JP5467374B2 - Apparatus for forming electroplating on shaft body, manufacturing method of shaft body having plating film, and plating solution for forming zinc-based plating film on shaft body - Google Patents

Apparatus for forming electroplating on shaft body, manufacturing method of shaft body having plating film, and plating solution for forming zinc-based plating film on shaft body Download PDF

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JP5467374B2
JP5467374B2 JP2012178752A JP2012178752A JP5467374B2 JP 5467374 B2 JP5467374 B2 JP 5467374B2 JP 2012178752 A JP2012178752 A JP 2012178752A JP 2012178752 A JP2012178752 A JP 2012178752A JP 5467374 B2 JP5467374 B2 JP 5467374B2
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plating solution
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義治 菊池
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Yuken Industry Co Ltd
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Description

本発明は、軸体に電気めっきを形成するための装置、めっき皮膜を有する軸体の製造方法および軸体上に亜鉛系めっき皮膜を形成するためのめっき液に関する。
本発明において、軸体とは、中心軸を有し、ほぼ回転対称の形状を有する部材をいう。
The present invention relates to an apparatus for forming electroplating on a shaft body, a method for manufacturing a shaft body having a plating film, and a plating solution for forming a zinc-based plating film on the shaft body.
In the present invention, the shaft body refers to a member having a central axis and a substantially rotationally symmetric shape.

シリンダーロッドなどの軸体からなるワークに電気めっきする場合には、ワークをラックに吊るしてめっき液内に浸漬させて、ラックを通じてワークに給電してめっき皮膜を形成することが一般的に行われている。   When electroplating a workpiece made of a shaft body such as a cylinder rod, it is common practice to hang the workpiece on a rack and immerse it in the plating solution, and then feed the workpiece through the rack to form a plating film. ing.

しかしながら、この吊り下げ方式の場合には、ワークの周方向のめっき皮膜の厚さにばらつきが生じやすく、めっき皮膜の厚さの管理幅が厳しい場合には不良品を発生させてしまう。   However, in the case of this suspension method, the thickness of the plating film in the circumferential direction of the workpiece is likely to vary, and if the management width of the thickness of the plating film is strict, defective products are generated.

このような軸体からなるワークにおけるめっき皮膜の厚さのばらつきを抑制する手段として、例えば、特許文献1には、めっき液が注入されためっき槽のワーク送り方向両端部にワーク入口及びワーク出口を形成し、めっき槽内のワーク通過通路両側に陽極板を配置した長尺ワーク用電気めっき装置において、めっき槽のワーク入口側に、円筒又は丸棒状のワークの軸心に対して傾斜する駆動軸を有するワーク駆動機構を配置し、ワーク外周面に圧接する駆動ローラを上記駆動軸に固着して、駆動ローラの回転によりワークの回転と長さ方向の移動とを行うようにするとともに、めっき槽内にめっき液噴出管を配置し、上記噴出管に、めっき槽内通過中のワークにめっき液の噴流を吹き付けるノズル部を複数個設けた長尺ワーク用電気めっき装置が開示されている。   As means for suppressing variations in the thickness of the plating film on a workpiece made of such a shaft, for example, Patent Document 1 discloses a workpiece inlet and a workpiece outlet at both ends of a workpiece feeding direction of a plating tank into which a plating solution has been injected. In an electroplating machine for long workpieces with anode plates arranged on both sides of the workpiece passage passage in the plating tank, the drive is inclined with respect to the axis of the cylindrical or round bar workpiece on the workpiece inlet side of the plating tank A work drive mechanism having a shaft is arranged, and a drive roller that presses against the outer peripheral surface of the work is fixed to the drive shaft so that the work roller rotates and moves in the length direction by the rotation of the drive roller. An electroplating for long workpieces, in which a plating solution jet pipe is arranged in the tank, and a plurality of nozzle portions for spraying a jet of the plating solution onto the workpiece passing through the plating tank are provided on the jet pipe. Location is disclosed.

特許2716741号公報Japanese Patent No. 2716741

しかしながら、特許文献1に開示される装置では、ワーク駆動機構によりワークは軸中心に回転しているとはいえ、回転の一瞬間を考えれば、ワークの周方向における一領域からめっき液が供給されている。このため、ワークに接するめっき液の流れの状態(流れ方向、流速など)はワークの周方向において不均一である。それゆえ、特許文献1に開示される装置では、ワークの周方向のめっき皮膜の厚さの均一性が低いという問題点があった。   However, in the apparatus disclosed in Patent Document 1, although the workpiece is rotated about the axis by the workpiece driving mechanism, the plating solution is supplied from one region in the circumferential direction of the workpiece in consideration of a moment of rotation. ing. For this reason, the state (flow direction, flow velocity, etc.) of the plating solution in contact with the workpiece is not uniform in the circumferential direction of the workpiece. Therefore, the apparatus disclosed in Patent Document 1 has a problem that the thickness uniformity of the plating film in the circumferential direction of the workpiece is low.

本発明は、このような技術背景を鑑み、軸体上に形成されためっき皮膜の厚さの均一性に優れる、電気めっきを軸体に形成するための装置、めっき皮膜を有する軸体の製造方法および軸体上に亜鉛系めっき皮膜を形成するためのめっき液を提供することを課題とする。   In view of such a technical background, the present invention is excellent in the uniformity of the thickness of the plating film formed on the shaft, and is an apparatus for forming electroplating on the shaft, and the manufacture of the shaft having the plating film. It is an object to provide a plating solution for forming a zinc-based plating film on a method and a shaft.

上記課題を解決するために提供される本発明は次のとおりである。
(1)軸体上に電気めっき皮膜を形成するための装置であって、被めっき部材である軸体におけるめっき皮膜が形成されるべき部分を内包し両端部が鉛直方向に開口する中空部を有する管状の管状部材、前記中空部の鉛直方向上側端部の開口の上方に設けられ前記軸体を前記中空部内に保持する支持手段、前記中空部の鉛直方向下側端部の開口から前記中空部内にめっき液を供給するめっき液噴流手段、前記中空部の鉛直方向上側端部の開口近傍に設けられ前記めっき液噴流手段により前記中空部内に供給されためっき液を前記管状部材外に排出可能にする排出構造、および前記排出構造を通じて前記管状部材から排出されためっき液を前記めっき液噴流手段に供給する環送手段を備え、前記支持手段は前記軸体と電気的に接続可能な接点部を備え、前記管状部材はその中空部に不溶性陽極を備え、前記支持手段は、前記接点部における前記軸体との電気的接続を維持しつつ前記軸体の軸周りの回転を可能とする回転機構を有し、この回転機構により、前記軸体を、前記軸体の表面の線速が10mm/秒以上となるように回転させながらめっき皮膜を形成することが可能とされる、軸体上に電気めっき皮膜を形成するための装置。
The present invention provided to solve the above problems is as follows.
(1) An apparatus for forming an electroplating film on a shaft body, which includes a hollow portion including a portion where a plating film is to be formed on a shaft body which is a member to be plated and having both ends opened in the vertical direction. A tubular member having a tubular member, a support means provided above the opening at the upper end in the vertical direction of the hollow portion, and holding the shaft body in the hollow portion; from the opening at the lower end in the vertical direction of the hollow portion to the hollow A plating solution jet means for supplying a plating solution into the part, provided near the opening at the upper end in the vertical direction of the hollow part, and the plating solution supplied into the hollow part by the plating solution jet means can be discharged out of the tubular member A discharge structure for supplying the plating solution discharged from the tubular member through the discharge structure to the plating solution jet means, and the support means is a contact portion that can be electrically connected to the shaft body. Wherein the tubular member comprises an insoluble anode in the hollow portion, said support means rotating mechanism for enabling rotation about the axis of the shaft body while maintaining electrical connection between the shaft body at the contact portion the a, this rotation mechanism, the shaft member, the linear velocity of the surface of the shaft body Ru is possible to form the plating film while rotating such that the 10 mm / sec or more, on the shaft An apparatus for forming an electroplated film.

(2)鉛直方向の両端に開口を有する中空部を備える管状の管状部材の前記中空部の内面に設けられた不溶性陽極と、被めっき部材である軸体を前記管状部材の中空部内に保持する支持手段が備えるものであって前記軸体との電気的接続を可能とする接点部との間に電圧を印加して前記軸体上にめっき皮膜を形成する方法であって、前記中空部の鉛直方向下側端部の開口から前記中空部内にめっき液を供給するめっき液噴流手段、前記中空部の鉛直方向上側端部の開口近傍に設けられ前記めっき液噴流手段により前記中空部内に供給されためっき液を前記管状部材外に排出可能にする排出構造、および前記排出構造を通じて前記管状部材から排出されためっき液を前記めっき液噴流手段に供給する環送手段により、前記中空部内にめっき液を電気めっき中に継続的に供給することが可能とされ、前記支持手段に設けられた、前記接点部における前記軸体との電気的接点を維持しつつ前記軸体の軸周りの回転を可能とする回転機構により、前記軸体を、前記軸体の表面の線速が10mm/秒以上となるように回転させながら前記軸体上にめっき皮膜を形成することが可能とされる、めっき皮膜を有する軸体の製造方法。 (2) An insoluble anode provided on the inner surface of the hollow tubular member having hollow portions having openings at both ends in the vertical direction, and a shaft body to be plated are held in the hollow portion of the tubular member. A method for forming a plating film on the shaft body by applying a voltage to a contact portion that is provided in the support means and enables electrical connection with the shaft body, A plating solution jet means for supplying a plating solution into the hollow portion from the opening at the lower end portion in the vertical direction, provided in the vicinity of the opening at the upper end portion in the vertical direction of the hollow portion, and supplied into the hollow portion by the plating solution jet means. A discharge structure that allows the plating solution to be discharged out of the tubular member, and a plating solution that is discharged from the tubular member through the discharge structure to the plating solution jet means, and is fed into the hollow portion by the circulating means. The Is it possible to continuously fed into the vapor plating, the provided on the support means, allowing rotation around the axis of the shaft body while maintaining electrical contact with the shaft body at the contact portion and the rotation mechanism, the shaft, the linear speed of the surface of said shaft body Ru is possible to form a plating film on the shaft on the body while rotating such that the 10 mm / sec or more, the plating film The manufacturing method of the shaft body which has.

(3)前記めっき液は、水溶性亜鉛含有物質およびポリエチレンイミンを含有する硫酸亜鉛系めっき液であって、前記水溶性亜鉛含有物質の含有量は亜鉛換算で70g/L以上100g/L以下であり、前記ポリエチレンイミンは、重量平均分子量が1500以上2500以下であって、その含有量は0.1g/L以上10g/Lであり、前記めっき液のpHは1以上2以下であって、めっき温度が30℃以上50℃以下、かつ電流密度が20A/dm以上100A/dm以下の条件で電気めっきが行われる、上記(2)に記載の製造方法。 (3) The plating solution is a zinc sulfate-based plating solution containing a water-soluble zinc-containing substance and polyethyleneimine, and the content of the water-soluble zinc-containing substance is 70 g / L or more and 100 g / L or less in terms of zinc. The polyethyleneimine has a weight average molecular weight of 1500 or more and 2500 or less, a content of 0.1 g / L or more and 10 g / L, and a pH of the plating solution of 1 or more and 2 or less. The production method according to (2) above , wherein electroplating is performed under conditions of a temperature of 30 ° C. or more and 50 ° C. or less and a current density of 20 A / dm 2 or more and 100 A / dm 2 or less.

(4)前記めっき液は、水溶性金属含有物質をさらに含有し、当該水溶性金属含有物質に含まれる金属元素は鉄、ニッケルからなる群から選ばれる一種または二種以上である、上記(3)記載の製造方法。 (4) The plating solution further contains a water-soluble metal-containing material, the metal element contained in the water-soluble metal-containing material is one or more selected from the group consisting of iron, nickel, the (3 ) Described production method.

(5)上記(1)に記載される装置を用い、めっき温度が30℃以上50℃以下かつ電流密度が20A/dm以上100A/dm以下の条件で電気めっきを行って軸体上に亜鉛系めっき皮膜を形成するためのめっき液であって、前記めっき液は、水溶性亜鉛含有物質およびポリエチレンイミンを含有する硫酸亜鉛系めっき液であって、前記水溶性亜鉛含有物質の含有量は亜鉛換算で70g/L以上100g/L以下であり、前記ポリエチレンイミンは、重量平均分子量が1500以上2500以下であって、その含有量は0.1g/L以上10g/Lであり、前記めっき液のpHは1以上2以下であることを特徴とする軸体上に亜鉛系めっき皮膜を形成するためのめっき液。 (5) Using the apparatus described in (1) above , electroplating is performed on the shaft body under the conditions of a plating temperature of 30 ° C. or higher and 50 ° C. or lower and a current density of 20 A / dm 2 or higher and 100 A / dm 2 or lower. A plating solution for forming a zinc-based plating film, wherein the plating solution is a zinc sulfate-based plating solution containing a water-soluble zinc-containing substance and polyethyleneimine, and the content of the water-soluble zinc-containing substance is It is 70 g / L or more and 100 g / L or less in terms of zinc, and the polyethyleneimine has a weight average molecular weight of 1500 or more and 2500 or less, and its content is 0.1 g / L or more and 10 g / L, and the plating solution The plating solution for forming a zinc-based plating film on the shaft body is characterized in that the pH of the shaft is 1 or more and 2 or less.

(6)前記めっき液は、水溶性金属含有物質をさらに含有し、当該水溶性金属含有物質に含まれる金属元素は鉄、ニッケルからなる群から選ばれる一種または二種以上である、上記(5)記載のめっき液。 (6) The plating solution further contains a water-soluble metal-containing substance, and the metal element contained in the water-soluble metal-containing substance is one or more selected from the group consisting of iron and nickel, (5 ) The plating solution described.

上記の発明によれば、軸体からなるワークの周方向におけるめっき液の流れ状態が均一となるため、ワーク上に形成されためっき皮膜は周方向の厚さの均一性に優れる。   According to said invention, since the flow state of the plating solution in the circumferential direction of the workpiece | work which consists of a shaft body becomes uniform, the plating film formed on the workpiece | work is excellent in the uniformity of the thickness of the circumferential direction.

本実施形態に係るめっき装置の具体的な一例を概念的に示す上面図(a)および上面図のA−A断面での断面図(b)である。It is the top view (a) which shows notionally a specific example of the plating apparatus which concerns on this embodiment, and sectional drawing (b) in the AA cross section of a top view. 実施例において使用した軸状ワークの具体的な形状・寸法を示す断面図である。It is sectional drawing which shows the specific shape and dimension of the shaft-shaped workpiece | work used in the Example.

本発明の一実施形態に係るめっき装置について以下に説明する。
本実施形態に係るめっき装置は、被めっき部材である軸体(以下、「軸状ワーク」ともいう。)の中心軸をほぼ鉛直方向にして、その中空部内をめっき液がほぼ鉛直方向上向きに流れる管状部材中に配置し、好ましい一態様では軸状ワークを回転させながら、めっき(電解)を行って、軸状ワーク上にめっき皮膜を形成するためのものである。
A plating apparatus according to an embodiment of the present invention will be described below.
In the plating apparatus according to this embodiment, the central axis of a shaft body (hereinafter also referred to as “shaft workpiece”) that is a member to be plated is set to a substantially vertical direction, and the plating solution is directed substantially vertically upward in the hollow portion. It arrange | positions in the flowing tubular member, and in one preferable aspect, it is for performing a plating (electrolysis), rotating a shaft-shaped workpiece, and forming a plating film on a shaft-shaped workpiece.

本実施形態に係るめっき装置はほぼ管状の形状を有する管状部材を備え、この管状部材は両端部が鉛直方向に開口する中空部を有する。この中空部内に軸状ワークのめっき皮膜が形成されるべき部分は内包される。また、この中空部内に不溶性陽極が設けられている。好ましい一態様では、不溶性陽極は中空部の内側面の少なくとも一部をなしており、さらに好ましい一態様では、管状部材の中空部の内側面における軸状ワークと対向する部分の全てが不溶性陽極からなる。不溶性陽極の材質は特に限定されない。一般的に使用されるチタン−白金クラッド、酸化イリジウムなどを使用すればよい。   The plating apparatus according to the present embodiment includes a tubular member having a substantially tubular shape, and the tubular member has a hollow portion whose both ends are open in the vertical direction. A portion where the plating film of the shaft-like workpiece is to be formed is included in the hollow portion. An insoluble anode is provided in the hollow portion. In a preferred embodiment, the insoluble anode forms at least a part of the inner surface of the hollow portion, and in a more preferred embodiment, all of the portion of the inner surface of the hollow portion of the tubular member facing the axial workpiece is formed from the insoluble anode. Become. The material of the insoluble anode is not particularly limited. Generally used titanium-platinum clad, iridium oxide, etc. may be used.

管状部材における中空部の鉛直方向上側の開口の上方には、軸状ワークをその中空部内に保持することを実現する支持手段が設けられている。この支持手段は、軸状ワークと電気的に接続可能な接点部を備える。軸状ワークはこの接点部を通じて外部電源と電気的に接続されてめっき液中で陰極をなすことが可能とされている。   Above the opening on the upper side in the vertical direction of the hollow portion of the tubular member, support means for realizing the holding of the shaft-like workpiece in the hollow portion is provided. The support means includes a contact portion that can be electrically connected to the shaft-like workpiece. The shaft-like workpiece can be electrically connected to an external power source through this contact portion to form a cathode in the plating solution.

支持手段の具体的な構成は任意であるが、次に説明するように軸状ワークが軸周りに回転可能とされることが好ましい。好ましい一態様では、支持手段は、接点部における軸状ワークとの電気的接続を維持しつつ、軸状ワークの軸周りの回転を可能とする回転機構を有し、この回転機構により軸状ワークを回転させながら軸状ワーク上にめっき皮膜を形成することが可能とされる。このような構成の具体例を示せば、モータの回転軸に連結されたクリップを用いて、軸状ワークの鉛直方向最上部を、軸状ワークの中心軸とモータの回転軸とが一致するように把持し、モータの中心軸に接触する給電ブラシにより外部電源からの電流を軸状ワークに導くが挙げられる。   Although the specific configuration of the support means is arbitrary, it is preferable that the shaft-like workpiece is rotatable around the axis as described below. In a preferred aspect, the support means has a rotation mechanism that enables rotation around the axis of the shaft-like workpiece while maintaining electrical connection with the shaft-like workpiece at the contact portion. It is possible to form a plating film on the shaft-like workpiece while rotating. If the specific example of such a structure is shown, the center axis | shaft of a shaft-shaped workpiece and the rotation axis of a motor will correspond in the perpendicular direction uppermost part of a shaft-shaped workpiece using the clip connected with the rotating shaft of the motor. The current from an external power source is guided to the shaft-like workpiece by a power supply brush that is gripped by the motor and contacts the central axis of the motor.

本実施形態に係るめっき装置は管状部材の中空部の鉛直方向下側の開口から中空部内にめっき液を供給するめっき液噴流手段を備える。一例において、めっき液噴流手段は、ポンプと、管状部材の中空部の鉛直方向下側に配置されてその開口が鉛直方向上側を向くポンプからのめっき液の吐出口とを備える。このめっき液噴流手段により、管状部材の中空部内にめっき液が鉛直方向上向きに流れる。このため、中空部内に配置された軸状ワークの周方向の流れ状態はほぼ一様となり、めっき液の流れ状態が周方向で変動することに基づいてめっき皮膜の厚さが変動することが抑制される。また、めっき金属の析出に伴い軸状ワークの表面に発生する気泡は、この鉛直方向上向きのめっき液の流れによりスムーズに軸状ワークから脱離することができるため、めっき皮膜内にピンホールが発生することが抑制される。   The plating apparatus according to the present embodiment includes plating solution jet means for supplying a plating solution into the hollow portion from the opening on the lower side in the vertical direction of the hollow portion of the tubular member. In one example, the plating solution jet means includes a pump and a discharge port for the plating solution from the pump that is disposed on the lower side in the vertical direction of the hollow portion of the tubular member and whose opening faces the upper side in the vertical direction. By this plating solution jet means, the plating solution flows vertically upward in the hollow portion of the tubular member. For this reason, the circumferential flow state of the shaft-like workpiece disposed in the hollow portion is almost uniform, and the variation of the plating film thickness is suppressed based on the variation of the plating solution flow state in the circumferential direction. Is done. In addition, air bubbles generated on the surface of the shaft-like workpiece due to the deposition of the plating metal can be smoothly detached from the shaft-like workpiece by the flow of the vertically upward plating solution. Occurrence is suppressed.

本実施形態に係るめっき装置は、好ましい一態様として、管状部材の中空部の内側面が不溶性陽極からなり、かつめっき時において軸状ワークが軸周りに回転する。このため、めっき液の流れ状態の周方向での変動はさらに抑制される。   In a preferred embodiment of the plating apparatus according to the present embodiment, the inner surface of the hollow portion of the tubular member is made of an insoluble anode, and the axial workpiece rotates around the axis during plating. For this reason, the fluctuation | variation in the circumferential direction of the flow state of a plating solution is further suppressed.

また、不溶性陽極と陰極としての軸状ワークとが作る電界の軸状ワークの周方向の変動も抑制される。管状部材の中空部の内側面における不溶性陽極の中心軸と軸状ワークの中心軸とは、めっき装置の設計上一致するが、現実には、めっき装置の加工時または組み立て時の誤差(装置上の誤差)、および軸状ワークをめっき装置に取り付ける際の取り付け誤差により、不溶性陽極の中心軸と軸状ワークの中心軸とは厳密には一致しない。軸状ワークを回転させることなくめっきを行うと、この中心軸同士のずれが軸状ワークの周方向の電界分布にばらつきをもたらし、電界が強い部分にめっき金属が集中的に析出する。すなわち、軸状ワークを回転させない場合には、装置上および/またはワーク取り付け時の不可避的なわずかな誤差によって、周方向のめっき皮膜の厚さに大きな変動がもたらされる可能性がある。軸状ワークを回転させながらめっきを行うことにより、こうした中心軸のずれは平準化されるため、めっき皮膜の厚さの周方向のばらつきが特に抑制される。   Moreover, the fluctuation | variation of the circumferential direction of the axial workpiece | work of the electric field which an insoluble anode and the axial workpiece | work as a cathode produce is also suppressed. The central axis of the insoluble anode on the inner surface of the hollow portion of the tubular member and the central axis of the shaft-like workpiece coincide with each other in the design of the plating apparatus, but in reality, errors during processing or assembly of the plating apparatus (on the apparatus) The center axis of the insoluble anode and the center axis of the shaft-shaped workpiece do not exactly match due to the mounting error when mounting the shaft-shaped workpiece to the plating apparatus. When plating is performed without rotating the shaft-shaped workpiece, the deviation between the central axes causes variation in the electric field distribution in the circumferential direction of the shaft-shaped workpiece, and the plating metal is concentrated in a portion where the electric field is strong. That is, when the shaft-like workpiece is not rotated, a slight variation in the thickness of the circumferential plating film may be caused by an inevitable slight error on the apparatus and / or when the workpiece is attached. By performing plating while rotating the shaft-like workpiece, such a deviation of the central axis is leveled, and thus the variation in the thickness of the plating film in the circumferential direction is particularly suppressed.

さらに、軸状ワークがその中心軸に沿った方向に回転中心軸を有するねじ部を備える場合には、めっき液の流れ方向が軸状ワークの中心軸に沿った方向のみでは、ねじの谷部分に発生した気泡が脱離しにくく、ねじの谷部分のめっき厚が薄くなる傾向がある。したがって、軸状ワークを回転させてめっき液の流れ方向に軸状ワークの周方向の成分を付与することによって、ねじの谷部分に発生した気泡が脱離しやすくなり、ねじの谷部分のめっき厚を増やすことが可能となる。すなわち、軸状ワークがその中心軸に沿った方向に回転中心軸を有するねじ部を備える場合には、軸状ワークを回転させることによりねじ部においてめっき不良の発生が抑制されるため、特に好ましい。   Furthermore, when the shaft-like workpiece is provided with a screw portion having a rotation center axis in the direction along the center axis, the thread valley portion is only in the direction in which the plating solution flows along the center axis of the shaft-like workpiece. The bubbles generated in the film are difficult to be detached, and the plating thickness of the thread valley portion tends to be thin. Therefore, by rotating the shaft-shaped workpiece and applying a circumferential component of the shaft-shaped workpiece in the plating solution flow direction, bubbles generated in the screw valley portion are easily detached, and the plating thickness of the screw valley portion is reduced. Can be increased. That is, when the shaft-like workpiece includes a screw portion having a rotation center axis in the direction along the center axis, the occurrence of plating defects in the screw portion is suppressed by rotating the shaft-like workpiece, which is particularly preferable. .

管状部材の中空部の鉛直方向上側の開口近傍には、めっき液噴流手段により中空部内に供給されためっき液を管状部材外に排出可能にする排出構造が設けられている。この排出構造の具体的な構成は、上記のとおりめっき液を管状部材外に排出することができる限り、任意である。そのような構造の一例としてオーバーフロー構造が挙げられる。   In the vicinity of the opening on the upper side in the vertical direction of the hollow portion of the tubular member, a discharge structure is provided that allows the plating solution supplied into the hollow portion by the plating solution jet means to be discharged out of the tubular member. The specific configuration of the discharge structure is arbitrary as long as the plating solution can be discharged out of the tubular member as described above. An example of such a structure is an overflow structure.

上記の排出構造を通じて管状部材から排出されためっき液を前述のめっき液噴流手段に供給する環送手段を、本実施形態に係るめっき装置は備える。この還流手段の具体的な構成は任意である。具体例を挙げれば、排出構造からのめっき液を受けるクッションタンクと、クッションタンク内のめっき液をめっき液噴流手段のポンプに接続する配管とからなる手段が挙げられる。   The plating apparatus according to this embodiment includes a circulating unit that supplies the plating solution discharged from the tubular member through the discharge structure to the plating solution jet unit. The specific configuration of the reflux means is arbitrary. As a specific example, there may be mentioned means comprising a cushion tank that receives the plating solution from the discharge structure, and a pipe that connects the plating solution in the cushion tank to the pump of the plating solution jet means.

ここで、めっき液噴流手段により供給されためっき液の流量や流速が大きい場合には、管状部材の中空部からのめっき液の一部が支持手段を構成する部材に近接するように向かう可能性がある。支持手段を構成する部材の中にはめっき液と接触すると、腐食して初期の機能を果たすことができなくなるものが含まれる場合もある(例えば給電ブラシ。)。そこで、支持手段は、めっき噴流手段により供給されためっき液が支持手段を構成する部材と接触することを安定的に抑制するための遮蔽部材を備えてもよい。   Here, when the flow rate or flow rate of the plating solution supplied by the plating solution jet means is large, there is a possibility that a part of the plating solution from the hollow portion of the tubular member will be close to the member constituting the support means. There is. Some members constituting the supporting means may include those that cannot corrode and perform the initial function when they come into contact with the plating solution (for example, a power supply brush). Therefore, the support means may include a shielding member for stably suppressing the plating solution supplied by the plating jet means from coming into contact with a member constituting the support means.

上記の本実施形態に係るめっき装置の具体的な一例について、図面を参照しつつ詳しく説明する。
図1は、本実施形態に係るめっき装置の具体的な一例を概念的に示す上面図(a)および上面図のA−A断面での断面図(b)である。
A specific example of the plating apparatus according to the present embodiment will be described in detail with reference to the drawings.
FIG. 1 is a top view (a) conceptually showing a specific example of the plating apparatus according to the present embodiment, and a sectional view (b) taken along the line AA of the top view.

本例に係るめっき装置100において、軸状ワーク8は、概形が六角ボルトの形状である軸体である。両端が開口する筒形状を有するチタン製であって、その内側面6全面が不溶性陽極として機能する管状部材7の内部に、軸状ワーク8がほぼ六角柱の形状を有する頂部を管状部材7から突出させるように配置されている。ここで、ほぼ平板上で貫通孔を有するドーナツ形状の支持部材1の貫通孔を貫くように軸状ワーク8は挿入されており、軸状ワーク8の頂部の下側と軸状ワーク8の貫通孔の開口縁部とが接することにより、軸状ワーク8は支持部材1により支持されている。   In the plating apparatus 100 according to this example, the shaft-shaped workpiece 8 is a shaft body whose rough shape is a hexagonal bolt shape. The top of the tubular member 7 is made of titanium having a cylindrical shape with both ends open, and the entire inner side surface 6 of the tubular member 7 functions as an insoluble anode. It is arranged to protrude. Here, the shaft-like workpiece 8 is inserted so as to penetrate the through-hole of the donut-shaped support member 1 having a through-hole substantially on a flat plate, and the lower side of the top of the shaft-like workpiece 8 and the penetration of the shaft-like workpiece 8 are inserted. The shaft-like workpiece 8 is supported by the support member 1 by coming into contact with the opening edge of the hole.

軸状ワーク8の頂部の上方には、接点部2とその上方の回転電極4とが取り付けられた接点加圧ふた3が設けられている。接点部2と軸状ワーク8の頂部との接触を維持しつつこの接点加圧ふた3が支持部材1に対して近接する向きに接点加圧ふた3が付勢されるように、接点加圧ふた3は支持部材1に対して固定される。このようにすることで、軸状ワーク8と支持部材1との接触部からめっき液が軸状ワーク8の頂部側に入り込むことが抑制されている。したがって、本例において、支持手段は、遮蔽部材としての機能も有する支持部材1、接点部、接点加圧ふた3および回転電極4により構成される。   Above the top of the shaft-shaped workpiece 8, a contact pressure lid 3 to which the contact portion 2 and the rotating electrode 4 above it are attached is provided. Contact pressurization is performed so that the contact pressurization lid 3 is urged in a direction in which the contact pressurization lid 3 approaches the support member 1 while maintaining contact between the contact portion 2 and the top of the shaft-shaped workpiece 8. The lid 3 is fixed to the support member 1. By doing in this way, it is suppressed that a plating solution enters into the top part side of the shaft-shaped workpiece 8 from the contact part of the shaft-shaped workpiece 8 and the supporting member 1. Therefore, in this example, the support means includes the support member 1 that also functions as a shielding member, the contact portion, the contact pressure lid 3, and the rotating electrode 4.

ここで、各部材の配置関係を説明すれば、管状部材7の中心軸と、軸状ワーク8の中心軸と、回転電極4の中心軸とはほぼ重なるように配置されている。したがって、回転機構5を駆動させて接点加圧ふた3を回転させると、その回転に伴って軸状ワーク8は回転し、このように軸状ワーク8が回転しても不溶性陽極と軸状ワーク8との距離は変動しない。すなわち、不溶性陽極と陰極をなす軸状ワーク8とが作る電界は軸状ワーク8の回転によっては変動しない。   Here, the arrangement relationship of each member will be described. The central axis of the tubular member 7, the central axis of the shaft-like workpiece 8, and the central axis of the rotary electrode 4 are arranged so as to substantially overlap. Therefore, when the rotating mechanism 5 is driven to rotate the contact pressure lid 3, the shaft-like workpiece 8 rotates with the rotation, and even if the shaft-like workpiece 8 rotates in this way, the insoluble anode and the shaft-like workpiece are rotated. The distance to 8 does not change. In other words, the electric field generated by the shaft-shaped workpiece 8 that forms the insoluble anode and the cathode does not vary depending on the rotation of the shaft-shaped workpiece 8.

管状部材7の下側の開口からめっき液噴流手段(ポンプ)により管状部材7の中空部内に供給されためっき液はオーバーフロー構造を有する排出構造9から排出され、排出されためっき液はクッションタンク10を経由してめっき液噴流手段(ポンプ)に供給される。こうして、管状部材7の中空部内におけるめっき液の液流が維持される。なお、クッションタンク10の容量は任意である。めっき液の流速、管理すべきめっき液の温度範囲などを考慮して適宜設定される。目安としては、管状部材7の容積の10倍から100倍であり、好ましくは20倍以上50倍以下である。   The plating solution supplied into the hollow portion of the tubular member 7 by the plating solution jet means (pump) from the lower opening of the tubular member 7 is discharged from the discharge structure 9 having an overflow structure, and the discharged plating solution is the cushion tank 10. To the plating solution jet means (pump). Thus, the plating solution flow in the hollow portion of the tubular member 7 is maintained. The capacity of the cushion tank 10 is arbitrary. It is set appropriately in consideration of the flow rate of the plating solution and the temperature range of the plating solution to be managed. As a standard, the volume of the tubular member 7 is 10 to 100 times, preferably 20 to 50 times.

管状部材7の中空部内におけるめっき液の流速は、速ければ速いほど軸状ワーク8の表面における拡散層の厚さが薄くなり、高速めっきを行いやすくなる。また、軸状ワーク8において発生した水素が軸状ワーク8の表面から脱離しやすくなるため、ピンホール発生の可能性も少なくなる。   The higher the flow rate of the plating solution in the hollow portion of the tubular member 7, the thinner the diffusion layer on the surface of the shaft-like workpiece 8, making it easier to perform high-speed plating. Further, since hydrogen generated in the shaft-like workpiece 8 is easily detached from the surface of the shaft-like workpiece 8, the possibility of occurrence of pinholes is reduced.

しかしながら、めっき液の液流が過度に速くなると、軸状ワーク8、特に軸径が変化する部分の表面近傍においてめっき液に乱流が発生しやすくなる。乱流が発生すると、その部分におけるめっきの析出状態が不安定化し、得られためっき皮膜の品質の低下をもたらす可能性が高まる。   However, when the flow rate of the plating solution becomes excessively fast, turbulent flow is likely to occur in the plating solution in the vicinity of the surface of the shaft-shaped workpiece 8, particularly the portion where the shaft diameter changes. When the turbulent flow occurs, the deposition state of the plating in that portion becomes unstable, and the possibility that the quality of the obtained plating film is deteriorated increases.

乱流を実質的に発生させない好ましいめっき液の流速の範囲は、管状部材7の中空部の内径(内径が小さい場合には乱流が発生しやすい)、軸状ワーク8の軸径(中空部の内径の軸径からの差が小さい場合には乱流が発生しやすい)、軸状ワーク8の軸方向の径変化の程度(急激な段差があると乱流が発生しやすい)、めっき液の組成(含有量が高い場合には粘度が高まりやすく、このとき乱流が発生しやすい)、めっき液温度(温度が低い場合には粘度が高まりやすく、このとき乱流が発生しやすい)などを考慮して適宜設定されるべきものである。   The preferable range of the flow rate of the plating solution that does not substantially generate turbulent flow is the inner diameter of the hollow portion of the tubular member 7 (turbulent flow is likely to occur when the inner diameter is small), the shaft diameter of the shaft-like workpiece 8 (hollow portion). Turbulent flow is likely to occur when the difference between the inner diameter of the workpiece and the inner diameter of the shaft is small), the degree of axial diameter change of the shaft-like workpiece 8 (turbulent flow is likely to occur if there is a sudden step), plating solution Composition (when the content is high, viscosity is likely to increase, and turbulence is likely to occur at this time), plating solution temperature (when temperature is low, viscosity is likely to increase, and turbulence is likely to occur at this time), etc. Should be set as appropriate.

また、めっき液における金属イオン濃度が低い場合には、めっき液の流速がある程度高くなるとめっき速度が低下する傾向を示す場合もあるため、めっき速度の低下を抑制する観点からめっき液の流速には上限を設定することが好ましい場合もある。   In addition, when the metal ion concentration in the plating solution is low, the plating solution flow rate may tend to decrease as the plating solution flow rate increases to some extent. It may be preferable to set an upper limit.

軸状ワーク8の回転速度は特に限定されない。軸状ワークの表面の線速として10mm/秒程度以上あれば、めっき皮膜の厚さの周方向のばらつきを抑制する効果が安定的に得られる。軸状ワークの表面の線速として20mm/秒以上とすることがさらに好ましく、30mm/秒以上とすることが特に好ましい。めっき液の組成などにも依存するが、50mm/秒以上とすることが好ましい場合もある。軸状ワーク8の回転速度の上限は確定的には規定されない。過度に速くなると、めっき液の流速とのベクトル和が大きくなって乱流が発生する可能性が高まること、および回転数を高めるための機構が大型化し、回転に要するエネルギーも多くなることなどを考慮して適宜設定すればよい。   The rotational speed of the shaft-like workpiece 8 is not particularly limited. If the linear velocity on the surface of the shaft-like workpiece is about 10 mm / second or more, the effect of suppressing the variation in the circumferential direction of the thickness of the plating film can be stably obtained. The linear velocity on the surface of the shaft-like workpiece is more preferably 20 mm / second or more, and particularly preferably 30 mm / second or more. Although depending on the composition of the plating solution and the like, it may be preferable to set it to 50 mm / second or more. The upper limit of the rotational speed of the shaft workpiece 8 is not definitely defined. If it becomes too fast, the vector sum with the plating solution flow rate will increase, increasing the possibility of turbulence, and the mechanism for increasing the number of rotations will become larger and the energy required for rotation will increase. It may be set as appropriate in consideration.

一例として挙げれば、管状部材7の内径が50mmおよび軸状ワークの軸径が18mmの場合には、めっき液の流速は0.10m/秒以上1.5m/秒以下の範囲、めっき液が後述する好適な組成のめっき液である場合には0.10m/秒以上1.0m/秒以下の範囲とし、軸状ワーク8の回転による線速を10mm/秒以上から200mm/秒以下の範囲、めっき液が後述する好適な組成のめっき液である場合には10mm/秒以上から30mm/秒以下の範囲とすれば、数mmの軸径変化(くびれ、突出、タップなど)がある軸状ワーク8に対して20A/dm以上100A/dm以下の高電解条件でめっきした場合であっても、安定した品質のめっき皮膜を得ることができる。 As an example, when the inner diameter of the tubular member 7 is 50 mm and the shaft diameter of the shaft-shaped workpiece is 18 mm, the flow rate of the plating solution is in the range of 0.10 m / second to 1.5 m / second, and the plating solution is described later. In the case of a plating solution having a suitable composition, the range is from 0.10 m / second to 1.0 m / second, and the linear velocity due to rotation of the shaft-shaped workpiece 8 is from 10 mm / second to 200 mm / second, When the plating solution is a plating solution having a suitable composition to be described later, an axial workpiece having a shaft diameter change (constriction, protrusion, tap, etc.) of several mm can be obtained if the plating solution is in the range of 10 mm / second to 30 mm / second. Even when plating is performed under high electrolysis conditions of 20 A / dm 2 or more and 100 A / dm 2 or less with respect to 8, a plating film with stable quality can be obtained.

以下、本実施形態に係るめっき装置100を用いてめっき処理を行うことに適しためっき液(以下、「本めっき液」ともいう。)について説明する。
本めっき液は、水溶性亜鉛含有物質およびポリエチレンイミンを含有し、pHが1以上2以下の硫酸亜鉛系めっき液である。ここで、亜鉛系めっき液とは、亜鉛めっき皮膜を形成するためのめっき液である亜鉛めっき液と、亜鉛合金めっき皮膜を形成するためのめっき液である亜鉛合金めっき液との総称である。本めっき液が亜鉛合金めっき液である場合には、水溶性金属含有物質をさらに含有してもよい。この水溶性金属含有物質に含まれる金属元素の具体例として、鉄およびニッケルからなる群から選ばれる一種または二種以上が挙げられる。
Hereinafter, a plating solution suitable for performing a plating process using the plating apparatus 100 according to the present embodiment (hereinafter also referred to as “the present plating solution”) will be described.
The present plating solution is a zinc sulfate-based plating solution containing a water-soluble zinc-containing substance and polyethyleneimine and having a pH of 1 or more and 2 or less. Here, the zinc-based plating solution is a generic term for a zinc plating solution that is a plating solution for forming a zinc plating film and a zinc alloy plating solution that is a plating solution for forming a zinc alloy plating film. When this plating solution is a zinc alloy plating solution, it may further contain a water-soluble metal-containing substance. Specific examples of the metal element contained in the water-soluble metal-containing material include one or more selected from the group consisting of iron and nickel.

(水溶性亜鉛含有物質)
本めっき液は、水溶性亜鉛含有物質を含有する。本明細書において水溶性亜鉛含有物質とは、亜鉛系めっき皮膜として析出する亜鉛の供給源であって、亜鉛の陽イオンおよびこれを含有する水溶性物質からなる群から選ばれる一種または二種以上の成分をいう。
(Water-soluble zinc-containing substance)
The plating solution contains a water-soluble zinc-containing substance. In the present specification, the water-soluble zinc-containing substance is a source of zinc deposited as a zinc-based plating film, and is one or more selected from the group consisting of zinc cations and water-soluble substances containing the same. Refers to the ingredients.

水溶性亜鉛含有物質をめっき浴に供給する原料物質(本発明において、「亜鉛源」ともいう。)として、硫酸亜鉛、酸化亜鉛、塩化亜鉛などが例示される。これらの中でも、硫酸亜鉛が亜鉛源として好ましい。本めっき液は、めっき液の安定性が低下したりめっき皮膜の膜質が低下したりする可能性を低減させる観点から、塩化物イオンまたはこれを含む物質が例示される塩素含有物質を含有しないことが好ましい。   Examples of the raw material for supplying the water-soluble zinc-containing material to the plating bath (also referred to as “zinc source” in the present invention) include zinc sulfate, zinc oxide, and zinc chloride. Among these, zinc sulfate is preferable as a zinc source. This plating solution does not contain chloride-containing substances such as chloride ions or substances containing the same from the viewpoint of reducing the possibility that the stability of the plating solution is lowered or the film quality of the plating film is lowered. Is preferred.

本めっき液における水溶性亜鉛含有物質の亜鉛換算含有量は70g/L以上100g/L以下とすることが好ましい。水溶性亜鉛含有物質の亜鉛換算含有量が70g/L未満の場合には、本実施形態に係るめっき装置100を用いても、高い電流密度、具体的には20A/dm程度以上で、良好な外観のめっき皮膜を安定的に形成することが困難となる。一方、本めっき液における水溶性亜鉛含有物質の亜鉛換算含有量が100g/L超の場合には、めっき液の粘度が高くなり、やはり良好な外観のめっき皮膜を安定的に形成することが困難となる。高い生産性で良好な外観のめっき皮膜をより安定的に形成することを可能とする観点から、本めっき液の水溶性亜鉛含有物質の亜鉛換算含有量は75g/L以上95g/L以下とすることが好ましい。良好な着きまわり性および廃水処理への負荷を緩和する観点も考慮すれば、本めっき液の水溶性亜鉛含有物質の亜鉛換算含有量は75g/L以上90g/L以下とすることが好ましい。 The zinc equivalent content of the water-soluble zinc-containing substance in the plating solution is preferably 70 g / L or more and 100 g / L or less. When the zinc equivalent content of the water-soluble zinc-containing substance is less than 70 g / L, even if the plating apparatus 100 according to this embodiment is used, a high current density, specifically about 20 A / dm 2 or more, is good. It is difficult to stably form a plating film having a good appearance. On the other hand, when the zinc equivalent content of the water-soluble zinc-containing substance in the present plating solution is over 100 g / L, the viscosity of the plating solution increases, and it is difficult to stably form a plating film with a good appearance. It becomes. From the viewpoint of enabling more stable formation of a plating film with high productivity and good appearance, the zinc equivalent content of the water-soluble zinc-containing substance of the present plating solution is 75 g / L or more and 95 g / L or less. It is preferable. Considering the viewpoint of alleviating the load on the wastewater treatment and the good throwing power, the zinc equivalent content of the water-soluble zinc-containing substance of the plating solution is preferably 75 g / L or more and 90 g / L or less.

(水溶性金属含有物質)
本めっき液が亜鉛合金めっき液である場合には、水溶性金属含有物質を含有する。本明細書において水溶性金属含有物質とは、亜鉛合金めっき皮膜に含有される亜鉛以外の金属の供給源であって、金属元素の陽イオンおよびこれを含有する水溶性物質からなる群から選ばれる一種または二種以上の成分をいう。水溶性金属含有物質に含有される金属元素として、鉄およびニッケルが例示される。好ましい一例において、金属含有物質に含まれる金属元素は鉄およびニッケルからなる群から選ばれる。
(Water-soluble metal-containing substance)
When this plating solution is a zinc alloy plating solution, it contains a water-soluble metal-containing substance. In the present specification, the water-soluble metal-containing substance is a source of metals other than zinc contained in the zinc alloy plating film, and is selected from the group consisting of metal element cations and water-soluble substances containing the metal element cations. It refers to one or more components. Examples of the metal element contained in the water-soluble metal-containing material include iron and nickel. In a preferred example, the metal element contained in the metal-containing material is selected from the group consisting of iron and nickel.

水溶性金属含有物質をめっき浴に供給する原料物質(本発明において、「金属源」ともいう。)はその水溶性金属含有物質に含有される金属元素の種類に応じて適宜選択すればよい。例えば、水溶性金属含有物質に含有される金属元素が鉄である場合、すなわち、亜鉛合金めっき浴が水溶性鉄含有物質を含有する場合には、Fe(SO・7HO、FeSO・7HO、Fe(OH)、FeCl・6HO、FeCl・4HOなどが鉄源として例示される。水溶性金属含有物質に含有される金属元素がニッケルである場合、すなわち、亜鉛合金めっき浴が水溶性ニッケル含有物質を含有する場合には、NiSO・6HO、NiCl・6HO,Ni(OH)などがニッケル源として例示される。 The raw material for supplying the water-soluble metal-containing substance to the plating bath (also referred to as “metal source” in the present invention) may be appropriately selected according to the type of metal element contained in the water-soluble metal-containing substance. For example, when the metal element contained in the water-soluble metal-containing material is iron, that is, when the zinc alloy plating bath contains the water-soluble iron-containing material, Fe 2 (SO 4 ) 3 · 7H 2 O, FeSO 4 · 7H 2 O, Fe (OH) 3 , FeCl 3 · 6H 2 O, FeCl 2 · 4H 2 O and the like are exemplified as iron sources. When the metal element contained in the water-soluble metal-containing material is nickel, that is, when the zinc alloy plating bath contains a water-soluble nickel-containing material, NiSO 4 .6H 2 O, NiCl 2 .6H 2 O, Ni (OH) 2 or the like is exemplified as the nickel source.

本実施形態に係る亜鉛系めっき浴における水溶性金属含有物質の金属換算含有量は、目的とする亜鉛合金めっきの組成に応じて適宜設定される。亜鉛系めっき浴が水溶性鉄含有物質を含有する場合には、水溶性鉄含有物質の鉄換算含有量を0.8g/L以上2g/L以下程度とすることが例示される。亜鉛系めっき浴が水溶性ニッケル含有物質を含有する場合には、水溶性ニッケル含有物質のニッケル換算含有量を10g/L以上17g/L以下程度とすることが例示される。   The metal equivalent content of the water-soluble metal-containing substance in the zinc-based plating bath according to the present embodiment is appropriately set according to the intended composition of the zinc alloy plating. When the zinc-based plating bath contains a water-soluble iron-containing substance, it is exemplified that the content in terms of iron of the water-soluble iron-containing substance is about 0.8 g / L or more and 2 g / L or less. In the case where the zinc-based plating bath contains a water-soluble nickel-containing substance, the nickel-converted content of the water-soluble nickel-containing substance is exemplified to be about 10 g / L or more and 17 g / L or less.

(ポリエチレンイミン)
本実施形態に係るめっき装置100は不溶性陽極を備えるため、陽極においてめっき液に含有される成分の電気分解が生じやすい。このような化学的に活性な環境においても優れた特性を示すことができる観点から、本めっき液はポリエチレンイミンを有機添加剤として含有する。
(Polyethyleneimine)
Since the plating apparatus 100 according to this embodiment includes an insoluble anode, electrolysis of components contained in the plating solution tends to occur at the anode. From the viewpoint of exhibiting excellent characteristics even in such a chemically active environment, the present plating solution contains polyethyleneimine as an organic additive.

本めっき液に含有されるポリエチレンイミンの重量平均分子量は1500以上2500以下である。この重量平均分子量が1500未満、具体的には例えば1000となると、電流密度が高い条件(例えば50A/dm程度以上)において、非めっき部材である軸体(軸状ワーク8)に異物が吸着したり(以下、この現象を「異物吸着」ともいう。)、めっきの析出状態が不安定となってめっき金属の酸化物などが析出したり(以下、この現象を「異常析出」ともいう。)して、めっき皮膜の外観が劣化する。一方、ポリエチレンイミンの重量平均分子量が2500以上、具体的には例えば3000となると、電流密度が比較的低い条件(例えば30A/dm程度)から上記のような異物吸着や異常析出が生じ、めっき皮膜の外観が劣化する。 The weight average molecular weight of polyethyleneimine contained in the plating solution is 1500 or more and 2500 or less. When the weight average molecular weight is less than 1500, specifically 1000, for example, foreign matter is adsorbed to the shaft body (shaft workpiece 8) which is a non-plated member under the condition of high current density (for example, about 50 A / dm 2 or more). (Hereinafter, this phenomenon is also referred to as “foreign matter adsorption”), the deposition state of the plating becomes unstable, and an oxide of the plating metal is deposited (hereinafter, this phenomenon is also referred to as “abnormal precipitation”). ) And the appearance of the plating film deteriorates. On the other hand, when the weight average molecular weight of polyethyleneimine is 2500 or more, specifically, for example, 3000, the above-described foreign matter adsorption and abnormal precipitation occur due to relatively low current density (for example, about 30 A / dm 2 ). The appearance of the film deteriorates.

本めっき液におけるポリエチレンイミンの含有量は0.1g/L以上10g/Lである。その含有量が0.1g/L未満の場合には、ポリエチレンイミンを含有させた効果が得られにくくなり、めっき皮膜の外観が劣化する。一方、ポリエチレンイミンの含有量が10g/Lを超えても、含有量に見合う程度の効果(例えば、めっき析出速度の向上など)は得られにくくなり経済的観点から好ましくない。また、得られためっき皮膜の光沢が過度に高くなってめっき皮膜形成の有無が確認できなくなったり、廃水処理の負荷が増大したりする場合もある。   The content of polyethyleneimine in the plating solution is 0.1 g / L or more and 10 g / L. When the content is less than 0.1 g / L, it is difficult to obtain the effect of containing polyethyleneimine, and the appearance of the plating film is deteriorated. On the other hand, even if the content of polyethyleneimine exceeds 10 g / L, it is difficult to obtain an effect commensurate with the content (for example, improvement in plating deposition rate), which is not preferable from an economical viewpoint. Moreover, the gloss of the obtained plating film may become excessively high, and it may not be possible to confirm the presence or absence of plating film formation, or the wastewater treatment load may increase.

(pH)
本めっき液のpHは1以上2以下である。pHが過度に低い場合には、めっき析出と同時に析出しためっき金属の溶解が進行するため、見掛け上のめっき皮膜の析出速度が低下し、高速めっきを行うことが困難となる。一方、pHが過度に高い場合には、高電流密度、特に80A/dm程度以上での析出状態が不安定となり、めっき皮膜の外観が劣化する。めっき皮膜の析出速度を低下させることなく外観が良好なめっき皮膜をより安定的に形成する観点から、本めっき液のpHは1.0以上2.0以下とすることが好ましく、1.5±0.3とすることがより好ましく、1.5±0.2とすることが特に好ましい。
(PH)
The pH of the plating solution is 1 or more and 2 or less. When the pH is excessively low, dissolution of the plated metal proceeds simultaneously with the deposition of the plating, so that the apparent deposition rate of the plating film is reduced and it is difficult to perform high-speed plating. On the other hand, when the pH is excessively high, the deposition state at a high current density, particularly about 80 A / dm 2 or more becomes unstable, and the appearance of the plating film deteriorates. From the viewpoint of more stably forming a plating film having a good appearance without reducing the deposition rate of the plating film, the pH of the present plating solution is preferably 1.0 or more and 2.0 or less, and 1.5 ± 0.3 is more preferable, and 1.5 ± 0.2 is particularly preferable.

このように低いpHとすることで、本めっき液が亜鉛合金めっき液である場合には、合金金属に係る金属イオンを安定化させるためのキレート剤などの錯化剤をめっき液に含有させることなく、めっきを行うことが可能となる。すなわち、本めっき液は、pHが1以上2以下であることによって、本めっき液が亜鉛合金めっき液であっても、めっき液の組成を単純化する(具体的には、めっき液の構成成分数を少なくする)ことが達成されている。前述のように、本実施形態に係るめっき装置100は不溶性陽極を採用するため、本めっき液に含まれる成分は電気分解されやすい。この電気分解によって生成した物質がめっき特性(外観など)に悪影響を及ぼす可能性を低減させる観点から、本めっき液はその組成が単純である、すなわち、含有成分種類数が少ないことが好ましい。   When the plating solution is a zinc alloy plating solution, the plating solution contains a complexing agent such as a chelating agent for stabilizing the metal ions related to the alloy metal. In this case, plating can be performed. That is, since the present plating solution has a pH of 1 or more and 2 or less, even if the present plating solution is a zinc alloy plating solution, the composition of the plating solution is simplified (specifically, constituent components of the plating solution). (Reducing the number) has been achieved. As described above, since the plating apparatus 100 according to the present embodiment employs an insoluble anode, the components contained in the plating solution are easily electrolyzed. From the viewpoint of reducing the possibility that the substance generated by this electrolysis will adversely affect the plating characteristics (appearance, etc.), it is preferable that the present plating solution has a simple composition, that is, has a small number of contained components.

なお、本めっき液のpHの調整は公知の酸、アルカリを用いて行えばよい。上記のとおり、めっき液の組成を単純化することが好ましいため、酸は硫酸を用いることが好ましい。   In addition, what is necessary is just to perform adjustment of pH of this plating solution using a well-known acid and an alkali. As described above, since it is preferable to simplify the composition of the plating solution, it is preferable to use sulfuric acid as the acid.

(その他の成分)
前述のように、本実施形態に係るめっき装置100は不溶性陽極を採用するため、本めっき液に含まれる成分は電気分解されやすい。したがって、本めっき液は、上記の成分以外に含有される成分数を可能な限り少なくすることが好ましい。例えば、亜鉛源や金属源は硫酸塩として、本めっき液に含有される金属イオンのカウンターアニオンの種類は硫酸イオンのみとすることが好ましい。また、本めっき液は、酸化防止剤や消泡剤、ポリエチレンイミン以外の有機添加剤、亜鉛合金めっき液の場合にはさらに錯化剤などを含有してもよいが、その含有量は少ないことが好ましく、これらの成分を含有しないことがより好ましい。このようにめっき液に含有される成分数が少ないことは廃液処理の負荷を緩和することにもなるため、めっき液に含有される成分数が少ないことにより廃液処理まで含めた処理コストを低減させることができる。
(Other ingredients)
As described above, since the plating apparatus 100 according to the present embodiment employs an insoluble anode, the components contained in the plating solution are easily electrolyzed. Therefore, it is preferable that the present plating solution reduce the number of components other than the above components as much as possible. For example, it is preferable that the zinc source or the metal source is a sulfate, and the type of metal ion counter anion contained in the plating solution is only a sulfate ion. In addition, this plating solution may contain an antioxidant, an antifoaming agent, an organic additive other than polyethyleneimine, and a complexing agent in the case of a zinc alloy plating solution, but its content should be small. Is preferable, and it is more preferable not to contain these components. As the number of components contained in the plating solution is reduced as described above, the load of the waste solution treatment is also reduced. Therefore, the treatment cost including the waste solution treatment is reduced by reducing the number of components contained in the plating solution. be able to.

(めっき条件)
本めっき液を用いて亜鉛系めっき皮膜を電気めっきにて形成するにあたり、その電流密度は20A/dm以上100A/dm以下の条件とすることが好ましい。電流密度が20A/dm未満の場合には、本実施形態に係るめっき装置100を用いても、析出速度が高まらず、生産性を向上させることが困難となる。一方、電流密度が100A/dm超の場合には、上記のようにポリエチレンイミンの分子量や含有量を調整したり、pHを調整したりしても、優れた外観のめっき皮膜を安定的に形成することが困難となる。
(Plating conditions)
In forming a zinc-based plating film by electroplating using the present plating solution, the current density is preferably set to 20 A / dm 2 or more and 100 A / dm 2 or less. When the current density is less than 20 A / dm 2 , even when the plating apparatus 100 according to the present embodiment is used, the deposition rate does not increase and it is difficult to improve productivity. On the other hand, when the current density exceeds 100 A / dm 2 , a plating film having an excellent appearance can be stably formed even if the molecular weight or content of polyethyleneimine or the pH is adjusted as described above. It becomes difficult to form.

また、本めっき液を用いて亜鉛系めっき皮膜を電気めっきにて形成するにあたり、めっき液の温度は30℃以上50℃以下とすることが好ましい。めっき液の温度が30℃未満の場合には、得られためっき皮膜の残留応力の電流密度依存性が顕著となり、電流密度が高くなるとめっき皮膜にはより強い引張応力が残留しやすくなる。めっき皮膜の残留応力の電流密度依存性をより安定的に低下させ、幅広い電流密度の範囲で特性変化の少ないめっき皮膜を得ることを容易にする観点から、めっき液の温度は35℃以上とすることが好ましい。一方、めっき液温度が50℃超となると、本実施形態に係るめっき装置100を構成する部材が耐熱性を有するものであることが求められるようになり、設備負荷が増大する。なお、めっき皮膜の残留応力は、若干量の圧縮応力であることが、皮膜強度を高める観点から好ましい。そのようなめっき皮膜を得ることを特に望む場合には、めっき温度を40℃±5℃とすることが好ましい。   Moreover, when forming a zinc-type plating film by electroplating using this plating solution, it is preferable that the temperature of a plating solution shall be 30 degreeC or more and 50 degrees C or less. When the temperature of the plating solution is less than 30 ° C., the current density dependence of the residual stress of the obtained plating film becomes remarkable, and when the current density increases, a stronger tensile stress tends to remain in the plating film. From the viewpoint of more stably lowering the current density dependence of the residual stress of the plating film and facilitating obtaining a plating film with little characteristic change in a wide current density range, the temperature of the plating solution is set to 35 ° C. or higher. It is preferable. On the other hand, when the plating solution temperature exceeds 50 ° C., it is required that the members constituting the plating apparatus 100 according to the present embodiment have heat resistance, and the equipment load increases. The residual stress of the plating film is preferably a slight amount of compressive stress from the viewpoint of increasing the film strength. When it is particularly desired to obtain such a plating film, the plating temperature is preferably 40 ° C. ± 5 ° C.

本めっき液を用いた場合には、本実施形態に係るめっき装置100におけるめっき液の流速の条件および軸状ワークの回転条件(以下、「運転条件」という。)を緩和することができる。これらの運転条件が緩和されることにより軸状ワークの表面近傍でめっき液に乱流が発生しにくくなるため、めっきの析出状態が不安定化する現象が生じにくくなる。それゆえ、運転条件が緩和されることによって、軸状ワーク上に形成されるめっき皮膜の品質は低下しにくくなる。   When this plating solution is used, the conditions for the flow rate of the plating solution and the rotation condition of the shaft-like workpiece (hereinafter referred to as “operating conditions”) in the plating apparatus 100 according to this embodiment can be relaxed. By relaxing these operating conditions, turbulent flow is less likely to occur in the plating solution in the vicinity of the surface of the shaft-like workpiece, so that the phenomenon that the deposition state of plating becomes unstable is less likely to occur. Therefore, when the operating conditions are relaxed, the quality of the plating film formed on the shaft-like workpiece is not easily lowered.

また、運転条件が緩和されることにより、次に説明するように、めっき処理のイニシャルコストおよびランニングコストが低減される。第一に、めっき装置100を構成する部品(ポンプ、モータなど)の仕様を特に高める必要がなくなるため、装置の製造コストを抑えることができる。第二に、運転条件の緩和に伴い装置の運転に要する電力が少なくなるため、軸状ワークにめっき皮膜を形成するのに要するコストも少なくなる。第三に、運転条件が緩和されることにより装置の耐久性が向上する。   In addition, by reducing the operating conditions, the initial cost and the running cost of the plating process are reduced as described below. First, since it is not necessary to particularly increase the specifications of components (pump, motor, etc.) constituting the plating apparatus 100, the manufacturing cost of the apparatus can be suppressed. Secondly, since the power required for operating the apparatus is reduced with the relaxation of the operating conditions, the cost required for forming the plating film on the shaft-like workpiece is also reduced. Third, the durability of the device is improved by reducing the operating conditions.

(めっき皮膜の特性)
本実施形態に係るめっき装置100および本めっき液を用いて、上記の好ましい条件で電気めっきを行うと、半光沢のめっき皮膜を幅広い電流密度の範囲で得ることができる。めっき皮膜が半光沢である場合には、光沢を有する被めっき部材上にめっき皮膜が形成されたことを目視で容易に確認できるため、好ましい。また、前述のように、めっき温度を適切な範囲とすることで、めっき皮膜の残留応力の絶対値を小さくすることができる。残留応力の絶対値が大きい場合、特に強い引張応力が残留している場合には、めっき皮膜が剥離しやすくなったり、めっき皮膜の応力腐食が生じやすくなったりする。
(Characteristics of plating film)
When electroplating is performed using the plating apparatus 100 and the present plating solution according to the present embodiment under the above-described preferable conditions, a semi-gloss plating film can be obtained in a wide current density range. When the plating film is semi-glossy, it is preferable because it can be easily confirmed visually that the plating film is formed on the member to be plated having gloss. Further, as described above, the absolute value of the residual stress of the plating film can be reduced by setting the plating temperature within an appropriate range. When the absolute value of the residual stress is large, particularly when a strong tensile stress remains, the plating film is easily peeled off or stress corrosion of the plating film is likely to occur.

以上説明しためっき装置100を用いて、軸状ワーク8に対してめっき処理を行った結果を以下に示す。   The result of plating the shaft-like workpiece 8 using the plating apparatus 100 described above is shown below.

(実施例1)
全体がチタンからなり内径50mm接液部の長さ300mmの管状部材の内部に、図2に示す形状を有する軸状ワーク(有効処理面積1.22dm)を、支持部材を用いて保持した。このとき、図2におけるAの範囲(長さ200mm)が管状部材の内面にある不溶性陽極に対向するように軸状ワークは配置された。
Example 1
A shaft-like workpiece (effective treatment area 1.22 dm 2 ) having the shape shown in FIG. 2 was held inside the tubular member made entirely of titanium and having a diameter of 50 mm and a wetted part of 300 mm in length using a support member. At this time, the shaft-like workpiece was disposed so that the range A (length: 200 mm) in FIG. 2 was opposed to the insoluble anode on the inner surface of the tubular member.

めっき槽に15Lのめっき液を満たし、液温を45℃に維持した。めっき液の組成は次のとおりであった。
水溶性亜鉛含有物質の亜鉛換算含有量:100g/L(亜鉛源:硫酸亜鉛)
硫酸アンモニウム:30g/L
ポリエチレンイミン(分子量7000):0.5g/L
溶媒:水
pH:2.5
The plating tank was filled with 15 L of plating solution, and the solution temperature was maintained at 45 ° C. The composition of the plating solution was as follows.
Zinc content of water-soluble zinc-containing material: 100 g / L (zinc source: zinc sulfate)
Ammonium sulfate: 30 g / L
Polyethyleneimine (molecular weight 7000): 0.5 g / L
Solvent: water pH: 2.5

開口する管状部材の下端の下方に配置される吐出口から管状部材内部へとめっき槽内のめっき液を、ポンプを用いて噴流させ、管状部材の内部に1m/秒のめっき液流を発生させた。管状部材の上端の開口から噴出しためっき液流は、遮蔽部材をも兼ねる支持部材に衝突し、支持部材と管状部材の上端との間に設けられた隙間を排出構造として管状部材の外側面へと流れ出し、この外側面を含むように配置されるクッションタンク(容量15L)内に収納された。クッションタンクの下面に設けられたドレインからめっき槽へとクッションタンク内のめっき液を流出させた。こうして、めっき槽、ポンプ、吐出口、管状部材内部、排出構造、クッションタンク、めっき槽の経路でめっき液を循環させた。この循環中のめっき液温は45℃に管理された。   The plating solution in the plating tank is jetted into the tubular member from the discharge port arranged below the lower end of the opening tubular member by using a pump to generate a plating solution flow of 1 m / second inside the tubular member. It was. The plating solution flow spouted from the opening at the upper end of the tubular member collides with the supporting member that also serves as a shielding member, and the gap provided between the supporting member and the upper end of the tubular member serves as a discharge structure toward the outer surface of the tubular member. And was stored in a cushion tank (capacity 15 L) arranged to include this outer surface. The plating solution in the cushion tank was allowed to flow out from the drain provided on the lower surface of the cushion tank to the plating tank. In this way, the plating solution was circulated through the path of the plating tank, pump, discharge port, tubular member, discharge structure, cushion tank, and plating tank. The temperature of the plating solution during the circulation was controlled at 45 ° C.

支持部材の上方に設けられた回転機構により軸状ワークを180rpm(めっき液と接する部分における最大の線速は170mm/s)で回転させるとともに、支持部材の上方に設けられた回転電極を通じて軸状ワークに電圧を印加可能とした。   The shaft-like work is rotated at 180 rpm (the maximum linear velocity at the portion in contact with the plating solution is 170 mm / s) by the rotation mechanism provided above the support member, and the shaft-like work is rotated through the rotation electrode provided above the support member. A voltage can be applied to the workpiece.

この状態で、軸状ワークからなるカソードと管状部材からなるアノードとの間の電流を、カソードにおける電流密度が60A/dmとなるように設定して、30秒間めっき処理を行った。 In this state, the plating process was performed for 30 seconds by setting the current between the cathode made of the axial workpiece and the anode made of the tubular member so that the current density at the cathode was 60 A / dm 2 .

めっき処理終了後の軸状ワークを取り出し、胴部分、くびれ部分、ならびにねじ部分のねじ山およびねじ谷におけるめっき厚を計測した。また、胴部分およびくびれ部分については、周方向にめっき厚を測定し、平均めっき厚に対するめっき厚のばらつき幅の比率((最大めっき厚−最小めっき厚)/平均めっき厚)を求めた。
得られためっき厚に関する測定結果を表1に示す。
The shaft-like workpiece after the completion of the plating treatment was taken out, and the plating thickness at the body portion, the constricted portion, and the thread and valley of the threaded portion was measured. Moreover, about the trunk | drum part and the constriction part, the plating thickness was measured in the circumferential direction, and the ratio ((maximum plating thickness-minimum plating thickness) / average plating thickness) of the variation width of the plating thickness to the average plating thickness was obtained.
Table 1 shows the measurement results regarding the obtained plating thickness.

(実施例2)
実施例1におけるめっき液を次の組成に変更した以外は実施例1と同様の作業を軸状ワークに対して行い、得られた軸状ワークのめっき厚を測定した。
水溶性亜鉛含有物質の亜鉛換算含有量:100g/L(亜鉛源:塩化亜鉛)
ユケン工業(株)製 メタスMZ−996A1:60ml/L
溶媒:水
得られためっき厚に関する測定結果を表1に示す。
(Example 2)
Except for changing the plating solution in Example 1 to the following composition, the same operation as in Example 1 was performed on the shaft-shaped workpiece, and the plating thickness of the obtained shaft-shaped workpiece was measured.
Zinc content of water-soluble zinc-containing substances: 100 g / L (zinc source: zinc chloride)
YUKEN INDUSTRY CO., LTD. METASU MZ-996A1: 60ml / L
Solvent: Water Table 1 shows the measurement results regarding the obtained plating thickness.

比較例1
実施例1において軸状ワークを回転させなかったこと以外は実施例1と同様の作業を軸状ワークに対して行い、得られた軸状ワークのめっき厚を測定した。
得られためっき厚に関する測定結果を表1に示す。
( Comparative Example 1 )
Except that the shaft-shaped workpiece was not rotated in Example 1, the same operation as in Example 1 was performed on the shaft-shaped workpiece, and the plating thickness of the obtained shaft-shaped workpiece was measured.
Table 1 shows the measurement results regarding the obtained plating thickness.

(実施例4)
実施例1において軸状ワークを回転させなかったこと以外は実施例1と同様の作業を軸状ワークに対して行い、得られた軸状ワークのめっき厚を測定した。
得られためっき厚に関する測定結果を表1に示す。
Example 4
Except that the shaft-shaped workpiece was not rotated in Example 1, the same operation as in Example 1 was performed on the shaft-shaped workpiece, and the plating thickness of the obtained shaft-shaped workpiece was measured.
Table 1 shows the measurement results regarding the obtained plating thickness.

(実施例5)
全体がチタンからなり内径50mm接液部の長さ300mmの管状部材の内部に、図2に示す形状を有する軸状ワーク(有効処理面積1.22dm)を、支持部材を用いて保持した。このとき、図2におけるAの範囲(長さ200mm)が管状部材の内面にある不溶性陽極に対向するように軸状ワークは配置された。
(Example 5)
A shaft-like workpiece (effective treatment area 1.22 dm 2 ) having the shape shown in FIG. 2 was held inside the tubular member made entirely of titanium and having a diameter of 50 mm and a wetted part of 300 mm in length using a support member. At this time, the shaft-like workpiece was disposed so that the range A (length: 200 mm) in FIG. 2 was opposed to the insoluble anode on the inner surface of the tubular member.

めっき槽に15Lのめっき液を満たし、液温を40℃に維持した。めっき液の組成は次のとおりであった。
水溶性亜鉛含有物質の亜鉛換算含有量:85g/L(亜鉛源:硫酸亜鉛)
ポリエチレンイミン(分子量2000):1g/L
溶媒:水
pH:1.5
The plating tank was filled with 15 L of plating solution, and the solution temperature was maintained at 40 ° C. The composition of the plating solution was as follows.
Zinc content of water-soluble zinc-containing substances: 85 g / L (zinc source: zinc sulfate)
Polyethyleneimine (molecular weight 2000): 1 g / L
Solvent: water pH: 1.5

開口する管状部材の下端の下方に配置される吐出口から管状部材内部へとめっき槽内のめっき液を、ポンプを用いて噴流させ、管状部材の内部に0.13m/秒のめっき液流を発生させた。管状部材の上端の開口から噴出しためっき液流は、遮蔽部材をも兼ねる支持部材に衝突し、支持部材と管状部材の上端との間に設けられた隙間を排出構造として管状部材の外側面へと流れ出し、この外側面を含むように配置されるクッションタンク(容量15L)内に収納された。クッションタンクの下面に設けられたドレインからめっき槽へとクッションタンク内のめっき液を流出させた。こうして、めっき槽、ポンプ、吐出口、管状部材内部、排出構造、クッションタンク、めっき槽の経路でめっき液を循環させた。この循環中のめっき液温は40℃に管理された。   The plating solution in the plating tank is jetted into the tubular member from the discharge port arranged below the lower end of the opening tubular member using a pump, and a plating solution flow of 0.13 m / sec is made inside the tubular member. Generated. The plating solution flow spouted from the opening at the upper end of the tubular member collides with the supporting member that also serves as a shielding member, and the gap provided between the supporting member and the upper end of the tubular member serves as a discharge structure toward the outer surface of the tubular member. And was stored in a cushion tank (capacity 15 L) arranged to include this outer surface. The plating solution in the cushion tank was allowed to flow out from the drain provided on the lower surface of the cushion tank to the plating tank. In this way, the plating solution was circulated through the path of the plating tank, pump, discharge port, tubular member, discharge structure, cushion tank, and plating tank. The temperature of the plating solution during the circulation was controlled at 40 ° C.

支持部材の上方に設けられた回転機構により軸状ワークを20rpm(めっき液と接する部分における最大の線速は20mm/s)で回転させるとともに、支持部材の上方に設けられた回転電極を通じて軸状ワークに電圧を印加可能とした。   The shaft-like workpiece is rotated at 20 rpm (the maximum linear velocity at the portion in contact with the plating solution is 20 mm / s) by the rotation mechanism provided above the support member, and the shaft-like work is rotated through the rotation electrode provided above the support member. A voltage can be applied to the workpiece.

この状態で、軸状ワークからなるカソードと管状部材からなるアノードとの間の電流を、カソードにおける電流密度が60A/dmとなるように設定して、30秒間めっき処理を行った。
以下、実施例1と同様にめっき厚さの測定を行った。得られためっき厚に関する測定結果を表1に示す。
In this state, the plating process was performed for 30 seconds by setting the current between the cathode made of the axial workpiece and the anode made of the tubular member so that the current density at the cathode was 60 A / dm 2 .
Thereafter, the plating thickness was measured in the same manner as in Example 1. Table 1 shows the measurement results regarding the obtained plating thickness.

Figure 0005467374
Figure 0005467374

(実施例6)
実施例5において調製しためっき液を基準として、ポリエチレンイミンの分子量(重量平均分子量)およびpHが異なるめっき液6−1〜6−8を用意した。なお、めっき液6−1は実施例5において調製しためっき液と同一の組成を有しているものであった。
スターラー回転数500rpmの液循環型ハルセル試験器(山本鍍金試験器社製:スマートハルセルB−53−SM)を用意した。この試験器のめっき槽内の所定の位置に、縦64mm、横64mm、厚さ1mmのアノードとしてのチタン−白金クラッド、および縦67mm、横100mm、厚さ0.2mmの被めっき部材(カソード)としての銅板を配置した。めっき槽内に上記のめっき液6−1〜6−8のそれぞれを液面が所定の高さとなるまで入れた。アノードおよびカソードをめっき電源に接続し、次の条件で電気めっきを行って、亜鉛めっき皮膜を有する亜鉛系めっき部材を得た。
電流:20A
通電時間:10秒間
めっき浴温度:40℃
上記の電流では、カソードの有効範囲の電流密度は100A/dmから10A/dmの範囲であった。
(Example 6)
Based on the plating solution prepared in Example 5, plating solutions 6-1 to 6-8 having different molecular weight (weight average molecular weight) and pH of polyethyleneimine were prepared. The plating solution 6-1 had the same composition as the plating solution prepared in Example 5.
A liquid circulation type hull cell tester (manufactured by Yamamoto Metal Tester Co., Ltd .: Smart Hull Cell B-53-SM) having a stirrer rotation speed of 500 rpm was prepared. Titanium-platinum clad as an anode having a length of 64 mm, a width of 64 mm, and a thickness of 1 mm, and a member to be plated (cathode) of 67 mm, a width of 100 mm, and a thickness of 0.2 mm at predetermined positions in the plating tank of this tester As a copper plate. Each of the plating solutions 6-1 to 6-8 was placed in the plating tank until the liquid level reached a predetermined height. The anode and cathode were connected to a plating power source, and electroplating was performed under the following conditions to obtain a zinc-based plated member having a zinc plating film.
Current: 20A
Energizing time: 10 seconds Plating bath temperature: 40 ° C
In the above current, the current density of the cathode scope ranged from 100A / dm 2 of 10A / dm 2.

得られた亜鉛系めっき部材における、電流密度が100A/dmの位置のめっき皮膜の析出状態を観察した。また、その位置から電流密度が10A/dmずつ減少した位置(最終評価位置における電流密度:10A/dm)におけるめっき皮膜の析出状態を観察した。観察結果は次の基準で評価した。
1:異常析出や異物付着が認められず、めっき皮膜は良好な外観であった
2:異常析出や異物付着は認められないが、めっき皮膜の光沢が過剰であって、めっき皮膜の形成を確認しにくい
3:異常析出や異物付着が認められ、めっき皮膜の外観が不良であった
評価結果を表2に示す。
In the obtained zinc-based plated member, the deposition state of the plating film at a position where the current density was 100 A / dm 2 was observed. Moreover, the deposition state of the plating film was observed at a position where the current density decreased by 10 A / dm 2 from that position (current density at the final evaluation position: 10 A / dm 2 ). The observation results were evaluated according to the following criteria.
1: Abnormal precipitation or adhesion of foreign matter was not observed, and the plating film had a good appearance 2: Abnormal precipitation or adhesion of foreign matter was not observed, but the plating film was excessively glossy, confirming the formation of the plating film Hard to resist 3: Abnormal precipitation and adhesion of foreign matter were observed, and the appearance of the plating film was poor.

Figure 0005467374
Figure 0005467374

(実施例7)
実施例6において調製しためっき液6−1から6−4のそれぞれに対して、水溶性鉄含有物質の鉄換算含有量が1.3g/Lとなるように、FeSO・7HOからなる鉄源がさらに添加されてなるめっき液7−1から7−4を調製した。
これらのめっき液7−1から7−4を用いて実施例6と同様の操作にて電気めっきを行い、亜鉛−鉄合金めっき皮膜を有する亜鉛系めっき部材を得た。
この亜鉛系めっき部材に対して、実施例6と同様の評価を行った。評価結果を表3に示す。
(Example 7)
For each of the plating solutions 6-1 to 6-4 prepared in Example 6, FeSO 4 · 7H 2 O is formed so that the iron equivalent content of the water-soluble iron-containing substance is 1.3 g / L. Plating solutions 7-1 to 7-4 to which an iron source was further added were prepared.
Using these plating solutions 7-1 to 7-4, electroplating was performed in the same manner as in Example 6 to obtain a zinc-based plated member having a zinc-iron alloy plating film.
Evaluation similar to Example 6 was performed with respect to this zinc-based plating member. The evaluation results are shown in Table 3.

Figure 0005467374
Figure 0005467374

(実施例8)
実施例6において調製しためっき液6−1から6−4のそれぞれに対して、水溶性ニッケル含有物質の鉄換算含有量が15g/Lとなるように、NiSO・6HOからなるニッケル源がさらに添加されてなるめっき液8−1から8−4を調製した。
これらのめっき液8−1から8−4を用いて実施例6と同様の操作にて電気めっきを行い、亜鉛−ニッケル合金めっき皮膜を有する亜鉛系めっき部材を得た。
この亜鉛系めっき部材に対して、実施例6と同様の評価を行った。評価結果を表4に示す。
(Example 8)
A nickel source composed of NiSO 4 .6H 2 O so that the iron equivalent content of the water-soluble nickel-containing substance is 15 g / L for each of the plating solutions 6-1 to 6-4 prepared in Example 6. Were further added to the plating solutions 8-1 to 8-4.
Using these plating solutions 8-1 to 8-4, electroplating was performed in the same manner as in Example 6 to obtain a zinc-based plated member having a zinc-nickel alloy plating film.
Evaluation similar to Example 6 was performed with respect to this zinc-based plating member. The evaluation results are shown in Table 4.

Figure 0005467374
Figure 0005467374

(実施例9)
実施例5において調製しためっき液を用いて、めっき条件を次のとおり変化させて電気めっきを行い、めっき皮膜応力測定装置(山本鍍金試験器社製:Plate Laboratory ST)の測定面(8×25mmの角状歪みゲージ付き銅板)上に亜鉛めっき皮膜を形成した。
めっき温度:20℃、30℃、35℃、40℃、45℃、50℃
電流密度:10A/dmから50A/dmまで10A/dm
めっき時間:15秒間
めっき液の攪拌条件:スターラー回転数 500rpm
測定面上のめっき皮膜の残留応力を測定した結果を表5に示す。なお、表5では、めっき皮膜の残留応力が引張応力であった場合に正の値とし、圧縮応力であった場合に負の値として示した。
Example 9
Using the plating solution prepared in Example 5, electroplating was performed while changing the plating conditions as follows, and the measurement surface (8 × 25 mm) of a plating film stress measuring apparatus (manufactured by Yamamoto Kakin Tester Co., Ltd .: Plate Laboratory ST) A galvanized film was formed on a copper plate with a square strain gauge.
Plating temperature: 20 ° C, 30 ° C, 35 ° C, 40 ° C, 45 ° C, 50 ° C
Current density: 10A / dm 2 from 50A / dm 2 to 10A / dm 2 per Plating time: 15 seconds plating solution stirring at: stirrer rotation speed 500rpm
Table 5 shows the results of measuring the residual stress of the plating film on the measurement surface. In Table 5, a positive value was shown when the residual stress of the plating film was a tensile stress, and a negative value was shown when it was a compressive stress.

Figure 0005467374
Figure 0005467374

Claims (6)

軸体上に電気めっき皮膜を形成するための装置(パルスめっきする装置である場合を除く。)であって、
被めっき部材である軸体におけるめっき皮膜が形成されるべき部分を内包し両端部が鉛直方向に開口する中空部を有する管状の管状部材、
前記中空部の鉛直方向上側端部の開口の上方に設けられ前記軸体を前記中空部内に保持する支持手段、
前記中空部の鉛直方向下側端部の開口から前記中空部内にめっき液を供給するめっき液噴流手段、
前記中空部の鉛直方向上側端部の開口近傍に設けられ前記めっき液噴流手段により前記中空部内に供給されためっき液を前記管状部材外に排出可能にする排出構造、および
前記排出構造を通じて前記管状部材から排出されためっき液を前記めっき液噴流手段に供給する環送手段を備え、
前記支持手段は前記軸体と電気的に接続可能な接点部を備え、前記管状部材はその中空部に不溶性陽極を備え
前記支持手段は、前記接点部における前記軸体との電気的接続を維持しつつ前記軸体の軸周りの回転を可能とする回転機構を有し、この回転機構により、前記軸体を、前記軸体の表面の線速が10mm/秒以上となるように回転させながらめっき皮膜を形成することが可能とされる、軸体上に電気めっき皮膜を形成するための装置。
A device for forming an electroplating film on a shaft body (except for a device for pulse plating),
A tubular member having a hollow portion including a portion where a plating film is to be formed in the shaft body which is a member to be plated and having both ends opened in the vertical direction;
A support means provided above the opening of the vertical upper end of the hollow portion to hold the shaft body in the hollow portion;
A plating solution jet means for supplying a plating solution into the hollow portion from the opening at the lower end in the vertical direction of the hollow portion;
A discharge structure that is provided in the vicinity of the opening at the upper end in the vertical direction of the hollow portion and that allows the plating solution supplied into the hollow portion by the plating solution jetting means to be discharged out of the tubular member, and the tubular through the discharge structure A circulating means for supplying the plating solution discharged from the member to the plating solution jet means;
The support means includes a contact portion that can be electrically connected to the shaft body, and the tubular member includes an insoluble anode in a hollow portion thereof .
The support means includes a rotation mechanism that enables rotation around the axis of the shaft body while maintaining electrical connection with the shaft body at the contact portion, and the rotation mechanism allows the shaft body to be linear speed of the surface of the shaft body Ru is possible to form the plating film while rotating such that the 10 mm / sec or more, an apparatus for forming an electroplated coating on the shaft.
鉛直方向の両端に開口を有する中空部を備える管状の管状部材の前記中空部の内面に設けられた不溶性陽極と、被めっき部材である軸体を前記管状部材の中空部内に保持する支持手段が備えるものであって前記軸体との電気的接続を可能とする接点部との間に電圧を印加して前記軸体上にめっき皮膜を形成する方法(パルスめっきする方法を除く。)であって、
前記中空部の鉛直方向下側端部の開口から前記中空部内にめっき液を供給するめっき液噴流手段、前記中空部の鉛直方向上側端部の開口近傍に設けられ前記めっき液噴流手段により前記中空部内に供給されためっき液を前記管状部材外に排出可能にする排出構造、および前記排出構造を通じて前記管状部材から排出されためっき液を前記めっき液噴流手段に供給する環送手段により、前記中空部内にめっき液を電気めっき中に継続的に供給することが可能とされ
前記支持手段に設けられた、前記接点部における前記軸体との電気的接点を維持しつつ前記軸体の軸周りの回転を可能とする回転機構により、前記軸体を、前記軸体の表面の線速が10mm/秒以上となるように回転させながら前記軸体上にめっき皮膜を形成することが可能とされる、
めっき皮膜を有する軸体の製造方法。
An insoluble anode provided on the inner surface of the hollow tubular member having hollow portions having openings at both ends in the vertical direction, and a supporting means for holding the shaft body to be plated in the hollow portion of the tubular member. A method of forming a plating film on the shaft body by applying a voltage between the shaft portion and a contact portion that enables electrical connection with the shaft body (excluding a method of pulse plating). And
A plating solution jet means for supplying a plating solution into the hollow portion from the opening at the lower end in the vertical direction of the hollow portion, and the hollow by the plating solution jet means provided in the vicinity of the opening at the upper end portion in the vertical direction of the hollow portion. The discharge structure that allows the plating solution supplied in the section to be discharged out of the tubular member, and the circulating means that supplies the plating solution discharged from the tubular member through the discharge structure to the plating solution jet means, the hollow It is possible to continuously supply the plating solution into the part during electroplating ,
The shaft body is provided on the surface of the shaft body by a rotation mechanism provided on the support means and capable of rotating around the axis of the shaft body while maintaining an electrical contact with the shaft body at the contact portion. the linear velocity of Ru is possible to form a plating film on the shaft on the body while rotating such that the 10 mm / sec or more,
A manufacturing method of a shaft having a plating film.
前記めっき液は、水溶性亜鉛含有物質およびポリエチレンイミンを含有する硫酸亜鉛系めっき液であって、
前記水溶性亜鉛含有物質の含有量は亜鉛換算で70g/L以上100g/L以下であり、
前記ポリエチレンイミンは、重量平均分子量が1500以上2500以下であって、その含有量は0.1g/L以上10g/Lであり、
前記めっき液のpHは1以上2以下であって、
めっき温度が30℃以上50℃以下、かつ電流密度が20A/dm以上100A/dm以下の条件で電気めっきが行われる、請求項2に記載の製造方法。
The plating solution is a zinc sulfate-based plating solution containing a water-soluble zinc-containing substance and polyethyleneimine,
The content of the water-soluble zinc-containing substance is 70 g / L or more and 100 g / L or less in terms of zinc,
The polyethyleneimine has a weight average molecular weight of 1500 or more and 2500 or less, and its content is 0.1 g / L or more and 10 g / L,
The plating solution has a pH of 1 or more and 2 or less,
Plating temperature is 30 ° C. or higher 50 ° C. or less, and a current density of 20A / dm 2 or more 100A / dm electroplating 2 under the following conditions takes place, a manufacturing method of claim 2.
前記めっき液は、水溶性金属含有物質をさらに含有し、
当該水溶性金属含有物質に含まれる金属元素は鉄、ニッケルからなる群から選ばれる一種または二種以上である、請求項3に記載の製造方法。
The plating solution further contains a water-soluble metal-containing substance,
The manufacturing method according to claim 3 , wherein the metal element contained in the water-soluble metal-containing material is one or more selected from the group consisting of iron and nickel.
請求項1に記載される装置を用い、めっき温度が30℃以上50℃以下かつ電流密度が20A/dm以上100A/dm以下の条件で電気めっきを行って軸体上に亜鉛系めっき皮膜を形成するためのめっき液であって、
前記めっき液は、水溶性亜鉛含有物質およびポリエチレンイミンを含有する硫酸亜鉛系めっき液であって、
前記水溶性亜鉛含有物質の含有量は亜鉛換算で70g/L以上100g/L以下であり、
前記ポリエチレンイミンは、重量平均分子量が1500以上2500以下であって、その含有量は0.1g/L以上10g/Lであり、
前記めっき液のpHは1以上2以下であること
を特徴とするめっき液。
A zinc-based plating film is formed on the shaft body by performing electroplating using the apparatus according to claim 1 under the conditions of a plating temperature of 30 ° C. or more and 50 ° C. or less and a current density of 20 A / dm 2 or more and 100 A / dm 2 or less. A plating solution for forming
The plating solution is a zinc sulfate-based plating solution containing a water-soluble zinc-containing substance and polyethyleneimine,
The content of the water-soluble zinc-containing substance is 70 g / L or more and 100 g / L or less in terms of zinc,
The polyethyleneimine has a weight average molecular weight of 1500 or more and 2500 or less, and its content is 0.1 g / L or more and 10 g / L,
The plating solution has a pH of 1 or more and 2 or less.
前記めっき液は、水溶性金属含有物質をさらに含有し、
当該水溶性金属含有物質に含まれる金属元素は鉄およびニッケルからなる群から選ばれる一種または二種以上である、請求項5に記載のめっき液。
The plating solution further contains a water-soluble metal-containing substance,
The plating solution according to claim 5 , wherein the metal element contained in the water-soluble metal-containing material is one or more selected from the group consisting of iron and nickel.
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