TWI825543B - Gas nozzle with controllable air flow distribution - Google Patents

Abstract

A gas nozzle with controllable gas flow distribution, which is installed in the cavity of a thin film deposition device and includes: a first layer panel with a plurality of first gas supply holes distributed according to a first rule; a second layer panel with a seat It is adjacent to the first layer panel and has a plurality of second gas supply holes distributed according to a second regular pattern. The first law is different from the second law, and one of the first layer panel and the second layer panel can rotate at least a certain angle relative to the other, so that the two can have different first positions and third layers relative to each other. Two positions. In the first position, all the first gas supply holes are not covered by the second layer panel; in the second position, part of the first gas supply holes are aligned with the respective second gas supply holes, and the other part is covered by the second layer panel. Floor panel covering.

Description

Gas nozzle with controllable air flow distribution

The present application relates generally to the field of semiconductor wafer and substrate processing, and more particularly to a gas nozzle for injecting gas onto a wafer or substrate in a semiconductor processing chamber.

A wafer or substrate is the base used for fabricating semiconductor devices. In order to prepare semiconductor devices (such as integrated circuits, semiconductor light-emitting devices, etc.), wafers or substrates need to be placed in a semiconductor processing chamber for heating and deposition processes (such as chemical vapor deposition (CVD), plasma enhanced chemistry, etc.) Vapor deposition (PECVD, etc.) to deposit thin films on the surface of wafers or substrates. In order to deposit a thin film on the surface of a wafer, a gas nozzle located in a semiconductor processing chamber needs to be used to spray source gas and reaction gas onto the wafer surface.

In the thin film deposition apparatus of the prior art, the number and distribution of the through holes of the gas nozzle for injecting the source gas and the reaction gas are fixed and cannot be adjusted. The disadvantages of this kind of gas nozzle are: on the one hand, it cannot meet the different injection requirements (for example, different injection speeds, injection flow rates, etc.) in different thin film deposition processes. With the development of semiconductor devices, the required thin film deposition processes have become increasingly diversified, and accordingly there are various jetting requirements. This type of nozzle in the prior art limits the application scope of itself and even the entire thin film deposition device. On the other hand, this type of gas nozzle cannot adjust the distribution of through holes, so it is not conducive to improving the uniformity of the deposited film. Specifically, the requirements for thin film uniformity in newly developed thin film processes are becoming increasingly high, and developing a large number of simulation and experimental processes for new processes requires considerable costs. The structure of prior art nozzles has limitations in developing new thin film deposition processes.

Therefore, it is necessary to improve the nozzles in the prior art to solve the above technical problems.

The purpose of this application is to solve at least one of the problems in the above-mentioned prior art, thereby providing a gas nozzle with controllable gas flow distribution: it can adjust the gas flow distribution and gas flow rate, which not only helps to meet the spraying needs of different thin film deposition processes , and also helps to improve the uniformity of the deposited thin film, so it is suitable for developing new thin film deposition processes and reducing the cost of new thin film deposition processes.

According to an embodiment of the present application, a gas nozzle with controllable gas flow distribution is provided in a cavity of a thin film deposition device, and includes: a first layer panel with a plurality of first gases distributed according to a first rule. Supply holes; a second layer panel, which is seated against the first layer panel and has a plurality of second gas supply holes distributed according to a second regularity. Wherein: the first rule is different from the second rule, and one of the first layer panel and the second layer panel can rotate at least a certain angle relative to the other, so that the two can rotate relative to the other. have different first and second positions; and wherein, in the first position, all the first gas supply holes are not covered by the second layer panel; in the second position, all the first gas supply holes are not covered by the second layer panel; A part of the first gas supply holes is aligned with the corresponding second gas supply hole, and another part is covered by the second layer panel.

Preferably, in the above embodiment, the first layer panel is fixed, and the second layer panel can be driven to rotate by at least a certain angle by the first rotating device. For example, the second layer panel can be rotated by 3° to 10° relative to the first layer panel.

As an implementation of the above embodiment, the first rotating device is adjacent to the edge of the second layer panel and includes a rotating column that can be driven to rotate and a control column that is fixedly connected to or integrally formed with the rotating column; The second layer panel is formed with an elongated slot that cooperates with the control column, so that when the rotating column is driven to rotate, the control column that cooperates with the elongated slot drives the second layer panel to rotate.

Preferably, the second layer panel has lugs extending outward from its edge, and the elongated groove is formed in the lugs.

Preferably, the first layer panel also has an annular peripheral wall extending upward from its edge, and a first recess that opens inward is formed on the inside of the annular peripheral wall. The rotating column, the control column and the convex The ears are located in the first notch.

Preferably, the width of the first notch is greater than the width of the lug, so that the second layer panel can rotate 3° to 5° relative to the first layer panel.

As an implementation of the above embodiment, the first rotating device is adjacent to the edge of the second layer panel and includes a gear; the edge of the second layer panel has a plurality of teeth meshing with the gear, so that when When the gear is driven to rotate, the teeth drive the second layer panel to rotate.

Preferably, a plurality of wavy concave and convex parts are formed on the upper surface of the first layer panel, and the second layer panel is correspondingly provided with rollers that can roll on the concave and convex parts, so that when the third layer is When the first layer of panels and the second layer of panels rotate relative to each other, the rollers roll on the concave and convex portions.

Preferably, when the first layer panel and the second layer panel are located in the first position and the second position relative to each other, the roller is located in two different valleys of the concave and convex portion. The lower surface of the second layer panel is attached to the upper surface of the first layer panel.

As a preferred embodiment, the above-mentioned gas nozzle also includes a third layer panel seated against the second layer panel, and the third layer panel has a plurality of third gas supply holes distributed according to a third rule. The third law is different from the first law and the second law.

Preferably, the third layer panel can be driven to rotate by at least a certain angle by the second rotation device. For example, the third layer panel can be rotated by 3° to 10° relative to the first layer panel.

In one embodiment, the second rotating device is adjacent to the edge of the third layer panel and includes a rotating column that can be driven to rotate and a control column that is fixedly connected to or integrally formed with the rotating column; the third rotating device An elongated slot that cooperates with the control column is formed on the layer panel, so that when the rotating column is driven to rotate, the control column that cooperates with the elongated slot drives the third layer panel to rotate.

In the above embodiment, the third layer panel has lugs extending outward from its edge, and the elongated groove is formed in the lugs.

Preferably, the first layer panel also has an annular peripheral wall extending upward from its edge, and a second recess that opens inward is formed on the inside of the annular peripheral wall. The rotating column, the control column and the convex The ears are located in the second notch.

Preferably, the width of the second notch is greater than the width of the lug, so that the third layer panel can rotate 3° to 5° relative to the first layer panel.

In another embodiment, the second rotating device is adjacent to an edge of the third layer panel and includes a gear; the edge of the third layer panel has a plurality of teeth meshing with the gear, so that when the gear When driven to rotate, the teeth drive the third layer panel to rotate.

Preferably, a plurality of wavy concave and convex portions are formed on the lower surface of the third layer panel, and the second layer panel is correspondingly provided with rollers that can roll on the concave and convex portions, so that when the third layer panel When the three-layer panel rotates relative to the second layer panel, the roller rolls on the concave and convex portion.

In the above embodiment, the concave-convex portion has at least two different troughs, and when the roller is located in the trough of the concave-convex portion, the lower surface of the third layer panel and the upper surface of the second layer panel The surfaces fit together.

Preferably, the first layer panel, the second layer panel and the third layer panel are all generally disk-shaped, and the three are arranged concentrically.

Preferably, the first layer panel also has an annular peripheral wall extending upward from its edge, thereby forming a cavity in the middle of the first layer panel, and the second layer panel and the third layer panel are both located inside the cavity.

Preferably, a plurality of rollers are provided inside the annular peripheral wall, and the plurality of rollers protrude from the inner surface of the annular peripheral wall and are in contact with the edges of the second layer panel and the third layer panel. fit to provide positioning.

The gas nozzle with controllable airflow distribution provided by this application can produce the following excellent technical effects:

Since the gas nozzle includes more than two layers of panels that can rotate relative to each other, and the through holes on each layer panel are distributed in different patterns, the panels on each layer can be rotated to different positions relative to each other. The holes form different combinations (for example, at a certain position, all the holes on the bottom panel (i.e., the panel close to the wafer) are in a through state (i.e., not blocked), and at another position, the bottom panel Some of the through holes above are blocked, and only the remaining through holes are open).

Therefore, when each layer of panels is in a different position relative to each other, different through holes are in a penetrating state. In this way, the gas nozzle can adjust the gas flow distribution and gas flow rate, which not only helps to meet the spraying needs of different thin film deposition processes, but also helps to improve the uniformity of the deposited thin films, and is therefore suitable for the development of new thin film deposition processes and reduces the cost of Research and development costs for new thin film deposition processes.

The embodiments of the present application will be described in detail below with reference to the accompanying drawings. It is easier to understand various aspects of the present application by reading the description of the following specific embodiments with reference to the accompanying drawings. It should be noted that these embodiments are only illustrative, and are only used to explain and illustrate the technical solution of the present application, but are not intended to limit the present application. Those skilled in the art can make various modifications and transformations (such as providing three or more layers of panels) on the basis of these embodiments. All technical solutions obtained by equivalent transformations fall within the scope of protection of this application. The names of various components used in this manual are for illustrative purposes only and do not have a limiting effect. Different manufacturers may use different names to refer to components with the same function.

1 is a schematic cross-sectional view of a substrate processing chamber using a gas shower head according to an embodiment of the present application. Referring to Figure 1, the gas nozzle 10 with controllable gas flow distribution provided by the present application is installed in the cavity 100 of the thin film deposition device (i.e., the substrate processing chamber), and is used to be placed opposite the wafer or substrate carrier device. Gas is sprayed onto the wafer or substrate 50 for thin film deposition.

Different from the prior art, the gas nozzle 10 of the present application includes multiple layers of panels, such as the first layer panel 1 in Figure 1 and the second layer panel 2 seated on the first layer panel 1, and through holes on each layer panel. According to different rules (i.e. with different layouts and/or numbers). For example, the first layer panel 1 has a plurality of first gas supply holes 11 distributed according to a first pattern; the second layer panel 2 has a plurality of second gas supply holes 21 distributed according to a second pattern. The first pattern is different from the first pattern. Two rules. The reason why different rules are needed is because if the distribution rules of the gas supply holes 11 and 21 on the first layer panel 1 and the second layer panel 2 are exactly the same (that is, have the same layout and the same number), it will lead to All the gas supply holes 11 on the first layer panel 1 (that is, the panel close to the wafer being ejected) are either completely covered or completely penetrated, and in this case cannot play a regulating role.

In addition, in this application, one of the first layer panel 1 and the second layer panel 2 can rotate at least a certain angle relative to the other, so that the two can have different first positions and second positions relative to each other. Location. Wherein: in the first position (such as the original position), all the first gas supply holes 11 are not covered by the second layer panel 2 (similar to the positions shown in FIGS. 5A to 5D , see below for details). All the first gas supply holes 11 can be used to inject gas, and thus can inject gas according to the maximum injection volume; in the second position (for example, the position after rotation), a part of the first gas supply holes 11 is in contact with the corresponding third position. The two gas supply holes 21 are aligned, and the other part is covered by the second layer panel 2 (similar to the position shown in Figure 6A to Figure 6C, see details below). At this time, only the uncovered gas injection hole 11 can be used. The amount of gas injected is obviously less than that at the first position, and only the positions corresponding to the gas injection holes 11 are injected with gas. Therefore, it can adjust the injection volume and airflow distribution. In some embodiments, the vias on adjacent panels may have different patterns (i.e., have different layouts and/or numbers), while the vias on non-adjacent panels may have the same pattern (i.e., have the same layout and/or number). or number), through the relative rotation of each layer, the injection volume and airflow distribution can also be adjusted.

It can be seen that the technical solution generated by the new inventive concept of the present application can bring the following beneficial technical effects: by changing the hole distribution of the gas nozzle to control the gas flow distribution, solving the problem of high cost of new process development process, And through the air flow compensation function, the film uniformity of the same process is optimized. Obviously, this kind of gas nozzle that can automatically adjust the air flow distribution provides flexibility in process adjustment, improves film uniformity, and saves process development costs.

The gas nozzle provided according to a preferred embodiment of the present application includes three layers of panels: a first layer panel 1, a second layer panel 2, and a third layer panel 3 (as shown in Figures 5A to 5C and 6A to 6C Show). The second layer panel 2 is seated against the first layer panel 1, and the third layer panel 3 is seated against the second layer panel 2. Among them, the first layer panel 1 is fixed, and the second layer panel 2 and the third layer panel 3 can be driven and rotated by the rotating device respectively. For example, both the second layer panel 2 and the third layer panel 3 can be rotated by 3° to 10°, 3° to 8°, or 3° to 5° relative to the first layer panel 1 . The specific degree of rotation can be determined by those skilled in the art based on various factors such as the number of panels, the distribution of gas supply holes on the panels, and the need for gas injection.

Referring to FIGS. 2A to 2C , the structure of the first layer panel 1 of the gas nozzle in the above preferred embodiment is shown. FIG. 2A is a schematic perspective view of the first layer panel 1 , and FIG. 2B is the first layer panel shown in FIG. 2A . Top view of layer panel 1. The first layer panel 1 is generally disk-shaped, with a plurality of first gas supply holes 11 distributed in a certain pattern in the middle portion, and a plurality of wavy concave and convex portions 14 formed near the edge of the middle portion. The edge of the first layer panel 1 has an annular peripheral wall 12 extending upward, thereby forming a cavity 16 in the middle of the first layer panel 1 so that both the second layer panel 2 and the third layer panel 3 can be accommodated in the cavity 16 . A first recess 13 and a second recess 15 opening inwardly are formed on the inner side of the annular peripheral wall 12 to respectively accommodate the rotating devices that drive the rotation of the second layer panel 2 and the third layer panel 3 (see details below). FIG. 2C is an enlarged view of the A-A cross-section in FIG. 2B , which shows the cross-sectional structure of the first layer panel 1 .

Referring to FIGS. 3A to 3C , the structure of the second layer panel 2 of the gas nozzle in the above preferred embodiment is shown. The second layer panel 2 is seated against the first layer panel 1. It is also generally disk-shaped, with an opening 24 in the middle part, and a plurality of second gas supply holes 21 are formed in the second layer panel 2 according to a certain regular distribution. , and its distribution pattern is different from the distribution pattern of the gas supply holes 11 on the first layer panel 1 . The second layer panel 2 also has lugs 23 extending outward from its edge. Elongated slots 22 are formed in the lugs 23 for cooperation with the rotating device that drives the rotation.

As shown in FIGS. 3A to 3C , the second layer panel 2 is also provided with rollers 25 close to the edge that can roll on the concave and convex portions 14 of the first layer panel 1 , so that when the first layer panel 1 and the second layer panel 2 rotate relative to each other, the roller 25 rolls on the concave and convex portion 14. This structure can effectively reduce or even eliminate the direct friction between the first layer panel 1 and the second layer panel 2 when they rotate relative to each other, helping to reduce the wear of both.

Referring to FIGS. 4A to 4D , the structure of the third layer panel 3 of the gas nozzle in the above preferred embodiment is shown. The third layer panel 3 is seated against the second layer panel 2 and is also generally disk-shaped. There is an opening 34 in the middle part, and a plurality of third gas supply holes 31 are formed in the third layer panel 3 according to a certain regular distribution. The distribution pattern is different from the distribution pattern of the gas supply holes 11 and 21 on the first and second layer panels 1 and 2. The third layer panel 3 also has lugs 33 extending outward from its edge. Elongated slots 32 are formed in the lugs 33 for cooperation with the rotating device that drives the rotation.

Referring to FIGS. 4C to 4D , a plurality of wavy concave and convex portions 35 are formed on the lower surface of the third layer panel 3 , and the concave and convex portions 35 can cooperate with the rollers 25 . Therefore, when the third layer panel 3 and the second layer panel 2 rotate relative to each other, the roller 25 rolls on the concave and convex portion 35 . This structure can effectively reduce or even eliminate the direct friction between the third layer panel 3 and the second layer panel 2 when they rotate relative to each other, helping to reduce the wear of both.

The overall structure, working process and principle of the gas nozzle in the above preferred embodiment will be described in detail below.

Figures 5A to 5D, Figures 6A to 6D, and Figures 7A to 7D show schematic diagrams of the entire gas nozzle of the present application. Referring first to Figure 5A, which shows the overall structure of the gas shower head. As shown in Figure 5A, the gas nozzle includes first, second, and third layers of panels 1, 2, and 3 that are stacked in sequence and substantially concentrically arranged, wherein the second and third layers of panels 2 and 3 are located on the first layer. In the cavity 16 formed by the annular peripheral wall 12 of the panel 1 . In this embodiment, the first layer panel 1 is stationary. The second and third layer panels 2 and 3 can rotate at least a certain angle.

The second layer panel 2 can be driven and rotated by the first rotating device 20 . The first rotating device 20 is adjacent to the edge of the second layer panel 2 and includes a rotating column 201 that can be driven to rotate and a control column 202 fixedly connected to or integrally formed with the rotating column 201; as mentioned above, on the second layer panel 2 An elongated slot 22 that cooperates with the control column 202 is formed, so that when the rotating column 201 is driven to rotate, the control column 202 that cooperates with the elongated slot 22 drives the second layer panel 2 to rotate. As previously mentioned, elongated slots 22 are formed in the lugs 23 . Among them, the rotating column 201 , the control column 202 and the lugs 23 are all located in the first notch 13 . The width of the first notch 13 is greater than the width of the lug 23 , so that the second layer panel 2 can rotate 3° to 5° relative to the first layer panel 1 .

Similarly, the third layer panel 3 can be driven to rotate by the second rotation device 30 . The second rotating device 30 is similar to the first rotating device 20, is adjacent to the edge of the third layer panel 3, and includes a rotating column 301 that can be driven to rotate and a control column 302 that is fixedly connected or integrally formed with the rotating column 301; the third layer The panel 3 is formed with an elongated slot 32 that cooperates with the control column 302, so that when the rotating column 301 is driven to rotate, the control column 302 that cooperates with the elongated slot 32 drives the third layer panel 3 to rotate. As shown in the figure, an elongated slot 32 is formed in the lug 33 . The rotating column 301 , the control column 302 and the lug 33 are all located in the second recess 15 . As shown in the figure, the width of the second notch 15 is greater than the width of the lug 33 , so that the third layer panel 3 can rotate 3° to 5° relative to the first layer panel 1 .

As shown in Figures 5A and 5B, a plurality of rollers 17 are provided inside the annular peripheral wall 12 of the first layer panel 1. The plurality of rollers 17 protrude from the inner surface of the annular peripheral wall 12 and are connected with the second layer panel 2 and The edges of the third layer panel 3 are in contact with each other to provide positioning and maintain centering, and at the same time, rolling friction occurs when the two panels rotate, thereby avoiding sliding friction with the inner surface of the annular peripheral wall 12 . Therefore, it helps production operations and extends the service life of each layer of panels. Unobstructed combined state

In the combined state shown in FIGS. 5A to 5D , all gas supply holes 111 in the first layer panel 1 are in an unobstructed state, and at this time, neither the second layer panel 2 nor the third layer panel 3 is rotated (such as the original position). ). At this time, the position of the roller 25 is as shown in Figure 5D. It can be seen from FIG. 5D that the concave and convex portions 14 on the first layer panel 1 and the concave and convex portions 35 on the third layer panel each have one or more crests and troughs. At this time, the roller 25 is located in the trough of the concave and convex portions 14 and 35, so that the lower surface of the second layer panel 2 and the upper surface of the first layer panel 1 fit together, and the lower surface of the third layer panel 3 is in contact with the second layer panel 2. The upper surfaces of panels 2 are fitted together. This can effectively avoid gas leakage between these panels.

By the way, when the first layer panel 1 , the second layer panel 2 and the third layer panel 3 rotate at a certain angle relative to each other, the roller 25 rolls in the concave and convex portions 14 and 35 . Specifically, during the rotation, the rollers 25 roll over the crest of the wave and then become fixed to each other after reaching the next trough of the wave. Therefore, during the rotation process, there is a gap between the first layer panel 1, the second layer panel 2 and the third layer panel 3, thus preventing frictional force from being generated. The combination state of the second layer panel 2 occlusion

If in the combined state shown in FIGS. 5A to 5D , by driving the first rotating device 20 to rotate (for example, by means of the controller 40 (such as a motor) shown in FIG. 1 ), it is not the focus of this application and is therefore unknown. (described above), thereby causing the second layer panel 2 to rotate at a certain angle (for example, 4 degrees), then the state shown in FIG. 6A to FIG. 6D is reached.

Referring to FIGS. 6A to 6C , at this time, the second layer panel 2 blocks part of the gas supply hole 11 of the first layer panel 1 (especially refer to FIG. 6C ). As shown in FIG. 6B , at this time, the rotating column 201 and the control column 202 have caused the lug 23 of the second layer panel 2 to move into the first notch 13 of the first layer panel 1 to a position close to the lower part in the figure. As shown in Figure 6D, at this time the roller 25 has moved to another valley (the leftmost valley in the figure) located at the concave and convex portions 14 and 35, and the lower surface of the second layer panel 2 and the upper surface of the first layer panel 1 Together, the lower surface of the third layer panel 3 and the upper surface of the second layer panel 2 are bonded together. The combination state of 3 occlusions in the third layer panel

If in the combined state shown in FIGS. 5A to 5D , by driving the second rotating device 30 to rotate (for example, by means of a controller 40 (such as a motor) similar to that shown in FIG. 1 ), it is not the focus of this application, and therefore (not described in detail), so that the third layer panel 3 is rotated at a certain angle (for example, 4 degrees), and then the state shown in FIG. 7A to FIG. 7D is reached.

Referring to FIGS. 7A and 7B , at this time, the rotating column 301 and the control column 302 have caused the lug 33 of the third layer panel 3 to move to the lower position in the second notch 15 of the first layer panel. Referring to FIG. 7C , at this time, the third layer panel 3 blocks part of the gas supply holes 11 of the first layer panel 1 and part of the gas supply holes 21 of the second layer panel 2 . As shown in FIG. 7D , at this time, the roller 25 has moved to another valley (the rightmost valley in the figure) located at the concave and convex parts 14 and 35 . In addition, as in the previous position, the lower surface of the second layer panel 2 is attached to the upper surface of the first layer panel 1, and the lower surface of the third layer panel 3 is attached to the upper surface of the second layer panel 2. .

From the above description, it can be seen that by rotating the second layer panel 2 and the third layer panel 3 to a certain angle, the number and distribution of the gas supply holes of the gas nozzle can be adjusted, thereby adjusting the injection volume and injection position. . This flexibility not only helps meet the jetting needs of different thin film deposition processes, but also helps improve the uniformity of deposited thin films, making it suitable for developing new thin film deposition processes and reducing the research and development costs of new thin film deposition processes.

Referring to FIG. 8 , as an alternative embodiment to the above embodiment, unlike the above embodiment, the first rotation device 20 and the second rotation device 30 are both composed of gears.

Specifically, the first rotating device 20 is adjacent to the edge of the second layer panel 2 and includes a gear 203; the edge of the second layer panel 2 has a plurality of teeth 24 meshing with the gear 203, so that when the gear 203 is driven to rotate, The teeth 24 drive the second layer panel 2 to rotate.

Similarly, the second rotating device 30 is adjacent to the edge of the third layer panel 3 and includes a gear 303; the edge of the third layer panel 3 has a plurality of teeth 34 meshing with the gear 303, so that when the gear 303 is driven When rotating, the teeth 34 drive the third layer panel 3 to rotate.

Similarly, the gears 203 and 303 can also be driven to rotate by the controller shown in Figure 1, thereby driving the second layer panel 2 and the third layer panel 3 to rotate. The angle of rotation is generally the same as in the above embodiment. This can be achieved by designing the number of teeth 24 and 34.

Therefore, this alternative embodiment can also achieve similar technical effects as the above-mentioned embodiment. That is, by rotating the second and third layer panels 2 and 3, the distribution of the gas supply holes that can be used to inject gas can be adjusted, thereby meeting the ejection needs of different thin film deposition processes, and also helping to improve the quality of the deposited thin film. Uniformity makes it suitable for developing new thin film deposition processes and reducing the research and development costs of new thin film deposition processes.

The technical content and technical features of the present application have been described by the above-mentioned relevant embodiments. However, the above-mentioned embodiments are only examples for implementing the present application. Those skilled in the art may still make various substitutions and modifications based on the teachings and disclosures of this application without departing from the spirit of this application. Therefore, the embodiments disclosed in this application do not limit the scope of this application. On the contrary, modifications and equivalent arrangements included within the spirit and scope of the claimed patent are included in the scope of this application.

1: First layer panel 2: Second layer panel 3: The third layer panel 10:Gas nozzle 11: First gas supply hole 12: Annular peripheral wall 13: First notch 14: Concave and convex parts 15: Second notch 16: cavity 17:Roller 20:First rotating device 21: Second gas supply hole 22:Long groove 23:Lug 24:Open your mouth 25:Roller 30:Second rotating device 31:Third gas supply hole 32:Long groove 33:Lug 34:Open your mouth 35: Concave and convex parts 40:Controller 50:Substrate carrying device 100:Cavity 201: Rotating column 202:Control column 301: Rotating column 302:Control column 303:Gear

In order to more clearly explain the specific implementation of the present application and the technical effects produced, the specific embodiments of the present application are described below in conjunction with the accompanying drawings. For clarity of expression and ease of layout, the drawings are not entirely to scale. For example, some are enlarged to show local details, while others are reduced to show the overall structure. in:

Figure 1 is a cross-sectional schematic diagram of a substrate processing chamber using a gas shower head according to an embodiment of the present application;

Figure 2A is a schematic three-dimensional view of the first layer panel of a gas nozzle according to an embodiment of the present application;

Figure 2B is a schematic top view of the first layer panel shown in Figure 2A;

Figure 2C is an enlarged view of the A-A cross-section in Figure 2B, which shows the cross-sectional structure of the first layer panel;

Figure 3A is a schematic three-dimensional view of the second layer panel of the gas nozzle according to an embodiment of the present application;

Figure 3B is a schematic top view of the second layer panel shown in Figure 3A;

Figure 3C is an enlarged view of the B-B cross-section of Figure 3B, which shows the cross-sectional structure of the second layer panel;

Figure 4A is a schematic three-dimensional view of the third panel of a gas nozzle according to an embodiment of the present application;

Figure 4B is a schematic top view of the third layer panel shown in Figure 4A;

Figure 4C is an enlarged view of the C-C section of Figure 4B, which shows the cross-sectional structure of the third layer panel;

Figure 4D is an enlarged view of the D-D cross-section of Figure 4B, especially showing the concave and convex portions of the third layer panel;

Figure 5A is a schematic three-dimensional view of the entire gas nozzle according to an embodiment of the present application. The gas nozzle includes three layers of panels. The combination state shown in the figure is that all through holes in the first layer of panels are in an unobstructed state;

Figure 5B is a schematic top view of the gas nozzle shown in Figure 5A;

Figure 5C is an enlarged view of the E-E cross-section of Figure 5B, which particularly shows the alignment of corresponding through holes on the three-layer panel;

Figure 5D is an enlarged view of the G-G cross-section of Figure 5C, especially showing the position of the roller;

Figure 6A is also a three-dimensional schematic view of the gas nozzle shown in Figures 5A to 5D. The difference from Figures 5A to 5D is that the second layer panel is rotated at a certain angle to block part of the through holes of the first layer panel. ;

Figure 6B is a schematic top view of the gas nozzle shown in Figure 6A;

Figure 6C is an enlarged view of the H-H cross-section of Figure 6B, which particularly shows that the second layer panel blocks part of the through holes of the first layer panel;

Figure 6D is an enlarged view of the I-I cross-section of Figure 6C, especially showing the position of the roller;

Figure 7A is also a three-dimensional schematic view of the gas nozzle shown in Figures 5A to 5D. The difference from Figures 5A to 5D is that the third layer panel is rotated at a certain angle to block the space between the first and second layer panels. Partially through-hole;

Figure 7B is a schematic top view of the gas nozzle shown in Figure 7A;

Figure 7C is an enlarged view of the J-J cross-section of Figure 7B, which particularly shows that the third layer panel blocks part of the through holes of the first and second layer panels;

Figure 7D is an enlarged view of the K-K cross-section of Figure 7C, especially showing the position of the roller; and

Figure 8 shows another embodiment of the present application, in which the first and second layers of panels are driven by gears.

1: First layer panel

2: Second layer panel

3: The third layer panel

11: First gas supply hole

21: Second gas supply hole

31:Third gas supply hole

Claims (21)

A gas nozzle (10) with controllable gas flow distribution, which is installed in a cavity (100) of a thin film deposition device and includes: a first layer panel (1) with a plurality of first gases distributed according to a first rule The supply hole (11), the second layer panel (2), is seated against the first layer panel (1) and has a plurality of second gas supply holes (21) distributed according to a second regularity, wherein: The first layer panel (1) is fixed, and the second layer panel (2) can be driven to rotate by a first rotating device (20), and the first rotating device (20) is adjacent to the second layer panel (2). ), and includes a rotating column (201) that can be driven to rotate and a control column (202) fixedly connected to or integrally formed with the rotating column (201); the second layer panel (2) is formed with a The control column (202) cooperates with the elongated groove (22), so that when the rotating column (201) is driven to rotate, the control column (202) cooperating with the elongated groove (22) drives the third The two-layer panel (2) rotates, the first law is different from the second law, and one of the first layer panel (1) and the second layer panel (2) can rotate relative to the other The two are rotated so that they can have different first and second positions relative to each other, and in the first position, all the first gas supply holes (11) are not connected to the second layer panel. (2) Covering; in the second position, part of the first gas supply hole (11) is aligned with the corresponding second gas supply hole (21), and the other part is covered by the second layer panel (2) Cover. The gas nozzle (10) of claim 1, wherein the second layer panel (2) has a lug (23) extending outward from its edge, and the elongated groove (22) is formed on the lug. (23) in. The gas nozzle (10) of claim 2, wherein the first layer panel (1) also has an annular peripheral wall (12) extending upward from its edge, and an inward opening is formed on the inside of the annular peripheral wall (12). The first recess (13), the rotating column (201), the control column (202) and the lug (23) are all located in the first recess (13). The gas nozzle (10) of claim 3, wherein the width of the first notch (13) is greater than the width of the lug (23), so that the second layer panel (2) can be positioned relative to the The first layer panel (1) is rotated by 3° to 5°. The gas nozzle (10) of claim 1, wherein the first rotating device (20) is adjacent to the edge of the second layer panel (2) and includes a gear (203); the second layer panel (2) ) has a plurality of teeth (24) on its edge that mesh with the gear (203), so that when the gear (203) is driven to rotate, the teeth (24) drive the second layer panel (2) ) rotate. The gas nozzle (10) of claim 1, wherein a plurality of wavy uneven portions (14) are formed on the upper surface of the first layer panel (1), and the second layer panel (2) has corresponding A roller (25) capable of rolling on the concave and convex portion (14) is provided, so that when the first layer panel (1) and the second layer panel (2) rotate relative to each other, the roller (25) 25) Roll on the concave and convex parts (14). The gas nozzle (10) of claim 6, wherein when the first layer panel (1) and the second layer panel (2) are located at the first position and the second position relative to each other, the The roller (25) is located at two different valleys of the concave and convex portion (14). At this time, the lower surface of the second layer panel (2) is in contact with the upper surface of the first layer panel (1). The gas nozzle (10) of claim 1, which also includes a third layer panel (3) seated on the second layer panel (2), and the third layer panel (3) has a plurality of buttons. The third gas supply holes (31) are distributed in a third regular pattern, and the third regular pattern is different from the first regular pattern and the second regular pattern. The gas nozzle (10) of claim 8, wherein the third layer panel (3) can be driven to rotate by the second rotating device (30). The gas nozzle (10) of claim 9, wherein the second rotating device (30) is adjacent to the edge of the third layer panel (3) and includes a rotating column (301) that can be driven to rotate and is connected to the The rotating column (301) is fixedly connected or integrally formed with a control column (302); the third layer panel (3) is formed with a long slot (32) that matches the control column (302), so that when the When the rotating column (301) is driven to rotate, the control column (302) matched with the elongated slot (32) drives the third layer panel (3) to rotate. The gas nozzle (10) of claim 10, wherein the third layer panel (3) has a lug (33) extending outward from its edge, and the elongated groove (32) is formed on the lug. (33) in. The gas nozzle (10) of claim 11, wherein the first layer panel (1) also has a An annular peripheral wall (12) with an upwardly extending edge. A second recess (15) opening inwardly is formed on the inside of the annular peripheral wall (12). The rotating column (301), the control column (302) and the The lugs (33) are located in the second recess (15). The gas nozzle (10) of claim 12, wherein the width of the second notch (15) is greater than the width of the lug (33), so that the third layer panel (3) can be positioned relative to the The first layer panel (1) is rotated by 3° to 5°. The gas nozzle (10) of claim 9, wherein the second rotating device (30) is adjacent to the edge of the third layer panel (3) and includes a gear (303); the third layer panel (3) ) has a plurality of teeth (34) on its edge that mesh with the gear (303), so that when the gear (303) is driven to rotate, the teeth (34) drive the third layer panel (3) ) rotate. The gas nozzle (10) of claim 8, wherein a plurality of wavy uneven portions (35) are formed on the lower surface of the third layer panel (3), and the corresponding surfaces of the second layer panel (2) are A roller (25) capable of rolling on the concave and convex portion (35) is provided, so that when the third layer panel (3) rotates relative to the second layer panel (2), the roller (25) Roll on the uneven portion (35). The gas nozzle (10) of claim 15, wherein the concave and convex portion (35) has at least two different troughs, and when the roller (25) is located in the trough of the concave and convex portion (35), the The lower surface of the third layer panel (3) and the upper surface of the second layer panel (2) are bonded together. The gas nozzle (10) of claim 8, wherein the first layer panel (1), the second layer The panel (2) and the third layer panel (3) are both generally disk-shaped, and they are arranged concentrically. The gas nozzle (10) of claim 17, wherein the first layer panel (1) also has an annular peripheral wall (12) extending upward from its edge, thereby forming a central layer in the middle of the first layer panel (1). The second layer panel (2) and the third layer panel (3) are both located in the cavity (16). The gas nozzle (10) of claim 18, wherein a plurality of rollers (17) are provided inside the annular peripheral wall (12), and the plurality of rollers (17) protrude from the annular peripheral wall (12) The inner surface is in contact with the edges of the second layer panel (2) and the third layer panel (3) to provide positioning for them. The gas nozzle (10) of claim 1, wherein the second layer panel (2) can rotate 3° to 10° relative to the first layer panel (1). The gas nozzle (10) of claim 9, wherein the third layer panel (3) can rotate 3° to 10° relative to the first layer panel (2).