TWI823617B - Reconfigurable capacity memory and manufacturing method thereof - Google Patents
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- 230000015654 memory Effects 0.000 title claims abstract description 64
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- 238000007789 sealing Methods 0.000 claims abstract description 27
- 230000008054 signal transmission Effects 0.000 claims description 25
- 239000013078 crystal Substances 0.000 claims description 18
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- 238000000926 separation method Methods 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 11
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本發明係關於一種集成電路結構,尤指一種可重組式容量頻寬記憶體結構及其製造方法。The invention relates to an integrated circuit structure, and in particular to a reconfigurable capacity bandwidth memory structure and a manufacturing method thereof.
目前透過晶圓堆疊(Wafer On Wafer, WOW)製程所形成之一晶圓堆疊結構,該晶圓堆疊結構包含一基底、一邏輯電路層以及一記憶體晶體層,該基底、該邏輯電路層以及該記憶體晶體層彼此之間具有複數個容置腔體,該等容置腔體分別與該基底、該邏輯電路層以及該記憶體晶體層對應構成複數個集成電路,且透過該等容置腔體設置一金屬層,以使該基底、該邏輯電路層以及該記憶體晶體層彼此之間電性連接,透過該晶圓堆疊製程,使得同時可製造出該等集成電路(Integrated Circuit, IC),接著,將該等集成電路彼此之間進行分割,以形成一集成電路。A wafer stack structure is currently formed through a Wafer On Wafer (WOW) process. The wafer stack structure includes a substrate, a logic circuit layer and a memory crystal layer. The substrate, the logic circuit layer and The memory crystal layer has a plurality of accommodation cavities between each other. The accommodation cavities respectively correspond to the substrate, the logic circuit layer and the memory crystal layer to form a plurality of integrated circuits, and through the accommodation A metal layer is provided in the cavity so that the substrate, the logic circuit layer and the memory crystal layer are electrically connected to each other. Through the wafer stacking process, the integrated circuits (ICs) can be manufactured at the same time. ), and then divide the integrated circuits from each other to form an integrated circuit.
為將該等集成電路精準的分割,在該邏輯電路層以及該記憶體晶體層各自設置一密封環(Sealing Ring),透過該密封環,使該等容置腔體各自獨立不連通,以沿著該密封環對該等集成電路進行分割成該集成電路。In order to accurately segment the integrated circuits, a sealing ring (Sealing Ring) is provided on the logic circuit layer and the memory crystal layer respectively. Through the sealing ring, the accommodation cavities are independent and not connected to each other, so as to ensure that the cavities are separated from each other. The integrated circuits are divided into integrated circuits along the sealing ring.
然而,現有技術透過該密封環將各容置腔體進行獨立不連通,致使該集成電路之間無法傳遞電訊號,導致後續在分割時,將因該密封環的設置導致無法依據用戶需求對該等集成電路彈性的進行分割,此外,若用戶需求不同時,因應不同需求,各自獨立的進行集成電路製程,而形成不同的集成電路。However, in the existing technology, each accommodation cavity is independently disconnected through the sealing ring, resulting in the inability to transmit electrical signals between the integrated circuits. As a result, during subsequent segmentation, the setting of the sealing ring will make it impossible to perform the processing according to user needs. The integrated circuits can be divided flexibly. In addition, if user needs are different, the integrated circuit processes can be carried out independently to form different integrated circuits in response to different needs.
因此,現有技術確實有待進一步提供更佳改良方案的必要性。Therefore, it is necessary to further provide better improvement solutions in the existing technology.
有鑑於上述現有技術之不足,本發明主要目的在於提供一種可重組式容量頻寬記憶體及其製造方法,透過記憶體晶體、邏輯電路之間的改良結構,使彼此之間可連通,提供後續各集成電路之間可電性連接,以節省生產成本以及彈性擴充。In view of the above-mentioned shortcomings of the prior art, the main purpose of the present invention is to provide a reconfigurable capacity bandwidth memory and a manufacturing method thereof. Through the improved structure between the memory crystal and the logic circuit, the memory crystal and the logic circuit can be connected to each other to provide subsequent Each integrated circuit can be electrically connected to save production costs and enable flexible expansion.
為達成上述目的本發明所採取的主要技術手段,主要係令前述可重組式容量頻寬記憶體結構包括: 一第一電路層; 一密封件,其設置在該第一電路層上; 一訊號傳輸層,其設置在該密封件內且向外凸伸; 一第二電路層,其設置在該密封件頂端。 The main technical means adopted by the present invention to achieve the above objectives are mainly to make the aforementioned reconfigurable capacity bandwidth memory structure include: a first circuit layer; A sealing member disposed on the first circuit layer; a signal transmission layer disposed within the seal and protruding outward; A second circuit layer is provided on the top of the seal.
透過上述構造,在該密封件設置該訊號傳輸層,以使各第一電路層以及各第二電路層之間可經由該訊號傳輸層進行連通,如此一來,可透過單一次集成電路製程製造出符合不同用戶需求的集成電路,不須根據不同用戶需求而分批次進行集成電路製程,且後續可根據用戶需求對集成電路進行分割,也不會發生該集成電路之間的訊號無法彼此傳遞之情形,以達到節省生產成本以及彈性擴充之目的。Through the above structure, the signal transmission layer is provided on the seal, so that each first circuit layer and each second circuit layer can be connected through the signal transmission layer. In this way, it can be manufactured through a single integrated circuit process. To produce integrated circuits that meet the needs of different users, there is no need to perform integrated circuit manufacturing processes in batches according to different user needs, and the integrated circuits can be subsequently divided according to user needs, and there will be no problem that the signals between the integrated circuits cannot be transmitted to each other. situation to achieve the purpose of saving production costs and flexibly expanding.
為達成上述目的本發明所採取的又一主要技術手段,主要係令前述可重組式容量頻寬記憶體結構的製造方法包括: 提供一第一電路層以及一第二電路層; 將複數個分隔層進行堆疊,以分別在該第一電路層以及該第二電路層形成一密封件,且在該等分隔層中的至少一層形成一訊號傳輸層;以及 在形成該密封件後,透過該密封件將該第二電路層堆疊在該第一電路層上。 Another main technical means adopted by the present invention to achieve the above object is that the manufacturing method of the aforementioned reconfigurable capacity bandwidth memory structure includes: Provide a first circuit layer and a second circuit layer; Stack a plurality of separation layers to form a seal on the first circuit layer and the second circuit layer respectively, and form a signal transmission layer on at least one of the separation layers; and After the sealing member is formed, the second circuit layer is stacked on the first circuit layer through the sealing member.
透過上述記憶體結構的製造方法,將該密封件設置在該第一電路層、該第二電路層之間,並且該密封件中凸伸該訊號傳輸層,以使集成電路之間可透過該訊號傳輸層進行電性連接,如此一來,可透過單一次集成電路製程製造出符合不同用戶需求的集成電路,不須根據不同用戶需求而分批次進行集成電路製程,且後續可根據用戶需求對該集成電路進行分割,也不會發生該集成電路之間的訊號無法彼此傳遞之情形,以達到節省生產成本以及彈性擴充之目的。Through the above-mentioned manufacturing method of the memory structure, the sealing member is disposed between the first circuit layer and the second circuit layer, and the signal transmission layer is protruded in the sealing member, so that the integrated circuits can pass through the The signal transmission layer is electrically connected. In this way, integrated circuits that meet the needs of different users can be manufactured through a single integrated circuit process. There is no need to perform integrated circuit processes in batches according to different user needs, and subsequent integrated circuit processes can be based on user needs. When the integrated circuit is divided, signals between the integrated circuits will not be unable to transmit to each other, so as to achieve the purpose of saving production costs and flexibly expanding.
關於本發明之較佳實施例,請參閱圖1所示,其中本發明係提供一可重組式容量頻寬記憶體結構10,其包括一第一電路層20、一密封件(Sealing Ring)30、一訊號傳輸層31以及一第二電路層40,該密封件30設置在該第一電路層20上,該訊號傳輸層31設置在該密封件30內且向外凸伸,該第二電路層40設置在該密封件30頂端。Regarding the preferred embodiment of the present invention, please refer to Figure 1, in which the present invention provides a reconfigurable capacity
在本實施例中,該密封件30包括複數個分隔層,該等分隔層從該第一電路層20的一面以及該第二電路層40的一面分別垂直堆疊形成,且該等分隔層中具有該訊號傳輸層31,該訊號傳輸層31向外凸伸,以將相鄰的該第一電路層20以及該第二電路層40進行電性連接。In this embodiment, the
詳細來說,該第二電路層40堆疊在該第一電路層20的上方,該等分隔層分別從該第一電路層20的一面朝向該第二電路層40堆疊,以形成該密封件30以及從該第二電路層40的一面朝向該第一電路層20堆疊,以形成該密封件30,並分別與該第一電路層20以及該第二電路層40垂直連接。在本實施例中,該密封件30可成一封閉環狀。Specifically, the
在本實施例中,該第一電路層20係一邏輯電路層20’或一記憶體晶體層40’,而該第二電路層40係一邏輯電路層20’或一記憶體晶體層40’。In this embodiment, the
在本實施例中,如圖2所示,當該第一電路層20或該第二電路層40係所述邏輯電路層20’時,該邏輯電路層20’進一步包括一邏輯電路21,該邏輯電路21設置在該邏輯電路層20’的一面且在該密封件30的該封閉環狀內。在本實施例中,該邏輯電路21包括一互補式金屬氧化物半導體(Complementary Metal-Oxide-Semiconductor, CMOS)、一微機電系統(Micro Electro Mechanical Systems, MEMS)。In this embodiment, as shown in Figure 2, when the
在本實施例中,當該第一電路層20或該第二電路層40係所述記憶體晶體層40’時,該記憶體晶體層40’進一步包括一記憶體41,該記憶體41設置在該記憶體晶體層40’的一面且在該密封件30的該封閉環狀內,並與該邏輯電路21相對設置。In this embodiment, when the
在本實施例中,該可重組式容量頻寬記憶體結構10更包括一金屬墊50,該金屬墊50分別設置在該邏輯電路21以及該記憶體41上。In this embodiment, the reconfigurable capacity
在本實施例中,該可重組式容量頻寬記憶體結構10還包括一導電件51,該導電件51設置在該訊號傳輸層31與該金屬墊50之間,且與該訊號傳輸層31以及該金屬墊50進行電性連接,以使該邏輯電路21以及該記憶體41透過該金屬墊50、該導電件51與該訊號傳輸層31進行訊號傳輸。在本實施例中,該導電件51係包括複數個導電層進行堆疊形成。In this embodiment, the reconfigurable capacity
在本實施例中,該訊號傳輸層31的長度大於該等分隔層的長度,以從該密封件30向外凸伸。In this embodiment, the length of the
為進一步說明本發明的應用方式,舉例來說,如圖3所示係一集成電路60的仰視剖面結構圖,當一個記憶體41的一記憶體容量係1GB時,若用戶所需求的該記憶體容量係2GB時,此時,基於各記憶體41彼此可透過該訊號傳輸層31進行訊號傳輸,故,可在包括二個記憶體41的劃線槽(Scribe Line)進行切割,以形成該集成電路60,使得用戶所得到的該集成電路60的該記憶體容量係由二個記憶體41所形成的該記憶體容量係2GB,同時,該集成電路60也包括二邏輯電路21,以提供更多的運算能力。To further illustrate the application of the present invention, for example, as shown in FIG. 3 is a bottom cross-sectional structural diagram of an integrated
根據上述實施例及具體應用方式,本發明可進一步的歸納出一可重組式容量頻寬記憶體結構的製造方法,如圖4所示,該方法包括以下步驟:
提供一第一電路層20以及一第二電路層40(S41);
將複數個分隔層進行堆疊,以分別在該第一電路層20以及該第二電路層40形成一密封件30,且在該等分隔層中的至少一層形成一訊號傳輸層(S42);以及
在形成該密封件後,透過該密封件將該第二電路層40堆疊在該第一電路層上(S43)。
According to the above embodiments and specific application methods, the present invention can further summarize a manufacturing method of a reconfigurable capacity bandwidth memory structure. As shown in Figure 4, the method includes the following steps:
Provide a
綜上所述,透過在該密封件30設置該訊號傳輸層31,以使各邏輯電路21以及各記憶體41之間可進行連通,使得後續各集成電路之間可透過該訊號傳輸層31進行電性連接,如此一來,可透過單一次集成電路製程製造出符合不同客戶需求的集成電路,不須根據不同用戶需求而分批次進行集成電路製程,且當用戶需要多個邏輯電路以及多個記憶體構成一集成電路時,可根據需求,對該可重組式容量頻寬記憶體結構進行分割,而不會發生該集成電路之間的訊號無法彼此傳遞之情形,以達到節省生產成本以及彈性擴充之目的。In summary, by disposing the
10:可重組式容量頻寬記憶體結構 20:第一電路層 20’:邏輯電路層 21:邏輯電路 30:密封件 31:訊號傳輸層 40:第二電路層 40’:記憶體晶體層 41:記憶體 50:金屬墊 51:導電件 60:集成電路10: Reconfigurable capacity bandwidth memory structure 20: First circuit layer 20’: Logic circuit layer 21: Logic circuit 30:Seals 31: Signal transmission layer 40: Second circuit layer 40’: Memory crystal layer 41:Memory 50:Metal pad 51: Conductive parts 60:Integrated circuit
圖1係本發明之可重組式容量頻寬記憶體結構的結構圖; 圖2係本發明之可重組式容量頻寬記憶體結構的具體實施例結構圖; 圖3係本發明之可重組式容量頻寬記憶體結構的仰視剖面結構圖;以及 圖4係本發明之可重組式容量頻寬記憶體結構的製造方法流程圖。 Figure 1 is a structural diagram of the reconfigurable capacity bandwidth memory structure of the present invention; Figure 2 is a structural diagram of a specific embodiment of the reconfigurable capacity bandwidth memory structure of the present invention; Figure 3 is a bottom cross-sectional structural view of the reconfigurable capacity bandwidth memory structure of the present invention; and FIG. 4 is a flow chart of the manufacturing method of the reconfigurable capacity bandwidth memory structure of the present invention.
10:可重組式容量頻寬記憶體結構 10: Reconfigurable capacity bandwidth memory structure
20:第一電路層 20: First circuit layer
30:密封件 30:Seals
31:訊號傳輸層 31: Signal transmission layer
40:第二電路層 40: Second circuit layer
50:金屬墊 50:Metal pad
51:導電件 51: Conductive parts
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WO2005043601A2 (en) * | 2003-11-03 | 2005-05-12 | Chipx Incorporated | Apparatus and method for forming compound integrated circuits |
TWI509745B (en) * | 2011-10-11 | 2015-11-21 | Etron Technology Inc | High speed memory chip module and electronics system device with a high speed memory chip module |
TW202226506A (en) * | 2020-12-23 | 2022-07-01 | 美商蘋果公司 | Die stitching and harvesting of arrayed structures |
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US20020004932A1 (en) * | 2000-03-27 | 2002-01-10 | Jeng-Jye Shau | Cost saving methods using pre-defined integrated circuit modules |
WO2005043601A2 (en) * | 2003-11-03 | 2005-05-12 | Chipx Incorporated | Apparatus and method for forming compound integrated circuits |
TWI509745B (en) * | 2011-10-11 | 2015-11-21 | Etron Technology Inc | High speed memory chip module and electronics system device with a high speed memory chip module |
TW202226506A (en) * | 2020-12-23 | 2022-07-01 | 美商蘋果公司 | Die stitching and harvesting of arrayed structures |
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