TWI823291B - Protection circuit - Google Patents

Protection circuit Download PDF

Info

Publication number
TWI823291B
TWI823291B TW111109312A TW111109312A TWI823291B TW I823291 B TWI823291 B TW I823291B TW 111109312 A TW111109312 A TW 111109312A TW 111109312 A TW111109312 A TW 111109312A TW I823291 B TWI823291 B TW I823291B
Authority
TW
Taiwan
Prior art keywords
transistor
protection circuit
coupled
bonding pad
voltage
Prior art date
Application number
TW111109312A
Other languages
Chinese (zh)
Other versions
TW202339384A (en
Inventor
李建興
周業甯
林志軒
林昌民
邱華琦
Original Assignee
世界先進積體電路股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 世界先進積體電路股份有限公司 filed Critical 世界先進積體電路股份有限公司
Priority to TW111109312A priority Critical patent/TWI823291B/en
Publication of TW202339384A publication Critical patent/TW202339384A/en
Application granted granted Critical
Publication of TWI823291B publication Critical patent/TWI823291B/en

Links

Images

Abstract

A protection circuit is provided. The protection circuit is coupled to a pad and includes a trigger circuit and a discharge circuit. The trigger circuit includes a first transistor and a second transistor having a first conductivity type, which are coupled in series between the pad and a ground terminal. The trigger circuit detects whether a transient even occurs on the pad. The discharge circuit is coupled between the pad and the ground terminal and controlled by the trigger circuit. When the transient event occurs on the pad, the trigger circuit generates a trigger voltage to trigger the discharge circuit to provide a discharge path between the pad and the ground terminal.

Description

保護電路protection circuit

本發明是有關於一種保護電路,特別是有關於一種具有高壓容忍度且可快速提供放電路徑的保護電路。The present invention relates to a protection circuit, and in particular to a protection circuit that has high voltage tolerance and can quickly provide a discharge path.

隨著積體電路的半導體製程的發展,半導體元件尺寸已縮小至次微米階段,以增進積體電路的性能以及運算速度。然而,元件尺寸的縮減,導致半導體元件容易受到電壓尖峰所導致的大電流破壞。因此,當積體電路所耦接的用於輸出/入的接合墊上出現在極短時間內具有大電流/大電壓時,需要能快速反應大電流/大電壓而能穩定提供放電路徑的保護電路。舉例來說,靜電放電(Electrostatic Discharge, ESD)保護電路、瞬態電壓抑制器(Transient Voltage Suppressor,TVS)等保護裝置或電路等可提供放電路徑,以保護半導體元件不受大電流破壞。因此,這種保護裝置或電路的放電效能(即保護能力)實為重要。With the development of semiconductor manufacturing processes for integrated circuits, the size of semiconductor components has been reduced to the sub-micron stage to improve the performance and computing speed of integrated circuits. However, shrinking device sizes have made semiconductor devices susceptible to damage by large currents caused by voltage spikes. Therefore, when a large current/voltage occurs in a very short time on the input/output bonding pads coupled to the integrated circuit, a protection circuit that can respond quickly to the large current/voltage and stably provide a discharge path is required. . For example, protection devices or circuits such as electrostatic discharge (ESD) protection circuits and transient voltage suppressors (TVS) can provide discharge paths to protect semiconductor components from damage by large currents. Therefore, the discharge performance (ie, protection capability) of this protection device or circuit is really important.

有鑑於此,本發明提出一種保護電路。保護電路耦接一接合墊且包括一觸發電路以及一放電電路。觸發電路包括串聯耦接於接合墊與一接地端之間且具有一第一導電類型的一第一電晶體與一第二電晶體。觸發電路偵測在接合墊上是否發生一瞬變事件。放電電路耦接於接合墊與接地端之間,且受控於觸發電路。當在接合墊上發生瞬變事件時,觸發電路產生一觸發電壓以觸發放電電路提供介於接合墊與接地端之間的一放電路徑。In view of this, the present invention proposes a protection circuit. The protection circuit is coupled to a bonding pad and includes a trigger circuit and a discharge circuit. The trigger circuit includes a first transistor and a second transistor having a first conductivity type coupled in series between the bonding pad and a ground terminal. The trigger circuit detects whether a transient event occurs on the bond pad. The discharge circuit is coupled between the bonding pad and the ground terminal and is controlled by the trigger circuit. When a transient event occurs on the bonding pad, the trigger circuit generates a trigger voltage to trigger the discharge circuit to provide a discharge path between the bonding pad and the ground.

為使本發明之上述目的、特徵和優點能更明顯易懂,下文特舉一較佳實施例,並配合所附圖式,作詳細說明如下。In order to make the above-mentioned objects, features and advantages of the present invention more clearly understandable, a preferred embodiment is given below and described in detail with reference to the accompanying drawings.

第1圖係表示根據本發明一實施例之保護電路。參閱第1圖,為了能詳細說明,第1圖除了顯示保護電路1,還顯示了接合墊12。如第1圖所示,保護電路1耦接接合墊12,且包括觸發電路10以及放電電路11。觸發電路10以及放電電路11皆耦接於接合墊12與接地端GND之間。Figure 1 shows a protection circuit according to an embodiment of the present invention. Referring to Figure 1, in order to explain in detail, Figure 1 not only shows the protection circuit 1, but also shows the bonding pad 12. As shown in FIG. 1 , the protection circuit 1 is coupled to the bonding pad 12 and includes a trigger circuit 10 and a discharge circuit 11 . The trigger circuit 10 and the discharge circuit 11 are both coupled between the bonding pad 12 and the ground terminal GND.

當保護電路1在一正常操作模式下操作時,一供應電壓提供至接合墊12。此時,觸發電路10控制放電電路11不提供介於接合墊12與接地端GND之間的任何放電路徑。當保護電路1非在正常操作模式下操作時,接合墊12未接收任何供應電壓。此時,觸發電路10偵測在接合墊12上是否發生一瞬變事件。當偵測到在接合墊12上是否發生一瞬變事件時,觸發電路10則產生一信號或電壓,以控制或觸發放電電路11提供介於接合墊12與接地端GND之間的一放電路徑。When the protection circuit 1 operates in a normal operating mode, a supply voltage is provided to the bonding pad 12 . At this time, the trigger circuit 10 controls the discharge circuit 11 not to provide any discharge path between the bonding pad 12 and the ground terminal GND. When the protection circuit 1 is not operating in the normal operating mode, the bonding pad 12 does not receive any supply voltage. At this time, the trigger circuit 10 detects whether a transient event occurs on the bonding pad 12 . When detecting whether a transient event occurs on the bonding pad 12, the trigger circuit 10 generates a signal or voltage to control or trigger the discharge circuit 11 to provide a discharge path between the bonding pad 12 and the ground terminal GND.

在此實施例中,所述的瞬變事件可以是涉及大電壓或大電流的事件。舉例來說,瞬變事件可以是一靜電放電(Electrostatic Discharge,ESD)事件或是一浪湧(surge)事件。在一實施例中,保護電路1可以是靜電放電(Electrostatic Discharge, ESD)保護電路、瞬態電壓抑制器(Transient Voltage Suppressor,TVS)。In this embodiment, the transient event may be an event involving a large voltage or a large current. For example, the transient event may be an electrostatic discharge (ESD) event or a surge event. In one embodiment, the protection circuit 1 may be an electrostatic discharge (Electrostatic Discharge, ESD) protection circuit or a transient voltage suppressor (Transient Voltage Suppressor, TVS).

第2圖係表示根據本發明另一實施例之保護電路。第1圖的保護電路1可以第2圖的保護電路1A來實現。參閱第2圖,保護電路1A的觸發電路10可包括電晶體20與21以及電阻器22。電晶體20與21具有相同的導電類型,且每一者具有三個電極端,分別為第一電極端、第二電極端、以及控制電極端。此實施例中,電晶體20與21皆以N型金氧半(N-type Metal-Oxide-Semiconductor,NMOS)電晶體來實現,即電晶體20與21的導電類型為N型。電晶體20與21的每一者的第一電極端、第二電極端、以及控制電極端分別為NMOS電晶體的汲極、源極、以及閘極。如第2圖所示。NMOS電晶體20的汲極(第一電極端)200耦接接合墊12,其源極(第二電極端)201耦接節點N20,且其閘極(控制電極端)202耦接節點N21。NMOS電晶體21的汲極210耦接節點N20,其源極211接地端GND,且其閘極212耦接節點N21。根據上述的連接架構可知,NMOS電晶體20與21係串聯耦接於接合墊12與接地端GND之間。電阻器22耦接於節點N21與接地端GND之間。Figure 2 shows a protection circuit according to another embodiment of the present invention. The protection circuit 1 in Figure 1 can be realized by the protection circuit 1A in Figure 2 . Referring to FIG. 2 , the trigger circuit 10 of the protection circuit 1A may include transistors 20 and 21 and a resistor 22 . The transistors 20 and 21 have the same conductivity type, and each has three electrode terminals, namely a first electrode terminal, a second electrode terminal, and a control electrode terminal. In this embodiment, the transistors 20 and 21 are both implemented by N-type Metal-Oxide-Semiconductor (NMOS) transistors, that is, the conductivity type of the transistors 20 and 21 is N-type. The first electrode terminal, the second electrode terminal, and the control electrode terminal of each of the transistors 20 and 21 are respectively the drain electrode, the source electrode, and the gate electrode of the NMOS transistor. As shown in Figure 2. The drain electrode (first electrode terminal) 200 of the NMOS transistor 20 is coupled to the bonding pad 12 , its source electrode (second electrode terminal) 201 is coupled to the node N20 , and its gate electrode (control electrode terminal) 202 is coupled to the node N21 . The drain 210 of the NMOS transistor 21 is coupled to the node N20, the source 211 of the NMOS transistor 21 is coupled to the ground terminal GND, and the gate 212 of the NMOS transistor 21 is coupled to the node N21. According to the above connection structure, the NMOS transistors 20 and 21 are coupled in series between the bonding pad 12 and the ground terminal GND. The resistor 22 is coupled between the node N21 and the ground terminal GND.

如第2圖所示,放電電路11包括電晶體23。電晶體23具有三個電極端,分別為第一電極端、第二電極端、以及控制電極端。此實施例中,電晶體23亦以NMOS電晶體來實現。電晶體23的第一電極端、第二電極端、以及控制電極端分別為NMOS電晶體23的汲極、源極、以及閘極。NMOS電晶體23的汲極230耦接接合墊12,其源極231接地端GND,且其閘極232耦接節點N20。根據上述的連接架構可知,NMOS電晶體23亦耦接於接合墊12與接地端GND之間。As shown in FIG. 2 , the discharge circuit 11 includes a transistor 23 . The transistor 23 has three electrode terminals, which are a first electrode terminal, a second electrode terminal, and a control electrode terminal. In this embodiment, the transistor 23 is also implemented as an NMOS transistor. The first electrode terminal, the second electrode terminal, and the control electrode terminal of the transistor 23 are the drain electrode, the source electrode, and the gate electrode of the NMOS transistor 23 respectively. The drain 230 of the NMOS transistor 23 is coupled to the bonding pad 12 , the source 231 of the NMOS transistor 23 is coupled to the ground terminal GND, and the gate 232 of the NMOS transistor 23 is coupled to the node N20 . According to the above connection structure, it can be seen that the NMOS transistor 23 is also coupled between the bonding pad 12 and the ground terminal GND.

在本發明的實施例中,NMOS電晶體23的耐壓程度高於NMOS電晶體20與21的耐壓程度。在一例子中,NMOS電晶體20與23為耐高壓電晶體,且NMOS電晶體23的耐壓程度高於NMOS電晶體20的耐壓程度。舉例來說,NMOS電晶體20為耐壓20V(伏特)的電晶體,NMOS電晶體21為耐壓5V的電晶體,且NMOS電晶體23為耐壓24V的電晶體,然而本發明並不以此為限。In the embodiment of the present invention, the withstand voltage of the NMOS transistor 23 is higher than that of the NMOS transistors 20 and 21 . In one example, the NMOS transistors 20 and 23 are high voltage withstand transistors, and the voltage withstand level of the NMOS transistor 23 is higher than that of the NMOS transistor 20 . For example, the NMOS transistor 20 is a transistor with a voltage resistance of 20V (volts), the NMOS transistor 21 is a transistor with a voltage resistance of 5V, and the NMOS transistor 23 is a transistor with a voltage resistance of 24V. However, the present invention does not use This is the limit.

在一實施例中,NMOS電晶體20與23可藉由增加其汲極的摻雜區尺寸(例如,厚度、側向擴散距離)來實現為耐高壓電晶體。In one embodiment, the NMOS transistors 20 and 23 can be implemented as high-voltage tolerant transistors by increasing the dimensions (eg, thickness, lateral diffusion distance) of the doped regions of their drains.

在一實施例中,NMOS電晶體20與21的通道寬度大約為幾百微米(um),而NMOS電晶體23的通道寬度大約為100~150千微米(kum)。電阻器22的電阻值大約在1~10千歐姆(kohm)的範圍內。In one embodiment, the channel width of the NMOS transistors 20 and 21 is approximately several hundred micrometers (um), and the channel width of the NMOS transistor 23 is approximately 100 to 150 kilomicrometers (kum). The resistance value of the resistor 22 is approximately in the range of 1 to 10 kiloohms (kohm).

以下將說明保護電路1A的詳細操作。The detailed operation of the protection circuit 1A will be described below.

參閱第3A圖,當保護電路1A在一正常操作模式下操作時,一供應電壓VDD提供至接合墊12。在此實施例中,供應電壓VDD例如為24V的電壓。此時,由於電阻器22耦接於節點N21與接地端GND之間,節點N21上的電壓相對於供應電壓VDD而處於一低位準,即NMOS電晶體20與21的閘極202與212上的電壓皆處於一低位準。基於閘極202與212上的低位準電壓,NMOS電晶體20與21皆關斷。在第3A圖以及後續圖示中,關斷的電晶體將以”(OFF)”標示。由於NMOS電晶體20與21皆關斷,節點N20上的電壓相對於供應電壓VDD而處於一低位準,即NMOS電晶體23的閘極232上的電壓皆處於一低位準,這使得NMOS電晶體23也關斷(OFF)。Referring to FIG. 3A, when the protection circuit 1A operates in a normal operating mode, a supply voltage VDD is provided to the bonding pad 12. In this embodiment, the supply voltage VDD is, for example, a voltage of 24V. At this time, since the resistor 22 is coupled between the node N21 and the ground terminal GND, the voltage on the node N21 is at a low level relative to the supply voltage VDD, that is, the voltage on the gates 202 and 212 of the NMOS transistors 20 and 21 The voltages are all at a low level. Due to the low level voltage on gates 202 and 212, both NMOS transistors 20 and 21 are turned off. In Figure 3A and subsequent figures, a turned-off transistor will be marked "(OFF)". Since the NMOS transistors 20 and 21 are both turned off, the voltage on the node N20 is at a low level relative to the supply voltage VDD, that is, the voltage on the gate 232 of the NMOS transistor 23 is at a low level, which makes the NMOS transistor 23 is also turned off (OFF).

根據上述可得知,在正常操作模式下,保護電路1A內耦接於接合墊12與接地端GND之間的所有NMOS電晶體皆處於關斷狀態。換句話說,本案的保護電路1A截斷了介於接合墊12與接地端GND之間的任何放電路徑。因此,在正常操作模式下,保護電路1A不會導致不必要的漏電流,避免保護電路1A的設置造成多餘的功率消耗。According to the above, it can be known that in the normal operation mode, all NMOS transistors in the protection circuit 1A coupled between the bonding pad 12 and the ground terminal GND are in the off state. In other words, the protection circuit 1A of this case cuts off any discharge path between the bonding pad 12 and the ground terminal GND. Therefore, in the normal operating mode, the protection circuit 1A will not cause unnecessary leakage current, and avoid unnecessary power consumption caused by the setting of the protection circuit 1A.

參閱第3B圖,在保護電路1A非處於正常操作模式的情況下,供應電壓VDD不被提供至接合墊12,即接合墊12處於浮接狀態,或者接合墊12的電壓等於0V。當在接合墊12上發生一瞬變事件(例如,ESD事件或浪湧事件)時,接合墊12的電壓瞬間提高。電晶體20的汲極200與閘極202之間具有寄生電容,其與電阻器22形成一RC電路。透過汲極200與閘極202之間的寄生電容的耦合效應,節點N21上的電壓隨著接合墊12的電壓而瞬間提高。此時,反應於節點N21上電壓的瞬間提高,NMOS電晶體20與21瞬間導通。在第3B圖以及後續圖示中,導通的電晶體將以”(ON)”標示。Referring to FIG. 3B , when the protection circuit 1A is not in the normal operation mode, the supply voltage VDD is not provided to the bonding pad 12 , that is, the bonding pad 12 is in a floating state, or the voltage of the bonding pad 12 is equal to 0V. When a transient event (eg, an ESD event or a surge event) occurs on bonding pad 12 , the voltage of bonding pad 12 increases momentarily. There is a parasitic capacitance between the drain 200 and the gate 202 of the transistor 20 , which forms an RC circuit with the resistor 22 . Through the coupling effect of the parasitic capacitance between the drain 200 and the gate 202 , the voltage on the node N21 increases instantaneously with the voltage of the bonding pad 12 . At this time, in response to the instantaneous increase in voltage at node N21, NMOS transistors 20 and 21 are turned on instantaneously. In Figure 3B and subsequent figures, the transistor that is turned on will be marked "(ON)".

由於NMOS電晶體20與21的導通,NMOS電晶體20與21各自具有導通內阻R30與R31。導通內阻R30與R31形成了一分壓器。此分壓器對接合墊12與接地端GND之間的電壓差進行分壓,以在節點N20上產生觸發電壓V30。透過分壓操作所產生的觸發電壓V30具有一高位準電壓以導通(ON)NMOS電晶體23。因此,在接合墊12與接地端GND之間形成了一放電路徑P30,以讓接合墊12上瞬變事件伴隨的大電流的電荷透過此放電路徑P30傳導至接地端GND。Due to the conduction of the NMOS transistors 20 and 21, the NMOS transistors 20 and 21 respectively have conduction internal resistances R30 and R31. The conduction internal resistances R30 and R31 form a voltage divider. This voltage divider divides the voltage difference between the bonding pad 12 and the ground terminal GND to generate the trigger voltage V30 on the node N20. The trigger voltage V30 generated through the voltage dividing operation has a high level voltage to turn on the NMOS transistor 23 . Therefore, a discharge path P30 is formed between the bonding pad 12 and the ground terminal GND, so that the charge of a large current accompanying the transient event on the bonding pad 12 is conducted to the ground terminal GND through the discharge path P30.

根據上述,當在接合墊12上發生一瞬變事件時,觸發電路10透過NMOS電晶體20與21、電阻器22的操作能快速地產生高位準的觸發電壓V30,以觸發放電電路11提供放電路徑P30,使得接合墊12上的大量電荷能快速透過放電路徑P30傳導至接地端GND,藉此保護耦接接合墊12的其他電路內的元件不被大電流破壞。According to the above, when a transient event occurs on the bonding pad 12, the trigger circuit 10 can quickly generate a high level trigger voltage V30 through the operation of the NMOS transistors 20 and 21 and the resistor 22 to trigger the discharge circuit 11 to provide a discharge path. P30, so that a large amount of charges on the bonding pad 12 can be quickly conducted to the ground terminal GND through the discharge path P30, thereby protecting components in other circuits coupled to the bonding pad 12 from being damaged by large currents.

在第2圖的實施例中,雖然未在第2圖中顯示,但NMOS電晶體23的基極(bulk)可與其源極231連接。In the embodiment of FIG. 2 , although not shown in FIG. 2 , the base (bulk) of the NMOS transistor 23 may be connected to its source 231 .

第4圖表示根據本發明另一實施例之保護電路。第1圖的保護電路1可以第4圖的保護電路1B來實現。第4圖的保護電路1B的電路架構與第2圖的保護電路1A的電路架構大致相同。參閱第4圖,保護電路1B與1A之間的相異之處在於,NMOS電晶體23基極(bulk)233。NMOS電晶體23的基極233耦接節點N21,也就是基極233耦接NMOS電晶體20與21的閘極202與212。Figure 4 shows a protection circuit according to another embodiment of the present invention. The protection circuit 1 in Figure 1 can be implemented by the protection circuit 1B in Figure 4 . The circuit structure of the protection circuit 1B in Figure 4 is substantially the same as the circuit structure of the protection circuit 1A in Figure 2 . Referring to Figure 4, the difference between the protection circuits 1B and 1A lies in the base (bulk) 233 of the NMOS transistor 23. The base 233 of the NMOS transistor 23 is coupled to the node N21 , that is, the base 233 is coupled to the gates 202 and 212 of the NMOS transistors 20 and 21 .

由於第4與5圖的保護電路1B的電路架構與第2圖的保護電路1A的電路架構大致相同,因此,保護電路1B的操作也與保護電路1A的操作大致相同,可參閱上述關於第3A與3B圖的說明。在下文中,相同的操作將省略記載,僅特別說明NMOS電晶體23的操作。Since the circuit structure of the protection circuit 1B in Figures 4 and 5 is roughly the same as that of the protection circuit 1A in Figure 2, the operation of the protection circuit 1B is also basically the same as the operation of the protection circuit 1A. Please refer to the above-mentioned description of the protection circuit 1A. Description with Figure 3B. In the following, description of the same operations will be omitted, and only the operation of the NMOS transistor 23 will be specifically described.

參閱第4圖,NMOS電晶體23的汲極230、源極231、以及基極233形成了一寄生的NPN型雙極性接面電晶體(bipolar junction transistor,BJT)40。NMOS電晶體23的汲極230、源極231、以及基極233分別作為NPN型BJT 40的集極(C)、射極(E)、以及基極(B)。當保護電路1B在一正常操作模式下操作時,節點N21上的電壓相對於供應電壓VDD而處於一低位準。基於節點N21上的低位準電壓以及源極231耦接接地端GND,NPN型BJT 40關斷。在保護電路1B非處於正常操作模式且在接合墊12上發生一瞬變事件的情況下,由於節點N21上的電壓具有高位準,NPN型BJT 40的基-射極電壓(V BE)大於0.7V,這使得NPN型BJT 40導通。此時,接合墊12上瞬變事件伴隨的大電流的電荷也透過導通的NPN型BJT 40傳導至接地端GND。 Referring to FIG. 4 , the drain 230 , source 231 , and base 233 of the NMOS transistor 23 form a parasitic NPN bipolar junction transistor (BJT) 40 . The drain electrode 230, the source electrode 231, and the base electrode 233 of the NMOS transistor 23 serve as the collector (C), the emitter (E), and the base electrode (B) of the NPN type BJT 40, respectively. When the protection circuit 1B operates in a normal operation mode, the voltage on the node N21 is at a low level relative to the supply voltage VDD. Based on the low level voltage on the node N21 and the source 231 coupled to the ground terminal GND, the NPN BJT 40 is turned off. In the case where the protection circuit 1B is not in the normal operating mode and a transient event occurs on the bonding pad 12, the base-emitter voltage (V BE ) of the NPN type BJT 40 is greater than 0.7V because the voltage on the node N21 has a high level. , which makes the NPN type BJT 40 conductive. At this time, the charge of the large current accompanying the transient event on the bonding pad 12 is also conducted to the ground terminal GND through the turned-on NPN BJT 40 .

根據上述,在第4圖的保護電路1B中,NMOS電晶體23的基極233耦接節點N21。因此,當接合墊12上發生一瞬變事件時,寄生的NPN型BJT 40可反應於節點N21的高位準電壓而快速的導通,提高了NMOS電晶體23的整體放電能力。Based on the above, in the protection circuit 1B of FIG. 4, the base 233 of the NMOS transistor 23 is coupled to the node N21. Therefore, when a transient event occurs on the bonding pad 12 , the parasitic NPN BJT 40 can quickly turn on in response to the high level voltage of the node N21 , thereby improving the overall discharge capability of the NMOS transistor 23 .

第6圖係表示根據本發明另一實施例之保護電路。第1圖的保護電路1可以第6圖的保護電路1C來實現。參閱第6圖,保護電路1C的觸發電路10可包括電晶體60與61以及電阻器62。電晶體60與61具有相同的導電類型,且每一者具有三個電極端,分別為第一電極端、第二電極端、以及控制電極端。此實施例中,電晶體60與61皆以NMOS電晶體來實現,即電晶體60與61的導電類型為N型。電晶體60與61的每一者的第一電極端、第二電極端、以及控制電極端分別為NMOS電晶體的汲極、源極、以及閘極。如第6圖所示。NMOS電晶體60的汲極600耦接接合墊12,其源極601耦接節點N60。NMOS電晶體61的汲極610耦接節點N60,其源極611接地端GND,且其閘極612耦接電源端T60。根據上述的連接架構可知,NMOS電晶體60與61係串聯耦接於接合墊12與接地端GND之間。電阻器62耦接於NMOS電晶體60的閘極602與節點N60之間。Figure 6 shows a protection circuit according to another embodiment of the present invention. The protection circuit 1 in Figure 1 can be realized by the protection circuit 1C in Figure 6 . Referring to FIG. 6 , the trigger circuit 10 of the protection circuit 1C may include transistors 60 and 61 and a resistor 62 . The transistors 60 and 61 have the same conductivity type, and each has three electrode terminals, namely a first electrode terminal, a second electrode terminal, and a control electrode terminal. In this embodiment, the transistors 60 and 61 are both implemented as NMOS transistors, that is, the conductivity type of the transistors 60 and 61 is N-type. The first electrode terminal, the second electrode terminal, and the control electrode terminal of each of the transistors 60 and 61 are respectively the drain electrode, the source electrode, and the gate electrode of the NMOS transistor. As shown in Figure 6. The drain 600 of the NMOS transistor 60 is coupled to the bonding pad 12 , and the source 601 of the NMOS transistor 60 is coupled to the node N60 . The drain 610 of the NMOS transistor 61 is coupled to the node N60, the source 611 of the NMOS transistor 61 is coupled to the ground terminal GND, and the gate 612 of the NMOS transistor 61 is coupled to the power terminal T60. According to the above connection structure, it can be seen that the NMOS transistors 60 and 61 are coupled in series between the bonding pad 12 and the ground terminal GND. Resistor 62 is coupled between gate 602 of NMOS transistor 60 and node N60.

如第6圖所示,放電電路11包括電晶體63。電晶體63具有三個電極端,分別為第一電極端、第二電極端、以及控制電極端。此實施例中,電晶體63亦以NMOS電晶體來實現。電晶體63的第一電極端、第二電極端、以及控制電極端分別為NMOS電晶體63的汲極、源極、以及閘極。NMOS電晶體63的汲極630耦接接合墊12,其源極631接地端GND,且其閘極632耦接節點N60。根據上述的連接架構可知,NMOS電晶體63亦耦接於接合墊12與接地端GND之間。As shown in FIG. 6 , the discharge circuit 11 includes a transistor 63 . The transistor 63 has three electrode terminals, which are a first electrode terminal, a second electrode terminal, and a control electrode terminal. In this embodiment, the transistor 63 is also implemented as an NMOS transistor. The first electrode terminal, the second electrode terminal, and the control electrode terminal of the transistor 63 are the drain electrode, the source electrode, and the gate electrode of the NMOS transistor 63 respectively. The drain 630 of the NMOS transistor 63 is coupled to the bonding pad 12 , the source 631 of the NMOS transistor 63 is coupled to the ground terminal GND, and the gate 632 of the NMOS transistor 63 is coupled to the node N60 . According to the above connection structure, it can be seen that the NMOS transistor 63 is also coupled between the bonding pad 12 and the ground terminal GND.

在本發明的實施例中,NMOS電晶體63的耐壓程度高於NMOS電晶體60與61的耐壓程度。在一例子中,NMOS電晶體60與63為耐高壓電晶體,且NMOS電晶體63的耐壓程度高於NMOS電晶體60的耐壓程度。舉例來說,NMOS電晶體60為耐壓20V(伏特)的電晶體,NMOS電晶體61為耐壓5V的電晶體,且NMOS電晶體63為耐壓24V的電晶體。In the embodiment of the present invention, the withstand voltage of the NMOS transistor 63 is higher than that of the NMOS transistors 60 and 61 . In one example, the NMOS transistors 60 and 63 are high-voltage withstand transistors, and the voltage-withstand level of the NMOS transistor 63 is higher than that of the NMOS transistor 60 . For example, the NMOS transistor 60 is a transistor with a withstand voltage of 20V (volts), the NMOS transistor 61 is a transistor with a withstand voltage of 5V, and the NMOS transistor 63 is a transistor with a withstand voltage of 24V.

在一實施例中,NMOS電晶體60與63可藉由增加其汲極的摻雜區尺寸(例如,縱向摻雜深度或側向擴散距離)來實現為耐高壓電晶體,然而本發明並不以此為限。In one embodiment, the NMOS transistors 60 and 63 can be implemented as high-voltage withstand transistors by increasing the doping region size of their drains (eg, vertical doping depth or lateral diffusion distance). However, the present invention does not Not limited to this.

在一實施例中,NMOS電晶體60與61的通道寬度大約為幾百微米(um),而NMOS電晶體63的通道寬度大約為100~150千微米(kum)。電阻器62的電阻值大約在1~10千歐姆(kohm)的範圍內。In one embodiment, the channel width of the NMOS transistors 60 and 61 is approximately several hundred micrometers (um), and the channel width of the NMOS transistor 63 is approximately 100 to 150 kilomicrometers (kum). The resistance value of the resistor 62 is approximately in the range of 1 to 10 kiloohms (kohm).

以下將說明保護電路1C的詳細操作。The detailed operation of the protection circuit 1C will be described below.

參閱第7A圖,當保護電路1C在一正常操作模式下操作時,一供應電壓VDD提供至接合墊12,且另一供應電壓VCC提供至電源端T60。在此實施例中,供應電壓VDD例如為24V的電壓,供應電壓VCC例如為5V的電壓。此時,由於5V的供應電壓VCC透過電源端T60提供至NMOS電晶體61的閘極612,因此,NMOS電晶體61一直處於導通狀態(ON)。透過導通的NMOS電晶體61,節點N60上的電壓相對於供應電壓VDD而處於一低位準,即NMOS電晶體63的閘極632上的電壓處於一低位準。基於閘極632上的低位準電壓,NMOS電晶體63關斷(OFF)。此外,由透過耦接於NMOS電晶體60的閘極602與節點N60之間的電阻器62,閘極602的電壓相對於供應電壓VDD而處於一低位準。基於閘極602的低位準電壓,NMOS電晶體60關斷(OFF)。Referring to FIG. 7A, when the protection circuit 1C operates in a normal operation mode, a supply voltage VDD is provided to the bonding pad 12, and another supply voltage VCC is provided to the power terminal T60. In this embodiment, the supply voltage VDD is, for example, a voltage of 24V, and the supply voltage VCC is, for example, a voltage of 5V. At this time, since the supply voltage VCC of 5V is provided to the gate 612 of the NMOS transistor 61 through the power terminal T60, the NMOS transistor 61 is always in a conductive state (ON). Through the turned-on NMOS transistor 61, the voltage on the node N60 is at a low level relative to the supply voltage VDD, that is, the voltage on the gate 632 of the NMOS transistor 63 is at a low level. Based on the low level voltage on gate 632, NMOS transistor 63 is turned OFF. In addition, the voltage of the gate 602 is at a low level relative to the supply voltage VDD through the resistor 62 coupled between the gate 602 of the NMOS transistor 60 and the node N60. Based on the low level voltage of gate 602, NMOS transistor 60 is turned off.

根據上述可得知,在正常操作模式下,保護電路1C內耦接於接合墊12與接地端GND之間的NMOS電晶體60與63關斷狀態。換句話說,本案的保護電路1C截斷了介於接合墊12與接地端GND之間的任何放電路徑。因此,在正常操作模式下,保護電路1C不會導致不必要的漏電流,避免保護電路1C的設置造成多餘的功率消耗。According to the above, it can be known that in the normal operation mode, the NMOS transistors 60 and 63 in the protection circuit 1C coupled between the bonding pad 12 and the ground terminal GND are in the off state. In other words, the protection circuit 1C of this case cuts off any discharge path between the bonding pad 12 and the ground terminal GND. Therefore, in the normal operating mode, the protection circuit 1C will not cause unnecessary leakage current, and avoid unnecessary power consumption caused by the setting of the protection circuit 1C.

參閱第7B圖,在保護電路1C非處於正常操作模式的情況下,供應電壓VDD不被提供至接合墊12,且供應電壓VCC也不被提供至電源端T60,即接合墊12以及/或電源端T60處於浮接狀態,或者接合墊12以及/或電源端T60的電壓等於0V。當在接合墊12上發生一瞬變事件(例如,ESD事件或浪湧事件)時,接合墊12的電壓瞬間提高。電晶體60的汲極600與閘極602之間具有寄生電容,其與電阻器62形成一RC電路。透過汲極600與閘極602之間的寄生電容的耦合效應,NMOS電晶體60的閘極602的電壓隨著接合墊12的電壓而瞬間提高。此時,反應於閘極602的電壓的瞬間提高,NMOS電晶體60導通(ON)。此外,由於電源端T60處於浮接狀態或者電源端T60的電壓等於0V,NMOS電晶體61處於完全導通狀態或弱導通狀態(ON)。Referring to FIG. 7B , when the protection circuit 1C is not in the normal operating mode, the supply voltage VDD is not provided to the bonding pad 12 , and the supply voltage VCC is not provided to the power terminal T60 , that is, the bonding pad 12 and/or the power supply. The terminal T60 is in a floating state, or the voltage of the bonding pad 12 and/or the power terminal T60 is equal to 0V. When a transient event (eg, an ESD event or a surge event) occurs on bonding pad 12 , the voltage of bonding pad 12 increases momentarily. There is a parasitic capacitance between the drain 600 and the gate 602 of the transistor 60 , which forms an RC circuit with the resistor 62 . Through the coupling effect of the parasitic capacitance between the drain 600 and the gate 602 , the voltage of the gate 602 of the NMOS transistor 60 increases instantaneously with the voltage of the bonding pad 12 . At this time, in response to the instantaneous increase in the voltage of the gate 602, the NMOS transistor 60 is turned on. In addition, since the power terminal T60 is in a floating state or the voltage of the power terminal T60 is equal to 0V, the NMOS transistor 61 is in a fully conductive state or a weak conduction state (ON).

由於NMOS電晶體60與61的導通,NMOS電晶體60與61各自具有導通內阻R60與R61。導通內阻R60與R61形成了一分壓器。此分壓器對接合墊12與接地端GND之間的電壓差進行分壓,以在節點N60上產生觸發電壓V60。透過分壓操作所產生的觸發電壓V60具有一高位準電壓以導通NMOS電晶體63。因此,在接合墊12與接地端GND之間形成了一放電路徑P60,以讓接合墊12上瞬變事件伴隨的大電流的電荷透過此放電路徑P60傳導至接地端GND。Due to the conduction of the NMOS transistors 60 and 61, the NMOS transistors 60 and 61 respectively have conduction internal resistances R60 and R61. The conduction internal resistances R60 and R61 form a voltage divider. This voltage divider divides the voltage difference between the bonding pad 12 and the ground terminal GND to generate the trigger voltage V60 on the node N60. The trigger voltage V60 generated through the voltage dividing operation has a high level voltage to turn on the NMOS transistor 63 . Therefore, a discharge path P60 is formed between the bonding pad 12 and the ground terminal GND, so that the charge of a large current accompanying the transient event on the bonding pad 12 is conducted to the ground terminal GND through the discharge path P60.

根據上述,當在接合墊12上發生一瞬變事件時,觸發電路10透過NMOS電晶體60與61、電阻器62的操作能快速地產生高位準的觸發電壓V60,以觸發放電電路11提供放電路徑P60,使得接合墊12上的大量電荷能快速透過放電路徑P60傳導至接地端GND,藉此保護耦接接合墊12的其他電路內的元件不被大電流破壞。According to the above, when a transient event occurs on the bonding pad 12, the trigger circuit 10 can quickly generate a high level trigger voltage V60 through the operation of the NMOS transistors 60 and 61 and the resistor 62 to trigger the discharge circuit 11 to provide a discharge path. P60, so that a large amount of charges on the bonding pad 12 can be quickly conducted to the ground terminal GND through the discharge path P60, thereby protecting components in other circuits coupled to the bonding pad 12 from being damaged by large currents.

在第6圖的實施例中,雖然未在第6圖中顯示,但NMOS電晶體63的基極可與其源極631連接。In the embodiment of FIG. 6 , although not shown in FIG. 6 , the base of the NMOS transistor 63 may be connected to its source 631 .

第8圖表示根據本發明另一實施例之保護電路。第1圖的保護電路1可以第8圖的保護電路1D來實現。第8圖的保護電路1D的電路架構與第6圖的保護電路1C的電路架構大致相同。參閱第8圖,保護電路1D與1C之間的相異之處在於,NMOS電晶體63基極(bulk)633。NMOS電晶體63的基極633耦接節點N60,也就是基極633耦接NMOS電晶體63的閘極632。Figure 8 shows a protection circuit according to another embodiment of the present invention. The protection circuit 1 in Figure 1 can be realized by the protection circuit 1D in Figure 8 . The circuit structure of the protection circuit 1D in Figure 8 is substantially the same as the circuit structure of the protection circuit 1C in Figure 6 . Referring to Figure 8, the difference between the protection circuits 1D and 1C lies in the base (bulk) 633 of the NMOS transistor 63. The base 633 of the NMOS transistor 63 is coupled to the node N60 , that is, the base 633 is coupled to the gate 632 of the NMOS transistor 63 .

由於第8圖的保護電路1D的電路架構與第6圖的保護電路1C的電路架構大致相同,因此,保護電路1D的操作也與保護電路1C的操作大致相同,可參閱上述關於第7A與7B圖的說明。在下文中,相同的操作將省略記載,僅特別說明NMOS電晶體63的操作。Since the circuit structure of the protection circuit 1D in Figure 8 is roughly the same as that of the protection circuit 1C in Figure 6, the operation of the protection circuit 1D is also basically the same as the operation of the protection circuit 1C. Please refer to the above about 7A and 7B. Figure description. In the following, description of the same operations will be omitted, and only the operation of the NMOS transistor 63 will be specifically described.

參閱第8與9圖,NMOS電晶體63的汲極630、源極631、以及基極633形成了一寄生的NPN型雙極性接面電晶體(BJT)80。NMOS電晶體63的汲極630、源極631、以及基極633分別作為NPN型BJT 80的集極(C)、射極(E)、以及基極(B)。當保護電路1D在一正常操作模式下操作時,節點N60上的電壓相對於供應電壓VDD而處於一低位準。基於節點N60上的低位準電壓以及源極631耦接接地端GND,NPN型BJT 80關斷。在保護電路1D非處於正常操作模式且在接合墊12上發生一瞬變事件的情況下,由於節點N60上的觸發電壓V60具有高位準,NPN型BJT 80的基-射極電壓(V BE)大於0.7V,這使得NPN型BJT 80導通。此時,接合墊12上瞬變事件伴隨的大電流的電荷也透過導通的NPN型BJT 80傳導至接地端GND。 Referring to FIGS. 8 and 9 , the drain 630 , the source 631 , and the base 633 of the NMOS transistor 63 form a parasitic NPN bipolar junction transistor (BJT) 80 . The drain electrode 630, the source electrode 631, and the base electrode 633 of the NMOS transistor 63 serve as the collector (C), the emitter (E), and the base electrode (B) of the NPN type BJT 80, respectively. When the protection circuit 1D operates in a normal operating mode, the voltage on the node N60 is at a low level relative to the supply voltage VDD. Based on the low level voltage on the node N60 and the source 631 coupled to the ground terminal GND, the NPN BJT 80 is turned off. In the case where the protection circuit 1D is not in the normal operating mode and a transient event occurs on the bonding pad 12, since the trigger voltage V60 on the node N60 has a high level, the base-emitter voltage (V BE ) of the NPN type BJT 80 is greater than 0.7V, which makes the NPN type BJT 80 conductive. At this time, the charge of the large current accompanying the transient event on the bonding pad 12 is also conducted to the ground terminal GND through the turned-on NPN BJT 80 .

根據上述,在第8圖的保護電路1D中,NMOS電晶體63的基極633耦接節點N60。因此,當接合墊12上發生一瞬變事件時,寄生的NPN型BJT 80可反應於節點N60的高位準電壓而快速的導通,提高了NMOS電晶體63的整體放電能力。 Based on the above, in the protection circuit 1D of FIG. 8, the base 633 of the NMOS transistor 63 is coupled to the node N60. Therefore, when a transient event occurs on the bonding pad 12 , the parasitic NPN BJT 80 can quickly turn on in response to the high level voltage of the node N60 , thereby improving the overall discharge capability of the NMOS transistor 63 .

第10A圖係表示根據本發明實施例一實施例的電子電路。參閱第10A圖,電子裝置13A包括核心電路100、接合墊12、以及本案第1圖所示的保護電路1。此保護電路1可以第2、4、6、8圖所示的保護電路1A~1D的任一者來實現。在第10A圖的實施例中,保護電路1配置在核心電路100的外部。當在接合墊12發生一瞬變事件時,保護電路1提供或觸發提供介於接合墊12與接地端GND之間的一放電路徑。接合墊12上的大量電荷能快速透過此放電路徑傳導至接地端GND,藉此保護核心電路100內的元件或電路不被瞬變事件伴隨的大電流破壞。 Figure 10A shows an electronic circuit according to an embodiment of the present invention. Referring to Figure 10A, the electronic device 13A includes a core circuit 100, a bonding pad 12, and the protection circuit 1 shown in Figure 1 of this case. This protection circuit 1 can be implemented by any one of the protection circuits 1A to 1D shown in Figures 2, 4, 6, and 8. In the embodiment of FIG. 10A , the protection circuit 1 is arranged outside the core circuit 100 . When a transient event occurs at the bonding pad 12 , the protection circuit 1 provides or triggers a discharge path between the bonding pad 12 and the ground terminal GND. A large amount of charge on the bonding pad 12 can be quickly conducted to the ground terminal GND through this discharge path, thereby protecting the components or circuits in the core circuit 100 from being damaged by large currents accompanying transient events.

在其他實施例中,保護電路1可設置在核心電路100的內部。如第10B圖所示,在電子裝置13B的核心電路100內設置有保護電路1以及其他電子元件或電路1000。當在接合墊12發生一瞬變事件時,保護電路1提供或觸發提供介於接合墊12與接地端GND之間的一放電路徑。接合墊12上的大量電荷能快速透過此放電路徑傳導至接地端GND,藉此保護核心電路100內的電子元件或電路1000不被瞬變事件伴隨的大電流破壞。 In other embodiments, the protection circuit 1 may be disposed inside the core circuit 100 . As shown in FIG. 10B , the protection circuit 1 and other electronic components or circuits 1000 are provided in the core circuit 100 of the electronic device 13B. When a transient event occurs at the bonding pad 12 , the protection circuit 1 provides or triggers a discharge path between the bonding pad 12 and the ground terminal GND. A large amount of charge on the bonding pad 12 can be quickly conducted to the ground terminal GND through this discharge path, thereby protecting the electronic components in the core circuit 100 or the circuit 1000 from being damaged by large currents accompanying transient events.

雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此項技藝者,在不脫離本發明之精神和範圍內,當可作更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed above in terms of preferred embodiments, they are not intended to limit the present invention. Anyone skilled in the art can make modifications and modifications without departing from the spirit and scope of the present invention. Therefore, the present invention is The scope of protection shall be determined by the appended patent application scope.

1,1A,1B,1C,1D:保護電路 1,1A,1B,1C,1D: Protection circuit

10:觸發電路 10: Trigger circuit

11:放電電路 11: Discharge circuit

12:接合墊 12:Joining pad

13A,13B:電子裝置 13A,13B: Electronic devices

20,21,23:NMOS電晶體 20,21,23:NMOS transistor

22:電阻器 22: Resistor

40:NPN型雙極性接面電晶體(BJT) 40:NPN type bipolar junction transistor (BJT)

60,61,63:NMOS電晶體 60,61,63:NMOS transistor

62:電阻器 62: Resistor

80:NPN型雙極性接面電晶體(BJT) 80:NPN type bipolar junction transistor (BJT)

100:核心電路 100:Core circuit

200,210,230:汲極(第一電極端) 200,210,230: drain (first electrode terminal)

201,211,231:源極(第二電極端) 201,211,231: Source (second electrode terminal)

202,212,232:閘極(控制電極端) 202,212,232: Gate (control electrode terminal)

233:基極 233:Base

1000:電子元件或電路 1000: Electronic components or circuits

600,610,630:汲極(第一電極端) 600,610,630: drain (first electrode terminal)

601,611,631:源極(第二電極端) 601,611,631: Source (second electrode terminal)

602,612,632:閘極(控制電極端) 602,612,632: Gate (control electrode terminal)

633:基極 633:Base

GND:接地端 GND: ground terminal

N20,N21,N60:節點 N20, N21, N60: nodes

P30,P60:放電路徑 P30,P60: discharge path

R30,R31,R60,R61:導通內阻 R30, R31, R60, R61: internal conduction resistance

T60:電源端 T60: power supply terminal

V30,V60:觸發電壓 V30, V60: trigger voltage

VCC,VDD:供應電壓 VCC, VDD: supply voltage

第1圖表示根據本發明一實施例之保護電路。 第2圖表示根據本發明另一實施例之保護電路。 第3A與3B圖表示第2圖的保護電路的操作示意圖。 第4圖表示根據本發明另一實施例之保護電路。 第5圖表示第4圖的保護電路中的寄生NPN型雙極性接面電晶體。 第6圖表示根據本發明另一實施例之保護電路。 第7A與7B圖表示第6圖的保護電路的操作示意圖。 第8圖表示根據本發明另一實施例之保護電路。 第9圖表示第8圖的保護電路中的寄生NPN型雙極性接面電晶體。 第10A圖表示根據本發明一實施例的電子電路,其具有本發明任一實施例的保護電路。 第10B圖表示根據本發明另一實施例的電子電路,其具有本發明任一實施例的保護電路。 Figure 1 shows a protection circuit according to an embodiment of the present invention. Figure 2 shows a protection circuit according to another embodiment of the present invention. Figures 3A and 3B show the operation diagram of the protection circuit of Figure 2. Figure 4 shows a protection circuit according to another embodiment of the present invention. Figure 5 shows a parasitic NPN bipolar junction transistor in the protection circuit of Figure 4. Figure 6 shows a protection circuit according to another embodiment of the present invention. Figures 7A and 7B illustrate the operation of the protection circuit of Figure 6. Figure 8 shows a protection circuit according to another embodiment of the present invention. Figure 9 shows a parasitic NPN bipolar junction transistor in the protection circuit of Figure 8. Figure 10A shows an electronic circuit according to an embodiment of the present invention, which has a protection circuit according to any embodiment of the present invention. Figure 10B shows an electronic circuit according to another embodiment of the present invention, which has a protection circuit according to any embodiment of the present invention.

1A:保護電路 1A: Protection circuit

10:觸發電路 10: Trigger circuit

11:放電電路 11: Discharge circuit

12:接合墊 12:Joining pad

20,21,23:NMOS電晶體 20,21,23:NMOS transistor

22:電阻器 22: Resistor

200,210,230:汲極(第一電極端) 200,210,230: drain (first electrode terminal)

201,211,231:源極(第二電極端) 201,211,231: Source (second electrode terminal)

202,212,232:閘極(控制電極端) 202,212,232: Gate (control electrode terminal)

GND:接地端 GND: ground terminal

N20,N21:節點 N20, N21: node

Claims (14)

一種保護電路,耦接一接合墊,包括:一觸發電路,包括串聯耦接於該接合墊與一接地端之間且具有一第一導電類型的一第一電晶體與一第二電晶體,其中,該觸發電路偵測在該接合墊上是否發生一瞬變事件;以及一放電電路,耦接於該接合墊與該接地端之間,且受控於該觸發電路,該放電電路包括耦接於該接合墊與該接地端之間且具有該第一導電類型的一第三電晶體;其中,該第一電晶體具有耦接該接合墊的一第一電極端以及耦接一第一節點的一第二電極端,且該第二電晶體具有耦接該第一節點的一第一電極端以及耦接該接地端的一第二電極端;以及其中,當在該接合墊上發生該瞬變事件時,該觸發電路於該第一節點產生一觸發電壓以導通該第三電晶體,藉以提供介於該接合墊與該接地端之間的一放電路徑。 A protection circuit coupled to a bonding pad includes: a trigger circuit including a first transistor and a second transistor that are coupled in series between the bonding pad and a ground terminal and have a first conductivity type, Wherein, the trigger circuit detects whether a transient event occurs on the bonding pad; and a discharge circuit is coupled between the bonding pad and the ground terminal and is controlled by the trigger circuit. The discharge circuit includes a A third transistor of the first conductivity type is between the bonding pad and the ground terminal; wherein the first transistor has a first electrode terminal coupled to the bonding pad and a first node coupled to a second electrode terminal, and the second transistor has a first electrode terminal coupled to the first node and a second electrode terminal coupled to the ground terminal; and wherein, when the transient event occurs on the bonding pad At this time, the trigger circuit generates a trigger voltage at the first node to turn on the third transistor, thereby providing a discharge path between the bonding pad and the ground terminal. 如請求項1之保護電路,其中,當在該接合墊上發生該瞬變事件時,該第一電晶體與該第二電晶體皆導通。 The protection circuit of claim 1, wherein when the transient event occurs on the bonding pad, both the first transistor and the second transistor are turned on. 如請求項1之保護電路,其中,該第一導電類型為N型。 The protection circuit of claim 1, wherein the first conductivity type is N type. 如請求項1之保護電路,其中:該觸發電路更包括一電阻器;該第一電晶體更具有耦接一第二節點的一控制電極端;該第二電晶體更具有耦接該第二節點的一控制電極端;該第三電晶體具有耦接該接合墊的一第一電極端、耦接該接地端 的一第二電極端、以及耦接該第一節點的一控制電極端,且該觸發電壓產生於該第一節點;以及該電阻器耦接於該第二節點與該接地端之間。 The protection circuit of claim 1, wherein: the trigger circuit further includes a resistor; the first transistor further has a control electrode terminal coupled to a second node; the second transistor further has a control electrode terminal coupled to the second node. a control electrode terminal of the node; the third transistor has a first electrode terminal coupled to the bonding pad, coupled to the ground terminal a second electrode terminal and a control electrode terminal coupled to the first node, and the trigger voltage is generated at the first node; and the resistor is coupled between the second node and the ground terminal. 如請求項4之保護電路,其中,該第三電晶體更具有一基極,以及該第三電晶體的該基極耦接該第二節點。 The protection circuit of claim 4, wherein the third transistor further has a base, and the base of the third transistor is coupled to the second node. 如請求項4或5之保護電路,其中,當在該接合墊上接收一供應電壓時,該第一電晶體、該第二電晶體、與該第三電晶體皆關斷。 The protection circuit of claim 4 or 5, wherein when receiving a supply voltage on the bonding pad, the first transistor, the second transistor, and the third transistor are all turned off. 如請求項1之保護電路,其中:該觸發電路更包括一電阻器;該第一電晶體更具有一控制電極端;該第二電晶體更具有耦接一電源端的一控制電極端;該第三電晶體具有耦接該接合墊的一第一電極端、耦接該接地端的一第二電極端、以及耦接該第一節點的一控制電極端,且該觸發電壓產生於該第一節點;以及該電阻器耦接於該第一電晶體的該控制電極端與該第一節點之間。 The protection circuit of claim 1, wherein: the trigger circuit further includes a resistor; the first transistor further has a control electrode terminal; the second transistor further has a control electrode terminal coupled to a power terminal; The three-transistor has a first electrode terminal coupled to the bonding pad, a second electrode terminal coupled to the ground terminal, and a control electrode terminal coupled to the first node, and the trigger voltage is generated at the first node ; And the resistor is coupled between the control electrode terminal of the first transistor and the first node. 如請求項7之保護電路,其中,該第三電晶體更具有一基極,以及該第三電晶體的該基極耦接該第一節點。 The protection circuit of claim 7, wherein the third transistor further has a base, and the base of the third transistor is coupled to the first node. 如請求項7或8之保護電路,其中,當在該接合墊上接收一第一供應電壓且該電源端接收一第二供應電壓時,該第一電晶體與該第三電晶體關斷,且該第二電晶體導通。 The protection circuit of claim 7 or 8, wherein when a first supply voltage is received on the bonding pad and a second supply voltage is received at the power terminal, the first transistor and the third transistor are turned off, and The second transistor is turned on. 如請求項9之保護電路,其中,該第一供應電壓大 於該第二供應電壓。 The protection circuit of claim 9, wherein the first supply voltage is greater than at the second supply voltage. 如請求項1之保護電路,其中,當在該接合墊上發生該瞬變事件時,該第一電晶體、該第二電晶體、與該第三電晶體皆導通。 The protection circuit of claim 1, wherein when the transient event occurs on the bonding pad, the first transistor, the second transistor, and the third transistor are all turned on. 如請求項1之保護電路,其中,該第三電晶體的耐壓程度高於該第一電晶體與該第二電晶體的耐壓程度。 The protection circuit of claim 1, wherein the voltage withstand level of the third transistor is higher than the voltage withstand levels of the first transistor and the second transistor. 如請求項1之保護電路,其中,該第一電晶體的耐壓程度高於該第二電晶體與該第二電晶體的耐壓程度。 The protection circuit of claim 1, wherein the voltage resistance of the first transistor is higher than the voltage resistance of the second transistor and the second transistor. 如請求項1之保護電路,其中,該保護電路為瞬態電壓抑制器(Transient Voltage Suppressor,TVS)。 The protection circuit of claim 1, wherein the protection circuit is a transient voltage suppressor (Transient Voltage Suppressor, TVS).
TW111109312A 2022-03-15 2022-03-15 Protection circuit TWI823291B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW111109312A TWI823291B (en) 2022-03-15 2022-03-15 Protection circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW111109312A TWI823291B (en) 2022-03-15 2022-03-15 Protection circuit

Publications (2)

Publication Number Publication Date
TW202339384A TW202339384A (en) 2023-10-01
TWI823291B true TWI823291B (en) 2023-11-21

Family

ID=89722605

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111109312A TWI823291B (en) 2022-03-15 2022-03-15 Protection circuit

Country Status (1)

Country Link
TW (1) TWI823291B (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI587593B (en) * 2016-03-22 2017-06-11 世界先進積體電路股份有限公司 Integrated circuits and electrostatic discharge protection circuits
US10475781B2 (en) * 2015-12-15 2019-11-12 Samsung Electronics Co., Ltd. Electrostatic discharge protection device capable of adjusting holding voltage
CN112740498A (en) * 2020-11-30 2021-04-30 英诺赛科(苏州)半导体有限公司 Electronic device and electrostatic discharge protection circuit
TWI732615B (en) * 2020-07-01 2021-07-01 世界先進積體電路股份有限公司 Electrostatic discharge protection device and circuit

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10475781B2 (en) * 2015-12-15 2019-11-12 Samsung Electronics Co., Ltd. Electrostatic discharge protection device capable of adjusting holding voltage
TWI587593B (en) * 2016-03-22 2017-06-11 世界先進積體電路股份有限公司 Integrated circuits and electrostatic discharge protection circuits
TWI732615B (en) * 2020-07-01 2021-07-01 世界先進積體電路股份有限公司 Electrostatic discharge protection device and circuit
CN112740498A (en) * 2020-11-30 2021-04-30 英诺赛科(苏州)半导体有限公司 Electronic device and electrostatic discharge protection circuit

Also Published As

Publication number Publication date
TW202339384A (en) 2023-10-01

Similar Documents

Publication Publication Date Title
JP4401500B2 (en) Semiconductor device and method for reducing parasitic bipolar effect in electrostatic discharge
US5946175A (en) Secondary ESD/EOS protection circuit
KR100697750B1 (en) Static protection circuit device and semiconductor integrated circuit device using same
US7397280B2 (en) High-voltage tolerant power-rail ESD clamp circuit for mixed-voltage I/O interface
US7982523B2 (en) Electro static discharge clamping device
TWI784502B (en) Electrostatic discharge protection circuit
WO2017157117A1 (en) Electrostatic discharge (esd) protective circuit for integrated circuit
US6879476B2 (en) Electrostatic discharge circuit and method therefor
US5349227A (en) Semiconductor input protective device against external surge voltage
US6317306B1 (en) Electrostatic discharge protection circuit
JPH07193195A (en) Cmos integrated circuit device
KR100313154B1 (en) Electrostatic discharge protection circuit
CN110311667B (en) Port circuit with port voltage protection circuit
TWI823291B (en) Protection circuit
US6707653B2 (en) Semiconductor controlled rectifier for use in electrostatic discharge protection circuit
US11418027B1 (en) Electrostatic discharge protection circuit
JP2016119389A (en) Electrostatic protection circuit and semiconductor integrated circuit device
US11894674B2 (en) Protection circuit
CN116845842A (en) Protection circuit
TWI808399B (en) Electrostatic discharge protection circuit
JPH04332160A (en) Output buffer
US10177135B2 (en) Integrated circuit and electrostatic discharge protection circuit thereof
TWI840989B (en) Electrostatic discharge protection circuit and electronic circuit
WO2022188326A1 (en) Electrostatic protection circuit and semiconductor device
JP4079920B2 (en) Electrostatic discharge protection circuit