TWI822098B - Method for detecting die fixing state by sound wave or electromagnetic wave - Google Patents
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Abstract
Description
本發明是涉及一種固晶方法,尤其是一種利用聲波或電磁波檢測固晶狀態的方法。The present invention relates to a method of solid crystal, in particular to a method of detecting the status of solid crystal by using acoustic waves or electromagnetic waves.
積體電路藉由大批方式,經過多道程序,製作在半導體晶圓上,晶圓進一步分割成複數晶粒。換言之,晶粒是以半導體材料製作而成未經封裝的一小塊積體電路本體。分割好的複數晶粒整齊貼附在一承載裝置上,接著一承載框負責運送承載裝置,然後固晶裝置將該等晶粒依序轉移至基板,俾利進行後續加工程序。Integrated circuits are manufactured on semiconductor wafers in a mass manner and through multiple processes, and the wafers are further divided into a plurality of dies. In other words, a die is a small unpackaged integrated circuit body made of semiconductor materials. The divided plurality of die are neatly attached to a carrier device, and then a carrier frame is responsible for transporting the carrier device. Then the die bonding device sequentially transfers the die to the substrate for subsequent processing.
進一步地說,在晶粒轉移至基板的過程中,晶粒的局部區塊脫離固晶裝置並且接觸基板以形成一貼合波(bond wave)。貼合波從晶粒的局部區塊往晶粒的其他區塊的方向擴散,使得晶粒逐漸脫離固晶裝置並且固定於基板上。Furthermore, during the process of transferring the die to the substrate, local areas of the die break away from the die bonding device and contact the substrate to form a bond wave. The bonding wave spreads from a local area of the die to other areas of the die, causing the die to gradually separate from the die-bonding device and be fixed on the substrate.
然而,晶粒的底面與基板的頂面之間可能會共同包住氣泡而形成一空洞(void),或者晶粒的底面黏附一些微粒,造成晶粒的底面沒有與基板的頂面緊密貼合。一旦晶粒沒有與基板緊密貼合,將會導致挑揀或辨識等晶粒的後續加工程序容易受到氣泡或微粒的影響,降低後續加工製成的產品良率,業者通常會將沒有與基板緊密貼合的晶粒挑出。However, the bottom surface of the die and the top surface of the substrate may enclose air bubbles to form a void, or some particles may adhere to the bottom surface of the die, resulting in the bottom surface of the die not being in close contact with the top surface of the substrate. . Once the die is not closely adhered to the substrate, subsequent processing procedures such as sorting or identification of the die will be easily affected by bubbles or particles, reducing the yield of subsequent processed products. The industry will usually process the die that is not closely adhered to the substrate. The combined grains are picked out.
惟,基板上的晶粒為數眾多,且晶粒的尺寸很小,難以精確地辨識出哪些晶粒緊密貼合於基板以及哪些晶粒沒有與基板緊密貼合。因此,業者基本上沒有辦法將沒有與基板緊密貼合的晶粒挑出。However, there are a large number of crystal grains on the substrate and the size of the crystal grains is very small. It is difficult to accurately identify which crystal grains are closely adhered to the substrate and which crystal grains are not closely adhered to the substrate. Therefore, there is basically no way for the industry to pick out the dies that are not in close contact with the substrate.
本發明的主要目的在於提供一種利用聲波或電磁波檢測貼固晶狀態的方法,能夠精確地辨識出晶粒是否與基板緊密貼合。The main purpose of the present invention is to provide a method for detecting the state of bonded crystals using acoustic waves or electromagnetic waves, which can accurately identify whether the crystal grains are closely adhered to the substrate.
為了達成前述的目的,本發明提供一種利用聲波或電磁波檢測固晶狀態的方法,包括下列步驟:一晶粒的局部區塊脫離一固晶裝置並且接觸一基板以形成一貼合波;貼合波從晶粒的局部區塊往晶粒的其他區塊的方向擴散並且具有一擴散趨勢,使得晶粒逐漸脫離固晶裝置並且固定於基板上;一聲波或一電磁波沿著晶粒的表面傳播;感測不同位置的聲波的音量或振幅或頻率變化程度,或感測不同位置的電磁波的振幅或頻率變化程度並且獲得複數感測訊息;根據該等感測訊息判定晶粒與固晶裝置分離的距離變化程度;根據晶粒與固晶裝置分離的距離變化程度判定貼合波的擴散趨勢;以及根據貼合波的擴散趨勢判定晶粒是否與基板緊密貼合。In order to achieve the aforementioned goals, the present invention provides a method for detecting the state of a solid die using acoustic waves or electromagnetic waves, which includes the following steps: a local block of a die breaks away from a die solid device and contacts a substrate to form a bonding wave; bonding The wave spreads from a local area of the crystal grain to other areas of the crystal grain and has a diffusion tendency, causing the crystal grain to gradually break away from the die-fixing device and be fixed on the substrate; an acoustic wave or an electromagnetic wave propagates along the surface of the crystal grain ; Sensing the volume, amplitude or frequency changes of sound waves at different locations, or sensing the amplitude or frequency changes of electromagnetic waves at different locations and obtaining multiple sensing messages; determining the separation of the die and the die-bonding device based on the sensing messages The degree of distance change; the diffusion trend of the bonding wave is determined based on the change in the distance between the die and the die-bonding device; and the diffusion trend of the bonding wave is used to determine whether the die is closely attached to the substrate.
在一些實施例中,形成貼合波的步驟進一步包括:固晶裝置藉由一正壓產生一氣流吹拂晶粒的局部區塊,使得晶粒的局部區塊脫離固晶裝置並且撓曲變形以接觸基板。In some embodiments, the step of forming a bonding wave further includes: the die-bonding device generates an airflow through a positive pressure to blow the local area of the die, so that the local area of the die breaks away from the die-bonding device and flexes and deforms. Contact the substrate.
在一些實施例中,聲波或電磁波沿著晶粒的表面傳播的步驟進一步包括:聲波或電磁波沿著晶粒的表面在固晶裝置與晶粒之間的一縫隙中傳播,接著聲波或電磁波進入固晶裝置的複數通道;以及其中,感測不同位置的聲波的音量或振幅或頻率變化程度,或感測不同位置的電磁波的振幅或頻率變化程度的步驟進一步包括:複數感測器分別感測通過該等通道的聲波的音量或振幅或頻率變化程度,或複數感測器分別感測通過該等通道的電磁波的振幅或頻率變化程度,並且獲得複數感測訊息。In some embodiments, the step of propagating acoustic waves or electromagnetic waves along the surface of the crystal grain further includes: propagating the acoustic wave or electromagnetic wave along the surface of the crystal grain in a gap between the crystal bonding device and the crystal grain, and then the acoustic wave or electromagnetic wave enters A plurality of channels of the solid crystal device; and wherein the step of sensing the volume or amplitude or frequency change degree of the sound wave at different positions, or sensing the amplitude or frequency change degree of the electromagnetic wave at different positions further includes: a plurality of sensors respectively sensing The volume, amplitude or frequency changes of the sound waves passing through the channels, or the plurality of sensors respectively sense the amplitude or frequency changes of the electromagnetic waves passing through the channels, and obtain a plurality of sensing information.
在一些實施例中,聲波或電磁波沿著晶粒的表面傳播的步驟進一步包括:正壓產生的氣流在接觸到晶粒的表面以後產生一風切聲的聲波。In some embodiments, the step of propagating the acoustic wave or the electromagnetic wave along the surface of the crystal grain further includes: the air flow generated by the positive pressure generates a wind-shearing sound wave after contacting the surface of the crystal grain.
在一些實施例中,聲波或電磁波沿著晶粒的表面傳播的步驟進一步包括:一聲波產生裝置設置在固晶裝置與晶粒的外側並且產生一聲波。In some embodiments, the step of propagating acoustic waves or electromagnetic waves along the surface of the crystal grain further includes: an acoustic wave generating device is disposed outside the crystal bonding device and the crystal grain and generates an acoustic wave.
在一些實施例中,聲波或電磁波沿著晶粒的表面傳播的步驟進一步包括:一電磁波產生裝置設置在固晶裝置與晶粒的外側並且產生一電磁波。In some embodiments, the step of propagating acoustic waves or electromagnetic waves along the surface of the crystal grain further includes: an electromagnetic wave generating device is disposed outside the crystal bonding device and the crystal grain and generates an electromagnetic wave.
在一些實施例中,判定晶粒與固晶裝置分離的距離變化程度的步驟進一步包括:一處理單元接收該等感測訊息並且根據該等感測訊息判定不同位置的聲波的音量或振幅或頻率變化程度,或判定不同位置的電磁波的振幅或頻率變化程度,處理單元進一步根據不同位置的聲波音量或振幅或頻率變化程度,或根據不同位置的電磁波的振幅或頻率變化程度判定晶粒與固晶裝置分離的距離變化程度;其中,判定貼合波的擴散趨勢的步驟進一步包括:處理單元根據晶粒與固晶裝置分離的距離變化程度判定貼合波的擴散趨勢;以及其中,判定晶粒是否與基板緊密貼合的步驟進一步包括:處理單元根據貼合波的擴散趨勢判定晶粒是否與基板緊密貼合。In some embodiments, the step of determining the change in distance between the die and the die-bonding device further includes: a processing unit receiving the sensing information and determining the volume, amplitude or frequency of the sound waves at different locations based on the sensing information. The degree of change, or the degree of change in the amplitude or frequency of electromagnetic waves at different locations, is determined. The processing unit further determines the degree of change in the amplitude or frequency of the electromagnetic wave at different locations, or the degree of change in the amplitude or frequency of the electromagnetic wave in different locations. The degree of change in the distance between device separation; wherein, the step of determining the diffusion trend of the bonding wave further includes: the processing unit determines the diffusion trend of the bonding wave based on the degree of change in the distance between the crystal grain and the die-bonding device; and wherein, determining whether the crystal grain The step of closely bonding with the substrate further includes: the processing unit determines whether the crystal grain is closely bonded with the substrate based on the diffusion trend of the bonding wave.
本發明的功效在於,本發明的方法能夠利用聲波或電磁波檢測固晶狀態,精確地辨識出哪些晶粒緊密貼合於基板以及哪些晶粒沒有與基板緊密貼合。The effect of the present invention is that the method of the present invention can use acoustic waves or electromagnetic waves to detect the solid state of the crystal, and accurately identify which crystal grains are closely adhered to the substrate and which crystal grains are not closely adhered to the substrate.
以下配合圖式及元件符號對本發明的實施方式做更詳細的說明,俾使熟習該項技藝者在研讀本說明書後能據以實施。The following is a more detailed description of the embodiments of the present invention with reference to drawings and component symbols, so that those skilled in the art can implement them after reading this specification.
請參閱圖1A至圖9,圖1A和圖1B是本發明的方法的流程圖,圖2A顯示了固晶裝置10和感測器80的示意圖,圖2B顯示了固晶裝置10和感測器80的俯視圖,圖3顯示了氣孔11~14和真空裝置30和氣體供應裝置40的連接關係的示意圖,圖4顯示了感測器80和處理單元90的連接關係的示意圖,圖5和圖6是本發明的方法的第一實施例的步驟S100~S800的示意圖,圖7顯示了晶粒20的隆起部分21影響聲波61的音量變化程度和貼合波的擴散趨勢60的示意圖,圖8顯示了當晶粒20與基板50之間無空洞或微粒時貼合波的擴散趨勢60的示意圖,圖9顯示了當晶粒20與基板50之間有空洞71或微粒時貼合波的擴散趨勢60的示意圖。本發明提供一種利用聲波或電磁波檢測固晶狀態的方法,包括下列步驟:Please refer to FIGS. 1A to 9 . FIGS. 1A and 1B are flow charts of the method of the present invention. FIG. 2A shows a schematic diagram of the die-
步驟S100,如圖1A及圖5所示,一固晶裝置10藉由一負壓31產生一吸附力吸附一晶粒20。更明確地說,如圖2A及圖2B所示,固晶裝置10具有四個氣孔11~14,該等氣孔11~14分布於固晶裝置10的四個角落101~104;如圖3所示,該等氣孔11~14連接一真空裝置30及一氣體供應裝置40;如圖2B、圖3和圖5所示,真空裝置30對該等氣孔11~14抽氣以產生負壓31,固晶裝置10藉由負壓31產生吸附力吸附晶粒20的四個角落,使得晶粒20的周圍緊密貼合在固晶裝置10的底面的周圍。因為晶粒20的周圍能夠緊密貼合在固晶裝置10的底面的周圍,所以晶粒20的周圍與固晶裝置10的底面的周圍之間完全沒有空隙,避免外部空氣進入而影響負壓31產生吸附力吸附晶粒20的效果。
Step S100 , as shown in FIG. 1A and FIG. 5 , a die
步驟S200,如圖1A、圖6及圖7所示,固晶裝置10藉由一正壓41產生一氣流吹拂晶粒20的局部區塊,使得晶粒20的局部區塊脫離固晶裝置10並且撓曲變形以接觸一基板50,晶粒20的局部區塊接觸到基板50以後形成一貼合波(bond wave)。第一實施例的步驟S200可進一步分成以下兩種實施方式。
Step S200 , as shown in FIG. 1A , FIG. 6 and FIG. 7 , the
關於第一種實施方式,晶粒20的局部區塊為晶粒20的一角落,固晶裝置10藉由正壓41產生氣流吹拂晶粒20的角落,使得晶粒20的角落脫離固晶裝置10並且撓曲變形以接觸基板50,晶粒20的角落接觸到基板50以後形成貼合波。更詳而言之,真空裝置30停止對固晶裝置10的角落101的氣孔11抽氣,氣孔11停止藉由負壓31產生吸附力吸附晶粒20的角落,同時氣體供應裝置40開始對固晶裝置10的角落101的氣孔11吹氣以產生正壓41,氣孔11開始藉由正壓41產生氣流吹拂晶粒20的角落。真空裝置30仍持續對固晶裝置10的其他角落102~104的氣孔12~14抽氣,使得固晶裝置10的其他角落102~104的氣孔12~14仍維持藉由負壓31產生吸附力吸附晶粒20的其他角落。藉此,晶粒20不僅能夠保持固定在固晶裝置10,還能夠確保整個晶粒20只有其角落撓曲變形且最為突出,讓晶粒20的角落能夠以點接觸的方式接觸基板50。因為晶粒20的角落以點接觸的方式接觸基板50,所以晶粒20的角落及其鄰近之處會產生鍵結力,此鍵結力會進一步形成貼合波。更詳而言之,真空裝置30依序停止對固晶裝置10的其他角落102~104的氣孔12~14抽氣,氣孔12~14沿著對角線的方向依序停止提供負壓31,氣體供應裝置40依序開始對固晶裝置10的其他角落102~104的氣孔12~14吹氣,氣孔12~14沿著對角線的方向依序開始提供正壓41以產生氣流吹拂晶粒20的其他角落,使得晶粒20的其他角落沿著對角線的方向依序被氣流吹拂以產生一壓力差波動,壓力差波動能夠進一步讓晶粒20的角落在接觸到基板50以後形成貼合波。Regarding the first embodiment, a local area of the die 20 is a corner of the die 20 , and the
關於第二種實施方式,晶粒20的局部區塊為晶粒20的一側邊,固晶裝置10藉由正壓41產生氣流吹拂晶粒20的側邊,使得晶粒20的側邊脫離固晶裝置10並且撓曲變形以接觸基板50,晶粒20的側邊接觸到基板50以後形成貼合波。更詳而言之,真空裝置30停止對固晶裝置10的側邊15的二角落101、102的氣孔11、12抽氣,氣孔11、12停止藉由負壓31產生吸附力吸附晶粒20的側邊的二角落,同時氣體供應裝置40開始對固晶裝置10的側邊15的二角落101、102的氣孔11、12吹氣以產生正壓41,氣孔11、12開始藉由正壓41產生氣流吹拂晶粒20的側邊的二角落。真空裝置30仍持續對固晶裝置10的另一側邊16的二角落103、104的氣孔13、14抽氣,使得氣孔13、14仍維持藉由負壓31產生吸附力吸附晶粒20的另一側邊的二角落。藉此,晶粒20不僅能夠保持固定在固晶裝置10,還能夠確保整個晶粒20只有其側邊撓曲變形且最為突出,讓晶粒20的側邊能夠以線接觸的方式接觸基板50。因為晶粒20的側邊以線接觸的方式接觸基板50,所以晶粒20的側邊及其鄰近之處會產生鍵結力,此鍵結力會進一步形成貼合波。更詳而言之,真空裝置30停止對固晶裝置10的另一側邊16的二角落103、104的氣孔13、14抽氣,氣孔13、14停止提供負壓31,氣體供應裝置40依序開始對固晶裝置10的另一側邊16的二角落103、104的氣孔13、14吹氣,氣孔13、14開始提供正壓41以產生氣流吹拂晶粒20的另一側邊,使得晶粒20從一側往另一側的方向依序被氣流吹拂以產生一壓力差波動,壓力差波動能夠進一步讓晶粒20的側邊在接觸到基板50以後形成貼合波。Regarding the second embodiment, a local area of the die 20 is one side of the die 20 , and the
步驟S300,如圖1A、圖6及圖7所示,貼合波從晶粒20的局部區塊往晶粒20的其他區塊的方向擴散並且具有一擴散趨勢60,使得晶粒20逐漸脫離固晶裝置10並且晶粒20逐漸固定於基板50上。第一實施例的步驟S300可進一步分成以下兩種實施方式。Step S300, as shown in FIG. 1A, FIG. 6 and FIG. 7, the bonding wave spreads from the local area of the die 20 to other areas of the
關於第一種實施方式,壓力差波動引導貼合波沿著晶粒20的一對角線的方向擴散。關於第二種實施方式,壓力差波動引導貼合波從晶粒20的一側往另一側的方向擴散。Regarding the first embodiment, the pressure difference fluctuation guides the bonding wave to spread along the diagonal direction of the
在一些實施例中,該等氣孔的數量和分布情形可以有多種可能性。舉例來說,該等氣孔的數量為六個,其中四個氣孔分布於固晶裝置10的四個角落,另外二個氣孔分布於固晶裝置10的相對二側邊。舉例來說,該等氣孔的數量為九個,其中四個氣孔分布於固晶裝置10的四個角落,另外四個氣孔分布於固晶裝置10的四個側邊且分別位於該等角落之間。舉例來說,該等氣孔的數量只有兩個,並且分布在固晶裝置10的相對二角落或相對二側邊。舉例來說,固晶裝置10只有一個氣孔,氣孔的位置位在固晶裝置10的軸心。無論氣孔的數量和分布情形如何變化,基本上這些實施例的步驟S200和步驟S300都相當類似,都能夠形成貼合波和擴散貼合波。上述示例僅列舉說明氣孔的數量和分布情形的多樣性,並非用以限制本發明的範圍。In some embodiments, the number and distribution of the pores may have multiple possibilities. For example, the number of the air holes is six, four of which are distributed at four corners of the
步驟S400,如圖1A、圖6及圖7所示,一聲波61沿著晶粒20的表面傳播。具體來說,如圖2A及圖2B所示,固晶裝置10開設複數通道17,該等通道17均勻分布於固晶裝置10;如圖6及圖7所示,正壓41產生的氣流在接觸到晶粒20的表面以後產生一風切聲的聲波61,聲波61沿著晶粒20的表面在固晶裝置10與晶粒20之間的一縫隙70中傳播,接著聲波61進入固晶裝置10的該等通道17。In step S400, as shown in FIG. 1A, FIG. 6 and FIG. 7, the
步驟S500,如圖1A、圖4、圖6及圖7所示,感測不同位置的聲波61的音量變化程度並且獲得複數感測訊息81。具體來說,如圖2A及圖2B所示,複數感測器80分別設置於該等通道17的開口;由於風切聲的聲波61是一種可聽聲波,因此感測器80為麥克風,能夠接收可聽聲波。如圖6所示,當晶粒20與基板50之間無空洞或微粒時,由於縫隙70會沿著貼合波的擴散趨勢60逐漸變大,縫隙70愈大,風切聲的聲波61的音量變化程度愈大,因此通過不同通道17的風切聲的聲波61的音量變化程度為V1
V2
V3
V4
V5。如圖7所示,當晶粒20與基板50之間共同包住氣泡而形成一空洞71(void)或晶粒20的底面黏附一些微粒(圖未示)時,晶粒20會向上隆起,晶粒20的隆起部分21擋住或靠近其中一通道17,以致於聲波61無法進入其中一通道17,導致音量改變,因此通過不同通道17的聲波61的音量變化程度為V1
V3
V4
V5且V2
0。如圖4所示,該等感測器80分別感測通過該等通道17的聲波61的音量變化程度,並且獲得複數感測訊息81。
Step S500, as shown in FIG. 1A, FIG. 4, FIG. 6 and FIG. 7, senses the volume change degree of the
步驟S600,如圖1A、圖4、圖6及圖7所示,根據該等感測訊息81判定晶粒20與固晶裝置10分離的距離變化程度。更明確地說,該等感測器80電性連接一處理單元90。如圖4和圖6所示,當晶粒20與基板50之間無空洞或微粒時,處理單元90接收該等感測訊息81並且根據該等感測訊息81判定通過不同通道17的風切聲的聲波61的音量變化程度為V1
V2
V3
V4
V5,處理單元90進一步根據通過不同通道17的風切聲的聲波61的音量變化程度為V1
V2
V3
V4
V5判定晶粒20與固晶裝置10分離的距離變化程度。如圖4和圖7所示,當晶粒20與基板50之間有空洞71或微粒時,處理單元90接收該等感測訊息81並且根據該等感測訊息81判定通過不同通道17的聲波61的音量變化程度為V1
V3
V4
V5且V2
0判定晶粒20與固晶裝置10分離的距離變化程度。
Step S600 , as shown in FIG. 1A , FIG. 4 , FIG. 6 and FIG. 7 , determines the change degree of the distance between the die 20 and the die-
步驟S700,如圖1A、圖4、圖6及圖7所示,處理單元90根據晶粒20與固晶裝置10分離的距離變化程度判定貼合波的擴散趨勢60。In step S700 , as shown in FIGS. 1A , 4 , 6 and 7 , the
步驟S800,如圖1B、圖4及圖6至圖9所示,處理單元90根據貼合波的擴散趨勢60判定晶粒20是否與基板50緊密貼合。如圖8所示,當晶粒20與基板50之間無空洞或微粒時,貼合波的擴散趨勢60大致上是沿著晶粒20的對角線的方向D1或從晶粒20的一側往另一側的方向D2、D3延伸,從而能夠判定晶粒20與基板50緊密貼合。如圖9所示,當晶粒20與基板50之間有空洞71或微粒時,貼合波的擴散趨勢60大致上是沿著晶粒20的對角線的方向D1A或從晶粒20的一側往另一側的方向D2A、D3A繞過隆起部分21延伸,從而能夠判定晶粒20沒有與基板50緊密貼合。In step S800 , as shown in FIG. 1B , FIG. 4 , and FIGS. 6 to 9 , the
圖10A是本發明的方法的第二實施例的步驟S200~S800的示意圖,其中顯示聲波61的振幅變化程度差異,圖10B顯示了晶粒20的隆起部分21影響聲波61的振幅變化程度和貼合波的擴散趨勢60的示意圖,圖11A是本發明的方法的第二實施例的步驟S200~S800的示意圖,其中顯示聲波61的頻率變化程度差異,圖11B顯示了晶粒20的隆起部分21影響聲波61的頻率變化程度和貼合波的擴散趨勢60的示意圖。如圖10A至圖11B所示,在結構方面,第二實施例與第一實施例的差異在於:一聲波產生裝置100設置在固晶裝置10與晶粒20的外側並且產生一聲波61。一般來說,聲波61可按照頻率範圍分類,從低頻率到高頻率區分成次聲波、可聽聲波、超聲波和兆聲波,聲波產生裝置100可按照產生的聲波61頻率範圍配置為次聲波產生裝置、可聽聲波產生裝置、超聲波產生裝置和兆聲波產生裝置,感測器80可按照接收的聲波61頻率範圍配置為次聲波感測器、可聽聲波感測器、超聲波感測器和兆聲波感測器。不同類型的聲波產生裝置100能夠產生不同的聲波61振幅和頻率範圍(例如,超聲波產生裝置能夠產生超聲波的振幅和頻率範圍,以此類推),不同類型的感測器80能夠接收不同的聲波61振幅和頻率範圍(例如,超聲波感測器能夠接收超聲波振幅和頻率範圍,以此類推)。
FIG. 10A is a schematic diagram of steps S200 to S800 of the second embodiment of the method of the present invention, which shows the difference in the amplitude change of the
如圖10A至圖11B所示,在方法方面,第二實施例與第一實施例的差異在於:步驟S500,感測不同位置的聲波61的振幅或頻率變化程度並且獲得複數感測訊息81。如圖10A所示,當晶粒20與基板50之間無空洞或微粒時,由於縫隙70會沿著貼合波的擴散方向逐漸變大,縫隙70愈大,聲波61的振幅變化程度愈大,因此通過不同通道17的聲波61的振幅變化程度為SA1>SA2>SA3>SA4>SA5。如圖10B所示,當晶粒20與基板50之間有空洞71或微粒時,晶粒20會向上隆起,晶粒20的隆起部分21擋住或靠近其中一通道17,以致於聲波61無法進入其中一通道17,導致振幅改變,因此通過不同通道17的聲波61的振幅變化程度為SA1>SA3>SA4>SA5且SA2=0。如圖11A所示,當晶粒20與基板50之間無空洞或微粒時,由於縫隙70會沿著貼合波的擴散趨勢60逐漸變大,縫隙70愈大,聲波61的頻率變化程度愈小,因此通過不同通道17的聲波61的頻率變化程度為SF1<SF2<SF3<SF4<SF5。如圖11B所示,當晶粒20與基板50之間有空洞71或微粒時,晶粒20會向上隆起,晶粒20的隆起部分21擋住或靠近其中一通道17,以致於聲波61無法進入其中一通道17,導致頻率改變,因此通過不同通道17的聲波61的頻率變化程度為SF1<SF3<SF4<SF5且SF2=0。
As shown in FIGS. 10A to 11B , in terms of method, the difference between the second embodiment and the first embodiment lies in step S500 , sensing the amplitude or frequency change degree of the
圖12A是本發明的方法的第三實施例的步驟S200~S800的示意圖,其中顯示電磁波62的振幅變化程度差異,圖12B顯示了晶粒20的隆起部分21影響電磁波62的振幅變化程度和貼合波的擴散趨勢60的示意圖,圖13A是本發明的方法的第三實施例的步驟S200~S800的示意圖,其中顯示電磁波62的頻率變化程度差異,圖13B顯示了晶粒20的隆起部分21影響電磁波62的頻率變化程度和貼合波的擴散趨勢60的示意圖。如圖12A至圖13B所示,在結構方面,第三實施例與第二實施例的差異在於:以一電磁波產生裝置110取代聲波產生裝置100,電磁波產生裝置110產生一電磁波62,電磁波62取代聲波61。一般來說,電磁波62可按照頻率範圍分類,從低頻率到高頻率區分成無線電波、兆赫輻射、微波、紅外線、可見光、紫外線、X射線和伽馬射線,電磁波產生裝置110可按照產生的電磁波62頻率範圍配置為無線電波產生裝置、兆赫輻射產生裝置、微波產生裝置、紅外線產生裝置、可見光產生裝置、紫外線產生裝置、X射線產生裝置和伽馬射線產生裝置,感測器80可按照接收的電磁波62頻率範圍配置為無線電波感測器、兆赫輻射感測器、微波感測器、紅外線感測器、可見光感測器、紫外線感測器、X射線感測器和伽馬射線感測器。不同類型的電磁波產生裝置110能夠產生不同的電磁波62振幅和頻率範圍(例如,可見光產生裝置能夠產生可見光的振幅和頻率範圍,以此類推),不同類型的感測器80能夠接收對應的電磁波62的振幅和頻率範圍(例如,可見光感測器能夠接收可見光的振幅和頻率範圍,以此類推)。
FIG. 12A is a schematic diagram of steps S200 to S800 of the third embodiment of the method of the present invention, which shows the difference in the amplitude change of the
如圖12A至圖13B所示,在方法方面,第三實施例與第二實施例的差異在於:步驟S500,感測不同位置的電磁波62的振幅或頻率變化程度並且獲得複數感測訊息81。如圖12A所示,當晶粒20與基板50之間無空洞或微粒時,由於縫隙70會沿著貼合波的擴散趨勢60逐漸變大,縫隙70愈大,電磁波62的振幅變化程度愈大,因此通過不同通道17的電磁波62的振幅變化程度為EA1
EA2
EA3
EA4
EA5。如圖12B所示,當晶粒20與基板50之間有空洞71或微粒時,晶粒20會向上隆起,晶粒20的隆起部分21擋住或靠近其中一通道17,以致於電磁波62無法進入其中一通道17,導致振幅改變,因此通過不同通道17的電磁波62的振幅變化程度為EA1
EA3
EA4
EA5且EA2
0。如圖13A所示,當晶粒20與基板50之間無空洞或微粒時,由於縫隙70會沿著貼合波的擴散趨勢60逐漸變大,縫隙70愈大,電磁波62的頻率變化程度愈小,因此通過不同通道17的電磁波62的頻率變化程度為EF1
EF2
EF3
EF4
EF5。如圖13B所示,當晶粒20與基板50之間有空洞71或微粒時,晶粒20會向上隆起,晶粒20的隆起部分21擋住或靠近其中一通道17,以致於電磁波62無法進入其中一通道17,導致頻率改變,因此通過不同通道17的電磁波62的頻率變化程度為EF1
EF3
EF4
EF5且EF2
0。
As shown in FIGS. 12A to 13B , in terms of method, the difference between the third embodiment and the second embodiment is: step S500 , sensing the amplitude or frequency change degree of the
綜上所述,本發明的方法能夠利用聲波61或電磁波62檢測固晶狀態,精確地辨識出哪些晶粒20緊密貼合於基板50以及哪些晶粒20沒有與基板50緊密貼合。業者能夠將與基板50緊密貼合的該些晶粒20進行後續加工程序,以及將沒有與基板50緊密貼合的該些晶粒20挑揀出來。To sum up, the method of the present invention can detect the solid state of the crystal using
以上所述者僅為用以解釋本發明的較佳實施例,並非企圖據以對本發明做任何形式上的限制,是以,凡有在相同的發明精神下所作有關本發明的任何修飾或變更,皆仍應包括在本發明意圖保護的範疇。The above are only used to explain the preferred embodiments of the present invention, and are not intended to limit the present invention in any form. Therefore, any modifications or changes related to the present invention are made under the same spirit of the invention. , should still be included in the scope of protection intended by the present invention.
10:固晶裝置
101~104:角落
11~14:氣孔
15,16:側邊
17:通道
20:晶粒
21:隆起部分
30:真空裝置
31:負壓
40:氣體供應裝置
41:正壓
50:基板
60:貼合波的擴散趨勢
61:聲波
62:電磁波
70:縫隙
71:空洞
80:感測器
81:感測訊息
90:處理單元
100:聲波產生裝置
110:電磁波產生裝置
D1~D3,D1A~D3A:方向
S100~S800:步驟
V1~V5:風切聲的聲波的音量
SA1~SA5:聲波的振幅變化程度
SF1~SF5:聲波的頻率變化程度
EA1~EA5:電磁波的振幅變化程度
EF1~EF5:電磁波的頻率變化程度
10:
圖1A和圖1B是本發明的方法的流程圖。 圖2A顯示了固晶裝置和感測器的示意圖。 圖2B顯示了固晶裝置和感測器的仰視圖。 圖3顯示了氣孔和真空裝置和氣體供應裝置的連接關係的示意圖。 圖4顯示了感測器和處理單元的連接關係的示意圖。 圖5和圖6是本發明的方法的第一實施例的步驟S100~S800的示意圖。 圖7顯示了晶粒的隆起部分影響聲波的音量變化程度和貼合波的擴散趨勢的示意圖。 圖8顯示了當晶粒與基板之間無空洞或微粒時貼合波的擴散趨勢的示意圖。 圖9顯示了當晶粒與基板之間有空洞或微粒時貼合波的擴散趨勢的示意圖。 圖10A是本發明的方法的第二實施例的步驟S200~S800的示意圖,其中顯示聲波的振幅變化程度差異。 圖10B顯示了晶粒的隆起部分影響聲波的振幅變化程度和貼合波的擴散趨勢的示意圖。 圖11A是本發明的方法的第二實施例的步驟S200~S800的示意圖,其中顯示聲波的頻率變化程度差異。 圖11B顯示了晶粒的隆起部分影響聲波的頻率變化程度和貼合波的擴散趨勢的示意圖。 圖12A是本發明的方法的第三實施例的步驟S200~S800的示意圖,其中顯示電磁波的振幅變化程度差異。 圖12B顯示了晶粒的隆起部分影響電磁波的振幅變化程度和貼合波的擴散趨勢的示意圖。 圖13A是本發明的方法的第三實施例的步驟S200~S800的示意圖,其中顯示電磁波的頻率變化程度差異。 圖13B顯示了晶粒的隆起部分影響電磁波的頻率變化程度和貼合波的擴散趨勢的示意圖。 Figures 1A and 1B are flow charts of the method of the present invention. Figure 2A shows a schematic diagram of the die-bonding device and sensor. Figure 2B shows a bottom view of the die attach device and sensor. Figure 3 shows a schematic diagram of the connection relationship between the air hole and the vacuum device and the gas supply device. Figure 4 shows a schematic diagram of the connection relationship between the sensor and the processing unit. Figures 5 and 6 are schematic diagrams of steps S100 to S800 in the first embodiment of the method of the present invention. Figure 7 shows a schematic diagram showing how the bulge of the grain affects the volume change of the sound wave and the diffusion trend of the fit wave. Figure 8 shows a schematic diagram of the diffusion trend of the bonding wave when there are no voids or particles between the die and the substrate. Figure 9 shows a schematic diagram of the diffusion trend of the bonding wave when there are voids or particles between the die and the substrate. Figure 10A is a schematic diagram of steps S200 to S800 of the second embodiment of the method of the present invention, which shows the difference in the amplitude change of the sound wave. Figure 10B shows a schematic diagram showing how the bulge portion of the grain affects the amplitude change of the sound wave and the diffusion trend of the bonding wave. FIG. 11A is a schematic diagram of steps S200 to S800 of the second embodiment of the method of the present invention, which shows the difference in the frequency change degree of the sound wave. Figure 11B shows a schematic diagram showing how the bulging portion of the grain affects the frequency change degree of the sound wave and the diffusion trend of the bonding wave. FIG. 12A is a schematic diagram of steps S200 to S800 of the third embodiment of the method of the present invention, which shows the difference in the amplitude change of the electromagnetic wave. Figure 12B shows a schematic diagram showing how the bulge portion of the crystal grain affects the amplitude change of the electromagnetic wave and the diffusion trend of the bonding wave. FIG. 13A is a schematic diagram of steps S200 to S800 of the third embodiment of the method of the present invention, which shows the difference in the frequency change degree of the electromagnetic wave. Figure 13B shows a schematic diagram showing how the bulging portion of the crystal grain affects the frequency change degree of the electromagnetic wave and the diffusion trend of the bonding wave.
S100~S700:步驟 S100~S700: steps
Claims (7)
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CN109342573A (en) * | 2018-11-23 | 2019-02-15 | 京东方科技集团股份有限公司 | A kind of detection device of display panel, detection method, abutted equipment |
CN110349877A (en) * | 2019-07-12 | 2019-10-18 | 芯盟科技有限公司 | Detect the method and wafer bonding board of wafer bonding intensity |
TWI765762B (en) * | 2020-12-25 | 2022-05-21 | 梭特科技股份有限公司 | Method for fixing chips with corner or side contact without impact force |
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CN109342573A (en) * | 2018-11-23 | 2019-02-15 | 京东方科技集团股份有限公司 | A kind of detection device of display panel, detection method, abutted equipment |
CN110349877A (en) * | 2019-07-12 | 2019-10-18 | 芯盟科技有限公司 | Detect the method and wafer bonding board of wafer bonding intensity |
TWI765762B (en) * | 2020-12-25 | 2022-05-21 | 梭特科技股份有限公司 | Method for fixing chips with corner or side contact without impact force |
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