TWI815156B - Chip - Google Patents
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Abstract
Description
本發明是有關於一種晶片,且特別是有關於一種半導體晶片。 The present invention relates to a wafer, and in particular to a semiconductor wafer.
在現今的電子裝置中,當電子裝置中的晶片產生崩裂時,崩裂往往會影響晶片中的訊號或電壓的傳遞,進而導致晶片中的電路區塊完全失能。 In today's electronic devices, when a chip in the electronic device cracks, the crack often affects the transmission of signals or voltages in the chip, leading to complete loss of circuit blocks in the chip.
本發明提供一種晶片,可有效避免崩裂導致電路區塊的完全失能。 The present invention provides a chip that can effectively prevent chipping from causing complete disability of the circuit block.
本發明的晶片包括電路區塊。電路區塊包括第一電晶體及第二電晶體。第一電晶體被區分為互相並聯的多個第一子電晶體。第二電晶體被區分為互相並聯的多個第二子電晶體。第一子電晶體及第二子電晶體互相交錯設置在電路區塊的第一列及第二列中。設置在第一列及第二列的第一電晶體分別透過不同訊號線接收第一輸入訊號。設置在第一列及第二列的第二電晶體分別透過 不同訊號線接收第二輸入訊號。 The wafer of the present invention includes circuit blocks. The circuit block includes a first transistor and a second transistor. The first transistor is divided into a plurality of first sub-transistors connected in parallel. The second transistor is divided into a plurality of second sub-transistors connected in parallel with each other. The first sub-transistors and the second sub-transistors are arranged alternately in the first column and the second column of the circuit block. The first transistors arranged in the first column and the second column respectively receive the first input signal through different signal lines. The second transistors arranged in the first column and the second column respectively pass through Different signal lines receive the second input signal.
本發明的晶片包括電路區塊、電力軌線及電源電路。電力軌線被區分為互相串聯的第一電力軌線及第二電力軌線。電力軌線耦接於電路區塊。電源電路被區分為第一電源電路及第二電源電路。電源電路耦接於電力軌線。電源電路透過電力軌線提供第一電壓至電路區塊。第一電力軌線的兩端分別耦接於第一電源電路及第二電源電路。第二電力軌線的兩端分別耦接於第一電源電路及第二電源電路。 The chip of the present invention includes circuit blocks, power rails and power circuits. The power rails are divided into first power rails and second power rails that are connected in series. Power rails are coupled to the circuit blocks. The power supply circuit is divided into a first power supply circuit and a second power supply circuit. The power circuit is coupled to the power rail. The power circuit provides the first voltage to the circuit block through the power rail. Two ends of the first power rail are coupled to the first power circuit and the second power circuit respectively. Two ends of the second power rail are coupled to the first power circuit and the second power circuit respectively.
基於上述,透過將第一電晶體及第二電晶體交錯設置在電路區塊中的第一列及第二列,且透過不同訊號線來接收輸入訊號,如此一來,當崩裂發生在晶片上時,可有效避免電路區塊的完全失能。 Based on the above, by staggering the first and second transistors in the first and second columns of the circuit block and receiving input signals through different signal lines, when a crack occurs on the chip , it can effectively prevent the circuit block from being completely disabled.
10、20、30a、30b:電路區塊 10, 20, 30a, 30b: circuit block
40、41:晶片 40, 41: Chip
100~108、200~213、300a~305a、300b~305b、306~311:訊號線 100~108, 200~213, 300a~305a, 300b~305b, 306~311: signal line
400、401、401a、401b、410~413:電力軌線 400, 401, 401a, 401b, 410~413: Power rail
402、403、414~417:電源電路 402, 403, 414~417: Power circuit
IN1、IN2:輸入訊號 IN1, IN2: input signal
CRK:崩裂 CRK: crack
M1-1~M1-4、M2-1~M2-4、N1-1~N1-4、N2-1~N2-4、N3-1~N3-4、N4-1~N4-4、P1-1~P1-4、P2-1~P2-4、P3-1~P3-4、P4-1~P4-4:電晶體 M1-1~M1-4, M2-1~M2-4, N1-1~N1-4, N2-1~N2-4, N3-1~N3-4, N4-1~N4-4, P1- 1~P1-4, P2-1~P2-4, P3-1~P3-4, P4-1~P4-4: transistor
V1:第一電壓 V1: first voltage
V2:第二電壓 V2: second voltage
圖1A為本發明實施例一電路區塊的示意圖。 FIG. 1A is a schematic diagram of a circuit block according to an embodiment of the present invention.
圖1B為本發明實施例一電路區塊發生崩裂CRK的示意圖。 FIG. 1B is a schematic diagram of CRK cracking in a circuit block according to Embodiment 1 of the present invention.
圖2為本發明實施例一電路區塊的示意圖。 FIG. 2 is a schematic diagram of a circuit block according to an embodiment of the present invention.
圖3A為本發明實施例一電路區塊的示意圖。 FIG. 3A is a schematic diagram of a circuit block according to an embodiment of the present invention.
圖3B為本發明實施例一電路區塊的示意圖。 FIG. 3B is a schematic diagram of a circuit block according to an embodiment of the present invention.
圖4A為本發明實施例一晶片的示意圖。 FIG. 4A is a schematic diagram of a wafer according to an embodiment of the present invention.
圖4B為本發明實施例一晶片的示意圖。 FIG. 4B is a schematic diagram of a wafer according to an embodiment of the present invention.
請參考圖1A,圖1A為本發明實施例一電路區塊10的示意圖。電路區塊10中具有電晶體M1、M2、訊號線100~106。簡單而言,電晶體M1、M2被分別設置在電路區塊10中的第一列及第二列中。設置在第一列的電晶體M1、M2可透過訊號線100、101、106取得輸入訊號及第一電壓。設置在第二列的電晶體M1、M2可透過訊號線102、103、106取得輸入訊號及第一電壓。換言之,電路區塊10中的電晶體M1、M2透過設置在第一列及第二列中,且分別以不同的訊號線來取得輸入訊號及第一電壓,如此一來,電路區塊10即可有效地避免當訊號線101~106出現崩裂(Crack)時,導致電晶體M1、M2整體的失能或異常。 Please refer to FIG. 1A , which is a schematic diagram of a circuit block 10 according to an embodiment of the present invention. The circuit block 10 includes transistors M1, M2, and signal lines 100~106. To put it simply, the transistors M1 and M2 are respectively arranged in the first column and the second column of the circuit block 10 . The transistors M1 and M2 arranged in the first column can obtain the input signal and the first voltage through the signal lines 100, 101, and 106. The transistors M1 and M2 arranged in the second column can obtain the input signal and the first voltage through the signal lines 102, 103, and 106. In other words, the transistors M1 and M2 in the circuit block 10 are arranged in the first column and the second column and obtain the input signal and the first voltage through different signal lines respectively. In this way, the circuit block 10 is It can effectively prevent the entire transistors M1 and M2 from being disabled or abnormal when the signal lines 101 to 106 are cracked.
首先言明的是,在圖1A中以網底繪示的訊號線與訊號線100~106是設置在不同層或不同高度,設置在不同層或不同高度的訊號線與電晶體M1、M2可透過介層窗塞(Via)來進行連接。因此,透過以網底繪示的訊號線進行連接時,電晶體M1、M2可跨越訊號線100~106進行連接以接收到適當的訊號,此應為本領域的通常知識。 First of all, it should be noted that the signal lines and signal lines 100 to 106 shown at the bottom of the net in FIG. 1A are arranged on different layers or at different heights. The signal lines and transistors M1 and M2 arranged on different layers or at different heights can pass through Via to connect. Therefore, when connected through the signal lines shown at the bottom of the net, the transistors M1 and M2 can be connected across the signal lines 100 to 106 to receive appropriate signals, which should be common knowledge in the art.
詳細而言,電晶體M1具有子電晶體M1-1~M1-4,子電晶體M1-1~M1-4彼此之間以並聯互相連接,因此子電晶體M1-1~M1-4可等效為單一的電晶體M1來操作。相似地,子電晶體M2-1~M2-4彼此之間以並聯互相連接,且可等效為單一的電晶體M2 來操作。舉例而言,電晶體M1、M2可為N型金氧半場效電晶體(N type Metal-Oxide-Semiconductor Field-Effect Transistor,NMOSFET)、P型金氧半場效電晶體(P type Metal-Oxide-Semiconductor Field-Effect Transistor,PMOSFET)或是其他適合的電晶體。 Specifically, the transistor M1 has sub-transistors M1-1~M1-4, and the sub-transistors M1-1~M1-4 are connected to each other in parallel, so the sub-transistors M1-1~M1-4 can be equal to Effectively it is operated by a single transistor M1. Similarly, the sub-transistors M2-1~M2-4 are connected to each other in parallel and can be equivalent to a single transistor M2 to operate. For example, the transistors M1 and M2 can be N-type Metal-Oxide-Semiconductor Field-Effect Transistor (NMOSFET) or P-type Metal-Oxide-Semiconductor Field-Effect Transistor (NMOSFET). Semiconductor Field-Effect Transistor, PMOSFET) or other suitable transistor.
子電晶體M1-1~M1-4、M2-1~M2-4可具有實質上相同的長與寬。子電晶體M1-1~M1-4被依序設置在第一列第一行、第二列第二行、第一列第三行及第二列第四行的位置,子電晶體M2-1~M2-4被依序設置在第二列第一行、第一列第二行、第二列第三行及第一列第四行的位置。因此,在電路區塊10的每一列及每一行中,電晶體M1的子電晶體M1-1~M1-4與電晶體M2的子電晶體M2-1~M2-4都為互相交錯設置。電晶體M1的子電晶體M1-1~M1-4與電晶體M2的子電晶體M2-1~M2-4以棋盤式地互相交錯設置在第一列及第二列中。 The sub-transistors M1-1~M1-4 and M2-1~M2-4 may have substantially the same length and width. The sub-transistors M1-1~M1-4 are sequentially arranged at the first row of the first column, the second row of the second column, the third row of the first column and the fourth row of the second column. The sub-transistors M2- 1~M2-4 are sequentially set at the first row of the second column, the second row of the first column, the third row of the second column and the fourth row of the first column. Therefore, in each column and each row of the circuit block 10, the sub-transistors M1-1~M1-4 of the transistor M1 and the sub-transistors M2-1~M2-4 of the transistor M2 are arranged staggered with each other. The sub-transistors M1-1~M1-4 of the transistor M1 and the sub-transistors M2-1~M2-4 of the transistor M2 are arranged staggeredly in the first column and the second column in a checkerboard pattern.
訊號線100、101設置在電路區塊10的上側邊,訊號線102、103設置在電路區塊的下側邊。訊號線100、101鄰近電路區塊10的第一列,訊號線100、101遠離電路區塊10的第二列。訊號線102、103鄰近電路區塊10的第二列,訊號線102、103遠離電路區塊10的第一列。訊號線100、101可用來分別提供輸入訊號IN1、IN2至第一列的子電晶體。訊號線102、103可用來分別提供輸入訊號IN1、IN2至第二列的子電晶體。 The signal lines 100 and 101 are arranged on the upper side of the circuit block 10, and the signal lines 102 and 103 are arranged on the lower side of the circuit block. The signal lines 100 and 101 are adjacent to the first column of the circuit block 10 , and the signal lines 100 and 101 are away from the second column of the circuit block 10 . The signal lines 102 and 103 are adjacent to the second column of the circuit block 10 , and the signal lines 102 and 103 are away from the first column of the circuit block 10 . The signal lines 100 and 101 can be used to provide input signals IN1 and IN2 to the sub-transistors of the first column respectively. The signal lines 102 and 103 can be used to provide input signals IN1 and IN2 to the sub-transistors of the second column respectively.
訊號線104設置在電路區塊10的右側邊,訊號線104的 兩端分別耦接訊號線100、102。訊號線105設置在電路區塊10的左側邊,訊號線105的兩端分別耦接訊號線101、103。也就是說,訊號線104、105對應設置在電路區塊10的分別兩側。訊號線100、102、104可共同形成一U型結構,環繞電晶體M1、M2。訊號線101、103、105可共同形成另一U型結構,環繞M1、M2。兩U型結構的開口互相對應設置。 The signal line 104 is arranged on the right side of the circuit block 10, and the Both ends are coupled to signal lines 100 and 102 respectively. The signal line 105 is disposed on the left side of the circuit block 10, and two ends of the signal line 105 are coupled to the signal lines 101 and 103 respectively. That is to say, the signal lines 104 and 105 are respectively arranged on both sides of the circuit block 10 . The signal lines 100, 102, and 104 may jointly form a U-shaped structure surrounding the transistors M1 and M2. The signal lines 101, 103, and 105 may jointly form another U-shaped structure surrounding M1 and M2. The openings of the two U-shaped structures are arranged corresponding to each other.
訊號線106完全環繞於電晶體M1、M2。訊號線106在電路區塊10的上側邊中,可設置於訊號線100、101與電路區塊10的第一列之間。訊號線106在電路區塊10的下側邊中,可設置於訊號線103、104與電路區塊10的第二列之間。訊號線106在電路區塊10的右側邊中,可設置於訊號線105與電路區塊10的第四行之間。訊號線106在電路區塊10的左側邊中,可設置於訊號線105與電路區塊10的第一行之間。 The signal line 106 completely surrounds the transistors M1 and M2. The signal line 106 is disposed on the upper side of the circuit block 10 between the signal lines 100 and 101 and the first column of the circuit block 10 . The signal line 106 is disposed on the lower side of the circuit block 10 between the signal lines 103 and 104 and the second column of the circuit block 10 . The signal line 106 is on the right side of the circuit block 10 and can be disposed between the signal line 105 and the fourth row of the circuit block 10 . The signal line 106 is on the left side of the circuit block 10 and can be disposed between the signal line 105 and the first row of the circuit block 10 .
訊號線100、102、104可提供輸入訊號IN1給電晶體M1、M2,訊號線101、103、105可提供輸入訊號IN2給電晶體M1、M2,訊號線106可提供第一電壓V1給電晶體M1、M2。 The signal lines 100, 102, and 104 can provide the input signal IN1 to the transistors M1 and M2, the signal lines 101, 103, and 105 can provide the input signal IN2 to the transistors M1 and M2, and the signal line 106 can provide the first voltage V1 to the transistors M1 and M2. .
在本實施例中,電晶體M1的第一端接收輸入訊號IN1,電晶體M1的第二端接收第一電壓V1,電晶體M1的第三端接收輸入訊號IN2。為了達成上述的耦接關係,電晶體M1在第一列中的子電晶體M1-1、M1-3的第一端耦接至訊號線100,且子電晶體M1-1、M1-3的第二端耦接至訊號線106。電晶體M1在第二列中的子電晶體M1-2、M1-4的第一端耦接至訊號線102,且子電晶體 M1-2、M1-4的第二端耦接至訊號線106。電晶體M1的所有子電晶體M1-1~M1-4透過訊號線107將每個子電晶體M1-1~M1-4的第三端互相耦接並接收輸入訊號IN2,其中訊號線107設置在電路區塊10的第一列及第二列之間。訊號線107透過斜向交錯的設置,進而連接在第一列及第二列中互相交錯設置的子電晶體M1-1~M1-4的第三端。 In this embodiment, the first terminal of the transistor M1 receives the input signal IN1, the second terminal of the transistor M1 receives the first voltage V1, and the third terminal of the transistor M1 receives the input signal IN2. In order to achieve the above coupling relationship, the first ends of the sub-transistors M1-1 and M1-3 in the first column of the transistor M1 are coupled to the signal line 100, and the first ends of the sub-transistors M1-1 and M1-3 are The second end is coupled to the signal line 106 . The first ends of the sub-transistors M1-2 and M1-4 of the transistor M1 in the second column are coupled to the signal line 102, and the sub-transistors The second ends of M1-2 and M1-4 are coupled to the signal line 106. All the sub-transistors M1-1~M1-4 of the transistor M1 couple the third terminals of each sub-transistor M1-1~M1-4 to each other through the signal line 107, and receive the input signal IN2, wherein the signal line 107 is provided at between the first column and the second column of the circuit block 10 . The signal lines 107 are arranged in an oblique staggered manner, and are further connected to the third ends of the sub-transistors M1-1~M1-4 arranged staggered in the first column and the second column.
相似地,電晶體M2的第一端接收輸入訊號IN2,電晶體M2的第二端接收第一電壓V1,電晶體M1的第三端接收輸入訊號IN1。為了達成上述的耦接關係,電晶體M2在第一列中的子電晶體M2-2、M2-4的第一端耦接至訊號線101,且子電晶體M2-2、M2-4的第二端耦接至訊號線101。電晶體M2在第二列中的子電晶體M2-1、M2-3的第一端耦接至訊號線102,且子電晶體M2-1、M2-3的第二端耦接至訊號線106。電晶體M1的所有子電晶體M2-1~M2-4透過訊號線108將每個子電晶體M2-1~M2-4的第三端互相耦接並接收輸入訊號IN1,其中訊號線108設置在電路區塊10的第一列及第二列之間。訊號線108透過斜向往返交錯的設置,進而連接在第一列及第二列中互相交錯設置的子電晶體M2-1~M2-4的第三端。 Similarly, the first terminal of the transistor M2 receives the input signal IN2, the second terminal of the transistor M2 receives the first voltage V1, and the third terminal of the transistor M1 receives the input signal IN1. In order to achieve the above coupling relationship, the first ends of the sub-transistors M2-2 and M2-4 in the first column of the transistor M2 are coupled to the signal line 101, and the first ends of the sub-transistors M2-2 and M2-4 are The second end is coupled to the signal line 101. The first ends of the sub-transistors M2-1 and M2-3 of the transistor M2 in the second column are coupled to the signal line 102, and the second ends of the sub-transistors M2-1 and M2-3 are coupled to the signal line. 106. All the sub-transistors M2-1~M2-4 of the transistor M1 couple the third terminals of each sub-transistor M2-1~M2-4 to each other through the signal line 108 and receive the input signal IN1, wherein the signal line 108 is provided at between the first column and the second column of the circuit block 10 . The signal lines 108 are arranged in an oblique and reciprocating manner, and are further connected to the third terminals of the sub-transistors M2-1 to M2-4 arranged in a staggered manner in the first column and the second column.
因此,電路區塊10中的電晶體M1的子電晶體M1-1~M1-4及M2的子電晶體M2-1~M2-4,在電路區塊10的每一行及每一列中接為交錯設置。設置在第一列的電晶體M1-1、M2-1、M1-3、M2-4可透過訊號線100、101、106接收輸入訊號IN1、IN2及 第一電壓V1,設置在第二列的電晶體M2-1、M1-1、M2-3、M1-4可透過訊號線102、103、106接收輸入訊號IN1、IN2及第一電壓V1。因此,電路區塊10可有效避免崩裂發生在訊號線100~103的任一者時,電晶體M1或電晶體M2會完全失能的情況。 Therefore, the sub-transistors M1-1~M1-4 of the transistor M1 and the sub-transistors M2-1~M2-4 of the transistor M2 in the circuit block 10 are connected in each row and column of the circuit block 10. Staggered settings. The transistors M1-1, M2-1, M1-3 and M2-4 arranged in the first row can receive the input signals IN1, IN2 and The first voltage V1, the transistors M2-1, M1-1, M2-3, and M1-4 arranged in the second column can receive the input signals IN1, IN2 and the first voltage V1 through the signal lines 102, 103, and 106. Therefore, the circuit block 10 can effectively prevent the transistor M1 or the transistor M2 from being completely disabled when a crack occurs in any one of the signal lines 100 to 103.
再者,透過將子電晶體M1-1~M1-4、M2-1~M2-4交錯設置在電路區塊10的第一列及第二列中,亦可將製程非理想性的梯度差異平均分配至電晶體M1、M2。換言之,電晶體M1、M2透過在每一航及每一列中交錯設置,可有效降低製程非理想性對電晶體M1、M2所造成的影響。當電晶體M1、M2為差動電路結構時,更可透過電路區塊10的設計而達到更好的匹配效果。 Furthermore, by staggering the sub-transistors M1-1~M1-4 and M2-1~M2-4 in the first and second columns of the circuit block 10, the non-ideal gradient differences in the process can also be eliminated. Evenly distributed to transistors M1 and M2. In other words, by staggering the transistors M1 and M2 in each row and column, the impact of process non-idealities on the transistors M1 and M2 can be effectively reduced. When the transistors M1 and M2 have a differential circuit structure, a better matching effect can be achieved through the design of the circuit block 10 .
圖1B為本發明實施例一電路區塊10發生崩裂CRK的示意圖。在本實施例中,電路區塊10可設置在可撓基板上。由於可撓基板的可彎折特性,崩裂CRK較容易發生在可撓基板上的電路區塊10中。詳細而言,崩裂CRK發生在電路區塊10的訊號線100、101、106上,也就是崩裂CRK發生在電路區塊10的上側邊。因此,子電晶體M1-1的第一端無法接收到輸入訊號IN1,子電晶體M2-2、M2-4的第一端無法接收到輸入訊號IN2。換言之,當崩裂CRK發生時,在第一列的子電晶體M1-1、M2-2、M2-4無法正常運作。 FIG. 1B is a schematic diagram of CRK cracking in the circuit block 10 according to Embodiment 1 of the present invention. In this embodiment, the circuit block 10 can be disposed on a flexible substrate. Due to the bending characteristics of the flexible substrate, crack CRK is more likely to occur in the circuit block 10 on the flexible substrate. Specifically, the crack CRK occurs on the signal lines 100, 101, and 106 of the circuit block 10, that is, the crack CRK occurs on the upper side of the circuit block 10. Therefore, the first terminal of the sub-transistor M1-1 cannot receive the input signal IN1, and the first terminals of the sub-transistors M2-2 and M2-4 cannot receive the input signal IN2. In other words, when crack CRK occurs, the sub-transistors M1-1, M2-2, and M2-4 in the first column cannot operate normally.
但,在第一列的電晶體M1-3的第一端可由訊號線100接收輸入訊號IN1,電晶體M1-3的第二端可由環狀的訊號線106接收第一電壓V1。另外,在第二列的子電晶體M2-1、M1-2、M2-3、 M1-4可由訊號線102、103上分別接收輸入訊號IN1、IN2。另外,子電晶體M1-1~M1-4的第三端可透過訊號線107接收輸入訊號IN2,子電晶體M2-1~M2-4的第三端可透過訊號線108接收輸入訊號IN1。因此,在第一列的電晶體M1-3以及在第二列的子電晶體M2-1、M1-2、M2-3、M1-4可正常運作。 However, the first end of the transistor M1-3 in the first column can receive the input signal IN1 through the signal line 100, and the second end of the transistor M1-3 can receive the first voltage V1 through the ring-shaped signal line 106. In addition, the sub-transistors M2-1, M1-2, M2-3, M1-4 can receive input signals IN1 and IN2 from signal lines 102 and 103 respectively. In addition, the third terminals of the sub-transistors M1-1~M1-4 can receive the input signal IN2 through the signal line 107, and the third terminals of the sub-transistors M2-1~M2-4 can receive the input signal IN1 through the signal line 108. Therefore, the transistor M1-3 in the first column and the sub-transistors M2-1, M1-2, M2-3, and M1-4 in the second column can operate normally.
簡言之,電路區塊10透過子電晶體M1-1~M1-4、M2-1~M2-4相互交錯設置於第一列及第二列中。另外,電路區塊10還透過訊號線100、102於電路區塊10的兩側提供輸入訊號IN1,且透過訊號線101、103於電路區塊10的兩側提供輸入訊號IN2。如此一來,當電路區塊10發生崩裂CRK時,可有效避免崩裂CRK發生在電晶體M1或M2所連接的唯一訊號線上,進而導致電晶體M1、M2的其中之一完全失能的結果。也就是說,當崩裂CRK發生在電路區塊10時,電晶體M1、M2仍可接收輸入訊號IN1、IN2及第一電壓V1而進行運作而不使電路區塊10完全失能。 In short, the circuit blocks 10 are arranged alternately in the first column and the second column through the sub-transistors M1-1~M1-4 and M2-1~M2-4. In addition, the circuit block 10 also provides the input signal IN1 on both sides of the circuit block 10 through the signal lines 100 and 102, and provides the input signal IN2 on both sides of the circuit block 10 through the signal lines 101 and 103. In this way, when crack CRK occurs in the circuit block 10, it can be effectively avoided that the crack CRK occurs on the only signal line connected to the transistor M1 or M2, thereby causing one of the transistors M1 and M2 to become completely disabled. That is to say, when crack CRK occurs in the circuit block 10, the transistors M1 and M2 can still receive the input signals IN1, IN2 and the first voltage V1 to operate without completely disabling the circuit block 10.
在另一實施例中,本領域具通常知識者當然可依據不同的設計需求來對電路區塊10進行修改。舉例而言,電路區塊10的電晶體M1、M2可被區分為不止四個。也就是說電路區塊10的行數可被增減,只要電路區塊10的行數最少為兩行即可。舉例而言,電路區塊10的訊號線100、102、104可不需要為U型結構。也就是說訊號線100、102、104亦由完全環繞或部分環繞於電晶體M1、M2的訊號線結構所取代,只要電路區塊10可於上側邊及下側邊都接收到輸入訊號IN1即可。同樣的修改也當然適用於訊號線101、 103、105,可由完全環繞電晶體M1、M2的訊號線來取代訊號線101、103、105。如此一來,透過完全環繞的訊號線來提供輸入訊號IN1、IN2,電路區塊10即可完全避免任何一個子電晶體M1-1~M1-4、M2-1~M2-4由於崩裂而失效。 In another embodiment, those of ordinary skill in the art can of course modify the circuit block 10 according to different design requirements. For example, the transistors M1 and M2 of the circuit block 10 may be divided into more than four. That is to say, the number of rows of the circuit block 10 can be increased or decreased, as long as the number of rows of the circuit block 10 is at least two rows. For example, the signal lines 100, 102, and 104 of the circuit block 10 do not need to have a U-shaped structure. That is to say, the signal lines 100, 102, and 104 are also replaced by signal line structures that completely surround or partially surround the transistors M1 and M2, as long as the circuit block 10 can receive the input signal IN1 on both the upper and lower sides. That’s it. The same modifications of course also apply to signal line 101, 103 and 105, the signal lines 101, 103 and 105 can be replaced by signal lines that completely surround the transistors M1 and M2. In this way, by providing the input signals IN1 and IN2 through the completely surrounding signal lines, the circuit block 10 can completely prevent any of the sub-transistors M1-1~M1-4 and M2-1~M2-4 from failing due to cracking. .
圖2為本發明實施例一電路區塊20的示意圖。電路區塊20中具有電晶體P1、P2、N1、N2。在本實施例中,電晶體P1、P2可為P型金氧半場效電晶體,電晶體N1、N2可為N型金氧半場效電晶體。電晶體P1具有子電晶體P1-1~P1-4,電晶體P2具有子電晶體P2-1~P2-4。電晶體N1具有子電晶體N1-1~N1-4,電晶體N2具有子電晶體N2-1~N2-4。 FIG. 2 is a schematic diagram of the circuit block 20 according to the first embodiment of the present invention. The circuit block 20 includes transistors P1, P2, N1, and N2. In this embodiment, the transistors P1 and P2 may be P-type metal oxide semi-field effect transistors, and the transistors N1 and N2 may be N-type metal oxide semi-field effect transistors. Transistor P1 has sub-transistors P1-1 to P1-4, and transistor P2 has sub-transistors P2-1 to P2-4. The transistor N1 has sub-transistors N1-1 to N1-4, and the transistor N2 has sub-transistors N2-1 to N2-4.
子電晶體P1-1~P1-4、P2-1~P2-4可具有實質上相同的長與寬,子電晶體N1-1~N1-4、N2-1~N2-4可具有實質上相同的長與寬。子電晶體P1-1~P1-4被依序設置在第一列第一行、第二列第二行、第一列第三行及第二列第四行的位置,子電晶體P2-1~P2-4被依序設置在第二列第一行、第一列第二行、第二列第三行及第一列第四行的位置。因此,在電路區塊10的每一列及每一行中,電晶體P1的子電晶體P1-1~P1-4與電晶體P2的子電晶體P2-1~P2-4都為互相交錯設置。電晶體P1的子電晶體P1-1~P1-4與電晶體P2的子電晶體P2-1~P2-4以棋盤式地互相交錯設置在第一列及第二列中。 The sub-transistors P1-1~P1-4 and P2-1~P2-4 may have substantially the same length and width, and the sub-transistors N1-1~N1-4 and N2-1~N2-4 may have substantially the same length and width. Same length and width. The sub-transistors P1-1~P1-4 are sequentially arranged at the first row of the first column, the second row of the second column, the third row of the first column and the fourth row of the second column. The sub-transistors P2- 1~P2-4 are sequentially set at the first row of the second column, the second row of the first column, the third row of the second column and the fourth row of the first column. Therefore, in each column and each row of the circuit block 10, the sub-transistors P1-1 to P1-4 of the transistor P1 and the sub-transistors P2-1 to P2-4 of the transistor P2 are arranged staggered with each other. The sub-transistors P1-1 to P1-4 of the transistor P1 and the sub-transistors P2-1 to P2-4 of the transistor P2 are arranged staggeredly in the first column and the second column in a checkerboard pattern.
子電晶體N1-1~N1-4被依序設置在第三列第一行、第四列第二行、第三列第三行及第四列第四行的位置,子電晶體N2-1 ~N2-4被依序設置在第四列第一行、第三列第二行、第四列第三行及第三列第四行的位置。因此,在電路區塊10的每一列及每一行中,電晶體N1的子電晶體N1-1~N1-4與電晶體N2的子電晶體N2-1~N2-4都為互相交錯設置。電晶體N1的子電晶體N1-1~N1-4與電晶體N2的子電晶體N2-1~N2-4以棋盤式地互相交錯設置在第三列及第四列中。 The sub-transistors N1-1~N1-4 are sequentially arranged at the first row of the third column, the second row of the fourth column, the third row of the third column and the fourth row of the fourth column. The sub-transistors N2- 1 ~N2-4 is sequentially placed at the first row of the fourth column, the second row of the third column, the third row of the fourth column, and the fourth row of the third column. Therefore, in each column and each row of the circuit block 10, the sub-transistors N1-1~N1-4 of the transistor N1 and the sub-transistors N2-1~N2-4 of the transistor N2 are arranged staggered with each other. The sub-transistors N1-1~N1-4 of the transistor N1 and the sub-transistors N2-1~N2-4 of the transistor N2 are arranged staggeredly in the third and fourth columns in a chessboard pattern.
訊號線200設置在電路區塊20的上側邊,訊號線202設置在電路區塊20的第二列及第三列之間,訊號線204設置在電路區塊20的下側邊。訊號線201設置在電路區塊20的上側邊,訊號線203設置在電路區塊20的第二列及第三列之間,訊號線205設置在電路區塊20的下側邊。訊號線206連接訊號線200、202、204,訊號線207連接訊號線201、203、205。訊號線208完全環繞電晶體P1、P2,訊號線209完全環繞電晶體N1、N2。訊號線200、202、204可用來提供輸入訊號IN1,訊號線201、203、205可用來提供輸入訊號IN2,訊號線208可用來提供第一電壓V1,訊號線209可用來提供第一電壓V1。 The signal line 200 is disposed on the upper side of the circuit block 20 , the signal line 202 is disposed between the second column and the third column of the circuit block 20 , and the signal line 204 is disposed on the lower side of the circuit block 20 . The signal line 201 is disposed on the upper side of the circuit block 20 , the signal line 203 is disposed between the second column and the third column of the circuit block 20 , and the signal line 205 is disposed on the lower side of the circuit block 20 . The signal line 206 is connected to the signal lines 200, 202, and 204, and the signal line 207 is connected to the signal lines 201, 203, and 205. The signal line 208 completely surrounds the transistors P1 and P2, and the signal line 209 completely surrounds the transistors N1 and N2. The signal lines 200, 202, and 204 can be used to provide the input signal IN1, the signal lines 201, 203, and 205 can be used to provide the input signal IN2, the signal line 208 can be used to provide the first voltage V1, and the signal line 209 can be used to provide the first voltage V1.
另外,訊號線210設置在電路區塊20的第一列及第二列之間,訊號線210透過斜向交錯的設置,進而連接在第一列及第二列中互相交錯設置的子電晶體P1-1~P1-4的第三端。相似地,訊號線211設置在電路區塊20的第一列及第二列之間,以連接子電晶體P2-1~P2-4的第三端。訊號線212設置在電路區塊20的第三列及第四列之間,以連接子電晶體N1-1~N1-4的第三端。訊 號線213設置在電路區塊20的第三列及第四列之間,以連接子電晶體N2-1~N2-4的第三端。 In addition, the signal lines 210 are arranged between the first column and the second column of the circuit block 20. The signal lines 210 are arranged in diagonal staggers to connect the sub-transistors arranged staggered in the first and second columns. The third end of P1-1~P1-4. Similarly, the signal line 211 is disposed between the first column and the second column of the circuit block 20 to connect the third terminals of the sub-transistors P2-1 to P2-4. The signal line 212 is provided between the third column and the fourth column of the circuit block 20 to connect the third terminals of the sub-transistors N1-1 to N1-4. News The number line 213 is provided between the third column and the fourth column of the circuit block 20 to connect the third terminals of the sub-transistors N2-1 to N2-4.
因此,電路區塊20第一列的子電晶體P1-1、P2-2、P1-3、P2-4可透過訊號線200、201、208取得輸入訊號IN1、IN2及第一電壓V1。電路區塊20第二列的子電晶體P2-1、P1-2、P2-3、P1-4可透過訊號線202、203、208取得輸入訊號IN1、IN2及第一電壓V1。電路區塊20第三列的子電晶體N1-1、N2-2、N1-3、N2-4可透過訊號線202、203、209取得輸入訊號IN1、IN2及第二電壓V2。電路區塊20第四列的子電晶體N2-1、N1-2、N2-3、N1-4可透過訊號線204、205、209取得輸入訊號IN1、IN2及第二電壓V2。 Therefore, the sub-transistors P1-1, P2-2, P1-3, and P2-4 in the first column of the circuit block 20 can obtain the input signals IN1, IN2 and the first voltage V1 through the signal lines 200, 201, and 208. The sub-transistors P2-1, P1-2, P2-3, and P1-4 in the second column of the circuit block 20 can obtain the input signals IN1, IN2 and the first voltage V1 through the signal lines 202, 203, and 208. The sub-transistors N1-1, N2-2, N1-3, and N2-4 in the third column of the circuit block 20 can obtain the input signals IN1, IN2 and the second voltage V2 through the signal lines 202, 203, and 209. The sub-transistors N2-1, N1-2, N2-3, and N1-4 in the fourth column of the circuit block 20 can obtain the input signals IN1, IN2 and the second voltage V2 through the signal lines 204, 205, and 209.
如此一來,當崩裂CRK發生在電路區塊20時,電晶體P1、P2、N1、N2仍可接收輸入訊號IN1、IN2、第一電壓V1、第二電壓V2而進行運作而不使電路區塊20完全失能。 In this way, when the crack CRK occurs in the circuit block 20, the transistors P1, P2, N1, and N2 can still receive the input signals IN1, IN2, the first voltage V1, and the second voltage V2 to operate without damaging the circuit block. Block 20 is completely disabled.
圖3A為本發明實施例一電路區塊30a的示意圖。電路區塊30a具有電晶體N3、N4、P3、P4。電晶體P3、P4可為P型金氧半場效電晶體,電晶體N3、N4可為N型金氧半場效電晶體。電晶體P3具有子電晶體P3-1~P3-4,電晶體P4具有子電晶體P4-1~P4-4。電晶體N3具有子電晶體N3-1~N3-4,電晶體N4具有子電晶體N4-1~N4-4。 FIG. 3A is a schematic diagram of a circuit block 30a according to an embodiment of the present invention. Circuit block 30a has transistors N3, N4, P3, and P4. The transistors P3 and P4 may be P-type metal oxide semi-field effect transistors, and the transistors N3 and N4 may be N-type metal oxide semi-field effect transistors. Transistor P3 has sub-transistors P3-1 to P3-4, and transistor P4 has sub-transistors P4-1 to P4-4. Transistor N3 has sub-transistors N3-1 to N3-4, and transistor N4 has sub-transistors N4-1 to N4-4.
子電晶體P3-1~P3-4、P4-1~P4-4可具有實質上相同的長與寬,子電晶體N3-1~N3-4、N4-1~N4-4可具有實質上相同的長與寬。子電晶體N3-1~N3-4被依序設置在第一列第一行、第二 列第二行、第一列第三行及第二列第四行的位置,子電晶體N4-1~N4-4被依序設置在第二列第一行、第一列第二行、第二列第三行及第一列第四行的位置。因此,在電路區塊30a的每一列及每一行中,電晶體N3的子電晶體N3-1~N3-4與電晶體N4的子電晶體N4-1~N4-4都為互相交錯設置。電晶體N3的子電晶體N3-1~N3-4與電晶體N4的子電晶體N4-1~N4-4以棋盤式地互相交錯設置在第一列及第二列中。 The sub-transistors P3-1~P3-4 and P4-1~P4-4 may have substantially the same length and width, and the sub-transistors N3-1~N3-4 and N4-1~N4-4 may have substantially the same length and width. Same length and width. Sub-transistors N3-1~N3-4 are sequentially arranged in the first column, first row, second The sub-transistors N4-1~N4-4 are sequentially arranged in the second row of the second column, the third row of the first column and the fourth row of the second column. The positions of the second column, third row and the first column, fourth row. Therefore, in each column and each row of the circuit block 30a, the sub-transistors N3-1~N3-4 of the transistor N3 and the sub-transistors N4-1~N4-4 of the transistor N4 are arranged staggered with each other. The sub-transistors N3-1~N3-4 of the transistor N3 and the sub-transistors N4-1~N4-4 of the transistor N4 are arranged staggeredly in the first column and the second column in a checkerboard pattern.
子電晶體P3-1~P3-4被依序設置在第一列第五行、第二列第六行、第一列第七行及第二列第八行的位置,子電晶體P4-1~P4-4被依序設置在第二列第五行、第一列第六行、第二列第七行及第一列第八行的位置。因此,在電路區塊30a的每一列及每一行中,電晶體P3的子電晶體P3-1~P3-4與電晶體P4的子電晶體P4-1~P4-4都為互相交錯設置。電晶體P3的子電晶體P3-1~P3-4與電晶體P4的子電晶體P4-1~P4-4以棋盤式地互相交錯設置在第一列及第二列中。 The sub-transistors P3-1~P3-4 are sequentially arranged at the fifth row of the first column, the sixth row of the second column, the seventh row of the first column and the eighth row of the second column. Sub-transistor P4-1 ~P4-4 is sequentially placed in the fifth row of the second column, the sixth row of the first column, the seventh row of the second column, and the eighth row of the first column. Therefore, in each column and each row of the circuit block 30a, the sub-transistors P3-1 to P3-4 of the transistor P3 and the sub-transistors P4-1 to P4-4 of the transistor P4 are arranged staggered with each other. The sub-transistors P3-1 to P3-4 of the transistor P3 and the sub-transistors P4-1 to P4-4 of the transistor P4 are arranged staggeredly in the first column and the second column in a checkerboard pattern.
訊號線300a設置在電路區塊30a的上側邊,訊號線302a設置在電路區塊30a的下側邊。訊號線301a設置在電路區塊30a的上側邊,訊號線303a設置在電路區塊30a的下側邊。訊號線304a連接訊號線300a、302a,訊號線305a連接訊號線301a、303a。訊號線306完全環繞電晶體P3、P4,訊號線307完全環繞電晶體N3、N4。訊號線300a、302a可用來提供輸入訊號IN1,訊號線301a、303a可用來提供輸入訊號IN2,訊號線306可用來提供第一電壓 V1,訊號線307可用來提供第一電壓V1。 The signal line 300a is disposed on the upper side of the circuit block 30a, and the signal line 302a is disposed on the lower side of the circuit block 30a. The signal line 301a is provided on the upper side of the circuit block 30a, and the signal line 303a is provided on the lower side of the circuit block 30a. The signal line 304a is connected to the signal lines 300a and 302a, and the signal line 305a is connected to the signal lines 301a and 303a. The signal line 306 completely surrounds the transistors P3 and P4, and the signal line 307 completely surrounds the transistors N3 and N4. The signal lines 300a and 302a can be used to provide the input signal IN1, the signal lines 301a and 303a can be used to provide the input signal IN2, and the signal line 306 can be used to provide the first voltage. V1, the signal line 307 can be used to provide the first voltage V1.
另外,訊號線308、309、310、311設置在電路區塊30a的第一列及第二列之間,訊號線308可連接在第一列及第二列中互相交錯設置的子電晶體P3-1~P3-4的第三端,訊號線309可連接在第一列及第二列中互相交錯設置的子電晶體P4-1~P4-4的第三端,訊號線310可連接在第一列及第二列中互相交錯設置的子電晶體N3-1~N3-4的第三端,訊號線311可連接在第一列及第二列中互相交錯設置的子電晶體N4-1~N4-4的第三端。 In addition, the signal lines 308, 309, 310, and 311 are arranged between the first column and the second column of the circuit block 30a. The signal lines 308 can be connected to the sub-transistors P3 that are staggered in the first column and the second column. -1 to the third end of P3-4, the signal line 309 can be connected to the third end of the sub-transistors P4-1 to P4-4 arranged staggered in the first column and the second column, and the signal line 310 can be connected to The third end of the sub-transistors N3-1~N3-4 arranged in the first column and the second column in a staggered manner, the signal line 311 can be connected to the sub-transistors N4- in the first column and the second column arranged in a staggered manner. 1~The third end of N4-4.
因此,電路區塊30a第一列的子電晶體N3-1、N4-2、N3-3、N4-4、P3-1、P4-2、P3-3、P4-4可透過訊號線300a、301a、306、307取得輸入訊號IN1、IN2、第一電壓V1及第二電壓V2。電路區塊30a第二列的子電晶體N4-1、N3-2、N4-3、N3-4、P4-1、P3-2、P4-3、P3-4可透過訊號線302a、303a、306、307取得輸入訊號IN1、IN2第一電壓V1及第二電壓V2。 Therefore, the sub-transistors N3-1, N4-2, N3-3, N4-4, P3-1, P4-2, P3-3, and P4-4 in the first column of the circuit block 30a can pass through the signal line 300a, 301a, 306, and 307 obtain input signals IN1, IN2, first voltage V1, and second voltage V2. The sub-transistors N4-1, N3-2, N4-3, N3-4, P4-1, P3-2, P4-3, and P3-4 in the second column of the circuit block 30a can pass through the signal lines 302a, 303a, 306 and 307 obtain the first voltage V1 and the second voltage V2 of the input signals IN1 and IN2.
如此一來,當崩裂CRK發生在電路區塊30a時,電晶體P3、P4、N3、N4仍可接收輸入訊號IN1、IN2、第一電壓V1、第二電壓V2而進行運作而不使電路區塊30a完全失能。 In this way, when the crack CRK occurs in the circuit block 30a, the transistors P3, P4, N3, and N4 can still receive the input signals IN1, IN2, the first voltage V1, and the second voltage V2 to operate without damaging the circuit area. Block 30a is completely disabled.
圖3B為本發明實施例一電路區塊30b的示意圖。圖3B所繪示的電路區塊30b相似於圖3A所繪示的電路區塊30a,故相同元件沿用相同符號。電路區塊30a與電路區塊30b的差別在於,電路區塊30a中的訊號線300a、301a、302a、303a、304a、305a在電路區塊30b中分別被訊號線300b、301b、302b、303b、304b、 305b取代。 FIG. 3B is a schematic diagram of the circuit block 30b according to the first embodiment of the present invention. The circuit block 30b shown in FIG. 3B is similar to the circuit block 30a shown in FIG. 3A , so the same symbols are used for the same components. The difference between the circuit block 30a and the circuit block 30b is that the signal lines 300a, 301a, 302a, 303a, 304a, and 305a in the circuit block 30a are respectively connected by the signal lines 300b, 301b, 302b, 303b, 304b. 305b superseded.
訊號線300b設置在電路區塊30b的上側邊,訊號線302b設置在電路區塊30b的下側邊。訊號線301b設置在電路區塊30b的上側邊,訊號線303b設置在電路區塊30b的下側邊。訊號線304b連接訊號線300b、302b,訊號線305b連接訊號線301b、303b。訊號線300b、302b可用來提供輸入訊號IN1,訊號線301b、303b可用來提供輸入訊號IN2。 The signal line 300b is disposed on the upper side of the circuit block 30b, and the signal line 302b is disposed on the lower side of the circuit block 30b. The signal line 301b is disposed on the upper side of the circuit block 30b, and the signal line 303b is disposed on the lower side of the circuit block 30b. The signal line 304b is connected to the signal lines 300b and 302b, and the signal line 305b is connected to the signal lines 301b and 303b. The signal lines 300b and 302b can be used to provide the input signal IN1, and the signal lines 301b and 303b can be used to provide the input signal IN2.
因此,電路區塊30b第一列的子電晶體N3-1、N4-2、N3-3、N4-4、P3-1、P4-2、P3-3、P4-4可透過訊號線300b、301b、306、307取得輸入訊號IN1、IN2、第一電壓V1及第二電壓V2。電路區塊30b第二列的子電晶體N4-1、N3-2、N4-3、N3-4、P4-1、P3-2、P4-3、P3-4可透過訊號線302b、303b、306、307取得輸入訊號IN1、IN2第一電壓V1及第二電壓V2。 Therefore, the sub-transistors N3-1, N4-2, N3-3, N4-4, P3-1, P4-2, P3-3, and P4-4 in the first column of the circuit block 30b can pass through the signal line 300b, 301b, 306, and 307 obtain input signals IN1, IN2, first voltage V1, and second voltage V2. The sub-transistors N4-1, N3-2, N4-3, N3-4, P4-1, P3-2, P4-3, and P3-4 in the second column of the circuit block 30b can pass through the signal lines 302b, 303b, 306 and 307 obtain the first voltage V1 and the second voltage V2 of the input signals IN1 and IN2.
如此一來,當崩裂CRK發生在電路區塊30b時,電晶體P3、P4、N3、N4仍可接收輸入訊號IN1、IN2、第一電壓V1、第二電壓V2而進行運作而不使電路區塊30b完全失能。 In this way, when the crack CRK occurs in the circuit block 30b, the transistors P3, P4, N3, and N4 can still receive the input signals IN1, IN2, the first voltage V1, and the second voltage V2 to operate without damaging the circuit area. Block 30b is completely disabled.
圖4A為本發明實施例一晶片40的示意圖。晶片40中設置有多個電路區塊10/20/30、電力軌線400、401及電源電路402、403。電源電路402、403可提供第一電壓V1至電力軌線400、401。電路區塊10/20/30耦接電力軌線400、401,以接收第一電壓V1。在一實施例中,晶片40可設置在可撓基板上,由於可撓基板的可彎折特性,崩裂較容易發生在可撓基板上的訊號線400、401中。
FIG. 4A is a schematic diagram of a
詳細而言,電力軌線400的兩端耦接電源電路402、403。電力軌線401的兩端耦接電源電路402、403。如此一來,電力軌線400、401可共同形成環狀結構而環繞晶片40。如此一來,當崩裂發生於電力軌線400或電力軌線401時,晶片40仍可透過電力軌線400、401的環狀結構將第一電壓V1穩定地傳遞至所有電路區塊10/20/30,因此,晶片40中不會有任何的電路區塊10/20/30由於崩裂而導致失能。
In detail, two ends of the
另外,晶片40中透過設置電源電路402、403,還可穩定電力軌線400、401上所提供的第一電壓V1,因而進一步改善電力軌線400、401在傳遞第一電壓V1時,由於電力軌線400、401的阻抗所造成第一電壓V1的衰減問題。
In addition, by providing
另外,如圖4A中所圈示,電力軌線400、401可具有多種的實施方式。在一實施例中,電力軌線401a可為直線連接的結構。在另一實施例中,電力軌線401b可為方形波浪狀的結構,如此一來,當晶片40是設置在在可撓基板上時,電力軌線401b可透過方形波浪狀的結構提供晶片40整體進行彎折時更好的可撓性且避免晶片40崩裂。
In addition, as circled in Figure 4A, the power rails 400, 401 may have various implementations. In one embodiment, the
圖4B為本發明實施例一晶片41的示意圖。晶片41中設置有多個電路區塊10/20/30、電力軌線410~413及電源電路414~417。電源電路414~417可提供第一電壓V1至電力軌線410~413。電路區塊10/20/30耦接電力軌線410~413以接收第一電壓V1。在一實施例中,晶片41可設置在可撓基板上,由於可撓基板
的可彎折特性,崩裂較容易發生在可撓基板上的訊號線410~413中。
FIG. 4B is a schematic diagram of a
詳細而言,電力軌線410的兩端耦接電源電路414、415。電力軌線411的兩端耦接電源電路415、416,電力軌線412的兩端耦接電源電路416、417,電力軌線413的兩端耦接電源電路417、414。如此一來,電力軌線410~413可共同形成環狀結構而環繞晶片41。如此一來,當崩裂發生於電力軌線410~413的其中一者或多者時,晶片41仍可透過電力軌線410~413的環狀結構以及電源電路414~417將第一電壓V1穩定地傳遞至所有電路區塊10/20/30,因此,晶片41中不會有任何的電路區塊10/20/30由於崩裂而導致失能。
In detail, two ends of the
另外,晶片41中透過設置電源電路414~417,還可穩定電力軌線410~413上所提供的第一電壓V1,因而進一步改善電力軌線410~413在傳遞第一電壓V1時,由於電力軌線410~413的阻抗所造成第一電壓V1的衰減問題。
In addition, by providing
綜上所述,本發明透過將不同的電晶體交錯設置在電路區塊中的第一列及第二列,且透過不同訊號線來提供輸入訊號給第一列及第二列的電晶體,如此一來,當崩裂發生在晶片上時,可有效避免電路區塊的完全失能。 To sum up, the present invention alternately arranges different transistors in the first and second columns of the circuit block, and provides input signals to the transistors in the first and second columns through different signal lines. In this way, when a crack occurs on the chip, the complete loss of the circuit block can be effectively avoided.
10:電路區塊 10:Circuit block
100~108:訊號線 100~108: signal line
IN1、IN2:輸入訊號 IN1, IN2: input signal
M1-1~M1-4、M2-1~M2-4:電晶體 M1-1~M1-4, M2-1~M2-4: transistor
V1:第一電壓 V1: first voltage
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Also Published As
Publication number | Publication date |
---|---|
TW202119291A (en) | 2021-05-16 |
TW202119596A (en) | 2021-05-16 |
TW202119698A (en) | 2021-05-16 |
TWI762894B (en) | 2022-05-01 |
TWI763081B (en) | 2022-05-01 |
TW202205052A (en) | 2022-02-01 |
TWI766412B (en) | 2022-06-01 |
TWI741606B (en) | 2021-10-01 |
TWI743882B (en) | 2021-10-21 |
TW202119879A (en) | 2021-05-16 |
TW202119164A (en) | 2021-05-16 |
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