TWI814937B - Laser device - Google Patents
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- TWI814937B TWI814937B TW108140326A TW108140326A TWI814937B TW I814937 B TWI814937 B TW I814937B TW 108140326 A TW108140326 A TW 108140326A TW 108140326 A TW108140326 A TW 108140326A TW I814937 B TWI814937 B TW I814937B
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- 229910052751 metal Inorganic materials 0.000 claims abstract description 66
- 239000002184 metal Substances 0.000 claims abstract description 66
- 239000004065 semiconductor Substances 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000010410 layer Substances 0.000 claims description 66
- 239000011241 protective layer Substances 0.000 claims description 13
- 238000002161 passivation Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- -1 hydrogen ions Chemical class 0.000 description 3
- 238000004806 packaging method and process Methods 0.000 description 3
- 238000012858 packaging process Methods 0.000 description 3
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Abstract
Description
本揭露是關於一種雷射元件,特別是關於一種小尺寸的雷射元件。The present disclosure relates to a laser component, and in particular to a small-sized laser component.
垂直共振腔面射型雷射(Vertical Cavity Surface Emitting Laser,VCSEL)因具有低功耗、高效能和快速調變等特性以及其廣泛的應用範圍,已逐漸成為新興層面的關鍵元件。因應裝置小型化的發展趨勢,VCSEL的設計亦希望能夠減小其尺寸,並期待能夠維持相同的能源效率或元件效能。Vertical Cavity Surface Emitting Laser (VCSEL) has gradually become a key component in the emerging field due to its low power consumption, high efficiency, fast modulation and other characteristics as well as its wide range of applications. In response to the development trend of device miniaturization, the design of VCSEL also hopes to reduce its size and maintain the same energy efficiency or device performance.
本揭露提出一種雷射元件的新穎設計,能夠在相同的能源效率下縮小其封裝體積,在可製程面積下可提升產出量,降低整體製程成本。This disclosure proposes a novel design of a laser component that can reduce its packaging volume with the same energy efficiency, increase output within the processable area, and reduce overall process costs.
本揭露提出一種雷射元件,其包括一基板;一磊晶結構,位於基板上,磊晶結構包括:一第一半導體結構,一活性結構,位於第一半導體結構上,一第二半導體結構,位於活性結構上,及一電流侷限層,位於活性結構和第二半導體結構之間,電流侷限層包含一電流限制區和由電流限制區圍繞的一電流導通區;一金屬層,其具有貫穿其間的一凹部,凹部的位置係對應於電流導通區;及一保護層,部分覆蓋於金屬層、磊晶結構及基板上,暴露出該金屬層之一第一部分。由雷射元件之上視圖觀之,通過凹部的中心點和第一部分的中心點之一軸線與雷射元件的長邊方向之間係呈一角度θ,其中0°>θ>45°。The present disclosure proposes a laser element, which includes a substrate; an epitaxial structure located on the substrate; the epitaxial structure includes: a first semiconductor structure, an active structure located on the first semiconductor structure, and a second semiconductor structure, on the active structure, and a current confinement layer between the active structure and the second semiconductor structure, the current confinement layer including a current confinement region and a current conduction region surrounded by the current confinement region; a metal layer having a a recess, the position of the recess corresponding to the current conduction area; and a protective layer partially covering the metal layer, the epitaxial structure and the substrate, exposing a first part of the metal layer. Viewed from the top view of the laser element, an axis passing through the center point of the recess and the center point of the first part forms an angle θ with the long side direction of the laser element, where 0°>θ>45°.
下文係參照圖式、並且以示例實施例說明本揭露之概念,在圖式或說明中,相似或相同的部分係使用相同的元件符號;再者,圖式係為利於理解而繪製,圖式中各層之厚度與形狀並非元件之實際尺寸或成比例關係。需特別注意的是,圖式中未繪示、或說明書中未描述之元件,可為熟習揭露所屬領域技藝之人士所知之形式。The concepts of the present disclosure are explained below with reference to the drawings and example embodiments are used. In the drawings or descriptions, similar or identical parts use the same element symbols; furthermore, the drawings are drawn to facilitate understanding. The thickness and shape of each layer are not the actual size or proportional relationship of the component. It should be noted that components not shown in the drawings or described in the specification may be in a form known to those skilled in the art.
請參閱第1A圖至第1C圖,係說明根據本揭露一實施例之雷射元件結構示意圖。第1A圖係根據本揭露實施例之雷射元件上視示意圖,第1B圖係沿第1A圖中線A-A’所示之截面示意圖,第1C圖係沿著第1A圖中線B-B’所示之截面示意圖。Please refer to Figures 1A to 1C, which are schematic diagrams illustrating the structure of a laser element according to an embodiment of the present disclosure. Figure 1A is a schematic top view of a laser element according to an embodiment of the present disclosure, Figure 1B is a schematic cross-sectional view along line AA' in Figure 1A, and Figure 1C is along line B- in Figure 1A The cross-sectional view shown in B'.
併參第1A圖至第1C圖,如圖所示,本揭露之雷射元件100係一垂直共振腔面射型雷射元件(Vertical Cavity Surface Emitting Laser,VCSEL)且包括基板110和位於基板110的一第一表面120上之磊晶結構130。磊晶結構130包括一第一半導體結構131、位於第一半導體結構131上之活性結構132、以及位於活性結構132上之第二半導體結構133。於第二半導體結構133中,形成電流限制區134A及和由電流限制區134A所圍繞的一電流導通區134B。在另一實施例中,於第一半導體結構131中,形成電流限制區134A及電流導通區134B。電流限制區134A可透過氧化製程或是離子佈植(ion implant)製程而形成。在本揭露中,第一半導體結構131和第二半導體結構133包含複數個不同折射率的膜層交互週期性的堆疊(例如:高鋁含量的AlGaAs層及低鋁含量的AlGaAs層交互週期性堆疊),以形成分散式布拉格反射鏡(Distributed Bragg Reflector,DBR),使得由活性結構132發射的光可以在兩個反射鏡中反射以形成同調光。Referring to Figures 1A to 1C, as shown in the figures, the
如上所述,當第一半導體結構131和第二半導體結構133包含複數個的膜層且皆包含鋁時,可使得第一半導體結構131或第二半導體結構133中之其中一層或多層之鋁含量大於97%(定義為電流侷限層125)且大於活性結構132、第一半導體結構131及第二半導體結構133之其他膜層的鋁含量,藉此,在進行氧化製程後,具有鋁含量大於97%之該層或該些層會被氧化以形成電流侷限區134A (例如:氧化鋁)。或者,佈植氫離子(H+
)、氦離子(He+
)或氬離子(Ar+
)來進行離子佈植製程以形成電流限制區134A。As mentioned above, when the
雷射元件100還包括一金屬層140,形成於第一半導體結構131上並具有貫穿其間的一凹部150。凹部150的位置係對應於電流導通區134B且定義為雷射元件100的發光孔位置。本揭露之雷射元件100還包括一保護層160,覆蓋金屬層140、磊晶結構130及基板110。保護層160係部分覆蓋金屬層140以暴露出金屬層140之一第一部分140A。換言之,金屬層140具有第一部份140A及一第二部分140B,第一部分140A未被保護層160覆蓋因而暴露出且供後續製程中打線固晶區之用。第二部分140B被保護層160完全覆蓋,且凹部150係形成於第二部分140B內。保護層160亦延伸至凹部150並覆蓋金屬層140之側壁且直接接觸第二半導體結構133。The
由於第一部分140A係為保護層160未覆蓋之區域,因此設計保護層160的形狀即可定義第一部分140A的形狀。第一部分140A係可設計為具規則或不規則形狀。同樣地,凹部150亦可設計為具規則或不規則形狀。在本揭露中,自雷射元件100的上視圖觀之,凹部150的中心點C1
和第一部分140A的中心點C2
係例如為幾何中心(形心)的位置。舉例而言,在第1A圖所示之實施例中,凹部150和第一部分140A係呈圓形,其各別之中心點C1
、C2
分別為圓形之凹部150和圓形之第一部分140A的圓心位置,亦即兩圓之各別形心位置。圓形凹部150具有直徑(D)係介於10μm至20μm之範圍。一實施例中,通過凹部150的中心點C1
和第一部分140A的中心點C2
之一軸線C與基板110的長邊方向(即第1A圖中線X-X’之方向)之間係呈一角度θ, 0°>θ>45°(例如:20°、30°、40°)。Since the
當凹部150的中心點C1
和第一部分140A的中心點C2
之間連線與雷射元件的長邊方向之間的角度θ為0°時,亦即凹部150的中心點C1
和第一部分的中心點C2
之間連線平行於雷射元件的長邊方向時,凹部150的中心點C1
和第一部分140A的中心點C2
之間的距離必定小於距離d。換言之,在此設計下,雷射元件的發光孔與打線固晶區之間的距離將縮短,則後續進行打線時,雷射元件的發光孔容易因製程誤差而被金屬線路(例如:金球,圖未示)而遮蔽,影響雷射元件的發光效率。又當凹部150的中心點C1
和第一部分140A的中心點C2
之間連線與雷射元件的長邊方向之間的角度θ為大於(或等於)45°時,在令凹部150的中心點C1
與第一部分140A的中心點C2
之間的距離保持同樣為d的情況下,大於或等於45°之角度θ將增加整個雷射元件100’的尺寸(面積),不利於小尺寸裝置之應用。When the angle θ between the center point C 1 of the
於本實施例中,雷射元件100具有長邊L係介於130μm至160μm之間,且短邊W係介於90μm至120μm之間。凹部150(即發光孔)的中心點C1
和第一部分140A(即打線固晶區)的圓形140A中心點C2
之間的距離d可介於10μm至30μm之間。圓形之第一部分140A的直徑為60μm至80μm間。當雷射元件100設計而具有上述尺寸(長邊或/及短邊或/及距離d或/及直徑或/及角度θ)時,雷射元件100可具有最佳的尺寸利用率以及可靠度。In this embodiment, the
根據本揭露,雷射元件的打線固晶區(即前揭金屬層之第一部分140A)的形狀並不限於圓形。為增加打線固晶區的面積以利後續封裝製程的進行,金屬層之第一部分之形狀除了第1A圖所示之圓形外,亦可設計為進一步包含複數個延伸部,例如一個延伸部、兩個延伸部或三個延伸部,亦即形成如第2A圖、第2B圖和第2C圖所示之第一部分240A、340A和440A。如第2A圖所示,第一部分240A包含一圓形2401及一延伸部2402。圓形2401的圓弧部與其兩條正交直徑R1、R2相交於四個點L1~L4,圓弧部可分成四個弧線A1~A4,且圓形2401可分成四個部分P1~P4(分別為右上部P1、左上部P2、左下部P3和右下部P4),前述兩條直徑R1、R2係分別平行於基板110的長邊和短邊。如圖所示,延伸部2402係由圓形2401之右下部P4或弧線A4向外延伸而成。更甚者,延伸部2402係由圓形2401在點L1和點L4處之外切線E1和外切線E4、以及弧線A4之圍設區域所定義。換言之,金屬層240之第一部分240A的邊界係由四分之三圓弧和外切線E1、E4所構成,其中心點C2
為圓形2401的圓心。在本實施例中,外切線E1和外切線E4的長度為圓形2401的半徑且在30μm至40μm間。According to the present disclosure, the shape of the wire bonding area of the laser component (ie, the
如第2B圖所示,第一部分340A包含一圓形3401及兩延伸部3402、3403。圓形3401的圓弧部與其兩條正交直徑R1、R2相交於四個點L1~L4,圓弧部可分成四個弧線A1~A4,且圓形3401可分成四個部分P1~P4(分別為右上部P1、左上部P2、左下部P3和右下部P4),前述兩條直徑R1、R2係分別平行於基板110的長邊和短邊。如圖所示,延伸部3402係由圓形3401之右下部P4或弧線A4向外延伸而成,且延伸部3403係由圓形3401之右上部P1或弧線A1向外延伸而成。更甚者,延伸部3402係由圓形3401在點L1和點L4處之外切線E1和外切線E4、以及弧線A4之圍設區域所定義,而延伸部3403係由圓形3401在點L1和點L2處之外切線E1和外切線E2、以及弧線A1之圍設區域所定義。換言之,金屬層240之第一部分340A的邊界係由二分之一圓弧和外切線E1、E2、E4所構成,其中心點C2
為圓形3401的圓心。在本實施例中,外切線E1的長度為圓形3401的直徑且在60μm至80μm間,外切線E2和外切線E4的長度為圓形3401的半徑且在30μm至40μm間。As shown in Figure 2B, the
第2C圖所示,第一部分440A包含一圓形4401及三個延伸部4402、4403、4404。圓形4401的圓弧部與其兩條正交直徑R1、R2相交於四個點L1~L4,圓弧部可分成四個弧線A1~A4,且圓形4401可分成四個部分P1~P4(分別為右上部P1、左上部P2、左下部P3和右下部P4),前述兩條直徑R1、R2係分別平行於基板110的長邊和短邊。如圖所示,延伸部4402係由圓形4401之右下部P4或弧線A4向外延伸而成,延伸部4403係由圓形4401之右上部P1或弧線A1向外延伸而成,而延伸部4404係由圓形4401之左下部P3或弧線A3向圓外延伸而成。更甚者,延伸部4402係由圓形4401在點L1和點L4處之外切線E1和外切線E4、以及弧線A4之圍設區域所定義,延伸部4403係由圓形4401在點L1和點L2處之外切線E1和外切線E2、以及弧線A1之圍設區域所定義,而延伸部4404則由圓形4401在點L3和點L4處之外切線E3和外切線E4、以及弧線A3之圍設區域所定義。換言之,金屬層440之第一部分440A的邊界係由四分之一圓弧和外切線E1、E2、E3、E4所構成,其中心點C2
為圓形4401的圓心,亦即圓形4401之外接正方形的形心,且此一設計有利於在有限的雷射元件尺寸下,令打線固晶區的面積達到最大化。在本實施例中,外切線E1和外切線E4的長度為圓形4401的直徑且在60μm至80μm間,外切線E2和外切線E3的長度為圓形4401的半徑且在30μm至40μm間。As shown in Figure 2C, the
如前述說明,無論金屬層之第一部分(即雷射元件的打線固晶區)的形狀為何,當凹部150(即發光孔)的中心點和第一部分(即打線固晶區)之圓形中心點之連線與雷射元件的長邊方向之間的角度θ小於45°時,有利於減小雷射元件的整體尺寸,亦可使雷射元件之發光孔和打線固晶區有效分隔,避免後續打線時製程中,金屬線路(圖未示)遮蔽發光孔(即凹部150)。一實施例中,由於打線金屬線路的形態係呈圓球狀,故打線固晶區(即金屬層之第一部分)的邊界至少一部分係包含圓弧邊界,且圓弧邊界係最靠近發光孔(即第2A~2C圖之A2)。As explained above, no matter what the shape of the first part of the metal layer (i.e., the wire bonding area of the laser element) is, when the center point of the recess 150 (i.e., the light-emitting hole) and the circular center of the first part (i.e., the wire bonding area) When the angle θ between the line connecting the points and the long side direction of the laser component is less than 45°, it is beneficial to reduce the overall size of the laser component, and can also effectively separate the light-emitting hole and the wire bonding area of the laser component. This prevents metal lines (not shown) from covering the light-emitting hole (ie, the concave portion 150 ) during the subsequent wiring process. In one embodiment, since the shape of the wired metal circuit is spherical, at least part of the boundary of the wired die-bonding area (ie, the first part of the metal layer) includes an arc boundary, and the arc boundary is closest to the light-emitting hole ( That is A2 in Figures 2A~2C).
由於金屬線路與保護層160之間的黏著力低於金屬線路與金屬層140之間的黏著力,當有金屬線路未完全位於打線固晶區且有部分金屬線路形成於保護層160上時,金屬線路會因固著力不足而脫落,進而降低雷射元件100的可靠度。因此,如第2A~2C圖所示,當進一步考量金屬線路於雷射元件100上的固著力時,如於雷射元件100中使打線固晶區的區域朝向發光孔(凹部150)的相反方向延伸,亦即形成延伸部,可有效降低金屬線路偏離雷射元件的打線固晶區(即金屬層之第一部分440A)的機率,從而提高金屬線路可完全位於打線固晶區的區域內的機率,以提高固著力而增加雷射元件之可靠度。Since the adhesion between the metal lines and the
如前述說明,本揭露提出一種雷射元件,透過其發光孔和打線固晶區之相對位置安排和形狀設計的最佳化,進一步減小雷射元件之封裝體積,同時仍維持不變的能源效率與發光效率,提高雷射元件的應用彈性。As explained above, the present disclosure proposes a laser element that further reduces the packaging volume of the laser element by optimizing the relative position arrangement and shape design of the light-emitting hole and the wire bonding area, while still maintaining the same energy. efficiency and luminous efficiency, improving the application flexibility of laser components.
根據本揭露,雷射元件之發光孔可與打線固晶區有效分隔,避免發光孔因封裝製程中金屬線路偏離打線固晶區而受金屬線路遮蔽。除此之外,在本揭露中,由於打線固晶區的面積因其形狀設計而達最大化,故可有效提高金屬線路與打線固晶區之間的固著力,避免金屬線路脫落。是以,相較於習知雷射元件的設計,本揭露之雷射元件在後續封裝製程中能適應不同的封裝精度,具有較高的應用性。According to the present disclosure, the light-emitting hole of the laser component can be effectively separated from the wire bonding area to prevent the light-emitting hole from being blocked by the metal circuit due to the metal circuit deviating from the wire bonding area during the packaging process. In addition, in the present disclosure, since the area of the wire bonding area is maximized due to its shape design, the adhesion between the metal circuit and the wire bonding area can be effectively improved to prevent the metal circuit from falling off. Therefore, compared with the design of conventional laser components, the laser component of the present disclosure can adapt to different packaging precisions in subsequent packaging processes and has higher applicability.
需注意的是,本揭露所提之前述實施例係僅用於例示說明本揭露,而非用於限制本揭露之範圍。熟習本揭露所屬領域技藝之人對本揭露所進行之諸般修飾和變化皆不脫離本揭露之精神與範疇。不同實施例中相同或相似的構件、或不同實施例中以相同元件符號表示的構件係具有相同的物理或化學特性。此外,在適當的情況下,本揭露之上述實施例係可互相組合或替換,而非僅限於上文所描述的特定實施例。在一實施例中所描述的特定構件與其他構件的連接關係亦可應用於其他實施例中,其皆落於本揭露如附申請專利範圍之範疇。It should be noted that the foregoing embodiments mentioned in the present disclosure are only used to illustrate the present disclosure and are not used to limit the scope of the present disclosure. Various modifications and changes may be made to this disclosure by those skilled in the art to which this disclosure belongs, without departing from the spirit and scope of this disclosure. The same or similar components in different embodiments, or components represented by the same reference numerals in different embodiments, have the same physical or chemical properties. In addition, under appropriate circumstances, the above-mentioned embodiments of the present disclosure can be combined or replaced with each other, and are not limited to the specific embodiments described above. The connection relationship between specific components and other components described in one embodiment can also be applied to other embodiments, and they all fall within the scope of the patent application of the present disclosure.
100:雷射元件 110:基板 120:基板的第一表面 130:磊晶結構 131:第一半導體結構 132:活性結構 133:第二半導體結構 134:電流侷限層 134A:電流限制區 134B:電流導通區 140:金屬層 140A:金屬層的第一部分 140B:金屬層的第二部分 150:凹部 160:保護層 240:金屬層 240A:金屬層的第一部分 2401:(金屬層的第一部分的)圓形 2402:(金屬層的第一部分的)延伸部 340:金屬層 340A:金屬層的第一部分 3401:(金屬層的第一部分的)圓形 3402:(金屬層的第一部分的)延伸部 3403:(金屬層的第一部分的)延伸部 440:金屬層 440A:金屬層的第一部分 4401:(金屬層的第一部分的)圓形 4402:(金屬層的第一部分的)延伸部 4403:(金屬層的第一部分的)延伸部 4404:(金屬層的第一部分的)延伸部 C:軸線 C1 :凹部的中心點 C2 :第一部分的中心點 P1:右上部 P2:左上部 P3:左下部 P4:右下部 R1、R2:直徑 A1~A4:弧線 E1~E4:外切線 L:雷射元件的長邊 W:雷射元件的短邊100: Laser element 110: Substrate 120: First surface of the substrate 130: Epitaxial structure 131: First semiconductor structure 132: Active structure 133: Second semiconductor structure 134: Current confinement layer 134A: Current confinement region 134B: Current conduction Area 140: Metal layer 140A: First part of metal layer 140B: Second part of metal layer 150: Recess 160: Protective layer 240: Metal layer 240A: First part of metal layer 2401: Circle (first part of metal layer) 2402: Extension (of the first part of the metal layer) 340: Metal layer 340A: First part of the metal layer 3401: Round (of the first part of the metal layer) 3402: Extension (of the first part of the metal layer) 3403: ( Extension 440 of the first part of the metal layer: Metal layer 440A: First part of the metal layer 4401: Circular 4402: Extension (of the first part of the metal layer) 4403: (of the first part of the metal layer) (of the first part) extension 4404: (of the first part of the metal layer) extension C: axis C 1 : center point of the recess C 2 : center point of the first part P1: upper right part P2: upper left part P3: lower left part P4: Lower right part R1, R2: Diameter A1~A4: Arc E1~E4: External tangent line L: Long side of laser element W: Short side of laser element
為能更進一步瞭解本揭露之特徵與技術內容,請參閱下述有關本揭露實施例之詳細說明及如附圖式。惟所揭詳細揭露及如附圖式係僅提供參考與說明之用,並非用以對本揭露加以限制;其中:To further understand the features and technical content of the present disclosure, please refer to the following detailed description of the embodiments of the present disclosure and the accompanying drawings. However, the detailed disclosure and accompanying drawings are provided for reference and illustration only and are not intended to limit the disclosure; among them:
第1A圖至第1C圖係根據本揭露一實施例之雷射元件結構示意圖。第1A圖係一上視示意圖,第1B圖係沿第1A圖中線A-A’所示之截面示意圖,第1C圖係沿著第1A圖中線B-B’所示之截面示意圖;Figures 1A to 1C are schematic structural diagrams of a laser element according to an embodiment of the present disclosure. Figure 1A is a schematic top view, Figure 1B is a schematic cross-sectional view along the line A-A’ in Figure 1A, and Figure 1C is a schematic cross-section along the line B-B’ in Figure 1A;
第2A圖至第2C圖係根據本揭露其他實施例之雷射元件的上視示意圖。Figures 2A to 2C are schematic top views of laser components according to other embodiments of the present disclosure.
100:雷射元件100:Laser components
110:基板110:Substrate
120:基板的第一表面120: First surface of substrate
130:磊晶結構130: Epitaxial structure
140:金屬層140:Metal layer
140A:金屬層的第一部分140A: The first part of the metal layer
150:凹部150: concave part
440:金屬層440:Metal layer
440A:金屬層的第一部分440A: The first part of the metal layer
4401:(金屬層的第一部分的)圓形4401: Circle (first part of metal layer)
4402:(金屬層的第一部分的)延伸部4402: Extension (of the first part of the metal layer)
4403:(金屬層的第一部分的)延伸部4403: Extension (of the first part of the metal layer)
4404:(金屬層的第一部分的)延伸部4404: Extension (of the first part of the metal layer)
C:軸線C: Axis
C1 :凹部的中心點C 1 : Center point of the concave part
C2 :第一部分的中心點C 2 : Center point of the first part
E1~E4:外切線E1~E4: outer tangent line
A1~A4:弧線A1~A4: arc
R1、R2:直徑R1, R2: diameter
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TW550866B (en) * | 2002-03-27 | 2003-09-01 | Chunghwa Telecom Co Ltd | Self-aligned process method of ridge shape waveguide semiconductor laser |
TWI282126B (en) * | 2001-08-30 | 2007-06-01 | Semiconductor Energy Lab | Method for manufacturing semiconductor device |
US20140269803A1 (en) * | 2013-03-18 | 2014-09-18 | Samsung Electronics Co., Ltd. | Hybrid vertical cavity laser and method of manufacturing the same |
TW201639258A (en) * | 2016-07-18 | 2016-11-01 | Trend Lighting Corp | Surface emitting laser with enhanced performance |
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TWI282126B (en) * | 2001-08-30 | 2007-06-01 | Semiconductor Energy Lab | Method for manufacturing semiconductor device |
TW550866B (en) * | 2002-03-27 | 2003-09-01 | Chunghwa Telecom Co Ltd | Self-aligned process method of ridge shape waveguide semiconductor laser |
US20140269803A1 (en) * | 2013-03-18 | 2014-09-18 | Samsung Electronics Co., Ltd. | Hybrid vertical cavity laser and method of manufacturing the same |
TW201639258A (en) * | 2016-07-18 | 2016-11-01 | Trend Lighting Corp | Surface emitting laser with enhanced performance |
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