TWI808129B - Printed circuit board and battery module having the same - Google Patents
Printed circuit board and battery module having the same Download PDFInfo
- Publication number
- TWI808129B TWI808129B TW108104672A TW108104672A TWI808129B TW I808129 B TWI808129 B TW I808129B TW 108104672 A TW108104672 A TW 108104672A TW 108104672 A TW108104672 A TW 108104672A TW I808129 B TWI808129 B TW I808129B
- Authority
- TW
- Taiwan
- Prior art keywords
- insulating layer
- metal
- metal layer
- printed circuit
- circuit board
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 claims abstract description 166
- 239000002184 metal Substances 0.000 claims abstract description 166
- 239000011888 foil Substances 0.000 claims description 33
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- 229910000679 solder Inorganic materials 0.000 claims description 12
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 238000009413 insulation Methods 0.000 abstract 3
- 238000010586 diagram Methods 0.000 description 14
- 238000000034 method Methods 0.000 description 12
- 239000003822 epoxy resin Substances 0.000 description 11
- 229920000647 polyepoxide Polymers 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000010949 copper Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 101001134276 Homo sapiens S-methyl-5'-thioadenosine phosphorylase Proteins 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 102100022050 Protein canopy homolog 2 Human genes 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- YZYBNQLOSZEZMO-UHFFFAOYSA-N N1=NN=CC=C1.C1(C=CC(N1)=O)=O.C1(C=CC(N1)=O)=O.N1=NN=CC=C1 Chemical compound N1=NN=CC=C1.C1(C=CC(N1)=O)=O.C1(C=CC(N1)=O)=O.N1=NN=CC=C1 YZYBNQLOSZEZMO-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- 235000011132 calcium sulphate Nutrition 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 description 1
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010881 fly ash Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 229960001545 hydrotalcite Drugs 0.000 description 1
- 229910001701 hydrotalcite Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- GVALZJMUIHGIMD-UHFFFAOYSA-H magnesium phosphate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GVALZJMUIHGIMD-UHFFFAOYSA-H 0.000 description 1
- 239000004137 magnesium phosphate Substances 0.000 description 1
- 229960002261 magnesium phosphate Drugs 0.000 description 1
- 229910000157 magnesium phosphate Inorganic materials 0.000 description 1
- 235000010994 magnesium phosphates Nutrition 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/181—Printed circuits structurally associated with non-printed electric components associated with surface mounted components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/42—Methods or arrangements for servicing or maintenance of secondary cells or secondary half-cells
- H01M10/425—Structural combination with electronic components, e.g. electronic circuits integrated to the outside of the casing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M50/00—Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
- H01M50/50—Current conducting connections for cells or batteries
- H01M50/572—Means for preventing undesired use or discharge
- H01M50/574—Devices or arrangements for the interruption of current
- H01M50/583—Devices or arrangements for the interruption of current in response to current, e.g. fuses
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/115—Via connections; Lands around holes or via connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/185—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Abstract
Description
本揭露是有關於一種印刷電路板以及包括該印刷電路板的電池模組。 The disclosure relates to a printed circuit board and a battery module including the printed circuit board.
本申請案主張於2018年7月13日在韓國智慧財產局提出申請的韓國專利申請案第10-2018-0081645號的權利,所述韓國專利申請案的全部揭露內容出於所有目的併入本案供參考。 This application asserts the rights of Korean Patent Application No. 10-2018-0081645 filed with the Korean Intellectual Property Office on July 13, 2018, the entire disclosure of which is incorporated herein by reference for all purposes.
隨著技術發展及對行動裝置的需求,對可再充電電池的需求迅速增加。與一次性電池或原電池相反,作為可再充電電池的二次電池廣泛用作包括行動裝置的電子產品的能量源。 With the development of technology and the demand for mobile devices, the demand for rechargeable batteries is increasing rapidly. Contrary to primary batteries or primary batteries, secondary batteries, which are rechargeable batteries, are widely used as energy sources for electronic products including mobile devices.
可再充電的(二次)電池由各種可燃材料構成,且在安全方面因為由於過度充電、過電流及其他物理外部影響而存在過熱、爆炸等危險而具有嚴重缺點。因此,此種二次電池可與能夠有效地控制異常狀況(例如,過度充電及過電流)的安全元件進行組合。 Rechargeable (secondary) batteries are composed of various combustible materials and have serious disadvantages in terms of safety due to the danger of overheating, explosion, etc. due to overcharging, overcurrent and other physical external influences. Therefore, such a secondary battery may be combined with safety elements capable of effectively controlling abnormal conditions such as overcharging and overcurrent.
在日本專利公開案第2014-007059(2014年1月16日)中,揭露一種電源供應穩定裝置。 In Japanese Patent Publication No. 2014-007059 (January 16, 2014), a power supply stabilization device is disclosed.
提供本發明內容是為了以簡化的形式介紹一系列概念,所述一系列概念在下文中在實施方式中進一步闡述。本發明內容並不旨在辨識所主張標的的關鍵特徵或本質特徵,亦並非旨在用於幫助確定所主張標的的範圍。 This Summary is provided to introduce a selection of concepts in a simplified form that are further described below in the Detailed Description. This Summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used as an aid in determining the scope of the claimed subject matter.
本揭露的目的是提供一種金屬凸片(metal tab)的可靠性得到改善的印刷電路板以及包括該印刷電路板的電池模組。 The purpose of the present disclosure is to provide a printed circuit board with improved reliability of metal tabs and a battery module including the printed circuit board.
在一個一般態樣中,一種印刷電路板包括:絕緣層;以及金屬層,形成於所述絕緣層內部且具有自所述絕緣層的一個側表面突出的一端。 In one general aspect, a printed circuit board includes: an insulating layer; and a metal layer formed inside the insulating layer and having one end protruding from one side surface of the insulating layer.
在另一一般態樣中,一種電池模組包括:電池單元,包括電極;以及印刷電路板,耦接至所述電池單元,其中所述印刷電路板包括:絕緣層;以及金屬層,形成於所述絕緣層內部且具有自所述絕緣層的一個側表面突出的一端,其中所述金屬層的自所述絕緣層的一個側表面突出的所述一端電性連接至所述電池單元的所述電極。 In another general aspect, a battery module includes: a battery unit including electrodes; and a printed circuit board coupled to the battery unit, wherein the printed circuit board includes: an insulating layer; and a metal layer formed inside the insulating layer and having one end protruding from one side surface of the insulating layer, wherein the one end protruding from one side surface of the insulating layer is electrically connected to the electrode of the battery unit.
藉由以下詳細說明、圖式及申請專利範圍,其他特徵及態樣將顯而易見。 Other features and aspects will be apparent from the following detailed description, drawings and claims.
10:電池單元 10: Battery unit
11:電極 11: Electrode
20:印刷電路板 20: Printed circuit board
110:第一絕緣層 110: the first insulating layer
120:第二絕緣層 120: second insulating layer
200:金屬層 200: metal layer
200a、200b:單位金屬層 200a, 200b: unit metal layer
210、210a、210b:金屬凸片 210, 210a, 210b: metal tabs
220:金屬箔 220: metal foil
310:第一電路 310: first circuit
320:第二電路 320: second circuit
410:第一通孔 410: the first through hole
420:第二通孔 420: Second through hole
430:穿孔/第三通孔 430: Perforation / third through hole
500:阻焊劑 500: solder resist
C1、C2、C3、C4、C5:空腔 C1, C2, C3, C4, C5: cavities
E1、E2:電子組件 E1, E2: electronic components
M:金屬層/金屬材料 M: metal layer/metal material
S:焊料 S: Solder
圖1是示出根據實施例的印刷電路板的圖。 FIG. 1 is a diagram illustrating a printed circuit board according to an embodiment.
圖2(a)、圖2(b)及圖2(c)是示出自另一側觀察的圖1所示根據實施例的印刷電路板的圖。 2( a ), FIG. 2( b ), and FIG. 2( c ) are views showing the printed circuit board shown in FIG. 1 according to the embodiment viewed from the other side.
圖3是示出根據實施例的印刷電路板的圖。 FIG. 3 is a diagram illustrating a printed circuit board according to an embodiment.
圖4是示出根據實施例的印刷電路板的圖。 FIG. 4 is a diagram illustrating a printed circuit board according to an embodiment.
圖5是示出根據實施例的印刷電路板的圖。 FIG. 5 is a diagram illustrating a printed circuit board according to an embodiment.
圖6(a)、圖6(b)及圖6(c)至圖8(a)、圖8(b)及圖8(c)是示出根據一或多個實施例的製造印刷電路板的方法的圖。 6(a), 6(b) and 6(c) to 8(a), 8(b) and 8(c) are diagrams illustrating a method of manufacturing a printed circuit board according to one or more embodiments.
圖9及圖10是示出根據一或多個實施例的電池模組的圖。 9 and 10 are diagrams illustrating a battery module according to one or more embodiments.
在所有圖式及詳細說明通篇中,相同的參考編號指代相同的元件。所述圖式可能未必按比例繪製,且為清晰、例示及方便起見,圖式中的元件的相對大小、比例及繪示可誇大。 Like reference numbers refer to like elements throughout the drawings and detailed description. The drawings may not necessarily be drawn to scale and the relative size, proportions and depiction of elements in the drawings may be exaggerated for clarity, illustration and convenience.
提供以下詳細說明是為了幫助讀者獲得對本文中所述方法、設備及/或系統的全面理解。然而,對於此項技術中具有通常知識者而言,在理解以下說明之後,本文中所述方法、設備及/或系統的各種改變、修改及等效形式將顯而易見。本文中所述操作順序僅為實例,且並非僅限於本文中所述該些操作順序,而是在理解以下說明之後,如對於此項技術中具有通常知識者而言將顯 而易見,除必定以特定次序出現的操作以外,皆可有所改變。 The following detailed description is provided to assist the reader in gaining a comprehensive understanding of the methods, devices and/or systems described herein. However, various changes, modifications, and equivalents of the methods, apparatus, and/or systems described herein will become apparent to those of ordinary skill in the art upon understanding the following description. The sequence of operations described herein are examples only, and are not intended to be limited to those described herein, but, after understanding the following description, as will be apparent to those of ordinary skill in the art It is easy to see that, except for the operations that must appear in a certain order, all can be changed.
本文中所述特徵可被實施為不同形式,且不應被視為僅限於本文中所述實例。確切而言,提供本文中所述實例是為了使此揭露內容將透徹,並將向此項技術中具有通常知識者傳達本揭露。 The features described herein may be implemented in different forms and should not be construed as limited to the examples described herein. Rather, the examples described herein are provided so that this disclosure will be thorough and will convey this disclosure to those of ordinary skill in the art.
應理解,儘管本文中可能使用用語「第一(first)」、「第二(second)」、「第三(third)」、「第四(fourth)」等中的任一者來闡述各種元件,然而該些元件不應受限於該些用語。該些用語僅用於區分各個元件。舉例而言,第一元件可被稱為第二元件,且類似地,在不背離本揭露的範圍的條件下,第二元件可被稱為第一元件。類似地,當闡述一種方法包括一系列操作時,所述操作的順序並非所述操作應按照順序執行的順序,任意技術操作可被省略及/或可向所述方法中添加本文中未揭露的另一任意操作。 It should be understood that although any of the terms "first", "second", "third", "fourth", etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish various elements. For example, a first element could be termed a second element, and, similarly, a second element could be termed a first element, without departing from the scope of the present disclosure. Similarly, when it is stated that a method includes a series of operations, the order of the operations is not the order in which the operations should be performed, any technical operation may be omitted and/or another arbitrary operation not disclosed herein may be added to the method.
除非另外指明,否則第一層位於第二層或基板「上」的任何陳述皆應被解釋為涵蓋其中第一層直接接觸第二層或基板的情形以及其中在第一層與第二層或基板之間設置一或多個其他層的情形二者。 Unless otherwise indicated, any statement that a first layer is "on" a second layer or substrate should be construed to encompass both situations where the first layer is in direct contact with the second layer or substrate and situations where one or more other layers are disposed between the first layer and the second layer or substrate.
可使用例如「在...下方(below)」、「在...下面(beneath)」、「在...之下(under)」、「下部(lower)」、「底部(bottom)」、「在...上方(above)」、「在...之上(over)」、「上部(upper)」、「頂部(top)」、「左(left)」及「右(right)」中的任一者等闡述相對空間關係的用詞來方便地闡述一個裝置或元件與其他裝置或元件的空間關 係。此類用詞應被解釋為囊括如圖式所示取向以及在使用或操作中處於其他取向的裝置。舉例而言,其中裝置包括基於圖式所示裝置的取向設置於第一層上方的第二層的實例亦囊括當裝置在使用或操作中上下翻轉時的裝置。 It is convenient to describe a device or device using terms such as "below", "beneath", "under", "lower", "bottom", "above", "over", "upper", "top", "left" and "right", etc. Spatial relationship between components and other devices or components Tie. Such terms should be construed to encompass the device in the orientation shown in the drawings as well as in other orientations in use or operation. For example, embodiments in which the device includes a second layer disposed above a first layer based on the orientation of the device as shown in the drawings also encompass devices when the device is turned upside down in use or operation.
在下文中,將參照附圖詳細闡述本揭露的某些實施例。 Hereinafter, some embodiments of the present disclosure will be described in detail with reference to the accompanying drawings.
印刷電路板A printed circuit board
圖1是示出根據實施例的印刷電路板的圖。圖2(a)、圖2(b)及圖2(c)是示出自另一側觀察的圖1所示根據實施例的印刷電路板的圖。具體而言,圖2(a)是示出圖1所示印刷電路板的一個表面的圖,圖2(b)是示出自頂部側觀察的圖1所示印刷電路板的圖,且圖2(c)是僅示出圖2(b)所示金屬層的圖。 FIG. 1 is a diagram illustrating a printed circuit board according to an embodiment. 2( a ), FIG. 2( b ), and FIG. 2( c ) are views showing the printed circuit board shown in FIG. 1 according to the embodiment viewed from the other side. Specifically, FIG. 2(a) is a diagram showing one surface of the printed circuit board shown in FIG. 1, FIG. 2(b) is a diagram showing the printed circuit board shown in FIG. 1 viewed from the top side, and FIG. 2(c) is a diagram showing only the metal layer shown in FIG. 2(b).
參照圖1以及圖2(a)、圖2(b)及圖2(c),根據實施例的印刷電路板包括:絕緣層;以及金屬層200且具有自絕緣層的一個側表面突出的一端。此處,金屬層200的自絕緣層的一個側表面突出的一端可被稱為「金屬凸片210」。 Referring to FIGS. 1 and 2(a), 2(b) and 2(c), a printed circuit board according to an embodiment includes: an insulating layer; and a metal layer 200 having one end protruding from one side surface of the insulating layer. Here, one end of the metal layer 200 protruding from one side surface of the insulating layer may be referred to as a 'metal tab 210'.
絕緣層可包括第一絕緣層110及第二絕緣層120。第一絕緣層110可層合(laminate)於金屬層200的兩個表面上,且第二絕緣層120可層合於第一絕緣層110上。 The insulating layer may include a first insulating layer 110 and a second insulating layer 120 . The first insulating layer 110 may be laminated on both surfaces of the metal layer 200 , and the second insulating layer 120 may be laminated on the first insulating layer 110 .
絕緣層(第一絕緣層110及第二絕緣層120中的每一者)可為由絕緣材料(例如樹脂)構成的層。絕緣層的樹脂可為各種材料,例如熱固性樹脂及熱塑性樹脂。具體而言,絕緣層的樹脂可為環氧樹脂、聚醯亞胺、雙馬來醯亞胺三嗪(bismaleimide triazine,BT)樹脂等。環氧樹脂的實例可包括萘型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、酚醛型環氧樹脂、甲酚酚醛型環氧樹脂、橡膠改性環氧樹脂、環狀脂肪族環氧樹脂、矽系環氧樹脂、氮系環氧樹脂、磷系環氧樹脂等,但並非僅限於此。 The insulating layer (each of the first insulating layer 110 and the second insulating layer 120 ) may be a layer made of insulating material such as resin. The resin of the insulating layer can be various materials, such as thermosetting resin and thermoplastic resin. Specifically, the resin of the insulating layer can be epoxy resin, polyimide, bismaleimide triazine (bismaleimide) triazine, BT) resin, etc. Examples of the epoxy resin may include naphthalene type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, cresol novolac type epoxy resin, rubber modified epoxy resin, cycloaliphatic epoxy resin, silicon type epoxy resin, nitrogen type epoxy resin, phosphorus type epoxy resin, etc., but are not limited thereto.
絕緣層可包含纖維增強材料(例如,玻璃布),且可為預浸體(prepreg,PPG)。絕緣層亦可為樹脂被無機填料(例如,二氧化矽(SiO2))填充的構成膜。作為此種構成膜,可使用味之素構成膜(Ajinomoto Build-up Film,ABF)等。無機填料可為二氧化矽(SiO2)、硫酸鋇(BaSO4)及氧化鋁(Al2O3)中的至少一者。無機填料可單獨使用或者以兩者或更多者的組合的方式來使用。無機填料的實例可包括碳酸鈣、碳酸鎂、飛灰、天然二氧化矽、合成二氧化矽、高嶺土、黏土、氧化鈣、氧化鎂、氧化鈦、氧化鋅、氫氧化鈣、氫氧化鋁、氫氧化鎂、滑石、雲母、水滑石、矽酸鋁、矽酸鎂、矽酸鈣、煆燒滑石、矽灰石、鈦酸鉀、硫酸鎂、硫酸鈣、磷酸鎂等,但並非僅限於此。 The insulating layer may comprise fiber reinforced material (eg, glass cloth) and may be a prepreg (PPG). The insulating layer may also be a constituent film in which a resin is filled with an inorganic filler (for example, silicon dioxide (SiO 2 )). As such a constituent film, Ajinomoto Build-up Film (ABF) or the like can be used. The inorganic filler can be at least one of silicon dioxide (SiO 2 ), barium sulfate (BaSO 4 ), and aluminum oxide (Al 2 O 3 ). The inorganic fillers may be used alone or in combination of two or more. Examples of inorganic fillers may include calcium carbonate, magnesium carbonate, fly ash, natural silica, synthetic silica, kaolin, clay, calcium oxide, magnesium oxide, titanium oxide, zinc oxide, calcium hydroxide, aluminum hydroxide, magnesium hydroxide, talc, mica, hydrotalcite, aluminum silicate, magnesium silicate, calcium silicate, calcined talc, wollastonite, potassium titanate, magnesium sulfate, calcium sulfate, magnesium phosphate, etc., but are not limited thereto.
第一絕緣層110及第二絕緣層120可由相同或不同的材料製成,但並非僅限於此。 The first insulating layer 110 and the second insulating layer 120 can be made of the same or different materials, but not limited thereto.
金屬層200是由例如以下金屬製成的板形結構(plate-shaped structure):鎳(Ni)、銅(Cu)或鋁(Al)等。金屬層200形成於絕緣層內部。亦即,第一絕緣層110層合於金屬層200的上表面及下表面上且第二絕緣層120層合於第一絕緣層110上以使得形成三明治結構(sandwich structure),在所述三明 治結構中,第一絕緣層110及第二絕緣層120形成於金屬層200上方及下方。 The metal layer 200 is a plate-shaped structure made of, for example, nickel (Ni), copper (Cu), or aluminum (Al). The metal layer 200 is formed inside the insulating layer. That is, the first insulating layer 110 is laminated on the upper and lower surfaces of the metal layer 200 and the second insulating layer 120 is laminated on the first insulating layer 110 so that a sandwich structure is formed in which In the structure, the first insulating layer 110 and the second insulating layer 120 are formed above and below the metal layer 200 .
由於金屬層200在絕緣層內部形成於大的面積中且金屬具有高導熱性,因此金屬層200可改善平面方向上的散熱功能。 Since the metal layer 200 is formed in a large area inside the insulating layer and metal has high thermal conductivity, the metal layer 200 can improve the heat dissipation function in the planar direction.
如圖1以及圖2(a)、圖2(b)及圖2(c)所示,金屬層200的一端可自絕緣層的一個側表面突出。金屬層200的自絕緣層的一個側表面突出的一端成為「金屬凸片210」。儘管圖中示出金屬凸片210的長度較不是金屬凸片210的部分的長度短,但是金屬凸片210的長度亦可為較長的。 As shown in FIG. 1 and FIG. 2( a ), FIG. 2( b ) and FIG. 2( c ), one end of the metal layer 200 may protrude from one side surface of the insulating layer. One end protruding from one side surface of the insulating layer of the metal layer 200 becomes a “metal bump 210 ”. Although the figure shows that the length of the metal tab 210 is shorter than the length of the portion that is not the metal tab 210 , the length of the metal tab 210 may also be longer.
金屬箔220可提供於金屬層200的一個表面上。金屬箔220的厚度可小於金屬層200的厚度。形成金屬層200的金屬與形成金屬箔220的金屬可彼此不同。舉例而言,金屬層200可由鎳製成且金屬箔220可由銅製成。 The metal foil 220 may be provided on one surface of the metal layer 200 . The thickness of the metal foil 220 may be smaller than that of the metal layer 200 . The metal forming the metal layer 200 and the metal forming the metal foil 220 may be different from each other. For example, the metal layer 200 can be made of nickel and the metal foil 220 can be made of copper.
形成於金屬層200的一個表面上的金屬箔220可形成於金屬層200的包括金屬凸片210的整個表面上。在此種情形中,金屬箔220可與金屬凸片210一起自絕緣層的一個側表面突出。 The metal foil 220 formed on one surface of the metal layer 200 may be formed on the entire surface of the metal layer 200 including the metal tab 210 . In this case, the metal foil 220 may protrude from one side surface of the insulating layer together with the metal tab 210 .
在金屬層200中可形成穿過金屬層200的上表面及下表面的空腔C1、C2及C3。該些空腔C1、C2及C3可穿過金屬層200以及形成於金屬層200上方及下方的第一絕緣層110。亦即,空腔C1、C2及C3在垂直方向上一同穿過金屬層200及第一絕緣層110。 Cavities C1 , C2 and C3 may be formed in the metal layer 200 through the upper and lower surfaces of the metal layer 200 . The cavities C1 , C2 and C3 may pass through the metal layer 200 and the first insulating layer 110 formed above and below the metal layer 200 . That is, the cavities C1 , C2 and C3 pass through the metal layer 200 and the first insulating layer 110 together in the vertical direction.
電子組件E1及E2可插入一些空腔C1及C2中且穿孔 (through via)430可穿過另一空腔C3。電子組件E1及E2可插入空腔C1及C2中以向下移位。在此種情形中,電子組件E1及E2的下表面可位於空腔C1及C2的下表面上。電子組件E1與E2的大小(厚度)可彼此不同。 Electronic components E1 and E2 can be inserted into some cavities C1 and C2 and perforated (through via) 430 may pass through another cavity C3. The electronic components E1 and E2 can be inserted into the cavities C1 and C2 for downward displacement. In this case, the lower surfaces of the electronic components E1 and E2 may be located on the lower surfaces of the cavities C1 and C2. The size (thickness) of the electronic components E1 and E2 may be different from each other.
電子組件E1及E2的大小可小於空腔C1及C2的大小。在將電子組件E1及E2插入空腔C1及C2中之後,可利用第二絕緣層120來填充空腔C1及C2的剩餘空間。 The sizes of the electronic components E1 and E2 may be smaller than the sizes of the cavities C1 and C2. After the electronic components E1 and E2 are inserted into the cavities C1 and C2 , the second insulating layer 120 may be used to fill the remaining spaces of the cavities C1 and C2 .
如圖2(a)、圖2(b)及圖2(c)所示,金屬層200可被劃分成兩個區。亦即,金屬層200可由兩個單位金屬層200a及200b形成,且所述兩個單位金屬層200a與200b可彼此絕緣。單位金屬層200a及單位金屬層200b可分別包括金屬凸片210a及金屬凸片210b。在此種情形中,如圖2(a)所示,一對金屬凸片210a及210b可自絕緣層的一個側表面突出。所述一對金屬凸片210a與210b彼此間隔開。 As shown in FIG. 2( a ), FIG. 2( b ) and FIG. 2( c ), the metal layer 200 can be divided into two regions. That is, the metal layer 200 may be formed of two unit metal layers 200a and 200b, and the two unit metal layers 200a and 200b may be insulated from each other. The unit metal layer 200a and the unit metal layer 200b may respectively include a metal bump 210a and a metal bump 210b. In this case, as shown in FIG. 2( a ), a pair of metal tabs 210 a and 210 b may protrude from one side surface of the insulating layer. The pair of metal tabs 210a and 210b are spaced apart from each other.
所述兩個單位金屬層200a及200b可藉由在所述兩個單位金屬層200a與200b之間形成空腔C4而彼此分隔開且彼此電性絕緣(在圖2(c)中未示出其他空腔C1至C3)。亦即,空腔C4穿過金屬層200的上表面及下表面,同時被形成為在平面方向上與金屬層200交叉。 The two unit metal layers 200a and 200b may be separated and electrically insulated from each other by forming a cavity C4 between the two unit metal layers 200a and 200b (other cavities C1 to C3 are not shown in FIG. 2( c )). That is, the cavity C4 passes through the upper and lower surfaces of the metal layer 200 while being formed to cross the metal layer 200 in a planar direction.
再次參照圖1,第一電路310可形成於第一絕緣層110的外表面上,且第二電路320可形成於第二絕緣層120的外表面上。第一電路310及第二電路320可為經圖案化的導體。第一電路310 及第二電路320可傳送電訊號。另外,第一電路310及第二電路320可用作接地點(ground)。 Referring again to FIG. 1 , the first circuit 310 may be formed on the outer surface of the first insulating layer 110 , and the second circuit 320 may be formed on the outer surface of the second insulating layer 120 . The first circuit 310 and the second circuit 320 may be patterned conductors. first circuit 310 And the second circuit 320 can transmit electrical signals. In addition, the first circuit 310 and the second circuit 320 can be used as grounds.
第一電路310及第二電路320可由例如以下金屬形成:銅(Cu)、鈀(Pd)、鋁(Al)、鎳(Ni)、鈦(Ti)、金(Au)、鉑(Pt)或其合金。 The first circuit 310 and the second circuit 320 may be formed of metals such as copper (Cu), palladium (Pd), aluminum (Al), nickel (Ni), titanium (Ti), gold (Au), platinum (Pt) or alloys thereof.
印刷電路板可更包括通孔。具體而言,第一通孔410可將電子組件E1及E2連接至第二電路320。第二通孔420可連接金屬層200與第二電路320。第三通孔430可將位於第二絕緣層120的兩個表面上的第二電路320連接至彼此。另外,印刷電路板可提供有通孔,所述通孔連接第一電路310與第二電路320且將位於第一絕緣層110的兩個外表面上的第一電路310連接至彼此。 The printed circuit board may further include through holes. Specifically, the first through hole 410 can connect the electronic components E1 and E2 to the second circuit 320 . The second via hole 420 can connect the metal layer 200 and the second circuit 320 . The third via hole 430 may connect the second circuits 320 on both surfaces of the second insulating layer 120 to each other. In addition, the printed circuit board may be provided with a through hole connecting the first circuit 310 and the second circuit 320 and connecting the first circuit 310 on both outer surfaces of the first insulating layer 110 to each other.
第一通孔410可穿過第二絕緣層120以將電子組件E1及E2的電極連接至第二電路320。第一通孔410可接觸電子組件E1及E2的電極的下表面。 The first via hole 410 may pass through the second insulating layer 120 to connect the electrodes of the electronic components E1 and E2 to the second circuit 320 . The first through hole 410 may contact the lower surfaces of the electrodes of the electronic components E1 and E2.
第二通孔420可穿過第一絕緣層110及第二絕緣層120以接觸金屬層200的金屬箔220。金屬箔220形成於金屬層200的下表面上且第二通孔420穿過位於金屬層200下方的第一絕緣層110及第二絕緣層120。 The second via hole 420 can pass through the first insulating layer 110 and the second insulating layer 120 to contact the metal foil 220 of the metal layer 200 . The metal foil 220 is formed on the lower surface of the metal layer 200 and the second via hole 420 passes through the first insulating layer 110 and the second insulating layer 120 under the metal layer 200 .
第一通孔410及第二通孔420可相對於金屬層200形成於同一側上。亦即,如圖1所示,第一通孔410及第二通孔420可形成於金屬層200下方。 The first via hole 410 and the second via hole 420 may be formed on the same side relative to the metal layer 200 . That is, as shown in FIG. 1 , the first through hole 410 and the second through hole 420 may be formed under the metal layer 200 .
另一方面,第一通孔410及第二通孔420可形成於金屬 層200的上表面上。在此種情形中,第一通孔410可電性連接至電子組件E1及E2的電極的上表面,且金屬箔220可形成於金屬層200的上表面上。 On the other hand, the first through hole 410 and the second through hole 420 can be formed in metal on the upper surface of layer 200. In this case, the first through hole 410 can be electrically connected to the upper surface of the electrodes of the electronic components E1 and E2 , and the metal foil 220 can be formed on the upper surface of the metal layer 200 .
穿孔430可穿過絕緣層的上表面及下表面。空腔C3可形成於金屬層200中,穿孔430穿過金屬層200。亦即,穿孔430可穿過第一絕緣層110、第二絕緣層120及金屬層200。空腔C3可穿過金屬層200及第一絕緣層110。第二絕緣層120可被引入空腔C3中且穿孔430可不僅穿過層合於第一絕緣層110上的第二絕緣層120而且亦可穿過被引入空腔C3中的第二絕緣層120。 The through hole 430 may pass through the upper surface and the lower surface of the insulating layer. The cavity C3 may be formed in the metal layer 200 , and the through hole 430 passes through the metal layer 200 . That is, the through hole 430 may pass through the first insulating layer 110 , the second insulating layer 120 and the metal layer 200 . The cavity C3 may pass through the metal layer 200 and the first insulating layer 110 . The second insulating layer 120 may be introduced into the cavity C3 and the perforation hole 430 may pass not only through the second insulating layer 120 laminated on the first insulating layer 110 but also through the second insulating layer 120 introduced into the cavity C3.
穿孔430可藉由對穿孔孔洞(through hole)的內壁進行鍍覆而形成。穿孔430可藉由對穿孔孔洞的整個內部進行鍍覆而形成。 The through hole 430 may be formed by plating the inner wall of the through hole. The through hole 430 may be formed by plating the entire interior of the through hole.
印刷電路板可更包括阻焊劑500。阻焊劑500可形成於絕緣層的兩個表面上。具體而言,阻焊劑500可層合於第二絕緣層120上以保護第二電路320。另一方面,阻焊劑500可提供有開口,所述開口暴露出第二電路320的至少一部分。被暴露出的第二電路320可用作用於外部連接的接墊。 The printed circuit board may further include a solder resist 500 . The solder resist 500 may be formed on both surfaces of the insulating layer. Specifically, the solder resist 500 may be laminated on the second insulating layer 120 to protect the second circuit 320 . On the other hand, the solder resist 500 may be provided with an opening exposing at least a portion of the second circuit 320 . The exposed second circuit 320 may be used as a pad for external connection.
圖3是示出根據實施例的印刷電路板的圖。參照圖3,在第二電路320的外表面上可形成有粗糙度。亦即,第二電路320的外表面可具有凹面及凸面。粗糙度(凹面及凸面)可改善印刷電路板的散熱。 FIG. 3 is a diagram illustrating a printed circuit board according to an embodiment. Referring to FIG. 3 , roughness may be formed on an outer surface of the second circuit 320 . That is, the outer surface of the second circuit 320 may have concave and convex surfaces. Roughness (concave and convex) can improve the heat dissipation of printed circuit boards.
具有粗糙度的第二電路320可傳送電訊號或執行接地功 能。舉例而言,在第二電路320的用於傳送電訊號的部分及用於執行接地功能的部分二者上可形成有粗糙度。另外,可僅在第二電路320的用於執行接地功能的部分上形成粗糙度。 The second circuit 320 with roughness can transmit electric signal or perform ground function able. For example, roughness may be formed on both the portion of the second circuit 320 for transmitting electrical signals and the portion for performing a grounding function. In addition, roughness may be formed only on a portion of the second circuit 320 for performing a ground function.
另外,具有粗糙度的第二電路320可設置於熱量產生集中的熱點(例如,積體電路(integrated circuit,IC))附近。 In addition, the rough second circuit 320 may be disposed near a hot spot (for example, an integrated circuit (IC)) where heat generation is concentrated.
圖4至圖5是示出根據一或多個實施例的印刷電路板的圖。參照圖4,金屬箔220可不形成於金屬層200的自絕緣層的一個側表面突出的一端上。參照圖5,金屬箔220可形成於金屬層200的兩個表面上,且形成於所述兩個表面上的金屬箔220可自絕緣層的一個側表面突出。金屬箔220可採用除了圖4及圖5所示形式之外的各種形式形成以達成金屬箔220的導電性。 4 to 5 are diagrams illustrating printed circuit boards according to one or more embodiments. Referring to FIG. 4 , the metal foil 220 may not be formed on one end of the metal layer 200 protruding from one side surface of the insulating layer. Referring to FIG. 5, the metal foil 220 may be formed on both surfaces of the metal layer 200, and the metal foil 220 formed on the two surfaces may protrude from one side surface of the insulating layer. The metal foil 220 may be formed in various forms other than those shown in FIGS. 4 and 5 to achieve the conductivity of the metal foil 220 .
製備印刷電路板的方法Method for preparing printed circuit boards
圖6(a)至圖8(c)是示出根據一或多個實施例的製造印刷電路板的方法的圖。 6(a) to 8(c) are diagrams illustrating a method of manufacturing a printed circuit board according to one or more embodiments.
參照圖6(a),提供一個表面上具有金屬箔220的金屬層200。 Referring to FIG. 6(a), a metal layer 200 having a metal foil 220 on its surface is provided.
參照圖6(b),可在金屬層200的兩個表面上形成第一絕緣層110,且可在第一絕緣層110的外表面上提供有金屬層M。儘管第一絕緣層110與金屬層M在圖6(b)中被示出為彼此分隔開,然而第一絕緣層110與金屬材料M可成一體地形成為覆銅層合板(copper clad laminate,CCL)。 Referring to FIG. 6( b ), the first insulating layer 110 may be formed on both surfaces of the metal layer 200 , and the metal layer M may be provided on an outer surface of the first insulating layer 110 . Although the first insulating layer 110 and the metal layer M are shown separated from each other in FIG. 6( b ), the first insulating layer 110 and the metal material M may be integrally formed as a copper clad laminate (CCL).
參照圖6(c),可自金屬層M形成第一電路310。第一電 路310可藉由例如以下各種方法形成:半加成製程(semi-additive process,SAP)、經修改的半加成製程(modified semi-additive process,MSAP)或封孔(tenting)等。另一方面,在其中欲形成空腔的部分處可不形成第一電路310。 Referring to FIG. 6( c ), the first circuit 310 may be formed from the metal layer M. Referring to FIG. first electric The via 310 can be formed by, for example, the following methods: semi-additive process (semi-additive process, SAP), modified semi-additive process (modified semi-additive process, MSAP), or tenting. On the other hand, the first circuit 310 may not be formed at a portion where the cavity is to be formed.
參照圖7(a),可形成一同穿過金屬層200及第一絕緣層110的空腔C1、C2及C3。另外,亦可形成在平面方向上與金屬層200交叉的空腔C4。用於金屬凸片210的空腔C5亦可形成。空腔C1至C5可藉由各種鑽孔形成。 Referring to FIG. 7( a ), cavities C1 , C2 and C3 passing through the metal layer 200 and the first insulating layer 110 together may be formed. In addition, the cavity C4 crossing the metal layer 200 in the planar direction may also be formed. A cavity C5 for the metal tab 210 may also be formed. The cavities C1 to C5 can be formed by various drillings.
在圖7(a)所示步驟之後的金屬層200的形狀被示出為位於圖7(a)所示上方上。金屬層200可被劃分成兩個單位金屬層200a及200b,所述兩個單位金屬層200a及200b可分別具有金屬凸片210a及金屬凸片210b以使得金屬層200可具有一對金屬凸片210a與210b。 The shape of the metal layer 200 after the step shown in FIG. 7( a ) is shown on top of that shown in FIG. 7( a ). The metal layer 200 can be divided into two unit metal layers 200a and 200b, and the two unit metal layers 200a and 200b can respectively have a metal tab 210a and a metal tab 210b so that the metal layer 200 can have a pair of metal tabs 210a and 210b.
參照圖7(b),可分別將電子組件E1及E2插入空腔C1及C2中。當插入電子組件E1及E2時,可將膠帶臨時貼合至第一絕緣層110的下表面(第一電路310的下表面),且可將電子組件E1及E2安裝於膠帶上。在此種情形中,電子組件E1及E2的每一個表面皆可位於同一平面上。 Referring to FIG. 7(b), electronic components E1 and E2 may be inserted into cavities C1 and C2, respectively. When the electronic components E1 and E2 are inserted, the tape may be temporarily attached to the lower surface of the first insulating layer 110 (the lower surface of the first circuit 310 ), and the electronic components E1 and E2 may be mounted on the tape. In this case, each surface of the electronic components E1 and E2 can be located on the same plane.
參照圖7(c),可對第二絕緣層120進行層合。第二絕緣層120亦可包括金屬層M。可使第二絕緣層120填充(流動)至在垂直方向上一同穿過金屬層200及第一絕緣層110的空腔C1、C2及C3中。亦可使第二絕緣層120填充(流動)至與金屬層200 交叉的空腔C4中以及用於金屬凸片210的空腔C5中。 Referring to FIG. 7(c), the second insulating layer 120 may be laminated. The second insulating layer 120 may also include a metal layer M. As shown in FIG. The second insulating layer 120 may be filled (flowed) into the cavities C1 , C2 , and C3 passing through the metal layer 200 and the first insulating layer 110 together in the vertical direction. It is also possible to fill (flow) the second insulating layer 120 to the metal layer 200 In the intersecting cavity C4 and in the cavity C5 for the metal tab 210 .
參照圖8(a),可自金屬層M形成第二電路320。第二電路320可藉由例如以下各種方法形成:SAP、MSAP或封孔等。另外,可在第二電路320的外表面上形成粗糙度。亦即,第二電路320的外表面可具有凹面及凸面。第二電路320的外表面的粗糙度(凹面及凸面)可藉由蝕刻形成。 Referring to FIG. 8( a ), the second circuit 320 may be formed from the metal layer M. Referring to FIG. The second circuit 320 can be formed by, for example, the following various methods: SAP, MSAP, or sealing holes. In addition, roughness may be formed on the outer surface of the second circuit 320 . That is, the outer surface of the second circuit 320 may have concave and convex surfaces. The roughness (concave and convex) of the outer surface of the second circuit 320 can be formed by etching.
可與第二電路320的形成一起來形成第一通孔410、第二通孔420及穿孔430。第一通孔410可藉由對穿過第二絕緣層120的通孔孔洞的內部進行鍍覆來形成以連接至電子組件E1及E2的電極。第二通孔420可藉由對穿過第一絕緣層110及第二絕緣層120的通孔孔洞的內部進行鍍覆來形成以連接至金屬箔220。穿孔430可穿過空腔C3以及穿過流動至空腔C3中的第二絕緣層120。 The first through hole 410 , the second through hole 420 and the through hole 430 may be formed together with the formation of the second circuit 320 . The first via hole 410 may be formed by plating the inside of the via hole passing through the second insulating layer 120 to connect to the electrodes of the electronic components E1 and E2. The second via hole 420 may be formed by plating the inside of the via hole passing through the first insulating layer 110 and the second insulating layer 120 to be connected to the metal foil 220 . The through hole 430 may pass through the cavity C3 and through the second insulating layer 120 flowing into the cavity C3.
參照圖8(b),可在第二絕緣層120上形成阻焊劑500。視需要,可在阻焊劑500中形成開口以暴露出第二電路320的一部分。 Referring to FIG. 8( b ), a solder resist 500 may be formed on the second insulating layer 120 . Optionally, an opening may be formed in the solder resist 500 to expose a portion of the second circuit 320 .
參照圖8(c),可部分地移除第一絕緣層110及第二絕緣層120以暴露出金屬凸片210。第一絕緣層110及第二絕緣層120的移除可藉由噴砂(blasting)或雷射來執行。 Referring to FIG. 8( c ), the first insulating layer 110 and the second insulating layer 120 may be partially removed to expose the metal bump 210 . The removal of the first insulating layer 110 and the second insulating layer 120 can be performed by blasting or laser.
之後,視需要,可藉由蝕刻來移除被暴露出的金屬箔220。當金屬層200及金屬箔220由不同的金屬製成時,可藉由蝕刻來選擇性地僅移除金屬箔220。 After that, the exposed metal foil 220 may be removed by etching if necessary. When the metal layer 200 and the metal foil 220 are made of different metals, only the metal foil 220 may be selectively removed by etching.
電池模組battery module
參照圖1至圖5闡述的印刷電路板可為欲被耦接至電池單元的保護電路模組(PCM)基板。此種PCM基板可包括能夠防止電池單元的異常狀況(例如,過度充電、過電流等)的元件。 The printed circuit board explained with reference to FIGS. 1 to 5 may be a protection circuit module (PCM) substrate to be coupled to a battery cell. Such a PCM substrate may include elements capable of preventing abnormal conditions (eg, overcharging, overcurrent, etc.) of the battery cell.
電池模組可藉由印刷電路板連接至主板。此處,在印刷電路板與主板之間可另外形成有連接件板,或者印刷電路板的一部分可用作連接件板。 The battery module can be connected to the main board through the printed circuit board. Here, a connector board may be additionally formed between the printed circuit board and the main board, or a part of the printed circuit board may be used as the connector board.
圖9及圖10是示出根據一或多個實施例的電池模組的圖。 9 and 10 are diagrams illustrating a battery module according to one or more embodiments.
參照圖9,電池模組可包括電池單元10以及保護電路模組(例如印刷電路板20),電池單元10包括電極11,保護電路模組(例如印刷電路板20)耦接至電池單元10。印刷電路板20可如參照圖1至圖5所述以各種方式實施。金屬凸片210可電性連接至電池單元10的電極11。被暴露出的金屬凸片210可藉由焊料S結合至電池單元10的電極11。 Referring to FIG. 9 , the battery module may include a battery unit 10 and a protection circuit module (such as a printed circuit board 20 ), the battery unit 10 includes an electrode 11 , and the protection circuit module (such as a printed circuit board 20 ) is coupled to the battery unit 10 . The printed circuit board 20 may be implemented in various ways as described with reference to FIGS. 1 to 5 . The metal tab 210 is electrically connected to the electrode 11 of the battery unit 10 . The exposed metal tab 210 can be bonded to the electrode 11 of the battery unit 10 by solder S. Referring to FIG.
電池單元10的電極11可包括正電極及負電極,且一對金屬凸片210可分別結合至正電極及負電極。 The electrode 11 of the battery cell 10 may include a positive electrode and a negative electrode, and a pair of metal tabs 210 may be respectively bonded to the positive electrode and the negative electrode.
參照圖10,金屬凸片210可為可撓性的且印刷電路板20可包繞在電極周圍。 Referring to FIG. 10, the metal tab 210 may be flexible and the printed circuit board 20 may be wrapped around the electrodes.
僅管本揭露包括特定實例,然而在理解本申請案的揭露內容之後將顯而易見的是,在不背離申請專利範圍及其等效範圍的精神及範圍的條件下,可在該些實例中作出各種形式及細節上的改變。本文中所述實例應僅被視為具有說明性意義,而非用於 限制。對每一實例中的特徵或態樣的說明應被視作適用於其他實例中的相似特徵或態樣。若以不同的次序執行所述技術及/或若以不同的方式對所述系統、架構、裝置或電路中的組件加以組合及/或以其他組件或其等效組件進行替換或補充,則可達成適合的結果。因此,本揭露的範圍並非由詳細說明界定,而是由申請專利範圍及其等效範圍界定,且處於申請專利範圍及其等效範圍的範圍內的所有變型皆應被視為包含於本揭露中。 Although this disclosure includes specific examples, it will be apparent upon reading the disclosure of this application that various changes in form and details could be made in these examples without departing from the spirit and scope of claims and equivalents thereof. The examples presented herein should be considered illustrative only and not intended for limit. Descriptions of features or aspects within each example should be considered as available for similar features or aspects in the other examples. Suitable results may be achieved if the techniques are performed in a different order and/or if components in the described system, architecture, device, or circuit are combined in a different manner and/or are substituted or supplemented with other components or their equivalents. Therefore, the scope of the present disclosure is defined not by the detailed description but by the scope of the patent application and its equivalents, and all modifications within the scope of the patent application and its equivalents should be considered to be included in the present disclosure.
110:第一絕緣層 110: the first insulating layer
120:第二絕緣層 120: second insulating layer
200:金屬層 200: metal layer
210:金屬凸片 210: metal tab
220:金屬箔 220: metal foil
310:第一電路 310: first circuit
320:第二電路 320: second circuit
410:第一通孔 410: the first through hole
420:第二通孔 420: second through hole
430:穿孔/第三通孔 430: Perforation / third through hole
500:阻焊劑 500: solder resist
C1、C2、C3:空腔 C1, C2, C3: cavities
E1、E2:電子組件 E1, E2: electronic components
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