TWI805221B - Optical module and display device - Google Patents

Optical module and display device Download PDF

Info

Publication number
TWI805221B
TWI805221B TW111105016A TW111105016A TWI805221B TW I805221 B TWI805221 B TW I805221B TW 111105016 A TW111105016 A TW 111105016A TW 111105016 A TW111105016 A TW 111105016A TW I805221 B TWI805221 B TW I805221B
Authority
TW
Taiwan
Prior art keywords
light
filter film
film
filter
wavelength
Prior art date
Application number
TW111105016A
Other languages
Chinese (zh)
Other versions
TW202331306A (en
Inventor
施宏欣
Original Assignee
大陸商業成科技(成都)有限公司
大陸商業成光電(深圳)有限公司
大陸商業成光電(無錫)有限公司
英特盛科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大陸商業成科技(成都)有限公司, 大陸商業成光電(深圳)有限公司, 大陸商業成光電(無錫)有限公司, 英特盛科技股份有限公司 filed Critical 大陸商業成科技(成都)有限公司
Application granted granted Critical
Publication of TWI805221B publication Critical patent/TWI805221B/en
Publication of TW202331306A publication Critical patent/TW202331306A/en

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01Head-up displays
    • G02B27/017Head mounted
    • G02B27/0172Head mounted characterised by optical features
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/28Interference filters
    • G02B5/285Interference filters comprising deposited thin solid films

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Push-Button Switches (AREA)
  • Electroluminescent Light Sources (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Optical Filters (AREA)

Abstract

Embodiments of the present disclosure relate to the field of augmented reality and virtual reality. It is designed to solve the problem that the efficiency of optical waveguide is reduced due to the gradual cracking of organic filter in the process of using. An optical module and a display device are provided. The optical module includes a first transparent substrate, a first coupling-in grating, a first coupling-out grating and a first filter film. The first transparent substrate is used for conducting light of a first band. The first transparent substrate includes a first surface and a second surface opposite to the first surface. The second surface includes a first light emitting region and a second light emitting region. The first filter film is arranged in the first light emitting region for filtering the light of the first band. The first filter film includes a multilayer inorganic film.

Description

光學組件及顯示裝置Optical components and display devices

本申請涉及增強現實及虛擬實境領域,具體而言,涉及光學組件及顯示裝置。The present application relates to the field of augmented reality and virtual reality, in particular, to an optical component and a display device.

擴增實境(Augmented Reality,AR)中,將光耦合進入光波導的玻璃基底中,藉由全反射原理將光傳輸到眼睛前方再釋放影像資訊。其中紅綠藍三色光需分別耦合到具有有機彩色濾光片的三層光波導中,使每一層光波導只針對某一個顏色耦合,改善出瞳位置的顏色均勻性,減小彩虹效應。In Augmented Reality (AR), light is coupled into the glass substrate of the optical waveguide, and the light is transmitted to the front of the eye by the principle of total reflection to release image information. Among them, the red, green and blue three-color light needs to be coupled into the three-layer optical waveguide with organic color filters, so that each layer of optical waveguide is only coupled to a certain color, improving the color uniformity of the exit pupil position and reducing the rainbow effect.

目前使用的有機彩色濾光片會因光源的光強度較大而隨時間損耗裂解,加重光損;當有機彩色濾光片隨時間逐漸裂解,為保持導光效果需使用光強更強的光源,導致功耗增大。The currently used organic color filters will be cracked over time due to the high light intensity of the light source, which will increase the light loss; when the organic color filter gradually cracks over time, it is necessary to use a light source with stronger light intensity to maintain the light guiding effect , resulting in increased power consumption.

本申請第一方面提供一種光學組件,以解決有機濾光片隨著使用過程逐漸裂解從而光波導功效降低的問題。所述光學組件包括第一透光基板、第一耦入光柵、第一耦出光柵以及第一濾光膜。所述第一透光基板用於傳導第一波段的光。所述第一透光基板包括相對的第一表面以及第二表面,所述第二表面包括間隔設置的第一出光區及第二出光區。所述第一耦入光柵及所述第一耦出光柵間隔設置於所述第一表面,所述第一耦入光柵在所述第一透光基板上的投影落入所述第一出光區,所述第一耦出光柵在所述第一透光基板上的投影落入所述第二出光區。所述第一濾光膜設置於所述第一出光區,用於濾除所述第一波段的光。所述第一濾光膜包括多層無機膜。其中,自所述第一耦入光柵入射至所述第一透光基板的所述第一波段的光,傳導至所述第一濾光膜後被濾除而無法在所述第一出光區出射,傳導至所述第一耦出光柵後,經所述第一耦出光柵繞射並在所述第二出光區出射。The first aspect of the present application provides an optical component to solve the problem that the organic optical filter is gradually cracked during use, thereby reducing the efficiency of the optical waveguide. The optical assembly includes a first light-transmitting substrate, a first in-coupling grating, a first out-coupling grating, and a first filter film. The first light-transmitting substrate is used to transmit light in the first wavelength band. The first light-transmitting substrate includes a first surface and a second surface opposite to each other, and the second surface includes a first light-emitting area and a second light-emitting area arranged at intervals. The first in-coupling grating and the first out-coupling grating are arranged at intervals on the first surface, and the projection of the first in-coupling grating on the first light-transmitting substrate falls into the first light-out region , the projection of the first outcoupling grating on the first light-transmitting substrate falls into the second light-out region. The first filter film is arranged in the first light exit area, and is used for filtering out the light in the first wavelength band. The first filter film includes a multi-layer inorganic film. Wherein, the light of the first wavelength band incident on the first light-transmitting substrate from the first coupling grating is filtered out after being transmitted to the first filter film so that it cannot enter the first light-exit area. After being transmitted to the first outcoupling grating, it is diffracted by the first outcoupling grating and emerges in the second light out region.

相比先前的有機高分子濾光片,所述第一濾光膜為多層無機膜,具有更高的裂解溫度(裂解溫度Td>450℃),裂解速度較慢,更為耐用;藉由調整膜堆結構改變濾光範圍,更容易調整光色;光譜特性更為陡峭,出光顏色更純。Compared with the previous organic polymer filter, the first filter film is a multi-layer inorganic film, which has a higher cracking temperature (cracking temperature Td > 450°C), slower cracking speed, and more durable; by adjusting The membrane stack structure changes the filtering range, making it easier to adjust the light color; the spectral characteristics are steeper, and the light color is purer.

本申請第二方面提供一種顯示裝置,包括光源,以及如前所述的光學組件,所述光源設置於所述光學組件的一側,所述光源發出的光經過所述光學組件後到達觀察位置。The second aspect of the present application provides a display device, including a light source, and the aforementioned optical assembly, the light source is arranged on one side of the optical assembly, and the light emitted by the light source reaches the observation position after passing through the optical assembly .

相比先前技術,所述顯示裝置提高出射光線顏色純度,改善觀察位置的顏色均勻性;透光率更高,平均透光率達到95%以上;在AR領域具有更廣泛的適用性,光源可以為有機高分子濾光片不適用的光源,例如微型發光二極體光源、微型有機發光二極體光源及量子點發光二極體。光源亦可以為有機高分子濾光片不適用的顯示裝置,例如數位光處理投影機、矽基液晶顯示面板。Compared with the previous technology, the display device improves the color purity of the outgoing light and improves the color uniformity of the observation position; the light transmittance is higher, and the average light transmittance reaches more than 95%; it has wider applicability in the AR field, and the light source can be It is a light source that organic polymer filters are not suitable for, such as micro-light emitting diode light sources, micro-organic light-emitting diode light sources and quantum dot light-emitting diodes. The light source can also be a display device for which an organic polymer filter is not suitable, such as a digital light processing projector and a silicon-based liquid crystal display panel.

下面將結合本申請實施例中的圖式,對本申請實施例中的技術方案進行清楚、完整地描述,顯然,所描述的實施例係本申請一部分實施例,而不是全部的實施例。The technical solutions in the embodiments of the present application will be clearly and completely described below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of them.

除非另有定義,本文所使用的所有的技術及科學術語與屬於本申請的技術領域的技術人員通常理解的含義相同。本文中於本申請的說明書中所使用的術語只是為了描述具體的實施例的目的,不是旨在於限制本申請。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field of the application. The terms used herein in the description of the application are only for the purpose of describing specific embodiments, and are not intended to limit the application.

在擴增實境(Augmented Reality,AR)及虛擬實境(Virtual Reality,VR)領域,從彩色光源發出的光經光學組件傳導至人眼觀察的位置。光學組件基於全內反射原理傳導光線,利用濾光組件分離不同波段的光,以提高觀察位置的顏色均勻性。這類光學組件亦可以應用於穿戴裝置,例如VR眼鏡、AR眼鏡。In the augmented reality (Augmented Reality, AR) and virtual reality (Virtual Reality, VR) fields, the light emitted from the color light source is transmitted to the position observed by human eyes through optical components. Optical components conduct light based on the principle of total internal reflection, and use filter components to separate light in different wavelength bands to improve color uniformity at the observation position. Such optical components can also be applied to wearable devices, such as VR glasses and AR glasses.

為能進一步闡述本申請達成預定目的所採取的技術手段及功效,以下結合圖式及較佳實施方式,對本申請做出如下詳細說明。In order to further explain the technical means and functions adopted by this application to achieve the intended purpose, the following detailed description of this application will be given in conjunction with the drawings and preferred implementation modes.

本申請提供一種光學組件,其中以多層無機膜為濾光組件,提升了出光效果的同時延長了光學組件的使用壽命。The present application provides an optical component, in which a multilayer inorganic film is used as a filter component, which improves the light extraction effect and prolongs the service life of the optical component.

實施例一Embodiment one

請參閱圖1,本實施例提供一種光學組件100。光學組件100包括第一透光基板110、第二透光基板120以及第三透光基板130。所述第一透光基板110用於傳導第一波段的光119;所述第二透光基板120用於傳導第二波段的光129;所述第三透光基板130用於傳導第三波段的光139。所述第一波段、所述第二波段以及所述第三波段兩兩之間互不重疊。第一透光基板110、第二透光基板120以及第三透光基板130的材料例如為玻璃。Referring to FIG. 1 , this embodiment provides an optical component 100 . The optical assembly 100 includes a first transparent substrate 110 , a second transparent substrate 120 and a third transparent substrate 130 . The first transparent substrate 110 is used to transmit the light 119 of the first wavelength band; the second transparent substrate 120 is used to transmit the light 129 of the second wavelength band; the third transparent substrate 130 is used to transmit the light of the third wavelength band 139 of the light. No two of the first wave band, the second wave band and the third wave band overlap each other. The material of the first transparent substrate 110 , the second transparent substrate 120 and the third transparent substrate 130 is, for example, glass.

所述第一透光基板110包括相對的第一表面111以及第二表面112,所述第二表面112包括間隔設置的第一出光區113及第二出光區114。於所述第一表面111間隔設置有第一耦入光柵115及第一耦出光柵116。所述第一耦入光柵115在所述第一透光基板110上的投影落入所述第一出光區113。所述第一耦出光柵116在所述第一透光基板110上的投影落入所述第二出光區114。於所述第一出光區113設置有第一濾光膜117,用於濾除所述第一波段的光119。本實施例中,所述第一出光區113為所述第二表面112上略大於所述第一耦入光柵115的投影的區域。所述第二出光區114為所述第二表面112上略大於所述第一耦出光柵116的投影的區域。其他實施例中,所述第一出光區113可為所述第一耦入光柵115在所述第二表面112上的投影區域。所述第二出光區114可為所述第一耦出光柵116在所述第二表面112上的投影區域。The first light-transmitting substrate 110 includes a first surface 111 and a second surface 112 opposite to each other, and the second surface 112 includes a first light-emitting region 113 and a second light-emitting region 114 arranged at intervals. A first in-coupling grating 115 and a first out-coupling grating 116 are disposed at intervals on the first surface 111 . The projection of the first in-coupling grating 115 on the first transparent substrate 110 falls into the first light exit region 113 . The projection of the first outcoupling grating 116 on the first transparent substrate 110 falls into the second light out region 114 . A first filter film 117 is disposed in the first light exit area 113 for filtering out the light 119 of the first wavelength band. In this embodiment, the first light exit area 113 is an area on the second surface 112 that is slightly larger than the projection of the first in-coupling grating 115 . The second light output area 114 is an area on the second surface 112 that is slightly larger than the projection of the first output coupling grating 116 . In other embodiments, the first light exit area 113 may be a projected area of the first in-coupling grating 115 on the second surface 112 . The second light output area 114 may be a projected area of the first output coupling grating 116 on the second surface 112 .

所述第二透光基板120包括相對的第三表面121以及第四表面122,所述第四表面122包括間隔設置的第三出光區123及第四出光區124。於所述第三表面121間隔設置有第二耦入光柵125及第二耦出光柵126。所述第二耦入光柵125在所述第二透光基板120上的投影落入所述第三出光區123。所述第二耦出光柵126在所述第二透光基板120上的投影落入所述第四出光區124。於所述第三出光區123設置有第二濾光膜127,用於濾除所述第二波段的光129。本實施例中,所述第三出光區123為所述第四表面122上略大於所述第二耦入光柵125的投影的區域。所述第四出光區124為所述第四表面122上略大於所述第二耦出光柵126的投影的區域。其他實施例中,所述第三出光區123可為所述第二耦入光柵125在所述第四表面122上的投影區域。所述第四出光區124可為所述第二耦出光柵126在所述第四表面122上的投影區域。The second light-transmitting substrate 120 includes a third surface 121 and a fourth surface 122 opposite to each other, and the fourth surface 122 includes a third light-emitting region 123 and a fourth light-emitting region 124 arranged at intervals. A second in-coupling grating 125 and a second out-coupling grating 126 are disposed at intervals on the third surface 121 . The projection of the second in-coupling grating 125 on the second transparent substrate 120 falls into the third light output region 123 . The projection of the second outcoupling grating 126 on the second transparent substrate 120 falls into the fourth light out region 124 . A second filter film 127 is disposed in the third light exit area 123 for filtering out the light 129 of the second wavelength band. In this embodiment, the third light exit area 123 is an area on the fourth surface 122 that is slightly larger than the projection of the second in-coupling grating 125 . The fourth light output area 124 is an area on the fourth surface 122 slightly larger than the projection of the second output coupling grating 126 . In other embodiments, the third light exit area 123 may be a projected area of the second in-coupling grating 125 on the fourth surface 122 . The fourth light output area 124 may be a projected area of the second output coupling grating 126 on the fourth surface 122 .

所述第三透光基板130包括相對的第五表面131以及第六表面132,所述第六表面132包括間隔設置的第五出光區133及第六出光區134。於所述第五表面131間隔設置有第三耦入光柵135及第三耦出光柵136。所述第三耦入光柵135在所述第三透光基板130上的投影落入所述第五出光區133。所述第三耦出光柵136在所述第三透光基板130上的投影落入所述第六出光區134。本實施例中,所述第五出光區133為所述第六表面132上略大於所述第三耦入光柵135的投影的區域。所述第六出光區134為所述第六表面132上略大於所述第三耦出光柵136的投影的區域。其他實施例中,所述第五出光區133可為所述第三耦入光柵135在所述第六表面132上的投影區域。所述第六出光區134可為所述第三耦出光柵136在所述第六表面132上的投影區域。The third light-transmitting substrate 130 includes a fifth surface 131 and a sixth surface 132 opposite to each other, and the sixth surface 132 includes a fifth light-emitting region 133 and a sixth light-emitting region 134 arranged at intervals. A third in-coupling grating 135 and a third out-coupling grating 136 are disposed at intervals on the fifth surface 131 . The projection of the third in-coupling grating 135 on the third transparent substrate 130 falls into the fifth light-out region 133 . The projection of the third outcoupling grating 136 on the third transparent substrate 130 falls into the sixth light out region 134 . In this embodiment, the fifth light exit area 133 is an area on the sixth surface 132 that is slightly larger than the projection of the third in-coupling grating 135 . The sixth light output area 134 is an area on the sixth surface 132 that is slightly larger than the projection of the third output coupling grating 136 . In other embodiments, the fifth light output area 133 may be a projected area of the third in-coupling grating 135 on the sixth surface 132 . The sixth light output area 134 may be a projected area of the third output coupling grating 136 on the sixth surface 132 .

來自光源600的光線經所述第一耦入光柵115繞射,入射至所述第一透光基板110,並在所述第一透光基板110內傳播。當光線傳導至所述第一出光區113後,由於所述第一濾光膜117的阻止作用,所述第一波段的光119被濾除而無法在所述第一出光區113出射。所述第一波段的光119傳導至所述第一耦出光柵116,經所述第一耦出光柵116繞射並在所述第二出光區114出射,後到達觀察位置500。自所述第一出光區113出射的光線經所述第二耦入光柵125繞射,入射至所述第二透光基板120,並在所述第二透光基板120內傳播。當光線傳導至所述第三出光區123後,由於所述第二濾光膜127的阻止作用,所述第二波段的光129被濾除而無法在所述第三出光區123出射。所述第二波段的光129傳導至所述第二耦出光柵126,經所述第二耦出光柵126繞射並在所述第四出光區124出射,後到達所述觀察位置500。自所述第三出光區123出射的光線經所述第三耦入光柵135繞射,入射至所述第三透光基板130,並在所述第三透光基板130內傳播。當所述第三波段的光139傳導至所述第三耦出光柵136,經所述第三耦出光柵136繞射並在所述第六出光區134出射後到達所述觀察位置500。The light from the light source 600 is diffracted by the first coupling grating 115 , is incident on the first transparent substrate 110 , and propagates in the first transparent substrate 110 . After the light is transmitted to the first light exit region 113 , due to the blocking effect of the first filter film 117 , the light 119 of the first wavelength band is filtered and cannot exit in the first light exit region 113 . The light 119 in the first wavelength band is transmitted to the first outcoupling grating 116 , diffracted by the first outcoupling grating 116 and exits in the second light out region 114 , and then reaches the observation position 500 . The light emitted from the first light emitting region 113 is diffracted by the second in-coupling grating 125 , enters the second transparent substrate 120 , and propagates in the second transparent substrate 120 . After the light is transmitted to the third light exit area 123 , due to the blocking effect of the second filter film 127 , the light 129 of the second wavelength band is filtered and cannot exit in the third light exit area 123 . The light 129 in the second wavelength band is transmitted to the second outcoupling grating 126 , diffracted by the second outcoupling grating 126 , exits in the fourth light out region 124 , and then reaches the observation position 500 . The light emitted from the third light output region 123 is diffracted by the third in-coupling grating 135 , enters the third transparent substrate 130 , and propagates in the third transparent substrate 130 . When the light 139 of the third wavelength band is transmitted to the third outcoupling grating 136 , it is diffracted by the third outcoupling grating 136 and exits in the sixth light out region 134 to reach the observation position 500 .

所述第一波段的光119為藍光,所述第二波段的光129為綠光,所述第三波段的光139為紅光。優選地,所述第一波段為400nm~470nm,所述第二波段為500nm~550nm,所述第三波段為600nm~650nm。The light 119 of the first waveband is blue light, the light 129 of the second waveband is green light, and the light 139 of the third waveband is red light. Preferably, the first waveband is 400nm~470nm, the second waveband is 500nm~550nm, and the third waveband is 600nm~650nm.

圖1示出了所述第一濾光膜117的局部放大101。所述第一濾光膜117包括多層無機膜。優選地,所述第一濾光膜117為多層介電質膜,由高折射率介電質膜與低折射率介電質膜交替設置,膜堆結構為:(0.5HL0.5H) m。其中,0.5H代表厚度為1/8波長的高折射率層,可以為ZrO 2、TiO 2、Nb 2O 5、ZnO、ZnS等。L代表厚度為1/4波長的低折射率層,可以為Al 2O 3、SiO 2、Si 3N 4、SiON、Na 3AlF 6等。m代表週期數。本實施例中,H為TiO 2,L為SiO 2,m為7。所述第一濾光膜117設置於所述第一出光區113的方式不受限制,可以為熱蒸鍍、電子槍蒸鍍、鐳射蒸鍍、濺鍍等方式。 FIG. 1 shows a partial enlargement 101 of the first filter film 117 . The first filter film 117 includes a multi-layer inorganic film. Preferably, the first filter film 117 is a multilayer dielectric film, which is alternately arranged with high refractive index dielectric films and low refractive index dielectric films, and the film stack structure is: (0.5HL0.5H) m . Wherein, 0.5H represents a high refractive index layer with a thickness of 1/8 wavelength, which can be ZrO 2 , TiO 2 , Nb 2 O 5 , ZnO, ZnS, etc. L represents a low refractive index layer with a thickness of 1/4 wavelength, which can be Al 2 O 3 , SiO 2 , Si 3 N 4 , SiON, Na 3 AlF 6 and so on. m represents the number of cycles. In this embodiment, H is TiO 2 , L is SiO 2 , and m is 7. The method of disposing the first filter film 117 in the first light exit region 113 is not limited, and may be thermal evaporation, electron gun evaporation, laser evaporation, sputtering, and the like.

請參閱圖2,所述第一濾光膜117為長波通濾光膜,波長大於參考波長的光能通過,波長小於參考波長的光不能通過。所述第一濾光膜117對於波長>500nm的光,透光率大於90%;對於波長<450nm的光,透光率小於5%。是故,所述第二波段(500nm~550nm)及所述第三波段(600nm~650nm)的光能夠通過所述第一濾光膜117,且具有90%以上的透光率。所述第一波段(400nm~470nm)的光在所述第一濾光膜117中的透光率小於30%。特別地,波長在400nm~450nm的光在所述第一濾光膜117中的透光率小於5%。特別地,波長在400nm~410nm的光在第一濾光膜117中的透光率幾乎為零。需要說明的是,本申請實施例中,所述第一濾光膜117用於濾除所述第一波段的光119,指的所述第一波段的光119在所述第一濾光膜117中的透過率小於特定值(如,30%),並非指嚴格的完全不透過。Please refer to FIG. 2 , the first filter film 117 is a long-wave pass filter film, through which light with a wavelength greater than the reference wavelength can pass through, and light with a wavelength smaller than the reference wavelength cannot pass through. The light transmittance of the first filter film 117 is greater than 90% for light with a wavelength > 500nm; for light with a wavelength < 450nm, the light transmittance is less than 5%. Therefore, the light in the second waveband (500nm~550nm) and the third waveband (600nm~650nm) can pass through the first filter film 117 and has a light transmittance of over 90%. The light transmittance of the light in the first wavelength band (400nm~470nm) in the first filter film 117 is less than 30%. In particular, the transmittance of light with a wavelength of 400nm-450nm in the first filter film 117 is less than 5%. In particular, the light transmittance of light with a wavelength of 400 nm to 410 nm in the first filter film 117 is almost zero. It should be noted that, in the embodiment of the present application, the first filter film 117 is used to filter out the light 119 of the first wavelength band, which means that the light 119 of the first wave band passes through the first filter film. The transmittance in 117 is less than a specific value (for example, 30%), and does not refer to strict complete impermeability.

所述第二濾光膜127包括多層無機膜。優選地,所述第二濾光膜127為多層介電質膜,由高折射率介電質膜與低折射率介電質膜交替設置,膜堆結構為:(0.5HL0.5H) 7。其中,0.5H代表厚度為1/8波長的高折射率層,可以為ZrO 2、TiO 2、Nb 2O 5、ZnO、ZnS等。L代表厚度為1/4波長的低折射率層,可以為Al 2O 3、SiO 2、Si 3N 4、SiON、Na 3AlF 6等。本實施例中,H為ZnS,L為Na 3AlF 6,7為週期數。所述第二濾光膜127設置於所述第三出光區123的方式不受限制,可以為熱蒸鍍、電子槍蒸鍍、鐳射蒸鍍、濺鍍等方式。 The second filter film 127 includes a multi-layer inorganic film. Preferably, the second filter film 127 is a multilayer dielectric film, which is alternately arranged with high refractive index dielectric films and low refractive index dielectric films, and the film stack structure is: (0.5HL0.5H) 7 . Wherein, 0.5H represents a high refractive index layer with a thickness of 1/8 wavelength, which can be ZrO 2 , TiO 2 , Nb 2 O 5 , ZnO, ZnS, etc. L represents a low refractive index layer with a thickness of 1/4 wavelength, which can be Al 2 O 3 , SiO 2 , Si 3 N 4 , SiON, Na 3 AlF 6 and so on. In this embodiment, H is ZnS, L is Na 3 AlF 6 , and 7 is the period number. The manner in which the second filter film 127 is disposed in the third light exit area 123 is not limited, and may be thermal evaporation, electron gun evaporation, laser evaporation, sputtering, and the like.

請參閱圖3,所述第二濾光膜127為長波通濾光膜,波長大於參考波長的光能通過,波長小於參考波長的光不能通過。所述第二濾光膜127對於波長>600nm的光,透光率大於90%;對於波長<550nm的光,透光率小於5%。是故,所述第三波段(600nm~650nm)的光能夠通過所述第二濾光膜127,且具有90%以上的透光率。所述第二波段(500nm~550nm)的光在所述第二濾光膜127中的透光率小於5%。所述第一波段(400nm~470nm)的光在所述第一濾光膜117中的透光率小於30%。特別地,波長在420nm~500nm的光在第二濾光膜127中的透光率幾乎為零。需要說明的是,本申請實施例中,所述第二濾光膜127用於濾除所述第二波段的光129,指的所述第二波段的光129在所述第二濾光膜127中的透過率小於特定值(如,5%),並非指嚴格的完全不透過。Please refer to FIG. 3 , the second filter film 127 is a long-wave pass filter film, through which light with a wavelength greater than the reference wavelength can pass through, and light with a wavelength smaller than the reference wavelength cannot pass through. The second filter film 127 has a light transmittance greater than 90% for light with a wavelength > 600nm; and a light transmittance of less than 5% for light with a wavelength < 550nm. Therefore, the light in the third wavelength band (600nm~650nm) can pass through the second filter film 127 and has a light transmittance of over 90%. The light transmittance of the light in the second wavelength band (500nm~550nm) in the second filter film 127 is less than 5%. The light transmittance of the light in the first wavelength band (400nm~470nm) in the first filter film 117 is less than 30%. In particular, the light transmittance of light with a wavelength of 420nm-500nm in the second filter film 127 is almost zero. It should be noted that, in the embodiment of the present application, the second filter film 127 is used to filter out the light 129 of the second wavelength band, which means that the light 129 of the second wave band passes through the second filter film. The transmittance in 127 is less than a specific value (eg, 5%), and does not mean strictly impermeable.

在本實施例中,所述第一濾光膜117減少了從所述第一透光基板110出射的藍光,減少了藍光對綠光及紅光的干擾。所述第二濾光膜127減少了從所述第二透光基板120出射的綠光,減少了對紅光的干擾。所述光學組件100減少了三種光色之間的互相干擾,避免彩虹效應。相比有機高分子濾光片,所述第一濾光膜117以及所述第二濾光膜127為多層無機膜,具有更高的裂解溫度(裂解溫度Td>450℃),裂解速度較慢,更為耐用;藉由選擇第一濾光膜及/或第二濾光膜中的高折射率介電質膜與低折射率介電質膜的材料,即可改變濾光範圍,更容易調整濾光光色;光譜特性更為陡峭,出光顏色更純。In this embodiment, the first filter film 117 reduces the blue light emitted from the first transparent substrate 110 , and reduces the interference of blue light on green light and red light. The second filter film 127 reduces the green light emitted from the second transparent substrate 120 and reduces the interference to the red light. The optical component 100 reduces the mutual interference among the three light colors and avoids the rainbow effect. Compared with organic polymer filters, the first filter film 117 and the second filter film 127 are multi-layer inorganic films with higher cracking temperature (cleavage temperature Td > 450°C) and slower cracking speed , more durable; by selecting the materials of the high-refractive-index dielectric film and the low-refractive-index dielectric film in the first filter film and/or the second filter film, the filter range can be changed, which is easier Adjust the filter light color; the spectral characteristics are steeper, and the light color is more pure.

實施例二Embodiment two

請參閱圖4,本實施例提供一種光學組件200,光學組件200包括第一透光基板210、第二透光基板220以及第三透光基板230。所述第一透光基板210包括相對的第一表面211以及第二表面212,所述第二表面212包括間隔設置的第一出光區213及第二出光區214。所述第二透光基板220包括相對的第三表面221以及第四表面222,所述第四表面222包括間隔設置的第三出光區223及第四出光區224。所述第三透光基板230包括相對的第五表面231以及第六表面232,所述第六表面232包括間隔設置的第五出光區233及第六出光區234。Referring to FIG. 4 , the present embodiment provides an optical assembly 200 . The optical assembly 200 includes a first transparent substrate 210 , a second transparent substrate 220 and a third transparent substrate 230 . The first light-transmitting substrate 210 includes a first surface 211 and a second surface 212 opposite to each other, and the second surface 212 includes a first light-emitting region 213 and a second light-emitting region 214 arranged at intervals. The second light-transmitting substrate 220 includes a third surface 221 and a fourth surface 222 opposite to each other, and the fourth surface 222 includes a third light-emitting region 223 and a fourth light-emitting region 224 arranged at intervals. The third light-transmitting substrate 230 includes a fifth surface 231 and a sixth surface 232 opposite to each other, and the sixth surface 232 includes a fifth light-emitting region 233 and a sixth light-emitting region 234 arranged at intervals.

光學組件200與實施例一的光學組件100的區別在於,所述第二出光區214設置有第三濾光膜218,所述第四出光區224設置有第四濾光膜228。所述第三濾光膜218用於濾除所述第二波段的光229以及所述第三波段的光239,所述第四濾光膜228用於濾除所述第三波段的光239。The difference between the optical assembly 200 and the optical assembly 100 of Embodiment 1 is that the second light exit region 214 is provided with a third filter film 218 , and the fourth light exit region 224 is provided with a fourth filter film 228 . The third filter film 218 is used to filter out the light 229 of the second waveband and the light 239 of the third waveband, and the fourth filter film 228 is used to filter out the light 239 of the third waveband .

來自光源600的光線經第一耦入光柵215繞射,入射至第一透光基板210,並在第一透光基板210內傳播。當光線傳導至第一出光區213後,由於第一濾光膜217的阻止作用,第一波段的光219被濾除而無法在所述第一出光區213出射。所述第一波段的光219傳導至第一耦出光柵216,經所述第一耦出光柵216繞射並在第二出光區214出射,後到達觀察位置500。由於所述第三濾光膜218的阻止作用,僅有所述第一波段的光219從所述第二出光區214出射。自所述第一出光區213出射的光線經第二耦入光柵225繞射,入射至第二透光基板220,並在所述第二透光基板220內傳播。當光線傳導至所述第三出光區223後,由於第二濾光膜227的阻止作用,所述第二波段的光229被濾除而無法在所述第三出光區223出射。所述第二波段的光229傳導至第二耦出光柵226,經所述第二耦出光柵226繞射並在第四出光區224出射,後到達所述觀察位置500。由於所述第四濾光膜228的阻止作用,僅有所述第一波段的光219以及所述第二波段的光229從所述第四出光區224出射。自所述第三出光區223出射的光線經第三耦入光柵235繞射,入射至第三透光基板230,並在所述第三透光基板230內傳播。當所述第三波段的光239傳導至第三耦出光柵236,經所述第三耦出光柵236繞射並在所述第六出光區234出射,後到達所述觀察位置500。The light from the light source 600 is diffracted by the first coupling grating 215 , enters the first transparent substrate 210 , and propagates in the first transparent substrate 210 . After the light is transmitted to the first light exit region 213 , due to the blocking effect of the first filter film 217 , the light 219 of the first wavelength band is filtered out and cannot exit in the first light exit region 213 . The light 219 in the first wavelength band is transmitted to the first outcoupling grating 216 , diffracted by the first outcoupling grating 216 , exits in the second light out region 214 , and then reaches the observation position 500 . Due to the blocking effect of the third filter film 218 , only the light 219 of the first wavelength band exits from the second light exit region 214 . The light emitted from the first light exit region 213 is diffracted by the second in-coupling grating 225 , enters the second light-transmitting substrate 220 , and propagates in the second light-transmitting substrate 220 . After the light is transmitted to the third light exit region 223 , due to the blocking effect of the second filter film 227 , the light 229 of the second wavelength band is filtered and cannot exit in the third light exit region 223 . The light 229 of the second wavelength band is transmitted to the second outcoupling grating 226 , diffracted by the second outcoupling grating 226 and exits in the fourth light out region 224 , and then reaches the observation position 500 . Due to the blocking function of the fourth filter film 228 , only the light 219 of the first wavelength band and the light 229 of the second wavelength band are emitted from the fourth light output region 224 . The light emitted from the third light output region 223 is diffracted by the third coupling grating 235 , enters the third light-transmitting substrate 230 , and propagates in the third light-transmitting substrate 230 . When the light 239 of the third wavelength band is transmitted to the third outcoupling grating 236 , is diffracted by the third outcoupling grating 236 and exits in the sixth light out region 234 , and then reaches the observation position 500 .

所述第一波段的光219為藍光,所述第二波段的光229為綠光,所述第三波段的光239為紅光。優選地,所述第一波段為400nm~470nm,所述第二波段為500nm~550nm,所述第三波段為600nm~650nm。The light 219 of the first waveband is blue light, the light 229 of the second waveband is green light, and the light 239 of the third waveband is red light. Preferably, the first waveband is 400nm~470nm, the second waveband is 500nm~550nm, and the third waveband is 600nm~650nm.

所述第三濾光膜218包括多層無機膜。優選地,所述第三濾光膜218為多層介電質膜,由高折射率介電質膜與低折射率介電質膜交替設置,膜堆結構為:1.5(0.5LH0.5L) 8×2.0(0.5LH0.5L) 8×(0.5HL0.5H) 8。其中,0.5L代表厚度為1/8波長的低折射率層,可以為Al 2O 3、SiO 2、Si 3N 4、SiON、Na 3AlF 6等。H代表厚度為1/4波長的高折射率層,可以為ZrO 2、TiO 2、Nb 2O 5、ZnO、ZnS等。在本實施例中,L為Na 3AlF 6,H為TiO 2,8為週期數,1.5以及2.0為調變倍數。所述第三濾光膜218設置於所述第二出光區214的方式不受限制,可以為熱蒸鍍、電子槍蒸鍍、鐳射蒸鍍、濺鍍等方式。 The third filter film 218 includes a multi-layer inorganic film. Preferably, the third filter film 218 is a multilayer dielectric film, which is alternately arranged with high refractive index dielectric films and low refractive index dielectric films, and the film stack structure is: 1.5 (0.5LH0.5L) 8 ×2.0(0.5LH0.5L) 8 ×(0.5HL0.5H) 8 . Wherein, 0.5L represents a low refractive index layer with a thickness of 1/8 wavelength, which may be Al 2 O 3 , SiO 2 , Si 3 N 4 , SiON, Na 3 AlF 6 and so on. H represents a high refractive index layer with a thickness of 1/4 wavelength, which can be ZrO 2 , TiO 2 , Nb 2 O 5 , ZnO, ZnS, etc. In this embodiment, L is Na 3 AlF 6 , H is TiO 2 , 8 is the period number, and 1.5 and 2.0 are the modulation multiples. The manner in which the third filter film 218 is disposed in the second light emitting region 214 is not limited, and may be thermal evaporation, electron gun evaporation, laser evaporation, sputtering, and the like.

請參閱圖5,所述第三濾光膜218為帶通濾光膜,波長在一定範圍內的光能通過,波長在一定範圍外的光不能通過。所述第三濾光膜218對於波長430nm~470nm的光,透過率大於90%,波長<420nm的光及波長>500nm的光,透光率小於5%。是故,所述第一波段(400nm~470nm)的光大部分能夠通過所述第三濾光膜218,且具有90%以上的透光率。所述第二波段(500nm~550nm)的光以及所述第三波段(600nm~650nm)的光在所述第三濾光膜218中的透光率接近於零。需要說明的是,本申請實施例中,所述第三濾光膜218用於濾除所述第二波段的光229以及所述第三波段的光239,是指所述第二波段的光229以及所述第三波段的光239在所述第三濾光膜218中的透過率小於特定值(如,5%),並非指嚴格的完全不透過。Please refer to FIG. 5 , the third filter film 218 is a band-pass filter film, through which light with a wavelength within a certain range can pass through, and light with a wavelength outside a certain range cannot pass through. The third filter film 218 has a transmittance of greater than 90% for light with a wavelength of 430nm-470nm, and a transmittance of less than 5% for light with a wavelength of <420nm and light with a wavelength of >500nm. Therefore, most of the light in the first wavelength band (400nm~470nm) can pass through the third filter film 218 and has a light transmittance of over 90%. The light transmittance of the light in the second waveband (500nm~550nm) and the light in the third waveband (600nm~650nm) in the third filter film 218 is close to zero. It should be noted that, in the embodiment of the present application, the third filter film 218 is used to filter out the light 229 of the second waveband and the light 239 of the third waveband, which refers to the light of the second waveband The transmittance of the light 229 and the light 239 of the third wavelength band in the third filter film 218 is less than a specific value (for example, 5%), which does not mean that it is completely impenetrable.

所述第四濾光膜228包括多層無機膜。優選地,所述第四濾光膜228為多層介電質膜,由高折射率介電質膜與低折射率介電質膜交替設置,膜堆結構為:(0.5LH0.5L) 7。其中,H代表厚度為1/4波長的高折射率層,可以為ZrO 2、TiO 2、Nb 2O 5、ZnO、ZnS等。0.5L代表厚度為1/8波長的低折射率層,可以為Al 2O 3、SiO 2、Si 3N 4、SiON、Na 3AlF 6等。在本實施例中,L為Na 3AlF 6,H為TiO 2,7為週期數。所述第四濾光膜228設置於所述第四出光區224的方式不受限制,可以為熱蒸鍍、電子槍蒸鍍、鐳射蒸鍍、濺鍍等方式。 The fourth filter film 228 includes a multi-layer inorganic film. Preferably, the fourth filter film 228 is a multi-layer dielectric film, which is alternately arranged with high refractive index dielectric films and low refractive index dielectric films, and the film stack structure is: (0.5LH0.5L) 7 . Wherein, H represents a high refractive index layer with a thickness of 1/4 wavelength, which can be ZrO 2 , TiO 2 , Nb 2 O 5 , ZnO, ZnS, etc. 0.5L represents a low refractive index layer with a thickness of 1/8 wavelength, which can be Al 2 O 3 , SiO 2 , Si 3 N 4 , SiON, Na 3 AlF 6 and so on. In this embodiment, L is Na 3 AlF 6 , H is TiO 2 , and 7 is the period number. The method of disposing the fourth filter film 228 in the fourth light emitting area 224 is not limited, and may be thermal evaporation, electron gun evaporation, laser evaporation, sputtering, and the like.

請參閱圖6,所述第四濾光膜228為短波通濾光膜,波長小於參考波長的光能通過,波長大於參考波長的光不能通過。所述第四濾光膜228對於波長<550nm的光,透過率大於70%;對於波長>600nm的光,透過率小於5%。是故,所述第一波段(400nm~470nm)的光以及所述第二波段(500nm~550nm)的光能夠通過所述第四濾光膜228,且具有70%以上的透光率。所述第三波段(600nm~650nm)的光在所述第四濾光膜228中的透光率接近於零。需要說明的是,本申請實施例中,所述第四濾光膜228用於濾除所述第三波段的光239,是指所述第三波段的光239在所述第四濾光膜228中的透過率小於特定值(如,5%),並非指嚴格的完全不透過。Please refer to FIG. 6 , the fourth filter film 228 is a short-pass filter film, through which light with a wavelength smaller than the reference wavelength can pass through, and light with a wavelength larger than the reference wavelength cannot pass through. The fourth filter film 228 has a transmittance of greater than 70% for light with a wavelength of <550nm; and a transmittance of less than 5% for light with a wavelength of >600nm. Therefore, the light of the first wavelength band (400nm~470nm) and the light of the second wavelength band (500nm~550nm) can pass through the fourth filter film 228 and have a light transmittance of more than 70%. The light transmittance of the light in the third wavelength band (600nm~650nm) in the fourth filter film 228 is close to zero. It should be noted that, in the embodiment of the present application, the fourth filter film 228 is used to filter out the light 239 of the third waveband, which means that the light 239 of the third waveband passes through the fourth filter film The transmittance in 228 is less than a specific value (eg, 5%), and does not mean strictly impermeable.

在本實施例中,所述第一濾光膜217減少了從所述第一透光基板210出射的藍光,減少了藍光對綠光及紅光的干擾。所述第二濾光膜227減少了從所述第二透光基板220出射的綠光,減少了對紅光的干擾。所述第三濾光膜218減少了從所述第一透光基板210出射的綠光及紅光,使藍光的出光顏色更純。所述第四濾光膜228減少了從所述第二透光基板220出射的紅光,使綠光的出光顏色更純。所述光學組件200減少了三種光色之間的互相干擾,避免彩虹效應,增加了每一種光色的純度,提高了成像效果。特別地,波長450nm的藍光到達觀察位置500時透光率達到92.5%;波長532nm的綠光到達觀察位置500時透光率達到95.2%;波長628nm的紅光到達觀察位置500時透光率達到91.8%。相比有機高分子濾光片,所述第一濾光膜217、所述第二濾光膜227、所述第三濾光膜218以及所述第四濾光膜228為多層無機膜,具有更高的裂解溫度(裂解溫度Td>450℃),裂解速度較慢,更為耐用;藉由選擇第一濾光膜、第二濾光膜、第三濾光膜以及第四濾光膜中的高折射率介電質膜與低折射率介電質膜的材料,即可改變濾光範圍,更容易調整濾光光色;光譜特性更為陡峭,出光顏色更純。In this embodiment, the first filter film 217 reduces the blue light emitted from the first transparent substrate 210 and reduces the interference of blue light on green light and red light. The second filter film 227 reduces the green light emitted from the second transparent substrate 220 and reduces the interference to the red light. The third filter film 218 reduces the green light and the red light emitted from the first transparent substrate 210 , so that the color of the blue light is more pure. The fourth filter film 228 reduces the red light emitted from the second transparent substrate 220 to make the emitted green light more pure. The optical component 200 reduces the mutual interference among the three light colors, avoids the rainbow effect, increases the purity of each light color, and improves the imaging effect. In particular, when blue light with a wavelength of 450nm reaches the observation position of 500, the light transmittance reaches 92.5%; when the green light with a wavelength of 532nm reaches the observation position of 500, the light transmittance reaches 95.2%; 91.8%. Compared with the organic polymer filter, the first filter film 217, the second filter film 227, the third filter film 218 and the fourth filter film 228 are multilayer inorganic films with Higher cracking temperature (cracking temperature Td > 450°C), slower cracking speed, more durable; by selecting the first filter, the second filter, the third filter and the fourth filter The materials of high refractive index dielectric film and low refractive index dielectric film can change the filtering range, and it is easier to adjust the color of the filtered light; the spectral characteristics are steeper, and the color of the light is purer.

實施例三Embodiment three

請參閱圖7,本實施例提供一種光學組件300,包括第一透光基板310、第二透光基板320以及第三透光基板330。所述第一透光基板310包括相對的第一表面311以及第二表面312,所述第二表面312包括間隔設置的第一出光區313及第二出光區314。於所述第一表面311間隔設置有第一耦入光柵315及第一耦出光柵316。所述第一出光區313設置有第一濾光膜317。所述第二透光基板320包括相對的第三表面321以及第四表面322,所述第四表面322包括間隔設置的第三出光區323及第四出光區324。於所述第三表面321間隔設置有第二耦入光柵325及第二耦出光柵326。所述第三出光區323設置有第二濾光膜327。所述第三透光基板330包括相對的第五表面331以及第六表面332,所述第六表面332包括間隔設置的第五出光區333及第六出光區334。所述第五表面331間隔設置有第三耦入光柵335及第三耦出光柵336。Please refer to FIG. 7 , the present embodiment provides an optical assembly 300 including a first transparent substrate 310 , a second transparent substrate 320 and a third transparent substrate 330 . The first light-transmitting substrate 310 includes a first surface 311 and a second surface 312 opposite to each other, and the second surface 312 includes a first light-emitting region 313 and a second light-emitting region 314 arranged at intervals. A first in-coupling grating 315 and a first out-coupling grating 316 are disposed at intervals on the first surface 311 . The first light exit region 313 is provided with a first filter film 317 . The second light-transmitting substrate 320 includes a third surface 321 and a fourth surface 322 opposite to each other, and the fourth surface 322 includes a third light-emitting region 323 and a fourth light-emitting region 324 arranged at intervals. A second in-coupling grating 325 and a second out-coupling grating 326 are disposed at intervals on the third surface 321 . The third light emitting region 323 is provided with a second filter film 327 . The third light-transmitting substrate 330 includes a fifth surface 331 and a sixth surface 332 opposite to each other, and the sixth surface 332 includes a fifth light-emitting region 333 and a sixth light-emitting region 334 arranged at intervals. A third in-coupling grating 335 and a third out-coupling grating 336 are arranged at intervals on the fifth surface 331 .

光學組件300與實施例一的光學組件100的區別在於,光學組件300中,第一濾光膜317以及第二濾光膜327為短波通濾光膜。所述第一濾光膜317用於濾除第一波段的光319,所述第二濾光膜327用於濾除第二波段的光329。所述第一波段的光319為紅光,所述第二波段的光329為綠光,所述第三波段的光339為藍光。優選地,所述第一波段為600nm~650nm,所述第二波段為500nm~550nm,所述第三波段為400nm~450nm。The difference between the optical assembly 300 and the optical assembly 100 of the first embodiment is that, in the optical assembly 300 , the first filter film 317 and the second filter film 327 are short-wave pass filter films. The first filter film 317 is used to filter the light 319 of the first wavelength band, and the second filter film 327 is used to filter the light 329 of the second wave band. The light 319 of the first waveband is red light, the light 329 of the second waveband is green light, and the light 339 of the third waveband is blue light. Preferably, the first waveband is 600nm~650nm, the second waveband is 500nm~550nm, and the third waveband is 400nm~450nm.

所述第一濾光膜317包括多層無機膜。優選地,所述第一濾光膜317為多層介電質膜,由高折射率介電質膜與低折射率介電質膜交替設置,膜堆結構為:(0.5LH0.5L) 7。其中,H代表厚度為1/4波長的高折射率層,可以為ZrO 2、TiO 2、Nb 2O 5、ZnO、ZnS等。0.5L代表厚度為1/8波長的低折射率層,可以為Al 2O 3、SiO 2、Si 3N 4、SiON、Na 3AlF 6等。在本實施例中,L為Na 3AlF 6,H為TiO 2,7為週期數。所述第一濾光膜317設置於所述第一出光區313的方式不受限制,可以為熱蒸鍍、電子槍蒸鍍、鐳射蒸鍍、濺鍍等方式。 The first filter film 317 includes a multi-layer inorganic film. Preferably, the first filter film 317 is a multilayer dielectric film, which is alternately arranged with high refractive index dielectric films and low refractive index dielectric films, and the film stack structure is: (0.5LH0.5L) 7 . Wherein, H represents a high refractive index layer with a thickness of 1/4 wavelength, which can be ZrO 2 , TiO 2 , Nb 2 O 5 , ZnO, ZnS, etc. 0.5L represents a low refractive index layer with a thickness of 1/8 wavelength, which can be Al 2 O 3 , SiO 2 , Si 3 N 4 , SiON, Na 3 AlF 6 and so on. In this embodiment, L is Na 3 AlF 6 , H is TiO 2 , and 7 is the period number. The method of disposing the first filter film 317 in the first light emitting region 313 is not limited, and may be thermal evaporation, electron gun evaporation, laser evaporation, sputtering, and the like.

請參閱圖8,所述第一濾光膜317對於波長<550nm的光,透過率大於70%;對於波長>600nm的光,透過率小於5%。是故,所述第三波段(400nm~470nm)的光以及所述第二波段(500nm~550nm)的光能夠通過所述第一濾光膜317,且具有70%以上的透光率。所述第一波段(600nm~650nm)的光在所述第一濾光膜317中的透光率接近於零。需要說明的是,本申請實施例中,所述第一濾光膜317用於濾除所述第一波段的光319,是指所述第一波段的光319在所述第一濾光膜317中的透過率小於特定值(如,5%),並非指嚴格的完全不透過。Please refer to FIG. 8 , the first filter film 317 has a transmittance greater than 70% for light with a wavelength of <550nm; and a transmittance of less than 5% for light with a wavelength of >600nm. Therefore, the light of the third wavelength band (400nm~470nm) and the light of the second wavelength band (500nm~550nm) can pass through the first filter film 317 and have a light transmittance of more than 70%. The transmittance of light in the first wavelength band (600nm~650nm) in the first filter film 317 is close to zero. It should be noted that, in the embodiment of the present application, the first filter film 317 is used to filter out the light 319 of the first wavelength band, which means that the light 319 of the first wave band passes through the first filter film The transmittance in 317 is less than a specific value (eg, 5%), and does not mean strictly impermeable.

所述第二濾光膜327包括多層無機膜。優選地,所述第二濾光膜327為多層介電質膜,由高折射率介電質膜與低折射率介電質膜交替設置,膜堆結構為:1.25(0.5LH0.5L) 7(0.5LH0.5L) 7。其中,H代表厚度為1/4波長的高折射率層,可以為ZrO 2、TiO 2、Nb 2O 5、ZnO、ZnS等。0.5L代表厚度為1/8波長的低折射率層,可以為Al 2O 3、SiO 2、Si 3N 4、SiON、Na 3AlF 6等。在本實施例中,L為Na 3AlF 6,H為TiO 2,7為週期數,1.25為調變倍數。所述第二濾光膜327設置於所述第三出光區323的方式不受限制,可以為熱蒸鍍、電子槍蒸鍍、鐳射蒸鍍、濺鍍等方式。 The second filter film 327 includes a multi-layer inorganic film. Preferably, the second filter film 327 is a multilayer dielectric film, which is alternately arranged by high refractive index dielectric films and low refractive index dielectric films, and the film stack structure is: 1.25 (0.5LH0.5L) 7 (0.5LH0.5L) 7 . Wherein, H represents a high refractive index layer with a thickness of 1/4 wavelength, which can be ZrO 2 , TiO 2 , Nb 2 O 5 , ZnO, ZnS, etc. 0.5L represents a low refractive index layer with a thickness of 1/8 wavelength, which can be Al 2 O 3 , SiO 2 , Si 3 N 4 , SiON, Na 3 AlF 6 and so on. In this embodiment, L is Na 3 AlF 6 , H is TiO 2 , 7 is the period number, and 1.25 is the modulation factor. The manner in which the second filter film 327 is disposed in the third light exit region 323 is not limited, and may be thermal evaporation, electron gun evaporation, laser evaporation, sputtering, and the like.

請參閱圖9,所述第二濾光膜327對於波長<460nm的光,透過率大於90%;對於波長>475nm的光,透過率小於5%。是故,所述第三波段(400nm~470nm)的光大部分能夠通過所述第二濾光膜327,且具有90%以上的透光率。所述第一波段(600nm~650nm)的光以及所述第二波段(500nm~550nm)的光在所述第二濾光膜327中的透光率接近於零。需要說明的是,本申請實施例中,所述第二濾光膜327用於濾除所述第二波段的光329,是指所述第二波段的光329在所述第二濾光膜327中的透過率小於特定值(如,5%),並非指嚴格的完全不透過。Please refer to FIG. 9 , the transmittance of the second filter film 327 is greater than 90% for light with a wavelength of <460nm, and less than 5% for light with a wavelength of >475nm. Therefore, most of the light in the third wavelength band (400nm~470nm) can pass through the second filter film 327 and has a light transmittance of over 90%. The light transmittance of the light in the first waveband (600nm~650nm) and the light in the second waveband (500nm~550nm) in the second filter film 327 is close to zero. It should be noted that, in the embodiment of the present application, the second filter film 327 is used to filter out the light 329 of the second wavelength band, which means that the light 329 of the second wave band passes through the second filter film The transmittance in 327 is less than a specific value (eg, 5%), and does not mean strictly impermeable.

在本實施例中,所述第一濾光膜317減少了從所述第一透光基板310出射的紅光,減少了紅光對綠光及藍光的干擾。所述第二濾光膜327減少了從所述第二透光基板320出射的綠光,減少了對藍光的干擾。所述光學組件300減少了三種光色之間的互相干擾,避免彩虹效應。相比有機高分子濾光片,所述第一濾光膜317以及所述第二濾光膜327為多層無機膜,具有更高的裂解溫度(裂解溫度Td>450℃),裂解速度較慢,更為耐用;藉由選擇第一濾光膜及/或第二濾光膜中的高折射率介電質膜與低折射率介電質膜的材料,即可改變濾光範圍,更容易調整濾光光色;光譜特性更為陡峭,出光顏色更純。In this embodiment, the first filter film 317 reduces the red light emitted from the first transparent substrate 310 and reduces the interference of red light on green light and blue light. The second filter film 327 reduces the green light emitted from the second transparent substrate 320 and reduces the interference to the blue light. The optical assembly 300 reduces the mutual interference among the three light colors and avoids the rainbow effect. Compared with organic polymer filters, the first filter film 317 and the second filter film 327 are multi-layer inorganic films with higher cracking temperature (cleavage temperature Td > 450°C) and slower cracking speed , more durable; by selecting the materials of the high-refractive-index dielectric film and the low-refractive-index dielectric film in the first filter film and/or the second filter film, the filter range can be changed, which is easier Adjust the filter light color; the spectral characteristics are steeper, and the light color is more pure.

實施例四Embodiment Four

請參閱圖10,本實施例提供一種光學組件400,光學組件400包括第一透光基板410、第二透光基板420以及第三透光基板430。所述第一透光基板410包括相對的第一表面411以及第二表面412,所述第二表面412包括間隔設置的第一出光區413及第二出光區414。所述第二透光基板420包括相對的第三表面421以及第四表面422,所述第四表面422包括間隔設置的第三出光區423及第四出光區424。所述第三透光基板430包括相對的第五表面431以及第六表面432,所述第六表面432包括間隔設置的第五出光區433及第六出光區434。Referring to FIG. 10 , the present embodiment provides an optical assembly 400 , and the optical assembly 400 includes a first transparent substrate 410 , a second transparent substrate 420 and a third transparent substrate 430 . The first light-transmitting substrate 410 includes a first surface 411 and a second surface 412 opposite to each other, and the second surface 412 includes a first light-emitting region 413 and a second light-emitting region 414 arranged at intervals. The second light-transmitting substrate 420 includes a third surface 421 and a fourth surface 422 opposite to each other, and the fourth surface 422 includes a third light-emitting region 423 and a fourth light-emitting region 424 arranged at intervals. The third light-transmitting substrate 430 includes a fifth surface 431 and a sixth surface 432 opposite to each other, and the sixth surface 432 includes a fifth light-emitting region 433 and a sixth light-emitting region 434 arranged at intervals.

光學組件400與實施例三的光學組件300的區別在於,所述第二出光區414設置有第三濾光膜418,所述第四出光區424設置有第四濾光膜428。所述第三濾光膜418用於濾除所述第二波段的光429以及所述第三波段的光439,所述第四濾光膜428用於濾除所述第三波段的光439。The difference between the optical assembly 400 and the optical assembly 300 of the third embodiment is that the second light exit region 414 is provided with a third filter film 418 , and the fourth light exit region 424 is provided with a fourth filter film 428 . The third filter film 418 is used to filter out the light 429 of the second waveband and the light 439 of the third waveband, and the fourth filter film 428 is used to filter out the light 439 of the third waveband .

來自光源600的光線經第一耦入光柵415繞射,入射至第一透光基板410,並在所述第一透光基板410內傳播。當光線傳導至第一出光區413後,由於第一濾光膜417的阻止作用,第一波段的光419被濾除而無法在所述第一出光區413出射。所述第一波段的光419傳導至第一耦出光柵416,經所述第一耦出光柵416繞射並在第二出光區414出射,後到達觀察位置500。由於所述第三濾光膜418的阻止作用,僅有所述第一波段的光419從所述第二出光區414出射。自所述第一出光區413出射的光線經第二耦入光柵425繞射,入射至第二透光基板420,並在所述第二透光基板420內傳播。當光線傳導至所述第三出光區423後,由於所述第二濾光膜427的阻止作用,所述第二波段的光429被濾除而無法在所述第三出光區423出射。所述第二波段的光229傳導至第二耦出光柵426,經所述第二耦出光柵426繞射並在所述第四出光區424出射,後到達所述觀察位置500。由於所述第四濾光膜428的阻止作用,僅有所述第一波段的光419以及所述第二波段的光429從所述第四出光區424出射。自所述第三出光區423出射的光線經第三耦入光柵435繞射,入射至第三透光基板430,並在所述第三透光基板430內傳播。當所述第三波段的光439傳導至第三耦出光柵436,經所述第三耦出光柵436繞射並在所述第六出光區434出射,後到達所述觀察位置500。The light from the light source 600 is diffracted by the first coupling grating 415 , enters the first transparent substrate 410 , and propagates in the first transparent substrate 410 . After the light is transmitted to the first light exit region 413 , due to the blocking effect of the first filter film 417 , the light 419 of the first wavelength band is filtered and cannot exit in the first light exit region 413 . The light 419 in the first wavelength band is transmitted to the first outcoupling grating 416 , diffracted by the first outcoupling grating 416 , exits in the second light out region 414 , and then reaches the observation position 500 . Due to the blocking effect of the third filter film 418 , only the light 419 of the first wavelength band exits from the second light exit area 414 . The light emitted from the first light exit region 413 is diffracted by the second in-coupling grating 425 , enters the second light-transmitting substrate 420 , and propagates in the second light-transmitting substrate 420 . After the light is transmitted to the third light exit region 423 , due to the blocking effect of the second filter film 427 , the light 429 of the second wavelength band is filtered and cannot exit in the third light exit region 423 . The light 229 in the second wavelength band is transmitted to the second outcoupling grating 426 , diffracted by the second outcoupling grating 426 and exits in the fourth light out region 424 , and then reaches the observation position 500 . Due to the blocking effect of the fourth filter film 428 , only the light 419 of the first wavelength band and the light 429 of the second wavelength band are emitted from the fourth light output region 424 . The light emitted from the third light emitting area 423 is diffracted by the third in-coupling grating 435 , enters the third light-transmitting substrate 430 , and propagates in the third light-transmitting substrate 430 . When the light 439 of the third wavelength band is transmitted to the third outcoupling grating 436 , is diffracted by the third outcoupling grating 436 and exits in the sixth light out region 434 , and then reaches the observation position 500 .

所述第一波段的光419為紅光,所述第二波段的光429為綠光,所述第三波段的光439為藍光。優選地,所述第一波段為600nm~650nm,所述第二波段為500nm~550nm,所述第三波段為400nm~450nm。The light 419 of the first waveband is red light, the light 429 of the second waveband is green light, and the light 439 of the third waveband is blue light. Preferably, the first waveband is 600nm~650nm, the second waveband is 500nm~550nm, and the third waveband is 400nm~450nm.

所述第三濾光膜418包括多層無機膜。優選地,所述第三濾光膜418為多層介電質膜,由高折射率介電質膜與低折射率介電質膜交替設置,膜堆結構為:1.5(0.5LH0.5L) 8×2.3(0.5LH0.5L) 8×(0.5HL0.5H) 8。其中,0.5L代表厚度為1/8波長的低折射率層,可以為Al 2O 3、SiO 2、Si 3N 4、SiON、Na 3AlF 6等。H代表厚度為1/4波長的高折射率層,可以為ZrO 2、TiO 2、Nb 2O 5、ZnO、ZnS等。在本實施例中,L為Na 3AlF 6,H為TiO 2,8為週期數,1.5以及2.3為調變倍數。所述第三濾光膜418設置於所述第二出光區414的方式不受限制,可以為熱蒸鍍、電子槍蒸鍍、鐳射蒸鍍、濺鍍等方式。 The third filter film 418 includes a multi-layer inorganic film. Preferably, the third filter film 418 is a multilayer dielectric film, which is alternately arranged by high refractive index dielectric films and low refractive index dielectric films, and the film stack structure is: 1.5 (0.5LH0.5L) 8 ×2.3(0.5LH0.5L) 8 ×(0.5HL0.5H) 8 . Wherein, 0.5L represents a low refractive index layer with a thickness of 1/8 wavelength, which may be Al 2 O 3 , SiO 2 , Si 3 N 4 , SiON, Na 3 AlF 6 and so on. H represents a high refractive index layer with a thickness of 1/4 wavelength, which can be ZrO 2 , TiO 2 , Nb 2 O 5 , ZnO, ZnS, etc. In this embodiment, L is Na 3 AlF 6 , H is TiO 2 , 8 is the period number, and 1.5 and 2.3 are modulation multiples. The manner in which the third filter film 418 is disposed on the second light emitting area 414 is not limited, and may be thermal evaporation, electron gun evaporation, laser evaporation, sputtering, and the like.

請參閱圖11,所述第三濾光膜418為帶通濾光膜,波長在一定範圍內的光能通過,波長在一定範圍外的光不能通過。所述第三濾光膜418對於波長605nm~640nm的光,透過率大於90%,波長<580nm的光及波長>680nm的光,透光率小於5%。是故,所述第一波段(600nm~650nm)的光大部分能夠通過所述第三濾光膜418,且具有90%以上的透光率。所述第二波段(500nm~550nm)的光以及所述第三波段(400nm~450nm)的光在所述第三濾光膜418中的透光率接近於零。需要說明的是,本申請實施例中,所述第三濾光膜418用於濾除所述第二波段的光429以及所述第三波段的光439,是指所述第二波段的光429以及所述第三波段的光439在所述第三濾光膜418中的透過率小於特定值(如,5%),並非指嚴格的完全不透過。Please refer to FIG. 11 , the third filter film 418 is a band-pass filter film, through which light with a wavelength within a certain range can pass through, and light with a wavelength outside a certain range cannot pass through. The third filter film 418 has a transmittance greater than 90% for light with a wavelength of 605nm-640nm, and a transmittance of less than 5% for light with a wavelength <580nm and light with a wavelength >680nm. Therefore, most of the light in the first wavelength band (600nm~650nm) can pass through the third filter film 418 and has a light transmittance of over 90%. The light transmittance of the light in the second waveband (500nm~550nm) and the light in the third waveband (400nm~450nm) in the third filter film 418 is close to zero. It should be noted that, in the embodiment of the present application, the third filter film 418 is used to filter out the light 429 of the second waveband and the light 439 of the third waveband, which refers to the light of the second waveband The transmittance of 429 and the light 439 of the third wavelength band in the third filter film 418 is less than a specific value (eg, 5%), which does not mean that it is strictly not transmitted at all.

所述第四濾光膜428包括多層無機膜。優選地,所述第四濾光膜428為多層介電質膜,由高折射率介電質膜與低折射率介電質膜交替設置,膜堆結構為:(0.5HL0.5H) 7。其中,0.5H代表厚度為1/8波長的高折射率層,可以為ZrO 2、TiO 2、Nb 2O 5、ZnO、ZnS等。L代表厚度為1/4波長的低折射率層,可以為Al 2O 3、SiO 2、Si 3N 4、SiON、Na 3AlF 6等。本實施例中,H為TiO 2,L為SiO 2,7為週期數。所述第四濾光膜428設置於所述第四出光區424的方式不受限制,可以為熱蒸鍍、電子槍蒸鍍、鐳射蒸鍍、濺鍍等方式。 The fourth filter film 428 includes a multi-layer inorganic film. Preferably, the fourth filter film 428 is a multilayer dielectric film, which is alternately arranged with high refractive index dielectric films and low refractive index dielectric films, and the film stack structure is: (0.5HL0.5H) 7 . Wherein, 0.5H represents a high refractive index layer with a thickness of 1/8 wavelength, which can be ZrO 2 , TiO 2 , Nb 2 O 5 , ZnO, ZnS, etc. L represents a low refractive index layer with a thickness of 1/4 wavelength, which can be Al 2 O 3 , SiO 2 , Si 3 N 4 , SiON, Na 3 AlF 6 and so on. In this embodiment, H is TiO 2 , L is SiO 2 , and 7 is the period number. The method of disposing the fourth filter film 428 in the fourth light output area 424 is not limited, and may be thermal evaporation, electron gun evaporation, laser evaporation, sputtering, and the like.

請參閱圖12,所述第四濾光膜428為長波通濾光膜,波長大於參考波長的光能通過,波長小於參考波長的光不能通過。所述第四濾光膜428對於波長>500nm的光,透光率大於90%;對於波長<450nm的光,透光率小於5%。是故,所述第二波段(500nm~550nm)及所述第一波段(600nm~650nm)的光能夠通過所述第四濾光膜428,且具有90%以上的透光率。所述第三波段(400nm~470nm)的光在所述第四濾光膜428中的透光率小於30%。特別地,波長在400nm~450nm的光在所述第四濾光膜428中的透光率小於5%。需要說明的是,本申請實施例中,所述第四濾光膜428用於濾除所述第三波段的光439,指的所述第三波段的光439在所述第四濾光膜428中的透過率小於特定值(如,30%),並非指嚴格的完全不透過。Please refer to FIG. 12 , the fourth filter film 428 is a long-wave pass filter film, through which light with a wavelength greater than the reference wavelength can pass through, and light with a wavelength smaller than the reference wavelength cannot pass through. The fourth filter film 428 has a light transmittance greater than 90% for light with a wavelength > 500nm; and a light transmittance of less than 5% for light with a wavelength < 450nm. Therefore, the light in the second waveband (500nm~550nm) and the first waveband (600nm~650nm) can pass through the fourth filter film 428 and has a light transmittance of over 90%. The light transmittance of the light in the third wavelength band (400nm~470nm) in the fourth filter film 428 is less than 30%. In particular, the light transmittance of light with a wavelength of 400nm-450nm in the fourth filter film 428 is less than 5%. It should be noted that, in the embodiment of the present application, the fourth filter film 428 is used to filter out the light 439 of the third wavelength band, which means that the light 439 of the third wave band passes through the fourth filter film. The transmittance in 428 is less than a specific value (for example, 30%), and does not mean strictly impermeable.

在本實施例中,所述第一濾光膜417減少了從所述第一透光基板410出射的紅光,減少了紅光對綠光及藍光的干擾。所述第二濾光膜427減少了從所述第二透光基板420出射的綠光,減少了對藍光的干擾。所述第三濾光膜418減少了從所述第一透光基板410出射的綠光及藍光,使紅光的出光顏色更純。所述第四濾光膜428減少了從所述第二透光基板420出射的藍光,使綠光的出光顏色更純。所述光學組件400減少了三種光色之間的互相干擾,避免彩虹效應,增加了每一種光色的純度,提高了成像效果。特別地,波長450nm的藍光到達觀察位置500時透光率達到88.9%;波長532nm的綠光到達觀察位置500時透光率達到95.2%;波長628nm的紅光到達觀察位置500時透光率達到92.5%。相比有機高分子濾光片,所述第一濾光膜417、所述第二濾光膜427、所述第三濾光膜418以及所述第四濾光膜428為多層無機膜,具有更高的裂解溫度(裂解溫度Td>450℃),裂解速度較慢,更為耐用;藉由選擇第一濾光膜、第二濾光膜、第三濾光膜以及第四濾光膜中的高折射率介電質膜與低折射率介電質膜的材料,即可改變濾光範圍,更容易調整濾光光色;光譜特性更為陡峭,出光顏色更純。In this embodiment, the first filter film 417 reduces the red light emitted from the first transparent substrate 410 and reduces the interference of red light on green light and blue light. The second filter film 427 reduces the green light emitted from the second transparent substrate 420 and reduces the interference to the blue light. The third filter film 418 reduces the green light and blue light emitted from the first transparent substrate 410 , so that the color of the red light is more pure. The fourth filter film 428 reduces the blue light emitted from the second transparent substrate 420 , making the emitted green light more pure. The optical component 400 reduces the mutual interference among the three light colors, avoids the rainbow effect, increases the purity of each light color, and improves the imaging effect. In particular, when the blue light with a wavelength of 450nm reaches the observation position of 500, the light transmittance reaches 88.9%; when the green light with a wavelength of 532nm reaches the observation position of 500, the light transmittance reaches 95.2%; 92.5%. Compared with the organic polymer filter, the first filter film 417, the second filter film 427, the third filter film 418 and the fourth filter film 428 are multilayer inorganic films with Higher cracking temperature (cracking temperature Td > 450°C), slower cracking speed, more durable; by selecting the first filter, the second filter, the third filter and the fourth filter The materials of high refractive index dielectric film and low refractive index dielectric film can change the filtering range, and it is easier to adjust the color of the filtered light; the spectral characteristics are steeper, and the color of the light is purer.

其他變形例Other modifications

上述實施例一至實施例四,以光學組件包括層疊的三個透光基板為例進行說明,其他變形例中,光學組件中透光基板的數量可以為一個、兩個或大於三個。例如,其他變形例中,透光基板的數量為一個,光學組件可只包括圖1中的第一透光基板110、位於第一透光基板110的第一表面111上的第一耦入光柵115及第一耦出光柵116、及位於第二表面112上的第一濾光膜117。自第一耦入光柵115入射至第一透光基板110的第一波段的光119,傳導至第一濾光膜117後被濾除而無法在第一出光區113出射。第一波段的光119傳導至第一耦出光柵116後,經第一耦出光柵116繞射並在第二出光區114出射後,直接進入觀察位置。The first to fourth embodiments described above are described by taking the optical assembly including three laminated light-transmitting substrates as an example. In other modification examples, the number of light-transmitting substrates in the optical assembly may be one, two or more than three. For example, in other modified examples, the number of light-transmitting substrates is one, and the optical assembly may only include the first light-transmitting substrate 110 in FIG. 115 , the first outcoupling grating 116 , and the first filter film 117 on the second surface 112 . The light 119 of the first wavelength band incident on the first light-transmitting substrate 110 from the first coupling grating 115 is transmitted to the first filter film 117 and then filtered out so that it cannot exit in the first light-exit region 113 . The light 119 of the first wavelength band is transmitted to the first outcoupling grating 116 , diffracted by the first outcoupling grating 116 , exits in the second light out region 114 , and directly enters the observation position.

再一變形例中,透光基板的數量為兩個,光學組件包括圖1中的第一透光基板110、位於第一透光基板110的第一表面111上的第一耦入光柵115及第一耦出光柵116、位於第二表面112上的第一濾光膜117。光學組件還包括圖1中的第三透光基板130、位於第三透光基板130的第五表面131上的第三耦入光柵135及第三耦出光柵136。從第一濾光膜117出射的光經第三耦入光柵135進入第三透光基板130傳播至第三耦出光柵136後,在第六出光區134出射後到達觀察位置500,從第二出光區114出射的光經第三耦出光柵136、第三透光基板130後,在第六出光區134出射後到達觀察位置500。In yet another modified example, the number of light-transmitting substrates is two, and the optical components include the first light-transmitting substrate 110 in FIG. The first outcoupling grating 116 and the first filter film 117 on the second surface 112 . The optical assembly further includes the third light-transmitting substrate 130 in FIG. 1 , a third in-coupling grating 135 and a third out-coupling grating 136 located on the fifth surface 131 of the third light-transmitting substrate 130 . The light emitted from the first filter film 117 enters the third light-transmitting substrate 130 through the third coupling grating 135, propagates to the third output grating 136, and reaches the observation position 500 after exiting the sixth light exit region 134. The light emitted from the light exit region 114 passes through the third outcoupling grating 136 and the third light-transmitting substrate 130 , and then reaches the observation position 500 after exiting from the sixth light exit region 134 .

請參閱圖13,本申請一實施例提供一種顯示裝置700,包括光源600,以及如前所述的光學組件100(200、300、400),所述光源600設置於所述光學組件100(200、300、400)的一側,所述光源600發出的光經過所述光學組件100後到達觀察位置500。其中,顯示裝置700中的,光學組件100(200、300、400)亦可替換為其他變形例的光學組件。Please refer to FIG. 13 , an embodiment of the present application provides a display device 700, including a light source 600, and the aforementioned optical assembly 100 (200, 300, 400), the light source 600 is arranged on the optical assembly 100 (200 , 300 , 400 ), the light emitted by the light source 600 reaches the observation position 500 after passing through the optical assembly 100 . Wherein, in the display device 700 , the optical components 100 ( 200 , 300 , 400 ) can also be replaced with optical components of other modified examples.

所述顯示裝置700提高出射光線顏色純度,改善觀察位置的顏色均勻性;透光率更高,平均透光率達到95%以上;在AR/VR領域具有更廣泛的適用性,光源600可以為有機高分子濾光片不適用的光源,例如微型發光二極體光源、微型有機發光二極體光源及量子點發光二極體。光源600亦可以為有機高分子濾光片不適用的顯示裝置,例如數位光處理投影機、矽基液晶顯示面板。所述顯示裝置700可以應用於穿戴裝置,例如VR眼鏡、AR眼鏡。The display device 700 improves the color purity of the outgoing light and improves the color uniformity of the observation position; the light transmittance is higher, and the average light transmittance reaches more than 95%; it has wider applicability in the field of AR/VR, and the light source 600 can be Light sources for which organic polymer filters are not suitable, such as micro light emitting diode light sources, micro organic light emitting diode light sources and quantum dot light emitting diodes. The light source 600 can also be a display device for which an organic polymer filter is not suitable, such as a digital light processing projector or a silicon-based liquid crystal display panel. The display device 700 can be applied to wearable devices, such as VR glasses and AR glasses.

以上實施方式僅用以說明本申請的技術方案而非限制,儘管參照較佳實施方式對本申請進行了詳細說明,本領域的普通技術人員應當理解,可以對本申請的技術方案進行修改或等同替換,而不脫離本申請技術方案的精神及範圍。The above embodiments are only used to illustrate the technical solutions of the present application without limitation. Although the present application has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present application can be modified or equivalently replaced. Without departing from the spirit and scope of the technical solution of the present application.

100、200、300、400:光學組件 110、210、310、410:第一透光基板 120、220、320、420:第二透光基板 130、230、330、430:第三透光基板 111、211、311、411:第一表面 112、212、312、412:第二表面 113、213、313、413:第一出光區 114、214、314、414:第二出光區 115、215、315、415:第一耦入光柵 116、216、316、416:第一耦出光柵 117、217、317、417:第一濾光膜 121、221、321、421:第三表面 122、222、322、422:第四表面 123、223、323、423:第三出光區 124、224、324、424:第四出光區 125、225、325、425:第二耦入光柵 126、226、326、426:第二耦出光柵 127、227、327、427:第二濾光膜 131、231、331、431:第五表面 132、232、332、432:第六表面 133、233、333、433:第五出光區 134、234、334、434:第六出光區 135、235、335、435:第三耦入光柵 136、236、336、436:第三耦出光柵 218、418:第三濾光膜 228、428:第四濾光膜 119、219、319、419:第一波段的光 129、229、329、429:第二波段的光 139、239、339、439:第三波段的光 101:局部放大 500:觀察位置 600:光源 700:顯示裝置 L:低折射率層 H:高折射率層 m:週期數100, 200, 300, 400: Optical components 110, 210, 310, 410: the first transparent substrate 120, 220, 320, 420: the second transparent substrate 130, 230, 330, 430: the third transparent substrate 111, 211, 311, 411: the first surface 112, 212, 312, 412: second surface 113, 213, 313, 413: the first light exit area 114, 214, 314, 414: the second light exit area 115, 215, 315, 415: the first coupling-in grating 116, 216, 316, 416: the first outcoupling grating 117, 217, 317, 417: the first filter film 121, 221, 321, 421: the third surface 122, 222, 322, 422: the fourth surface 123, 223, 323, 423: the third light exit area 124, 224, 324, 424: the fourth light output area 125, 225, 325, 425: the second coupling grating 126, 226, 326, 426: the second outcoupling grating 127, 227, 327, 427: the second filter film 131, 231, 331, 431: the fifth surface 132, 232, 332, 432: the sixth surface 133, 233, 333, 433: the fifth light output area 134, 234, 334, 434: the sixth light exit area 135, 235, 335, 435: the third coupling grating 136, 236, 336, 436: the third outcoupling grating 218, 418: the third filter film 228, 428: the fourth filter film 119, 219, 319, 419: light in the first band 129, 229, 329, 429: light in the second waveband 139, 239, 339, 439: light in the third waveband 101: Partial zoom-in 500: Observation position 600: light source 700: display device L: low refractive index layer H: high refractive index layer m: number of cycles

圖1為本申請實施例一的光學組件的結構示意圖。FIG. 1 is a schematic structural diagram of an optical component according to Embodiment 1 of the present application.

圖2為本申請實施例一的第一濾光膜的透光率特性圖。FIG. 2 is a characteristic diagram of light transmittance of the first filter film according to Embodiment 1 of the present application.

圖3為本申請實施例一的第二濾光膜的透光率特性圖。FIG. 3 is a characteristic diagram of light transmittance of a second filter film according to Embodiment 1 of the present application.

圖4為本申請實施例二的光學組件的結構示意圖。FIG. 4 is a schematic structural diagram of an optical assembly according to Embodiment 2 of the present application.

圖5為本申請實施例二的第三濾光膜的透光率特性圖。FIG. 5 is a characteristic diagram of light transmittance of the third filter film according to the second embodiment of the present application.

圖6為本申請實施例二的第四濾光膜的透光率特性圖。FIG. 6 is a characteristic diagram of light transmittance of the fourth filter film according to the second embodiment of the present application.

圖7為本申請實施例三的光學組件的結構示意圖。FIG. 7 is a schematic structural diagram of an optical assembly according to Embodiment 3 of the present application.

圖8為本申請實施例三的第一濾光膜的透光率特性圖。FIG. 8 is a characteristic diagram of light transmittance of the first filter film according to the third embodiment of the present application.

圖9為本申請實施例三的第二濾光膜的透光率特性圖。FIG. 9 is a characteristic diagram of light transmittance of the second filter film according to the third embodiment of the present application.

圖10為本申請實施例四的光學組件的結構示意圖。FIG. 10 is a schematic structural diagram of an optical assembly according to Embodiment 4 of the present application.

圖11為本申請實施例四的第三濾光膜的透光率特性圖。FIG. 11 is a characteristic diagram of light transmittance of the third filter film according to the fourth embodiment of the present application.

圖12為本申請實施例四的第四濾光膜的透光率特性圖。FIG. 12 is a characteristic diagram of light transmittance of a fourth filter film according to Embodiment 4 of the present application.

圖13為本申請一實施例的顯示裝置的結構示意圖。FIG. 13 is a schematic structural diagram of a display device according to an embodiment of the present application.

100:光學組件 100: Optical components

110:第一透光基板 110: the first transparent substrate

120:第二透光基板 120: the second transparent substrate

130:第三透光基板 130: the third transparent substrate

111:第一表面 111: first surface

112:第二表面 112: second surface

113:第一出光區 113: The first light exit area

114:第二出光區 114: Second light exit area

115:第一耦入光柵 115: The first coupling into the grating

116:第一耦出光柵 116: The first outcoupling grating

117:第一濾光膜 117: The first filter film

121:第三表面 121: third surface

122:第四表面 122: The fourth surface

139:第三波段的光 139: Light in the third waveband

101:局部放大 101: Partial zoom-in

500:觀察位置 500: Observation position

123:第三出光區 123: The third light exit area

124:第四出光區 124: The fourth light output area

125:第二耦入光柵 125: The second coupling grating

126:第二耦出光柵 126: The second outcoupling grating

127:第二濾光膜 127: Second filter film

131:第五表面 131: fifth surface

132:第六表面 132: sixth surface

133:第五出光區 133: Fifth light area

134:第六出光區 134: The sixth light area

135:第三耦入光柵 135: The third coupling grating

136:第三耦出光柵 136: The third outcoupling grating

119:第一波段的光 119: Light in the first band

129:第二波段的光 129: Light in the second band

600:光源 600: light source

L:低折射率層 L: low refractive index layer

H:高折射率層 H: high refractive index layer

m:週期數 m: number of cycles

Claims (15)

一種光學組件,其改良在於,包括: 第一透光基板,用於傳導第一波段的光;所述第一透光基板包括相對的第一表面以及第二表面,所述第二表面包括間隔設置的第一出光區及第二出光區; 第一耦入光柵及第一耦出光柵,間隔設置於所述第一表面,所述第一耦入光柵在所述第一透光基板上的投影落入所述第一出光區,所述第一耦出光柵在所述第一透光基板上的投影落入所述第二出光區; 第一濾光膜,設置於所述第一出光區,所述第一濾光膜包括多層無機膜,所述第一濾光膜用於濾除所述第一波段的光; 其中,自所述第一耦入光柵入射至所述第一透光基板的所述第一波段的光,傳導至所述第一濾光膜後被濾除而無法在所述第一出光區出射,傳導至所述第一耦出光柵後,經所述第一耦出光柵繞射並在所述第二出光區出射。 An optical assembly, the improvement of which comprises: The first light-transmitting substrate is used to transmit the light of the first wavelength band; the first light-transmitting substrate includes opposite first surfaces and second surfaces, and the second surface includes first light-emitting regions and second light-emitting regions arranged at intervals district; The first in-coupling grating and the first out-coupling grating are arranged at intervals on the first surface, and the projection of the first in-coupling grating on the first light-transmitting substrate falls into the first light-out region, and The projection of the first outcoupling grating on the first light-transmitting substrate falls into the second light-out region; The first filter film is arranged in the first light exit area, the first filter film includes a multi-layer inorganic film, and the first filter film is used to filter out the light in the first wavelength band; Wherein, the light of the first wavelength band incident on the first light-transmitting substrate from the first coupling grating is filtered out after being transmitted to the first filter film, so that it cannot enter the first light-exit area. After being transmitted to the first outcoupling grating, it is diffracted by the first outcoupling grating and emerges in the second light out region. 根據請求項1所述的光學組件,其中,所述光學組件還包括: 第二透光基板,用於傳導第二波段的光,所述第二波段與所述第一波段不重疊;所述第二透光基板包括相對的第三表面以及第四表面,所述第四表面包括間隔設置的第三出光區及第四出光區; 第二耦入光柵及第二耦出光柵,間隔設置於所述第三表面,所述第二耦入光柵在所述第二透光基板上的投影落入所述第三出光區,所述第二耦出光柵在所述第二透光基板上的投影落入所述第四出光區; 第二濾光膜,設置於所述第三出光區,所述第二濾光膜包括多層無機膜,所述第二濾光膜用於濾除所述第二波段的光; 其中,自所述第一出光區出射的光經所述第二耦入光柵入射至所述第二透光基板的所述第二波段的光,傳導至所述第二濾光膜後被濾除而無法在所述第三出光區出射,傳導至所述第二耦出光柵後,經所述第二耦出光柵繞射並在所述第四出光區出射。 The optical assembly according to claim 1, wherein the optical assembly further comprises: The second light-transmitting substrate is used to transmit the light of the second waveband, and the second waveband does not overlap with the first waveband; the second light-transmitting substrate includes a third surface and a fourth surface opposite to each other, and the first waveband does not overlap with the first waveband; The four surfaces include a third light output area and a fourth light output area arranged at intervals; The second in-coupling grating and the second out-coupling grating are arranged at intervals on the third surface, the projection of the second in-coupling grating on the second light-transmitting substrate falls into the third light-out area, and the The projection of the second outcoupling grating on the second light-transmitting substrate falls into the fourth light-out region; The second filter film is arranged in the third light exit area, the second filter film includes a multi-layer inorganic film, and the second filter film is used to filter out the light in the second wavelength band; Wherein, the light emitted from the first light exit region is incident on the light of the second wavelength band of the second light-transmitting substrate through the second in-coupling grating, and is filtered after being transmitted to the second filter film. In addition to being unable to exit in the third light exit area, it is transmitted to the second outcoupling grating, diffracted by the second outcoupling grating, and exits in the fourth light exit area. 根據請求項2所述的光學組件,其中,所述光學組件還包括: 第三透光基板,所述第三透光基板用於傳導第三波段的光,所述第三波段與所述第一波段不重疊,所述第三波段與所述第二波段不重疊;所述第三透光基板包括相對的第五表面以及第六表面,所述第六表面包括間隔設置的第五出光區及第六出光區; 第三耦入光柵及第三耦出光柵,間隔設置於所述第五表面,所述第三耦入光柵在所述第三透光基板上的投影落入所述第五出光區,所述第三耦出光柵在所述第三透光基板上的投影落入所述第六出光區; 其中,自所述第三出光區出射的光經所述第三耦入光柵入射至所述第三透光基板的第三波段的光,傳導至所述第三耦出光柵後,經所述第三耦出光柵繞射並在所述第六出光區出射。 The optical assembly according to claim 2, wherein the optical assembly further comprises: A third light-transmitting substrate, the third light-transmitting substrate is used to transmit light in a third waveband, the third waveband does not overlap with the first waveband, and the third waveband does not overlap with the second waveband; The third light-transmitting substrate includes opposite fifth and sixth surfaces, and the sixth surface includes fifth and sixth light-emitting regions arranged at intervals; The third in-coupling grating and the third out-coupling grating are arranged at intervals on the fifth surface, the projection of the third in-coupling grating on the third light-transmitting substrate falls into the fifth light-out area, and the The projection of the third outcoupling grating on the third light-transmitting substrate falls into the sixth light-out region; Wherein, the light exiting from the third light output region passes through the third in-coupling grating and enters the light in the third wavelength band of the third light-transmitting substrate, and after being transmitted to the third out-coupling grating, passes through the The third outcoupling grating diffracts and emits in the sixth light out region. 根據請求項2或3所述的光學組件,其中,所述光學組件還包括: 第三濾光膜,設置於所述第一透光基板的所述第二出光區,所述第三濾光膜包括多層無機膜,所述第三濾光膜用於濾除所述第二波段的光以及所述第三波段的光; 第四濾光膜,設置於所述第二透光基板的所述第四出光區,所述第四濾光膜包括多層無機膜,所述第四濾光膜用於濾除所述第三波段的光。 The optical assembly according to claim 2 or 3, wherein the optical assembly further comprises: The third filter film is arranged in the second light exit area of the first light-transmitting substrate, the third filter film includes a multi-layer inorganic film, and the third filter film is used to filter out the second the light of the wavelength band and the light of the third wavelength band; The fourth filter film is arranged in the fourth light exit region of the second light-transmitting substrate, the fourth filter film includes a multi-layer inorganic film, and the fourth filter film is used to filter out the third bands of light. 根據請求項4所述的光學組件,其中,所述第一濾光膜以及所述第二濾光膜為長波通濾光膜,所述第三濾光膜為帶通濾光膜,所述第四濾光膜為短波通濾光膜。The optical assembly according to claim 4, wherein the first filter film and the second filter film are long-wave pass filter films, the third filter film is a band-pass filter film, and the The fourth filter film is a short-wave pass filter film. 根據請求項5所述的光學組件,其中,所述第一濾光膜允許波長>500nm的光通過,所述第二濾光膜允許波長>600nm的光通過,所述第三濾光膜允許波長440nm~460nm的光通過,所述第四濾光膜允許波長<550nm的光通過。The optical assembly according to claim 5, wherein the first filter film allows light with a wavelength > 500 nm to pass through, the second filter film allows light with a wavelength > 600 nm to pass through, and the third filter film allows light with a wavelength > 600 nm to pass through. Light with a wavelength of 440nm to 460nm passes through, and the fourth filter film allows light with a wavelength of <550nm to pass through. 根據請求項4所述的光學組件,其中,所述第一濾光膜以及所述第二濾光膜為短波通濾光膜,所述第三濾光膜為帶通濾光膜,所述第四濾光膜為長波通濾光膜。The optical assembly according to claim 4, wherein the first filter film and the second filter film are short-wave pass filter films, the third filter film is a band-pass filter film, and the The fourth filter film is a long-wave pass filter film. 根據請求項7所述的光學組件,其中,所述第一濾光膜允許波長<550nm的光通過,所述第二濾光膜允許波長<450nm的光通過,所述第三濾光膜允許波長600nm~640nm的光通過,所述第四濾光膜允許波長>500nm的光通過。The optical assembly according to claim 7, wherein the first filter film allows light with a wavelength <550nm to pass through, the second filter film allows light with a wavelength <450nm to pass through, and the third filter film allows Light with a wavelength of 600nm to 640nm passes through, and the fourth filter film allows light with a wavelength >500nm to pass through. 根據請求項4所述的光學組件,其中,所述第三濾光膜以及所述第四濾光膜為多層介電質膜,所述多層介電質膜由高折射率介電質膜與低折射率介電質膜交替設置,所述介電質膜為非金屬氧化物或金屬氧化物。The optical component according to claim 4, wherein, the third filter film and the fourth filter film are multilayer dielectric films, and the multilayer dielectric films are composed of a high refractive index dielectric film and a Low refractive index dielectric films are arranged alternately, and the dielectric films are non-metal oxides or metal oxides. 根據請求項9所述的光學組件,其中,所述多層介電質膜以鍍膜方式形成堆疊對稱膜層,所述鍍膜方式為熱蒸鍍,或電子槍蒸鍍,或鐳射蒸鍍,或濺鍍。The optical component according to claim 9, wherein the multilayer dielectric film forms stacked symmetrical film layers by means of coating, and the coating mode is thermal evaporation, electron gun evaporation, laser evaporation, or sputtering . 根據請求項2所述的光學組件,其中,所述第二濾光膜為多層介電質膜,所述多層介電質膜由高折射率介電質膜與低折射率介電質膜交替設置,所述介電質膜為非金屬氧化物或金屬氧化物。The optical component according to claim 2, wherein the second filter film is a multi-layer dielectric film, and the multi-layer dielectric film consists of high refractive index dielectric films and low refractive index dielectric films alternately It is provided that the dielectric film is a non-metal oxide or a metal oxide. 根據請求項11所述的光學組件,其中,所述多層介電質膜以鍍膜方式形成堆疊對稱膜層,所述鍍膜方式為熱蒸鍍,或電子槍蒸鍍,或鐳射蒸鍍,或濺鍍。The optical component according to claim 11, wherein the multilayer dielectric film forms a stacked symmetrical film layer by coating, and the coating method is thermal evaporation, electron gun evaporation, laser evaporation, or sputtering . 根據請求項1所述的光學組件,其中,所述第一濾光膜為多層介電質膜,所述多層介電質膜由高折射率介電質膜與低折射率介電質膜交替設置,所述介電質膜為非金屬氧化物或金屬氧化物。The optical component according to claim 1, wherein the first filter film is a multilayer dielectric film, and the multilayer dielectric film is composed of high refractive index dielectric films and low refractive index dielectric films alternately It is provided that the dielectric film is a non-metal oxide or a metal oxide. 根據請求項13所述的光學組件,其中,所述多層介電質膜以鍍膜方式形成堆疊對稱膜層,所述鍍膜方式為熱蒸鍍,或電子槍蒸鍍,或鐳射蒸鍍,或濺鍍。The optical component according to claim 13, wherein the multilayer dielectric film forms stacked symmetrical film layers by means of coating, and the coating mode is thermal evaporation, or electron gun evaporation, or laser evaporation, or sputtering . 一種顯示裝置,其改良在於,包括光源,以及請求項1至14任一項所述的光學組件,所述光源設置於所述光學組件的一側,所述光源發出的光經過所述光學組件後到達觀察位置。A display device, which is improved in that it includes a light source, and the optical assembly described in any one of claims 1 to 14, the light source is arranged on one side of the optical assembly, and the light emitted by the light source passes through the optical assembly After reaching the observation position.
TW111105016A 2022-01-26 2022-02-11 Optical module and display device TWI805221B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202210093374.7A CN114563873A (en) 2022-01-26 2022-01-26 Optical assembly and display device
CN202210093374.7 2022-01-26

Publications (2)

Publication Number Publication Date
TWI805221B true TWI805221B (en) 2023-06-11
TW202331306A TW202331306A (en) 2023-08-01

Family

ID=81714503

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111105016A TWI805221B (en) 2022-01-26 2022-02-11 Optical module and display device

Country Status (2)

Country Link
CN (1) CN114563873A (en)
TW (1) TWI805221B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7209628B2 (en) * 1992-03-23 2007-04-24 3M Innovative Properties Company Luminaire device
US20180341111A1 (en) * 2017-05-24 2018-11-29 Microsoft Technology Licensing, Llc Diffractive filtering in waveguide display
TW202018369A (en) * 2018-11-09 2020-05-16 美商菲絲博克科技有限公司 Optical coupler, waveguide-based near-eye display and method of displaying images using waveguide-based near-eye display

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103018812B (en) * 2012-12-17 2015-05-13 晋谱(福建)光电科技有限公司 Near-infrared narrow-band optical filter used for somatosensory recognition system
CN105785491A (en) * 2016-05-23 2016-07-20 浙江水晶光电科技股份有限公司 Reflection optical filter and vehicle-mounted head-up display system
CN108387961A (en) * 2018-05-16 2018-08-10 德州尧鼎光电科技有限公司 A kind of deep ultraviolet spike filter
CN112415744A (en) * 2019-08-22 2021-02-26 苏州苏大维格科技集团股份有限公司 Augmented reality display system
CN212009008U (en) * 2020-03-02 2020-11-24 深圳市激埃特光电有限公司 NBP578 nanometer narrow-band filter for glucometer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7209628B2 (en) * 1992-03-23 2007-04-24 3M Innovative Properties Company Luminaire device
US20180341111A1 (en) * 2017-05-24 2018-11-29 Microsoft Technology Licensing, Llc Diffractive filtering in waveguide display
TW202018369A (en) * 2018-11-09 2020-05-16 美商菲絲博克科技有限公司 Optical coupler, waveguide-based near-eye display and method of displaying images using waveguide-based near-eye display

Also Published As

Publication number Publication date
CN114563873A (en) 2022-05-31
TW202331306A (en) 2023-08-01

Similar Documents

Publication Publication Date Title
CN102985856B (en) Cutoff filter
CN105388625B (en) A kind of wearing display beam splitter and preparation method thereof
CN103235356B (en) Optical filter and preparation method thereof, color membrane substrates and display device
US20120276350A1 (en) Reflection reducing film, optical member and optical system
CN103261927B (en) Optical filter module and optical filter system
JP6331366B2 (en) Projection optical system prism and optical system using the same
CA2480648A1 (en) Dichroic mirror and projection-type display unit
JP3563955B2 (en) Observation system having half mirror and method of manufacturing the half mirror
WO2018054140A1 (en) Display device
KR20120097774A (en) Liquid crystal display using phosphor
JP2014182280A (en) Display device
CN210506093U (en) Antireflection film and antireflection glass
KR101543672B1 (en) backlight unit
JP2003279914A (en) Wavelength variable optical element
JP2000068069A (en) Organic electroluminescence device and its manufacture
TWI805221B (en) Optical module and display device
JP4171362B2 (en) Transparent substrate with antireflection film
WO2020143504A1 (en) Reflective inner red dot sight optical system with improved monochromaticity and concealment, two-light three-color optical system, and sight thereof
CN114859554B (en) Multilayer diffraction optical waveguide device
JP6447511B2 (en) Color separation / synthesis prism and optical system using the same
JP2000111702A (en) Antireflection film
CN112649903B (en) Composite film group, preparation method thereof, lighting device and display device
JPWO2021105978A5 (en)
JP2008203493A (en) Image projection device
JP2012237832A (en) Optical device