TWI803847B - Heat treatment apparatus - Google Patents

Heat treatment apparatus Download PDF

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TWI803847B
TWI803847B TW110110980A TW110110980A TWI803847B TW I803847 B TWI803847 B TW I803847B TW 110110980 A TW110110980 A TW 110110980A TW 110110980 A TW110110980 A TW 110110980A TW I803847 B TWI803847 B TW I803847B
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heat treatment
outlet
treatment chamber
inlet
gas supply
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TW110110980A
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TW202136696A (en
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奥村昌倫
中谷淳司
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日商捷太格特熱處理股份有限公司
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22GSUPERHEATING OF STEAM
    • F22G1/00Steam superheating characterised by heating method
    • F22G1/16Steam superheating characterised by heating method by using a separate heat source independent from heat supply of the steam boiler, e.g. by electricity, by auxiliary combustion of fuel oil
    • F22G1/165Steam superheating characterised by heating method by using a separate heat source independent from heat supply of the steam boiler, e.g. by electricity, by auxiliary combustion of fuel oil by electricity
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/02Supplying steam, vapour, gases, or liquids
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B1/00Methods of steam generation characterised by form of heating method
    • F22B1/28Methods of steam generation characterised by form of heating method in boilers heated electrically
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23GCREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G7/00Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
    • F23G7/06Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
    • F23G7/061Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating
    • F23G7/065Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating using gaseous or liquid fuel
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24CDOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
    • F24C1/00Stoves or ranges in which the fuel or energy supply is not restricted to solid fuel or to a type covered by a single one of the following groups F24C3/00 - F24C9/00; Stoves or ranges in which the type of fuel or energy supply is not specified
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/06Forming or maintaining special atmospheres or vacuum within heating chambers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28DHEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D21/00Heat-exchange apparatus not covered by any of the groups F28D1/00 - F28D20/00

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Furnace Details (AREA)
  • Tunnel Furnaces (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)

Abstract

本發明之課題在於提供一種熱處理裝置,其可防止藉由過熱水蒸氣進行被處理物之熱處理的熱處理裝置之結構的複雜化,並且可抑制在進行被處理物之熱處理的熱處理室內發生環境氛圍(atmosphere)之停滯的情形。熱處理裝置1具備有熱處理室11、水蒸氣供給部13、及水蒸氣排出部15。熱處理室11設置有供被處理物10搬入的入口31及供被處理物10搬出的出口32,以進行從入口31朝向出口32被搬送之被處理物10的熱處理。水蒸氣供給部13被設置在熱處理室11中的加熱區域HR,對熱處理室11內供給過熱水蒸氣。水蒸氣排出部15在熱處理室11中,相對於水蒸氣供給部13分別被設置在入口31側及出口32側,將熱處理室11內之過熱水蒸氣朝向熱處理室11的外部排出。The object of the present invention is to provide a heat treatment apparatus that can prevent the complexity of the structure of the heat treatment apparatus for heat-treating the object to be processed by superheated steam, and can suppress the occurrence of an ambient atmosphere ( atmosphere) stagnation situation. The heat treatment apparatus 1 includes a heat treatment chamber 11 , a water vapor supply unit 13 , and a water vapor discharge unit 15 . The heat treatment chamber 11 is provided with an inlet 31 for carrying in the object 10 to be processed and an outlet 32 for carrying out the object 10 to perform heat treatment on the object 10 conveyed from the inlet 31 to the outlet 32 . The steam supply unit 13 is provided in the heating region HR in the heat treatment chamber 11 , and supplies superheated steam into the heat treatment chamber 11 . The steam discharge unit 15 is provided on the inlet 31 side and the outlet 32 side of the steam supply unit 13 in the heat treatment chamber 11 , and discharges the superheated water vapor in the heat treatment chamber 11 to the outside of the heat treatment chamber 11 .

Description

熱處理裝置Heat treatment device

本發明係關於利用過熱水蒸氣加熱被處理物來進行被處理物之熱處理的熱處理裝置。The present invention relates to a heat treatment device for heating an object to be processed by using superheated steam to heat the object to be processed.

過去以來,已知有利用過熱水蒸氣加熱被處理物來進行被處理物之熱處理的熱處理裝置(例如,參照專利文獻1)。專利文獻1所記載的熱處理裝置,具備有作為加熱爐被設置而進行被處理物之熱處理的熱處理室,且用於加熱被處理物的加熱區域被形成於熱處理室內。熱處理室內的加熱區域被劃分為從被處理物之搬送方向的上游側朝向下游側依序地鄰接而被設置的複數個區段(zone)。而且,專利文獻1的熱處理裝置,被構成為被處理物一邊在各區段內依序地被搬送一邊由過熱水蒸氣所加熱,而實施被處理物的熱處理。Conventionally, there is known a heat treatment apparatus that heats an object to be processed with superheated steam to heat the object to be processed (for example, refer to Patent Document 1). The heat treatment apparatus described in Patent Document 1 includes a heat treatment chamber installed as a heating furnace for heat-treating an object to be processed, and a heating region for heating the object to be processed is formed in the heat treatment chamber. The heating area in the heat treatment chamber is divided into a plurality of zones (zones) arranged adjacent to each other sequentially from the upstream side toward the downstream side in the conveying direction of the object to be processed. Furthermore, the heat treatment apparatus of Patent Document 1 is configured such that the to-be-processed object is heated by superheated steam while being sequentially conveyed in each zone, and heat-processes the to-be-processed object.

又,專利文獻1的熱處理裝置,被構成為在熱處理室內之複數個區段之各者被供給作為過熱水蒸氣的水蒸氣。更具體而言,被構成為在熱處理室中各區段的上表面設置有開孔部,從各區段的上表面的開孔部向各區段內供給作為過熱水蒸氣的水蒸氣。又,在專利文獻1的熱處理裝置中,在熱處理室的各區段的下表面設置有排氣孔。藉此,專利文獻1的熱處理裝置,被構成為在熱處理室內的各區段中,從上表面的開孔部被供給而通過各區段內的水蒸氣,從下表面的排氣孔被排出。 [先前技術文獻] [專利文獻]In addition, the heat treatment apparatus of Patent Document 1 is configured such that water vapor as superheated water vapor is supplied to each of a plurality of sections in the heat treatment chamber. More specifically, an opening is provided on the upper surface of each block in the heat treatment chamber, and water vapor as superheated steam is supplied into each block from the opening on the upper face of each block. Also, in the heat treatment apparatus of Patent Document 1, exhaust holes are provided on the lower surfaces of the respective blocks of the heat treatment chamber. Accordingly, in the heat treatment apparatus of Patent Document 1, in each section of the heat treatment chamber, the water vapor supplied from the openings on the upper surface and passing through each section is exhausted from the exhaust holes on the lower surface. . [Prior Art Literature] [Patent Document]

[專利文獻1] 日本專利特開2015-2325號公報[Patent Document 1] Japanese Patent Laid-Open No. 2015-2325

(發明所欲解決之問題)(Problem to be solved by the invention)

專利文獻1所揭示的熱處理裝置,被構成為在熱處理室內沿著被處理物之搬送方向排列的複數個區段之各者中,從上表面的開孔部供給過熱水蒸氣,並將水蒸氣從下表面的排氣孔排出。因此,存在有熱處理裝置會因如下的結構而複雜化的問題:熱處理室內之複數個區段之各者需要用以對熱處理室內供給過熱水蒸氣,並在其後將使用於被處理物之加熱後的水蒸氣朝向外部排出。The heat treatment apparatus disclosed in Patent Document 1 is configured such that superheated steam is supplied from openings on the upper surface to each of a plurality of sections arranged in the heat treatment chamber along the conveying direction of the object to be processed, and the water vapor Exhaust from the vent hole on the lower surface. Therefore, there is a problem that the heat treatment device is complicated by the following structure: each of a plurality of sections in the heat treatment chamber needs to be used to supply superheated steam into the heat treatment chamber, and then use it to heat the object to be processed. The final water vapor is discharged toward the outside.

又,專利文獻1的熱處理裝置如以上所述,在熱處理室內之複數個區段之各者中,從上表面的開孔部供給過熱水蒸氣並將水蒸氣從下表面的排氣孔排出。因此,在熱處理室內的各區段中,水蒸氣從上表面的開孔部朝向下表面的排氣孔流動,而分別在每個區段中不均勻地形成從上方朝向下方流動之水蒸氣的流動。藉此,在熱處理室內,則難以產生沿著與被處理物之搬送方向平行之方向的水蒸氣的流動。所以,沿著與被處理物之搬送方向平行之方向的水蒸氣的流動會產生較大的偏差,而容易產生水蒸氣之流動停滯的區域,其結果,在熱處理室內容易產生環境氛圍停滯的區域。Also, in the heat treatment apparatus of Patent Document 1, as described above, in each of the plurality of sections in the heat treatment chamber, superheated steam is supplied from the openings on the upper surface and the steam is exhausted from the exhaust holes on the lower surface. Therefore, in each section of the heat treatment chamber, water vapor flows from the openings on the upper surface toward the exhaust holes on the lower surface, and the water vapor flowing from above to below is formed unevenly in each section. flow. This makes it difficult to generate a flow of water vapor in a direction parallel to the conveyance direction of the object to be processed in the heat treatment chamber. Therefore, the flow of water vapor along the direction parallel to the conveying direction of the object to be processed will have a large deviation, and a region where the flow of water vapor stagnates is likely to occur, and as a result, a region where the ambient atmosphere is likely to stagnate in the heat treatment chamber .

又其存在有如下的問題:若在熱處理室內容易發生環境氛圍的停滯,在熱處理室內便容易發生過熱水蒸氣之分佈的不均,在相同的熱處理室內實施熱處理之複數個被處理物之間便會容易發生熱處理的不均。又,在當熱處理時一部分成分從被處理物氣化而產生氣體之處理的情形時, 若在熱處理室內發生滯留,從被處理物所產生的氣體便會在發生滯留的區域滯留。而且,其存在有如下的問題:若發生環境氛圍之停滯而當熱處理時從被處理物所產生的氣體滯留,加熱區域內之過熱水蒸氣的純度便會降低,其會導致熱處理效率的降低。又,從被處理物所產生並滯留於環境氛圍之停滯區域的氣體並不會從熱處理室被排出,而會伴隨著熱處理結束時之溫度的降低而液化,從而在熱處理室內的頂壁或牆壁面結露。此外,其存在有如下的問題:當開始新的熱處理時,在熱處理室內的頂壁或牆壁面所結露的成分會滴落至被處理物上,而使被處理物產生髒污。And it has the following problems: if the stagnation of the ambient atmosphere is likely to occur in the heat treatment chamber, the uneven distribution of superheated steam will easily occur in the heat treatment chamber, and there will be a large number of processed objects that are heat treated in the same heat treatment chamber. Uneven heat treatment tends to occur. Also, in the case of heat treatment in which a part of the components are vaporized from the object to generate gas, if stagnation occurs in the heat treatment chamber, the gas generated from the object will stagnate in the stagnant region. Moreover, it has the following problem: if the stagnation of the ambient atmosphere occurs and the gas generated from the object to be processed stays during the heat treatment, the purity of the superheated steam in the heating area will decrease, which will lead to a decrease in heat treatment efficiency. In addition, the gas generated from the object to be processed and retained in the stagnant area of the ambient atmosphere will not be discharged from the heat treatment chamber, but will be liquefied as the temperature drops at the end of the heat treatment, so that the top wall or wall of the heat treatment chamber will be liquefied. Condensation on the face. In addition, there is a problem that when a new heat treatment is started, the components condensed on the ceiling wall or the wall surface of the heat treatment chamber will drip onto the object to be processed, thereby causing the object to be treated to be soiled.

再者,作為當熱處理時一部分的成分從被處理物氣化而產生氣體的處理,例如為燒結處理。在燒結處理中為進行如下的處理:對作為利用含有油脂成分之黏合劑所一體化之被燒結體的被處理物進行加熱,使黏合劑氣化而將其加以去除。當進行該處理時,若氣化之黏合劑滯留在環境氛圍的停滯區域而不被排出,便會伴隨著熱處理結束時之溫度的降低而液化,從而在熱處理室內的頂壁或牆壁面結露。而且,當開始新的熱處理時,在熱處理室內的頂壁或牆壁面所結露的黏合劑的成分會滴落至被處理物上,而使被處理物產生髒污。In addition, as a process in which a part of the components are vaporized from the object to be processed to generate gas during heat treatment, for example, sintering process is used. In the sintering process, the process of heating the to-be-processed object which is the to-be-sintered body integrated with the binder containing fats and oils, and vaporizing and removing a binder is performed. When this treatment is performed, if the vaporized binder stays in the stagnant area of the ambient atmosphere and is not discharged, it will be liquefied as the temperature drops at the end of the heat treatment, and dew will be condensed on the top wall or wall surface of the heat treatment chamber. Moreover, when a new heat treatment is started, the components of the adhesive condensed on the top wall or the wall surface of the heat treatment chamber will drop onto the object to be processed, causing the object to be processed to be soiled.

如上述般,若在熱處理室內容易發生環境氛圍的停滯,在相同的熱處理室內實施熱處理之複數個被處理物之間便會容易發生熱處理的不均,而且,也容易發生如下的問題:伴隨從被處理物中所產生之氣體的滯留之熱處理效率的降低、及被處理物之髒污的產生。因此, 期望可實現抑制熱處理室內之環境氛圍之停滯發生之情形的熱處理裝置。As mentioned above, if the stagnation of the ambient atmosphere is likely to occur in the heat treatment chamber, heat treatment unevenness will easily occur between a plurality of objects to be treated in the same heat treatment chamber, and the following problems will easily occur: The reduction of heat treatment efficiency due to the stagnation of gas generated in the object to be processed, and the generation of contamination of the object to be processed. Therefore, it is desired to realize a heat treatment apparatus capable of suppressing stagnation of the ambient atmosphere in the heat treatment chamber.

本發明鑒於上述實情,其目的在於提供一種熱處理裝置,其可防止藉由過熱水蒸氣來進行被處理物之熱處理的熱處理裝置之結構的複雜化,並且可抑制環境氛圍之停滯在進行被處理物之熱處理的熱處理室內發生的情形。 (解決問題之技術手段)In view of the above circumstances, the present invention aims to provide a heat treatment apparatus that can prevent the complexity of the structure of the heat treatment apparatus for heat-treating the object to be processed by superheated steam, and can suppress the stagnation of the ambient atmosphere while the object is being processed. What happens in the heat treatment chamber of the heat treatment. (technical means to solve the problem)

(1) 為了解決上述課題,本發明一態樣之熱處理裝置係關於利用過熱水蒸氣對被處理物進行加熱來實施該被處理物之熱處理者。而且,本發明一態樣之熱處理裝置具備有:熱處理室,其設置有供上述被處理物搬入的入口及供上述被處理物搬出的出口,對從上述入口朝向上述出口被搬送之上述被處理物實施熱處理;水蒸氣供給部,其被設置於上述熱處理室中作為實施上述被處理物之加熱之區域的加熱區域,其對上述熱處理室內供給過熱水蒸氣;以及水蒸氣排出部,其在上述熱處理室中,相對於上述水蒸氣供給部分別被設置於上述入口側及上述出口側,將上述熱處理室內的過熱水蒸氣朝向上述熱處理室的外部排出。(1) In order to solve the above-mentioned problems, a heat treatment apparatus according to an aspect of the present invention relates to heating an object to be processed with superheated steam to perform heat treatment on the object to be processed. Furthermore, a heat treatment apparatus according to an aspect of the present invention includes: a heat treatment chamber provided with an inlet for carrying in the object to be processed and an outlet for carrying out the object to be processed, and for the object to be processed that is conveyed from the inlet toward the outlet The object is heat-treated; the water vapor supply unit is installed in the heating area in the heat treatment chamber as the area where the object to be processed is heated, and supplies superheated steam to the heat treatment chamber; and the water vapor discharge unit is located in the above-mentioned heat treatment chamber. In the heat treatment chamber, the water vapor supply unit is provided on the inlet side and the outlet side respectively, and the superheated water vapor in the heat treatment chamber is discharged to the outside of the heat treatment chamber.

根據該構成,被處理物藉由從被設置於熱處理室之加熱區域之水蒸氣供給部而被供給至熱處理室內的過熱水蒸氣所加熱,來實施被處理物的熱處理。而且,被使用於被處理物之加熱的過熱水蒸氣,從被設置於加熱區域的水蒸氣供給部朝向分別被設置於熱處理室的入口側及出口側的水蒸氣排出部流動,而從水蒸氣排出部朝向熱處理室的外部被排出。因此,在熱處理室中,形成有從加熱區域內的水蒸氣供給部朝向入口側流動而從水蒸氣排出部朝向外部被排出之水蒸氣的流動、及從加熱區域內之水蒸氣供給部朝向出口側流動而從水蒸氣排出部朝向外部被排出之水蒸氣的流動。而且,在熱處理室內,從加熱區域內之水蒸氣供給部朝向入口側及出口側之各者,沿著與被處理物之搬送方向平行之方向形成有流速之偏差較少之更為相同之水蒸氣的流動。藉此,在熱處理室內,難以產生水蒸氣之流動停滯的區域, 其結果,在熱處理室內難以產生環境氛圍停滯的區域。According to this configuration, the object to be processed is heated by the superheated steam supplied into the heat treatment chamber from the steam supply unit provided in the heating region of the heat treatment chamber, so that the object to be processed is heat-treated. In addition, the superheated steam used for heating the object flows from the steam supply part provided in the heating area toward the steam discharge parts respectively provided on the inlet side and the outlet side of the heat treatment chamber, and the steam The discharge portion is discharged toward the outside of the heat treatment chamber. Therefore, in the heat treatment chamber, the flow of water vapor that flows from the water vapor supply part in the heating area toward the inlet side and is discharged from the water vapor discharge part toward the outside, and the water vapor flow from the water vapor supply part in the heating area toward the outlet is formed. The flow of water vapor discharged from the water vapor discharge part to the outside by side flow. Moreover, in the heat treatment chamber, from the water vapor supply part in the heating area toward each of the inlet side and the outlet side, more uniform water with less variation in flow velocity is formed along the direction parallel to the conveyance direction of the object to be processed. The flow of steam. This makes it difficult to generate a region where the flow of water vapor stagnates in the heat treatment chamber, and as a result, hardly generates a region where the ambient atmosphere stagnates in the heat treatment chamber.

因此,根據上述構成,可抑制在實施被處理物之熱處理的熱處理室內發生環境氛圍之停滯的情形。又,根據上述構成,由於可抑制在熱處理室內發生環境氛圍之停滯的情形,因此可抑制在相同的熱處理室內實施熱處理之複數個被處理物之間發生熱處理之不均的情形,而且,也可抑制伴隨從被處理物中所產生之氣體的滯留之熱處理效率之降低及被處理物之髒污的發生。Therefore, according to the above configuration, it is possible to suppress stagnation of the ambient atmosphere in the heat treatment chamber in which the heat treatment of the object to be processed is performed. Also, according to the above configuration, since stagnation of the ambient atmosphere in the heat treatment chamber can be suppressed, it is possible to suppress unevenness in heat treatment among a plurality of objects to be treated that are heat treated in the same heat treatment chamber, and it is also possible to Suppresses the reduction of heat treatment efficiency and the occurrence of contamination of the processed object due to the stagnation of the gas generated from the processed object.

又,根據上述構成,藉由水蒸氣供給部被設置於熱處理室的加熱區域,水蒸氣排出部被設置於熱處理室的入口側及出口側之簡單的構成,可實現抑制熱處理室內之環境氛圍之停滯的發生的熱處理裝置。因此,可防止藉由過熱水蒸氣進行被處理物之熱處理的熱處理裝置之結構的複雜化。In addition, according to the above-mentioned configuration, the simple structure in which the water vapor supply part is provided in the heating area of the heat treatment chamber and the water vapor discharge part is provided on the inlet side and the outlet side of the heat treatment chamber can realize the suppression of the environmental atmosphere in the heat treatment chamber. Stagnation occurred in the heat treatment unit. Therefore, it is possible to prevent the complexity of the structure of the heat treatment apparatus for heat-treating the object to be treated with superheated steam.

如上述般,根據上述構成,可提供一種熱處理裝置,其可防止藉由過熱水蒸氣對被處理物實施熱處理之熱處理裝置之結構的複雜化,並且可抑制在對被處理物實施熱處理之熱處理室內發生環境氛圍之停滯的情形。As described above, according to the above configuration, it is possible to provide a heat treatment apparatus that can prevent the complexity of the structure of the heat treatment apparatus for heat-treating the object to be processed by superheated steam, and can suppress the heat treatment inside the heat treatment chamber for heat-treating the object to be processed. A stagnation of the environment occurs.

(2) 其存在有下述之情形:進一步具備有對上述熱處理室內供給惰性氣體及空氣中之至少任一者的氣體供給部,上述入口相對於上述熱處理室的外部被開放,在上述熱處理裝置中具有入口側氣體供給部作為上述氣體供給部,該入口側氣體供給部設於較相對於上述熱處理室中之上述水蒸氣供給部而被設在上述入口側之上述水蒸氣排出部更靠上述入口側。(2) There is a case where a gas supply unit for supplying at least one of an inert gas and air is further provided to the heat treatment chamber, the inlet is opened to the outside of the heat treatment chamber, and the heat treatment apparatus As the gas supply unit, there is an inlet-side gas supply unit, which is located closer to the above-mentioned water vapor discharge unit than the water vapor discharge unit provided on the inlet side with respect to the water vapor supply unit in the heat treatment chamber. entrance side.

根據該構成,由於熱處理室的入口相對於外部被開放,因此可連續地迅速地且容易地進行被處理物朝向熱處理室內的搬入作業。藉此,可將熱處理程式加以連續化而謀求熱處理之作業效率的提升。而且,根據上述構成,除了入口被開放之外,也設置有,相對於水蒸氣供給部被設置有,在較被設置於入口側之水蒸氣排出部更靠入口側而對熱處理室內供給惰性氣體及空氣中之至少任一氣體的入口側氣體供給部。因此,藉由從入口側氣體供給部供給之氣體,可在對外部被開放的入口與水蒸氣排出部之間分離熱處理室內的環境氛圍。亦即,可將從水蒸氣供給部至入口側氣體供給部為止之區域的環境氛圍、與從對外部被開放的入口至入口側氣體供給部為止之區域的環境氛圍加以分離。藉此,在為了熱處理之作業效率之提升而入口被開放的熱處理裝置中,可將從水蒸氣供給部至水蒸氣排出部為止之區域的環境氛圍相對於外部加以遮斷,而可效率佳地進行加熱區域中之利用過熱水蒸氣之被處理物的熱處理。According to this configuration, since the entrance of the heat treatment chamber is opened to the outside, it is possible to continuously, quickly and easily carry in an object to be processed into the heat treatment chamber. In this way, the heat treatment program can be continued to improve the operational efficiency of heat treatment. Furthermore, according to the above configuration, in addition to the opening of the inlet, it is also provided that an inert gas is supplied to the heat treatment chamber on the inlet side of the water vapor discharge part provided on the inlet side with respect to the water vapor supply part. and an inlet-side gas supply unit for at least any gas in the air. Therefore, with the gas supplied from the inlet-side gas supply unit, the ambient atmosphere in the heat treatment chamber can be separated between the inlet opened to the outside and the water vapor discharge unit. That is, the ambient atmosphere of the region from the water vapor supply unit to the inlet-side gas supply unit and the ambient atmosphere of the region from the inlet opened to the outside to the inlet-side gas supply unit can be separated. Thereby, in the heat treatment apparatus whose inlet is opened to improve the working efficiency of heat treatment, the ambient atmosphere in the area from the water vapor supply part to the water vapor discharge part can be blocked from the outside, and efficient Heat treatment of the object to be treated using superheated steam in the heating zone.

(3) 其存在有下述之情形:上述入口側氣體供給部被設置為一對,於上述熱處理室中,在一對上述入口側氣體供給部之間,設置有將上述熱處理室內之氣體朝向上述熱處理室之外部排出的入口側排氣部。(3) There is a case where the inlet-side gas supply unit is provided as a pair, and in the heat treatment chamber, between the pair of the inlet-side gas supply units, there is a device that directs the gas in the heat treatment chamber toward the direction of the gas in the heat treatment chamber. An inlet-side exhaust unit for exhausting outside the heat treatment chamber.

根據該構成,入口側氣體供給部被設置為一對且在該等之間設置有入口側排氣部。因此,從水蒸氣排出部朝向入口側,依照水蒸氣排出部、一對入口側氣體供給部之一者、入口側排氣部、及一對入口側氣體供給部之另一者的順序,該等被配置。根據該構成, 未被水蒸氣排出部完全排出而以洩漏的方式朝向入口側流動之些微的水蒸氣,則與從一對入口側氣體供給部之一者被供給的氣體混合而被稀釋。而且,與從一對入口側氣體供給部之一者被供給的氣體混合而被稀釋的水蒸氣,則從入口側排氣部朝向外部被排出。因此,從水蒸氣排出部以洩漏的方式朝向入口側流動之些微的水蒸氣,也從入口側排氣部被排出。其結果, 可防止水蒸氣流入入口側排氣部與入口之間的區域即溫度較低的區域之情形。藉此,可防止水蒸氣流入入口側排氣部與入口之間之溫度較低的區域而發生結露之情形。藉由防止結露的發生,可防止水分滴落至從入口被搬入的被處理物上而弄濕被處理物之情形,從而對被處理物的熱處理狀態產生影響之情形。又,根據上述構成,藉由從一對入口側氣體供給部之另一者所供給的氣體、即藉由從被配置於入口側排氣部與入口之間之入口側氣體供給部所供給的氣體, 可更確實地將從水蒸氣供給部至入口側氣體供給部為止之區域的環境氛圍、與從入口至入口側氣體供給部為止之區域的環境氛圍分離並加以遮斷。According to this configuration, the inlet-side gas supply unit is provided as a pair, and the inlet-side exhaust unit is provided between them. Therefore, from the water vapor discharge part toward the inlet side, the water vapor discharge part, one of the pair of inlet side gas supply parts, the inlet side exhaust part, and the other of the pair of inlet side gas supply parts are ordered. and so on are configured. According to this configuration, the slight water vapor that leaks toward the inlet without being completely discharged by the water vapor discharge unit is mixed with the gas supplied from one of the pair of inlet side gas supply units to be diluted. Then, the water vapor diluted by mixing with the gas supplied from one of the pair of inlet-side gas supply parts is discharged from the inlet-side exhaust part toward the outside. Therefore, the slight amount of water vapor that leaks toward the inlet side from the water vapor discharge portion is also discharged from the inlet side exhaust portion. As a result, water vapor can be prevented from flowing into a region between the inlet side exhaust portion and the inlet, that is, a region with a relatively low temperature. Thereby, it is possible to prevent water vapor from flowing into a region with a lower temperature between the inlet side exhaust part and the inlet to cause dew condensation. By preventing the occurrence of condensation, it is possible to prevent moisture from dripping onto the object to be processed from the inlet and wet the object to be processed, thereby affecting the heat treatment state of the object to be processed. Moreover, according to the above configuration, the gas supplied from the other of the pair of inlet-side gas supply parts, that is, the gas supplied from the inlet-side gas supply part arranged between the inlet-side exhaust part and the inlet The gas can more reliably separate and block the ambient atmosphere of the area from the water vapor supply unit to the inlet-side gas supply unit, and the area from the inlet to the inlet-side gas supply unit.

(4) 其存在有下述之情形:進一步具備有對上述熱處理室內供給惰性氣體及空氣中之至少任一者的氣體供給部,上述出口相對於上述熱處理室的外部被開放,在上述熱處理裝置中具有出口側氣體供給部作為上述氣體供給部,該出口側氣體供給部設於較相對於上述熱處理室中之上述水蒸氣供給部而被設在上述出口側之上述水蒸氣排出部更靠上述出口側。(4) There is a case where a gas supply unit for supplying at least one of an inert gas and air is further provided to the heat treatment chamber, the outlet is opened to the outside of the heat treatment chamber, and the heat treatment apparatus As the gas supply unit, there is an outlet-side gas supply unit, which is located closer to the above-mentioned water vapor discharge unit than the water vapor discharge unit provided on the outlet side with respect to the water vapor supply unit in the heat treatment chamber. exit side.

根據該構成,由於熱處理室的出口相對於外部被開放,因此可連續地迅速地且容易地進行被處理物從熱處理室的搬出作業。藉此,可將熱處理程式加以連續化而謀求熱處理之作業效率的提升。而且,根據上述構成,除了出口被開放之外,也設置有相對於水蒸氣供給部被設置在較被設置於出口側之水蒸氣排出部更靠出口側而對熱處理室內供給惰性氣體及空氣中之至少任一氣體的出口側氣體供給部。因此,藉由從出口側氣體供給部供給的氣體,可在朝外部被開放的出口與水蒸氣排出部之間將熱處理室內的環境氛圍加以分離。亦即,可將從水蒸氣供給部至出口側氣體供給部為止之區域的環境氛圍、與從朝外部被開放的出口至出口側氣體供給部為止之區域的環境氛圍加以分離。藉此,在為了熱處理之作業效率的提升而出口被開放的熱處理裝置中,可將從水蒸氣供給部至水蒸氣排出部為止之區域的環境氛圍相對於外部加以遮斷,而可有效率地實施加熱區域中之利用過熱水蒸氣之被處理物的熱處理。According to this configuration, since the outlet of the heat treatment chamber is opened to the outside, it is possible to continuously, quickly and easily carry out the work of carrying out the to-be-processed object from the heat treatment chamber. In this way, the heat treatment program can be continued to improve the operational efficiency of heat treatment. Furthermore, according to the above configuration, in addition to the opening of the outlet, there is also a device for supplying inert gas and air into the heat treatment chamber with respect to the water vapor supply part which is arranged on the outlet side of the water vapor discharge part provided on the outlet side. An outlet-side gas supply unit for at least any one of the gases. Therefore, the atmosphere in the heat treatment chamber can be separated between the outlet opened to the outside and the water vapor discharge unit by the gas supplied from the outlet-side gas supply unit. That is, the ambient atmosphere of the region from the water vapor supply unit to the outlet-side gas supply unit and the ambient atmosphere of the region from the outlet opened to the outside to the outlet-side gas supply unit can be separated. Thereby, in the heat treatment apparatus whose outlet is opened to improve the working efficiency of heat treatment, the ambient atmosphere in the area from the water vapor supply part to the water vapor discharge part can be blocked from the outside, and efficient Carry out heat treatment of the object to be treated using superheated steam in the heating zone.

(5) 上述出口側氣體供給部被設置為一對,於上述熱處理室中,在一對上述出口側氣體供給部之間設置有將上述熱處理室內之氣體朝向上述熱處理室之外部排出的出口側排氣部。(5) The outlet-side gas supply unit is provided as a pair, and in the heat treatment chamber, an outlet side for discharging the gas in the heat treatment chamber toward the outside of the heat treatment chamber is provided between the pair of the outlet-side gas supply units. Exhaust.

根據該構成,出口側氣體供給部被設置為一對且在該等之間設置有出口側排氣部。因此,從水蒸氣排出部朝向出口側,依照水蒸氣排出部、一對出口側氣體供給部之一者、出口側排氣部、及一對出口側氣體供給部之另一者的順序,該等被配置。根據該構成,未被水蒸氣排出部完全排出而以洩漏的方式朝向出口側流動之些微的水蒸氣,則與從一對出口側氣體供給部之一者被供給的氣體混合而被稀釋。而且,與從一對出口側氣體供給部之一者被供給的氣體混合而被稀釋的水蒸氣,則從出口側排氣部朝向外部被排出。因此,從水蒸氣排出部以洩漏的方式朝向出口側流動之些微的水蒸氣,也從出口側排氣部被排出。其結果, 可防止水蒸氣流入出口側排氣部與出口之間的區域即溫度較低的區域之情形。藉此,可防止水蒸氣流入出口側排氣部與出口之間之溫度較低的區域而發生結露之情形。藉由防止結露的發生,可防止當被處理物從出口被搬出時水分滴在被處理物上而弄濕被處理物之情形。又, 根據上述構成,藉由從一對出口側氣體供給部之另一者所供給的氣體、即藉由從被配置於出口側排氣部與出口之間之出口側氣體供給部所供給的氣體,可更確實地將從水蒸氣供給部至出口側氣體供給部為止之區域的環境氛圍、與從出口至出口側氣體供給部為止之區域的環境氛圍分離並加以遮斷。According to this configuration, the outlet-side gas supply unit is provided as a pair, and the outlet-side exhaust unit is provided between them. Therefore, from the water vapor discharge part toward the outlet side, the water vapor discharge part, one of the pair of outlet side gas supply parts, the outlet side exhaust part, and the other of the pair of outlet side gas supply parts are ordered. and so on are configured. According to this configuration, the slight water vapor leaking toward the outlet side without being completely discharged by the water vapor discharge unit is mixed with the gas supplied from one of the pair of outlet side gas supply units to be diluted. Then, the water vapor diluted by mixing with the gas supplied from one of the pair of outlet-side gas supply parts is discharged from the outlet-side exhaust part toward the outside. Therefore, the slight amount of water vapor that leaks toward the outlet side from the water vapor discharge portion is also discharged from the outlet side exhaust portion. As a result, water vapor can be prevented from flowing into the region between the outlet-side exhaust portion and the outlet, that is, a region with a relatively low temperature. This prevents water vapor from flowing into the lower-temperature region between the exhaust portion on the outlet side and the outlet to cause dew condensation. By preventing the occurrence of dew condensation, it is possible to prevent the water from dripping on the processed object and wetting the processed object when the processed object is carried out from the outlet. Also, according to the above configuration, the gas supplied from the other of the pair of outlet-side gas supply parts, that is, the gas supplied from the outlet-side gas supply part arranged between the outlet-side exhaust part and the outlet The gas can more reliably separate and block the ambient atmosphere of the area from the water vapor supply unit to the outlet side gas supply unit, and the area from the outlet to the outlet side gas supply unit.

(6) 上述水蒸氣供給部具備有在上述被處理物的搬送方向上相互地對向而被配置的一對噴嘴部,一對上述噴嘴部之各者被構成為朝向相對向之一對上述噴嘴部的中間位置側吹出過熱水蒸氣。(6) The steam supply part is provided with a pair of nozzle parts arranged to face each other in the conveying direction of the object to be processed, and each of the pair of nozzle parts is configured to face one of the opposing pairs of the nozzle parts. Superheated steam is blown from the middle position side of the nozzle part.

根據該構成,從水蒸氣供給部之一對噴嘴部分別被吹出的過熱水蒸氣,朝向相對向之一對噴嘴部的中間位置側流動。於相對向之一對噴嘴部之間的區域,存在設置有被構成為局部地限制在與被處理物之搬送方向平行之方向上之氣體之流動的隔板之情形、及未設置有該隔板之情形。在設置有隔板的情形時,從各噴嘴部被吹出而朝向一對噴嘴部之中間位置側流動的各過熱水蒸氣與隔板碰撞,從而在加熱區域內一邊涵蓋與被處理物之搬送方向垂直之截面的整體擴散一邊以在與被處理物之搬送方向平行的方向上翻轉而折回的方式流動。又,在未設置有隔板的情形時,從各噴嘴部吹出而朝向一對噴嘴部之中間位置側流動的各過熱水蒸氣則相互地碰撞,從而在加熱區域內一邊涵蓋與被處理物之搬送方向垂直之截面的整體擴散一邊以在與被處理物之搬送方向平行的方向上翻轉而折回的方式流動。因此,無論在設置有隔板之情形與未設置有隔板之情形之任一者時,從各噴嘴部被吹出的過熱水蒸氣皆在朝向一對噴嘴部之中間位置側流動並翻轉後,以在加熱區域內涵蓋與被處理物之搬送方向垂直之截面的整體擴散的狀態,朝向與一對噴嘴部之中間位置側之相反方向而沿著與被處理物之搬送方向平行的方向流動。亦即,從一對噴嘴部分別被吹出的過熱水蒸氣,其流動在一對噴嘴部之中間位置側翻轉後,以擴散至加熱區域之截面之整體的狀態,沿著與被處理物之搬送方向平行的方向並沿著相互地遠離的方向流動。因此,從一對噴嘴部之一者所吹出的過熱水蒸氣,從一對噴嘴部之中間位置側朝向熱處理室的入口側並以擴散至加熱區域之截面之整體的狀態流動。而且,從一對噴嘴部之另一者所吹出的過熱水蒸氣,則以從一對噴嘴部之中間位置側朝向熱處理室之出口側擴散至加熱區域之截面之整體的狀態流動。藉此,於熱處理室內,其以如下之狀態形成流速之偏差更少之更相同之水蒸氣的流動:從一對噴嘴部之中間位置側分別朝向入口側及出口側,而沿著與被處理物之搬送方向平行的方向擴散至加熱區域之截面的整體。藉此,於熱處理室內,則更難以產生水蒸氣之流動停滯的區域,其結果,於熱處理室內則更難以產生環境氛圍停滯的區域。因此,根據上述構成,可進一步抑制於熱處理室內發生環境氛圍之停滯的情形。According to this configuration, the superheated steam blown out from the pair of nozzle parts of the steam supply part flows toward the intermediate position side of the pair of nozzle parts facing each other. In the region between a pair of facing nozzle parts, there are cases where a partition configured to locally restrict the flow of gas in a direction parallel to the conveying direction of the object is provided, and the partition is not provided. The situation of the board. When a partition is installed, each superheated steam blown out from each nozzle part and flowing toward the middle position side of a pair of nozzle parts collides with the partition, thereby covering the conveyance direction of the object to be processed within the heating area. The overall diffusion of the vertical cross-section flows in such a way that it reverses and turns in a direction parallel to the conveying direction of the object to be processed. In addition, when no partition is provided, the superheated steam blown from each nozzle and flowing towards the middle position side of the pair of nozzles collides with each other, thereby covering the distance between the object and the object in the heating area. The entire cross-section perpendicular to the conveying direction flows so as to invert and return in a direction parallel to the conveying direction of the object to be processed. Therefore, regardless of whether a partition is provided or a partition is not provided, the superheated steam blown from each nozzle part flows toward the middle position side of a pair of nozzle parts and turns over. In the heated area, it flows in a direction parallel to the conveying direction of the processed object in the direction opposite to the middle position side of the pair of nozzle parts in the state of spreading across the entire cross section perpendicular to the conveying direction of the processed object. That is to say, the superheated steam blown out from the pair of nozzles is reversed at the middle position of the pair of nozzles, and diffused to the entire cross-section of the heating area, along the conveyance of the object to be processed. directions parallel to each other and flow in directions away from each other. Therefore, the superheated steam blown from one of the pair of nozzles flows from the middle position side of the pair of nozzles toward the inlet side of the heat treatment chamber and spreads over the entire cross section of the heating region. And, the superheated steam blown from the other of the pair of nozzles flows in a state of spreading from the middle position side of the pair of nozzles toward the outlet side of the heat treatment chamber to the entire cross section of the heating region. Thereby, in the heat treatment chamber, the flow of more uniform water vapor with less variation in flow velocity is formed in the following state: from the middle position side of a pair of nozzle parts toward the inlet side and the outlet side respectively, and along the The direction parallel to the conveying direction of the object spreads to the entire cross-section of the heating area. This makes it more difficult to generate a region where the flow of water vapor stagnates in the heat treatment chamber, and as a result, it becomes more difficult to generate a region where the ambient atmosphere stagnates in the heat treatment chamber. Therefore, according to the above configuration, stagnation of the ambient atmosphere in the heat treatment chamber can be further suppressed.

(7) 在一對上述入口側氣體供給部之各者與上述入口側排氣部之間分別設置有入口側隔板,上述入口側隔板被構成為局部地限制上述熱處理室中之與上述被處理物之搬送方向平行之方向上的氣體的流動。(7) An inlet-side partition is provided between each of the pair of inlet-side gas supply parts and the inlet-side exhaust part, and the inlet-side partition is configured to partially limit the connection between the heat treatment chamber and the gas outlet. The flow of gas in a direction parallel to the conveying direction of the object to be processed.

根據該構成,在一對入口側氣體供給部之各者與入口側排氣部之間,設置有局部地限制與被處理物之搬送方向平行之方向上的氣體之流動的入口側隔板。因此,在夾著入口側排氣部而被配置的一對入口側氣體供給部之間,可一邊維持環境氛圍以氣體可流動之方式連通的狀態,一邊形成更容易將環境氛圍加以分離的狀態。藉此,可更有效率地將從水蒸氣供給部至入口側氣體供給部為止之區域的環境氛圍、與從入口至入口側氣體供給部為止之區域的環境氛圍分離並加以遮斷。According to this configuration, an inlet-side partition plate that partially restricts the flow of gas in a direction parallel to the conveyance direction of the object is provided between each of the pair of inlet-side gas supply units and the inlet-side exhaust unit. Therefore, between the pair of inlet-side gas supply units arranged across the inlet-side exhaust unit, the ambient atmosphere can be separated more easily while maintaining a state in which the ambient atmosphere communicates so that the gas can flow. . Thereby, the ambient atmosphere of the region from the water vapor supply part to the inlet side gas supply part and the ambient atmosphere of the region from the inlet to the inlet side gas supply part can be separated and blocked more efficiently.

(8) 在一對上述出口側氣體供給部之各者與上述出口側排氣部之間分別設置有出口側隔板,上述出口側隔板被構成為局部地限制上述熱處理室中之與上述被處理物之搬送方向平行之方向上的氣體的流動。(8) Between each of the pair of outlet-side gas supply units and the outlet-side exhaust unit, an outlet-side partition is respectively provided, and the outlet-side partition is configured to locally restrict the connection between the heat treatment chamber and the outlet-side exhaust unit. The flow of gas in a direction parallel to the conveying direction of the object to be processed.

根據該構成,在一對出口側氣體供給部之各者與出口側排氣部之間,設置有局部地限制與被處理物之搬送方向平行之方向上的氣體之流動的出口側隔板。因此,在夾著出口側排氣部而被配置的一對出口側氣體供給部之間,可一邊維持環境氛圍以氣體可流動之方式連通的狀態,一邊形成更容易將環境氛圍加以分離的狀態。藉此,可更有效率地將從水蒸氣供給部至出口側氣體供給部為止之區域的環境氛圍、與從出口至出口側氣體供給部為止之區域的環境氛圍分離並加以遮斷。 (對照先前技術之功效)According to this configuration, between each of the pair of outlet-side gas supply units and the outlet-side exhaust unit, an outlet-side partition plate that locally restricts the flow of gas in a direction parallel to the conveyance direction of the object to be processed is provided. Therefore, between the pair of outlet-side gas supply units arranged across the outlet-side exhaust unit, the ambient atmosphere can be separated more easily while maintaining a state in which the ambient atmosphere communicates with the gas flow. . Thereby, the ambient atmosphere of the region from the steam supply unit to the outlet-side gas supply unit and the ambient atmosphere of the region from the outlet to the outlet-side gas supply unit can be separated and blocked more efficiently. (compared to the effect of previous technology)

根據本發明,可防止藉由過熱水蒸氣進行被處理物之熱處理的熱處理裝置之結構的複雜化,並且可抑制在進行被處理物之熱處理的熱處理室內發生環境氛圍之停滯的情形。According to the present invention, it is possible to prevent the complexity of the structure of the heat treatment apparatus for heat-treating the object to be processed by superheated steam, and to suppress stagnation of the ambient atmosphere in the heat-treatment chamber for heat-treating the object to be processed.

以下,一邊參照圖式一邊對用以實施本發明之形態進行說明。Hereinafter, an embodiment for implementing the present invention will be described with reference to the drawings.

[熱處理裝置的概略] 圖1係示意性地表示本發明之實施形態之熱處理裝置1之一例的圖。圖2係示意地表示關於熱處理裝置1之水蒸氣供給部13、水蒸氣供給系統14、水蒸氣排出部15、水蒸氣排出系統(16a、16b)、氣體供給部17、及氣體供給系統18等的圖。圖3係將熱處理裝置1之一部分放大而加以表示的圖,圖3(A)係將熱處理裝置1之熱處理室11之入口31及其附近放大而加以表示的圖,而圖3(B)係將熱處理裝置1之熱處理室1之出口32及其附近放大而加以表示的圖。[Outline of heat treatment equipment] FIG. 1 is a diagram schematically showing an example of a heat treatment apparatus 1 according to an embodiment of the present invention. 2 schematically shows the water vapor supply unit 13, the water vapor supply system 14, the water vapor discharge unit 15, the water vapor discharge system (16a, 16b), the gas supply unit 17, and the gas supply system 18 of the heat treatment apparatus 1. diagram. Fig. 3 is the figure that a part of heat treatment device 1 is enlarged and shown, and Fig. 3 (A) is that the entrance 31 of the heat treatment chamber 11 of heat treatment device 1 and its vicinity are enlarged and shown, and Fig. 3 (B) is It is an enlarged view showing the outlet 32 of the heat treatment chamber 1 of the heat treatment apparatus 1 and its vicinity.

參照圖1至圖3,熱處理裝置1係構成為利用過熱水蒸氣來加熱金屬製之被處理物10而進行被處理物10之熱處理的裝置。再者,過熱水蒸氣係被加熱至比沸點高之溫度的水蒸氣,為比沸點高之溫度之乾燥的水蒸氣。熱處理裝置1具備設置有供被處理物10搬入之入口31及供被處理物10搬出之出口32的熱處理室11。而且,在熱處理裝置1中,於熱處理室11內,被處理物10一邊從入口31朝向出口32被搬送一邊利用過熱水蒸氣被加熱,而進行被處理物10的熱處理。作為在熱處理裝置1中使用過熱水蒸氣所進行之對被處理物10的熱處理,例如可例示脫脂處理、及燒結處理。Referring to FIGS. 1 to 3 , the heat treatment apparatus 1 is configured as a device for heating a metal object 10 to be processed by using superheated steam to perform heat treatment on the object 10 to be processed. In addition, superheated steam is water vapor heated to a temperature higher than the boiling point, and is dry water vapor at a temperature higher than the boiling point. The heat treatment apparatus 1 includes a heat treatment chamber 11 provided with an inlet 31 through which an object to be processed 10 is carried in and an outlet 32 through which the object to be processed 10 is carried out. In the heat treatment apparatus 1 , the object 10 is heated by superheated steam while being transported from the inlet 31 toward the outlet 32 in the heat treatment chamber 11 , and the object 10 is heat-treated. Examples of the heat treatment of the object 10 to be processed using superheated steam in the heat treatment apparatus 1 include degreasing treatment and sintering treatment.

於熱處理裝置1進行脫脂處理的情形時,在利用熱處理裝置1之處理前的處理步驟中被施以機械加工等的被處理物10,會被搬入熱處理裝置1。而且,於熱處理裝置1中,附著於被處理物10的油脂會由過熱水蒸氣所加熱而被氣化,從而從被處理物10上被去除。又,於熱處理裝置1中進行燒結處理之情形時,被構成為由含有油脂成分之黏合劑所結合之被燒結材料的被處理物10,會被搬入熱處理裝置1。而且,於熱處理裝置1中,被處理物10會由過熱水蒸氣所加熱,黏合劑便會被氣化而被去除,接著,藉由進一步由過熱水蒸氣所加熱,經去除黏合劑的被處理物10便會被燒結。When the heat treatment apparatus 1 performs the degreasing treatment, the object 10 to be treated 10 subjected to machining or the like in a processing step before the treatment by the heat treatment apparatus 1 is carried into the heat treatment apparatus 1 . In addition, in the heat treatment apparatus 1 , fats and oils adhering to the object 10 are heated by superheated steam to be vaporized and removed from the object 10 . Also, when the sintering process is performed in the heat treatment apparatus 1 , the object 10 to be sintered, which is composed of a material to be sintered and bonded with a binder containing oil and fat, is carried into the heat treatment apparatus 1 . Moreover, in the heat treatment apparatus 1, the object 10 to be processed is heated by superheated steam, and the binder is vaporized and removed, and then, by further heating with superheated steam, the treated object 10 is treated to remove the binder. The object 10 will be sintered.

於熱處理裝置1中,被處理物10會被搬入熱處理室11,而在熱處理室11內一邊被搬送一邊由過熱水蒸氣所加熱。藉此,進行對被處理物10之熱處理。然後,熱處理室11內之熱處理結束後的被處理物10會從熱處理室11被搬出。又,被處理物10連續地朝向熱處理室11被搬送,在熱處理室11內一邊被連續地搬送一邊被施以熱處理,並從熱處理室11連續地被搬出。In the heat treatment apparatus 1 , the object 10 to be processed is carried into the heat treatment chamber 11 , and is heated by superheated steam while being conveyed in the heat treatment chamber 11 . Thereby, the heat treatment of the object 10 to be processed is performed. Then, the processed object 10 after the heat treatment in the heat treatment chamber 11 is carried out from the heat treatment chamber 11 . Furthermore, the object 10 to be processed is continuously conveyed toward the heat treatment chamber 11 , is subjected to heat treatment while being continuously conveyed in the heat treatment chamber 11 , and is continuously carried out from the heat treatment chamber 11 .

會由熱處理裝置11所處理的被處理物10,例如被設為金屬製的構件,並被設為外形呈大致環狀或大致圓筒狀的構件。作為外形呈大致環狀或大致圓筒狀的被處理物10,例如可例示電動馬達的鐵芯(core)、滾動軸承之外圈及內圈等的座圈(race)構件、正齒輪等的齒輪、滾動軸承的滾子、軸桿、墊圈等。再者,被處理物10既可不被構成為大致環狀或大致圓筒狀的構件,亦可作為被形成為大致環狀或大致圓筒狀以外之形狀的構件而被構成。例如,亦可為圓柱狀、角柱狀、方筒狀、長方體狀、立方體狀、棒狀、板狀、及具有特殊之截面形狀或表面形狀之形狀等的各種形狀。The object to be processed 10 to be processed by the heat treatment apparatus 11 is, for example, a metal member, and is a substantially ring-shaped or substantially cylindrical member. Examples of the processed object 10 having a substantially annular or substantially cylindrical shape include a core of an electric motor, a race member such as an outer ring and an inner ring of a rolling bearing, and a gear such as a spur gear. , rolling bearing rollers, shafts, washers, etc. In addition, the object 10 to be processed may not be configured as a substantially annular or substantially cylindrical member, but may be configured as a member formed in a shape other than the substantially annular or substantially cylindrical shape. For example, various shapes such as a columnar shape, a prism shape, a square cylinder shape, a cuboid shape, a cube shape, a rod shape, a plate shape, and a shape having a special cross-sectional shape or surface shape may be used.

在熱處理裝置1之熱處理室11的入口31及其附近的放大圖即圖3(A)中,表示被處理物10被搬入熱處理室11的狀態。又,在熱處理裝置1之熱處理室11的出口32及其附近的放大圖即圖3(B)中,表示被處理物10在熱處理室11內被搬送且從熱處理室11被搬出的狀態。參照圖3(A)及圖3(B),被處理物10當被搬入熱處理室11時,例如會以被配置在被形成為薄型之箱狀之殼體10a內的狀態被搬入。於殼體10a中,複數個被處理物10會以大致等間隔地擴散而被配置的狀態被收納。然後,被處理物10會以被配置於殼體10a內的狀態被搬入熱處理室11內。再者,於收納複數個被處理物10的殼體10a,會以可供周圍的氣體幾乎無阻力地通過之方式,例如設置有被形成於周圍側面及底面的複數個孔、以及被形成於上表面的開口。藉此,被構成為熱處理室11內之環境氛圍的過熱水蒸氣會通過殼體10a而流動。再者,殼體10a只要為可供熱處理室11內之環境氛圍的過熱水蒸氣以幾乎無阻力地通過殼體10a之方式流動的結構即可,例如亦可為由網狀之構件所形成的形態。FIG. 3(A), which is an enlarged view of the entrance 31 of the heat treatment chamber 11 of the heat treatment apparatus 1 and its vicinity, shows a state in which the object 10 is carried into the heat treatment chamber 11 . 3(B), which is an enlarged view of the outlet 32 of the heat treatment chamber 11 of the heat treatment apparatus 1 and its vicinity, shows a state in which the object 10 is conveyed in the heat treatment chamber 11 and carried out from the heat treatment chamber 11. Referring to FIG. 3(A) and FIG. 3(B), when the object to be processed 10 is carried into the thermal processing chamber 11, it is carried in, for example, in a state of being arranged in a thin box-shaped casing 10a. In the casing 10a, a plurality of processed objects 10 are housed in a state of being spread and arranged at substantially equal intervals. Then, the object 10 to be processed is carried into the heat treatment chamber 11 in a state of being arranged in the casing 10a. Furthermore, in the housing 10a that accommodates a plurality of objects 10 to be processed, in such a manner that the surrounding air can pass through almost without resistance, for example, a plurality of holes formed on the surrounding side and bottom surface, and a plurality of holes formed on the openings on the upper surface. Thereby, superheated steam constituting the ambient atmosphere in the heat treatment chamber 11 flows through the casing 10a. Furthermore, the housing 10a only needs to be a structure that allows the superheated steam in the ambient atmosphere in the heat treatment chamber 11 to flow through the housing 10a almost without resistance, for example, it may also be formed by a mesh-like member. form.

熱處理裝置1被構成為具備有熱處理室11、加熱器12、水蒸氣供給部13、水蒸氣供給系統14、水蒸氣排出部15、水蒸氣排出系統(16a、16b)、氣體供給部17、氣體供給系統18、入口側排氣部19、出口側排氣部20、排氣系統(21a、21b)、隔板22、黏合劑排出部23、空氣簾部24、及控制部25等。以下,對熱處理裝置1的結構詳細地進行說明。The heat treatment apparatus 1 is configured to include a heat treatment chamber 11, a heater 12, a water vapor supply unit 13, a water vapor supply system 14, a water vapor discharge unit 15, a water vapor discharge system (16a, 16b), a gas supply unit 17, a gas Supply system 18, inlet side exhaust unit 19, outlet side exhaust unit 20, exhaust system (21a, 21b), partition plate 22, adhesive discharge unit 23, air curtain unit 24, control unit 25, etc. Hereinafter, the configuration of the heat treatment apparatus 1 will be described in detail.

[熱處理室] 圖4係將熱處理裝置1之熱處理室11中水蒸氣供給部13及其附近放大而加以表示的圖。圖5係熱處理裝置11之一部分之示意性的剖視圖,圖5(A)係表示從圖4的A-A箭頭位置所觀察之狀態的圖,而圖5(B)係表示從圖4的B-B箭頭位置所觀察之狀態的圖。參照圖1至圖5,熱處理室11設置有供被處理物10搬入的入口31及供被處理物10搬出的出口32,被構成為進行會從入口31朝向出口32被搬送之被處理物10之熱處理的熱處理爐。[Heat treatment chamber] FIG. 4 is an enlarged view showing the water vapor supply unit 13 and its vicinity in the heat treatment chamber 11 of the heat treatment apparatus 1 . Fig. 5 is a schematic cross-sectional view of a part of the heat treatment device 11, Fig. 5(A) is a diagram showing the state observed from the position of the A-A arrow in Fig. 4 , and Fig. 5(B) is a view showing the position of the B-B arrow from Fig. 4 A graph of the observed state. Referring to FIGS. 1 to 5 , the heat treatment chamber 11 is provided with an inlet 31 for importing the object 10 to be processed and an outlet 32 for exporting the object 10 to be processed, and is configured to carry out the processing object 10 that will be conveyed from the inlet 31 toward the outlet 32 . Heat treatment furnace for heat treatment.

熱處理室11具有呈直線地且筒狀地延伸之隧道狀的外形,在內部設置有被處理物10會被搬送並且進行被處理物10之熱處理的處理空間。被處理物10的搬送方向、即在熱處理室11內被處理物10會被搬送的方向,係與熱處理室11呈筒狀地延伸之長度方向平行的方向。再者,在圖1至圖3中,關於被處理物10的搬送方向,利用一點鏈線的箭頭X1來表示,以下,將其稱為搬送方向X1。The heat treatment chamber 11 has a tunnel-like outer shape extending linearly and cylindrically, and a processing space in which the object 10 is transported and heat-treated for the object 10 is provided inside. The conveying direction of the processed object 10 , that is, the direction in which the processed object 10 is conveyed in the thermal processing chamber 11 is a direction parallel to the longitudinal direction in which the thermal processing chamber 11 extends in a cylindrical shape. In addition, in FIGS. 1-3, the conveyance direction of the object 10 to be processed is shown by the arrow X1 of a dot chain line, Hereinafter, this is called conveyance direction X1.

熱處理室11具有一對側壁(11a、11b)、頂壁11c、及底壁11d。熱處理室11的一對側壁(11a、11b)、頂壁11c、及底壁11d係由鋼鐵製的板狀構件形成。熱處理室11由鋼鐵製之板狀的構件所形成,藉此被構成為來自從外部對熱處理室11進行加熱之後述之加熱器12的熱會易於傳導。一對側壁(11a、11b)平行地被配置,且均被設為沿著上下方向及搬送方向X1延伸的壁部。頂壁11c被設為將熱處理室11之上部之頂面部分加以劃分的壁部,而以將一對側壁(11a、11b)之上端部結合為一體的方式被設置。又,頂壁11c被形成為在與搬送方向X1垂直的截面上呈拱形地延伸。底壁11d被設為將熱處理室11的底面部分加以劃分的壁部,而以將一對側壁(11a、11b)之下端部結合為一體的方式被設置。The heat treatment chamber 11 has a pair of side walls (11a, 11b), a top wall 11c, and a bottom wall 11d. A pair of side walls (11a, 11b), a ceiling wall 11c, and a bottom wall 11d of the heat treatment chamber 11 are formed of a plate-shaped member made of steel. The heat treatment chamber 11 is formed of a plate-shaped member made of steel, thereby being configured so that heat from the heater 12 described after heating the heat treatment chamber 11 from the outside can be easily conducted. A pair of side walls (11a, 11b) are arrange|positioned in parallel, and both are made into the wall part extended along the up-down direction and conveyance direction X1. The ceiling wall 11c is used as a wall part which divides the top surface part of the upper part of the heat processing chamber 11, and is provided so that the upper end part of a pair of side walls (11a, 11b) may be integrated. Moreover, the top wall 11c is formed so that it may extend in arch shape in the cross section perpendicular|vertical to conveyance direction X1. The bottom wall 11d is used as a wall part which divides the bottom surface part of the heat processing chamber 11, and is provided so that the lower end part of a pair of side walls (11a, 11b) may be integrated.

熱處理室11之入口31被設為熱處理室11中供被處理物10搬入的開口。於本實施方式中,入口31被設為由側壁11a的端部、側壁11b的端部、頂壁11c的端部、及底壁11d的端部所劃分的開口。而且,於熱處理室11中,入口31被設為在與搬送方向X1平行之方向上之一方向之端部的開口,而在熱處理室11之搬送方向X1之上游側的端部開口。入口31相對於熱處理室11的外部被開放,且未設置門板,而始終相對於外部被開放。再者,被處理物10如前所述般,會以被收納於殼體10a的狀態,從入口31被搬入熱處理室11。The entrance 31 of the heat treatment chamber 11 is set as an opening in the heat treatment chamber 11 for the object 10 to be processed to be carried in. In the present embodiment, the inlet 31 is defined as an opening defined by the end of the side wall 11a, the end of the side wall 11b, the end of the top wall 11c, and the end of the bottom wall 11d. In the heat treatment chamber 11 , the inlet 31 is opened at one end in a direction parallel to the conveyance direction X1 , and is opened at an end upstream of the heat treatment chamber 11 in the conveyance direction X1 . The entrance 31 is open to the outside of the heat treatment chamber 11 and is always open to the outside without providing a door panel. In addition, the object 10 to be processed is carried into the thermal processing chamber 11 from the entrance 31 in the state accommodated in the casing 10 a as described above.

熱處理室11之出口32被設為熱處理室11中供被處理物10搬出的開口。於本實施方式中,出口32被設為由側壁11a的端部、側壁11b的端部、頂壁11c的端部、及底壁11d的端部所劃分的開口。而且,於熱處理室11中,出口32被設為與搬送方向X1平行之方向上之入口31側的端部相反側之端部的開口,而在熱處理室11之搬送方向X1之下游側的端部開口。出口32相對於熱處理室11的外部被開放,且未設置門板,而始終相對於外部被開放。又,被處理物10如前所述般,會以被收納於殼體10a的狀態,從出口32朝向熱處理室11的外部被搬出。The outlet 32 of the heat treatment chamber 11 is used as an opening in the heat treatment chamber 11 for carrying out the processed object 10 . In the present embodiment, the outlet 32 is defined as an opening defined by the end of the side wall 11a, the end of the side wall 11b, the end of the top wall 11c, and the end of the bottom wall 11d. Moreover, in the heat treatment chamber 11, the outlet 32 is provided as an opening at the end opposite to the end on the side of the entrance 31 in the direction parallel to the conveyance direction X1, and the end on the downstream side of the conveyance direction X1 of the heat treatment chamber 11 is opening. The outlet 32 is open to the outside of the heat treatment chamber 11 and is always open to the outside without providing a door panel. In addition, the object 10 to be processed is carried out from the outlet 32 toward the outside of the heat treatment chamber 11 in a state accommodated in the housing 10 a as described above.

又,於熱處理室11中,設有作為進行被處理物10之加熱之區域的加熱區域HR。加熱區域HR於熱處理室11中,被設定為搬送方向X1上之一部分的區域。再者,在圖1中,關於熱處理室11中的加熱區域HR,作為搬送方向X1上既定的範圍,係以雙向箭頭來表示,且係以熱處理室11之外部所圖示的雙向箭頭示意性地表示。Also, in the heat treatment chamber 11, a heating region HR is provided as a region where the object to be processed 10 is heated. The heating region HR is set as a partial region in the conveyance direction X1 in the heat treatment chamber 11 . Furthermore, in FIG. 1 , regarding the heating region HR in the heat treatment chamber 11, as a predetermined range on the conveying direction X1, it is represented by a double-headed arrow, and is schematically represented by a double-headed arrow shown outside the heat treatment chamber 11. to express.

在熱處理室11內,被處理物10會由從後述之水蒸氣供給部13被供給的過熱水蒸氣所加熱,並且亦會藉由經由熱處理室11所加熱之熱處理室11內的環境氛圍所加熱,其中,該熱處理室11會藉由從外部對熱處理室11進行加熱之後述的加熱器12所加熱。因此,於熱處理室11中,作為進行被處理物10之加熱之區域的加熱區域HR,被構成為進行利用過熱水蒸氣所進行的加熱及利用來自加熱器12之熱所進行的加熱(即,利用藉由來自加熱器12之熱而經由熱處理室11被加熱之熱處理室11內之環境氛圍所進行的加熱)中之至少任一者的區域。In the heat treatment chamber 11, the object 10 to be processed is heated by the superheated steam supplied from the steam supply unit 13 described later, and is also heated by the ambient atmosphere in the heat treatment chamber 11 heated by the heat treatment chamber 11. , wherein the heat treatment chamber 11 is heated by the heater 12 described later after heating the heat treatment chamber 11 from the outside. Therefore, in the heat treatment chamber 11, the heating region HR, which is a region for heating the object 10 to be processed, is configured to perform heating by superheated steam and heating by heat from the heater 12 (that is, A region of at least any one of heating by the ambient atmosphere in the heat treatment chamber 11 heated by the heat from the heater 12 via the heat treatment chamber 11 .

再者,於熱處理室11內,利用來自加熱器12之熱所進行之被處理物10的加熱,會在搬送方向X1上配置有加熱器12之區域內進行。而且,利用過熱水蒸氣所進行之被處理物10的加熱,會在熱處理室11內環境氛圍中含有過熱水蒸氣的區域內進行。於本實施形態中,在熱處理室11中進行利用過熱水蒸氣所進行之被處理物10之加熱的區域,係從水蒸氣供給部13至後述之氣體供給部17中之入口側氣體供給部36a為止的區域、及從水蒸氣供給部13至後述之氣體供給部17中之出口側氣體供給部37b為止的區域。而且,於本實施形態中, 在熱處理室11中,進行利用來自加熱器12所進行之被處理物10之加熱的區域,包含在進行利用過熱水蒸氣所進行之被處理物10之加熱的區域中。亦即,於熱處理室11的搬送方向X1上,進行利用來自加熱器12之熱所進行之被處理物10之加熱的區域,被配置在進行利用過熱水蒸氣所進行之被處理物10之加熱的區域的內側。因此,於本實施形態中,加熱區域HR係從水蒸氣供給部13至後述之氣體供給部17之入口側氣體供給部36a為止的區域、及從水蒸氣供給部13至後述之氣體供給部17之出口側氣體供給部37b為止的區域。Furthermore, in the heat treatment chamber 11, the heating of the object 10 to be processed by the heat from the heater 12 is performed in the area where the heater 12 is arranged in the conveyance direction X1. Furthermore, the heating of the object 10 to be processed by the superheated steam is performed in a region where the ambient atmosphere in the heat treatment chamber 11 contains the superheated steam. In this embodiment, the region where the object 10 is heated by superheated steam in the heat treatment chamber 11 is from the water vapor supply part 13 to the inlet-side gas supply part 36a of the gas supply part 17 described later. and the area from the water vapor supply unit 13 to the outlet-side gas supply unit 37b of the gas supply unit 17 described later. In addition, in the present embodiment, in the heat treatment chamber 11, the area where the object 10 is heated by the heater 12 is included in the area where the object 10 is heated by superheated steam. middle. That is, in the transfer direction X1 of the heat treatment chamber 11, the area where the object 10 is heated by the heat from the heater 12 is arranged in the area where the object 10 is heated by the superheated steam. inside of the area. Therefore, in the present embodiment, the heating region HR is the area from the steam supply part 13 to the inlet-side gas supply part 36a of the gas supply part 17 described later, and the region from the steam supply part 13 to the gas supply part 17 described later. The region up to the outlet side gas supply part 37b.

又,於本實施方式中,如上所述,進行利用來自加熱器12之熱所進行之加熱的區域,被配置在進行利用過熱水蒸氣所進行之加熱的區域的內側。因此,於加熱區域HR內之區域、且進行利用來自加熱器12之熱所進行之加熱的區域中,會進行利用來自加熱器12所進行之熱的加熱及利用過熱水蒸氣所進行之加熱雙方的加熱。而且,於加熱區域HR內之區域、且未配置加熱器12而不進行利用來自加熱器12之熱所進行之加熱的區域中,僅會進行利用過熱水蒸氣所進行的加熱。Also, in the present embodiment, as described above, the area where heating by the heat from the heater 12 is performed is arranged inside the area where heating by superheated steam is performed. Therefore, in the area within the heating area HR, where heating by the heat from the heater 12 is performed, both heating by the heat from the heater 12 and heating by superheated steam are performed. of heating. And, in the area within the heating area HR, where the heater 12 is not arranged and the heating by the heat from the heater 12 is not performed, only the heating by the superheated steam is performed.

又,於本實施形態中,雖已例示進行利用來自加熱器12之熱所進行之加熱的區域被配置在進行利用過熱水蒸氣所進行之加熱之區域的內側的形態,但亦可並非如此。進行利用來自加熱器12之所進行之對被處理物10之加熱的區域,亦可被配置為從進行利用過熱水蒸氣所進行之被處理物10之加熱之區域的內側涵蓋至外側為止。於該情形時,進行利用過熱水蒸氣所進行之加熱之區域,會被配置在進行利用來自加熱器12之熱所進行之加熱之區域的內側。而且,加熱區域HR係包含進行利用過熱水蒸氣所進行之加熱之區域的區域,為進行利用來自加熱器12之熱所進行之加熱的區域。Also, in this embodiment, an example has been described in which the region heated by the heat from the heater 12 is disposed inside the region heated by superheated steam, but this may not be the case. The area where the object 10 is heated by the heater 12 may be arranged so as to cover from the inside to the outside of the area where the object 10 is heated by superheated steam. In this case, the region where heating with superheated steam is performed is arranged inside the region where heating with heat from the heater 12 is performed. Furthermore, the heating region HR is a region including a region where heating with superheated steam is performed, and is a region where heating with heat from the heater 12 is performed.

又,於熱處理室11設置有搬送機構33。搬送機構33被設為將被處理物10在熱處理室11內進行搬送的機構。再者,於本實施形態中,搬送機構33被構成為將被處理物10以整個殼體10a為單位來進行搬送、即將被處理物10以被收納於殼體10a的狀態來進行搬送。搬送機構33被配置在熱處理室11內下方的區域,且在底壁11d的上方沿著搬送方向X1與底壁11d的牆壁面平行地被配置。搬送機構33例如被構成為藉由環繞之環狀的網格帶34來搬送被處理物10的機構。而且,搬送機構33被構成為藉由網格帶34進行環繞,而將被配置於在網格帶34之上表面之殼體10a中所收納的被處理物10與殼體10a一起進行搬送。In addition, a transfer mechanism 33 is provided in the heat treatment chamber 11 . The conveyance mechanism 33 is provided as a mechanism that conveys the object 10 to be processed within the thermal processing chamber 11 . In addition, in this embodiment, the conveyance mechanism 33 is comprised so that the to-be-processed object 10 may be conveyed in units of the whole casing 10a, ie, the to-be-processed object 10 shall be conveyed in the state accommodated in the casing 10a. The conveyance mechanism 33 is arranged in the lower region in the heat treatment chamber 11 and is arranged above the bottom wall 11d in parallel with the wall surface of the bottom wall 11d along the conveyance direction X1. The transport mechanism 33 is configured, for example, as a mechanism for transporting the processed object 10 by an endless mesh belt 34 . Furthermore, the conveyance mechanism 33 is configured so that the mesh belt 34 is surrounded, and the processed object 10 accommodated in the casing 10 a disposed on the upper surface of the mesh belt 34 is conveyed together with the casing 10 a.

再者,環狀之網格帶34例如被構成為具有在其寬度方向之兩緣部分別設置有滾子鏈的結構,由設置有與滾子鏈嚙合之鏈輪的複數個驅動軸35所驅動而進行環繞。複數個驅動軸35被設置為以被插通於網格帶34之內側的狀態分別繞軸心進行旋轉。複數個驅動軸35以相互平行地延伸之方式被配置,並被配置為沿著相對於一對側壁(11a、11b)垂直之方向延伸。又,各驅動軸35相對於一對側壁(11a、11b)旋轉自如地被支撐。又,於各驅動軸35設置有離開其軸向被配置之一對鏈輪(35a、35a),且各鏈輪35a與網格帶34之兩緣部的各滾子鏈嚙合。又,複數個驅動軸35中之至少一者被構成為,由根據來自控制部25之控制指令作動的電動馬達(省略圖示)所旋轉驅動。若驅動軸35由電動馬達所旋轉驅動,驅動軸35的旋轉驅動便會經由鏈輪35a與滾子鏈的嚙合被傳遞至網格帶34。然後,藉由複數個驅動軸35環繞自如地被支撐之網格帶34的環繞動作便會被進行。若網格帶34進行環繞動作,以被收納於殼體10a之狀態被配置於網格帶34之上表面的被處理物10便會被搬送。Furthermore, the endless mesh belt 34 is, for example, configured to have a structure in which roller chains are respectively provided on both edges in the width direction thereof, and is formed by a plurality of drive shafts 35 provided with sprockets meshing with the roller chains. Drive around. The plurality of driving shafts 35 are provided so as to rotate about the respective axes while being inserted inside the mesh belt 34 . The plurality of drive shafts 35 are arranged to extend parallel to each other, and are arranged to extend in a direction perpendicular to the pair of side walls (11a, 11b). Moreover, each drive shaft 35 is rotatably supported with respect to a pair of side walls (11a, 11b). Also, a pair of sprockets (35a, 35a) arranged away from the axial direction is provided on each drive shaft 35, and each sprocket 35a meshes with each roller chain on both edges of the mesh belt 34. Moreover, at least one of the plurality of drive shafts 35 is configured to be rotationally driven by an electric motor (not shown) that operates in accordance with a control command from the control unit 25 . If the drive shaft 35 is rotationally driven by the electric motor, the rotational drive of the drive shaft 35 is transmitted to the mesh belt 34 through the meshing of the sprocket 35 a with the roller chain. Then, the winding motion of the grid belt 34 freely supported by the plurality of driving shafts 35 is performed. When the mesh belt 34 performs the winding operation, the processed object 10 arranged on the upper surface of the mesh belt 34 in a state of being housed in the case 10a is conveyed.

[加熱器] 參照圖1,加熱器12被設為從外部對熱處理室11進行加熱的機構,且設有複數個。複數個加熱器12沿著熱處理室11的長度方向(即,沿著搬送方向X1)串聯地被排列而配置。再者,在圖2及圖4以後的圖式中,省略加熱器12的圖示。[heater] Referring to FIG. 1 , heater 12 is provided as a mechanism for heating heat treatment chamber 11 from the outside, and plural heaters 12 are provided. A plurality of heaters 12 are arranged in series along the longitudinal direction of the heat treatment chamber 11 (that is, along the conveyance direction X1). In addition, in FIG. 2 and FIG. 4 and later figures, the illustration of the heater 12 is abbreviate|omitted.

各加熱器12被構成為具備有被配置於熱處理室11之周圍的發熱體(省略圖示)、及在被配置於熱處理室11之周圍之發熱體的更外側並以覆蓋熱處理室11之周圍與發熱體的方式被配置的絕熱構件(省略圖示)。發熱體被配置為從外部對熱處理室11內的一對側壁(11a、11b)、頂壁11c、及底壁11d進行加熱。發熱體被構成為例如具備有將從省略圖示之電源所供給的電能轉換為熱能的電熱體,並藉由對電熱體進行通電而進行發熱。又,加熱器12的發熱體根據來自控制部25的控制指令作動作而進行發熱。若加熱器12的發熱體根據來自控制部25的控制指令動作而進行發熱,熱處理室11的一對側壁(11a、11b)、頂壁11c、及底壁11d便會藉由來自加熱器12之發熱體的熱所加熱。藉此,熱處理室11內的環境氛圍會被加熱。然後,在熱處理室11中被搬送的被處理物10,會由過熱水蒸氣所加熱,並且亦會藉由被來自加熱器12之熱加熱之熱處理室11內的環境氛圍所加熱。Each heater 12 is configured to include a heating element (not shown) arranged around the heat treatment chamber 11 , and an outer side of the heating element arranged around the heat treatment chamber 11 to cover the periphery of the heat treatment chamber 11 . A heat insulating member (not shown) arranged in the same way as a heating element. The heating element is disposed so as to heat the pair of side walls (11a, 11b), the top wall 11c, and the bottom wall 11d in the heat treatment chamber 11 from the outside. The heating element is configured, for example, to include an electric heating element that converts electric energy supplied from a power supply (not shown) into thermal energy, and generates heat by energizing the electric heating element. In addition, the heat generating element of the heater 12 operates according to a control command from the control unit 25 to generate heat. If the heating element of the heater 12 operates according to the control command from the control unit 25 to generate heat, the pair of side walls (11a, 11b), the top wall 11c, and the bottom wall 11d of the heat treatment chamber 11 will be heated by the heat from the heater 12. Heated by the heat of the heating element. Thereby, the ambient atmosphere in the heat treatment chamber 11 is heated. Then, the object to be processed 10 conveyed in the heat treatment chamber 11 is heated by the superheated steam, and is also heated by the ambient atmosphere in the heat treatment chamber 11 heated by the heat from the heater 12 .

[水蒸氣供給部] 參照圖1、圖2、圖4、圖5,水蒸氣供給部13被設置於熱處理室11中的加熱區域HR,被設為對熱處理室11內供給過熱水蒸氣的機構。於本實施形態已例示的熱處理裝置1中,水蒸氣供給部13被設在加熱區域HR內之被處理物10之搬送方向X1的中央部分。再者,水蒸氣供給部13只要被配置於加熱區域HR即可,亦可被設於較搬送方向X1之中央部分更靠入口31側或出口32側。[Water vapor supply part] Referring to FIG. 1 , FIG. 2 , FIG. 4 , and FIG. 5 , the steam supply unit 13 is provided in the heating region HR in the heat treatment chamber 11 , and serves as a mechanism for supplying superheated steam into the heat treatment chamber 11 . In the heat treatment apparatus 1 exemplified in this embodiment, the steam supply unit 13 is provided in the central portion of the object to be processed 10 in the conveyance direction X1 within the heating region HR. In addition, the steam supply part 13 should just be arrange|positioned in the heating area|region HR, and may be provided in the entrance 31 side or the exit 32 side rather than the central part of conveyance direction X1.

水蒸氣供給部13被構成為具備有將從後述之水蒸氣供給系統14所供給之過熱水蒸氣朝向熱處理室11內供給的一對噴嘴部(38a、38b)。一對噴嘴部(38a、38b)分別被設為呈圓筒狀地延伸並且圓筒軸方向的兩端部被封閉的構件。一對噴嘴部(38a、38b)在被處理物10之搬送方向X1上相互地對向而被配置。而且,在被處理物10的搬送方向X1上,噴嘴部38a相對於噴嘴部38b被配置於入口31側,而噴嘴部38b相對於噴嘴部38a被配置於出口32側。又,於本實施形態中,一對噴嘴部(38a、38b)於熱處理室11內被配置在加熱區域HR內之搬送方向X1的中央部分。而且,噴嘴部38a被配置於較加熱區域HR內之搬送方向X1的中央位置更靠入口31側,而噴嘴部38b被配置於較加熱區域HR內之搬送方向X1的中央位置更靠出口32側。又,各噴嘴部(38a、38b)以其圓筒軸方向沿著熱處理室11之寬度方向水平地延伸的狀態,被配置在熱處理室11內。再者,熱處理室11的寬度方向被規定為相對於水平地延伸之熱處理室11的長度方向(即,搬送方向X1)及熱處理室11的高度方向(即,上下方向)垂直的方向。The steam supply unit 13 is configured to include a pair of nozzle units ( 38 a , 38 b ) for supplying superheated steam supplied from a steam supply system 14 described later into the heat treatment chamber 11 . A pair of nozzle parts (38a, 38b) are each extended in a cylindrical shape, and the both ends of a cylindrical axial direction are closed. A pair of nozzle parts (38a, 38b) is arrange|positioned facing mutually in the conveyance direction X1 of the object 10 to be processed. Moreover, in the conveyance direction X1 of the object 10, the nozzle part 38a is arrange|positioned at the inlet 31 side with respect to the nozzle part 38b, and the nozzle part 38b is arrange|positioned at the exit 32 side with respect to the nozzle part 38a. Moreover, in this embodiment, a pair of nozzle part (38a, 38b) is arrange|positioned in the center part of the conveyance direction X1 in the heating region HR in the heat processing chamber 11. Furthermore, the nozzle portion 38a is disposed on the entrance 31 side from the central position in the conveyance direction X1 in the heating region HR, and the nozzle portion 38b is disposed on the exit 32 side from the central position in the conveyance direction X1 in the heating region HR. . Moreover, each nozzle part (38a, 38b) is arrange|positioned in the heat processing chamber 11 in the state which the cylinder axial direction extended horizontally along the width direction of the heat processing chamber 11. The width direction of the heat treatment chamber 11 is defined as a direction perpendicular to the longitudinal direction of the heat treatment chamber 11 extending horizontally (that is, the transfer direction X1) and the height direction of the heat treatment chamber 11 (that is, the vertical direction).

又,各噴嘴部(38a、38b)在其圓筒軸方向上之大致中央位置,與後述之水蒸氣供給系統14的各水蒸氣供給配管(42a、42b)連接。再者,噴嘴部38a與水蒸氣供給配管42a連接,而噴嘴部38b與水蒸氣供給配管42b連接。各水蒸氣供給配管(42a、42b)貫通熱處理室11的頂壁11c,與熱處理室11內的各噴嘴部(38a、38b)連接。與各噴嘴部(38a、38b)連接的各水蒸氣供給配管(42a、42b),以貫通頂壁11c的狀態被固定於頂壁11c。藉此,在熱處理室11內,各噴嘴部(38a、38b)經由各水蒸氣供給配管(42a、42b)而被支撐於頂壁11c。Moreover, each nozzle part (38a, 38b) is connected to each steam supply pipe (42a, 42b) of the steam supply system 14 mentioned later at the substantially center position of the cylinder axial direction. In addition, the nozzle part 38a is connected to the water vapor supply pipe 42a, and the nozzle part 38b is connected to the water vapor supply pipe 42b. Each water vapor supply pipe (42a, 42b) penetrates through the ceiling wall 11c of the heat treatment chamber 11, and is connected to each nozzle part (38a, 38b) in the heat treatment chamber 11. Each steam supply pipe (42a, 42b) connected to each nozzle part (38a, 38b) is fixed to the ceiling wall 11c in a state penetrating through the ceiling wall 11c. Thereby, in the heat processing chamber 11, each nozzle part (38a, 38b) is supported by the ceiling wall 11c via each steam supply pipe (42a, 42b).

各噴嘴部(38a、38b)之內部與各水蒸氣供給配管(42a、42b)的內部連通,從各水蒸氣供給配管(42a、42b)所供給的過熱水蒸氣,會被供給至各噴嘴部(38a、38b)的內部。又,於各噴嘴部(38a、38b)設有複數個噴嘴孔39。各噴嘴孔39例如被設為呈圓形之形狀開口的貫通孔。再者,各噴嘴孔39之開口形狀並不限於圓形之形狀,例如亦可被形成為矩形之形狀、狹縫狀之形狀等的各種形狀。複數個噴嘴孔39在各噴嘴部(38a、38b)沿著其圓筒軸方向呈直線狀地排列而被配置,例如等間隔地排列而被配置。再者,各噴嘴部(38a、38b)的圓筒軸方向由於沿著熱處理室11的寬度方向,因此各噴嘴部(38a、38b)的複數個噴嘴孔39沿著熱處理室11的寬度方向被配置。從各水蒸氣供給配管(42a、42b)朝向各噴嘴部(38a、38b)所供給的過熱水蒸氣,會充滿各噴嘴部(38a、38b)內,而且會從複數個噴嘴孔39朝向外部吹出。藉由從複數個噴嘴孔39吹出過熱水蒸氣,過熱水蒸氣會從各噴嘴部(38a、38b)被供給至熱處理室11內。The inside of each nozzle part (38a, 38b) communicates with the inside of each steam supply pipe (42a, 42b), and the superheated steam supplied from each water vapor supply pipe (42a, 42b) is supplied to each nozzle part The interior of (38a, 38b). Moreover, the some nozzle hole 39 is provided in each nozzle part (38a, 38b). Each nozzle hole 39 is formed, for example, as a through hole opening in a circular shape. In addition, the opening shape of each nozzle hole 39 is not limited to a circular shape, For example, it can also be formed in various shapes, such as a rectangular shape and a slit shape. The plurality of nozzle holes 39 are arranged linearly along the cylindrical axis direction of each nozzle part (38a, 38b), for example, arranged at equal intervals. Furthermore, since the cylindrical axis direction of each nozzle part (38a, 38b) is along the width direction of the heat treatment chamber 11, the plurality of nozzle holes 39 of each nozzle part (38a, 38b) are drawn along the width direction of the heat treatment chamber 11. configuration. The superheated steam supplied from each steam supply pipe (42a, 42b) toward each nozzle portion (38a, 38b) fills each nozzle portion (38a, 38b) and is blown out from a plurality of nozzle holes 39. . By blowing the superheated steam from the plurality of nozzle holes 39, the superheated steam is supplied into the heat treatment chamber 11 from the respective nozzle portions (38a, 38b).

又,於噴嘴部38a,沿著其圓筒軸方向被配置的複數個噴嘴孔39,均朝向相對向之一對噴嘴部(38a、38b)的中間位置側開口,並朝向出口32側開口。因此,從一對噴嘴部(38a、38b)中被配置於入口31側的噴嘴部38a朝向熱處理室11內所供給的過熱水蒸氣,會朝向與入口31側相反側的出口32側,並從噴嘴部38a被吹出。又,於本實施形態中, 在噴嘴部38a,複數個噴嘴孔39朝向加熱區域HR內之搬送方向X1的中央位置側開口。再者,噴嘴部38a被配置於較加熱區域HR內之搬送方向X1的中央位置更靠入口31側,噴嘴部38a的各噴嘴孔39朝向出口32側開口。因此,從被配置於較加熱區域HR內之搬送方向X1之中央位置更靠入口31側的噴嘴部38a被供給至熱處理室11內的過熱水蒸氣,會從入口31側朝向加熱區域HR內之搬送方向X1的中央位置側,並從噴嘴部38a被吹出。In addition, in the nozzle part 38a, a plurality of nozzle holes 39 arranged along the direction of the cylinder axis all open toward the middle position side of a pair of opposing nozzle parts (38a, 38b) and open toward the outlet 32 side. Therefore, the superheated steam supplied from the nozzle portion 38a disposed on the inlet 31 side out of the pair of nozzle portions (38a, 38b) toward the inside of the heat treatment chamber 11 is directed toward the outlet 32 side opposite to the inlet 31 side, and from The nozzle portion 38a is blown out. Moreover, in this embodiment, in the nozzle part 38a, the some nozzle hole 39 opens toward the center position side of the conveyance direction X1 in heating area|region HR. In addition, the nozzle part 38a is arrange|positioned at the entrance 31 side rather than the center position of the conveyance direction X1 in heating area|region HR, and each nozzle hole 39 of the nozzle part 38a opens toward the exit 32 side. Therefore, the superheated steam supplied to the heat treatment chamber 11 from the nozzle portion 38a disposed on the inlet 31 side closer to the central position of the conveyance direction X1 in the heating region HR flows from the inlet 31 side to the inside of the heating region HR. The center position side of the conveyance direction X1 is blown out from the nozzle part 38a.

又,於噴嘴部38b,沿著其圓筒軸方向被配置的複數個噴嘴孔39,均朝向相對向之一對噴嘴部(38a、38b)的中間位置側開口,並朝向入口31側開口。因此,從一對噴嘴部(38a、38b)中被配置於出口32側的噴嘴部38b被供給至熱處理室11內的過熱水蒸氣,會朝向與出口32側相反側的入口31側,並從噴嘴部38b被吹出。又,於本實施形態中,在噴嘴部38b,複數個噴嘴孔39朝向加熱區域HR內之搬送方向X1的中央位置側開口。再者,噴嘴部38b被配置於較加熱區域HR內之搬送方向X1的中央位置更靠出口32側,噴嘴部38b的各噴嘴孔39朝向入口31側開口。因此,從被配置於較加熱區域HR內之搬送方向X1的中央位置更靠出口32側的噴嘴部38a被供給至熱處理室11內的過熱水蒸氣,會從出口32側朝向加熱區域HR內之搬送方向X1的中央位置側,並從噴嘴部38b被吹出。In addition, in the nozzle part 38b, a plurality of nozzle holes 39 arranged along the direction of the cylinder axis all open toward the middle position side of a pair of opposing nozzle parts (38a, 38b) and open toward the inlet 31 side. Therefore, the superheated steam supplied to the heat treatment chamber 11 from the nozzle portion 38b disposed on the outlet 32 side among the pair of nozzle portions (38a, 38b) is directed toward the inlet 31 side opposite to the outlet 32 side, and flows from The nozzle portion 38b is blown out. Moreover, in this embodiment, in the nozzle part 38b, the some nozzle hole 39 opens toward the center position side of the conveyance direction X1 in heating region HR. In addition, the nozzle part 38b is arrange|positioned at the exit 32 side rather than the center position of the conveyance direction X1 in heating area|region HR, and each nozzle hole 39 of the nozzle part 38b opens toward the inlet 31 side. Therefore, the superheated steam supplied to the heat treatment chamber 11 from the nozzle portion 38a disposed on the outlet 32 side closer to the center position of the conveyance direction X1 in the heating region HR is directed from the outlet 32 side to the inside of the heating region HR. The center position side of the conveyance direction X1 is blown out from the nozzle part 38b.

根據上述之構成,一對噴嘴部(38a、38b)分別被構成為朝向相對向之一對噴嘴部(38a、38b)的中間位置側吹出過熱水蒸氣。又,於本實施形態中,噴嘴部38a被配置為在加熱區域HR內之搬送方向X1的中央部分,從入口31側朝向加熱區域HR內之搬送方向X1的中央位置側吹出過熱水蒸氣。而且,噴嘴部38b被配置為在加熱區域HR內之搬送方向X1的中央部分,從出口32側朝向加熱區域HR內之搬送方向X1的中央位置側吹出過熱水蒸氣。因此,一對噴嘴部(38a、38b)夾隔著加熱區域HR內之搬送方向X1的中央位置,在被處理物10的搬送方向X1上相互地對向而被配置。而且,一對噴嘴部(38a、38b)分別被構成為朝向加熱區域HR內之被處理物10之搬送方向X1的中央位置側吹出過熱水蒸氣。According to the above structure, a pair of nozzle part (38a, 38b) is comprised so that superheated steam may be blown toward the intermediate position side of a pair of nozzle part (38a, 38b) which opposes each. Moreover, in this embodiment, the nozzle part 38a is arrange|positioned at the center part of the conveyance direction X1 in the heating area|region HR, and blows superheated steam from the inlet 31 side toward the center position side of the conveyance direction X1 in the heating area HR. And the nozzle part 38b is arrange|positioned so that superheated steam may blow out toward the center position side of the conveyance direction X1 in the heating region HR from the outlet 32 side in the center part of the conveyance direction X1 in the heating region HR. Therefore, a pair of nozzle parts (38a, 38b) are arrange|positioned facing each other in the conveyance direction X1 of the object 10 across the central position in the conveyance direction X1 in the heating area|region HR. Moreover, a pair of nozzle part (38a, 38b) is comprised so that superheated steam may be blown toward the center position side of the conveyance direction X1 of the object 10 in the heating area|region HR, respectively.

[水蒸氣供給系統] 參照圖2、圖4及圖5,水蒸氣供給系統14被設為生成過熱水蒸氣並朝向水蒸氣供給部13供給過熱水蒸氣的機構。而且,水蒸氣供給系統14被構成為具備有過熱水蒸氣生成部40、及水蒸氣供給配管(41、42a、42b)。[Water vapor supply system] Referring to FIG. 2 , FIG. 4 , and FIG. 5 , the steam supply system 14 is a mechanism that generates superheated steam and supplies the superheated steam to the steam supply unit 13 . Furthermore, the steam supply system 14 is configured to include a superheated steam generating unit 40 and steam supply piping (41, 42a, 42b).

過熱水蒸氣生成部40被設為對水進行加熱而生成過熱水蒸氣的機構,具備有鍋爐及過熱器。鍋爐對水進行加熱使其蒸發而生成沸點程度之溫度的飽和水蒸氣,過熱器進一步對在鍋爐所生成之飽和水蒸氣進行加熱而生成過熱水蒸氣。過熱水蒸氣生成部40根據來自控制部25的控制指令作動,而生成過熱水蒸氣。亦即,鍋爐及過熱器會根據來自控制部25的控制指令作動,而進行過熱水蒸氣的生成。若過熱水蒸氣生成部40根據來自控制部25的控制指令作動而生成過熱水蒸氣,過熱水蒸氣便會經由後述之水蒸氣供給配管(41、42a、42b)被供給至水蒸氣供給部13的一對噴嘴部(38a、38b)。The superheated steam generator 40 is a mechanism for heating water to generate superheated steam, and includes a boiler and a superheater. The boiler heats and evaporates water to generate saturated steam at a temperature around the boiling point, and the superheater further heats the saturated steam generated in the boiler to generate superheated steam. The superheated steam generation unit 40 operates according to a control command from the control unit 25 to generate superheated steam. That is, the boiler and the superheater operate according to the control command from the control unit 25 to generate superheated steam. When the superheated steam generation unit 40 operates according to the control command from the control unit 25 to generate superheated steam, the superheated steam will be supplied to the steam supply unit 13 through the steam supply pipes (41, 42a, 42b) described later. A pair of nozzle portions (38a, 38b).

水蒸氣供給配管41在其上游端側被連接於過熱水蒸氣生成部40,被設為供給由過熱水蒸氣生成部40所生成之過熱水蒸氣的配管系統。又,水蒸氣供給配管41在其下游端側,與水蒸氣供給配管42a及水蒸氣供給配管42b連接。亦即,水蒸氣供給配管41以並列地分支的方式與水蒸氣供給配管(42a、42b)連接。水蒸氣供給配管42a被設為連接水蒸氣供給配管41與噴嘴部38a的配管系統,被構成為將由過熱水蒸氣生成部40所生成並經由水蒸氣供給配管41所供給的過熱水蒸氣攻擊至噴嘴部38a。水蒸氣供給配管42b被設為連接水蒸氣供給配管41與噴嘴部38b的配管系統,被構成為將由過熱水蒸氣生成部40所生成並經由水蒸氣供給配管41所供給的過熱水蒸氣供給至噴嘴部38b。The steam supply pipe 41 is connected to the superheated steam generator 40 at its upstream end side, and serves as a piping system for supplying superheated steam generated by the superheated steam generator 40 . Moreover, the water vapor supply pipe 41 is connected to the water vapor supply pipe 42a and the water vapor supply pipe 42b on the downstream end side thereof. That is, the water vapor supply pipe 41 is connected to the water vapor supply pipe (42a, 42b) so as to branch in parallel. The steam supply piping 42a is a piping system connecting the steam supply piping 41 and the nozzle portion 38a, and is configured to attack the nozzle with the superheated steam generated by the superheated steam generation unit 40 and supplied via the steam supply piping 41. Section 38a. The steam supply pipe 42b is a piping system connecting the steam supply pipe 41 and the nozzle part 38b, and is configured to supply the superheated steam generated by the superheated steam generating part 40 and supplied via the steam supply pipe 41 to the nozzle. Section 38b.

[水蒸氣排出部] 圖6係將熱處理裝置1之熱處理室11中後述之入口側水蒸氣排出部15a及後述之入口側氣體供給部(36a、36b)以及其附近放大而加以表示的圖。圖7係熱處理裝置1之一部分之示意性的剖視圖,圖7(A)係表示從圖6之C-C箭頭位置所觀察之狀態的圖,而圖7(B)係表示從圖6之D-D箭頭位置所觀察之狀態的圖。圖8係將熱處理裝置1之熱處理室11中後述之出口側水蒸氣排出部15b及後述之出口側氣體供給部(37a、37b)以及其附近放大而加以表示的圖。圖9係熱處理裝置1之一部分之示意性的剖視圖,圖9(A)係表示從圖8之E-E箭頭方向所觀察之狀態的圖,而圖9(B)係表示從圖8之F-F箭頭方向所觀察之狀態的圖。[Water vapor discharge part] 6 is an enlarged view showing an inlet-side water vapor discharge unit 15a, an inlet-side gas supply unit (36a, 36b) described later, and their vicinity in the heat treatment chamber 11 of the heat treatment apparatus 1, which will be described later. Fig. 7 is a schematic cross-sectional view of a part of the heat treatment device 1, Fig. 7(A) is a view showing the state viewed from the position of the arrow C-C in Fig. 6, and Fig. 7(B) is a view showing the position of the arrow D-D in Fig. 6 A graph of the observed state. 8 is an enlarged view showing an outlet-side water vapor discharge unit 15b, an outlet-side gas supply unit (37a, 37b) described later, and their vicinity in the heat treatment chamber 11 of the heat treatment apparatus 1, which will be described later. Fig. 9 is a schematic cross-sectional view of a part of the heat treatment device 1, Fig. 9(A) is a view showing the state viewed from the direction of the E-E arrow in Fig. 8, and Fig. 9(B) is a view from the direction of the F-F arrow in Fig. 8 A graph of the observed state.

參照圖1至圖3、圖6至圖9,水蒸氣排出部15被設為用以將熱處理室11內之過熱水蒸氣朝向熱處理室11之外部排出的機構。而且,水蒸氣排出部15在熱處理室11中,相對於水蒸氣供給部13分別被設於入口31側及出口32側。Referring to FIG. 1 to FIG. 3 , and FIG. 6 to FIG. 9 , the steam discharge unit 15 is set as a mechanism for discharging the superheated steam in the heat treatment chamber 11 to the outside of the heat treatment chamber 11 . Further, the water vapor discharge unit 15 is provided on the inlet 31 side and the outlet 32 side with respect to the water vapor supply unit 13 in the heat treatment chamber 11 .

在熱處理室11的入口31側,作為水蒸氣排出部15,設置有入口側水蒸氣排出部15a。於熱處理室11之出口32側,作為水蒸氣排出部15,而設置有出口側水蒸氣排出部15b。於本實施形態中,入口側水蒸氣排出部15a及出口側水蒸氣排出部15b被配置於熱處理室11內之加熱區域HR內,且分別被配置於加熱區域HR內之搬送方向X1之兩端部附近的區域。又,於本實施形態中,入口側水蒸氣排出部15a在熱處理室11中,被配置於與沿著搬送方向X1排列之複數個加熱器12中最靠入口31側被配置之加熱器12對應的位置。而且,出口側水蒸氣排出部15b在熱處理室11中,被配置於與沿著搬送方向X1排列之複數個加熱器12中最靠出口32側被配置之加熱器12對應的位置。又,入口側水蒸氣排出部15a及出口側水蒸氣排出部15b在與加熱區域HR之搬送方向X1平行的方向上之兩端部至各者附近的區域中,被配置於頂壁11c側的區域、即熱處理室11之與搬送方向X1垂直的截面上之上半部分側的區域。On the inlet 31 side of the heat treatment chamber 11 , an inlet-side steam discharge unit 15 a is provided as the steam discharge unit 15 . On the outlet 32 side of the heat treatment chamber 11 , an outlet-side steam discharge unit 15 b is provided as the steam discharge unit 15 . In this embodiment, the inlet-side steam discharge part 15a and the outlet-side steam discharge part 15b are arranged in the heating region HR in the heat treatment chamber 11, and are respectively arranged at both ends of the conveying direction X1 in the heating region HR. area near the Ministry. In addition, in the present embodiment, the inlet-side steam discharge unit 15a is arranged in the heat treatment chamber 11 corresponding to the heater 12 arranged closest to the inlet 31 side among the plurality of heaters 12 arranged along the conveyance direction X1. s position. In addition, the outlet-side steam discharge unit 15b is arranged at a position corresponding to the heater 12 arranged closest to the outlet 32 side among the plurality of heaters 12 arranged along the conveyance direction X1 in the heat treatment chamber 11 . In addition, the inlet side steam discharge part 15a and the outlet side steam discharge part 15b are arranged on the top wall 11c side in the region from both ends in the direction parallel to the conveyance direction X1 of the heating zone HR to the vicinity of each. The area, that is, the area on the upper half side of the heat treatment chamber 11 in a cross section perpendicular to the conveyance direction X1.

入口側水蒸氣排出部15a及出口側水蒸氣排出部15b被構成為相同,而被形成為沿著熱處理室11之寬度方向延伸之中空的箱狀。而且,入口側水蒸氣排出部15a及出口側水蒸氣排出部15b分別被構成為具備有在與搬送方向X1垂直之截面上沿著頂壁11c呈拱形地延伸的上壁43a、水平地延伸的下壁43b、及沿著與搬送方向X1垂直之截面延伸的一對側壁(43c、43d)。藉此,入口側水蒸氣排出部15a及出口側水蒸氣排出部15b之各者之內側的中空區域,被形成為由上壁43a、下壁43b 、及一對側壁(43c、43d)所包圍之圓弧狀之圓頂型的中空區域。The inlet-side steam discharge part 15 a and the outlet-side steam discharge part 15 b have the same configuration, and are formed in a hollow box shape extending along the width direction of the heat treatment chamber 11 . Furthermore, the inlet-side steam discharge part 15a and the outlet-side steam discharge part 15b are respectively configured to include an upper wall 43a extending arched along the top wall 11c in a cross section perpendicular to the conveyance direction X1, and extending horizontally. The lower wall 43b and a pair of side walls (43c, 43d) extending along a cross section perpendicular to the conveying direction X1. Thereby, the hollow area inside each of the inlet side water vapor discharge part 15a and the outlet side water vapor discharge part 15b is formed to be surrounded by the upper wall 43a, the lower wall 43b, and a pair of side walls (43c, 43d). The arc-shaped dome-shaped hollow area.

又,於入口側水蒸氣排出部15a及出口側水蒸氣排出部15b之各者之下壁43b,設有用以將過熱水蒸氣吸入的複數個貫通孔(省略圖示)。過熱水蒸氣分別從入口側水蒸氣排出部15a及出口側水蒸氣排出部15b被吸入,並從熱處理室11被排出。In addition, a plurality of through holes (not shown) for sucking superheated steam are provided on the lower wall 43b of each of the inlet side steam discharge part 15a and the outlet side steam discharge part 15b. The superheated water vapor is drawn in from the inlet side steam discharge part 15 a and the outlet side steam discharge part 15 b, and is discharged from the heat treatment chamber 11 .

[水蒸氣排出系統] 參照圖2及圖6至圖9,水蒸氣排出系統(16a、16b)被設為將過熱水蒸氣從入口側水蒸氣排出部15a及出口側水蒸氣排出部15b吸入並將過熱水蒸氣朝向熱處理室11之外部排出的機構。而且,水蒸氣排出系統(16a、16b)分別被連接於入口側水蒸氣排出部15a及出口側水蒸氣排出部15b。再者,水蒸氣排出系統16a被連接於入口側水蒸氣排出部15a,被吸入入口側水蒸氣排出部15a的過熱水蒸氣,會被吸入水蒸氣排出系統16a並從熱處理室11被排出。而且,水蒸氣排出系統16b被連接於出口側水蒸氣排出部15b,被吸入出口側水蒸氣排出部15b的過熱水蒸氣,會被吸入水蒸氣排出系統16b並從熱處理室11被排出。[Water vapor discharge system] Referring to Fig. 2 and Fig. 6 to Fig. 9, the steam discharge system (16a, 16b) is set to suck the superheated steam from the inlet side steam discharge part 15a and the outlet side steam discharge part 15b and direct the superheated steam towards the heat treatment The mechanism for discharging outside the chamber 11. Furthermore, the water vapor discharge systems (16a, 16b) are respectively connected to the inlet side water vapor discharge part 15a and the outlet side water vapor discharge part 15b. Furthermore, the steam discharge system 16a is connected to the inlet side steam discharge unit 15a, and the superheated steam sucked into the inlet side steam discharge unit 15a is sucked into the steam discharge system 16a and discharged from the heat treatment chamber 11. Moreover, the steam discharge system 16b is connected to the outlet side steam discharge unit 15b, and the superheated steam sucked into the outlet side steam discharge unit 15b is sucked into the steam discharge system 16b and discharged from the heat treatment chamber 11.

水蒸氣排出系統16a及水蒸氣排出系統16b被構成為相同,均被構成為具備有水蒸氣排出管44及噴射器45。The water vapor discharge system 16 a and the water vapor discharge system 16 b have the same configuration, and both are configured to include a water vapor discharge pipe 44 and an injector 45 .

水蒸氣排出系統(16a、16b)的各水蒸氣排出管44,貫通熱處理室11之頂壁11c,分別被連接於熱處理室11內的入口側水蒸氣排出部15a及出口側水蒸氣排出部15b。入口側水蒸氣排出部15a及出口側水蒸氣排出部15b之各者之內部與各水蒸氣排出管44連通,分別被吸入入口側水蒸氣排出部15a及出口側水蒸氣排出部15b的過熱水蒸氣,會被吸入各水蒸氣排出管44。又,分別被連接於入口側水蒸氣排出部15a及出口側水蒸氣排出部15b的各水蒸氣排出管44,以貫通頂壁11c的狀態被固定於頂壁11c。藉此,在熱處理室11內,入口側水蒸氣排出部15a及出口側水蒸氣排出部15b分別經由各水蒸氣排出管44,被支撐於頂壁11c。Each water vapor discharge pipe 44 of the water vapor discharge system (16a, 16b) penetrates the top wall 11c of the heat treatment chamber 11, and is connected to the inlet side water vapor discharge part 15a and the outlet side water vapor discharge part 15b in the heat treatment chamber 11 respectively. . The interior of each of the inlet-side steam discharge part 15a and the outlet-side steam discharge part 15b communicates with each steam discharge pipe 44, and the superheated water sucked into the inlet-side steam discharge part 15a and the outlet-side steam discharge part 15b respectively The steam is sucked into each steam discharge pipe 44 . Moreover, each steam discharge pipe 44 connected to the inlet side steam discharge part 15a and the outlet side steam discharge part 15b is fixed to the ceiling wall 11c in the state which penetrates the ceiling wall 11c. Thereby, in the heat treatment chamber 11 , the inlet side steam discharge part 15 a and the outlet side steam discharge part 15 b are respectively supported by the ceiling wall 11 c through the respective water vapor discharge pipes 44 .

水蒸氣排出系統(16a、16b)的各噴射器45,相對於各水蒸氣排出管44,在各水蒸氣排出管44中分別與連接於入口側水蒸氣排出部15a及出口側水蒸氣排出部15b之端部相反側的端部被連接。而且,各噴射器45被設為藉由使用高壓流體產生負壓,經由各水蒸氣排出管44分別從入口側水蒸氣排出部15a及出口側水蒸氣排出部15b抽吸過熱水蒸氣,而且將所抽吸的過熱水蒸氣朝向外部排出的機構。Each ejector 45 of the water vapor discharge system (16a, 16b) is connected to the inlet side water vapor discharge part 15a and the outlet side water vapor discharge part respectively in each water vapor discharge pipe 44 with respect to each water vapor discharge pipe 44. The ends opposite to the ends of 15b are connected. Furthermore, each ejector 45 is set to generate negative pressure by using a high-pressure fluid, suck superheated steam from the inlet-side steam discharge part 15a and the outlet-side steam discharge part 15b through each steam discharge pipe 44, and discharge A mechanism that discharges the sucked superheated steam toward the outside.

水蒸氣排出系統(16a、16b)的各噴射器45被構成為例如具備有會被供給作為高壓流體之壓縮空氣的噴嘴、覆蓋噴嘴之周圍的主體、及與主體連通並且設有朝外部開口之吐出口的擴散器。噴嘴被構成為壓縮空氣從壓縮空氣供給源(省略圖示)被供給。再者,於噴嘴之上游側,設置有根據來自後述之控制部25的控制指令而進行開閉的電磁閥,來控制朝向噴嘴之壓縮空氣的供給與排出。主體將噴嘴之下游端之周圍的區域劃分為負壓產生區域,並且被連接於各水蒸氣排出管44。再者,於主體中與各水蒸氣排出管44之下游端連接的部分,設置有根據來自控制部25的控制指令來進行開閉的電磁閥,在使噴射器45作動而進行經由各水蒸氣排出管44之過熱水蒸氣之抽吸動作的情形時,該電磁閥會被開放。Each injector 45 of the water vapor discharge system (16a, 16b) is constituted, for example, with a nozzle to which compressed air is supplied as a high-pressure fluid, a main body that covers the periphery of the nozzle, and a nozzle that communicates with the main body and is provided with an opening to the outside. Diffuser for spit outlet. The nozzle is configured such that compressed air is supplied from a compressed air supply source (not shown). In addition, on the upstream side of the nozzle, a solenoid valve that is opened and closed according to a control command from a control unit 25 described later is provided to control the supply and discharge of compressed air to the nozzle. The main body divides the area around the downstream end of the nozzle into a negative pressure generating area, and is connected to each steam discharge pipe 44 . Moreover, in the part connected to the downstream end of each water vapor discharge pipe 44 in the main body, an electromagnetic valve that is opened and closed according to a control command from the control unit 25 is provided, and the ejector 45 is activated to discharge the water vapor through each water vapor. When the superheated steam of the pipe 44 is sucked, the solenoid valve is opened.

當進行利用入口側水蒸氣排出部15a及出口側水蒸氣排出部15b之黏合劑的排出時,根據來自控制部25的控制指令,水蒸氣排出系統(16a、16b)之各噴射器45的電磁閥會被開放,噴射器45會作動。亦即,噴嘴之上游側的電磁閥被開放,並且在主體中連接於各水蒸氣排出管44之下游端之部分所設的電磁閥會被開放,各噴射器45會作動。若各噴射器45作動,藉由壓縮空氣從噴嘴以高速朝主體內吹出便會在主體內產生負壓,藉此,入口側水蒸氣排出部15a及出口側水蒸氣排出部15b之各者之內部的過熱水蒸氣,便會經由各水蒸氣排出管44被抽吸。藉由入口側水蒸氣排出部15a及出口側水蒸氣排出部15b之各者之內部的過熱水蒸氣被抽吸至各水蒸氣排出管44,熱處理室11 內的過熱水蒸氣會從被設於入口側水蒸氣排出部15a及出口側水蒸氣排出部15b之各者之下壁43b的複數個貫通孔被吸入。分別被吸入入口側水蒸氣排出部15a及出口側水蒸氣排出部15b的過熱水蒸氣,會經由各水蒸氣排出管44朝向各噴射器45的主體流動,而在主體內與從噴嘴被吹出的壓縮空氣混合。而且,混合過熱水蒸氣與壓縮空氣之狀態的混合氣體會在擴散器內朝向下游側流動,而從擴散器之排出口朝向外部被排出。如此一來,熱處理室11內之過熱水蒸氣便會分別從入口側水蒸氣排出部15a及出口側水蒸氣排出部15b被吸入,並經由各水蒸氣排出管44及各噴射器45朝向外部被排出。When discharging the adhesive using the inlet-side water vapor discharge part 15a and the outlet-side water vapor discharge part 15b, according to the control command from the control part 25, the solenoid valves of the injectors 45 of the water vapor discharge system (16a, 16b) The valve will be opened and injector 45 will be actuated. That is, the solenoid valve on the upstream side of the nozzle is opened, and the solenoid valve connected to the downstream end of each steam discharge pipe 44 in the main body is opened, and each injector 45 is activated. When each ejector 45 is activated, the compressed air is blown out from the nozzle at a high speed toward the inside of the main body to generate a negative pressure in the main body. The superheated steam inside is sucked through each steam discharge pipe 44 . The superheated steam in each of the inlet-side steam discharge part 15a and the outlet-side steam discharge part 15b is sucked into each steam discharge pipe 44, and the superheated steam in the heat treatment chamber 11 is discharged from the The plurality of through-holes of the lower wall 43b of each of the inlet-side steam discharge part 15a and the outlet-side steam discharge part 15b are sucked. The superheated steam sucked into the inlet-side steam discharge part 15a and the outlet-side steam discharge part 15b respectively flows toward the main body of each injector 45 through each steam discharge pipe 44, and is blown out from the nozzle in the main body. Compressed air mix. Then, the mixed gas in the state of mixing the superheated steam and the compressed air flows toward the downstream side in the diffuser, and is discharged toward the outside from the discharge port of the diffuser. In this way, the superheated steam in the heat treatment chamber 11 will be sucked in from the inlet side steam discharge part 15a and the outlet side steam discharge part 15b respectively, and will be discharged toward the outside through each steam discharge pipe 44 and each injector 45. discharge.

[氣體供給部] 參照圖1至圖3及圖6至圖9,氣體供給部17被設為對熱處理室11內供給惰性氣體及空氣中之至少任一者的機構。亦即,氣體供給部17被設為對熱處理室11內供給惰性氣體的機構、或被設為對熱處理室11內供給空氣的機構、或者被設為對熱處理室11內供給惰性氣體及空氣之混合氣體的機構。再者,於本實施形態中,例示有氣體供給部17被構成為對熱處理室11內供給惰性氣體之機構的形態。氣體供給部17對熱處理室11內供給的惰性氣體例如為氮氣。再者,作為氣體供給部17所供給之氮氣以外的惰性氣體,例如可例示氦氣及氬氣。[Gas Supply Unit] Referring to FIGS. 1 to 3 and FIGS. 6 to 9 , the gas supply unit 17 is provided as a mechanism for supplying at least one of an inert gas and air into the heat processing chamber 11 . That is, the gas supply unit 17 is set as a mechanism for supplying an inert gas into the heat treatment chamber 11, or as a mechanism for supplying air into the heat treatment chamber 11, or as a mechanism for supplying an inert gas and air into the heat treatment chamber 11. Mechanism for mixing gases. In addition, in this embodiment, the form in which the gas supply part 17 is comprised as the mechanism which supplies inert gas to the inside of the heat processing chamber 11 was illustrated. The inert gas supplied by the gas supply unit 17 to the heat treatment chamber 11 is, for example, nitrogen gas. In addition, as an inert gas other than nitrogen gas supplied by the gas supply part 17, helium gas and argon gas can be illustrated, for example.

於熱處理裝置1中,作為氣體供給部17,設置有入口側氣體供給部(36a、36b)、及出口側氣體供給部(37a、37b)。於熱處理室11中,入口側氣體供給部(36a、36b)相對於水蒸氣供給部13被設置在入口31側,而出口側氣體供給部(37a、37b)相對於水蒸氣供給部13被設置在出口32側。In the heat treatment apparatus 1, as the gas supply unit 17, an inlet-side gas supply unit (36a, 36b) and an outlet-side gas supply unit (37a, 37b) are provided. In the heat treatment chamber 11, the inlet-side gas supply part (36a, 36b) is provided on the inlet 31 side with respect to the water vapor supply part 13, and the outlet-side gas supply part (37a, 37b) is provided with respect to the water vapor supply part 13. On the exit 32 side.

入口側氣體供給部(36a、36b)被設置為一對,在熱處理室11中相對於水蒸氣供給部13被設置於較被設置於入口31側之入口側水蒸氣排出部15a更靠入口31側。一對入口側氣體供給部(36a、36b)分別被設為例如呈圓筒狀地延伸並且圓筒軸方向之兩端部被封閉的構件。於本實施形態中,一對入口側氣體供給部(36a、36b)被配置於與加熱區域HR之搬送方向X1平行的方向上之入口31側之端部之附近的區域。而且,一對入口側氣體供給部(36a、36b)沿著搬送方向X1排列而被配置,且入口側氣體供給部36a相對於入口側氣體供給部36b被配置於入口31側。又,各入口側氣體供給部(36a、36b)以其圓筒軸方向沿著熱處理室11之寬度方向水平地延伸的狀態,被配置於熱處理室11內。The inlet-side gas supply unit (36a, 36b) is provided as a pair, and is provided closer to the inlet 31 than the inlet-side steam discharge unit 15a provided on the inlet 31 side with respect to the water vapor supply unit 13 in the heat treatment chamber 11. side. The pair of inlet-side gas supply parts (36a, 36b) are each formed, for example, as a member extending in a cylindrical shape and having both ends in the direction of the cylinder axis closed. In this embodiment, a pair of inlet side gas supply part (36a, 36b) is arrange|positioned in the area|region near the end part of the inlet 31 side in the direction parallel to the conveyance direction X1 of heating region HR. Furthermore, a pair of inlet side gas supply part (36a, 36b) is arrange|positioned along the conveyance direction X1, and the inlet side gas supply part 36a is arrange|positioned at the inlet 31 side with respect to the inlet side gas supply part 36b. In addition, each inlet-side gas supply part (36a, 36b) is arranged in the heat treatment chamber 11 in a state in which the cylinder axis direction extends horizontally along the width direction of the heat treatment chamber 11.

又,各入口側氣體供給部(36a、36b)在其圓筒軸方向上之大致中央位置,連接於供給惰性氣體之後述之氣體供給系統18的各分支配管(48a、48b)。再者,入口側氣體供給部36a連接於分支配管48a連接,而入口側氣體供給部36b連接於分支配管48b。各分支配管(48a、48b)貫通熱處理室11的頂壁11c,並連接於熱處理室11內的各入口側氣體供給部(36a、36b)。與各入口側氣體供給部(36a、36b)連接的各分支配管(48a、48b),以貫通頂壁11c的狀態被固定於頂壁11c。藉此,於熱處理室11內,各入口側氣體供給部(36a、36b)藉由各分支配管(48a、48b)而被支撐於頂壁11c。In addition, each inlet-side gas supply part (36a, 36b) is connected to each branch pipe (48a, 48b) of the gas supply system 18 described later for supplying an inert gas at a substantially center position in the direction of the cylinder axis. Furthermore, the inlet side gas supply part 36a is connected to the branch pipe 48a, and the inlet side gas supply part 36b is connected to the branch pipe 48b. Each branch pipe (48a, 48b) penetrates through the ceiling wall 11c of the heat treatment chamber 11, and is connected to each inlet side gas supply part (36a, 36b) in the heat treatment chamber 11. Each branch pipe (48a, 48b) connected to each inlet-side gas supply part (36a, 36b) is fixed to the ceiling wall 11c in a state penetrating through the ceiling wall 11c. Thereby, in the heat processing chamber 11, each inlet side gas supply part (36a, 36b) is supported by the ceiling wall 11c via each branch pipe (48a, 48b).

各入口側氣體供給部(36a、36b)之內部與各分支配管(48a、48b)的內部連通,從各分支配管(48a、48b)所供給的惰性氣體,會被供給至各入口側氣體供給部(36a、36b) 的內部。又,於各入口側氣體供給部(36a、36b)設有複數個噴嘴孔(省略圖示)。複數個噴嘴孔於各入口側氣體供給部(36a、36b),沿著其圓筒軸方向呈直線狀地排列而被配置,例如等間隔地排列而被配置。又,於各入口側氣體供給部(36a、36b)沿著圓筒軸方向被配置的複數個噴嘴孔均朝向下方開口。因此,惰性氣體會從各入口側氣體供給部(36a、36b)朝向下方被吹出。The inside of each inlet-side gas supply unit (36a, 36b) communicates with the inside of each branch pipe (48a, 48b), and the inert gas supplied from each branch pipe (48a, 48b) is supplied to each inlet-side gas supply unit. the interior of the portion (36a, 36b). Moreover, a plurality of nozzle holes (not shown) are provided in each inlet side gas supply part (36a, 36b). A plurality of nozzle holes are arranged linearly along the cylindrical axis direction of each inlet-side gas supply part (36a, 36b), for example, arranged at equal intervals. Moreover, the plurality of nozzle holes arranged along the cylinder axis direction in each inlet-side gas supply part (36a, 36b) all open downward. Therefore, the inert gas is blown downward from each inlet side gas supply part (36a, 36b).

根據上述的構成,從各分支配管(48a、48b)朝向各入口側氣體供給部(36a、36b)被供給的惰性氣體,會充滿在各入口側氣體供給部(36a、36b)內,而且會從複數個噴嘴孔朝向下方而朝向外部吹出。而且,藉由惰性氣體從複數個噴嘴孔吹出,惰性氣體會從各入口側氣體供給部(36a、36b)被供給至熱處理室11內。藉由惰性氣體被從設置於較入口側水蒸氣排出部15a更靠入口31側的入口側氣體供給部(36a、36b)被供給,在入口31與入口側水蒸氣排出部15a之間,熱處理室11內的環境氛圍會被分離。According to the above structure, the inert gas supplied from each branch pipe (48a, 48b) toward each inlet-side gas supply part (36a, 36b) fills each inlet-side gas supply part (36a, 36b), and It blows out toward the outside from the plurality of nozzle holes downward. Then, the inert gas is supplied into the heat treatment chamber 11 from each inlet-side gas supply part (36a, 36b) by blowing the inert gas from the plurality of nozzle holes. The inert gas is supplied from the inlet-side gas supply part (36a, 36b) provided on the side of the inlet 31 than the inlet-side water vapor discharge part 15a, between the inlet 31 and the inlet-side water vapor discharge part 15a, heat treatment The ambient atmosphere in chamber 11 will be separated.

出口側氣體供給部(37a、37b)被設置為一對,且在熱處理室11中相對於水蒸氣供給部13被設在較被設於出口32側之出口側水蒸氣排出部15b更靠出口32側。一對出口側氣體供給部(37a、37b)分別被設為例如呈圓筒狀地延伸並且圓筒軸方向的兩端部被封閉的構件。於本實施形態中,一對出口側氣體供給部(37a、37b)被配置於與加熱區域HR之搬送方向X1平行之方向上之出口32側之端部之附近的區域。而且,一對出口側氣體供給部(37a、37b)沿著搬送方向X1排列而被配置,出口側氣體供給部37b相對於出口側氣體供給部37a被配置於出口32側。又,各出口側氣體供給部(37a、37b)以其圓筒軸方向沿著熱處理室11之寬度方向水平地延伸的狀態,被配置於熱處理室11內。The outlet-side gas supply part (37a, 37b) is provided as a pair, and is provided in the heat treatment chamber 11 with respect to the water vapor supply part 13, and is arranged closer to the outlet than the outlet-side water vapor discharge part 15b provided on the outlet 32 side. 32 sides. The pair of outlet-side gas supply parts (37a, 37b) are each formed, for example, as a member extending in a cylindrical shape and having both ends in the direction of the cylinder axis closed. In this embodiment, a pair of outlet side gas supply part (37a, 37b) is arrange|positioned in the area|region near the end part of the outlet 32 side in the direction parallel to the conveyance direction X1 of heating region HR. And a pair of outlet side gas supply part (37a, 37b) is arrange|positioned along the conveyance direction X1, and the outlet side gas supply part 37b is arrange|positioned at the outlet 32 side with respect to the outlet side gas supply part 37a. In addition, each outlet-side gas supply part (37a, 37b) is arranged in the heat treatment chamber 11 in a state in which the cylinder axis direction extends horizontally along the width direction of the heat treatment chamber 11.

又,各出口側氣體供給部(37a、37b)於其圓筒軸方向上的大致中央位置,連接於供給惰性氣體之後述之氣體供給系統18的各分支配管(48c、48d)。再者,出口側氣體供給部37a連接於分支配管48c,而出口側氣體供給部37b連接於分支配管48d。各分支配管(48c、48d)貫通熱處理室11的頂壁11c,與熱處理室11內的各出口側氣體供給部(37a、37b)連接。連接於各出口側氣體供給部(37a、37b)的各分支配管(48c、48d),以貫通頂壁11c的狀態被固定於頂壁11c。藉此,於熱處理室11內,各出口側氣體供給部(37a、37b)經由各分支配管(48c、48d),被支撐於頂壁11c。In addition, each outlet side gas supply part (37a, 37b) is connected to each branch pipe (48c, 48d) of the gas supply system 18 described later for supplying inert gas at approximately the center position in the direction of the cylinder axis. In addition, the outlet side gas supply part 37a is connected to the branch pipe 48c, and the outlet side gas supply part 37b is connected to the branch pipe 48d. Each branch pipe (48c, 48d) penetrates through the ceiling wall 11c of the heat treatment chamber 11, and is connected to each outlet side gas supply part (37a, 37b) in the heat treatment chamber 11. Each branch pipe (48c, 48d) connected to each outlet-side gas supply part (37a, 37b) is fixed to the ceiling wall 11c in a state penetrating through the ceiling wall 11c. Thereby, in the heat processing chamber 11, each outlet side gas supply part (37a, 37b) is supported by the ceiling wall 11c via each branch pipe (48c, 48d).

各出口側氣體供給部(37a、37b)之內部與各分支配管(48c、48d)的內部連通,從各分支配管(48c、48d)所供給的惰性氣體,會被供給至各出口側氣體供給部(37a、37b)的內部。又,於各出口側氣體供給部(37a、37b)設有複數個噴嘴孔(省略圖示)。複數個噴嘴孔在各出口側氣體供給部(37a、37b)中,沿著其圓筒軸方向呈直線狀地排列而被配置,例如等間隔地排列而被配置。又,於各出口側氣體供給部(37a、37b),沿著圓筒軸方向被配置的複數個噴嘴孔均朝向下方開口。因此,惰性氣體會從各出口側氣體供給部(37a、37b)朝向下方被吹出。The inside of each outlet-side gas supply unit (37a, 37b) communicates with the inside of each branch pipe (48c, 48d), and the inert gas supplied from each branch pipe (48c, 48d) is supplied to each outlet-side gas supply unit. The interior of the portion (37a, 37b). In addition, a plurality of nozzle holes (not shown) are provided in each outlet-side gas supply part (37a, 37b). The plurality of nozzle holes are arranged linearly along the direction of the cylindrical axis in each outlet-side gas supply part (37a, 37b), for example, arranged at equal intervals. Moreover, in each outlet side gas supply part (37a, 37b), the some nozzle hole arrange|positioned along the cylinder axial direction opens downward. Therefore, the inert gas is blown downward from each outlet-side gas supply part (37a, 37b).

根據上述的構成,從各分支配管(48c、48d)朝向各出口側氣體供給部(37a、37b)被供給的惰性氣體,會充滿各出口側氣體供給部(37a、37b)內,而且會從複數個噴嘴孔朝向下方而朝向外部吹出。而且,通過從複數個噴嘴孔吹出惰性氣體,從各出口側氣體供給部(37a、37b)向熱處理室11內供給惰性氣體。通過從設置在比出口側水蒸氣排出部15b更靠出口32側的位置的出口側氣體供給部(37a、37b)供給惰性氣體,在出口32和出口側水蒸氣排出部15b之間,熱處理室11內的環境氛圍被分離。According to the above-mentioned structure, the inert gas supplied from each branch pipe (48c, 48d) toward each outlet side gas supply part (37a, 37b) will fill the inside of each outlet side gas supply part (37a, 37b), and will flow from A plurality of nozzle holes direct downward and blow out toward the outside. Then, the inert gas is supplied into the heat treatment chamber 11 from each outlet side gas supply part (37a, 37b) by blowing the inert gas from the plurality of nozzle holes. By supplying an inert gas from an outlet-side gas supply unit (37a, 37b) arranged at a position closer to the outlet 32 side than the outlet-side steam discharge unit 15b, between the outlet 32 and the outlet-side steam discharge unit 15b, the heat treatment chamber The ambient atmosphere within 11 is separated.

[氣體供給系統] 參照圖2及圖6至圖9,氣體供給系統18被設為對氣體供給部17供給惰性氣體的機構。而且,氣體供給系統18被構成為具備有惰性氣體供給源46、共同配管47、分支配管(48a、48b、48c、48d)、及氣體供給閥(49a、49b、49c、49d)。[Gas supply system] Referring to FIGS. 2 and 6 to 9 , the gas supply system 18 is provided as a mechanism for supplying an inert gas to the gas supply unit 17 . Furthermore, the gas supply system 18 is configured to include an inert gas supply source 46, a common pipe 47, branch pipes (48a, 48b, 48c, 48d), and gas supply valves (49a, 49b, 49c, 49d).

惰性氣體供給源46被設為供給大氣壓以上之高壓之惰性氣體的供給源,例如被構成為儲藏有被壓縮為大氣壓以上之高壓的狀態之惰性氣體的槽或儲氣瓶等之容器。共同配管46a被連接於惰性氣體供給源46,被設為用以將高壓的惰性氣體從惰性氣體供給源46供給至分支配管(48a、48b、48c、48d)的配管系統。The inert gas supply source 46 is a supply source for supplying high-pressure inert gas equal to or higher than atmospheric pressure, and is configured as a tank or a container such as a gas cylinder storing the inert gas compressed to a high pressure equal to or higher than atmospheric pressure, for example. The common piping 46a is connected to the inert gas supply source 46, and is set as a piping system for supplying high-pressure inert gas from the inert gas supply source 46 to the branch pipes (48a, 48b, 48c, 48d).

分支配管(48a、48b、48c、48d)從共同配管47分支,被設為將共同配管47與氣體供給部17之入口側氣體供給部(36a、36b)及出口側氣體供給部(37a、37b)加以連接的配管系統。4個分支配管(48a、48b、48c、48d)從共同配管47並列地分支。而且,各分支配管(48a、48b)分別連接於各入口側氣體供給部(36a、36b),而各分支配管(48c、48d)分別連接於各出口側氣體供給部(37a、37b)。具體而言,分支配管48a被構成為將共同配管47與入口側氣體供給部36a加以連接,而將惰性氣體供給至入口側氣體供給部36a。分支配管48b被構成為將共同配管47與入口側氣體供給部36b加以連接,而將惰性氣體供給至入口側氣體供給部36b。分支配管48c被構成為將共同配管47與出口側氣體供給部37a加以連接,而將惰性氣體供給至出口側氣體供給部37a。分支配管48d被構成為將共同配管47與出口側氣體供給部37b加以連接,而將惰性氣體供給至出口側氣體供給部37b。The branch pipes (48a, 48b, 48c, 48d) are branched from the common pipe 47, and are set to connect the common pipe 47 and the inlet-side gas supply part (36a, 36b) and the outlet-side gas supply part (37a, 37b) of the gas supply part 17. ) to the piping system connected. Four branch pipes ( 48 a , 48 b , 48 c , 48 d ) are branched from the common pipe 47 in parallel. Furthermore, each branch pipe (48a, 48b) is connected to each inlet-side gas supply part (36a, 36b), and each branch pipe (48c, 48d) is connected to each outlet-side gas supply part (37a, 37b). Specifically, the branch pipe 48a is configured to connect the common pipe 47 and the inlet side gas supply part 36a, and to supply inert gas to the inlet side gas supply part 36a. The branch pipe 48b is configured to connect the common pipe 47 and the inlet-side gas supply part 36b, and supply inert gas to the inlet-side gas supply part 36b. The branch pipe 48c is configured to connect the common pipe 47 and the outlet-side gas supply part 37a, and to supply inert gas to the outlet-side gas supply part 37a. The branch pipe 48d is configured to connect the common pipe 47 and the outlet-side gas supply part 37b, and to supply the inert gas to the outlet-side gas supply part 37b.

氣體供給閥(49a、49b、49c、49d)分別被設為電磁閥,且分別被設於分支配管(48a、48b、48c、48d)。再者,氣體供給閥49a被設於分支配管48a,氣體供給閥49b被設於分支配管48b,氣體供給閥49c被設於分支配管48c,而氣體供給閥49d被設於分支配管48d。各氣體供給閥(49a、49b、49c、49d)被構成為藉由進行開閉動作,而將各個分支配管(48a、48b、48c、48d)的狀態在開放狀態與封閉狀態之間進行切換。各氣體供給閥(49a、49b、49c、49d)根據來自控制部 25 的控制指令作動。在各氣體供給閥(49a、49b、49c、49d)根據來自控制部 25  的控制指令進行打開動作,而各分支配管(48a、48b、48c、48d)的狀態被切換為開放狀態時,惰性氣體供給源46與各入口側氣體供給部(36a、36b)及各出口側氣體供給部(37a、37b)會經由共同配管47與各分支配管(48a、48b、48c、48d)而連通。藉此,會從惰性氣體供給源46被供給的惰性氣體,便會經由共同配管47及各分支配管(48a、48b、48c、48d)被供給至各入口側氣體供給部(36a、36b)及各出口側氣體供給部(37a、37b)。然後,惰性氣體會從各入口側氣體供給部(36a、36b)及各出口側氣體供給部(37a、37b)被供給至熱處理室11內。再者,根據來自控制部25的控制指令,各氣體供給閥(49a、49b、49c、49d)進行關閉動作,在各分支配管(48a、48b、48c、48d)的狀態被切換為關閉狀態而連通被切斷時,惰性氣體不會被供給至熱處理室11。Gas supply valves (49a, 49b, 49c, 49d) are electromagnetic valves, respectively, and are provided in branch pipes (48a, 48b, 48c, 48d). Furthermore, the gas supply valve 49a is provided in the branch pipe 48a, the gas supply valve 49b is provided in the branch pipe 48b, the gas supply valve 49c is provided in the branch pipe 48c, and the gas supply valve 49d is provided in the branch pipe 48d. Each gas supply valve (49a, 49b, 49c, 49d) is configured to switch the state of each branch pipe (48a, 48b, 48c, 48d) between an open state and a closed state by performing an opening and closing operation. Each gas supply valve (49a, 49b, 49c, 49d) operates according to a control command from the control unit 25. When each gas supply valve (49a, 49b, 49c, 49d) is opened according to the control command from the control unit 25, and the state of each branch pipe (48a, 48b, 48c, 48d) is switched to the open state, the inert gas The supply source 46 communicates with each inlet-side gas supply unit (36a, 36b) and each outlet-side gas supply unit (37a, 37b) via a common pipe 47 and each branch pipe (48a, 48b, 48c, 48d). Thereby, the inert gas supplied from the inert gas supply source 46 is supplied to each inlet side gas supply part (36a, 36b) and Each outlet-side gas supply unit (37a, 37b). Then, an inert gas is supplied into the heat treatment chamber 11 from each inlet side gas supply part (36a, 36b) and each outlet side gas supply part (37a, 37b). Furthermore, each gas supply valve (49a, 49b, 49c, 49d) is closed according to a control command from the control unit 25, and the state of each branch pipe (48a, 48b, 48c, 48d) is switched to the closed state. When the communication is cut off, the inert gas is not supplied to the heat treatment chamber 11 .

[入口側排氣部、出口側排氣部] 參照圖1至圖3及圖6至圖9,入口側排氣部19及出口側排氣部20被設為用以將熱處理室11內之氣體朝向熱處理室11之外部排氣的機構。[Inlet side exhaust, outlet side exhaust] Referring to FIGS. 1 to 3 and FIGS. 6 to 9 , the inlet side exhaust unit 19 and the outlet side exhaust unit 20 are provided as mechanisms for exhausting the gas in the heat treatment chamber 11 to the outside of the heat treatment chamber 11 .

入口側排氣部19於熱處理室11中,被設於一對入口側氣體供給部(36a、36b)之間。亦即,入口側排氣部19於熱處理室11中,被設於入口側氣體供給部36a與入口側氣體供給部36b之間的區域。因此,於熱處理室11內之較入口側水蒸氣排出部15a更靠入口31側的區域內,從入口側水蒸氣排出部15a側朝向入口31側,入口側水蒸氣排出部15a、入口側氣體供給部36b、入口側排氣部19、及入口側氣體供給部36a會依此順序被配置。又,入口側排氣部19於熱處理室11內之一對入口側氣體供給部(36a、36b)之間的區域內,被配置於頂壁11c側的區域、即熱處理室11之與搬送方向X1垂直之截面上之上半部分側的區域。The inlet-side exhaust unit 19 is provided between the pair of inlet-side gas supply units (36a, 36b) in the heat treatment chamber 11. That is, the inlet-side exhaust unit 19 is provided in a region between the inlet-side gas supply unit 36 a and the inlet-side gas supply unit 36 b in the heat treatment chamber 11 . Therefore, in the region of the heat treatment chamber 11 closer to the inlet 31 than the inlet-side steam discharge portion 15a, from the inlet-side steam discharge portion 15a side toward the inlet 31 side, the inlet-side steam discharge portion 15a, the inlet-side gas The supply part 36b, the inlet-side exhaust part 19, and the inlet-side gas supply part 36a are arranged in this order. In addition, the inlet-side exhaust unit 19 is arranged in the area between the pair of inlet-side gas supply units (36a, 36b) in the heat treatment chamber 11, in the area on the side of the ceiling wall 11c, that is, in the direction of the heat treatment chamber 11 and the transfer direction. The area on the upper half side of the vertical section of X1.

出口側排氣部20於熱處理室11,被設於一對出口側氣體供給部(37a、37b)之間。亦即,出口側排氣部20於熱處理室11中,被設於出口側氣體供給部37a與出口側氣體供給部37b之間的區域。因此,於熱處理室11內之較出口側水蒸氣排出部15b更靠出口32側的區域內,從出口側水蒸氣排出部15b側朝向出口32側,出口側水蒸氣排出部15b、出口側氣體供給部37a、出口側排氣部20、及出口側氣體供給部36b依次順序地被配置。又,出口側排氣部20於熱處理室11內之一對出口側氣體供給部(37a、37b)之間的區域內,被配置於頂壁11c側的區域、即熱處理室11之與搬送方向X1垂直之截面之上半部分側的區域。The outlet side exhaust unit 20 is provided in the heat treatment chamber 11 between a pair of outlet side gas supply units (37a, 37b). That is, the outlet-side exhaust unit 20 is provided in a region between the outlet-side gas supply unit 37 a and the outlet-side gas supply unit 37 b in the heat treatment chamber 11 . Therefore, in the region of the heat treatment chamber 11 closer to the outlet 32 side than the outlet-side steam discharge part 15b, from the outlet-side steam discharge part 15b side toward the outlet 32 side, the outlet-side steam discharge part 15b, the outlet-side gas The supply part 37a, the outlet-side exhaust part 20, and the outlet-side gas supply part 36b are sequentially arranged in this order. In addition, the outlet side exhaust part 20 is arranged in the region between the pair of outlet side gas supply parts (37a, 37b) in the heat treatment chamber 11, in the region on the side of the ceiling wall 11c, that is, in the direction of the heat treatment chamber 11 and the transfer direction. The area on the side of the upper half of the cross-section perpendicular to X1.

入口側排氣部19及出口側排氣部20被構成為相同,被形成為沿著熱處理室11之寬度方向延伸之中空的箱狀。而且,入口側排氣部19及出口側排氣部20被構成為分別具備有在與搬送方向X1垂直之截面上沿著頂壁11c呈拱形地延伸的上壁50a、水平延伸的下壁50b、沿著與搬送方向X1垂直的截面延伸的一對側壁(50c、50d)。藉此, 入口側排氣部19及出口側排氣部20之各者之內側的中空區域,被形成為由上壁50a、下壁50b、及一對側壁(50c、50d)所包圍之圓弧狀之圓頂型的中空區域。The inlet-side exhaust section 19 and the outlet-side exhaust section 20 have the same configuration, and are formed in a hollow box shape extending along the width direction of the heat treatment chamber 11 . Furthermore, the inlet-side exhaust unit 19 and the outlet-side exhaust unit 20 are each provided with an upper wall 50a extending arcuately along the top wall 11c in a cross section perpendicular to the conveyance direction X1, and a lower wall extending horizontally. 50b, a pair of side walls (50c, 50d) extending along a cross section perpendicular to the conveyance direction X1. Thereby, the hollow area inside each of the inlet side exhaust part 19 and the outlet side exhaust part 20 is formed as a circle surrounded by the upper wall 50a, the lower wall 50b, and a pair of side walls (50c, 50d). Arc-shaped dome-shaped hollow area.

又,於入口側排氣部19及出口側排氣部20之各者之下壁50b,設有用以吸入熱處理室11內之氣體的複數個貫通孔(省略圖示)。熱處理室11內的氣體,會分別從入口側排氣部19及出口側排氣部20被吸入並從熱處理室11被排出。再者,從入口側排氣部19,從入口側氣體供給部36b被供給至熱處理室 11 內的惰性氣體、從入口側氣體供給部36a被供給至熱處理室11內並朝向與入口31側為相反側流動的惰性氣體、及未由入口側水蒸氣排出部15a所排出而朝向入口31側流動之些微的過熱水蒸氣,會作為熱處理室11內的氣體被吸入並被排出。又,從出口側排氣部20,從出口側氣體供給部37a被供給至熱處理室11內的惰性氣體、從出口側氣體供給部37b被供給至熱處理室11內並朝向與出口32側而相反側流動的惰性氣體、及未由出口側水蒸氣排出部15b所排出而朝向出口32側流動之些微的過熱水蒸氣,會作為熱處理室11內的氣體被吸入並被排出。In addition, a plurality of through holes (not shown) for sucking the gas in the heat treatment chamber 11 are provided on the lower wall 50b of each of the inlet side exhaust part 19 and the outlet side exhaust part 20 . The gas in the heat processing chamber 11 is sucked in from the inlet side exhaust part 19 and the outlet side exhaust part 20 and discharged from the heat processing chamber 11 . Furthermore, from the inlet side exhaust part 19, the inert gas supplied into the heat treatment chamber 11 from the inlet side gas supply part 36b is supplied into the heat treatment chamber 11 from the inlet side gas supply part 36a, and is directed toward the direction opposite to the inlet side 31 side. The inert gas flowing on the opposite side and the slightly superheated steam flowing toward the inlet 31 without being discharged from the inlet-side steam discharge unit 15 a are sucked and discharged as gas in the heat treatment chamber 11 . In addition, from the outlet side exhaust part 20, the inert gas supplied from the outlet side gas supply part 37a into the heat treatment chamber 11 is supplied into the heat treatment chamber 11 from the outlet side gas supply part 37b, and is directed opposite to the outlet 32 side. The inert gas flowing sideways and the slightly superheated steam flowing toward the outlet 32 without being discharged from the outlet-side steam discharge unit 15 b are sucked into and discharged as gas in the heat treatment chamber 11 .

[排氣系統] 參照圖2及圖6至圖9,排氣系統(21a、21b)被設為將熱處理室11內的氣體從入口側排氣部19及出口側排氣部20吸入並將該所吸入的氣體朝向熱處理室11的外部排氣的機構。而且,排氣系統(21a、21b)分別被連接於入口側排氣部19及出口側排氣部20。再者,排氣系統21a被連接於入口側排氣部19,被吸入入口側排氣部19之熱處理室11內的氣體,會被吸入排氣系統21a並從熱處理室11被排出。而且,排氣系統21b被連接於出口側排氣部20,被吸入出口側排氣部20之熱處理室11內的氣體,會被吸入排氣系統21b並從熱處理室11被排出。[exhaust system] Referring to Fig. 2 and Fig. 6 to Fig. 9, exhaust system (21a, 21b) is set as the gas in the heat treatment chamber 11 is sucked from inlet side exhaust part 19 and outlet side exhaust part 20 and the gas sucked A mechanism for exhausting air toward the outside of the heat treatment chamber 11 . Furthermore, exhaust systems (21a, 21b) are connected to the inlet side exhaust unit 19 and the outlet side exhaust unit 20, respectively. Furthermore, the exhaust system 21a is connected to the inlet side exhaust unit 19, and the gas sucked into the heat treatment chamber 11 of the inlet side exhaust unit 19 is drawn into the exhaust system 21a and discharged from the heat treatment chamber 11. Furthermore, the exhaust system 21b is connected to the outlet side exhaust unit 20, and the gas sucked into the heat treatment chamber 11 of the outlet side exhaust unit 20 is sucked into the exhaust system 21b and discharged from the heat treatment chamber 11.

排氣系統21a及排氣系統21b被構成為相同,均被構成為具備有氣體排氣管51及噴射器52。The exhaust system 21 a and the exhaust system 21 b have the same configuration, and both are configured to include a gas exhaust pipe 51 and an injector 52 .

排氣系統(21a、21b)的各氣體排氣管51貫通熱處理室11的頂壁11c,分別被連接於熱處理室11內的入口側排氣部19及出口側排氣部20。入口側排氣部19及出口側排氣部20之各者之內部與各氣體排氣管51連通,分別被吸入入口側排氣部19及出口側排氣部20的氣體,會被吸入各氣體排氣管51。又,分別被連接於入口側排氣部19及出口側排氣部20的各氣體排氣管51,以貫通頂壁11c的狀態被固定於頂壁11c。藉此,於熱處理室11內,入口側排氣部19及出口側排氣部20分別經由各氣體排氣管51被支撐於頂壁11c。Each gas exhaust pipe 51 of the exhaust system (21a, 21b) penetrates the ceiling wall 11c of the heat treatment chamber 11, and is respectively connected to the inlet side exhaust part 19 and the outlet side exhaust part 20 in the heat treatment chamber 11. The inside of each of the inlet side exhaust part 19 and the outlet side exhaust part 20 communicates with each gas exhaust pipe 51, and the gas sucked into the inlet side exhaust part 19 and the outlet side exhaust part 20 respectively will be sucked into each Gas exhaust pipe 51. Moreover, each gas exhaust pipe 51 connected to the inlet side exhaust part 19 and the outlet side exhaust part 20 is fixed to the ceiling wall 11c in the state which penetrated the ceiling wall 11c. Thereby, in the heat processing chamber 11, the inlet side exhaust part 19 and the outlet side exhaust part 20 are supported by the ceiling wall 11c via each gas exhaust pipe 51, respectively.

排氣系統(21a、21b)的各噴射器52相對於各氣體排氣管51,在各氣體排氣管51中分別與連接於入口側排氣部19及出口側排氣部20之端部相反側的端部被連接。而且,各噴射器52被設為藉由使用高壓流體產生負壓,經由各氣體排氣管51分別從入口側排氣部19及出口側排氣部20抽吸氣體,而且將所抽吸之氣體朝向外部排出的機構。排氣系統(21a、21b)的各噴射器 52 與水蒸氣排出系統(16a、16b)的各噴射器45被構成為相同。亦即,各噴射器52被構成為具備有會被供給作為高壓流體之壓縮空氣的噴嘴、覆蓋噴嘴之周圍的主體、及與主體連通並且設有朝向外部開口之吐出口的擴散器。而且,噴射器52的動作係藉由被設於噴嘴之上游側及主體中連接於氣體排氣管51之下游端的部分的電磁閥根據來自後述之控制部25的控制指令進行開閉而被控制。Each injector 52 of the exhaust system (21a, 21b) is opposite to each gas exhaust pipe 51, and in each gas exhaust pipe 51, it is respectively connected to the end of the inlet side exhaust part 19 and the outlet side exhaust part 20. Ends on opposite sides are connected. Also, each injector 52 is set to generate negative pressure by using a high-pressure fluid, sucks gas from the inlet side exhaust part 19 and the outlet side exhaust part 20 respectively through each gas exhaust pipe 51, and discharges the sucked gas. The mechanism by which gas is discharged toward the outside. Each injector 52 of the exhaust system (21a, 21b) and each injector 45 of the water vapor discharge system (16a, 16b) have the same configuration. That is, each injector 52 is configured to include a nozzle to which compressed air as high-pressure fluid is supplied, a main body covering the periphery of the nozzle, and a diffuser communicating with the main body and having an outlet opening to the outside. The operation of the injector 52 is controlled by opening and closing the solenoid valve provided on the upstream side of the nozzle and the part of the main body connected to the downstream end of the gas exhaust pipe 51 according to a control command from the control unit 25 described later.

當進行利用入口側排氣部19及出口側排氣部20所進行之熱處理室11內之氣體的排出時,根據來自控制部25的控制指令,排氣系統(21a、21b)之各噴射器52的電磁閥會被開放,噴射器52會作動。亦即,噴嘴之上游側的電磁閥會被開放,並且在主體中連接於各氣體排氣管51之下游端之部分所設的電磁閥會被開放,各噴射器52會作動。藉由各噴射器52作動,入口側排氣部19及出口側排氣部20之各者之內部的氣體會經由各氣體排氣管51被抽吸。藉由入口側排氣部19及出口側排氣部20之各者之氣體被抽吸至各氣體排氣管51,熱處理室11內的氣體會從被設於入口側排氣部19及出口側排氣部20之各者之下壁50b的複數個貫通孔被吸入。分別被吸入入口側排氣部19及出口側排氣部20的氣體,會經由各氣體排氣管51朝向各噴射器52的主體流動,而在主體內與壓縮空氣混合,並從各噴射器52之擴散器的吐出口朝向外部被排出。如此一來,熱處理室11內之氣體便會分別從入口側排氣部19及出口側排氣部20被吸入,並經由各氣體排氣管51及各噴射器52朝向外部被排出。When the gas in the heat treatment chamber 11 carried out by the inlet side exhaust part 19 and the outlet side exhaust part 20 is discharged, according to the control command from the control part 25, each injector of the exhaust system (21a, 21b) The solenoid valve of 52 will be opened, and injector 52 will be actuated. That is, the solenoid valve on the upstream side of the nozzle is opened, and the solenoid valve provided in the part of the main body connected to the downstream end of each gas exhaust pipe 51 is opened, and each injector 52 is activated. The gas inside each of the inlet side exhaust part 19 and the outlet side exhaust part 20 is sucked through each gas exhaust pipe 51 by the operation of each injector 52 . The gas in each of the inlet-side exhaust part 19 and the outlet-side exhaust part 20 is sucked into each gas exhaust pipe 51, and the gas in the heat treatment chamber 11 will flow from the inlet-side exhaust part 19 and the outlet. The plurality of through-holes of the lower wall 50b of each of the side exhaust parts 20 are sucked. The gas sucked into the inlet side exhaust part 19 and the outlet side exhaust part 20 respectively will flow towards the main body of each injector 52 through each gas exhaust pipe 51, and mix with the compressed air in the main body, and be discharged from each injector. The outlet of the diffuser at 52 is discharged toward the outside. In this way, the gas in the heat treatment chamber 11 is sucked in from the inlet side exhaust part 19 and the outlet side exhaust part 20 respectively, and is discharged to the outside through each gas exhaust pipe 51 and each injector 52 .

[隔板] 參照圖1至圖9,隔板22設有複數個,於本實施形態中,作為複數個隔板22,而設有隔板(22a、22b、22c、22d、22e、22f、22g、22h、22i、22j)。複數個隔板22(22a~j)在熱處理室11內沿著搬送方向X1被配置。[partition] Referring to Fig. 1 to Fig. 9, the partition board 22 is provided with a plurality of, in this embodiment, as a plurality of partition boards 22, and partition board (22a, 22b, 22c, 22d, 22e, 22f, 22g, 22h, 22i, 22j). A plurality of partition plates 22 ( 22 a to j ) are arranged along the transfer direction X1 in the heat treatment chamber 11 .

各隔板22(22a~j)被設為僅局部地封閉熱處理室11之與搬送方向X1垂直之截面之上半部分之平板狀的構件。又,各隔板22(22a~j)之上端的邊緣部分沿著頂壁11c被配置,並相對於頂壁11c被固定。而且,各隔板22(22a~j)在熱處理室11內之上半部分的區域,以沿著熱處理室11之與搬送方向X1垂直的截面擴展的方式被設置。各隔板22(22a~j)藉由如上述般被設置,被構成為局部地限制熱處理室11內之與被處理物10之搬送方向X1平行之方向上之氣體的流動。再者,於本實施形態中,各隔板22(22a~j)被構成為在熱處理室11之與搬送方向X1垂直的截面上,限制上半部分側之區域之氣體的流動,並容許下半部分側之區域之氣體的流動。Each partition plate 22 (22a~j) is set as the plate-shaped member which partially closes only the upper half part of the cross section perpendicular|vertical to the conveyance direction X1 of the heat processing chamber 11. In addition, the edge portions of the upper ends of the respective partitions 22 (22a~j) are arranged along the top wall 11c, and are fixed to the top wall 11c. Furthermore, each partition plate 22 (22a~j) is provided so that it may expand along the cross section of the heat processing chamber 11 perpendicular|vertical to the conveyance direction X1 in the upper half area in the heat processing chamber 11. Each partition plate 22 (22a~j) is provided as mentioned above, and is comprised so that the flow of the gas in the direction parallel to the conveyance direction X1 of the object 10 in the thermal processing chamber 11 may be partially restricted. Furthermore, in the present embodiment, each partition plate 22 (22a~j) is configured to restrict the flow of gas in the region on the upper half side of the heat treatment chamber 11 on a cross section perpendicular to the transfer direction X1, and to allow the flow of the lower part. Gas flow in the area on the side of the half.

又,參照圖2、圖3、圖6、圖7,複數個隔板22中之隔板(22a、22b)被設為本實施形態中之入口側隔板(22a、22b)。入口側隔板(22a、22b)分別被設於一對入口側氣體供給部(36a、36b)之各者與入口側排氣部19之間。更具體而言,入口側隔板22a被設於入口側氣體供給部36a與入口側排氣部19之間,相對於入口側排氣部19在入口31側相鄰地被配置。又,入口側隔板22b被設於入口側排氣部19與入口側氣體供給部36b之間,相對於入口側排氣部19在出口32側相鄰地被配置。2, FIG. 3, FIG. 6, and FIG. 7, the partitions (22a, 22b) among the plurality of partitions 22 are set as inlet side partitions (22a, 22b) in this embodiment. The inlet-side partition plates (22a, 22b) are provided between each of the pair of inlet-side gas supply parts (36a, 36b) and the inlet-side exhaust part 19, respectively. More specifically, the inlet-side partition plate 22 a is provided between the inlet-side gas supply unit 36 a and the inlet-side exhaust unit 19 , and is arranged adjacent to the inlet-side exhaust unit 19 on the inlet 31 side. Furthermore, the inlet-side partition plate 22 b is provided between the inlet-side exhaust unit 19 and the inlet-side gas supply unit 36 b, and is arranged adjacent to the inlet-side exhaust unit 19 on the outlet 32 side.

根據上述的配置構成,在熱處理室11內之入口側氣體供給部(36a、36b)之附近的區域內,從入口31側朝向出口32側入口側氣體供給部36a、入口側隔板22a、入口側排氣部19、入口側隔板22b、及入口側氣體供給部36b依次順序地排列而被設置。而且,入口側隔板(22a、22b),被構成為在入口側氣體供給部(36a、36b)之附近的區域內,局部地限制熱處理室11中之與被處理物10之搬送方向X1平行之方向上之氣體的流動。According to the above-mentioned arrangement structure, in the area near the inlet side gas supply part (36a, 36b) in the heat treatment chamber 11, the inlet side gas supply part 36a, the inlet side partition plate 22a, the inlet side gas supply part 36a, the inlet side partition plate 22a, and the The side exhaust part 19, the inlet side partition plate 22b, and the inlet side gas supply part 36b are arranged sequentially in this order. Furthermore, the inlet-side partitions (22a, 22b) are configured to partially restrict the gas flow parallel to the transfer direction X1 of the object 10 in the heat treatment chamber 11 in the vicinity of the inlet-side gas supply parts (36a, 36b). the flow of gas in that direction.

又,參照圖2、圖3、圖6、圖7,複數個隔板22中之隔板(22c、22d),在熱處理室11內被配置於入口側水蒸氣排出部15a的附近。又,隔板(22c、22d)相對於入口側水蒸氣排出部15a,被配置在搬送方向X1上之兩側。更具體而言,隔板22c被設於入口側氣體供給部36b與水蒸氣排出部15a之間,相對於入口側水蒸氣排出部15a在入口31側相鄰地被配置。又,隔板22d相對於入口側水蒸氣排出部15a在出口32側相鄰地被配置。2, FIG. 3, FIG. 6, and FIG. 7, the partitions (22c, 22d) among the plurality of partitions 22 are disposed near the inlet side steam discharge part 15a in the heat treatment chamber 11. Moreover, the partition plates (22c, 22d) are arranged on both sides in the conveyance direction X1 with respect to the inlet side steam discharge part 15a. More specifically, the partition plate 22c is provided between the inlet side gas supply part 36b and the water vapor discharge part 15a, and is arranged adjacent to the inlet side water vapor discharge part 15a on the inlet 31 side. Moreover, the partition plate 22d is arranged adjacent to the outlet 32 side with respect to the inlet side steam discharge part 15a.

又,參照圖2、圖4、圖5,複數個隔板22中之隔板(22e、22f)在熱處理室11內,被設於水蒸氣供給部13中之一對噴嘴部(38a、38b)之間。又,在隔板22e與隔板22f之間配置有後述之黏合劑排出部23。再者,隔板22e相對於黏合劑排出部23在入口31側相鄰地被配置,而隔板22f相對於黏合劑排出部23在出口32側相鄰地被配置。Again, with reference to Fig. 2, Fig. 4, Fig. 5, the partition (22e, 22f) in the plurality of partitions 22 is set in a pair of nozzle parts (38a, 38b) in the water vapor supply part 13 in the heat treatment chamber 11. )between. Moreover, the adhesive discharge part 23 mentioned later is arrange|positioned between the separator 22e and the separator 22f. In addition, the partition 22 e is arranged adjacent to the inlet 31 side with respect to the adhesive discharge part 23 , and the partition 22 f is arranged adjacent to the outlet 32 side with respect to the adhesive discharge part 23 .

又,參照圖2、圖3、圖8、圖9,複數個隔板22中之隔板(22g、22h)在熱處理室11內,被配置於出口側水蒸氣排出部15b的附近。又,隔板(22g、22h)相對於出口側水蒸氣排出部15b,被配置於搬送方向X1上之兩側。更具體而言,隔板22g相對於出口側水蒸氣排出部15b在入口31側相鄰地被配置。又,隔板22h被設於水蒸氣排出部15b與出口側氣體供給部37a之間,相對於出口側水蒸氣排出部15b在出口32側相鄰地被配置。2, FIG. 3, FIG. 8, and FIG. 9, the partitions (22g, 22h) among the plurality of partitions 22 are arranged near the outlet side steam discharge part 15b in the heat treatment chamber 11. Moreover, the separators (22g, 22h) are arranged on both sides in the conveyance direction X1 with respect to the outlet side steam discharge part 15b. More specifically, the partition plate 22g is arranged adjacent to the inlet 31 side with respect to the outlet-side steam discharge portion 15b. Moreover, the partition plate 22h is provided between the water vapor discharge part 15b and the outlet side gas supply part 37a, and is arrange|positioned adjacent to the outlet 32 side with respect to the outlet side water vapor discharge part 15b.

又,參照圖2、圖3、圖8、圖9,複數個隔板22中之隔板(22i、22j),被設為本實施形態中之出口側隔板(22i、22j)。出口側隔板(22i、22j)分別被設於一對出口側氣體供給部(37a、37b)之各者與出口側排氣部20之間。更具體而言,出口側隔板22i被設於出口側氣體供給部37a與出口側排氣部20之間,相對於出口側排氣部20在出口32側相鄰地被配置。又,出口側隔板22j被設於出口側排氣部20與出口側氣體供給部37b之間,相對於出口側排氣部20在出口32側相鄰地被配置。2, FIG. 3, FIG. 8, and FIG. 9, the partitions (22i, 22j) in the plurality of partitions 22 are set as outlet-side partitions (22i, 22j) in this embodiment. The outlet-side partitions (22i, 22j) are provided between each of the pair of outlet-side gas supply parts (37a, 37b) and the outlet-side exhaust part 20, respectively. More specifically, the outlet-side partition plate 22 i is provided between the outlet-side gas supply unit 37 a and the outlet-side exhaust unit 20 , and is arranged adjacent to the outlet-side exhaust unit 20 on the outlet 32 side. In addition, the outlet-side partition plate 22 j is provided between the outlet-side exhaust unit 20 and the outlet-side gas supply unit 37 b, and is arranged adjacent to the outlet-side exhaust unit 20 on the outlet 32 side.

根據上述的配置構成,於熱處理室11內之出口側氣體供給部(37a、37b)之附近的區域內,從入口31側朝向出口32側,出口側氣體供給部37a、出口側隔板22i、出口側排氣部20、出口側隔板22j、及出口側氣體供給部37b依此順序地排列而被設置。而且,出口側隔板(22i、22j)被構成為於出口側氣體供給部(37a、37b)之附近的區域內,局部地限制熱處理室11中之與被處理物10之搬送方向X1平行之方向上之氣體的流動。According to the above arrangement, in the area near the outlet side gas supply part (37a, 37b) in the heat treatment chamber 11, from the inlet 31 side toward the outlet 32 side, the outlet side gas supply part 37a, the outlet side partition plate 22i, The outlet-side exhaust part 20, the outlet-side partition plate 22j, and the outlet-side gas supply part 37b are arranged in this order and provided. In addition, the outlet-side partitions (22i, 22j) are configured to locally limit the direction of the heat treatment chamber 11 parallel to the conveyance direction X1 of the object 10 in the vicinity of the outlet-side gas supply parts (37a, 37b). direction of gas flow.

[黏合劑排出部] 參照圖1、圖2、圖4及圖5,黏合劑排出部23被設為當在熱處理裝置1中進行燒結處理時用以將從被處理物10所產生之氣化的黏合劑朝向熱處理室11之外部排出的機構。黏合劑排出部23例如當在熱處理裝置1中之燒結處理時,在從被處理物10會大量地產生黏合劑之情形時,被使用於用以將所大量產生之黏合劑加以排出。[Adhesive discharge part] Referring to Fig. 1, Fig. 2, Fig. 4 and Fig. 5, the adhesive discharge part 23 is configured to direct the gasified adhesive generated from the object 10 to the heat treatment chamber when the sintering process is performed in the heat treatment device 1. 11. External discharge mechanism. The binder discharge unit 23 is used to discharge a large amount of the binder generated from the object 10 during the sintering process in the heat treatment apparatus 1 , for example.

黏合劑排出部23於熱處理室11中,被配置於隔板22e與隔板22f之間,且被配置於加熱區域HR內之搬送方向X1的中央位置。隔板(22e、22f)被配置於水蒸氣供給部13的一對噴嘴部(38a、38b)之間,且相對於黏合劑排出部23,隔板22e被配置於入口31側,而隔板22f被配置於出口32側。因此,於本實施形態中,在加熱區域HR內之搬送方向X1的中央部分,從入口31側朝向出口32側,噴嘴部38a、隔板22e、黏合劑排出部23、隔板22f、及噴嘴部38b依此順序地排列而被設置。又,於熱處理室11內之隔板(22e、22f) 之間的區域內,黏合劑排出部23被配置於頂壁11c側的區域、即熱處理室11之與搬送方向X1垂直之截面上之上半部分側的區域。The adhesive discharge part 23 is arrange|positioned between the partition plate 22e and the partition plate 22f in the heat processing chamber 11, and is arrange|positioned at the center position of the conveyance direction X1 in the heating area|region HR. The partitions (22e, 22f) are arranged between the pair of nozzle parts (38a, 38b) of the steam supply part 13, and the partition board 22e is arranged on the side of the inlet 31 with respect to the adhesive discharge part 23, and the partition board 22f is arranged on the outlet 32 side. Therefore, in this embodiment, in the central part of the conveyance direction X1 in the heating region HR, from the inlet 31 side toward the outlet 32 side, the nozzle part 38a, the partition 22e, the adhesive discharge part 23, the partition 22f, and the nozzle The parts 38b are arranged in this order and provided. In addition, in the region between the partition plates (22e, 22f) in the heat treatment chamber 11, the adhesive discharge part 23 is arranged in the region on the side of the top wall 11c, that is, on the cross section of the heat treatment chamber 11 perpendicular to the conveyance direction X1. The area on the side of the upper half.

黏合劑排出部23被形成為沿著熱處理室11之寬度方向延伸之中空的箱狀。而且,黏合劑排出部23被構成為具備有在與搬送方向X1垂直之截面上沿著頂壁11c呈拱形地延伸的上壁23a、水平延伸的下壁23b、及沿著與搬送方向X1垂直之截面延伸的一對側壁(23c、23d)。藉此,黏合劑排出部23內的中空區域被形成為由上壁23a、下壁23b及一對側壁(23c、23d)所包圍之圓弧狀之圓頂型的中空區域。而且,於黏合劑排出部23的下壁23b,設有用以吸入黏合劑的複數個貫通孔(省略圖示)。再者,當黏合劑從黏合劑排出部23被吸入並從熱處理室11被排出時,黏合劑會與熱處理室11內之環境氛圍的氣體一起被吸入黏合劑排出部23而被排出。亦即,藉由熱處理室11內之環境氛圍中含有高濃度之黏合劑的氣體被吸入黏合劑排出部23,黏合劑會被吸入黏合劑排出部23並從熱處理室11被排出。The adhesive discharge part 23 is formed in the shape of a hollow box extending along the width direction of the heat treatment chamber 11 . Furthermore, the adhesive discharge unit 23 is configured to include an upper wall 23a extending arcuately along the top wall 11c in a cross section perpendicular to the conveying direction X1, a lower wall 23b extending horizontally, and an upper wall 23b extending along the conveying direction X1. A pair of side walls (23c, 23d) extending perpendicular to the section. Thereby, the hollow area in the adhesive discharge part 23 is formed as an arc-shaped dome-shaped hollow area surrounded by the upper wall 23a, the lower wall 23b, and a pair of side walls (23c, 23d). Furthermore, a plurality of through holes (not shown) for sucking the adhesive are provided on the lower wall 23b of the adhesive discharge part 23 . Furthermore, when the adhesive is sucked from the adhesive discharge part 23 and discharged from the heat treatment chamber 11 , the adhesive is sucked into the binder discharge part 23 and discharged together with the ambient gas in the heat treatment chamber 11 . That is, the binder is sucked into the binder discharge part 23 and discharged from the heat treatment chamber 11 by the gas containing a high concentration of the binder in the ambient atmosphere in the heat treatment chamber 11 being sucked into the binder discharge part 23 .

又,黏合劑排出部23被連接於黏合劑排出系統53,該黏合劑排出系統53係用以從黏合劑排出部23吸入含有較多黏合劑的氣體,並將含有黏合劑的氣體朝向熱處理室11的外部者。黏合劑排出系統53被構成為具備有黏合劑排出管54、及噴射器55。In addition, the binder discharge unit 23 is connected to a binder discharge system 53 for sucking the gas containing a large amount of binder from the binder discharge unit 23 and directing the gas containing the binder toward the heat treatment chamber. 11 outsiders. The adhesive discharge system 53 is configured to include an adhesive discharge pipe 54 and an injector 55 .

黏合劑排出管54貫通熱處理室11的頂壁11c,被連接於熱處理室11內的黏合劑排出部23。黏合劑排出部23的內部與黏合劑排出管54連通,被吸入黏合劑排出部23之含有黏合劑的氣體會被吸入黏合劑排出管54。又,連接於黏合劑排出部23的黏合劑排出管54,以貫通頂壁11c的狀態被固定於頂壁11c。藉此,於熱處理室11內, 黏合劑排出部23經由黏合劑排出管54被支撐於頂壁11c。The binder discharge pipe 54 passes through the ceiling wall 11 c of the heat treatment chamber 11 and is connected to the binder discharge part 23 in the heat treatment chamber 11 . The inside of the adhesive discharge part 23 communicates with the adhesive discharge pipe 54 , and the gas containing the adhesive sucked into the adhesive discharge part 23 is sucked into the adhesive discharge pipe 54 . Moreover, the adhesive discharge pipe 54 connected to the adhesive discharge part 23 is fixed to the top wall 11c in the state which penetrated the top wall 11c. Thereby, in the heat processing chamber 11, the adhesive discharge part 23 is supported by the top wall 11c via the adhesive discharge pipe 54. As shown in FIG.

噴射器55相對於黏合劑排出管54,在與連接於黏合劑排出部23之端部相反側的端部被連接。而且,噴射器55被設為藉由使用高壓流體產生負壓,經由黏合劑排出管54從黏合劑排出部23抽吸含有黏合劑的氣體,而且將所抽吸之氣體朝向外部排出的機構。黏合劑排出系統53的噴射器55與水蒸氣排出系統(16a、16b)的噴射器45被構成為相同。亦即,噴射器55被構成為具備有會被供給作為高壓流體之壓縮空氣的噴嘴、覆蓋噴嘴之周圍的主體、及與主體連通並且設有朝外部開口之吐出口的擴散器。而且,噴射器55的動作係藉由被設於噴嘴之上游側與主體中連接於黏合劑排出管54之下游端之部分的電磁閥根據來自後述之控制部25的控制指令進行開閉而被控制。The injector 55 is connected to the end of the adhesive discharge pipe 54 opposite to the end connected to the adhesive discharge part 23 . In addition, the injector 55 is a mechanism that generates negative pressure using high-pressure fluid, sucks the gas containing the adhesive from the adhesive discharge part 23 through the adhesive discharge pipe 54, and discharges the sucked gas to the outside. The injector 55 of the adhesive discharge system 53 is configured the same as the injector 45 of the water vapor discharge system (16a, 16b). That is, the ejector 55 is configured to include a nozzle to which compressed air as a high-pressure fluid is supplied, a main body covering the periphery of the nozzle, and a diffuser communicating with the main body and having an outlet opening to the outside. Furthermore, the operation of the injector 55 is controlled by opening and closing a solenoid valve provided on the upstream side of the nozzle and at the part of the main body connected to the downstream end of the adhesive discharge pipe 54 according to a control command from the control unit 25 described later. .

當進行利用黏合劑排出部23所進行之黏合劑的排出時,根據來自控制部25的控制指令, 噴射器55的電磁閥會被開放,噴射器55會作動。亦即,噴嘴之上游側的電磁閥會被開放,並且在主體中連接於黏合劑排氣管54之下游端之部分的電磁閥會被開放,噴射器55會作動。藉由噴射器55作動,黏合劑排出部23內之氣體會經由黏合劑排氣管54被抽吸。藉由黏合劑排出部23的氣體被抽吸至黏合劑排氣管54,熱處理室11內之含有黏合劑的氣體會從被設於黏合劑排氣部23之下壁23b的複數個貫通孔被吸入。被吸入黏合劑排氣部23之含有黏合劑的氣體,會經由黏合劑排氣管54朝向噴射器55的主體流動,而在主體內與從噴嘴被吹出的壓縮空氣混合,並從噴射器55之擴散器的吐出口朝向外部被排出。如此一來,熱處理室11內之含有黏合劑的氣體便會從黏合劑排出部23被吸入,並經由黏合劑排氣管54及噴射器55朝向外部被排出。When the adhesive is discharged by the adhesive discharge unit 23 , the electromagnetic valve of the injector 55 is opened according to the control command from the control unit 25 , and the injector 55 is activated. That is, the solenoid valve on the upstream side of the nozzle is opened, and the solenoid valve of the part connected to the downstream end of the adhesive exhaust pipe 54 in the main body is opened, and the injector 55 is activated. As the injector 55 operates, the gas in the adhesive discharge part 23 is sucked through the adhesive exhaust pipe 54 . The gas from the binder discharge part 23 is sucked into the binder discharge pipe 54, and the gas containing the binder in the heat treatment chamber 11 is discharged from a plurality of through holes provided on the lower wall 23b of the binder discharge part 23. be inhaled. The adhesive-containing gas sucked into the adhesive exhaust part 23 flows toward the main body of the injector 55 through the adhesive exhaust pipe 54 , and is mixed with the compressed air blown out from the nozzle in the main body, and is discharged from the injector 55 . The outlet of the diffuser is discharged to the outside. In this way, the gas containing the binder in the heat treatment chamber 11 is sucked from the binder discharge part 23 and discharged to the outside through the binder discharge pipe 54 and the injector 55 .

[空氣簾部] 參照圖1及圖3,空氣簾部24被設為在熱處理室11內之入口31側的端部與出口32側的端部,以形成惰性氣體呈窗簾狀地擴散之區域的方式來噴射惰性氣體的機構。於熱處理室11之入口31側的端部,設有作為空氣簾部24的入口空氣簾部24a,而在熱處理室11之出口32側的端部,設有作為空氣簾部24的出口空氣簾部24b。[air curtain part] 1 and 3, the air curtain 24 is set at the end of the inlet 31 side and the end of the outlet 32 side in the heat treatment chamber 11, and injects inert gas in the form of an area where the inert gas diffuses like a curtain. Gas body. At the end of the inlet 31 side of the heat treatment chamber 11, an inlet air curtain 24a as the air curtain 24 is provided, and at the end of the outlet 32 of the heat treatment chamber 11, an outlet air curtain as the air curtain 24 is provided. Section 24b.

入口空氣簾部24a及出口空氣簾部24b分別被形成為中空的箱狀,並且具有會被供給來自惰性氣體供給源46之惰性氣體的氣體供給箱。入口空氣簾部24a的氣體供給箱被設於熱處理室11內之入口31側的端部,而出口空氣簾部24b的氣體供給箱被設於熱處理室11內之出口32側的端部。入口空氣簾部24a及出口空氣簾部24b之各者之氣體供給箱相對於氣體供給系統18的共同配管47,經由省略圖示的配管被連接,被構成為會被供給來自惰性氣體供給源46的惰性氣體。The inlet air curtain part 24 a and the outlet air curtain part 24 b are each formed in a hollow box shape, and have a gas supply box to which an inert gas from an inert gas supply source 46 is supplied. The gas supply box of the inlet air curtain 24a is provided at the end of the heat treatment chamber 11 on the inlet 31 side, and the gas supply box of the outlet air curtain 24b is provided at the end of the heat treatment chamber 11 on the outlet 32 side. The gas supply box of each of the inlet air curtain part 24a and the outlet air curtain part 24b is connected to the common pipe 47 of the gas supply system 18 through a pipe not shown in the figure, and is configured to be supplied from the inert gas supply source 46 inert gas.

又,於入口空氣簾部24a及出口空氣簾部24b的各氣體供給箱,設有與熱處理室11內連通的複數個噴射孔。而且,被設於各氣體供給箱的複數個噴射孔,被構成為將從惰性氣體供給源46所供給之惰性氣體朝熱處理室11的內部噴射。又,入口空氣簾部24a之氣體供給箱的複數個噴射孔,被構成為以惰性氣體會沿著與入口31之開口面平行的方向呈窗簾狀地擴散的方式噴射惰性氣體。而且,出口空氣簾部24b之氣體供給箱的複數個噴射孔,構成為以惰性氣體會沿著與出口32的之開口面平行的方向呈窗簾狀地擴散的方式噴射惰性氣體。於熱處理室11之入口31側的端部,藉由惰性氣體從入口空氣簾部24a呈窗簾狀地被噴射,在熱處理室11之入口31的附近,熱處理室11之內側的區域與外側的區域的環境氛圍會被分離。又,藉由在熱處理室11之出口32側的端部,惰性氣體會從出口空氣簾部24b呈窗簾狀地被噴射,在熱處理室11之出口32的附近,熱處理室11之內側的區域與外側的區域的環境氛圍會被分離。In addition, a plurality of injection holes communicating with the inside of the heat treatment chamber 11 are provided in each gas supply box of the inlet air curtain part 24a and the outlet air curtain part 24b. Furthermore, the plurality of injection holes provided in each gas supply box are configured to inject the inert gas supplied from the inert gas supply source 46 into the heat treatment chamber 11 . In addition, the plurality of injection holes of the gas supply box of the inlet air curtain portion 24a is configured to inject the inert gas so that the inert gas diffuses in a curtain-like direction in a direction parallel to the opening surface of the inlet 31 . Furthermore, the plurality of injection holes of the gas supply box of the outlet air curtain portion 24b is configured to inject the inert gas so that the inert gas diffuses in a curtain-like direction in a direction parallel to the opening surface of the outlet 32 . At the end of the heat treatment chamber 11 on the side of the entrance 31, the inert gas is sprayed in a curtain shape from the entrance air curtain 24a. The environment atmosphere will be separated. Also, since the inert gas is sprayed from the outlet air curtain portion 24b at the end on the side of the outlet 32 of the heat treatment chamber 11, in the vicinity of the outlet 32 of the heat treatment chamber 11, the area inside the heat treatment chamber 11 and the The ambient atmosphere of the outer area will be separated.

[控制部] 參照圖2,熱處理室11的搬送機構33、加熱器12、水蒸氣供給系統14、水蒸氣排出系統(16a、16b)、氣體供給系統18、排氣系統(21a、21b)、及黏合劑排出系統53的動作,會由控制部25所控制。具體而言,控制部25藉由控制對搬送機構33進行驅動之驅動軸35的電動馬達、加熱器12的發熱體、水蒸氣供給系統14之過熱水蒸氣生成部40的鍋爐及過熱器、水蒸氣排出系統(16a、16b)之噴射器45的電磁閥、氣體供給系統18的氣體供給閥(49a~d)、排氣系統(21a、21b)之噴射器52的電磁閥、以及黏合劑排出系統53之噴射器55的電磁閥的作動,來控制搬送機構33、加熱器12、水蒸氣供給系統14、水蒸氣排出系統(16a、16b)、氣體供給系統18、排氣系統(21a、21b)、以及黏合劑排出系統53的動作。[control department] Referring to Fig. 2, the conveying mechanism 33 of heat treatment chamber 11, heater 12, water vapor supply system 14, water vapor discharge system (16a, 16b), gas supply system 18, exhaust system (21a, 21b), and binder discharge The operation of the system 53 is controlled by the control unit 25 . Specifically, the control unit 25 controls the electric motor of the drive shaft 35 that drives the transport mechanism 33, the heating element of the heater 12, the boiler and the superheater of the superheated steam generation unit 40 of the steam supply system 14, and the water heater. The solenoid valve of the injector 45 of the steam discharge system (16a, 16b), the gas supply valve (49a~d) of the gas supply system 18, the solenoid valve of the injector 52 of the exhaust system (21a, 21b), and the adhesive discharge The operation of the electromagnetic valve of the injector 55 of the system 53 controls the conveying mechanism 33, the heater 12, the water vapor supply system 14, the water vapor discharge system (16a, 16b), the gas supply system 18, the exhaust system (21a, 21b ), and the action of the adhesive discharge system 53.

又,控制部25被構成為具備有CPU(Central Processing Unit;中央處理單元)等之硬體處理器、RAM(Random Access Memory;隨機存取記憶體)及ROM(Read Only Memory;唯讀記憶體)等之記憶體,由使用者所操作之操作面板等的操作部、以及介面回路等。於控制部25的記憶體,儲存有用以生成控制指令的程式,該控制指令係對驅動驅動軸35的電動馬達、加熱器12的發熱體、過熱水蒸氣生成部40的鍋爐及過熱器、噴射器45的電磁閥、氣體供給閥(49a~d)、噴射器52的電磁閥、噴射器55的電磁閥等的動作進行控制者。例如,藉由操作部由作業人員所操作,上述的程式會由硬體處理器從記憶體所讀出並被執行。藉此,上述的控制指令會被生成,而根據該控制指令,驅動驅動軸35的電動馬達、加熱器12的發熱體、過熱水蒸氣生成部40的鍋爐及過熱器、噴射器45的電磁閥、氣體供給閥(49a~d)、噴射器52的電磁閥、以及噴射器55的電磁閥等會作動。Also, the control unit 25 is configured to include a hardware processor such as a CPU (Central Processing Unit; central processing unit), a RAM (Random Access Memory; random access memory), and a ROM (Read Only Memory; read-only memory). ) and other memories, the operation part of the operation panel operated by the user, and the interface circuit, etc. In the memory of the control unit 25, there is stored a program for generating a control command for the electric motor driving the drive shaft 35, the heating element of the heater 12, the boiler and the superheater of the superheated steam generating unit 40, and the injection The electromagnetic valve of the injector 45, the gas supply valve (49a~d), the electromagnetic valve of the injector 52, the electromagnetic valve of the injector 55, and the like are controlled. For example, when the operating part is operated by an operator, the above-mentioned program will be read out from the memory by the hardware processor and executed. Thereby, the above-mentioned control command is generated, and according to the control command, the electric motor of the drive shaft 35, the heating element of the heater 12, the boiler and the superheater of the superheated steam generating part 40, and the solenoid valve of the injector 45 are driven. , the gas supply valve (49a~d), the electromagnetic valve of the injector 52, and the electromagnetic valve of the injector 55, etc. will operate.

[熱處理裝置的動作] 其次,對熱處理裝置1之處理動作的一例進行說明。在開始熱處理裝置1的處理動作時,首先,根據來自控制部25的控制指令,開始熱處理室11的搬送機構33、加熱器12、水蒸氣供給系統14、水蒸氣排出系統(16a、16b)、氣體供給系統18、及排氣系統(21a、21b)的動作。若根據來自控制部25的控制指令而開始熱處理裝置1的處理動作,具體而言,在熱處理裝置1中便會進行以下的動作。[Operation of heat treatment device] Next, an example of the processing operation of the heat processing apparatus 1 will be described. When starting the processing operation of the heat treatment apparatus 1, at first, according to the control instruction from the control unit 25, the conveying mechanism 33, the heater 12, the water vapor supply system 14, the water vapor discharge system (16a, 16b), and the heat treatment chamber 11 are started. Operation of the gas supply system 18 and the exhaust system (21a, 21b). When the processing operation of the thermal processing apparatus 1 is started based on the control command from the control unit 25 , specifically, the following operations are performed in the thermal processing apparatus 1 .

首先,進行利用加熱器12所進行之熱處理室11內之環境氛圍的加熱。具體而言,進行對加熱器12之發熱體之電熱體的通電,發熱體會發熱,而熱處理室11便會從外部由加熱器12所加熱。而且,藉由熱處理室11從外部被加熱,來進行熱處理室11內之環境氛圍的加熱。First, the heating of the ambient atmosphere in the heat treatment chamber 11 by the heater 12 is performed. Specifically, when the electric heating element of the heating element of the heater 12 is energized, the heating element generates heat, and the heat treatment chamber 11 is heated by the heater 12 from the outside. Furthermore, the ambient atmosphere in the heat processing chamber 11 is heated by heating the heat processing chamber 11 from the outside.

又,於熱處理室11中,開始對搬送機構33之驅動軸35進行驅動之電動馬達的運轉,而開始搬送機構33之網格帶34的環繞動作,便會成為可進行利用搬送機構33所進行在熱處理室11內之被處理物10之搬送的狀態。再者,藉由適當設定電動馬達的旋轉速度,當藉由網格帶34的環繞動作來搬送被處理物10時的搬送速度、即利用搬送機構33所進行之被處理物10的搬送速度會被設定為既定的速度。又,利用搬送機構33所進行之被處理物10的搬送速度,會對應於會在熱處理室11內被熱處理之被處理物10之熱處理時間等的熱處理條件而被適當設定。Also, in the heat treatment chamber 11, the operation of the electric motor that drives the drive shaft 35 of the conveying mechanism 33 is started, and the mesh belt 34 of the conveying mechanism 33 is started to circle around, so that it can be performed by using the conveying mechanism 33. The state of conveyance of the object to be processed 10 in the heat treatment chamber 11. Furthermore, by appropriately setting the rotational speed of the electric motor, the conveying speed when the object 10 is conveyed by the winding operation of the mesh belt 34, that is, the conveying speed of the object 10 performed by the conveying mechanism 33 can be reduced. is set to a given speed. In addition, the conveyance speed of the object 10 to be processed by the conveyance mechanism 33 is appropriately set in accordance with the heat treatment conditions such as the heat treatment time of the object 10 to be heat treated in the heat treatment chamber 11 .

又,水蒸氣供給系統14之過熱水蒸氣生成部40的鍋爐及過熱器作動,而連續地進行過熱水蒸氣的生成。再者,在過熱水蒸氣生成部40所生成之過熱水蒸氣的溫度與每單位時間所生成之過熱水蒸氣的量,會對應於被處理物10的熱處理條件而被適當設定,而該被處理物10係作為藉由利用過熱水蒸氣所進行之加熱來進行之熱處理的熱處理對象者。在過熱水蒸氣生成部40所生成的加熱水蒸氣,會經由水蒸氣供給配管(41、42a、42b)連續地被供給至水蒸氣供給部13的一對噴嘴部(38a、38b)。此外,被供給至各噴嘴部(38a、38b)的過熱水蒸氣,會從各噴嘴部(38a、38b)的複數個噴嘴孔39吹出,過熱水蒸氣會連續地被供給至熱處理室11內。In addition, the boiler and the superheater of the superheated steam generating unit 40 of the steam supply system 14 are operated to continuously generate superheated steam. Furthermore, the temperature of the superheated steam generated in the superheated steam generation unit 40 and the amount of superheated steam generated per unit time are appropriately set in accordance with the heat treatment conditions of the object 10 to be processed. The object 10 is an object of heat treatment by heating with superheated steam. The heating steam generated in the superheated steam generating part 40 is continuously supplied to the pair of nozzle parts (38a, 38b) of the steam supplying part 13 via the steam supplying pipes (41, 42a, 42b). In addition, the superheated steam supplied to each nozzle part (38a, 38b) is blown out from the plurality of nozzle holes 39 of each nozzle part (38a, 38b), and the superheated steam is continuously supplied into the heat treatment chamber 11.

又,開始水蒸氣排出系統(16a、16b)之各噴射器45的作動。藉此,熱處理室11內之過熱水蒸氣,會分別從入口側水蒸氣排出部15a及出口側水蒸氣排出部15b被吸入,並經由各水蒸氣排出管44及各噴射器45朝向外部連續地被排出。Also, the operation of each injector 45 of the water vapor discharge system (16a, 16b) is started. Thereby, the superheated steam in the heat treatment chamber 11 is drawn in from the inlet side steam discharge part 15a and the outlet side steam discharge part 15b respectively, and is continuously directed to the outside through each steam discharge pipe 44 and each ejector 45. was discharged.

又,開始從氣體供給部17之入口側氣體供給部(36a、36b)及出口側氣體供給部(37a、37b)之朝向熱處理室11內之惰性氣體的供給。具體而言,以氣體供給系統18的氣體供給閥(49a~d)進行打開動作之方式作動,從惰性氣體供給源46所供給的惰性氣體會經由共同配管47及各分支配管(48a~d)連續地被供給至入口側氣體供給部(36a、36b)及出口側氣體供給部(37a、37b)。然後,惰性氣體從入口側氣體供給部(36a、36b)及出口側氣體供給部(37a、37b)朝向熱處理室11內連續地被供給。Also, the supply of the inert gas into the heat treatment chamber 11 from the inlet-side gas supply part (36a, 36b) and the outlet-side gas supply part (37a, 37b) of the gas supply part 17 is started. Specifically, the gas supply valves (49a~d) of the gas supply system 18 are operated to open, and the inert gas supplied from the inert gas supply source 46 passes through the common pipe 47 and each branch pipe (48a~d). It is continuously supplied to the inlet side gas supply part (36a, 36b) and the outlet side gas supply part (37a, 37b). Then, the inert gas is continuously supplied into the heat treatment chamber 11 from the inlet side gas supply part (36a, 36b) and the outlet side gas supply part (37a, 37b).

又,開始排氣系統(21a、21b)之噴射器52的作動。藉此,熱處理室11內之氣體會分別從入口側排氣部19及出口側排氣部20被吸入,並經由各氣體排氣管51及各噴射器52朝向外部連續地被排出。Also, the operation of the injector 52 of the exhaust system (21a, 21b) is started. Thereby, the gas in the heat treatment chamber 11 is sucked in from the inlet side exhaust part 19 and the outlet side exhaust part 20 respectively, and is continuously discharged toward the outside through each gas exhaust pipe 51 and each injector 52 .

又,黏合劑排出系統53在熱處理裝置1進行燒結處理,如從被處理物10會大量地產生黏合劑般之熱處理條件的情形時,會根據來自控制部25的控制指令作動。在黏合劑排出系統53之噴射器55的作動中,熱處理室11內之環境氛圍中含有高濃度黏合劑的氣體,會被吸入黏合劑排出部23並從熱處理室11被排出。In addition, the binder discharge system 53 operates according to a control command from the control unit 25 when the heat treatment device 1 performs sintering treatment and the heat treatment condition is such that a large amount of binder is generated from the object 10 to be processed. During the operation of the injector 55 of the binder discharge system 53 , the gas containing a high concentration of binder in the ambient atmosphere in the heat treatment chamber 11 will be sucked into the binder discharge part 23 and discharged from the heat treatment chamber 11 .

如上述般,若開始熱處理裝置1的處理動作,從被設置在加熱區域HR內之搬送方向X1之中央部分之水蒸氣供給部13所供給的過熱水蒸氣便會一邊充滿在熱處理室11內一邊進行流動。而且,從水蒸氣供給部13朝向入口31側及出口32側之水蒸氣排出部15流動之過熱水蒸氣的流動會持續地被形成。亦即,在熱處理室11內一邊充滿過熱水蒸氣,從水蒸氣供給部13流向入口側水蒸氣排出部15a之過熱水蒸氣的流動、及從水蒸氣供給部13流向出口側水蒸氣排出部15b之過熱水蒸氣的流動會一邊持續地被形成。As mentioned above, when the processing operation of the heat treatment apparatus 1 starts, the superheated water vapor supplied from the steam supply part 13 provided in the central part of the transfer direction X1 in the heating region HR fills the heat treatment chamber 11 while filling the heat treatment chamber 11. to flow. Furthermore, the flow of superheated steam flowing from the steam supply part 13 toward the steam discharge part 15 on the side of the inlet 31 and the side of the outlet 32 is continuously formed. That is, while the heat treatment chamber 11 is filled with superheated steam, the flow of superheated steam flowing from the steam supply part 13 to the inlet side steam discharge part 15a, and the flow of the superheated steam from the steam supply part 13 to the outlet side steam discharge part 15b The flow of superheated steam will continue to be formed.

又,從氣體供給部17之入口側氣體供給部(36a、36b)所供給的惰性氣體,會以在熱處理室11內之入口側氣體供給部(36a、36b)之附近的區域擴散的方式流動。藉此,在入口側氣體供給部(36a、36b)之附近的區域內,進行利用惰性氣體所進行之環境氛圍的分離。又,從氣體供給部17之出口側氣體供給部(37a、37b)所供給的惰性氣體,會以在熱處理室11內之出口側氣體供給部(37a、37b)之附近的區域擴散的方式流動。藉此,在出口側氣體供給部(37a、37b)之附近的區域內,進行利用惰性氣體所進行之環境氛圍的分離。In addition, the inert gas supplied from the inlet-side gas supply part (36a, 36b) of the gas supply part 17 flows so as to diffuse in the area near the inlet-side gas supply part (36a, 36b) in the heat treatment chamber 11. . Thereby, the separation of the ambient atmosphere by the inert gas is performed in the vicinity of the inlet side gas supply part (36a, 36b). In addition, the inert gas supplied from the outlet-side gas supply part (37a, 37b) of the gas supply part 17 flows so as to diffuse in the region near the outlet-side gas supply part (37a, 37b) in the heat treatment chamber 11. . Thereby, separation of the ambient atmosphere by the inert gas is carried out in the region near the outlet side gas supply part (37a, 37b).

如上述般,若開始熱處理裝置1的處理動作,於熱處理室11內,從水蒸氣供給部13朝向入口31側及出口32側之水蒸氣排出部15流動之過熱水蒸氣的流動便會持續地被形成,並且亦會進行利用從氣體供給部17所供給之惰性氣體所進行之環境氛圍的分離。As mentioned above, when the processing operation of the thermal processing apparatus 1 is started, in the thermal processing chamber 11, the flow of superheated steam from the steam supply part 13 toward the steam discharge part 15 on the side of the inlet 31 and the side of the outlet 32 will continue to flow. is formed, and the separation of the ambient atmosphere by the inert gas supplied from the gas supply unit 17 is also performed.

此處,進一步對熱處理裝置1之動作中之熱處理室11內之水蒸氣的流動與利用惰性氣體所進行之環境氛圍的分離進行說明。圖10及圖11係用以說明熱處理裝置1中熱處理室11內之過熱水蒸氣及惰性氣體之流動的圖。再者,圖11(A)係說明在水蒸氣供給部13之周圍之區域的過熱水蒸氣之流動的圖。圖11(B)係說明入口側水蒸氣排出部15a及入口側氣體供給部(36a、36b)之周圍之區段的過熱水蒸氣及惰性氣體之流動的圖。圖11(C)係說明在出口側水蒸氣排出部15b及出口側氣體供給部(37a、37b)之周圍之區域的過熱水蒸氣及惰性氣體之流動的圖。再者,在圖10及圖11中,以虛線之箭頭示意地表示熱處理室11內之過熱水蒸氣之流動的方向,並以實線之箭頭示意地表示熱處理室11內之惰性氣體之流動的方向。Here, the flow of water vapor in the heat treatment chamber 11 during the operation of the heat treatment apparatus 1 and the separation of the ambient atmosphere by an inert gas will be further described. 10 and 11 are views for explaining the flow of superheated steam and inert gas in the heat treatment chamber 11 of the heat treatment apparatus 1 . Furthermore, FIG. 11(A) is a diagram illustrating the flow of superheated steam in the area around the steam supply unit 13 . FIG. 11(B) is a diagram illustrating the flow of superheated steam and inert gas in the area around the inlet-side steam discharge unit 15a and the inlet-side gas supply unit (36a, 36b). FIG. 11(C) is a diagram illustrating the flow of superheated steam and inert gas in the area around the outlet-side steam discharge unit 15b and the outlet-side gas supply unit (37a, 37b). Moreover, in Fig. 10 and Fig. 11, the direction of the flow of the superheated steam in the heat treatment chamber 11 is schematically indicated by the dotted arrow, and the direction of the flow of the inert gas in the heat treatment chamber 11 is schematically indicated by the solid line arrow. direction.

如圖10及圖11(A)所示,從水蒸氣供給部13之一對噴嘴部(38a、38b)之各者分別被吹出的過熱水蒸氣,會朝向一對噴嘴部(38a、38b)的中間位置側流動,而於本實施形態中,會朝向加熱區域HR內之被處理物10之搬送方向X1的中央位置側流動。又,在一對噴嘴部(38a、38b)之間的區域且加熱區域HR之中央位置附近的區域,設置有隔板(22e、22f)。因此,從各噴嘴部(38a、38b)被吹出並朝向一對噴嘴部(38a、38b)之中間位置側(於本實施形態中,係加熱區域HR之中央位置側)流動的各過熱水蒸氣,會與隔板(22e、22f)碰撞。亦即,從噴嘴部38a所吹出的過熱水蒸氣會與隔板22e碰撞,而從噴嘴部38b所吹出之過熱水蒸氣會與隔板22f碰撞。然後,從各噴嘴部(38a、38b)被吹出並與隔板(22e、22f)碰撞的各過熱水蒸氣,會一邊在加熱區域HR內涵蓋與搬送方向X1垂直之截面的整體擴散,一邊以在與搬送方向X1平行的方向上翻轉而折回的方式流動。As shown in Fig. 10 and Fig. 11 (A), the superheated steam that is respectively blown out from each of a pair of nozzle parts (38a, 38b) of the steam supply part 13 will be directed toward the pair of nozzle parts (38a, 38b). In the present embodiment, it flows toward the middle position side of the conveying direction X1 of the object 10 in the heating region HR. Moreover, partition plates (22e, 22f) are provided in the region between the pair of nozzle parts (38a, 38b) and in the vicinity of the central position of the heating region HR. Therefore, each superheated steam blown out from each nozzle part (38a, 38b) and flowing toward the middle position side (in this embodiment, the middle position side of the heating region HR) of the pair of nozzle parts (38a, 38b) , will collide with the partitions (22e, 22f). That is, the superheated steam blown from the nozzle part 38a collides with the partition plate 22e, and the superheated steam blown out from the nozzle part 38b collides with the partition plate 22f. Then, each superheated steam blown out from each nozzle portion (38a, 38b) and colliding with the partition plate (22e, 22f) diffuses in the heating region HR covering the entire cross-section perpendicular to the conveyance direction X1, while It flows so as to invert and turn back in the direction parallel to the conveyance direction X1.

如上述般,從噴嘴部38a被吹出的過熱水蒸氣,會在朝向一對噴嘴部(38a、38b)的中間位置側流動並翻轉後,以在加熱區域HR內涵蓋與搬送方向X1垂直之截面的整體擴散的狀態,朝向與一對噴嘴部(38a、38b)之中間位置側相反方向而沿著與搬送方向X1平行的方向流動。亦即,從噴嘴部38a所吹出的過熱水蒸氣,會以從一對噴嘴部(38a、38b)之中間位置側朝向熱處理室11的入口31側擴散至加熱區域HR之截面之整體的狀態流動。而且,從噴嘴部38b所吹出的過熱水蒸氣,朝向一對噴嘴部(38a、38b)之中間位置側流動並翻轉後,以在加熱區域HR內涵蓋與搬送方向X1垂直之截面的整體擴散的狀態,朝向與一對噴嘴部(38a、38b)之中間位置側相反方向而沿著與搬送方向X1平行的方向流動。亦即,從噴嘴部38b所吹出的過熱水蒸氣,會以從一對噴嘴部(38a、38b)之中間位置側朝向熱處理室11的出口32側擴散至加熱區域HR之截面之整體的狀態流動。藉此,於熱處理室11內,會在從一對噴嘴部(38a、38b)之中間位置側之各者朝向入口31側及出口32側而沿著與搬送方向X1平行之方向擴散至加熱區域HR之截面之整體的狀態下,形成流速之偏差較少之大致相同之水蒸氣的流動。As described above, the superheated steam blown from the nozzle part 38a flows toward the middle position side of the pair of nozzle parts (38a, 38b) and reverses to cover a cross section perpendicular to the conveyance direction X1 in the heating region HR. In a state where the entire body is diffused, it flows in a direction parallel to the conveyance direction X1 in a direction opposite to the middle position side of a pair of nozzle parts (38a, 38b). That is, the superheated steam blown from the nozzle portion 38a flows in a state of spreading from the middle position side of the pair of nozzle portions (38a, 38b) toward the inlet 31 side of the heat treatment chamber 11 to the entire cross section of the heating region HR. . Then, the superheated steam blown from the nozzle part 38b flows toward the middle position side of the pair of nozzle parts (38a, 38b), turns over, and spreads over the entire cross section perpendicular to the conveying direction X1 in the heating region HR. state, it flows in a direction parallel to the conveyance direction X1 in the direction opposite to the middle position side of a pair of nozzle parts (38a, 38b). That is, the superheated steam blown from the nozzle portion 38b flows from the middle position side of the pair of nozzle portions (38a, 38b) toward the outlet 32 side of the heat treatment chamber 11 to the entire cross section of the heating region HR. . Thereby, in the heat treatment chamber 11, from each of the intermediate position side of a pair of nozzle parts (38a, 38b) toward the inlet 31 side and the outlet 32 side, it diffuses to the heating area along the direction parallel to the conveyance direction X1 In the overall state of the cross-section of HR, the flow of substantially the same water vapor with less variation in flow velocity is formed.

又,從噴嘴部38a被吹出並朝向入口31側流動的過熱水蒸氣,如圖10及圖11(B)所示般,會朝向入口側水蒸氣排出部15a流動,而從入口側水蒸氣排出部15a被吸入並朝向熱處理室11的外部被排出。再者,朝向入口側水蒸氣排出部15a流動的過熱水蒸氣,會通過隔板22d之下方的區域,而從入口側水蒸氣排出部15a之下壁43b之複數個貫通孔被吸入入口側水蒸氣排出部15a。又,從噴嘴部38b被吹出並朝向出口32側流動的過熱水蒸氣,如圖10及圖11(C)所示般,會朝向出口側水蒸氣排出部15b流動,從出口側水蒸氣排出部15b被吸入並朝向熱處理室11的外部被排出。再者,朝向出口側水蒸氣排出部15b流動的過熱水蒸氣,會通過隔板22g之下方的區域,而從出口側水蒸氣排出部15b之下壁43b的複數個貫通孔被吸入入口側水蒸氣排出部15a。Also, the superheated steam blown out from the nozzle portion 38a and flowing toward the inlet 31 side, as shown in FIGS. The portion 15 a is sucked in and discharged toward the outside of the heat treatment chamber 11 . Furthermore, the superheated steam flowing toward the inlet-side steam discharge part 15a will pass through the area below the partition plate 22d, and the inlet-side water will be sucked in from the plurality of through holes in the lower wall 43b of the inlet-side steam discharge part 15a. Steam discharge part 15a. Also, the superheated steam that is blown out from the nozzle portion 38b and flows toward the outlet 32 side, as shown in FIGS. 10 and 11(C), flows toward the outlet side steam discharge portion 15b, 15b is drawn in and discharged toward the outside of the heat treatment chamber 11 . Furthermore, the superheated steam flowing toward the outlet-side steam discharge portion 15b will pass through the region below the partition plate 22g, and the inlet-side water will be sucked in from the plurality of through holes in the lower wall 43b of the outlet-side steam discharge portion 15b. Steam discharge part 15a.

如上述般,於熱處理室11內,從水蒸氣供給部13朝向入口31側及出口32側之水蒸氣排出部15流動之大致相同之過熱水蒸氣的流動會持續地被形成。因此,在從水蒸氣供給部13至入口31側及出口32側之水蒸氣排出部15為止的區域內,充滿呈流動狀態之過熱水蒸氣,並且在擴散至加熱區域HR之截面之整體的狀態下,流速偏差較少之大致相同之過熱水蒸氣的流動會持續地被形成。As described above, in the heat treatment chamber 11, substantially the same flow of superheated steam flows from the steam supply part 13 toward the steam discharge part 15 on the side of the inlet 31 and the side of the outlet 32 is continuously formed. Therefore, in the region from the steam supply part 13 to the steam discharge part 15 on the side of the inlet 31 and the side of the outlet 32, the superheated steam in a flowing state is filled and diffused to the entire cross section of the heating region HR. In this case, the flow of approximately the same superheated steam with less variation in flow velocity is continuously formed.

又,在熱處理室11內之較入口側水蒸氣排出部15a更靠入口31側的區域內, 如圖10及圖11(B)所示般,惰性氣體會分別從入口側氣體供給部36a及入口側氣體供給部36b被吹出。Also, in the region of the heat treatment chamber 11 closer to the inlet 31 than the inlet-side water vapor discharge portion 15a, as shown in FIGS. The inlet side gas supply part 36b is blown out.

惰性氣體從入口側氣體供給部36a,會以朝向下方擴散的方式被吹出。從入口側氣體供給部36a被吹出的惰性氣體,會以充滿入口側氣體供給部36b之附近之區域的方式擴散。而且,以充滿入口側氣體供給部36a之附近之區域的方式擴散之惰性氣體的一部分,會朝向較入口側氣體供給部36a更靠入口31側的區域流動。因此,可阻止較入口側氣體供給部36a更靠入口31側之區域之環境氛圍的氣體朝向入口側氣體供給部36a側流動之情形。藉此,從水蒸氣供給部13至入口側氣體供給部(36a、36b)為止之區域的環境氛圍、與從入口31至入口側氣體供給部(36a、36b)為止之區域的環境氛圍,會更確實地被分離並被遮斷。又,從入口側氣體供給部36a被吹出之惰性氣體的一部分,會朝向入口側氣體排氣部19流動,並在以充滿隔板22a之下方之區域的方式擴散的狀態下通過隔板22a之下方的區域。然後,通過隔板22a之下方之區域的惰性氣體,會從入口側氣體排氣部19之下壁50b的複數個貫通孔被吸入入口側氣體排氣部19,並朝向熱處理室11的外部被排出。The inert gas is blown out from the inlet side gas supply part 36a so as to diffuse downward. The inert gas blown out from the inlet-side gas supply part 36a diffuses so as to fill the vicinity of the inlet-side gas supply part 36b. Then, a part of the inert gas diffused so as to fill the region near the inlet-side gas supply part 36a flows toward the region closer to the inlet 31 than the inlet-side gas supply part 36a. Therefore, the gas of the ambient atmosphere in the region closer to the inlet 31 than the inlet-side gas supply part 36a can be prevented from flowing toward the inlet-side gas supply part 36a. Thereby, the ambient atmosphere of the region from the water vapor supply part 13 to the inlet side gas supply part (36a, 36b) and the ambient atmosphere of the region from the inlet 31 to the inlet side gas supply part (36a, 36b) are different. more definitely separated and blocked. Moreover, a part of the inert gas blown out from the inlet-side gas supply part 36a flows toward the inlet-side gas exhaust part 19, and passes through the space between the partition walls 22a while being diffused so as to fill the lower area of the partition wall 22a. the area below. Then, the inert gas passing through the region below the partition plate 22a will be sucked into the inlet side gas exhaust part 19 from the plurality of through holes in the lower wall 50b of the inlet side gas exhaust part 19, and will be drawn toward the outside of the heat treatment chamber 11. discharge.

又,惰性氣體亦可從入口側氣體供給部36b,以朝向下方擴散的方式被吹出。從入口側氣體供給部36b朝向下方擴散而被吹出的惰性氣體,會朝向入口側氣體排氣部19流動,並在以充滿隔板22b之下方之區域的方式擴散的狀態下通過隔板22b之下方的區域。然後,通過隔板22b之下方之區域的惰性氣體,會從入口側氣體排氣部19之下壁50b的複數個貫通孔被吸入入口側氣體排氣部19,並朝向熱處理室11的外部被排出。In addition, the inert gas may be blown out from the inlet-side gas supply part 36b so as to diffuse downward. The inert gas diffused downward from the inlet-side gas supply part 36b and blown out flows toward the inlet-side gas exhaust part 19, and passes through the space between the partition plates 22b while being diffused so as to fill the area below the partition plate 22b. the area below. Then, the inert gas passing through the lower region of the partition plate 22b will be sucked into the inlet side gas exhaust part 19 from the plurality of through holes in the lower wall 50b of the inlet side gas exhaust part 19, and will be drawn toward the outside of the heat treatment chamber 11. discharge.

又,於入口側氣體供給部36b之附近的區域內,以在入口側水蒸氣排出部15a不會完全被排出而洩漏的方式朝向入口31側流動之些微的水蒸氣,會與從入口側氣體供給部36b被供給至熱處理室11內的惰性氣體混合而被稀釋。然後,與從入口側氣體供給部36b被供給至熱處理室11內之惰性氣體混合而被稀釋的水蒸氣,會從入口側排氣部19朝向外部被排出。因此,以從入口側水蒸氣排出部15a洩漏的方式朝向入口31側流動之些微的水蒸氣,亦會從入口側排氣部19被排出。Also, in the vicinity of the inlet-side gas supply part 36b, the slight water vapor flowing toward the inlet 31 in such a manner that it is not completely discharged from the inlet-side water vapor discharge part 15a and leaks will be mixed with the gas from the inlet side. The supply part 36 b is mixed and diluted with the inert gas supplied into the heat treatment chamber 11 . Then, the water vapor diluted by mixing with the inert gas supplied into the heat treatment chamber 11 from the inlet side gas supply part 36 b is discharged from the inlet side exhaust part 19 to the outside. Therefore, the slight amount of water vapor flowing toward the inlet 31 side by leaking from the inlet side water vapor discharge portion 15 a is also discharged from the inlet side exhaust portion 19 .

如上述般,從入口側氣體供給部(36a、36b)所供給之惰性氣體,會以在熱處理室11內之入口側氣體供給部(36a、36b)之附近的區域擴散的方式流動。而且,朝向入口31側流動之惰性氣體的流動、及朝向被配置於入口側氣體供給部(36a、36b)之間之入口側氣體排氣部19流動之惰性氣體的流動,會持續地被形成。藉此,在入口側氣體供給部(36a、36b)之附近的區域內,會進行利用從入口側氣體供給部(36a、36b)被供給至熱處理室11內之惰性氣體所進行之環境氛圍的分離。As mentioned above, the inert gas supplied from the inlet side gas supply part (36a, 36b) flows so as to diffuse in the area near the inlet side gas supply part (36a, 36b) in the heat treatment chamber 11. Furthermore, the flow of the inert gas flowing toward the inlet 31 side and the flow of the inert gas flowing toward the inlet side gas exhaust part 19 disposed between the inlet side gas supply parts (36a, 36b) are continuously formed. . Thereby, in the area near the inlet-side gas supply part (36a, 36b), the environment atmosphere using the inert gas supplied from the inlet-side gas supply part (36a, 36b) into the heat treatment chamber 11 is carried out. separate.

又,在熱處理室11內之較出口側水蒸氣排出部15b更靠出口32側的區域中,如圖10及圖11(C)所示般,惰性氣體會分別從出口側氣體供給部37a及出口側氣體供給部37b被吹出。Also, in the region of the heat treatment chamber 11 closer to the outlet 32 side than the outlet-side water vapor discharge part 15b, as shown in Fig. 10 and Fig. The outlet side gas supply part 37b is blown out.

惰性氣體從出口側氣體供給部37a,會以朝向下方擴散的方式被吹出。從出口側氣體供給部37a朝向下方擴散而被吹出的惰性氣體,會朝向出口側氣體排氣部20流動,並以充滿隔板22i之下方之區域之方式擴散的狀態通過隔板22i之下方的區域。然後,通過隔板22i之下方之區域的惰性氣體,會從出口側氣體排氣部20之下壁50b的複數個貫通孔被吸入出口側氣體排氣部20,並朝向熱處理室11的外部被排出。The inert gas is blown out from the outlet side gas supply part 37a so as to diffuse downward. The inert gas diffused downward from the outlet-side gas supply part 37a and blown out flows toward the outlet-side gas exhaust part 20, and passes through the area below the partition plate 22i while being diffused so as to fill the area below the partition plate 22i. area. Then, the inert gas passing through the region below the partition plate 22i will be sucked into the outlet-side gas exhaust portion 20 from the plurality of through holes in the lower wall 50b of the outlet-side gas exhaust portion 20, and will be discharged toward the outside of the heat treatment chamber 11. discharge.

又,在出口側氣體供給部37a之附近的區域內,以在出口側水蒸氣排出部15b不會完全被排出而洩漏的方式朝向出口32側流動之些微的水蒸氣,會與從出口側氣體供給部37a對熱處理室11內被供給的惰性氣體混合而被稀釋。然後,與從出口側氣體供給部37a供給至熱處理室11內的惰性氣體混合而稀釋的水蒸氣從出口側排氣部20向外部排出。因此,以從出口側水蒸氣排出部15b洩漏的方式朝向出口32側流動之些微的水蒸氣,亦會從出口側排氣部20被排氣。Also, in the region near the outlet side gas supply part 37a, the slight water vapor flowing toward the outlet 32 side in the manner of not being completely discharged and leaking at the outlet side water vapor discharge part 15b will be mixed with the gas from the outlet side. The supply unit 37 a mixes and dilutes the inert gas supplied in the heat treatment chamber 11 . Then, the water vapor diluted by mixing with the inert gas supplied into the heat treatment chamber 11 from the outlet-side gas supply unit 37 a is exhausted from the outlet-side exhaust unit 20 to the outside. Therefore, the slight amount of water vapor flowing toward the outlet 32 side by leaking from the outlet side water vapor discharge portion 15 b is also exhausted from the outlet side exhaust portion 20 .

又,惰性氣體亦會從出口側氣體供給部37b,以朝向下方擴散的方式被吹出。從出口側氣體供給部37b被吹出的惰性氣體,會以充滿出口側氣體供給部37b之附近之區域的方式擴散。而且,以充滿出口側氣體供給部37b之附近之區域的方式擴散之惰性氣體的一部分,會朝向較出口側氣體供給部37b更靠出口32側之區域流動。因此,可阻止較出口側氣體供給部37b更靠出口32側之區域之環境氛圍的氣體朝向出口側氣體供給部37b側流動的情形。藉此,從水蒸氣供給部13至出口側氣體供給部(37a、37b)為止之區段的環境氛圍、與從出口32至出口側氣體供給部(37a、37b)為止之區域的環境氛圍,會更確實地被分離並被遮斷。又,從出口側氣體供給部37b被吹出之惰性氣體的一部分,會朝向出口側氣體排氣部20流動,並以充滿隔板22j之下方之區域的方式擴散的狀態,通過隔板22j之下方的區域。然後,通過隔板22j之下方之區域的惰性氣體,會從出口側氣體排氣部20之下壁50b的複數個貫通孔被吸入出口側氣體排氣部20,並朝向熱處理室11的外部被排出。In addition, the inert gas is also blown out from the outlet side gas supply part 37b so as to diffuse downward. The inert gas blown out from the outlet side gas supply part 37b diffuses so as to fill the area near the outlet side gas supply part 37b. Then, a part of the inert gas diffused so as to fill the area near the outlet-side gas supply part 37b flows toward the area closer to the outlet 32 than the outlet-side gas supply part 37b. Therefore, it is possible to prevent the gas of the ambient atmosphere in the region closer to the outlet 32 side than the outlet-side gas supply unit 37b from flowing toward the outlet-side gas supply unit 37b side. Thereby, the ambient atmosphere of the section from the water vapor supply part 13 to the outlet-side gas supply part (37a, 37b) and the ambient atmosphere of the area from the outlet 32 to the outlet-side gas supply part (37a, 37b) are will be more reliably separated and blocked. Moreover, a part of the inert gas blown out from the outlet-side gas supply part 37b flows toward the outlet-side gas exhaust part 20, and passes under the partition board 22j while being diffused so as to fill the area below the partition board 22j. Area. Then, the inert gas passing through the region below the partition plate 22j will be sucked into the outlet side gas exhaust part 20 from the plurality of through holes in the lower wall 50b of the outlet side gas exhaust part 20, and will be drawn toward the outside of the heat treatment chamber 11. discharge.

如上述般,從出口側氣體供給部(37a、37b)所供給的惰性氣體,會以在熱處理室11內之出口側氣體供給部(37a、37b)之附近的區域擴散的方式流動。然後,朝向出口32側流動之惰性氣體的流動、與朝向被配置於出口側氣體供給部(37a、37b)之間之出口側氣體排氣部20流動之惰性氣體的流動,會持續地被形成。藉此,在出口側氣體供給部(37a、37b)附近的區域內,會進行利用從出口側氣體供給部(37a、37b)被供給至熱處理室11內的惰性氣體所進行之環境氛圍的分離。As mentioned above, the inert gas supplied from the outlet side gas supply part (37a, 37b) flows so as to diffuse in the area near the outlet side gas supply part (37a, 37b) in the heat treatment chamber 11. Then, the flow of the inert gas flowing toward the outlet 32 side and the flow of the inert gas flowing toward the outlet-side gas exhaust unit 20 disposed between the outlet-side gas supply units (37a, 37b) are continuously formed. . Thereby, in the area near the outlet-side gas supply part (37a, 37b), separation of the ambient atmosphere by the inert gas supplied from the outlet-side gas supply part (37a, 37b) into the heat treatment chamber 11 is carried out. .

如上述般,若開始熱處理裝置1的處理動作而各機器開始作動,在從水蒸氣供給部13至入口31側及出口32側的水蒸氣排出部15為止的區域內,會成為一邊在熱處理室11內充滿一邊大致相同地流動之過熱水蒸氣之流動會持續地被形成的狀態。而且,在入口側氣體供給部(36a、36b)之附近及出口側氣體供給部(37a、37b)之附近的各者,會成為進行利用惰性氣體所進行之環境氛圍之分離的狀態。在該狀態下,被收納於殼體10a的被處理物10會朝向熱處理室11被搬入。As mentioned above, if the processing operation of the heat treatment device 1 is started and each device starts to operate, in the area from the water vapor supply part 13 to the water vapor discharge part 15 on the side of the inlet 31 and the side of the outlet 32, there will be one side in the heat treatment chamber. 11 is filled with a state where the flow of superheated steam flowing substantially uniformly is continuously formed. In addition, each of the vicinity of the inlet-side gas supply parts (36a, 36b) and the vicinity of the outlet-side gas supply parts (37a, 37b) is in a state of separating the atmosphere by the inert gas. In this state, the object to be processed 10 housed in the casing 10 a is carried in toward the heat treatment chamber 11 .

被收納於殼體10a之狀態的被處理物10,會從入口31朝向熱處理室11內反覆而連續地且依序地被搬入。更具體而言,若一個收納有複數個被處理物10的殼體10a從入口31朝向熱處理室11被搬入,經過既定時間後,下一個收納有複數個被處理物10的殼體10a便會從入口31朝向熱處理室11被搬入。然後,每當再經過既定時間,再下一個收納有複數個被處理物10的殼體10a便會從入口31朝向熱處理室11被搬入。如此,收納有複數個被處理物10的殼體10a,會從入口31朝向熱處理室11內反覆連續地且依序地被搬入。The processed object 10 housed in the casing 10 a is repeatedly, continuously and sequentially carried in from the inlet 31 toward the heat processing chamber 11 . More specifically, if a casing 10a containing a plurality of processed objects 10 is carried in from the entrance 31 toward the heat treatment chamber 11, after a predetermined time, the next casing 10a containing a plurality of processed objects 10 will be moved. It is carried in from the entrance 31 toward the heat treatment chamber 11 . Then, every time a predetermined time elapses, the next casing 10 a containing a plurality of processed objects 10 is carried in from the entrance 31 toward the heat treatment chamber 11 . In this way, the case 10 a containing the plurality of processed objects 10 is repeatedly, continuously and sequentially carried in from the inlet 31 to the heat treatment chamber 11 .

收納有被處理物10的殼體10a,若從入口31朝向熱處理室11內被搬入,便會在被配置於搬送機構33之網格帶34之上表面的狀態下,與網格帶34的環繞動作一起,在熱處理室11內朝搬送方向X1被搬送。在熱處理室11內與殼體10a一起朝搬送方向X1被搬送的被處理物10,若通過入口側氣體供給部36a的下方,便會進入加熱區域HR,而開始在加熱區域HR之利用過熱水蒸氣所進行的加熱。再者,被處理物10從通過入口側氣體供給部36a之下方後至到達入口側氣體供給部36b之附近為止的期間,會藉由不會被入口側水蒸氣排出部15a所排出而朝向入口31側流動之些微的過熱水蒸氣所加熱。而且,從到達入口側氣體供給部36b之附近起至通過入口側水蒸氣排出部15a之下方之區域為止的期間,會藉由朝向入口31側流動之上述之些微的過熱水蒸氣、及被來自加熱器12的熱進行加熱的環境氛圍所加熱。If the casing 10a containing the processed object 10 is carried into the heat treatment chamber 11 from the entrance 31, it will be placed on the upper surface of the grid belt 34 of the conveying mechanism 33, and the grid belt 34 will Together with the winding operation, it is conveyed in the heat treatment chamber 11 in the conveyance direction X1. The object to be processed 10 transported in the transport direction X1 together with the casing 10a in the heat treatment chamber 11 enters the heating region HR when it passes under the inlet-side gas supply part 36a, and starts to use superheated water in the heating region HR. Heating by steam. Furthermore, during the period from when the object 10 passes under the inlet-side gas supply part 36a to reaching the vicinity of the inlet-side gas supply part 36b, it will move toward the inlet by not being discharged by the inlet-side steam discharge part 15a. The superheated steam flowing on the 31 side is heated. And, during the period from reaching the vicinity of the inlet-side gas supply part 36b to passing through the region below the inlet-side steam discharge part 15a, the above-mentioned slight superheated steam flowing toward the inlet 31 side, and the gas from the The heat of the heater 12 is heated by heating the ambient atmosphere.

被處理物10若通過入口側水蒸氣排出部15a的下方,便會在過熱水蒸氣之環境氛圍中朝搬送方向X1被搬送,其中,該過熱水蒸氣會在熱處理室11內一邊充滿一邊大致相同地從水蒸氣供給部13朝向入口側水蒸氣排出部15a流動。然後,被處理物10會在過熱水蒸氣流動之上述的環境氛圍中被繼續加熱。再者,於該期間內,被處理物10亦會由被來自加熱器12之熱加熱的環境氛圍所加熱。When the object to be processed 10 passes under the inlet-side steam discharge part 15a, it will be transported in the transport direction X1 in the atmosphere of superheated steam, which will be filled in the heat treatment chamber 11 while being substantially uniform. The ground flows from the water vapor supply part 13 toward the inlet side water vapor discharge part 15a. Then, the object 10 to be processed is continuously heated in the above-mentioned ambient atmosphere where the superheated steam flows. Furthermore, during this period, the object to be processed 10 is also heated by the ambient atmosphere heated by the heat from the heater 12 .

被處理物10如上述般一邊被加熱一邊被搬送至加熱區域HR的中央部分。然後, 被處理物10若通過被設置在加熱區域HR之中央部分之水蒸氣供給部13的下方,便會在過熱水蒸氣之環境氛圍中朝搬送方向X1被搬送,其中,該過熱水蒸氣會在熱處理室11內一邊充滿一邊大致相同地從水蒸氣供給部13朝向出口側水蒸氣排出部15b流動。然後,被處理物10會在過熱水蒸氣流動之上述的環境氛圍中被繼續加熱。再者,於該期間內,被處理物10亦會由被來自加熱器12之熱加熱的環境氛圍所加熱。The object to be processed 10 is conveyed to the central portion of the heating region HR while being heated as described above. Then, when the object to be processed 10 passes under the steam supply unit 13 provided in the central portion of the heating region HR, it will be transported in the transport direction X1 in the atmosphere of the superheated steam. While filling the heat treatment chamber 11 , it flows from the water vapor supply part 13 toward the outlet side water vapor discharge part 15 b in substantially the same manner. Then, the object 10 to be processed is continuously heated in the above-mentioned ambient atmosphere where the superheated steam flows. Furthermore, during this period, the object to be processed 10 is also heated by the ambient atmosphere heated by the heat from the heater 12 .

在熱處理室11內如上述般一邊被加熱一邊朝搬送方向X1被搬送的被處理物10,會一邊持續被加熱一邊被搬送至出口側水蒸氣排出部15b之下方的區域。再者,必須對被處理物10進行之利用過熱水蒸氣所進行的熱處理,主要藉由在從通過入口側水蒸氣排出部15a之下方起經過水蒸氣供給部13之下方的區域到達出口側水蒸氣排出部15b之下方之區域為止的期間之利用過熱水蒸氣所進行的加熱來進行。The object to be processed 10 conveyed in the conveyance direction X1 while being heated in the heat treatment chamber 11 as described above is conveyed to the area below the outlet side steam discharge part 15b while being continuously heated. Furthermore, the heat treatment by superheated steam that must be carried out on the object 10 is mainly achieved by passing through the area below the water vapor supply part 13 from below the inlet side water vapor discharge part 15a to reach the outlet side water. The period up to the area below the steam discharge part 15b is performed by heating with superheated steam.

被處理物10若通過出口側水蒸氣排出部15b之下方的區域,便會由不會被出口側水蒸氣排出部15b所排出而朝向出口32側流動之些微的過熱水蒸氣所加熱。此外,被處理物10若從出口側水蒸氣排出部15b之下方的區域朝向出口32側被搬送,便會通過出口側排氣部20的下方到達出口側氣體供給部37b之下方的區域,而脫離加熱區域HR。被處理物10若通過出口側氣體供給部37b之下方的區域而脫離加熱區域HR,便不會進行加熱處理,而在熱處理室11內朝搬送方向X1被搬送至出口32。然後,若到達出口32,被收納於殼體10a之狀態的被處理物10便會從出口32朝向熱處理室11之外被搬出。再者,收納有被處理物10的殼體10a會反覆連續地且依序地朝向熱處理室11內被搬入,當從出口32之搬出時,也會被反覆連續地且依序地被搬出。When the object to be treated 10 passes through the area below the outlet-side steam discharge unit 15b, it is heated by the slightly superheated steam flowing toward the outlet 32 side without being discharged by the outlet-side steam discharge unit 15b. In addition, if the object to be treated 10 is conveyed toward the outlet 32 side from the area below the outlet-side steam discharge unit 15b, it will pass below the outlet-side exhaust unit 20 and reach the area below the outlet-side gas supply unit 37b. Leave the heating zone HR. When the object to be processed 10 leaves the heating region HR through the region below the outlet side gas supply unit 37b, it is conveyed to the outlet 32 in the conveyance direction X1 in the heat treatment chamber 11 without undergoing heat treatment. Then, when reaching the exit 32 , the object 10 housed in the casing 10 a is carried out from the exit 32 toward the outside of the heat treatment chamber 11 . Furthermore, the case 10 a containing the object 10 is repeatedly and continuously and sequentially carried into the heat treatment chamber 11 , and when carried out from the exit 32 , it is repeatedly and continuously and sequentially carried out.

若必須進行熱處理裝置1中之熱處理之所有被處理物10的熱處理結束,所有被處理物10從熱處理室11被搬出時,根據來自控制部25的控制指令,搬送機構33、加熱器12、水蒸氣供給系統14、水蒸氣排出系統(16a、16b)、氣體供給系統18、排氣系統(21a、21b)的作動便會被停止。藉此,熱處理裝置1的處理動作結束。If the heat treatment of all objects to be treated 10 that must be heat treated in the heat treatment device 1 is finished, and all objects to be processed 10 are carried out from the heat treatment chamber 11, according to the control command from the control unit 25, the transport mechanism 33, the heater 12, the water The operation of the steam supply system 14, the water vapor discharge system (16a, 16b), the gas supply system 18, and the exhaust system (21a, 21b) will be stopped. Thereby, the processing operation of the thermal processing apparatus 1 ends.

[本實施形態的效果] 如以上所說明般,根據本實施形態的熱處理裝置1,被處理物10會藉由從被設置在熱處理室11之加熱區域HR之水蒸氣供給部13被供給至熱處理室11內的過熱水蒸氣所加熱,而進行被處理物10的熱處理。而且,被使用於被處理物10之加熱的過熱水蒸氣,會從被設置在加熱區域HR的水蒸氣供給部13朝向分別被設置在熱處理室11之入口31側與出口32側的水蒸氣排出部15(15a、15b)流動,並從水蒸氣排出部15(15a、15b)朝向熱處理室的外部被排出。因此,於熱處理室11,形成有從加熱區域HR內之水蒸氣供給部13朝向入口31側流動並從入口側水蒸氣排出部15a朝向外部被排出之水蒸氣的流動、及從加熱區域HR內之水蒸氣供給部13朝向出口32側流動並從出口側水蒸氣排出部15b朝向外部被排出之水蒸氣的流動。而且,於熱處理室11內,從加熱區域HR內的水蒸氣供給部13朝向入口31側及出口32側之各者,形成有沿著與被處理物10之搬送方向X1平行的方向流速偏差較少之更相同之水蒸氣的流動。藉此,於熱處理室11內,會難以產生水蒸氣之流動會停滯的區域,其結果,在熱處理室11內會難以產生環境氛圍會停滯的區域。[Effect of this embodiment] As described above, according to the heat treatment apparatus 1 of the present embodiment, the object 10 to be processed is supplied with superheated steam into the heat treatment chamber 11 from the steam supply unit 13 provided in the heating region HR of the heat treatment chamber 11. heated to perform heat treatment of the object 10 to be processed. Furthermore, the superheated steam used for heating the object 10 is discharged from the steam supply unit 13 provided in the heating region HR toward the steam provided on the inlet 31 side and the outlet 32 side of the heat treatment chamber 11, respectively. Part 15 (15a, 15b) flows, and is discharged from the steam discharge part 15 (15a, 15b) toward the outside of the heat treatment chamber. Therefore, in the heat treatment chamber 11, the flow of water vapor flowing from the water vapor supply part 13 in the heating region HR toward the inlet 31 side and discharged from the inlet side water vapor discharge part 15a toward the outside, and the water vapor flowing from the heating region HR are formed. The water vapor supply part 13 flows toward the outlet 32 side and is discharged from the outlet side water vapor discharge part 15b toward the outside. In addition, in the heat treatment chamber 11, from the steam supply unit 13 in the heating region HR toward each of the inlet 31 side and the outlet 32 side, there is a relatively small flow velocity deviation in a direction parallel to the conveyance direction X1 of the object 10 to be processed. Less and more the same flow of water vapor. This makes it difficult to generate a region where the flow of water vapor stagnates in the heat treatment chamber 11 , and as a result, it becomes difficult to generate a region where the ambient atmosphere stagnates in the heat treatment chamber 11 .

因此,根據本實施形態的熱處理裝置1,可抑制在進行被處理物10之熱處理的熱處理室11內發生環境氛圍之停滯的情形。又,根據熱處理裝置1,由於可抑制在熱處理室11內發生環境氛圍之停滯的情形,因此可抑制在相同之熱處理室11內進行熱處理的複數個被處理物10之間產生熱處理之不均的情形,而且,亦可抑制伴隨從被處理物10中所產生之氣體的滯留之熱處理效率的降低及被處理物10之髒污的發生。Therefore, according to the heat treatment apparatus 1 of the present embodiment, stagnation of the ambient atmosphere in the heat treatment chamber 11 where the heat treatment of the object 10 is performed can be suppressed. Moreover, according to the heat treatment apparatus 1, since stagnation of the ambient atmosphere in the heat treatment chamber 11 can be suppressed, it is possible to suppress unevenness in heat treatment among a plurality of objects 10 to be heat treated in the same heat treatment chamber 11. Furthermore, it is also possible to suppress the decrease in heat treatment efficiency and the occurrence of contamination of the object 10 due to the stagnation of gas generated from the object 10 to be processed.

又,根據本實施形態,藉由水蒸氣供給部13被設置在熱處理室11的加熱區域HR,且水蒸氣排出部15(15a、15b)被設置在熱處理室11之入口31側及出口32側之簡單的構成,可實現可抑制熱處理室11內之環境氛圍之停滯的發生的熱處理裝置1。因此,可防止利用過熱水蒸氣來進行被處理物10之熱處理的熱處理裝置1之結構的複雜化。Also, according to the present embodiment, since the steam supply part 13 is provided in the heating region HR of the heat treatment chamber 11, and the water vapor discharge part 15 (15a, 15b) is provided on the inlet 31 side and the outlet 32 side of the heat treatment chamber 11 With such a simple structure, it is possible to realize the heat treatment apparatus 1 that can suppress stagnation of the ambient atmosphere in the heat treatment chamber 11 . Therefore, it is possible to prevent the complexity of the structure of the heat treatment apparatus 1 for heat-treating the object 10 using superheated steam.

如以上所述般,根據本實施形態,可提供一種熱處理裝置1,其可防止利用過熱水蒸氣來進行被處理物10之熱處理的熱處理裝置1之結構的複雜化,並且可抑制在進行被處理物10之熱處理的熱處理室11內發生環境氛圍之停滯的情形。As described above, according to the present embodiment, it is possible to provide a heat treatment apparatus 1 that can prevent the complexity of the structure of the heat treatment apparatus 1 for heat-treating the object 10 by using superheated steam, and can suppress the heat treatment during the process of performing the heat treatment on the object 10. The stagnation of the ambient atmosphere occurs in the heat treatment chamber 11 of the heat treatment of the object 10 .

又,根據本實施方式的熱處理裝置1,由於熱處理室11的入口31相對於外部被開放,因此可連續地迅速地且容易地進行被處理物10朝向熱處理室11內的搬入作業。藉此,可使熱處理程式連續化而謀求熱處理之作業效率的提升。而且,根據熱處理裝置1,除了入口31被開放之外,還設置有入口側氣體供給部(36a、36b),其中,該入口側氣體供給部(36a、36b)相對於水蒸氣供給部13被設置在較被設置於入口31側之入口側水蒸氣排出部15a更靠入口31側而對熱處理室11內供給惰性氣體。因此,藉由從入口側氣體供給部(36a、36b)供給的惰性氣體,可在朝外部被開放的入口31與入口側水蒸氣排出部15a之間將熱處理室11內的環境氛圍加以分離。亦即,可將從水蒸氣供給部13至入口側氣體供給部(36a、36b)為止之區域的環境氛圍、與從朝外部被開放的入口31至入口側氣體供給部(36a、36b)為止之區域的環境氛圍加以分離。藉此,在為了提升熱處理的作業效率而入口31被開放的熱處理裝置1中,可相對於外部遮斷從水蒸氣供給部13至入口側水蒸氣排出部15a為止之區域的環境氛圍,而可效率佳地進行利用加熱區域HR內之過熱水蒸氣所進行之被處理物10的熱處理。Furthermore, according to the heat treatment apparatus 1 of the present embodiment, since the entrance 31 of the heat treatment chamber 11 is opened to the outside, it is possible to continuously, quickly and easily carry in the object 10 into the heat treatment chamber 11 . Thereby, the heat treatment program can be continuous and the work efficiency of the heat treatment can be improved. Furthermore, according to the heat treatment apparatus 1, in addition to the opening of the inlet 31, an inlet-side gas supply part (36a, 36b) is provided, wherein the inlet-side gas supply part (36a, 36b) is closed relative to the water vapor supply part 13. The inlet-side water vapor discharge part 15 a provided on the inlet 31 side is provided on the inlet 31 side to supply an inert gas into the heat treatment chamber 11 . Therefore, the atmosphere in the heat treatment chamber 11 can be separated between the inlet 31 opened to the outside and the inlet-side steam discharge part 15a by the inert gas supplied from the inlet-side gas supply part (36a, 36b). That is, the ambient atmosphere of the region from the water vapor supply part 13 to the inlet-side gas supply part (36a, 36b) and the area from the inlet 31 opened to the outside to the inlet-side gas supply part (36a, 36b) can be adjusted. The environmental atmosphere of the area is separated. Thereby, in the heat treatment apparatus 1 in which the inlet 31 is opened in order to improve the working efficiency of the heat treatment, the ambient atmosphere in the region from the water vapor supply part 13 to the inlet side water vapor discharge part 15a can be blocked from the outside, and the The heat treatment of the object to be processed 10 by using the superheated steam in the heating region HR is performed efficiently.

又,根據本實施形態的熱處理裝置1,入口側氣體供給部(36a、36b)被設置為一對,且在該等之間設置有入口側排氣部19。因此,從入口側水蒸氣排出部15a朝向入口31側,依照入口側水蒸氣排出部15a、入口側氣體供給部36b、入口側排氣部19、及入口側氣體供給部36a 的順序,該等會被配置。根據該構成,以在入口側水蒸氣排出部15a不會完全被排出而洩漏的方式朝向入口31側流動之些微的水蒸氣,會與從入口側氣體供給部36b所供給的惰性氣體混合而被稀釋。然後,與從入口側氣體供給部36b所供給的惰性氣體混合而被稀釋的水蒸氣,會從入口側排氣部19朝向外部被排出。因此,以從入口側水蒸氣排出部15a洩漏的方式朝向入口31側流動之些微的水蒸氣,亦會從入口側排氣部19被排氣。其結果,可防止水蒸氣流入入口側排氣部19與入口31之間的區域且溫度較低之區域的情形。藉此,可防止水蒸氣流入入口側排氣部19與入口31之間之溫度較低的區域而發生結露的情形。藉由防止結露的發生,可防止水分滴落至從入口31被搬入的被處理物10而弄濕被處理物10,從而對被處理物10之熱處理狀態產生影響的情形。又,根據上述的構成,藉由從被配置在入口側排氣部19與入口31之間的入口側氣體供給部36a所供給的惰性氣體,可更確實地將從水蒸氣供給部13至入口側氣體供給部(36a、36b)為止之區域的環境氛圍、與從入口31至入口側氣體供給部(36a、36b)為止之區域的環境氛圍分離並加以遮斷。Moreover, according to the heat treatment apparatus 1 of this embodiment, the inlet side gas supply part (36a, 36b) is provided as a pair, and the inlet side exhaust part 19 is provided between them. Therefore, from the inlet side water vapor discharge part 15a toward the inlet 31 side, in accordance with the order of the inlet side water vapor discharge part 15a, the inlet side gas supply part 36b, the inlet side exhaust part 19, and the inlet side gas supply part 36a, these will be configured. According to this configuration, the slight water vapor flowing toward the inlet 31 so as not to be completely discharged from the inlet side water vapor discharge part 15a and to leak is mixed with the inert gas supplied from the inlet side gas supply part 36b to be absorbed. dilution. Then, the water vapor diluted by mixing with the inert gas supplied from the inlet-side gas supply unit 36 b is discharged from the inlet-side exhaust unit 19 to the outside. Therefore, the slight amount of water vapor flowing toward the inlet 31 side by leaking from the inlet side water vapor discharge portion 15 a is also exhausted from the inlet side exhaust portion 19 . As a result, water vapor can be prevented from flowing into the region between the inlet-side exhaust portion 19 and the inlet 31 , which is a relatively low temperature region. Thereby, it is possible to prevent water vapor from flowing into a region with a relatively low temperature between the inlet-side exhaust portion 19 and the inlet 31 to cause dew condensation. By preventing condensation, it is possible to prevent moisture from dripping onto the object 10 carried in from the inlet 31 to wet the object 10 and affect the heat treatment state of the object 10 . In addition, according to the above-mentioned configuration, by the inert gas supplied from the inlet-side gas supply part 36a disposed between the inlet-side exhaust part 19 and the inlet 31, the water vapor supply part 13 to the inlet can be flowed more reliably. The ambient atmosphere of the area up to the side gas supply part (36a, 36b) is separated from the ambient atmosphere of the area from the inlet 31 to the inlet side gas supply part (36a, 36b) and blocked.

又,根據本實施形態的熱處理裝置1,由於熱處理室11的出口32相對於外部被開放,因此可連續地迅速地且容易地進行被處理物10從熱處理室11的搬出作業。藉此,可使熱處理程式連續化而謀求熱處理之作業效率的提升。而且,根據熱處理裝置1,除了出口32被開放之外,還設置有出口側氣體供給部(37a、37b),其中,該出口側氣體供給部(37a、37b)相對於水蒸氣供給部13被設置在較被設置於出口32側的出口側水蒸氣排出部15b更靠出口32側,而對熱處理室11內供給惰性氣體。因此,藉由從出口側氣體供給部(37a、37b)供給的惰性氣體,可在朝外部被開放的出口32與出口側水蒸氣排出部15b之間將熱處理室11內的環境氛圍加以分離。亦即,可將從水蒸氣供給部13至出口側氣體供給部(37a、37b)為止之區域的環境氛圍、與從朝外部被開放的出口32至出口側氣體供給部(37a、37b)為止之區域的環境氛圍加以分離。藉此,在為了提升熱處理的作業效率而出口32被開放的熱處理裝置1中,可將從水蒸氣供給部13至出口側水蒸氣排出部15b為止之區域的環境氛圍相對於外部遮斷,而可效率佳地進行利用加熱區域HR內之過熱水蒸氣所進行之被處理物10的熱處理。Furthermore, according to the heat treatment apparatus 1 of the present embodiment, since the outlet 32 of the heat treatment chamber 11 is opened to the outside, the unloading operation of the processed object 10 from the heat treatment chamber 11 can be carried out continuously, quickly and easily. Thereby, the heat treatment program can be continuous and the work efficiency of the heat treatment can be improved. Furthermore, according to the heat treatment apparatus 1, in addition to the outlet 32 being opened, an outlet-side gas supply unit (37a, 37b) is provided, wherein the outlet-side gas supply unit (37a, 37b) is closed relative to the water vapor supply unit 13. The outlet-side steam discharge portion 15b provided on the outlet 32 side is provided on the outlet 32 side, and supplies an inert gas into the heat treatment chamber 11 . Therefore, the atmosphere in the heat treatment chamber 11 can be separated between the outlet 32 opened to the outside and the outlet-side steam discharge unit 15b by the inert gas supplied from the outlet-side gas supply unit (37a, 37b). That is, the ambient atmosphere in the area from the water vapor supply part 13 to the outlet side gas supply part (37a, 37b) and the area from the outlet 32 opened to the outside to the outlet side gas supply part (37a, 37b) can be adjusted. The environmental atmosphere of the area is separated. Thereby, in the heat treatment apparatus 1 in which the outlet 32 is opened in order to improve the working efficiency of the heat treatment, the ambient atmosphere in the region from the water vapor supply part 13 to the outlet side water vapor discharge part 15b can be blocked from the outside, and Heat treatment of the object to be processed 10 using the superheated steam in the heating region HR can be efficiently performed.

又,根據本實施形態的熱處理裝置1,出口側氣體供給部(37a、37b)被設置為一對,在該等之間設置有出口側排氣部20。因此,從出口側水蒸氣排出部15b朝向出口32側,依照出口側水蒸氣排出部15b、出口側氣體供給部37a、出口側排氣部20、及出口側氣體供給部37b的順序,該等構件會被配置。根據該構成,以在出口側水蒸氣排出部15b不會完全被排出而洩漏的方式朝向出口32側流動之些微的水蒸氣,會與從出口側氣體供給部37a所供給的惰性氣體混合而被稀釋。然後,與從出口側氣體供給部37b所供給的惰性氣體混合而被稀釋的水蒸氣,會從出口側排氣部20朝向外部被排出。因此,以從出口側水蒸氣排出部15b洩漏的方式朝向出口32側流動之些微的水蒸氣,亦會從出口側排氣部20被排氣。其結果,可防止水蒸氣流入出口側排氣部20與出口32之間的區域且溫度較低的區域之情形。藉此,可防止水蒸氣流入出口側排氣部20與出口32之間的溫度較低的區域而發生結露的情形。藉由防止結露的發生,當被處理物10從出口32被搬出時,可防止水分滴落至被處理物10而弄濕被處理物10的情形。又,根據上述的構成,藉由從被配置在出口側排氣部20與出口32之間的出口側氣體供給部37b所供給的氣體,可更確實地將從水蒸氣供給部13至出口側氣體供給部(37a、37b)為止之區域的環境氛圍、與從出口32至出口側氣體供給部(37a、37b)為止之區域的環境氛圍分離並加以遮斷。Moreover, according to the heat treatment apparatus 1 of this embodiment, the outlet side gas supply part (37a, 37b) is provided as a pair, and the outlet side exhaust part 20 is provided between them. Therefore, from the outlet side water vapor discharge part 15b toward the outlet 32 side, according to the order of the outlet side water vapor discharge part 15b, the outlet side gas supply part 37a, the outlet side exhaust part 20, and the outlet side gas supply part 37b, these Components will be configured. According to this configuration, the slight water vapor flowing toward the outlet 32 side without being completely discharged from the outlet side water vapor discharge part 15b and leaking is mixed with the inert gas supplied from the outlet side gas supply part 37a and is absorbed. dilution. Then, the water vapor diluted by mixing with the inert gas supplied from the outlet-side gas supply unit 37 b is discharged from the outlet-side exhaust unit 20 to the outside. Therefore, the slight amount of water vapor flowing toward the outlet 32 side by leaking from the outlet side water vapor discharge portion 15 b is also exhausted from the outlet side exhaust portion 20 . As a result, water vapor can be prevented from flowing into the region between the outlet-side exhaust portion 20 and the outlet 32 , which is a relatively low temperature region. This prevents water vapor from flowing into a region with a relatively low temperature between the outlet-side exhaust portion 20 and the outlet 32 to cause dew condensation. By preventing the occurrence of condensation, when the processed object 10 is carried out from the outlet 32 , it is possible to prevent moisture from dripping onto the processed object 10 and making the processed object 10 wet. Also, according to the above-mentioned configuration, the gas supplied from the outlet-side gas supply unit 37b disposed between the outlet-side exhaust unit 20 and the outlet 32 can more reliably transfer gas from the steam supply unit 13 to the outlet side. The ambient atmosphere of the area up to the gas supply part (37a, 37b) is separated from the ambient atmosphere of the area from the outlet 32 to the outlet-side gas supply part (37a, 37b) and blocked.

又,根據本實施形態的熱處理裝置1,水蒸氣供給部13具備有一對噴嘴部(38a、38b)。而且,從一對噴嘴部(38a、38b)之各者被吹出的過熱水蒸氣,會朝向相對向之一對噴嘴部(38a、38b)的中間位置側流動。在相對向之一對噴嘴部(38a、38b)之間的區域,設置有被構成為局部地限制與被處理物10之搬送方向X1平行之方向上的氣體之流動的隔板(22e、22f)。從各噴嘴部(38a、38b)被吹出並朝向一對噴嘴部(38a、38b)之中間位置側流動的各過熱水蒸氣會與隔板(22e、22f)碰撞,而在加熱區域HR內一邊涵蓋與被處理物10之搬送方向X1垂直的截面之整體擴散一邊以在與被處理物10之搬送方向X1平行的方向上翻轉而折回之方式流動。因此,從各噴嘴部(38a、38b)被吹出的過熱水蒸氣,會於朝向一對噴嘴部(38a、38b)的中間位置側流動並翻轉後,以在加熱區域HR內涵蓋與被處理物10之搬送方向X1垂直的截面之整體擴展的狀態,朝向與一對噴嘴部(38a、38b)之中間位置側相反方向,沿著與被處理物10之搬送方向X1平行的方向流動。亦即,從一對噴嘴部(38a、38b)之各者被吹出的過熱水蒸氣,會在一對噴嘴部(38a、38b)之中間位置側流動並翻轉後,以擴展至加熱區域HR之截面之整體的狀態,沿著與被處理物10之搬送方向X1平行的方向並沿著相互地離開的方向流動。因此,從噴嘴部38a吹出的過熱水蒸氣,會以從一對噴嘴部(38a、38b)的中間位置側朝向熱處理室11的入口31側而擴散至加熱區域HR之截面之整體的狀態流動。而且,從噴嘴部38b吹出的過熱水蒸氣,會以從一對噴嘴部(38a、38b)之中間位置側朝向熱處理室11的出口32側而擴散至加熱區域HR之截面之整體的狀態流動。藉此,於熱處理室11內,從一對噴嘴部(38a、38b)之中間位置側朝向入口31側及出口32側之各者,以沿著與被處理物10之搬送方向X1平行的方向擴散至加熱區域HR之截面之整體的狀態,形成有流速偏差更少之更相同之水蒸氣的流動。藉此,於熱處理室11內,會更難以產生水蒸氣之流動會停滯的區域,其結果,於熱處理室11內會更難以產生環境氛圍會停滯的區域。因此,根據上述的構成,可進一步抑制在熱處理室11內發生環境氛圍之停滯的情形。Moreover, according to the heat processing apparatus 1 of this embodiment, the steam supply part 13 is equipped with a pair of nozzle part (38a, 38b). And the superheated steam blown from each of a pair of nozzle part (38a, 38b) flows toward the intermediate position side of a pair of opposing nozzle part (38a, 38b). In the region between a pair of facing nozzle parts (38a, 38b), partition plates (22e, 22f) configured to partially restrict the flow of gas in a direction parallel to the conveying direction X1 of the object 10 are provided. ). Each superheated steam that is blown out from each nozzle portion (38a, 38b) and flows toward the middle position side of a pair of nozzle portions (38a, 38b) will collide with the partition plate (22e, 22f), and will The entire diffusion covering the cross section perpendicular to the conveyance direction X1 of the object 10 flows so as to invert and return in a direction parallel to the conveyance direction X1 of the object 10 . Therefore, the superheated steam blown from each nozzle part (38a, 38b) flows toward the middle position side of the pair of nozzle parts (38a, 38b) and reverses to cover the object to be processed in the heating region HR. 10 in a state where the entire cross-section perpendicular to the conveying direction X1 is expanded, flows in a direction parallel to the conveying direction X1 of the object to be processed 10 in a direction opposite to the middle position side of a pair of nozzle parts (38a, 38b). That is, the superheated steam blown out from each of the pair of nozzle parts (38a, 38b) will flow in the middle position side of the pair of nozzle parts (38a, 38b) and turn over to spread to the heating region HR. The overall state of the cross-section flows in a direction parallel to the conveyance direction X1 of the object 10 and in directions away from each other. Therefore, the superheated steam blown from the nozzle portion 38a flows from the middle position side of the pair of nozzle portions (38a, 38b) toward the inlet 31 side of the heat treatment chamber 11 and spreads over the entire cross section of the heating region HR. The superheated steam blown from the nozzle portion 38b flows from the middle position side of the pair of nozzle portions (38a, 38b) toward the outlet 32 side of the heat treatment chamber 11 and spreads over the entire cross section of the heating region HR. Thereby, in the heat treatment chamber 11, from the middle position side of a pair of nozzle parts (38a, 38b) toward each of the inlet 31 side and the outlet 32 side, along the direction parallel to the conveyance direction X1 of the object 10 to be processed The state of spreading to the entire cross-section of the heating region HR forms a more uniform flow of water vapor with less variation in flow velocity. This makes it more difficult to generate a region where the flow of water vapor stagnates in the heat treatment chamber 11 , and as a result, it becomes more difficult to generate a region where the ambient atmosphere stagnates in the heat treatment chamber 11 . Therefore, according to the above configuration, stagnation of the ambient atmosphere in the heat processing chamber 11 can be further suppressed.

又,根據本實施方式的熱處理裝置1,在一對入口側氣體供給部(36a、36b)之各者與入口側排氣部19之間,設置有局部地限制與被處理物10的搬送方向X1平行的方向上的氣體的流動的入口側隔板(22a、22b)。因此,在夾著入口側排氣部19而配置的一對入口側氣體供給部(36a、36b)之間,可維持以氣體可流動的方式連通環境氛圍的狀態,並且可形成更容易分離環境氛圍的狀態。藉此,可更有效地分離並遮斷從水蒸氣供給部13到入口側氣體供給部(36a、36b)的區段的環境氛圍和從入口31到入口側氣體供給部(36a、36b)的區段的環境氛圍。Furthermore, according to the heat treatment apparatus 1 of the present embodiment, between each of the pair of inlet-side gas supply units (36a, 36b) and the inlet-side exhaust unit 19, a device for locally restricting the transfer direction of the object 10 to be processed is provided. Inlet-side partitions (22a, 22b) for gas flow in a direction parallel to X1. Therefore, between the pair of inlet-side gas supply parts (36a, 36b) arranged across the inlet-side exhaust part 19, the state in which the atmosphere is communicated so that the gas can flow can be maintained, and a more easily separated environment can be formed. state of the atmosphere. Thereby, the ambient atmosphere of the section from the steam supply part 13 to the inlet-side gas supply part (36a, 36b) and the atmosphere from the inlet 31 to the inlet-side gas supply part (36a, 36b) can be more effectively separated and blocked. The environment of the segment.

又,根據本實施形態的熱處理裝置1,在一對出口側氣體供給部(37a、37b)之各者與出口側排氣部20之間,設置有局部地限制與被處理物10之搬送方向X1平行的方向上之氣體之流動的出口側隔板(22i、22j)。因此,在夾著出口側排氣部20被配置的一對出口側氣體供給部(37a、37b)之間,可一邊維持環境氛圍以氣體可進行流動之方式連通的狀態,一邊形成更容易分離環境氛圍的狀態。藉此,可更有效地將從水蒸氣供給部13至出口側氣體供給部(37a、37b)為止之區域的環境氛圍、與從出口32至出口側氣體供給部(37a、37b)為止之區域的環境氛圍分離並加以遮斷。In addition, according to the heat treatment apparatus 1 of the present embodiment, between each of the pair of outlet-side gas supply units (37a, 37b) and the outlet-side exhaust unit 20, an air conditioner for locally restricting the transfer direction of the object 10 to be processed is provided. Outlet-side partitions (22i, 22j) for gas flow in a direction parallel to X1. Therefore, between the pair of outlet-side gas supply units (37a, 37b) disposed across the outlet-side exhaust unit 20, it is possible to form a more easily separated state while maintaining a state in which the ambient atmosphere communicates so that the gas can flow. The state of the ambient atmosphere. Thereby, the ambient atmosphere of the region from the water vapor supply part 13 to the outlet-side gas supply part (37a, 37b) and the region from the outlet 32 to the outlet-side gas supply part (37a, 37b) can be more effectively adjusted. The surrounding atmosphere is separated and blocked.

[變形例] 以上,雖已對本發明之實施形態進行說明,但本發明並非被限定於上述之實施形態者,在申請專利範圍所記載的範圍內可進行各種變更並加以實施。例如,亦可實施如下的變形例。[modified example] Although the embodiments of the present invention have been described above, the present invention is not limited to the above-mentioned embodiments, and various changes can be made and implemented within the scope described in the claims. For example, the following modifications can also be implemented.

(1) 在前述的實施形態中,雖已例示加熱區域被構成為從水蒸氣供給部至入口側氣體供給部為止的區域、及從水蒸氣供給部至出口側氣體供給部為止之區域的形態,但亦可並非如此,而亦可實施其他的形態。加熱區域只要為進行熱處理室內之被處理物之加熱的區域即可,可被構成為進行利用過熱水蒸氣所進行之加熱與利用來自加熱器之熱所進行的加熱(即,利用藉由來自加熱器的熱而經由熱處理室加熱之熱處理室內之環境氛圍所進行的加熱)中之至少任一者的區域。例如,若為從外部對熱處理室進行加熱的加熱器涵蓋從熱處理室的入口至出口為止的區段被配置的形態,熱處理室內涵蓋從入口至出口為止之全長的區域便為加熱區域。(1) In the above-mentioned embodiment, although the example in which the heating area is configured as the area from the steam supply part to the inlet side gas supply part, and the area from the water vapor supply part to the outlet side gas supply part has been exemplified. , but it may not be like this, and other forms may also be implemented. As long as the heating region is a region for heating the object to be processed in the heat treatment chamber, it can be configured to perform heating using superheated steam and heating using heat from the heater (that is, using heat from the heating At least any one of the regions that are heated by the ambient atmosphere in the heat treatment chamber heated by the heat of the heat treatment chamber. For example, if the heater for heating the heat treatment chamber from the outside is arranged to cover the section from the entrance to the exit of the heat treatment chamber, the entire length of the heat treatment chamber from the entrance to the exit is the heating region.

(2) 又,在前述的實施形態中,雖已例示水蒸氣排出部被設置在加熱區域內之被處理物之搬送方向之中央部分的形態,但亦可並非如此,亦可實施其他的形態。例如, 亦可實施水蒸氣供給部被設置在加熱區域內之較被處理物之搬送方向的中央部分更靠入口側或出口側的形態。(2) Also, in the above-mentioned embodiment, although the form in which the steam discharge part is provided in the central part of the conveying direction of the object to be processed in the heating area has been exemplified, this may not be the case, and other forms may also be implemented. . For example, a form in which the steam supply part is provided on the inlet side or the outlet side of the central part in the conveyance direction of the object in the heating area may be implemented.

(3) 又,在前述的實施形態中,雖已例示水蒸氣供給部被構成為具備有在被處理物之搬送方向上相互地對向而被配置的一對噴嘴部的形態,但亦可並非如此,亦可實施其他的形態。例如,亦可實施水蒸氣供給部被構成為具備有1個或3個以上的噴嘴部的形態。又,在前述的實施形態中,雖已例示被形成為圓筒狀的噴嘴部,但噴嘴部的形狀可以並非如此,亦可進行各種變更來實施。例如,亦可實施噴嘴部被形成為箱狀、方筒狀、或複數個圓筒狀的部分以該等之內部連通之狀態被連結的形狀等之各種形狀的形態。又,在前述的實施形態中,雖已例示在噴嘴部,複數個噴嘴孔被設置為朝向一對噴嘴部之中間位置側吹出過熱水蒸氣的形態,但亦可並非如此,亦可實施其他的形態。例如,在噴嘴部,亦可實施複數個噴嘴孔被設置為朝向上方或下方吹出過熱水蒸氣的形態。或者,在噴嘴部,亦可實施複數個噴嘴孔被設置為朝向與一對噴嘴部之中間位置側的相反側吹出過熱水蒸氣的形態。(3) Also, in the above-mentioned embodiment, the water vapor supply unit has been exemplified as being provided with a pair of nozzle units arranged opposite to each other in the conveying direction of the object to be processed, but it may also be Not so, and other forms can also be implemented. For example, the water vapor supply unit may be configured to include one or three or more nozzle units. Moreover, in the above-mentioned embodiment, although the nozzle part formed in the cylindrical shape was illustrated, the shape of a nozzle part may not be like this, and various changes may be implemented. For example, various forms such as a box shape, a square tube shape, or a shape in which a plurality of cylindrical parts are connected in a state in which the interiors of these nozzles are connected can also be implemented. Also, in the above-mentioned embodiment, although it has been exemplified in the nozzle part, a plurality of nozzle holes are provided in the form of blowing superheated steam toward the middle position side of the pair of nozzle parts, but this may not be the case, and other methods may also be implemented. form. For example, in the nozzle portion, a plurality of nozzle holes may be provided so as to blow superheated steam upward or downward. Alternatively, in the nozzle portion, a plurality of nozzle holes may be provided so as to blow superheated steam toward the side opposite to the middle position side of the pair of nozzle portions.

(4) 又,在前述的實施形態中,雖已例示在水蒸氣供給部的一對噴嘴部之間設置有一對隔板及黏合劑排出部的形態,但亦可並非如此,亦可實施其他的形態。例如,亦可實施在水蒸氣供給部的一對噴嘴部之間不設置黏合劑排出部而設置1張隔板的形態。或者,亦可實施在水蒸氣供給部的一對噴嘴部之間不設置隔板而設置黏合劑排出部的形態。或者,亦可實施在水蒸氣供給部的一對噴嘴部之間未設置有隔板及黏合劑排出部之任一者的形態。(4) Also, in the above-mentioned embodiment, although the form in which a pair of partitions and an adhesive discharge part are provided between a pair of nozzle parts of the water vapor supply part has been illustrated, this may not be the case, and other embodiments may also be implemented. Shape. For example, it is also possible to implement a form in which one separator is provided between the pair of nozzle parts of the water vapor supply part without providing the adhesive discharge part. Alternatively, an aspect in which an adhesive discharge portion is provided without providing a partition between a pair of nozzle portions of the water vapor supply portion may be implemented. Alternatively, a form in which neither the partition plate nor the adhesive discharge portion is provided between the pair of nozzle portions of the water vapor supply portion may be implemented.

(5) 又,在前述的實施形態中,雖已例示氣體供給部對熱處理室內供給惰性氣體的形態,但亦可並非如此,亦可實施其他的形態。例如,亦可實施氣體供給部對熱處理室內供給空氣的形態。或者,亦可實施氣體供給部對熱處理室內供給惰性氣體與空氣之混合氣體的形態。(5) In addition, in the above-mentioned embodiment, although the form in which the gas supply part supplies an inert gas to a thermal processing chamber was illustrated, this may not be the case, and other forms may be implemented. For example, an aspect in which the gas supply unit supplies air to the heat processing chamber may also be implemented. Alternatively, a form in which the gas supply unit supplies a mixed gas of an inert gas and air to the heat processing chamber may also be implemented.

(6) 又,在前述的實施形態中,雖已例示入口側氣體供給部被設置為一對的形態,但亦可並非如此,亦可實施其他的形態。例如,亦可實施設置有1個或3個以上之入口側氣體供給部的形態。又,在前述的實施形態中,雖已例示被形成為圓筒狀的入口側氣體供給部,但入口側氣體供給部的形狀亦可並非如此,亦可進行各種變更來實施。例如,亦可實施入口側氣體供給部被形成為箱狀、方筒狀、或複數個圓筒狀的部分以該等之內部連通的狀態被連結的形狀等之各種形狀的形態。又,在前述的實施形態中, 雖已例示在入口側氣體供給部,複數個噴嘴孔被設為朝向下方吹出氣體的形態,但亦可並非如此,亦可實施其他的形態。例如,在噴嘴部,亦可實施複數個噴嘴孔被設為朝向下方以外的方向吹出氣體的形態。(6) In addition, in the above-mentioned embodiment, although the form in which the inlet side gas supply part was provided as a pair was illustrated, this may not be the case, and other forms may be implemented. For example, one, or three or more inlet-side gas supply parts may be provided. Moreover, in the above-mentioned embodiment, although the inlet-side gas supply part formed in cylindrical shape was illustrated, the shape of the inlet-side gas supply part may not be like this, and various changes may be implemented. For example, various forms such as a box shape, a square tube shape, or a shape in which a plurality of cylindrical parts are connected in a state in which the insides of the inlet side gas supply part are connected can also be implemented. In addition, in the above-mentioned embodiment, the gas supply part on the inlet side was exemplified in the form in which the gas is blown downward from the plurality of nozzle holes, but this may not be the case, and other forms may also be implemented. For example, in the nozzle part, it is good also as the form which blows gas toward the direction other than downward direction from several nozzle holes.

(7) 又,在前述的實施形態中,雖已例示出口側氣體供給部被設置為一對的形態, 但亦可並非如此,亦可實施其他的形態。例如,亦可實施設置有1個或3個以上之出口側氣體供給部的形態。又,在前述的實施形態中,雖已例示被形成為圓筒狀的出口側氣體供給部,但出口側氣體供給部的形狀亦可並非如此,亦可進行各種變更來實施。例如,亦可實施出口側氣體供給部被形成為箱狀、方筒狀、或者複數個圓筒狀的部分以該等之內部連通的狀態被連結的形狀等之各種形狀的形態。又,在前述的實施形態中, 雖已例示在出口側氣體供給部,複數個噴嘴孔被設為朝向下方吹出氣體的形態,但亦可並非如此,亦可實施其他的形態。例如,在噴嘴部,亦可實施複數個噴嘴孔被設為朝向下方以外之方向吹出氣體的形態。 (產業上之可利用性)(7) In addition, in the above-mentioned embodiment, although the form in which the outlet side gas supply part was provided as a pair was illustrated, this may not be the case, and other forms may be implemented. For example, one, or three or more outlet-side gas supply units may be provided. Moreover, in the above-mentioned embodiment, although the outlet side gas supply part formed in the cylindrical shape was illustrated, the shape of the outlet side gas supply part may not be like this, and various changes may be implemented. For example, various forms such as a box shape, a square tube shape, or a shape in which a plurality of cylindrical parts are connected in a state in which the insides of the outlet side gas supply part are connected can also be implemented. In addition, in the above-mentioned embodiment, the gas supply part on the outlet side is exemplified in the form in which the gas is blown downward from the plurality of nozzle holes, but this may not be the case, and other forms may also be implemented. For example, in the nozzle portion, a plurality of nozzle holes may be configured to blow gas in directions other than downward. (industrial availability)

本發明係關於利用過熱水蒸氣對被處理物進行加熱來進行被處理物之熱處理的熱處理裝置,而可廣泛地加以應用。The present invention relates to a heat treatment device for heat-treating an object to be processed by heating the object to be processed with superheated steam, and can be widely applied.

1:熱處理裝置 10:被處理物 10a:殼體 11:熱處理室 11a:側壁 11b:側壁 11c:頂壁 11d:底壁 12:加熱器 13:水蒸氣供給部 14:水蒸氣供給系統 15:水蒸氣排出部 15a:水蒸氣排出部 15b:水蒸氣排出部 16a:水蒸氣排出系統 16b:水蒸氣排出系統 17:氣體供給部 18:氣體供給系統 19:入口側排氣部 20:出口側排氣部 21a:排氣系統 21b:排氣系統 22:隔板 22a:隔板 22b:隔板 22c:隔板 22d:隔板 22e:隔板 22f:隔板 22g:隔板 22h:隔板 22i:隔板 22j:隔板 23:黏合劑排出部;黏合劑排氣部 23a:上壁 23b:水平延伸的下壁 23c:側壁 23d:側壁 24:空氣簾部 24a:入口空氣簾部 24b:出口空氣簾部 25:控制部 31:入口 32:出口 33:搬送機構 34:網格帶 35:驅動軸 35a:鏈輪 36a:入口側氣體供給部(氣體供給部) 36b:入口側氣體供給部(氣體供給部) 37a:出口側氣體供給部(氣體供給部) 37b:出口側氣體供給部(氣體供給部) 38a:噴嘴部 38b:噴嘴部 39:噴嘴孔 40:過熱水蒸氣生成部 41:水蒸氣供給配管 42a:水蒸氣供給配管 42b:水蒸氣供給配管 43a:上壁 43b:下壁 43c:側壁 43d:側壁 44:水蒸氣排出管 45:噴射器 46:惰性氣體供給源 46a:共同配管 47:共同配管 48a:分支配管 48b:分支配管 48c:分支配管 48d:分支配管 49a:氣體供給閥 49b:氣體供給閥 49c:氣體供給閥 49d:氣體供給閥 50a:上壁 50b:下壁 50c:側壁 50d:側壁 51:氣體排氣管 52:噴射器 53:黏合劑排出系統 54:黏合劑排出管;黏合劑排氣管 55:噴射器 HR:加熱區域 X1:搬送方向1: Heat treatment device 10: Processed objects 10a: shell 11: Heat treatment chamber 11a: side wall 11b: side wall 11c: top wall 11d: bottom wall 12: heater 13:Steam supply part 14: Water vapor supply system 15: Water vapor discharge part 15a: Water vapor discharge part 15b: Water vapor discharge part 16a: Water Vapor Exhaust System 16b: Water Vapor Exhaust System 17: Gas supply part 18: Gas supply system 19: Inlet side exhaust 20:Exit side exhaust 21a: Exhaust system 21b: Exhaust system 22: Partition 22a: Partition 22b: Partition 22c: Partition 22d: Partition 22e: Partition 22f: Partition 22g: separator 22h: Partition 22i: Partition 22j: Partition 23: Binder discharge part; Binder discharge part 23a: upper wall 23b: Lower wall extending horizontally 23c: side wall 23d: side wall 24: Air curtain 24a: Inlet air curtain 24b: Outlet air curtain 25: Control Department 31: Entrance 32: export 33: Transport mechanism 34: grid belt 35: drive shaft 35a: sprocket 36a: Inlet side gas supply part (gas supply part) 36b: Inlet side gas supply part (gas supply part) 37a: Outlet side gas supply part (gas supply part) 37b: Outlet side gas supply part (gas supply part) 38a: nozzle part 38b: nozzle part 39: nozzle hole 40:Superheated steam generating unit 41:Steam supply piping 42a: Steam supply piping 42b: Steam supply piping 43a: upper wall 43b: lower wall 43c: side wall 43d: side wall 44: Water vapor discharge pipe 45: Injector 46: Inert gas supply source 46a: Common piping 47:Common piping 48a: branch control 48b: branch control 48c: branch control 48d: branch control 49a: Gas supply valve 49b: Gas supply valve 49c: Gas supply valve 49d: Gas supply valve 50a: upper wall 50b: lower wall 50c: side wall 50d: side wall 51: Gas exhaust pipe 52: Injector 53: Binder discharge system 54: Adhesive exhaust pipe; adhesive exhaust pipe 55: Injector HR: heating zone X1: Transport direction

圖1係示意性地表示本發明之實施形態之熱處理裝置之一例的圖。 圖2係示意地表示關於熱處理裝置之水蒸氣供給部、水蒸氣供給系統、水蒸氣排出部、水蒸氣排出系統、氣體供給部、及氣體供給系統等的圖。 圖3係將熱處理裝置之一部分放大而加以表示的圖,圖3(A)係將熱處理裝置中熱處理室之入口及其附近放大而加以表示的圖,而圖3(B)係將熱處理裝置中熱處理室之出口及其附近放大而加以表示的圖。 圖4係將熱處理裝置之熱處理室中水蒸氣供給部及其附近放大而加以表示的圖。 圖5係熱處理裝置之一部分之示意性的剖視圖,圖5(A)係表示從圖4之A-A箭頭位置所觀察之狀態的圖,而圖5(B)係表示從圖4之B-B箭頭位置所觀察之狀態的圖。 圖6係將熱處理裝置之熱處理室中入口側水蒸氣排出部及入口側氣體供給部以及其附近放大而加以表示的圖。 圖7係熱處理裝置之一部分之示意性的剖視圖,圖7(A)係表示從圖6之C-C箭頭位置所觀察之狀態的圖,而圖7(B)係表示從圖6之D-D箭頭位置所觀察之狀態的圖。 圖8係將熱處理裝置之熱處理室中出口側水蒸氣排出部及出口側氣體供給部以及其附近放大而加以表示的圖。 圖9係熱處理裝置之一部分之示意性的剖視圖,圖9(A)係表示從圖8之E-E箭頭位置所觀察之狀態的圖,而圖9(B)係表示從圖8之F-F箭頭位置所觀察之狀態的圖。 圖10係用以說明熱處理裝置中熱處理室內之過熱水蒸氣及惰性氣體之流動的圖。 圖11係用以說明熱處理裝置中熱處理室內之過熱水蒸氣及惰性氣體之流動的圖,圖11(A)係說明在水蒸氣供給部之周圍之區域之過熱水蒸氣及惰性氣體之流動的圖,圖11(B)係說明在入口側水蒸氣排出部及入口側氣體供給部之周圍之區域之過熱水蒸氣及惰性氣體之流動的圖,而圖11(C)係說明出口側水蒸氣排出部及出口側氣體供給部之周圍之區域之過熱水蒸氣及惰性氣體之流動的圖。Fig. 1 is a diagram schematically showing an example of a heat treatment apparatus according to an embodiment of the present invention. 2 is a diagram schematically showing a water vapor supply unit, a water vapor supply system, a water vapor discharge unit, a water vapor discharge system, a gas supply unit, a gas supply system, and the like of the heat treatment apparatus. Fig. 3 is a part of the heat treatment device enlarged and shown, Fig. 3 (A) is the entrance of the heat treatment chamber in the heat treatment device and its vicinity is enlarged and shown, and Fig. 3 (B) is the heat treatment device An enlarged view of the exit of the heat treatment chamber and its vicinity. Fig. 4 is an enlarged view showing a water vapor supply part and its vicinity in a heat treatment chamber of a heat treatment apparatus. Fig. 5 is a schematic cross-sectional view of a part of the heat treatment device, Fig. 5(A) is a view showing the state observed from the position of the A-A arrow in Fig. 4, and Fig. 5(B) is a view from the position of the B-B arrow in Fig. 4 A diagram of states of observation. 6 is an enlarged view showing an inlet-side water vapor discharge unit, an inlet-side gas supply unit, and their vicinity in a heat treatment chamber of a heat treatment apparatus. Fig. 7 is a schematic cross-sectional view of a part of the heat treatment device, Fig. 7 (A) is a view showing the state observed from the position of the arrow C-C in Fig. 6, and Fig. 7 (B) is a view from the position of the arrow D-D in Fig. A diagram of states of observation. Fig. 8 is an enlarged view showing an outlet-side water vapor discharge unit, an outlet-side gas supply unit and their vicinity in a heat treatment chamber of a heat treatment apparatus. Fig. 9 is a schematic cross-sectional view of a part of the heat treatment device, Fig. 9 (A) is a view showing the state viewed from the position of the E-E arrow in Fig. 8, and Fig. 9 (B) is a view from the position of the F-F arrow in Fig. 8 A diagram of states of observation. Fig. 10 is a diagram for explaining the flow of superheated steam and inert gas in the heat treatment chamber of the heat treatment apparatus. Fig. 11 is a diagram for explaining the flow of superheated steam and inert gas in the heat treatment chamber of the heat treatment device, and Fig. 11(A) is a diagram for explaining the flow of superheated steam and inert gas in the area around the steam supply part , Figure 11(B) is a diagram illustrating the flow of superheated steam and inert gas in the area around the inlet side water vapor discharge part and the inlet side gas supply part, and Figure 11(C) is a diagram illustrating the outlet side water vapor discharge The diagram of the flow of superheated steam and inert gas in the area around the part and the gas supply part on the outlet side.

1:熱處理裝置 1: Heat treatment device

10:被處理物 10: Processed objects

10a:殼體 10a: Shell

11:熱處理室 11: Heat treatment chamber

12:加熱器 12: heater

13:水蒸氣供給部 13:Steam supply part

15:水蒸氣排出部 15: Water vapor discharge part

15a:水蒸氣排出部 15a: Water vapor discharge part

15b:水蒸氣排出部 15b: Water vapor discharge part

17:氣體供給部 17: Gas supply part

19:入口側排氣部 19: Inlet side exhaust

20:出口側排氣部 20:Exit side exhaust

22:隔板 22: Partition

23:黏合劑排出部 23: Adhesive discharge part

24:空氣簾部 24: Air curtain

24a:入口空氣簾部 24a: Inlet air curtain

24b:出口空氣簾部 24b: Outlet air curtain

31:入口 31: Entrance

32:出口 32: export

33:搬送機構 33: Transport mechanism

36a:入口側氣體供給部(氣體供給部) 36a: Inlet side gas supply part (gas supply part)

36b:入口側氣體供給部(氣體供給部) 36b: Inlet side gas supply part (gas supply part)

37a:出口側氣體供給部(氣體供給部) 37a: Outlet side gas supply part (gas supply part)

37b:出口側氣體供給部(氣體供給部) 37b: Outlet side gas supply part (gas supply part)

HR:加熱區域 HR: heating zone

X1:搬送方向 X1: Transport direction

Claims (8)

一種熱處理裝置,係利用過熱水蒸氣對被處理物進行加熱來實施該被處理物之熱處理者;其具備有:熱處理室,其設置有供上述被處理物搬入的入口及供上述被處理物搬出的出口,對從上述入口朝向上述出口被搬送之上述被處理物實施熱處理;水蒸氣供給部,其被設置於上述熱處理室中作為實施上述被處理物之加熱之區域的加熱區域,其對上述熱處理室內供給過熱水蒸氣;水蒸氣排出部,其在上述熱處理室中,相對於上述水蒸氣供給部分別被設置於上述入口側及上述出口側,將上述熱處理室內的過熱水蒸氣朝向上述熱處理室的外部排出;以及噴射器,其將過熱水蒸氣從上述水蒸氣排出部抽吸並朝向上述熱處理室的外部排出;上述水蒸氣排出部被形成為沿著與上述被處理物之搬送方向垂直的方向即上述熱處理室之寬度方向延伸之中空的箱狀,並且設有將過熱水蒸氣吸入的複數個貫通孔。 A heat treatment device that heats the object to be processed by using superheated steam to heat the object to be processed; it is equipped with: a heat treatment chamber, which is provided with an inlet for carrying in the object to be processed and an outlet for carrying out the object to be processed The outlet is used to heat-treat the object to be processed that is transported from the inlet toward the outlet; the water vapor supply unit is installed in the heating area of the heat treatment chamber as a region where the object to be processed is heated, and it is used for the above-mentioned Superheated steam is supplied in the heat treatment chamber; a water vapor discharge unit is provided on the inlet side and the outlet side of the water vapor supply unit in the heat treatment chamber, and directs the superheated steam in the heat treatment chamber toward the heat treatment chamber. and an ejector that sucks superheated steam from the steam discharge part and discharges it toward the outside of the heat treatment chamber; the steam discharge part is formed along a direction perpendicular to the conveying direction of the object to be processed It is a hollow box shape extending in the width direction of the above-mentioned heat treatment chamber, and is provided with a plurality of through holes for sucking superheated steam. 如請求項1之熱處理裝置,其進一步具備有對上述熱處理室內供給惰性氣體及空氣中之至少任一者的氣體供給部,上述入口相對於上述熱處理室的外部被開放,在上述熱處理裝置中具有入口側氣體供給部作為上述氣體供給部,該入口側氣體供給部設於較相對於上述熱處理室中之上述水蒸氣供給部而被設在上述入口側之上述水蒸氣排出部更靠上述入口側。 The heat treatment apparatus according to claim 1, further comprising a gas supply unit for supplying at least one of an inert gas and air into the heat treatment chamber, the inlet being opened to the outside of the heat treatment chamber, and the heat treatment apparatus having The inlet-side gas supply part is the gas supply part, and the inlet-side gas supply part is provided on the inlet side of the water vapor discharge part provided on the inlet side with respect to the water vapor supply part in the heat treatment chamber. . 如請求項2之熱處理裝置,其中,上述入口側氣體供給部被設置為一對,於上述熱處理室中,在一對上述入口側氣體供給部之間,設置有將上述 熱處理室內之氣體朝向上述熱處理室之外部排出的入口側排氣部。 The heat treatment device according to claim 2, wherein the inlet-side gas supply unit is provided as a pair, and in the heat treatment chamber, between the pair of the inlet-side gas supply units, the above-mentioned The gas in the heat treatment chamber is exhausted toward the outside of the heat treatment chamber. 如請求項1之熱處理裝置,其進一步具備有對上述熱處理室內供給惰性氣體及空氣中之至少任一者的氣體供給部,上述出口相對於上述熱處理室的外部被開放,在上述熱處理裝置中具有出口側氣體供給部作為上述氣體供給部,該出口側氣體供給部設於較相對於上述熱處理室中之上述水蒸氣供給部而被設在上述出口側之上述水蒸氣排出部更靠上述出口側。 The heat treatment apparatus according to claim 1, further comprising a gas supply unit for supplying at least one of an inert gas and air into the heat treatment chamber, the outlet being opened to the outside of the heat treatment chamber, and the heat treatment apparatus having An outlet-side gas supply unit is the gas supply unit, and the outlet-side gas supply unit is provided on the outlet side of the water vapor discharge unit provided on the outlet side with respect to the water vapor supply unit in the heat treatment chamber. . 如請求項4之熱處理裝置,其中,上述出口側氣體供給部被設置為一對,於上述熱處理室中,在一對上述出口側氣體供給部之間設置有將上述熱處理室內之氣體朝向上述熱處理室之外部排出的出口側排氣部。 The heat treatment device according to claim 4, wherein the outlet-side gas supply unit is provided as a pair, and in the heat treatment chamber, a device for directing the gas in the heat treatment chamber toward the heat treatment chamber is provided between the pair of outlet-side gas supply units. Exhaust on the outlet side of the chamber. 如請求項1至5中任一項之熱處理裝置,其中,上述水蒸氣供給部具備有在上述被處理物的搬送方向上相互地對向而被配置的一對噴嘴部,一對上述噴嘴部之各者被構成為朝向相對向之一對上述噴嘴部的中間位置側吹出過熱水蒸氣。 The heat treatment apparatus according to any one of claims 1 to 5, wherein the steam supply unit includes a pair of nozzles arranged to face each other in the conveyance direction of the object to be processed, and the pair of nozzles Each of them is configured to blow superheated steam toward an intermediate position side of a pair of opposing nozzle portions. 如請求項3之熱處理裝置,其中,在一對上述入口側氣體供給部之各者與上述入口側排氣部之間分別設置有入口側隔板,上述入口側隔板被構成為局部地限制上述熱處理室中之與上述被處理物之搬送方向平行之方向上的氣體的流動。 The heat treatment device according to claim 3, wherein an inlet-side partition is respectively provided between each of the pair of inlet-side gas supply parts and the above-mentioned inlet-side exhaust part, and the inlet-side partition is configured to partially restrict The gas flow in the direction parallel to the conveyance direction of the object to be processed in the heat treatment chamber. 如請求項5之熱處理裝置,其中,在一對上述出口側氣體供給部之各者與上述出口側排氣部之間分別設置有出口側隔板, 上述出口側隔板被構成為局部地限制上述熱處理室中之與上述被處理物之搬送方向平行之方向上的氣體的流動。The heat treatment apparatus according to claim 5, wherein an outlet-side partition is provided between each of the pair of outlet-side gas supply units and the outlet-side exhaust unit, The outlet-side partition plate is configured to locally restrict a flow of gas in a direction parallel to a conveyance direction of the object to be processed in the heat treatment chamber.
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