TWI801142B - 加工條件設定裝置、加工條件設定方法及晶圓製造系統 - Google Patents

加工條件設定裝置、加工條件設定方法及晶圓製造系統 Download PDF

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Publication number
TWI801142B
TWI801142B TW111106171A TW111106171A TWI801142B TW I801142 B TWI801142 B TW I801142B TW 111106171 A TW111106171 A TW 111106171A TW 111106171 A TW111106171 A TW 111106171A TW I801142 B TWI801142 B TW I801142B
Authority
TW
Taiwan
Prior art keywords
condition setting
processing condition
manufacturing system
wafer manufacturing
setting device
Prior art date
Application number
TW111106171A
Other languages
English (en)
Other versions
TW202241641A (zh
Inventor
宮崎裕司
Original Assignee
日商Sumco股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Sumco股份有限公司 filed Critical 日商Sumco股份有限公司
Publication of TW202241641A publication Critical patent/TW202241641A/zh
Application granted granted Critical
Publication of TWI801142B publication Critical patent/TWI801142B/zh

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Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/41875Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by quality surveillance of production
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q15/00Automatic control or regulation of feed movement, cutting velocity or position of tool or work
    • B23Q15/007Automatic control or regulation of feed movement, cutting velocity or position of tool or work while the tool acts upon the workpiece
    • B23Q15/013Control or regulation of feed movement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/32Operator till task planning
    • G05B2219/32201Build statistical model of past normal proces, compare with actual process
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/45Nc applications
    • G05B2219/45031Manufacturing semiconductor wafers
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/45Nc applications
    • G05B2219/45232CMP chemical mechanical polishing of wafer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Automation & Control Theory (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW111106171A 2021-02-22 2022-02-21 加工條件設定裝置、加工條件設定方法及晶圓製造系統 TWI801142B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021026648A JP2022128233A (ja) 2021-02-22 2021-02-22 加工条件設定装置、加工条件設定方法、及びウェーハの製造システム
JP2021-026648 2021-02-22

Publications (2)

Publication Number Publication Date
TW202241641A TW202241641A (zh) 2022-11-01
TWI801142B true TWI801142B (zh) 2023-05-01

Family

ID=82931587

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111106171A TWI801142B (zh) 2021-02-22 2022-02-21 加工條件設定裝置、加工條件設定方法及晶圓製造系統

Country Status (7)

Country Link
US (1) US20240123566A1 (zh)
JP (1) JP2022128233A (zh)
KR (1) KR20230119024A (zh)
CN (1) CN116888712A (zh)
DE (1) DE112022001172T5 (zh)
TW (1) TWI801142B (zh)
WO (1) WO2022176576A1 (zh)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003085526A (ja) * 2001-09-12 2003-03-20 Toshiba Corp 最適値探索装置、最適値探索方法、最適値探索プログラム、パラメータ・フィッティング方法及び半導体装置の製造方法
JP2005520317A (ja) * 2001-06-19 2005-07-07 アプライド マテリアルズ インコーポレイテッド 半導体ウェハの表面平坦化方法及びその装置
JP2005317864A (ja) * 2004-04-30 2005-11-10 Renesas Technology Corp ウェハの研磨方法
TWI277149B (en) * 2003-04-11 2007-03-21 Trecenti Technologies Inc Manufacturing method of semiconductor device, automatic operation method of semiconductor device, automatic operation system, and automatic operation method of CMP apparatus
WO2007094443A1 (ja) * 2006-02-17 2007-08-23 Nikon Corporation 調整方法、基板処理方法、基板処理装置、露光装置、検査装置、測定検査システム、処理装置、コンピュータ・システム、プログラム及び情報記録媒体
JP2009267159A (ja) * 2008-04-25 2009-11-12 Sumco Techxiv株式会社 半導体ウェーハの製造装置及び方法
JP2016032862A (ja) * 2014-07-30 2016-03-10 エルジー・シルトロン・インコーポレーテッド ウエハー研磨装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4827292B2 (ja) 2000-11-01 2011-11-30 アプライド マテリアルズ インコーポレイテッド 研磨装置
JP5293153B2 (ja) * 2002-03-14 2013-09-18 株式会社ニコン 加工量予測方法
JP2007220842A (ja) * 2006-02-16 2007-08-30 Renesas Technology Corp 半導体装置の製造方法、ウェハの研磨方法、および電極間隔の設定方法
JP5691796B2 (ja) * 2011-04-26 2015-04-01 株式会社Sumco 研磨装置、および、研磨方法
JP7137943B2 (ja) * 2018-03-20 2022-09-15 株式会社日立ハイテク 探索装置、探索方法及びプラズマ処理装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005520317A (ja) * 2001-06-19 2005-07-07 アプライド マテリアルズ インコーポレイテッド 半導体ウェハの表面平坦化方法及びその装置
JP2003085526A (ja) * 2001-09-12 2003-03-20 Toshiba Corp 最適値探索装置、最適値探索方法、最適値探索プログラム、パラメータ・フィッティング方法及び半導体装置の製造方法
TWI277149B (en) * 2003-04-11 2007-03-21 Trecenti Technologies Inc Manufacturing method of semiconductor device, automatic operation method of semiconductor device, automatic operation system, and automatic operation method of CMP apparatus
JP2005317864A (ja) * 2004-04-30 2005-11-10 Renesas Technology Corp ウェハの研磨方法
WO2007094443A1 (ja) * 2006-02-17 2007-08-23 Nikon Corporation 調整方法、基板処理方法、基板処理装置、露光装置、検査装置、測定検査システム、処理装置、コンピュータ・システム、プログラム及び情報記録媒体
JP2009267159A (ja) * 2008-04-25 2009-11-12 Sumco Techxiv株式会社 半導体ウェーハの製造装置及び方法
TWI384541B (zh) * 2008-04-25 2013-02-01 Sumco Techxiv Corp Semiconductor wafer manufacturing apparatus and method
JP2016032862A (ja) * 2014-07-30 2016-03-10 エルジー・シルトロン・インコーポレーテッド ウエハー研磨装置

Also Published As

Publication number Publication date
US20240123566A1 (en) 2024-04-18
JP2022128233A (ja) 2022-09-01
DE112022001172T5 (de) 2023-12-14
WO2022176576A1 (ja) 2022-08-25
TW202241641A (zh) 2022-11-01
CN116888712A (zh) 2023-10-13
KR20230119024A (ko) 2023-08-14

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