TWI796692B - Detection device of surface inclination amount, control device, and laser processing device - Google Patents
Detection device of surface inclination amount, control device, and laser processing device Download PDFInfo
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Abstract
Description
本揭示關於一種用以檢測出電流計鏡(Galvanic mirror,又稱Galvanometer mirror)的面歪斜量之面歪斜量檢測裝置、控制裝置及雷射加工裝置。The disclosure relates to a surface deflection detecting device, a control device and a laser processing device for detecting the deflection of a Galvanic mirror (also known as a Galvanometer mirror).
對於印刷基本等之被加工物進行開孔的雷射加工裝置,係藉由電流計掃描器(Galvanic scanner,又稱galvanometer scanner)來控制屬於對於被加工物加工之加工位置的雷射光照射位置。當電流計掃描器反覆進行同一節距(pitch)的加工位置移動時,會因為加工位置移動的移動週期而引起轉子及電流計鏡的面歪斜共振。並且,當面歪斜共振發生時,會在與由電流計掃描器所控制的加工位置的移動方向正交的方向發生加工位置的位置偏離。The laser processing device for opening holes in the processed object such as printing uses a galvanic scanner (also known as a galvanometer scanner) to control the laser light irradiation position belonging to the processing position for processing the processed object. When the galvanometer scanner repeatedly moves the processing position at the same pitch, the surface skew resonance of the rotor and the galvanometer mirror will be caused due to the movement period of the processing position movement. In addition, when plane skew resonance occurs, a positional deviation of the processing position occurs in a direction perpendicular to the moving direction of the processing position controlled by the galvanometer scanner.
雖然有一種嚴密地實施轉子之重量平衡調整而藉此減輕面歪斜量的方法,惟激振力仍會隨著要求的定位速度的上昇而增大,僅藉由重量平衡調整難以獲得所需的定位精密度。Although there is a method to strictly implement the weight balance adjustment of the rotor to reduce the amount of surface deflection, the exciting force will still increase with the increase of the required positioning speed, and it is difficult to obtain the required positioning speed only by weight balance adjustment. Positioning precision.
專利文獻1所揭示的雷射加工裝置係事先於電流計鏡貼上壓電元件而利用壓電元件來檢測出電流計鏡的面歪斜,並補正電流計鏡的面歪斜。
(先前技術文獻)
(專利文獻)In the laser processing device disclosed in
專利文獻1:日本專利公開公報2011-154196號Patent Document 1: Japanese Patent Laid-Open Publication No. 2011-154196
[發明所欲解決的課題][Problems to be Solved by the Invention]
然而,在上述專利文獻1的技術中,必須在電流計鏡貼上壓電元件,因此壓電元件對電流計鏡造成影響。因此,會有為了正確地檢測電流計鏡的面歪斜量而使驅動電流計鏡的電流計掃描器的構成變得複雜的問題。However, in the technique of the above-mentioned
本揭示有鑑於上述而研創者,目的在於獲得一種面歪斜量檢測裝置,可利用簡單的構成來檢測出電流計鏡的正確的面歪斜量。 [解決課題的手段]The present disclosure was developed in view of the above, and an object thereof is to obtain a surface skew amount detection device capable of detecting the correct surface skew amount of a galvanometer mirror with a simple configuration. [means to solve the problem]
為解決上述課題並達成目的,本揭示的面歪斜量檢測裝置係具備輸入部,該輸入部係從配置於電流計鏡之旋轉軸上的編碼器接受顯示電流計鏡之旋轉角度的電流計角度位置,該電流計鏡係使雷射光朝加工位置偏向。此外,本揭示的面歪斜量檢測裝置係具備位移量算出部,該位移量算出部係根據電流計角度位置而算出殘餘振動,該殘餘振動係與屬於電流計鏡之旋轉方向的角度偏離量的面歪斜量相關聯。 [發明之效果]In order to solve the above-mentioned problems and achieve the object, the surface skew detection device of the present disclosure is provided with an input unit that receives a galvanometer angle indicating the rotation angle of the galvanometer mirror from an encoder disposed on the rotation axis of the galvanometer mirror. position, the galvanometer mirror deflects the laser light towards the processing position. In addition, the surface deflection detection device of the present disclosure is provided with a displacement calculation unit that calculates residual vibration based on the angular position of the galvanometer. face skew. [Effect of Invention]
本揭示的面歪斜量檢測裝置係達成可利用簡單的構成來檢測出電流計鏡之正確的面歪斜量的效果。The surface deflection detection device of the present disclosure achieves the effect of being able to detect the correct surface deflection of the galvanometer mirror with a simple structure.
以下,根據圖式詳細說明本揭示的實施型態之面歪斜量檢測裝置、控制裝置及雷射加工裝置。Hereinafter, the surface distortion detection device, the control device, and the laser processing device according to the embodiments of the present disclosure will be described in detail based on the drawings.
實施型態
圖1係顯示實施型態之雷射加工裝置的購成之圖。雷射加工裝置101係藉由屬於脈衝雷射光(pulsed laser)的雷射光L1的照射而在被加工物W進行微細孔的開孔加工的裝置。亦即,雷射加工裝置101係藉由循環脈衝模式(cycle pulse mode)而在被加工物W進行微細孔的開孔加工。implementation type
Fig. 1 is a diagram showing the purchase of the laser processing device of the embodiment. The
在本實施型態中,雷射加工裝置101係藉由編碼器來檢測出由電流計鏡3X,3Y的面歪斜共振所致之鏡面的位移量。編碼器係檢測顯示電流計鏡3X,3Y之旋轉角度的電流計角度位置來作為鏡面的位移量。該鏡面的位移量係與屬於雷射光照射位置之加工位置的位置偏離相對應。In this embodiment, the
雷射加工裝置101係利用電流計鏡3X,3Y之鏡面沒有位移者的電流計鏡來消除與電流計鏡3X,3Y之位移相對應的加工位置的位置偏離,藉此使加工位置的定位精密度提升。The
雷射加工裝置101係具備有:雷射振盪器1、像轉移光學機構2、雷射加工部4、及控制裝置20;該雷射振盪器1係振盪出雷射光L0;該像轉移光學機構2係將雷射光L0進行整形並且調整成期望的射束形狀及射束能量;該雷射加工部4係進行屬於工件之被加工物W的雷射加工。例外,在此的循環脈衝模式為:依序掃描被設定在被加工物W的複數個開空加工位置,以複數循環來進行對於各孔的雷射照射的加工處理。亦即,循環脈衝模式係重複進行複數次將雷射光L1各照射1發(1 shot)的照射循環之加工處理。The
雷射振盪器1係振盪出雷射光L0並送出至像轉移光學機構2。像轉移光學機構2係具備:準直透鏡(collimation lens)2C、及遮罩2M。準直透鏡2C係將來自雷射振盪器1的雷射光L0予以聚光並調整光軸以進行平行化,而遮罩2M係將雷射光L0的光束形狀進行整形。The
雷射加工部4係具備:電流計鏡3X,3Y、電流計掃描器5X,5Y、fθ透鏡6、XY滑台8、以及面歪斜量檢測裝置10A。電流計掃描器5X,5Y係具有使雷射光L0的軌道變化而對於被加工物W的照射位置移動的功能(亦即定位功能),且為了沿X-Y方向掃描雷射光L0,而使電流計鏡3X,3Y沿預定的角度轉動。藉此,電流計掃描器5X,5Y係令電流計鏡3X,3Y使雷射光L1朝被設定於加工區域的加工位置偏向。The
電流計鏡3X,3Y係使從像轉移光學機構2的遮罩2M所射出之作為光射束的雷射光L0反射、並且朝任意的角度偏向。電流計鏡3X係使雷射光L0朝X方向偏向,而電流計鏡3Y係使雷射光L0朝Y方向偏向。fθ透鏡6係使雷射光L0朝垂直於被加工物W之表面的方向偏向後的雷射光L1聚光並照射在被加工物W的加工位置的表面。The
面歪斜量檢測裝置10A係根據由編碼器所檢測到的電流計角度位置來檢測出電流計鏡3X,3Y的殘餘振動。電流計鏡3X,3Y的殘餘振動係與電流計鏡3X,3Y的面歪斜量相對應。殘餘振動為在電流計鏡3X,3Y旋轉後使旋轉停止之狀態的振動。The surface skew
於面歪斜量檢測裝置10A所檢測之電流計鏡3X,3Y的殘餘振動中係含有殘餘振動時之面歪斜之頻率的資訊。面歪斜量檢測裝置10A係將作為檢測結果之殘餘振動的資訊(以下,稱殘餘振動資訊)傳送至控制裝置20。在本實施型態中,在作為雷射加工前之準備的準備工作時,面歪斜量檢測裝置10A就將殘餘振動資訊傳送至控制裝置20。The residual vibration of the
控制裝置20係根據從面歪斜量檢測裝置10A傳送而來的殘餘振動的頻率,修正電流計鏡3X,3Y的位置。在本實施型態中,在作為雷射加工前之準備的準備工作時,控制裝置20係根據殘餘振動資訊所含有的面歪斜量而事先算出用以修正電流計鏡3X,3Y之位置的修正量。用以修正電流計鏡3X,3Y之位置的修正量為用以修正雷射光照射位置的修正量(以下,稱加工位置修正量)。The
控制裝置20係事先記憶加工位置修正量及殘餘振動資訊所含有的頻率。在實際的雷射加工時,控制裝置20係根據雷射加工所用之加工程式而算出雷射加工時的頻率。在所算出的頻率與事先記憶的頻率之差比基準值還小的情形,控制裝置20係利用事先記憶的加工位置修正量來修正電流計鏡3X,3Y的位置。The
控制裝置20係由個人電腦等的電腦來構成,且藉由數值(NC:Numerical Control)控制等來控制雷射振盪器1、像轉移光學機構2、及雷射加工部4。The
被加工物W為印刷基板等的基板,且進行複數個開孔加工。XY滑台8為載置被加工物W者,且藉由未圖示的X軸馬達及Y軸馬達的驅動而在X軸-Y軸二維平面上自由地移動。XY滑台8係使照射雷射光L1的加工區域沿XY方向移動。The workpiece W is a substrate such as a printed circuit board, and is subjected to a plurality of drilling processes. The XY slide table 8 is for placing the workpiece W, and is driven by an unshown X-axis motor and a Y-axis motor to move freely on the X-axis-Y-axis two-dimensional plane. The XY slide table 8 moves the processing area irradiated with the laser light L1 in the XY direction.
圖2係顯示實施型態之雷射加工裝置所具備的控制裝置之構成的方塊圖。控制裝置20係連接於面歪斜量檢測裝置10A。對於面歪斜量檢測裝置10A係輸入由編碼器所檢測到的電流計角度位置。此外,控制裝置20係連接於XY滑台8、雷射振盪器1、及電流計掃描器5X,5Y。FIG. 2 is a block diagram showing the configuration of a control device included in the laser processing device of the embodiment. The
控制裝置20係具備輸入部21、加工程式記憶部22、修正量算出部23、指示作成部24、輸出部25、及修正量記憶部26。輸入部21係從面歪斜量檢測裝置10A接受作為檢測結果的殘餘振動資訊,並傳送至修正量算出部23。The
加工程式記憶部22為記憶被加工物W的雷射加工所用之加工程式的記憶體等。在加工程式內係設定有顯示被加工物W上之加工位置的座標等。The processing formula memory unit 22 is a memory for storing a processing formula used for laser processing of the workpiece W, and the like. In the machining formula, coordinates and the like indicating the machining position on the workpiece W are set.
修正量算出部23係根據殘餘振動資訊所含有的面歪斜量而算出加工位置修正量。控制裝置20中,係預先在加工程式記憶部22內等記憶加工位置修正量相對於面歪斜量的關係,修正量算出部23係根據加工位置修正量相對於面歪斜量的關係及所檢測到的面歪斜量而算出加工位置修正量。The correction amount calculation unit 23 calculates the machining position correction amount based on the surface skew amount included in the residual vibration information. In the
修正量算出部23係於準備工作時事先算出加工位置修正量。修正量算出部23係於準備工作時事先將對應資訊儲存於修正量記憶部26,該對應資訊係將所算出的加工位置修正量與殘餘振動資訊所含有的頻率建立對應關係而成者。修正量記憶部26係記憶對應資訊的記憶體等。The correction amount calculation unit 23 calculates the machining position correction amount in advance during the preparation work. The correction amount calculation unit 23 stores corresponding information in the correction amount storage unit 26 in advance during preparation. The corresponding information is a correspondence between the calculated processing position correction amount and the frequency contained in the residual vibration information. The correction amount storage unit 26 is a memory or the like for storing corresponding information.
當要在準備工作中檢測出旋轉方向的殘餘振動時,控制裝置20係對電流計掃描器5X,5Y激發振動,以使電流計鏡3X,3Y藉由電流計鏡3X,3Y的固有頻率而振動,該固有頻率係於電流計鏡3X,3Y之製造時預先量測者。藉此,藉由電流計鏡3X,3Y的固有頻率來使電流計鏡3X,3Y發生面歪斜。如此,電流計鏡3X,3Y係藉由依每個個體而不同的頻率而振動,故控制裝置20係藉由預先量測的電流計鏡3X,3Y的固有頻率來使電流計鏡3X,3Y振動。藉此,可使在雷射加工時發生之振動的頻率及面歪斜量發生於電流計鏡3X,3Y。When the residual vibration in the direction of rotation is to be detected during preparation, the
修正量算出部23係於實際的雷射加工時,根據加工程式記憶部22內的加工程式而算出雷射加工時之殘餘振動的頻率。在加工程式中係規定有電流計鏡3X,3Y的各種動作,故修正量算出部23係根據加工程式中所規定的動作而算出雷射加工時之殘餘振動的頻率。修正量算出部23係於實際的雷射加工時比較所算出的頻率與事先儲存於修正量記憶部26的頻率。The correction amount calculation unit 23 calculates the frequency of residual vibration during laser processing based on the processing formula in the processing formula memory unit 22 during actual laser processing. Various operations of the galvanometer mirrors 3X and 3Y are specified in the processing formula, so the correction amount calculating unit 23 calculates the frequency of residual vibration during laser processing based on the operations specified in the processing formula. The correction amount calculation unit 23 compares the calculated frequency with the frequency previously stored in the correction amount memory unit 26 during actual laser processing.
於準備工作時由修正量算出部23所取得之殘餘振動資訊所含有的頻率為第一頻率,於實際之雷射加工時由修正量算出部23以加工程式所算出的頻率為第二頻率。The frequency included in the residual vibration information obtained by the correction amount calculation unit 23 during preparation is the first frequency, and the frequency calculated by the correction amount calculation unit 23 using the processing formula during actual laser processing is the second frequency.
在事先儲存於修正量記憶部26的頻率當中具有與所算出的頻率之差比基準值還小的頻率的情形,修正量算出部23係從修正量記憶部26內的對應資訊抽出與該頻率相對應的加工位置修正量。修正量算出部23係將加工位置修正量傳送至指示作成部24。When there is a frequency whose difference from the calculated frequency is smaller than the reference value among the frequencies previously stored in the correction amount storage unit 26, the correction amount calculation unit 23 extracts the corresponding frequency from the corresponding information in the correction amount storage unit 26. Corresponding processing position correction amount. The correction amount calculation unit 23 transmits the machining position correction amount to the instruction creation unit 24 .
指示作成部24係根據加工程式記憶部22內的加工程式而作成對於XY滑台8及雷射振盪器1的指示資訊。此外,指示作成部24係根據加工程式而作成對於電流計掃描器5X,5Y的指示資訊。此外,本實施型態的指示作成部24係使用修正量算出部23所算出的加工位置修正量而作成修正位置指令,該修正位置指令為修正對於電流計掃描器5X,5Y的位置指令者。指示作成部24係作成修正位置指令,以抵消由面歪斜共振所產生之雷射光照射位置的位置偏離,亦即使雷射光L1照射至期望的雷射光照射位置。指示作成部24係使用根據加工程式而成的位置指令與修正位置指令而作成對於電流計掃描器5X,5Y之指示資訊的位置指令。The instruction creation unit 24 creates instruction information for the XY slide table 8 and the
指示作成部24係將作成的指示資訊傳送至輸出部25。輸出部25係將對於電流計掃描器5X,5Y的傳送資訊傳送至電流計掃描器5X,5Y,且將對於XY滑台8及雷射振盪器1的指示資訊分別傳送至XY滑台8及雷射振盪器1。The instruction generating unit 24 transmits the generated instruction information to the
在此,說明電流計掃描器5X,5Y的構成。另外,電流計掃描器5X與電流計掃描器5Y係具有同樣的構成,因此,在以下說明電流計掃描器時,係就電流計掃描器5Y說明。Here, the configuration of the
圖3係顯示實施型態之雷射加工裝置所具備的電流計掃描器之構成的方塊圖。電流計掃描器5Y係包含自電流計鏡3Y側延伸之轉子52的一部分而構成。電流計掃描器5Y中,係於轉子52配置有:軸承55,57、鏡驅動部56、以及屬於角度檢測器的編碼器58。轉子52係藉由軸承55,57而旋轉自如地支持。Fig. 3 is a block diagram showing the configuration of a galvanometer scanner included in the laser processing device of the embodiment. The
軸承55係配置於鏡驅動部56與電流計鏡3Y之間,且軸承57係配置於鏡驅動部56與編碼器58之間。轉子52會隨著其溫度變化而沿軸方向發生伸縮。因此,軸承55係構成為:並未對於轉子52在軸方向完全地固定,而是在轉子52伸縮時使轉子52穿過軸承55。另一方面,軸承57係在軸方向固定轉子52。The
鏡驅動部56係以轉子52的柱軸作為旋轉軸來使電流計鏡3Y旋轉。鏡驅動部56係例如使用磁鐵與線圈所構成,且使電流流通於線圈,藉此在其與磁鐵之間產生轉矩。藉此,轉子52以及電流計鏡3Y會旋轉而稼動。The
編碼器58係具備編碼盤(encoder disk),且使用編碼盤來檢測出屬於電流計鏡3Y之旋轉角度的電流計角度位置。編碼器58係配置於電流計鏡3Y的旋轉軸上,且進行與電流計鏡3Y相同的動作。編碼器58係將所檢測到的電流計角度位置傳送至面歪斜量檢測裝置10A及控制裝置20。The
面歪斜量檢測裝置10A係根據電流計角度位置來檢測出電流計鏡3Y的殘餘振動。控制裝置20係根據電流計角度位置來控制電流計鏡3Y的動作,並且根據殘餘振動來修正電流計鏡3Y的動作。The surface
圖4係顯示實施型態之雷射加工裝置所具備的面歪斜量檢測裝置之構成的方塊圖。面歪斜量檢測裝置10A係根據於電流計掃描器5X,5Y的定位時由編碼器58所檢測到的電流計角度位置來檢測出電流計鏡3X,3Y之旋轉方向的殘餘振動。旋轉方向的殘餘振動係與屬於電流計鏡3X,3Y之面歪斜量的傾斜量相對應,且依據電流計鏡3X,3Y的角度偏離量而變化。亦即,電流計鏡3X,3Y的面歪斜量為電流計鏡3X,3Y之旋轉方向的角度偏離量,且電流計鏡3X,3Y愈大幅振動就會成為愈大的面歪斜量。Fig. 4 is a block diagram showing the configuration of a surface distortion detection device included in the laser processing device of the embodiment. The surface
面歪斜量檢測裝置10A係具有:屬於輸入部的編碼器振動檢測部15、以及位移量算出部16。編碼器振動檢測部15係連接於編碼器58,且從編碼器58接受電流計角度位置,並輸入至位移量算出部16。10 A of surface skew amount detection apparatuses have the encoder
編碼器振動檢測部15係將電流計角度位置傳送至位移量算出部16。位移量算出部16係根據電流計角度位置而算出顯示電流計鏡3X,3Y之位置偏離量的殘餘振動。編碼器振動檢測部15係算出振動的頻率、面歪斜量等而作為殘餘振動的資訊。編碼器振動檢測部15係將含有殘餘振動的頻率及面歪斜量的殘餘振動資訊傳送至控制裝置20。The encoder
控制裝置20係使用電流計鏡3X,3Y的殘餘振動之值來作成電流計指令,並傳送至電流計掃描器5X,5Y,該電流計指令係屬於對於電流計掃描器5X,5Y的指示資訊。當面歪斜共振發生時,控制裝置20係對與面歪斜共振發生之軸正交的軸傳送包含修正值的電流計指令,俾以消除面歪斜量。The
當面歪斜共振在電流計鏡3X發生時,控制裝置20係對與電流計鏡3X之旋轉軸正交的電流計鏡3Y傳送包含修正值的電流計指令。同樣地,當面歪斜共振在電流計鏡3Y發生時,控制裝置20係對與電流計鏡3Y之旋轉軸正交的電流計鏡3X傳送包含修正值的電流計指令。When surface skew resonance occurs in the
控制裝置20係能夠以使面歪斜共振現象即時地(real time)反映給定位伺服控制的方式,對正交之軸的檢測角度予以加上或減去所檢測到的面歪斜量來進行修正,而藉此消除因面歪斜所致的位置偏離。藉此,控制裝置20係可即時地消除朝目標位置開始移動後的面歪斜共振。面歪斜量的消除會有依據旋轉軸之正負方向的設定、旋轉軸的配置、X軸方向的設定、或Y軸方向的設定而對於指令位置或檢測位置加上或減去修正量的情形。因此,關於修正演算,係事先對控制裝置20設定符號,以適當地使消除機制稼動。The
在此,說明面歪斜共振現象。圖5係用以說明面歪斜共振現象之圖。另外,在圖5中省略鏡驅動部56及編碼器58的圖示。面歪斜共振現象為電流計鏡3Y在與鏡面大致垂直的方向搖擺的現象。例如,在電流計鏡3Y的情形,軸承57係在軸方向固定轉子52,因此會在較軸承57更靠端部側的電流計鏡3Y側發生面歪斜共振現象。面歪斜共振現象,係轉子52及電流計鏡3Y以軸承57為固定部分而彎曲,從而改變電流計鏡3Y的鏡面的角度而使偏向之雷射光L0的前進方向偏離的現象。Here, the plane skew resonance phenomenon will be described. Fig. 5 is a diagram for explaining the plane skew resonance phenomenon. In addition, illustration of the
若電流計掃描器5Y沿相同方向反覆進行等節距的加工位置移動時,會在某一移動週期發生轉子52及電流計鏡3Y的面歪斜共振。換言之,在以等節距沿相同方向使加工位置移動時,當移動週期接近於包含電流計鏡3Y之轉子52的面歪斜共振頻率的倒數,就會發生面歪斜共振。When the
面歪斜共振為包含電流計鏡3Y之轉子52的機械性彎曲的固有振動。在進行等節距的電流計移動的情形,會週期性地發生電流計鏡3Y之旋轉的加減速。在此旋轉運動的中心至電流計鏡3Y及轉子52若有重量不平衡,就會發生軸之離心旋轉的現象,且旋轉的加速度會轉換成軸的彎曲力。此彎曲力會成為激振力,且在其週期接近於面歪斜共振頻率的週期的情形,面歪斜振動會漸漸地變大,而在處於加工點的雷射光照射位置發生大幅的位置偏離。由面歪斜共振所致的位置偏離,例如會顯現在與加工位置之行進方向正交的方向。The plane skew resonance is a natural vibration of the mechanical bending of the
因此,當在進行X方向定位的電流計鏡3X發生面歪斜共振時,加工位置會朝Y方向偏離。同樣地,當在進行Y方向定位的電流計鏡3Y發生面歪斜共振時,加工位置會朝X方向偏離。Therefore, when plane skew resonance occurs in the
在面歪斜共振時,轉子52及電流計鏡3Y會以軸承55及軸承57為固定位置而在與電流計鏡3Y之鏡面大至垂直的方向搖擺。因此,雷射光L0之於電流計鏡3Y上的反射角度會偏離期望的反射角度達預定量。偏離該期望的反射角度的偏離量係與電流計鏡3Y之旋轉方向的角度偏離量相對應。亦即,偏離期望的反射角度的偏離量係與電流計鏡3Y的面歪斜量相對應。During plane skew resonance, the
例如,在轉子52及電流計鏡3Y朝電流計鏡3Y的背面側最大幅地彎曲的狀態下,雷射光L0會以朝X方向偏離達反射角度(+θ1)的方式反射而成為雷射光L2。另一方面,在轉子52及電流計鏡3Y朝電流計鏡3Y的正面側最大幅地彎曲的狀態下,雷射光L0會以朝X方向偏離達反射角度(-θ1)的方式反射而成為雷射光L3。For example, in a state where the
換句話說,若轉子52及電流計鏡3Y因面歪斜共振而彎曲時,就會在雷射光L0之相對於X方向的反射角度產生對應彎曲量的偏離量。並且,在轉子52及電流計鏡3Y最大幅地彎曲的狀態的情形,雷射光L0之X方向的反射角度的偏離量亦成為最大。In other words, if the
本實施型態中,編碼器58係檢測出電流計角度位置,該電流計角度位置係屬於雷射光L0之X方向及Y方向的反射角度的偏離量。並且,控制裝置20係從電流計角度位置算出X方向及Y方向的面歪斜量,並根據所算出的面歪斜量來修正雷射光照射位置的位置偏離(加工位置的位置偏離)。In this embodiment, the
圖6係顯示實施型態之雷射加工裝置所具備的控制裝置的硬體構成之圖。在圖6中顯示雷射加工裝置101之控制系統的整體構成。控制裝置20係具備:加工機控制部88、電流計控制部90X,90Y、及驅動控制部92。加工機控制部88係根據從加工程式或面歪斜量檢測裝置10A傳送而來的電流計掃描器5X,5Y之面歪斜量來對電流計控制部90X,90Y、驅動控制部92、雷射振盪器1傳送指示資訊。FIG. 6 is a diagram showing the hardware configuration of the control device included in the laser processing device of the embodiment. The overall configuration of the control system of the
加工機控制部88係對電流計控制部90X傳送X方向的位置指令,且對電流計控制部90Y傳送Y方向的位置指令。具體而言,加工機控制部88係對電流計控制部90X,90Y傳送對於電流計掃描器5X,5Y之定位目標座標的指令。The processing
本實施型態中,在電流計鏡3X發生面歪斜共振的情形,雷射光L1的照射位置會朝Y方向偏離,因此要對電流計控制部90Y傳送包含加工位置修正量的位置指令。此外,在電流計鏡3Y發生面歪斜共振的情形,雷射光L1的照射位置會朝X方向偏離,因此要對電流計控制部90X傳送包含加工位置修正量的位置指令。In the present embodiment, when the
電流計控制部90X係根據來自加工機控制部88的指示資訊來控制電流計掃描器5X。此外,電流計控制部90Y係根據來自加工機控制部88的指示資訊來控制電流計掃描器5Y。具體而言,電流計控制部90X,90Y係分別對電流計掃描器5X,5Y進行定位伺服動作。並且,電流計掃描器5X,5Y係分別使電流計鏡3X,3Y以轉子52為旋轉軸而旋轉達預定的角度。The
此外,加工機控制部88係對雷射振盪器1指示:用以照射期望之雷射輸出和脈衝寬度的雷射脈衝的條件和時序(timing)。藉此,雷射振盪器1係可在加工所需的時序發射雷射脈衝。In addition, the processing
此外,如圖1所示,雷射加工裝置101係具備用以載置被加工物W的XY滑台8,且控制裝置20係具有進行XY滑台8之定位驅動控制的驅動控制部92。驅動控制部92係對伺服馬達93X,93Y進行驅動控制,以朝X-Y方向對XY滑台8進行定位驅動控制。藉此,使馬達M94,M95動作,而使XY滑台8朝X-Y方向移動。此外,驅動控制部92係對fθ透鏡6的上下高度方向(Z方向)、搭載電流計掃描器5X,5Y之Z軸頭部分的上下高度方向分別進行定位驅動控制。具體而言,驅動控制部92係對伺服放大器93Z進行驅動控制。藉此,使馬達M96動作,而使fθ透鏡6及Z軸頭部分朝Z方向移動。In addition, as shown in FIG. 1 , the
在此,說明比較例的電流計控制系統。若比較例的電流計控制系統為X軸方向的電流計掃描器,則使用檢測出X軸之旋轉角度的感測器(例如,旋轉編碼器(rotary encoder)等)的信號來執行反饋控制。此外,為了以高速進行定位,比較例的電流計控制系統係預先假想控制對象的模型(model),並採用前饋控制來執行定位動作。Here, an ammeter control system of a comparative example will be described. If the galvanometer control system of the comparative example is a galvanometer scanner in the X-axis direction, feedback control is performed using a signal from a sensor (for example, a rotary encoder) that detects the rotation angle of the X-axis. In addition, in order to perform positioning at high speed, the galvanometer control system of the comparative example assumes a model of the controlled object in advance, and executes the positioning operation using feedforward control.
然而,在比較例的電流計控制系統中,沒有使用來自檢測出旋轉之感測器以外的資訊,並未形成抑制在X軸方向及Y軸方向發生之面歪斜現象的構成。在本實施型態中,雷射加工裝置101係從所檢測到的面歪斜量求得加工位置的偏離量,以進行面歪斜的修正。並且,雷射加工裝置101係將對於正交之軸的電流計掃描器5X的位置指令與加工位置的偏離量相加,從而實施修正。因此,為了使X方向及Y方向之各者同樣地消除相互的面歪斜,而以修正彼此的位置指令的方式事先構成雷射加工裝置101。藉此,雷射加工裝置101係可藉由Y軸方向的電流計鏡3Y消除發生在用以控制X軸方向之位置的電流計鏡3Y的面歪斜量Δy,且可藉由X軸方向的電流計鏡3X消除與發生在Y軸方向之電流計鏡3Y的面歪斜量相對應的照射位置偏離量Δx。因此,即使發生面歪斜現象,雷射加工裝置101亦可使雷射光L0朝期望的目標位置偏向,可進行高精密度的雷射加工。However, in the galvanometer control system of the comparative example, information other than the sensor that detects the rotation is not used, and there is no structure for suppressing the surface distortion that occurs in the X-axis direction and the Y-axis direction. In this embodiment, the
隨著電流計掃描器或電流計鏡之動作速度的提升,會有角加速度亦會加快且使得對於面歪斜方向的激振力也會增加的傾向。進而,處於即使是同一機械性構成亦會使面歪斜量變大,而變得難以兼顧使用者所殷切盼望的加工速度與加工精密度的狀況。在本實施型態中,即使在因為加工速度的加快而使面歪斜共振發生的情形,亦會根據面歪斜量來修正對於電流計鏡3X,3Y的位置指令,因此可兼顧加工速度與加工精密度。As the operating speed of the galvanometer scanner or the galvanometer mirror increases, the angular acceleration tends to increase and the excitation force in the oblique direction of the surface tends to increase. Furthermore, even with the same mechanical configuration, the amount of surface deflection increases, making it difficult to balance the processing speed and processing precision desired by users. In this embodiment, even if the surface skew resonance occurs due to the acceleration of the machining speed, the position commands for the galvanometer mirrors 3X and 3Y will be corrected according to the amount of surface skew, so the machining speed and machining precision can be taken into account. Spend.
此外,雷射加工裝置101係根據由編碼器58所檢測到的電流計角度位置而算出電流計鏡3X,3Y之旋轉方向的面歪斜量,因此可利用簡單的構成而容易地檢測出電流計鏡3X,3Y的面歪斜量。In addition, since the
此外,雷射加工裝置101係不採用特性容易隨時間經過而變動的構件來檢測出電流計鏡3X,3Y之旋轉方向的面歪斜量,且係根據檢測結果來修正對於電流計鏡3X,3Y的位置指令,因此可穩定降低電流計鏡3X,3Y的面歪斜量。In addition, the
有一種隨著溫度的上昇而靜態地修正面歪斜量的方法。在該方法中,並無法動態地修正依據電流計鏡3X,3Y的動作而變化的面歪斜量。另一方面,雷射加工裝置101係於在事前事先記憶的電流計鏡3X,3Y之固有頻率與根據加工程式所算出之頻率的差比基準值還小的情形,修正面歪斜量。藉此,雷射加工裝置101可動態地修正依據電流計鏡3X,3Y之動作而變化的面歪斜量。There is a method of statically correcting the amount of surface skew as the temperature increases. In this method, it is not possible to dynamically correct the amount of surface skew that varies depending on the operation of the galvano mirrors 3X and 3Y. On the other hand, the
在此,說明面歪斜量檢測裝置10A的硬體構成。圖7係顯示實現實施型態之面歪斜量檢測裝置的硬體構成例之圖。Here, the hardware structure of 10 A of surface distortion detection apparatuses is demonstrated. Fig. 7 is a diagram showing an example of the hardware configuration of the surface skew amount detecting device of the embodiment.
面歪斜量檢測裝置10A係可藉由輸入裝置300、處理器100、記憶體200、及輸出裝置400來實現。處理器100之例為:CPU(亦稱:Central Processing Unit、中央處理裝置、處理裝置、演算裝置、微處理器、微電腦、DSP(Digital Signal Processor,數位信號處理器))或系統LSI (Large Scale Integration,大型積體電路)。記憶體200之例為:RAM (Random Access Memory,隨機存取記憶體)、ROM(Read Only Memory,唯讀存貯器)。The surface
面歪斜量檢測裝置10A係藉由處理器100讀取並執行面歪斜量檢測程式而實現,該面歪斜量檢測程式係可藉由用以執行以記憶體200所記憶之面歪斜量檢測裝置10A的動作的電腦執行。屬於用以執行面歪斜量檢測裝置10A之動作的程式的面歪斜量檢測程式,亦可稱為使電腦執行面歪斜量檢測裝置10A的步驟或方法者。The surface
以面歪斜量檢測裝置10A所執行的面歪斜量檢測程式係成為包含編碼器振動檢測部15、及位移量算出部16的模組構成,且將上述各部載入至主記憶裝置上、並使上述各部生成在主記憶裝置上。The surface deflection detection program executed by the surface
輸入裝置300係接受電流計角度位置並傳送至處理器100。記憶體200係使用於處理器100執行各種處理時的暫時記憶體。而且,記憶體200係記憶:加工程式、對應資訊等。輸出裝置400係將殘餘振動資訊輸出至控制裝置20。The input device 300 receives the angular position of the galvanometer and transmits it to the processor 100 . The memory 200 is a temporary memory used when the processor 100 executes various processes. Moreover, the memory 200 stores: processing formulas, corresponding information, and the like. The output device 400 outputs the residual vibration information to the
面歪斜量檢測程式亦可藉由可安裝之形式或可執行之形式的檔案記憶於電腦可讀取之記憶媒體而作為電腦程式產品來提供。此外,面歪斜量檢測程式亦可經由網際網路等網路來提供給面歪斜量檢測裝置10A。另外,關於面歪斜量檢測裝置10A的功能,亦可設為一部分由專用電路等之專用的硬體來實現、且一部分由軟體或韌體來實現。此外,關於面歪斜量檢測裝置10A的功能,亦可全部由專用電路等之專用的硬體來實現。此外,關於控制裝置20,亦可由與面歪斜量檢測裝置10A同樣的硬體構成來實現。The surface skew detection program can also be provided as a computer program product by storing an installable or executable file in a computer-readable storage medium. In addition, the surface skew amount detection program may also be provided to the surface skew
如此,根據實施型態,面歪斜量檢測裝置10A係根據從編碼器58接受的電流計角度位置而算出與電流計鏡3X,3Y之旋轉方向的面歪斜量相關聯的殘餘振動,因此可利用簡單的構成而容易地檢測出正確的電流計鏡3X,3Y的面歪斜量。In this way, according to the embodiment, the surface
此外,控制裝置20係在實際的雷射加工開始之前記憶對應資訊,該對應資訊係將屬於電流計鏡3X,3Y振動的固有頻率的第一頻率與面歪斜量的修正量建立對應關係而成者。此外,於實際的雷射加工時,控制裝置20係根據加工程式而算出屬於電流計鏡3X,3Y振動的固有頻率的第二頻率。於實際的雷射加工時,在第一頻率與第二頻率之差比基準值還小的情形,控制裝置20係從對應資訊抽出與第一頻率相對應的修正量,且使用該修正量來修正使電流計鏡3X,3Y轉動的指示資訊。藉此,控制裝置20可穩定地使電流計鏡3X,3Y的面歪斜量降低。In addition, the
以上實施型態所示的構成為顯示一例,亦可與其他習知的技術組合,亦可在不脫離主旨的範圍內省略或變更構成的一部分。The configuration shown in the above embodiments is an example, and it may be combined with other known techniques, and a part of the configuration may be omitted or changed within the range not departing from the gist.
1:雷射振盪器
2:像轉移光學機構
2C:準直透鏡
2M:遮罩
3X,3Y:電流計鏡
4:雷射加工部
5X,5Y:電流計掃描器
6:fθ透鏡
8:XY滑台
10A:面歪斜量檢測裝置
15:編碼器振動檢測部
16:位移量算出部
20:控制裝置
21:輸入部
22:加工程式記憶部
23:修正量算出部
24:指示作成部
25:輸出部
26:修正量記憶部
52:轉子
55,57:軸承
56:鏡驅動部
58:編碼器
88:加工機控制部
90X,90Y:電流計控制部
92:驅動控制部
93X,93Y:伺服馬達
93Z:伺服放大器
100:處理器
101:雷射加工裝置
200:記憶體
300:輸入裝置
400:輸出裝置
L0至L3:雷射光
M94,M95,M96:馬達
W:被加工物
+θ1,-θ1:反射角度1:Laser oscillator
2: Image transfer
圖1係顯示實施型態之雷射加工裝置的構成之圖。 圖2係顯示實施型態之雷射加工裝置所具備的控制裝置之構成的方塊圖。 圖3係顯示實施型態之雷射加工裝置所具備的電流計掃描器之構成的方塊圖。 圖4係顯示實施型態之雷射加工裝置所具備的面歪斜量檢測裝置之構成的方塊圖。 圖5係用以說明面歪斜共振現象之圖。 圖6係顯示實施型態之雷射加工裝置所具備的控制裝置的硬體構成之圖。 圖7係顯示實現實施型態之面歪斜量檢測裝置的硬體構成例之圖。Fig. 1 is a diagram showing the configuration of a laser processing device of an embodiment. FIG. 2 is a block diagram showing the configuration of a control device included in the laser processing device of the embodiment. Fig. 3 is a block diagram showing the configuration of a galvanometer scanner included in the laser processing device of the embodiment. Fig. 4 is a block diagram showing the configuration of a surface distortion detection device included in the laser processing device of the embodiment. Fig. 5 is a diagram for explaining the plane skew resonance phenomenon. FIG. 6 is a diagram showing the hardware configuration of the control device included in the laser processing device of the embodiment. Fig. 7 is a diagram showing an example of the hardware configuration of the surface skew amount detecting device of the embodiment.
10A:面歪斜量檢測裝置10A: Surface skew detection device
15:編碼器振動檢測部15: Encoder vibration detection part
16:位移量算出部16: Displacement Calculation Unit
20:控制裝置20: Control device
58:編碼器58:Encoder
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TW201805726A (en) * | 2016-03-30 | 2018-02-16 | 尼康股份有限公司 | Pattern drawing device, pattern drawing method, and method for manufacturing device |
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