TWI791549B - 蒸鍍罩 - Google Patents
蒸鍍罩 Download PDFInfo
- Publication number
- TWI791549B TWI791549B TW107123244A TW107123244A TWI791549B TW I791549 B TWI791549 B TW I791549B TW 107123244 A TW107123244 A TW 107123244A TW 107123244 A TW107123244 A TW 107123244A TW I791549 B TWI791549 B TW I791549B
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- vapor deposition
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- 238000001704 evaporation Methods 0.000 title claims description 24
- 230000008020 evaporation Effects 0.000 title claims description 24
- 238000007740 vapor deposition Methods 0.000 claims abstract description 111
- 239000000463 material Substances 0.000 claims description 68
- 239000007769 metal material Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 abstract description 46
- 238000005452 bending Methods 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 198
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 78
- 229910052751 metal Inorganic materials 0.000 description 69
- 239000002184 metal Substances 0.000 description 69
- 229910052759 nickel Inorganic materials 0.000 description 39
- 238000004070 electrodeposition Methods 0.000 description 29
- 238000004519 manufacturing process Methods 0.000 description 26
- 238000000034 method Methods 0.000 description 16
- 230000002093 peripheral effect Effects 0.000 description 16
- 239000000853 adhesive Substances 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 13
- 238000005755 formation reaction Methods 0.000 description 13
- 238000007747 plating Methods 0.000 description 13
- 238000005323 electroforming Methods 0.000 description 12
- 239000010408 film Substances 0.000 description 11
- 239000011521 glass Substances 0.000 description 11
- 230000001070 adhesive effect Effects 0.000 description 10
- 239000012790 adhesive layer Substances 0.000 description 10
- 230000007261 regionalization Effects 0.000 description 9
- 238000011282 treatment Methods 0.000 description 9
- 238000003825 pressing Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 238000002788 crimping Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 238000006073 displacement reaction Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000004913 activation Effects 0.000 description 4
- 230000002411 adverse Effects 0.000 description 4
- 239000013039 cover film Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000010354 integration Effects 0.000 description 4
- 238000005096 rolling process Methods 0.000 description 4
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 3
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 3
- 229910000990 Ni alloy Inorganic materials 0.000 description 3
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- KGWWEXORQXHJJQ-UHFFFAOYSA-N [Fe].[Co].[Ni] Chemical compound [Fe].[Co].[Ni] KGWWEXORQXHJJQ-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 238000009760 electrical discharge machining Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000005510 radiation hardening Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000009469 supplementation Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Images
Landscapes
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
- Outer Garments And Coats (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017148250 | 2017-07-31 | ||
| JPJP2017-148250 | 2017-07-31 | ||
| JP2017191494A JP7067889B2 (ja) | 2017-07-31 | 2017-09-29 | 蒸着マスク |
| JPJP2017-191494 | 2017-09-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201911622A TW201911622A (zh) | 2019-03-16 |
| TWI791549B true TWI791549B (zh) | 2023-02-11 |
Family
ID=65477826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107123244A TWI791549B (zh) | 2017-07-31 | 2018-07-05 | 蒸鍍罩 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7067889B2 (enExample) |
| TW (1) | TWI791549B (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7449485B2 (ja) * | 2019-03-28 | 2024-03-14 | 大日本印刷株式会社 | 蒸着マスク及び蒸着マスクの製造方法 |
| JP7473298B2 (ja) * | 2019-03-29 | 2024-04-23 | マクセル株式会社 | 蒸着マスク |
| KR102187007B1 (ko) * | 2020-02-26 | 2020-12-04 | 주식회사 핌스 | 평탄도가 개선된 박막 증착용 마스크 조립체 및 그 제조 방법 |
| WO2025225401A1 (ja) * | 2024-04-23 | 2025-10-30 | 大日本印刷株式会社 | メタルマスク及びその製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201706428A (zh) * | 2015-02-10 | 2017-02-16 | Dainippon Printing Co Ltd | 蒸鍍遮罩之製造方法、欲製作蒸鍍遮罩所使用之金屬板及其製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4401040B2 (ja) * | 2001-06-19 | 2010-01-20 | 株式会社オプトニクス精密 | 蒸着用マスク |
| JP4616667B2 (ja) * | 2005-03-01 | 2011-01-19 | 京セラ株式会社 | マスク構造体およびそれを用いた蒸着方法、並びに有機発光素子の製造方法 |
-
2017
- 2017-09-29 JP JP2017191494A patent/JP7067889B2/ja active Active
-
2018
- 2018-07-05 TW TW107123244A patent/TWI791549B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201706428A (zh) * | 2015-02-10 | 2017-02-16 | Dainippon Printing Co Ltd | 蒸鍍遮罩之製造方法、欲製作蒸鍍遮罩所使用之金屬板及其製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2019026926A (ja) | 2019-02-21 |
| TW201911622A (zh) | 2019-03-16 |
| JP7067889B2 (ja) | 2022-05-16 |
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