TWI786173B - Defect recording system, film manufacturing system, and film manufacturing method - Google Patents
Defect recording system, film manufacturing system, and film manufacturing method Download PDFInfo
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- TWI786173B TWI786173B TW107130842A TW107130842A TWI786173B TW I786173 B TWI786173 B TW I786173B TW 107130842 A TW107130842 A TW 107130842A TW 107130842 A TW107130842 A TW 107130842A TW I786173 B TWI786173 B TW I786173B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
- G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/07—Ink jet characterised by jet control
- B41J2/11—Ink jet characterised by jet control for ink spray
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
- G01N2021/888—Marking defects
Abstract
Description
本發明係關於一種缺陷記錄系統,和膜製造系統以及膜的製造方法。 The present invention relates to a defect recording system, a film manufacturing system, and a film manufacturing method.
例如,偏光膜等光學膜係在進行異物或凹凸等缺陷檢查之後,被捲繞在芯材之周圍。此時,會有屬於檢查結果之有關缺陷位置或種類之資訊(以下稱為「缺陷資訊」)藉由在光學膜之寬度方向的端部印刷條碼,或對缺陷部位施予標記,而記錄在光學膜之情形。 For example, optical films such as polarizing films are inspected for defects such as foreign objects and unevenness, and then wound around a core material. At this time, there will be information about the defect position or type (hereinafter referred to as "defect information") belonging to the inspection result by printing a barcode on the end of the width direction of the optical film, or marking the defect position, and recorded in the The case of optical film.
例如,在專利文獻1中,記載有一種依序使用可朝檢查對象之寬度方向移動之複數個標記筆,而對缺陷(標記目標)施予標記之技術。
For example,
並且,在專利文獻2中,記載有一種利用在彼此不同之位置載置有二排噴墨模組之薄片(web)標記具,而對薄片上之異常進行標記之技術。 In addition, Patent Document 2 describes a technique for marking abnormalities on a web using a web marking tool in which two rows of inkjet modules are placed at different positions.
專利文獻1:日本特開2015-059804號公報 Patent Document 1: Japanese Patent Laid-Open No. 2015-059804
專利文獻2:日本特開2012-233917號公報 Patent Document 2: Japanese Patent Laid-Open No. 2012-233917
該等缺陷部位係大多從製品去除而被破棄。在習知之方法中,為了顯示缺陷之位置,會有以包圍其周圍之方式施予標記之情形。此時,會有位在缺陷部位與標記之間的光學膜被廢棄之情形。因此,當缺陷部位與標記之間隔大時,光學膜之耗損會變多。當光學膜之耗損多時,由於製造成本會變高,因此要求使光學膜之耗損減少。為了減少光學膜之耗損,可考慮使缺陷部位與標記之間隔減小。 Most of these defective parts are removed from the product and discarded. In the conventional method, in order to show the position of the defect, there are cases where a mark is applied to surround it. At this time, the optical film positioned between the defective portion and the mark may be discarded. Therefore, when the distance between the defective part and the mark is large, the loss of the optical film will increase. When the loss of the optical film is large, since the production cost becomes high, it is required to reduce the loss of the optical film. In order to reduce the loss of the optical film, it may be considered to reduce the distance between the defect site and the mark.
然而,在專利文獻1所述之發明中,會有下述疑慮:標記筆之移動與間隔不匹配,檢查對象之標記目標與標記之間隔會變大,或產生檢查對象之缺陷資訊的記錄遺漏。
However, in the invention described in
並且,在專利文獻2所述之發明中,薄片上之異常與標記具之間隔並非充分地小。此外,為了使該間隔變小,必須將噴墨模組密集地排列。 Furthermore, in the invention described in Patent Document 2, the distance between the abnormality on the sheet and the marker is not sufficiently small. In addition, in order to reduce the interval, it is necessary to arrange the inkjet modules densely.
再者,上述之課題係推測為亦會在光學膜以外之膜中的缺陷檢查中發生。 In addition, the above-mentioned problem is presumed to also occur in the defect inspection in the film other than an optical film.
本發明係鑑於上述課題而研創者,其目的在於提供一種缺陷記錄系統和膜製造系統以及膜的製造方 法,係可使膜之缺陷與標記之間隔變小,且可抑制膜之缺陷資訊之記錄遺漏產生。 The present invention was made in view of the above problems, and its object is to provide a defect recording system, a film manufacturing system, and a film manufacturing method. This method can reduce the gap between the film defect and the mark, and can suppress the recording omission of the film defect information.
為瞭解決上述課題,本發明之一態樣係提供一種缺陷記錄系統,該缺陷記錄系統係對於朝長邊方向搬送之長形的膜,記錄有關於膜所具有之缺陷之資訊者,且具備:檢查部,係設置在膜之搬送路徑,並檢查膜之缺陷;印刷部,係在搬送路徑中設置在檢查部之下游,且對膜印刷資訊而予以記錄;控制部,係依據由檢查部所得之檢查結果來控制印刷部之動作;印刷部係具有:噴墨裝置,係朝與長邊方向交叉之方向延伸而設置,且對膜射出印墨以印刷資訊;及移動裝置,係使噴墨裝置沿著交叉之方向移動;噴墨裝置係具有複數個射出印墨之射出孔,複數個射出孔係從交叉之方向之膜的一端至另一端離散地配置,控制部係依據檢查結果,來控制由移動裝置所進行之噴墨裝置的位置移動及由噴墨裝置所進行之印刷。 In order to solve the above-mentioned problems, an aspect of the present invention provides a defect recording system that records information on defects of a film that is conveyed in the longitudinal direction, and has : The inspection department is installed on the conveying path of the film, and inspects the defects of the film; the printing department is arranged downstream of the inspection department in the conveying path, and records the printing information of the film; the control department is based on the inspection department The obtained inspection results are used to control the action of the printing section; the printing section has: an inkjet device, which is arranged to extend in a direction intersecting with the long side direction, and ejects ink to the film to print information; and a mobile device, which makes the inkjet The ink device moves along the crossing direction; the inkjet device has a plurality of ejection holes for ejecting ink, and the plurality of ejection holes are discretely arranged from one end of the film in the crossing direction to the other end, and the control unit is based on the inspection results. To control the position movement of the inkjet device performed by the mobile device and the printing performed by the inkjet device.
在本發明之一態樣中亦可設為,噴墨裝置係具有沿著交叉之方向排列之複數個噴墨頭,噴墨頭係分別具有射出孔,移動裝置係使複數個噴墨頭沿著交叉之方向移動,前述控制部分別獨立地控制複數個前述噴墨頭之移動的構成。 In one aspect of the present invention, it may also be set that the inkjet device has a plurality of inkjet heads arranged along the crossing direction, the inkjet heads respectively have injection holes, and the moving device makes the plurality of inkjet heads along the The structure in which the control unit independently controls the movement of a plurality of the inkjet heads as they move in the crossing direction.
在本發明之一態樣中亦可設為,複數個噴墨頭係排列成沿著交叉之方向設定之複數之列,在交叉之方向彼此相鄰接之2個噴墨頭分別排列在不同之列的構 成。 In one aspect of the present invention, a plurality of inkjet heads are arranged in a plurality of rows set along the crossing direction, and two inkjet heads adjacent to each other in the crossing direction are respectively arranged in different positions. structure become.
在本發明之一態樣中亦可設為,噴墨裝置具有第1噴墨裝置及在搬送路徑中配置在第1噴墨裝置之下游的第2噴墨裝置的構成。 In one aspect of the present invention, the inkjet device may include a first inkjet device and a second inkjet device arranged downstream of the first inkjet device in the conveyance path.
在本發明之一態樣中亦可設為,第1噴墨裝置與第2噴墨裝置之至少一方係具有沿著交叉之方向排列之複數個噴墨頭,噴墨頭係分別具有射出孔,移動裝置係使複數個噴墨頭沿著交叉之方向移動,控制部分別獨立地控制複數個噴墨頭之移動的構成。 In one aspect of the present invention, at least one of the first inkjet device and the second inkjet device has a plurality of inkjet heads arranged in a crossing direction, and the inkjet heads each have an injection hole. , the moving device moves a plurality of inkjet heads in a crossing direction, and the control unit independently controls the movement of the plurality of inkjet heads.
在本發明之一態樣中亦可設為,複數個噴墨頭係排列成沿著交叉之方向設定之複數個列,在交叉之方向彼此相鄰之2個噴墨頭分別排列在不同之列的構成。 In one aspect of the present invention, it may also be set that a plurality of inkjet heads are arranged in a plurality of rows set along the crossing direction, and two inkjet heads adjacent to each other in the crossing direction are respectively arranged in different positions. The composition of the columns.
在本發明之一態樣中亦可設為,第1噴墨裝置具有沿著交叉之方向排列之複數個噴墨頭的構成。 In one aspect of the present invention, the first inkjet device may have a configuration in which a plurality of inkjet heads are arranged in a crossing direction.
在本發明之一態樣中亦可設為,具有在搬送路徑中配置於第1噴墨裝置與第2噴墨裝置之間,且檢測出因第1噴墨裝置所致之印刷不良的感測器,控制部依據由檢查部所得之檢查結果及感測器之檢測結果,使第2噴墨裝置驅動,以將資訊印刷於對應於印刷不良之位置的構成。 In one aspect of the present invention, it may also be provided that it is arranged between the first inkjet device and the second inkjet device in the conveyance path and detects a printing defect caused by the first inkjet device. The detector and the control unit drive the second inkjet device based on the inspection result obtained by the inspection unit and the detection result of the sensor, so as to print information at the position corresponding to the printing failure.
在本發明之一態樣中亦可設為,第1噴墨裝置所射出之印墨與第2噴墨裝置所射出之印墨的顏色不同的構成。 In one aspect of the present invention, the ink ejected from the first inkjet device and the ink ejected from the second inkjet device may be different in color.
本發明之一態樣係提供一種具有將長形之 膜朝長邊方向搬送之搬送裝置及上述缺陷記錄系統的膜製造系統。 One aspect of the present invention is to provide a A conveying device for conveying a film in the longitudinal direction and a film manufacturing system of the above-mentioned defect recording system.
本發明之一態樣係提供一種利用上述膜製造系統之膜的製造方法。 One aspect of the present invention provides a method of manufacturing a film using the above-mentioned film manufacturing system.
依據本發明之一態樣,可使膜之缺陷與標記之間隔減小,且可抑制產生膜之缺陷資訊之記錄遺漏的缺陷記錄系統和膜製造系統以及膜的製造方法。 According to an aspect of the present invention, there is provided a defect recording system, a film manufacturing system, and a film manufacturing method capable of reducing the gap between a film defect and a mark and suppressing recording omission of film defect information.
1、2‧‧‧缺陷記錄系統 1.2‧‧‧Defect recording system
11‧‧‧缺陷檢查裝置 11‧‧‧Defect inspection device
12‧‧‧印刷部 12‧‧‧Printing Department
13、53、55‧‧‧噴墨裝置 13, 53, 55‧‧‧Inkjet device
14‧‧‧移動裝置 14‧‧‧Mobile Device
15‧‧‧測長器 15‧‧‧Length measuring device
16‧‧‧控制裝置 16‧‧‧Control device
21a、22a、23a‧‧‧照明部 21a, 22a, 23a‧‧‧Lighting Department
21b、22b、23b‧‧‧光檢測部 21b, 22b, 23b‧‧‧light detection unit
24‧‧‧判定部 24‧‧‧judgment department
31、31A、31B、31C、31D、31E‧‧‧噴墨頭 31, 31A, 31B, 31C, 31D, 31E‧‧‧Inkjet head
31a‧‧‧端邊 31a‧‧‧Edge
32‧‧‧射出孔 32‧‧‧Injection hole
41‧‧‧感測器 41‧‧‧Sensor
53A‧‧‧第1噴墨裝置 53A‧‧‧The first inkjet device
53B‧‧‧第2噴墨裝置 53B‧‧‧The second inkjet device
101‧‧‧膜 101‧‧‧film
101a‧‧‧一端 101a‧‧‧one end
101b‧‧‧另一端 101b‧‧‧the other end
200‧‧‧膜製造系統 200‧‧‧Membrane Manufacturing System
201‧‧‧搬送裝置 201‧‧‧Conveying device
203‧‧‧搬送輥 203‧‧‧Conveying roller
AR‧‧‧範圍 AR‧‧‧Range
D、D1、D2、D3、D4、D5‧‧‧缺陷 D, D1, D2, D3, D4, D5‧‧‧Defects
F11‧‧‧偏光膜 F11‧‧‧polarizing film
L1‧‧‧第1列
L1‧‧‧
L2‧‧‧第2列 L2‧‧‧column 2
M、M1、M2、M3、M4‧‧‧記號 M, M1, M2, M3, M4‧‧‧mark
P‧‧‧顯示面板 P‧‧‧display panel
P1‧‧‧第1基板 P1‧‧‧1st substrate
P2‧‧‧第2基板 P2‧‧‧Second substrate
P3‧‧‧液晶層 P3‧‧‧LCD layer
P4‧‧‧顯示區域 P4‧‧‧display area
PT1‧‧‧第1印刷圖案 PT1‧‧‧1st printing pattern
PT2‧‧‧第2印刷圖案 PT2‧‧‧2nd printing pattern
PT3‧‧‧第3印刷圖案 PT3‧‧‧3rd printing pattern
PT4‧‧‧第4印刷圖案 PT4‧‧‧4th printing pattern
R‧‧‧搬送路徑 R‧‧‧Transportation path
第1圖係顯示液晶顯示面板P之構成的俯視圖。 FIG. 1 is a plan view showing the structure of the liquid crystal display panel P. As shown in FIG.
第2圖係第1圖之II-II剖視圖。 Fig. 2 is a sectional view of II-II in Fig. 1 .
第3圖係顯示第1實施形態之膜製造系統之構成的立體圖。 Fig. 3 is a perspective view showing the configuration of the film production system according to the first embodiment.
第4圖係顯示噴墨裝置13之構成的俯視圖。
FIG. 4 is a plan view showing the structure of the
第5圖係顯示噴墨裝置13所具有之噴墨頭之構成的俯視圖。
FIG. 5 is a plan view showing the structure of the inkjet head included in the
第6圖係顯示第1實施形態之記號M之配置例的示意圖。 Fig. 6 is a schematic diagram showing an example of arrangement of marks M in the first embodiment.
第7圖係顯示第2實施形態之噴墨裝置之構成的俯視圖。 Fig. 7 is a plan view showing the structure of the inkjet device according to the second embodiment.
第8圖係顯示第2實施形態之複數個噴墨頭之動作的示意圖。 Fig. 8 is a schematic diagram showing the operation of a plurality of inkjet heads in the second embodiment.
第9圖係顯示第3實施形態之噴墨裝置之構成的俯視 圖。 Fig. 9 is a plan view showing the structure of the inkjet device according to the third embodiment picture.
第10圖係顯示第4實施形態之膜製造系統之構成的立體圖。 Fig. 10 is a perspective view showing the configuration of a film manufacturing system according to a fourth embodiment.
<第1實施形態> <First Embodiment>
以下,參考第1圖至第6圖,針對本發明之第1實施形態的膜製造系統及膜的製造方法加以說明。此外,在以下之全部圖式中,為了容易地觀看圖式,各構成元件之尺寸或比率等係適當地設定成不同。 Hereinafter, a film production system and a film production method according to a first embodiment of the present invention will be described with reference to FIGS. 1 to 6 . In addition, in all of the following drawings, the dimensions, ratios, and the like of each component are appropriately set to be different in order to facilitate viewing of the drawings.
再者,在以下之說明中,係例示製造構成光學顯示裝置之光學膜之膜的製造方法。並且,例示用於該膜製造方法之膜製造系統。 In addition, in the following description, the manufacturing method of the film which manufactures the optical film which comprises an optical display device is illustrated. And, the film manufacturing system used for this film manufacturing method is illustrated.
就利用膜製造方法來製造之光學膜而言,可列舉偏光膜、位相差膜及亮度提升膜等。例如,光學膜係貼合在液晶顯示面板及有機EL顯示面板等光學顯示零件。 As an optical film manufactured by the film manufacturing method, a polarizing film, retardation film, brightness enhancement film, etc. are mentioned. For example, optical films are bonded to optical display components such as liquid crystal display panels and organic EL display panels.
[光學顯示裝置] [Optical display device]
就適用由本實施形態之製造方法所製造之膜的光學顯示裝置而言,係例示穿透型之液晶顯示裝置。穿透型之液晶顯示裝置係具備液晶顯示面板及背光。在該液晶顯示裝置中,將從背光射出之照明光從液晶顯示面板之背面側入射,並將藉由液晶顯示面板而調變之光從液晶顯示面板之表面側射出,藉此可顯示圖像。 As an optical display device to which the film produced by the production method of this embodiment is applied, a transmissive liquid crystal display device is exemplified. A transmissive liquid crystal display device includes a liquid crystal display panel and a backlight. In this liquid crystal display device, the illumination light emitted from the backlight enters from the back side of the liquid crystal display panel, and the light modulated by the liquid crystal display panel is emitted from the front side of the liquid crystal display panel, whereby an image can be displayed .
針對液晶顯示面板P之構成加以說明。第1 圖係顯示液晶顯示面板P之構成的俯視圖。第2圖係第1圖之II-II剖視圖。此外,在第2圖中,係省略顯示剖面之陰影線的圖示。 The configuration of the liquid crystal display panel P will be described. No. 1 The figure is a top view showing the structure of the liquid crystal display panel P. As shown in FIG. Fig. 2 is a sectional view of II-II in Fig. 1 . In addition, in Fig. 2 , illustration of hatching showing cross-sections is omitted.
如第1圖及第2圖所示,液晶顯示面板P係具備:第1基板P1;與第1基板P1相對向而配置之第2基板P2;及配置在第1基板P1與第2基板P2之間的液晶層P3。 As shown in FIGS. 1 and 2, the liquid crystal display panel P includes: a first substrate P1; a second substrate P2 disposed opposite to the first substrate P1; and a substrate P2 disposed between the first substrate P1 and the second substrate P2. Between the liquid crystal layer P3.
第1基板P1係由俯視形狀長方形之透明基板所構成。第2基板P2係由比第1基板P1小之長方形的透明基板所構成。液晶層P3係利用密封材(未圖示)將第1基板P1與第2基板P2之間的周圍予以密封,且配置在由密封材所包圍之區域的內側。該區域之俯視形狀係為長方形。在液晶顯示面板P中,將俯視時收容在液晶層P3之外周內側的區域作為顯示區域P4,將包圍該顯示區域P4之周圍的外側之區域作為邊框部G。 The first substrate P1 is composed of a transparent substrate having a rectangular shape in plan view. The second substrate P2 is composed of a rectangular transparent substrate smaller than the first substrate P1. The liquid crystal layer P3 is sealed between the first substrate P1 and the second substrate P2 with a sealing material (not shown), and is disposed inside a region surrounded by the sealing material. The top view shape of this area is a rectangle. In the liquid crystal display panel P, a region accommodated inside the outer periphery of the liquid crystal layer P3 in a plan view is defined as a display region P4, and a region outside the periphery surrounding the display region P4 is defined as a frame portion G.
在液晶顯示面板P之背面(背光側)貼合有偏光膜F11。在液晶顯示面板P之表面(顯示面側)貼合有偏光膜F12。在液晶顯示面板P之背面(背光側),與偏光膜F11重疊而貼合有亮度提升膜F13。 The polarizing film F11 is bonded to the back surface (backlight side) of the liquid crystal display panel P. The polarizing film F12 is bonded to the surface (display surface side) of the liquid crystal display panel P. On the back surface (backlight side) of the liquid crystal display panel P, the brightness enhancement film F13 is laminated|stacked on the polarizing film F11.
當適用於該構成之光學顯示裝置之偏光膜或亮度提升膜等光學膜具有缺陷時,會有發生無法正確地使光學顯示裝置作動等問題之情形。 When an optical film such as a polarizing film or a brightness enhancement film applied to an optical display device of this configuration has a defect, problems such as an inability to operate the optical display device may occur.
因此,為了防止該問題之產生,在本實施形態之膜的製造系統中,檢查膜之缺陷,並記錄屬於該檢 查結果之缺陷資訊。藉此,可使缺陷部位從製品(膜)廢棄。再者,由於膜之缺陷與標記(記號)之間隔小,因此可使與缺陷部位一同被廢棄之膜的耗損減少。此外,缺陷部位係指缺陷之正上方及其附近。 Therefore, in order to prevent the occurrence of this problem, in the film manufacturing system of this embodiment, the defects of the film are inspected, and the defects belonging to the inspection are recorded. The defect information of the inspection result. Thereby, the defective part can be discarded from a product (film). Furthermore, since the distance between the defect of the film and the mark (mark) is small, the loss of the film discarded together with the defect can be reduced. In addition, the defective part means directly above and near the defect.
[膜製造系統] [Membrane Manufacturing System]
接著,針對利用在本實施形態之製造方法之膜製造系統加以說明。第3圖係顯示第1實施形態之膜製造系統之構成的立體圖。 Next, a film manufacturing system using the manufacturing method of this embodiment will be described. Fig. 3 is a perspective view showing the configuration of the film production system according to the first embodiment.
第3圖所示之膜製造系統200係製造長形之膜101者。膜101係上述之光學膜。
The
此外,在以下之說明中,依需要來設定xyz正交座標系統,一邊參照該xyz正交座標系統,一邊針對各構件之位置關係加以說明。在本實施形態中,將膜101之長邊方向設為x方向,在膜101之面內將與x方向正交之方向(膜101之短邊方向)設為y方向,將與x方向及y方向正交之方向設為z方向。
In addition, in the following description, an xyz orthogonal coordinate system is set as needed, and the positional relationship of each member is demonstrated referring this xyz orthogonal coordinate system. In this embodiment, the long-side direction of the
在此,x方向與y方向係位於水平面內,z方向係位於鉛直方向(上下方向)。 Here, the x direction and the y direction are located in the horizontal plane, and the z direction is located in the vertical direction (vertical direction).
此外,有將+x方向稱為下游之情形。 In addition, the +x direction may be called downstream.
膜製造系統200係具備缺陷記錄系統1及搬送裝置201。
The
搬送裝置201係將膜101朝長邊方向(x方向)搬送。在搬送裝置201所形成之搬送路徑R,具備有搬送輥203。此外,搬送輥203亦可具備複數個。
The transport device 201 transports the
膜101係對於聚乙烯醇(PVA,Polyvinyl Alcohol)等樹脂膜施行染色處理、交聯處理及延伸處理等之後,依需要而在施行過前述處理之膜的兩面貼合三醋酸纖維素(TAC,Triacetyl cellulose)等保護膜而得者。
The
[缺陷記錄系統] [Defect recording system]
缺陷記錄系統1係對於朝長邊方向(x方向)搬送之膜101,檢查膜101所具有之缺陷,並記錄屬於其檢查結果的資訊(以下亦稱為「缺陷資訊」)。
The
如第3圖所示,缺陷記錄系統1係具備缺陷檢查裝置11、噴墨裝置13、移動裝置14、測長器15及控制裝置16。
As shown in FIG. 3 , the
在本說明書中,缺陷檢查裝置11係相當於申請專利範圍中之檢查部。並且,控制裝置16係相當於申請專利範圍中之控制部。並且,將包含噴墨裝置13及移動裝置14之構成稱為印刷部12。
In this specification, the defect inspection device 11 corresponds to the inspection unit in the scope of the patent application. And, the
[缺陷檢查裝置] [Defect inspection device]
缺陷檢查裝置11係設置在膜101之搬送路徑R,以檢查膜101之缺陷。就缺陷之種類而言,可列舉在膜101之製造時或搬送時所產生之異物、凹凸、亮點缺陷等。此外,亮點缺陷係指可藉由利用後述之照明部的檢查而進行判定者。例如,在偏光膜中,亮點缺陷係指藉由偏光之散亂等而產生者。
The defect inspection device 11 is installed on the conveyance path R of the
在本實施形態中,利用缺陷檢查裝置11,對於被搬送之膜101,執行例如反射檢查、穿透檢查、傾
斜穿透檢查、正交偏光鏡穿透檢查等之檢查處理,以檢測出膜101之缺陷。缺陷檢查裝置11係可執行上述之檢查處理者。
In this embodiment, the defect inspection device 11 is used to perform, for example, reflection inspection, penetration inspection, tilt inspection, etc. on the conveyed
缺陷檢查裝置11係具有照明部21a、照明部22a及照明部23a、光檢測部21b、光檢測部22b及光檢測部23b、及判定部24。照明部21a至照明部23a係排列配置在膜101之搬送方向(長邊方向、x方向)。並且,光檢測部21b至光檢測部23b係排列配置在膜101之搬送方向。
The defect inspection device 11 includes an
照明部21a至照明部23a係對膜101照射照明光。光檢測部21b至光檢測部23b係檢測出穿透膜101之光(穿透光)。
The
照明部21a至照明部23a、光檢測部21b至光檢測部23b係分別隔著膜101而相對向配置。此時,照明部21a會對應於光檢測部21b,照明部22a會對應於光檢測部22b,照明部23a會對應於光檢測部23b。
The illuminating
此外,缺陷檢查裝置11並不限定於用以檢測該穿透光之構成,亦可具有用以檢測反射光之構成,或用以檢測穿透光及反射光之構成。在檢測反射光時,光檢測部係配置在與照明部相同之側。 In addition, the defect inspection device 11 is not limited to the configuration for detecting the transmitted light, and may have a configuration for detecting reflected light, or a configuration for detecting transmitted light and reflected light. When detecting reflected light, the photodetection unit is arranged on the same side as the illumination unit.
照明部21a至照明部23a係依據缺陷檢查之種類而將經調整光強度、波長、或偏光狀態等的照明光照射在膜101。光檢測部21b至光檢測部23b係利用CCD等攝像元件,對膜101之被照射照明光之位置的圖像進行攝
像。
The illuminating
由光檢測部21b至光檢測部23b所攝像之圖像係輸出至判定部24。判定部24係對由光檢測部21b至光檢測部23b所攝像之圖像進行解析,以判定缺陷之有無(位置)或種類等。將該判定部24所判定之結果(檢查結果)輸出至後述之控制裝置16。此外,判定部24亦可為控制裝置16之一部分。
The images captured by the
[印刷部] [Printing Department]
印刷部12係設置在搬送路徑R中之缺陷檢查裝置11的下游,並在膜101印刷缺陷資訊並予以記錄。
The
(噴墨裝置) (inkjet device)
第4圖係顯示噴墨裝置13之構成的俯視圖。第5圖係顯示噴墨裝置13具有之噴墨頭之構成的俯視圖。第4圖所示之噴墨裝置13係朝與膜101之長邊方向交叉的方向延伸設置,且對膜101射出印墨並印刷缺陷資訊。在第4圖中,與膜101之長邊方向交叉的方向係指y方向。
FIG. 4 is a plan view showing the structure of the
此外,在第4圖中,噴墨裝置13之延伸方向與膜101之長邊方向所成的角度雖為90°,但不限定於此。
In addition, in FIG. 4 , although the angle formed by the extending direction of the
噴墨裝置13係藉由後述之控制裝置16所進行之控制而將缺陷資訊記録在膜101。第4圖所示之噴墨裝置13係具有沿著與膜101之長邊方向交叉的方向排列之10個噴墨頭31。
The
噴墨裝置13係具有複數個射出孔32(參照
第5圖)。複數個射出孔32係在膜101之長邊方向交叉之方向中從膜101的一端101a至另一端101b離散地配置。此外,在本實施形態中所謂「離散地」係指射出孔32規則性地以一列配置之情形,亦包含不規則性排列之情形。
The
在此,針對複數個射出孔32之配置例,一邊參照第5圖一邊加以說明。第5圖所示之噴墨頭31係具有16個射出印墨之射出孔32。再者,鄰接之2個射出孔32的間隔係10mm,從噴墨頭31之端邊31a至配置在最外側之射出孔32的間隔係5mm。
Here, an arrangement example of a plurality of injection holes 32 will be described with reference to FIG. 5 . The
此外,在1個噴墨頭31之中,16個射出孔32係以等間隔排列,亦能以不同之間隔排列。再者,複數個噴墨頭31之射出孔32之數量、大小、間隔等係可為彼此相同,亦可為彼此不同。
In addition, in one
(移動裝置) (mobile device)
如第3圖及第4圖所示,移動裝置14係藉由以後述之控制裝置16所進行之控制,使噴墨裝置13沿著與膜101之長邊方向交叉之方向移動。後述之控制裝置16係使移動裝置14驅動,且使複數個噴墨頭31沿著與膜101之長邊方向交叉的方向移動。
As shown in FIGS. 3 and 4 , the moving
[測長器] [length measuring device]
測長器15係配置在搬送輥203,以測量膜101之搬送量。測長器15係由旋轉編碼器所構成。
The
構成測長器15之旋轉編碼器係測量膜101之搬送量。膜101之搬送量係依據與膜101相接而旋轉之
搬送輥203的旋轉變位量而決定。測長器15之測量結果係輸出至後述之控制裝置16。
The rotary encoder constituting the
[控制裝置] [control device]
控制裝置16係依據由缺陷檢查裝置11所進行之檢查結果,來控制印刷部12之動作。具體而言,控制裝置16係依據由缺陷檢查裝置11所進行之檢查結果,來控制由移動裝置14s進行之噴墨裝置13的位置移動及由噴墨裝置13所進行之印刷。
The
控制裝置16係使移動裝置14驅動,並使噴墨裝置13移動至噴墨裝置13之y座標與缺陷部位之y座標重疊的位置。
The
在缺陷記錄系統1中,為了不會在藉由膜101之缺陷檢查裝置11而進行缺陷檢查之位置(缺陷檢查位置)與缺陷資訊之記錄之位置(資訊記錄位置)之間產生偏離,在進行缺陷檢查之後以預定之時序來記錄缺陷資訊。例如,在本實施形態中,於利用缺陷檢查裝置11進行檢查之時刻以後,算出在搬送路徑R上被搬送之膜的搬送量,當所算出之搬送量與偏置距離一致時,藉由噴墨裝置13來進行記錄。
In the
因此,偏置距離係指缺陷檢查裝置11與噴墨裝置13之間之膜的搬送距離。嚴格來說,偏置距離係定義作為缺陷檢查裝置11之缺陷檢查位置與噴墨裝置13之資訊記錄位置之間之膜的搬送距離。
Therefore, the offset distance refers to the transport distance of the film between the defect inspection device 11 and the
偏置距離係預先記憶在控制裝置16。具體
而言,在缺陷檢查裝置11中,會存在有光檢測部21b至光檢測部23b,以在各個光檢測部21b至光檢測部23b進行缺陷之檢查。因此,在控制裝置16中,於各個光檢測部21b至光檢測部23b記憶有偏置距離。
The offset distance is stored in the
在本實施形態中,依據測長器15之測量結果,在由缺陷檢查裝置11進行檢查之時刻以後,算出在搬送路徑R上被搬送之膜的搬送量,當所算出之搬送量與偏置距離一致時,藉由噴墨裝置13來進行印刷。
In this embodiment, based on the measurement result of the
(記號之配置例) (Example of placement of symbols)
例如,在無法藉由對缺陷部位變更噴墨裝置之y座標的習知系統中,會有難以在缺陷之正上方印刷記號之情形。另一方面,在不變更噴墨裝置之y座標的情形下,為了在缺陷之正上方印刷記號,可考慮將多數個射出孔密集地配置在噴墨裝置之方法。然而,配置多數個射出孔時,可推測出發生印墨之阻塞等問題的機會將變多。 For example, in the conventional system in which the y-coordinate of the inkjet device cannot be changed for the defective part, it may be difficult to print a mark directly on the defective part. On the other hand, in order to print a mark directly on the defect without changing the y-coordinate of the inkjet device, a method of densely arranging a plurality of injection holes in the inkjet device may be considered. However, when a large number of injection holes are arranged, it can be presumed that there will be more opportunities for problems such as clogging of ink to occur.
結果,可推測出維護所耗費用之時間或費用會更為增加。 As a result, it is presumed that the time or cost for maintenance will be further increased.
相對於此,在本實施形態中,如第4圖所示,藉由使噴墨裝置13移動,可在膜101之缺陷D的正上方印刷記號M。在第4圖中,雖顯示點狀之記號,但亦可為線狀之記號。
On the other hand, in this embodiment, as shown in FIG. 4 , by moving the
再者,當具有x座標相等之缺陷D1及缺陷D2時,對於缺陷D1,可在其正上方印刷記號M1。另一方面,對於缺陷D2,能以包圍其周圍之方式印刷記號M2。 此外,針對記號M之配置,並不限定於此。 Furthermore, when there are defect D1 and defect D2 with the same x coordinate, the mark M1 can be printed directly on the defect D1. On the other hand, the mark M2 can be printed so that it may surround the defect D2. In addition, the arrangement of the marks M is not limited to this.
第6圖係顯示第1實施形態之記號M之配置例的示意圖。在本實施形態中,如第6圖(a)所示,亦可在膜101之表面,以於與膜101之長邊方向交叉的方向使缺陷D位於相鄰之第1印刷圖案PT1與第2印刷圖案PT2之間的方式,印刷第1印刷圖案PT1及第2印刷圖案PT2。
Fig. 6 is a schematic diagram showing an example of arrangement of marks M in the first embodiment. In this embodiment, as shown in FIG. 6 (a), the defect D may be located on the surface of the
此時,就第1印刷圖案PT1及第2印刷圖案PT2而言,在膜101之搬送方向(長邊方向、x方向)排列複數個點狀之記號M並予以印刷。
At this time, in the first printing pattern PT1 and the second printing pattern PT2 , a plurality of dot-shaped marks M are arranged and printed in the conveyance direction (longitudinal direction, x direction) of the
第1印刷圖案PT1與第2印刷圖案PT2之間隔係依要使用之二個射出孔32(參照第5圖)之間隔而決定。利用第5圖所示之噴墨頭31,來使用鄰接之二個射出孔32時,第1印刷圖案PT1與第2印刷圖案PT2之間隔係成為10mm。
The distance between the first printed pattern PT1 and the second printed pattern PT2 is determined according to the distance between the two injection holes 32 (see FIG. 5 ) to be used. When using the
並且,如第6圖(b)所示,當缺陷D較大時,亦可印刷相鄰接之第1印刷圖案PT1、第2印刷圖案PT2、第3印刷圖案PT3、第4印刷圖案PT4。利用第5圖所示之噴墨頭31,在使用相鄰接之4個射出孔32時,第1印刷圖案PT1與第4印刷圖案PT4之間隔係成為30mm。
And, as shown in FIG. 6(b), when the defect D is large, the adjacent first printed pattern PT1, second printed pattern PT2, third printed pattern PT3, and fourth printed pattern PT4 may be printed. With the
在此,將第2印刷圖案PT2至第4印刷圖案PT4稱為「第X印刷圖案PTX」。如上所述,由於缺陷D位於第1印刷圖案PT1與第X之印刷圖案PTX之間,因此可顯示缺陷D之位置。藉此,在印刷後之檢查中,可容易地掌握缺陷D之位置。 Here, the second printed pattern PT2 to the fourth printed pattern PT4 are referred to as "Xth printed pattern PTX". As described above, since the defect D is located between the first printed pattern PT1 and the X-th printed pattern PTX, the position of the defect D can be displayed. Thereby, the position of the defect D can be grasped easily in the inspection after printing.
再者,藉由第1印刷圖案PT1與第X印刷
圖案PTX之間隔,可辨識位在其間之缺陷D的大小。此外,亦可不一定要使用排列在與膜101之搬送方向(長邊方向)交叉的方向(第4圖中之y方向)之複數個射出孔32中之相隣接之射出孔32。亦可配合缺陷D之位置及大小,適當地選擇射出孔32。
Moreover, by the first printing pattern PT1 and the X printing
The interval between the patterns PTX can identify the size of the defect D therebetween. In addition, it is not necessary to use adjacent injection holes 32 among the plurality of injection holes 32 arranged in a direction (y direction in FIG. 4 ) intersecting the conveyance direction (longitudinal direction) of the
構成第1印刷圖案PT1及第X印刷圖案PTX之點狀的記號M之個數或間隔並無特別限制,但亦可變更記號M之個數或間隔。並且,就印刷之記號而言,除了點狀或線狀之記號以外,亦可組合記號或花紋等。在本實施形態中,係使由記號之種類、數量及間隔所構成之群中選出的至少一個來與缺陷資訊預先相對應,並依據該對應關係詳細地記錄缺陷資訊。 The number or intervals of dot-shaped marks M constituting the first printed pattern PT1 and the Xth printed pattern PTX are not particularly limited, but the number or intervals of the marks M may be changed. In addition, in addition to dot-like or line-like marks, marks, patterns, etc. may be combined in printed marks. In this embodiment, defect information is associated with at least one selected from the group consisting of types, numbers, and intervals of marks in advance, and defect information is recorded in detail based on the correspondence.
(膜之製造方法) (Membrane manufacturing method)
接著,針對利用第3圖所示之膜製造系統200之膜的製造方法加以說明。膜101會藉由搬送裝置201而朝膜101之長邊方向(+x方向)搬送。
Next, a method for producing a film using the
首先,缺陷檢查裝置11會檢查膜101之缺陷。在由缺陷檢查裝置11進行檢查之時刻以後,測長器15會算出膜101之搬送量。
First, the defect inspection device 11 inspects the defect of the
接著,依據由缺陷檢查裝置11進行之檢查結果及測長器15的測量結果,控制裝置16係控制噴墨裝置13及移動裝置14。詳細而言,藉由移動裝置14而使噴墨裝置13之噴墨頭31朝與缺陷部位相對應之位置移動。
Next, the
再者,選擇該噴墨頭31所具有之複數個射
出孔32中之印刷第1印刷圖案PT1及第X印刷圖案PTX的射出孔32。然後,從該等選択之射出孔32來射出印墨,而在膜101記錄缺陷資訊。如此,製造出記錄有缺陷資訊之膜。
Furthermore, select a plurality of jets that the
此外,在本實施形態中,噴墨裝置13雖具有複數個噴墨頭31,但並不限定於此。就本實施形態之噴墨裝置而言,亦可為由一個噴墨頭所構成,且朝與膜101之長邊方向交叉的方向延伸設置的噴墨裝置。
In addition, in this embodiment, although the
依據以上構成之缺陷記錄系統,可使膜之缺陷與標記(記號)之間隔變小,且可抑制膜之缺陷資訊的記錄遺漏之產生。 According to the defect recording system constituted as above, the gap between the film defect and the mark (mark) can be reduced, and the occurrence of recording omission of the film defect information can be suppressed.
再者,具備該缺陷記錄系統之膜製造系統係可使膜之缺陷與標記之間隔變小,且可抑制膜之缺陷資訊的記錄遺漏之產生。 Furthermore, the film manufacturing system provided with this defect recording system can reduce the gap between the film defect and the mark, and can suppress the occurrence of recording omission of the film defect information.
再者,利用該膜製造系統之膜的製造方法係可使膜之缺陷與標記之間隔變小,且可抑制膜之缺陷資訊的記錄遺漏之產生。 Furthermore, the film manufacturing method using the film manufacturing system can reduce the gap between the film defect and the mark, and can suppress the occurrence of recording omission of the film defect information.
<第2實施形態> <Second Embodiment>
以下,一面參照第7圖,一面針對本發明第2實施形態之膜的製造方法加以說明。本實施形態之膜的製造方法係與第1實施形態之膜的製造方法局部共通。不同者係在於噴墨裝置之構成。因此,針對在本實施形態中與第1實施形態共通之構成元件係標記相同符號,並省略詳細之說明。 Hereinafter, a method for producing a film according to a second embodiment of the present invention will be described with reference to FIG. 7 . The manufacturing method of the film of this embodiment is partly the same as the manufacturing method of the film of 1st Embodiment. The difference lies in the composition of the inkjet device. Therefore, the same reference numerals are assigned to the same components in the present embodiment as those in the first embodiment, and detailed description thereof will be omitted.
(噴墨裝置) (inkjet device)
第7圖係顯示第2實施形態之噴墨裝置之構成的俯視圖。此外,第7圖係對應於第4圖。在第7圖所示之噴墨裝置53中,複數個噴墨頭31係排列在沿著與膜101之長邊方向交叉的方向設定之第1列L1及第2列L2。
Fig. 7 is a plan view showing the structure of the inkjet device according to the second embodiment. In addition, FIG. 7 corresponds to FIG. 4 . In the
噴墨頭31A及噴墨頭31B係在與膜101之長邊方向交叉的方向彼此相鄰接配置。5個噴墨頭31B係排列在第1列L1,5個噴墨頭31A係排列在第2列L2。
The
亦即,噴墨頭31A及噴墨頭31B係分別排列在不同之列排列。藉此,噴墨頭31A及噴墨頭31B係可分別獨立地移動。
That is, the inkjet heads 31A and the inkjet heads 31B are arranged in different rows, respectively. Thereby, the
此外,排列有複數個噴墨頭31之列的數量亦可限定於二個,亦可例如為三個。 In addition, the number of rows in which a plurality of inkjet heads 31 are arranged may be limited to two, or may be three, for example.
藉由使用具備該噴墨裝置53之缺陷記錄系統,具有下述之優點。例如,在具有x座標相等之缺陷D1及缺陷D2時,在第1實施形態中,係先說明僅針對缺陷D1在其正上方印刷記號M1之情形。
By using the defect recording system provided with this
相對於此,在第2實施形態中,噴墨頭31A及噴墨頭31C可分別獨立地移動。在此,噴墨頭31C係指5個噴墨頭31B中之可對缺陷D2印刷記號M2之噴墨頭。第8圖係顯示第2實施形態之複數個噴墨頭之動作的示意圖。如第8圖所示,藉由使噴墨頭31A朝+y方向移動,而可使噴墨頭31A之射出孔32A的y座標與缺陷D1之y座標一致。同樣地,藉由噴墨頭31C朝-y方向移動,可使噴
墨頭31C之射出孔32C的y座標與缺陷D2之y座標一致。
On the other hand, in the second embodiment, the
因此,針對缺陷D1及缺陷D2之兩方,可在其正上方印刷記號M1及記號M2。因此,可使缺陷D與記號M之間隔減小,且可減少在將缺陷部位廢棄之際產生之膜的耗損。 Therefore, the mark M1 and the mark M2 can be printed directly on both of the defect D1 and the defect D2. Therefore, the distance between the defect D and the mark M can be reduced, and the wear of the film that occurs when the defect portion is discarded can be reduced.
再者,即使在存在有y座標為不同之多數個缺陷D時,亦可抑制膜101之缺陷資訊的記錄遺漏之產生。
Furthermore, even when there are many defects D with different y-coordinates, occurrence of recording omission of defect information on the
由以上之情形得知,在第2實施形態中可使膜之缺陷與標記(記號)之間隔減小,且可抑制膜之缺陷資訊之記錄遺漏的產生。 From the above, in the second embodiment, it is possible to reduce the gap between the film defect and the mark (mark), and to suppress the occurrence of recording omission of the film defect information.
<第3實施形態> <Third Embodiment>
以下,參照第9圖,針對本發明第3實施形態之膜的製造方法加以說明。本實施形態之膜的製造方法係與第2實施形態之膜的製造方法局部共通。不同者係在於噴墨裝置之構成。因此,在本實施形態中,針對與第2實施形態共通之構成元件標記相同之符號,並省略詳細之說明。 Hereinafter, referring to FIG. 9, a method of manufacturing a film according to a third embodiment of the present invention will be described. The manufacturing method of the film of this embodiment is partly the same as the manufacturing method of the film of 2nd Embodiment. The difference lies in the composition of the inkjet device. Therefore, in the present embodiment, the same reference numerals are assigned to the same constituent elements as those of the second embodiment, and detailed description thereof will be omitted.
(噴墨裝置) (inkjet device)
第9圖係顯示第3實施形態之噴墨裝置之構成的俯視圖。此外,第9圖係對應於第4圖。第9圖所示之噴墨裝置55係具有第1噴墨裝置53A及第2噴墨裝置53B。第2噴墨裝置53B係在搬送路徑中配置在第1噴墨裝置53A之下游(+x方向)。
Fig. 9 is a plan view showing the structure of the inkjet device according to the third embodiment. In addition, FIG. 9 corresponds to FIG. 4 . The
第1噴墨裝置53A及第2噴墨裝置53B係
為與第2實施形態之噴墨裝置53相同的構成。
The
第1噴墨裝置53A所射出之印墨的顏色亦可與第2噴墨裝置53B所射出之印墨的顏色不同。藉此,除了區分點狀或線狀之記號、符號、花紋之外,亦可區分顏色。此時,預先使記號之種類、顏色、數量、間隔與缺陷資訊預先對應,並依據該對應關係而詳細地記錄缺陷資訊。
The color of the ink ejected from the
此外,第1噴墨裝置53A與第2噴墨裝置53B之至少任一方亦可為與第1實施形態之噴墨裝置13相同的構成。
In addition, at least one of the
再者,第1噴墨裝置53A與第2噴墨裝置53B之至少任一者亦可為由一個噴墨頭所構成,且朝與膜101之長邊方向交叉的方向延伸設置之噴墨裝置。第1噴墨裝置53A係較佳為第2實施形態之噴墨裝置53。
Furthermore, at least one of the
藉由使用具備該噴墨裝置55之缺陷記錄系統,而具有下述之優點。例如,假設噴墨頭31A位於可印刷之範圍AR,且具有x座標相等之缺陷D3及缺陷D4的情形。此時,在第1實施形態中,先說明僅針對缺陷D3可在其正上方印刷記號M3。
By using the defect recording system provided with this
相對於此,在第3實施形態中,第2噴墨裝置53B係具有可在範圍AR印刷之噴墨頭31D。在第3實施形態中,噴墨頭31A及噴墨頭31D係可分別獨立地移動。結果,可對於缺陷D3及缺陷D4之兩方,在其正上方印刷記號M3及記號M4。因此,可使缺陷D與記號M之
間隔減小,且可減少在將缺陷部位予以廢棄之際產生之膜的耗損。
On the other hand, in the third embodiment, the
再者,與第2實施形態同樣地,在第3實施形態中,即使存在有y座標不同之多數個缺陷D時,亦可抑制膜101之缺陷資訊的記錄遺漏之產生。
Furthermore, similarly to the second embodiment, in the third embodiment, even when there are a plurality of defects D having different y coordinates, occurrence of recording omission of defect information on the
並且,亦可針對其他缺陷D5,藉由第1印刷圖案PT1及第2印刷圖案PT2來記錄缺陷資訊。在第3實施形態中,噴墨頭31C係可印刷第1印刷圖案PT1,噴墨頭31E係可印刷第2印刷圖案PT2。噴墨頭31E係包含在第2噴墨裝置53B,且位於與噴墨頭31D不同之列。具體而言,噴墨頭31E係位於噴墨頭31D所在之列的上游側之列。在第3實施形態中,藉由變更噴墨頭31C及噴墨頭31E之位置關係,而可變更第1印刷圖案PT1與第2印刷圖案PT2之間隔。
Moreover, defect information can also be recorded with respect to the other defect D5 with the 1st printing pattern PT1 and the 2nd printing pattern PT2. In the third embodiment, the
再者,第2噴墨裝置53B亦可與第1噴墨裝置53A所印刷之記號重疊,來印刷記號。此時,即使在無法由第1噴墨裝置53A印刷記號時,亦可由第2噴墨裝置53B印刷記號。因此,可抑制因印刷不良所造成之缺陷資訊的記錄遺漏之產生。
Furthermore, the
由以上得知,即使在第3實施形態中,亦可使膜之缺陷與標記(記號)之間隔減小,且可抑制膜之缺陷資訊之記錄遺漏的產生。 From the above, even in the third embodiment, the gap between the film defect and the mark (mark) can be reduced, and the occurrence of recording omission of the film defect information can be suppressed.
[第4實施形態] [Fourth Embodiment]
以下,一邊參照第10圖,一邊針對本發明第4實施 形態之膜的製造方法加以說明。本實施形態之膜的製造方法係與第3實施形態之膜的製造方法局部共通。不同者係在於缺陷記錄系統之構成。因此,針對在本實施形態中與第3實施形態共通之構成元件,標記相同符號,並省略詳細之說明。 Hereinafter, referring to Fig. 10, while referring to the fourth embodiment of the present invention The method for producing the morphological film will be described. The method of manufacturing the film of the present embodiment is partly the same as the method of manufacturing the film of the third embodiment. The difference lies in the composition of the defect recording system. Therefore, the same reference numerals are assigned to the same components in this embodiment as those in the third embodiment, and detailed descriptions will be omitted.
[缺陷記錄系統] [Defect recording system]
第10圖係顯示第4實施形態之膜製造系統之構成的立體圖。此外,第10圖係對應於第3圖。如第10圖所示,缺陷記錄系統2係具備缺陷檢查裝置11、噴墨裝置55、移動裝置14、測長器15、控制裝置16及感測器41。再者,將包含噴墨裝置55及移動裝置14之構成稱為印刷部12。
Fig. 10 is a perspective view showing the configuration of a film manufacturing system according to a fourth embodiment. In addition, FIG. 10 corresponds to FIG. 3 . As shown in FIG. 10 , the defect recording system 2 includes a defect inspection device 11 , an
[感測器] [sensor]
如第10圖所示,感測器41係配置在搬送路徑R中之第1噴墨裝置53A與第2噴墨裝置53B之間。感測器41係檢測出因第1噴墨裝置53A所造成之印刷不良。感測器41係由例如攝像機所構成。由感測器41所攝像之圖像(檢測結果)係輸出至控制裝置16。
As shown in FIG. 10 , the
控制裝置16係依據由缺陷檢查裝置11所進行之檢查結果及感測器41的檢測結果,使第2噴墨裝置53B驅動,以在對應於印刷不良之位置印刷缺陷資訊。
The
此外,在本實施形態中,第2噴墨裝置53B亦可從頭開始驅動,亦可停止。
In addition, in the present embodiment, the
由以上得知,即使在第4實施形態中,亦可使膜之缺陷與標記(記號)之間隔減小,且可抑制膜之缺 陷資訊之記錄遺漏的產生。特別是,可即時地檢測出印刷不良,且抑制因印刷不良所造成之缺陷資訊的記錄遺漏之產生。 From the above, even in the fourth embodiment, it is possible to reduce the distance between the defect of the film and the mark (mark), and to suppress the defect of the film. Occurrence of omissions in the recording of trap information. In particular, printing defects can be detected in real time, and the occurrence of omission of recording defect information due to printing defects can be suppressed.
以上,一邊參照附圖,一邊針對本發明之較佳實施形態例進行了說明,惟本發明當然並不限定於該例。在上述例中所示之各構成構件的諸形狀或組合等係為一例,亦可在在不會脫離本發明之主旨的範圍下,依據設計要求等進行各種變更。 As mentioned above, although the example of preferred embodiment of this invention was demonstrated referring drawings, it goes without saying that this invention is not limited to this example. The shapes and combinations of the components shown in the above examples are examples, and various changes can be made according to design requirements without departing from the gist of the present invention.
P‧‧‧顯示面板 P‧‧‧display panel
P1‧‧‧第1基板 P1‧‧‧1st substrate
P2‧‧‧第2基板 P2‧‧‧Second substrate
P3‧‧‧液晶層 P3‧‧‧LCD layer
P4‧‧‧顯示區域 P4‧‧‧display area
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CN109425616B (en) | 2023-03-28 |
KR102603009B1 (en) | 2023-11-15 |
JP7022037B2 (en) | 2022-02-17 |
KR20190026602A (en) | 2019-03-13 |
CN109425616A (en) | 2019-03-05 |
TW201932826A (en) | 2019-08-16 |
JP2019045502A (en) | 2019-03-22 |
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