TWI785703B - Optical film, polarizing plate and liquid crystal display device - Google Patents

Optical film, polarizing plate and liquid crystal display device Download PDF

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TWI785703B
TWI785703B TW110127914A TW110127914A TWI785703B TW I785703 B TWI785703 B TW I785703B TW 110127914 A TW110127914 A TW 110127914A TW 110127914 A TW110127914 A TW 110127914A TW I785703 B TWI785703 B TW I785703B
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optical film
light
absorbing material
polarizer
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TW202210297A (en
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瑓理英子
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日商柯尼卡美能達股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/023Optical properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/10Esters; Ether-esters
    • C08K5/101Esters; Ether-esters of monocarboxylic acids
    • C08K5/103Esters; Ether-esters of monocarboxylic acids with polyalcohols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L65/00Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors

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  • Polarising Elements (AREA)
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Abstract

本發明之光學薄膜係包含環烯烴樹脂。 由光學薄膜之一面至厚度之30%之深度的區域作為表層區域(Sa),由另一面至厚度之30%之深度的區域作為表層區域(Sb),表層區域(Sa)與表層區域(Sb)之間的區域作為內層區域(C)時, 至少表層區域(Sa)之波長9.6μm之光的吸收係數As與內層區域(C)之波長9.6μm之光之吸收係數Ac之比As/Ac為1.1~20, 光學薄膜之波長9.6μm之光的吸收係數為1.5×10-5 /μm以上。The optical film of the present invention contains cycloolefin resin. The area from one side of the optical film to the depth of 30% of the thickness is the surface area (Sa), the area from the other side to the depth of 30% of the thickness is the surface area (Sb), and the surface area (Sa) and the surface area (Sb) ) as the inner region (C), at least the ratio As of the absorption coefficient As of the light with a wavelength of 9.6 μm in the surface region (Sa) to the absorption coefficient Ac of light with a wavelength of 9.6 μm in the inner region (C) /Ac is 1.1 to 20, and the absorption coefficient of light with a wavelength of 9.6 μm of the optical film is 1.5×10 -5 /μm or more.

Description

光學薄膜、偏光板及液晶顯示裝置Optical film, polarizing plate and liquid crystal display device

本發明係有關光學薄膜、偏光板及液晶顯示裝置。The invention relates to an optical film, a polarizing plate and a liquid crystal display device.

液晶顯示裝置等之顯示裝置包含偏光板。偏光板包含偏光鏡與偏光鏡保護薄膜。偏光鏡保護薄膜由於具有、優異之透明性與高的耐濕性等,有可使用環烯烴樹脂薄膜的情形。A display device such as a liquid crystal display device includes a polarizing plate. The polarizer includes a polarizer and a protective film for the polarizer. Cycloolefin resin films may be used for polarizer protective films due to their excellent transparency and high moisture resistance.

這種偏光板,通常以接著劑等貼合偏光鏡與偏光鏡保護薄膜後,切斷成特定之大小來使用。偏光板之切斷,例如使用刀之機械切斷法或使用雷射光之雷射切斷法等。機械的切斷法,由於容易有微細的傷痕,殘留應力容易變得不均勻,因此,近年,多採用雷射切斷法的情形。Such a polarizing plate is usually used after bonding a polarizer and a polarizer protective film with an adhesive or the like, and then cutting it into a specific size. The cutting of the polarizing plate is, for example, a mechanical cutting method using a knife or a laser cutting method using laser light. The mechanical cutting method tends to have fine scratches and the residual stress tends to become uneven. Therefore, in recent years, the laser cutting method is often used.

環烯烴樹脂薄膜,一般雷射光之吸收率低,因此,以雷射光之切斷困難。Cycloolefin resin films generally have a low absorption rate of laser light, so it is difficult to cut them off with laser light.

相對於此,為了可藉由雷射切斷法之切斷,使用包含含有雷射吸收劑之基材的偏光鏡保護薄膜的偏光板已為人知(參照例如專利文獻1)。 [先前技術文獻] [專利文獻]On the other hand, in order to enable cutting by a laser cutting method, a polarizing plate using a polarizer protective film including a base material containing a laser absorber is known (see, for example, Patent Document 1). [Prior Art Literature] [Patent Document]

[專利文獻1]國際公開第2018/139638號[Patent Document 1] International Publication No. 2018/139638

[發明所欲解決之課題][Problem to be Solved by the Invention]

但是專利文獻1之包含環烯烴樹脂之偏光鏡保護薄膜藉由雷射光之切斷性不足。因此,欲以雷射光切斷偏光鏡保護薄膜時,必須高照度之雷射光之照射。因此,雷射光之吸收率高的偏光鏡容易燒焦,易產生煤煙,偏光板被污染的問題。而為了提高藉由雷射光之切斷性,而多量添加雷射吸收劑(光吸收材料)時,容易損及光學薄膜之透明性。However, the polarizer protective film comprising cycloolefin resin in Patent Document 1 is insufficient in cuttability by laser light. Therefore, when it is desired to cut the polarizer protective film with laser light, it is necessary to irradiate with high-intensity laser light. Therefore, polarizers with a high absorption rate of laser light are easy to burn, generate soot, and pollute the polarizer. In order to improve the cut-off property by laser light, when a large amount of laser absorber (light-absorbing material) is added, the transparency of the optical film is likely to be damaged.

相對於此,本發明人等藉由局部提高偏光鏡保護薄膜(光學薄膜)之表層區域之雷射光之吸收率,發現不會損及光學薄膜之透明性,可提高藉由雷射光之切斷性。而過度提高表層區域之雷射光的吸收率時,有顯示裝置容易產生漏光之新的問題。In contrast, the inventors of the present invention have found that the laser light cut-off rate can be improved without compromising the transparency of the optical film by locally increasing the absorption rate of the laser light in the surface layer region of the polarizer protective film (optical film). sex. On the other hand, when the absorptivity of laser light in the surface layer region is excessively increased, there is a new problem that light leakage is likely to occur in the display device.

本發明有鑑於上述情形而完成者,本發明之目的係提供顯示裝置不會產生漏光,可提高藉由雷射光之切斷性的光學薄膜,偏光板及液晶顯示裝置。 [用以解決課題之手段]The present invention was made in view of the above circumstances, and an object of the present invention is to provide an optical film, a polarizing plate, and a liquid crystal display device that can improve the cutting performance by laser light without causing light leakage in the display device. [Means to solve the problem]

本發明係有關以下的光學薄膜、偏光板及液晶顯示裝置。The present invention relates to the following optical film, polarizing plate and liquid crystal display device.

本發明之光學薄膜,其係包含環烯烴樹脂的光學薄膜,由前述光學薄膜之一面至前述光學薄膜之厚度之30%之深度的區域作為表層區域Sa,由前述光學薄膜之另一面至前述光學薄膜之厚度之30%之深度的區域作為表層區域Sb,前述表層區域Sa與前述表層區域Sb之間的區域作為內層區域C時, 至少前述表層區域Sa之以ATR法測定之波長9.6μm之光的吸收係數As與、前述內層區域C之以ATR法測定之波長9.6μm之光之吸收係數Ac之比As/Ac為1.1~20, 前述光學薄膜之波長9.6μm之光的吸收係數為1.5×10-5 /μm以上。The optical film of the present invention is an optical film comprising cycloolefin resin, the area from one surface of the optical film to the depth of 30% of the thickness of the optical film is defined as the surface region Sa, and the area from the other surface of the optical film to the optical film is When the area at the depth of 30% of the thickness of the film is defined as the surface area Sb, and the area between the aforementioned surface area Sa and the aforementioned surface area Sb is used as the inner layer area C, at least the wavelength of the aforementioned surface area Sa measured by the ATR method is 9.6 μm The ratio As/Ac of the absorption coefficient As of light to the absorption coefficient Ac of light with a wavelength of 9.6 μm measured by the ATR method in the inner layer region C is 1.1 to 20, and the absorption coefficient of light with a wavelength of 9.6 μm of the aforementioned optical film is 1.5×10 -5 /μm or more.

本發明之偏光板,其係具有偏光鏡,及配置於前述偏光鏡之至少一面的本發明之光學薄膜。The polarizing plate of the present invention has a polarizer, and the optical film of the present invention disposed on at least one side of the polarizer.

本發明之液晶顯示裝置,其係具有液晶胞,與挟持液晶胞之第一偏光板及第二偏光板,且第一偏光板及第二偏光板之至少一者為本發明之偏光板。 [發明效果]The liquid crystal display device of the present invention has a liquid crystal cell, and a first polarizer and a second polarizer sandwiching the liquid crystal cell, and at least one of the first polarizer and the second polarizer is the polarizer of the present invention. [Invention effect]

依據本發明時,可提供顯示裝置中不會產生漏光,可提高藉由雷射光之切斷性的光學薄膜、偏光板及液晶顯示裝置。According to the present invention, it is possible to provide an optical film, a polarizing plate, and a liquid crystal display device capable of improving cutting performance by laser light without causing light leakage in a display device.

[實施發明之形態][Mode of Implementing the Invention]

如前述,藉由局部提高光學薄膜之表層區域之雷射光之吸收率,不會損及光學薄膜之透明性,可提高藉由雷射光之切斷性,故作為顯示裝置時,容易產生漏光。As mentioned above, by locally increasing the absorption rate of laser light in the surface region of the optical film, the transparency of the optical film can be improved, and the cutting performance by laser light can be improved. Therefore, it is easy to cause light leakage when used as a display device.

此理由雖不明,推測如下述。亦即,局部過度提高光學薄膜之表層區域之雷射光之吸收率時,在表層區域之雷射光之吸收所致的發熱量,遠大於內層區域中之發熱量,而容易產生應力差的緣故。Although the reason for this is unknown, it is presumed as follows. That is, when the absorption rate of laser light in the surface region of the optical film is excessively increased locally, the heat generated by the absorption of laser light in the surface region is much greater than the heat generated in the inner layer region, which is likely to cause stress differences. .

相對於此,本發明中,適度地提高光學薄膜之表層區域之雷射光的吸收率。亦即,將光學薄膜全體之波長9.6μm之光的吸收係數設為一定以上,且表層區域Sa之波長9.6μm之光的吸收係數As與內層區域C之波長9.6μm之光之吸收係數Ac之比As/Ac設為1.1~20,較佳為3~15。藉此,提高藉由雷射光之切斷性,可減少在表層區域Sa與內層區域C,藉由雷射光之吸收之發熱所致的應力差,故可抑制顯示裝置中之漏光。以下,說明本發明之構成。On the other hand, in the present invention, the absorptivity of laser light in the surface region of the optical film is moderately increased. That is, the absorption coefficient of light with a wavelength of 9.6 μm in the entire optical film is set to a certain value or more, and the absorption coefficient As of light with a wavelength of 9.6 μm in the surface region Sa and the absorption coefficient Ac of light with a wavelength of 9.6 μm in the inner region C The ratio As/Ac is set at 1.1-20, preferably 3-15. Thereby, the cutting property by laser light is improved, and the stress difference caused by the heat generated by the absorption of laser light can be reduced between the surface layer region Sa and the inner layer region C, so that light leakage in the display device can be suppressed. Hereinafter, the configuration of the present invention will be described.

1.光學薄膜 本發明之光學薄膜包含環烯烴樹脂。而且,光學薄膜之至少一表層區域之雷射光的吸收率,局部地變高(高於內層區域)。1. Optical film The optical film of the present invention contains a cycloolefin resin. Furthermore, the absorptivity of laser light in at least one surface layer region of the optical film becomes locally high (higher than that in the inner layer region).

圖1係表示光學薄膜10之表層區域Sa、Sb及內層區域C的斷面示意圖。FIG. 1 is a schematic cross-sectional view showing the surface regions Sa and Sb and the inner region C of an optical film 10 .

由光學薄膜10之一面10a及另一面10b,至光學薄膜10之厚度之30%之深度的區域,各自為表層區域Sa及Sb,彼等之間的區域作為內層區域C時,至少一表層區域Sa之雷射光之吸收率,高於內層區域C之雷射光之吸收率。具體而言,至少一表層區域Sa之波長9.6μm之光的吸收係數As與內層區域C之波長9.6μm之光之吸收係數Ac之比As/Ac,較佳為1.1~20。The regions from one side 10a and the other side 10b of the optical film 10 to the depth of 30% of the thickness of the optical film 10 are the surface regions Sa and Sb respectively, and when the region between them is used as the inner layer region C, at least one surface layer The absorptivity of the laser light in the region Sa is higher than the absorptivity of the laser light in the inner layer region C. Specifically, the ratio As/Ac of the absorption coefficient As of light with a wavelength of 9.6 μm in at least one surface region Sa and the absorption coefficient Ac of light with a wavelength of 9.6 μm in the inner region C is preferably 1.1-20.

As/Ac為1.1以上時,表層區域Sa之雷射光之吸收率,可相對地提高,故容易提高藉由雷射光之切斷性。As/Ac為20以下時,表層區域Sa中之雷射光吸收所致之發熱量,不會遠大於內層區域C中之雷射光吸收所致之發熱量,故可減少因雷射光之吸收之發熱所產生的應力差。因此,可抑制顯示裝置之漏光。就同樣的觀點,As/Ac更佳為3~15。When As/Ac is 1.1 or more, the absorptivity of laser light in the surface layer region Sa can be relatively increased, so it is easy to improve the cutting property by laser light. When As/Ac is less than 20, the calorific value caused by the laser light absorption in the surface region Sa will not be much greater than the calorific value caused by the laser light absorption in the inner layer region C, so the heat generated by the laser light absorption can be reduced. Stress difference due to heat generation. Therefore, light leakage of the display device can be suppressed. From the same viewpoint, As/Ac is more preferably 3-15.

As/Ac可使用以下方法測定。 1)首先,使用顯微FTIR(Agilent製「UMA600」及「FTS3000」),以ATR法,在入射光徑:100μm、稜鏡:Ge(入射角45°)、檢測器:MCT-A、分解能:4.0cm-1 、累積:64次的條件下,測定紅外線吸收光譜。由所得之紅外線吸收光譜,讀取相當於波長9.6μm之部分(頻率1041cm-1 )的吸光度,測定光學薄膜10全體之吸光度A。 2)接著,由光學薄膜10之一面10a,切削厚度之30%。然後,與上述1)同樣地測定切削所得之面的吸光度A1。 3)又,由光學薄膜10之另一面10b,切削厚度之30%。然後,與上述1)同樣地測定切削所得之面的吸光度A2。 4)將上述1)~3)所得之吸光度A、A1及A2帶入下述式,分別算出表層區域Sa之吸光係數As及內層區域C之吸光係數Ac。 表層區域Sa之吸光係數As=(A-A1)×loge10÷(0.3T) 內層區域C之吸光係數Ac=A2×loge10÷(0.4T) (T:光學薄膜10之厚度 A:光學薄膜10之吸光度 A1:由光學薄膜10之一面10a,切削光學薄膜10之厚度T之30%部分,進行測定的吸光度 A2:由光學薄膜10之另一面10b,切削光學薄膜10之厚度T之30%部分,進行測定的吸光度)As/Ac can be measured using the following method. 1) First, using a microscope FTIR ("UMA600" and "FTS3000" manufactured by Agilent), by the ATR method, the incident light path: 100μm, the galvanic: Ge (incident angle 45°), the detector: MCT-A, the resolution : 4.0 cm -1 , accumulation: 64 times, the infrared absorption spectrum was measured. From the obtained infrared absorption spectrum, the absorbance of a portion corresponding to a wavelength of 9.6 μm (frequency 1041 cm −1 ) was read, and the absorbance A of the entire optical film 10 was measured. 2) Next, cut 30% of the thickness from one side 10a of the optical film 10 . Then, the absorbance A1 of the cut surface was measured in the same manner as in the above 1). 3) Also, cut 30% of the thickness from the other surface 10b of the optical film 10 . Then, the absorbance A2 of the cut surface was measured in the same manner as in 1) above. 4) Put the absorbances A, A1 and A2 obtained in the above 1) to 3) into the following formula to calculate the light absorption coefficient As of the surface region Sa and the light absorption coefficient Ac of the inner layer region C, respectively. The light absorption coefficient As=(A-A1)×loge10÷(0.3T) of the surface area Sa, the light absorption coefficient Ac=A2×loge10÷(0.4T) of the inner area C (T: the thickness of the optical film 10 A: the optical film 10 Absorbance A1: Cut 30% of the thickness T of the optical film 10 from one side 10a of the optical film 10, and measure the absorbance A2: Cut 30% of the thickness T of the optical film 10 from the other side 10b of the optical film 10 , the absorbance at which the measurement was performed)

光學薄膜10之另一表層區域Sb之雷射光的吸收係數,可比內層區域C之雷射光之吸收係數高也可同等。亦即,光學薄膜10之表層區域Sb之波長9.6μm之光的吸收係數As與內層區域C之波長9.6μm之光之吸收係數Ac之比As/Ac可為1~20,也可為1.1~20。The absorption coefficient of laser light in the other surface region Sb of the optical film 10 can be higher than that of the inner layer region C or can be equal. That is, the ratio As/Ac of the absorption coefficient As of the light with a wavelength of 9.6 μm in the surface region Sb of the optical film 10 to the absorption coefficient Ac of light with a wavelength of 9.6 μm in the inner region C can be 1 to 20, or 1.1 ~20.

又,光學薄膜10之波長9.6μm之光的吸收係數,較佳為1.5×10-5 /μm以上,更佳為2.0×10-5 ~50×10-5 /μm。In addition, the absorption coefficient of light with a wavelength of 9.6 μm of the optical film 10 is preferably 1.5×10 -5 /μm or more, more preferably 2.0×10 -5 to 50×10 -5 /μm.

光學薄膜10之As/Ac或吸收係數A,可藉由吸收雷射光之材料(光吸收材料)的分布或種類、含量等來調整。亦即,欲使As/Ac提高至一定以上時,光學薄膜10,較佳為表層區域Sa及內層區域C各自包含光吸收材料;表層區域Sa中之光吸收材料之含量Ms多於內層區域C中之光吸收材料的含量Mc(具體而言,Ms/Mc為2.5~20,較佳為3.5~15)。以下,詳細地說明光吸收材料。As/Ac or the absorption coefficient A of the optical film 10 can be adjusted by the distribution, type, content, etc. of the material (light-absorbing material) that absorbs laser light. That is, when As/Ac is desired to be raised above a certain value, the optical film 10, preferably, the surface region Sa and the inner layer region C each contain a light-absorbing material; the content Ms of the light-absorbing material in the surface region Sa is more than that of the inner layer The content Mc of the light-absorbing material in the region C (specifically, Ms/Mc is 2.5-20, preferably 3.5-15). Hereinafter, the light-absorbing material will be described in detail.

這種光學薄膜10,可為具有基材層與表層的積層薄膜,也可為單層薄膜。Such an optical film 10 may be a laminated film having a base layer and a surface layer, or may be a single-layer film.

以下的實施形態係光學薄膜為具有基材層與表層的積層薄膜的例進行說明。The following embodiments will be described as examples in which the optical film is a laminated film having a base layer and a surface layer.

圖2A表示本實施形態之光學薄膜10之構成的斷面圖。FIG. 2A is a cross-sectional view showing the structure of the optical film 10 of this embodiment.

如圖2A所示,本實施形態之光學薄膜10係具有基材層11與夾持基材層11之2個表層12及13。As shown in FIG. 2A , the optical film 10 of this embodiment has a base layer 11 and two surface layers 12 and 13 sandwiching the base layer 11 .

基材層11包含環烯烴樹脂與光吸收材料。The substrate layer 11 includes cycloolefin resin and light absorbing material.

1-1.基材層 1-1-1.環烯烴樹脂 環烯烴樹脂係包含來自降莰烯系單體之結構單位的聚合物。1-1. Substrate layer 1-1-1. Cycloolefin resin Cycloolefin resins are polymers comprising structural units derived from norbornene-based monomers.

降莰烯系單體係以下述式(1)表示。

Figure 02_image001
The norbornene-based monomer system is represented by the following formula (1).
Figure 02_image001

式(1)之R1 ~R4 分別表示氫原子、鹵素原子、烴基、或極性基。R 1 to R 4 in formula (1) respectively represent a hydrogen atom, a halogen atom, a hydrocarbon group, or a polar group.

鹵素原子之例,包含氟原子、氯原子等。Examples of halogen atoms include fluorine atoms, chlorine atoms and the like.

烴基係碳原子數為1~10,較佳為1~4,更佳為1或2的烴基。烴基之例,包含甲基、乙基、丙基、丁基等之烷基。烴基也可進一步具有包含氧原子、氮原子、硫原子或矽原子之連結基(例如,羰基、亞胺基、醚鍵、矽醚鍵、硫醚鍵等)之2價的連結基。The hydrocarbon group is a hydrocarbon group with 1-10 carbon atoms, preferably 1-4, more preferably 1 or 2 carbon atoms. Examples of hydrocarbon groups include alkyl groups such as methyl, ethyl, propyl, and butyl. The hydrocarbon group may further have a divalent linking group including a linking group of an oxygen atom, a nitrogen atom, a sulfur atom or a silicon atom (for example, a carbonyl group, an imino group, an ether bond, a silicon ether bond, a thioether bond, etc.).

極性基之例,包含介於羧基、羥基、烷氧基、烷氧基羰基、烯丙氧基羰基、胺基、醯胺基、及伸甲基等之連結基(-(CH2 )n -,n為1以上之整數),鍵結此等基的基。其中,較佳為烷氧基羰基及芳氧基羰基,更佳為烷氧基羰基。Examples of polar groups include linking groups (-(CH 2 ) n - , n is an integer of 1 or more), the group that bonds these groups. Among them, an alkoxycarbonyl group and an aryloxycarbonyl group are preferable, and an alkoxycarbonyl group is more preferable.

其中,R1 ~R4 之中至少1個,較佳為極性基。包含來自具有極性基之降莰烯系單體之結構單位的環烯烴樹脂,例如以溶液流延法製膜時,容易溶解於溶劑,也容易提高所得薄膜的玻璃轉移溫度。而熔融製膜法中,也可為不含來自具有極性基之降莰烯系單體之結構單位的環烯烴樹脂。Among them, at least one of R 1 to R 4 is preferably a polar group. Cycloolefin resins containing structural units derived from norbornene-based monomers having polar groups are easily dissolved in solvents when film-forming by solution casting, for example, and tend to increase the glass transition temperature of the resulting film. On the other hand, in the melt film-forming method, a cycloolefin resin not containing a structural unit derived from a norbornene-based monomer having a polar group may be used.

又,R1 ~R4 之中,R1 及R2 之兩者(或R3 及R4 之兩者)也可為氫原子。Also, among R 1 to R 4 , both of R 1 and R 2 (or both of R 3 and R 4 ) may be hydrogen atoms.

式(1)之p表示0~2之整數。就提高光學薄膜之耐熱性的觀點,p較佳為1~2。p in formula (1) represents an integer of 0-2. From the viewpoint of improving the heat resistance of the optical film, p is preferably 1-2.

式(1)表示之降莰烯系單體之具體例示於下述。其中,具有極性基之降莰烯系單體之例,包含以下者。Specific examples of the norbornene-based monomer represented by formula (1) are shown below. Among them, examples of the norbornene-based monomer having a polar group include the following.

Figure 02_image003
Figure 02_image003

不具有極性基之降莰烯系單體之例,包含以下者。

Figure 02_image005
Examples of the norbornene-based monomer having no polar group include the following.
Figure 02_image005

來自降莰烯系單體之結構單位之含量,相對於構成環烯烴樹脂之全結構單位,可為50~100莫耳%。The content of structural units derived from norcamphene-based monomers may be 50-100 mol% relative to the total structural units constituting the cycloolefin resin.

環烯烴樹脂,可進一步含有來自可與來自降莰烯系單體之結構單位共聚合之其他單體的結構單位。可共聚合之其他單體之例,包含不具有(上述降莰烯系單體為具有極性基的情形)極性基的降莰烯系單體,或不具有環丁烯、環戊烯、環庚烯、環辛烯、二環戊二烯等之降莰烯骨架的環烯烴系單體等。The cycloolefin resin may further contain structural units derived from other monomers that are copolymerizable with structural units derived from norbornene-based monomers. Examples of other monomers that can be copolymerized include norbornene-based monomers that do not have a polar group (in the case of the above-mentioned norbornene-based monomer having a polar group), or do not have cyclobutene, cyclopentene, cyclobutene, or cyclobutene. Cycloolefin-based monomers such as heptene, cyclooctene, and dicyclopentadiene with a norbornene skeleton.

環烯烴樹脂也可使用市售品。市售品之例,包含JSR公司製之ARTON(ARTON:註冊商標)G、ARTON F、ARTON R、及ARTON RX。A commercial item can also be used for cycloolefin resin. Examples of commercially available products include ARTON (ARTON: registered trademark) G, ARTON F, ARTON R, and ARTON RX manufactured by JSR Corporation.

環烯烴樹脂之重量平均分子量Mw,無特別限制,較佳為2萬~30萬,更佳為3萬~25萬,又更佳為4萬~20萬。環烯烴樹脂之重量平均分子量Mw為上述範圍時,不會損及成形加工性,可提高光學薄膜之機械特性。The weight average molecular weight Mw of the cycloolefin resin is not particularly limited, but is preferably 20,000 to 300,000, more preferably 30,000 to 250,000, and more preferably 40,000 to 200,000. When the weight-average molecular weight Mw of the cycloolefin resin is within the above-mentioned range, the mechanical properties of the optical film can be improved without impairing moldability.

環烯烴樹脂之重量平均分子量Mw,可藉由凝膠滲透層析儀(GPC)測定。 具體而言,測定裝置使用凝膠滲透層析法(東曹公司製 HLC8220GPC)、管柱係使用東曹公司製 TSK-GEL G6000HXL-G5000HXL-G5000HXL-G4000HXL-G3000HXL串聯。 然後,將試料20±0.5mg溶解於四氫呋喃10ml,以0.45mm之過濾器進行過濾。將此溶液100ml注入上述管柱(溫度40℃)中,以檢測器RI、溫度40℃測定,苯乙烯換算求重量平均分子量。The weight average molecular weight Mw of cycloolefin resin can be measured by gel permeation chromatography (GPC). Specifically, the measurement device used gel permeation chromatography (HLC8220GPC manufactured by Tosoh Corporation), and the column system used TSK-GEL G6000HXL-G5000HXL-G5000HXL-G4000HXL-G3000HXL manufactured by Tosoh Corporation in series. Then, 20±0.5 mg of the sample was dissolved in 10 ml of tetrahydrofuran, and filtered with a 0.45 mm filter. 100 ml of this solution was poured into the above-mentioned column (temperature 40° C.), measured with a detector RI at a temperature of 40° C., and the weight average molecular weight was calculated in terms of styrene.

環烯烴樹脂之玻璃轉移溫度Tg,通常為110℃以上,較佳為110~350℃,更佳為120~250℃。環烯烴樹脂之Tg為110℃以上時,即使高溫條件下也不容易變形。Tg為350℃以下時,不易損及成形加工性,更能抑制成形加工時之環烯烴樹脂之熱劣解(heat deterioration)。The glass transition temperature Tg of cycloolefin resin is usually above 110°C, preferably 110~350°C, more preferably 120~250°C. When the Tg of cycloolefin resin is 110°C or higher, it is not easy to deform even under high temperature conditions. When the Tg is 350°C or lower, the molding processability is less likely to be damaged, and the heat degradation of the cycloolefin resin during molding processing can be suppressed.

玻璃轉移溫度可使用DSC(Differential Scanning Colorimetry:示差掃描熱量法),依據JIS K 7121-2012的方法測定。The glass transition temperature can be measured using DSC (Differential Scanning Colorimetry: Differential Scanning Calorimetry) in accordance with the method of JIS K 7121-2012.

環烯烴樹脂之含量,無特別限制,相對於光學薄膜,較佳為50質量%以上,更佳為70~99質量%。The content of the cycloolefin resin is not particularly limited, but it is preferably at least 50% by mass, more preferably 70-99% by mass, relative to the optical film.

1-1-2.光吸收材料 光吸收材料可為波長9.0~11.0μm之光之吸光係數為4.0×10-3 /μm以上的光吸收材料。這種光吸收材料通常為具有羰基的化合物,較佳為酯化合物、或(甲基)丙烯酸聚合物粒子。1-1-2. Light-absorbing material The light-absorbing material may be a light-absorbing material having an absorption coefficient of 4.0×10 -3 /μm or more for light having a wavelength of 9.0 to 11.0 μm. The light-absorbing material is generally a compound having a carbonyl group, preferably an ester compound, or (meth)acrylic polymer particles.

<酯化合物> 酯化合物可為醣酯化合物、聚縮合酯化合物、多元醇酯化合物之任一者。<Ester compound> The ester compound may be any of a sugar ester compound, a polycondensation ester compound, and a polyol ester compound.

(醣酯化合物) 醣酯化合物為單糖、二糖或三糖之OH基之全部或一部分進行酯化的化合物。這種醣酯化合物,較佳為下述式(FA)表示之化合物。

Figure 02_image007
(Sugar ester compound) The sugar ester compound is a compound obtained by esterifying all or part of OH groups of monosaccharides, disaccharides, or trisaccharides. Such a sugar ester compound is preferably a compound represented by the following formula (FA).
Figure 02_image007

式(FA)之R1 ~R8 表示取代或無取代之烷基羰基、或取代或無取代之芳基羰基。R1 ~R8 ,可彼此相同或相異。R 1 to R 8 in formula (FA) represent substituted or unsubstituted alkylcarbonyl, or substituted or unsubstituted arylcarbonyl. R 1 to R 8 may be the same or different from each other.

取代或無取代之烷基羰基,較佳為碳原子數2以上之取代或無取代之烷基羰基。取代或無取代之烷基羰基之例,包含甲基羰基(乙醯基)、乙基羰基等。烷基所具有之取代基之例,包含苯基等之芳基。The substituted or unsubstituted alkylcarbonyl group is preferably a substituted or unsubstituted alkylcarbonyl group having 2 or more carbon atoms. Examples of substituted or unsubstituted alkylcarbonyl include methylcarbonyl (acetyl), ethylcarbonyl and the like. Examples of the substituent that the alkyl group has include aryl groups such as phenyl groups.

取代或無取代之芳基羰基,較佳為碳原子數7以上之取代或無取代之芳基羰基。芳基羰基之例,包含苯基羰基。芳基所具有之取代基之例,包含甲基等之烷基。The substituted or unsubstituted arylcarbonyl group is preferably a substituted or unsubstituted arylcarbonyl group having 7 or more carbon atoms. Examples of arylcarbonyl include phenylcarbonyl. Examples of the substituent that the aryl group has include alkyl groups such as methyl groups.

式(FA)之R1 ~R8 之例,包含以下者。

Figure 02_image009
Examples of R 1 to R 8 in formula (FA) include the following.
Figure 02_image009

醣酯化合物之平均取代度,較佳為3~6。醣酯化合物之平均取代度表示成為原料之糖之OH基之總數之中,被酯化的平均比例。The average degree of substitution of the sugar ester compound is preferably 3-6. The average degree of substitution of sugar ester compounds represents the average ratio of esterification among the total number of OH groups of sugars used as raw materials.

(多元醇酯化合物) 多元醇酯為2價以上之脂肪族多元醇(較佳為2~20價之脂肪族多元醇)與單羧酸之酯化物。(polyol ester compound) The polyol ester is an esterification product of an aliphatic polyol with a valence of 2 or more (preferably an aliphatic polyol with a valence of 2-20) and a monocarboxylic acid.

多元醇之例,包含核糖醇(Adonitol)、阿糖醇、乙二醇、二乙二醇、三乙二醇、四乙二醇、1,2-丙二醇、1,3-丙二醇、二丙二醇、三丙二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、二丁二醇、1,2,4-丁烷三醇、1,5-戊二醇、1,6-己二醇、己烷三醇、半乳糖醇(Galactitol)、鄰苯三酚、3-甲基戊烷-1,3,5-三醇、頻哪醇、山梨醣醇、三羥甲基丙烷、三羥甲基乙烷、木糖醇等,較佳為三乙二醇、四乙二醇、二丙二醇、三丙二醇、山梨醣醇、三羥甲基丙烷、木糖醇。Examples of polyols include Adonitol, arabitol, ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, 1,2-propylene glycol, 1,3-propylene glycol, dipropylene glycol, Tripropylene glycol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, dibutylene glycol, 1,2,4-butanetriol, 1,5-pentanediol , 1,6-hexanediol, hexanetriol, galactitol (Galactitol), pyrogallol, 3-methylpentane-1,3,5-triol, pinacol, sorbitol, Trimethylolpropane, trimethylolethane, xylitol, etc., preferably triethylene glycol, tetraethylene glycol, dipropylene glycol, tripropylene glycol, sorbitol, trimethylolpropane, xylitol .

單羧酸,無特別限制,也可為乙酸、丙酸等之脂肪族單羧酸、環戊烷羧酸、環己烷羧酸等之脂環族單羧酸、苯甲酸、甲苯酸等之芳香族單羧酸之任一者。The monocarboxylic acid is not particularly limited, and may be aliphatic monocarboxylic acids such as acetic acid and propionic acid, alicyclic monocarboxylic acids such as cyclopentanecarboxylic acid and cyclohexanecarboxylic acid, benzoic acid, toluic acid, etc. Any of aromatic monocarboxylic acids.

多元醇酯化合物所使用之羧酸,可為1種類,也可為2種以上之混合。又,多元醇中之OH基,也可全部酯化,也可為一部分以OH基殘留。The carboxylic acid used for the polyol ester compound may be one type or a mixture of two or more types. In addition, all the OH groups in the polyol may be esterified, or part of them may remain as OH groups.

醣酯化合物及多元醇酯化合物之分子量,雖因光學薄膜之製造方法而異,但是就容易得到與環烯烴樹脂之良好相溶性的觀點,適度低為佳。具體而言,醣酯化合物或酯化合物之分子量,例如300~1500,較佳為600~1200。Although the molecular weights of the sugar ester compound and the polyol ester compound vary depending on the production method of the optical film, they are preferably moderately low from the viewpoint of easily obtaining good compatibility with the cycloolefin resin. Specifically, the molecular weight of the sugar ester compound or the ester compound is, for example, 300-1500, preferably 600-1200.

(聚縮合酯化合物) 聚縮合酯化合物係包含使二羧酸與二醇反應所得之結構單位的聚縮合體(聚合物)。(Polycondensed ester compound) The polycondensation ester compound is a polycondensate (polymer) including a structural unit obtained by reacting a dicarboxylic acid and a diol.

二羧酸可為芳香族二羧酸、脂肪族二羧酸、脂環式二羧酸之任一者,較佳為芳香族二羧酸。二羧酸可為1種類,也可為2種以上之混合物。較佳為混合芳香族二羧酸與脂肪族二羧酸。The dicarboxylic acid may be any one of aromatic dicarboxylic acid, aliphatic dicarboxylic acid, and alicyclic dicarboxylic acid, preferably aromatic dicarboxylic acid. One type of dicarboxylic acid may be used, or a mixture of two or more types may be used. Preferably, an aromatic dicarboxylic acid and an aliphatic dicarboxylic acid are mixed.

二醇可為芳香族二醇、脂肪族二醇、脂環式二醇之任一者,較佳為脂肪族二醇,更佳為碳數1~4之二醇。二醇可為1種類,也可為2種以上之混合物。The diol may be any one of aromatic diol, aliphatic diol, and alicyclic diol, preferably aliphatic diol, more preferably a diol with 1 to 4 carbon atoms. One type of diol may be used, or a mixture of two or more types may be used.

亦即,聚縮合酯化合物,較佳為含有使包含芳香族二羧酸之二羧酸與碳數1~8之二醇反應所得的結構單位,更佳為含有使包含芳香族二羧酸與脂肪族二羧酸的二羧酸與碳數1~8之二醇反應所得的結構單位。聚縮合酯之分子的兩末端可封端(end capping)或未被封端。That is, the polycondensation ester compound preferably contains a structural unit obtained by reacting a dicarboxylic acid containing an aromatic dicarboxylic acid with a diol having 1 to 8 carbon atoms, and more preferably contains a compound containing an aromatic dicarboxylic acid and a diol having a carbon number of 1 to 8. The structural unit obtained by reacting dicarboxylic acid of aliphatic dicarboxylic acid with diol with 1 to 8 carbon atoms. Both ends of the molecule of the polycondensed ester may be end capped or uncapped.

此等酯化合物之中,就分子量適度低,與環烯烴樹脂之相溶性優異的觀點,特佳為醣酯化合物。Among these ester compounds, sugar ester compounds are particularly preferred from the viewpoint of moderately low molecular weight and excellent compatibility with cycloolefin resins.

<(甲基)丙烯酸聚合物粒子> (甲基)丙烯酸聚合物粒子係包含來自(甲基)丙烯酸酯類之結構單位之聚合物的粒子,較佳為包含來自甲基丙烯酸甲酯之結構單位之聚合物的粒子。<(Meth)acrylic polymer particles> The (meth)acrylic polymer particle is a particle containing a polymer of a structural unit derived from (meth)acrylate, preferably a particle containing a polymer of a structural unit derived from methyl methacrylate.

包含來自甲基丙烯酸甲酯之結構單位的聚合物,可再進一步包含其他共聚單體的結構單位。其他之共聚單體之例,包含甲基丙烯酸甲酯以外之碳原子數1~18之烷基(甲基)丙烯酸酯;(甲基)丙烯酸等之α,β-不飽和酸;馬來酸、富馬酸、依康酸等之不飽和二羧酸;苯乙烯、α-甲基苯乙烯等之苯乙烯類;(聚)乙二醇二(甲基)丙烯酸酯、丁二醇二(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯等之具有2個以上之(甲基)丙烯醯基之多官能(甲基)丙烯酸酯類;烯丙基(甲基)丙烯酸酯、烯丙基烷基(甲基)丙烯酸酯等之烯丙基烷基(甲基)丙烯酸酯類等的多官能單體類等。A polymer comprising structural units derived from methyl methacrylate may further comprise structural units of other comonomers. Examples of other comonomers include alkyl (meth)acrylates with 1 to 18 carbon atoms other than methyl methacrylate; α, β-unsaturated acids such as (meth)acrylic acid; maleic acid , fumaric acid, itaconic acid and other unsaturated dicarboxylic acids; styrene, α-methylstyrene and other styrenes; (poly)ethylene glycol di(meth)acrylate, butylene glycol di( Meth)acrylate, ethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, etc., having two or more (methyl) ) polyfunctional (meth)acrylates of acryl; allyl (meth)acrylates of allyl (meth)acrylate, allyl alkyl (meth)acrylate, etc. and other multifunctional monomers, etc.

其中,上述聚合物,較佳為交聯聚合物,亦即,包含來自甲基丙烯酸甲酯之結構單位與來自多官能單體之結構單位的共聚物;更佳為包含來自甲基丙烯酸甲酯之結構單位,來自苯乙烯類之結構單位及來自多官能單體類之結構單位的共聚物。Among them, the above-mentioned polymer is preferably a cross-linked polymer, that is, a copolymer comprising structural units derived from methyl methacrylate and structural units derived from multifunctional monomers; more preferably comprising The structural unit of styrene is a copolymer of structural units from styrene and structural units from multifunctional monomers.

就提高基材層11之雷射光之吸收率的觀點,較佳為來自包含羰基之(甲基)丙烯酸酯類之結構單位之含量為一定以上。就這種觀點,來自甲基丙烯酸甲酯之結構單位之合計,相對於構成聚合物之全結構單位,較佳為30莫耳%以上,更佳為50~80莫耳%。From the viewpoint of increasing the absorptivity of laser light of the base material layer 11, the content of the structural unit derived from (meth)acrylates containing a carbonyl group is preferably a certain amount or more. From this point of view, the total of the structural units derived from methyl methacrylate is preferably 30 mol% or more, more preferably 50 to 80 mol%, based on the total structural units constituting the polymer.

來自多官能性單體之結構單位之含量,相對於構成聚合物之全結構單位,較佳為3~50莫耳%,更佳為10~35莫耳%。The content of structural units derived from polyfunctional monomers is preferably 3-50 mol%, more preferably 10-35 mol%, relative to the total structural units constituting the polymer.

(甲基)丙烯酸聚合物粒子,較佳為與環烯烴樹脂之折射率差為0.01以下的聚合物。這種(甲基)丙烯酸聚合物粒子,不易使所得之光學薄膜之透明性降低。The (meth)acrylic polymer particles are preferably polymers having a refractive index difference with the cycloolefin resin of 0.01 or less. Such (meth)acrylic polymer particles are less likely to lower the transparency of the resulting optical film.

環烯烴樹脂與(甲基)丙烯酸聚合物粒子之折射率,各自可為波長550nm之光的折射率。波長550nm之光的折射率,例如製作以單獨含有各成分之樣品薄膜,藉由使用堀場製分光橢圓測厚儀UVSEL測定,可求得該樣品薄膜之波長550nm之光的折射率。The refractive index of the cycloolefin resin and the (meth)acrylic polymer particle may be the refractive index of light with a wavelength of 550 nm. For the refractive index of light with a wavelength of 550nm, for example, a sample film containing each component alone is made, and the refractive index of the sample film with a wavelength of 550nm can be obtained by measuring it with a spectroscopic ellipsometer UVSEL manufactured by Horiba.

(甲基)丙烯酸聚合物粒子之Tg,較佳為80℃以上。(甲基)丙烯酸聚合物粒子之Tg係與上述同樣,可依據JIS K 7121-2012或ASTM D 3418-82測定。The Tg of the (meth)acrylic polymer particles is preferably 80°C or higher. Tg of (meth)acrylic polymer particles can be measured in accordance with JIS K 7121-2012 or ASTM D 3418-82 in the same manner as above.

(甲基)丙烯酸聚合物粒子之平均粒徑,無特別限制,例如較佳為50~500nm。平均粒徑為上述範圍內時,可提高雷射光之吸收率,在薄膜之表面可形成適度地大小的凹凸,故可賦予滑性。(甲基)丙烯酸聚合物粒子之平均粒徑,就上述觀點,更佳為0.07~0.28μm。The average particle diameter of the (meth)acrylic polymer particles is not particularly limited, for example, it is preferably 50-500 nm. When the average particle diameter is within the above-mentioned range, the absorption rate of laser light can be increased, and moderately sized unevenness can be formed on the surface of the film, so slipperiness can be imparted. The average particle diameter of the (meth)acrylic polymer particles is more preferably 0.07 to 0.28 μm from the above viewpoint.

(甲基)丙烯酸聚合物粒子之平均粒徑,可依以下步驟測定。The average particle diameter of (meth)acrylic polymer particles can be measured according to the following procedure.

光學薄膜中之(甲基)丙烯酸聚合物粒子之平均粒徑,可依以下方法測定。首先,將光學薄膜切斷,以TEM觀察所得的切斷面。然後,對於任意粒子100個之粒子,測定粒徑。粒徑係與前述同樣,藉由TEM攝影所得之粒子100個之相當圓之直徑進行測定。然後,所得之粒徑之平均值作為「平均粒徑」。又,TEM圖像中,明度為視野之平均明度×150%以上的部分,判斷為粒子。The average particle diameter of (meth)acrylic polymer particles in the optical film can be measured by the following method. First, the optical film is cut, and the obtained cut surface is observed with TEM. Then, the particle size was measured for 100 particles of arbitrary particles. The particle size is measured by the diameter of 100 particles equivalent to a circle obtained by TEM photography in the same manner as above. Then, the average value of the obtained particle diameters was taken as "average particle diameter". In addition, in the TEM image, a portion whose lightness is equal to or greater than the average lightness of the visual field×150% was judged to be a particle.

基材層11中之光吸收材料之含量,可設定為光學薄膜10之Ms/Mc,特別是As/Ac滿足上述範圍,且光學薄膜10全體之吸光係數A滿足上述範圍。The content of the light-absorbing material in the substrate layer 11 can be set so that Ms/Mc, especially As/Ac of the optical film 10 satisfies the above-mentioned range, and the light absorption coefficient A of the optical film 10 as a whole satisfies the above-mentioned range.

亦即,基材層11中之光吸收材料之含量Mc’,較佳為比表層12(或13)中之光吸收材料的含量Ms’少。具體而言,基材層11中之光吸收材料之含量Mc’,相對於基材層11,較佳為0.1~4.5質量%,更佳為0.3~3.5質量%。基材層11中之光吸收材料之含量Mc’為上述範圍時,將光學薄膜10全體之吸光係數A調整為上述範圍,且Ms/Mc(或Ms’/Mc’),特別是As/Ac容易調整為上述範圍。因此,提高藉由光學薄膜10之雷射光的切斷性,在基材層11與表層12(或13)之間,可減少雷射光之發熱量之差,故容易抑制顯示裝置中之漏光。That is, the content Mc' of the light-absorbing material in the substrate layer 11 is preferably less than the content Ms' of the light-absorbing material in the surface layer 12 (or 13). Specifically, the content Mc' of the light-absorbing material in the base layer 11 is preferably 0.1 to 4.5% by mass, more preferably 0.3 to 3.5% by mass relative to the base layer 11. When the content Mc' of the light-absorbing material in the substrate layer 11 is within the above-mentioned range, the light absorption coefficient A of the entire optical film 10 is adjusted to the above-mentioned range, and Ms/Mc (or Ms'/Mc'), especially As/Ac Easy to adjust to the above range. Therefore, by improving the cut-off property of laser light by the optical film 10, the difference in the calorific value of laser light between the base layer 11 and the surface layer 12 (or 13) can be reduced, so it is easy to suppress light leakage in the display device.

1-1-3.其他的成分 基材層11,必要時可再含有無機微粒子等之其他的成分。1-1-3. Other ingredients The base material layer 11 may further contain other components such as inorganic fine particles as necessary.

無機微粒子具有提高光學薄膜之滑性的機能。構成無機微粒子之無機材料之例,包含二氧化矽(SiO2 )、二氧化鈦、氧化鋁、氧化鋯等之氧化物。其中,就可減少薄膜之霧度增大的觀點等,較佳為二氧化矽。Inorganic fine particles have the function of improving the slipperiness of optical films. Examples of inorganic materials constituting the inorganic fine particles include oxides such as silicon dioxide (SiO 2 ), titanium dioxide, aluminum oxide, and zirconium oxide. Among them, silicon dioxide is preferable from the viewpoint of reducing the increase in haze of the film.

二氧化矽粒子之市售品之例,包含AEROSIL R812、R972(日本AEROSIL公司製)、NanoTek SiO2 (C.I.Kasei公司製)等。Examples of commercially available silica particles include AEROSIL R812, R972 (manufactured by Aerosil Japan), NanoTek SiO2 (manufactured by C.I. Kasei), and the like.

無機微粒子之平均一次粒徑,較佳為5~50nm。無機微粒子之平均一次粒徑為5nm以上時,可將薄膜之表面進行粗面化,故容易賦予滑性,50nm以下時,容易抑制霧度之增大。無機微粒子之平均一次粒徑,較佳為5~30nm。光學薄膜10中之無機微粒子之平均一次粒徑,可與上述同樣的方法測定。The average primary particle size of the inorganic fine particles is preferably 5-50 nm. When the average primary particle diameter of the inorganic fine particles is 5 nm or more, the surface of the film can be roughened, so it is easy to impart slipperiness, and when it is 50 nm or less, it is easy to suppress the increase of haze. The average primary particle size of the inorganic fine particles is preferably 5-30 nm. The average primary particle diameter of the inorganic fine particles in the optical film 10 can be measured by the same method as above.

無機微粒子之含量,無特別限制,相對於光學薄膜,為0~5質量%,較佳為0~2質量%。The content of the inorganic fine particles is not particularly limited, but it is 0-5% by mass, preferably 0-2% by mass relative to the optical film.

1-1-4.物性 基材層11之厚度係設定為As/Ac及光學薄膜全體之吸光係數為上述範圍即可,無特別限制,例如較佳為30~60μm,更佳為35~55μm。1-1-4. Physical properties The thickness of the substrate layer 11 is set so that As/Ac and the light absorption coefficient of the optical film as a whole are within the above-mentioned range, and there is no special limitation, for example, it is preferably 30-60 μm, more preferably 35-55 μm.

1-2.表層12及13 表層12係包含於由光學薄膜10之一面10a至厚度之30%為止之表層區域Sa;表層13係包含於由光學薄膜10之另一面10b至厚度之30%為止的表層區域Sb(參照圖1及2A)。表層12及13係各自以包含熱塑性樹脂與光吸收材料的熱塑性樹脂組成物所構成(態樣1),也可以包含具有光吸收性之硬化性化合物(作為光吸收材料之硬化性化合物)與硬化劑之硬化性組成物之硬化物所構成(態樣2)。1-2. Surface layers 12 and 13 The surface layer 12 is included in the surface area Sa from one side 10a of the optical film 10 to 30% of the thickness; the surface layer 13 is included in the surface area Sb from the other side 10b of the optical film 10 to 30% of the thickness (see FIG. and 2A). The surface layers 12 and 13 are each composed of a thermoplastic resin composition including a thermoplastic resin and a light-absorbing material (aspect 1), and may also include a hardening compound having light-absorbing properties (hardening compound as a light-absorbing material) and a hardening compound. It is composed of the cured product of the curable composition of the agent (state 2).

<關於態樣1> 表層12及13係各自以包含熱塑性樹脂與光吸收材料的樹脂組成物所構成。又,熱塑性樹脂也可兼作光吸收材料。<About Form 1> The surface layers 12 and 13 are each made of a resin composition including a thermoplastic resin and a light-absorbing material. In addition, a thermoplastic resin may also serve as a light-absorbing material.

(熱塑性樹脂) 熱塑性樹脂組成物所含有之熱塑性樹脂,只要是具有光線穿透性者,即無特別限制,可為環烯烴樹脂或(甲基)丙烯酸樹脂等。(thermoplastic resin) The thermoplastic resin contained in the thermoplastic resin composition is not particularly limited as long as it has light-transmitting properties, and may be cycloolefin resin, (meth)acrylic resin, or the like.

表層12(或13)所含有之環烯烴樹脂,可使用與基材層11所含有之環烯烴樹脂同樣者。The cycloolefin resin contained in the surface layer 12 (or 13 ) may be the same as the cycloolefin resin contained in the base material layer 11 .

表層12(或13)所含有之(甲基)丙烯酸樹脂,不僅作為熱塑性樹脂,也可作為光吸收材料產生功能。The (meth)acrylic resin contained in the surface layer 12 (or 13) functions not only as a thermoplastic resin but also as a light absorbing material.

(甲基)丙烯酸樹脂,較佳為包含來自甲基丙烯酸甲酯之結構單位的聚合物。該聚合物也可再包含來自可與甲基丙烯酸甲酯共聚合之單體的結構單位。可與甲基丙烯酸甲酯共聚合之其他單體之例,包含2-乙基己基甲基丙烯酸酯等之甲基丙烯酸甲酯以外之碳原子數1~18之烷基(甲基)丙烯酸酯;(甲基)丙烯酸等之α,β-不飽和酸;馬來酸、富馬酸、依康酸等之不飽和二羧酸;苯乙烯、α-甲基苯乙烯等之苯乙烯類;馬來酸酐;馬來醯亞胺、N-苯基馬來醯亞胺等之馬來醯亞胺類;戊二酸酐等。The (meth)acrylic resin is preferably a polymer comprising structural units derived from methyl methacrylate. The polymer may further comprise structural units from monomers copolymerizable with methyl methacrylate. Examples of other monomers that can be copolymerized with methyl methacrylate include alkyl (meth)acrylates with 1 to 18 carbon atoms other than methyl methacrylate such as 2-ethylhexyl methacrylate ; α, β-unsaturated acids such as (meth)acrylic acid; unsaturated dicarboxylic acids such as maleic acid, fumaric acid, and itaconic acid; styrenes such as styrene and α-methylstyrene; Maleic anhydride; maleimides such as maleimide and N-phenylmaleimide; glutaric anhydride, etc.

相對於構成上述共聚物之全結構單位,來自甲基丙烯酸甲酯之結構單位之含有比例,較佳為50質量%以上,更佳為70質量%以上。又,(甲基)丙烯酸樹脂之重量平均分子量,又更佳為4萬~50萬。The content ratio of the structural unit derived from methyl methacrylate is preferably at least 50% by mass, more preferably at least 70% by mass, relative to all structural units constituting the copolymer. Also, the weight average molecular weight of the (meth)acrylic resin is more preferably 40,000 to 500,000.

其中,與基材層11之層間密著性佳,就不易損及透明性的觀點,表層12(或13)所含有之熱塑性樹脂,較佳為環烯烴樹脂。Among them, the interlayer adhesion with the substrate layer 11 is good, and the thermoplastic resin contained in the surface layer 12 (or 13) is preferably a cycloolefin resin from the viewpoint of not being easily damaged and transparent.

表層12(或13)所含有之環烯烴樹脂之組成,也可為與基材層11所含有之環烯烴樹脂的組成相同或不同。就提高層間密著性或生產效率的觀點,較佳為表層12(或13)所含有之環烯烴樹脂之組成與基材層11所含有之環烯烴樹脂之組成相同。The composition of the cycloolefin resin contained in the surface layer 12 (or 13 ) may be the same as or different from the composition of the cycloolefin resin contained in the base layer 11 . From the standpoint of improving interlayer adhesion or production efficiency, it is preferable that the composition of the cycloolefin resin contained in the surface layer 12 (or 13 ) is the same as the composition of the cycloolefin resin contained in the base layer 11 .

(光吸收材料) 表層12(或13)所含有之光吸收材料,可使用與基材層11所含有之光吸收材料同樣者。(light absorbing material) As the light-absorbing material contained in the surface layer 12 (or 13), the same light-absorbing material as that contained in the substrate layer 11 can be used.

表層12(或13)所含有之光吸收材料之種類,可與基材層11所含有之光吸收材料之種類相同或不同。就提高製造效率的觀點,較佳為表層12(或13)所含有之光吸收材料之種類與基材層11所含有之光吸收材料之種類相同。The type of light-absorbing material contained in the surface layer 12 (or 13 ) may be the same as or different from the type of light-absorbing material contained in the substrate layer 11 . From the viewpoint of improving manufacturing efficiency, it is preferable that the type of light-absorbing material contained in the surface layer 12 (or 13 ) is the same as the type of light-absorbing material contained in the base layer 11 .

表層12(或13)中之光吸收材料之含量,較佳設定為光學薄膜10之Ms/Mc,特別是As/Ac滿足上述範圍,且光學薄膜10全體之吸光係數A滿足上述範圍。The content of the light-absorbing material in the surface layer 12 (or 13) is preferably set so that Ms/Mc, especially As/Ac of the optical film 10 satisfies the above range, and the light absorption coefficient A of the entire optical film 10 satisfies the above range.

亦即,表層12(或13)中之光吸收材料之含量Ms’,較佳為比基材層11中之光吸收材料之含量Mc’多。具體而言,雖因表層12(或13)中之光吸收材料之含量Ms’而異,但是Ms’/Mc’,較佳為2.5~50,更佳為7~15。例如,表層12(或13)中之光吸收材料之含量Ms’,相對於表層12(或13),較佳為1~30質量%,更佳為3~10質量%。表層12(或13)中之光吸收材料之含量Ms’為上述範圍時,光學薄膜10全體之吸光係數A調整為上述範圍,且Ms/Mc(Ms’/Mc’),特別是As/Ac容易調整成為上述範圍。藉此,提高光學薄膜10藉由雷射光之切斷性,且在基材層11與表層12(或13)之間,可減少雷射光之發熱量之差,故容易抑制顯示裝置中之漏光。亦即,就抑制顯示裝置中之漏光的觀點,較佳為Ms’/Mc’不會過大,且Ms’不會過多。That is, the content Ms' of the light-absorbing material in the surface layer 12 (or 13) is preferably greater than the content Mc' of the light-absorbing material in the base layer 11. Specifically, although the content Ms' of the light-absorbing material in the surface layer 12 (or 13) varies, Ms'/Mc' is preferably 2.5-50, more preferably 7-15. For example, the content Ms' of the light-absorbing material in the surface layer 12 (or 13) is preferably 1-30% by mass, more preferably 3-10% by mass relative to the surface layer 12 (or 13). When the content Ms' of the light-absorbing material in the surface layer 12 (or 13) is in the above range, the light absorption coefficient A of the optical film 10 as a whole is adjusted to the above range, and Ms/Mc (Ms'/Mc'), especially As/Ac It is easy to adjust to the above-mentioned range. Thereby, the cutting property of the optical film 10 by laser light is improved, and the difference in the calorific value of laser light can be reduced between the base layer 11 and the surface layer 12 (or 13), so it is easy to suppress light leakage in the display device . That is, from the viewpoint of suppressing light leakage in the display device, Ms'/Mc' is preferably not too large, and Ms' is not too large.

(其他的成分) 表層12(或13)係與基材層11同樣,也可再包含無機微粒子等之其他的成分。(other ingredients) The surface layer 12 (or 13 ) is the same as the base material layer 11, and may further contain other components such as inorganic fine particles.

<關於態樣2> 表層12(或13)可以包含具有光吸收性之硬化性化合物與硬化劑之硬化性組成物的硬化物所構成。<About Form 2> The surface layer 12 (or 13) may be composed of a hardened composition of a light-absorbing hardening compound and a hardening agent.

硬化性組成物所含有之光吸收性的硬化性化合物,較佳為具有與硬化劑反應之基的胺基甲酸酯化合物。The light-absorbing curable compound contained in the curable composition is preferably a urethane compound having a group reactive with a curing agent.

(胺基甲酸酯化合物) 具有與硬化劑反應之官能基的胺基甲酸酯化合物係由多元醇與聚異氰酸酯反應而得。胺基甲酸酯化合物可為單體,也可為預聚物。這種胺基甲酸酯化合物,例如使多元醇與聚異氰酸酯反應後,作為與硬化劑反應之基,具有未反應殘留之官能基(羥基或丙烯酸酯基、羧基、丙烯醯胺基等)。(urethane compound) Urethane compounds having functional groups reactive with hardeners are obtained by reacting polyols with polyisocyanates. The urethane compound may be a monomer or a prepolymer. Such a urethane compound has, for example, a functional group (hydroxyl group, acrylate group, carboxyl group, acrylamide group, etc.) that remains unreacted as a group that reacts with a curing agent after polyol and polyisocyanate are reacted.

多元醇之例,包含多元醇化合物(例如,乙二醇、丙二醇、1,4-丁二醇、新戊二醇、丙三醇、三羥甲基丙烷等)與多元酸(例如,己二酸、琥珀酸、癸二酸、戊二酸、馬來酸、富馬酸、苯二甲酸、間苯二甲酸、對苯二甲酸等之多元羧酸之二羧酸或偏苯三甲酸等之包含三羧酸的多元羧酸或其酸酐等)之反應所得的聚酯多元醇;聚醚多元醇(例如聚(氧丙烯醚)多元醇、聚(氧乙烯-丙烯醚)多元醇);聚碳酸酯多元醇等。其中,較佳為聚碳酸酯聚胺基甲酸酯。Examples of polyols include polyol compounds (for example, ethylene glycol, propylene glycol, 1,4-butanediol, neopentyl glycol, glycerol, trimethylolpropane, etc.) dicarboxylic acid, succinic acid, sebacic acid, glutaric acid, maleic acid, fumaric acid, phthalic acid, isophthalic acid, terephthalic acid, etc. Polyester polyols obtained by the reaction of polycarboxylic acids containing tricarboxylic acids or their anhydrides, etc.); polyether polyols (such as poly(oxypropylene ether) polyols, poly(oxyethylene-propylene ether) polyols); polyols Carbonate polyols, etc. Among them, polycarbonate polyurethane is preferred.

硬化劑係分子內具有2個以上與胺基甲酸酯化合物所含有之(未反應之)官能基反應之官能基的化合物。例如,包含(作為與硬化劑反應之基)羥基之胺基甲酸酯化合物之硬化劑之例,包含環氧化合物、異氰酸酯化合物、三級胺化合物、碳二亞胺化合物;具有(作為與硬化劑反應之基)丙烯醯胺基之胺基甲酸酯化合物之硬化劑之例,包含二羧酸等之活性氫化合物。The curing agent is a compound having two or more functional groups that react with (unreacted) functional groups contained in the urethane compound in the molecule. For example, examples of hardeners of urethane compounds containing (as a group reactive with hardeners) hydroxyl groups include epoxy compounds, isocyanate compounds, tertiary amine compounds, and carbodiimide compounds; Examples of hardening agents of acrylamide-based urethane compounds include active hydrogen compounds such as dicarboxylic acids.

又,具有(作為與硬化劑反應之基)丙烯酸酯基之胺基甲酸酯化合物(胺基甲酸酯丙烯酸酯)係使具有丙烯酸酯基之多元醇與聚異氰酸酯反應者或,使多元醇與聚異氰酸酯反應後,所得之胺基甲酸酯化合物之未反應之異氰酸酯基以(甲基)丙烯酸進行酯化所得者。In addition, the urethane compound (urethane acrylate) having an acrylate group (as a group that reacts with a hardener) is one in which a polyol having an acrylate group is reacted with a polyisocyanate, or a polyol After reacting with polyisocyanate, the unreacted isocyanate group of the resulting urethane compound is esterified with (meth)acrylic acid.

胺基甲酸酯丙烯酸酯也可再與其他的(甲基)丙烯酸酯化合物併用。其他的(甲基)丙烯酸酯化合物之例,包含異三聚氰酸二丙烯酸酯類、異三聚氰酸三丙烯酸酯類等之異三聚氰酸丙烯酸酯類。Urethane acrylate can also be used together with another (meth)acrylate compound. Examples of other (meth)acrylate compounds include isocyanurate acrylates such as isocyanurate diacrylates and isocyanurate triacrylates.

胺基甲酸酯丙烯酸酯之硬化劑可為自由基硬化劑。自由基硬化劑之例,包含α-羥基烷基苯酮等之分子內開裂型之起始劑。The hardener for urethane acrylate may be a free radical hardener. Examples of radical curing agents include intramolecular cleavage initiators such as α-hydroxyalkylphenones.

(其他的成分) 硬化性組成物,必要時,可再包含硬化促進劑、硬化助劑、微粒子等之其他的成分。(other ingredients) The curable composition may further contain other components such as a curing accelerator, a curing aid, and fine particles, if necessary.

例如,作為硬化劑使用環氧化合物時,硬化促進劑可使用三級胺化合物或三氟化硼錯化合物。微粒子之例,包含二氧化矽粒子等之無機微粒子。For example, when an epoxy compound is used as a curing agent, a tertiary amine compound or a boron trifluoride zirconium compound can be used as a curing accelerator. Examples of fine particles include inorganic fine particles such as silica particles.

<態樣1及2之共通事項> 表層12(或13)如上述,可以包含熱塑性樹脂與光吸收材料的熱塑性樹脂組成物所構成(態樣1),可以包含具有光吸收性之硬化性化合物與硬化劑之硬化性組成物之硬化物所構成(態樣2)。其中,就與基材層11之層間密著性佳,不易剝離的觀點,表層12(或13),較佳為態樣1,亦即,以包含熱塑性樹脂與光吸收材料的熱塑性樹脂組成物所構成者;(與基材層11同樣),更佳為以包含環烯烴樹脂與光吸收材料的熱塑性樹脂組成物所構成。<Common Items of Forms 1 and 2> The surface layer 12 (or 13) can be composed of a thermoplastic resin composition including a thermoplastic resin and a light-absorbing material as described above (aspect 1), and can be hardened by a hardening composition of a hardening compound and a hardener having light-absorbing properties. constituted by things (state 2). Among them, in terms of good interlayer adhesion with the substrate layer 11 and not easy to peel off, the surface layer 12 (or 13) is preferably Aspect 1, that is, a thermoplastic resin composition comprising a thermoplastic resin and a light-absorbing material What constitutes; (the same as the base material layer 11 ), is more preferably composed of a thermoplastic resin composition including a cycloolefin resin and a light-absorbing material.

1-1-4.物性 表層12(或13)之厚度,只要設定為As/Ac及光學薄膜全體之吸光係數A成為上述範圍即可,無特別限制,相對於基材層11與表層12(或13)之合計厚度,較佳為0.3~30%,更佳為2~10%。具體而言,基材層11與表層12(或表層13)之合計厚度,較佳為20~100μm,更佳為35~60μm。又,基材層11之厚度,較佳為15~60μm,更佳為30~50μm。1-1-4. Physical properties The thickness of the surface layer 12 (or 13) is not particularly limited as long as the light absorption coefficient A of As/Ac and the optical film as a whole is within the above-mentioned range. Preferably it is 0.3-30%, more preferably 2-10%. Specifically, the total thickness of the substrate layer 11 and the surface layer 12 (or the surface layer 13 ) is preferably 20-100 μm, more preferably 35-60 μm. Moreover, the thickness of the base material layer 11 is preferably 15-60 μm, more preferably 30-50 μm.

1-3.光學薄膜之物性 (全光線穿透率) 光學薄膜之全光線穿透率,只要具有充分的光線穿透性時,即無特別限制,較佳為80%以,更佳為85%以上,又更佳為88%以上。光學薄膜之全光線穿透率,可依據JIS K7361-1:1997測定。1-3. Physical properties of optical films (total light transmittance) The total light transmittance of the optical film is not particularly limited as long as it has sufficient light transmittance. It is preferably at least 80%, more preferably at least 85%, and even more preferably at least 88%. The total light transmittance of the optical film can be measured according to JIS K7361-1:1997.

光學薄膜之全光線穿透率,例如可藉由光吸收材料之含量等調整。欲提高光學薄膜之全光線穿透率時,例如,較佳為將光吸收材料之含量設定為一定以下。The total light transmittance of the optical film can be adjusted by, for example, the content of light-absorbing materials. When it is desired to increase the total light transmittance of the optical film, for example, it is preferable to set the content of the light-absorbing material to a certain value or less.

(吸光係數) 光學薄膜之吸光係數A係如上述,波長9.6μm之光的吸光係數A,較佳為1.5×10-5 /μm以上。光學薄膜之吸光係數A為1.5×10-5 /μm以上時,可適度地吸收雷射光,故可提高藉由雷射光之切斷性。光學薄膜之吸光係數A,就不易損及透明性,且不易發生顯示裝置中之漏光的觀點,較佳為2.0×10-5 ~50×10-5 /μm,更佳為5.0×10-5 ~20×10-5 /μm。光學薄膜之吸光係數A係如上述,使用ATR法,以上述條件測定吸光度,由此可算出。(Absorptance Coefficient) The light absorption coefficient A of the optical film is as described above, and the light absorption coefficient A of light with a wavelength of 9.6 μm is preferably 1.5×10 -5 /μm or more. When the light absorption coefficient A of the optical film is 1.5×10 -5 /μm or more, laser light can be absorbed moderately, so the cutting property by laser light can be improved. The light absorption coefficient A of the optical film is preferably 2.0×10 -5 ~50×10 -5 /μm, more preferably 5.0×10 -5 from the viewpoint of not being easily damaged and transparent, and not easily causing light leakage in the display device ~20×10 -5 /μm. The absorption coefficient A of the optical film can be calculated by measuring the absorbance under the above-mentioned conditions using the ATR method as described above.

光學薄膜之吸光係數A,可藉由光吸收材料之種類或含量等來調整。就提高光學薄膜之吸光係數A的觀點,較佳為提高光吸收材料之含量。The light absorption coefficient A of the optical film can be adjusted by the type or content of the light-absorbing material. From the viewpoint of increasing the light absorption coefficient A of the optical film, it is preferable to increase the content of the light-absorbing material.

(相位差Ro及Rt) 光學薄膜依據其用途,可具有相位差值Ro及Rt。例如,光學薄膜作為偏光板之0相位差薄膜使用時,在測定波長590nm、23℃55%RH之環境下測定之面內方向之相位差Ro,較佳為滿足0nm≦Ro≦5nm,厚度方向之相位差Rt,較佳為滿足-5nm≦Rt≦5nm。(Phase difference Ro and Rt) Optical thin films may have retardation values Ro and Rt depending on their usage. For example, when the optical film is used as a zero-retardation film of a polarizing plate, the retardation Ro in the in-plane direction measured at a wavelength of 590nm and an environment of 23°C and 55%RH preferably satisfies 0nm≦Ro≦5nm, and the thickness direction The phase difference Rt preferably satisfies -5nm≦Rt≦5nm.

光學薄膜之Ro及Rt係分別以下述式定義。 式(2a):Ro=(nx-ny)×d 式(2b):Rt=((nx+ny)/2-nz)×d (式中, nx表示光學薄膜之面內慢軸方向(折射率成為最大的方向)之折射率, ny表示與光學薄膜之面內慢軸正交之方向的折射率, nz表示光學薄膜之厚度方向的折射率, d表示光學薄膜之厚度(nm))Ro and Rt of the optical film are respectively defined by the following formulas. Formula (2a): Ro=(nx-ny)×d Formula (2b): Rt=((nx+ny)/2-nz)×d (where, nx represents the refractive index of the in-plane slow axis direction (the direction in which the refractive index becomes the largest) of the optical film, ny represents the refractive index in the direction perpendicular to the in-plane slow axis of the optical film, nz represents the refractive index in the thickness direction of the optical film, d represents the thickness of the optical film (nm))

光學薄膜之面內慢軸係指薄膜面中,折射率成為最大的軸。光學薄膜之面內慢軸,可藉由自動雙折射率計AxoScan(AxoScan Mueller Matrix Polarimeter:Axometrics公司製)來確認。The in-plane slow axis of an optical film refers to the axis where the refractive index becomes the largest in the film surface. The in-plane slow axis of the optical film can be confirmed with an automatic birefringence meter AxoScan (AxoScan Mueller Matrix Polarimeter: manufactured by Axometrics).

光學薄膜之Ro及Rt之測定,可以下的方法進行。 1)將光學薄膜在23℃55%RH的環境下進行24小時調濕。以阿貝式折射計(Abbe refractometer)測定此光學薄膜的平均折射率,使用市售之測微器(micrometer)測定厚度d。 2)分別使用自動雙折射率計AxoScan(AxoScan Mueller Matrix Polarimeter:Axometrics公司製),在23℃55%RH之環境下,測定調濕後之光學薄膜之測定波長590nm下的延遲Ro及Rt。Ro and Rt of the optical film can be measured by the following method. 1) Condition the optical film for 24 hours in an environment of 23°C and 55%RH. The average refractive index of the optical film was measured with an Abbe refractometer, and the thickness d was measured with a commercially available micrometer. 2) Using an automatic birefringence meter AxoScan (AxoScan Mueller Matrix Polarimeter: manufactured by Axometrics Co., Ltd.), the retardation Ro and Rt at a measurement wavelength of 590 nm of the optical film after humidity control were measured in an environment of 23° C. and 55% RH.

光學薄膜之相位差Ro及Rt,主要可藉由拉伸率調整。欲提高光學薄膜之相位差Ro及Rt時,較佳為提高拉伸率。The retardation Ro and Rt of the optical film can be adjusted mainly by the stretching ratio. When it is desired to increase the retardation Ro and Rt of the optical film, it is preferable to increase the stretching ratio.

(厚度) 光學薄膜之厚度,無特別限制,較佳為20~100μm,更佳為35~70μm。(thickness) The thickness of the optical film is not particularly limited, preferably 20-100 μm, more preferably 35-70 μm.

1-4.製造方法 本發明之光學薄膜,可以任意的方法製造。例如,具有表層12(或13)之光學薄膜10,可將基材層11與表層12(或13)進行共流延而得(共流延法),製造基材層11後,塗佈表層12(或13),及使硬化而得(塗佈法)。1-4. Manufacturing method The optical film of the present invention can be produced by any method. For example, the optical film 10 having the surface layer 12 (or 13) can be obtained by co-casting the substrate layer 11 and the surface layer 12 (or 13) (co-casting method). After the substrate layer 11 is produced, the surface layer is coated 12 (or 13), and obtained by hardening (coating method).

<共流延法> 上述態樣1之光學薄膜10,較佳為以共流延法製造。共流延法可為溶液共流延法,或可為熔融共流延法。<Co-casting method> The optical film 10 of the above-mentioned aspect 1 is preferably produced by a co-casting method. The co-casting method may be a solution co-casting method, or may be a melt co-casting method.

(熔融共流延法) 熔融共流延係將基材層用之熱塑性樹脂組成物的熱熔融物與表層用之熱塑性樹脂組成物的熱熔融物進行共流延後,使冷卻固化,得到共流延膜。具體而言,本發明之光學薄膜可經由下述步驟A1)~A3)而得,其中A1)準備基材層用之熱塑性樹脂組成物及表層用熱塑性樹脂組成物的步驟,A2)將基材層用之熱塑性樹脂組成物的熱熔融物與表層用之熱塑性樹脂組成物的熱熔融物進行共流延後,進行冷卻固化的步驟,及必要時,A3)將所得之膜狀物進行延伸的步驟。(melt co-casting method) Melt co-casting is to co-cast the hot melt of the thermoplastic resin composition for the base layer and the hot melt of the thermoplastic resin composition for the surface layer, and then cool and solidify to obtain a co-cast film. Specifically, the optical film of the present invention can be obtained through the following steps A1) to A3), wherein A1) prepares the thermoplastic resin composition for the substrate layer and the thermoplastic resin composition for the surface layer, A2) prepares the substrate After co-casting the hot melt of the thermoplastic resin composition for the layer and the hot melt of the thermoplastic resin composition for the surface layer, the step of cooling and solidifying, and if necessary, A3) extending the obtained film step.

A1)之步驟係將各成分乾燥混合後,以二軸擠壓機等進行熔融混練,得到顆粒。The step of A1) is to dry mix the ingredients, and then melt and knead them with a twin-screw extruder to obtain granules.

A2)之步驟係將準備之基材層用之熱塑性樹脂組成物及表層用熱塑性樹脂組成物的顆粒,分別以二軸擠壓機等進行熔融混練後,使由共流延模(cocasting die)共流延。熔融共流延中之熱熔融溫度係當樹脂之玻璃轉移溫度為Tg時,可為(Tg+30)~(Tg+70)℃。The step of A2) is to melt and knead the particles of the thermoplastic resin composition for the base layer and the thermoplastic resin composition for the surface layer with a two-screw extruder respectively, and then use a cocasting die (cocasting die) co-casting. The melting temperature in melt co-casting is (Tg+30)~(Tg+70)℃ when the glass transition temperature of the resin is Tg.

A3)之步驟中,依據所要求的光學特性,進行延伸即可,在寬度方向(TD方向)、搬送方向(MD方向)、斜方向之中一個以上的方向進行延伸為佳。In the step of A3), stretching may be carried out according to the required optical characteristics, and stretching is preferably carried out in one or more directions among the width direction (TD direction), the conveying direction (MD direction), and the oblique direction.

依據所要求的光學特性,設定拉伸率,例如,作為低相位差之薄膜產生機能的觀點,可為1.01~1.3倍。拉伸率係(延伸後之薄膜之延伸方向大小)/(延伸前之薄膜之延伸方向大小)來定義。延伸溫度(延伸時之乾燥溫度),較佳為(Tg-20)~(Tg+30)℃。The elongation ratio is set according to the required optical characteristics, for example, it can be 1.01 to 1.3 times from the viewpoint of the function of producing a low-retardation film. The stretch ratio is defined by (stretching direction of film after stretching)/(stretching direction of film before stretching). Stretching temperature (drying temperature during stretching) is preferably (Tg-20)~(Tg+30)°C.

(溶液共流延法) 溶液共流延係將基材層用之成分溶解於溶劑的溶液(膠漿)與使表層用之成分溶解於溶劑的溶液(膠漿)進行共流延後,使乾燥得到共流延膜。具體而言,本發明之光學薄膜,可經由步驟B1)~B3)製造,其中B1)準備包含環烯烴樹脂、光吸收材料、及溶劑之膠漿的步驟,B2)將所得之膠漿流延於支撐體上後,經乾燥及剝離,得到流延膜的步驟,及必要時,B3)將所得之流延膜進行延伸的步驟。(Solution co-casting method) Solution co-casting is to co-cast the solution (dope) in which the components for the substrate layer are dissolved in the solvent and the solution (dope) in which the components for the surface layer are dissolved in the solvent, and then dry to obtain a co-cast film. Specifically, the optical film of the present invention can be produced through steps B1) to B3), wherein B1) prepares a dope comprising a cycloolefin resin, a light-absorbing material, and a solvent, and B2) casts the obtained dope After being placed on the support body, drying and peeling are performed to obtain a cast film, and if necessary, B3) a step of extending the obtained cast film.

B1)之步驟係將環烯烴樹脂及光吸收材料溶解或分散於溶劑,調製膠漿。The step of B1) is dissolving or dispersing the cycloolefin resin and the light absorbing material in a solvent to prepare a glue.

所使用的溶劑係至少包含可使環烯烴樹脂溶解的有機溶劑(良溶劑)。良溶劑之例,包含二氯甲烷等之氯系有機溶劑或;乙酸甲酯、乙酸乙酯、丙酮、四氫呋喃等之非氯系有機溶劑,較佳為二氯甲烷。The solvent used contains at least an organic solvent (good solvent) capable of dissolving the cycloolefin resin. Examples of good solvents include chlorine-based organic solvents such as dichloromethane or non-chlorinated organic solvents such as methyl acetate, ethyl acetate, acetone, tetrahydrofuran, etc., preferably dichloromethane.

所使用的溶劑也可進一步包含弱溶劑。弱溶劑之例,包含甲醇、乙醇等之碳原子數1~4之脂肪族醇,較佳為乙醇。也可再包含脂肪族醇的膠漿易凝膠化,故由金屬支撐體容易剝離。The solvent used may also further contain a weak solvent. Examples of weak solvents include aliphatic alcohols with 1 to 4 carbon atoms such as methanol and ethanol, preferably ethanol. The glue that may further contain aliphatic alcohol tends to gel, so it is easy to peel off from the metal support.

B2)之步驟係將所得之膠漿由流延模吐出等,流延至支撐體上。將流延至支撐體上的膠漿,使溶劑蒸發,直到藉由剝離輥可由支撐體剝離為止。The step of B2) is to spit out the obtained glue from the casting die, etc., and cast it onto the support body. The dope cast on the support was allowed to evaporate the solvent until it could be peeled off from the support by a peeling roller.

然後,使溶劑蒸發所得之流延膜,藉由剝離輥剝離。剝離時之支撐體上之流延膜的殘留溶劑量,因乾燥條件或支撐體之長度等而異,例如可為50~120質量%。殘留溶劑量係以下述式定義。 殘留溶劑量(質量%)=(流延膜之加熱處理前質量-流延膜之加熱處理後質量)/(流延膜之加熱處理後質量)×100 測定殘留溶劑量時之加熱處理係在115℃下,1小時之加熱處理。Then, the cast film obtained by evaporating the solvent was peeled off with a peeling roll. The amount of residual solvent in the cast film on the support at the time of peeling varies depending on the drying conditions, the length of the support, etc., and may be, for example, 50 to 120% by mass. The residual solvent amount is defined by the following formula. Amount of residual solvent (mass%) = (mass of cast film before heat treatment - mass of cast film after heat treatment) / (mass of cast film after heat treatment) × 100 The heat treatment for measuring the amount of residual solvent is at 115°C for 1 hour.

B3)之步驟係將流延膜進行延伸。拉伸率或延伸溫度,可與上述A3)之步驟相同。The step of B3) is to extend the casting film. Stretching ratio or stretching temperature can be the same as the above-mentioned step of A3).

延伸開始時之流延膜中的殘留溶劑量,較佳為與剝離時之流延膜中之殘留溶劑量相同程度,例如較佳為20~30質量%,更佳為25~30質量%。The amount of residual solvent in the cast film at the start of stretching is preferably the same as the amount of residual solvent in the cast film at the time of peeling, for example, preferably 20 to 30% by mass, more preferably 25 to 30% by mass.

<塗佈法> 上述態樣2之光學薄膜10,較佳為以塗佈法製造。具體而言,態樣2之光學薄膜10係經由步驟C1)~C2)製造,其中C1)製造基材層11的步驟,C2)在所得之基材層11上,賦予包含具有光吸收性之硬化性化合物與硬化劑的硬化性組成物,使硬化形成表層12(或13)的步驟。<Coating method> The optical film 10 of the above-mentioned aspect 2 is preferably manufactured by a coating method. Specifically, the optical film 10 of Aspect 2 is manufactured through steps C1)~C2), wherein C1) the step of manufacturing the base material layer 11, C2) imparting a light-absorbing material on the obtained base material layer 11 A step of hardening the curable composition of the hardening compound and the hardening agent to form the surface layer 12 (or 13).

C1)之步驟中,基材層11係與上述相同,可以熔融流延法製造,也可以溶液流延法製造。In the step of C1), the substrate layer 11 is the same as above, and can be produced by melt casting or solution casting.

C2)之步驟中,在基材層11之表面,賦予包含光吸收性之硬化性化合物與硬化劑的硬化性組成物。硬化性組成物之賦予可以任意的塗佈法進行,例如可以輥塗佈等進行。In step C2), a curable composition including a light-absorbing curable compound and a curing agent is applied to the surface of the base material layer 11 . The application of the curable composition may be performed by any coating method, for example, roll coating or the like.

然後,使硬化性組成物硬化,得到表層12(或13)。硬化性組成物之硬化,可為熱硬化,也可為光硬化,較佳為光硬化。Then, the curable composition is cured to obtain the surface layer 12 (or 13). The hardening of the curable composition may be heat hardening or light hardening, preferably light hardening.

1-5.變形例 又,上述實施形態中,光學薄膜10表示具有2個表層之例(參照圖2A),不限定於此,也可具有1個表層(參照圖2B)。1-5. Modified example In addition, in the above-mentioned embodiment, the optical film 10 shows an example having two surface layers (see FIG. 2A ), but is not limited thereto, and may have one surface layer (see FIG. 2B ).

圖2B為表示變形例之光學薄膜10之構成的圖。如圖2B所示,光學薄膜10,可僅具有1個表層12。特別是表層12(或13)為包含硬化性組成物的交聯物時(上述態樣2),光學薄膜10,較佳為僅具有1個表層。FIG. 2B is a diagram showing the configuration of an optical film 10 according to a modified example. As shown in FIG. 2B , the optical film 10 may have only one surface layer 12 . Especially when the surface layer 12 (or 13) is a cross-linked product containing a curable composition (the above-mentioned aspect 2), the optical film 10 preferably has only one surface layer.

2.偏光板 圖3為表示本實施形態之偏光板100之構成的斷面圖。本實施形態中,作為光學薄膜10,表示使用圖2A之光學薄膜10之例。2. Polarizer FIG. 3 is a cross-sectional view showing the structure of the polarizing plate 100 of the present embodiment. In this embodiment, an example using the optical film 10 of FIG. 2A as the optical film 10 is shown.

如圖3所示,本實施形態之偏光板100,具有偏光鏡20,配置於其一側之本發明之光學薄膜10,配置於另一側之其他的光學薄膜30,分別在偏光鏡20與光學薄膜10之間,及偏光鏡20與其他的光學薄膜30之間配置之複數的接著層40。As shown in Fig. 3, the polarizing plate 100 of the present embodiment has a polarizer 20, the optical film 10 of the present invention arranged on one side thereof, and other optical films 30 arranged on the other side are arranged on the polarizer 20 and the other optical film 30 respectively. A plurality of adhesive layers 40 are arranged between the optical films 10 and between the polarizer 20 and other optical films 30 .

2-1.偏光鏡20 偏光鏡係僅通過一定方向之偏波面之光的元件,聚乙烯醇系偏光薄膜。聚乙烯醇系偏光薄膜,包含使聚乙烯醇系薄膜染色碘者,與染色雙色性染料者。2-1. Polarizer 20 The polarizer is an element that only passes the light of the polarized wave plane in a certain direction, and the polyvinyl alcohol is a polarizing film. Polyvinyl alcohol-based polarizing films include those dyed with iodine and those dyed with dichroic dyes.

聚乙烯醇系偏光薄膜,可為將聚乙烯醇系薄膜進行單軸延伸後,以碘或雙色性染料染色的薄膜(較佳為再以硼化合物施予耐久性處理的薄膜);以碘或雙色性染料染色聚乙烯醇系薄膜後,進行單軸延伸的薄膜(較佳為再以硼化合物施予耐久性處理的薄膜)。偏光鏡之吸收軸係與最大延伸方向平行。The polyvinyl alcohol-based polarizing film can be a film dyed with iodine or a dichroic dye after the polyvinyl alcohol-based film is uniaxially stretched (preferably a film that is subjected to a durability treatment with a boron compound); A polyvinyl alcohol-based film dyed with a dichroic dye is uniaxially stretched (preferably a film subjected to a durability treatment with a boron compound). The absorption axis of the polarizer is parallel to the direction of maximum extension.

偏光鏡之厚度,較佳為5~30μm,為了將偏光板進行薄型化等,更佳為5~20μm。The thickness of the polarizer is preferably 5-30 μm, and more preferably 5-20 μm for thinning the polarizer.

2-2.光學薄膜10 本發明之光學薄膜係配置於偏光鏡之至少一面(至少與液晶胞對向之面)。具體而言,本發明之光學薄膜10係使表層12或13(圖3中,表層12)成為偏光鏡20側來配置。2-2. Optical film 10 The optical film of the present invention is arranged on at least one side of the polarizer (at least the side opposite to the liquid crystal cell). Specifically, the optical film 10 of the present invention is disposed so that the surface layer 12 or 13 (in FIG. 3 , the surface layer 12 ) faces the polarizer 20 side.

2-3.其他的光學薄膜30 其他的光學薄膜,也可使用本發明之光學薄膜10,其他的光學薄膜,例如可使用偏光鏡保護薄膜等。其他的光學薄膜之例,包含聚酯薄膜或纖維素酯薄膜(TAC薄膜等)。2-3. Other optical films 30 For other optical films, the optical film 10 of the present invention can also be used, and for other optical films, for example, polarizer protective films can be used. Examples of other optical films include polyester films and cellulose ester films (TAC films, etc.).

2-4.接著層40 接著層係配置於光學薄膜10(或其他的光學薄膜30)與偏光鏡20之間,使彼等接著。構成接著層之接著劑,無特別限制,可為使完全皂化型聚乙烯醇水溶液(水糊)乾燥者或活性能量線硬化性接著劑之硬化物。活性能量線硬化性接著劑,可為利用光自由基聚合之光自由基聚合型組成物、利用光陽離子聚合之光陽離子聚合型組成物、或彼等之併用物之任一者。2-4. Next layer 40 Then, the layer system is arranged between the optical film 10 (or other optical film 30 ) and the polarizer 20 , so that they are bonded. The adhesive constituting the adhesive layer is not particularly limited, and may be a fully saponified polyvinyl alcohol aqueous solution (water paste) dried or a cured product of an active energy ray-curable adhesive. The active energy ray-curable adhesive may be a photoradical polymerizable composition that utilizes photoradical polymerization, a photocationic polymerizable composition that utilizes photocationic polymerization, or any of these combinations.

接著層之厚度,例如可為0.01~10μm,較佳為0.03~5μm程度。The thickness of the bonding layer may be, for example, 0.01-10 μm, preferably about 0.03-5 μm.

2-5.製造方法 圖4A及B係表示圖3之偏光板之製造方法的斷面圖。2-5. Manufacturing method 4A and B are cross-sectional views showing a method of manufacturing the polarizing plate shown in FIG. 3 .

如圖4A及B所示,本實施形態之偏光板100係得到包含偏光鏡20,配置於其一面(貼合)之本發明之光學薄膜10,配置於另一面(貼合)之其他的光學薄膜30的積層物200後(參照圖4A),由所得之積層物200之光學薄膜10側,照射雷射光L,將積層物200切斷成所定之大小而得(參照圖4B)。As shown in Fig. 4A and B, the polarizing plate 100 of the present embodiment is to obtain the optical film 10 of the present invention comprising a polarizer 20 arranged on one side (bonded), and other optical film 10 arranged on the other side (bonded). After the laminate 200 of the thin film 30 (see FIG. 4A ), the obtained laminate 200 is irradiated with laser light L from the optical film 10 side, and the laminate 200 is cut into a predetermined size (see FIG. 4B ).

偏光鏡20與本發明之光學薄膜10之貼合,就提高藉由雷射光之切斷性的觀點,本發明之光學薄膜10之吸光係數高的表層12或13(圖2中,表層12)成為、偏光鏡20側方式貼合後,藉由雷射光之切斷成所定之大小。又,貼合係可介於接著劑進行。The lamination of the polarizer 20 and the optical film 10 of the present invention improves the cut-off property by laser light. The surface layer 12 or 13 of the optical film 10 of the present invention has a high light absorption coefficient (in FIG. 2, the surface layer 12) After bonding the polarizer 20 sideways, it is cut into a predetermined size by laser light. Also, bonding can be performed through an adhesive.

藉由雷射光之切斷係將雷射光由光學薄膜10側(圖4A中,光學薄膜10之表層13側)照射。此時,光學薄膜10係表層12及13之雷射光之吸收性高,故以較少的照射能量,可切斷光學薄膜10。藉此,偏光鏡20不必處於過量雷射光,故偏光鏡20不會因吸收過多雷射光而燒焦,可抑制產生煤煙。因此,可抑制偏光板之污染。Cutting by laser light is to irradiate laser light from the optical film 10 side (in FIG. 4A , the surface layer 13 side of the optical film 10 ). At this time, the optical film 10 has high absorption of laser light on the surface layers 12 and 13, so the optical film 10 can be cut with less irradiation energy. Thereby, the polarizer 20 does not need to be exposed to excessive laser light, so the polarizer 20 will not be burnt due to absorbing too much laser light, and generation of soot can be suppressed. Therefore, contamination of the polarizing plate can be suppressed.

3.液晶顯示裝置 本發明之液晶顯示裝置,包含液晶胞、配置於液晶胞之一面的第一偏光板、配置於液晶胞之另一面的第二偏光板。3. Liquid crystal display device The liquid crystal display device of the present invention comprises a liquid crystal cell, a first polarizer arranged on one side of the liquid crystal cell, and a second polarizer arranged on the other side of the liquid crystal cell.

液晶胞之顯示模式,無特別限制,例如可為STN(Super-Twisted Nematic)、TN(Twisted Nematic)、OCB(Optically Compensated Bend)、HAN(Hybridaligned Nematic)、VA(Vertical Alignment)、MVA(Multi-domain Vertical Alignment)、PVA(Patterned Vertical Alignment)、IPS(In-Plane-Switching)等。其中,較佳為IPS模式。The display mode of the liquid crystal cell is not particularly limited, such as STN (Super-Twisted Nematic), TN (Twisted Nematic), OCB (Optically Compensated Bend), HAN (Hybridaligned Nematic), VA (Vertical Alignment), MVA (Multi- domain Vertical Alignment), PVA (Patterned Vertical Alignment), IPS (In-Plane-Switching), etc. Among them, the IPS mode is preferred.

第一偏光板及第二偏光板之中一者或兩者為本發明之偏光板。本發明之偏光板,配置使本發明之光學薄膜成為液晶胞側較佳。One or both of the first polarizing plate and the second polarizing plate are the polarizing plate of the present invention. In the polarizing plate of the present invention, it is preferable to arrange the optical film of the present invention on the side of the liquid crystal cell.

本發明之偏光板100係如上述,藉由雷射光之切斷性良好,不僅偏光板之污染減少,且As/Ac調整為適度的範圍。因此,光學薄膜10之表層12(或13)中之因雷射光之吸收所致的發熱量,相對於基材層11中之雷射光之吸收所致之發熱量不會過大,故不易產生上述所致之應力差。因此,可抑制作為顯示裝置時之漏光。 [實施例]As mentioned above, the polarizing plate 100 of the present invention has good cutting property of laser light, not only reduces contamination of the polarizing plate, but also adjusts As/Ac to an appropriate range. Therefore, the calorific value caused by the absorption of laser light in the surface layer 12 (or 13) of the optical film 10 will not be too large relative to the calorific value caused by the absorption of laser light in the base layer 11, so it is difficult to produce the above-mentioned The resulting stress difference. Therefore, light leakage when used as a display device can be suppressed. [Example]

以下藉由實施例具體地說明本發明,但是本發明不限定於此等。The present invention will be specifically described below by way of examples, but the present invention is not limited thereto.

1.光學薄膜之材料 (1)環烯烴樹脂 準備以下之COP1~6,作為環烯烴樹脂。

Figure 02_image011
1. Materials of optical film (1) Cycloolefin resin Prepare the following COP1~6 as cycloolefin resin.
Figure 02_image011

又,來自單體之結構單位A~D分別如以下。

Figure 02_image013
In addition, the structural units A to D derived from the monomer are as follows, respectively.
Figure 02_image013

COP1~6之Tg及Mw係使用以下的方法測定。Tg and Mw of COP1-6 were measured using the following methods.

[玻璃轉移溫度(Tg)] 使用DSC(Differential Scanning Colorimetry:示差掃描熱量法),依據JIS K 7121-2012測定樹脂之玻璃轉移溫度。[Glass transition temperature (Tg)] The glass transition temperature of the resin was measured in accordance with JIS K 7121-2012 using DSC (Differential Scanning Colorimetry: Differential Scanning Calorimetry).

[重量平均分子量(Mw)] 使用凝膠滲透層析法(東曹公司製 HLC8220GPC)、管柱(東曹公司製 TSK-GEL G6000HXL-G5000HXL-G5000HXL -G4000HXL-G3000HXL 串聯)測定樹脂之重量平均分子量(Mw)。將試料20±0.5mg溶解於四氫呋喃10ml中,以0.45mm之過濾器過濾。將此溶液100ml注入管柱(溫度40℃),以檢測器RI、溫度40℃測定,苯乙烯換算求重量平均分子量。[Weight average molecular weight (Mw)] The weight average molecular weight (Mw) of the resin was measured using gel permeation chromatography (HLC8220GPC manufactured by Tosoh Corporation) and a column (TSK-GEL G6000HXL-G5000HXL-G5000HXL-G4000HXL-G3000HXL series manufactured by Tosoh Corporation). Dissolve 20±0.5 mg of the sample in 10 ml of tetrahydrofuran, and filter with a 0.45 mm filter. 100 ml of this solution was poured into a column (at a temperature of 40° C.), measured with a detector RI at a temperature of 40° C., and the weight average molecular weight was calculated in terms of styrene.

(2)光吸收材料 <光吸收材料A>

Figure 02_image015
(2) Light-absorbing material <Light-absorbing material A>
Figure 02_image015

<光吸收材料B> 甲基丙烯酸甲酯(MMA)/苯乙烯(St)/乙二醇二甲基丙烯酸酯(EGDMA)(70/10/20莫耳比)共聚物粒子(折射率1.51、平均粒徑0.14μm)<Light absorbing material B> Methyl methacrylate (MMA)/styrene (St)/ethylene glycol dimethacrylate (EGDMA) (70/10/20 molar ratio) copolymer particles (refractive index 1.51, average particle size 0.14μm)

<光吸收材料C> 甲基丙烯酸甲酯(MMA)/苯乙烯(St)/乙二醇二甲基丙烯酸酯(EGDMA)(70/10/20莫耳比)共聚物粒子(折射率1.51、平均粒徑0.35μm)<Light absorbing material C> Methyl methacrylate (MMA)/styrene (St)/ethylene glycol dimethacrylate (EGDMA) (70/10/20 molar ratio) copolymer particles (refractive index 1.51, average particle size 0.35μm)

<光吸收材料D> 季戊四醇四苯甲酸酯(分子量552)<Light absorbing material D> Pentaerythritol tetrabenzoate (molecular weight 552)

<光吸收材料E> 甲基丙烯酸甲酯(MMA)/苯乙烯(St)/乙二醇二甲基丙烯酸酯(EGDMA)(70/10/20莫耳比)共聚物粒子(折射率1.51、平均粒徑0.3μm)<Light absorbing material E> Methyl methacrylate (MMA) / styrene (St) / ethylene glycol dimethacrylate (EGDMA) (70/10/20 molar ratio) copolymer particles (refractive index 1.51, average particle size 0.3 μm)

<光吸收材料F> 水系胺基甲酸酯樹脂(第一工業製藥公司製Superflex 210)<Light absorbing material F> Water-based urethane resin (Superflex 210 manufactured by Daiichi Kogyo Pharmaceutical Co., Ltd.)

<光吸收材料G> 胺基甲酸酯丙烯酸酯(新中村化學(股)製UA-1100) 異三聚氰酸EO改性二及三丙烯酸酯<Light absorbing material G> Urethane acrylate (UA-1100 manufactured by Shin-Nakamura Chemical Co., Ltd.) Isocyanuric acid EO modified di and triacrylate

<光吸收材料H> (甲基)丙烯酸樹脂(MMA/N-苯基馬來醯亞胺/甲基丙烯酸2-乙基己酯聚合物、Mw800000)<Light absorbing material H> (Meth)acrylic resin (MMA/N-phenylmaleimide/2-ethylhexyl methacrylate polymer, Mw800000)

<光吸收材料I> 季戊四醇四苯甲酸酯(分子量552)<Light Absorbing Material I> Pentaerythritol tetrabenzoate (molecular weight 552)

藉由ATR法測定光吸收材料A~I之波長9.0~11.0μm之光之吸光係數,測得4.0×10-3 ~6.0×10-3 /μm。The absorptivity of the light absorbing materials A~I with a wavelength of 9.0~11.0 μm was measured by the ATR method, and the measured value was 4.0×10 -3 ~6.0×10 -3 /μm.

2.光學薄膜之製作 <實施例1> (基材薄膜之製作) 將表2之樹脂與相對於該樹脂為2質量%之添加劑,進行熔融混練,使用單軸擠壓機(φ=20mm、L/D=25),由衣架型T模(寬150mm)進行熔融擠壓,在薄膜上成型,邊搬送邊延伸,製作厚度50μm之基材薄膜(基材層)。2. Production of optical film <Example 1> (Making of substrate film) Melt knead the resin in Table 2 and 2% by mass of additives relative to the resin, and melt it with a hanger-shaped T-die (width 150mm) using a single-screw extruder (φ=20mm, L/D=25) Extrusion, forming on the film, stretching while conveying, and producing a substrate film (substrate layer) with a thickness of 50 μm.

(表層之形成) 首先,將第一工業製藥公司製Superflex 210(水系胺基甲酸酯樹脂、光吸收材料F)與作為硬化劑之己二酸與環氧樹脂溶解於純水中,得到Superflex 210之濃度10質量%的硬化性組成物。(formation of surface layer) First, Superflex 210 (water-based urethane resin, light-absorbing material F) manufactured by Daiichi Kogyo Pharmaceutical Co., Ltd., adipic acid and epoxy resin as a hardener were dissolved in pure water to obtain a concentration of Superflex 210 of 10 mass % hardening composition.

接著,使用擠壓塗佈機(extrusion coater),將上述製作之硬化性組成物塗佈於所得之基材薄膜的表面後,使在80℃下乾燥5分鐘,形成厚度0.2μm之表層。藉此,得到具有基材薄膜(基材層)/表層之2層構造的光學薄膜。Next, the above-prepared curable composition was coated on the surface of the obtained substrate film using an extrusion coater, and then dried at 80° C. for 5 minutes to form a surface layer with a thickness of 0.2 μm. Thereby, an optical film having a two-layer structure of base film (base layer)/surface layer was obtained.

<實施例2> (基材薄膜之製作) 與實施例1相同,得到厚度50μm之基材薄膜(基材層)。<Example 2> (Making of substrate film) In the same manner as in Example 1, a substrate film (substrate layer) having a thickness of 50 μm was obtained.

(表層之形成) 首先,將下述材料進行攪拌、混合後,孔徑0.4μm之聚丙烯製過濾器進行過濾作為硬化性組成物。 胺基甲酸酯丙烯酸酯(新中村化學(股)製UA-1100):12質量% 異三聚氰酸EO改性二及三丙烯酸酯(東亞合成(股)製M-315):8質量%(以上、光吸收材料G) 二氧化矽微粒子分散液(日揮觸媒化成公司製V-8804):60質量份 IRGACURE184(BASF JAPAN公司製):2.4質量% KF-351A(聚醚改性矽油,信越化學工業公司製)0.4質量% 甲醇18質量% 丙二醇單甲醚乙酸酯(PGME):12質量%(formation of surface layer) First, the following materials were stirred and mixed, and then filtered through a polypropylene filter with a pore size of 0.4 μm to obtain a curable composition. Urethane acrylate (UA-1100 manufactured by Shin-Nakamura Chemical Co., Ltd.): 12% by mass Isocyanuric acid EO-modified di- and triacrylates (M-315 manufactured by Toagosei Co., Ltd.): 8% by mass (above, light-absorbing material G) Silica microparticle dispersion (V-8804 manufactured by Nikki Catalyst Chemicals Co., Ltd.): 60 parts by mass IRGACURE184 (manufactured by BASF JAPAN): 2.4% by mass KF-351A (polyether modified silicone oil, manufactured by Shin-Etsu Chemical Co., Ltd.) 0.4% by mass Methanol 18% by mass Propylene glycol monomethyl ether acetate (PGME): 12% by mass

接著,使用擠壓塗佈機,將上述調製之硬化性組成物塗佈於基材薄膜的表面,在80℃下乾燥後,使氧濃度成為1.0體積%以下的環境,邊氮氣沖洗,邊使用紫外線燈,在照射部之照度100mW/cm2 、照射量0.2J/cm2 的條件下照射紫外線,使硬化,形成厚度0.5μm之表層。藉此,得到具有基材薄膜/表層之2層構造的光學薄膜。Next, apply the curable composition prepared above on the surface of the substrate film using an extrusion coater, dry it at 80°C, and use it while purging it with nitrogen gas in an environment where the oxygen concentration is 1.0% by volume or less. The ultraviolet lamp was used to irradiate ultraviolet rays under the conditions of illuminance of irradiated part 100mW/cm 2 and irradiation dose of 0.2J/cm 2 to harden and form a surface layer with a thickness of 0.5μm. Thereby, an optical film having a two-layer structure of base film/surface layer was obtained.

<實施例3> (基材層用顆粒之調製) 使光吸收材料A之含量成為0.5質量%的方式,以真空諾塔混合機(Nauta Mixer)混合COP1與光吸收材料A,進行乾燥後,使用2軸式擠壓機,進行熔融得到樹脂混合物之顆粒。<Example 3> (Preparation of particles for substrate layer) The content of the light-absorbing material A is 0.5% by mass. Mix COP1 and the light-absorbing material A with a vacuum Nauta mixer (Nauta Mixer), dry it, and melt it using a 2-axis extruder to obtain a resin mixture. particles.

(表層用顆粒之調製) 除使用光吸收材料H((甲基)丙烯酸樹脂)外,與上述同樣得到樹脂混合物之顆粒。(Preparation of particles for the surface layer) Except for using the light absorbing material H ((meth)acrylic resin), pellets of the resin mixture were obtained in the same manner as above.

(共流延) 將所得之基材層用顆粒與表層用顆粒分別在氮環境下,供給2台之2軸擠壓機,使熔融進行共流延。亦即,使用共擠壓模,基材層為中心,表層位於其兩側,進行熔融共流延。2軸擠壓機之設定溫度,均為180℃,共擠壓模設定為190℃。共擠壓模係衣架型3層積層型多重分歧管模具。然後,將熔融擠壓的薄膜在冷卻輥與彈性接觸輥(touch roll)之間挟壓、成形,再以冷卻輥冷卻後,以剝離輥剝離,得到具有基材層/表層之2層構造的光學薄膜。(co-cast) The obtained pellets for the base layer and the pellets for the surface layer were respectively supplied to two twin-screw extruders in a nitrogen atmosphere, melted and co-cast. That is, melt co-casting is performed using a co-extrusion die with the base layer as the center and the surface layers on both sides. The set temperature of the 2-axis extruder is 180°C, and the co-extrusion die is set at 190°C. The co-extrusion mold is a coat hanger type 3-layer laminated type multiple branch pipe mold. Then, the melt-extruded film is pinched and formed between a cooling roll and an elastic touch roll (touch roll), cooled by the cooling roll, and peeled off by a peeling roll to obtain a two-layer structure having a base layer/surface layer. Optical film.

<實施例4~17及比較例1> 除了將基材層及表層之組成及厚度變更為如表2所示外,與實施例3同樣地,得到具有表層/基材層/表層之3層構造的光學薄膜。<Examples 4 to 17 and Comparative Example 1> Except changing the compositions and thicknesses of the base layer and the surface layer as shown in Table 2, an optical film having a three-layer structure of surface layer/base layer/surface layer was obtained in the same manner as in Example 3.

<實施例18> (光吸收材料添加液之調製) 將二氯甲烷95質量份投入於密閉容器中,邊攪拌邊添加5質量份之光吸收材料B((甲基)丙烯酸聚合物粒子)。然後,在溶解器中攪拌混合50分鐘。將所得之混合液2000g通過高壓分散裝置(商品名:超高壓均質器M110-E/H、Microfluidics Corporation 製),以175MPa處理1次,調製光吸收材料分散液。將此以日本精線(股)製之FINEMET NF過濾,調製光吸收材料添加液。<Example 18> (Preparation of light-absorbing material additive solution) 95 parts by mass of dichloromethane was put into an airtight container, and 5 parts by mass of light absorbing material B ((meth)acrylic acid polymer particles) was added with stirring. Then, stir and mix in the dissolver for 50 minutes. 2000 g of the obtained mixed solution was passed through a high-pressure dispersing device (trade name: ultra-high pressure homogenizer M110-E/H, manufactured by Microfluidics Corporation), and treated once at 175 MPa to prepare a light-absorbing material dispersion. This was filtered through Finemet NF manufactured by Nippon Seisen Co., Ltd. to prepare a light-absorbing material additive solution.

(表層用膠漿之調製) 調製下述組成的膠漿。首先,在加壓溶解槽中添加二氯甲烷與乙醇。將COP6(環烯烴樹脂)、上述光吸收材料添加液(光吸收材料)邊攪拌邊投入上述加壓溶解槽中,邊加熱、攪拌使完全溶解。將此使用安積濾紙(股)製之安積濾紙No.244過濾調製膠漿。 二氯甲烷:300質量份 乙醇:19質量份 COP6(環烯烴樹脂):100質量份 光吸收材料添加液(光吸收材料B):75質量份(Preparation of glue for the surface layer) A dope of the following composition was prepared. First, methylene chloride and ethanol were added to a pressurized dissolution tank. COP6 (cycloolefin resin) and the above-mentioned light-absorbing material additive solution (light-absorbing material) were poured into the above-mentioned pressurized dissolution tank while stirring, and heated and stirred to completely dissolve. This was filtered using Azumi filter paper No. 244 manufactured by Azumi Filter Paper Co., Ltd. to prepare dope. Dichloromethane: 300 parts by mass Ethanol: 19 parts by mass COP6 (cycloolefin resin): 100 parts by mass Light-absorbing material additive solution (light-absorbing material B): 75 parts by mass

(基材層用膠漿之調製) 上述膠漿之調製中,除未添加光吸收材料添加液外,同樣地調製膠漿。(Preparation of glue for substrate layer) In the preparation of the dope mentioned above, the dope was prepared in the same manner except that the light-absorbing material additive liquid was not added.

(製膜) 接著,使用環帶式流延裝置,將表層用膠漿及基材層用膠漿在溫度33℃、1500mm寬,均勻地共流延於不銹鋼帶支撐體上。不銹鋼帶之溫度控制在30℃。使溶劑蒸發,直到共流延至不銹鋼帶支撐體上之膠漿中的殘留溶劑量成為30質量%為止後,以剝離張力130N/m,由不銹鋼帶支撐體上剝離。 將剝離所得之流延膜,在160℃(樹脂之Tg-10℃)的條件下,在寬度方向(TD方向)以延伸率50%進行延伸。延伸開始時之殘留溶劑為10質量%。接著,將乾燥區以多數滾輪邊搬送,邊以130℃使乾燥。然後,經捲繞得到具有表層/基材層/表層之3層構造的光學薄膜。(film making) Next, using an endless-belt casting device, the glue for the surface layer and the glue for the substrate layer were evenly co-cast on the stainless steel belt support at a temperature of 33° C. and a width of 1500 mm. The temperature of the stainless steel strip is controlled at 30°C. The solvent was evaporated until the amount of residual solvent in the dope co-cast on the stainless steel tape support reached 30% by mass, and then peeled from the stainless steel tape support at a peeling tension of 130 N/m. The cast film obtained by peeling was stretched at an elongation rate of 50% in the width direction (TD direction) under the condition of 160°C (Tg-10°C of the resin). The residual solvent at the start of elongation was 10% by mass. Next, drying was carried out at 130° C. while being conveyed by many rollers in the drying zone. Then, an optical film having a three-layer structure of surface layer/substrate layer/surface layer was obtained by winding.

<實施例19~21> 除了將基材層與表層之組成變更為如表2所示外,與實施例18同樣得到光學薄膜。<Examples 19~21> An optical film was obtained in the same manner as in Example 18, except that the compositions of the substrate layer and the surface layer were changed as shown in Table 2.

<實施例22~26、比較例10> 除了將基材層及表層之光吸收材料之種類及厚度變更為如表3所示外,與實施例4同樣得到具有表層/基材層/表層之3層構造的光學薄膜。<Examples 22 to 26, Comparative Example 10> An optical film having a three-layer structure of surface layer/substrate layer/surface layer was obtained in the same manner as in Example 4, except that the types and thicknesses of the light-absorbing materials of the substrate layer and surface layer were changed as shown in Table 3.

<比較例2~4> 與國際公開第2018/139638號之製造例3、4及7同樣得到光學薄膜。<Comparative examples 2~4> Optical films were obtained in the same manner as Production Examples 3, 4, and 7 of International Publication No. 2018/139638.

<比較例5> 與國際公開第2015/098956號之實施例4同樣得到光學薄膜。<Comparative example 5> An optical film was obtained in the same manner as in Example 4 of International Publication No. 2015/098956.

<比較例6> 除了將基材層中之光吸收材料E之含量變更為如表3所示,且未形成表層外,與實施例12同樣得到光學薄膜(單層薄膜)。<Comparative example 6> An optical film (single-layer film) was obtained in the same manner as in Example 12, except that the content of the light-absorbing material E in the substrate layer was changed as shown in Table 3, and no surface layer was formed.

<比較例7> 除了將光吸收材料B之含量變更為如表3所示外,與比較例6同樣得到光學薄膜(單層薄膜)。<Comparative example 7> An optical film (single-layer film) was obtained in the same manner as in Comparative Example 6 except that the content of the light-absorbing material B was changed as shown in Table 3.

<比較例8> 將國際公開第2018/139638號之製造例1使用的熱塑性樹脂(J0)以100℃乾燥5小時。乾燥後之熱塑性樹脂(J0)供給擠壓機,在擠壓機內使熔融。將熔融後的熱塑性樹脂(J0)通過聚合物管(pipe)及聚合物過濾器,由T模,成薄片狀擠壓至流延鼓(casting drum)上。將擠壓後的熱塑性樹脂(J0)冷卻,得到厚度70μm之延伸前基材。將所得之基材延伸1.4倍,得到厚度50μm之光學薄膜。<Comparative example 8> The thermoplastic resin (J0) used in Production Example 1 of International Publication No. 2018/139638 was dried at 100° C. for 5 hours. The dried thermoplastic resin (J0) is supplied to an extruder and melted in the extruder. The melted thermoplastic resin (J0) passes through a polymer pipe (pipe) and a polymer filter, and is extruded in thin sheets from a T-die onto a casting drum (casting drum). The extruded thermoplastic resin (J0) was cooled to obtain a 70 μm thick base material before stretching. The obtained substrate was stretched 1.4 times to obtain an optical film with a thickness of 50 μm.

<比較例9> 在比較例8之光學薄膜上,除了不含有光吸收材料外,塗佈與實施例2之硬化性組成物同樣之硬化性組成物後,使乾燥及硬化,形成表層,得到光學薄膜。<Comparative example 9> The optical film of Comparative Example 8 was coated with the same curable composition as the curable composition of Example 2 except that no light-absorbing material was included, and then dried and cured to form a surface layer to obtain an optical film.

<評價> 使用以下的方法評價所得之光學薄膜之吸光係數及滲出之有無。滲出係僅針對一部分之實施例及比較例進行。<Evaluation> The absorption coefficient and the presence or absence of bleeding of the obtained optical film were evaluated by the following methods. Bleeding was carried out only for a part of Examples and Comparative Examples.

(1)吸光係數之比(As/Ac) 1)首先,使用顯微FTIR(Agilent製「UMA600」及「FTS3000」),以ATR法在入射光徑:100μm、稜鏡:Ge(入射角45°)、檢測器:MCT-A、分解能:4.0cm-1 、積算:64的條件下,測定紅外線吸收光譜。由所得之紅外線吸收光譜,讀取相當於波長9.6μm之部分(頻率1041cm-1 )的吸光度,得到光學薄膜全體之吸光度A。 2)接著,由光學薄膜之一面a,切削厚度之30%。然後,與上述1)同樣地測定切削所得之面的吸光度A1。 3)又,由光學薄膜之另外的面b,切削厚度之30%。然後,與上述1)同樣地測定切削所得之面的吸光度A2。 4)將上述1)~3)所得之吸光度A、A1及A2,帶入下述式,分別算出表層區域之吸光係數As及內層區域之吸光係數Ac。 表面吸光係數As=(A-A1)×loge10÷(0.3T) 內部吸光係數Ac=A2×loge10÷(0.4T) (T:光學薄膜之厚度 A:光學薄膜之吸光度 A1:由光學薄膜之一面10a,切削光學薄膜之厚度T之30%部分,測定的吸光度 A2:由光學薄膜之另外的面10b,切削光學薄膜之厚度T之30%部分,測定的吸光度)(1) Ratio of Absorption Coefficient (As/Ac) 1) First, using a microscope FTIR ("UMA600" and "FTS3000" manufactured by Agilent), by ATR method, the incident light path: 100 μm, 騜鏡: Ge (incident angle 45 °), detector: MCT-A, resolution: 4.0cm -1 , integration: 64, the infrared absorption spectrum was measured. From the obtained infrared absorption spectrum, the absorbance at a portion corresponding to a wavelength of 9.6 µm (frequency 1041 cm -1 ) was read to obtain the absorbance A of the entire optical film. 2) Next, cut 30% of the thickness from one side a of the optical film. Then, the absorbance A1 of the cut surface was measured in the same manner as in the above 1). 3) Also, cut 30% of the thickness from the other side b of the optical film. Then, the absorbance A2 of the cut surface was measured in the same manner as in 1) above. 4) Put the absorbance A, A1 and A2 obtained in the above 1) to 3) into the following formula to calculate the light absorption coefficient As of the surface area and the light absorption coefficient Ac of the inner area respectively. Surface absorption coefficient As=(A-A1)×loge10÷(0.3T) Internal absorption coefficient Ac=A2×loge10÷(0.4T) (T: Thickness of optical film A: Absorbance of optical film A1: From one side of optical film 10a, the absorbance measured by cutting 30% of the thickness T of the optical film A2: the absorbance measured by cutting 30% of the thickness T of the optical film from the other surface 10b of the optical film)

(2)滲出 將所得之薄膜投入90℃之高溫加熱裝置(thermo)與80℃90%RH之濕熱加熱裝置中3000小時。随時取出後,觀察薄膜之表面析出物之有無。觀察係在暗室中,照綠燈來進行。 然後,觀察到析出物為止所需的時間示於表2及3。(2) Seepage The obtained film was put into a high-temperature heating device (thermo) at 90° C. and a humid heat heating device at 80° C. 90% RH for 3000 hours. After taking it out at any time, observe whether there are precipitates on the surface of the film. Observations were made in a dark room under a green light. Then, the time required until the precipitate was observed is shown in Tables 2 and 3.

又,使用所得之光學薄膜,製作偏光板及顯示裝置。然後,使用以下的方法評價偏光板品質及漏光。Moreover, using the obtained optical film, a polarizing plate and a display device were produced. Then, the polarizing plate quality and light leakage were evaluated by the following methods.

(3)偏光板之評價(偏光板品質) (偏光鏡之製作) 準備聚合度2400、皂化度99.7莫耳%、厚度75μm之PVA樹脂薄膜。將該薄膜在30℃之碘水溶液中邊染色,邊在薄膜搬送方向延伸3倍,接著,在60℃之4質量%硼酸、5質量%之碘化鉀水溶液中,使總拉伸率成為原有長度之6倍進行延伸。此外,將延伸後之薄膜在30℃之2質量%之碘化鉀水溶液中浸漬數秒洗淨。所得之延伸薄膜以90℃乾燥,得到偏光鏡。(3) Evaluation of polarizers (quality of polarizers) (Making of Polarizers) A PVA resin film with a degree of polymerization of 2400, a degree of saponification of 99.7 mol%, and a thickness of 75 μm was prepared. The film was stretched 3 times in the film conveying direction while being dyed in an iodine aqueous solution at 30°C, and then the total stretching ratio was brought to the original length in 4 mass % boric acid and 5 mass % potassium iodide aqueous solution at 60 °C. 6 times to extend. In addition, the stretched film was dipped in a 2% by mass potassium iodide aqueous solution at 30° C. for several seconds and washed. The obtained stretched film was dried at 90° C. to obtain a polarizer.

(偏光板之製作) 在光學薄膜之表層(或光吸收層),介於接著劑,貼合偏光鏡,在背面介於接著劑,貼合PET薄膜,製作偏光板。(Production of Polarizing Plate) On the surface layer (or light-absorbing layer) of the optical film, the adhesive agent is interposed, and the polarizer is pasted, and the adhesive agent is interposed on the back side, and the PET film is pasted to make a polarizing plate.

(雷射切斷性) 將所得之偏光板,以波長9.6μm之二氧化碳雷射照射於光學薄膜,切斷偏光板。切斷條件為頻率20kHz、輸出:59W、速度:60m/min。顯微鏡確認評價切斷長度10cm之表面附近。 S:完全無污染或煤煙 A:僅在切斷部稍微可看見污染或煤煙 B:僅在切斷部周邊稍微可看見污染或煤煙 C:污染或煤煙明顯,但是可清洗 ×:污染嚴重無法使用 C以上時,判斷為良好。(Laser cutting property) The obtained polarizing plate was irradiated on the optical film with a carbon dioxide laser having a wavelength of 9.6 μm, and the polarizing plate was cut. Cutting conditions were frequency 20 kHz, output: 59 W, and speed: 60 m/min. Microscopically confirmed and evaluated the vicinity of the surface with a cut length of 10 cm. S: No pollution or soot at all A: Pollution or soot can be seen slightly only at the cut part B: Pollution or soot is slightly visible only around the cut portion C: Pollution or soot is evident, but washable ×: Severely polluted and unusable When C or more, it judged as favorable.

(4)顯示裝置之評價(漏光) 首先,將預先貼合於IPS型液晶顯示裝置之日立製液晶顯示裝置Wooo W32L-H90之偏光板,小心謹慎剝離。然後,與原先貼著之偏光板之穿透軸一致,黏貼雷射切割之偏光板,製作液晶顯示裝置。雷射切割之偏光板之黏貼係使本發明之光學薄膜成為液晶胞側方式來進行。(4) Evaluation of display devices (light leakage) First, carefully peel off the polarizing plate of Wooo W32L-H90, a liquid crystal display device manufactured by Hitachi, which has been attached to the IPS liquid crystal display device in advance. Then, stick the laser-cut polarizing plate in line with the penetration axis of the previously attached polarizing plate to make a liquid crystal display device. The lamination of the laser-cut polarizing plate is carried out by making the optical film of the present invention the side of the liquid crystal cell.

然後,將所得之液晶顯示裝置在全面黑顯示的狀態下,在暗室中目視觀察,以10人評價端部之漏光。 SS:10人皆完全未看見漏光 S:10人中1人可看見微弱漏光 A:10人中2~3人可看見微弱漏光 B:10人中4~6人可看見微弱漏光 C:10人中,7人以上可看見微弱漏光。實用上無問題。 ×:10人皆可看見強的漏光 C以上時,判斷為良好。Then, the obtained liquid crystal display device was visually observed in a dark room in a state where the entire surface was displayed in black, and 10 persons evaluated the light leakage at the edge. SS: None of the 10 people saw the light leak at all S: 1 out of 10 people can see faint light leakage A: 2~3 out of 10 people can see weak light leakage B: 4~6 out of 10 people can see faint light leakage C: Out of 10 persons, 7 or more persons could see faint light leakage. There is no problem practically. ×: Strong light leakage can be seen by 10 people When C or more, it judged as favorable.

實施例1~21之光學薄膜之組成及評價結果示於表2,實施例22~26及比較例1~10之光學薄膜之組成及評價結果示於表3。

Figure 02_image017
Figure 02_image019
The compositions and evaluation results of the optical films of Examples 1-21 are shown in Table 2, and the compositions and evaluation results of the optical films of Examples 22-26 and Comparative Examples 1-10 are shown in Table 3.
Figure 02_image017
Figure 02_image019

如表2及3所示,吸光係數比As/Ac調整為1.1~20之實施例1~26之光學薄膜,得知雷射切斷性佳,偏光板之品質優(污染少)。又,得知所得之顯示裝置也無漏光。As shown in Tables 2 and 3, the optical films of Examples 1 to 26 with the light absorption ratio As/Ac adjusted to 1.1 to 20 have good laser cutting properties and high quality polarizers (less contamination). Also, it was found that the obtained display device had no light leakage.

相對於此,吸光係數比As/Ac為未達1.1之比較例1~3及6~8之光學薄膜,得知雷射切斷性差,偏光板之品質差。而As/Sc為超過20之比較例4、5、9及10之光學薄膜,得知顯示裝置產生漏光。On the other hand, the optical films of Comparative Examples 1 to 3 and 6 to 8 in which the absorptivity ratio As/Ac was less than 1.1 showed poor laser cutting properties and poor quality of polarizing plates. As for the optical films of Comparative Examples 4, 5, 9, and 10 whose As/Sc exceeds 20, it is known that light leakage occurs in the display device.

本申請案係依據2020年7月29日申請之特願2020-128426主張優先權。本案說明書中全部引用該出願說明書及圖面所記載的內容。 [產業上之可利用性]This application claims priority based on Japanese Patent Application No. 2020-128426 filed on July 29, 2020. All the content recorded in the petition statement and drawings are quoted in the statement of this case. [Industrial availability]

依據本發明時,可提供顯示裝置中不會產生漏光,可提供藉由雷射光之切斷性的光學薄膜、偏光板及液晶顯示裝置。According to the present invention, it is possible to provide an optical film, a polarizing plate, and a liquid crystal display device capable of cutting off by laser light without causing light leakage in a display device.

10:光學薄膜 11:基材層 12,13:表層 20:偏光鏡 30:其他的光學薄膜 40:接著層 100:偏光板 200:積層物 Sa,Sb:表層區域 C:內層區域 L:雷射光10:Optical film 11: Substrate layer 12,13: surface layer 20: Polarizer 30:Other optical films 40: Next layer 100: polarizer 200: laminate Sa, Sb: surface area C: inner area L: laser light

[圖1]圖1係表示光學薄膜之表層區域及內層區域的斷面示意圖。 [圖2]圖2A係表示本實施形態之光學薄膜之構成的斷面圖,圖2B係表示變形例之光學薄膜之構成的斷面圖。 [圖3]圖3係表示本實施形態之偏光板之構成的斷面圖。 [圖4]圖4A及B係表示圖3之偏光板之製造方法的斷面圖。[Fig. 1] Fig. 1 is a schematic cross-sectional view showing the surface layer region and the inner layer region of an optical film. [FIG. 2] FIG. 2A is a cross-sectional view showing the structure of the optical film of this embodiment, and FIG. 2B is a cross-sectional view showing the structure of the optical film of the modified example. [ Fig. 3] Fig. 3 is a cross-sectional view showing the configuration of a polarizing plate according to this embodiment. [FIG. 4] FIGS. 4A and B are cross-sectional views showing a method of manufacturing the polarizing plate shown in FIG. 3. [FIG.

10:光學薄膜 10:Optical film

Sa,Sb:表層區域 Sa, Sb: surface area

C:內層區域 C: inner area

Claims (13)

一種光學薄膜,其係包含環烯烴樹脂的光學薄膜,由前述光學薄膜之一面至前述光學薄膜之厚度之30%之深度的區域作為表層區域(Sa),由前述光學薄膜之另一面至前述光學薄膜之厚度之30%之深度的區域作為表層區域(Sb),前述表層區域(Sa)與前述表層區域(Sb)之間的區域作為內層區域(C)時,至少前述表層區域(Sa)之以ATR法測定之波長9.6μm之光的吸收係數As與前述內層區域(C)之以ATR法測定之波長9.6μm之光之吸收係數Ac之比As/Ac為1.1~20,前述光學薄膜之波長9.6μm之光的吸收係數為1.5×10-5/μm以上。 An optical film, which is an optical film comprising a cycloolefin resin, the area from one surface of the optical film to the depth of 30% of the thickness of the optical film is defined as the surface area (Sa), and the area from the other surface of the optical film to the optical When the area at the depth of 30% of the thickness of the film is the surface area (Sb), and the area between the aforementioned surface area (Sa) and the aforementioned surface area (Sb) is the inner area (C), at least the aforementioned surface area (Sa) The ratio As/Ac of the absorption coefficient As of the light with a wavelength of 9.6 μm measured by the ATR method and the absorption coefficient Ac of the light of the wavelength of 9.6 μm measured by the ATR method in the inner layer region (C) As/Ac is 1.1~20. The film has an absorption coefficient of light with a wavelength of 9.6 μm of 1.5×10 -5 /μm or more. 如請求項1之光學薄膜,其中前述比As/Ac為3~15。 The optical film according to claim 1, wherein the aforementioned ratio As/Ac is 3-15. 如請求項1之光學薄膜,其中前述表層區域(Sa)及前述內層區域(C)係分別包含波長9.6μm之光的吸光係數為4.0×10-3/μm以上的光吸收材料。 The optical film according to claim 1, wherein the surface region (Sa) and the inner region (C) respectively contain light-absorbing materials with an absorption coefficient of 4.0×10 -3 /μm or more for light with a wavelength of 9.6 μm. 如請求項3之光學薄膜,其中前述表層區域(Sa)中之前述光吸收材料之含量Ms比前述內層區域(C)中之前述光吸收材料的含量Mc多。 The optical film according to claim 3, wherein the content Ms of the light-absorbing material in the surface region (Sa) is greater than the content Mc of the light-absorbing material in the inner layer region (C). 如請求項4之光學薄膜,其中Ms/Mc為2.5~20。 Such as the optical film of claim 4, wherein Ms/Mc is 2.5~20. 如請求項3~5中任一項之光學薄膜,其係 具有包含環烯烴樹脂與前述光吸收材料之基材層,與積層於前述基材層之至少一面,包含環烯烴樹脂與前述光吸收材料,或包含作為前述光吸收材料之(甲基)丙烯酸樹脂之表層,前述表層中之前述光吸收材料Ms’之含量,比前述基材層中之前述光吸收材料之含量Mc’多。 Such as the optical film of any one of claims 3 to 5, which is A substrate layer comprising a cycloolefin resin and the light-absorbing material, and at least one side of the substrate layer, comprising a cycloolefin resin and the light-absorbing material, or a (meth)acrylic resin as the light-absorbing material In the surface layer, the content of the light-absorbing material Ms' in the surface layer is greater than the content Mc' of the light-absorbing material in the base layer. 如請求項6之光學薄膜,其中Ms’/Mc’為2.5~50。 Such as the optical film of claim 6, wherein Ms'/Mc' is 2.5~50. 如請求項3~5中任一項之光學薄膜,其係具有包含前述環烯烴樹脂與前述光吸收材料之基材層,與積層於前述基材層之至少一面,由包含作為前述光吸收材料之硬化性化合物與硬化劑之硬化性組成物之硬化物所構成的表層,前述硬化性化合物係具有與硬化劑反應之基的胺基甲酸酯化合物。 The optical film according to any one of Claims 3 to 5, which has a substrate layer comprising the aforementioned cycloolefin resin and the aforementioned light-absorbing material, and is laminated on at least one side of the aforementioned substrate layer, and comprises the aforementioned light-absorbing material as A surface layer composed of a cured product of a curable composition of a hardening compound and a hardening agent, wherein the hardening compound is a urethane compound having a group reactive with the hardening agent. 如請求項8之光學薄膜,其中前述光吸收材料包含酯化合物或(甲基)丙烯酸聚合物粒子。 The optical film according to claim 8, wherein the light-absorbing material comprises ester compounds or (meth)acrylic polymer particles. 如請求項9之光學薄膜,其中前述光吸收材料為醣酯化合物。 The optical film according to claim 9, wherein the light-absorbing material is a sugar ester compound. 一種偏光板,其係具有偏光鏡,配置於前述偏光鏡之至少一面之如請求項1~10中任一項之光學薄膜。 A polarizing plate, which has a polarizer, and the optical film according to any one of claims 1-10 arranged on at least one side of the polarizer. 如請求項11之偏光板,其中前述光學薄膜之前述表層區域(Sa)所含有的面係與前述偏光鏡接著。 The polarizing plate according to claim 11, wherein the surface contained in the surface region (Sa) of the optical film is bonded to the polarizer. 一種液晶顯示裝置,其係具有液晶胞,與挟持液晶胞之第一偏光板及第二偏光板,第一偏光板及第二偏光板之至少一者為如請求項11或12之偏光板。 A liquid crystal display device comprising a liquid crystal cell, a first polarizer and a second polarizer holding the liquid crystal cell, at least one of the first polarizer and the second polarizer is the polarizer according to claim 11 or 12.
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