TWI783710B - Protection circuit - Google Patents

Protection circuit Download PDF

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TWI783710B
TWI783710B TW110136981A TW110136981A TWI783710B TW I783710 B TWI783710 B TW I783710B TW 110136981 A TW110136981 A TW 110136981A TW 110136981 A TW110136981 A TW 110136981A TW I783710 B TWI783710 B TW I783710B
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voltage
detection
power pad
coupled
protection circuit
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TW110136981A
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TW202316615A (en
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黃紹璋
李慶和
廖顯峰
莊介堯
周業甯
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世界先進積體電路股份有限公司
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Abstract

A protection circuit is provided. The protection circuit includes a detection circuit and a discharge circuit. The detection circuit is coupled to a first power pad and a second power pad and configured to detect whether an electrostatic discharge (ESD) event or an electrical overstress (EOS) event occurs at the first power pad. The detection circuit controls a detection voltage at a detection node according to a detection result. The first power pad and the second power pad belong to different power domains. The discharge circuit is coupled to the detection node and the first power pad. In response to the ESD event occurring at the first power pad, the discharge circuit provides a discharge path between the first power pad and a ground according to the detection voltage. In response to the EOS event occurring at the first power pad, the detection circuit enables a second discharge path between the first power pad and the ground.

Description

保護電路protect the circuit

本發明是有關於一種保護電路,特別是有關於一種用於靜電放電與過度電性應力的保護電路。The present invention relates to a protection circuit, in particular to a protection circuit for electrostatic discharge and excessive electrical stress.

積體電路隨著半導體製程的發展,元件尺寸已縮小至次微米階段,以增進積體電路的性能以及運算速度,但元件尺寸的縮減,卻出現了一些可靠度的問題,尤以積體電路對靜電放電(electrostatic discharge,ESD)的防護能力影響最大。當元件尺寸由於先進的製程技術而減小,靜電放電的防護能力也降低許多,結果造成元件的靜電放電耐受力大幅降低。因此,需要保護電路來保護元件不受靜電放電所損壞。然而,用於靜電放電的現有保護電路沒有應付過度電性應力(electrical overstress,EOS)的能力。因此,當在保護電路的一接合墊發生過度電性應力時,過大的電壓會導致保護電路內的元件損壞,導致保護電路失去了用於靜電放電的防護能力。Integrated circuits With the development of semiconductor manufacturing process, the size of components has been reduced to the sub-micron stage to improve the performance and operation speed of integrated circuits. However, the reduction of component sizes has caused some reliability problems, especially for integrated circuits. It has the greatest impact on the protection ability of electrostatic discharge (ESD). When the component size is reduced due to advanced process technology, the ESD protection ability is also greatly reduced, resulting in a significant decrease in the ESD tolerance of the component. Therefore, protection circuits are required to protect components from electrostatic discharge damage. However, existing protection circuits for ESD are not capable of coping with electrical overstress (EOS). Therefore, when an excessive electrical stress occurs on a bonding pad of the protection circuit, the excessive voltage will cause damage to components in the protection circuit, causing the protection circuit to lose its protection against ESD.

有鑑於此,本發明提出一種保護電路,其具有一第一電源接合墊以及一第二電源接合墊。保護電路包括一偵測電路以及一放電電路。偵測電路耦接第一電源接合墊以及第二電源接合墊,用以偵測在第一電源接合墊上是否發生一靜電放電事件或一過度電性應力事件。保護電路根據一偵測結果控制在一偵測節點上的一偵測電壓。第一電源接合墊與第二電源接合墊分別屬於不同的電源域。放電電路耦接偵測節點以及第一電源接合墊。當在第一電源接合墊上發生靜電放電事件時,放電電路根據偵測電壓提供介於第一電源接合墊與一接地端之間的一第一放電路徑。當在第一電源接合墊上發生過度電性應力事件時,偵測電路致能介於第一電源接合墊與接地端之間的一第二放電路徑。In view of this, the present invention proposes a protection circuit, which has a first power pad and a second power pad. The protection circuit includes a detection circuit and a discharge circuit. The detection circuit is coupled to the first power bonding pad and the second power bonding pad, and is used for detecting whether an electrostatic discharge event or an excessive electrical stress event occurs on the first power bonding pad. The protection circuit controls a detection voltage on a detection node according to a detection result. The first power bonding pad and the second power bonding pad belong to different power domains respectively. The discharge circuit is coupled to the detection node and the first power pad. When an electrostatic discharge event occurs on the first power pad, the discharge circuit provides a first discharge path between the first power pad and a ground terminal according to the detection voltage. When an excessive electrical stress event occurs on the first power pad, the detection circuit enables a second discharge path between the first power pad and the ground terminal.

本發明另提出一種保護電路,其包括偵測電路以及放電電路。偵測電路包括第一電晶體、電阻元件、以及第二電晶體。第一電晶體具有耦接一第一電源接合墊的一第一端、耦接一第一節點的一第二端、以及耦接一第二電源接合墊的一控制端。第一電源接合墊與第二電源接合墊分別屬於不同的電源域。電阻元件耦接於第一節點與一接地端之間。第二電晶體具有耦接一偵測節點的一第一端、耦接接地端的一第二端、以及耦接第一節點的一控制端。放電電路耦接偵測節點以及第一電源接合墊,且包括一電阻器、一第三電晶體、一第四電晶體、以及一第五電晶體。電阻器耦接於第一電源接合墊與偵測節點之間。第三電晶體具有耦接第一電源接合墊的一第一端、耦接一第二節點的一第二端、以及耦接偵測節點的一控制端。第四電晶體具有耦接第二節點的一第一端、耦接接地端的一第二端、以及耦接偵測節點的一控制端。第五電晶體具有耦接第一電源接合墊的一第一端、耦接接地端的一第二端、以及耦接第二節點的一控制端。The present invention further provides a protection circuit, which includes a detection circuit and a discharge circuit. The detection circuit includes a first transistor, a resistance element, and a second transistor. The first transistor has a first end coupled to a first power pad, a second end coupled to a first node, and a control end coupled to a second power pad. The first power bonding pad and the second power bonding pad belong to different power domains respectively. The resistance element is coupled between the first node and a ground terminal. The second transistor has a first terminal coupled to a detection node, a second terminal coupled to the ground terminal, and a control terminal coupled to the first node. The discharge circuit is coupled to the detection node and the first power pad, and includes a resistor, a third transistor, a fourth transistor, and a fifth transistor. The resistor is coupled between the first power pad and the detection node. The third transistor has a first end coupled to the first power pad, a second end coupled to a second node, and a control end coupled to the detection node. The fourth transistor has a first terminal coupled to the second node, a second terminal coupled to the ground terminal, and a control terminal coupled to the detection node. The fifth transistor has a first terminal coupled to the first power pad, a second terminal coupled to the ground terminal, and a control terminal coupled to the second node.

為使本發明之上述目的、特徵和優點能更明顯易懂,下文特舉一較佳實施例,並配合所附圖式,作詳細說明如下。In order to make the above-mentioned purpose, features and advantages of the present invention more comprehensible, a preferred embodiment will be exemplified below and described in detail in conjunction with the accompanying drawings.

第1圖係表是根據本發明一實施例之保護電路。參閱第1圖,保護電路1包括偵測電路10以及放電電路11。保護電路1還包括兩電源接合墊PAD1與PAD2。當保護電路1在一操作模式下,電源接合墊PAD1與PAD2是屬於不同的電壓域。電源接合墊PAD1與PAD2各自所接收的電源電壓將於後文詳細說明。偵測電路10耦接電源接合墊PAD1與PAD2。放電電路11透過偵測節點N11耦接偵測電路10,且更耦接電源接合墊PAD1。Figure 1 is a table showing a protection circuit according to an embodiment of the present invention. Referring to FIG. 1 , the protection circuit 1 includes a detection circuit 10 and a discharge circuit 11 . The protection circuit 1 further includes two power bonding pads PAD1 and PAD2. When the protection circuit 1 is in an operation mode, the power pads PAD1 and PAD2 belong to different voltage domains. The power supply voltages received by the power pads PAD1 and PAD2 will be described in detail later. The detection circuit 10 is coupled to the power pads PAD1 and PAD2. The discharge circuit 11 is coupled to the detection circuit 10 through the detection node N11, and is further coupled to the power pad PAD1.

偵測電路10偵測在電源接合墊PAD1上是否發生靜電放電(electrostatic discharge,ESD)事件或過度電性應力(electrical overstress,EOS)事件,且根據表示發生靜電放電事件或過度電性應力事件的偵測結果來控制在偵測節點N11上的偵測電壓。當在電源接合墊PAD1上發生靜電放電事件時,放電電路11根據偵測節點N11上的偵測電壓提供介於該電源接合墊PAD1與接地端GND之間的一放電路徑。當在電源接合墊PAD1上發生過度電性應力事件時,偵測電路10致能介於電源接合墊PAD與接地端GND之間的至少一放電路徑。根據本發明之實施例,本案的保護電路1不僅提供了用於靜電放電的防護,也提供了用於過度電性應力的防護。保護電路1的詳細電路架構與操作將於下文說明。The detection circuit 10 detects whether an electrostatic discharge (ESD) event or an electrical overstress (EOS) event occurs on the power bonding pad PAD1, and according to the occurrence of the electrostatic discharge event or the electrical overstress event The detection result is used to control the detection voltage on the detection node N11. When an electrostatic discharge event occurs on the power pad PAD1 , the discharge circuit 11 provides a discharge path between the power pad PAD1 and the ground terminal GND according to the detection voltage on the detection node N11 . When an excessive electrical stress event occurs on the power pad PAD1 , the detection circuit 10 enables at least one discharge path between the power pad PAD and the ground terminal GND. According to an embodiment of the present invention, the protection circuit 1 of the present invention not only provides protection for electrostatic discharge, but also provides protection for excessive electrical stress. The detailed circuit structure and operation of the protection circuit 1 will be described below.

如第1圖所示,偵測電路10包括電晶體100與101以及電阻元件102。此實施例中,電晶體100係以P型金氧半(P-type Metal-Oxide-Semiconductor,PMOS)電晶體來實現,而電晶體101係以N型金氧半(N-type Metal-Oxide-Semiconductor,NMOS)電晶體來實現。PMOS電晶體100的第一端(源極)耦接電源接合墊PAD1,其第二端(汲極)耦接節點N10,且其控制端(閘極)耦接電源接合墊PAD2。NMOS電晶體101的第一端(汲極)耦接偵測節點N11,其第二端(源極)耦接接地端GND,且其控制端(閘極)耦接節點N10。在此實施例中,電阻元件102包括電阻器R10。電阻器R10耦接於節點N10與接地端GND之間。As shown in FIG. 1 , the detection circuit 10 includes transistors 100 and 101 and a resistor 102 . In this embodiment, the transistor 100 is realized by a P-type Metal-Oxide-Semiconductor (PMOS) transistor, and the transistor 101 is realized by an N-type Metal-Oxide-Semiconductor (N-type Metal-Oxide-Semiconductor). -Semiconductor, NMOS) transistors to achieve. A first end (source) of the PMOS transistor 100 is coupled to the power pad PAD1, a second end (drain) thereof is coupled to the node N10, and a control end (gate) thereof is coupled to the power pad PAD2. A first terminal (drain) of the NMOS transistor 101 is coupled to the detection node N11, a second terminal (source) thereof is coupled to the ground terminal GND, and a control terminal (gate) thereof is coupled to the node N10. In this embodiment, the resistive element 102 includes a resistor R10. The resistor R10 is coupled between the node N10 and the ground terminal GND.

放電電路11包括電晶體110~112、電阻器113、以及電容器114。電阻器113耦接於電源接合墊PAD1與偵測節點N11之間。電容器114耦接於偵測節點N11與接地端之間。在此實施例中,電晶體110係以PMOS電晶體來實施,而電晶體111~112係以NMOS電晶體來實現。PMOS電晶體110的第一端耦接電源接合墊PAD1,其第二端耦接節點N12,且其控制端耦接偵測節點N11。NMOS型電晶體111的第一端耦接節點N12,其第二端耦接接地端GND,且其控制端耦接偵測節點N11。NMOS電晶體112的第一端耦接電源接合墊PAD1,其第二端耦接接地端GND,且其控制端耦接節點N12。The discharge circuit 11 includes transistors 110 - 112 , a resistor 113 , and a capacitor 114 . The resistor 113 is coupled between the power pad PAD1 and the detection node N11. The capacitor 114 is coupled between the detection node N11 and the ground. In this embodiment, the transistor 110 is implemented as a PMOS transistor, and the transistors 111 - 112 are implemented as NMOS transistors. A first terminal of the PMOS transistor 110 is coupled to the power pad PAD1 , a second terminal thereof is coupled to the node N12 , and a control terminal thereof is coupled to the detection node N11 . A first terminal of the NMOS transistor 111 is coupled to the node N12 , a second terminal thereof is coupled to the ground terminal GND, and a control terminal thereof is coupled to the detection node N11 . A first terminal of the NMOS transistor 112 is coupled to the power pad PAD1 , a second terminal thereof is coupled to the ground terminal GND, and a control terminal thereof is coupled to the node N12 .

在第1圖的實施例中,PMOS電晶體100的閘極氧化層的厚度較佳地大於PMOS電晶體110的閘極氧化層的厚度。因此,PMOS電晶體100與110的閘極以不同的圖樣來表示,然而本發明並不以此為限。在其他實施例中,PMOS電晶體100的閘極氧化層的厚度可等於或小於PMOS電晶體110的閘極氧化層的厚度。In the embodiment of FIG. 1 , the thickness of the gate oxide layer of the PMOS transistor 100 is preferably greater than the thickness of the gate oxide layer of the PMOS transistor 110 . Therefore, the gates of the PMOS transistors 100 and 110 are shown in different patterns, but the invention is not limited thereto. In other embodiments, the thickness of the gate oxide layer of the PMOS transistor 100 may be equal to or smaller than the thickness of the gate oxide layer of the PMOS transistor 110 .

參閱第2圖,當保護電路1處於操作模式下正常操作時,一操作電壓提供給電源接合墊PAD1,另一操作電壓提供給電源接合墊PAD2,且接地端GND具有接地電壓(例如0伏特(V))。在此實施例中,提供給電源接合墊PAD2的操作電壓大於或等於提供給電源接合墊PAD1的操作電壓,例如,提供給電源接合墊PAD1的操作電壓為18V且提供給電源接合墊PAD2的操作電壓為24V。因此,電源接合墊PAD1的電壓VP1為18V,且電源接合墊PAD2的電壓VP2為24V。Referring to FIG. 2, when the protection circuit 1 is operating normally in the operating mode, one operating voltage is provided to the power bonding pad PAD1, and the other operating voltage is provided to the power bonding pad PAD2, and the ground terminal GND has a ground voltage (for example, 0 volts ( V)). In this embodiment, the operating voltage supplied to the power pad PAD2 is greater than or equal to the operating voltage supplied to the power pad PAD1, for example, the operating voltage supplied to the power pad PAD1 is 18V and the operation voltage supplied to the power pad PAD2 The voltage is 24V. Therefore, the voltage VP1 of the power pad PAD1 is 18V, and the voltage VP2 of the power pad PAD2 is 24V.

基於電壓VP1與VP2,PMOS電晶體100關斷。在第2圖以及後續圖示中,關斷的電晶體將以”(OFF)”標示。此時,由於PMOS電晶體100被關斷且電阻器R10耦接接地端GND,節點N10上的電壓V10處於低位準。參閱第4圖,電壓V10大約為接地端GND的電壓位準(0V)。根據0V的電壓V10,NMOS電晶體101關斷(OFF)。此外,反應於電壓VP1,偵測節點N11上的偵測電壓V11大約等於電壓VP1。舉例而言,參閱第4圖,偵測電壓V11大約等於18V(V11≈18V)。根據大約18V的偵測電壓V11,PMOS電晶體110關斷(OFF),且NMOS電晶體111導通(ON)。在第2圖以及後續圖示中,導通的電晶體將以”(ON)”標示。由於NMOS電晶體111導通,節點N12上的電壓V12接近或等於接地端GND的電壓位準(0V),以使得NMOS電晶體112關斷(OFF)。Based on the voltages VP1 and VP2, the PMOS transistor 100 is turned off. In Figure 2 and subsequent figures, transistors that are turned off will be marked with "(OFF)". At this time, since the PMOS transistor 100 is turned off and the resistor R10 is coupled to the ground terminal GND, the voltage V10 on the node N10 is at a low level. Referring to FIG. 4, the voltage V10 is approximately the voltage level (0V) of the ground terminal GND. According to the voltage V10 of 0V, the NMOS transistor 101 is turned off (OFF). In addition, in response to the voltage VP1 , the detection voltage V11 on the detection node N11 is approximately equal to the voltage VP1 . For example, referring to FIG. 4 , the detection voltage V11 is approximately equal to 18V (V11≈18V). According to the detection voltage V11 of about 18V, the PMOS transistor 110 is turned off (OFF), and the NMOS transistor 111 is turned on (ON). In Figure 2 and subsequent figures, a transistor that is turned on will be marked with "(ON)". Since the NMOS transistor 111 is turned on, the voltage V12 on the node N12 is close to or equal to the voltage level (0V) of the ground terminal GND, so that the NMOS transistor 112 is turned off (OFF).

根據上述,當保護電路1在操作模式下正常操作時,偵測電路10的電晶體100與101關斷,使得偵測節點N11上的偵測電壓V11具有大約18V的位準。根據偵測電壓V11,放電電路11的電晶體110與112皆關斷。因此,偵測電路10未提供介於電源接合墊PAD1與接地端GND之間的任何電路路徑,放電電路11也未提供介於電源接合墊PAD1與接地端GND之間的任何電路路徑。According to the above, when the protection circuit 1 operates normally in the operation mode, the transistors 100 and 101 of the detection circuit 10 are turned off, so that the detection voltage V11 on the detection node N11 has a level of about 18V. According to the detection voltage V11, the transistors 110 and 112 of the discharge circuit 11 are both turned off. Therefore, the detection circuit 10 does not provide any circuit path between the power pad PAD1 and the ground terminal GND, and the discharge circuit 11 does not provide any circuit path between the power pad PAD1 and the ground terminal GND.

在正常操作期間,若電源接合墊PAD1遭遇到過度電性應力(即是,在電源接合墊PAD1上發生一過度電性應力事件),電源接合墊PAD1的電壓VP1而上升。參閱第3與4圖,舉例來說,在電源接合墊PAD1上發生一過度電性應力事件時,電源接合墊PAD1的電壓VP上升至30V。基於電壓VP1與VP2,PMOS電晶體100導通(ON)。由於PMOS電晶體100導通,因此在電源接合墊PAD1與接地端GND之間形成了一偵測路徑P10,也就是,偵測電路10透過PMOS電晶體100的導通而致能偵測路徑P10。此時,由於PMOS電晶體100被導通,節點N10上的電壓V10上升。參閱第4圖,當電壓VP1上升至30V時,電壓V10也上升。在此實施例中,根據PMOS電晶體100的尺寸以及電阻器R10的電阻值,於一實施例中,電壓V10上升後的位準低於偵測電壓V11,舉例而言,電壓V10大約小於等於5V。During normal operation, if the power pad PAD1 encounters excessive electrical stress (ie, an excessive electrical stress event occurs on the power pad PAD1 ), the voltage VP1 of the power pad PAD1 rises. Referring to FIGS. 3 and 4 , for example, when an excessive electrical stress event occurs on the power pad PAD1 , the voltage VP of the power pad PAD1 rises to 30V. Based on the voltages VP1 and VP2 , the PMOS transistor 100 is turned on (ON). Since the PMOS transistor 100 is turned on, a detection path P10 is formed between the power pad PAD1 and the ground terminal GND, that is, the detection circuit 10 enables the detection path P10 through the conduction of the PMOS transistor 100 . At this time, since the PMOS transistor 100 is turned on, the voltage V10 on the node N10 rises. Referring to Figure 4, when the voltage VP1 rises to 30V, the voltage V10 also rises. In this embodiment, according to the size of the PMOS transistor 100 and the resistance value of the resistor R10, in one embodiment, the raised level of the voltage V10 is lower than the detection voltage V11, for example, the voltage V10 is approximately less than or equal to 5V.

反應於電壓V10的上升,NMOS電晶體101導通(ON)。由於NMOS電晶體101導通,因此,在電源接合墊PAD1與接地端GND之間形成了一放電路徑P11,也就是,偵測電路10透過NMOS電晶體101的導通而致能放電路徑P11。透過由電阻器113以及導通的NMOS電晶體101實現的分壓操作,偵測節點N11上的偵測電壓V11大約等於一預設電壓。在此實施例中,上述預設電壓須低於NMOS電晶體111的崩潰電壓(例如,26V)。透過調整電阻器113的電阻值以及NMOS電晶體101的尺寸,可使上述預設電壓等於18V,即偵測電壓V11大約等於18V。參閱第4圖,當電壓VP1上升至30V時,偵測電壓V11大約等於18V(V11≈18V)。In response to the rise of the voltage V10, the NMOS transistor 101 is turned on (ON). Since the NMOS transistor 101 is turned on, a discharge path P11 is formed between the power pad PAD1 and the ground terminal GND, that is, the detection circuit 10 enables the discharge path P11 through the conduction of the NMOS transistor 101 . Through the voltage dividing operation realized by the resistor 113 and the turned-on NMOS transistor 101 , the detection voltage V11 on the detection node N11 is approximately equal to a predetermined voltage. In this embodiment, the preset voltage must be lower than the breakdown voltage of the NMOS transistor 111 (for example, 26V). By adjusting the resistance value of the resistor 113 and the size of the NMOS transistor 101 , the above-mentioned preset voltage can be equal to 18V, that is, the detection voltage V11 is approximately equal to 18V. Referring to FIG. 4, when the voltage VP1 rises to 30V, the detection voltage V11 is approximately equal to 18V (V11≈18V).

反應於30V的電壓VP1以及大約18V的偵測電壓V11,PMOS電晶體110導通(ON)。此外,根據18V的偵測電壓V11,NMOS電晶體111也導通(ON)。因此,透過由導通的電晶體110與111實現的分壓操作,節點N12上的電壓V12上升。參閱第4圖,當電壓VP上升至30V時,電壓V12也上升,在此實施例中,根據PMOS電晶體110與NMOS電晶體111的尺寸,電壓V12上升後的位準低於偵測電壓V11,舉例而言,電壓V12大約小於等於5V。反應於偵測電壓V12,NMOS電晶體112導通(ON),以提供在電源接合墊PAD1與接地端GND之間的一放電路徑P12。In response to the voltage VP1 of 30V and the detection voltage V11 of about 18V, the PMOS transistor 110 is turned on (ON). In addition, according to the detection voltage V11 of 18V, the NMOS transistor 111 is also turned on (ON). Therefore, the voltage V12 on the node N12 rises through the voltage dividing operation realized by the turned-on transistors 110 and 111 . Referring to FIG. 4, when the voltage VP rises to 30V, the voltage V12 also rises. In this embodiment, according to the sizes of the PMOS transistor 110 and the NMOS transistor 111, the voltage V12 rises to a level lower than the detection voltage V11 For example, the voltage V12 is approximately less than or equal to 5V. In response to the detection voltage V12, the NMOS transistor 112 is turned on (ON) to provide a discharge path P12 between the power pad PAD1 and the ground terminal GND.

根據上述,當操作模式下在電源接合墊PAD1發生一過度電性應力事件時,偵測電路10的電晶體100與101都導通,使得在電源接合墊PAD1與接地端GND之間形成偵測路徑P10與放電路徑P11。電源接合墊PAD1上的電荷透過偵測路徑P10與放電路徑P11傳導至接地端GND。此外,藉由電阻器113與NMOS電晶體101,偵測節點N11上的偵測電壓V11大約等於預設電壓,其不會過高而損壞放電電路11內的元件,尤其是電容器114與NMOS電晶體111。此外,NMOS電晶體112亦導通,因此,當在電源接合墊PAD1發生一過度電性應力事件時,放電電路11也提供了介於電源接合墊PAD1與接地端GND之間的放電路徑P12。According to the above, when an excessive electrical stress event occurs on the power pad PAD1 in the operation mode, the transistors 100 and 101 of the detection circuit 10 are both turned on, so that a detection path is formed between the power pad PAD1 and the ground terminal GND P10 and discharge path P11. The charge on the power pad PAD1 is conducted to the ground terminal GND through the detection path P10 and the discharge path P11 . In addition, through the resistor 113 and the NMOS transistor 101, the detection voltage V11 on the detection node N11 is approximately equal to the preset voltage, which will not be too high to damage the components in the discharge circuit 11, especially the capacitor 114 and the NMOS transistor. Crystal 111. In addition, the NMOS transistor 112 is also turned on. Therefore, when an excessive electrical stress event occurs on the power pad PAD1 , the discharge circuit 11 also provides a discharge path P12 between the power pad PAD1 and the ground terminal GND.

參閱第4圖,參閱當過度電性應力事件消失時,電源接合墊PAD1的電壓VP1恢復至24V,且保護電路1恢復正常操作。此時,電壓V10與V12降低為接近或等於接地端GND的電壓位準(0V),且偵測電壓V11反應於電壓VP1而大約等於18V。Referring to FIG. 4 , it can be seen that when the excessive electrical stress event disappears, the voltage VP1 of the power pad PAD1 recovers to 24V, and the protection circuit 1 resumes normal operation. At this time, the voltages V10 and V12 decrease to be close to or equal to the voltage level (0V) of the ground terminal GND, and the detection voltage V11 is approximately equal to 18V in response to the voltage VP1.

參閱第5圖,在保護電路1非處於操作模式的情況下,操作電壓不提供至電源接合墊PAD1與PAD2,即電源接合墊PAD1與PAD2處於浮接狀態或者其等的電壓VP1與VP2等於0V。當在電源接合墊PAD1上發生一靜電放電事件(例如,正靜電放電事件)時,電源接合墊PAD1的電壓VP而瞬間提高。此時,由於電源接合墊PAD2處於浮接狀態或者其電壓VP2等於0V,PMOS電晶體100導通(ON)。由於PMOS電晶體100被導通,節點N10上的電壓V10隨著電壓VP1而瞬間提高。Referring to FIG. 5, when the protection circuit 1 is not in the operation mode, the operating voltage is not supplied to the power pads PAD1 and PAD2, that is, the power pads PAD1 and PAD2 are in a floating state or their voltages VP1 and VP2 are equal to 0V . When an ESD event (for example, a positive ESD event) occurs on the power pad PAD1 , the voltage VP of the power pad PAD1 increases instantaneously. At this time, since the power pad PAD2 is in a floating state or its voltage VP2 is equal to 0V, the PMOS transistor 100 is turned on (ON). Since the PMOS transistor 100 is turned on, the voltage V10 on the node N10 increases instantaneously along with the voltage VP1.

反應於電壓V10的瞬間提高,NMOS電晶體101導通(ON)。基於電容器114的元件特性,偵測電壓V11不會隨著VP1而瞬間提高,此外,偵測節點N11上的偵測電壓V11透過導通的NMOS電晶體101而拉低。此時,根據偵測電壓V11,PMOS電晶體110導通(ON),而NMOS電晶體111關斷(OFF)。透過導通的PMOS電晶體110,節點N12上的電壓V12隨著電壓VP1而瞬間提高,以導通NMOS電晶體112。由於NMOS型電晶體112的導通,因此在電源接合墊PAD1與接地端GND之間形成了一放電路徑P12,以讓電源接合墊PAD1上的靜電電荷透過此放電路徑P12傳導至接地端GND,藉此保護耦接電源接合墊PAD1的其他電路內的元件不受靜電電荷的破壞。In response to the instantaneous increase of the voltage V10, the NMOS transistor 101 is turned on (ON). Based on the device characteristics of the capacitor 114 , the detection voltage V11 does not rise instantaneously with VP1 , and the detection voltage V11 on the detection node N11 is pulled down by the turned-on NMOS transistor 101 . At this time, according to the detection voltage V11, the PMOS transistor 110 is turned on (ON), and the NMOS transistor 111 is turned off (OFF). Through the turned-on PMOS transistor 110 , the voltage V12 on the node N12 increases instantaneously along with the voltage VP1 to turn on the NMOS transistor 112 . Due to the conduction of the NMOS transistor 112, a discharge path P12 is formed between the power pad PAD1 and the ground terminal GND, so that the electrostatic charge on the power pad PAD1 is conducted to the ground terminal GND through the discharge path P12, thereby This protects components in other circuits coupled to the power pad PAD1 from being damaged by electrostatic charges.

根據上述,當在電源接合墊PAD1上發生一靜電放電事件時,偵測電路10的電晶體100與101都導通,使得偵測電壓V11能處於低位準(接近或等於接地端GND的電壓位準(0V)),藉此致能放電路徑P12的形成。According to the above, when an electrostatic discharge event occurs on the power pad PAD1, the transistors 100 and 101 of the detection circuit 10 are both turned on, so that the detection voltage V11 can be at a low level (close to or equal to the voltage level of the ground terminal GND (0V)), thereby enabling the formation of the discharge path P12.

此外,與僅具有放電電路11(但不具有偵測電路10)的靜電放電保護電路相比,當在電源接合墊PAD1上發生一靜電放電事件時,透過本案偵測電路10的操作,偵測電壓V11具有較低的位準,且電壓V12具有較高的位準。In addition, compared with the electrostatic discharge protection circuit that only has the discharge circuit 11 (but does not have the detection circuit 10), when an electrostatic discharge event occurs on the power pad PAD1, through the operation of the detection circuit 10 of this case, the detection The voltage V11 has a lower level, and the voltage V12 has a higher level.

參閱第6A~6B圖,當在電源接合墊PAD1上發生一靜電放電事件時,僅具有放電電路11的靜電放電保護電路的偵測電壓V11與電壓V12的變化分別以曲線60與62表示,而本案保護電路1的偵測電壓V11與電壓V12的變化分別以曲線61與63表示。透過比較曲線60與61以及比較曲線62與63可得知,本案的偵測電路V11的位準較低,使得PMOS電晶體110能完全導通,本案的電路V12的位準較高,使得NMOS電晶體112能完全導通,藉以提供穩定的放電路徑P12。Referring to FIGS. 6A~6B, when an electrostatic discharge event occurs on the power bonding pad PAD1, the changes of the detected voltage V11 and the voltage V12 of the electrostatic discharge protection circuit having only the discharge circuit 11 are represented by curves 60 and 62, respectively, and The changes of the detection voltage V11 and the voltage V12 of the protection circuit 1 in this case are represented by curves 61 and 63 respectively. By comparing curves 60 and 61 and comparing curves 62 and 63, it can be seen that the level of the detection circuit V11 in this case is low, so that the PMOS transistor 110 can be completely turned on, and the level of the circuit V12 in this case is high, so that the NMOS transistor 110 can be completely turned on. The crystal 112 can be fully turned on, thereby providing a stable discharge path P12.

根據第1圖所示的實施例,本案的保護電路1不僅能提供靜電放電保護,也能提供過度電性應力保護。透過耦接不同電源域的電源接合墊PAD1與PDA2,當偵測電路10偵測到電源接合墊PDA1上發生一靜電放電事件或一過度電性應力,偵測電路10內的電晶體100與101處於導通狀態,其表示了偵測結果。根據此偵測結果,偵測電路10控制偵測節點N11具有不同的電壓且致能至少一放電路徑。According to the embodiment shown in FIG. 1 , the protection circuit 1 of the present application can not only provide electrostatic discharge protection, but also provide excessive electrical stress protection. By coupling the power pads PAD1 and PDA2 of different power domains, when the detection circuit 10 detects an electrostatic discharge event or an excessive electrical stress on the power pad PDA1, the transistors 100 and 101 in the detection circuit 10 In the ON state, it indicates the detection result. According to the detection result, the detection circuit 10 controls the detection node N11 to have different voltages and enables at least one discharge path.

詳細來說,當偵測電路10偵測到在電源接合墊PDA1發生一過度電性應力事件時,其控制偵測節點N11上的偵測電壓V11處於低於NMOS電晶體111崩潰電壓的(例如,26V)的位準(例如,18V),並致能經過PMOS電晶體100、節點N10、與電阻器R11的偵測路徑P10、經過電阻器113、偵測節點N11、與NMOS電晶體101的放電路徑P11、以及經過NMOS電晶體112的放電路徑P12(顯示於第3圖)。當偵測電路10偵測到在電源接合墊PDA1發生一靜電放電事件時,其控制偵測節點N11上的偵測電壓V11處於低位準(接近或等於接地端GND的電壓位準(0V)),並致能經過NMOS電晶體112的放電路徑P12(顯示於第5圖)。In detail, when the detection circuit 10 detects that an excessive electrical stress event occurs on the power pad PDA1, it controls the detection voltage V11 on the detection node N11 to be lower than the breakdown voltage of the NMOS transistor 111 (for example, , 26V) level (for example, 18V), and enables the detection path P10 passing through the PMOS transistor 100, the node N10, and the resistor R11, passing through the resistor 113, the detecting node N11, and the NMOS transistor 101 The discharge path P11 and the discharge path P12 passing through the NMOS transistor 112 (shown in FIG. 3 ). When the detection circuit 10 detects that an electrostatic discharge event occurs on the power pad PDA1, it controls the detection voltage V11 on the detection node N11 to be at a low level (close to or equal to the voltage level (0V) of the ground terminal GND) , and enable the discharge path P12 (shown in FIG. 5 ) through the NMOS transistor 112 .

根據第5圖的相關說明,電容器114是用於當在電源接合墊PAD1上發生一靜電放電事件時,使偵測電壓V11不會隨著VP1而瞬間提高而處於一低位準。根據本案偵測電路10的操作,在發生靜電放電事件時,偵測電路10能拉低偵測電壓V11,即偵測電壓V11不會隨著VP1而瞬間提高。因此,在其他實施例中,可省略電容器114。According to the relevant description of FIG. 5 , the capacitor 114 is used to prevent the detection voltage V11 from rising instantaneously with VP1 to be at a low level when an electrostatic discharge event occurs on the power pad PAD1 . According to the operation of the detection circuit 10 in this case, when an electrostatic discharge event occurs, the detection circuit 10 can pull down the detection voltage V11 , that is, the detection voltage V11 will not increase instantaneously with VP1 . Thus, in other embodiments, capacitor 114 may be omitted.

參閱第7圖,放電電路11不包括電容器114,其可減小保護電路1的面積。即使放電電路11不包括電容器114,由於偵測電路10的操作,在發生靜電放電事件時,偵測電壓V11仍可處於低位準。第7圖中保護電路1的操作請參閱前述第1~6A圖的相關說明,在此省略。Referring to FIG. 7 , the discharge circuit 11 does not include the capacitor 114 , which can reduce the area of the protection circuit 1 . Even though the discharge circuit 11 does not include the capacitor 114 , due to the operation of the detection circuit 10 , the detection voltage V11 can still be at a low level when an ESD event occurs. For the operation of the protection circuit 1 in Fig. 7, please refer to the related descriptions in Figs. 1 to 6A, which are omitted here.

在上述各實施例中,電阻元件102係以電阻器R10來實現。在其他實施例中,電阻元件102可以其他能提供阻抗的元件來實現。In the above-mentioned embodiments, the resistance element 102 is realized by a resistor R10. In other embodiments, the resistive element 102 can be realized by other elements capable of providing impedance.

參閱第8圖,電阻元件102包括NMOS電晶體90。NMOS電晶體90的第一端耦接節點N10,其第二端耦接接地端GND,且其控制端耦接電源接合墊PAD2。第8圖的保護電路1的其它元件的連接架構請參閱前述第1圖的相關說明,在此省略。參閱第9圖,當保護電路1處於操作模式下正常操作時,一操作電壓提供給電源接合墊PAD1,另一操作電壓提供給電源接合墊PAD2,且接地端GND具有接地電壓(例如0伏特(V))。舉例來說,提供給電源接合墊PAD1的操作電壓為18V且提供給電源接合墊PAD2的操作電壓為24V。因此,電源接合墊PAD1的電壓VP1為18V,且電源接合墊PAD2的電壓VP2為24V。Referring to FIG. 8 , the resistive element 102 includes an NMOS transistor 90 . The first terminal of the NMOS transistor 90 is coupled to the node N10 , the second terminal thereof is coupled to the ground terminal GND, and the control terminal thereof is coupled to the power pad PAD2 . For the connection structure of other components of the protection circuit 1 in FIG. 8 , please refer to the related description in FIG. 1 , which is omitted here. Referring to FIG. 9, when the protection circuit 1 is operating normally in the operation mode, one operating voltage is provided to the power bonding pad PAD1, another operating voltage is provided to the power bonding pad PAD2, and the ground terminal GND has a ground voltage (for example, 0 volts ( V)). For example, the operating voltage provided to the power pad PAD1 is 18V and the operating voltage provided to the power pad PAD2 is 24V. Therefore, the voltage VP1 of the power pad PAD1 is 18V, and the voltage VP2 of the power pad PAD2 is 24V.

基於電壓VP1與VP2,PMOS電晶體100關斷(OFF)。此外,反應於電壓VP2,NMOS電晶體90導通(ON)。此時,節點N10上的電壓V10透過導通的NMOS電晶體90而被拉低至0大約為接地端GND的電壓位準(0V),使得NMOS電晶體101關斷(OFF)。此外,反應於電壓VP1,偵測節點N11上的偵測電壓V11大約等於電壓VP1,舉例而言,偵測電壓V11大約等於18V。根據偵測電壓V11,PMOS電晶體110關斷(OFF),且NMOS電晶體111導通(ON)。透過導通的NMOS電晶體111,節點N12上的電壓V12接近或等於接地端GND的電壓位準(0V),以使得NMOS電晶體112關斷(OFF)。Based on the voltages VP1 and VP2, the PMOS transistor 100 is turned off (OFF). In addition, the NMOS transistor 90 is turned on (ON) in response to the voltage VP2. At this time, the voltage V10 on the node N10 is pulled down to 0 (0V) which is approximately the voltage level of the ground terminal GND through the turned-on NMOS transistor 90 , so that the NMOS transistor 101 is turned off (OFF). In addition, in response to the voltage VP1 , the detection voltage V11 on the detection node N11 is approximately equal to the voltage VP1 , for example, the detection voltage V11 is approximately equal to 18V. According to the detection voltage V11, the PMOS transistor 110 is turned off (OFF), and the NMOS transistor 111 is turned on (ON). Through the turned-on NMOS transistor 111 , the voltage V12 on the node N12 is close to or equal to the voltage level (0V) of the ground terminal GND, so that the NMOS transistor 112 is turned off (OFF).

根據上述,當保護電路1在操作模式下正常操作時,偵測電路10的電晶體100與101關斷,此外,放電電路11的電晶體110與112也皆關斷。因此,偵測電路10未提供介於電源接合墊PAD1與接地端GND之間的任何電路路徑,放電電路11也未提供介於電源接合墊PAD1與接地端GND之間的任何電路路徑。According to the above, when the protection circuit 1 operates normally in the operation mode, the transistors 100 and 101 of the detection circuit 10 are turned off, and in addition, the transistors 110 and 112 of the discharge circuit 11 are also turned off. Therefore, the detection circuit 10 does not provide any circuit path between the power pad PAD1 and the ground terminal GND, and the discharge circuit 11 does not provide any circuit path between the power pad PAD1 and the ground terminal GND.

參閱第10圖,在正常操作期間,若在電源接合墊PAD1上發生一過度電性應力事件,電源接合墊PAD1的電壓VP1而上升至,例如, 30V。基於電壓VP1與VP2,PMOS電晶體100導通(ON)。此外,反應於電壓VP2,NMOS電晶體90導通(ON)。由於PMOS電晶體100與NMOS電晶體90皆導通,因此在電源接合墊PAD1與接地端GND之間形成了一偵測路徑P10,也就是,偵測電路10透過PMOS電晶體100的導通而致能偵測路徑P10。偵測路徑P10經過PMOS電晶體100、節點N10、以及NMOS電晶體90。此時,透過由導通的PMOS電晶體100與NMOS電晶體90所實現的分壓操作,節點N10上的電壓V10上升以導通NMOS電晶體101(ON)。Referring to FIG. 10, during normal operation, if an electrical overstress event occurs on the power pad PAD1, the voltage VP1 of the power pad PAD1 rises to, for example, 30V. Based on the voltages VP1 and VP2 , the PMOS transistor 100 is turned on (ON). In addition, the NMOS transistor 90 is turned on (ON) in response to the voltage VP2. Since both the PMOS transistor 100 and the NMOS transistor 90 are turned on, a detection path P10 is formed between the power pad PAD1 and the ground terminal GND, that is, the detection circuit 10 is enabled through the conduction of the PMOS transistor 100 Detection path P10. The detection path P10 passes through the PMOS transistor 100 , the node N10 , and the NMOS transistor 90 . At this moment, through the voltage division operation realized by the turned-on PMOS transistor 100 and the NMOS transistor 90 , the voltage V10 on the node N10 rises to turn on the NMOS transistor 101 (ON).

由於NMOS電晶體101導通,因此,在電源接合墊PAD1與接地端GND之間形成了一放電路徑P11,也就是,偵測電路10透過NMOS電晶體101的導通而致能放電路徑P11。放電路徑P11經過電阻器113、偵測節點N11、以及NMOS電晶體101。透過由電阻器113以及導通的NMOS電晶體101實現的分壓操作,偵測電壓V11大約等於一預設電壓。透過調整電阻器113的電阻值以及NMOS電晶體101的尺寸,可使上述預設電壓等於18V,其低於NMOS電晶體111的崩潰電壓(例如,26V)。反應於30V的電壓VP1以及大約18V的偵測電壓V11,PMOS電晶體110導通(ON)。此外,根據18V的偵測電壓V11,NMOS電晶體111也導通(ON)。因此,透過由導通的電晶體110與111實現的分壓操作,節點N12上的電壓V12上升,使得NMOS電晶體112導通(ON)以提供在電源接合墊PAD1與接地端GND之間的一放電路徑P12。Since the NMOS transistor 101 is turned on, a discharge path P11 is formed between the power pad PAD1 and the ground terminal GND, that is, the detection circuit 10 enables the discharge path P11 through the conduction of the NMOS transistor 101 . The discharge path P11 passes through the resistor 113 , the detection node N11 , and the NMOS transistor 101 . Through the voltage division operation realized by the resistor 113 and the turned-on NMOS transistor 101 , the detection voltage V11 is approximately equal to a predetermined voltage. By adjusting the resistance of the resistor 113 and the size of the NMOS transistor 101 , the preset voltage can be made equal to 18V, which is lower than the breakdown voltage of the NMOS transistor 111 (eg, 26V). In response to the voltage VP1 of 30V and the detection voltage V11 of about 18V, the PMOS transistor 110 is turned on (ON). In addition, according to the detection voltage V11 of 18V, the NMOS transistor 111 is also turned on (ON). Therefore, through the voltage dividing operation realized by the turned-on transistors 110 and 111, the voltage V12 on the node N12 rises, so that the NMOS transistor 112 is turned on (ON) to provide a discharge between the power pad PAD1 and the ground terminal GND Path P12.

根據上述,當操作模式下在電源接合墊PAD1發生一過度電性應力事件時,偵測電路10的電晶體100、101、與90都導通,使得在電源接合墊PAD1與接地端GND之間形成偵測路徑P10與放電路徑P11。電源接合墊PAD1上的電荷透過偵測路徑P10與放電路徑P11傳導至接地端GND。此外,藉由電阻器113與NMOS電晶體101,偵測節點N11上的偵測電壓V11大約等於預設電壓,其不會過高而損壞放電電路11內的元件,尤其是電容器114與NMOS電晶體111。此外,NMOS電晶體112亦導通,因此,當在電源接合墊PAD1發生一過度電性應力事件時,放電電路11也提供了介於電源接合墊PAD1與接地端GND之間的放電路徑P12。According to the above, when an excessive electrical stress event occurs on the power pad PAD1 in the operation mode, the transistors 100, 101, and 90 of the detection circuit 10 are all turned on, so that a power supply pad PAD1 and the ground terminal GND are formed. The detection path P10 and the discharge path P11. The charge on the power pad PAD1 is conducted to the ground terminal GND through the detection path P10 and the discharge path P11 . In addition, through the resistor 113 and the NMOS transistor 101, the detection voltage V11 on the detection node N11 is approximately equal to the preset voltage, which will not be too high to damage the components in the discharge circuit 11, especially the capacitor 114 and the NMOS transistor. Crystal 111. In addition, the NMOS transistor 112 is also turned on. Therefore, when an excessive electrical stress event occurs on the power pad PAD1 , the discharge circuit 11 also provides a discharge path P12 between the power pad PAD1 and the ground terminal GND.

參閱第11圖,在保護電路1非處於操作模式的情況下,操作電壓不提供至電源接合墊PAD1與PAD2,即電源接合墊PAD1與PAD2處於浮接狀態或者其等的電壓VP1與VP2等於0V。當在電源接合墊PAD1上發生一靜電放電事件時,電源接合墊PAD1的電壓VP而瞬間提高。此時,由於電源接合墊PAD2處於浮接狀態或者其電壓VP2等於0V,PMOS電晶體100導通(ON),而NMOS電晶體90關斷(OFF)。透過導通的PMOS電晶體100,節點N10上的電壓V10隨著電壓VP1而瞬間提高。Referring to FIG. 11, when the protection circuit 1 is not in the operation mode, the operating voltage is not supplied to the power pads PAD1 and PAD2, that is, the power pads PAD1 and PAD2 are in a floating state or their voltages VP1 and VP2 are equal to 0V . When an electrostatic discharge event occurs on the power pad PAD1 , the voltage VP of the power pad PAD1 increases instantaneously. At this time, since the power pad PAD2 is in a floating state or its voltage VP2 is equal to 0V, the PMOS transistor 100 is turned on (ON), and the NMOS transistor 90 is turned off (OFF). Through the turned-on PMOS transistor 100, the voltage V10 on the node N10 increases instantaneously along with the voltage VP1.

反應於電壓V10的瞬間提高,NMOS電晶體101導通(ON)。基於電容器114的元件特性,偵測電壓V11不會隨著VP1而瞬間提高,此外,偵測節點N11上的偵測電壓V11透過導通的NMOS電晶體101而拉低。此時,根據偵測電壓V11,PMOS電晶體110導通(ON),而NMOS電晶體111關斷(OFF)。透過導通的PMOS電晶體110,節點N12上的電壓V12隨著電壓VP1而瞬間提高,以導通NMOS電晶體112。由於NMOS型電晶體112的導通,因此在電源接合墊PAD1與接地端GND之間形成了一放電路徑P12,以讓電源接合墊PAD1上的靜電電荷透過此放電路徑P12傳導至接地端GND,藉此保護耦接電源接合墊PAD1的其他電路內的元件不受靜電電荷的破壞。In response to the instantaneous increase of the voltage V10, the NMOS transistor 101 is turned on (ON). Based on the device characteristics of the capacitor 114 , the detection voltage V11 does not rise instantaneously with VP1 , and the detection voltage V11 on the detection node N11 is pulled down by the turned-on NMOS transistor 101 . At this time, according to the detection voltage V11, the PMOS transistor 110 is turned on (ON), and the NMOS transistor 111 is turned off (OFF). Through the turned-on PMOS transistor 110 , the voltage V12 on the node N12 increases instantaneously along with the voltage VP1 to turn on the NMOS transistor 112 . Due to the conduction of the NMOS transistor 112, a discharge path P12 is formed between the power pad PAD1 and the ground terminal GND, so that the electrostatic charge on the power pad PAD1 is conducted to the ground terminal GND through the discharge path P12, thereby This protects components in other circuits coupled to the power pad PAD1 from being damaged by electrostatic charges.

根據上述,當在電源接合墊PAD1上發生一靜電放電事件時,偵測電路10的電晶體100與101都導通而電晶體90關斷,使得偵測電壓V11能處於低位準(接近或等於接地端GND的電壓位準(0V)),藉此致能放電路徑P12的形成。According to the above, when an electrostatic discharge event occurs on the power pad PAD1, the transistors 100 and 101 of the detection circuit 10 are both turned on and the transistor 90 is turned off, so that the detection voltage V11 can be at a low level (close to or equal to ground The voltage level of the terminal GND (0V)), thereby enabling the formation of the discharge path P12.

根據上述,第8圖的保護電路1不僅能提供靜電放電保護,也能提供過度電性應力保護。透過耦接不同電源域的電源接合墊PAD1與PDA2,當偵測電路10偵測到電源接合墊PDA1上發生一靜電放電事件或一過度電性應力,偵測電路10內的電晶體100與101處於導通狀態,其表示了偵測結果。根據此偵測結果,偵測電路10控制偵測節點N11具有不同的電壓且致能至少一放電路徑。According to the above, the protection circuit 1 of FIG. 8 can not only provide ESD protection, but also provide protection against electrical overstress. By coupling the power pads PAD1 and PDA2 of different power domains, when the detection circuit 10 detects an electrostatic discharge event or an excessive electrical stress on the power pad PDA1, the transistors 100 and 101 in the detection circuit 10 In the ON state, it indicates the detection result. According to the detection result, the detection circuit 10 controls the detection node N11 to have different voltages and enables at least one discharge path.

詳細來說,當偵測電路10偵測到在電源接合墊PDA1發生一過度電性應力事件時,其控制偵測節點N11上的偵測電壓V11處於低於NMOS電晶體111崩潰電壓的(例如,26V)的位準(例如,18V),並致能經過PMOS電晶體100、節點N10、與電阻器R11的偵測路徑P10、經過電阻器113、偵測節點N11、與NMOS電晶體101的放電路徑P11、以及經過NMOS電晶體112的放電路徑P12(顯示於第10圖)。當偵測電路10偵測到在電源接合墊PDA1發生一靜電放電事件時,其控制偵測節點N11上的偵測電壓V11處於低位準(接近或等於接地端GND的電壓位準(0V)),並致能經過NMOS電晶體112的放電路徑P12(顯示於第11圖)。In detail, when the detection circuit 10 detects that an excessive electrical stress event occurs on the power pad PDA1, it controls the detection voltage V11 on the detection node N11 to be lower than the breakdown voltage of the NMOS transistor 111 (for example, , 26V) level (for example, 18V), and enables the detection path P10 passing through the PMOS transistor 100, the node N10, and the resistor R11, passing through the resistor 113, the detecting node N11, and the NMOS transistor 101 The discharge path P11 and the discharge path P12 passing through the NMOS transistor 112 (shown in FIG. 10 ). When the detection circuit 10 detects that an electrostatic discharge event occurs on the power pad PDA1, it controls the detection voltage V11 on the detection node N11 to be at a low level (close to or equal to the voltage level (0V) of the ground terminal GND) , and enable the discharge path P12 (shown in FIG. 11 ) through the NMOS transistor 112 .

在第8圖的實施例中,PMOS電晶體100的閘極氧化層的厚度大於PMOS電晶體110的閘極氧化層的厚度,然而本發明並不以此為限。在以第8圖的電路架構為基礎的其他實施例中,PMOS電晶體100的閘極氧化層的厚度可等於或小於PMOS電晶體110的閘極氧化層的厚度。In the embodiment shown in FIG. 8 , the thickness of the gate oxide layer of the PMOS transistor 100 is greater than the thickness of the gate oxide layer of the PMOS transistor 110 , but the invention is not limited thereto. In other embodiments based on the circuit structure of FIG. 8 , the thickness of the gate oxide layer of the PMOS transistor 100 may be equal to or smaller than the thickness of the gate oxide layer of the PMOS transistor 110 .

此外,在第8圖的實施例中,放電電路11可不包括電容器114,使得保護電路1佔用較小的面積。即使放電電路11不包括電容器114,由於偵測電路10的操作,在發生靜電放電事件時,偵測電壓V11可透過導通的NMOS電晶體101而處於低位準,以致能放電路徑P12的形成。In addition, in the embodiment of FIG. 8, the discharge circuit 11 may not include the capacitor 114, so that the protection circuit 1 occupies a smaller area. Even though the discharge circuit 11 does not include the capacitor 114 , due to the operation of the detection circuit 10 , when an ESD event occurs, the detection voltage V11 can be at a low level through the turned-on NMOS transistor 101 to enable the formation of the discharge path P12 .

在上述各實施例中,當保護電路1進入操作模式時,兩不同的操作電壓可同時提供給電源接合墊PAD1與PAD2。在其他實施例中,當保護電路1進入操作模式時,兩不同的操作電壓可先後提供給電源接合墊PAD1與PAD2,例如,先提供一操作電壓至電源接合墊PAD2,接著再提供另一操作電壓至電源接合墊PAD1。如此一來,當保護電路1進入操作模式時,電源接合墊PAD2的電壓VP2在第一時間處於高位準,以關斷PMOS電晶體100,藉此可避免透過PMOS電晶體100的漏電流。In the above embodiments, when the protection circuit 1 enters the operation mode, two different operation voltages can be provided to the power pads PAD1 and PAD2 at the same time. In other embodiments, when the protection circuit 1 enters the operation mode, two different operating voltages can be provided to the power pads PAD1 and PAD2 successively, for example, one operating voltage is provided to the power pad PAD2 first, and then another operation voltage is provided. Voltage to Power Bonding Pad PAD1. In this way, when the protection circuit 1 enters the operation mode, the voltage VP2 of the power pad PAD2 is at a high level at the first time to turn off the PMOS transistor 100 , thereby avoiding the leakage current through the PMOS transistor 100 .

雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此項技藝者,在不脫離本發明之精神和範圍內,當可作更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Anyone skilled in this art can make changes and modifications without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of protection shall be subject to what is defined in the scope of the attached patent application.

1:保護電路1: Protection circuit

10:偵測電路10: Detection circuit

11:放電電路11: Discharge circuit

60~63:曲線60~63: curve

90:NMOS電晶體90: NMOS transistor

100:PMOS電晶體100: PMOS transistor

101:NMOS電晶體101: NMOS transistor

102:阻抗元件102: Impedance element

110:PMOS電晶體110: PMOS transistor

111,112:NMOS電晶體111,112: NMOS transistor

113:電阻器113: Resistor

114:電容器114: Capacitor

GND:接地端GND: ground terminal

N10,N12:節點N10, N12: nodes

N11:偵測節點N11: detection node

P10:偵測路徑P10: Detection path

P11,P12:放電路徑P11, P12: discharge path

PAD1,PAD2:電源接合墊PAD1,PAD2: power bonding pads

R10:電阻器R10: Resistor

V10,V12:電壓V10, V12: Voltage

V11:偵測電壓V11: detection voltage

VP1,VP2:電壓VP1, VP2: Voltage

第1圖係表示本發明一實施例之保護電路。 第2圖係表示第1圖之保護電路在操作模式下的正常操作示意圖。 第3圖係表示第1圖之保護電路在操作模式下遭遇過度電性應力事件時的操作示意圖。 第4圖係表示第1圖之保護電路在正常操作以及遭遇過度電性應力事件時的主要電壓示意圖。 第5圖係表示第1圖之保護電路遭遇靜電放電事件時的操作示意圖。 第6A~6B圖係表示第1圖之保護電路遭遇靜電放電事件時的主要電壓示意圖。 第7圖係表示本發明又一實施例之保護電路。 第8圖係表示本發明另一實施例之保護電路。 第9圖係表示第8圖之保護電路在操作模式下的正常操作示意圖。 第10圖係表示第8圖之保護電路在操作模式下遭遇過度電性應力事件時的操作示意圖。 第11圖係表示第8圖之保護電路遭遇靜電放電事件時的操作示意圖。 Fig. 1 shows a protection circuit of an embodiment of the present invention. FIG. 2 is a schematic diagram showing the normal operation of the protection circuit in FIG. 1 in the operation mode. FIG. 3 is a schematic diagram showing the operation of the protection circuit in FIG. 1 when it encounters an electrical overstress event in the operation mode. FIG. 4 is a schematic diagram showing the main voltages of the protection circuit in FIG. 1 in normal operation and when it encounters an electrical overstress event. FIG. 5 is a schematic diagram showing the operation of the protection circuit in FIG. 1 when it encounters an electrostatic discharge event. Figures 6A-6B are schematic diagrams showing main voltages when the protection circuit in Figure 1 encounters an electrostatic discharge event. Fig. 7 shows a protection circuit of another embodiment of the present invention. Fig. 8 shows a protection circuit of another embodiment of the present invention. FIG. 9 is a schematic diagram showing the normal operation of the protection circuit in FIG. 8 in the operation mode. FIG. 10 is a schematic diagram showing the operation of the protection circuit in FIG. 8 when it encounters an electrical overstress event in the operation mode. FIG. 11 is a schematic diagram showing the operation of the protection circuit in FIG. 8 when it encounters an electrostatic discharge event.

1:保護電路 1: Protection circuit

10:偵測電路 10: Detection circuit

11:放電電路 11: Discharge circuit

100:PMOS電晶體 100: PMOS transistor

101:NMOS電晶體 101: NMOS transistor

102:阻抗元件 102: Impedance element

110:PMOS電晶體 110: PMOS transistor

111,112:NMOS電晶體 111,112: NMOS transistor

102:阻抗元件 102: Impedance element

113:電阻器 113: Resistor

114:電容器 114: Capacitor

GND:接地端 GND: ground terminal

N10,N12:節點 N10, N12: nodes

N11:偵測節點 N11: detection node

PAD1,PAD2:電源接合墊 PAD1,PAD2: power bonding pads

R10:電阻器 R10: Resistor

Claims (20)

一種保護電路,具有一第一電源接合墊以及一第二電源接合墊,包括:一偵測電路,耦接該第一電源接合墊以及該第二電源接合墊,用以偵測在該第一電源接合墊上是否發生一靜電放電事件或一過度電性應力事件,且根據一偵測結果控制在一偵測節點上的一偵測電壓,其中,該第一電源接合墊與該第二電源接合墊分別屬於不同的電源域;以及一放電電路,耦接該偵測節點以及該第一電源接合墊;其中,當在該第一電源接合墊上發生該靜電放電事件時,該放電電路根據該偵測電壓提供介於該第一電源接合墊與一接地端之間的一第一放電路徑;以及其中,當在該第一電源接合墊上發生該過度電性應力事件時,該偵測電路致能介於該第一電源接合墊與該接地端之間的一第二放電路徑。 A protection circuit having a first power supply pad and a second power supply pad, comprising: a detection circuit coupled to the first power supply pad and the second power supply pad for detecting Whether an electrostatic discharge event or an excessive electrical stress event occurs on a power pad, and controlling a detection voltage on a detection node according to a detection result, wherein the first power pad is connected to the second power pad The pads belong to different power domains; and a discharge circuit is coupled to the detection node and the first power pad; wherein, when the electrostatic discharge event occurs on the first power pad, the discharge circuit according to the detection measuring voltage to provide a first discharge path between the first power pad and a ground; and wherein the detection circuit is enabled when the electrical overstress event occurs on the first power pad A second discharge path between the first power pad and the ground terminal. 如請求項1的保護電路,其中,當在該第一電源接合墊上發生該過度電性應力事件時,該放電電路根據該偵測電壓提供該第一放電路徑。 The protection circuit of claim 1, wherein when the excessive electrical stress event occurs on the first power pad, the discharge circuit provides the first discharge path according to the detection voltage. 如請求項1的保護電路,其中:當該保護電路處於一操作模式操作時,該第一電源接合墊接收一第一電壓,且該第二電源接合墊接收一第二電壓;以及該第二電壓大於或等於該第一電壓。 The protection circuit of claim 1, wherein: when the protection circuit operates in an operation mode, the first power pad receives a first voltage, and the second power pad receives a second voltage; and the second The voltage is greater than or equal to the first voltage. 如請求項3的保護電路,其中,該第二電壓提供至 該第二電源接合墊的時間點早於該第一電壓提供至該第一電源接合墊。 The protection circuit of claim 3, wherein the second voltage is provided to The second power pad is supplied to the first power pad earlier than the first voltage. 如請求項3的保護電路,其中,當該保護電路非處於該操作模式下時,該第一電源接合墊未接收該第一電壓,且第二電源接合墊浮接或接收一零伏特電壓。 The protection circuit of claim 3, wherein when the protection circuit is not in the operation mode, the first power pad does not receive the first voltage, and the second power pad is floating or receives a voltage of zero volts. 如請求項1的保護電路,其中,該偵測電路包括:一第一電晶體,具有耦接該第一電源接合墊的一第一端、耦接一第一節點的一第二端、以及耦接該第二電源接合墊的一控制端;一電阻元件,耦接於該第一節點與該接地端之間;以及一第二電晶體,具有耦接該偵測節點的一第一端、耦接該接地端的一第二端、以及耦接該第一節點的一控制端。 The protection circuit according to claim 1, wherein the detection circuit includes: a first transistor having a first end coupled to the first power pad, a second end coupled to a first node, and a control terminal coupled to the second power pad; a resistance element coupled between the first node and the ground terminal; and a second transistor having a first terminal coupled to the detection node , a second terminal coupled to the ground terminal, and a control terminal coupled to the first node. 如請求項6的保護電路,其中:該放電電路包括耦接於該第一電源接合墊與該偵測節點之間的一電阻器;以及當在該第一電源接合墊上發生該過度電性應力事件時,該第二放電路徑經過該電阻器、該偵測節點、以及該第二電晶體。 The protection circuit of claim 6, wherein: the discharge circuit includes a resistor coupled between the first power pad and the detection node; and when the excessive electrical stress occurs on the first power pad event, the second discharge path passes through the resistor, the detection node, and the second transistor. 如請求項7的保護電路,其中,當在該第一電源接合墊上發生該過度電性應力事件時,該偵測電路更致能介於該第一電源接合墊與該接地端之間的一偵測路徑,且該偵測路徑經過該第一電晶體、該第一節點、以及該電阻元件。 The protection circuit according to claim 7, wherein when the electrical overstress event occurs on the first power pad, the detection circuit is further capable of enabling a contact between the first power pad and the ground terminal a detection path, and the detection path passes through the first transistor, the first node, and the resistance element. 如請求項6的保護電路,其中,該電阻元件包括一電阻器。 The protection circuit of claim 6, wherein the resistive element comprises a resistor. 如請求項6的保護電路,其中,該電阻元件包括一第三電晶體,且該第三電晶體具有耦接該第一節點的一第一端、耦 接該接地端的一第二端、以及耦接該第二電源接合墊的一控制端。 The protection circuit according to claim 6, wherein the resistance element includes a third transistor, and the third transistor has a first end coupled to the first node, coupled to A second end connected to the ground end, and a control end coupled to the second power pad. 一種保護電路,包括:一偵測電路,包括:一第一電晶體,具有耦接一第一電源接合墊的一第一端、耦接一第一節點的一第二端、以及耦接一第二電源接合墊的一控制端,其中,該第一電源接合墊與該第二電源接合墊分別屬於不同的電源域;一電阻元件,耦接於該第一節點與一接地端之間;以及一第二電晶體,具有耦接一偵測節點的一第一端、耦接該接地端的一第二端、以及耦接該第一節點的一控制端;以及一放電電路,耦接該偵測節點以及該第一電源接合墊,且包括:一電阻器,耦接於該第一電源接合墊與該偵測節點之間;一第三電晶體,具有耦接該第一電源接合墊的一第一端、耦接一第二節點的一第二端、以及耦接該偵測節點的一控制端;一第四電晶體,具有耦接該第二節點的一第一端、耦接該接地端的一第二端、以及耦接該偵測節點的一控制端;以及一第五電晶體,具有耦接該第一電源接合墊的一第一端、耦接該接地端的一第二端、以及耦接該第二節點的一控制端。 A protection circuit, comprising: a detection circuit, including: a first transistor, having a first end coupled to a first power pad, a second end coupled to a first node, and a first end coupled to a a control terminal of the second power pad, wherein the first power pad and the second power pad respectively belong to different power domains; a resistance element coupled between the first node and a ground terminal; and a second transistor having a first terminal coupled to a detection node, a second terminal coupled to the ground terminal, and a control terminal coupled to the first node; and a discharge circuit coupled to the The detection node and the first power supply pad, and includes: a resistor coupled between the first power supply pad and the detection node; a third transistor with a coupling to the first power supply pad a first terminal coupled to a second node, a second terminal coupled to the detection node, and a control terminal coupled to the detection node; a fourth transistor has a first terminal coupled to the second node, coupled to a second end connected to the ground end, and a control end coupled to the detection node; and a fifth transistor, having a first end coupled to the first power pad, a first end coupled to the ground end two terminals, and a control terminal coupled to the second node. 如請求項11的保護電路,其中:當在該第一電源接合墊上發生一靜電放電事件時,該第五電晶體導通;以及於該保護電路的一操作模式下,當在該第一電源接合墊上發生一過度電性應力事件時,該第一電晶體與該第二電晶體導通。 The protection circuit of claim 11, wherein: when an electrostatic discharge event occurs on the first power supply pad, the fifth transistor is turned on; and in an operation mode of the protection circuit, when the first power supply is connected to When an excessive electrical stress event occurs on the pad, the first transistor and the second transistor are turned on. 如請求項12的保護電路,其中,當在該第一電源 接合墊上發生該過度電性應力事件時,該第五電晶體導通。 The protection circuit according to claim 12, wherein, when the first power supply When the excessive electrical stress event occurs on the bonding pad, the fifth transistor is turned on. 如請求項12的保護電路,其中:當該保護電路處於該操作模式下,該第一電源接合墊接收一第一電壓,且該第二電源接合墊接收一第二電壓;以及該第二電壓大於或等於該第一電壓。 The protection circuit of claim 12, wherein: when the protection circuit is in the operation mode, the first power pad receives a first voltage, and the second power pad receives a second voltage; and the second voltage greater than or equal to the first voltage. 如請求項14的保護電路,其中,該第二電壓提供至該第二電源接合墊的時間點早於該第一電壓提供至該第一電源接合墊。 The protection circuit according to claim 14, wherein the second voltage is supplied to the second power pad earlier than the first voltage is supplied to the first power pad. 如請求項14的保護電路,其中,當該保護電路非處於該操作模式下時,該第一電源接合墊未接收該第一電壓,且第二電源接合墊浮接或接收一零伏特電壓。 The protection circuit of claim 14, wherein when the protection circuit is not in the operation mode, the first power pad does not receive the first voltage, and the second power pad is floating or receives a voltage of zero volts. 如請求項11的保護電路,其中,該放電電路更包括:一電容器,耦接於該偵測節點與該接地端之間。 The protection circuit according to claim 11, wherein the discharge circuit further includes: a capacitor coupled between the detection node and the ground terminal. 如請求項11的保護電路,其中,該第一電晶體的閘極氧化層的厚度大於該第三電晶體的閘極氧化層的厚度。 The protection circuit according to claim 11, wherein the thickness of the gate oxide layer of the first transistor is greater than the thickness of the gate oxide layer of the third transistor. 如請求項11的保護電路,其中,該電阻元件包括一電阻器。 The protection circuit of claim 11, wherein the resistive element comprises a resistor. 如請求項11的保護電路,其中,該電阻元件包括為一第六電晶體,且該第六電晶體具有耦接該第一節點的一第一端、耦接該接地端的一第二端、以及耦接該第二電源接合墊的一控制端。The protection circuit according to claim 11, wherein the resistance element includes a sixth transistor, and the sixth transistor has a first end coupled to the first node, a second end coupled to the ground end, and a control terminal coupled to the second power pad.
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Publication number Priority date Publication date Assignee Title
US20080158748A1 (en) * 2006-12-31 2008-07-03 Texas Instruments Incorporated Electrical Overstress Protection
TW201445700A (en) * 2013-05-28 2014-12-01 Princeton Technology Corp Electrostatic discharge (ESD) protection circuit with EOS and latch-up immunity
TW201832438A (en) * 2017-02-24 2018-09-01 瑞昱半導體股份有限公司 Electrostatic discharge protection circuit
US20200153241A1 (en) * 2018-11-13 2020-05-14 Western Digital Technologies, Inc. Electrostatic discharge protection circuit
TW202103402A (en) * 2019-07-10 2021-01-16 瑞昱半導體股份有限公司 Electrostatic discharge protection circuit and operation method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080158748A1 (en) * 2006-12-31 2008-07-03 Texas Instruments Incorporated Electrical Overstress Protection
TW201445700A (en) * 2013-05-28 2014-12-01 Princeton Technology Corp Electrostatic discharge (ESD) protection circuit with EOS and latch-up immunity
TW201832438A (en) * 2017-02-24 2018-09-01 瑞昱半導體股份有限公司 Electrostatic discharge protection circuit
US20200153241A1 (en) * 2018-11-13 2020-05-14 Western Digital Technologies, Inc. Electrostatic discharge protection circuit
TW202103402A (en) * 2019-07-10 2021-01-16 瑞昱半導體股份有限公司 Electrostatic discharge protection circuit and operation method

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