KR20110130811A - Electrostatic discharge circuit - Google Patents
Electrostatic discharge circuit Download PDFInfo
- Publication number
- KR20110130811A KR20110130811A KR1020100050318A KR20100050318A KR20110130811A KR 20110130811 A KR20110130811 A KR 20110130811A KR 1020100050318 A KR1020100050318 A KR 1020100050318A KR 20100050318 A KR20100050318 A KR 20100050318A KR 20110130811 A KR20110130811 A KR 20110130811A
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- South Korea
- Prior art keywords
- voltage
- control node
- voltage terminal
- control
- terminal
- Prior art date
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- 230000006378 damage Effects 0.000 abstract description 4
- 230000002265 prevention Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 6
- 230000005611 electricity Effects 0.000 description 5
- 230000003068 static effect Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0255—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using diodes as protective elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0266—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/08—Modifications for protecting switching circuit against overcurrent or overvoltage
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/01—Modifications for accelerating switching
- H03K19/013—Modifications for accelerating switching in bipolar transistor circuits
- H03K19/0136—Modifications for accelerating switching in bipolar transistor circuits by means of a pull-up or down element
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computing Systems (AREA)
- General Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
BACKGROUND OF THE
In general, electrostatic discharge (ELECTROSTATIC DISCHARGE) refers to a phenomenon in which current flows instantaneously due to a very large voltage difference between two objects when they are insulated from each other.
Since high voltages caused by these ESD currents can enter the semiconductor devices, internal circuits can be destroyed, so most semiconductor devices install an electrostatic discharge circuit (ELECTROSTATIC DISCHARGE CIRCUIT) between the input / output pad and the internal circuits to protect the internal circuits. .
The requirements of the electrostatic discharge circuit should not operate at the power supply voltage (VDD) in the normal operating range, and if the power supply voltage (VDD) rises above a certain voltage due to static electricity, etc., a discharge path is rapidly formed to make the ground voltage at the power supply voltage (VDD). The current must be discharged to the (VSS) stage to prevent the gate oxide of the transistor from being destroyed.
As the operating speed of semiconductor devices increases, gate lengths of transistors used in high-speed operation are gradually decreasing, and the thickness of the gate oxide is continuously thinning.
Recently, as the thickness of the gate oxide is lowered to 30 kPa or less, the possibility of destruction of the internal circuit by static electricity as well as power noise is increasing. Therefore, the electrostatic discharge circuit plays a role of protecting the internal circuit from power noise as well as static electricity. In addition, as described above, as the gate oxide (GATE OXIDE) is reduced in thickness, there is a growing need for an electrostatic discharge circuit that reacts sensitively to small changes in the power supply voltage VDD to perform a discharge operation.
1 is a configuration diagram of a conventional electrostatic discharge circuit.
As shown in FIG. 1, a conventional electrostatic discharge circuit includes a
Usually, the operating voltage of internal circuits such as semiconductor devices ranges from 1.2 to 3.5V. The
It is an object of the present invention to provide an electrostatic discharge circuit that operates even with a small change in power supply voltage.
An electrostatic discharge circuit according to the present invention for achieving the above object comprises a diode chain connected between a first voltage terminal and the first control node and a first control resistor connected between the first control node and the second voltage terminal. 1 control unit; A drain is connected between the first voltage terminal, a source is connected to the second control node, and a gate input is between the first NMOS transistor, the second control node, and the second voltage terminal. A second control unit including a connected second control resistor; And a discharge unit including a discharge unit configured to flow a discharge current from the first voltage terminal to the second voltage terminal in response to the voltage of the second control node.
The discharge part may be a second NMOS transistor having a drain connected to the first voltage terminal, a source connected to the second voltage terminal, and a gate input of which is a voltage of the second control node.
In addition, the electrostatic discharge circuit according to the present invention for achieving the above object includes a first control resistor connected between a first voltage terminal and the first control node and a diode chain connected between the first control node and the second voltage terminal. A first control unit; A second control unit including a pull-up element configured to pull-up the second control node in response to the voltage of the first control node and a pull-down element configured to pull-down the second control node in response to the voltage of the first control node; And a discharge unit configured to flow a discharge current from the first voltage terminal to the second voltage terminal in response to the voltage of the second control node.
The pull-up device is a PMOS transistor having a source connected to the first voltage terminal, a drain connected to the second control node, and an input of a gate being a voltage of the first control node. And a first NMOS transistor connected to a second control node, a source connected to the second voltage terminal, and a gate input of which is a voltage of the first control node.
The discharge part may be a second NMOS transistor whose drain is connected to the first voltage terminal, a source is connected to the second voltage terminal, and a gate input is a voltage of the second control node.
According to the present invention, it is possible to prevent the internal circuit from being destroyed by operating the electrostatic discharge circuit even with a small change in the power supply voltage.
1 is a configuration diagram of a conventional electrostatic discharge circuit,
2 is a graph showing a snap back characteristic of a transistor;
3 is a configuration diagram of an electrostatic discharge circuit according to an embodiment of the present invention;
4 is a configuration diagram of another electrostatic discharge circuit according to another embodiment of the present invention.
Hereinafter, the most preferred embodiments of the present invention will be described with reference to the accompanying drawings so that those skilled in the art may easily implement the technical idea of the present invention.
2 is a graph illustrating a snap back characteristic of a transistor.
The snapback phenomenon refers to a phenomenon in which a voltage is applied to a gate of a CMOS transistor and a drain-source current IDS increases rapidly as the drain-source voltage VDS of a transistor is gradually increased.
In general, the transistor is turned on when the gate-source voltage VGS is greater than the threshold voltage VT based on the NMOS transistor. In general, however, turning on the transistor is not enough current flow, which may damage the internal circuit. The purpose of the electrostatic discharge circuit is to discharge the current as soon as possible from the power supply voltage (VDD) to the ground voltage (VSS) in order to prevent damage to the internal circuit when there is a sudden voltage change in the power supply voltage (VDD).
Therefore, the snapback phenomenon is used in the discharge circuit. That is, a larger voltage must be applied to the gate than to turn on the transistor. The snapback phenomenon usually occurs when the voltage applied to the gate of the transistor is between 1/2 and 2/3 of the drain-source voltage VDS.
As described above in the description of FIG. 1, the
Until now, the electrostatic discharge circuit has been designed to operate when the voltage at the power supply voltage (VDD) stage becomes 5V or more due to static electricity or noise. 2 shows the voltage of the control node A, that is, the drain-source voltage VDS when the gate voltage VG of the
However, as described above, even when the gate oxide of the transistor becomes thin, the electrostatic discharge circuit needs to operate even when the voltage at the power supply voltage VDD stage is about 4-5V. That is, even when the voltage of the power supply voltage VDD stage is about 4 to 5V, there is a need for the
In the electrostatic discharge circuit of FIG. 1, the gate voltage VG of the
In the conventional case, when the resistance value of the
3 is a configuration diagram of an electrostatic discharge circuit according to an embodiment of the present invention.
As shown in FIG. 3, the electrostatic discharge circuit according to the present invention includes a
The discharge unit 330 includes a second NMOS transistor whose drain is connected to the
First, when the voltage of the
The value of the
Since the voltage of the second control node B is the ground voltage VSS, the second NMOS transistor 331 is turned off. Therefore, the discharge current does not flow. That is, when the voltage of the
Next, when the voltage of the
When the voltage of the
When the voltage of the second control node B becomes 2V, the second NMOS transistor 331 operates in the snapback mode. Therefore, a large discharge current flows from the
In addition, since the electrostatic discharge circuit discharges when the voltage of the
The second NMOS transistor 331 has a width WIDTH greater than that of the
4 is a configuration diagram of an electrostatic discharge circuit according to another embodiment of the present invention. As shown in FIG. 4, the electrostatic discharge circuit according to the present invention includes a
The voltage of the
The pull-up
The
When the voltage of the
First, when the voltage of the
When the voltage of the
Next, when the voltage of the
When the voltage of the
Therefore, it can be seen that the electrostatic discharge circuit of FIG. 4 operates in the same manner as the electrostatic discharge circuit of FIG. 3.
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit and scope of the invention.
VDD: power supply voltage VSS: ground voltage
A: first control node B: second control node
301: first voltage terminal 302: second voltage terminal
310:
315: first control resistor 320: second control unit
321: first NMOS transistor 322: second control resistor
330: discharge unit 331: second NMOS transistor
Claims (8)
A drain is connected between the first voltage terminal, a source is connected to the second control node, and a gate input is provided between the first NMOS transistor, the second control node, and the second voltage terminal. A second control unit including a connected second control resistor; And
A discharge unit including a discharge unit configured to flow a discharge current from the first voltage terminal to the second voltage terminal in response to the voltage of the second control node.
Electrostatic discharge circuit comprising a.
And wherein the voltage of the first voltage terminal is a power supply voltage and the voltage of the second voltage terminal is a ground voltage.
And wherein the discharge portion is a second NMOS transistor whose drain is connected to the first voltage terminal, a source is connected to the second voltage terminal, and an input of a gate is a voltage of the second control node.
And the second NMOS transistor has a larger gate width than the first NMOS transistor.
A second control unit including a pull-up element configured to pull-up the second control node in response to the voltage of the first control node and a pull-down element configured to pull-down the second control node in response to the voltage of the first control node; And
A discharge unit configured to flow a discharge current from the first voltage terminal to the second voltage terminal in response to the voltage of the second control node;
Electrostatic discharge circuit comprising a.
And wherein the voltage of the first voltage terminal is a power supply voltage and the voltage of the second voltage terminal is a ground voltage.
The pull-up device is a PMOS transistor having a source connected to the first voltage terminal, a drain connected to the second control node, and an input of a gate being a voltage of the first control node. And a source connected to the second voltage terminal, a gate input, and a voltage of the first control node to the first NMOS transistor.
And wherein the discharge portion is a second NMOS transistor whose drain is connected to the first voltage terminal, a source is connected to the second voltage terminal, and a gate input is a voltage of the second control node.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020100050318A KR20110130811A (en) | 2010-05-28 | 2010-05-28 | Electrostatic discharge circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020100050318A KR20110130811A (en) | 2010-05-28 | 2010-05-28 | Electrostatic discharge circuit |
Publications (1)
Publication Number | Publication Date |
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KR20110130811A true KR20110130811A (en) | 2011-12-06 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020100050318A KR20110130811A (en) | 2010-05-28 | 2010-05-28 | Electrostatic discharge circuit |
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KR (1) | KR20110130811A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190066498A (en) * | 2017-12-05 | 2019-06-13 | 삼성전자주식회사 | Electrostatic discharge (ESD) protection circuit and integrated circuit including the same |
CN113793815A (en) * | 2021-09-26 | 2021-12-14 | 杭州广立微电子股份有限公司 | Wide-voltage-range high-speed multistage discharge circuit, test system and discharge method |
-
2010
- 2010-05-28 KR KR1020100050318A patent/KR20110130811A/en not_active Application Discontinuation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190066498A (en) * | 2017-12-05 | 2019-06-13 | 삼성전자주식회사 | Electrostatic discharge (ESD) protection circuit and integrated circuit including the same |
CN113793815A (en) * | 2021-09-26 | 2021-12-14 | 杭州广立微电子股份有限公司 | Wide-voltage-range high-speed multistage discharge circuit, test system and discharge method |
CN113793815B (en) * | 2021-09-26 | 2024-04-26 | 杭州广立测试设备有限公司 | Wide-voltage-range high-speed multistage discharge circuit, test system and discharge method |
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