TWI782507B - A cassette feeding robot arm and sensor with a thin and brittle substrate rubbing vibration sensor - Google Patents
A cassette feeding robot arm and sensor with a thin and brittle substrate rubbing vibration sensor Download PDFInfo
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Abstract
一種機械臂,其包括:基座、設置於上述基座驅動件、至少一移動臂、承載件以及至少一個振盪感測器。移動臂連接於基座並受驅動件驅動而可相對於基座在至少一啟始位置和目標位置間移動/旋轉。承載件設置於移動臂,並供承載至少一薄型脆性基材。振盪感測器包括:至少一對應於上述承載件設置的感測裝置、供儲存一基準值範圍的儲存裝置、進行比對運算的中央處理裝置以及當發現承載件產生異常振動時發出警示的警示模組。藉由偵測承載薄型脆性基材的承載件從移動到達定位時的阻尼振動狀態,來判定承載件所承載的薄型脆性基材與物體發生擦碰。 A mechanical arm, which includes: a base, a driving element disposed on the base, at least one moving arm, a bearing element and at least one oscillation sensor. The moving arm is connected to the base and is driven by the driving member to move/rotate relative to the base between at least a starting position and a target position. The bearing part is arranged on the moving arm, and is used for bearing at least one thin brittle substrate. The vibration sensor includes: at least one sensing device corresponding to the above-mentioned carrier, a storage device for storing a range of reference values, a central processing device for comparison calculation, and a warning device that sends out a warning when abnormal vibration of the carrier is found mod. By detecting the damped vibration state of the carrier carrying the thin brittle substrate from moving to the position, it is determined that the thin brittle substrate carried by the carrier collides with the object.
Description
本發明係關於薄型脆性基材擦碰震盪偵測的技術領域,特別是關於一種可偵測承載薄型脆性基材的承載件的阻尼振動狀態以判定薄型脆性基材是否與其所經過的物體擦碰的感測器及配置該感測器的機械臂。 The present invention relates to the technical field of detection of rubbing and vibration of thin brittle substrates, in particular to a kind of damped vibration state of a carrier bearing thin brittle substrates that can be detected to determine whether the thin brittle substrates have rubbed against objects passing by The sensor and the robot arm that configures the sensor.
在工業應用中經常會使用薄型脆性基材,例如半導體晶圓、太陽能電池基板、面板的基材或用於電子裝置的玻璃、陶瓷板材等,這些薄型基材通常受限於材料結構,一旦厚度夠薄,結構強度便相當有限,因此在本案中稱其為脆性基材。這些基材又往往需要經過多個製程來產生最後的目標產品,例如磊晶、光刻、蝕刻、切割及封裝等製程,玻璃板材也需要進行退火等製程。這些製程通常是在不同的機台進行,因此當要對於這類薄型脆性基材進行一系列的加工製程時,就需要在各機台間運送,以半導體晶圓為例,通常是放置在基材容置器(晶圓匣)內,以便於保護薄型脆性基材在運送過程中不會受到損傷,當基材容置器被運送到達機台附近時,通常是改以機械手臂將薄型脆性基材在機台與基材容置器之間進行搬運,例如以夾持或承托的方式將待加工的基材從基材容置器搬運至機台,或將完成加工後的基材從機台搬運進入基材容置器。 Thin brittle substrates are often used in industrial applications, such as semiconductor wafers, solar cell substrates, panel substrates or glass for electronic devices, ceramic plates, etc. These thin substrates are usually limited by the material structure. Once the thickness Thin enough, the structural strength is quite limited, so it is called a brittle substrate in this case. These substrates often need to go through multiple processes to produce the final target product, such as epitaxy, photolithography, etching, cutting, and packaging. The glass plate also needs to be annealed. These processes are usually carried out on different machines. Therefore, when a series of processing processes are to be performed on such thin and brittle substrates, they need to be transported between the machines. Taking semiconductor wafers as an example, they are usually placed on the substrate. In order to protect the thin brittle substrate from damage during transportation, when the substrate container is transported to the vicinity of the machine, the thin brittle substrate is usually replaced by a mechanical arm. The substrate is transported between the machine and the substrate container, such as transferring the substrate to be processed from the substrate container to the machine by clamping or supporting, or transferring the processed substrate Transfer from the machine table into the substrate holder.
機械手臂在運行時由於本身機構的結構會產生振動,例如馬達的振動傳遞至機械手臂、機械結構間的摩擦力所產生的振動或者是機械手臂從移動的狀態到達定位後瞬間靜止時通過結構的阻尼效應產生的振動等。機械手臂所產生的振動對於薄型脆性基材的搬運過程會造成影響,例如振動過大容易造成基材掉落或刮傷等,因此現有技術多半是在機械手臂上設置振動感測器,以量測機械手臂的振動狀態,藉此判定機械手臂在搬運基材的過程中,其振動是否會造成基材的損傷。 The mechanical arm will vibrate due to the structure of its own mechanism when it is running. For example, the vibration of the motor is transmitted to the mechanical arm, the vibration generated by the friction between the mechanical structures, or the mechanical arm passes through the structure when it reaches the position from the moving state. Vibration due to damping effect, etc. The vibration generated by the mechanical arm will affect the handling process of thin and brittle substrates. For example, if the vibration is too large, it may easily cause the substrate to drop or be scratched. The vibration state of the robotic arm is used to determine whether the vibration of the robotic arm will cause damage to the substrate during the process of transporting the substrate.
但是上述的現有技術是偵測機械手臂本身在運行時的振動狀態,因此只能判斷機械手臂本身的振動狀態是否影響基材的搬運。對於機械手臂將基材搬運至機台的加工區域或將基材搬運進入基材容置器時,由於機械手臂行程的誤差或者是由於機台的加工區域或基材容置器產生變形所導致的誤差,使基材在搬運至機台或基材容置器所可能產生的擦碰,現有技術無法進行判定。基材產生擦碰後不僅可能造成基材本身的損傷,基材擦碰後所產生的碎屑,也可能因而散布至空間中,對其他基材或機台造成汙染。 However, the above-mentioned prior art detects the vibration state of the robot arm itself during operation, so it can only determine whether the vibration state of the robot arm itself affects the handling of the substrate. When the robot arm transports the substrate to the processing area of the machine or transports the substrate into the substrate holder, due to the error of the stroke of the robot arm or the deformation of the processing area of the machine or the substrate holder The error, so that the possible friction of the substrate when it is transported to the machine or the substrate container, cannot be judged by the prior art. After the substrate is rubbed, it may not only cause damage to the substrate itself, but the debris generated after the substrate is rubbed may also spread into the space and cause pollution to other substrates or machines.
若以半導體晶圓為例,由於操作過程均需保持在無塵室內,即使是機械手臂在到位後的阻尼振動達到例如1mm範圍,都可能導致半導體晶圓擦撞晶圓匣或機台,嚴重時造成破裂,即使僅是輕微擦碰,都可能激起大量微粒散落而嚴重破壞無塵室內的空氣潔淨程度,由於這種事故極難被即時發現,而單片半導體晶圓可能價值數百至數千美元,倘若連續污染潔淨室或機台數小時,所造成商業損失將是難以估算。 Taking semiconductor wafers as an example, since the operation process needs to be kept in a clean room, even if the damped vibration of the robotic arm reaches the range of 1mm, for example, the semiconductor wafer may collide with the wafer cassette or machine, seriously Even if it is only slightly scratched, it may cause a large number of particles to scatter and seriously damage the cleanliness of the air in the clean room. Because this kind of accident is extremely difficult to be found immediately, and a single semiconductor wafer may be worth hundreds to Thousands of dollars, if the clean room or machine is continuously polluted for several hours, the commercial loss will be difficult to estimate.
目前針對此種問題,一般是以設置光學監視器進行監控,藉由影像資料判斷機械手臂的行程與位置,藉以偵測因機械鬆動、老化所造成的誤差或振動。然而,一方面各式各樣半導體晶圓可能會因製程而有不同的顏色,導致光學監測的數值需要頻繁調整;另方面要偵測每一機台,都需要從多角度方向設置光學監測裝置,不但增加成本,也造成操作和維修保養的限制和負擔;尤其是機械手臂進入晶圓匣時會被遮蔽,無法輕易由上方或側面完成精準偵測,讓偵測警示的效果大打折扣。 At present, to solve this kind of problem, an optical monitor is generally used for monitoring, and the stroke and position of the robot arm are judged by image data, so as to detect errors or vibrations caused by mechanical looseness and aging. However, on the one hand, various semiconductor wafers may have different colors due to the manufacturing process, resulting in frequent adjustment of optical monitoring values; on the other hand, to detect each machine, it is necessary to install optical monitoring devices from multiple angles , not only increases the cost, but also causes restrictions and burdens on operation and maintenance; especially when the robot arm enters the wafer cassette, it will be covered and cannot easily complete accurate detection from above or from the side, greatly reducing the effect of detection and warning.
另外,在晶圓進行研磨平坦化的過程中,例如進行化學機械研磨(chemical mechanical planarization,CMP)的過程中,也可能因為異常振動而使研磨的晶圓受損,例如由於基材變形(700μm-700μm)使得研磨拋光製程的阻尼振盪會產生異常。此外,一般的監測都是針對機械臂的移動與振動,對於卡匣的變形或基材本身因為加工而變形都無法監測。因此,如何讓這類薄型脆性基材在搬運過程中被妥善監測,並在一旦產生輕微擦碰時即時示警,藉此控制損害而避免持續擴大,甚至進一步找尋出卡匣的變形或基材的變形,從源頭解決問題,就是本發明所要突破的技術貢獻。 In addition, during the process of grinding and planarizing the wafer, such as chemical mechanical planarization (CMP), the ground wafer may also be damaged due to abnormal vibration, such as deformation of the substrate (700 μm -700μm) makes the damped oscillation of the grinding and polishing process abnormal. In addition, general monitoring is aimed at the movement and vibration of the robotic arm, and cannot monitor the deformation of the cassette or the deformation of the substrate itself due to processing. Therefore, how to properly monitor this kind of thin and brittle substrate during the handling process, and give an immediate warning in the event of a slight scratch, so as to control the damage and avoid continuous expansion, and even further find out the deformation of the cassette or the damage of the substrate Deformation, solving the problem from the source is the technical contribution that the present invention will break through.
有鑑於此,本發明的目的在於提供一種具薄型脆性基材擦碰震盪感測器的入匣機械臂,藉由偵測機械臂的阻尼振動狀態,判定薄型脆性基材是否產生擦碰,即時發現,有效控制損害。 In view of this, the purpose of the present invention is to provide a box-loading robot arm with a thin brittle substrate rubbing vibration sensor, by detecting the damped vibration state of the robotic arm, it can be determined whether the thin brittle substrate has rubbed, and the real-time Discovery and effective damage control.
本發明的另一目的在於提供一種具薄型脆性基材擦碰震盪感測器的入匣機械臂,可以在多方向維度偵測機械臂的振動狀態,提升判定是否產生擦碰的準確度與信賴度。 Another object of the present invention is to provide a box-loading robotic arm with a thin brittle substrate rubbing vibration sensor, which can detect the vibration state of the robotic arm in multiple directions and dimensions, and improve the accuracy and reliability of judging whether rubbing occurs. Spend.
本發明的又一目的在於提供一種具薄型脆性基材擦碰震盪感測器的入匣機械臂,可選擇在機械臂接近定位時才啟動警示模組,有效避免錯誤警示。 Another object of the present invention is to provide a box-loading robotic arm with a thin brittle substrate rubbing vibration sensor, which can choose to activate the warning module when the robotic arm is close to the positioning, effectively avoiding false warnings.
本發明的再一目的在於提供一種具薄型脆性基材擦碰震盪感測器的入匣機械臂,可選擇微機電元件進行振盪監測,獲得阻尼振盪的正常和異常頻率,不受任何遮蔽干擾。 Another object of the present invention is to provide a box-loading robot arm with a thin brittle substrate rubbing vibration sensor, which can select micro-electromechanical components for vibration monitoring, and obtain normal and abnormal frequencies of damped vibration without any shielding interference.
本發明的再一目的在於提供一種入匣機械臂用的擦碰振盪感測器,藉由微型化的感測裝置,使得量測位置可以接近機械臂前端,提升量測訊雜比。 Another object of the present invention is to provide a rubbing vibration sensor for a box-loading robot arm. With a miniaturized sensing device, the measurement position can be close to the front end of the robot arm, thereby improving the measurement signal-to-noise ratio.
本發明的又另一目的在於提供一種入匣機械臂用的擦碰振盪感測器,藉由可選擇將感測裝置和後端的中央處理裝置以無線方式訊號連接,進一步讓貼近機械臂端部的感測裝置體積縮減,以減少對機械臂慣性所增加的負載。 Yet another object of the present invention is to provide a wiping vibration sensor for a box-loading robot arm. By optionally connecting the sensing device with the central processing unit at the rear end in a wireless manner, it is further close to the end of the robot arm. The size of the sensing device is reduced to reduce the load added to the inertia of the manipulator.
為了達成上述目的,本發明提供一種機械臂,供輸送至少一薄型脆性基材,本發明的機械臂的一實施例包括:一基座、一設置於上述基座驅動件、至少一移動臂、一承載件以及至少一個振盪感測器。移動臂連接於基座並受驅動件驅動而可相對於基座在至少一啟始位置和一目標位置間移動/旋轉。承載件設置於移動臂,並供承載至少一薄型脆性基材。振盪感測器包括:至少一對應於上述承載件設置的感測裝置、一供儲存一基準值範圍的儲存裝置、一中央處理裝置以及一警示模組。前述感測裝置包括彼此相互垂直的三維振動感測件,供量測上述移動臂和/或上述承載件的三維振動,並輸出一偵測訊號。中央處理裝置係訊號連接於上述感測裝置及上述儲存裝置,供接收上述偵 測訊號並與上述一基準值範圍進行比對,當上述偵測訊號超出上述基準值範圍以外,則產生一警示訊號。警示模組供接收上述警示訊號而發出警示。 In order to achieve the above object, the present invention provides a mechanical arm for transporting at least one thin brittle substrate. An embodiment of the mechanical arm of the present invention includes: a base, a driving member arranged on the base, at least one moving arm, A carrier and at least one vibration sensor. The moving arm is connected to the base and is driven by the driving member to move/rotate relative to the base between at least a starting position and a target position. The bearing part is arranged on the moving arm, and is used for bearing at least one thin brittle substrate. The vibration sensor includes: at least one sensing device corresponding to the bearing part, a storage device for storing a reference value range, a central processing device and a warning module. The sensing device includes three-dimensional vibration sensing elements perpendicular to each other for measuring the three-dimensional vibration of the moving arm and/or the bearing element and outputting a detection signal. The central processing device is signal-connected to the above-mentioned sensing device and the above-mentioned storage device for receiving the above-mentioned detection The detection signal is compared with the above-mentioned reference value range, and when the above-mentioned detection signal exceeds the above-mentioned reference value range, a warning signal is generated. The warning module is used for receiving the above warning signal and issuing a warning.
本發明提供一種薄型脆性基材擦碰震盪感測器,其用於量測一機械臂的一承載件在承載輸送一薄型脆性基材的阻尼振動,本發明的薄型脆性基材擦碰震盪感測器的一實施例包括上述的薄型脆性基材擦碰震盪感測器,而用於達成本發明的上述目的。本發明的薄型脆性基材擦碰震盪感測器包括至少一對應於上述承載件設置的感測裝置、一供儲存一基準值範圍的儲存裝置、一中央處理裝置以及一警示模組。前述感測裝置包括彼此相互垂直的三維振動感測件,供量測上述移動臂和/或上述承載件的三維振動,並輸出一偵測訊號。中央處理裝置係訊號連接於上述感測裝置及上述儲存裝置,供接收上述偵測訊號並與上述一基準值範圍進行比對,當上述偵測訊號超出上述基準值範圍以外,則產生一警示訊號,警示模組則接收上述警示訊號而發出警示。 The invention provides a thin-type brittle substrate rubbing vibration sensor, which is used to measure the damped vibration of a bearing part of a mechanical arm when carrying and transporting a thin-shaped brittle substrate. An embodiment of the detector includes the above-mentioned thin brittle substrate rubbing vibration sensor, which is used to achieve the above-mentioned object of the present invention. The thin brittle substrate rubbing vibration sensor of the present invention includes at least one sensing device corresponding to the above-mentioned carrier, a storage device for storing a reference value range, a central processing device and a warning module. The sensing device includes three-dimensional vibration sensing elements perpendicular to each other for measuring the three-dimensional vibration of the moving arm and/or the bearing element and outputting a detection signal. The central processing device is signal-connected to the above-mentioned sensing device and the above-mentioned storage device for receiving the above-mentioned detection signal and comparing it with the above-mentioned reference value range. When the above-mentioned detection signal exceeds the above-mentioned reference value range, a warning signal is generated. , the warning module receives the warning signal and issues a warning.
本發明的薄型脆性基材擦碰震盪感測器藉由偵測承載薄型脆性基材的承載件從移動到達定位時的阻尼振動狀態,判斷承載件的阻尼振動狀態是否異於承載件於同一行程且承載相同的薄型脆性基材所產生的自然阻尼振動,來判定承載件所承載的薄型脆性基材與物體發生擦碰。本發明的薄型脆性基材擦碰震盪感測器藉由設置三維振動感測件,可在多個方向上偵測承載件的振動狀態,藉此可以有效地偵測到各方位上產生的擦碰。另外,本發明的薄型脆性基材擦碰震盪感測器可以選擇在到達定位時才開始將警示訊號傳送至警示模組,或在到達定位時才開啟警示模組,皆可選擇性地使得薄型脆性基材擦碰震盪感測器在到達定位時才啟動警示功能,避免感測件偵測承載件與該物體擦碰無關的振動狀態而誤發出警示。 The thin brittle substrate rubbing vibration sensor of the present invention detects whether the damped vibration state of the carrier is different from that of the carrier in the same stroke by detecting the damped vibration state of the carrier carrying the thin brittle substrate from moving to positioning And the natural damping vibration produced by bearing the same thin brittle substrate is used to determine the friction between the thin brittle substrate carried by the carrier and the object. The thin brittle substrate rubbing shock sensor of the present invention can detect the vibration state of the bearing part in multiple directions by setting a three-dimensional vibration sensing part, so that it can effectively detect the rubbing generated in various directions. bump. In addition, the thin brittle substrate rubbing vibration sensor of the present invention can choose to transmit the warning signal to the warning module when it reaches the position, or turn on the warning module when it reaches the position, all of which can selectively make the thin The brittle substrate rubbing and vibration sensor activates the warning function only when it reaches the fixed position, so as to prevent the sensing part from detecting the vibration state of the bearing part that has nothing to do with the rubbing of the object and falsely giving a warning.
尤其是對於卡匣變形或者例如半導體晶圓在製程中變形等無法藉由外部光學觀察而得到的警示,藉由本發明的偵測,也可以在一發生擦碰時就立即反應得知,藉此提醒問題所在而獲得及時處理。 Especially for warnings that cannot be obtained through external optical observation, such as the deformation of the cassette or the deformation of the semiconductor wafer during the manufacturing process, through the detection of the present invention, it can also be known immediately when a scratch occurs, thereby Remind the problem and get timely treatment.
1:機械臂 1: Mechanical arm
10:基座 10: base
20:驅動件 20: Driver
30:移動臂 30: Moving arm
40:承載件 40: Carrier
50:震盪感測器 50: Oscillation sensor
51:感測裝置 51: Sensing device
52:中央處理裝置 52: Central processing unit
53:儲存裝置 53: storage device
54:警示模組 54:Warning module
511:三維振動量測件 511: Three-dimensional vibration measurement parts
512:晶片 512: chip
513:無線訊號發送件 513: Wireless signal sender
521:處理器晶片 521: processor chip
522:類比數位轉換電路 522: Analog to digital conversion circuit
523:濾波電路 523: filter circuit
524:無線訊號收發件 524: Wireless signal transceiver
C:基材容置器 C: substrate container
S:薄型脆性基材 S: thin brittle substrate
W:機台的工作區域 W: the working area of the machine
第1圖為本發明的機械臂的一實施例的側視圖。 Fig. 1 is a side view of an embodiment of the robot arm of the present invention.
第2圖為本發明的薄型脆性基材擦碰震盪感測器的一實施例的系統方塊圖。 FIG. 2 is a system block diagram of an embodiment of the thin brittle substrate rubbing vibration sensor of the present invention.
第3圖為本發明的機械臂在機台的工作區域及基材容置器間移動搬運薄型脆性基材的俯視圖。 Fig. 3 is a top view of the robot arm of the present invention moving and transporting thin brittle substrates between the working area of the machine table and the substrate container.
第4圖為本發明的機械臂將薄型脆性基材輸送進入基材容置器的側視圖。 Fig. 4 is a side view of the robotic arm of the present invention transporting thin brittle substrates into the substrate holder.
第5圖為本發明的機械臂在搬運薄型脆性基材的行程中未發生擦碰及發生擦碰的振動的振幅與時間的關係曲線圖。 Fig. 5 is a graph showing the relationship between the vibration amplitude and time of the mechanical arm of the present invention in the process of transporting thin brittle substrates without rubbing and rubbing.
第6圖為本發明的機械臂在搬運薄型脆性基材的行程中未發生擦碰及發生擦碰的振動的振幅與頻率的關係曲線圖。 Fig. 6 is a graph showing the relationship between the vibration amplitude and frequency of the vibration without rubbing and rubbing with the robotic arm of the present invention during the process of transporting the thin brittle substrate.
請參閱第1圖、第2圖、第3圖及第4圖,其表示本發明的機械臂及薄型脆性基材擦碰震盪感測器的一實施例。本實施例的機械臂1包括一基座10、一驅動件20、多個移動臂30、一承載件40以及一震盪感測器50。
Please refer to FIG. 1 , FIG. 2 , FIG. 3 and FIG. 4 , which represent an embodiment of the mechanical arm and the thin brittle substrate rubbing vibration sensor of the present invention. The
如第1圖所示,基座10設置在一工作的基準面上,例如設置在地面或工作機台的設置面,作為計算移動臂30移動的基準位置。基座10用於承載移動臂30、承載件40及震盪感測器50。
As shown in FIG. 1 , the
多個移動臂30相互連接,本實施例的移動臂30係相互樞接,各移動臂30可相互旋轉,藉此延伸或旋轉至希望的距離和角度。但本發明的移動臂不限於此,也可以是彼此滑動組接而且正交設置而可以分別沿著三個正交的座標軸移動的移動臂,或者是以部分滑動組接、部分轉動組接的方式彼此連接,並無特別限定。
A plurality of moving
驅動件20可設置在基座10,用於驅動移動臂30移動或旋轉。驅動件20可以是伺服馬達或液壓馬達等驅動元件。對於多個移動臂30的結構而言,由於每個移動臂30的移動或旋轉係分別控制,因此可以在每個移動臂30的驅動位置或旋轉中心分別設置一個驅動件20,以驅動對應的移動臂30樞轉、移動或伸縮。
The driving
承載件40連接於多個移動臂30中最末端的移動臂30,多個移動臂30在各自旋轉或移動後,最末端的移動臂30會到達目標位置,藉此將承載件40移動至該目標位置。承載件40用於承載薄型脆性基材S,因此藉由上述結構,如第3圖所示,承載件40可將薄型脆性基材再一起始位置及一目標位置間移動,例如將薄型脆性基材S從基材容置器C移動至機台的工作區域W進行加工,或將加工後的薄型脆性基材S從機台的工作區域W移動至基材容置器C。本實施例的承載件40是以承托薄型脆性基材的托架為例,且薄型脆性基材是例釋為半導體晶圓,但熟悉本技術領域人士可以輕易理解,承載件40也可以是夾持薄型脆性基材的爪夾。承載件40可以是固定在移動臂30的末端,或者是與移動臂30轉動組接或滑動組接。
The
如第3圖所示,承載件40將薄型脆性基材S在機台的工作區域W與基材容置器C間移動時,承載件40由於驅動件20的運轉、移動臂30
間摩擦力的作用以及移動臂30和承載件40材料本身的剛性等因素,承載件40會產生振動。這些振動除了移動臂30和承載件40在移動過程中的振動以外,當承載件40由移動臂30從移動狀態到達預定的目標位置後停止時,承載件40本身會從動態藉由承載件40本身慣性的阻尼作用產生阻尼振動而逐漸振動終至靜止。
As shown in FIG. 3, when the
另外,如第4圖所示,在移動臂30移動的行程中,可能會經過某些結構物體,尤其是在機台的工作區域W的機台構件及基材容置器C的框體等,承載件40在通過這些結構物體時,由於行程設置的誤差或結構物體的變形等因素,由承載件40所承載的薄型脆性基材S在極少的情況下,可能會與這些結構物體產生擦碰等問題。在薄型脆性基材S與這接結構物體產生擦碰之後,承載件40會產生與薄型脆性基材S未產生擦碰時不同的阻尼振動型態,藉由量測在每個行程中承載件40的振動狀態,特別是承載件40從移動到達例如目標位置後的阻尼振動狀態,然後與承載件40在同一行程且承載相同的薄型脆性基材S的自然振動狀態進行比較,如果現行的振動狀態與自然振動狀態有明顯的差異模式,則判定承載件40所承載的薄型脆性基材S與這些結構物體產生擦碰。
In addition, as shown in FIG. 4, during the moving stroke of the
由於承載件40承載各種薄型脆性基材S以及在不同移動行程的自然阻尼振動狀態都不相同,可事先以承載件40承載各種不同的薄型脆性基材S而且對於各種加工機台所設定的移動行程量測承載件40的自然振動狀態或自然阻尼振動狀態,並將所量測得到的自然振動狀態作為基準值範圍,用來與承載件40在加工過程中的每個行程的振動狀態或阻尼振動狀態進行比對,藉以判定薄型脆性基材S是否產生擦碰。
Since the
為了量測承載件40的振動狀態,本發明的震盪感測器50設置在承載件40上,例如震盪感測器50可以設置在承載件40遠離薄型脆性基材S的表面,即設置在承載件40的底面,藉此一方面可以量測承載件40的振動狀態,另一方面避免影響承載件40承載薄型脆性基材S以及承載件40移動時的力平衡狀態。
In order to measure the vibration state of the
如第4圖所示,震盪感測器50包括一感測裝置51、一中央處理裝置52、一儲存裝置53以及一警示模組54。其中感測裝置51可安裝在承載件40,而中央處理裝置52、儲存裝置53和警示模組54可以安裝在其他的位置,例如安裝在基座10,以避免其增加承載件40或/及移動臂30承載的重量並影響承載件40或/及移動臂30整體的慣性。
As shown in FIG. 4 , the
感測裝置51包括一殼體以及安裝在殼體中的三維振動量測件511,三維振動量測件511可包括三個量測加速度或位移的晶片512,分別設置在三個彼此相互正交的方向上,藉此量測承載件40或/及移動臂30的三維振動狀態。三維振動量測件511可以是微機電式的三軸加速度量測元件、電容式的位移量測元件或壓電式的位移量測元件,其並無限定,只要能量測三維的加速度或位移的元件均可適用。感測裝置51中還包括一電路板,在電路板上設有訊號傳輸接口或無線訊號發送件513,訊號傳輸接口可供連接一訊號傳輸纜線。三維振動量測件將量測到的承載件40或/及移動臂30的加速度或位移產生一偵測訊號,偵測訊號經由訊號傳輸接口或無線訊號發送件513以有線或無線的方式傳送至中央處理裝置52。
The
中央處理裝置52包括處理器晶片521、類比數位轉換電路522、濾波電路523和訊號接收接口或無線訊號收發件524等,訊號接收接
口可供連接上述訊號傳輸纜線,以接收三維振動量測件511產生的偵測訊號,或者是以無線訊號收發件524接收來自無線訊號發送件513所發送的偵測訊號。類比數位轉換電路522將三維振動量測件產生的類比的偵測訊號轉換成數位式的偵測訊號,供處理器晶片521運算使用,濾波電路523可以濾除環境的雜訊,以避免影響量測的結果。
The
儲存裝置53可儲存上述承載件40承載各種薄型脆性基材S以及在不同移動行程下測得的自然振動狀態所對應的物理量,例如振動的振幅和頻率。儲存裝置53也可以儲存供中央處理裝置52進行比對運算的程式碼,程式碼係對應於比對運算的演算法。由於振動現象是多種振動波的組合,程式碼中也可以包含將振幅的時域數據轉換成頻域數據的程式。儲存裝置53可以是記憶體、硬碟或USB隨身碟等元件。
The
操作人員可將加工機台的類型、加工方式及薄型脆性基材S的種類輸入震盪感測器50,例如可在每部機械臂1設置觸控式介面裝置,供顯示機械臂1的狀態或修改設定機械臂1的操作參數,或者是在監控中心的輸入裝置對每部機械臂1修改操作參數。在操作人員設定了與加工機台的類型、加工方式及薄型脆性基材S對應的操作參數後,中央處理裝置52從儲存裝置53載入對應的比對運算程式碼以及與上述加工機台的類型、加工方式及薄型脆性基材S的種類對應的自然振動狀態的各種基準值範圍。在中央處理裝置52接收了偵測訊號以後,其將偵測訊號與基準值範圍進行比對,如第5圖和第6圖所示,如果偵測訊號對應的物理量數值在基準值範圍以外,則判定薄型脆性基材S連同承載件42產生了異於自然振動狀態的振動。例如,產生擦碰時,由於外力對薄型脆性基材S連同承載件42做功,
能量增加使得振動的振幅變大,如第5圖的偵測訊號1的曲線所示,或使得振動產生了自然頻率以外的頻率的震動,如第6圖的偵測訊號3的曲線所示。如果移動路徑過於接近結構物體,結構物體對自然振動產生抑制,使得振動的振幅變小,如第5圖的偵測訊號2的曲線所示。因此只要是承載件42的振動狀態異於其自然振動狀態,即可判定為發生擦碰,因而可藉此修正承載件42移動的行程或調整結構物體的位置,達到避免再度擦碰的功效。
The operator can input the type of the processing machine, the processing method and the type of the thin brittle substrate S into the
警示模組54訊號連接於中央處理裝置52,當中央處理裝置52將偵測訊號與自然振動狀態的基準值範圍比對時,如果判定薄型脆性基材S連同承載件42產生了異於自然振動狀態的振動,則中央處理裝置52產生警示訊號,警示訊號傳送至警示模組54而產生警示。警示模組54可以是設置在機械臂1可發出聲音的揚聲器、設置在機械臂1可發光的燈具或者是設置在監控中心的伺服器內的程式模組,警示訊號可經由中央處理裝置52的無線訊號收發件傳送至監控中心的伺服器,警示模組54在伺服器中執行,在伺服器接收到警示訊號後,監控中心的伺服器會螢幕上顯示哪一部機械臂有擦碰的狀態。監控中心的操作人員在得到警示後,可立即停止該部機械臂1的運行,並進行後續的檢修作業與基材碎屑的清理作業。
The signal of the
中央處理裝置52還可包括警示啟動單元,由於承載件42在整個移動的行程中,只有在從移動到達靜止的狀態時才會產生阻尼振動,因此感測裝置51如果一直處在偵測狀態,則中央處理裝置52在承載件42的整個移動過程則持續進行比對,如此容易因偵測到與擦碰物體無關的異常振動而導致警示模組54發出警示,而此警示與擦碰物體並無關聯,如此會經常性造成薄型脆性基材S的搬運作業不必要的中斷。因此警示啟動單元是用於當承載件42
移動至目標位置後,警示啟動單元啟動,並且中央處理裝置52開始將警示訊號傳送至警示模組54。警示啟動單元可包括程式模組,程式模組計算驅動件20轉動的角度值或移動的距離,來判斷承載件42是否移動至目標位置,當判斷承載件42移動至目標位置後,中央處理裝置52開始將產生的警示訊號傳送至警示模組54,藉此產生警示的作用。
The
本發明的薄型脆性基材擦碰震盪感測器藉由偵測承載薄型脆性基材的承載件從移動到達定位時的阻尼振動狀態,判斷承載件的阻尼振動狀態是否異於承載件於同一行程且承載相同的薄型脆性基材所產生的自然阻尼振動,來判定承載件所承載的薄型脆性基材與物體發生擦碰。本發明的薄型脆性基材擦碰震盪感測器藉由設置三維振動感測件,可在多個方向上偵測承載件的振動狀態,藉此可以有效地偵測到各方位上產生的擦碰。另外,本發明的薄型脆性基材擦碰震盪感測器在到達定位時才開始將警示訊號傳送至警示模組,使得薄型脆性基材擦碰震盪感測器在到達定位時才啟動警示功能,避免感測件偵測承載件與該物體擦碰無關的振動狀態而誤發出警示。本發明的薄型脆性基材擦碰震盪感測器也可以用於偵測晶圓在研磨過程中的振動狀態,如果在研磨過程中產生與穩態基準值相異的振動狀態(振幅或頻率),可以得知在研磨過程中晶圓與研磨頭間產生異常的應力。 The thin brittle substrate rubbing vibration sensor of the present invention detects whether the damped vibration state of the carrier is different from that of the carrier in the same stroke by detecting the damped vibration state of the carrier carrying the thin brittle substrate from moving to positioning And the natural damping vibration produced by bearing the same thin brittle substrate is used to determine the friction between the thin brittle substrate carried by the carrier and the object. The thin brittle substrate rubbing shock sensor of the present invention can detect the vibration state of the bearing part in multiple directions by setting a three-dimensional vibration sensing part, so that it can effectively detect the rubbing generated in various directions. bump. In addition, the thin brittle substrate rubbing vibration sensor of the present invention starts to transmit the warning signal to the warning module when it reaches the positioning, so that the thin brittle substrate rubbing vibration sensor only starts the warning function when it reaches the positioning, It is avoided that the sensing part detects the vibration state of the bearing part which has nothing to do with the rubbing of the object and falsely sends out an alarm. The thin brittle substrate rubbing vibration sensor of the present invention can also be used to detect the vibration state of the wafer during the grinding process, if the vibration state (amplitude or frequency) different from the steady-state reference value is generated during the grinding process , it can be seen that abnormal stress is generated between the wafer and the grinding head during the grinding process.
震盪感測器50所測得的振動狀態是直接量測的原始數據,經由計算可得機件故障與老化、機械手臂精確度或位移量,例如在機件故障與老化時的振動狀態與正常狀態不同,藉由相同機械臂承載相同工件會得到基準的振動模式,根據此振動模式可得出的描述該振動模式的數學模式,根據該數學模
式可以得出對應的演算法,將演算法轉化成程式碼,而可以在偵測振動狀態時,同步比對機械臂的運行是否異常,還可以計算出機械手臂精確度或位移量。另外,偵測振動頻率可以得知機械臂是否異常,可以作為維修的依據,並且達到預防保養的效果。
The vibration state measured by the
震動感測器50可以得震動數據與頻率關連性,經由適當篩選可以依特徵頻率得到易於偵測或監控的頻率,如第6圖所示,未發生擦碰時,機械臂的振動振幅的最大值是在頻率40Hz-50Hz間,因此可以得到機械臂固有的阻尼振動狀態對應的特徵頻率,因而震動感測器50在產生偵測訊號後,可以將相關性低的其他頻段的訊號波濾除,而留下與特徵頻率相關的波。
The
震動感測器50所測得的振動數據可以用於監控機械臂是否異常,以達到即時監控、反應問題,避免晶片報廢或不良品。
The vibration data measured by the
另外還可以整合機械臂、晶圓和基材容置器的監控方案,對整個製程及相關設備進行監測,除了有利於設備的維護,也有助於提升良率。 In addition, the monitoring solution of the robotic arm, wafer and substrate container can be integrated to monitor the entire process and related equipment, which is not only conducive to equipment maintenance, but also helps to improve yield.
惟以上所述者,僅為本發明之較佳實施例而已,不能以此限定本發明實施之範圍,凡是依本發明申請專利範圍及說明書內容所作之簡單的等效變化與修飾,皆應仍屬本發明涵蓋之範圍內。經過本發明較佳實施例之描述後,熟悉此一技術領域人員應可瞭解到,本案實為一新穎、進步且具產業實用性之發明專利,深具發展價值。 But what is described above is only a preferred embodiment of the present invention, and cannot limit the scope of the present invention. All simple equivalent changes and modifications made according to the patent scope of the present invention and the contents of the description should still be It is within the scope of the present invention. After the description of the preferred embodiments of the present invention, those familiar with this technical field should be able to understand that this case is indeed a novel, progressive and industrially applicable invention patent, which has great development value.
1:機械臂 1: Mechanical arm
10:基座 10: Base
20:驅動件 20: Driver
30:移動臂 30: Moving arm
40:承載件 40: Carrier
50:震盪感測器 50: Oscillation sensor
51:感測裝置 51: Sensing device
52:中央處理裝置 52: Central processing unit
53:儲存裝置 53: storage device
S:薄型脆性基材 S: thin brittle substrate
W:機台的工作區域 W: the working area of the machine
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TW110115322A TWI782507B (en) | 2021-04-28 | 2021-04-28 | A cassette feeding robot arm and sensor with a thin and brittle substrate rubbing vibration sensor |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW546238B (en) * | 2001-07-31 | 2003-08-11 | United Microelectronics Corp | Method and device for preventing bump on boat |
US20050194651A1 (en) * | 2004-02-09 | 2005-09-08 | Toshio Ohashi | Physical quantity sensor |
TW200807602A (en) * | 2006-07-26 | 2008-02-01 | Jia-Xuan Wu | A method for preventing wafer from being scraped and apparatus using the same |
US20110040527A1 (en) * | 2002-01-24 | 2011-02-17 | Kla-Tencor Corporation | Process condition sensing wafer and data analysis system |
US20140154038A1 (en) * | 2012-11-30 | 2014-06-05 | Applied Materials, Inc. | Multi-axis robot apparatus with unequal length forearms, electronic device manufacturing systems, and methods for transporting substrates in electronic device manufacturing |
US20140350712A1 (en) * | 2013-05-21 | 2014-11-27 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Transporting device for substrate of liquid crystal display and using method thereof |
-
2021
- 2021-04-28 TW TW110115322A patent/TWI782507B/en active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW546238B (en) * | 2001-07-31 | 2003-08-11 | United Microelectronics Corp | Method and device for preventing bump on boat |
US20110040527A1 (en) * | 2002-01-24 | 2011-02-17 | Kla-Tencor Corporation | Process condition sensing wafer and data analysis system |
US20050194651A1 (en) * | 2004-02-09 | 2005-09-08 | Toshio Ohashi | Physical quantity sensor |
TW200807602A (en) * | 2006-07-26 | 2008-02-01 | Jia-Xuan Wu | A method for preventing wafer from being scraped and apparatus using the same |
US20140154038A1 (en) * | 2012-11-30 | 2014-06-05 | Applied Materials, Inc. | Multi-axis robot apparatus with unequal length forearms, electronic device manufacturing systems, and methods for transporting substrates in electronic device manufacturing |
US20140350712A1 (en) * | 2013-05-21 | 2014-11-27 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Transporting device for substrate of liquid crystal display and using method thereof |
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