TWI779923B - Pattern verification system and operating method thereof - Google Patents
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Description
本揭露係關於一種圖案驗證系統及一種圖案驗證系統的操作方法。The present disclosure relates to a pattern verification system and an operation method of the pattern verification system.
一般而言,機台作業人員通常會使用二維圖案測試法(shmoo)對記憶體產品進行測試。當機台作業人員使用二維圖案測試法檢測記憶體產品具有異常時,二維圖案測試法產生的二維圖案會出現通過區以及失敗區。由於機台作業人員需手動選擇測試點以分析二維圖案的失敗區,因此增加了機台作業人員的作業量,並且降低了二維圖案測試法進行測試的整體效率。Generally speaking, machine operators usually use the two-dimensional pattern test method (shmoo) to test memory products. When the machine operator uses the two-dimensional pattern test method to detect the abnormality of the memory product, the two-dimensional pattern generated by the two-dimensional pattern test method will have a pass area and a failure area. Since the machine operator needs to manually select test points to analyze the failure area of the two-dimensional pattern, the workload of the machine operator is increased, and the overall efficiency of the two-dimensional pattern test method for testing is reduced.
本揭露之一技術態樣為一種圖案驗證系統。One technical aspect of the present disclosure is a pattern verification system.
根據本揭露一實施方式,一種圖案驗證系統包括第一處理器以及第二處理器。第一處理器配置以對待測元件進行多個操作指令,以產生具有第一區域以及第二區域的二維圖案。第二處理器電性連接第一處理器且配置以依序移除操作指令並同時對待測元件進行測試。當操作指令其中至少一者移除而造成二維圖案的第二區域轉換為第一區域時,第二處理器回復移除中的操作指令的至少一者,並將回復的操作指令的至少一者設定為至少一關鍵操作指令。According to an embodiment of the present disclosure, a pattern verification system includes a first processor and a second processor. The first processor is configured to execute a plurality of operation instructions on the element to be tested to generate a two-dimensional pattern with a first area and a second area. The second processor is electrically connected to the first processor and configured to sequentially remove the operation instructions and simultaneously test the DUT. When at least one of the operation instructions is removed to cause the second area of the two-dimensional pattern to be converted into the first area, the second processor returns at least one of the operation instructions being removed, and at least one of the returned operation instructions or set as at least one key operation instruction.
在本揭露一實施方式中,上述圖案驗證系統還包括掃描單元。掃描單元電性連接第一處理器且配置以掃描二維圖案,以定位二維圖案的第二區域的中心點。In an embodiment of the present disclosure, the above pattern verification system further includes a scanning unit. The scanning unit is electrically connected to the first processor and configured to scan the two-dimensional pattern to locate the center point of the second area of the two-dimensional pattern.
在本揭露一實施方式中,上述圖案驗證系統還包括輸出單元。輸出單元電性連接第二處理器且配置以輸出至少一關鍵操作指令。In an embodiment of the present disclosure, the above-mentioned pattern verification system further includes an output unit. The output unit is electrically connected to the second processor and configured to output at least one key operation instruction.
在本揭露一實施方式中,上述圖案驗證系統還包括記憶體。記憶體電性連接第二處理器且配置以儲存至少一關鍵操作指令。In an embodiment of the present disclosure, the above-mentioned pattern verification system further includes a memory. The memory is electrically connected to the second processor and configured to store at least one key operation instruction.
本揭露之另一技術態樣為一種圖案驗證系統的操作方法。Another technical aspect of the present disclosure is an operation method of a pattern verification system.
根據本揭露一實施方式,一種圖案驗證系統的操作方法包括:對待測元件進行多個操作指令,以產生具有第一區域以及第二區域的二維圖案;以及依序移除操作指令並同時對待測元件進行測試,其中當操作指令其中至少一者移除而造成二維圖案的第二區域轉換為第一區域時,回復移除中的操作指令的至少一者,並將回復的操作指令的至少一者設定為至少一關鍵操作指令。According to an embodiment of the present disclosure, an operating method of a pattern verification system includes: performing a plurality of operating instructions on a device to be tested to generate a two-dimensional pattern having a first region and a second region; and removing the operating instructions sequentially and treating them simultaneously The test element is tested, wherein when at least one of the operation instructions is removed and the second area of the two-dimensional pattern is converted into the first area, at least one of the operation instructions in the removal is replied, and the returned operation instructions are At least one of them is set as at least one key operation instruction.
在本揭露一實施方式中,上述方法還包括使用掃描單元掃描二維圖案,以定位二維圖案的第二區域的中心點。In an embodiment of the present disclosure, the above method further includes scanning the two-dimensional pattern by using the scanning unit to locate the center point of the second area of the two-dimensional pattern.
在本揭露一實施方式中,上述方法還包括將二維圖案的第二區域的中心點設定為測試點,以獲得測試環境。In an embodiment of the present disclosure, the above method further includes setting a center point of the second area of the two-dimensional pattern as a test point to obtain a test environment.
在本揭露一實施方式中,上述測試環境包括測試電壓值及測試速度值。In an embodiment of the present disclosure, the test environment includes a test voltage value and a test speed value.
在本揭露一實施方式中,上述方法還包括使用記憶體儲存至少一關鍵操作指令。In an embodiment of the present disclosure, the above method further includes using a memory to store at least one key operation instruction.
在本揭露一實施方式中,上述方法還包括使用輸出單元輸出至少一關鍵操作指令。In an embodiment of the present disclosure, the above method further includes using the output unit to output at least one key operation instruction.
在本揭露上述實施方式中,當操作指令移除而造成二維圖案的第二區域轉換成第一區域時,圖案驗證系統可回復移除中的操作指令。詳細來說,圖案驗證系統可移除與二維圖案的第二區域無關的操作指令,並且將與二維圖案的第二區域相關的操作指令設定為關鍵操作指令。如此一來,圖案驗證系統只需保留關鍵操作指令,而不需保留原先數量的操作指令,因此可降低圖案驗證系統的保留指令的數量。由於機台操作人員可直接獲得關鍵操作指令而非尚未分析的操作指令,因此可省去機台操作人員手動分析操作指令的時間,以提升圖案驗證系統的測試效率。此外,圖案驗證系統可藉由掃描單元設定二維圖案的第二區域的中心點為測試點,因此可省去機台操作人員手動設定測試點的時間,以提高圖案驗證系統的測試效率。In the above embodiments of the present disclosure, when the removal of the operation command results in the conversion of the second area of the two-dimensional pattern into the first area, the pattern verification system can reply the operation command being removed. In detail, the pattern verification system can remove operation instructions not related to the second region of the two-dimensional pattern, and set operation instructions related to the second region of the two-dimensional pattern as key operation instructions. In this way, the pattern verification system only needs to retain key operation instructions instead of the original number of operation instructions, so the number of reserved instructions of the pattern verification system can be reduced. Since the machine operator can directly obtain the key operation instructions instead of the unanalyzed operation instructions, the time for the machine operator to manually analyze the operation instructions can be saved, so as to improve the test efficiency of the pattern verification system. In addition, the pattern verification system can set the center point of the second area of the two-dimensional pattern as the test point by the scanning unit, thus saving the machine operator from manually setting the test points, thereby improving the test efficiency of the pattern verification system.
以下揭示之實施方式內容提供了用於實施所提供的標的之不同特徵的許多不同實施方式,或實例。下文描述了元件和佈置之特定實例以簡化本案。當然,該等實例僅為實例且並不意欲作為限制。此外,本案可在各個實例中重複元件符號及/或字母。此重複係用於簡便和清晰的目的,且其本身不指定所論述的各個實施方式及/或配置之間的關係。The embodiments disclosed below provide many different implementations, or examples, for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to simplify the present case. Of course, these examples are only examples and are not intended to be limiting. In addition, the present case may repeat element symbols and/or letters in various instances. This repetition is for the purposes of brevity and clarity and does not in itself dictate a relationship between the various implementations and/or configurations discussed.
諸如「在……下方」、「在……之下」、「下部」、「在……之上」、「上部」等等空間相對術語可在本文中為了便於描述之目的而使用,以描述如附圖中所示之一個元件或特徵與另一元件或特徵之關係。空間相對術語意欲涵蓋除了附圖中所示的定向之外的在使用或操作中的裝置的不同定向。裝置可經其他方式定向(旋轉90度或以其他定向)並且本文所使用的空間相對描述詞可同樣相應地解釋。Spatially relative terms such as "below", "beneath", "lower", "above", "upper", etc. may be used herein for convenience of description to describe The relationship of one element or feature to another element or feature as shown in the drawings. Spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
第1圖繪示根據本揭露一實施方式之圖案驗證系統100的方塊圖。第2圖繪示根據本揭露一實施方式之具有第一區域210及第二區域220的二維圖案200的示意圖。圖案驗證系統100包括第一處理器110以及第二處理器120。第一處理器110配置以對待測元件300進行多個操作指令112,以產生具有第一區域210以及第二區域220的二維圖案200。舉例來說,待測元件300可為記憶體產品,例如動態隨機存取記憶體(Dynamic random access memory, DRAM),但並不以此為限。在一些實施方式中,圖案驗證系統100可使用二維圖案測試法(Shmoo)對待測元件300進行測試,並根據測試結果產生具有第一區域210以及第二區域220的二維圖案200。詳細來說,二維圖案200的第一區域210可代表待測元件300的測試結果為通過,而二維圖案200的第二區域220可代表待測元件300的測試結果為失敗。FIG. 1 shows a block diagram of a
此外,圖案驗證系統100的第二處理器120電性連接第一處理器110且配置以依序移除操作指令112並同時對待測元件300進行測試。當操作指令112其中至少一者移除而造成二維圖案200的第二區域220轉換為第一區域210時,圖案驗證系統100的第二處理器120回復移除中的操作指令112的至少一者,並將回復的操作指令112的至少一者設定為至少一關鍵操作指令122。詳細來說,圖案驗證系統100的第二處理器120在依序移除每一操作指令112後便接著對待測元件300進行測試,當操作指令112移除而二維圖案200的第二區域220維持為第二區域220時,則代表移除中的操作指令112與二維圖案200的第二區域220的測試結果無關,也就是說,移除中的操作指令112與待測元件300的失敗結果無關,因此可移除操作指令112。In addition, the
另一方面,當操作指令112移除而造成二維圖案200的第二區域220轉換為第一區域210時,則代表移除中的操作指令112與二維圖案200的第二區域220的測試結果相關,也就是說,移除中的操作指令112與待測元件300的失敗結果相關,因此圖案驗證系統100的第二處理器120可回復移除中的操作指令112,並將回復的操作指令112設定為關鍵操作指令122。如此一來,機台操作人員可透過圖案驗證系統100獲得關鍵操作指令122,並且每一關鍵操作指令122皆與待測元件300的失敗結果相關。On the other hand, when the
具體而言,圖案驗證系統100可移除與二維圖案200的第二區域220無關的操作指令112,並且將與二維圖案200的第二區域220相關的操作指令112設定為關鍵操作指令122。如此一來,圖案驗證系統100只需保留關鍵操作指令122,而不需保留原先數量的操作指令112,因此可降低圖案驗證系統100的保留指令的數量。由於機台操作人員可直接獲得關鍵操作指令122而非尚未分析的操作指令112,因此可省去機台操作人員手動分析操作指令112的時間,以提升圖案驗證系統100的測試效率。Specifically, the
在一些實施方式中,圖案驗證系統100還包括掃描單元130、輸出單元140以及記憶體150。圖案驗證系統100的掃描單元130電性連接第一處理器110且配置以掃描二維圖案200的第二區域220,以定位二維圖案200的第二區域220的中心點222。圖案驗證系統100的輸出單元140及記憶體150電性連接第二處理器120。輸出單元140配置以輸出關鍵操作指令122,且記憶體150配置以儲存關鍵操作指令122。機台操作人員可透過圖案驗證系統100獲得關鍵操作指令122而非尚未分析的操作指令112,因此可省去機台操作人員手動分析操作指令112的時間。In some embodiments, the
在以下敘述中,將說明圖案驗證系統的操作方法。已敘述的元件連接關係與材料將不重覆贅述,合先敘明。In the following description, an operation method of the pattern verification system will be explained. The described component connection relationship and materials will not be repeated, but will be described first.
第3圖繪示根據本揭露一實施方式之圖案驗證系統的操作方法的流程圖。圖案驗證系統的操作方法包括下列步驟。首先在步驟S1中,對待測元件進行多個操作指令,以產生具有第一區域以及第二區域的二維圖案。接著在步驟S2中,依序移除操作指令並同時對待測元件進行測試,其中當該些操作指令其中至少一者移除而造成二維圖案的第二區域轉換為第一區域時,回復移除中的操作指令的至少一者,並將回復的操作指令的至少一者設定為至少一關鍵操作指令。在以下敘述中,將詳細說明上述各步驟。FIG. 3 is a flow chart illustrating the operation method of the pattern verification system according to an embodiment of the present disclosure. The method of operation of the pattern verification system includes the following steps. Firstly, in step S1, a plurality of operation instructions are performed on the component to be tested to generate a two-dimensional pattern having a first area and a second area. Then in step S2, the operation instructions are removed in sequence and the device under test is tested at the same time, wherein when at least one of the operation instructions is removed to cause the second area of the two-dimensional pattern to be converted into the first area, the shift is reversed. deleting at least one of the operation instructions, and setting at least one of the returned operation instructions as at least one key operation instruction. In the following description, the above-mentioned steps will be described in detail.
第4圖繪示第1圖的操作指令112之示意圖。同時參照第1圖、第2圖以及第4圖,對待測元件300進行多個操作指令112,以產生具有第一區域210以及第二區域220的二維圖案200。詳細來說,多個操作指令112依照順序排列,圖案驗證系統100依照操作指令112的順序對待測元件300進行測試,並根據測試結果產生具有第一區域210以及第二區域220的二維圖案200。舉例來說,二維圖案200的第一區域210可代表待測元件300的測試結果為通過的狀態,而二維圖案200的第二區域220可代表待測元件300的測試結果為失敗的狀態。FIG. 4 shows a schematic diagram of the
在一些實施方式中,圖案驗證系統100的操作方法還包括:使用掃描單元130掃描二維圖案200的第二區域220,以定位二維圖案200的第二區域220的中心點222;以及將二維圖案200的第二區域220的中心點222設定為測試點230,以獲得包括測試電壓值以及測試速度值的測試環境。藉由選定的測試電壓值及測試速度值對待測元件300進行操作指令112,將使待測元件300的測試結果維持為失敗(對應二維圖案200的第二區域220)。此外,圖案驗證系統100可藉由掃描單元130設定二維圖案200的第二區域220的中心點222為測試點230,因此機台操作人員不需手動設定測試點230,可省去機台操作人員手動設定測試點230的時間。In some embodiments, the operation method of the
第5A圖至第5B圖繪示根據本揭露一實施方式之移除操作指令112的示意圖。同時參照第1圖、第2圖、第5A圖以及第5B圖,當待測元件300的測試結果維持為失敗後,便可進行下一步驟。接著,依序移除每一操作指令112後便對待測元件300進行測試。舉例來說,可使用第5A圖的近似法(Approximation methodology)及第5B圖的群組刪除法(Group deletion methodology)之方式依序移除操作指令112。第5A圖的近似法可使用上下逼近之方式移除操作指令112以對待測元件300進行測試。第5B圖的群組刪除法可將功能相似的操作指令112進行群組化以產生不同群組,並移除群組化的操作指令112以對待測元件300進行測試。FIG. 5A to FIG. 5B are schematic diagrams of the removing
在一些實施方式中,當移除操作指令112並對待測元件300進行測試且二維圖案200的第二區域220維持為第二區域220時,則代表移除中的操作指令112與二維圖案200的第二區域220的測試結果無關。也就是說,移除中的操作指令112與待測元件300的失敗結果無關,因此可移除操作指令112。當移除操作指令112並對待測元件300進行測試且二維圖案200的第二區域220轉換為第一區域210時,則代表移除中的操作指令112與二維圖案200的第二區域220的測試結果相關。也就是說,移除中的操作指令112與待測元件300的失敗結果相關。圖案驗證系統100的第二處理器120可回復移除中的操作指令112,並將回復的操作指令112設定為關鍵操作指令122。In some embodiments, when the
第6圖繪示根據本揭露一實施方式之關鍵操作指令122的示意圖。同時參照第1圖及第6圖,圖案驗證系統100的操作方法還包括:使用記憶體150儲存關鍵操作指令122;以及使用輸出單元140輸出關鍵操作指令122。機台操作人員可藉由圖案驗證系統100獲得關鍵操作指令122而非尚未分析的操作指令112,因此可省去機台操作人員手動分析操作指令112的時間,以提高圖案驗證系統100的測試效率。FIG. 6 is a schematic diagram of a
綜上所述,當操作指令移除而造成二維圖案的第二區域轉換成第一區域時,圖案驗證系統可回復移除中的操作指令。詳細來說,圖案驗證系統可移除與二維圖案的第二區域無關的操作指令,並且將與二維圖案的第二區域相關的操作指令設定為關鍵操作指令。如此一來,圖案驗證系統只需保留關鍵操作指令,而不需保留原先數量的操作指令,因此可降低圖案驗證系統的保留指令的數量。由於機台操作人員可直接獲得關鍵操作指令而非尚未分析的操作指令,因此可省去機台操作人員手動分析操作指令的時間,以提高圖案驗證系統的測試效率。此外,圖案驗證系統可藉由掃描單元設定二維圖案的第二區域的中心點為測試點,因此機台操作人員不需手動設定測試點,可省去機台操作人員手動設定測試點的時間。To sum up, when the operation instruction is removed and the second area of the two-dimensional pattern is transformed into the first area, the pattern verification system can reply the operation instruction being removed. In detail, the pattern verification system can remove operation instructions not related to the second region of the two-dimensional pattern, and set operation instructions related to the second region of the two-dimensional pattern as key operation instructions. In this way, the pattern verification system only needs to retain key operation instructions instead of the original number of operation instructions, so the number of reserved instructions of the pattern verification system can be reduced. Since the machine operator can directly obtain the key operation instructions instead of the unanalyzed operation instructions, the time for the machine operator to manually analyze the operation instructions can be saved, so as to improve the test efficiency of the pattern verification system. In addition, the pattern verification system can use the scanning unit to set the center point of the second area of the two-dimensional pattern as the test point, so the machine operator does not need to manually set the test point, which can save the time for the machine operator to manually set the test point .
前述概述了幾個實施方式的特徵,使得本領域技術人員可以更好地理解本揭露的態樣。本領域技術人員應當理解,他們可以容易地將本揭露用作設計或修改其他過程和結構的基礎,以實現與本文介紹的實施方式相同的目的和/或實現相同的優點。本領域技術人員還應該認識到,這樣的等效構造不脫離本揭露的精神和範圍,並且在不脫離本揭露的精神和範圍的情況下,它們可以在這裡進行各種改變,替換和變更。The foregoing outlines features of several embodiments so that those skilled in the art may better understand aspects of the present disclosure. It should be appreciated by those skilled in the art that they may readily use the present disclosure as a basis for designing or modifying other processes and structures, so as to achieve the same purposes and/or achieve the same advantages as the embodiments described herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they can make various changes, substitutions and alterations herein without departing from the spirit and scope of the present disclosure.
100:圖案驗證系統 110:第一處理器 112:操作指令 120:第二處理器 122:關鍵操作指令 130:掃描單元 140:輸出單元 150:記憶體 200:二維圖案 210:第一區域 220:第二區域 222:中心點 230:測試點 300:待測元件 S1:步驟 S2:步驟100:Pattern Verification System 110: The first processor 112: Operation instruction 120: second processor 122: Key operation instructions 130: scanning unit 140: output unit 150: Memory 200: 2D pattern 210: The first area 220: Second area 222: center point 230: test point 300: component under test S1: step S2: step
當結合隨附諸圖閱讀時,得自以下詳細描述最佳地理解本揭露之一實施方式。應強調,根據工業上之標準實務,各種特徵並未按比例繪製且僅用於說明目的。事實上,為了論述清楚,可任意地增大或減小各種特徵之尺寸。 第1圖繪示根據本揭露一實施方式之圖案驗證系統的方塊圖。 第2圖繪示根據本揭露一實施方式之具有第一區域及第二區域的二維圖案的示意圖。 第3圖繪示根據本揭露一實施方式之圖案驗證系統的操作方法的流程圖。 第4圖繪示第1圖的操作指令之示意圖。 第5A圖至第5B圖繪示根據本揭露一實施方式之移除操作指令的示意圖。 第6圖繪示根據本揭露一實施方式之關鍵操作指令的示意圖。 One embodiment of the present disclosure is best understood from the following detailed description when read in conjunction with the accompanying drawings. It is emphasized that, in accordance with the standard practice in the industry, various features are not drawn to scale and are used for illustration purposes only. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion. FIG. 1 is a block diagram of a pattern verification system according to an embodiment of the present disclosure. FIG. 2 is a schematic diagram of a two-dimensional pattern having a first region and a second region according to an embodiment of the present disclosure. FIG. 3 is a flow chart illustrating the operation method of the pattern verification system according to an embodiment of the present disclosure. FIG. 4 shows a schematic diagram of the operation command in FIG. 1 . FIG. 5A to FIG. 5B are schematic diagrams of removing operation instructions according to an embodiment of the present disclosure. FIG. 6 is a schematic diagram of key operation instructions according to an embodiment of the present disclosure.
國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic deposit information (please note in order of depositor, date, and number) none Overseas storage information (please note in order of storage country, institution, date, and number) none
100:圖案驗證系統 100:Pattern Verification System
110:第一處理器 110: The first processor
112:操作指令 112: Operation instruction
120:第二處理器 120: second processor
122:關鍵操作指令 122: Key operation instructions
130:掃描單元 130: scanning unit
140:輸出單元 140: output unit
150:記憶體 150: memory
300:待測元件 300: component under test
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