TWI778939B - Adhesive tape for workpiece processing - Google Patents
Adhesive tape for workpiece processing Download PDFInfo
- Publication number
- TWI778939B TWI778939B TW105112954A TW105112954A TWI778939B TW I778939 B TWI778939 B TW I778939B TW 105112954 A TW105112954 A TW 105112954A TW 105112954 A TW105112954 A TW 105112954A TW I778939 B TWI778939 B TW I778939B
- Authority
- TW
- Taiwan
- Prior art keywords
- aforementioned
- urethane
- compound
- meth
- energy ray
- Prior art date
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- 239000002390 adhesive tape Substances 0.000 title claims abstract description 115
- 238000012545 processing Methods 0.000 title claims abstract description 45
- 150000001875 compounds Chemical class 0.000 claims abstract description 184
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims abstract description 158
- 239000012790 adhesive layer Substances 0.000 claims abstract description 109
- 239000011347 resin Substances 0.000 claims abstract description 71
- 229920005989 resin Polymers 0.000 claims abstract description 71
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims abstract description 21
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 140
- 239000010410 layer Substances 0.000 claims description 112
- 239000000853 adhesive Substances 0.000 claims description 82
- 230000001070 adhesive effect Effects 0.000 claims description 81
- 239000003431 cross linking reagent Substances 0.000 claims description 77
- 229920000642 polymer Polymers 0.000 claims description 73
- 239000000203 mixture Substances 0.000 claims description 54
- 239000000178 monomer Substances 0.000 claims description 44
- 238000002156 mixing Methods 0.000 claims description 33
- 125000000524 functional group Chemical group 0.000 claims description 21
- 239000004065 semiconductor Substances 0.000 claims description 19
- 150000002148 esters Chemical class 0.000 claims description 12
- 239000002075 main ingredient Substances 0.000 claims description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 9
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- 150000005846 sugar alcohols Polymers 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 238000004132 cross linking Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 2
- 125000004494 ethyl ester group Chemical group 0.000 claims 2
- 230000001568 sexual effect Effects 0.000 claims 1
- -1 vinyl halide Chemical class 0.000 description 59
- 235000012431 wafers Nutrition 0.000 description 46
- 239000000463 material Substances 0.000 description 38
- 229920005862 polyol Polymers 0.000 description 36
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 34
- 239000005056 polyisocyanate Substances 0.000 description 30
- 229920001228 polyisocyanate Polymers 0.000 description 30
- 239000011342 resin composition Substances 0.000 description 28
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 26
- 150000003077 polyols Chemical class 0.000 description 25
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 23
- 238000000576 coating method Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 14
- 239000004721 Polyphenylene oxide Substances 0.000 description 12
- 229920000570 polyether Polymers 0.000 description 12
- 150000002009 diols Chemical class 0.000 description 11
- 239000003999 initiator Substances 0.000 description 11
- 229920000139 polyethylene terephthalate Polymers 0.000 description 11
- 239000005020 polyethylene terephthalate Substances 0.000 description 11
- 239000003505 polymerization initiator Substances 0.000 description 11
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 10
- 125000002723 alicyclic group Chemical group 0.000 description 10
- 150000004985 diamines Chemical class 0.000 description 10
- 229920005906 polyester polyol Polymers 0.000 description 10
- 238000003860 storage Methods 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 9
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 9
- 229920000768 polyamine Polymers 0.000 description 9
- 125000003396 thiol group Chemical group [H]S* 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 229920006243 acrylic copolymer Polymers 0.000 description 8
- 125000003118 aryl group Chemical group 0.000 description 8
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 8
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000004711 α-olefin Substances 0.000 description 8
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000012948 isocyanate Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
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- 125000000217 alkyl group Chemical group 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 229920001971 elastomer Polymers 0.000 description 6
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 5
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 5
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 5
- 230000001678 irradiating effect Effects 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 230000000379 polymerizing effect Effects 0.000 description 5
- 229920001451 polypropylene glycol Polymers 0.000 description 5
- 150000007519 polyprotic acids Polymers 0.000 description 5
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 4
- 239000005977 Ethylene Substances 0.000 description 4
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 239000003522 acrylic cement Substances 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 125000005442 diisocyanate group Chemical group 0.000 description 4
- 239000000539 dimer Substances 0.000 description 4
- 239000000806 elastomer Substances 0.000 description 4
- 230000002349 favourable effect Effects 0.000 description 4
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 4
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 229920002635 polyurethane Polymers 0.000 description 4
- 239000004814 polyurethane Substances 0.000 description 4
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 4
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 4
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 3
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
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- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 3
- DKIDEFUBRARXTE-UHFFFAOYSA-M 3-mercaptopropionate Chemical compound [O-]C(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-M 0.000 description 3
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
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- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
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- 239000005058 Isophorone diisocyanate Substances 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
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- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 3
- 125000003368 amide group Chemical group 0.000 description 3
- 239000003963 antioxidant agent Substances 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
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- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 3
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- 229910052710 silicon Inorganic materials 0.000 description 3
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- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 3
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 description 1
- TWXDDNPPQUTEOV-FVGYRXGTSA-N methamphetamine hydrochloride Chemical compound Cl.CN[C@@H](C)CC1=CC=CC=C1 TWXDDNPPQUTEOV-FVGYRXGTSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 235000010460 mustard Nutrition 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical compound C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- ZVEZMVFBMOOHAT-UHFFFAOYSA-N nonane-1-thiol Chemical compound CCCCCCCCCS ZVEZMVFBMOOHAT-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- PRAARDGLAWZXML-UHFFFAOYSA-N o-propylhydroxylamine Chemical compound CCCON PRAARDGLAWZXML-UHFFFAOYSA-N 0.000 description 1
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- DSNHSQKRULAAEI-UHFFFAOYSA-N para-diethylbenzene Natural products CCC1=CC=C(CC)C=C1 DSNHSQKRULAAEI-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- ZHZCYWWNFQUZOR-UHFFFAOYSA-N pent-4-en-2-ol Chemical group CC(O)CC=C ZHZCYWWNFQUZOR-UHFFFAOYSA-N 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
- UWJJYHHHVWZFEP-UHFFFAOYSA-N pentane-1,1-diol Chemical compound CCCCC(O)O UWJJYHHHVWZFEP-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Chemical group 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006124 polyolefin elastomer Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 229920003225 polyurethane elastomer Polymers 0.000 description 1
- 229920003226 polyurethane urea Polymers 0.000 description 1
- XRVCFZPJAHWYTB-UHFFFAOYSA-N prenderol Chemical compound CCC(CC)(CO)CO XRVCFZPJAHWYTB-UHFFFAOYSA-N 0.000 description 1
- 229950006800 prenderol Drugs 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- UFUASNAHBMBJIX-UHFFFAOYSA-N propan-1-one Chemical compound CC[C]=O UFUASNAHBMBJIX-UHFFFAOYSA-N 0.000 description 1
- ZJLMKPKYJBQJNH-UHFFFAOYSA-N propane-1,3-dithiol Chemical compound SCCCS ZJLMKPKYJBQJNH-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- OSFBJERFMQCEQY-UHFFFAOYSA-N propylidene Chemical group [CH]CC OSFBJERFMQCEQY-UHFFFAOYSA-N 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 229940071127 thioglycolate Drugs 0.000 description 1
- CWERGRDVMFNCDR-UHFFFAOYSA-M thioglycolate(1-) Chemical compound [O-]C(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-M 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- VZZUPGZLDMTMFL-UHFFFAOYSA-N triazine;trithiole Chemical compound S1SC=CS1.C1=CN=NN=C1 VZZUPGZLDMTMFL-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J175/00—Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
- C09J175/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J175/00—Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
- C09J175/04—Polyurethanes
- C09J175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C09J175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
Landscapes
- Organic Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Laminated Bodies (AREA)
Abstract
本發明之工件加工用黏著膠帶,其係具備基材、與設置在前述基材之一側的面側之黏著劑層,前述黏著劑層係包含胺基甲酸乙酯系樹脂(A)與能量線硬化性化合物(B),該能量線硬化性化合物(B)係對前述胺基甲酸乙酯系樹脂(A)為非反應,且具有光聚合性不飽和鍵,分子量為35,000以下。 The adhesive tape for workpiece processing of the present invention comprises a substrate, and an adhesive layer provided on one side of the substrate, the adhesive layer comprising urethane resin (A) and energy A ray-curable compound (B) that is non-reactive to the aforementioned urethane-based resin (A), has a photopolymerizable unsaturated bond, and has a molecular weight of 35,000 or less.
Description
本發明係關於工件加工用黏著膠帶,尤其是關於為了保護附凸塊之半導體晶圓的表面所使用之半導體晶圓表面保護用黏著膠帶。 The present invention relates to an adhesive tape for workpiece processing, in particular to an adhesive tape for protecting the surface of a semiconductor wafer used for protecting the surface of a semiconductor wafer with bumps.
情報終端裝置的薄型化、小型化、多機能化正急速進展中,該等所搭載之半導體裝置亦同樣正尋求薄型化、高密度化,亦追求半導體晶圓的薄型化。以往為了因應該需求,正進行研磨半導體晶圓的背面而薄型化。又,近年來,半導體晶圓有由高度30~100μm左右的焊接等所構成之凸塊形成於晶圓表面的情況。如此之附凸塊之半導體晶圓為研磨背面的情況下,為了保護凸塊部分,有於形成凸塊之晶圓表面貼附表面保護薄片的情況。 Thinning, miniaturization, and multi-functionalization of information terminal devices are rapidly progressing, and the semiconductor devices mounted on these devices are also seeking thinning, high density, and thinning of semiconductor wafers. Conventionally, in order to meet this demand, the back surface of the semiconductor wafer has been polished to make it thinner. Also, in recent years, semiconductor wafers may have bumps made of solder or the like with a height of about 30 to 100 μm formed on the surface of the wafer. When such a semiconductor wafer with bumps has a ground backside, in order to protect the bump portion, a surface protection sheet may be attached to the surface of the wafer on which the bumps are formed.
以往作為表面保護薄片,已知有包含將在25℃及60℃之儲藏彈性率以成為特定範圍的方式調整之樹脂層(例如參照專利文獻1)。此表面保護薄片藉由設置在室溫(25℃)之儲藏彈性率、與在高溫(60℃)之儲藏彈性率有落差的樹脂層,並藉由於具有凹凸部分之晶圓表面以 高溫進行貼附,而使樹脂層軟化,吸收晶圓表面的凹凸,正努力減少晶圓表面的高低差。 Conventionally, as a surface protection sheet, a resin layer including a resin layer adjusted so that the storage elastic moduli at 25° C. and 60° C. are in a specific range is known (for example, refer to Patent Document 1). This surface protection sheet is provided with a resin layer with a difference between the storage elastic modulus at room temperature (25°C) and the storage elastic modulus at high temperature (60°C), and the surface of the wafer with concave-convex parts. Attaching at high temperature softens the resin layer and absorbs the unevenness of the wafer surface, making efforts to reduce the level difference of the wafer surface.
又,作為表面保護薄片,已知有為了使密著性與剝離性變為良好,於基材之上設置2個具有預定之拉伸彈性率的樹脂層,此2個樹脂層當中,貼附面側之樹脂層係以聚苯乙烯系彈性體、聚烯烴系彈性體、聚胺基甲酸乙酯系彈性體、及聚酯系彈性體等之熱塑性彈性體形成(參照專利文獻2)。 In addition, as a surface protection sheet, it is known that two resin layers having a predetermined tensile modulus are provided on a base material in order to improve adhesion and peelability, and that, among the two resin layers, sticking The resin layer on the surface side is formed of thermoplastic elastomers such as polystyrene elastomers, polyolefin elastomers, polyurethane elastomers, and polyester elastomers (see Patent Document 2).
進而,作為表面保護薄片,亦已知有於基材一側的面設置中間層、及黏著劑層之黏著膠帶。在此黏著膠帶,已知有為了提高凹凸吸收性,將中間層在25℃之儲藏彈性率定為30~1000kPa左右,同時將黏著劑層藉由能量線硬化型黏著劑形成(例如參照專利文獻3)。如專利文獻3,於表面保護薄片使用能量線硬化型黏著劑時,對半導體晶圓之貼附性、及剝離性會趨於良好。尚,以往在表面保護薄片使用之能量線硬化型黏著劑由於易調整接著性,又,易確保凸塊的嵌入性,故主要使用丙烯酸系者。 Furthermore, an adhesive tape in which an intermediate layer and an adhesive layer are provided on the base material side surface is also known as a surface protection sheet. In this adhesive tape, it is known that in order to improve the absorption of unevenness, the storage elastic modulus of the intermediate layer at 25°C is set at about 30~1000kPa, and the adhesive layer is formed with an energy ray-curable adhesive (for example, refer to patent documents 3). As in Patent Document 3, when an energy ray-curable adhesive is used for the surface protection sheet, the adhesion and peelability to the semiconductor wafer tend to be better. In the past, the energy ray-curable adhesives used for surface protection sheets are mainly acrylic adhesives because they are easy to adjust the adhesion and ensure the embedding of the bumps.
[專利文獻1]日本專利第4603578號公報 [Patent Document 1] Japanese Patent No. 4603578
[專利文獻2]日本專利第4918181號公報 [Patent Document 2] Japanese Patent No. 4918181
[專利文獻3]日本專利第4367769號公報 [Patent Document 3] Japanese Patent No. 4367769
因此,近年來,伴隨半導體裝置之進一步高密度化、小型化,有提高凸塊高度的傾向,亦研究具有200μm以上之高度者。惟,提高凸塊高度,對於高低差較大之半導體晶圓,使用專利文獻3所記載之丙烯酸系的表面保護薄片時,有於薄片剝離時在凸塊大量產生黏著劑殘渣(糊殘留)的情況。丙烯酸系之能量線硬化型黏著劑係因為凝聚力及機械性強度比較低。 Therefore, in recent years, along with further densification and miniaturization of semiconductor devices, there is a tendency to increase the height of bumps, and those having a height of 200 μm or more have also been studied. However, increasing the bump height and using the acrylic surface protection sheet described in Patent Document 3 for a semiconductor wafer with a large height difference may cause a large amount of adhesive residue (paste residue) to be generated on the bump when the sheet is peeled off. Condition. Acrylic energy ray curing adhesives are relatively low in cohesion and mechanical strength.
另一方面,例如於專利文獻1、2,正研究於表面保護薄片的貼附面使用聚胺基甲酸乙酯系彈性體等之丙烯酸系黏著劑以外之材料。惟,於專利文獻1、2,並非研究該等材料對能量線硬化型黏著劑的適用,而是為了確保接著性、剝離性、及凸塊的嵌入性必須進一步改良。 On the other hand, for example, in Patent Documents 1 and 2, studies are underway to use materials other than acrylic adhesives such as polyurethane-based elastomers on the attachment surface of the surface protection sheet. However, in Patent Documents 1 and 2, it is not to study the application of these materials to energy ray-curable adhesives, but to ensure further improvement in adhesiveness, peelability, and embedding of bumps.
本發明係鑑於以上實情而完成者,本發明之課題為提供一種工件加工用黏著膠帶,其係對半導體晶圓等之工件的黏著性、剝離性、及凸塊的嵌入性所代表之對工件之表面形狀的黏著劑層之追蹤性良好,而且貼附之工件即使表面形狀並非平坦,但在工件表面之糊殘留少。 The present invention was accomplished in view of the above facts. The object of the present invention is to provide an adhesive tape for workpiece processing, which is representative of the adhesiveness, peelability, and embedding of bumps to workpieces such as semiconductor wafers. The tracking of the adhesive layer on the surface shape is good, and even if the surface shape of the attached workpiece is not flat, there is little paste residue on the surface of the workpiece.
本發明者們努力研究的結果發現,作為黏著劑,使用胺基甲酸乙酯系黏著劑,且可藉由特定其組成,來解決上述課題,而完成以下之本發明。本發明係提供以 下之(1)~(16)的工件加工用黏著膠帶。 As a result of intensive studies, the present inventors have found that the above-mentioned problems can be solved by using a urethane-based adhesive as an adhesive and specifying its composition, and the following invention has been accomplished. The present invention provides Adhesive tapes for workpiece processing in (1)~(16) below.
(1)一種工件加工用黏著膠帶,其係具備基材、與設置在前述基材之一側的面側之黏著劑層,前述黏著劑層係包含胺基甲酸乙酯系樹脂(A)與能量線硬化性化合物(B),該能量線硬化性化合物(B)係對前述胺基甲酸乙酯系樹脂(A)為非反應,且具有光聚合性不飽和鍵,分子量為35,000以下。 (1) An adhesive tape for workpiece processing comprising a base material and an adhesive layer provided on one side of the base material, the adhesive layer comprising a urethane-based resin (A) and An energy ray-curable compound (B) which is non-reactive to the aforementioned urethane-based resin (A), has a photopolymerizable unsaturated bond, and has a molecular weight of 35,000 or less.
(2)如上述(1)之工件加工用黏著膠帶,其中,前述能量線硬化性化合物(B)為選自(甲基)丙烯酸酯單體(B1)、及胺基甲酸乙酯(甲基)丙烯酸酯(B2)中之至少1種。 (2) The adhesive tape for workpiece processing according to the above (1), wherein the aforementioned energy ray-curable compound (B) is selected from (meth)acrylate monomer (B1), and urethane (methyl) ) at least one of acrylates (B2).
(3)如上述(2)之工件加工用黏著膠帶,其中,前述能量線硬化性化合物(B)至少包含(甲基)丙烯酸酯單體(B1)的同時,前述(甲基)丙烯酸酯單體(B1)為多元醇與(甲基)丙烯酸之完全酯即多官能(甲基)丙烯酸酯。 (3) The adhesive tape for workpiece processing according to (2) above, wherein the energy ray-curable compound (B) contains at least a (meth)acrylate monomer (B1), and the (meth)acrylate monomer Body (B1) is a complete ester of polyhydric alcohol and (meth)acrylic acid, that is, polyfunctional (meth)acrylate.
(4)如上述(1)~(3)中任一項之工件加工用黏著膠帶,其中,前述能量線硬化性化合物(B)係於1分子中具有2官能以上之(甲基)丙烯醯基。 (4) The adhesive tape for workpiece processing according to any one of (1) to (3) above, wherein the energy ray-curable compound (B) is a (meth)acrylic acid having two or more functions in one molecule base.
(5)如上述(1)~(4)中任一項之工件加工用黏著膠帶,其中,前述胺基甲酸乙酯系樹脂(A)係具有光聚合性不飽和鍵。 (5) The adhesive tape for workpiece processing according to any one of (1) to (4) above, wherein the urethane-based resin (A) has a photopolymerizable unsaturated bond.
(6)如上述(1)~(5)中任一項之工件加工用黏著膠帶,其中,前述黏著劑層係由至少包含胺基甲酸乙酯聚合物(A’)、與前述能量線硬化性化合物(B)、與交聯劑(C)之黏著劑組成物所形成,前述胺基甲酸乙酯系樹脂(A)係將胺 基甲酸乙酯聚合物(A’)藉由前述交聯劑(C)進行交聯者。 (6) The adhesive tape for workpiece processing according to any one of the above (1) to (5), wherein the aforementioned adhesive layer is made of at least a urethane polymer (A'), and the aforementioned energy ray hardening tape. The compound (B) and the adhesive composition of the cross-linking agent (C) are formed, and the above-mentioned urethane resin (A) is an amine The ethyl formate polymer (A') is cross-linked by the aforementioned cross-linking agent (C).
(7)如上述(6)之工件加工用黏著膠帶,其中,前述交聯劑(C)係包含含有光聚合性不飽和鍵之交聯劑(C1)。 (7) The adhesive tape for workpiece processing according to (6) above, wherein the crosslinking agent (C) contains a photopolymerizable unsaturated bond-containing crosslinking agent (C1).
(8)如上述(6)或(7)之工件加工用黏著膠帶,其係將前述胺基甲酸乙酯聚合物(A’)與前述交聯劑(C)藉由胺基甲酸乙酯鍵進行鍵結。 (8) The adhesive tape for workpiece processing according to the above (6) or (7), which is obtained by combining the aforementioned urethane polymer (A') and the aforementioned crosslinking agent (C) via a urethane bond. Make a bond.
(9)如上述(6)~(8)中任一項之工件加工用黏著膠帶,其中,前述黏著劑組成物係進一步含有化合物(D),該化合物(D)係具有光聚合性不飽和鍵和可與前述交聯劑(C)反應之反應性官能基。 (9) The adhesive tape for workpiece processing according to any one of the above (6) to (8), wherein the aforementioned adhesive composition further contains a compound (D), and the compound (D) has a photopolymerizable unsaturated A bond and a reactive functional group that can react with the aforementioned crosslinking agent (C).
(10)如上述(9)之工件加工用黏著膠帶,其中,前述化合物(D)為多元醇與(甲基)丙烯酸之部分酯即多官能(甲基)丙烯酸酯。 (10) The adhesive tape for workpiece processing according to (9) above, wherein the compound (D) is a polyfunctional (meth)acrylate that is a partial ester of a polyhydric alcohol and (meth)acrylic acid.
(11)如上述(1)~(10)中任一項之工件加工用黏著膠帶,其中,前述黏著劑層之能量線照射後之斷裂應力為2.5MPa以上。 (11) The adhesive tape for workpiece processing according to any one of (1) to (10) above, wherein the breaking stress of the adhesive layer after energy ray irradiation is 2.5 MPa or more.
(12)如上述(1)~(11)中任一項之工件加工用黏著膠帶,其中,於前述基材及前述黏著劑層之間具有中間層。 (12) The adhesive tape for workpiece processing according to any one of (1) to (11) above, which has an intermediate layer between the base material and the adhesive layer.
(13)如上述(12)之工件加工用黏著膠帶,其中,前述中間層之厚度為10~600μm。 (13) The adhesive tape for workpiece processing according to (12) above, wherein the thickness of the intermediate layer is 10 to 600 μm.
(14)如上述(12)或(13)之工件加工用黏著膠帶,其中,前述中間層在以頻率1Hz測定之50℃的損失正切為1.0以上。 (14) The adhesive tape for workpiece processing according to the above (12) or (13), wherein the loss tangent of the intermediate layer at 50° C. measured at a frequency of 1 Hz is 1.0 or more.
(15)如上述(1)~(14)中任一項之工件加工用黏著膠帶, 其中,能量線照射後之黏著力為2000mN/25mm以下。 (15) The adhesive tape for workpiece processing according to any one of the above (1)~(14), Among them, the adhesive force after energy ray irradiation is 2000mN/25mm or less.
(16)如上述(1)~(15)中任一項之工件加工用黏著膠帶,其係半導體晶圓表面保護用黏著膠帶。 (16) The adhesive tape for workpiece processing according to any one of (1) to (15) above, which is an adhesive tape for protecting the surface of a semiconductor wafer.
於本發明,可提供一種工件加工用黏著膠帶,其係黏著性、剝離性、及對工件之表面形狀的黏著劑層之追蹤性良好,而且在工件表面之糊殘留少。 In the present invention, an adhesive tape for workpiece processing can be provided, which has good adhesiveness, peelability, and tracking of the adhesive layer on the surface shape of the workpiece, and has little paste residue on the surface of the workpiece.
在以下之記載,「重量平均分子量(Mw)」係以凝膠滲透層析(GPC)法測定之聚苯乙烯換算的值,具體而言係根據實施例所記載之方法所測定之值。 In the description below, "weight average molecular weight (Mw)" is a polystyrene-equivalent value measured by gel permeation chromatography (GPC), and specifically, it is a value measured by the method described in Examples.
又,在本說明書中之記載,例如所謂「(甲基)丙烯酸酯」,已作為表示「丙烯酸酯」及「甲基丙烯酸酯」雙方之用語使用,針對其他類似用語亦相同。 In addition, in the description in this specification, for example, "(meth)acrylate" is used as a term indicating both "acrylate" and "methacrylate", and the same applies to other similar terms.
以下,使用實施形態來說明本發明。 Hereinafter, the present invention will be described using embodiments.
本發明之工件加工用黏著膠帶(以下,亦單稱為“黏著膠帶”)係具備基材、與設置在基材之一側的面側之黏著劑層。又,黏著膠帶可與此基材於黏著劑層之間具有中間層。黏著膠帶如以上可由2層或3層所構成,進而可設置其他層。例如於黏著劑層之上進一步設置剝離材。 The adhesive tape for workpiece processing (hereinafter also simply referred to as "adhesive tape") of the present invention includes a base material and an adhesive layer provided on one side of the base material. In addition, the adhesive tape may have an intermediate layer between the adhesive layer and the base material. The adhesive tape may be composed of 2 or 3 layers as above, and further layers may be provided. For example, a release material is further provided on the adhesive layer.
以下,針對構成黏著膠帶之各構件詳細進行說明。 Hereinafter, each member which comprises an adhesive tape is demonstrated in detail.
<基材> <Substrate>
黏著膠帶所使用之基材雖並未特別限定,但較佳為樹脂薄膜。樹脂薄膜與紙或不織布相比較,由於塵芥發生少故適合在電子零件之加工構件,由於取得容易故較佳。基材可為由1個樹脂薄膜所構成之單層薄膜,亦可為層合複數之樹脂薄膜之複層薄膜。 The base material used for the adhesive tape is not particularly limited, but is preferably a resin film. Compared with paper or non-woven fabric, resin film is suitable for processing components of electronic parts because it generates less dust and mustard, and it is better because it is easy to obtain. The substrate may be a single-layer film composed of one resin film, or a multi-layer film in which multiple resin films are laminated.
作為基材使用之樹脂薄膜,例如可列舉聚烯烴系薄膜、鹵化乙烯聚合物系薄膜、丙烯酸樹脂系薄膜、橡膠系薄膜、纖維素系薄膜、聚酯系薄膜、聚碳酸酯系薄膜、聚苯乙烯系薄膜、聚伸苯基硫化物系薄膜、環烯烴聚合物系薄膜等。 Resin films used as substrates include, for example, polyolefin-based films, vinyl halide polymer-based films, acrylic resin-based films, rubber-based films, cellulose-based films, polyester-based films, polycarbonate-based films, polystyrene Vinyl films, polyphenylene sulfide films, cycloolefin polymer films, etc.
此等當中,從將晶圓研磨至極薄時可安定晶圓進行保持的觀點、以及從厚度的精度高之薄膜的觀點來看,較佳為聚酯系薄膜,聚酯系薄膜當中,從取得容易,且厚度精度高的觀點來看,較佳為聚對苯二甲酸乙二酯薄膜。 Among these, polyester films are preferred from the viewpoint of holding the wafer stably when the wafer is polished to an extremely thin thickness, and from the viewpoint of a film with high thickness accuracy. Among polyester films, polyester films are obtained from From the viewpoint of ease and high thickness accuracy, a polyethylene terephthalate film is preferable.
又,基材的厚度雖並未特別限定,但較佳為10~200μm,更佳為25~150μm。 Moreover, although the thickness of a base material is not specifically limited, Preferably it is 10-200 micrometers, More preferably, it is 25-150 micrometers.
尚,從使對於基材之黏著劑層或中間層的接著性提昇的觀點來看,可於樹脂薄膜的表面進一步使用層合易接著層或黏著劑層之基材。進而,於本發明使用之基材中,在不損及本發明的效果的範圍,可含有填料、著色劑、抗靜電劑、抗氧化劑、有機潤滑劑、觸媒等。又,基材可為透明者,雖亦可視期望而著色,但為了硬化黏著劑層,較佳為足夠程度透過能量線。 Also, from the viewpoint of improving the adhesiveness of the adhesive layer or the intermediate layer to the base material, a base material in which an easily bonding layer or an adhesive layer is further laminated on the surface of the resin film can be used. Furthermore, the substrate used in the present invention may contain fillers, colorants, antistatic agents, antioxidants, organic lubricants, catalysts, etc. within the range that does not impair the effects of the present invention. Also, the base material may be transparent, and may be colored as desired, but it is preferable to transmit energy rays to a sufficient degree in order to harden the adhesive layer.
<中間層> <middle layer>
於本發明之黏著膠帶,可於基材之一側的面設置中間層。本發明之黏著膠帶藉由具有中間層,於工件設置凸塊等,即使工件表面之凹凸的高低差較大的情況下,凸部嵌入黏著劑層及中間層,並藉此使得與貼附在黏著膠帶之工件的面相反側的面保持平坦變容易。於本發明使用之中間層較佳為以頻率1Hz測定之在50℃的損失正切(tanδ)(以下,亦單稱為「損失正切」)成為1.0以上。 In the adhesive tape of the present invention, an intermediate layer may be provided on one side of the substrate. The adhesive tape of the present invention has an intermediate layer, and when the workpiece is provided with bumps, etc., even if the unevenness of the surface of the workpiece is large, the protrusions are embedded in the adhesive layer and the intermediate layer, and thereby it can be attached to the adhesive tape. It becomes easier to keep the surface on the opposite side of the workpiece to which the tape is attached flat. The intermediate layer used in the present invention preferably has a loss tangent (tan δ) at 50°C measured at a frequency of 1 Hz (hereinafter also simply referred to as "loss tangent") of 1.0 or more.
中間層之損失正切為如此之值時,將工件加工用黏著膠帶貼附在附凸塊之晶圓等之有凹凸的工件時,中間層充分變形,可容易追蹤凹凸。中間層充分吸收凸塊等之凹凸,例如從得到對於附凸塊之晶圓的表面之良好貼附狀態的觀點來看,中間層之損失正切更佳為1.5以上,再更佳為1.65以上,又再更佳為1.8以上。 When the loss tangent of the intermediate layer is such a value, when the adhesive tape for workpiece processing is attached to a workpiece with bumps such as a wafer with bumps, the intermediate layer is sufficiently deformed and the unevenness can be easily tracked. The intermediate layer sufficiently absorbs the unevenness of bumps and the like. For example, from the viewpoint of obtaining a good adhesion state to the surface of the wafer with bumps, the loss tangent of the intermediate layer is more preferably 1.5 or more, and more preferably 1.65 or more. Still more preferably, it is 1.8 or more.
又,從將中間層之加熱時之流動性調整在適當之範圍的觀點來看,中間層之損失正切較佳為5.0以下,更佳為4.0以下。 Also, from the viewpoint of adjusting the fluidity of the intermediate layer during heating to an appropriate range, the loss tangent of the intermediate layer is preferably 5.0 or less, more preferably 4.0 or less.
尚,上述之中間層之損失正切更具體而言,係根據後述之實施例所記載之方法所測定之值。 In addition, the loss tangent of the above-mentioned intermediate layer is a value measured more specifically by the method described in the Example mentioned later.
又,中間層之厚度雖可因應貼附黏著膠帶之被著面的狀態適當調整,但從亦可吸收高度比較高之凸塊的觀點來看,較佳為10~600μm,更佳為25~550μm,再更佳為35~500μm。 Also, although the thickness of the middle layer can be appropriately adjusted according to the state of the surface to which the adhesive tape is attached, it is preferably 10-600 μm, more preferably 25-600 μm, from the viewpoint of absorbing bumps with relatively high height 550 μm, more preferably 35~500 μm.
中間層係由中間層用樹脂組成物所形成者。又,中間層用樹脂組成物較佳為包含胺基甲酸乙酯(甲基)丙烯酸酯。 The intermediate layer is formed of a resin composition for an intermediate layer. Moreover, it is preferable that the resin composition for intermediate layers contains urethane (meth)acrylate.
(胺基甲酸乙酯(甲基)丙烯酸酯(X)) (Urethane (meth)acrylate (X))
胺基甲酸乙酯(甲基)丙烯酸酯(X)係至少具有(甲基)丙烯醯基及胺基甲酸乙酯鍵之化合物,係具有藉由能量線照射進行聚合之性質者。尚,所謂能量線,係指於電磁波或荷電粒子束之中具有能量量子者,即紫外線等之活性光或電子束等。 The urethane (meth)acrylate (X) is a compound having at least a (meth)acryl group and a urethane bond, and has a property of being polymerized by energy ray irradiation. Also, the so-called energy rays refer to those with energy quantum in electromagnetic waves or charged particle beams, that is, active light such as ultraviolet rays or electron beams.
胺基甲酸乙酯(甲基)丙烯酸酯(X)中之(甲基)丙烯醯基數雖可為單官能、2官能、或者3官能以上,但由於易將損失正切成為1.0以上,故以中間層用樹脂組成物包含單官能胺基甲酸乙酯(甲基)丙烯酸酯較佳。單官能胺基甲酸乙酯(甲基)丙烯酸酯由於在聚合構造無關於三維網狀構造的形成,故於中間層難以形成三維網狀構造,而提高損失正切。 The number of (meth)acryl groups in urethane (meth)acrylate (X) may be monofunctional, difunctional, or trifunctional or more, but since the loss tangent is likely to be 1.0 or more, the intermediate The layer resin composition preferably contains monofunctional urethane (meth)acrylate. Since the monofunctional urethane (meth)acrylate has nothing to do with the formation of a three-dimensional network structure in the polymerization structure, it is difficult to form a three-dimensional network structure in the intermediate layer, thereby increasing the loss tangent.
作為中間層用樹脂組成物所使用之胺基甲酸乙酯(甲基)丙烯酸酯(X),例如可於使多元醇化合物與聚異氰酸酯化合物進行反應所得之末端異氰酸酯胺基甲酸乙酯預聚物,使具有(甲基)丙烯醯基之化合物進行反應而得到。胺基甲酸乙酯(甲基)丙烯酸酯(X)可1種或組合2種以上使用。 The urethane (meth)acrylate (X) used as the resin composition for the intermediate layer can be, for example, an isocyanate-terminated urethane prepolymer obtained by reacting a polyol compound and a polyisocyanate compound , It is obtained by reacting a compound having a (meth)acryloyl group. Urethane (meth)acrylate (X) can be used 1 type or in combination of 2 or more types.
[多元醇化合物] [Polyol compound]
多元醇化合物若為具有2個以上羥基之化合物則並未特別限制。 The polyol compound is not particularly limited as long as it is a compound having two or more hydroxyl groups.
作為具體之多元醇化合物,例如可列舉伸烷基二醇、聚醚型多元醇、聚酯型多元醇、聚碳酸酯型多元醇等。 As a specific polyol compound, an alkylene glycol, a polyether polyol, a polyester polyol, a polycarbonate polyol, etc. are mentioned, for example.
此等當中,較佳為聚醚型多元醇。 Among these, polyether polyols are preferable.
尚,作為多元醇化合物,雖2官能之二醇、3官能之三醇、4官能以上之多元醇之任一種皆可,但從取得之容易性、泛用性、反應性等之觀點來看,較佳為2官能之二醇,更佳為聚醚型二醇。 Furthermore, any of bifunctional diols, trifunctional triols, and tetrafunctional or higher polyols may be used as the polyol compound, but from the viewpoints of ease of acquisition, versatility, reactivity, etc. , preferably a difunctional diol, more preferably a polyether diol.
聚醚型二醇較佳為下述式(1)表示之化合物。 The polyether diol is preferably a compound represented by the following formula (1).
上述式(1)中,R雖為2價之烴基,但較佳為伸烷基,更佳為碳數1~6之伸烷基。碳數1~6之伸烷基當中,較佳為伸乙基、伸丙基、四亞甲基,更佳為伸丙基、四亞甲基。 In the above formula (1), although R is a divalent hydrocarbon group, it is preferably an alkylene group, more preferably an alkylene group having 1 to 6 carbon atoms. Among alkylene groups having 1 to 6 carbon atoms, ethylidene, propylidene, and tetramethylene are preferred, and propylidene and tetramethylene are more preferred.
又,n為伸烷基氧化物之重複單位數,較佳為10~250,更佳為25~205,再更佳為40~185。n若為上述範圍,變容易將所得之胺基甲酸乙酯(甲基)丙烯酸酯之胺基甲酸乙酯鍵濃度設為適度,損失正切以滿足上述要件的方式來調製中間層。 Also, n is the number of repeating units of the alkylene oxide, preferably 10-250, more preferably 25-205, still more preferably 40-185. When n is within the above range, it becomes easy to prepare the intermediate layer so that the urethane bond concentration of the obtained urethane (meth)acrylate is moderate and the loss tangent satisfies the above requirements.
上述式(1)表示之化合物當中,較佳為聚乙二醇、聚丙二醇、聚四亞甲基二醇,更佳為聚丙二醇、聚四亞甲基 二醇。 Among the compounds represented by the above formula (1), polyethylene glycol, polypropylene glycol, and polytetramethylene glycol are preferred, and polypropylene glycol, polytetramethylene glycol, and polytetramethylene glycol are more preferred. diol.
藉由聚醚型二醇與聚異氰酸酯化合物的反應,生成導入醚鍵部分[-(-R-O-)n-]之末端異氰酸酯胺基甲酸乙酯預聚物。藉由使用如此之聚醚型二醇,胺基甲酸乙酯(甲基)丙烯酸酯含有由聚醚型二醇所衍生之構成單位。 Through the reaction of polyether diol and polyisocyanate compound, a terminal isocyanate urethane prepolymer with ether bond [-(-R-O-)n-] introduced is formed. By using such a polyether diol, the urethane (meth)acrylate contains a constituent unit derived from the polyether diol.
聚酯型多元醇係藉由使多元醇成分與多元酸成分進行縮聚而得到。作為多元醇成分,可列舉乙二醇、二乙二醇、三乙二醇、1,2-丙烷二醇、1,3-丙烷二醇、1,3-丁烷二醇、1,4-丁烷二醇、新戊二醇、戊烷二醇、3-甲基-1,5-戊烷二醇、2,2,4-三甲基-1,3-戊烷二醇、己烷二醇、辛烷二醇、2,2-二乙基-1,3-丙烷二醇、2-乙基-2-丁基-1,3-丙烷二醇、1,4-環己烷二甲醇、雙酚A之乙二醇或丙二醇加成物等之周知的各種二醇類等。 A polyester polyol is obtained by polycondensing a polyhydric alcohol component and a polybasic acid component. Examples of the polyol component include ethylene glycol, diethylene glycol, triethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,3-butanediol, 1,4- Butanediol, neopentyl glycol, pentanediol, 3-methyl-1,5-pentanediol, 2,2,4-trimethyl-1,3-pentanediol, hexane Diol, octanediol, 2,2-diethyl-1,3-propanediol, 2-ethyl-2-butyl-1,3-propanediol, 1,4-cyclohexanediol Various well-known diols such as methanol, ethylene glycol or propylene glycol adducts of bisphenol A, and the like.
作為聚酯型多元醇之製造所使用之多元酸成分,一般可使用已知作為聚酯之多元酸成分的化合物。 As a polybasic acid component used for manufacture of a polyester polyol, the compound known as a polybasic acid component of polyester can be used generally.
作為具體之多元酸成分,例如可列舉己二酸、馬來酸、琥珀酸、草酸、富馬酸、丙二酸、戊二酸、庚二酸、壬二酸、癸二酸、辛二酸等之二元酸;鄰苯二甲酸、間苯二甲酸、對苯二甲酸、2,6-萘二羧酸等之二元酸、或偏苯三酸、苯均四酸等之多元酸等之芳香族多元酸、對應此等之酐或其衍生物及二聚酸、氫化二聚酸等。此等當中,從形成具有適度硬度之塗膜的觀點來看,較佳為芳香族多元酸。於用以製造聚酯型多元醇之酯化反應,如有必要可使用各種周知之觸媒。 Specific polybasic acid components include, for example, adipic acid, maleic acid, succinic acid, oxalic acid, fumaric acid, malonic acid, glutaric acid, pimelic acid, azelaic acid, sebacic acid, and suberic acid. Dibasic acids such as phthalic acid, isophthalic acid, terephthalic acid, 2,6-naphthalene dicarboxylic acid, etc., or polyacids such as trimellitic acid, pyromellitic acid, etc. Aromatic polyacids, corresponding anhydrides or their derivatives, dimer acids, hydrogenated dimer acids, etc. Among these, aromatic polybasic acids are preferred from the viewpoint of forming a coating film having moderate hardness. For the esterification reaction for producing polyester polyol, various well-known catalysts can be used if necessary.
作為聚碳酸酯型多元醇並未特別限定,例如可列舉前述之二醇類與伸烷基碳酸酯的反應物等。 It does not specifically limit as a polycarbonate polyol, For example, the reaction material of the said diol and an alkylene carbonate, etc. are mentioned.
作為由多元醇化合物之羥基價所算出之數平均分子量,較佳為1,000~10,000,更佳為2,000~9,000,再更佳為3,000~7,000。若該數平均分子量為1,000以上,由於回避起因於過剩量之胺基甲酸乙酯鍵的生成,使中間層之黏彈性特性的控制變困難的事態故較佳。另一方面,若該數平均分子量為10,000以下,由於可防止所得之中間層過度軟化故較佳。 The number average molecular weight calculated from the hydroxyl value of the polyol compound is preferably from 1,000 to 10,000, more preferably from 2,000 to 9,000, and still more preferably from 3,000 to 7,000. If the number average molecular weight is 1,000 or more, it is preferable to avoid the situation that the control of the viscoelastic properties of the intermediate layer becomes difficult due to the formation of excess urethane bonds. On the other hand, when the number average molecular weight is 10,000 or less, it is preferable because excessive softening of the obtained intermediate layer can be prevented.
尚,從多元醇化合物之羥基價算出之數平均分子量係從[多元醇官能基數]×56.11×1000/[羥基價(單位:mgKOH/g)]算出之值。 Furthermore, the number average molecular weight calculated from the hydroxyl value of the polyol compound is a value calculated from [number of polyol functional groups]×56.11×1000/[hydroxyl value (unit: mgKOH/g)].
[聚異氰酸酯化合物] [Polyisocyanate compound]
作為聚異氰酸酯化合物,例如可列舉四亞甲基二異氰酸酯、六亞甲基二異氰酸酯、三甲基六亞甲基二異氰酸酯等之脂肪族聚異氰酸酯;異佛爾酮二異氰酸酯、降莰烯二異氰酸酯、二環己基甲烷-4,4’-二異氰酸酯、二環己基甲烷-2,4’-二異氰酸酯、ω,ω’-二異氰酸酯二甲基環己烷等之脂環族二異氰酸酯類;4,4’-二苯基甲烷二異氰酸酯、甲伸苯基(Tolylene)二異氰酸酯、伸茬基(Xylylene)二異氰酸酯、聯甲苯胺(Tolidine)二異氰酸酯、四亞甲基伸茬基二異氰酸酯、萘-1,5-二異氰酸酯等之芳香族二異氰酸酯類等。 Examples of polyisocyanate compounds include aliphatic polyisocyanates such as tetramethylene diisocyanate, hexamethylene diisocyanate, and trimethylhexamethylene diisocyanate; isophorone diisocyanate, norcamphene diisocyanate; , dicyclohexylmethane-4,4'-diisocyanate, dicyclohexylmethane-2,4'-diisocyanate, ω,ω'-diisocyanate dimethylcyclohexane and other alicyclic diisocyanates; 4 ,4'-Diphenylmethane diisocyanate, Tolylene diisocyanate, Xylylene diisocyanate, Tolidine diisocyanate, Tetramethylene stubble diisocyanate, Naphthalene -Aromatic diisocyanates such as 1,5-diisocyanate, etc.
此等當中,從操作性的觀點來看,較佳為異佛爾酮二異氰酸酯或六亞甲基二異氰酸酯、伸茬基二異氰酸酯。 Among them, isophorone diisocyanate, hexamethylene diisocyanate, and stubble diisocyanate are preferable from the viewpoint of handleability.
{具有(甲基)丙烯醯基之化合物} {Compounds having a (meth)acryl group}
作為具有(甲基)丙烯醯基之化合物,可列舉具有羥基之(甲基)丙烯酸酯。作為具有羥基之(甲基)丙烯酸酯,若為至少於1分子中具有羥基及(甲基)丙烯醯基之化合物,則並未特別限定。 As a compound which has a (meth)acryloyl group, the (meth)acrylate which has a hydroxyl group is mentioned. The (meth)acrylate having a hydroxyl group is not particularly limited as long as it is a compound having a hydroxyl group and a (meth)acryl group in at least one molecule.
作為具有具體羥基之(甲基)丙烯酸酯,例如可列舉於2-羥基乙基(甲基)丙烯酸酯、2-羥基丙基(甲基)丙烯酸酯、4-羥基丁基(甲基)丙烯酸酯、4-羥基環己基(甲基)丙烯酸酯、5-羥基環辛基(甲基)丙烯酸酯、2-羥基-3-苯氧基丙基(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、聚乙二醇單(甲基)丙烯酸酯、聚丙二醇單(甲基)丙烯酸酯等之羥基烷基(甲基)丙烯酸酯;N-羥甲基(甲基)丙烯醯胺等之含有羥基之(甲基)丙烯醯胺;乙烯醇、乙烯基酚、雙酚A之二環氧丙酯使(甲基)丙烯酸進行反應所得之反應物等。 Examples of (meth)acrylates having specific hydroxyl groups include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate ester, 4-hydroxycyclohexyl (meth)acrylate, 5-hydroxycyclooctyl (meth)acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, pentaerythritol tri(methyl)acrylate ) acrylate, polyethylene glycol mono(meth)acrylate, polypropylene glycol mono(meth)acrylate and other hydroxyalkyl(meth)acrylates; N-methylol(meth)acrylamide, etc. Hydroxyl-containing (meth)acrylamide; vinyl alcohol, vinylphenol, and bisphenol-A diglycidyl ester reacting (meth)acrylic acid, etc.
此等當中,較佳為羥基烷基(甲基)丙烯酸酯,更佳為2-羥基乙基(甲基)丙烯酸酯。 Among these, hydroxyalkyl (meth)acrylate is preferable, and 2-hydroxyethyl (meth)acrylate is more preferable.
如此進行所得之中間層用樹脂組成物用之胺基甲酸乙酯(甲基)丙烯酸酯(X)的重量平均分子量較佳為1,000~100,000,更佳為3,000~80,000,再更佳為5,000~65,000。若該重量平均分子量為1,000以上,由於在胺基甲酸乙酯(甲基)丙烯酸酯與後述之聚合性單體的聚合 物,起因於源自胺基甲酸乙酯(甲基)丙烯酸酯之構造彼此的分子間力,對中間層賦予適度之硬度故較佳。 The weight-average molecular weight of the urethane (meth)acrylate (X) for the resin composition for the intermediate layer obtained in this way is preferably 1,000 to 100,000, more preferably 3,000 to 80,000, and even more preferably 5,000 to 80,000. 65,000. If the weight average molecular weight is 1,000 or more, due to the polymerization of urethane (meth)acrylate and the polymerizable monomer described later, It is preferable to impart appropriate hardness to the intermediate layer due to the intermolecular force between structures derived from urethane (meth)acrylate.
中間層用樹脂組成物中之胺基甲酸乙酯(甲基)丙烯酸酯(X)的摻合量以組成物全量基準,較佳為20~70質量%,更佳為25~60質量%,再更佳為30~50質量%,又再更佳為33~47質量%。若胺基甲酸乙酯(甲基)丙烯酸酯的摻合量為如此之範圍,易形成損失正切高之中間層。 The blending amount of urethane (meth)acrylate (X) in the resin composition for the intermediate layer is based on the total amount of the composition, preferably 20-70% by mass, more preferably 25-60% by mass, Still more preferably, it is 30 to 50 mass %, and still more preferably, it is 33 to 47 mass %. When the blending amount of the urethane (meth)acrylate is in such a range, it is easy to form an intermediate layer with a high loss tangent.
中間層用樹脂組成物除了上述胺基甲酸乙酯(甲基)丙烯酸酯(X)之外,例如雖可進一步含有含有硫醇基之化合物(Y)或聚合性單體(Z),但較佳為含有此等之雙方。 The resin composition for an intermediate layer may further contain, for example, a thiol group-containing compound (Y) or a polymerizable monomer (Z) in addition to the above-mentioned urethane (meth)acrylate (X). It is better to include both of these.
(含有硫醇基之化合物(Y)) (compound (Y) containing thiol group)
作為含有硫醇基之化合物(Y),若為於分子中具有至少1個硫醇基之化合物,雖並未特別限制,但從易提高損失正切的觀點來看,較佳為多官能之含有硫醇基之化合物,更佳為4官能之含有硫醇基之化合物。 The thiol group-containing compound (Y) is not particularly limited as long as it has at least one thiol group in the molecule, but it is preferably a polyfunctional compound (Y) from the viewpoint of easily increasing the loss tangent. The thiol compound is more preferably a quadrifunctional compound containing a thiol group.
作為具體之含有硫醇基之化合物(Y),例如可列舉壬基硫醇、1-十二烷基硫醇、1,2-乙烷二硫醇、1,3-丙烷二硫醇、三嗪硫醇、三嗪二硫醇、三嗪三硫醇、1,2,3-丙烷三硫醇、四乙二醇-雙(3-巰基丙酸酯)、三羥甲基丙烷參(3-巰基丙酸酯)、季戊四醇肆(3-巰基丙酸酯)、季戊四醇肆硫乙醇酸酯、二季戊四醇陸(3-巰基丙酸酯)、參[(3-巰基丙醯氧基)-乙基]-異氰脲酸酯、1,4-雙(3-巰基丁醯氧基 (Butyryloxy))丁烷、季戊四醇肆(3-巰基丁酸酯)、1,3,5-參(3-巰基丁氧基乙基)-1,3,5-三嗪-2,4,6-(1H,3H,5H)-三酮等。 Specific examples of the compound (Y) containing a thiol group include nonylmercaptan, 1-dodecylmercaptan, 1,2-ethanedithiol, 1,3-propanedithiol, Oxazine thiol, triazine dithiol, triazine trithiol, 1,2,3-propane trithiol, tetraethylene glycol-bis(3-mercaptopropionate), trimethylolpropane ginseng (3 -mercaptopropionate), pentaerythritol fourteenth (3-mercaptopropionate), pentaerythritol fourteenth thioglycolate, dipentaerythritol four (3-mercaptopropionate), ginseng [(3-mercaptopropionyloxy)-ethyl base]-isocyanurate, 1,4-bis(3-mercaptobutyryloxy (Butyryloxy)) butane, pentaerythritol tetrakis(3-mercaptobutyrate), 1,3,5-ginseng(3-mercaptobutoxyethyl)-1,3,5-triazine-2,4,6 -(1H,3H,5H)-trione, etc.
尚,此等之含有硫醇基之化合物(Y)可1種或組合2種以上使用。 Furthermore, these thiol group-containing compounds (Y) can be used alone or in combination of two or more.
含有硫醇基之化合物(Y)的分子量較佳為200~3,000,更佳為300~2,000。若該分子量為上述範圍,與胺基甲酸乙酯(甲基)丙烯酸酯(X)的相溶性變良好,可將製膜性成為良好。 The molecular weight of the compound (Y) containing a thiol group is preferably from 200 to 3,000, more preferably from 300 to 2,000. When this molecular weight is the said range, compatibility with a urethane (meth)acrylate (X) becomes favorable, and film-forming property can be made favorable.
含有硫醇基之化合物(Y)的摻合量相對於胺基甲酸乙酯(甲基)丙烯酸酯(X)及後述之聚合性單體(Z)的合計100質量份,較佳為1.0~4.9質量份,更佳為1.5~4.8質量份。 The blending amount of the compound (Y) containing a thiol group is preferably 1.0~ 4.9 parts by mass, more preferably 1.5 to 4.8 parts by mass.
若該摻合量為1.0質量份以上,變易形成損失正切高之中間層,可使泵吸收性提昇。另一方面,若該摻合量為4.9質量份以下,可抑制捲繞成輥狀時之中間層的滲出等。 When the blending amount is 1.0 parts by mass or more, an intermediate layer with a high loss tangent is likely to be formed, and pump absorbability can be improved. On the other hand, if the blending amount is 4.9 parts by mass or less, bleeding of the intermediate layer when wound into a roll, etc., can be suppressed.
(聚合性單體(Z)) (polymerizable monomer (Z))
於本發明使用之中間層用樹脂組成物中,從使製膜性提昇的觀點來看,進而以包含聚合性單體(Z)較佳。聚合性單體(Z)係上述之胺基甲酸乙酯(甲基)丙烯酸酯(X)以外的聚合性化合物,可藉由能量線的照射與其他成分聚合之化合物。惟,所謂聚合性單體(Z),係意指去除樹脂成分 者。聚合性單體(Z)較佳為具有至少1個(甲基)丙烯醯基之化合物。 In the resin composition for an intermediate layer used in the present invention, it is further preferable to include a polymerizable monomer (Z) from the viewpoint of improving film-forming properties. The polymerizable monomer (Z) is a polymerizable compound other than the above-mentioned urethane (meth)acrylate (X), and is a compound that can be polymerized with other components by irradiation of energy rays. However, the so-called polymerizable monomer (Z) refers to the removal of the resin component By. The polymerizable monomer (Z) is preferably a compound having at least one (meth)acryl group.
尚,在本說明書,所謂「樹脂成分」,係指於構造中具有重複構造之低聚物或高分子量體,係指重量平均分子量為1,000以上之化合物。 Furthermore, in this specification, the term "resin component" means an oligomer or a high molecular weight body having a repeating structure in the structure, and means a compound having a weight average molecular weight of 1,000 or more.
作為聚合性單體(Z),例如可列舉具有碳數1~30之烷基的烷基(甲基)丙烯酸酯、具有羥基、醯胺基、胺基、環氧基等官能基之(甲基)丙烯酸酯、具有脂環式構造之(甲基)丙烯酸酯、具有芳香族構造之(甲基)丙烯酸酯、具有雜環式構造之(甲基)丙烯酸酯、苯乙烯、羥基乙基乙烯醚、羥基丁基乙烯醚、N-乙烯基甲醯胺、N-乙烯基吡咯烷酮、N-乙烯基己內醯胺、烯丙基環氧丙基醚等之乙烯化合物等。 Examples of the polymerizable monomer (Z) include alkyl (meth)acrylates having an alkyl group having 1 to 30 carbon atoms, and (meth)acrylates having functional groups such as hydroxyl groups, amido groups, amino groups, and epoxy groups. base) acrylate, (meth)acrylate with alicyclic structure, (meth)acrylate with aromatic structure, (meth)acrylate with heterocyclic structure, styrene, hydroxyethyl vinyl Vinyl compounds such as ether, hydroxybutyl vinyl ether, N-vinyl formamide, N-vinyl pyrrolidone, N-vinyl caprolactam, allyl glycidyl ether, etc.
作為具有碳數1~30之烷基的烷基(甲基)丙烯酸酯,例如可列舉甲基(甲基)丙烯酸酯、乙基(甲基)丙烯酸酯、n-丙基(甲基)丙烯酸酯、異丙基(甲基)丙烯酸酯、n-丁基(甲基)丙烯酸酯、異丁基(甲基)丙烯酸酯、t-丁基(甲基)丙烯酸酯、n-戊基(甲基)丙烯酸酯、n-己基(甲基)丙烯酸酯、2-乙基己基(甲基)丙烯酸酯、n-辛基(甲基)丙烯酸酯、壬基(甲基)丙烯酸酯、癸基(甲基)丙烯酸酯、十一烷基(甲基)丙烯酸酯、十二烷基(甲基)丙烯酸酯、十三烷基(甲基)丙烯酸酯、十四烷基(甲基)丙烯酸酯、十六烷基(甲基)丙烯酸酯、十八烷基(甲基)丙烯酸酯、二十烷基(甲基)丙烯酸酯等。 Examples of alkyl (meth)acrylates having an alkyl group having 1 to 30 carbon atoms include meth (meth)acrylate, ethyl (meth)acrylate, and n-propyl (meth)acrylate. ester, isopropyl(meth)acrylate, n-butyl(meth)acrylate, isobutyl(meth)acrylate, t-butyl(meth)acrylate, n-pentyl(meth)acrylate Base) acrylate, n-hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, n-octyl (meth)acrylate, nonyl (meth)acrylate, decyl ( Meth)acrylate, Undecyl(meth)acrylate, Dodecyl(meth)acrylate, Tridecyl(meth)acrylate, Tetradecyl(meth)acrylate, Cetyl (meth)acrylate, octadecyl (meth)acrylate, eicosyl (meth)acrylate, etc.
作為具有官能基之(甲基)丙烯酸酯,例如可列舉羥基乙基(甲基)丙烯酸酯、羥基丙基(甲基)丙烯酸酯、羥基丁基(甲基)丙烯酸酯等之含有羥基之(甲基)丙烯酸酯;(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N-丁基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥甲基丙烷(甲基)丙烯醯胺、N-甲氧基甲基(甲基)丙烯醯胺、N-丁氧基甲基(甲基)丙烯醯胺等之含有醯胺基之化合物;含有第1級胺基之(甲基)丙烯酸酯、含有第2級胺基之(甲基)丙烯酸酯、含有第3級胺基之(甲基)丙烯酸酯等之含有胺基之(甲基)丙烯酸酯;環氧丙基(甲基)丙烯酸酯、甲基環氧丙基(甲基)丙烯酸酯等之含有環氧基之(甲基)丙烯酸酯等。 Examples of (meth)acrylates having functional groups include those containing hydroxyl groups such as hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, and hydroxybutyl (meth)acrylate. Meth)acrylate; (meth)acrylamide, N,N-dimethyl(meth)acrylamide, N-butyl(meth)acrylamide, N-methylol(methyl)acrylamide Containing acrylamide, N-methylolpropane(meth)acrylamide, N-methoxymethyl(meth)acrylamide, N-butoxymethyl(meth)acrylamide, etc. Compounds with amide groups; (meth)acrylates containing 1st grade amine groups, (meth)acrylates containing 2nd grade amine groups, (meth)acrylates containing 3rd grade amine groups, etc. Amino-based (meth)acrylates; epoxypropyl (meth)acrylates, methylglycidyl (meth)acrylates, etc., epoxy-containing (meth)acrylates, etc.
作為具有脂環式構造之(甲基)丙烯酸酯,例如可列舉異莰基(甲基)丙烯酸酯、二環戊烯基(甲基)丙烯酸酯、二環戊基(甲基)丙烯酸酯、二環戊烯氧基(甲基)丙烯酸酯、環己基(甲基)丙烯酸酯、金剛烷(甲基)丙烯酸酯等。 Examples of (meth)acrylates having an alicyclic structure include isocamphoryl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentyl (meth)acrylate, Dicyclopentenyloxy (meth)acrylate, cyclohexyl (meth)acrylate, adamantane (meth)acrylate, and the like.
作為具有芳香族構造之(甲基)丙烯酸酯,例如可列舉苯基羥基丙基(甲基)丙烯酸酯、苄基(甲基)丙烯酸酯、2-羥基-3-苯氧基丙基(甲基)丙烯酸酯等。 Examples of (meth)acrylates having an aromatic structure include phenylhydroxypropyl (meth)acrylate, benzyl (meth)acrylate, 2-hydroxy-3-phenoxypropyl (methyl) base) acrylate, etc.
作為具有雜環式構造之(甲基)丙烯酸酯,例如可列舉四氫糠基(甲基)丙烯酸酯、嗎福啉(甲基)丙烯酸酯等。 As (meth)acrylate which has a heterocyclic structure, tetrahydrofurfuryl (meth)acrylate, morpholine (meth)acrylate, etc. are mentioned, for example.
此等當中,從與上述胺基甲酸乙酯(甲基)丙烯酸酯(X)的相溶性的觀點來看,較佳為具有比較的高體積 之基,更具體而言,較佳為具有脂環式構造之(甲基)丙烯酸酯、具有芳香族構造之(甲基)丙烯酸酯、具有雜環式構造之(甲基)丙烯酸酯,更佳為具有脂環式構造之(甲基)丙烯酸酯。又,從損失正切易成為1.0以上的觀點來看,作為聚合性單體,較佳為包含具有官能基之(甲基)丙烯酸酯及具有脂環式構造之(甲基)丙烯酸酯,更佳為包含含有羥基之(甲基)丙烯酸酯及異莰基(甲基)丙烯酸酯。 Among these, from the viewpoint of compatibility with the above-mentioned urethane (meth)acrylate (X), it is preferable to have a relatively high volume More specifically, (meth)acrylates having an alicyclic structure, (meth)acrylates having an aromatic structure, and (meth)acrylates having a heterocyclic structure are preferable, and Preferred are (meth)acrylates having an alicyclic structure. Also, from the viewpoint that the loss tangent is likely to be 1.0 or more, as the polymerizable monomer, it is preferable to include (meth)acrylate having a functional group and a (meth)acrylate having an alicyclic structure, more preferably It includes hydroxyl-containing (meth)acrylate and isocamyl (meth)acrylate.
中間層用樹脂組成物中之具有脂環式構造之(甲基)丙烯酸酯的摻合量,從上述觀點來看,以組成物全量基準較佳為32~53質量%,更佳為35~51質量%,再更佳為37~48質量%,又再更佳為40~47質量%。 The blending amount of (meth)acrylate having an alicyclic structure in the resin composition for an intermediate layer is preferably 32 to 53% by mass, more preferably 35 to 53% by mass based on the total amount of the composition, from the above viewpoint. 51% by mass, more preferably 37-48% by mass, and still more preferably 40-47% by mass.
又,相對於中間層用樹脂組成物中所包含之聚合性單體(Z)的全量,具有脂環式構造之(甲基)丙烯酸酯的摻合量,從上述觀點來看,較佳為52~87質量%,更佳為55~85質量%,再更佳為60~80質量%,又再更佳為65~77質量%。具有脂環式構造之(甲基)丙烯酸酯的摻合量為如此之範圍時,損失正切易成為1.0以上。 Also, from the above viewpoint, the amount of the (meth)acrylate having an alicyclic structure relative to the total amount of the polymerizable monomer (Z) contained in the resin composition for an intermediate layer is preferably 52 to 87% by mass, more preferably 55 to 85% by mass, still more preferably 60 to 80% by mass, and still more preferably 65 to 77% by mass. When the compounding quantity of the (meth)acrylate which has an alicyclic structure exists in such a range, a loss tangent becomes 1.0 or more easily.
又,中間層用樹脂組成物中之聚合性單體(Z)的摻合量較佳為30~80質量%,更佳為40~75質量%,再更佳為50~70質量%,又再更佳為53~67質量%。若聚合性單體(Z)的摻合量為如此之範圍,由於聚合在中間層中之聚合性單體(Z)而成之部分的運動性較高,有中間層變柔軟的傾向,損失正切更容易形成滿足上述要件之中間層。 In addition, the blending amount of the polymerizable monomer (Z) in the resin composition for the intermediate layer is preferably 30 to 80% by mass, more preferably 40 to 75% by mass, and still more preferably 50 to 70% by mass. Still more preferably, it is 53 to 67% by mass. If the blending amount of the polymerizable monomer (Z) is within such a range, the mobility of the portion formed by the polymerizable monomer (Z) polymerized in the intermediate layer tends to be high, and the intermediate layer tends to become soft, resulting in loss of Tangent is easier to form an intermediate layer that satisfies the above requirements.
又,從同樣的觀點來看,中間層用樹脂組成物中之胺基甲酸乙酯(甲基)丙烯酸酯(X)與聚合性單體(Z)的質量比[胺基甲酸乙酯(甲基)丙烯酸酯/聚合性單體]較佳為20/80~60/40,更佳為30/70~50/50,再更佳為35/65~45/55。 Also, from the same viewpoint, the mass ratio of urethane (meth)acrylate (X) to polymerizable monomer (Z) in the resin composition for an intermediate layer [urethane (meth)acrylate Base) acrylate/polymerizable monomer] is preferably 20/80~60/40, more preferably 30/70~50/50, and even more preferably 35/65~45/55.
(能量線聚合起始劑(R)) (Energy Ray Polymerization Initiator (R))
中間層用樹脂組成物更佳為包含能量線聚合起始劑(R)。藉由含有能量線聚合起始劑(R),將中間層用樹脂組成物藉由紫外線等之能量線可輕易硬化。能量線聚合起始劑(R)由於一般又稱為「光聚合起始劑」,於本說明書,以下,亦單稱為「光聚合起始劑」。 The resin composition for an intermediate layer more preferably contains an energy ray polymerization initiator (R). By containing the energy ray polymerization initiator (R), the resin composition for the intermediate layer can be easily cured by energy rays such as ultraviolet rays. Since the energy ray polymerization initiator (R) is generally also referred to as a "photopolymerization initiator", in this specification, hereinafter, it is also simply referred to as a "photopolymerization initiator".
作為光聚合起始劑,例如可列舉安息香化合物、苯乙酮化合物、醯基氧化膦化合物、茂鈦化合物、硫雜蒽酮化合物、過氧化物化合物等之光聚合起始劑、胺或醌等之光敏劑等,更具體而言,例如可列舉1-羥基環己基苯基酮、2-羥基-2-甲基-1-苯基-丙烷-1-酮、安息香、安息香甲基醚、安息香乙基醚、安息香異丙基醚、2,2-二甲氧基-1,2-二苯基乙烷-1-酮等。 Examples of photopolymerization initiators include photopolymerization initiators such as benzoin compounds, acetophenone compounds, acylphosphine oxide compounds, titanocene compounds, thioxanthone compounds, and peroxide compounds, amines, and quinones. photosensitizers, etc., more specifically, for example, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, benzoin, benzoin methyl ether, benzoin Ethyl ether, benzoin isopropyl ether, 2,2-dimethoxy-1,2-diphenylethan-1-one, etc.
此等之光聚合起始劑可1種或組合2種以上使用。 These photopolymerization initiators can be used 1 type or in combination of 2 or more types.
光聚合起始劑的摻合量相對於胺基甲酸乙酯(甲基)丙烯酸酯及聚合性單體的合計100質量份,較佳為0.05~15質量份,更佳為0.1~10質量份,再更佳為0.3~5質量份。 The blending amount of the photopolymerization initiator is preferably 0.05 to 15 parts by mass, more preferably 0.1 to 10 parts by mass, based on 100 parts by mass of the total of the urethane (meth)acrylate and the polymerizable monomer. , and more preferably 0.3 to 5 parts by mass.
(其他添加劑) (other additives)
中間層用樹脂組成物在不損及本發明的效果的範圍,可含有其他添加劑。作為其他添加劑,例如可列舉交聯劑、抗氧化劑、軟化劑(可塑劑)、填充劑、防鏽劑、顏料、染料等。摻合此等之添加劑時,其他添加劑的摻合量相對於胺基甲酸乙酯(甲基)丙烯酸酯及聚合性單體的合計100質量份,較佳為0.01~6質量份,更佳為0.1~3質量份。 The resin composition for an intermediate layer may contain other additives within the range that does not impair the effect of the present invention. Examples of other additives include crosslinking agents, antioxidants, softeners (plasticizers), fillers, antirust agents, pigments, and dyes. When these additives are blended, the blending amount of other additives is preferably 0.01 to 6 parts by mass, more preferably 0.1~3 parts by mass.
尚,中間層用樹脂組成物在不損及本發明的效果的範圍,除了胺基甲酸乙酯(甲基)丙烯酸酯之外,雖可含有胺基甲酸乙酯(甲基)丙烯酸酯以外之樹脂成分,但作為樹脂成分以僅含有胺基甲酸乙酯(甲基)丙烯酸酯較佳。 Furthermore, the resin composition for the intermediate layer may contain other than urethane (meth)acrylate in the range that does not impair the effect of the present invention. As a resin component, it is preferable to contain only urethane (meth)acrylate as a resin component.
中間層用樹脂組成物中所包含之胺基甲酸乙酯(甲基)丙烯酸酯以外之樹脂成分的含量較佳為5質量%以下,更佳為1質量%以下,再更佳為0.1質量%以下,又再更佳為0質量%。 The content of resin components other than urethane (meth)acrylate contained in the resin composition for an intermediate layer is preferably at most 5% by mass, more preferably at most 1% by mass, still more preferably at most 0.1% by mass Below, still more preferably, it is 0 mass %.
又,中間層取代胺基甲酸乙酯(甲基)丙烯酸酯(X),可藉由包含其他樹脂成分之中間層用樹脂組成物來形成。例如中間層可使用包含非反應性之胺基甲酸乙酯聚合物或低聚物、與聚合性單體之硬化性組成物、或包含乙烯-α-烯烴共聚物之組成物來形成。非反應性之胺基甲酸乙酯聚合物或低聚物使用周知者即可,作為聚合性單體,可使用與上述相同者。如此之硬化性組成物可含有上述之能量線聚合起始劑。 In addition, the intermediate layer may be formed by a resin composition for an intermediate layer containing other resin components in place of the urethane (meth)acrylate (X). For example, the intermediate layer can be formed using a curable composition comprising a non-reactive urethane polymer or oligomer, and a polymerizable monomer, or a composition comprising an ethylene-α-olefin copolymer. As the non-reactive urethane polymer or oligomer, known ones can be used, and as the polymerizable monomer, the same ones as above can be used. Such a curable composition may contain the aforementioned energy ray polymerization initiator.
乙烯-α-烯烴共聚物係聚合乙烯與α-烯烴單體而得到。作為α-烯烴單體,可列舉丙烯、1-丁烯、2-甲基-1-丁烯、2-甲基-1-戊烯、1-己烯、2,2-二甲基-1-丁烯、2-甲基-1-己烯、4-甲基-1-戊烯、1-庚烯、3-甲基-1-己烯、2,2-二甲基-1-戊烯、3,3-二甲基-1-戊烯、2,3-二甲基-1-戊烯、3-乙基-1-戊烯、2,2,3-三甲基-1-丁烯、1-辛烯、2,2,4-三甲基-1-辛烯等。此等之α-烯烴單體可單獨、或組合2種以上使用。 Ethylene-α-olefin copolymer is obtained by polymerizing ethylene and α-olefin monomers. Examples of α-olefin monomers include propylene, 1-butene, 2-methyl-1-butene, 2-methyl-1-pentene, 1-hexene, 2,2-dimethyl-1 -butene, 2-methyl-1-hexene, 4-methyl-1-pentene, 1-heptene, 3-methyl-1-hexene, 2,2-dimethyl-1-pentene ene, 3,3-dimethyl-1-pentene, 2,3-dimethyl-1-pentene, 3-ethyl-1-pentene, 2,2,3-trimethyl-1- Butene, 1-octene, 2,2,4-trimethyl-1-octene, etc. These α-olefin monomers can be used alone or in combination of two or more.
又,乙烯-α-烯烴共聚物可為聚合乙烯與α-烯烴單體與其他單體者。作為其他單體成分,例如可列舉乙酸乙烯酯、苯乙烯、丙烯腈、甲基丙烯腈、乙烯酮等之乙烯化合物;丙烯酸、甲基丙烯酸等之不飽和羧酸;丙烯酸甲酯、丙烯酸乙酯、丙烯酸-n-丙酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸-n-丙酯等之不飽和羧酸酯;丙烯醯胺、甲基丙烯醯胺等之不飽和羧酸醯胺等。此等單體可單獨、或組合2種以上使用。 Also, the ethylene-α-olefin copolymer may be one that polymerizes ethylene and α-olefin monomers and other monomers. Examples of other monomer components include vinyl compounds such as vinyl acetate, styrene, acrylonitrile, methacrylonitrile, and ketene; unsaturated carboxylic acids such as acrylic acid and methacrylic acid; methyl acrylate, ethyl acrylate , unsaturated carboxylic acid esters such as n-propyl acrylate, methyl methacrylate, ethyl methacrylate, and n-propyl methacrylate; unsaturated carboxylic acid esters such as acrylamide and methacrylamide Acid amides, etc. These monomers can be used individually or in combination of 2 or more types.
<黏著劑層> <Adhesive layer>
黏著劑層係設置在基材之上,又,設置中間層的情況下,係設置在該中間層之上。本發明之黏著劑層係至少包含胺基甲酸乙酯系樹脂(A)與能量線硬化性化合物(B),該能量線硬化性化合物(B)係對胺基甲酸乙酯系樹脂(A)為非反應,且分子量為35,000以下。 The adhesive layer is provided on the base material, and when an intermediate layer is provided, it is provided on the intermediate layer. The adhesive layer of the present invention contains at least urethane-based resin (A) and energy ray-curable compound (B), and the energy ray-curable compound (B) is urethane-based resin (A) It is non-reactive and has a molecular weight of 35,000 or less.
於本發明,由於黏著劑層藉由含有胺基甲酸乙酯系樹 脂(A),提高黏著劑層之凝聚力及機械性強度,於能量線硬化後將黏著膠帶從工件剝離時,難以在凸塊等之工件表面產生糊殘留。又,藉由至少含有能量線硬化性化合物(B),而使黏著劑層成為具有能量線硬化性。因此,將黏著膠帶從工件剝離時之剝離性能變良好。進而,藉由能量線硬化性化合物(B)為非反應,如後述,減低黏著劑層之儲藏彈性率,易確保對工件表面之凹凸的追蹤性。 In the present invention, since the adhesive layer contains urethane-based resin Grease (A) improves the cohesion and mechanical strength of the adhesive layer, and when the adhesive tape is peeled off from the workpiece after hardening by energy rays, it is difficult to produce paste residue on the surface of the workpiece such as bumps. Moreover, by containing at least an energy ray curable compound (B), the adhesive layer becomes energy ray curable. Therefore, the peeling performance when peeling an adhesive tape from a workpiece becomes favorable. Furthermore, since the energy ray-curable compound (B) is non-reactive, as will be described later, the storage modulus of the adhesive layer is lowered, and it is easy to ensure traceability to unevenness on the workpiece surface.
黏著劑層較佳為能量線照射後之斷裂應力為2.5MPa以上。斷裂應力成為2.5MPa以上時,機械性強度成為充分之值,易減低上述之糊殘留。又,從抑制糊殘留,並且易使突起之嵌入性、黏著劑層之接著性及剝離性提昇的點來看,上述斷裂應力較佳為2.8~30MPa,更佳為3.0~25MPa。尚,斷裂應力係以後述之實施例所記載之方法測定。 The adhesive layer preferably has a breaking stress after energy ray irradiation of 2.5 MPa or more. When the fracture stress is 2.5 MPa or more, the mechanical strength becomes a sufficient value, and the above-mentioned paste residue is easily reduced. In addition, from the viewpoint of suppressing paste residue and improving the embedability of protrusions, the adhesiveness and peelability of the adhesive layer, the breaking stress is preferably 2.8 to 30 MPa, more preferably 3.0 to 25 MPa. In addition, the fracture stress is measured by the method described in the examples described later.
尚,斷裂應力可藉由變更胺基甲酸乙酯系樹脂(A)的種類來調整。又,亦可藉由後述之光聚合性不飽和鍵的量來調整,有增多黏著劑層所含有之光聚合性不飽和鍵的量時斷裂應力增大,減少時斷裂應力縮小的傾向。同樣地,亦可藉由後述之交聯劑成分的量來調整,有增多交聯劑成分的量時斷裂應力增大,減少時斷裂應力縮小的傾向。 Furthermore, the fracture stress can be adjusted by changing the type of urethane-based resin (A). In addition, it can also be adjusted by the amount of photopolymerizable unsaturated bonds described later. When the amount of photopolymerizable unsaturated bonds contained in the adhesive layer increases, the fracture stress tends to increase, and when it decreases, the fracture stress tends to decrease. Similarly, it can also be adjusted by the amount of the cross-linking agent component described later. When the amount of the cross-linking agent component is increased, the fracture stress tends to increase, and when the amount of the cross-linker component is decreased, the fracture stress tends to decrease.
黏著劑層由於為能量線硬化性,故在能量線照射前可成為比較軟質,易追縱黏著劑層形成於工件表面的凹凸。又,黏著膠帶藉由照射能量線而硬化,降低黏著力,易從工件剝離。 Since the adhesive layer is energy ray curable, it can become relatively soft before energy ray irradiation, and it is easy to trace the unevenness formed by the adhesive layer on the surface of the workpiece. In addition, the adhesive tape hardens by irradiating energy rays, reduces the adhesive force, and is easy to peel off from the workpiece.
從抑制黏著膠帶之剝離時之糊殘留的觀點來看,黏著膠帶之能量線照射後的黏著力較佳為2000mN/25mm以下。尤其是將具有中間層之本發明之黏著膠帶貼附在於表面有凸塊等之大的突起(例如高度200μm以上)之工件的情況下,通常為藉由突起貼附在工件表面之黏著膠帶的中間層來吸收的狀態。因此,雖從該中間層剝離黏著膠帶時易產生糊殘留,故藉由將黏著力定為2000mN/25mm以下,易防止如此之糊殘留的產生。黏著膠帶之能量線照射後的黏著力較佳為50~1750mN/25mm,更佳為100~1500nN/25mm。 From the viewpoint of suppressing paste residue when the adhesive tape is peeled off, the adhesive force of the adhesive tape after energy ray irradiation is preferably 2000 mN/25 mm or less. In particular, when the adhesive tape of the present invention having an intermediate layer is attached to a workpiece having large protrusions (for example, a height of 200 μm or more) such as bumps on the surface, it is usually an adhesive tape that is attached to the surface of the workpiece through the protrusions. The middle layer comes in the state of absorption. Therefore, although it is easy to generate paste residue when peeling off the adhesive tape from this intermediate|middle layer, it becomes easy to prevent the generation|occurrence|production of such paste residue by making adhesive force into 2000mN/25mm or less. The adhesive force of the adhesive tape after energy ray irradiation is preferably 50~1750mN/25mm, more preferably 100~1500nN/25mm.
又,黏著膠帶之能量線照射前的黏著力例如雖較2000mN/25mm更大,但較佳為3000~30000mN/25mm,更佳為3500~9000mN/m。能量線照射前的黏著力為如此之範圍時,對工件表面的接著性變良好,工件的保護性能變良好。 In addition, although the adhesive force of the adhesive tape before energy ray irradiation is larger than 2000mN/25mm, for example, it is preferably 3000~30000mN/25mm, more preferably 3500~9000mN/m. When the adhesive force before energy ray irradiation is within such a range, the adhesion to the surface of the workpiece becomes good, and the protection performance of the workpiece becomes good.
尚,黏著膠帶之黏著力係將黏著膠帶之黏著劑層面貼附在矽鏡面晶圓,於23℃之環境下,以剝離角度180°、剝離速度300mm/分鐘剝離時所測定者,具體而言,係以後述之實施例所記載之方法測定。 Furthermore, the adhesive force of the adhesive tape is measured by attaching the adhesive layer of the adhesive tape to the silicon mirror wafer and peeling it off at a peeling angle of 180° and a peeling speed of 300mm/min in an environment of 23°C. Specifically, , is determined by the method described in the examples described later.
黏著力可藉由變更胺基甲酸乙酯系樹脂(A)或能量線硬化性化合物(B)的種類等來調整。又,能量線照射後之黏著力亦可藉由後述之光聚合性不飽和鍵的量來調整,有增多黏著劑層所含有之光聚合性不飽和鍵的量時減低,減少時提高的傾向。進而,能量線照射後之黏著力如後述般 即使藉由摻合含有光聚合性不飽和鍵之交聯劑(C1)或化合物(D),亦容易降低。 Adhesive force can be adjusted by changing the kind of urethane resin (A) or energy ray curable compound (B), etc. In addition, the adhesive force after energy ray irradiation can also be adjusted by the amount of photopolymerizable unsaturated bonds described later, and tends to decrease when the amount of photopolymerizable unsaturated bonds contained in the adhesive layer increases, and increase when it decreases. . Furthermore, the adhesive force after energy ray irradiation is as described later Even by blending a photopolymerizable unsaturated bond-containing crosslinking agent (C1) or compound (D), it is easy to decrease.
(胺基甲酸乙酯系樹脂(A)) (Urethane resin (A))
胺基甲酸乙酯系樹脂(A)係含有胺基甲酸乙酯鍵及脲鍵中之至少一者的聚合物。又,本發明之黏著劑層係由至少包含胺基甲酸乙酯聚合物(A’)、與能量線硬化性化合物(B)之胺基甲酸乙酯系黏著劑組成物(以下,亦單稱為「黏著劑組成物」)所形成者,胺基甲酸乙酯系樹脂(A)至少由主劑之胺基甲酸乙酯聚合物(A’)所構成。又,胺基甲酸乙酯系黏著劑組成物中如有必要,可進一步包含交聯劑(C)、化合物(D)等。 The urethane-based resin (A) is a polymer containing at least one of a urethane bond and a urea bond. In addition, the adhesive layer of the present invention is composed of a urethane-based adhesive composition (hereinafter, also referred to simply as In the case of "adhesive composition"), the urethane-based resin (A) is composed of at least the urethane polymer (A') as the main ingredient. In addition, the urethane-based adhesive composition may further contain a crosslinking agent (C), a compound (D), and the like, if necessary.
胺基甲酸乙酯系樹脂(A)可為藉由交聯劑(C)進行交聯者。又,如上述,胺基甲酸乙酯系黏著劑組成物除了交聯劑(C)之外亦如化合物(D)等,直接或間接與胺基甲酸乙酯聚合物(A’)鍵結,在黏著劑層可含有作為一體構成胺基甲酸乙酯系樹脂(A)之化合物。 The urethane-based resin (A) may be crosslinked by a crosslinking agent (C). Also, as described above, the urethane-based adhesive composition is directly or indirectly bonded to the urethane polymer (A') in addition to the crosslinking agent (C), such as the compound (D), The adhesive layer may contain a compound constituting the urethane-based resin (A) as a whole.
尚,如交聯劑(C)及化合物(D),總稱直接或間接與胺基甲酸乙酯聚合物(A’)鍵結,與胺基甲酸乙酯聚合物(A’)一起在黏著劑層作為一體構成胺基甲酸乙酯系樹脂(A)之化合物稱為“主劑反應性化合物”。 Still, such as crosslinking agent (C) and compound (D), collectively referred to as directly or indirectly bonded to the urethane polymer (A'), together with the urethane polymer (A') in the adhesive The compound constituting the urethane-based resin (A) as a whole is referred to as a "main agent-reactive compound".
在本發明,胺基甲酸乙酯聚合物(A’)的摻合量由於確保黏著劑層之黏著性,並且適當量摻合後述之成分(B)~(E),故相對於黏著劑組成物全量較佳為30~85質量%, 更佳為35~80質量%,再更佳為37~77質量%。又,主劑反應性化合物與胺基甲酸乙酯聚合物(A’)的摻合量合計相對於黏著劑組成物全量,較佳為40~95質量%,更佳為45~94質量%,再更佳為50~93質量%。 In the present invention, the blending amount of the urethane polymer (A') is relative to the composition of the adhesive because the adhesiveness of the adhesive layer is ensured and the following components (B) to (E) are blended in an appropriate amount. The total amount of the substance is preferably 30-85% by mass, More preferably, it is 35-80 mass %, More preferably, it is 37-77 mass %. In addition, the total blending amount of the main ingredient reactive compound and the urethane polymer (A') is preferably 40 to 95% by mass, more preferably 45 to 94% by mass, based on the total amount of the adhesive composition. More preferably, it is 50 to 93% by mass.
胺基甲酸乙酯系樹脂(A)較佳為具有光聚合性不飽和鍵。胺基甲酸乙酯系樹脂(A)為具有光聚合性不飽和鍵時,在工件加工用黏著膠帶之黏著劑層,變成胺基甲酸乙酯系樹脂(A)與能量線硬化性化合物(B)皆具有光聚合性不飽和鍵。因此,藉由照射能量線在黏著劑層,藉由聚合反應而於胺基甲酸乙酯系樹脂(A)與能量線硬化性化合物(B)之間形成鍵結,更易減低能量線照射後之黏著膠帶之黏著力,將黏著膠帶從工件剝離時之剝離性變良好。進而,變成可更一層減低將黏著膠帶從工件剝離時所產生之糊殘留。又,將因能量線照射導致黏著劑層之硬化與以僅能量線硬化性化合物(B)產生的情況相比較,有提高能量線照射後之黏著劑層之強度的傾向,更易抑制糊殘留的產生。 The urethane-based resin (A) preferably has a photopolymerizable unsaturated bond. When the urethane-based resin (A) has a photopolymerizable unsaturated bond, the adhesive layer of the adhesive tape for workpiece processing becomes the urethane-based resin (A) and the energy ray-curable compound (B). ) all have photopolymerizable unsaturated bonds. Therefore, by irradiating energy rays to the adhesive layer, a bond is formed between the urethane resin (A) and the energy ray-curable compound (B) through a polymerization reaction, and it is easier to reduce the damage after energy ray irradiation. The adhesive force of the adhesive tape improves the peelability when the adhesive tape is peeled off from the workpiece. Furthermore, it becomes possible to further reduce the paste residue generated when the adhesive tape is peeled off from the workpiece. In addition, when the hardening of the adhesive layer by energy ray irradiation is compared with the case of only the energy ray curable compound (B), there is a tendency to increase the strength of the adhesive layer after energy ray irradiation, and it is easier to suppress paste residue. produce.
導入光聚合性不飽和鍵於胺基甲酸乙酯系樹脂(A)之方法並未特別限定。例如光聚合性不飽和鍵導入前之胺基甲酸乙酯聚合物(A’)具有羥基的情況下,可使具有可與羥基反應之官能基、與包含(甲基)丙烯醯基等之光聚合性不飽和鍵之官能基的化合物於上述羥基進行反應,而導入光聚合性不飽和鍵。作為具有可與上述羥基反應之官能基與包含光聚合性不飽和鍵之官能基的化合物,例如 可列舉甲基丙烯醯氧基乙基異氰酸酯等。如此之化合物可預先使其在胺基甲酸乙酯聚合物(A’)進行反應,亦可使黏著劑層含有該化合物,在黏著劑層形成時使胺基甲酸乙酯聚合物(A’)進行反應。 The method for introducing a photopolymerizable unsaturated bond into the urethane-based resin (A) is not particularly limited. For example, when the urethane polymer (A') before the introduction of photopolymerizable unsaturated bonds has a hydroxyl group, it can be combined with a photopolymer containing a (meth)acryl group or the like that has a functional group that can react with the hydroxyl group. The compound of the functional group of a polymerizable unsaturated bond reacts with the said hydroxyl group, and introduces a photopolymerizable unsaturated bond. As a compound having a functional group reactive with the aforementioned hydroxyl group and a functional group containing a photopolymerizable unsaturated bond, for example Examples thereof include methacryloxyethyl isocyanate and the like. Such a compound may be reacted with the urethane polymer (A') in advance, or the adhesive layer may contain the compound, and the urethane polymer (A') may be reacted when the adhesive layer is formed. react.
又,如後述作為交聯劑(C),可藉由使用具有光聚合性不飽和鍵之交聯劑(C1)交聯胺基甲酸乙酯聚合物(A’),導入光聚合性不飽和鍵於胺基甲酸乙酯系樹脂(A)。進而,可藉由後述之化合物(D),導入光聚合性不飽和鍵於胺基甲酸乙酯系樹脂(A)。 Also, as described later as the crosslinking agent (C), it is possible to introduce photopolymerizable unsaturated bonds by crosslinking the urethane polymer (A') using a crosslinking agent (C1) having a photopolymerizable unsaturated bond. Bonded to the urethane resin (A). Furthermore, a photopolymerizable unsaturated bond can be introduced into the urethane resin (A) by the compound (D) mentioned later.
<胺基甲酸乙酯聚合物(A’)> <Urethane polymer (A')>
胺基甲酸乙酯聚合物(A’)可列舉含有胺基甲酸乙酯鍵及脲鍵之至少一者,具體而言,可列舉使多元醇及聚異氰酸酯化合物進行反應所得之於末端具有羥基之聚胺基甲酸乙酯多元醇。又,胺基甲酸乙酯聚合物(A’)可使用使多元醇及聚異氰酸酯化合物進行反應所得之末端為異氰酸酯即胺基甲酸乙酯聚合物。 The urethane polymer (A') includes at least one of a urethane bond and a urea bond, specifically, one having a hydroxyl group at the terminal obtained by reacting a polyol and a polyisocyanate compound. Polyurethane polyol. Also, as the urethane polymer (A'), an isocyanate-terminated urethane polymer obtained by reacting a polyol and a polyisocyanate compound can be used.
作為胺基甲酸乙酯聚合物(A’)所使用之多元醇,可列舉聚酯多元醇及聚醚多元醇。 Examples of the polyol used for the urethane polymer (A') include polyester polyol and polyether polyol.
作為聚酯多元醇係使用周知之聚酯多元醇。聚酯多元醇係酸成分、與二醇成分及多元醇成分之至少一者之酯,作為酸成分,可列舉對苯二甲酸、己二酸、壬二酸、癸二酸、無水鄰苯二甲酸、間苯二甲酸、偏苯三酸等。又,作為二醇成分,可列舉乙二醇、丙二醇、二乙二醇、丁二 醇、1,6-己烷二醇、3-甲基-1,5-戊烷二醇、3,3’-二羥甲基庚烷、聚氧乙二醇、聚氧丙二醇、1,4-丁烷二醇、新戊二醇、丁基乙基戊烷二醇,作為多元醇成分,可列舉甘油、三羥甲基丙烷、季戊四醇等。 A well-known polyester polyol is used as a polyester polyol. Polyester polyol-based acid components, esters with at least one of diol components and polyol components. Examples of acid components include terephthalic acid, adipic acid, azelaic acid, sebacic acid, and anhydrous phthalic acid. Formic acid, isophthalic acid, trimellitic acid, etc. Moreover, as a glycol component, ethylene glycol, propylene glycol, diethylene glycol, butanediol, alcohol, 1,6-hexanediol, 3-methyl-1,5-pentanediol, 3,3'-dimethylolheptane, polyoxyethylene glycol, polyoxypropylene glycol, 1,4 -Butanediol, neopentyl glycol, butylethylpentanediol, glycerol, trimethylolpropane, pentaerythritol, etc. are mentioned as a polyhydric alcohol component.
其他,可為開環聚合聚己內酯、聚(β-甲基-γ-戊內酯)、聚戊內酯等之內酯類所得之聚酯多元醇等。 Others may be polyester polyols obtained by ring-opening polymerization of lactones such as polycaprolactone, poly(β-methyl-γ-valerolactone), and polyvalerolactone.
又,作為聚醚多元醇係使用周知之聚醚多元醇。例如藉由將水、丙二醇、乙二醇、甘油、三羥甲基丙烷等之低分子量多元醇作為起始劑使用,使氧化乙烯、氧化丙烯、氧化丁烯、四氫呋喃等之環氧乙烷(Oxirane)化合物進行聚合所得之聚醚多元醇,具體而言,使用聚丙二醇、聚乙二醇、聚四亞甲基二醇等之官能基數為2以上者。 Moreover, a well-known polyether polyol is used as a polyether polyol. For example, ethylene oxide (ethylene oxide, propylene oxide, butylene oxide, tetrahydrofuran, etc.) As the polyether polyol obtained by polymerizing an Oxirane) compound, specifically, polypropylene glycol, polyethylene glycol, polytetramethylene glycol, etc. having two or more functional groups are used.
作為聚異氰酸酯化合物,可列舉周知之芳香族聚異氰酸酯、脂肪族聚異氰酸酯、芳香脂肪族聚異氰酸酯、脂環族聚異氰酸酯等。作為芳香族聚異氰酸酯,可列舉1,3-伸苯基二異氰酸酯、4,4’-二苯基二異氰酸酯、1,4-伸苯基二異氰酸酯、4,4’-二苯基甲烷二異氰酸酯、2,4-甲伸苯基二異氰酸酯、2,6-甲伸苯基二異氰酸酯、4,4’-甲苯胺二異氰酸酯、2,4,6-三異氰酸酯甲苯、1,3,5-三異氰酸酯苯、聯茴香胺二異氰酸酯、4,4’-二苯基醚二異氰酸酯、4,4’,4”-三苯基甲烷三異氰酸酯等。 As the polyisocyanate compound, well-known aromatic polyisocyanate, aliphatic polyisocyanate, araliphatic polyisocyanate, alicyclic polyisocyanate, etc. are mentioned. Examples of aromatic polyisocyanate include 1,3-phenylene diisocyanate, 4,4'-diphenylene diisocyanate, 1,4-phenylene diisocyanate, 4,4'-diphenylmethane diisocyanate , 2,4-methylene phenylene diisocyanate, 2,6-methylene phenylene diisocyanate, 4,4'-toluidine diisocyanate, 2,4,6-triisocyanate toluene, 1,3,5-tri Benzene isocyanate, dianisidine diisocyanate, 4,4'-diphenylether diisocyanate, 4,4',4"-triphenylmethane triisocyanate, etc.
作為脂肪族聚異氰酸酯,可列舉三亞甲基二異氰酸酯、四亞甲基二異氰酸酯、六亞甲基二異氰酸酯、 五亞甲基二異氰酸酯、1,2-丙烯二異氰酸酯、2,3-丁烯二異氰酸酯、1,3-丁烯二異氰酸酯、十二亞甲基二異氰酸酯、2,4,4-三甲基六亞甲基二異氰酸酯等。 Examples of the aliphatic polyisocyanate include trimethylene diisocyanate, tetramethylene diisocyanate, hexamethylene diisocyanate, Pentamethylene diisocyanate, 1,2-propene diisocyanate, 2,3-butene diisocyanate, 1,3-butene diisocyanate, dodecamethylene diisocyanate, 2,4,4-trimethyl Hexamethylene diisocyanate, etc.
作為芳香脂肪族聚異氰酸酯,可列舉ω,ω’-二異氰酸酯-1,3-二甲基苯、ω,ω’-二異氰酸酯-1,4-二甲基苯、ω,ω’-二異氰酸酯-1,4-二乙基苯、1,4-四甲基伸茬基二異氰酸酯、1,3-四甲基伸茬基二異氰酸酯等。 Examples of araliphatic polyisocyanates include ω,ω'-diisocyanate-1,3-dimethylbenzene, ω,ω'-diisocyanate-1,4-dimethylbenzene, ω,ω'-diisocyanate - 1,4-diethylbenzene, 1,4-tetramethyl-diisocyanate, 1,3-tetramethyl-diisocyanate, etc.
作為脂環族聚異氰酸酯,可列舉3-異氰酸酯甲基-3,5,5-三甲基環己基異氰酸酯、1,3-環戊烷二異氰酸酯、1,3-環己烷二異氰酸酯、1,4-環己烷二異氰酸酯、甲基-2,4-環己烷二異氰酸酯、甲基-2,6-環己烷二異氰酸酯、4,4’-亞甲基雙(環己基異氰酸酯)、1,4-雙(異氰酸酯甲基)環己烷、1,4-雙(異氰酸酯甲基)環己烷等。 Examples of alicyclic polyisocyanate include 3-isocyanate methyl-3,5,5-trimethylcyclohexyl isocyanate, 1,3-cyclopentane diisocyanate, 1,3-cyclohexane diisocyanate, 1, 4-cyclohexane diisocyanate, methyl-2,4-cyclohexane diisocyanate, methyl-2,6-cyclohexane diisocyanate, 4,4'-methylene bis(cyclohexyl isocyanate), 1 ,4-bis(isocyanate methyl)cyclohexane, 1,4-bis(isocyanate methyl)cyclohexane, etc.
又,上述聚異氰酸酯化合物可與上述聚異氰酸酯化合物之三羥甲基丙烷加成物、與水反應之縮二脲體、具有異氰脲酸酯環之三聚物等併用。 Furthermore, the above-mentioned polyisocyanate compound may be used in combination with a trimethylolpropane adduct of the above-mentioned polyisocyanate compound, a biuret product reacted with water, a trimer having an isocyanurate ring, or the like.
作為聚異氰酸酯化合物,較佳為4,4’-二苯基甲烷二異氰酸酯、六亞甲基二異氰酸酯、3-異氰酸酯甲基-3,5,5-三甲基環己基異氰酸酯(異佛爾酮二異氰酸酯)等。 As the polyisocyanate compound, 4,4'-diphenylmethane diisocyanate, hexamethylene diisocyanate, 3-isocyanatomethyl-3,5,5-trimethylcyclohexyl isocyanate (isophorone diisocyanate), etc.
又,聚胺基甲酸乙酯多元醇除了多元醇與多官能異氰酸酯之外,可為進一步使乙烯二胺、N-胺基乙基乙醇胺、異佛爾酮二胺、伸茬基二胺等之二胺進行反應者。進而,作為多元醇,除了上述之聚酯多元醇、聚醚多元醇之外,可使用乙二醇、1,4-丁烷二醇、新戊二醇、丁 基乙基戊烷二醇、甘油、三羥甲基丙烷、季戊四醇等。 In addition, polyurethane polyol can be further made of ethylenediamine, N-aminoethylethanolamine, isophoronediamine, stubble diamine, etc. in addition to polyol and polyfunctional isocyanate. Diamine reactants. Furthermore, as the polyol, in addition to the above-mentioned polyester polyol and polyether polyol, ethylene glycol, 1,4-butanediol, neopentyl glycol, butyl Ethylpentanediol, glycerin, trimethylolpropane, pentaerythritol, etc.
尚,與多元醇及聚異氰酸酯化合物的反應通常於3級胺系化合物、有機金屬系化合物等之觸媒的存在下進行。 Furthermore, the reaction with a polyol and a polyisocyanate compound is usually carried out in the presence of a catalyst such as a tertiary amine compound, an organometallic compound, or the like.
作為胺基甲酸乙酯聚合物(A’),並不限於上述者,例如可為麥可加成型胺基甲酸乙酯聚合物。 The urethane polymer (A') is not limited to those described above, and may be, for example, a Myco-addition type urethane polymer.
作為麥可加成型胺基甲酸乙酯聚合物,例如可列舉如以下之(1)或(2)。 As a mycoaddition type urethane polymer, the following (1) or (2) is mentioned, for example.
(1)於胺基甲酸乙酯預聚物使胺基化合物進行反應而成,該胺基甲酸乙酯預聚物係使上述多元醇與聚異氰酸酯化合物進行反應所得且於末端具有異氰酸酯基(-NCO),該胺基化合物係使聚胺與不飽和化合物進行麥可加成反應而成、(2)除了上述多元醇、聚異氰酸酯化合物之外,於具有一級或二級之胺基之聚胺基甲酸乙酯脲使不飽和化合物進行麥可加成反應而成,該聚胺基甲酸乙酯脲係使聚胺進行反應所得且於末端具有一級或二級之胺基。 (1) Made by reacting an amino compound with a urethane prepolymer obtained by reacting the above-mentioned polyol with a polyisocyanate compound and having an isocyanate group (- NCO), the amine-based compound is formed by the addition reaction of polyamine and unsaturated compound. (2) In addition to the above-mentioned polyols and polyisocyanate compounds, polyamines with primary or secondary amine groups Ethyl formate urea is produced by the Michael addition reaction of unsaturated compounds. The polyurethane urea is obtained by reacting polyamine and has primary or secondary amine groups at the end.
作為麥可加成型胺基甲酸乙酯聚合物中所使用之聚胺,可使用周知者,具體而言,可列舉乙烯二胺、丙烯二胺、三亞甲基二胺、四亞甲基二胺、五亞甲基二胺、六亞甲基二胺、三乙烯四胺、二乙烯三胺、三胺基丙烷、2,2,4-三甲基六亞甲基二胺、甲伸苯基二胺、胼、哌嗪等之脂肪族聚胺、異佛爾酮二胺、二環己基甲烷-4,4’-二胺等之脂環式聚胺、及伸苯基二胺、伸茬基二胺等之芳香族聚胺。進而亦可使用2-羥基乙基乙烯二胺、N-(2-羥基乙基)丙烯二胺、(2-羥基乙基丙烯)二胺、(二-2-羥基乙 基乙烯)二胺、(二-2-羥基乙基丙烯)二胺、(2-羥基丙基乙烯)二胺、(二-2-羥基丙基乙烯)二胺等之於分子內具有羥基之二胺類及將二聚酸之羧基轉化成胺基之二聚物二胺、於兩末端具有丙氧基胺且以下述一般式(2)表示之聚氧伸烷基二醇二胺等。 Known ones can be used as the polyamine used in the Myco-addition type urethane polymer, specifically, ethylenediamine, propylenediamine, trimethylenediamine, tetramethylenediamine, etc. , pentamethylenediamine, hexamethylenediamine, triethylenetetramine, diethylenetriamine, triaminopropane, 2,2,4-trimethylhexamethylenediamine, methylenediamine Aliphatic polyamines such as diamine, hydrazine, piperazine, etc., aliphatic polyamines such as isophorone diamine, dicyclohexylmethane-4,4'-diamine, etc., and phenylenediamine, stubble Aromatic polyamines such as diamines. Furthermore, 2-hydroxyethylethylenediamine, N-(2-hydroxyethyl)propylenediamine, (2-hydroxyethylpropylene)diamine, (di-2-hydroxyethyl ethylene) diamine, (di-2-hydroxyethylpropylene) diamine, (2-hydroxypropyl ethylene) diamine, (di-2-hydroxypropyl ethylene) diamine, etc. have hydroxyl groups in the molecule Diamines, dimer diamines obtained by converting carboxyl groups of dimer acids into amine groups, polyoxyalkylene glycol diamines having propoxylamine at both ends and represented by the following general formula (2), and the like.
H2-NCH2-CH2-CH2-O(CnH2n-O)m-CH2-CH2-CH2-NH2 (2)(尚,式(2)中,n表示2~4之任意整數,m表示2~50之任意整數)。 H 2 -NCH 2 -CH 2 -CH 2 -O(C n H 2n -O) m -CH 2 -CH 2 -CH 2 -NH 2 (2) (Shang, in formula (2), n represents 2~ Any integer of 4, m represents any integer of 2~50).
進而,作為聚胺亦可使用於末端具有一級或二級胺基之樹枝狀聚合物(Dendrimer)。 Furthermore, as polyamine, it can also be used for the dendrimer (Dendrimer) which has a primary or secondary amine group at the terminal.
上述之聚胺當中,從異佛爾酮二胺、2,2,4-三甲基六亞甲基二胺、六亞甲基二胺反應的控制制御容易的觀點來看較佳。 Among the above-mentioned polyamines, isophoronediamine, 2,2,4-trimethylhexamethylenediamine, and hexamethylenediamine are preferable from the viewpoint of ease of control of the reaction of hexamethylenediamine.
又,麥可加成型胺基甲酸乙酯聚合物中所使用之不飽和化合物係將胺基甲酸乙酯聚合物以進行改質之目的使用。據此,使用之不飽和化合物的種類可因應改質之目的任意進行選擇。作為不飽和化合物,例如可列舉(甲基)丙烯酸系不飽和化合物、醯胺系不飽和化合物、脂肪酸乙烯酯系不飽和化合物、乙烯醚系不飽和化合物、α-烯烴系不飽和化合物、烯丙基系不飽和化合物、乙酸烯丙酯系不飽和化合物、氰化乙烯系不飽和化合物、苯乙烯或乙烯苯系不飽和化合物等。 In addition, the unsaturated compound used in the Michael addition-type urethane polymer is used for the purpose of modifying the urethane polymer. Accordingly, the type of unsaturated compound used can be selected arbitrarily according to the purpose of modification. Examples of unsaturated compounds include (meth)acrylic unsaturated compounds, amide unsaturated compounds, fatty acid vinyl ester unsaturated compounds, vinyl ether unsaturated compounds, α-olefin unsaturated compounds, allyl Base-based unsaturated compounds, allyl acetate-based unsaturated compounds, vinyl cyanide-based unsaturated compounds, styrene or vinylbenzene-based unsaturated compounds, etc.
使用之不飽和化合物的種類雖可因應改質之目的任意進行選擇,但較佳為注目在不飽和化合物所具有之官能基 來進行選擇。作為如此之不飽和化合物所具有之官能基,雖可例示烷基、聚伸烷基二醇基、烷氧基、苯氧基、羥基、羧基、全氟烷基、烷氧基矽烷基、環氧基,進而可例示醯胺基或二烷基胺基、四級銨鹼等之含有氮之基等,但如上述,因為在胺基甲酸乙酯聚合物(A’)含有羥基,故以具有羥基較佳。 Although the type of unsaturated compound used can be selected arbitrarily according to the purpose of modification, it is better to pay attention to the functional group of the unsaturated compound to make a selection. Examples of functional groups possessed by such unsaturated compounds include alkyl groups, polyalkylene glycol groups, alkoxy groups, phenoxy groups, hydroxyl groups, carboxyl groups, perfluoroalkyl groups, alkoxysilyl groups, cyclic Oxygen group, further, amide group, dialkylamine group, nitrogen-containing group such as quaternary ammonium base, etc. can be exemplified, but as mentioned above, since the urethane polymer (A') contains a hydroxyl group, it is represented by It preferably has a hydroxyl group.
尚,此等作為不飽和化合物之具體例,例如使用日本特開2002-121256號公報(歐州公開公報EP1146061 A1)所記載者。 Furthermore, as specific examples of these unsaturated compounds, for example, those described in JP 2002-121256 A (European Publication EP1146061 A1) are used.
本發明所使用之胺基甲酸乙酯聚合物(A’)以重量平均分子量為10,000~300,000較佳,更佳為30,000~150,000。藉由為10,000以上,得到提昇黏著劑層之凝聚力,且抑制更高之糊殘留的效果。又,藉由成為300,000以下,從黏著劑組成物形成黏著劑層時,有即使以溶劑稀釋、或加熱使其熔融亦難以導致如對製程適用性帶來影響般之黏度上昇的優勢。 The urethane polymer (A') used in the present invention preferably has a weight average molecular weight of 10,000-300,000, more preferably 30,000-150,000. By being 10,000 or more, the cohesive force of the adhesive layer is enhanced and the effect of suppressing higher paste residues is obtained. In addition, when it is 300,000 or less, when an adhesive layer is formed from an adhesive composition, there is an advantage that even if it is diluted with a solvent or heated and melted, it is difficult to cause an increase in viscosity that affects process suitability.
(能量線硬化性化合物(B)) (Energy Beam Curing Compound (B))
本發明所使用之能量線硬化性化合物(B)係對胺基甲酸乙酯系樹脂(A)為非反應,且具有光聚合性不飽和鍵。 The energy ray-curable compound (B) used in the present invention is non-reactive to the urethane-based resin (A), and has a photopolymerizable unsaturated bond.
於此,所謂非反應,係意指除了「光聚合性不飽和鍵」以外,不僅胺基甲酸乙酯聚合物(A’),亦未含有與主劑反應性化合物進行反應之官能基,化合物(B)係在黏著劑層對於胺基甲酸乙酯系樹脂(A)未反應之化合物。 Here, the so-called non-reactive means that in addition to the "photopolymerizable unsaturated bond", not only the urethane polymer (A') does not contain a functional group that reacts with the reactive compound of the main agent, the compound (B) is a compound that does not react with the urethane-based resin (A) in the adhesive layer.
亦即,能量線硬化性化合物(B)係藉由胺基甲酸乙酯聚合物(A’)、與交聯劑(C)、與如有必要所使用之其他成分(例如(D)成分)進行反應,而形成黏著劑層時,未與此等(A’)、(C)、(D)成分反應之化合物。 That is, the energy ray-curable compound (B) is composed of a urethane polymer (A'), a crosslinking agent (C), and other components (such as (D) component) if necessary. A compound that does not react with these (A'), (C), and (D) components when reacting to form an adhesive layer.
如此,能量線硬化性化合物(B)成為在黏著劑層作為未構成胺基甲酸乙酯系樹脂(A)之成分存在。胺基甲酸乙酯聚合物由於一般而言凝聚力高且儲藏彈性率亦高,雖單獨難以嵌入工件表面的凸塊等之突起,但於本發明,藉由摻合未構成胺基甲酸乙酯聚合物鏈之能量線硬化性化合物(B),降低黏著劑層之儲藏彈性率,易確保對凸塊的嵌入性。 Thus, the energy ray-curable compound (B) exists as a component which does not comprise a urethane-type resin (A) in an adhesive layer. Since urethane polymers generally have high cohesive force and high storage elastic modulus, although it is difficult to embed protrusions such as bumps on the surface of the workpiece alone, in the present invention, no urethane polymerization is formed by blending. The energy ray hardening compound (B) of the material chain reduces the storage elastic modulus of the adhesive layer and easily ensures the embedding property of the bump.
尚,在本發明,光聚合性不飽和鍵係意指藉由能量線照射進行反應之不飽和鍵,通常為乙烯性雙鍵,較佳為(甲基)丙烯醯基所包含之碳-碳雙鍵。 Still, in the present invention, the photopolymerizable unsaturated bond refers to an unsaturated bond that reacts by energy ray irradiation, usually an ethylenic double bond, preferably a carbon-carbon contained in a (meth)acryl group double bond.
能量線硬化性化合物(B)的分子量成為35,000以下。分子量較35,000更大時,難以降低黏著劑層之儲藏彈性率,變難以確保對凸塊的嵌入性。又,有惡化與胺基甲酸乙酯系樹脂(A)的相溶性之虞。能量線硬化性化合物(B)的分子量較佳為150~35,000,再更佳為200~34,000。尚,所謂分子量,係意指式量可特定的情況下為式量,式量無法特定特定的情況下為重量平均分子量。 The molecular weight of the energy ray-curable compound (B) is 35,000 or less. When the molecular weight is larger than 35,000, it becomes difficult to lower the storage elastic modulus of the adhesive layer, and it becomes difficult to ensure embedding property to bumps. Moreover, there exists a possibility that the compatibility with a urethane resin (A) may deteriorate. The molecular weight of the energy ray-curable compound (B) is preferably from 150 to 35,000, more preferably from 200 to 34,000. Also, the molecular weight means a formula weight when the formula weight can be specified, and a weight average molecular weight when the formula weight cannot be specified.
能量線硬化性化合物(B)的摻合量雖因所使用之化合物而有所不同,但相對於胺基甲酸乙酯系樹脂(A)100質量份(亦即,係意指胺基甲酸乙酯聚合物(A’)及主劑反應性化 合物的合計100質量份,以下相同),通常為1~120質量份,較佳為2~100質量份,更佳為4~90質量份。藉由將能量線硬化性化合物(B)的摻合量設為如此之範圍,易得到對工件表面的追蹤性、與抑制糊殘留兼顧的黏著劑層。 The blending amount of the energy ray-curing compound (B) varies depending on the compound used, but it is based on 100 parts by mass of the urethane-based resin (A) (that is, urethane Reactivity of ester polymer (A') and main ingredient 100 parts by mass in total of the compound, the same below), usually 1 to 120 parts by mass, preferably 2 to 100 parts by mass, more preferably 4 to 90 parts by mass. By setting the blending amount of the energy ray-curable compound (B) within such a range, it is easy to obtain an adhesive layer that has both traceability to the workpiece surface and suppression of paste residue.
作為能量線硬化性化合物(B)之具體化合物,可列舉具有(甲基)丙烯醯基之化合物。能量線硬化性化合物(B)之一分子中之(甲基)丙烯醯基(光聚合性不飽和鍵)雖若為1官能以上即可,但較佳2官能以上,更佳為2~12官能。 Specific examples of the energy ray-curable compound (B) include compounds having a (meth)acryloyl group. The (meth)acryl group (photopolymerizable unsaturated bond) in one molecule of the energy ray-curable compound (B) may be monofunctional or higher, but preferably bifunctional or higher, more preferably 2 to 12 functional.
又,作為本發明所使用之能量線硬化性化合物(B)的具體例,可列舉選自(甲基)丙烯酸酯單體(B1)、及胺基甲酸乙酯(甲基)丙烯酸酯(B2)中之至少1種。 In addition, specific examples of the energy ray-curable compound (B) used in the present invention include (meth)acrylate monomers (B1) and urethane (meth)acrylates (B2). ) at least 1 species.
(甲基)丙烯酸酯單體(B1)係於分子中具有(甲基)丙烯醯基之化合物,其(甲基)丙烯醯基之數較佳為2官能以上,更佳為3~6。尤其是胺基甲酸乙酯系樹脂(A)未具有光聚合性不飽和鍵的情況下,較佳為在對黏著劑層的能量線照射之後,以易使黏著膠帶的黏著力減低的方式,使黏著劑層含有(甲基)丙烯醯基之數為4官能以上之(甲基)丙烯酸酯單體(B1)。 The (meth)acrylate monomer (B1) is a compound having a (meth)acryl group in the molecule, and the number of (meth)acryl groups is preferably more than 2, more preferably 3-6. In particular, when the urethane-based resin (A) does not have a photopolymerizable unsaturated bond, it is preferable to easily reduce the adhesive force of the adhesive tape after irradiation of the adhesive layer with energy rays. The adhesive layer contains the (meth)acrylate monomer (B1) whose number of (meth)acryl groups is 4 or more functional.
作為(甲基)丙烯酸酯單體(B1),例如可列舉多元醇之全部羥基為形成(甲基)丙烯酸與酯之完全酯即多官能(甲基)丙烯酸酯。於此,多元醇之碳數較佳為4~10。又,(甲基)丙烯酸酯單體(B1)以分子量為150~1000較佳,更 佳為200~800。 As the (meth)acrylate monomer (B1), for example, all the hydroxyl groups of the polyhydric alcohol are polyfunctional (meth)acrylates that form complete esters of (meth)acrylic acid and esters. Here, the carbon number of the polyol is preferably 4-10. Also, (meth)acrylate monomer (B1) is preferably 150~1000 with molecular weight, more The best is 200~800.
作為多官能(甲基)丙烯酸酯之具體化合物,雖可列舉三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己烷二醇二(甲基)丙烯酸酯等,但此等當中,較佳為季戊四醇四(甲基)丙烯酸酯。 As specific compounds of polyfunctional (meth)acrylates, trimethylolpropane tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1, 4-Butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, etc., Among these, pentaerythritol tetra(meth)acrylate is preferable.
尚,(甲基)丙烯酸酯單體(B1)係意指可構造特定,分子量為式量。 Furthermore, the (meth)acrylate monomer (B1) means that the structure can be specified, and the molecular weight is a formula weight.
(甲基)丙烯酸酯單體(B1)由於即使以較少之摻合量,亦可防止糊殘留且藉由能量線硬化使黏著力適當降低故較佳。 (Meth)acrylate monomer (B1) is preferable since it can prevent paste residue even with a small compounding quantity, and can moderately reduce adhesive force by energy ray hardening.
又,(甲基)丙烯酸酯單體(B1)的摻合量具體而言,相對於胺基甲酸乙酯系樹脂(A)100質量份,較佳為1~20質量份,更佳為2~15質量份,再更佳為3~10質量份。能量線硬化性化合物(B)可藉由成為如此之摻合量,適當防止黏著劑層之糊殘留,且可藉由能量線照射使黏著劑層之黏著力適當降低。 In addition, the blending amount of the (meth)acrylate monomer (B1) is specifically, preferably 1 to 20 parts by mass, more preferably 2 parts by mass, based on 100 parts by mass of the urethane resin (A). ~15 parts by mass, more preferably 3~10 parts by mass. The energy ray-curable compound (B) can suitably prevent the paste residue of an adhesive layer by using such a compounding quantity, and can suitably reduce the adhesive force of an adhesive layer by irradiation of an energy ray.
胺基甲酸乙酯(甲基)丙烯酸酯(B2)係具有胺基甲酸乙酯鍵,於末端具有(甲基)丙烯醯基之聚合物。作為胺基甲酸乙酯(甲基)丙烯酸酯(B2),可列舉藉由多元醇化合物與聚異氰酸酯化合物的反應生成末端異氰酸酯胺基甲酸乙酯聚合物,於其末端之官能基使具有(甲基)丙烯醯基之化合物進行反應所得之化合物等。如此之胺基甲酸乙酯(甲基)丙烯酸酯(B2)由(甲基)丙烯醯基之作用而具有能量 線硬化性。 Urethane (meth)acrylate (B2) is a polymer having a urethane bond and a (meth)acryl group at the end. Urethane (meth)acrylate (B2) includes terminal isocyanate urethane polymer formed by the reaction of polyol compound and polyisocyanate compound, and the functional group at its terminal has (form A compound obtained by reacting an acryl group compound, etc. Such urethane (meth)acrylate (B2) has energy due to the action of (meth)acryl group line hardening.
尚,為了得到胺基甲酸乙酯(甲基)丙烯酸酯(B2)所使用之多元醇化合物、聚異氰酸酯化合物、及具有(甲基)丙烯醯基之化合物,係分別從上述之中間層之胺基甲酸乙酯(甲基)丙烯酸酯(X)所使用之多元醇化合物、聚異氰酸酯化合物、及具有(甲基)丙烯醯基之化合物適當選擇使用,省略其具體之說明。 Furthermore, the polyol compound, the polyisocyanate compound, and the compound having a (meth)acryl group used to obtain the urethane (meth)acrylate (B2) are obtained from the amines of the above-mentioned intermediate layer, respectively. The polyol compound, polyisocyanate compound, and compound having a (meth)acryl group used in the ethyl methacrylate (X) are appropriately selected and used, and specific description thereof will be omitted.
胺基甲酸乙酯(甲基)丙烯酸酯(B2)係具有(甲基)丙烯醯基,其1分子中之(甲基)丙烯醯基較佳為2官能以上,更佳為2~12官能,再更佳為2~10官能。如此,藉由成為多官能,因能量線硬化導致易降低黏著力。 Urethane (meth)acrylate (B2) has (meth)acryl groups, and the (meth)acryl groups in one molecule are preferably 2 or more functional, more preferably 2 to 12 functional , and more preferably 2 to 10 functions. In this way, by being multifunctional, it is easy to lower the adhesive force by energy ray hardening.
又,胺基甲酸乙酯(甲基)丙烯酸酯(B2)的分子量雖成為35000以下,但較佳為2000~35000,更佳為5000~34000。尚,胺基甲酸乙酯(甲基)丙烯酸酯(B2)的分子量係意指重量平均分子量。藉由將胺基甲酸乙酯(甲基)丙烯酸酯的分子量定為如此之範圍,使黏著劑層之儲藏彈性率降低,且易確保對工件表面之凹凸的追蹤性。又,抑制在黏著劑層中之胺基甲酸乙酯(甲基)丙烯酸酯(B2)的移動,提昇黏著劑膠帶隨著時間的安定性。 Moreover, although the molecular weight of urethane (meth)acrylate (B2) will be 35000 or less, Preferably it is 2000-35000, More preferably, it is 5000-34000. Also, the molecular weight of the urethane (meth)acrylate (B2) means a weight average molecular weight. By setting the molecular weight of the urethane (meth)acrylate in such a range, the storage elastic modulus of the adhesive layer is lowered, and it is easy to ensure traceability to the unevenness of the workpiece surface. Also, the movement of the urethane (meth)acrylate (B2) in the adhesive layer is suppressed, and the stability of the adhesive tape over time is improved.
能量線硬化性化合物(B)為胺基甲酸乙酯(甲基)丙烯酸酯(B2)時,胺基甲酸乙酯(甲基)丙烯酸酯(B2)的摻合量相對於胺基甲酸乙酯系樹脂(A)100質量份,較佳為30~120質量份,更佳為40~100質量份,再更佳為50~90質量份。胺基甲酸乙酯(甲基)丙烯酸酯(B2)藉由成為如 此的摻合量,良好維持黏著劑層之黏著性能,且易確保嵌入性。又,因能量線硬化導致使黏著力充分降低,進而亦容易使糊殘留減低。 When the energy ray-curing compound (B) is urethane (meth)acrylate (B2), the blending amount of urethane (meth)acrylate (B2) relative to the urethane 100 parts by mass of the resin (A), preferably 30-120 parts by mass, more preferably 40-100 parts by mass, and more preferably 50-90 parts by mass. Urethane (meth)acrylate (B2) becomes Such a blending amount can maintain the adhesive performance of the adhesive layer well and ensure the embedding property easily. In addition, the adhesive force is sufficiently reduced by energy ray hardening, and it is also easy to reduce paste residue.
(交聯劑(C)) (Crosslinking agent (C))
本發明之黏著劑組成物以進一步含有交聯劑(C)較佳。交聯劑(C)係與胺基甲酸乙酯聚合物(A’)進行反應,使胺基甲酸乙酯聚合物(A’)交聯。黏著劑組成物藉由含有交聯劑(C),提高交聯密度,且易形成機械性強度高之黏著劑層。又,亦容易防止剝離黏著膠帶時之糊殘留等。 The adhesive composition of the present invention preferably further contains a crosslinking agent (C). The crosslinking agent (C) reacts with the urethane polymer (A') to crosslink the urethane polymer (A'). By containing the crosslinking agent (C), the adhesive composition increases the crosslinking density and easily forms an adhesive layer with high mechanical strength. In addition, it is also easy to prevent paste residue when the adhesive tape is peeled off.
作為交聯劑(C),較佳為胺基甲酸乙酯聚合物(A’)為具有羥基的情況下,可與該羥基反應般,具有2個以上異氰酸酯基之交聯劑。尚,黏著劑組成物含有交聯劑的情況下,通常為藉由塗佈後進行加熱而交聯。 As the crosslinking agent (C), when the urethane polymer (A') has a hydroxyl group, it is preferably a crosslinking agent having two or more isocyanate groups that can react with the hydroxyl group. Also, when the adhesive composition contains a crosslinking agent, it is usually crosslinked by heating after coating.
又,反而胺基甲酸乙酯聚合物(A’)已具有異氰酸酯基,交聯劑(C)可為具有羥基者。胺基甲酸乙酯聚合物(A’)由於一般而言於該製造方法上具有羥基或異氰酸酯基,如此,胺基甲酸乙酯聚合物(A’)與交聯劑(C)較佳為藉由胺基甲酸乙酯鍵鍵結。 Also, on the contrary, the urethane polymer (A') already has isocyanate groups, and the crosslinking agent (C) may have hydroxyl groups. Since the urethane polymer (A') generally has a hydroxyl group or an isocyanate group in the production method, the urethane polymer (A') and the crosslinking agent (C) are preferably formed by Bonded by urethane linkages.
作為可於本發明使用之交聯劑(C),較佳為使用含有光聚合性不飽和鍵之交聯劑(C1)。 As a crosslinking agent (C) which can be used in this invention, it is preferable to use the crosslinking agent (C1) containing a photopolymerizable unsaturated bond.
又,含有光聚合性不飽和鍵之交聯劑(C1)較佳為使用具有2個以上異氰酸酯基與(甲基)丙烯醯基之化合物,更佳為使用至少具有2個異氰酸酯基之胺基甲酸乙酯(甲基) 丙烯酸酯。 Also, as the crosslinking agent (C1) containing a photopolymerizable unsaturated bond, it is preferable to use a compound having two or more isocyanate groups and (meth)acryl groups, more preferably to use an amine group having at least two isocyanate groups Ethyl formate (methyl) Acrylate.
此胺基甲酸乙酯(甲基)丙烯酸酯以重量平均分子量為500~2000較佳,更佳為700~1000。又,交聯劑(C1)之一分子具有2個以上光聚合性不飽和鍵的情況下,交聯劑(C1)之同一分子中之光聚合性不飽和鍵有彼此易聚合的傾向。因此,難以引起交聯劑(C1)所具有之光聚合性不飽和鍵與其他分子所具有之光聚合性不飽和鍵的反應,有因對黏著劑層的能量線照射導致降低黏著膠帶之黏著力的效果較低的情況。據此,作為交聯劑(C1)較佳者為於一分子中具有1個光聚合性不飽和鍵。又,作為交聯劑(C1)使用之胺基甲酸乙酯(甲基)丙烯酸酯,例如可列舉DAICEL-ALLNEX公司製之「EBECRYL 4150」。 The urethane (meth)acrylate preferably has a weight average molecular weight of 500-2000, more preferably 700-1000. Moreover, when one molecule of a crosslinking agent (C1) has 2 or more photopolymerizable unsaturated bonds, the photopolymerizable unsaturated bonds in the same molecule of a crosslinking agent (C1) tend to superpose|polymerize easily. Therefore, it is difficult to cause a reaction between the photopolymerizable unsaturated bond of the crosslinking agent (C1) and the photopolymerizable unsaturated bond of other molecules, and the adhesion of the adhesive tape is reduced due to the energy ray irradiation to the adhesive layer. The case where the force effect is low. Accordingly, it is preferable that the crosslinking agent (C1) has one photopolymerizable unsaturated bond in one molecule. Moreover, the urethane (meth)acrylate used as a crosslinking agent (C1) is mentioned, for example, "EBECRYL 4150" by DAICEL-ALLNEX company.
於本實施形態,藉由使用具有光聚合性不飽和鍵之交聯劑(C1),成為在黏著劑層胺基甲酸乙酯系樹脂(A)為具有光聚合性不飽和鍵。 In this embodiment, by using the crosslinking agent (C1) which has a photopolymerizable unsaturated bond, the urethane-type resin (A) will have a photopolymerizable unsaturated bond in an adhesive agent layer.
作為含有羥基及光聚合性不飽和鍵之交聯劑,例如可列舉於側鏈具有羥基及(甲基)丙烯醯基之丙烯酸聚合物。此情況下,藉由交聯劑(C1)交聯之胺基甲酸乙酯系樹脂(A)亦即雖作為丙烯酸胺基甲酸乙酯樹脂,但於本發明之胺基甲酸乙酯系樹脂(A)亦包含如此之丙烯酸胺基甲酸乙酯樹脂。 As a crosslinking agent containing a hydroxyl group and a photopolymerizable unsaturated bond, an acrylic polymer which has a hydroxyl group and a (meth)acryl group in a side chain is mentioned, for example. In this case, although the urethane resin (A) crosslinked by the crosslinking agent (C1) is an acrylic urethane resin, it is used in the urethane resin (A) of the present invention. A) also includes such urethane acrylate resins.
含有光聚合性不飽和鍵之交聯劑(C1)的摻合量,相對於胺基甲酸乙酯系樹脂(A)100質量份,較佳為5~60質量份,更佳為10~50質量份,再更佳為15~45 質量份。藉由將交聯劑(C1)定為如此之摻合量,黏著劑層之交聯密度良好,同時可於胺基甲酸乙酯系樹脂(A)導入適當量之光聚合性不飽和鍵。 The blending amount of the crosslinking agent (C1) containing a photopolymerizable unsaturated bond is preferably 5 to 60 parts by mass, more preferably 10 to 50 parts by mass, based on 100 parts by mass of the urethane resin (A). parts by mass, more preferably 15~45 parts by mass. By setting such a blending amount of the crosslinking agent (C1), the crosslink density of the adhesive layer becomes favorable, and at the same time, an appropriate amount of photopolymerizable unsaturated bonds can be introduced into the urethane resin (A).
又,黏著劑組成物,作為交聯劑(C)可含有未含有光聚合性不飽和鍵之交聯劑(C2)。作為交聯劑(C2),胺基甲酸乙酯聚合物(A’)為具有羥基的情況下,可適當選自上述所列舉之為了合成胺基甲酸乙酯聚合物(A’)所使用之聚異氰酸酯化合物來使用。又,交聯前之聚合物(A’)為具有異氰酸酯基的情況下,可將周知之多元醇作為交聯劑(C2)使用。黏著劑組成物藉由含有交聯劑(C2),可充分提高黏著劑層之交聯密度。 In addition, the adhesive composition may contain a crosslinking agent (C2) not containing a photopolymerizable unsaturated bond as the crosslinking agent (C). As the crosslinking agent (C2), when the urethane polymer (A') has a hydroxyl group, it can be appropriately selected from those used for the synthesis of the urethane polymer (A') listed above. Polyisocyanate compounds are used. Moreover, when the polymer (A') before crosslinking has an isocyanate group, a well-known polyhydric alcohol can be used as a crosslinking agent (C2). The adhesive composition can sufficiently increase the crosslink density of the adhesive layer by containing the crosslinking agent (C2).
交聯劑(C)可為全部為具有光聚合性不飽和鍵之交聯劑(C1),雖可為全部為未具有光聚合性不飽和鍵之交聯劑(C2),但較佳為含有具有光聚合性不飽和鍵之交聯劑(C1),更佳為含有交聯劑(C1)與交聯劑(C2)雙方。 The crosslinking agent (C) may be all crosslinking agents (C1) having photopolymerizable unsaturated bonds, although it may be all crosslinking agents (C2) not having photopolymerizable unsaturated bonds, but preferably It contains the crosslinking agent (C1) which has a photopolymerizable unsaturated bond, More preferably, it contains both a crosslinking agent (C1) and a crosslinking agent (C2).
未含有光聚合性不飽和鍵之交聯劑(C2)的摻合量,相對於胺基甲酸乙酯系樹脂(A)100質量份,較佳為0.2~15質量份,更佳為0.5~10質量份。又,如上述,與交聯劑(C1)併用的情況下,未含有光聚合性不飽和鍵之交聯劑(C2)的摻合量可為比較少,相對於胺基甲酸乙酯系樹脂(A)100質量份,較佳為0.2~5質量份,更佳為0.5~2質量份。 The amount of the crosslinking agent (C2) that does not contain a photopolymerizable unsaturated bond is preferably 0.2 to 15 parts by mass, more preferably 0.5 to 100 parts by mass of the urethane resin (A). 10 parts by mass. Also, as mentioned above, when the crosslinking agent (C1) is used in combination, the blending amount of the crosslinking agent (C2) that does not contain a photopolymerizable unsaturated bond can be relatively small. (A) 100 parts by mass, preferably 0.2 to 5 parts by mass, more preferably 0.5 to 2 parts by mass.
(化合物(D)) (Compound (D))
黏著劑組成物含有交聯劑(C)時,以進一步含有具有光聚合性不飽和鍵、與可與交聯劑(C)反應之反應性官能基的化合物(D)較佳。具有反應性官能基之化合物(D)於胺基甲酸乙酯聚合物(A’)與交聯劑(C)進行反應形成胺基甲酸乙酯聚合物鏈時,係於交聯劑(C)進行反應。 When the adhesive composition contains a crosslinking agent (C), it is preferable to further contain a compound (D) having a photopolymerizable unsaturated bond and a reactive functional group capable of reacting with the crosslinking agent (C). The compound (D) having a reactive functional group is bound to the crosslinking agent (C) when the urethane polymer (A') reacts with the crosslinking agent (C) to form a urethane polymer chain. react.
黏著劑組成物含有化合物(D)時,因化合物(D)導致可於胺基甲酸乙酯系樹脂(A)導入光聚合性不飽和鍵。因此,將黏著劑層藉由能量線硬化時,易減低黏著劑層之黏著力,亦進一步容易防止糊殘留等。又,亦有隨著時間易安定化黏著膠帶之性能的效果。 When the adhesive composition contains the compound (D), photopolymerizable unsaturated bonds can be introduced into the urethane-based resin (A) due to the compound (D). Therefore, when the adhesive layer is cured by energy rays, the adhesive force of the adhesive layer can be easily reduced, and it is also easy to prevent paste residue and the like. In addition, it also has the effect of stabilizing the performance of the adhesive tape over time.
作為化合物(D)所含有之反應性官能基,可列舉異氰酸酯基、或羥基。又,作為化合物(D),可列舉具有羥基與(甲基)丙烯醯基之(甲基)丙烯酸酯單體。在化合物(D)之1分子中之(甲基)丙烯醯基(亦即光聚合性不飽和鍵)之數較佳為於1分子中包含2官能以上,更佳為2~5官能。 An isocyanate group or a hydroxyl group is mentioned as a reactive functional group contained in a compound (D). Moreover, as a compound (D), the (meth)acrylate monomer which has a hydroxyl group and a (meth)acryl group is mentioned. The number of (meth)acryl groups (that is, photopolymerizable unsaturated bonds) in one molecule of compound (D) is preferably 2 or more functions in 1 molecule, more preferably 2 to 5 functions.
作為成分(D)使用之(甲基)丙烯酸酯單體係以分子量為150~3,000較佳,更佳為200~2,000。 The (meth)acrylate monomer used as component (D) preferably has a molecular weight of 150-3,000, more preferably 200-2,000.
作為成分(D)使用之(甲基)丙烯酸酯單體,可列舉多元醇、與(甲基)丙烯酸之部分酯之多官能(甲基)丙烯酸酯。於此,多元醇之碳數較佳為4~10。作為具體之化合物,雖例示有季戊四醇三(甲基)丙烯酸酯、二季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯等,但此等當中,較佳為季戊四醇三(甲基)丙烯酸酯。 As a (meth)acrylate monomer used as a component (D), the polyfunctional (meth)acrylate of the partial ester of a polyhydric alcohol and (meth)acrylic acid is mentioned. Here, the carbon number of the polyol is preferably 4-10. As specific compounds, pentaerythritol tri(meth)acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, etc. are exemplified, but among these, pentaerythritol tri(meth)acrylate is preferred. base) acrylate.
化合物(D)的摻合量相對於胺基甲酸乙酯系樹脂(A)100質量份,較佳為1~30質量份,更佳為2~20質量份,再更佳為3~15質量份。藉由將化合物(D)以如此之範圍摻合,不會對黏著劑層之黏著性能帶來不良影響,因能量線之硬化導致易使黏著力減低,亦容易防止糊殘留。又,化合物(D)係以能量線硬化性化合物(B)為含有(甲基)丙烯酸酯單體(B1)的情況下,通常使用較佳。如此,併用化合物(D)與(甲基)丙烯酸酯單體(B1)時,更易發揮本發明的效果。 The blending amount of the compound (D) is preferably 1 to 30 parts by mass, more preferably 2 to 20 parts by mass, and still more preferably 3 to 15 parts by mass, based on 100 parts by mass of the urethane resin (A). share. By blending the compound (D) in such a range, it is easy to reduce the adhesive force due to hardening of the energy ray without adversely affecting the adhesive performance of the adhesive layer, and it is also easy to prevent paste residue. In addition, when the compound (D) is an energy ray-curable compound (B) containing a (meth)acrylate monomer (B1), it is usually used preferably. Thus, when compound (D) and (meth)acrylate monomer (B1) are used together, the effect of this invention is exhibited more easily.
(能量線聚合起始劑(E)) (Energy ray polymerization initiator (E))
黏著劑組成物以進一步含有能量線聚合起始劑(E)較佳。黏著劑層藉由含有能量線聚合起始劑(E),可藉由能量線之照射而容易硬化。作為能量線聚合起始劑(E),可適當選擇自上述所列舉之可於中間層用樹脂組成物所使用之光聚合起始劑來使用。 It is preferable that the adhesive composition further contains an energy ray polymerization initiator (E). The adhesive layer can be cured easily by irradiation of energy rays by containing the energy ray polymerization initiator (E). As the energy ray polymerization initiator (E), it can be appropriately selected from the photopolymerization initiators listed above that can be used in the resin composition for an intermediate layer.
能量線聚合起始劑(E)的摻合量,相對於具有光聚合性不飽和鍵之胺基甲酸乙酯聚合物(A’)、交聯劑(C1)、能量線硬化性化合物(B)、化合物(D)等之具有光聚合性不飽和鍵之化合物的合計100質量份,較佳為0.05~25質量份,更佳為0.1~20質量份,再更佳為0.3~15質量份。 The blending amount of the energy ray polymerization initiator (E) relative to the urethane polymer (A') having a photopolymerizable unsaturated bond, the crosslinking agent (C1), and the energy ray-curable compound (B ), compound (D) and the like with a total of 100 parts by mass of compounds having photopolymerizable unsaturated bonds, preferably 0.05 to 25 parts by mass, more preferably 0.1 to 20 parts by mass, and more preferably 0.3 to 15 parts by mass .
尚,黏著劑組成物可於胺基甲酸乙酯系黏著劑含有以往所使用之其他添加劑,可含有碳酸鈣、氧化鈦等之填充劑、著色劑、抗氧化劑、消泡劑、光安定劑等。 In addition, the adhesive composition may contain other additives used in the past in urethane adhesives, such as fillers such as calcium carbonate and titanium oxide, colorants, antioxidants, defoamers, light stabilizers, etc. .
黏著劑層之厚度雖可因應晶圓表面之凸塊高度等、貼附黏著膠帶之被著面的表面狀態來適當調整,但較佳為2~150μm,更佳為5~100μm,再更佳為8~50μm。 Although the thickness of the adhesive layer can be appropriately adjusted according to the height of the bump on the wafer surface, etc., and the surface state of the surface to which the adhesive tape is attached, it is preferably 2~150 μm, more preferably 5~100 μm, and even better 8~50μm.
<剝離材> <Peeling material>
黏著劑層之上所設置之剝離材、或後述之製造方法的步驟所使用之剝離材,使用經單面剝離處理之剝離薄片、或經雙面剝離處理之剝離薄片等,可列舉於剝離材用之基材上塗佈剝離劑者等。 The release material provided on the adhesive layer, or the release material used in the steps of the manufacturing method described later, use a release sheet that has undergone a single-side release treatment, or a release sheet that has undergone a double-side release treatment, and can be listed in the release material Used for coating release agent on the base material, etc.
作為剝離材用基材,例如可列舉聚對苯二甲酸乙二酯樹脂、聚對苯二甲酸丁二酯樹脂、萘二甲酸乙二酯樹脂等之聚酯樹脂薄膜、聚丙烯樹脂、聚乙烯樹脂等之聚烯烴樹脂薄膜等之塑膠薄膜等。 Examples of the base material for the release material include polyester resin films such as polyethylene terephthalate resin, polybutylene terephthalate resin, and ethylene naphthalate resin, polypropylene resin, polyethylene resin, etc. Plastic films such as polyolefin resin films such as resins, etc.
作為剝離劑,例如可列舉矽氧系樹脂、烯烴系樹脂、異戊二烯系樹脂、丁二烯系樹脂等之橡膠系彈性體、長鏈烷基系樹脂、醇酸系樹脂、氟系樹脂等。 Examples of release agents include rubber-based elastomers such as silicone-based resins, olefin-based resins, isoprene-based resins, and butadiene-based resins, long-chain alkyl-based resins, alkyd-based resins, and fluorine-based resins. Wait.
又,剝離材的厚度雖並未特別限定,但較佳為5~200μm,更佳為10~120μm。 Moreover, although the thickness of a peeling material is not specifically limited, Preferably it is 5-200 micrometers, More preferably, it is 10-120 micrometers.
[黏著膠帶之製造方法] [Manufacturing method of adhesive tape]
本發明之黏著膠帶其製造方法並未特別限制,可藉由周知之方法製造。 The manufacturing method of the adhesive tape of this invention is not specifically limited, It can manufacture by a well-known method.
中間層例如直接塗佈中間層用樹脂組成物的溶液於基材之一側的面,而形成塗佈膜之後,視需要進行乾燥,且 可進行硬化處理而形成。又,中間層係塗佈中間層用樹脂組成物的溶液於剝離材之剝離處理面,形成塗佈膜之後,視需要進行乾燥,藉由進行半硬化處理於剝離材上形成半硬化層,可將此半硬化層貼合在基材,完全硬化半硬化層而形成。此時,剝離材只要於完全硬化半硬化層之前、或硬化後適當去除即可。尚,中間層之硬化較佳為照射能量線於塗佈膜,使其聚合硬化。能量線較佳為紫外線。又,將中間層使用烯烴系材料形成的情況下,可藉由擠出成型等形成中間層。 The intermediate layer is, for example, directly coated with a solution of a resin composition for an intermediate layer on one side of the substrate to form a coating film, and then dried if necessary, and It can be formed by hardening treatment. In addition, the intermediate layer is coated with a solution of the resin composition for the intermediate layer on the peeling surface of the release material to form a coating film, and then dried if necessary, and a semi-hardened layer is formed on the release material by performing a semi-hardening treatment. This semi-hardened layer is bonded to the substrate, and the semi-hardened layer is completely hardened. In this case, the peeling material may be appropriately removed before or after the semi-cured layer is completely cured. Furthermore, it is preferable to harden the intermediate layer by irradiating the coating film with energy rays to polymerize and harden it. The energy rays are preferably ultraviolet rays. Also, when the intermediate layer is formed using an olefin-based material, the intermediate layer can be formed by extrusion molding or the like.
又,黏著劑層較佳為塗佈黏著劑組成物後,加熱黏著劑組成物再進行交聯,且視需要進行乾燥而形成。此時,黏著劑組成物可直接塗佈於中間層或基材上,塗佈於剝離材之剝離處理面形成黏著劑層,然後,可於中間層或基材之上貼合黏著劑層而形成。配置在黏著劑層之上的剝離材可視需要剝離。 In addition, the adhesive layer is preferably formed by applying the adhesive composition, heating the adhesive composition to perform crosslinking, and drying if necessary. At this time, the adhesive composition can be directly coated on the intermediate layer or the substrate, and coated on the peeled surface of the release material to form an adhesive layer, and then the adhesive layer can be pasted on the intermediate layer or the substrate. form. The release material placed on the adhesive layer can be peeled off as needed.
形成中間層或黏著劑層時,可於中間層用樹脂組成物或者黏著劑組成物進一步摻合有機溶劑,可作為中間層用樹脂組成物或者黏著劑組成物之稀釋液。作為所使用之有機溶劑,例如可列舉甲基乙基酮、丙酮、乙酸乙酯、四氫呋喃、二噁烷、環己烷、n-己烷、甲苯、二甲苯、n-丙醇、異丙醇等。 When forming an intermediate layer or an adhesive layer, an organic solvent can be further mixed with the resin composition for an intermediate layer or an adhesive composition, and can be used as a diluent of the resin composition or an adhesive composition for an intermediate layer. Examples of organic solvents used include methyl ethyl ketone, acetone, ethyl acetate, tetrahydrofuran, dioxane, cyclohexane, n-hexane, toluene, xylene, n-propanol, isopropanol Wait.
尚,此等之有機溶劑可直接使用中間層用樹脂組成物或者黏著劑組成物中所包含之各成分的合成時所使用之有機溶劑,亦可加入除此之外的1種以上之有機溶劑。 In addition, as these organic solvents, the organic solvents used in the synthesis of the components contained in the resin composition for the intermediate layer or the adhesive composition may be used as they are, or one or more other organic solvents may be added. .
中間層用樹脂組成物或者黏著劑組成物可藉由周知之塗佈方法塗佈。作為塗佈方法,例如可列舉旋塗法、噴塗法、棒塗法,刮刀塗佈法、輥塗法、刮塗法、模具塗佈法、凹版塗佈法等。 The resin composition or adhesive composition for the intermediate layer can be coated by a known coating method. Examples of coating methods include spin coating, spray coating, bar coating, knife coating, roll coating, blade coating, die coating, and gravure coating.
[黏著膠帶之使用方法] [How to use adhesive tape]
本發明之黏著膠帶其係貼附在各種工件,加工工件時所使用者,以貼附在有凹凸或突起之工件面使用較佳。 The adhesive tape of the present invention is attached to various workpieces, and is used when processing workpieces. It is better to be attached to the surface of workpieces with concavo-convex or protrusions.
又,更佳為貼附在半導體晶圓表面尤其是形成凸塊之晶圓表面,作為半導體晶圓表面保護用黏著膠帶使用。又,再更佳為黏著膠帶貼附在半導體晶圓表面,於之後的晶圓背面研磨時,作為保護晶圓表面所形成之電路的背面研磨膠帶使用。本發明之黏著膠帶為具有中間層的情況下,由於即使於晶圓表面因凸塊等而導致有高低差,嵌入性亦佳,故晶圓表面之保護性能變佳。此情況下,將黏著膠帶貼附在半導體晶圓的表面時之黏著膠帶的溫度例如為40~80℃左右,較佳為50~70℃。 Moreover, it is more preferable to stick on the surface of a semiconductor wafer, especially the surface of a wafer on which bumps are formed, and use it as an adhesive tape for protecting the surface of a semiconductor wafer. Furthermore, it is more preferable that the adhesive tape is attached to the surface of the semiconductor wafer, and used as a back grinding tape for protecting the circuit formed on the surface of the wafer when the wafer is subsequently ground. When the adhesive tape of the present invention has an intermediate layer, since the embedding property is good even if there is a level difference on the wafer surface due to bumps or the like, the protection performance of the wafer surface is improved. In this case, the temperature of the adhesive tape when attaching the adhesive tape to the surface of the semiconductor wafer is, for example, about 40-80°C, preferably 50-70°C.
在本發明,黏著劑層為能量線硬化型,半導體晶圓等之工件表面所貼附之黏著膠帶係照射能量線而能量線硬化之後,從工件表面剝離。據此,黏著膠帶由於係降低黏著力之後再剝離,故其剝離性變佳。又,如上述,硬化後之黏著膠帶剝離時難以產生糊殘留。 In the present invention, the adhesive layer is an energy ray curing type, and the adhesive tape affixed to the surface of a workpiece such as a semiconductor wafer is irradiated with energy rays to cure the energy ray, and then peeled off from the surface of the workpiece. Accordingly, since the adhesive tape is peeled off after the adhesive force is lowered, the peelability is improved. Also, as described above, when the hardened adhesive tape is peeled off, it is difficult to generate paste residue.
尚,黏著膠帶使用在半導體晶圓用的情況下,不限定於背面研磨薄片,亦可使用在其他用途。例如,黏著膠帶 貼附在晶圓背面,切割晶圓時,亦可作為保持晶圓之切割薄片使用。此情況之晶圓可為形成貫通電極者等,可為於晶圓背面形成凸塊等之突起或凹凸者。 Furthermore, when the adhesive tape is used for a semiconductor wafer, it is not limited to a back grinding sheet, and may be used for other purposes. e.g. adhesive tape Attached to the back of the wafer, it can also be used as a dicing sheet to hold the wafer when dicing the wafer. In this case, the wafer may be formed with through-hole electrodes, etc., or may have protrusions or irregularities such as bumps formed on the back surface of the wafer.
[實施例] [Example]
以下,雖根據實施例進一步詳細說明本發明,但本發明並非被限制於此等之例。 Hereinafter, although the present invention will be further described in detail based on examples, the present invention is not limited to these examples.
在本發明之測定方法、評估方法係如以下。 The measurement method and evaluation method in the present invention are as follows.
[重量平均分子量(Mw)、數平均分子量(Mn)] [Weight average molecular weight (Mw), number average molecular weight (Mn)]
使用凝膠滲透層析裝置(製品名「HLC-8220」、東曹股份有限公司製),以下述之條件下測定,使用在標準聚苯乙烯換算測定之值。 Using a gel permeation chromatography device (product name "HLC-8220", manufactured by Tosoh Co., Ltd.), it was measured under the following conditions, and the value measured in terms of standard polystyrene was used.
(測定條件) (measurement conditions)
管柱:「TSK guard column HXL-H」「TSK gel GMHXL(×2)」「TSK gel G2000HXL」(皆為東曹股份有限公司製) Column: "TSK guard column HXL-H", "TSK gel GMHXL(×2)" and "TSK gel G2000HXL" (all manufactured by Tosoh Co., Ltd.)
管柱溫度:40℃展開溶劑:四氫呋喃 流速:1.0mL/min Column temperature: 40°C Developing solvent: tetrahydrofuran Flow rate: 1.0mL/min
[損失正切(tanδ)] [loss tangent (tanδ)]
將各實施例及比較例所使用之中間層用樹脂組成物於聚對苯二甲酸乙二酯薄膜系剝離薄膜(琳得科股份有限公司製、製品名「SP-PET381031」、厚度38μm)上以模池刮刀(fountain die)方式進行塗佈而形成塗膜。而且從塗膜側 照射紫外線,而形成半硬化層。 The resin composition for the intermediate layer used in each example and comparative example was placed on a polyethylene terephthalate film-based release film (manufactured by Lintec Co., Ltd., product name "SP-PET381031", thickness 38 μm) Coating was performed by a fountain die method to form a coating film. And from the coating side UV rays are irradiated to form a semi-hardened layer.
尚,紫外線照射係使用皮帶輸送式紫外線照射裝置(iGrafx公司製、製品名「ECS-4011GX」)作為紫外線照射裝置,使用高壓水銀燈(iGrafx公司製、製品名「H04-L41」)作為紫外線源,在光波長365nm之照度112mW/cm2、光量177mJ/cm2(在iGrafx公司製之紫外線光量計「UVPF-A1」下測定)之條件下進行作為照射條件。 As for the ultraviolet irradiation system, a belt conveyor type ultraviolet irradiation device (manufactured by iGrafx Corporation, product name "ECS-4011GX") was used as the ultraviolet irradiation device, and a high-pressure mercury lamp (manufactured by iGrafx Corporation, product name "H04-L41") was used as the ultraviolet source. Irradiation conditions were carried out under the conditions of illuminance of 112 mW/cm 2 and light intensity of 177 mJ/cm 2 (measured with an ultraviolet light meter "UVPF-A1" manufactured by iGrafx Corporation) with a light wavelength of 365 nm.
於形成之半硬化層之上層合聚對苯二甲酸乙二酯薄膜系剝離薄膜(琳得科股份有限公司製、製品名「SP-PET381031」、厚度38μm),進而進行紫外線照射(使用上述之紫外線照射裝置、紫外線源,照度271mW/cm2、光量1,200mJ/cm2作為照射條件),使其完全硬化,於雙面形成貼附剝離薄膜之厚度200μm的中間層。 A polyethylene terephthalate film-based release film (manufactured by Lintec Co., Ltd., product name "SP-PET381031", thickness 38 μm) was laminated on the formed semi-hardened layer, and then irradiated with ultraviolet rays (using the above-mentioned Ultraviolet irradiation device, ultraviolet light source, illuminance 271mW/cm 2 , light intensity 1,200mJ/cm 2 as irradiation conditions), make it completely hardened, and form a 200μm-thick middle layer with a peeling film on both sides.
準備五個如此形成之中間層,藉由剝離PET系剝離薄膜,配合剝離面彼此依順序層合,來調製中間層層合體(厚度1,000μm)。 Five interlayers formed in this way were prepared, and the PET-based release film was peeled off, and the peeled surfaces were sequentially laminated to prepare an interlayer laminate (thickness: 1,000 μm).
其次,將所得之中間層層合體沖孔成直徑10mm之圓形,而得到用以測定黏彈性之試料。藉由黏彈性測定裝置(TA儀器公司製、製品名「ARES」),對上述之試料給予頻率1Hz之扭曲,以4℃/分鐘之昇溫速度測定-50~150℃之儲藏彈性率(G’),而得到在50℃之損失正切(tanδ)。 Next, the obtained intermediate layer laminate was punched into a circle with a diameter of 10 mm to obtain a sample for measuring viscoelasticity. Using a viscoelasticity measurement device (manufactured by TA Instruments, product name "ARES"), the above-mentioned sample was given a twist at a frequency of 1 Hz, and the storage elastic modulus (G' ) to obtain the loss tangent (tanδ) at 50°C.
[斷裂應力] [fracture stress]
於雙面調製貼附聚對苯二甲酸乙二酯系剝離薄膜(琳 得科股份有限公司製、製品名「SP-PET381031」)之黏著劑層(厚度200μm)。於此,以與實施例、比較例相同之方法,於一側之剝離薄膜之上將厚度變更為40μm,形成黏著劑層,然後,貼附另一側之剝離薄膜於黏著劑層。準備五片挾持如此之剝離薄膜的黏著劑層,剝離一側之剝離薄膜使露出之黏著劑層之表面彼此對向並層合。藉由重複此順序,而得到層合5層之黏著劑層之厚度200μm的黏著劑層。將挾持在2片剝離薄膜之間的黏著劑層之層合體在琳得科股份有限公司製UV照射裝置「RAD-2000m/12」以照度220mW/cm、照射速度15mm/秒照射紫外線後,將黏著劑層之硬化物切出15mm×150mm。其次,貼附薄膜拉伸用之標籤於兩端25mm部分,製作測定對象部分為15mm×100mm之帶狀型的樣品。在島津製作所股份有限公司製「Autograph AG-IS 500N」測定以拉伸速度200mm/分鐘測定時之斷裂應力。 Prepare and attach polyethylene terephthalate peel-off film (Lin Adhesive layer (thickness: 200 μm) manufactured by TEC Co., Ltd., product name “SP-PET381031”). Here, in the same manner as in Examples and Comparative Examples, the thickness was changed to 40 μm on one side of the release film to form an adhesive layer, and then the other side of the release film was attached to the adhesive layer. Five adhesive layers sandwiching such a release film were prepared, and the release film on one side was peeled off so that the exposed surfaces of the adhesive layers faced each other and were laminated. By repeating this procedure, an adhesive layer with a thickness of 200 μm in which five adhesive layers were laminated was obtained. After irradiating the laminated body of the adhesive layer sandwiched between two peeling films with UV irradiation device "RAD-2000m/12" manufactured by Lintec Co., Ltd. with an illuminance of 220mW/cm and an irradiation speed of 15mm/second, the The cured product of the adhesive layer is cut out to a size of 15mm×150mm. Next, a label for stretching the film was attached to the 25 mm portion at both ends, and a strip-shaped sample with a measurement target portion of 15 mm×100 mm was produced. The fracture stress when measured at a tensile speed of 200 mm/min was measured with "Autograph AG-IS 500N" manufactured by Shimadzu Corporation.
[能量線照射前之黏著力] [Adhesion before energy ray irradiation]
將實施例及比較例之黏著膠帶均等切斷成25mm寬,暫時放置黏著膠帶於被著體之矽鏡面晶圓之上,將其上使重量1kg之輥往返1次,藉由施加因自身重量造成之負荷貼附。貼附後,於23℃、相對濕度50%環境下保管1小時後,使用拉伸試驗機(Orientec公司製,製品名「TENSILON」),在剝離角度180°、剝離速度300mm/分鐘測定剝離黏著膠帶時之黏著力。 Cut the adhesive tapes of Examples and Comparative Examples equally into 25 mm wide, temporarily place the adhesive tape on the silicon mirror wafer to be attached, and make a roller weighing 1 kg reciprocate once on it, by applying the weight due to its own weight The resulting load is attached. After attaching, store at 23°C and a relative humidity of 50% for 1 hour, and measure the peel adhesion at a peel angle of 180° and a peel speed of 300mm/min using a tensile tester (manufactured by Orientec Corporation, product name "TENSILON") Adhesive force of adhesive tape.
[能量線照射後之黏著力] [Adhesion after energy ray irradiation]
將實施例及比較例之黏著膠帶均等切斷成25mm寬,暫時放置黏著膠帶於被著體之矽鏡面晶圓之上,將其上使重量1kg之輥往返1次,藉由施加因自身重量造成之負荷貼附。貼附後,於23℃、相對濕度50%環境下保管1小時後,在琳得科股份有限公司製UV照射裝置「RAD-2000 m/12」作為照度220mW/cm、照射速度15mm/秒從黏著膠帶側照射紫外線後,在23℃、相對濕度50%環境下放置5分鐘後,使用拉伸試驗機(Orientec公司製,製品名「TENSILON」),在剝離角度180°、剝離速度300mm/分鐘測定剝離黏著膠帶時之黏著力。 Cut the adhesive tapes of Examples and Comparative Examples equally into 25 mm wide, temporarily place the adhesive tape on the silicon mirror wafer to be attached, and make a roller weighing 1 kg reciprocate once on it, by applying the weight due to its own weight The resulting load is attached. After sticking, store it at 23°C and relative humidity of 50% for 1 hour, and then use the UV irradiation device "RAD-2000 m/12" manufactured by Lintec Co., Ltd. After irradiating the side of the adhesive tape with ultraviolet rays, leave it for 5 minutes at 23°C and a relative humidity of 50%, and then test it at a peeling angle of 180° and a peeling speed of 300mm/min using a tensile tester (manufactured by Orientec, product name "TENSILON") Measure the adhesive force when the adhesive tape is peeled off.
[嵌入性評估] [Embedded Evaluation]
於凸塊高度250μm、間距500μm、在俯視時之直徑300μm之球狀附凸塊的晶圓(Waltz公司製、8英寸晶圓、凸塊規格Sn/Ag/Cu=96.5/3/0.5質量%、晶圓表面材質SiO2)將於實施例及比較例製作之黏著膠帶使用琳得科股份有限公司製層壓機「RAD-3510F/12」貼附。尚,貼附之時,將裝置之層合桌與層合輥設定在60℃。層合後,在琳得科股份有限公司製UV照射裝置「RAD-2000 m/12」以照度220mW/cm、照射速度15mm/秒從黏著膠帶側照射紫外線。將貼附如此所得之黏著膠帶的評估晶圓使用數位顯微鏡(Keyence股份有限公司製、製品名「VHX-1000」) 測定從基材側至凸塊周邊所產生之圓形空隙的直徑,由以下之式算出嵌入性。 Spherical bumped wafer with a bump height of 250 μm, a pitch of 500 μm, and a diameter of 300 μm in plan view (manufactured by Waltz, 8-inch wafer, bump specification Sn/Ag/Cu=96.5/3/0.5% by mass , Wafer surface material SiO 2 ) Adhesive tapes produced in Examples and Comparative Examples were attached using a laminator "RAD-3510F/12" manufactured by Lintec Co., Ltd. Also, when attaching, set the lamination table and lamination rollers of the device at 60°C. After lamination, UV irradiation device "RAD-2000 m/12" manufactured by Lintec Co., Ltd. was irradiated with ultraviolet rays from the side of the adhesive tape at an illumination intensity of 220mW/cm and an irradiation speed of 15mm/sec. Using a digital microscope (manufactured by Keyence Co., Ltd., product name "VHX-1000"), the evaluation wafer to which the thus-obtained adhesive tape was attached was measured for the diameter of the circular void formed from the base material side to the periphery of the bump, as follows: The formula calculates the embeddedness.
嵌入性=空隙之直徑/凸塊徑×100[%] Embedding = diameter of void/diameter of bump × 100[%]
將算出之嵌入性具有110%以上未滿130%之適度空隙者評估為最優良,以以下之評估基準評估。 The calculated embeddability with a moderate gap of 110% or more but less than 130% is evaluated as the best, and is evaluated according to the following evaluation criteria.
A:嵌入性=110%以上未滿130% A: Embedding = more than 110% but less than 130%
B:嵌入性=130%以上未滿140% B: Embedding = more than 130% but less than 140%
C:嵌入性=未滿110%、或140%以上 C: Embedding = less than 110%, or more than 140%
[對凸塊的糊殘留評估] [Evaluation of Paste Residue on Bumps]
從與上述之嵌入性評估試驗同樣作成且貼附黏著膠帶之評估晶圓,於23℃、相對濕度50%之環境下在拉伸試驗機(Orientec公司製,製品名「TENSILON」)以拉伸速度120mm/分鐘剝離黏著膠帶。剝離後,將晶圓在Keyence製股份有限公司電子顯微鏡「VE-9800」,觀察晶圓之凸塊部分,確認糊殘留之有無。 From the evaluation wafer prepared in the same way as the above-mentioned embedding evaluation test and attached with an adhesive tape, it was stretched in a tensile tester (manufactured by Orientec Corporation, product name "TENSILON") in an environment of 23°C and a relative humidity of 50%. Peel off the adhesive tape at a speed of 120mm/min. After peeling off, put the wafer on an electron microscope "VE-9800" from Keyence Co., Ltd., and observe the bump portion of the wafer to confirm whether there is any paste residue.
[中間層付基材之製作] [Manufacturing of the base material for the middle layer]
摻合單官能胺基甲酸乙酯丙烯酸酯40質量份、異莰基丙烯酸酯(IBXA)45質量份、羥基丙基丙烯酸酯(HPA)15質量份、季戊四醇肆(3-巰基丁酸酯)(昭和電工股份有限公司、製品名「KarenzMT PE1」、含有第2級4官能硫醇之化合物、固形分濃度100質量份%)3.5質量份、交聯劑1.8質量份、及作為光聚合起始劑之2-羥基-2-甲基-1-苯基 -丙烷-1-酮(BASF公司製、製品名「Darocure1173」、固形分濃度100質量份%)1.0質量份,來調整中間層用樹脂組成物。將此中間層用樹脂組成物於聚對苯二甲酸乙二酯薄膜系剝離薄膜(琳得科股份有限公司製、製品名「SP-PET381031」、厚度38μm)上以模池刮刀方式進行塗佈而形成塗膜。 Blending 40 parts by mass of monofunctional urethane acrylate, 45 parts by mass of isocamphoryl acrylate (IBXA), 15 parts by mass of hydroxypropyl acrylate (HPA), pentaerythritol four (3-mercaptobutyrate) ( Showa Denko Co., Ltd., product name "KarenzMT PE1", a compound containing a second-stage tetrafunctional thiol, a solid content concentration of 100 parts by mass %) 3.5 parts by mass, a crosslinking agent 1.8 parts by mass, and as a photopolymerization initiator 2-Hydroxy-2-methyl-1-phenyl - 1.0 parts by mass of propan-1-one (manufactured by BASF Corporation, product name "Darocure 1173", solid content concentration: 100 parts by mass %) to adjust the resin composition for the intermediate layer. The resin composition for the intermediate layer was coated on a polyethylene terephthalate film-based release film (manufactured by Lintec Co., Ltd., product name "SP-PET381031", thickness 38 μm) with a pool doctor blade method to form a coating film.
而且從塗膜側照射紫外線而形成半硬化層。尚,紫外線照射係使用皮帶輸送式紫外線照射裝置(iGrafx公司製、製品名「ECS-401GGX」)作為紫外線照射裝置,使用高壓水銀燈(iGrafx公司製、製品名「H04-L41」)作為紫外線源,在光波長365nm之照度112mW/cm2、光量177mJ/cm2(iGrafx公司製,在製品名「UVPF-A1」測定)之條件下作為照射條件進行。 Further, ultraviolet rays are irradiated from the coating film side to form a semi-cured layer. As for the ultraviolet irradiation system, a belt conveyor type ultraviolet irradiation device (manufactured by iGrafx Corporation, product name "ECS-401GGX") was used as the ultraviolet irradiation device, and a high-pressure mercury lamp (manufactured by iGrafx Corporation, product name "H04-L41") was used as the ultraviolet source. Irradiation conditions were carried out under conditions of illuminance of 112 mW/cm 2 and light intensity of 177 mJ/cm 2 (manufactured by iGrafx Corporation, measured under the product name "UVPF-A1") at a wavelength of 365 nm.
層合由聚對苯二甲酸乙二酯(PET)系薄膜(東洋紡股份有限公司製、製品名「Cosmo ShineA4100」、厚度50μm)所構成之基材於形成之半硬化層之上,從PET薄膜側進一步進行紫外線照射(使用上述之紫外線照射裝置、紫外線源,照度271mW/cm2、光量1200mJ/cm2作為照射條件),使其完全硬化,形成厚度300μm之中間層於基材之PET薄膜上,而得到中間層付基材。 A substrate made of polyethylene terephthalate (PET) film (manufactured by Toyobo Co., Ltd., product name "Cosmo Shine A4100", thickness 50 μm) is laminated on the formed semi-hardened layer. From the PET film The side is further irradiated with ultraviolet rays (using the above-mentioned ultraviolet irradiation device, ultraviolet light source, illuminance 271mW/cm 2 , light intensity 1200mJ/cm 2 as irradiation conditions) to completely harden it, and form an intermediate layer with a thickness of 300μm on the PET film of the substrate , to obtain the sub-substrate of the intermediate layer.
尚,以頻率1Hz測定在50℃之中間層的損失正切(tanδ)為1.92。 Furthermore, the loss tangent (tan δ) of the intermediate layer measured at a frequency of 1 Hz at 50° C. was 1.92.
尚,在以下之實施例、比較例,各質量份係對於以稀釋液稀釋者以固形分換算表示。 Furthermore, in the following examples and comparative examples, each part by mass is expressed in terms of solid content with respect to those diluted with a diluent.
[實施例1] [Example 1]
準備具有胺基甲酸乙酯骨架,且具有複數羥基之聚胺基甲酸乙酯多元醇(Toyochem股份有限公司製、製品名「SH-101」、重量平均分子量:100,000),於此胺基甲酸乙酯聚合物(A’)100質量份作為胺基甲酸乙酯聚合物(A’)、添加具有複數異氰酸酯基之胺基甲酸乙酯丙烯酸酯(DAICEL-ALLNEX製、製品名「EBECRYL 4150」、重量平均分子量:1,040)32質量份作為交聯劑(C1)、作為能量線硬化性化合物(B)之季戊四醇四丙烯酸酯(式量:352)及作為化合物(D)之季戊四醇三丙烯酸酯(式量:298)的混合物(質量比(C:D)=40:60)(新中村化學股份有限公司製、製品名「A-TMM-3LM-N」)添加17質量份、添加2,2-二甲氧基-1,2-二苯基乙烷-1-酮(BASF公司製、製品名「Irgacure651」)5質量份作為能量線聚合起始劑(E)、添加聚異氰酸酯化合物(Toyochem股份有限公司製「T-501B」)1質量份作為交聯劑(C2),進行10分鐘攪拌,以甲苯稀釋來調整固形分濃度40質量%之黏著劑組成物。 A polyurethane polyol (manufactured by Toyochem Co., Ltd., product name "SH-101", weight-average molecular weight: 100,000) having a urethane skeleton and multiple hydroxyl groups was prepared. 100 parts by mass of ester polymer (A') As urethane polymer (A'), urethane acrylate having multiple isocyanate groups (manufactured by DAICEL-ALLNEX, product name "EBECRYL 4150", weight Average molecular weight: 1,040) 32 parts by mass as the crosslinking agent (C1), pentaerythritol tetraacrylate (formula: 352) as the energy ray-curable compound (B), and pentaerythritol triacrylate (formula) as the compound (D) :298) mixture (mass ratio (C:D)=40:60) (manufactured by Shin-Nakamura Chemical Co., Ltd., product name "A-TMM-3LM-N") added 17 parts by mass, added 2,2-di Methoxy-1,2-diphenylethan-1-one (manufactured by BASF, product name "Irgacure 651") was used as an energy ray polymerization initiator (E) in 5 parts by mass, and a polyisocyanate compound (Toyochem Co., Ltd. "T-501B" manufactured by the company) 1 part by mass as a crosslinking agent (C2), stirred for 10 minutes, and diluted with toluene to adjust the adhesive composition with a solid content concentration of 40% by mass.
其次,將調整之黏著劑組成物塗佈在聚對苯二甲酸乙二酯系剝離薄膜(琳得科股份有限公司製、製品名「SP-PET381031」、厚度38μm),於100℃加熱2分鐘,使其乾燥而於剝離薄膜上形成厚度10μm之黏著劑層。 Next, apply the adjusted adhesive composition on a polyethylene terephthalate-based release film (manufactured by Lintec Co., Ltd., product name "SP-PET381031", thickness 38 μm), and heat at 100°C for 2 minutes , and dried to form an adhesive layer with a thickness of 10 μm on the release film.
然後,去除先前製作之附中間層之基材上的剝離薄膜,貼合剝離薄膜上之黏著劑層於表出之中間層後,裁斷 去除在寬度方向之端部的不要部分,而得到基材、中間層、黏著劑層、及剝離薄膜以此順序設置之黏著膠帶。將此黏著膠帶的評估結果示於表1。 Then, remove the peeling film on the base material with the intermediate layer prepared earlier, stick the adhesive layer on the peeling film to the exposed intermediate layer, and then cut An adhesive tape in which a base material, an intermediate layer, an adhesive layer, and a release film were provided in this order was obtained by removing unnecessary portions at the ends in the width direction. Table 1 shows the evaluation results of this adhesive tape.
[實施例2] [Example 2]
除了將胺基甲酸乙酯聚合物(A’)變更為Toyochem股份有限公司製、製品名「SP-205」、重量平均分子量:98,000)來調整黏著劑組成物之外,其他與實施例1在同樣的順序製作黏著膠帶。 Except that the urethane polymer (A') was changed to Toyochem Co., Ltd., product name "SP-205", weight average molecular weight: 98,000) to adjust the adhesive composition, the others were the same as in Example 1. Make the adhesive tape in the same order.
[實施例3] [Example 3]
除了將「A-TMM-3LM-N」17質量份變更為作為能量線硬化性化合物(B)之胺基甲酸乙酯丙烯酸酯(根上工業股份有限公司製、製品名「UN-6200」、2官能、重量平均分子量6,270)100質量份來調整黏著劑組成物之外,其他與實施例1在同樣的順序製作黏著膠帶。 Except changing 17 parts by mass of "A-TMM-3LM-N" to urethane acrylate (manufactured by Negami Industry Co., Ltd., product name "UN-6200", 2 Functional, weight average molecular weight 6,270) 100 parts by mass to adjust the adhesive composition, other than Example 1 in the same procedure to produce an adhesive tape.
[實施例4] [Example 4]
除了將胺基甲酸乙酯聚合物(A’)變更為Toyochem股份有限公司製、製品名「SP-205」來調整黏著劑組成物之外,其他與實施例3在同樣的順序製作黏著膠帶。 An adhesive tape was produced in the same procedure as in Example 3, except that the urethane polymer (A') was changed to Toyochem Co., Ltd. product name "SP-205" to adjust the adhesive composition.
[實施例5] [Example 5]
除了將「A-TMM-3LM-N」17質量份變更為作為能量 線硬化性化合物(B)之胺基甲酸乙酯丙烯酸酯(6官能、重量平均分子量33,000)100質量份之外,其他與實施例1在同樣的順序製作黏著膠帶。 In addition to changing 17 parts by mass of "A-TMM-3LM-N" as energy An adhesive tape was produced in the same procedure as in Example 1 except for 100 parts by mass of urethane acrylate (6-functional, weight average molecular weight: 33,000) of the line-curing compound (B).
[比較例1] [Comparative example 1]
於聚合2-乙基己基丙烯酸酯94質量份、及2-羥基乙基丙烯酸酯6質量份所得之丙烯酸共聚物,將2-異氰酸酯乙基甲基丙烯酸酯(昭和電工股份有限公司製、製品名「KarenzMOI」)對於丙烯酸共聚物中之羥基之加成率以莫耳數基準成為50%的方式來調整加成之甲基丙烯醯基加成丙烯酸共聚物(重量平均分子量:900,000、固形分量:35質量%)。於此共聚物100質量份,添加1-羥基環己基苯基酮(BASF公司製、製品名「Irgacure184」)3質量份作為光聚合起始劑、添加聚異氰酸酯化合物(Toyochem股份有限公司製、製品名「BHS-8515」)0.8質量份作為交聯劑,進行30分鐘攪拌,來調整丙烯酸系黏著劑組成物。將所得之丙烯酸系黏著劑組成物塗佈在聚對苯二甲酸乙二酯系剝離薄膜(琳得科股份有限公司製、製品名「SP-PET381031」、厚度38μm),使其乾燥形成厚度10μm之黏著劑層。 In the acrylic copolymer obtained by polymerizing 94 parts by mass of 2-ethylhexyl acrylate and 6 parts by mass of 2-hydroxyethyl acrylate, 2-isocyanate ethyl methacrylate (made by Showa Denko Co., Ltd., product name "KarenzMOI") to the methacryl-added acrylic copolymer (weight average molecular weight: 900,000, solid content: 35% by mass). To 100 parts by mass of this copolymer, 3 parts by mass of 1-hydroxycyclohexyl phenyl ketone (manufactured by BASF Corporation, product name "Irgacure 184") was added as a photopolymerization initiator, and a polyisocyanate compound (manufactured by Toyochem Co., Ltd., product Name "BHS-8515") 0.8 parts by mass as a crosslinking agent, stirring for 30 minutes to adjust the acrylic adhesive composition. The obtained acrylic adhesive composition was coated on a polyethylene terephthalate release film (manufactured by Lintec Co., Ltd., product name "SP-PET381031", thickness 38 μm), and dried to a thickness of 10 μm. the adhesive layer.
去除先前製作之附中間層之基材上的剝離薄膜,貼合表出之中間層與剝離薄膜上之黏著劑層後,裁斷去除在寬度方向之端部的不要部分,而得到基材、中間層、黏著劑層、及剝離薄膜以此順序設置之黏著膠帶。將此黏著膠帶 的評估結果示於表1。 Remove the peeling film on the substrate with the intermediate layer prepared previously, and after bonding the exposed intermediate layer and the adhesive layer on the peeling film, cut and remove the unnecessary part at the end in the width direction to obtain the substrate, intermediate layer, adhesive layer, and release film in this order of the adhesive tape. sticky tape The evaluation results are shown in Table 1.
[比較例2] [Comparative example 2]
於聚合2-乙基己基丙烯酸酯90質量份、4-羥基丁基丙烯酸酯10質量份所得之丙烯酸共聚物,將2-異氰酸酯乙基甲基丙烯酸酯(昭和電工股份有限公司製、製品名「KarenzMOI」)對於丙烯酸共聚物中之羥基之加成率以莫耳數基準成為65%的方式加成而得到甲基丙烯醯基加成丙烯酸共聚物(重量平均分子量:1,000,000、固形分量:25質量%)。於此共聚物100質量份,添加1-羥基環己基苯基酮(BASF公司製、製品名「Irgacure184」)3質量份作為光聚合起始劑、添加聚異氰酸酯化合物(Toyochem股份有限公司製、製品名「BHS-8515」)1.1質量份作為交聯劑,進行30分鐘攪拌,來調整丙烯酸系黏著劑組成物。除此之外其他與比較例1以同樣的順序製作黏著膠帶。 In the acrylic copolymer obtained by polymerizing 90 parts by mass of 2-ethylhexyl acrylate and 10 parts by mass of 4-hydroxybutyl acrylate, 2-isocyanate ethyl methacrylate (made by Showa Denko Co., Ltd. KarenzMOI") to the hydroxyl group in the acrylic copolymer was added so that the molar basis became 65% to obtain a methacryl group-added acrylic copolymer (weight average molecular weight: 1,000,000, solid content: 25 mass %). To 100 parts by mass of this copolymer, 3 parts by mass of 1-hydroxycyclohexyl phenyl ketone (manufactured by BASF Corporation, product name "Irgacure 184") was added as a photopolymerization initiator, and a polyisocyanate compound (manufactured by Toyochem Co., Ltd., product name "BHS-8515") 1.1 parts by mass as a crosslinking agent, and stirred for 30 minutes to adjust the acrylic adhesive composition. Other than that, the adhesive tape was produced in the same procedure as in Comparative Example 1.
[比較例3] [Comparative example 3]
於聚合2-乙基己基丙烯酸酯90質量份、4-羥基丁基丙烯酸酯10質量份所得之丙烯酸共聚物,將2-異氰酸酯乙基甲基丙烯酸酯(昭和電工股份有限公司製、製品名「KarenzMOI」)對於丙烯酸共聚物中之羥基之加成率以莫耳數基準成為75%的方式加成而得到甲基丙烯醯基加成丙烯酸共聚物(重量平均分子量:1,000,000、固形分量:25質量%)。 In the acrylic copolymer obtained by polymerizing 90 parts by mass of 2-ethylhexyl acrylate and 10 parts by mass of 4-hydroxybutyl acrylate, 2-isocyanate ethyl methacrylate (made by Showa Denko Co., Ltd. KarenzMOI") to the hydroxyl group in the acrylic copolymer was added so that the molar basis became 75% to obtain a methacryl group-added acrylic copolymer (weight average molecular weight: 1,000,000, solid content: 25 mass %).
於此共聚物100質量份,添加1-羥基環己基苯基酮(BASF公司製、製品名「Irgacure184」)5質量份作為光聚合起始劑、添加聚異氰酸酯化合物(Toyochem股份有限公司製、製品名「BHS-8515」)1.2質量份作為交聯劑,進行30分鐘攪拌,來調整丙烯酸系黏著劑組成物。除此之外其他與比較例1以同樣的順序製作黏著膠帶。 To 100 parts by mass of this copolymer, 5 parts by mass of 1-hydroxycyclohexyl phenyl ketone (manufactured by BASF Corporation, product name "Irgacure 184") was added as a photopolymerization initiator, and a polyisocyanate compound (manufactured by Toyochem Co., Ltd., product Name "BHS-8515") 1.2 parts by mass as a crosslinking agent, stirring for 30 minutes to adjust the acrylic adhesive composition. Other than that, the adhesive tape was produced in the same procedure as in Comparative Example 1.
[比較例4] [Comparative example 4]
除了未添加「A-TMM-3LM-N」之外,其他與實施例1在同樣的順序製作黏著膠帶。 An adhesive tape was produced in the same procedure as in Example 1 except that "A-TMM-3LM-N" was not added.
於以上之實施例1~5,黏著劑組成物為胺基甲酸乙酯系,同時藉由於胺基甲酸乙酯系樹脂(A)含有非反應之能量線硬化性化合物(B),使凸塊之嵌入性(對工件之表面形狀的黏著劑層之追蹤性)變佳,同時斷裂應力提高可防止剝離時之糊殘留。進而,由於可提高能量線硬化前之黏著力,同時充分降低硬化後之黏著力,故剝離性、接著性優異。 In Examples 1 to 5 above, the adhesive composition is urethane-based, and at the same time, the urethane-based resin (A) contains a non-reactive energy ray-curing compound (B) to make the bumps The embedding property (tracking of the adhesive layer on the surface shape of the workpiece) becomes better, and the fracture stress is increased to prevent paste residue during peeling. Furthermore, since the adhesive force before energy ray curing can be increased and the adhesive force after curing can be sufficiently reduced, peelability and adhesiveness are excellent.
另一方面,於比較例1~3,由於黏著劑組成物為丙烯酸系,降低斷裂應力無法防止糊殘留。又,於比較例4雖為胺基甲酸乙酯系,但由於未含有能量線硬化性化合物(B),黏著劑層之柔軟性不良,嵌入性不夠充分。 On the other hand, in Comparative Examples 1-3, since the adhesive composition is acrylic, reducing the fracture stress cannot prevent paste residue. In addition, in Comparative Example 4, although it is a urethane system, since the energy ray-curable compound (B) is not contained, the flexibility of the adhesive layer is poor, and the embedding property is not sufficient.
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