TWI776317B - All-round correction module - Google Patents
All-round correction module Download PDFInfo
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- TWI776317B TWI776317B TW109144227A TW109144227A TWI776317B TW I776317 B TWI776317 B TW I776317B TW 109144227 A TW109144227 A TW 109144227A TW 109144227 A TW109144227 A TW 109144227A TW I776317 B TWI776317 B TW I776317B
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Abstract
一種全方位校正模組,其包括一傳動單元,其有一安裝平面,傳動單元有在空間移動之自由度;一吸嘴單元,其有一吸附端及一相對設置的安裝端,吸附端可吸附一晶片或其他待吸附之物品,安裝端可拆卸地安裝在傳動單元之安裝平面;一調整單元,其有一對應吸嘴單元形狀的調整端及一控制元件,調整端使吸嘴單元在安裝平面上移動及旋轉;及一視覺辨識單元,其電性連接調整單元之控制元件。本發明藉由視覺辨識單元來辨別晶片與系統要求位置的差距後,以調整單元來移動吸嘴單元進行對位,較習知裝置方法具有快速、安全的擺正晶片功效。An omnidirectional calibration module, which includes a transmission unit, which has an installation plane, and the transmission unit has a degree of freedom to move in space; a suction nozzle unit, which has an adsorption end and an oppositely arranged installation end, the adsorption end can adsorb a For wafers or other objects to be adsorbed, the mounting end is detachably mounted on the mounting plane of the transmission unit; an adjusting unit has an adjusting end corresponding to the shape of the suction nozzle unit and a control element, and the adjusting end makes the suction nozzle unit on the mounting plane moving and rotating; and a visual recognition unit, which is electrically connected to the control element of the adjustment unit. The present invention uses the visual recognition unit to identify the difference between the wafer and the position required by the system, and then uses the adjustment unit to move the suction nozzle unit for alignment. Compared with the conventional device method, the invention has the effect of aligning the wafer quickly and safely.
Description
本發明是有關於一種晶片移動設備,特別是一種可快速安全地將晶片擺正的全方位校正模組。The present invention relates to a wafer moving device, in particular to an omnidirectional calibration module that can quickly and safely align the wafer.
晶片在科技發達的現代已經成為生活不可或缺的一部分,但晶片在加工途中必須經歷過多次設備之間的移動,故有許多移動晶片的設備。但習知方法在將晶片移動並要置入托盤或進行後續作業時,因為無法每次皆完美的讓晶片被吸取在系統所預定的位置與角度,傳動模組必須進行位置與角度的微調才能順利讓晶片擺正進行下一工序,或是利用一外加的調整模組移動已經被吸起的晶片,又或是傳動模組先將晶片放置到一中介平台,中介平台先移動及旋轉晶片的角度後,傳動模組再進行一次吸取以利後續的動作;但這三種方法都有各自的缺點,例如:傳動模組本身體積較大不適合快速移動,故對位較花時間;部分晶片又薄又脆,不適合被調整模組夾持;多進行一次搬運到中介平台就多一次晶片碰撞的風險,且中介平台也難以快速移動。Wafers have become an indispensable part of life in the modern age with advanced technology, but wafers must undergo many moves between devices during processing, so there are many devices that move wafers. However, when the conventional method moves the wafer to be placed in the tray or performs subsequent operations, because the wafer cannot be perfectly sucked in the predetermined position and angle of the system every time, the transmission module must be fine-tuned in position and angle to be able to The wafer can be oriented smoothly to proceed to the next process, or an additional adjustment module is used to move the wafer that has been sucked up, or the transmission module first places the wafer on an intermediate platform, and the intermediate platform first moves and rotates the wafer. After the angle is turned, the transmission module performs another suction to facilitate subsequent actions; but these three methods have their own shortcomings, such as: the transmission module itself is large and not suitable for rapid movement, so it takes time to align; some wafers are thin It is also brittle and not suitable for being clamped by the adjustment module; if one more transfer to the intermediary platform is carried out, there is an additional risk of wafer collision, and the intermediary platform is also difficult to move quickly.
有鑑於此,本發明人乃潛心研思、設計組製,期能提供一種安全快速擺正晶片的裝置,即為本發明所欲研創之發明動機者。In view of this, the inventors of the present invention have devoted themselves to research and design, hoping to provide a device for safely and quickly aligning a chip, which is the motivation of the present invention.
本發明全方位校正模組之主要目的,即在提供一種安全快速擺正晶片的全方位校正模組,以調整單元調整及旋轉吸嘴單元的位置與角度,增快擺正晶片的速度。The main purpose of the omnidirectional calibration module of the present invention is to provide an omnidirectional calibration module for safely and quickly aligning the wafer, so as to adjust the unit adjustment and the position and angle of the rotating suction nozzle unit to increase the speed of aligning the wafer.
本發明之全方位校正模組,其包含一傳動單元,其有一安裝平面,傳動單元有在空間移動之自由度;一吸嘴單元,其有一吸附端及一相對設置的安裝端,吸附端可吸附一晶片或其他待吸附之物品,安裝端可拆卸地安裝在傳動單元之安裝平面;一調整單元,其有一對應吸嘴單元形狀的調整端及一控制元件,調整端使吸嘴單元在安裝平面上移動及旋轉;及一視覺辨識單元,其電性連接調整單元之控制元件。The omnidirectional calibration module of the present invention includes a transmission unit, which has an installation plane, and the transmission unit has a degree of freedom to move in space; a suction nozzle unit, which has an adsorption end and an oppositely arranged installation end, and the adsorption end can be A wafer or other object to be adsorbed is adsorbed, and the mounting end is detachably mounted on the mounting plane of the transmission unit; an adjusting unit has an adjusting end corresponding to the shape of the suction nozzle unit and a control element, and the adjusting end enables the suction nozzle unit to be installed moving and rotating on the plane; and a visual recognition unit, which is electrically connected to the control element of the adjustment unit.
本發明藉由視覺辨識單元來辨別晶片與系統所要求的預定位置及角度差距後,以調整單元來移動及旋轉吸嘴單元進行晶片的對位擺正,不用反覆移動沉重的傳動單元,也不用夾持晶片移動,亦不使用中介平台,較習知方法具有快速、安全的擺正晶片功效。The present invention uses the visual recognition unit to identify the predetermined position and angle difference between the wafer and the system, and then uses the adjustment unit to move and rotate the suction nozzle unit to align the wafer, without repeatedly moving the heavy transmission unit, and without The clamping of the wafer is moved, and no intermediate platform is used, which has the effect of aligning the wafer quickly and safely compared with the conventional method.
吸嘴單元之安裝端可沿著該安裝平面之延伸方向延伸出一安裝凸緣,方便安裝吸嘴單元。傳動單元可為一機械手臂。The installation end of the suction nozzle unit can extend along the extending direction of the installation plane with an installation flange, so as to facilitate the installation of the suction nozzle unit. The transmission unit can be a robotic arm.
吸嘴單元可用磁力、真空或是安裝平面上的複數彈力卡榫來安裝。The nozzle unit can be installed by magnetic force, vacuum or multiple spring clips on the mounting surface.
為了能夠更進一步瞭解本發明之特徵、特點和技術內容,請參閱以下有關本發明之詳細說明。In order to further understand the features, characteristics and technical content of the present invention, please refer to the following detailed description of the present invention.
請參閱第一圖至第四圖,揭示出本發明實施方式的圖式,本發明之全方位校正模組之實施例(一),包含一傳動單元1,其有一安裝平面10,傳動單元1有在空間移動之自由度,傳動單元1可為一機械手臂;一吸嘴單元2,其有一吸附端20及一相對設置的安裝端21,吸附端20可吸附一晶片A或其他待吸附之物品,安裝端21可拆卸地安裝在傳動單元1之安裝平面10,在本實施例(一)中,吸嘴單元2之安裝端21沿著安裝平面10之延伸方向延伸出一安裝凸緣211;一調整單元3,其有一對應吸嘴單元2形狀的調整端31及一控制元件(未繪製),調整端31使吸嘴單元2在安裝平面10上移動位置及旋轉角度,在本實施例(一)中調整端31有二夾爪311,讓調整端31可用各夾爪311從兩旁夾住吸嘴單元2移動與旋轉角度讓晶片A對正托盤B,調整單元3可有一活動關節(未繪製)來旋轉吸嘴單元2;及一視覺辨識單元4,其電性連接調整單元3之控制元件(未繪製)。在第二圖中,視覺辨識單元4辨別晶片A與系統所要求的預定位置及角度差距後,以調整單元3來移動及旋轉吸嘴單元2進行對位,再讓晶片進行下一道預定工序或如第三圖中再移動到另一位置將晶片A置放到一托盤B,不用反覆移動沉重的傳動單元1,也不用夾持晶片A移動故沒有損傷晶片的疑慮,亦不使用中介平台來增加操作次數,較習知方法具有快速、安全的擺正晶片A之功效,本實
施例(一)如第四圖中在安裝平面10設有至少一磁性元件101,讓吸嘴單元2以磁力吸附在安裝平面10之上,磁性元件101亦可以設置於安裝端21。
Please refer to the first to fourth figures, which reveal the drawings of the embodiments of the present invention. The embodiment (1) of the omnidirectional calibration module of the present invention includes a
在第五圖,本發明之實施例(二)中,安裝平面10設有一真空吸引元件102,真空吸引元件102吸引吸嘴單元2之安裝端21,使吸嘴單元2安裝於傳動單元1。
In FIG. 5 , in the second embodiment of the present invention, the
在第六圖,本發明之實施例(三)中,安裝平面10朝安裝端21的方向凸設複數L字型卡掣件103,各L字型卡掣件103未與安裝平面10相接之一端分別朝向相對設置的彼此,也就是朝向另一L字型卡掣件103,各L字型卡掣件103未與安裝平面10相接之一端分別設一彈力卡榫1031,各彈力卡榫1031分別卡掣安裝端21,讓各彈力卡榫1031支撐吸嘴單元2,由於安裝凸緣211之寬度大於各彈力卡榫1031之間形成的開口,吸嘴單元2不會意外掉落,各L字型卡掣件103可成環狀設置於安裝平面10之上,提供吸嘴單元2各方向的支撐。要取下吸嘴單元2時可壓縮各彈力卡榫1031便可取下吸嘴單元2。
In the sixth figure, in the third embodiment of the present invention, a plurality of L-
惟以上所述者,僅為本發明之較佳實施例,當不能用以限定本發明可實施之範圍,凡習於本業之人士所明顯可作的變化與修飾,皆應視為不悖離本發明之實質內容。However, the above descriptions are only preferred embodiments of the present invention, and should not be used to limit the scope of implementation of the present invention. Any changes and modifications that can be obviously made by those who are accustomed to the industry should be regarded as not departing from the essence of the present invention.
1:傳動單元 1: Transmission unit
10:安裝平面 10: Installation plane
101:磁性元件 101: Magnetic Components
102:真空吸引元件 102: Vacuum suction element
103:L字型卡掣件 103: L-shaped clip
1031:彈力卡榫 1031: Elastic tenon
2:吸嘴單元 2: Nozzle unit
20:吸附端 20: Adsorption end
21:安裝端 21: Mounting end
211:安裝凸緣 211: Mounting flange
3:調整單元 3: Adjustment unit
31:調整端 31: Adjustment end
311:夾爪 311: Gripper
4:視覺辨識單元 4: Visual recognition unit
A:晶片 A: Wafer
B:托盤 B: Tray
第一圖為本發明之實施例(一)之示意圖(一)。The first figure is a schematic diagram (1) of the embodiment (1) of the present invention.
第二圖為本發明之實施例(一)之動作示意圖(一)。 The second figure is a schematic diagram (1) of the operation of the embodiment (1) of the present invention.
第三圖為本發明之實施例(一)之動作示意圖(二)。 The third figure is a schematic diagram (2) of the operation of the embodiment (1) of the present invention.
第四圖為本發明之實施例(一)之側視部分剖面示意圖。 The fourth figure is a schematic partial cross-sectional view of the side view of the embodiment (1) of the present invention.
第五圖為本發明之實施例(二)之側視部分剖面示意圖。 FIG. 5 is a partial cross-sectional schematic diagram of the side view of the second embodiment of the present invention.
第六圖為本發明之實施例(三)之側視部分剖面示意圖。 Fig. 6 is a partial cross-sectional schematic diagram of the side view of the embodiment (3) of the present invention.
1 傳動單元
10 安裝平面
2 吸嘴單元
20 吸附端
21 安裝端
211 安裝凸緣
3 調整單元
31 調整端
311 夾爪
4 視覺辨識單元
A 晶片
1
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TWI776317B true TWI776317B (en) | 2022-09-01 |
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Citations (1)
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TWM521802U (en) * | 2015-10-07 | 2016-05-11 | Youngtek Electronics Corp | Packaged chip detection device and chip turning module thereof |
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TWM521802U (en) * | 2015-10-07 | 2016-05-11 | Youngtek Electronics Corp | Packaged chip detection device and chip turning module thereof |
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