TWI775543B - Powder atomic layer deposition equipment with quick release function - Google Patents

Powder atomic layer deposition equipment with quick release function Download PDF

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TWI775543B
TWI775543B TW110127436A TW110127436A TWI775543B TW I775543 B TWI775543 B TW I775543B TW 110127436 A TW110127436 A TW 110127436A TW 110127436 A TW110127436 A TW 110127436A TW I775543 B TWI775543 B TW I775543B
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vacuum chamber
sealing device
shaft sealing
reaction space
sealing ring
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TW110127436A
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TW202305981A (en
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林俊成
張容華
古家誠
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天虹科技股份有限公司
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Abstract

The invention provides a powder atomic layer deposition equipment with quick release function, which includes a vacuum chamber, a shaft sealing device and a driving unit, wherein the driving unit is connected to the shaft sealing device. The vacuum chamber is connected to the shaft sealing device, and a enclosed space is formed between the vacuum chamber and the shaft sealing device. At least one air extraction pipeline is located in the shaft sealing device and is fluidly connected to the enclosed space. The air extraction pipeline is used to extract gas from the enclosed space to fix the vacuum chamber on the shaft sealing device so that the drive unit drive the vacuum chamber rotating via the shaft sealing device to facilitate the formation of a thin film of uniform thickness on the surface of the powder. After the air extraction pipeline stops pumping, the vacuum chamber can be quickly unloaded from the shaft seal device to improve the process efficiency and convenience in use.

Description

具快拆功能的粉末原子層沉積設備 Powder atomic layer deposition equipment with quick release function

本發明有關於一種具快拆功能的粉末原子層沉積設備,可快速將真空腔體由軸封裝置上卸下,或者是將真空腔體固定在軸封裝置上。 The present invention relates to a powder atomic layer deposition equipment with quick-release function, which can quickly remove the vacuum chamber from the shaft sealing device, or fix the vacuum chamber on the shaft sealing device.

奈米顆粒(nanoparticle)一般被定義為在至少一個維度上小於100奈米的顆粒,奈米顆粒與宏觀物質在物理及化學上的特性截然不同。一般而言,宏觀物質的物理特性與本身的尺寸無關,但奈米顆粒則非如此,奈米顆粒在生物醫學、光學和電子等領域都具有潛在的應用。 Nanoparticles are generally defined as particles smaller than 100 nanometers in at least one dimension that are physically and chemically distinct from macroscopic substances. In general, the physical properties of macroscopic substances are independent of their size, but this is not the case for nanoparticles, which have potential applications in fields such as biomedicine, optics, and electronics.

量子點(Quantum Dot)是半導體材料的奈米顆粒,目前研究的半導體材料為II-VI材料,如ZnS、CdS、CdSe等,其中又以CdSe最受到矚目。量子點的尺寸通常在2至50奈米之間,量子點被紫外線照射後,量子點中的電子會吸收能量,並從價帶躍遷到傳導帶。被激發的電子從傳導帶回到價帶時,會通過發光釋放出能量。 Quantum Dot (Quantum Dot) is a nanoparticle of semiconductor material. The currently studied semiconductor materials are II-VI materials, such as ZnS, CdS, CdSe, etc. Among them, CdSe has attracted the most attention. The size of quantum dots is usually between 2 and 50 nanometers. When the quantum dots are irradiated with ultraviolet light, the electrons in the quantum dots absorb energy and transition from the valence band to the conduction band. Excited electrons release energy by emitting light as they travel from the conduction band back to the valence band.

量子點的能隙與尺寸大小相關,量子點的尺寸越大能隙越小,經照射後會發出波長較長的光,量子點的尺寸越小則能隙越大,經照射後會發出波長較短的光。例如5到6奈米的量子點會發出橘光或紅光,而2到3奈米的量子點則會發出藍光或綠光,當然光色還需取決於量子點的材料組成。 The energy gap of quantum dots is related to the size. The larger the size of the quantum dot, the smaller the energy gap, and it will emit light with a longer wavelength after irradiation. The smaller the size of the quantum dot, the larger the energy gap, and the wavelength will be emitted after irradiation. shorter light. For example, quantum dots of 5 to 6 nanometers will emit orange or red light, while quantum dots of 2 to 3 nanometers will emit blue or green light. Of course, the light color depends on the material composition of the quantum dots.

應用量子點的發光二極體(LED)產生的光接近連續光譜,同時具有高演色性,並有利於提高發光二極體的發光品質。此外亦可透過改變量子點的尺寸調整發射光的波長,使得量子點成為新一代發光裝置及顯示器的發展重點。 Light emitting diodes (LEDs) using quantum dots produce light close to a continuous spectrum, and at the same time have high color rendering properties, which are beneficial to improve the luminous quality of light emitting diodes. In addition, the wavelength of the emitted light can be adjusted by changing the size of the quantum dots, making the quantum dots become the focus of the development of the new generation of light-emitting devices and displays.

量子點雖然具有上述的優點及特性,但在應用或製造的過程中容易產生團聚現象。此外量子點具有較高的表面活性,並容易與空氣及水氣發生反應,進而縮短量子點的壽命。 Although quantum dots have the above-mentioned advantages and characteristics, they are prone to agglomeration in the process of application or manufacture. In addition, quantum dots have high surface activity and easily react with air and water vapor, thereby shortening the life of quantum dots.

具體來說,將量子點製作成為發光二極體的密封膠時,可能會產生團聚效應,而降低量子點的光學性能。此外,量子點在製作成發光二極體的密封膠後,外界的氧或水氣仍可能會穿過密封膠而接觸量子點的表面,導致量子點氧化,並影響量子點及發光二極體的效能或使用壽命。量子點表面的缺陷及懸空鍵(dangling bonds)亦可能造成非輻射復合(non-radiative recombination),同樣會影響量子點的發光效率。 Specifically, when quantum dots are used as sealants for light-emitting diodes, agglomeration effects may occur, reducing the optical properties of quantum dots. In addition, after the quantum dots are made into the sealant of the light-emitting diodes, the external oxygen or moisture may still pass through the sealant and contact the surface of the quantum dots, resulting in oxidation of the quantum dots and affecting the quantum dots and light-emitting diodes. performance or service life. Defects and dangling bonds on the surface of quantum dots may also cause non-radiative recombination, which also affects the luminous efficiency of quantum dots.

目前業界主要透過原子層沉積(atomic layer deposition,ALD)在量子點的表面形成一層奈米厚度的薄膜,或者是在量子點的表面形成多層薄膜,以形成量子井結構。 At present, the industry mainly uses atomic layer deposition (ALD) to form a nanometer-thick film on the surface of the quantum dot, or to form a multi-layer film on the surface of the quantum dot to form a quantum well structure.

原子層沉積可以在基板上形成厚度均勻的薄膜,並可有效控制薄膜的厚度,理論上亦適用於三維的量子點。量子點靜置在承載盤時,相鄰的量子點之間會存在接觸點,使得原子層沉積的前驅物氣體無法接觸這些接觸點,並導致無法在所有的奈米顆粒的表面皆形成厚度均勻的薄膜。 Atomic layer deposition can form a thin film with uniform thickness on the substrate, and can effectively control the thickness of the thin film. It is also suitable for three-dimensional quantum dots in theory. When the quantum dots are placed on the carrier plate, there will be contact points between adjacent quantum dots, so that the precursor gas of atomic layer deposition cannot contact these contact points, and it is impossible to form uniform thickness on the surface of all nanoparticles. film.

一般而言,原子層沉積通常需要在真空環境下進行,因此原子層沉積裝置的構造往往較為厚實,並具有一定的重量,不利於使用者搬運及操作。為此本發明提出一種具快拆功能的粉末原子層沉積設備,在完成粉末的原子層沉積製程後,可快速將真空腔體由軸封裝置及/或驅動單元上卸下,方便使用者取出真空腔體內的粉末,並清潔真空腔體。 Generally speaking, the atomic layer deposition usually needs to be performed in a vacuum environment, so the structure of the atomic layer deposition apparatus is usually relatively thick and has a certain weight, which is not convenient for users to carry and operate. To this end, the present invention provides a powder atomic layer deposition equipment with a quick-release function. After the powder atomic layer deposition process is completed, the vacuum chamber can be quickly removed from the shaft sealing device and/or the drive unit, which is convenient for users to take out. Powder inside the vacuum chamber and clean the vacuum chamber.

本發明的一目的,在於提供一種具快拆功能的粉末原子層沉積設備,主要包括一驅動單元、一軸封裝置及一真空腔體,其中驅動單元可連接軸封裝置,或者是由軸封裝置上卸下。在完成原子層沉積製程後,可將真空腔體由軸封裝置上卸下,方便使用者將真空腔體內的粉末取出,並清潔真空腔體,以提高使用時的便利性。 An object of the present invention is to provide a powder atomic layer deposition equipment with quick release function, which mainly includes a driving unit, a shaft sealing device and a vacuum chamber, wherein the driving unit can be connected to the shaft sealing device, or can be connected by the shaft sealing device Remove on top. After the atomic layer deposition process is completed, the vacuum chamber can be detached from the shaft sealing device, so that the user can take out the powder in the vacuum chamber and clean the vacuum chamber, so as to improve the convenience in use.

本發明的一目的,在於提供一種具快拆功能的粉末原子層沉積設備,主要透過一抽氣管線抽氣或洩氣控制軸封裝置與真空腔體之間的連接狀態,可省去透過螺絲鎖固真空腔體及軸封裝置的麻煩,並可大幅提高於軸封裝置上拆卸或裝設真空腔體的便利性。 An object of the present invention is to provide a powder atomic layer deposition equipment with quick release function, which mainly controls the connection state between the shaft seal device and the vacuum chamber by pumping or venting through a pumping line, eliminating the need for screw locks. The trouble of fixing the vacuum chamber and the shaft sealing device is eliminated, and the convenience of disassembling or installing the vacuum chamber on the shaft sealing device can be greatly improved.

本發明的一目的,在於提供一種具快拆功能的粉末原子層沉積設備,可將完成原子層沉積製程的真空腔體及粉末由軸封裝置上卸下,並將另一個裝載粉末的真空腔體鎖固在軸封裝置上,進行粉末的原子層沉積,有利於提高製程的效率。 An object of the present invention is to provide a powder atomic layer deposition equipment with a quick-release function, which can remove the vacuum chamber and powder after the atomic layer deposition process is completed from the shaft sealing device, and install another vacuum chamber loaded with powder from the shaft sealing device. The body is locked on the shaft sealing device, and the atomic layer deposition of powder is carried out, which is beneficial to improve the efficiency of the process.

為了達到上述的目的,本發明提出一種具快拆功能的粉末原子層沉積設備,包括:一驅動單元;一軸封裝置,連接驅動單元;一真空腔體,連接軸封裝置,並於軸封裝置及真空腔體之間形成一密閉空間,其中真空腔體包括一反應空間用以容置複數個粉末,而驅動單元透過軸封裝置帶動 真空腔體轉動;至少一第一密封環及至少一第二密封環,位於軸封裝置與真空腔體之間,密閉空間則位於第一密封環及第二密封環之間;至少一第一抽氣管線,位於軸封裝置內,並流體連接密閉空間,其中抽氣管線用以抽出密閉空間內的一氣體,並將真空腔體固定在軸封裝置上;及至少一進氣管線,位於軸封裝置內,流體連接真空腔體的反應空間,並用以將一前驅物氣體輸送至反應空間。 In order to achieve the above-mentioned purpose, the present invention provides a powder atomic layer deposition equipment with a quick-release function, comprising: a driving unit; a shaft sealing device connected to the driving unit; a vacuum chamber connected to the shaft sealing device and connected to the shaft sealing device A closed space is formed between the vacuum chamber and the vacuum chamber, wherein the vacuum chamber includes a reaction space for accommodating a plurality of powders, and the drive unit drives the shaft through the shaft sealing device The vacuum chamber rotates; at least one first sealing ring and at least one second sealing ring are located between the shaft sealing device and the vacuum chamber, and the closed space is located between the first sealing ring and the second sealing ring; at least one first sealing ring An air extraction line is located in the shaft sealing device and is fluidly connected to the closed space, wherein the air extraction line is used to extract a gas in the closed space and fix the vacuum cavity on the shaft sealing device; and at least one air intake line is located in the closed space. In the shaft sealing device, the reaction space of the vacuum chamber is fluidly connected and used for delivering a precursor gas to the reaction space.

所述的具快拆功能的粉末原子層沉積設備,包括一第二抽氣管線位於軸封裝置內,並流體連接真空腔體的反應空間。 The powder atomic layer deposition equipment with quick-release function includes a second exhaust line located in the shaft sealing device and fluidly connected to the reaction space of the vacuum chamber.

所述的具快拆功能的粉末原子層沉積設備,其中軸封裝置包括一外管體及一內管體,外管體包括一容置空間用以容置內管體,而內管體則包括至少一連接空間用以容置第一抽氣管線及進氣管線。 The powder atomic layer deposition equipment with quick-release function, wherein the shaft sealing device includes an outer tube body and an inner tube body, the outer tube body includes an accommodating space for accommodating the inner tube body, and the inner tube body is At least one connecting space is included for accommodating the first air suction line and the air intake line.

所述的具快拆功能的粉末原子層沉積設備,其中第一密封環位於內管體及真空腔體之間,第二密封環位於外管體及真空腔體之間,第一密封環為一動態密封環,而第二密封環為一靜態密封環。 The powder atomic layer deposition equipment with quick-release function, wherein the first sealing ring is located between the inner pipe body and the vacuum chamber, the second sealing ring is located between the outer pipe body and the vacuum chamber, and the first sealing ring is A dynamic seal ring, and the second seal ring is a static seal ring.

所述的具快拆功能的粉末原子層沉積設備,其中驅動單元透過外管體連接真空腔體,並帶動真空腔體轉動。 In the powder atomic layer deposition equipment with quick-release function, the driving unit is connected to the vacuum chamber through the outer tube body, and drives the vacuum chamber to rotate.

所述的具快拆功能的粉末原子層沉積設備,其中真空腔體的一底部包括一凹部,用以容置凸出軸封裝置的內管體,並在凸出軸封裝置的內管體與真空腔體的凹部之間形成密閉空間。 The powder atomic layer deposition equipment with quick-release function, wherein a bottom of the vacuum chamber includes a concave portion for accommodating the inner tube body of the protruding shaft seal device, and the inner tube body of the protruding shaft seal device is located at the bottom of the vacuum chamber body. A closed space is formed between it and the concave part of the vacuum chamber.

所述的具快拆功能的粉末原子層沉積設備,其中凹部由真空腔體的底部延伸至反應空間,並形成一凸出管部。 In the powder atomic layer deposition equipment with quick release function, the concave portion extends from the bottom of the vacuum chamber to the reaction space, and forms a protruding tube portion.

所述的具快拆功能的粉末原子層沉積設備,還包括一過濾單元位於真空腔體的凹部內,而進氣管線經由過濾單元流體連接真空腔體的反應空間。 The powder atomic layer deposition equipment with quick-release function further includes a filter unit located in the concave portion of the vacuum chamber, and the inlet line is fluidly connected to the reaction space of the vacuum chamber through the filter unit.

所述的具快拆功能的粉末原子層沉積設備,其中進氣管線用以將一非反應氣體輸送至反應空間,並透過非反應氣體吹動反應空間內的粉末。 In the powder atomic layer deposition equipment with quick-release function, the air inlet pipeline is used for conveying a non-reactive gas to the reaction space, and blowing the powder in the reaction space through the non-reactive gas.

所述的具快拆功能的粉末原子層沉積設備,其中進氣管線包括至少一非反應氣體輸送管線位於軸封裝置內,流體連接真空腔體的反應空間,並用以將非反應氣體輸送至真空腔體的反應空間,以吹動反應空間內的粉末。 The powder atomic layer deposition equipment with quick-release function, wherein the gas inlet pipeline includes at least one non-reactive gas delivery pipeline located in the shaft sealing device, fluidly connected to the reaction space of the vacuum chamber, and used to deliver the non-reactive gas to the vacuum The reaction space of the cavity to blow the powder in the reaction space.

10:具快拆功能的粉末原子層沉積設備 10: Powder atomic layer deposition equipment with quick release function

11:真空腔體 11: Vacuum chamber

111:蓋板 111: Cover

1111:內表面 1111: inner surface

112:底部 112: Bottom

113:腔體 113: Cavity

114:凹部 114: Recess

115:監控晶圓 115: Monitor Wafers

12:反應空間 12: Reaction Space

121:粉末 121: Powder

13:軸封裝置 13: Shaft seal device

130:凸出管部 130: protruding pipe

131:外管體 131: outer tube body

132:容置空間 132: accommodating space

133:內管體 133: inner tube body

134:連接空間 134: Connect Space

139:過濾單元 139: Filter unit

14:齒輪 14: Gear

15:驅動單元 15: Drive unit

16:密閉空間 16: Confined space

161:第一密封環 161: The first sealing ring

163:第二密封環 163: Second sealing ring

171:第一抽氣管線 171: First pumping line

172:延伸管體 172: Extension tube body

1721:出氣孔 1721: Air vent

173:進氣管線 173: Intake line

175:非反應氣體輸送管線 175: Non-reactive gas delivery line

177:加熱器 177: Heater

179:第二抽氣管線 179: Second pumping line

[圖1]為本發明具快拆功能的粉末原子層沉積設備一實施例的立體示意體。 FIG. 1 is a three-dimensional schematic diagram of an embodiment of the powder atomic layer deposition apparatus with quick release function of the present invention.

[圖2]為本發明具快拆功能的粉末原子層沉積設備一實施例的剖面示意圖。 2 is a schematic cross-sectional view of an embodiment of the powder atomic layer deposition apparatus with quick release function of the present invention.

[圖3]為本發明具快拆功能的粉末原子層沉積設備一實施例的剖面分解示意圖。 3 is an exploded cross-sectional schematic diagram of an embodiment of the powder atomic layer deposition apparatus with quick release function of the present invention.

[圖4]為本發明具快拆功能的粉末原子層沉積設備的軸封裝置一實施例的剖面示意圖。 4 is a schematic cross-sectional view of an embodiment of the shaft sealing device of the powder atomic layer deposition equipment with quick release function of the present invention.

[圖5]為本發明具快拆功能的粉末原子層沉積設備又一實施例的剖面示意圖。 5 is a schematic cross-sectional view of another embodiment of the powder atomic layer deposition apparatus with quick release function of the present invention.

[圖6]為本發明具快拆功能的粉末原子層沉積設備又一實施例的剖面示意圖。 6 is a schematic cross-sectional view of another embodiment of the powder atomic layer deposition apparatus with quick release function of the present invention.

[圖7]為本發明具快拆功能的粉末原子層沉積設備又一實施例的剖面分解示意圖。 FIG. 7 is a cross-sectional exploded schematic diagram of another embodiment of the powder atomic layer deposition apparatus with quick-release function of the present invention.

請參閱圖1、圖2、圖3及圖4,分別為本發明具快拆功能的粉末原子層沉積設備一實施例的立體示意圖、剖面示意圖、剖面分解示意圖及具快拆功能的粉末原子層沉積設備的軸封裝置的剖面示意圖。如圖所示,具快拆功能的粉末原子層沉積設備10主要包括一真空腔體11、一軸封裝置13及一驅動單元15,其中驅動單元15透過軸封裝置13連接並帶動真空腔體11轉動。 Please refer to FIG. 1 , FIG. 2 , FIG. 3 and FIG. 4 , which are a three-dimensional schematic diagram, a cross-sectional schematic diagram, a cross-sectional exploded schematic diagram, and a powder atomic layer deposition device with a quick-release function of an embodiment of the present invention, respectively. Schematic cross-section of the shaft sealing device of the deposition apparatus. As shown in the figure, the powder atomic layer deposition apparatus 10 with quick release function mainly includes a vacuum chamber 11 , a shaft sealing device 13 and a driving unit 15 , wherein the driving unit 15 is connected through the shaft sealing device 13 and drives the vacuum chamber 11 turn.

真空腔體11內具有一反應空間12,用以容置複數個粉末121,其中粉末121可以是量子點(Quantum Dot),例如ZnS、CdS、CdSe等II-VI半導體材料,而形成在量子點上的薄膜可以是三氧化二鋁(Al2O3)。真空腔體11可包括一蓋板111及一腔體113,其中蓋板111的一內表面1111用以覆蓋腔體113,並在兩者之間形成反應空間12。 The vacuum chamber 11 has a reaction space 12 for accommodating a plurality of powders 121, wherein the powders 121 can be quantum dots (Quantum Dot), such as ZnS, CdS, CdSe and other II-VI semiconductor materials, and formed in the quantum dots The film on the top can be aluminum oxide (Al2O3). The vacuum chamber 11 may include a cover plate 111 and a cavity 113 , wherein an inner surface 1111 of the cover plate 111 is used to cover the cavity 113 and form the reaction space 12 therebetween.

在本發明一實施例中,可於蓋板111的內表面1111設置一監控晶圓115,當蓋板111覆蓋腔體113時,監控晶圓115會位於反應空間12內。在反應空間12內進行原子層沉積時,監控晶圓115的表面會形成薄膜。在實際應用時可進一步量測監控晶圓115表面的薄膜厚度與粉末121表面的薄膜厚 度,並計算出兩者之間的關係。而後便可透過量測監控晶圓115表面的薄膜厚度,換算出粉末121表面的薄膜厚度。 In an embodiment of the present invention, a monitoring wafer 115 may be disposed on the inner surface 1111 of the cover plate 111 . When the cover plate 111 covers the cavity 113 , the monitoring wafer 115 will be located in the reaction space 12 . During the atomic layer deposition in the reaction space 12 , a thin film is formed on the surface of the monitoring wafer 115 . In practical applications, the film thickness on the surface of the monitoring wafer 115 and the film thickness on the surface of the powder 121 can be further measured and monitored degree, and calculate the relationship between the two. Then, the film thickness on the surface of the wafer 115 can be monitored and measured, and the film thickness on the surface of the powder 121 can be converted.

軸封裝置13包括一外管體131及一內管體133,其中外管體131具有一容置空間132,而內管體133則具有一連接空間134,例如外管體131及內管體133可為空心柱狀體。外管體131的容置空間132用以容置內管體133,其中外管體131及內管體133同軸設置。軸封裝置13可以是一般常見的軸封或磁流體軸封,主要用以隔離真空腔體11的反應空間12與外部的空間,以維持反應空間12的真空。 The shaft sealing device 13 includes an outer tube body 131 and an inner tube body 133, wherein the outer tube body 131 has an accommodating space 132, and the inner tube body 133 has a connecting space 134, such as the outer tube body 131 and the inner tube body 133 can be a hollow cylinder. The accommodating space 132 of the outer tube body 131 is used for accommodating the inner tube body 133 , wherein the outer tube body 131 and the inner tube body 133 are coaxially arranged. The shaft seal device 13 may be a common shaft seal or a magnetic fluid shaft seal, and is mainly used to isolate the reaction space 12 of the vacuum chamber 11 from the external space, so as to maintain the vacuum of the reaction space 12 .

驅動單元15連接軸封裝置13的一端,並透過軸封裝置13帶動真空腔體11轉動,例如透過外管體131連接真空腔體11,並透過外管體131帶動真空腔體11轉動。 The driving unit 15 is connected to one end of the shaft sealing device 13 , and drives the vacuum chamber 11 to rotate through the shaft sealing device 13 .

驅動單元15可連接並帶動外管體131及真空腔體11以同一方向持續轉動,例如順時針或逆時針方向持續轉動。在不同實施例中,驅動單元15可帶動外管體131及真空腔體11以順時針的方向旋轉一特定角度後,再以逆時針的方向旋轉特定角度,例如特定角度可為360度。真空腔體11轉動時,會攪拌反應空間12內的粉末121,以利於粉末121均勻受熱並與前驅物氣體或非反應氣體接觸。 The driving unit 15 can be connected to and drive the outer tube body 131 and the vacuum chamber 11 to continuously rotate in the same direction, for example, clockwise or counterclockwise. In different embodiments, the driving unit 15 can drive the outer tube 131 and the vacuum chamber 11 to rotate clockwise by a specific angle, and then rotate counterclockwise by a specific angle, for example, the specific angle can be 360 degrees. When the vacuum chamber 11 rotates, the powder 121 in the reaction space 12 is stirred, so that the powder 121 is heated uniformly and contacts with the precursor gas or the non-reactive gas.

在本發明一實施例中,驅動單元15可為馬達,透過至少一齒輪14連接外管體131,並經由齒輪14帶動外管體131及真空腔體11相對於內管體133轉動。 In an embodiment of the present invention, the driving unit 15 can be a motor, connected to the outer tube body 131 through at least one gear 14 , and drives the outer tube body 131 and the vacuum chamber 11 to rotate relative to the inner tube body 133 through the gear 14 .

內管體133的連接空間134內可設置至少一第一抽氣管線171、至少一進氣管線173、至少一非反應氣體輸送管線175、一加熱器177及/或一第二抽氣管線179,如圖2及圖4所示。 The connecting space 134 of the inner pipe body 133 may be provided with at least one first gas extraction line 171 , at least one inlet gas pipeline 173 , at least one non-reactive gas delivery line 175 , a heater 177 and/or a second gas extraction line 179 , as shown in Figure 2 and Figure 4.

本發明的真空腔體11及軸封裝置13為兩個獨立的構件,其中真空腔體11可由軸封裝置13上卸下,或者是將真空腔體11固定在軸封裝置13上。當真空腔體11連接軸封裝置13時,會在兩者之間形成一密閉空間16,例如密閉空間16可為環狀體,並環繞在軸封裝置13的周圍。第一抽氣管線171流體連接密閉空間16,並用以抽出密閉空間16內的氣體,或者是將氣體輸送至密閉空間16。 The vacuum chamber 11 and the shaft sealing device 13 of the present invention are two independent components, wherein the vacuum chamber 11 can be removed from the shaft sealing device 13 , or the vacuum chamber 11 can be fixed on the shaft sealing device 13 . When the vacuum chamber 11 is connected to the shaft sealing device 13 , a sealed space 16 is formed between the two. For example, the sealed space 16 can be an annular body and surround the shaft sealing device 13 . The first exhaust line 171 is fluidly connected to the closed space 16 and is used to extract the gas in the closed space 16 , or to transport the gas to the closed space 16 .

第二抽氣管線179流體連接真空腔體11的反應空間12,並用以抽出反應空間12內的氣體,使得反應空間12為真空狀態,以進行原子層沉積製程。具體而言第二抽氣管線179可連接一幫浦,並透過幫浦抽出反應空間12內的氣體。 The second pumping line 179 is fluidly connected to the reaction space 12 of the vacuum chamber 11, and is used for pumping out the gas in the reaction space 12, so that the reaction space 12 is in a vacuum state, so that the atomic layer deposition process can be performed. Specifically, the second pumping line 179 can be connected to a pump, and the gas in the reaction space 12 can be pumped out through the pump.

進氣管線173流體連接真空腔體11的反應空間12,並用以將一前驅物氣體或一非反應氣體輸送至反應空間12,其中非反應氣體可以是氮氣或氬氣等惰性氣體。例如進氣管線173可透過閥件組連接一前驅物氣體儲存槽及一非反應氣體儲存槽,並透過閥件組將前驅物氣體輸送至反應空間12內,使得前驅物氣體沉積粉末121表面。在實際應用時,進氣管線173可能會將一載送氣體(carrier gas)及前驅物氣體一起輸送到反應空間12內。而後透過閥件組將非反應氣體輸送至反應空間12內,並透過第二抽氣管線179抽氣,以去除反應空間12內的前驅物氣體。在本發明一實施例中,進氣管線 173可連接複數個分枝管線,並分別透過各個分枝管線將不同的前驅物氣體依序輸送至反應空間12內。 The gas inlet line 173 is fluidly connected to the reaction space 12 of the vacuum chamber 11, and is used for delivering a precursor gas or a non-reactive gas to the reaction space 12, wherein the non-reactive gas can be an inert gas such as nitrogen or argon. For example, the inlet line 173 can be connected to a precursor gas storage tank and a non-reactive gas storage tank through the valve assembly, and the precursor gas can be transported into the reaction space 12 through the valve assembly, so that the precursor gas is deposited on the surface of the powder 121 . In practical applications, the gas inlet line 173 may transport a carrier gas and the precursor gas into the reaction space 12 together. Then, the non-reactive gas is transported into the reaction space 12 through the valve assembly, and is evacuated through the second exhaust line 179 to remove the precursor gas in the reaction space 12 . In an embodiment of the present invention, the intake line 173 can be connected to a plurality of branch pipelines, and different precursor gases can be sequentially transported into the reaction space 12 through each branch pipeline.

此外進氣管線173可增大輸送至反應空間12的非反應氣體的流量,並透過非反應氣體吹動反應空間12內的粉末121,使得粉末121受到非反應氣體的帶動,而擴散到反應空間12的各個區域。 In addition, the inlet line 173 can increase the flow rate of the non-reactive gas delivered to the reaction space 12, and blow the powder 121 in the reaction space 12 through the non-reactive gas, so that the powder 121 is driven by the non-reactive gas and diffuses into the reaction space 12 of the various areas.

在本發明一實施例中,進氣管線173可包括至少一非反應氣體輸送管線175流體連接真空腔體11的反應空間12,並用以將一非反應氣體輸送至反應空間12,例如非反應氣體輸送管線175可透過閥件組連接一氮氣儲存槽,並透過閥件組將氮氣輸送至反應空間12。非反應氣體用以吹動反應空間12內的粉末121,配合驅動單元15驅動真空腔體11轉動,可有效且均勻的翻攪反應空間12內的粉末121,並在各個粉末121的表面沉積厚度均勻的薄膜。 In an embodiment of the present invention, the gas inlet line 173 may include at least one non-reactive gas delivery line 175 that is fluidly connected to the reaction space 12 of the vacuum chamber 11 and used to deliver a non-reactive gas to the reaction space 12 , such as a non-reactive gas The delivery line 175 can be connected to a nitrogen storage tank through the valve assembly, and the nitrogen is conveyed to the reaction space 12 through the valve assembly. The non-reactive gas is used to blow the powder 121 in the reaction space 12 , and cooperates with the driving unit 15 to drive the vacuum chamber 11 to rotate, which can effectively and uniformly stir the powder 121 in the reaction space 12 and deposit thickness on the surface of each powder 121 uniform film.

具快拆功能的粉末原子層沉積設備10的進氣管線173及非反應氣體輸送管線175都用以將非反應氣體輸送至反應空間12,其中進氣管線173輸送的非反應氣體的流量較小,主要用以去除反應空間12內的前驅物氣體,而非反應氣體輸送管線175輸送的非反應氣體的流量較大,主要用以吹動反應空間12內的粉末121。 Both the air inlet line 173 and the non-reactive gas delivery line 175 of the powder atomic layer deposition apparatus 10 with the quick-release function are used to deliver the non-reactive gas to the reaction space 12 , wherein the flow rate of the non-reactive gas delivered by the inlet line 173 is relatively small. , which is mainly used to remove the precursor gas in the reaction space 12 , and the flow rate of the non-reactive gas conveyed by the non-reactive gas transmission line 175 is relatively large, which is mainly used to blow the powder 121 in the reaction space 12 .

具體而言,進氣管線173及非反應氣體輸送管線175將非反應氣體輸送至反應空間12的時間點不同,因此在實際應用時可不設置非反應氣體輸送管線175,並調整進氣管線173在不同時間點輸送的非反應氣體的流量。當要去除反應空間12內的前驅物氣體時,可降低進氣管線173輸送至反 應空間12的非反應氣體的流量,而要吹動反應空間12內的粉末121時,則增加進氣管線173輸送至反應空間12的非反應氣體的流量。 Specifically, the time points at which the gas inlet line 173 and the non-reactive gas delivery line 175 deliver the non-reactive gas to the reaction space 12 are different. Therefore, in practical applications, the non-reactive gas delivery line 175 may not be provided, and the gas inlet line 173 may be adjusted at The flow of non-reactive gas delivered at different time points. When the precursor gas in the reaction space 12 is to be removed, the gas inlet line 173 can be lowered to be transported to the reaction chamber When the powder 121 in the reaction space 12 is to be blown in response to the flow rate of the non-reactive gas in the space 12 , the flow rate of the non-reactive gas delivered to the reaction space 12 by the inlet line 173 is increased.

本發明的驅動單元15帶動外管體131及真空腔體11轉動時,內管體133及其內部的第一抽氣管線171、第二抽氣管線179、進氣管線173及/或非反應氣體輸送管線175不會隨著轉動,有利於提高進氣管線173及/或非反應氣體輸送管線175輸送至反應空間12的非反應氣體及/或前驅物氣體的穩定度。 When the driving unit 15 of the present invention drives the outer tube body 131 and the vacuum chamber 11 to rotate, the inner tube body 133 and the first air extraction line 171 , the second air extraction line 179 , the air intake line 173 and/or the non-reaction The gas delivery line 175 does not rotate along with it, which is beneficial to improve the stability of the unreacted gas and/or the precursor gas delivered by the gas inlet line 173 and/or the non-reactive gas delivery line 175 to the reaction space 12 .

加熱器177用以加熱連接空間134及內管體133,並透過加熱器177加熱內管體133內的第二抽氣管線179、進氣管線173及/或非反應氣體輸送管線175,以提高第二抽氣管線179、進氣管線173及/或非反應氣體輸送管線175內的氣體的溫度。使得非反應氣體及/或前驅物氣體進入反應空間12時,不會造成反應空間12的溫度大幅下降或改變。此外亦可於連接空間134內設置一溫度感測單元用以量測加熱器177或連接空間134的溫度,以得知加熱器177的工作狀態。當然在真空腔體11的內部、外部或周圍通常會設置另一個加熱裝置,其中加熱裝置鄰近或接觸真空腔體11,並用以加熱真空腔體11及反應空間12。 The heater 177 is used for heating the connecting space 134 and the inner pipe body 133, and through the heater 177 to heat the second exhaust line 179, the gas inlet line 173 and/or the non-reactive gas transmission line 175 in the inner pipe body 133, so as to improve the The temperature of the gas in the second evacuation line 179 , the inlet line 173 and/or the non-reactive gas delivery line 175 . When the non-reactive gas and/or the precursor gas is allowed to enter the reaction space 12 , the temperature of the reaction space 12 will not be greatly decreased or changed. In addition, a temperature sensing unit can also be arranged in the connection space 134 to measure the temperature of the heater 177 or the connection space 134 so as to know the working state of the heater 177 . Of course, another heating device is usually disposed inside, outside or around the vacuum chamber 11 , wherein the heating device is adjacent to or in contact with the vacuum chamber 11 and used to heat the vacuum chamber 11 and the reaction space 12 .

在進行原子層沉積製程時,真空腔體11的反應空間12需要維持真空狀態,因此真空腔體11的結構通常較為厚實,重量亦較為沉重。軸封裝置13用以承載及驅動真空腔體11,同樣較為厚實及沉重。在操作時使用者需要將真空腔體11及軸封裝置13一起由驅動單元15上卸下,才能將真空腔體11內的粉末121取出,並清潔真空腔體11。如此一來不僅會造成使用者的 負擔,亦可能在操作及清潔過程中發生碰撞,而造成使用者受傷或裝置損壞。 During the atomic layer deposition process, the reaction space 12 of the vacuum chamber 11 needs to maintain a vacuum state, so the structure of the vacuum chamber 11 is generally thicker and heavier. The shaft sealing device 13 is used to carry and drive the vacuum chamber 11 , and is also relatively thick and heavy. During operation, the user needs to remove the vacuum chamber 11 and the shaft sealing device 13 from the driving unit 15 together, so as to take out the powder 121 in the vacuum chamber 11 and clean the vacuum chamber 11 . As a result, not only will the user's It may also cause collisions during operation and cleaning, resulting in injury to the user or damage to the device.

為了改善上述的問題,本發明將真空腔體11及軸封裝置13設計為兩個獨立的構件。在進行原子層沉積時,可將真空腔體11連接軸封裝置13,如圖2所示,並於真空腔體11與軸封裝置13之間形成密閉空間16。而後透過第一抽氣管線171抽出密閉空間16內的氣體,使得密閉空間16為真空,以將真空腔體11固定在軸封裝置13上,而驅動單元15可透過軸封裝置13帶動真空腔體11轉動。當真空腔體11連接軸封裝置13時,軸封裝置13內的第二抽氣管線179、進氣管線173及/或非反應氣體輸送管線175會流體連接真空腔體11的反應空間12。 In order to improve the above problems, the present invention designs the vacuum chamber 11 and the shaft sealing device 13 as two independent components. During atomic layer deposition, the vacuum chamber 11 can be connected to the shaft sealing device 13 , as shown in FIG. 2 , and a closed space 16 is formed between the vacuum chamber 11 and the shaft sealing device 13 . Then, the gas in the closed space 16 is extracted through the first exhaust line 171 , so that the closed space 16 is evacuated, so as to fix the vacuum chamber 11 on the shaft sealing device 13 , and the driving unit 15 can drive the vacuum chamber through the shaft sealing device 13 The body 11 rotates. When the vacuum chamber 11 is connected to the shaft sealing device 13 , the second evacuation line 179 , the gas inlet line 173 and/or the non-reactive gas delivery line 175 in the shaft sealing device 13 are fluidly connected to the reaction space 12 of the vacuum chamber 11 .

在完成原子層沉積後,可透過第一抽氣管線171卸除密閉空間16的真空,例如經由第一抽氣管線171將氣體輸送至密閉空間16,而後可將真空腔體11由軸封裝置13上卸下。 After the atomic layer deposition is completed, the vacuum of the sealed space 16 can be removed through the first evacuation line 171, for example, the gas is transported to the sealed space 16 through the first evacuation line 171, and then the vacuum chamber 11 can be removed from the shaft sealing device 13 to remove.

透過本發明所述的具快拆功能的粉末原子層沉積設備10,可快速將真空腔體11由軸封裝置13卸下,並將另一個真空腔體11裝設在軸封裝置13上。在拆卸及裝設真空腔體11的過程中僅須要透過幫浦經由第一抽氣管線171抽出密閉空間16內的氣體,或是經由第一抽氣管線171將氣體輸送至密閉空間16,而不需要透過螺絲鎖固真空腔體11及軸封裝置13,可大幅提高更換真空腔體11的速度及便利性。 Through the powder atomic layer deposition apparatus 10 with quick release function of the present invention, the vacuum chamber 11 can be quickly removed from the shaft sealing device 13 , and another vacuum chamber 11 can be installed on the shaft sealing device 13 . In the process of disassembling and installing the vacuum chamber 11 , it is only necessary to extract the gas in the closed space 16 through the first pumping line 171 through the pump, or transport the gas to the closed space 16 through the first pumping line 171 , and The vacuum chamber 11 and the shaft sealing device 13 do not need to be locked by screws, which can greatly improve the speed and convenience of replacing the vacuum chamber 11 .

在本發明一實施例中,軸封裝置13及/或真空腔體11之間可設置複數個密封環,其中密閉空間16位於兩個密封環之間,並透過密封環隔離密閉空間16及外界環境。具體而言,密封環包括一第一密封環161及一第二 密封環163,當真空腔體11連接軸封裝置13時,真空腔體11及軸封裝置13會壓迫兩者之間的第一密封環161及第二密封環163,並在第一密封環161及第二密封環163之間形成密閉空間16。如圖3所示,第一密封環161設置在真空腔體11上,而第二密封環163則設置在軸封裝置13上。 In an embodiment of the present invention, a plurality of sealing rings may be arranged between the shaft sealing device 13 and/or the vacuum chamber 11, wherein the sealed space 16 is located between the two sealing rings, and the sealed space 16 and the outside are isolated through the sealing ring surroundings. Specifically, the sealing ring includes a first sealing ring 161 and a second sealing ring 161 The sealing ring 163, when the vacuum chamber 11 is connected to the shaft sealing device 13, the vacuum chamber 11 and the shaft sealing device 13 will press the first sealing ring 161 and the second sealing ring 163 between them, and the first sealing ring A closed space 16 is formed between 161 and the second sealing ring 163 . As shown in FIG. 3 , the first sealing ring 161 is arranged on the vacuum chamber 11 , and the second sealing ring 163 is arranged on the shaft sealing device 13 .

在實際應用時,第一密封環161位於內管體133及真空腔體11之間,而第二密封環163位於外管體131及真空腔體11之間,其中第一密封環161為一動態密封環,而第二密封環163為一靜態密封環。例如第一密封環161可套設在內管體133上,並為鐵氟龍O型環(Teflonoring),而第二密封環163則為橡膠製的O型環。 In practical application, the first sealing ring 161 is located between the inner pipe body 133 and the vacuum chamber 11 , and the second sealing ring 163 is located between the outer pipe body 131 and the vacuum chamber 11 , wherein the first sealing ring 161 is a dynamic sealing ring, and the second sealing ring 163 is a static sealing ring. For example, the first sealing ring 161 can be sleeved on the inner tube body 133, and is a Teflon O-ring (Teflonoring), and the second sealing ring 163 is a rubber O-ring.

在本發明一實施例中,如圖3所示,真空腔體11的底部112可設置一凹部114,並於凹部114內設置第一密封環161。軸封裝置13的內管體133部分凸出外管體131,並於軸封裝置13連接真空腔體11的底部112的一側設置第二密封環163,或者是在凸出的內管體133上套設第二密封環163。 In an embodiment of the present invention, as shown in FIG. 3 , a concave portion 114 may be disposed on the bottom 112 of the vacuum chamber 11 , and a first sealing ring 161 is disposed in the concave portion 114 . The inner tube body 133 of the shaft sealing device 13 partially protrudes from the outer tube body 131 , and a second sealing ring 163 is provided on the side of the shaft sealing device 13 connected to the bottom 112 of the vacuum chamber 11 , or a protruding inner tube body 133 is provided. A second sealing ring 163 is sleeved thereon.

凸出軸封裝置13的內管體133在徑向上的橫切面面積略小於真空腔體11的凹部114,當凸出的內管體133插入真空腔體11的凹部114時,凸出的內管體133會壓迫凹部114內的第一密封環161,而真空腔體11的底部112或凹部114則會壓迫設置在軸封裝置13上的第二密封環163,以在凸出的內管體133、凹部114、第一密封環161及/或第二密封環163之間形成密閉空間16。上述第一密封環161、第二密封環163及/或凹部114的數量及設置位置僅為本發明一具體實施例,並非本發明權利範圍的限制。 The cross-sectional area of the inner tube body 133 of the protruding shaft seal device 13 in the radial direction is slightly smaller than that of the concave portion 114 of the vacuum chamber 11 . The tube body 133 presses the first sealing ring 161 in the concave portion 114 , and the bottom 112 or the concave portion 114 of the vacuum chamber 11 presses the second sealing ring 163 provided on the shaft sealing device 13 to seal the protruding inner tube A closed space 16 is formed between the body 133 , the recess 114 , the first sealing ring 161 and/or the second sealing ring 163 . The above-mentioned number and arrangement position of the first sealing ring 161 , the second sealing ring 163 and/or the concave portion 114 are only a specific embodiment of the present invention, and are not intended to limit the scope of the present invention.

本發明的第一抽氣管線171大致上沿著軸封裝置13的軸向設置,並具有沿著軸封裝置13的徑向的分枝或彎折,以在凸出軸封裝置13的內管 體133的側壁上形成一開口,使得第一抽氣管線171經由內管體133的側壁上的開口流體連接密閉空間16。 The first air extraction line 171 of the present invention is generally arranged along the axial direction of the shaft sealing device 13 and has branches or bends along the radial direction of the shaft sealing device 13 to protrude inside the shaft sealing device 13 . Tube An opening is formed on the side wall of the body 133 , so that the first exhaust line 171 is fluidly connected to the closed space 16 through the opening on the side wall of the inner pipe body 133 .

本發明所述的具快拆功能的粉末原子層沉積設備10亦有利於提高原子層沉積的製程效率。具體而言,可準備多個真空腔體11,並分別在各個真空腔體11內放置粉末121。將其中一個真空腔體11固定在軸封裝置13上,並對真空腔體11內的粉末121進行原子層沉積。在完成粉末121的原子層沉積後,將真空腔體11及粉末121由軸封裝置13卸下,並將另一個真空腔體11固定在軸封裝置13上,對該真空腔體11內的粉末121進行原子層沉積製程。被卸下的真空腔體11可放置在冷卻區,待真空腔體11及粉末121的溫度下降後,再將粉末121由真空腔體11內取出。 The powder atomic layer deposition apparatus 10 with quick release function of the present invention is also beneficial to improve the process efficiency of atomic layer deposition. Specifically, a plurality of vacuum chambers 11 may be prepared, and powders 121 may be placed in each of the vacuum chambers 11 . One of the vacuum chambers 11 is fixed on the shaft sealing device 13 , and atomic layer deposition is performed on the powder 121 in the vacuum chamber 11 . After the atomic layer deposition of the powder 121 is completed, the vacuum chamber 11 and the powder 121 are removed from the shaft sealing device 13 , and another vacuum chamber 11 is fixed on the shaft sealing device 13 . The powder 121 is subjected to an atomic layer deposition process. The removed vacuum chamber 11 can be placed in a cooling area, and after the temperature of the vacuum chamber 11 and the powder 121 drops, the powder 121 is taken out from the vacuum chamber 11 .

在本發明一實施例中,真空腔體11的底部112可設置一過濾單元139,例如過濾單元139可設置在真空腔體11的凹部114內。當真空腔體11連接軸封裝置13時,真空腔體11上的過濾單元139會覆蓋軸封裝置13的內管體133,使得內管體133內的第二抽氣管線179、進氣管線173及/或非反應氣體輸送管線175經由過濾單元139流體連接真空腔體11的反應空間12。 In an embodiment of the present invention, a filter unit 139 may be disposed at the bottom 112 of the vacuum chamber 11 , for example, the filter unit 139 may be disposed in the concave portion 114 of the vacuum chamber 11 . When the vacuum chamber 11 is connected to the shaft sealing device 13 , the filter unit 139 on the vacuum chamber 11 will cover the inner pipe body 133 of the shaft sealing device 13 , so that the second exhaust line 179 and the air intake line in the inner pipe body 133 173 and/or the non-reactive gas delivery line 175 is fluidly connected to the reaction space 12 of the vacuum chamber 11 via the filter unit 139 .

透過過濾單元139的設置,可避免第二抽氣管線179抽出反應空間12內的氣體時,將反應空間12內的粉末121一併抽出,造成粉末121的損耗。另外將過濾單元139設置在真空腔體11上,而非設置在軸封裝置13上,則可避免真空腔體11由軸封裝置13上卸下時,粉末121由真空腔體11的反應空間12散落到外部。 The arrangement of the filter unit 139 can prevent the powder 121 in the reaction space 12 from being sucked out together when the gas in the reaction space 12 is extracted by the second gas extraction line 179 , resulting in the loss of the powder 121 . In addition, arranging the filter unit 139 on the vacuum chamber 11 instead of on the shaft sealing device 13 can prevent the powder 121 from passing through the reaction space of the vacuum chamber 11 when the vacuum chamber 11 is removed from the shaft sealing device 13 . 12 scattered to the outside.

在本發明一實施例中,如圖5所示,進氣管線173及/或非反應氣體輸送管線175可由內管體133的連接空間134延伸至真空腔體11的反應空 間12,並在真空腔體11的反應空間12內形成一延伸管體172。延伸管體172的端部及/或管壁上可設置至少一出氣孔1721,延伸管體172可經由出氣孔1721將非反應氣體輸送至反應空間12,並吹動反應空間12內的粉末121。 In an embodiment of the present invention, as shown in FIG. 5 , the gas inlet line 173 and/or the non-reactive gas delivery line 175 can extend from the connection space 134 of the inner pipe body 133 to the reaction space of the vacuum chamber 11 . The space 12 is formed, and an extension pipe 172 is formed in the reaction space 12 of the vacuum chamber 11 . At least one air outlet 1721 may be disposed on the end and/or the tube wall of the extension tube body 172 , and the extension tube body 172 may deliver the non-reactive gas to the reaction space 12 through the air outlet hole 1721 and blow the powder 121 in the reaction space 12 .

在本發明一實施例中,凹部114可由真空腔體11的底部112延伸至反應空間12內,而軸封裝置13的內管體133則由外管體131的容置空間132延伸至外部,並凸出軸封裝置13及外管體131,如圖7所示。連接真空腔體11及軸封裝置13時,凸出軸封裝置13的內管體133可用以插入凹部114,並在內管體133及真空腔體11的凹部114之間形成密閉空間16,如圖6所示。此外,軸封裝置13的內管體133會由外管體131的容置空間132延伸至真空腔體11的凹部114及/或反應空間12,使得內管體133及凹部114在反應空間12內形成一凸出管部130。 In an embodiment of the present invention, the concave portion 114 can extend from the bottom 112 of the vacuum chamber 11 into the reaction space 12 , and the inner tube 133 of the shaft sealing device 13 extends from the accommodating space 132 of the outer tube 131 to the outside. And the shaft sealing device 13 and the outer tube body 131 are protruded, as shown in FIG. 7 . When connecting the vacuum chamber 11 and the shaft sealing device 13, the inner tube body 133 protruding from the shaft sealing device 13 can be inserted into the recess 114, and a sealed space 16 is formed between the inner tube body 133 and the recess 114 of the vacuum chamber 11, As shown in Figure 6. In addition, the inner tube body 133 of the shaft sealing device 13 will extend from the accommodating space 132 of the outer tube body 131 to the concave portion 114 and/or the reaction space 12 of the vacuum chamber 11 , so that the inner tube body 133 and the concave portion 114 are in the reaction space 12 . A protruding pipe portion 130 is formed therein.

透過凸出管部130的設置可縮短或調整進氣管線173及/或非反應氣體輸送管線175與蓋板111之間的距離,進氣管線173及/或非反應氣體輸送管線175輸送至反應空間12的非反應氣體可傳遞至蓋板111的內表面1111,並經由蓋板111的內表面1111擴散到反應空間12的各個區域,以利於吹動反應空間12內的粉末121。 The distance between the inlet line 173 and/or the non-reactive gas delivery line 175 and the cover plate 111 can be shortened or adjusted through the arrangement of the protruding pipe portion 130, and the inlet line 173 and/or the non-reaction gas delivery line 175 are delivered to the reaction The non-reactive gas in the space 12 can be transmitted to the inner surface 1111 of the cover plate 111 and diffused to various regions of the reaction space 12 through the inner surface 1111 of the cover plate 111 to facilitate blowing the powder 121 in the reaction space 12 .

以上所述者,僅為本發明之一較佳實施例而已,並非用來限定本發明實施之範圍,即凡依本發明申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾,均應包括於本發明之申請專利範圍內。 The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Modifications should be included within the scope of the patent application of the present invention.

10:具快拆功能的粉末原子層沉積設備 10: Powder atomic layer deposition equipment with quick release function

11:真空腔體 11: Vacuum chamber

111:蓋板 111: Cover

1111:內表面 1111: inner surface

113:腔體 113: Cavity

115:監控晶圓 115: Monitor Wafers

12:反應空間 12: Reaction Space

121:粉末 121: Powder

13:軸封裝置 13: Shaft seal device

131:外管體 131: outer tube body

132:容置空間 132: accommodating space

133:內管體 133: inner tube body

134:連接空間 134: Connect Space

14:齒輪 14: Gear

15:驅動單元 15: Drive unit

16:密閉空間 16: Confined space

161:第一密封環 161: The first sealing ring

163:第二密封環 163: Second sealing ring

171:第一抽氣管線 171: First pumping line

177:加熱器 177: Heater

Claims (8)

一種具快拆功能的粉末原子層沉積設備,包括:一驅動單元;一軸封裝置,連接該驅動單元;一真空腔體,連接該軸封裝置,並於該軸封裝置及該真空腔體之間形成一密閉空間,其中該真空腔體包括一反應空間用以容置複數顆粉末,而該驅動單元透過該軸封裝置帶動該真空腔體轉動;至少一第一密封環及至少一第二密封環,位於該軸封裝置與該真空腔體之間,其中該密閉空間位於該第一密封環及該第二密封環之間;至少一第一抽氣管線,位於該軸封裝置內,並流體連接該密閉空間,其中該第一抽氣管線用以抽出該密閉空間內的一氣體,以將該真空腔體固定在該軸封裝置上;一第二抽氣管線,位於該軸封裝置內,並流體連接該真空腔體的該反應空間;及至少一進氣管線,位於該軸封裝置內,流體連接該真空腔體的該反應空間,並用以將一前驅物氣體輸送至該反應空間。 A powder atomic layer deposition equipment with quick-release function, comprising: a driving unit; a shaft sealing device connected with the driving unit; a vacuum chamber body connected with the shaft sealing device and between the shaft sealing device and the vacuum chamber body A closed space is formed between, wherein the vacuum chamber includes a reaction space for accommodating a plurality of powders, and the driving unit drives the vacuum chamber to rotate through the shaft sealing device; at least one first sealing ring and at least one second A sealing ring is located between the shaft sealing device and the vacuum cavity, wherein the closed space is located between the first sealing ring and the second sealing ring; at least one first air suction line is located in the shaft sealing device, and fluidly connected to the closed space, wherein the first suction line is used to extract a gas in the closed space to fix the vacuum cavity on the shaft seal device; a second suction line is located in the shaft seal in the device, and fluidly connected to the reaction space of the vacuum chamber; and at least one inlet line, located in the shaft seal device, fluidly connected to the reaction space of the vacuum chamber, and used to deliver a precursor gas to the reaction space. 如請求項1所述的具快拆功能的粉末原子層沉積設備,其中該進氣管線用以將一非反應氣體輸送至該反應空間,並透過該非反應氣體吹動該反應空間內的該粉末。 The powder atomic layer deposition apparatus with quick-release function as claimed in claim 1, wherein the gas inlet line is used for delivering a non-reactive gas to the reaction space, and blowing the powder in the reaction space through the non-reactive gas . 如請求項2所述的具快拆功能的粉末原子層沉積設備,其中該進氣管線包括至少一非反應氣體輸送管線位於該軸封裝置內,流體連接該真空腔體的該反應空間,並用以將該非反應氣體輸送至該真空腔體的該反應空間,以吹動該反應空間內的該粉末。 The powder atomic layer deposition equipment with quick release function as claimed in claim 2, wherein the gas inlet line comprises at least one non-reactive gas delivery line located in the shaft sealing device, fluidly connected to the reaction space of the vacuum chamber, and used for so as to deliver the non-reactive gas to the reaction space of the vacuum chamber to blow the powder in the reaction space. 一種具快拆功能的粉末原子層沉積設備,包括:一驅動單元;一軸封裝置,連接該驅動單元;一真空腔體,連接該軸封裝置,並於該軸封裝置及該真空腔體之間形成一密閉空間,其中該真空腔體包括一反應空間用以容置複數顆粉末,而該驅動單元透過該軸封裝置帶動該真空腔體轉動;至少一第一密封環及至少一第二密封環,位於該軸封裝置與該真空腔體之間,其中該密閉空間位於該第一密封環及該第二密封環之間,其中該第一密封環位於該內管體及該真空腔體之間,該第二密封環位於該外管體及該真空腔體之間,該第一密封環為一動態密封環,而該第二密封環為一靜態密封環;至少一第一抽氣管線,位於該軸封裝置內,並流體連接該密閉空間,其中該第一抽氣管線用以抽出該密閉空間內的一氣體,以將該真空腔體固定在該軸封裝置上;及至少一進氣管線,位於該軸封裝置內,流體連接該真空腔體的該反應空間,並用以將一前驅物氣體輸送至該反應空間,其中該軸封裝置包括一外管體及一內管體,該外管體包括一容置空間用以容置該內管體,而該內管體則包括至少一連接空間用以容置該第一抽氣管線及該進氣管線。 A powder atomic layer deposition equipment with quick-release function, comprising: a driving unit; a shaft sealing device connected with the driving unit; a vacuum chamber body connected with the shaft sealing device and between the shaft sealing device and the vacuum chamber body A closed space is formed between, wherein the vacuum chamber includes a reaction space for accommodating a plurality of powders, and the driving unit drives the vacuum chamber to rotate through the shaft sealing device; at least one first sealing ring and at least one second A sealing ring is located between the shaft sealing device and the vacuum chamber, wherein the closed space is located between the first sealing ring and the second sealing ring, wherein the first sealing ring is located between the inner tube and the vacuum chamber the second sealing ring is located between the outer tube body and the vacuum chamber, the first sealing ring is a dynamic sealing ring, and the second sealing ring is a static sealing ring; at least one first pump a gas line, located in the shaft sealing device, and fluidly connected to the closed space, wherein the first air suction line is used to extract a gas in the closed space to fix the vacuum chamber on the shaft sealing device; and At least one intake line is located in the shaft sealing device, fluidly connected to the reaction space of the vacuum chamber, and used to deliver a precursor gas to the reaction space, wherein the shaft sealing device includes an outer tube body and an inner tube body A pipe body, the outer pipe body includes an accommodating space for accommodating the inner pipe body, and the inner pipe body includes at least one connecting space for accommodating the first suction line and the air intake line. 如請求項4所述的具快拆功能的粉末原子層沉積設備,其中該驅動單元透過該外管體連接該真空腔體,並帶動該真空腔體轉動。 The powder atomic layer deposition device with quick release function as claimed in claim 4, wherein the driving unit is connected to the vacuum chamber through the outer tube, and drives the vacuum chamber to rotate. 如請求項4所述的具快拆功能的粉末原子層沉積設備,其中該真空腔體的一底部包括一凹部,用以容置凸出該軸封裝置的該內管體,並在凸出該軸封裝置的該內管體與該真空腔體的該凹部之間形成該密閉空間。 The powder atomic layer deposition equipment with quick release function as claimed in claim 4, wherein a bottom of the vacuum chamber includes a concave portion for accommodating the inner tube body protruding from the shaft sealing device, and when the protruding part is The sealed space is formed between the inner tube body of the shaft sealing device and the concave portion of the vacuum chamber. 如請求項6所述的具快拆功能的粉末原子層沉積設備,其中該凹部由該真空腔體的該底部延伸至該反應空間,並形成一凸出管部。 The powder atomic layer deposition apparatus with quick release function as claimed in claim 6, wherein the concave portion extends from the bottom of the vacuum chamber to the reaction space, and forms a protruding tube portion. 如請求項6所述的具快拆功能的粉末原子層沉積設備,還包括一過濾單元位於該真空腔體的該凹部內,而該進氣管線經由該過濾單元流體連接該真空腔體的該反應空間。 The powder atomic layer deposition apparatus with quick release function as claimed in claim 6, further comprising a filter unit located in the recess of the vacuum chamber, and the intake line is fluidly connected to the vacuum chamber through the filter unit reaction space.
TW110127436A 2021-07-26 2021-07-26 Powder atomic layer deposition equipment with quick release function TWI775543B (en)

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TWM609525U (en) * 2020-11-24 2021-03-21 天虹科技股份有限公司 Detachable powder atomic layer deposition device

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TWM609525U (en) * 2020-11-24 2021-03-21 天虹科技股份有限公司 Detachable powder atomic layer deposition device

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