TWI773528B - Display device - Google Patents
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- TWI773528B TWI773528B TW110134381A TW110134381A TWI773528B TW I773528 B TWI773528 B TW I773528B TW 110134381 A TW110134381 A TW 110134381A TW 110134381 A TW110134381 A TW 110134381A TW I773528 B TWI773528 B TW I773528B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
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Abstract
Description
本發明是有關於一種顯示裝置,且特別是有關於一種具有提高的出光效率的顯示裝置。The present invention relates to a display device, and more particularly, to a display device with improved light extraction efficiency.
微型發光二極體(Micro-LED)顯示裝置是直接以微型發光二極體晶粒作為發光單元,透過將微型發光二極體晶粒封裝於電路基板上來實現畫面顯示的效果。然而,由於微型發光二極體晶粒本身的折射率偏高,其出光效率仍然有偏低的現象。The Micro-LED display device directly uses the micro-LED die as the light-emitting unit, and realizes the effect of screen display by encapsulating the micro-LED die on the circuit substrate. However, due to the high refractive index of the micro-LED crystal grains, their light extraction efficiency is still low.
本發明提供一種顯示裝置,具有提高的出光效率。The present invention provides a display device with improved light extraction efficiency.
本發明的一個實施例提出一種顯示裝置,包括:電路基板;多個發光元件,位於電路基板上且電性連接電路基板,且分別包括發光層;膠層,位於電路基板上及電路基板與多個發光元件之間;以及覆蓋層,覆蓋多個發光元件及膠層,其中,膠層具有複折射率實部n A,覆蓋層具有複折射率實部n B,發光層具有複折射率實部n LED,且(n A+n B)/n LED介於1.45至1.75之間。 An embodiment of the present invention provides a display device, including: a circuit substrate; a plurality of light-emitting elements, located on the circuit substrate and electrically connected to the circuit substrate, respectively including a light-emitting layer; an adhesive layer, located on the circuit substrate and the circuit substrate and the plurality of light-emitting elements between the light-emitting elements; and a cover layer covering a plurality of light-emitting elements and the adhesive layer, wherein the adhesive layer has a real part of the complex refractive index n A , the cover layer has a real part of the complex refractive index n B , and the light-emitting layer has a real part of the complex refractive index n B . n LED , and (n A +n B )/n LED is between 1.45 and 1.75.
在本發明的一實施例中,上述的n A/n LED介於0.8至0.95之間。 In an embodiment of the present invention, the above-mentioned n A /n LED is between 0.8 and 0.95.
在本發明的一實施例中,上述的n A<n B<n LED。 In an embodiment of the present invention, the above-mentioned n A <n B <n LED .
在本發明的一實施例中,上述的膠層的上表面不高於發光元件的上表面。In an embodiment of the present invention, the upper surface of the above-mentioned adhesive layer is not higher than the upper surface of the light-emitting element.
在本發明的一實施例中,上述的膠層包括染料,且染料的顏色與發光元件的光色相同。In an embodiment of the present invention, the above-mentioned adhesive layer includes a dye, and the color of the dye is the same as the light color of the light-emitting element.
在本發明的一實施例中,上述的染料包括染料粒子及染劑,且染料粒子的複折射率實部大於染劑的複折射率實部。In an embodiment of the present invention, the above-mentioned dye includes dye particles and a dye, and the real part of the complex refractive index of the dye particles is greater than the real part of the complex refractive index of the dye.
在本發明的一實施例中,上述的覆蓋層的複折射率虛部小於膠層的複折射率虛部。In an embodiment of the present invention, the imaginary part of the complex refractive index of the cover layer is smaller than the imaginary part of the complex refractive index of the adhesive layer.
在本發明的一實施例中,上述的覆蓋層包括多個彩色濾光結構。In an embodiment of the present invention, the above-mentioned cover layer includes a plurality of color filter structures.
在本發明的一實施例中,上述的彩色濾光結構的顏色與對應的發光元件的光色相同。In an embodiment of the present invention, the color of the above-mentioned color filter structure is the same as the light color of the corresponding light-emitting element.
在本發明的一實施例中,上述的顯示裝置還包括抗反射層,位於覆蓋層上。In an embodiment of the present invention, the above-mentioned display device further includes an anti-reflection layer on the cover layer.
在本發明的一實施例中,上述的抗反射層的複折射率虛部接近零。In an embodiment of the present invention, the imaginary part of the complex refractive index of the above-mentioned anti-reflection layer is close to zero.
在本發明的一實施例中,上述的抗反射層包括破壞性干涉抗反射層或漸變折射率抗反射層。In an embodiment of the present invention, the above-mentioned anti-reflection layer includes a destructive interference anti-reflection layer or a graded-index anti-reflection layer.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more obvious and easy to understand, the following embodiments are given and described in detail with the accompanying drawings as follows.
在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。在整個說明書中,相同的附圖標記表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件「上」或「連接到」另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反地,當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時,不存在中間元件。如本文所使用的,「連接」可以指物理及/或電性連接。再者,「電性連接」或「耦合」可為二元件間存在其它元件。In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. The same reference numerals refer to the same elements throughout the specification. It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to a physical and/or electrical connection. Furthermore, "electrically connected" or "coupled" may refer to the existence of other elements between the two elements.
此外,諸如「下」或「底部」和「上」或「頂部」的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其他元件的「下」側的元件將被定向在其他元件的「上」側。因此,示例性術語「下」可以包括「下」和「上」的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件「下」或「下方」的元件將被定向為在其它元件「上方」。因此,示例性術語「下」或「下方」可以包括上方和下方的取向。Furthermore, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe one element's relationship to another element, as shown in the figures. It should be understood that relative terms are intended to encompass different orientations of the device in addition to the orientation shown in the figures. For example, if the device in one of the figures is turned over, elements described as being on the "lower" side of other elements would then be oriented on "upper" sides of the other elements. Thus, the exemplary term "lower" may include an orientation of "lower" and "upper", depending on the particular orientation of the figures. Similarly, if the device in one of the figures is turned over, elements described as "below" or "beneath" other elements would then be oriented "above" the other elements. Thus, the exemplary terms "below" or "beneath" can encompass both an orientation of above and below.
考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制),本文使用的「約」、「近似」、或「實質上」包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值。例如,「約」可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。再者,本文使用的「約」、「近似」、或「實質上」可依光學性質、蝕刻性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。"About," "approximately," or "substantially" as used herein includes the stated value and is of ordinary skill in the art, given the measurement in question and the particular amount of error associated with the measurement (ie, limitations of the measurement system). The average within an acceptable deviation range for a specific value determined by a person. For example, "about" can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%. Furthermore, as used herein, "about", "approximately", or "substantially" may be used to select a more acceptable range of deviation or standard deviation depending on optical properties, etching properties, or other properties, and not one standard deviation may apply to all. nature.
圖1A是依照本發明一實施例的顯示裝置10的剖面示意圖。圖1B是依照本發明一實施例的顯示裝置10的出光效率模擬圖。顯示裝置10包括:電路基板110;多個發光元件120,位於電路基板110上且電性連接電路基板110,且分別包括發光層EL;膠層130,位於電路基板110上及電路基板110與多個發光元件120之間;以及覆蓋層140,覆蓋多個發光元件120及膠層130,其中,膠層130具有複折射率實部n
A,覆蓋層140具有複折射率實部n
B,發光層EL具有複折射率實部n
LED,且(n
A+n
B)/n
LED可以介於約1.45至1.75之間。
FIG. 1A is a schematic cross-sectional view of a
在本發明的一實施例的顯示裝置10中,藉由控制發光元件120周圍的膠層130及覆蓋層140的折射率來減少發光元件120的出光反射,同時增加發光元件120的出光透射,從而提高發光元件的出光效率。以下,配合圖1,繼續說明顯示裝置10的各個元件的實施方式,但本發明不以此為限。In the
在本實施例中,電路基板110可以包括底板112以及驅動電路層114。電路基板110的底板112可以是透明基板或非透明基板,其材質可以是石英基板、玻璃基板、高分子基板或其他適當材質,但本發明不以此為限。驅動電路層114可以包括接墊P1、P2,且接墊P1、P2可以電性連接電路基板110與發光元件120。接墊P1、P2可以具有單層結構或多層以上的導電層層疊的結構。舉例而言,接墊P1、P2可以具有鋁、鉬、鈦、銅等金屬與銦錫氧化物(ITO)、銦鋅氧化物(IZO)、銦鎵鋅氧化物(IGZO)或其他適合的導電氧化物層疊的結構,但本發明不以此為限。In this embodiment, the
在一些實施例中,驅動電路層114還可以包括顯示裝置10需要的元件或線路,例如驅動元件、開關元件、儲存電容、電源線、驅動訊號線、時序訊號線、電流補償線、檢測訊號線等等。舉例而言,可以利用薄膜沉積製程、微影製程以及蝕刻製程,在底板112上形成驅動電路層114,且驅動電路層114可以包括主動元件陣列,其中主動元件陣列可以包括排列成陣列的多個主動元件T,且主動元件T可以電性連接接墊P1或接墊P2。具體而言,驅動電路層114可以包括主動元件T、緩衝層I1、閘極絕緣層I2、層間絕緣層I3、平坦層I4以及接墊P1、P2。主動元件T可以由半導體層CH、閘極GE、源極SE與汲極DE所構成。半導體層CH重疊閘極GE的區域可視為主動元件T的通道區。閘極絕緣層I2位於閘極GE與半導體層CH之間,層間絕緣層I3設置在源極SE與閘極GE之間以及汲極DE與閘極GE之間。閘極GE及源極SE可分別接收來自例如驅動元件的訊號,且汲極DE可以通過平坦層I4中的通孔電性連接接墊P1。當閘極GE接收訊號而開啟主動元件T時,可使源極SE接收的訊號通過汲極DE傳遞至接墊P1。在其他實施例中,驅動電路層114還可以視需要包括更多的絕緣層以及導電層。In some embodiments, the
舉例而言,半導體層CH的材質可以包括矽質半導體材料(例如多晶矽、非晶矽等)、氧化物半導體材料、有機半導體材料,而閘極GE、源極SE以及汲極DE的材質可包括導電性良好的金屬,例如鋁、鉬、鈦、銅等金屬或其疊層,但不限於此。緩衝層I1、閘極絕緣層I2以及層間絕緣層I3的材質可以包括透明的絕緣材料,例如氧化矽、氮化矽、氮氧化矽或上述材料的疊層,但本發明不限於此。平坦層I4的材質可以包括透明的絕緣材料,例如有機材料、壓克力(acrylic)材料、矽氧烷(siloxane)材料、聚醯亞胺(polyimide)材料、環氧樹脂(epoxy)材料等,但不限於此。緩衝層I1、閘極絕緣層I2、層間絕緣層I3以及平坦層I4也可以分別具有單層結構或多層結構,多層結構例如上述絕緣材料中任意兩層或更多層的疊層,可視需要進行組合與變化。For example, the material of the semiconductor layer CH may include silicon semiconductor material (such as polysilicon, amorphous silicon, etc.), oxide semiconductor material, and organic semiconductor material, and the material of the gate electrode GE, the source electrode SE, and the drain electrode DE may include Metals with good electrical conductivity, such as aluminum, molybdenum, titanium, copper and other metals or their laminates, but not limited thereto. Materials of the buffer layer I1 , the gate insulating layer I2 and the interlayer insulating layer I3 may include transparent insulating materials, such as silicon oxide, silicon nitride, silicon oxynitride or a stack of the above materials, but the invention is not limited thereto. The material of the flat layer I4 may include transparent insulating materials, such as organic materials, acrylic materials, siloxane materials, polyimide materials, epoxy materials, etc., But not limited to this. The buffer layer I1, the gate insulating layer I2, the interlayer insulating layer I3 and the flat layer I4 may also have a single-layer structure or a multi-layer structure, respectively. Combination and variation.
在本實施例中,每一發光元件120可以包括第一電極E1、第二電極E2及發光疊層SS,且第一電極E1及第二電極E2分別電性連接發光疊層SS中的不同層。發光疊層SS可以包括兩層半導體層及夾於上述的兩層半導體層之間的發光層,且第一電極E1可電性連接上述的兩層半導體層中的一層,而第二電極E2可電性連接上述的兩層半導體層中的另一層。第一電極E1及第二電極E2的材質可包括金屬、合金、金屬材料的氮化物、金屬材料的氧化物、金屬材料的氮氧化物或其他合適的材料或是金屬材料與其他導電材料的堆疊層或其他低阻值的材料。In this embodiment, each light-
舉例而言,發光疊層SS可以包括第一型半導體層S1、第二型半導體層S2以及夾置於第一型半導體層S1與第二型半導體層S2之間的發光層EL。第一型半導體層S1與第二型半導體層S1中的一者可以為N型摻雜半導體,且另一者可以為P型摻雜半導體。此外,第一型半導體層S1和第二型半導體層S2可以包括Ⅱ-Ⅵ族材料(例如:鋅化硒(ZnSe))或Ⅲ-Ⅴ氮族化物材料(例如:氮化鎵(GaN)、砷化鎵、氮化銦(InN)、氮化銦鎵(InGaN)、氮化鋁鎵(AlGaN)、氮化鋁銦鎵(AlInGaN))或鋁鎵銦磷化物(AlGaInP)。舉例而言,在本實施例中,第一型半導體層S1例如是N型摻雜半導體層,N型摻雜半導體層的材料例如是N型氮化鎵(n-GaN),第二型半導體層S2例如是P型摻雜半導體層,P型摻雜半導體層的材料例如是P型氮化鎵(p-GaN),但本發明不以此為限。另外,發光層EL的結構例如是多層量子井結構(Multiple Quantum Well,MQW),多重量子井結構可以包括交替堆疊的多層氮化銦鎵(InGaN)以及多層氮化鎵(GaN),藉由設計發光層EL中銦或鎵的比例,還可調整發光層的發光波長範圍,但本發明不以此為限。For example, the light emitting stack SS may include a first type semiconductor layer S1, a second type semiconductor layer S2, and a light emitting layer EL sandwiched between the first type semiconductor layer S1 and the second type semiconductor layer S2. One of the first type semiconductor layer S1 and the second type semiconductor layer S1 may be an N-type doped semiconductor, and the other may be a P-type doped semiconductor. In addition, the first-type semiconductor layer S1 and the second-type semiconductor layer S2 may include II-VI group materials (eg, zinc selenide (ZnSe)) or III-V nitride materials (eg, gallium nitride (GaN), Gallium Arsenide, Indium Nitride (InN), Indium Gallium Nitride (InGaN), Aluminum Gallium Nitride (AlGaN), Aluminum Indium Gallium Nitride (AlInGaN), or Aluminum Gallium Indium Phosphide (AlGaInP). For example, in this embodiment, the first-type semiconductor layer S1 is, for example, an N-type doped semiconductor layer, and the material of the N-type doped semiconductor layer is, for example, N-type gallium nitride (n-GaN), and the second-type semiconductor layer is, for example, N-type gallium nitride (n-GaN). The layer S2 is, for example, a P-type doped semiconductor layer, and the material of the P-type doped semiconductor layer is, for example, P-type gallium nitride (p-GaN), but the invention is not limited thereto. In addition, the structure of the light emitting layer EL is, for example, a multi-layer quantum well (MQW) structure. The multi-quantum well structure may include alternately stacked multi-layer indium gallium nitride (InGaN) and multi-layer gallium nitride (GaN). The ratio of indium or gallium in the light-emitting layer EL can also adjust the light-emitting wavelength range of the light-emitting layer, but the present invention is not limited to this.
發光元件120可以是於生長基板(例如藍寶石基板)上製造後,透過巨量轉移(Mass transfer)製程轉置於電路基板110上,且第一電極E1可以電性連接接墊P1,第二電極E2可以電性連接接墊P2。在一些實施例中,第一電極E1與接墊P1之間以及第二電極E2與接墊P2之間還可以包括焊料、導電膠或其他導電材料。The light-emitting
在巨量轉移製程之後,可以將膠層130塗覆於發光元件120周圍的電路基板110上,其後膠層130還可流入發光元件120與電路基板110之間。考慮到實際製程的可行性,膠層130的上表面130T可以不高於發光元件120的上表面120T。舉例而言,在本實施例中,膠層130的上表面130T可以低於發光元件120的上表面120T,但不以此為限。在一些實施例中,膠層130的上表面130T可以大致與發光元件120的上表面120T齊平。After the mass transfer process, the adhesive layer 130 may be coated on the
一般而言,通稱的折射率是指材料的複折射率的實部,而複折射率的虛部又可稱為消光係數(Extinction coefficient),其表示光進入材料後的衰減量。在本實施例中,可以定義發光元件120的發光層EL具有複折射率實部n
LED,且膠層130具有平均複折射率實部n
A。由於發光層EL的折射率可能高達2.4至3.6,因此設計使n
A小於n
LED,且n
A/n
LED的比值較佳在0.8以上,例如n
A/n
LED可以介於0.8至0.95之間,以避免發光層EL發出的光線產生全反射。
In general, the so-called refractive index refers to the real part of the complex refractive index of the material, and the imaginary part of the complex refractive index can also be called the extinction coefficient (Extinction coefficient), which represents the attenuation of light after entering the material. In this embodiment, it can be defined that the light emitting layer EL of the
在本實施例中,覆蓋層140可以覆蓋發光元件120的上表面120T以及膠層130,且覆蓋層140可以具有平均複折射率實部n
B。在一些實施例中,n
B可以介於n
A與n
LED之間,即n
A<n
B<n
LED,以有利於提高發光元件120的出光率。另外,從圖1B的出光效率模擬結果可以看出,當(n
A+n
B)/n
LED介於1.45至1.75之間時,發光元件120的出光效率即可提高到11.5%以上;當(n
A+n
B)/n
LED介於1.47至1.71之間時,發光元件120的出光效率更可達到12%以上;且當(n
A+n
B)/n
LED介於1.5至1.67之間時,發光元件120的出光效率還可以超過12.5%。
In this embodiment, the
在一些實施例中,膠層130可以具有平均複折射率虛部k
A,覆蓋層140可以具有平均複折射率虛部k
B,且k
B可以略小於k
A,即k
B<k
A,以減少膠層130與覆蓋層140之間的界面反射。
In some embodiments, the subbing layer 130 may have an average complex refractive index imaginary part k A , the
以下,使用圖2至圖3繼續說明本發明的其他實施例,並且,沿用圖1A的實施例的元件標號與相關內容,其中,採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明,可參考圖1A的實施例,在以下的說明中不再重述。Hereinafter, other embodiments of the present invention will continue to be described with reference to FIGS. 2 to 3 , and the element numbers and related contents of the embodiment in FIG. 1A will be followed, wherein the same numbers are used to represent the same or similar elements, and the same elements are omitted. Description of technical content. For the description of the omitted part, reference may be made to the embodiment of FIG. 1A , which will not be repeated in the following description.
圖2是依照本發明一實施例的顯示裝置20的剖面示意圖。顯示裝置20包括電路基板110、發光元件120、接墊P1、P2、膠層132以及覆蓋層140,且發光元件120包括第一電極E1、第二電極E2及發光疊層SS,其中,發光疊層SS中的發光層具有複折射率實部n
LED,膠層132具有平均複折射率實部n
A,覆蓋層140具有平均複折射率實部n
B,且(n
A+n
B)/n
LED介於1.45至1.75之間。與如圖1A所示的顯示裝置10相比,圖2所示的顯示裝置20的不同之處在於:顯示裝置20的膠層132還包括染料DM。
FIG. 2 is a schematic cross-sectional view of a
舉例而言,在本實施例中,染料DM的顏色較佳與發光元件120的光色相同,且染料DM可以包括染料粒子DP及染劑DS,其中染劑DS可有助於染料粒子DP分散於膠層132中。此外,染料粒子DP的複折射率實部可略大於染劑DS的複折射率實部,以提高光色均勻度。在一些實施例中,覆蓋層140也可以包括染料,且覆蓋層140的染料的顏色也與發光元件120的光色相同。For example, in this embodiment, the color of the dye DM is preferably the same as the light color of the light-emitting
在一些實施例中,顯示裝置20還包括抗反射層AR,且抗反射層AR可以位於覆蓋層140上。抗反射層AR可以降低反射率,藉以提高光穿透率及出光效率。在某些實施例中,抗反射層AR的複折射率虛部可以接近零,以藉由減少進入光線的衰減量來提高出光率。In some embodiments, the
在一些實施例中,抗反射層AR可以是破壞性干涉抗反射層。舉例而言,抗反射層AR的厚度可以是光波長的一半,如此一來,穿透抗反射層AR後經抗反射層AR反射的光的相位可與入射光相反,使得反射光與入射光產生破壞性干涉,從而降低反射率。In some embodiments, the antireflection layer AR may be a destructive interference antireflection layer. For example, the thickness of the anti-reflection layer AR can be half the wavelength of light, so that the phase of the light reflected by the anti-reflection layer AR after penetrating the anti-reflection layer AR can be opposite to the incident light, so that the reflected light and the incident light Destructive interference occurs, thereby reducing reflectivity.
在一些實施例中,抗反射層AR可以是漸變折射率抗反射層。舉例而言,抗反射層AR中可以包括折射率較低的材料,例如空氣泡或其他適當的材料。當空氣泡的分佈濃度由抗反射層AR靠近覆蓋層140的側邊C1遞增至相對的另一側邊C2時,即可於抗反射層AR中形成由側邊C1遞減至側邊C2的折射率,而有利於出光。在某些實施例中,抗反射層AR可以包括折射率漸變的多層結構。In some embodiments, the antireflection layer AR may be a graded index antireflection layer. For example, the anti-reflection layer AR may include a material with a lower refractive index, such as air bubbles or other suitable materials. When the distribution concentration of air bubbles increases from the side C1 of the anti-reflection layer AR close to the
圖3是依照本發明一實施例的顯示裝置30的剖面示意圖。顯示裝置30包括電路基板110、發光元件120、接墊P1、P2、膠層130以及覆蓋層143,且發光元件120包括第一電極E1、第二電極E2及發光疊層SS,其中,發光疊層SS中的發光層具有複折射率實部n
LED,膠層130具有平均複折射率實部n
A,覆蓋層143具有平均複折射率實部n
B,且(n
A+n
B)/n
LED介於1.45至1.75之間。與如圖1A所示的顯示裝置10相比,圖3所示的顯示裝置30的不同之處在於:顯示裝置30的覆蓋層143可以包括多個彩色濾光結構CF,且膠層130的上表面130T可以實質上與發光元件120的上表面120T齊平。
FIG. 3 is a schematic cross-sectional view of a
在本實施例中,多個彩色濾光結構CF於電路基板110的正投影可以分別重疊多個發光元件120於電路基板110的正投影,以分別對來自對應的發光元件120的光線進行濾光,且彩色濾光結構CF的顏色可以與對應的發光元件120的光色相同。舉例而言,當對應的發光元件120是藍色發光二極體時,彩色濾光結構CF可以是藍色濾光片;當對應的發光元件120是綠色發光二極體時,彩色濾光結構CF可以是綠色濾光片;且當對應的發光元件120是紅色發光二極體時,彩色濾光結構CF可以是紅色濾光片。In this embodiment, the orthographic projections of the plurality of color filter structures CF on the
在本實施例中,顯示裝置30還可以包括多個遮光結構BM以及透光蓋板CV,其中彩色濾光結構CF以及遮光結構BM可以交替形成於透光蓋板CV上靠近發光元件120的表面上,且彩色濾光結構CF、遮光結構BM以及透光蓋板CV可以構成彩色濾光基板CS。藉由使遮光結構BM分別位於彩色濾光結構CF之間,且遮光結構BM於電路基板110的正投影位於發光元件120於電路基板110的正投影之外,還可避免影響出光,同時能夠降低暗態亮度及提高色彩對比度。In this embodiment, the
綜上所述,本發明的顯示裝置藉由控制發光元件周圍的膠層及覆蓋層的複折射率,能夠有效提高發光元件的出光效率。To sum up, the display device of the present invention can effectively improve the light extraction efficiency of the light-emitting element by controlling the complex refractive index of the adhesive layer and the cover layer around the light-emitting element.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above by the embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the scope of the appended patent application.
10、20、30:顯示裝置10, 20, 30: Display device
110:電路基板110: circuit substrate
112:底板112: Bottom plate
114:驅動電路層114: Driver circuit layer
120:發光元件120: Light-emitting element
120T:上表面120T: Upper surface
130、132:膠層130, 132: Adhesive layer
130T:上表面130T: Upper surface
140、143:覆蓋層140, 143: Overlay
AR:抗反射層AR: Anti-Reflection Layer
BM:遮光結構BM: shading structure
C1、C2:側邊C1, C2: side
CF:彩色濾光結構CF: Color filter structure
CH:半導體層CH: semiconductor layer
CS:彩色濾光基板CS: Color Filter Substrate
CV:透光蓋板CV: translucent cover
DE:汲極DE: drain
DM:染料DM: Dye
DP:染料粒子DP: Dye Particles
DS:染劑DS: dye
E1:第一電極E1: The first electrode
E2:第二電極E2: Second electrode
EL:發光層EL: light-emitting layer
GE:閘極GE: gate
I1:緩衝層I1: Buffer layer
I2:閘極絕緣層I2: gate insulating layer
I3:層間絕緣層I3: Interlayer insulating layer
I4:平坦層I4: flat layer
P1、P2:接墊P1, P2: pads
S1:第一型半導體層S1: first type semiconductor layer
S2:第二型半導體層S2: Second type semiconductor layer
SE:源極SE: source
SS:發光疊層SS: Light Emitting Laminate
T:主動元件T: Active element
圖1A是依照本發明一實施例的顯示裝置10的剖面示意圖。
圖1B是依照本發明一實施例的顯示裝置10的出光效率模擬圖。
圖2是依照本發明一實施例的顯示裝置20的剖面示意圖。
圖3是依照本發明一實施例的顯示裝置30的剖面示意圖。
FIG. 1A is a schematic cross-sectional view of a
10:顯示裝置 10: Display device
110:電路基板 110: circuit substrate
112:底板 112: Bottom plate
114:驅動電路層 114: Driver circuit layer
120:發光元件 120: Light-emitting element
120T:上表面 120T: Upper surface
130:膠層 130: Adhesive layer
130T:上表面 130T: Upper surface
140:覆蓋層 140: Overlay
CH:半導體層 CH: semiconductor layer
DE:汲極 DE: drain
E1:第一電極 E1: The first electrode
E2:第二電極 E2: Second electrode
EL:發光層 EL: light-emitting layer
GE:閘極 GE: gate
I1:緩衝層 I1: Buffer layer
I2:閘極絕緣層 I2: gate insulating layer
I3:層間絕緣層 I3: Interlayer insulating layer
I4:平坦層 I4: flat layer
P1、P2:接墊 P1, P2: pads
S1:第一型半導體層 S1: first type semiconductor layer
S2:第二型半導體層 S2: Second type semiconductor layer
SE:源極 SE: source
SS:發光疊層 SS: Light emitting stack
T:主動元件 T: Active element
Claims (11)
Priority Applications (2)
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TW110134381A TWI773528B (en) | 2021-09-15 | 2021-09-15 | Display device |
CN202111477222.9A CN114188365A (en) | 2021-09-15 | 2021-12-06 | Display device |
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TW110134381A TWI773528B (en) | 2021-09-15 | 2021-09-15 | Display device |
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TWI773528B true TWI773528B (en) | 2022-08-01 |
TW202314339A TW202314339A (en) | 2023-04-01 |
Family
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TW110134381A TWI773528B (en) | 2021-09-15 | 2021-09-15 | Display device |
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CN (1) | CN114188365A (en) |
TW (1) | TWI773528B (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201705539A (en) * | 2015-07-23 | 2017-02-01 | 新世紀光電股份有限公司 | Light-emitting package and manufacturing method thereof |
TW202028822A (en) * | 2019-01-18 | 2020-08-01 | 中強光電股份有限公司 | Light source module and display appartus |
TW202042406A (en) * | 2019-05-07 | 2020-11-16 | 喆光照明光電股份有限公司 | Stacked optical coupler formed with twice encapsulation and packaging method thereof capable of simplifying the manufacturing process and maintaining the integrity of the required elements |
-
2021
- 2021-09-15 TW TW110134381A patent/TWI773528B/en active
- 2021-12-06 CN CN202111477222.9A patent/CN114188365A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201705539A (en) * | 2015-07-23 | 2017-02-01 | 新世紀光電股份有限公司 | Light-emitting package and manufacturing method thereof |
TW202028822A (en) * | 2019-01-18 | 2020-08-01 | 中強光電股份有限公司 | Light source module and display appartus |
TW202042406A (en) * | 2019-05-07 | 2020-11-16 | 喆光照明光電股份有限公司 | Stacked optical coupler formed with twice encapsulation and packaging method thereof capable of simplifying the manufacturing process and maintaining the integrity of the required elements |
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CN114188365A (en) | 2022-03-15 |
TW202314339A (en) | 2023-04-01 |
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