TWI765834B - Light-emitting diode wafer inspection method - Google Patents

Light-emitting diode wafer inspection method Download PDF

Info

Publication number
TWI765834B
TWI765834B TW110139080A TW110139080A TWI765834B TW I765834 B TWI765834 B TW I765834B TW 110139080 A TW110139080 A TW 110139080A TW 110139080 A TW110139080 A TW 110139080A TW I765834 B TWI765834 B TW I765834B
Authority
TW
Taiwan
Prior art keywords
light
emitting diode
wafer
electrode
electrodes
Prior art date
Application number
TW110139080A
Other languages
Chinese (zh)
Other versions
TW202228221A (en
Inventor
廖建碩
Original Assignee
台灣愛司帝科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 台灣愛司帝科技股份有限公司 filed Critical 台灣愛司帝科技股份有限公司
Application granted granted Critical
Publication of TWI765834B publication Critical patent/TWI765834B/en
Publication of TW202228221A publication Critical patent/TW202228221A/en

Links

Images

Landscapes

  • Led Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

A light-emitting diode wafer inspection method, comprising: providing a light-emitting diode wafer, the light-emitting diode wafer comprising: a wafer substrate; a plurality of light-emitting diode dies; at least one auxiliary electrode; providing power to the light-emitting diode dies; and optically inspecting the light source generated by the light-emitting diode dies. The light-emitting diode wafer inspection method of the present invention can be applied to the manufacturing process of displays.

Description

發光二極體晶圓檢測方法 Light Emitting Diode Wafer Inspection Method

本發明係關於一種發光二極體晶圓檢測方法,尤指一種用於包括輔助電極的發光二極體晶圓的發光二極體晶圓檢測方法。 The present invention relates to a method for detecting a light-emitting diode wafer, in particular to a method for detecting a light-emitting diode wafer for a light-emitting diode wafer including an auxiliary electrode.

現有技術中,多個發光二極體晶片可以在一晶圓上製作出來,但是多個發光二極體晶片必須先從晶圓上切割下來後,才能進行光學檢測,不僅造成發光二極體晶片在光學檢測上的困難度,也降低發光二極體晶片的檢測效率。 In the prior art, a plurality of light-emitting diode chips can be fabricated on one wafer, but the plurality of light-emitting diode chips must be cut from the wafer before optical detection can be performed, which not only causes the light-emitting diode chips The difficulty in optical detection also reduces the detection efficiency of LED wafers.

本發明所要解決的技術問題在於,針對現有技術的不足提供一種發光二極體晶圓檢測方法。 The technical problem to be solved by the present invention is to provide a light-emitting diode wafer detection method aiming at the deficiencies of the prior art.

為了解決上述的技術問題,本發明所採用的其中一技術方案是提供一種發光二極體晶圓檢測方法,其包括:提供一發光二極體晶圓,該發光二極體晶圓包括:一晶圓基底;多個發光二極體晶片,其係設置在該晶圓基底上, 其中,每一發光二極體晶片包含:一第一電極,其係設置於該晶圓基底之上;一主體結構,其係設置於該第一電極之上;及一第二電極,其係設置於該主體結構之上;以及至少一輔助電極,其係與該等發光二極體晶片的第一電極電性連接,且不與該等發光二極體晶片的第二電極電性連接;於該等發光二極體晶片中,多個主體結構之間係彼此間隔;多個第二電極之間係彼此間隔;且各個第一電極係至少部分未被設置於其上的主體結構及第二電極所覆蓋;提供電源給該等發光二極體晶片;以及對該等發光二極體晶片所產生的光源進行光學檢測。 In order to solve the above technical problems, one of the technical solutions adopted by the present invention is to provide a method for detecting a light-emitting diode wafer, which includes: providing a light-emitting diode wafer, and the light-emitting diode wafer includes: a a wafer base; a plurality of light-emitting diode chips, which are arranged on the wafer base, Wherein, each light-emitting diode chip includes: a first electrode, which is disposed on the wafer substrate; a main body structure, which is disposed on the first electrode; and a second electrode, which is disposed on the wafer substrate. disposed on the main body structure; and at least one auxiliary electrode, which is electrically connected to the first electrodes of the light-emitting diode chips and not electrically connected to the second electrodes of the light-emitting diode chips; In these light-emitting diode chips, the plurality of main structures are spaced apart from each other; the plurality of second electrodes are spaced apart from each other; and each of the first electrodes is at least partially not disposed on the main body structure and the second electrode. covered by two electrodes; providing power to the light-emitting diode chips; and optically detecting the light sources generated by the light-emitting diode chips.

上述之發光二極體晶圓檢測方法,其中,於該等發光二極體晶片中,多個第一電極之間可彼此間隔,且每一發光二極體晶片的第一電極中未被設置於其上的主體結構及第二電極所覆蓋的部分可分別設置有一輔助電極。 The above-mentioned LED wafer inspection method, wherein, in the LED chips, a plurality of first electrodes can be spaced apart from each other, and the first electrodes of each LED chip are not disposed An auxiliary electrode can be respectively provided on the main structure and the part covered by the second electrode.

上述之發光二極體晶圓檢測方法,其中,於該等發光二極體晶片中,該等第一電極可彼此連結以形成一第一電極層,且該發光二極體晶圓可僅包含一個輔助電極。 The above-mentioned LED wafer inspection method, wherein, in the LED chips, the first electrodes can be connected to each other to form a first electrode layer, and the LED wafer can only contain an auxiliary electrode.

上述之發光二極體晶圓檢測方法,其中,該輔助電極係設置於二個發光二極體晶片之間。 In the above light-emitting diode wafer inspection method, the auxiliary electrode is disposed between two light-emitting diode wafers.

上述之發光二極體晶圓檢測方法,其中,該發光二極體晶圓係包含一主體區域以及一外圍區域,該等發光二極體晶片中的主體結構及第二電 極係設置於該主體區域中;且該第一電極層係自該主體區域延伸至該外圍區域;且該輔助電極係設置於該第一電極層中位於該外圍區域的部分上。 The above LED wafer inspection method, wherein the LED wafer includes a main body region and a peripheral region, the main body structure and the second electrical The electrode is disposed in the main body region; the first electrode layer extends from the main body region to the peripheral region; and the auxiliary electrode is disposed on a portion of the first electrode layer located in the peripheral region.

上述之發光二極體晶圓檢測方法,其中,該等第二電極及該或該等輔助電極之上表面係位於與該晶圓基底平行之一平面上。 In the above-mentioned LED wafer inspection method, the upper surfaces of the second electrodes and the auxiliary electrode(s) are located on a plane parallel to the wafer substrate.

上述之發光二極體晶圓檢測方法,其中,該等發光二極體晶片是透過使用一導電探針模組而得到電源供應。 In the above-mentioned LED wafer inspection method, the LED chips are supplied with power by using a conductive probe module.

上述之發光二極體晶圓檢測方法,其中,該導電探針模組包含:一基板;多個第一導電探針,其係自該基板之下表面向下延伸,且該等第一導電探針的位置係分別對應該等第二電極;以及至少一第二導電探針,其係自該基板之下表面向下延伸,且該或該等第二導電探針的位置係分別對應該或該等輔助電極。 In the above-mentioned LED wafer inspection method, the conductive probe module comprises: a substrate; a plurality of first conductive probes extending downward from the lower surface of the substrate, and the first conductive probes The positions of the probes correspond to the second electrodes respectively; and at least one second conductive probe extends downward from the lower surface of the substrate, and the positions of the or the second conductive probes correspond to the or these auxiliary electrodes.

上述之發光二極體晶圓檢測方法,其中,該光學檢測至少包括發光檢測、亮度檢測以及色座標檢測。 In the above light-emitting diode wafer inspection method, the optical inspection at least includes light emission inspection, luminance inspection and color coordinate inspection.

本發明的其中一有益效果在於,本發明所提供的一種發光二極體晶圓檢測方法,其能透過於所提供之發光二極體晶圓中設置至少一輔助電極,以使得本發明的發光二極體晶圓檢測方法可以於第二電極以及輔助電極兩者之間施加電壓以提供電源給該等發光二極體晶片,藉此對發光二極體晶圓進行光學檢測,無需將發光二極體晶片先從發光二極體晶圓上切割下來,可大幅提升檢測效率。 One of the beneficial effects of the present invention is that in the light-emitting diode wafer detection method provided by the present invention, at least one auxiliary electrode can be provided in the provided light-emitting diode wafer, so that the light-emitting diode of the present invention can emit light. The diode wafer inspection method can apply a voltage between the second electrode and the auxiliary electrode to provide power to the light-emitting diode wafers, thereby optically inspecting the light-emitting diode wafers without requiring the light-emitting diode wafers to be inspected. The polar body wafer is first cut from the light emitting diode wafer, which can greatly improve the detection efficiency.

為使能進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本發明加以限制。 To further understand the features and technical content of the present invention, please refer to the following detailed descriptions and drawings related to the present invention, but the drawings provided are only for reference and description, not for limiting the present invention.

10:發光二極體晶圓 10: Light Emitting Diode Wafer

10a:發光二極體晶圓 10a: Light Emitting Diode Wafer

10b:發光二極體晶圓 10b: Light Emitting Diode Wafer

11:晶圓基底 11: Wafer substrate

11a:晶圓基底 11a: Wafer substrate

11b:晶圓基底 11b: Wafer substrate

12:發光二極體晶片 12: LED chip

12a:發光二極體晶片 12a: LED chip

12b:發光二極體晶片 12b: LED chip

121:第一電極 121: The first electrode

121a:第一電極 121a: first electrode

121b:第一電極 121b: first electrode

122:主體結構 122: Main structure

122a:主體結構 122a: Main Structure

122b:主體結構 122b: Main Structure

123:第二電極 123: Second electrode

123a:第二電極 123a: second electrode

123b:第二電極 123b: second electrode

124a:第一電極層 124a: first electrode layer

124b:第一電極層 124b: first electrode layer

13:輔助電極 13: Auxiliary electrode

13a:輔助電極 13a: auxiliary electrode

13b:輔助電極 13b: auxiliary electrode

20:導電探針模組 20: Conductive probe module

20a:導電探針模組 20a: Conductive probe module

21:基板 21: Substrate

21a:基板 21a: Substrate

22:第一導電探針 22: The first conductive probe

22a:第一導電探針 22a: first conductive probe

23:第二導電探針 23: Second Conductive Probe

23a:第二導電探針 23a: Second conductive probe

31:主體區域 31: Main area

33:外圍區域 33: Peripheral area

S101:步驟 S101: Steps

S102:步驟 S102: Steps

S103:步驟 S103: Steps

〔圖1〕係為本發明實施例1之發光二極體晶圓檢測方法的流程圖。 [FIG. 1] is a flowchart of a method for inspecting a light-emitting diode wafer according to Embodiment 1 of the present invention.

〔圖2〕係為本發明實施例1之發光二極體晶圓檢測方法中所提供的發光二極體晶圓的剖面示意圖。 [ FIG. 2 ] is a schematic cross-sectional view of the light-emitting diode wafer provided in the light-emitting diode wafer detection method according to Embodiment 1 of the present invention.

〔圖3〕係為本發明實施例1之發光二極體晶圓檢測方法中所提供的發光二極體晶圓配合導電探針模組進行檢測的剖面示意圖。 [FIG. 3] is a schematic cross-sectional view of the LED wafer provided in the LED wafer detection method according to Embodiment 1 of the present invention and the conductive probe module for detection.

〔圖4〕係為本發明實施例2之發光二極體晶圓檢測方法中所提供的發光二極體晶圓的剖面示意圖。 [ FIG. 4 ] is a schematic cross-sectional view of a light-emitting diode wafer provided in the light-emitting diode wafer detection method according to Embodiment 2 of the present invention.

〔圖5〕係為本發明實施例2之發光二極體晶圓檢測方法中所提供的發光二極體晶圓配合導電探針模組進行檢測的剖面示意圖。 5 is a schematic cross-sectional view of the LED wafer provided in the LED wafer detection method according to Embodiment 2 of the present invention and the conductive probe module for detection.

〔圖6〕係為本發明實施例3之發光二極體晶圓檢測方法中所提供的發光二極體晶圓的俯視示意圖。 6 is a schematic top view of a light-emitting diode wafer provided in a method for detecting a light-emitting diode wafer according to Embodiment 3 of the present invention.

以下係藉由特定的具體實施例說明本發明之實施方式,熟習此技藝之人士可由本說明書所揭示之內容瞭解本發明之其他優點與功效。本發明也可藉由其他不同的具體實施例加以實施或應用,本說明書中的各項細節亦可基 於不同觀點與應用,在不悖離本發明之精神下進行各種修飾與變更。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。 The following describes the implementation of the present invention through specific embodiments, and those skilled in the art can understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied by other different specific embodiments, and the details in this specification can also be based on For different viewpoints and applications, various modifications and changes can be made without departing from the spirit of the present invention. In addition, the term "or", as used herein, should include any one or a combination of more of the associated listed items, as the case may be.

實施例1 Example 1

如圖1所示,本發明實施例1之發光二極體晶圓檢測方法,其包括:步驟S101:提供一發光二極體晶圓,該發光二極體晶圓包括:一晶圓基底;多個發光二極體晶片;至少一輔助電極;步驟S102:提供電源給該等發光二極體晶片;以及步驟S103:對該等發光二極體晶片所產生的光源進行光學檢測。 As shown in FIG. 1 , the method for detecting a light-emitting diode wafer according to Embodiment 1 of the present invention includes: step S101 : providing a light-emitting diode wafer, and the light-emitting diode wafer includes: a wafer substrate; a plurality of light-emitting diode chips; at least one auxiliary electrode; step S102 : providing power to the light-emitting diode chips; and step S103 : performing optical detection on the light sources generated by the light-emitting diode chips.

具體而言,如圖2所示,實施例1之發光二極體晶圓檢測方法中所提供之發光二極體晶圓10包括:一晶圓基底11;多個發光二極體晶片12,其係設置在該晶圓基底11上,其中,每一發光二極體晶片12包含:一第一電極121,其係設置於該晶圓基底11之上;一主體結構122,其係設置於該第一電極121之上;及一第二電極123,其係設置於該主體結構122之上;以及至少一輔助電極13,其係與該等發光二極體晶片12的第一電極121電性連接。 Specifically, as shown in FIG. 2 , the LED wafer 10 provided in the LED wafer detection method of Embodiment 1 includes: a wafer substrate 11 ; a plurality of LED chips 12 , It is disposed on the wafer base 11, wherein each light-emitting diode chip 12 includes: a first electrode 121 disposed on the wafer base 11; a main structure 122 disposed on the On the first electrode 121 ; and a second electrode 123 , which is disposed on the main body structure 122 ; and at least one auxiliary electrode 13 , which is electrically connected to the first electrodes 121 of the light-emitting diode chips 12 sexual connection.

更具體而言,如圖2所示,實施例1之發光二極體晶圓檢測方法中所提供之發光二極體晶圓10中,多個主體結構122之間係彼此間隔;多個第二電極123之間係彼此間隔;且各個第一電極121係至少部分未被設置於其上的主體結構122及第二電極12所覆蓋。 More specifically, as shown in FIG. 2 , in the light-emitting diode wafer 10 provided in the light-emitting diode wafer inspection method of Embodiment 1, the plurality of main structures 122 are spaced apart from each other; The two electrodes 123 are spaced apart from each other; and each of the first electrodes 121 is at least partially not covered by the main body structure 122 and the second electrode 12 disposed thereon.

特別地,如圖2所示,實施例1之發光二極體晶圓檢測方法中所提供之發光二極體晶圓10中,多個第一電極121之間係彼此間隔,且每一發光二極體晶片12的第一電極121中未被設置於其上的主體結構122及第二電極123所覆蓋的部分係分別設置有一輔助電極13。 In particular, as shown in FIG. 2 , in the LED wafer 10 provided in the LED wafer inspection method of Embodiment 1, the plurality of first electrodes 121 are spaced apart from each other, and each light The parts of the first electrode 121 of the diode wafer 12 not covered by the main structure 122 and the second electrode 123 disposed thereon are provided with an auxiliary electrode 13 respectively.

舉例來說,該等第一電極121可源自單一第一電極層,並於該發光二極體晶圓的製程中,藉由蝕刻技術,將單一第一電極層分割成多個彼此間隔的第一電極121。 For example, the first electrodes 121 can be derived from a single first electrode layer, and in the process of the light emitting diode wafer, the single first electrode layer is divided into a plurality of spaced apart by etching technology The first electrode 121 .

如上所述,實施例1之發光二極體晶圓檢測方法透過於所提供之發光二極體晶圓10中設置至少一輔助電極13,以使其可以透過於第二電極123以及輔助電極13兩者之間施加電壓以提供電源給該等發光二極體晶片12,藉此對發光二極體晶圓10進行光學檢測,無需將發光二極體晶片12先從發光二極體晶圓10上切割下來,可大幅提升檢測效率。 As described above, the light-emitting diode wafer detection method of the first embodiment is provided by disposing at least one auxiliary electrode 13 in the provided light-emitting diode wafer 10 so that the second electrode 123 and the auxiliary electrode 13 can pass through. A voltage is applied between the two to provide power to the LED chips 12 , thereby optically inspecting the LED chips 10 without removing the LED chips 12 from the LED chips 10 first. It can be cut from the top to greatly improve the detection efficiency.

於一較佳實施方式中,該等第二電極及該或該等輔助電極之上表面係位於與該晶圓基底平行之一平面上,以使該等第二電極及該或該等輔助電極易於透過下端位於同一平面之多個導電探針所導通,但本發明並不限於此。 In a preferred embodiment, the upper surfaces of the second electrodes and the auxiliary electrode(s) are located on a plane parallel to the wafer substrate, so that the second electrodes and the auxiliary electrode(s) are It is easy to conduct through a plurality of conductive probes whose lower ends are located on the same plane, but the present invention is not limited to this.

於一較佳實施方式中,該光學檢測至少包括發光檢測(檢測發光二極體晶片是否有產生光源)、亮度檢測(檢測發光二極體晶片所產生的光源的亮度)以及色座標檢測(檢測發光二極體晶片所產生的光源在色度座標圖上的分布),但本發明並不限於此。 In a preferred embodiment, the optical detection at least includes luminescence detection (detecting whether the light-emitting diode chip generates a light source), brightness detection (detecting the brightness of the light source generated by the light-emitting diode chip), and color coordinate detection (detecting distribution of the light source generated by the light-emitting diode wafer on the chromaticity coordinate diagram), but the present invention is not limited thereto.

於一特定實施方式中,實施例1之發光二極體晶圓檢測方法中,該等發光二極體晶片12可透過使用一導電探針模組20而得到電源供應,但本發明並不限於此。 In a specific embodiment, in the light-emitting diode wafer inspection method of Example 1, the light-emitting diode wafers 12 can be powered by using a conductive probe module 20, but the present invention is not limited to this.

舉例來說,如圖3所示,該導電探針模組20可包含:一基板21;多個第一導電探針22,其係自該基板21之下表面向下延伸,且該等第一導電探針22的位置係分別對應該等第二電極123;以及至少一第二導電探針 23,其係自該基板21之下表面向下延伸,且該或該等第二導電探針23的位置係分別對應該或該等輔助電極13。 For example, as shown in FIG. 3 , the conductive probe module 20 may include: a substrate 21 ; a plurality of first conductive probes 22 extending downward from the lower surface of the substrate 21 , and the first conductive probes 22 The positions of a conductive probe 22 correspond to the second electrodes 123 respectively; and at least one second conductive probe 23 , which extends downward from the lower surface of the substrate 21 , and the positions of the or the second conductive probes 23 correspond to the or the auxiliary electrodes 13 respectively.

具體而言,圖3所示之導電探針模組20包含:多個第二導電探針23,且該等第二導電探針23的位置係分別對應該等輔助電極13,但本發明並不限於此,於另一實施方式中,導電探針模組可僅包含一個第二導電探針,且該第二導電探針係對應單一輔助電極。 Specifically, the conductive probe module 20 shown in FIG. 3 includes: a plurality of second conductive probes 23, and the positions of the second conductive probes 23 correspond to the auxiliary electrodes 13 respectively, but the present invention does not Not limited to this, in another embodiment, the conductive probe module may include only one second conductive probe, and the second conductive probe corresponds to a single auxiliary electrode.

藉由圖3所示之導電探針模組20可更有效率地於多個第二電極以及多個輔助電極兩者之間施加電壓,以提升檢測效率。 The conductive probe module 20 shown in FIG. 3 can more efficiently apply voltage between the plurality of second electrodes and the plurality of auxiliary electrodes, so as to improve the detection efficiency.

實施例2 Example 2

實施例2之發光二極體晶圓檢測方法大致上與實施例1相同,其差異僅在於所提供之發光二極體晶圓的結構。 The LED wafer inspection method of Embodiment 2 is substantially the same as that of Embodiment 1, and the difference is only in the structure of the provided LED wafer.

如圖4所示,與實施例1相同地,實施例2之發光二極體晶圓檢測方法中所提供之發光二極體晶圓10a包括:一晶圓基底11a;多個發光二極體晶片12a,其係設置在該晶圓基底11a上,其中,每一發光二極體晶片12a包含:一第一電極121a,其係設置於該晶圓基底11a之上;一主體結構122a,其係設置於該第一電極121a之上;及一第二電極123a,其係設置於該主體結構122a之上;以及至少一輔助電極13a,其係與該等發光二極體晶片12a的第一電極121a電性連接。 As shown in FIG. 4 , as in Embodiment 1, the LED wafer 10a provided in the LED wafer inspection method of Embodiment 2 includes: a wafer base 11a; a plurality of LEDs The chip 12a is disposed on the wafer base 11a, wherein each light-emitting diode chip 12a includes: a first electrode 121a disposed on the wafer base 11a; a main structure 122a, which is are disposed on the first electrode 121a; a second electrode 123a is disposed on the main body structure 122a; and at least one auxiliary electrode 13a is connected to the first electrode of the light-emitting diode chips 12a The electrodes 121a are electrically connected.

特別地,如圖4所示,實施例2之發光二極體晶圓檢測方法中所提供之發光二極體晶圓10a中,該等第一電極121a係彼此連結以形成一第一電極層124a,且該發光二極體晶圓10a僅包含一個輔助電極13a。此外,該輔助電極13a係設置於二個發光二極體晶片12a之間。 In particular, as shown in FIG. 4, in the LED wafer 10a provided in the LED wafer inspection method of Embodiment 2, the first electrodes 121a are connected to each other to form a first electrode layer 124a, and the LED wafer 10a includes only one auxiliary electrode 13a. In addition, the auxiliary electrode 13a is disposed between the two light-emitting diode wafers 12a.

相較於實施例1,實施例2之發光二極體晶圓檢測方法中所提供之發光二極體晶圓10a僅包含一個輔助電極13a,且該等第一電極121a係彼此連結以形成一第一電極層124a,藉此可於多個第二電極123a以及單一輔助電極13a兩者之間施加電壓以提供電源給該等發光二極體晶片12a,藉此而對發光二極體晶圓10a進行光學檢測,可減少輔助電極13a所需設置之數量,藉此簡化發光二極體晶圓10a的製備流程,且藉此提升檢測效率。 Compared with Embodiment 1, the LED wafer 10a provided in the LED wafer inspection method of Embodiment 2 includes only one auxiliary electrode 13a, and the first electrodes 121a are connected to each other to form a The first electrode layer 124a, whereby a voltage can be applied between the plurality of second electrodes 123a and the single auxiliary electrode 13a to provide power to the light-emitting diode chips 12a, thereby providing power to the light-emitting diode wafers The optical inspection performed by 10a can reduce the number of auxiliary electrodes 13a required to be disposed, thereby simplifying the manufacturing process of the light emitting diode wafer 10a, and thereby improving the inspection efficiency.

於一特定實施方式中,實施例2之發光二極體晶圓檢測方法中,該等發光二極體晶片12a可透過使用一導電探針模組20a而得到電源供應,但本發明並不限於此。 In a specific embodiment, in the LED wafer inspection method of Example 2, the LED chips 12a can be powered by using a conductive probe module 20a, but the present invention is not limited to this.

舉例來說,如圖5所示,該導電探針模組20a可包含:一基板21a;多個第一導電探針22a,其係自該基板21a之下表面向下延伸,且該等第一導電探針22a的位置係分別對應該等第二電極123a;以及至少一第二導電探針23a,其係自該基板21a之下表面向下延伸,且該或該等第二導電探針23a的位置係分別對應該或該等輔助電極13a。 For example, as shown in FIG. 5, the conductive probe module 20a may include: a substrate 21a; a plurality of first conductive probes 22a extending downward from the lower surface of the substrate 21a, and the first conductive probes 22a The positions of a conductive probe 22a correspond to the second electrodes 123a respectively; and at least one second conductive probe 23a extends downward from the lower surface of the substrate 21a, and the or the second conductive probes The positions of 23a correspond to the or the auxiliary electrodes 13a, respectively.

具體而言,圖5所示之導電探針模組20a包含:單一第二導電探針23a,且該第二導電探針23a的位置係對應單一輔助電極13a。 Specifically, the conductive probe module 20a shown in FIG. 5 includes a single second conductive probe 23a, and the position of the second conductive probe 23a corresponds to the single auxiliary electrode 13a.

藉由圖5所示之導電探針模組20a可更有效率地於多個第二電極以及單一輔助電極兩者之間施加電壓,以提升檢測效率。 The conductive probe module 20a shown in FIG. 5 can more efficiently apply voltage between the plurality of second electrodes and the single auxiliary electrode, so as to improve the detection efficiency.

實施例3 Example 3

實施例3之發光二極體晶圓檢測方法大致上與實施例1相同,其差異僅在於所提供之發光二極體晶圓的結構。 The LED wafer inspection method of Embodiment 3 is substantially the same as that of Embodiment 1, and the difference is only in the structure of the provided LED wafer.

如圖6所示,與實施例1相同地,實施例3之發光二極體晶圓檢測方法中所提供之發光二極體晶圓10b包括:一晶圓基底11b;多個發光二極體晶片12b,其係設置在該晶圓基底11b上,其中,每一發光二極體晶片12b包含:一第一電極121b,其係設置於該晶圓基底11b之上;一主體結構122b,其係設置於該第一電極121b之上;及一第二電極123b,其係設置於該主體結構122b之上(於圖6之俯視圖中,該主體結構122b係為該第二電極123b所覆蓋);以及至少一輔助電極13b,其係與該等發光二極體晶片12b的第一電極121b電性連接。 As shown in FIG. 6 , as in Embodiment 1, the LED wafer 10 b provided in the LED wafer inspection method of Embodiment 3 includes: a wafer substrate 11 b ; a plurality of LEDs The chip 12b is disposed on the wafer base 11b, wherein each light-emitting diode chip 12b includes: a first electrode 121b disposed on the wafer base 11b; a main structure 122b, which is are disposed on the first electrode 121b; and a second electrode 123b is disposed on the main body structure 122b (in the top view of FIG. 6, the main body structure 122b is covered by the second electrode 123b) ; and at least one auxiliary electrode 13b, which is electrically connected to the first electrodes 121b of the light-emitting diode chips 12b.

如圖6所示,與實施例2相同地,實施例3之發光二極體晶圓檢測方法中所提供之發光二極體晶圓10b中,該等第一電極121b係彼此連結以形成一第一電極層124b,且該發光二極體晶圓10b僅包含一個輔助電極13b。 As shown in FIG. 6 , in the light-emitting diode wafer 10b provided in the light-emitting diode wafer inspection method of the third embodiment, the first electrodes 121b are connected to each other to form a The first electrode layer 124b, and the light-emitting diode wafer 10b includes only one auxiliary electrode 13b.

特別地,如圖6所示,實施例3之發光二極體晶圓檢測方法中所提供之發光二極體晶圓10b中,該發光二極體晶圓10b係包含一主體區域31以及一外圍區域33,該等發光二極體晶片10b中的主體結構122b及第二電極123b係設置於該主體區域31中;且該第一電極層124b係自該主體區域31延伸至該外圍區域33;且該輔助電極13b係設置於該第一電極層124中位於該外圍區域33的部分上。 In particular, as shown in FIG. 6 , in the LED wafer 10 b provided in the LED wafer inspection method of Embodiment 3, the LED wafer 10 b includes a main body region 31 and a The peripheral area 33, the main body structure 122b and the second electrode 123b in the light-emitting diode chips 10b are disposed in the main area 31; and the first electrode layer 124b extends from the main area 31 to the peripheral area 33 ; and the auxiliary electrode 13b is disposed on the portion of the first electrode layer 124 located in the peripheral region 33 .

相較於實施例2,實施例3之發光二極體晶圓檢測方法中所提供之發光二極體晶圓10b中,該輔助電極13b係設置於該第一電極層124中位於該外圍區域33的部分上,可減少因輔助電極13b與第二電極123b之間意外地電性連接而形成短路的風險。 Compared with Embodiment 2, in the LED wafer 10b provided in the LED wafer inspection method of Embodiment 3, the auxiliary electrode 13b is disposed in the first electrode layer 124 and located in the peripheral region 33 , the risk of short circuit due to accidental electrical connection between the auxiliary electrode 13b and the second electrode 123b can be reduced.

綜合上述,本發明之發光二極體晶圓檢測方法能透過於所提供之發光二極體晶圓中設置至少一輔助電極,以使得本發明的發光二極體晶圓檢測方法可以於第二電極以及輔助電極兩者之間施加電壓以提供電源給該等發光 二極體晶片,藉此對發光二極體晶圓進行光學檢測,無需將發光二極體晶片先從發光二極體晶圓上切割下來,可大幅提升檢測效率。 To sum up the above, the LED wafer inspection method of the present invention can provide at least one auxiliary electrode in the provided LED wafer, so that the LED wafer inspection method of the present invention can be used in the second A voltage is applied between the electrodes and the auxiliary electrode to provide power to the light-emitting The diode chip is used to perform optical inspection on the light emitting diode wafer without cutting the light emitting diode chip from the light emitting diode wafer first, which can greatly improve the inspection efficiency.

上述實施例僅例示性說明本發明,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修飾與改變。因此,本發明之權利保護範圍,應如後述之申請專利範圍所載。 The above-mentioned embodiments are only used to illustrate the present invention, but not to limit the present invention. Any person skilled in the art can modify and change the above embodiments without departing from the spirit and scope of the present invention. Therefore, the protection scope of the right of the present invention should be as set forth in the patent application scope described later.

S101:步驟 S101: Steps

S102:步驟 S102: Steps

S103:步驟 S103: Steps

Claims (9)

一種發光二極體晶圓檢測方法,其包括:提供一發光二極體晶圓,該發光二極體晶圓包括:一晶圓基底;多個發光二極體晶片,其係設置在該晶圓基底上,其中,每一發光二極體晶片包含:一第一電極,其係設置於該晶圓基底之上;一主體結構,其係設置於該第一電極之上;及一第二電極,其係設置於該主體結構之上;以及至少一輔助電極,其係與該等發光二極體晶片的第一電極電性連接,且不與該等發光二極體晶片的第二電極電性連接;於該等發光二極體晶片中,多個主體結構之間係彼此間隔;多個第二電極之間係彼此間隔;且各個第一電極係至少部分未被設置於其上的主體結構及第二電極所覆蓋;提供電源給該等發光二極體晶片;以及對該等發光二極體晶片所產生的光源進行光學檢測。 A method for detecting a light-emitting diode wafer, comprising: providing a light-emitting diode wafer, the light-emitting diode wafer comprising: a wafer base; a plurality of light-emitting diode chips, which are arranged on the wafer On a circular base, wherein each light-emitting diode chip includes: a first electrode, which is disposed on the wafer base; a main body structure, which is disposed on the first electrode; and a second electrode electrodes, which are disposed on the main body structure; and at least one auxiliary electrode, which is electrically connected to the first electrodes of the light-emitting diode chips and not connected to the second electrodes of the light-emitting diode chips In the light-emitting diode chips, a plurality of main structures are spaced apart from each other; a plurality of second electrodes are spaced apart from each other; and each of the first electrodes is at least partially not disposed thereon The main structure and the second electrode are covered; the power is supplied to the light-emitting diode chips; and the light sources generated by the light-emitting diode chips are optically detected. 如請求項1所述的發光二極體晶圓檢測方法,其中,於該等發光二極體晶片中,多個第一電極之間係彼此間隔,且每一發光二極體晶片的第一電極中未被設置於其上的主體結構及第二電極所覆蓋的部分係分別設置有一輔助電極。 The light-emitting diode wafer inspection method according to claim 1, wherein, in the light-emitting diode wafers, a plurality of first electrodes are spaced apart from each other, and the first electrodes of each light-emitting diode wafer are An auxiliary electrode is respectively provided on the part of the electrode that is not covered by the main structure and the second electrode. 如請求項1所述的發光二極體晶圓檢測方法,其中,於該等發光二極體晶片中,該等第一電極係彼此連結以形成一第一電極層,且該發光二極體晶圓僅包含一個輔助電極。 The light-emitting diode wafer inspection method of claim 1, wherein, in the light-emitting diode wafers, the first electrodes are connected to each other to form a first electrode layer, and the light-emitting diode wafers The wafer contains only one auxiliary electrode. 如請求項3所述的發光二極體晶圓檢測方法,其中,該輔助電極係設置於二個發光二極體晶片之間。 The light-emitting diode wafer inspection method according to claim 3, wherein the auxiliary electrode is disposed between two light-emitting diode wafers. 如請求項3所述的發光二極體晶圓檢測方法,其中,該發光二極體晶圓係包含一主體區域以及一外圍區域,該等發光二極體晶片中的主體結構及第二電極係設置於該主體區域中;且該第一電極層係自該主體區域延伸至該外圍區域;且該輔助電極係設置於該第一電極層中位於該外圍區域的部分上。 The light-emitting diode wafer inspection method according to claim 3, wherein the light-emitting diode wafer system comprises a main body region and a peripheral region, the main body structure and the second electrode in the light-emitting diode wafers and the first electrode layer is extended from the main body region to the peripheral region; and the auxiliary electrode is arranged on the part of the first electrode layer which is located in the peripheral region. 如請求項1至5中任一項所述的發光二極體晶圓檢測方法,其中,該等第二電極及該或該等輔助電極之上表面係位於與該晶圓基底平行之一平面上。 The light-emitting diode wafer inspection method according to any one of claims 1 to 5, wherein the upper surfaces of the second electrodes and the auxiliary electrode(s) are located on a plane parallel to the wafer substrate superior. 如請求項1所述的發光二極體晶圓檢測方法,其中,該等發光二極體晶片是透過使用一導電探針模組而得到電源供應。 The light-emitting diode wafer inspection method of claim 1, wherein the light-emitting diode wafers are powered by using a conductive probe module. 如請求項7所述的發光二極體晶圓檢測方法,其中,該導電探針模組包含:一基板;多個第一導電探針,其係自該基板之下表面向下延伸,且該等第一導電探針的位置係分別對應該等第二電極;以及至少一第二導電探針,其係自該基板之下表面向下延伸,且該或該等第二導電探針的位置係分別對應該或該等輔助電極。 The LED wafer inspection method according to claim 7, wherein the conductive probe module comprises: a substrate; a plurality of first conductive probes extending downward from the lower surface of the substrate, and The positions of the first conductive probes correspond to the second electrodes respectively; and at least one second conductive probe extends downward from the lower surface of the substrate, and the or the second conductive probes are The positions correspond to the auxiliary electrode(s), respectively. 如請求項1所述的發光二極體晶圓檢測方法,其中,該光學檢測至少包括發光檢測、亮度檢測以及色座標檢測。 The light-emitting diode wafer inspection method according to claim 1, wherein the optical inspection at least includes light emission inspection, brightness inspection, and color coordinate inspection.
TW110139080A 2020-12-31 2021-10-21 Light-emitting diode wafer inspection method TWI765834B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TW109147050 2020-12-31
TW109147050 2020-12-31

Publications (2)

Publication Number Publication Date
TWI765834B true TWI765834B (en) 2022-05-21
TW202228221A TW202228221A (en) 2022-07-16

Family

ID=82594524

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110139080A TWI765834B (en) 2020-12-31 2021-10-21 Light-emitting diode wafer inspection method

Country Status (1)

Country Link
TW (1) TWI765834B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201440265A (en) * 2013-04-10 2014-10-16 Neobulb Technologies Inc LED component by integrating epitaxial structure and package substrate together and method of manufacturing the same
TW201839872A (en) * 2017-04-17 2018-11-01 旺矽科技股份有限公司 Testing method for micro-led wafer
TWM578381U (en) * 2018-12-17 2019-05-21 惠特科技股份有限公司 Measuring device for array type lighting unit

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201440265A (en) * 2013-04-10 2014-10-16 Neobulb Technologies Inc LED component by integrating epitaxial structure and package substrate together and method of manufacturing the same
TW201839872A (en) * 2017-04-17 2018-11-01 旺矽科技股份有限公司 Testing method for micro-led wafer
TWM578381U (en) * 2018-12-17 2019-05-21 惠特科技股份有限公司 Measuring device for array type lighting unit

Also Published As

Publication number Publication date
TW202228221A (en) 2022-07-16

Similar Documents

Publication Publication Date Title
TWI610465B (en) Light-emitting diode assembly and manufacturing method thereof
US7732825B2 (en) AC light emitting diode
TWI470823B (en) Light-emitting device and manufacturing method thereof
TWI480962B (en) Light-emitting diode package and wafer-level packaging process of a light-emitting diode
JP2010147189A (en) Light-emitting device
US20070287223A1 (en) Light emitting diode and method for improving luminescence efficiency of light emitting diode
US20110284883A1 (en) Semiconductor light-emitting element, light-emitting device, luminaire, display unit, traffic signal lamp unit, and traffic information display unit
TWI444633B (en) Semiconductor light emitting diode chip, method of manufacturing thereof and method for quality control thereof
TW200905910A (en) Light emitting device
US10680133B2 (en) Light-emitting device and manufacturing method thereof
US20120125169A1 (en) Semiconductor light-emitting device measurement apparatus
JP7273280B2 (en) Light-emitting module and method for manufacturing light-emitting module
TWI765834B (en) Light-emitting diode wafer inspection method
CN113257971B (en) Manufacturing method of red light mini-LED chip
KR20050060479A (en) Light emitting diode lighting apparatus and manufacturing method thereof
US20130130417A1 (en) Manufacturing method of a light-emitting device
TW202117353A (en) Led wafer, and led wafer detection device and method
TWI747418B (en) Magnetic light-emitting structure and manufacturing method of magnetic light-emitting element
US9534747B2 (en) Light-emitting diode assembly and fabrication method thereof
CN107393428A (en) Structure and process of electrodeless shading light-emitting diode display
JP5232027B2 (en) Light emitting device
TWI751807B (en) Vertical light-emitting diode structure with high current dispersion and high reliability
WO2014169720A1 (en) Light-emitting diode and manufacturing method therefor
KR20090087374A (en) Light emitting diode and package thereof
CN101494258B (en) Light-emitting element, backlight module apparatus and lighting device