TWI764436B - Heat treatment device - Google Patents

Heat treatment device

Info

Publication number
TWI764436B
TWI764436B TW109144287A TW109144287A TWI764436B TW I764436 B TWI764436 B TW I764436B TW 109144287 A TW109144287 A TW 109144287A TW 109144287 A TW109144287 A TW 109144287A TW I764436 B TWI764436 B TW I764436B
Authority
TW
Taiwan
Prior art keywords
rotating
rotating ring
heat treatment
treatment device
lifting
Prior art date
Application number
TW109144287A
Other languages
Chinese (zh)
Other versions
TW202225623A (en
Inventor
周昭昌
林翰佳
Original Assignee
國立臺灣海洋大學
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 國立臺灣海洋大學 filed Critical 國立臺灣海洋大學
Priority to TW109144287A priority Critical patent/TWI764436B/en
Priority to CN202110080188.5A priority patent/CN114636311B/en
Application granted granted Critical
Publication of TWI764436B publication Critical patent/TWI764436B/en
Publication of TW202225623A publication Critical patent/TW202225623A/en

Links

Images

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D3/00Charging; Discharging; Manipulation of charge
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D5/00Supports, screens, or the like for the charge within the furnace
    • F27D5/0006Composite supporting structures
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D3/00Charging; Discharging; Manipulation of charge
    • F27D2003/0034Means for moving, conveying, transporting the charge in the furnace or in the charging facilities
    • F27D2003/0075Charging or discharging vertically, e.g. through a bottom opening
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D3/00Charging; Discharging; Manipulation of charge
    • F27D2003/0085Movement of the container or support of the charge in the furnace or in the charging facilities
    • F27D2003/0087Rotation about a vertical axis

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Furnace Details (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)

Abstract

一種熱處理裝置,適用於加熱一工件,其包含一加熱爐、一升降機構、一承載單元及一旋轉機構。加熱爐具有一出入口。升降機構設置於該加熱爐,並包括一可上下活動的升降支架,該升降支架具有一安裝孔。承載單元可旋轉地設置於該升降支架並穿過該安裝孔,適用於承載該工件。旋轉機構可活動地設置於該升降支架,該旋轉機構用以驅動該承載單元旋轉。升降機構可帶動該承載單元位移經由該出入口進入該加熱爐內,且進入該加熱爐的過程中,該旋轉機構驅動該承載單元持續地旋轉。A heat treatment device is suitable for heating a workpiece, which comprises a heating furnace, a lifting mechanism, a bearing unit and a rotating mechanism. The heating furnace has an entrance and exit. The lifting mechanism is arranged on the heating furnace, and includes a lifting bracket that can move up and down, and the lifting bracket has an installation hole. The carrying unit is rotatably arranged on the lifting bracket and passes through the mounting hole, and is suitable for carrying the workpiece. The rotating mechanism is movably arranged on the lifting bracket, and the rotating mechanism is used for driving the bearing unit to rotate. The lifting mechanism can drive the carrying unit to move into the heating furnace through the entrance and exit, and during the process of entering the heating furnace, the rotating mechanism drives the carrying unit to rotate continuously.

Description

熱處理裝置Heat treatment device

本發明是有關於一種熱處理裝置,特別是指一種能使工件受熱均勻的熱處理裝置。 The present invention relates to a heat treatment device, in particular to a heat treatment device that can heat a workpiece uniformly.

現有的加熱裝置例如烤箱對金屬、有機材料的加熱過程中,通常有兩種問題會影響或限制產品的功能特性與品質的均勻性。其中之一是材料被加熱時溫度的控制與受熱的均勻性,另一個問題則是加熱過程的氣氛條件受限於大氣,例如材料常在升溫過程就開始產生局部氧化反應,或無法完全控制氧化物的產生。因此,尚有改良的空間。 In the process of heating metal and organic materials by existing heating devices such as ovens, there are usually two problems that affect or limit the uniformity of functional properties and quality of products. One of them is the temperature control and the uniformity of heating when the material is heated. Another problem is that the atmospheric conditions of the heating process are limited by the atmosphere. For example, the material often begins to produce local oxidation reactions during the heating process, or the oxidation cannot be completely controlled. production of things. Therefore, there is still room for improvement.

因此,本發明之目的,即在提供一種能解決上述問題的熱處理裝置。 Therefore, the object of the present invention is to provide a heat treatment apparatus that can solve the above problems.

於是,本發明熱處理裝置適用於加熱一工件,該熱處理裝置包含一加熱爐,具有一出入口;一升降機構,設置於該加熱爐上方,並包括一可上下活動的升降支架,該升降支架具有一安裝孔;一承載單元,可旋轉地設置於該升降支架並穿過該安裝孔,適用於承載該工件;及一旋轉機構,可活動地設 置於該升降支架,該旋轉機構用以驅動該承載單元旋轉;該升降機構可帶動該承載單元向下位移經由該出入口進入該加熱爐內,且進入該加熱爐的過程中,該旋轉機構驅動該承載單元持續地旋轉。 Therefore, the heat treatment device of the present invention is suitable for heating a workpiece, and the heat treatment device includes a heating furnace with an entrance and exit; a lifting mechanism arranged above the heating furnace and including a lifting bracket that can move up and down, and the lifting bracket has a a mounting hole; a bearing unit, rotatably arranged on the lifting bracket and passing through the mounting hole, suitable for bearing the workpiece; and a rotating mechanism, movably arranged Placed on the lifting bracket, the rotating mechanism is used to drive the bearing unit to rotate; the lifting mechanism can drive the bearing unit to move downward through the entrance and exit into the heating furnace, and during the process of entering the heating furnace, the rotating mechanism drives The carrier unit rotates continuously.

在一些實施態樣中,該承載單元包括一設置於該升降支架的該安裝孔的軸承件及一設置於該軸承件上方的上蓋件。 In some embodiments, the bearing unit includes a bearing member disposed in the mounting hole of the lifting bracket and an upper cover member disposed above the bearing member.

在一些實施態樣中,該旋轉機構包括一可旋轉地設置於該上蓋件上方的一第一旋轉環,該承載單元還包括一可旋轉地設置於該上蓋件下方的第二旋轉環及一固接該第二旋轉環向下延伸的內筒,該第一旋轉環及該第二旋轉環皆嵌設有多個彼此間隔排列的磁吸塊,該第一旋轉環可被驅動而旋轉,進而帶動該第二旋轉環及該內筒旋轉。 In some embodiments, the rotating mechanism includes a first rotating ring rotatably disposed above the upper cover, the carrying unit further includes a second rotating ring rotatably disposed below the upper cover, and a The inner cylinder extending downwards of the second rotating ring is fixedly connected, the first rotating ring and the second rotating ring are both embedded with a plurality of magnetic attraction blocks arranged at intervals from each other, the first rotating ring can be driven to rotate, Then, the second rotating ring and the inner cylinder are driven to rotate.

在一些實施態樣中,該承載單元還包括一固設於該軸承件下方的外筒,該內筒位於該外筒內部。 In some embodiments, the bearing unit further includes an outer cylinder fixed below the bearing member, and the inner cylinder is located inside the outer cylinder.

在一些實施態樣中,該旋轉機構還包括一固接於該第一旋轉環外周面的齒輪環、一設置於該升降支架的旋轉馬達及一連接該旋轉馬達的驅動軸,該驅動軸末端設有螺紋並與該齒輪環嚙合,該旋轉馬達可驅動該驅動軸轉動,進而帶動該齒輪環及該第一旋轉環旋轉。 In some embodiments, the rotating mechanism further includes a gear ring fixed on the outer peripheral surface of the first rotating ring, a rotating motor disposed on the lifting bracket, and a drive shaft connected to the rotating motor, the end of the drive shaft is A thread is provided and meshed with the gear ring, and the rotary motor can drive the drive shaft to rotate, thereby driving the gear ring and the first rotating ring to rotate.

在一些實施態樣中,該上蓋件具有一套筒部及一自該套筒部向外延伸的盤體部,該第一旋轉環可旋轉地套設於該套筒部並位於該盤體部上方,該第二旋轉環可旋轉地套設於該套筒部並位於該盤體部下方,該盤體部固接該軸承件。 In some embodiments, the upper cover has a sleeve portion and a disk body portion extending outward from the sleeve portion, and the first rotating ring is rotatably sleeved on the sleeve portion and located on the disk body Above the part, the second rotating ring is rotatably sleeved on the sleeve part and is located under the disc body part, and the disc body part is fixed to the bearing part.

在一些實施態樣中,該套筒部具有一頂壁及自該頂壁向下延伸的圍壁,該盤體部自該圍壁向外延伸。 In some embodiments, the sleeve portion has a top wall and a surrounding wall extending downward from the top wall, and the disk portion extends outward from the surrounding wall.

在一些實施態樣中,該頂壁形成有兩個彼此間隔的通氣孔及一與該等通氣孔相間隔的穿孔,該承載單元還包括一穿設於該穿孔的溫度量測件、一穿設其中一該通氣孔的輸氣管及一穿設其中另一該通氣孔的排氣管。 In some embodiments, the top wall is formed with two ventilation holes spaced apart from each other and a through hole spaced apart from the ventilation holes, and the carrying unit further includes a temperature measuring member pierced through the through hole, a through hole One of the air pipes is provided with the ventilation holes and an exhaust pipe is provided with the other of the ventilation holes.

在一些實施態樣中,還包含一基座及一連接該基座的擺動機構,該升降機構還包括一供該升降支架上下活動地設置的升降軌道件,該基座供該加熱爐及該升降軌道件設置,該擺動機構用以帶動該基座相對於水平方向擺動。 In some embodiments, a base and a swing mechanism connected to the base are further included, the lifting mechanism further includes a lifting rail member for the lifting bracket to be movably arranged up and down, the base is used for the heating furnace and the The lifting rail is provided, and the swing mechanism is used to drive the base to swing relative to the horizontal direction.

在一些實施態樣中,該基座包括一供該加熱爐及該升降軌道件設置的基板及一對設置於該基板側邊向上延伸的側板,該擺動機構包括一底板、一對設置於底板向上延伸分別連接該等側板的立板及一穿設該等立板、該等側板及該基板的轉軸,該轉軸可被操作旋轉,以帶動該基座相對於該等立板擺動。 In some embodiments, the base includes a base plate on which the heating furnace and the lifting rail are disposed, and a pair of side plates disposed on sides of the base plate and extending upward, and the swing mechanism includes a bottom plate and a pair of side plates disposed on the bottom plate. Uprights extending upwards are respectively connected to the side plates and a rotating shaft passing through the vertical plates, the side plates and the base plate. The rotating shaft can be operated and rotated to drive the base to swing relative to the vertical plates.

本發明至少具有以下功效:藉由該旋轉機構的設置,使得該升降機構在帶動該承載單元向下位移經由該出入口進入該加熱爐內進行加熱的過程中,該承載單元是持續地旋轉,如此便能確保在該承載單元內的工件均勻地受熱。 The present invention has at least the following effects: through the setting of the rotating mechanism, the lifting mechanism drives the bearing unit to move downward through the inlet and outlet into the heating furnace for heating, the bearing unit is continuously rotated, so This ensures that the workpieces in the carrier unit are uniformly heated.

1:基座 1: Base

11:基板 11: Substrate

12:側板 12: Side panels

13:後擋板 13: Tailgate

2:加熱爐 2: Heating furnace

21:出入口 21: Entrance and exit

3:升降機構 3: Lifting mechanism

31:升降軌道件 31: Lifting track pieces

32:升降支架 32: Lifting bracket

321:安裝孔 321: Mounting holes

33:安裝架 33: Mounting bracket

4:承載單元 4: Bearing unit

41:軸承件 41: Bearing parts

42:上蓋件 42: upper cover

421:套筒部 421: Sleeve Department

421a:頂壁 421a: Top Wall

421a1:通氣孔 421a1: Air vent

421a2:穿孔 421a2: Perforation

421b:圍壁 421b: Walls

422:盤體部 422: Disc Body

423:第一旋轉軸承 423: First rotary bearing

424:第二旋轉軸承 424: Second rotary bearing

43:第二旋轉環 43: Second rotating ring

431:磁吸塊 431: Magnetic block

44:內筒 44: inner cylinder

45:外筒 45: outer cylinder

451:容置腔 451: accommodating cavity

46:溫度量測件 46: Temperature measuring piece

47:排氣管 47: Exhaust pipe

48:輸氣管 48: Air pipe

5:旋轉機構 5: Rotary mechanism

51:第一旋轉環 51: The first rotating ring

511:本體部 511: Body part

512:上蓋部 512: Upper cover

513:磁吸塊 513: Magnetic block

52:齒輪環 52: Gear ring

53:旋轉馬達 53: Rotary Motor

54:驅動軸 54: Drive shaft

6:擺動機構 6: Swing mechanism

61:底板 61: Bottom plate

62:立板 62: Vertical plate

63:轉軸 63: Spindle

本發明之其他的特徵及功效,將於參照圖式的實施方式中清楚地 呈現,其中:圖1是本發明熱處理裝置的一實施例的一立體示意圖;圖2是該實施例的一承載單元及一旋轉機構的一立體分解圖;圖3是由圖1的剖線III-III得出的一剖視圖;圖4是圖3的一局部放大圖;及圖5是類似於圖3的剖視圖,說明一升降機構帶動該承載單元向下移動進入一加熱爐內。 Other features and effects of the present invention will be made clear in the embodiments with reference to the drawings Present, wherein: FIG. 1 is a schematic perspective view of an embodiment of the heat treatment device of the present invention; FIG. 2 is a perspective exploded view of a carrying unit and a rotating mechanism of the embodiment; FIG. 3 is a section line III of FIG. 1 A cross-sectional view derived from -III; FIG. 4 is a partial enlarged view of FIG. 3 ; and FIG. 5 is a cross-sectional view similar to FIG. 3 , illustrating that a lifting mechanism drives the carrying unit to move downward into a heating furnace.

參閱圖1,本發明熱處理裝置之一實施例,適用於加熱一工件(圖未示),該工件可例如為金屬或是有機溶劑。該熱處理裝置包含一基座1、一加熱爐2、一升降機構3、一承載單元4、一旋轉機構5及一擺動機構6。 Referring to FIG. 1 , an embodiment of the heat treatment apparatus of the present invention is suitable for heating a workpiece (not shown), and the workpiece may be, for example, a metal or an organic solvent. The heat treatment device includes a base 1 , a heating furnace 2 , a lifting mechanism 3 , a bearing unit 4 , a rotating mechanism 5 and a swing mechanism 6 .

參閱圖1及圖2,該基座1包括一水平延伸的基板11、一對設置於該基板11側邊向上延伸的側板12及一自遠離該加熱爐2的側邊向上延伸的後擋板13。該等側板12大致呈半圓形,用以連接該擺動機構6。該加熱爐2設置於該基板11,並具有一朝上開口呈圓形的出入口21。 Referring to FIGS. 1 and 2 , the base 1 includes a horizontally extending base plate 11 , a pair of side plates 12 disposed on the side of the base plate 11 and extending upward, and a rear baffle extending upward from the side away from the heating furnace 2 13. The side plates 12 are roughly semicircular and are used for connecting the swing mechanism 6 . The heating furnace 2 is disposed on the base plate 11 and has a circular opening 21 that opens upward.

升降機構3設置於該基座1的該基板11上,包括一設置於該基板11及該後擋板13的升降軌道件31、一可上下活動地設置於該升降軌道件31的升降支架32及一固接於該升降支架32的安裝架33。該升降支架32大致呈L型,並具有一安裝孔321。該安裝架33大致呈Z形。 The lifting mechanism 3 is disposed on the base plate 11 of the base 1 , and includes a lifting rail member 31 disposed on the base plate 11 and the rear baffle 13 , and a lifting bracket 32 movably disposed on the lifting rail member 31 up and down. and a mounting bracket 33 fixed to the lifting bracket 32 . The lift bracket 32 is substantially L-shaped and has a mounting hole 321 . The mounting bracket 33 is substantially Z-shaped.

參閱圖2至圖4,承載單元4可旋轉地設置於該升降支架32並穿過該安裝孔321,適用於承載該工件(圖未示)。該承載單元4包括一設置於該升降支架32的該安裝孔321的軸承件41、一設置於該軸承件41上方的上蓋件42、一可旋轉地設置於該上蓋件42下方的第二旋轉環43、一固接該第二旋轉環43向下延伸的內筒44及一固設於該軸承件41下方供該內筒44容置的外筒45。 Referring to FIGS. 2 to 4 , the carrying unit 4 is rotatably disposed on the lifting bracket 32 and passes through the mounting hole 321 , and is suitable for carrying the workpiece (not shown). The bearing unit 4 includes a bearing member 41 disposed in the mounting hole 321 of the lifting bracket 32 , an upper cover member 42 disposed above the bearing member 41 , and a second rotating member rotatably disposed below the upper cover member 42 The ring 43 , an inner cylinder 44 extending downwards fixedly connected to the second rotating ring 43 , and an outer cylinder 45 fixed below the bearing member 41 for the inner cylinder 44 to be accommodated.

旋轉機構5可活動地設置於該升降支架32,用以驅動該承載單元4旋轉的內筒44旋轉。該旋轉機構5包括一可旋轉地設置於該上蓋件42上方的一第一旋轉環51、一固接於該第一旋轉環51外周面的齒輪環52、一設置於該升降支架32的旋轉馬達53及一連接該旋轉馬達53的驅動軸54。 The rotating mechanism 5 is movably disposed on the lifting bracket 32 to drive the inner cylinder 44 of the bearing unit 4 to rotate. The rotating mechanism 5 includes a first rotating ring 51 rotatably disposed above the upper cover 42 , a gear ring 52 fixed on the outer peripheral surface of the first rotating ring 51 , and a rotating ring 52 disposed on the lifting bracket 32 . The motor 53 and a drive shaft 54 connected to the rotary motor 53 .

該上蓋件42具有一套筒部421及一自該套筒部421向外延伸的盤體部422。該第一旋轉環51可旋轉地套設於該套筒部421並位於該盤體部422上方,該第二旋轉環43可旋轉地套設於該套筒部421並位於該盤體部422下方,該第一旋轉環51及該套筒部421之間設有一第一旋轉軸承423,使該第一旋轉環51能夠相對於該套筒部421定位而不會晃動或水平位移,並以該套筒部421為軸心旋轉。同樣地,該第二旋轉環43及該套筒部421之間設有一第二旋轉軸承424,使該第二旋轉環43能夠在垂直及水平方向上定位於該套筒部421並以該套筒部421為軸心旋轉。在本實施例中,該第一旋轉軸承423及該第二旋轉軸承424是選用滾珠軸承,但不以此為限。該盤體部422是以螺絲鎖固的方式固接於該軸承件41上方。該軸承件41、該上蓋件42、該第二旋轉環43及該外筒45共同界定出一氣密的容置腔451。該第二旋轉環43嵌設有多個磁吸塊431。該套筒部421 具有一頂壁421a及自該頂壁421a向下延伸的圍壁421b,該頂壁421a形成有兩個彼此間隔的通氣孔421a1及一與該等通氣孔421a1相間隔的穿孔421a2。該內筒44為一網狀結構,是作為容置該工件的承載台,該內筒44可供氣體流動,避免該加熱爐2所給予的熱能被阻隔於該外筒45及該內筒44之間。該承載單元4還包括一穿設於該穿孔421a2的溫度量測件46、一穿設其中一該通氣孔421a1的輸氣管48及一穿設其中另一該通氣孔421a1的排氣管47。該溫度量測件46可例如為一熱電偶,用以量測該工件的溫度。該輸氣管48係連接一外部氣源(圖未示),用以對該容置腔451灌入惰性氣體,例如氮氣或氬氣。該排氣管47係連接一幫浦(圖未示),用以將該容置腔451抽氣至真空狀態。藉由該外筒45、該輸氣管48及該排氣管47的設置,該工件能於進入該加熱爐2前進行氣體條件的調整,可以增加通氣程序上的彈性,意即通氣程序及加熱程序能夠分開進行。 The upper cover 42 has a sleeve portion 421 and a disk portion 422 extending outward from the sleeve portion 421 . The first rotating ring 51 is rotatably sleeved on the sleeve portion 421 and located above the disk body portion 422 , and the second rotating ring 43 is rotatably sleeved on the sleeve portion 421 and located on the disk body portion 422 . Below, a first rotating bearing 423 is disposed between the first rotating ring 51 and the sleeve portion 421, so that the first rotating ring 51 can be positioned relative to the sleeve portion 421 without shaking or horizontal displacement, and The sleeve portion 421 rotates around the axis. Similarly, a second rotating bearing 424 is disposed between the second rotating ring 43 and the sleeve portion 421, so that the second rotating ring 43 can be positioned on the sleeve portion 421 in the vertical and horizontal directions and the sleeve The cylindrical portion 421 rotates around the axis. In this embodiment, the first rotating bearing 423 and the second rotating bearing 424 are ball bearings, but not limited thereto. The disk body portion 422 is fixed above the bearing member 41 by means of screw locking. The bearing member 41 , the upper cover member 42 , the second rotating ring 43 and the outer cylinder 45 together define an airtight accommodating cavity 451 . The second rotating ring 43 is embedded with a plurality of magnetic attraction blocks 431 . The sleeve portion 421 The top wall 421a has a top wall 421a and a surrounding wall 421b extending downward from the top wall 421a. The top wall 421a is formed with two ventilation holes 421a1 spaced apart from each other and a through hole 421a2 spaced apart from the ventilation holes 421a1. The inner cylinder 44 is a net-like structure and serves as a bearing platform for accommodating the workpiece. The inner cylinder 44 can be used for gas flow to prevent the heat energy given by the heating furnace 2 from being blocked by the outer cylinder 45 and the inner cylinder 44 between. The carrying unit 4 further includes a temperature measuring member 46 penetrated through the through hole 421a2, an air delivery pipe 48 through one of the ventilation holes 421a1, and an exhaust pipe 47 through the other of the ventilation holes 421a1. The temperature measuring element 46 can be, for example, a thermocouple for measuring the temperature of the workpiece. The gas pipe 48 is connected to an external gas source (not shown) for filling the accommodating cavity 451 with inert gas, such as nitrogen gas or argon gas. The exhaust pipe 47 is connected to a pump (not shown) for evacuating the accommodating chamber 451 to a vacuum state. With the arrangement of the outer cylinder 45, the gas pipe 48 and the exhaust pipe 47, the workpiece can adjust the gas conditions before entering the heating furnace 2, which can increase the flexibility of the ventilation process, that is, the ventilation process and the heating process. Procedures can be performed separately.

該第一旋轉環51具有一本體部511及一連接該本體部511上表面的上蓋部512,該本體部511嵌設有多個磁吸塊513。該驅動軸54末端設有螺紋並與該齒輪環52嚙合,該旋轉馬達53設置於該安裝架33上,並可驅動該驅動軸54轉動,進而帶動該齒輪環52及該第一旋轉環51旋轉。該第一旋轉環51與該第二旋轉環43之間藉由該等磁吸塊431、513的磁吸力使得該第一旋轉環51旋轉時將同步帶動該第二旋轉環43及該內筒44旋轉。在本實施例中,該第一旋轉環51與該第二旋轉環43是設置成上下相對,但並不以此態樣為限制,在其他實施例中也可以設置成內外相對,例如該第一旋轉環51在外圈,該第二旋轉環43在內圈,同樣能夠藉由該等磁吸塊431、513的磁吸力使得該第一旋轉環51旋轉時將 同步帶動該第二旋轉環43及該內筒44旋轉。 The first rotating ring 51 has a body portion 511 and an upper cover portion 512 connected to the upper surface of the body portion 511 . A plurality of magnetic attraction blocks 513 are embedded in the body portion 511 . The end of the drive shaft 54 is threaded and meshed with the gear ring 52 . The rotary motor 53 is disposed on the mounting frame 33 and can drive the drive shaft 54 to rotate, thereby driving the gear ring 52 and the first rotating ring 51 rotate. The magnetic attraction between the first rotating ring 51 and the second rotating ring 43 makes the rotation of the first rotating ring 51 drive the second rotating ring 43 and the inner cylinder synchronously due to the magnetic attraction force of the magnetic attraction blocks 431 and 513 44 spins. In this embodiment, the first rotating ring 51 and the second rotating ring 43 are arranged to be opposite to each other up and down, but this is not a limitation. A rotating ring 51 is on the outer ring, the second rotating ring 43 is on the inner ring, and the first rotating ring 51 can be rotated by the magnetic attraction force of the magnetic attraction blocks 431 and 513. The second rotating ring 43 and the inner cylinder 44 are driven to rotate synchronously.

參閱圖1,擺動機構6用以帶動該基座1相對於水平方向擺動。該擺動機構6包括一底板61、一對設置於底板61向上延伸分別連接該等側板12的立板62及一穿設該等立板62、該等側板12及該基板11的轉軸63。該轉軸63可被操作旋轉,以帶動該基座1相對於該等立板62擺動。 Referring to FIG. 1 , the swing mechanism 6 is used to drive the base 1 to swing relative to the horizontal direction. The swing mechanism 6 includes a bottom plate 61 , a pair of vertical plates 62 extending upward from the bottom plate 61 and connecting the side plates 12 respectively, and a rotating shaft 63 passing through the vertical plates 62 , the side plates 12 and the base plate 11 . The rotating shaft 63 can be operated and rotated to drive the base 1 to swing relative to the vertical plates 62 .

參閱圖1、圖3及圖5,本發明熱處理裝置的操作過程如下:先將工件置於該內筒44中,再將該內筒44與該第二旋轉環43組裝固定。接著透過該排氣管47將容置腔451內抽真空後,再透過該輸氣管48朝該容置腔451灌入惰性氣體,以避免工件在加熱的過程中產生局部氧化的現象。最後該升降機構3便帶動該承載單元4向下位移經由該出入口21進入該加熱爐2內進行加熱,在移動的過程中承載著該工件的該內筒44是持續地旋轉,確保該工件在該容置腔451內均勻地受熱。待經過一預定加熱時間後,該升降機構3便帶動該承載單元4向上位移經由該出入口21離開該加熱爐2,如此便完成對工件加熱的流程。藉由該升降機構3帶動該承載單元4上下位移,便能夠精準地控制該預定加熱時間。需要說明的是,若工件為有機溶液,會先以一容器(圖未示)裝盛後再放置於該內筒44,藉由擺動機構6帶動該基座1及該承載單元4相對於水平方向擺動,可增加有機溶液內容物上下層的攪拌效果。其中,有機溶液例如包括胺類和纖維素,它可以是乾燒,也可以混合帶有酸鹼性的水溶液來燒結,但不以此為限制。需要說明的是,當該加熱爐2開始加熱作為預熱且承載單元4未進入加熱爐2內前,可透過一擋板(圖未示)封閉該加熱爐2的出入口21,避免爐內的熱散出。且 在其他實施例中,該加熱爐2的該出入口21也可以是朝下開口,該升降機構3也能設置成帶動該承載單元4由下往上進入該加熱爐2內,並不以此為限制。 Referring to FIGS. 1 , 3 and 5 , the operation process of the heat treatment device of the present invention is as follows: first place the workpiece in the inner cylinder 44 , and then assemble the inner cylinder 44 and the second rotating ring 43 to fix it. Then, after the accommodating cavity 451 is evacuated through the exhaust pipe 47 , inert gas is poured into the accommodating cavity 451 through the gas pipe 48 to avoid local oxidation of the workpiece during the heating process. Finally, the lifting mechanism 3 drives the carrying unit 4 to move downward and enters the heating furnace 2 through the inlet 21 for heating. During the moving process, the inner cylinder 44 carrying the workpiece is continuously rotated to ensure that the workpiece is in the heating furnace 2 . The accommodating cavity 451 is heated uniformly. After a predetermined heating time has elapsed, the lifting mechanism 3 drives the carrying unit 4 to move upward and leave the heating furnace 2 through the inlet 21 , thus completing the process of heating the workpiece. The predetermined heating time can be precisely controlled by the lifting mechanism 3 driving the bearing unit 4 to move up and down. It should be noted that, if the workpiece is an organic solution, it will be filled in a container (not shown) and then placed in the inner cylinder 44, and the base 1 and the bearing unit 4 will be driven by the swing mechanism 6 to be horizontal relative to the Swing in the direction can increase the stirring effect of the upper and lower layers of the contents of the organic solution. Among them, the organic solution includes, for example, amines and cellulose, which can be dry-fired or mixed with an acid-base aqueous solution for firing, but not limited thereto. It should be noted that, when the heating furnace 2 starts to be heated as preheating and the bearing unit 4 does not enter the heating furnace 2, a baffle plate (not shown) can be used to close the entrance and exit 21 of the heating furnace 2 to prevent Heat dissipates. and In other embodiments, the entrance 21 of the heating furnace 2 can also be opened downward, and the lifting mechanism 3 can also be configured to drive the carrying unit 4 to enter the heating furnace 2 from bottom to top. limit.

綜上所述,本發明熱處理裝置藉由該旋轉機構5的設置,使得該升降機構3在帶動該承載單元4向下位移經由該出入口21進入該加熱爐2內進行加熱的過程中,該承載單元4是持續地旋轉,如此便能確保在該承載單元4內的工件均勻地受熱。再者,藉由該內筒44、該輸氣管48及該排氣管47的設置,該工件能於進入該加熱爐2前進行氣氛條件的調整,可以增加通氣程序上的彈性,意即通氣程序及加熱程序能夠分開進行,故確實能達成本發明之目的。 To sum up, the arrangement of the rotating mechanism 5 in the heat treatment device of the present invention enables the lifting mechanism 3 to drive the bearing unit 4 to move downward through the inlet 21 into the heating furnace 2 for heating. The unit 4 is continuously rotated, thus ensuring that the workpieces in the carrier unit 4 are uniformly heated. Furthermore, with the arrangement of the inner cylinder 44, the gas supply pipe 48 and the exhaust pipe 47, the workpiece can be adjusted to the atmosphere condition before entering the heating furnace 2, which can increase the flexibility of the ventilation procedure, which means ventilation. The procedure and the heating procedure can be carried out separately, so the object of the present invention can indeed be achieved.

惟以上所述者,僅為本發明之實施例而已,當不能以此限定本發明實施之範圍,凡是依本發明申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。 However, the above are only examples of the present invention, and should not limit the scope of the present invention. Any simple equivalent changes and modifications made according to the scope of the application for patent of the present invention and the content of the patent specification are still within the scope of the present invention. within the scope of the invention patent.

1:基座 1: Base

11:基板 11: Substrate

12:側板 12: Side panels

13:後擋板 13: Tailgate

2:加熱爐 2: Heating furnace

21:出入口 21: Entrance and exit

3:升降機構 3: Lifting mechanism

31:升降軌道件 31: Lifting track pieces

32:升降支架 32: Lifting bracket

321:安裝孔 321: Mounting holes

33:安裝架 33: Mounting bracket

4:承載單元 4: Bearing unit

41:軸承件 41: Bearing parts

42:上蓋件 42: upper cover

45:外筒 45: outer cylinder

46:溫度量測件 46: Temperature measuring piece

47:排氣管 47: Exhaust pipe

48:輸氣管 48: Air pipe

5:旋轉機構 5: Rotary mechanism

51:第一旋轉環 51: The first rotating ring

52:齒輪環 52: Gear ring

53:旋轉馬達 53: Rotary Motor

6:擺動機構 6: Swing mechanism

61:底板 61: Bottom plate

62:立板 62: Vertical plate

63:轉軸 63: Spindle

Claims (8)

一種熱處理裝置,適用於加熱一工件,該熱處理裝置包含:一加熱爐,具有一出入口;一升降機構,設置於該加熱爐,並包括一可上下活動的升降支架,該升降支架具有一安裝孔;一承載單元,可旋轉地設置於該升降支架並穿過該安裝孔,適用於承載該工件,該承載單元包括一設置於該升降支架的該安裝孔的軸承件、一設置於該軸承件上方的上蓋件、一可旋轉地設置於該上蓋件下方的第二旋轉環及一固接該第二旋轉環向下延伸的內筒,該第二旋轉環嵌設有多個彼此間隔排列的磁吸塊;及一旋轉機構,可活動地設置於該升降支架,該旋轉機構用以驅動該承載單元旋轉,且包括一可旋轉地設置於該上蓋件上方的一第一旋轉環,該第一旋轉環嵌設有多個彼此間隔排列的磁吸塊且可被驅動而旋轉,進而帶動該第二旋轉環及該內筒旋轉;該升降機構可帶動該承載單元位移經由該出入口進入該加熱爐內,且進入該加熱爐的過程中,該旋轉機構驅動該承載單元持續地旋轉。 A heat treatment device is suitable for heating a workpiece, the heat treatment device comprises: a heating furnace with an entrance and exit; a lifting mechanism arranged in the heating furnace and comprising a lifting bracket that can move up and down, the lifting bracket has a mounting hole ; a bearing unit, rotatably arranged on the lifting bracket and passing through the mounting hole, suitable for bearing the workpiece, the bearing unit includes a bearing member arranged in the installation hole of the lifting bracket, a bearing member arranged on the bearing member The upper cover part above, a second rotating ring rotatably arranged under the upper cover part, and an inner cylinder that is fixed to the second rotating ring and extends downward, the second rotating ring is embedded with a plurality of spaced apart from each other. a magnetic suction block; and a rotating mechanism, movably arranged on the lifting bracket, the rotating mechanism is used to drive the bearing unit to rotate, and includes a first rotating ring rotatably arranged above the upper cover, the first rotating ring A rotating ring is embedded with a plurality of magnetic attraction blocks spaced apart from each other and can be driven to rotate, thereby driving the second rotating ring and the inner cylinder to rotate; the lifting mechanism can drive the carrying unit to move through the inlet and outlet into the heating In the furnace, and in the process of entering the heating furnace, the rotating mechanism drives the carrying unit to rotate continuously. 如請求項1所述的熱處理裝置,其中,該承載單元還包括一固設於該軸承件下方的外筒,該內筒位於該外筒內部。 The heat treatment device according to claim 1, wherein the bearing unit further comprises an outer cylinder fixed under the bearing member, and the inner cylinder is located inside the outer cylinder. 如請求項1所述的熱處理裝置,其中,該旋轉機構還包括一固接於該第一旋轉環外周面的齒輪環、一設置於該升降支架的旋轉馬達及一連接該旋轉馬達的驅動軸,該驅動軸末端設有螺紋並與該齒輪環嚙合,該旋轉馬達可驅動該驅動軸轉動,進而帶動該齒輪環及該第一旋轉環旋轉。 The heat treatment device according to claim 1, wherein the rotating mechanism further comprises a gear ring fixed on the outer peripheral surface of the first rotating ring, a rotating motor disposed on the lifting bracket, and a drive shaft connected to the rotating motor The end of the drive shaft is provided with threads and meshes with the gear ring. The rotary motor can drive the drive shaft to rotate, thereby driving the gear ring and the first rotating ring to rotate. 如請求項1所述的熱處理裝置,其中,該上蓋件具有一套筒部及一自該套筒部向外延伸的盤體部,該第一旋轉環可旋轉地套設於該套筒部並位於該盤體部上方,該第二旋轉環可旋轉地套設於該套筒部並位於該盤體部下方,該盤體部固接該軸承件。 The heat treatment device according to claim 1, wherein the upper cover has a sleeve portion and a disk portion extending outward from the sleeve portion, and the first rotating ring is rotatably sleeved on the sleeve portion and located above the disc body, the second rotating ring is rotatably sleeved on the sleeve part and located below the disc body, and the disc body is fixedly connected to the bearing part. 如請求項4所述的熱處理裝置,其中,該套筒部具有一頂壁及自該頂壁向下延伸的圍壁,該盤體部自該圍壁向外延伸。 The heat treatment device of claim 4, wherein the sleeve portion has a top wall and a surrounding wall extending downward from the top wall, and the disk portion extends outward from the surrounding wall. 如請求項5所述的熱處理裝置,其中,該頂壁形成有兩個彼此間隔的通氣孔及一與該等通氣孔相間隔的穿孔,該承載單元還包括一穿設於該穿孔的溫度量測件、一穿設其中一該通氣孔的輸氣管及一穿設其中另一該通氣孔的排氣管。 The heat treatment device as claimed in claim 5, wherein the top wall is formed with two vent holes spaced apart from each other and a through hole spaced apart from the vent holes, and the bearing unit further comprises a temperature gauge passing through the through holes A measuring piece, an air pipe passing through one of the vent holes, and an exhaust pipe passing through the other one of the vent holes. 如請求項1所述的熱處理裝置,還包含一基座及一連接該基座的擺動機構,該升降機構還包括一供該升降支架上下活動地設置的升降軌道件,該基座供該加熱爐及該升降軌道件設置,該擺動機構用以帶動該基座相對於水平方向擺動。 The heat treatment device according to claim 1, further comprising a base and a swinging mechanism connected to the base, the lifting mechanism further comprising a lifting rail for the lifting bracket to be movably arranged up and down, the base for the heating The furnace and the lifting track are arranged, and the swing mechanism is used to drive the base to swing relative to the horizontal direction. 如請求項7所述的熱處理裝置,其中,該基座包括一供該加熱爐及該升降軌道件設置的基板及一對設置於該基板側邊向上延伸的側板,該擺動機構包括一底板、一對設置於底板向上延伸分別連接該等側板的立板及一穿設該等立板、該等側板及該基板的轉軸,該轉軸可被操作旋轉,以帶動該基座相對於該等立板擺動。 The heat treatment device as claimed in claim 7, wherein the base comprises a base plate on which the heating furnace and the lift rail are arranged, and a pair of side plates arranged on sides of the base plate and extending upward, and the swing mechanism includes a bottom plate, A pair of vertical plates extending upward from the bottom plate and connecting the side plates respectively, and a rotating shaft passing through the vertical plates, the side plates and the base plate, the rotating shaft can be operated and rotated to drive the base relative to the vertical plates. Board swings.
TW109144287A 2020-12-15 2020-12-15 Heat treatment device TWI764436B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW109144287A TWI764436B (en) 2020-12-15 2020-12-15 Heat treatment device
CN202110080188.5A CN114636311B (en) 2020-12-15 2021-01-21 Heat treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW109144287A TWI764436B (en) 2020-12-15 2020-12-15 Heat treatment device

Publications (2)

Publication Number Publication Date
TWI764436B true TWI764436B (en) 2022-05-11
TW202225623A TW202225623A (en) 2022-07-01

Family

ID=81946001

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109144287A TWI764436B (en) 2020-12-15 2020-12-15 Heat treatment device

Country Status (2)

Country Link
CN (1) CN114636311B (en)
TW (1) TWI764436B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117570718B (en) * 2024-01-15 2024-04-02 宝鸡市弘森钛制品有限责任公司 Feeding equipment of electric furnace and electric furnace with same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200936975A (en) * 2002-02-28 2009-09-01 Tokyo Electron Ltd Cooling device and heat treating device using the same
CN209508347U (en) * 2019-01-18 2019-10-18 大连热处理有限公司 Rotatable heat treatment hanger
CN209816251U (en) * 2019-04-28 2019-12-20 南京宝钻热处理有限公司 Vacuum well type gas nitriding furnace with lifting structure

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4966800B2 (en) * 2007-09-26 2012-07-04 東京エレクトロン株式会社 Heat treatment equipment
US9273373B2 (en) * 2011-03-15 2016-03-01 Neturen Co., Ltd. Heating apparatus, heat treatment apparatus, and heating method
CN106834648B (en) * 2017-03-03 2018-06-29 上海钜晶精密仪器制造有限公司 Full-automatic heat treatment industrial furnace
CN108731472B (en) * 2017-12-26 2020-10-09 湖南久泰冶金科技有限公司 Multifunctional part switching device for vacuum smelting furnace

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200936975A (en) * 2002-02-28 2009-09-01 Tokyo Electron Ltd Cooling device and heat treating device using the same
CN209508347U (en) * 2019-01-18 2019-10-18 大连热处理有限公司 Rotatable heat treatment hanger
CN209816251U (en) * 2019-04-28 2019-12-20 南京宝钻热处理有限公司 Vacuum well type gas nitriding furnace with lifting structure

Also Published As

Publication number Publication date
CN114636311B (en) 2023-12-12
TW202225623A (en) 2022-07-01
CN114636311A (en) 2022-06-17

Similar Documents

Publication Publication Date Title
TWI764436B (en) Heat treatment device
JP4179276B2 (en) Solvent removal apparatus and solvent removal method
US5183509A (en) Apparatus for application of a material to an internal surface of items of manufacture
US20200406204A1 (en) Rotary bucket mixing device and rotating disk assembly
JPH10139159A (en) Cassette chamber and cassette carrying-in and out mechanism
US9475720B2 (en) System and method for restricting inward hydrogen permeation in a glass manufacturing system
KR100787540B1 (en) A vacuum dry machine
JP4895984B2 (en) Application processing equipment
KR100924656B1 (en) Spin coater for cylindrical substrate and coating method using thereof
CN104864721B (en) Industrial Stoves
CN218620959U (en) Pipe part heat treatment device
KR101537217B1 (en) apparatus for drying of panel
JP2012163231A (en) Rotary heat treatment furnace
JP2019123024A (en) Industrial robot
JP2021084064A (en) Substrate processing method and substrate processing apparatus
CN220149637U (en) Vacuum carburizing furnace
JP2004085126A (en) Vacuum heat treatment furnace
JP2001015481A (en) Etching device
JPH1012536A (en) Apparatus for heat treatment of substrate
KR20210038052A (en) Foam nozzle for foam molding
JPS59217329A (en) Spinner apparatus
JPH0610678Y2 (en) Substrate dry cleaning equipment
KR100693380B1 (en) A temperature chamber opened door
JP2010093069A (en) Heat treatment apparatus of substrate
JP2001321711A (en) Coating apparatus and coating system using it