TWI756511B - Cleaning agents and how to use them - Google Patents

Cleaning agents and how to use them Download PDF

Info

Publication number
TWI756511B
TWI756511B TW108104125A TW108104125A TWI756511B TW I756511 B TWI756511 B TW I756511B TW 108104125 A TW108104125 A TW 108104125A TW 108104125 A TW108104125 A TW 108104125A TW I756511 B TWI756511 B TW I756511B
Authority
TW
Taiwan
Prior art keywords
cleaning agent
water
cleaning
weight
parts
Prior art date
Application number
TW108104125A
Other languages
Chinese (zh)
Other versions
TW201940684A (en
Inventor
堀薫夫
赤松悠紀
Original Assignee
日商化研科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商化研科技股份有限公司 filed Critical 日商化研科技股份有限公司
Publication of TW201940684A publication Critical patent/TW201940684A/en
Application granted granted Critical
Publication of TWI756511B publication Critical patent/TWI756511B/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/26Cleaning or polishing of the conductive pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Emergency Medicine (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Detergent Compositions (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

本發明提供一種清洗劑,其係至少包含水溶性二醇醚化合物及水,且苯甲醇之溶解度為10 vol%以上者,且相對於上述水溶性二醇醚化合物100重量份,上述水之調配量為50~1000重量份。The present invention provides a cleaning agent comprising at least a water-soluble glycol ether compound and water, and the solubility of benzyl alcohol is 10 vol% or more, and relative to 100 parts by weight of the water-soluble glycol ether compound, the preparation of the water The amount is 50 to 1000 parts by weight.

Description

清洗劑及清洗劑之使用方法Cleaning agents and how to use them

本發明係關於一種清洗劑及清洗劑之使用方法。尤其是關於一種如下之清洗劑及此種清洗劑之使用方法,該清洗劑藉由包含特定量之水而環境安全性(例如作業環境安全性)優異,另一方面,於利用特定洗淨劑(苯甲醇等)對被洗淨物進行洗淨後,可發揮優異之清洗性。The present invention relates to a cleaning agent and a method of using the cleaning agent. In particular, it relates to a cleaning agent which is excellent in environmental safety (for example, work environment safety) by containing a specific amount of water, and a method for using the cleaning agent, and on the other hand, is used in the use of a specific cleaning agent. (Benzyl alcohol, etc.) can exhibit excellent cleaning properties after cleaning the object to be cleaned.

工業用洗淨劑、例如助焊劑用洗淨劑係為了於使用焊膏將作為被洗淨物之電子零件接合於印刷配線基板之電極後,將助焊劑及助焊劑殘渣去除而廣泛使用。 因此,由於發揮良好之洗淨性且環境問題等相對較少,故而使用包含以各種二醇系化合物作為主成分之二醇系洗淨劑之助焊劑用洗淨劑。 [先前技術文獻] [專利文獻]Industrial cleaners, such as flux cleaners, are widely used to remove flux and flux residues after bonding electronic components, which are objects to be cleaned, to electrodes of printed wiring boards using solder paste. Therefore, since good cleaning performance is exhibited and there are relatively few environmental problems, a cleaning agent for flux containing a glycol-based cleaning agent containing various glycol-based compounds as a main component is used. [Prior Art Literature] [Patent Literature]

[專利文獻1]WO2009/020199號公報 [專利文獻2]日本專利特開平7-080423號公報 [專利文獻3]日本專利特開平5-175641號公報[Patent Document 1] WO2009/020199 [Patent Document 2] Japanese Patent Laid-Open No. 7-080423 [Patent Document 3] Japanese Patent Laid-Open No. 5-175641

[發明所欲解決之問題][Problems to be Solved by Invention]

揭示有一種無鉛焊料助焊劑去除用洗淨劑組合物,其係包含特定結構式所示之非鹵素系有機溶劑(A)、特定結構式所示之胺化合物(B)、不含胺基之螯合劑(C)、及視需要之特定量之水而成(例如,參照WO2009/020199號公報(專利文獻1))。Disclosed is a cleaning composition for removing lead-free solder flux, which comprises a non-halogen organic solvent (A) represented by a specific structural formula, an amine compound (B) represented by a specific structural formula, and an amine group-free solvent. A chelating agent (C), and water of a specific amount as needed (for example, refer to WO2009/020199 A (Patent Document 1)).

又,揭示有一種洗淨方法,其具有於使用包含非離子性界面活性劑及/或烴化合物等而成之洗淨劑組合物實施洗淨步驟後,使用5~100℃之水之清洗步驟(例如,參照日本專利特開平7-080423號公報(專利文獻2))。Furthermore, there is disclosed a cleaning method including a cleaning step of using water at 5 to 100° C. after the cleaning step is performed using a detergent composition containing a nonionic surfactant and/or a hydrocarbon compound, etc. (For example, refer to Japanese Patent Laid-Open No. 7-080423 (Patent Document 2)).

進而還揭示有一種基板之洗淨處理方法,其係使含有特定之二醇醚系化合物而成之洗淨劑與附著有松香系焊料助焊劑之基板接觸,自該基板將助焊劑洗淨去除,繼而使作為沖洗劑之低級醇或其水溶液等與基板接觸(例如,參照日本專利特開平5-175641號公報(專利文獻3))。Furthermore, a method for cleaning a substrate is disclosed, wherein a cleaning agent containing a specific glycol ether-based compound is brought into contact with a substrate to which a rosin-based solder flux is attached, and the flux is cleaned and removed from the substrate. , and then a lower alcohol or an aqueous solution thereof as a rinsing agent is brought into contact with the substrate (for example, refer to Japanese Patent Laid-Open No. 5-175641 (Patent Document 3)).

然而,存在如下問題:專利文獻1中揭示之助焊劑用洗淨劑本身通常沸點較高而難以於短時間內乾燥。進而,發現如下問題:該助焊劑用洗淨劑對被洗淨物之純淨度容易下降。 因此,發現如下問題:必須設置一面使用水及含水醇等清洗劑置換助焊劑用洗淨劑一面使被洗淨物乾燥之製程。However, there is a problem that the cleaning agent for fluxes disclosed in Patent Document 1 generally has a high boiling point and is difficult to dry in a short time. Furthermore, it was found that the cleaning agent for flux tends to lower the purity of the object to be cleaned. Therefore, the following problem has been found: it is necessary to provide a process of drying the object to be cleaned while replacing the cleaning agent for flux with a cleaning agent such as water and hydrous alcohol.

又,於專利文獻2中揭示之洗淨方法之情形時,存在洗淨劑組合物之種類過度受限之問題。進而,發現如下問題:於該洗淨方法之情形時,必須將清洗步驟中之水溫嚴格地控制為特定範圍內之值(5~100℃)。 而且,亦發現如下問題:於使用水作為清洗劑之情形時,不僅乾燥性較差,對疏水性之助焊劑用洗淨劑、例如苯甲醇等之溶解性亦較低,因此容易漂洗不良。Furthermore, in the case of the cleaning method disclosed in Patent Document 2, there is a problem that the types of detergent compositions are excessively limited. Furthermore, it was found that in the case of this cleaning method, the water temperature in the cleaning step must be strictly controlled to a value within a specific range (5 to 100°C). Furthermore, it was found that when water is used as the cleaning agent, not only the drying property is poor, but also the solubility to a hydrophobic flux cleaning agent, such as benzyl alcohol, is also low, so that rinsing is likely to be poor.

於專利文獻3中揭示之基板之洗淨處理方法之情形時,由於使用含水醇作為清洗劑,故而對疏水性之助焊劑用洗淨劑之溶解性相對良好。然而,發現如下問題:該清洗劑之引火點較低而環境安全性(例如作業環境安全性)不充分。In the case of the substrate cleaning treatment method disclosed in Patent Document 3, since a water-containing alcohol is used as the cleaning agent, the solubility in the cleaning agent for a hydrophobic flux is relatively good. However, it was found that the cleaning agent has a low flash point and insufficient environmental safety (eg, work environment safety).

因此,本發明之發明者經過努力研究,結果發現藉由將水溶性二醇醚化合物之調配量與水之調配量之比率設為特定比率之清洗劑,且將清洗劑中之苯甲醇之溶解度設為特定值以上,而解決先前之問題。 即,本發明之目的在於提供一種清洗劑及此種清洗劑之使用方法,該清洗劑係於利用疏水性之特定洗淨劑(苯甲醇等)對被洗淨物進行洗淨後使用之環境安全性(例如作業環境安全性)優異之水系清洗劑,且可發揮優異之清洗性。 [解決問題之技術手段]Therefore, the inventors of the present invention have studied diligently and found that by setting the ratio of the preparation amount of the water-soluble glycol ether compound to the preparation amount of water as a cleaning agent in a specific ratio, and the solubility of benzyl alcohol in the cleaning agent is adjusted. Set above a certain value, and solve the previous problem. That is, an object of the present invention is to provide a cleaning agent that is used in an environment where an object to be cleaned is cleaned with a hydrophobic specific cleaning agent (benzyl alcohol, etc.) and a method of using the cleaning agent It is a water-based cleaning agent with excellent safety (such as work environment safety), and can exert excellent cleaning performance. [Technical means to solve problems]

根據本發明,提供一種清洗劑,其係至少包含水溶性二醇醚化合物及水,且苯甲醇之溶解度為10 vol%以上者,且相對於水溶性二醇醚化合物100重量份,水之調配量為50~1000重量份。根據本發明,可解決上述問題點。 本發明係如此將水溶性二醇醚化合物之調配量與水之調配量之比率設為特定範圍內之值之環境安全性(例如作業環境安全性)優異之清洗劑。 而且,藉由將相對於每單位體積之清洗劑之苯甲醇之溶解度設為特定值以上,可沖洗以先前利用水難以沖洗之苯甲醇等疏水性化合物為代表之各種洗淨劑。因此,可提供被洗淨物中之特定洗淨劑之殘留極少之清洗劑。According to the present invention, a cleaning agent is provided, which comprises at least a water-soluble glycol ether compound and water, and the solubility of benzyl alcohol is 10 vol% or more, and the preparation of the water is relative to 100 parts by weight of the water-soluble glycol ether compound. The amount is 50 to 1000 parts by weight. According to the present invention, the above-mentioned problems can be solved. The present invention is a cleaning agent excellent in environmental safety (for example, work environment safety) by setting the ratio of the amount of the water-soluble glycol ether compound to the amount of water to be prepared within a specific range. Furthermore, by setting the solubility of benzyl alcohol per unit volume of the cleaning agent to a certain value or more, various cleaning agents such as hydrophobic compounds such as benzyl alcohol, which have been difficult to rinse with water, can be rinsed. Therefore, it is possible to provide a cleaning agent with very little residue of the specific cleaning agent in the object to be cleaned.

又,構成本發明之清洗劑時,較佳為室溫至80℃之溫度範圍內之透光率為90%以上。 如此,藉由於特定溫度範圍內具有特定之透光率,可判斷於室溫至80℃之溫度範圍內不會相分離,而事實上不具有濁點。因此,由於在通常之使用溫度範圍內不具有濁點而維持透明性,故而可提供使用便利性良好之清洗劑。Moreover, when forming the cleaning agent of this invention, it is preferable that the light transmittance in the temperature range of room temperature to 80 degreeC is 90% or more. In this way, by having a specific light transmittance in a specific temperature range, it can be judged that there is no phase separation in the temperature range from room temperature to 80°C, and in fact it does not have a cloud point. Therefore, since it does not have a cloud point in a normal use temperature range, and maintains transparency, it can provide the cleaning agent which is easy to use.

又,構成本發明之清洗劑時,較佳為清洗劑之引火點為50℃以上。 如此,即便於具有引火點之情形時,藉由設為特定溫度以上之值,亦可提供環境安全性(例如作業環境安全性)更優異之清洗劑。Moreover, when forming the cleaning agent of this invention, it is preferable that the flash point of a cleaning agent is 50 degreeC or more. In this way, even when there is a flash point, by setting the value to a value above a specific temperature, it is possible to provide a cleaning agent that is more excellent in environmental safety (for example, work environment safety).

又,構成本發明之清洗劑時,較佳為於將相對於表面經感光性阻焊劑硬化體保護之印刷基板之阻劑表面的水之初始接觸角設為θ1 ,且將相對於將上述印刷基板於30℃之清洗劑中浸漬10分鐘後,於100℃、5分鐘之條件下進行乾燥之該印刷基板之阻劑表面的水之接觸角設為θ2 時,|θ2 -θ1 |為3°以下。 如此,藉由設為特定接觸角之差之絕對值,可定量地提供對印刷基板等被洗淨物之不良影響較少之清洗劑。Moreover, when constituting the cleaning agent of the present invention, it is preferable to set the initial contact angle with respect to the water on the resist surface of the printed circuit board whose surface is protected by the photosensitive solder resist cured body as θ 1 , and set the initial contact angle with respect to the above-mentioned After the printed circuit board was immersed in a cleaning agent at 30°C for 10 minutes, and then dried at 100°C for 5 minutes, when the contact angle of water on the surface of the resist of the printed circuit board was set to θ 2 , |θ 2 −θ 1 | is 3° or less. Thus, by setting it as the absolute value of the difference of a specific contact angle, it becomes possible to quantitatively provide the cleaning agent which has little adverse effect on to-be-cleaned objects, such as a printed circuit board.

又,構成本發明之清洗劑時,較佳為水溶性二醇醚化合物之沸點(大氣壓下)為250℃以下。 如此,藉由限制水溶性二醇醚化合物之沸點,可更容易地進行清洗劑之再生,且乾燥性亦更優異。Moreover, when forming the cleaning agent of this invention, it is preferable that the boiling point (under atmospheric pressure) of a water-soluble glycol ether compound is 250 degrees C or less. In this way, by limiting the boiling point of the water-soluble glycol ether compound, the regeneration of the cleaning agent can be performed more easily, and the drying property is also more excellent.

又,構成本發明之清洗劑時,較佳為水溶性二醇醚化合物為選自由乙二醇單丙醚、乙二醇單第三丁醚、3-甲氧基-3-甲基丁醇、3-甲氧基丁醇、乙二醇單異丙醚、二乙二醇異丙基甲醚、二丙二醇單甲醚、二乙二醇乙基甲醚、三乙二醇二甲醚及二乙二醇二甲醚所組成之群中之至少1種化合物。 藉由使用此種水溶性二醇醚化合物,可提供環境安全性(例如作業環境安全性)優異,並且洗淨劑之殘留較少,進而相對價廉之清洗劑。Moreover, when constituting the cleaning agent of the present invention, the water-soluble glycol ether compound is preferably selected from the group consisting of ethylene glycol monopropyl ether, ethylene glycol mono-tertiary butyl ether, and 3-methoxy-3-methylbutanol , 3-methoxybutanol, ethylene glycol monoisopropyl ether, diethylene glycol isopropyl methyl ether, dipropylene glycol monomethyl ether, diethylene glycol ethyl methyl ether, triethylene glycol dimethyl ether and At least one compound in the group consisting of diethylene glycol dimethyl ether. By using such a water-soluble glycol ether compound, it is possible to provide a relatively inexpensive cleaning agent which is excellent in environmental safety (for example, work environment safety) and has less residue of the cleaning agent.

又,構成本發明之清洗劑時,較佳為上述清洗劑進而包含沸點為250℃以下之胺化合物,且該胺化合物之調配量相對於水溶性二醇醚化合物100重量份為0.1~10重量份。 如此,藉由調配特定量之具有特定沸點之胺化合物,可提供可提高與洗淨劑中所含之助焊劑殘渣之相溶性,並且可更容易地進行清洗劑之再生,且可利用對印刷基板等被洗淨物之不良影響較少之清洗劑有效率地洗淨被洗淨物的清洗劑。Moreover, when constituting the cleaning agent of the present invention, it is preferable that the cleaning agent further contains an amine compound having a boiling point of 250° C. or lower, and the compounding amount of the amine compound is 0.1 to 10 parts by weight relative to 100 parts by weight of the water-soluble glycol ether compound. share. In this way, by preparing a specific amount of an amine compound having a specific boiling point, the compatibility with the flux residue contained in the cleaning agent can be improved, the cleaning agent can be regenerated more easily, and the printing effect can be used. A cleaning agent that effectively cleans objects to be cleaned with less adverse effects on objects to be cleaned, such as substrates.

本發明之另一態樣係一種清洗劑之使用方法,其特徵在於具有下述步驟(1)~步驟(2)。 (1)將附著於被洗淨物之助焊劑利用包含苯甲醇及疏水性二醇醚化合物、或者任一者之洗淨液洗淨之步驟 (2)使用清洗劑清洗上述步驟(1)中洗淨之被洗淨物之步驟,該清洗劑係至少包含水溶性二醇醚化合物及水,且苯甲醇之溶解度為10 vol%以上者,而且相對於水溶性二醇醚化合物100重量份,水之調配量為50~1000重量份 如此,藉由使用將水溶性二醇醚化合物之調配量與水之調配量之比率設為特定範圍內之值,且將苯甲醇之溶解度設為特定值以上之清洗劑,於使用特定洗淨劑將被洗淨物有效率地洗淨後,亦可進行環境安全性(例如作業環境安全性)優異之清洗處理。 而且,於在洗淨步驟中使用特定洗淨劑之情形時,亦可利用可沖洗以先前利用水難以沖洗之苯甲醇等疏水性化合物為代表之各種洗淨劑而被洗淨物中之特定洗淨劑之殘留極少之清洗劑進行清洗處理。 [發明之效果]Another aspect of the present invention is a method of using a cleaning agent, which is characterized by having the following steps (1) to (2). (1) The step of cleaning the flux adhering to the object to be cleaned with a cleaning solution containing benzyl alcohol, a hydrophobic glycol ether compound, or any of them (2) The step of cleaning the object to be cleaned in the above step (1) with a cleaning agent, the cleaning agent contains at least a water-soluble glycol ether compound and water, and the solubility of benzyl alcohol is 10 vol% or more, Furthermore, the amount of water to be formulated is 50 to 1000 parts by weight relative to 100 parts by weight of the water-soluble glycol ether compound. In this way, by using a cleaning agent in which the ratio of the amount of the water-soluble glycol ether compound and the amount of water to be prepared is within a specific range, and the solubility of benzyl alcohol is set to a specific value or more, a specific cleaning agent is used. After efficiently cleaning the object to be cleaned with an agent, a cleaning process excellent in environmental safety (for example, work environment safety) can also be performed. In addition, when a specific detergent is used in the washing step, the specific detergent in the object to be washed can also be washed with various detergents represented by hydrophobic compounds such as benzyl alcohol, which are difficult to be washed with water. The cleaning agent with very little residue of the cleaning agent is used for cleaning treatment. [Effect of invention]

根據本發明,可提供一種清洗劑及此種清洗劑之使用方法,該清洗劑係於利用疏水性之特定洗淨劑(苯甲醇等)對被洗淨物進行洗淨後所使用之環境安全性(例如作業環境安全性)優異之水系清洗劑,且可發揮優異之清洗性。According to the present invention, it is possible to provide a cleaning agent and a method for using the cleaning agent, which are environmentally safe to use after cleaning an object to be cleaned with a hydrophobic specific cleaning agent (benzyl alcohol, etc.). It is a water-based cleaning agent with excellent performance (such as work environment safety), and can exert excellent cleaning performance.

[第1實施形態] 第1實施形態係一種清洗劑,其特徵在於:其係至少包含水溶性二醇醚化合物及水,且苯甲醇之溶解度為10 vol%以上者,且相對於水溶性二醇醚化合物100重量份,將水之調配量設為50~1000重量份之範圍內之值。 換言之,上述清洗劑係至少包含水溶性二醇醚化合物及水,且苯甲醇之溶解度為10 vol%以上者,且相對於上述水溶性二醇醚化合物100重量份,上述水之調配量為50~1000重量份。 以下,一面適當參照圖式一面具體地對本發明之第1實施形態之清洗劑進行說明。再者,於本說明書中,「A~B」之形式之表記係指範圍之上限及下限(即,A以上且B以下),於A中未記載單位而僅於B中記載有單位之情形時,A之單位與B之單位相同。[1st Embodiment] The first embodiment is a cleaning agent, which is characterized in that it contains at least a water-soluble glycol ether compound and water, and the solubility of benzyl alcohol is 10 vol% or more, relative to 100 parts by weight of the water-soluble glycol ether compound , and set the amount of water to a value within the range of 50 to 1000 parts by weight. In other words, the above-mentioned cleaning agent contains at least a water-soluble glycol ether compound and water, and the solubility of benzyl alcohol is 10 vol% or more, and relative to 100 parts by weight of the above-mentioned water-soluble glycol ether compound, the preparation amount of the above-mentioned water is 50% ~1000 parts by weight. Hereinafter, the cleaning agent of the 1st Embodiment of this invention is demonstrated concretely, referring drawings suitably. Furthermore, in this specification, the notation in the form of "A to B" refers to the upper limit and lower limit of the range (that is, A or more and B or less), and the case where the unit is not described in A but only in B. , the unit of A is the same as the unit of B.

1.水溶性二醇醚化合物 水溶性二醇醚化合物係清洗劑之主成分。此處,「二醇醚化合物」係指二醇或其縮聚物之羥基中之一者或兩者經醚化所成之化合物。 而且,構成本發明之清洗劑之二醇醚化合物與上述第1步驟(步驟(1))中使用者(洗淨液中所含之疏水性二醇醚化合物)不同,係水溶性二醇醚化合物。 其理由在於:藉由使用該水溶性二醇醚化合物,即便於水100重量份溶解100 ml,亦不會產生懸浮或分離。 而且,其原因在於:可將殘留於被洗淨物之具有疏水性之苯甲醇或疏水性二醇醚化合物去除而有效率地清洗被洗淨物。 再者,作為此處使用之水溶性二醇醚化合物,例如較佳為顯示出於水中之溶解度(測定溫度:20℃)超過50重量%之水溶性者。1. Water-soluble glycol ether compounds Water-soluble glycol ether compounds are the main components of cleaning agents. Here, the "glycol ether compound" refers to a compound obtained by etherifying one or both of the hydroxyl groups of a glycol or its polycondensate. Furthermore, the glycol ether compound constituting the cleaning agent of the present invention is a water-soluble glycol ether, unlike the user (the hydrophobic glycol ether compound contained in the cleaning solution) in the first step (step (1)) described above. compound. The reason is that by using the water-soluble glycol ether compound, even if 100 ml of water is dissolved in 100 parts by weight of water, suspension or separation does not occur. Furthermore, the reason is that the object to be cleaned can be efficiently cleaned by removing the hydrophobic benzyl alcohol or the hydrophobic glycol ether compound remaining in the object to be cleaned. In addition, as the water-soluble glycol ether compound used here, it is preferable that the solubility in water (measurement temperature: 20 degreeC) shows the water solubility of more than 50weight%, for example.

又,本發明中使用之水溶性二醇醚化合物較佳為將其沸點(大氣壓下)通常設為250℃以下之值。即,上述水溶性二醇醚化合物較佳為其沸點(大氣壓下)為250℃以下。於本實施形態中,「大氣壓」為1013.25 hPa。 其理由在於:藉由使用具有此種沸點之水溶性二醇醚化合物,可更容易地進行清洗劑之再生,且所獲得之清洗劑不再有引火性而成為環境安全性(例如作業環境安全性)亦更優異者。 因此,本發明之清洗劑較佳為即便於具有引火點之情形時,亦使引火點為50℃以上,或者不具有引火點。 即,於洗淨裝置之運轉中,對清洗劑引火之危險性消失,而可進行包括非常穩定之清洗步驟之洗淨作業。 因此,更佳為將水溶性二醇醚化合物之沸點設為120~230℃之範圍內之值,進而較佳為設為140~220℃之範圍內之值。In addition, it is preferable that the water-soluble glycol ether compound used in the present invention has a boiling point (under atmospheric pressure) of usually a value of 250°C or lower. That is, the above-mentioned water-soluble glycol ether compound preferably has a boiling point (under atmospheric pressure) of 250°C or lower. In this embodiment, the "atmospheric pressure" is 1013.25 hPa. The reason is that by using a water-soluble glycol ether compound having such a boiling point, the regeneration of the cleaning agent can be carried out more easily, and the obtained cleaning agent is no longer flammable and becomes environmentally safe (for example, a safe working environment). sex) is also better. Therefore, even when the cleaning agent of the present invention has a flash point, it is preferable that the flash point is 50° C. or higher, or it does not have a flash point. That is, during the operation of the cleaning apparatus, the risk of ignition of the cleaning agent is eliminated, and the cleaning operation including a very stable cleaning step can be performed. Therefore, it is more preferable to set the boiling point of the water-soluble glycol ether compound to a value within a range of 120 to 230°C, and more preferably to a value within a range of 140 to 220°C.

又,作為此種水溶性二醇醚化合物之具體例,可列舉選自由乙二醇單丙醚(PS)、乙二醇單第三丁醚(ETB)、3-甲氧基-3-甲基丁醇(MMB)、2-甲氧基丁醇(2MB)、3-甲氧基丁醇(3MB)、乙二醇單異丙醚(iPG)、二乙二醇異丙基甲醚(IPDM)、二丙二醇單甲醚(DPM)、二乙二醇乙基甲醚(MEDG)、三乙二醇二甲醚(DMTG)及二乙二醇二甲醚(DMDG)所組成之群中之至少一種化合物。 上述水溶性二醇醚化合物可單獨使用一種,亦可將複數種組合而使用。作為複數種上述水溶性二醇醚之組合,例如可列舉PS與MMB、PS與3MB、PS與IPDM、PS與DPM、PS與DMTG、ETB與MMB、ETB與DPM、MMB與DPM、及MMB與DMTG。再者,當然亦可將上述水溶性二醇醚化合物之三種以上組合。Moreover, as a specific example of such a water-soluble glycol ether compound, one selected from ethylene glycol monopropyl ether (PS), ethylene glycol monotertiary butyl ether (ETB), 3-methoxy-3-methyl ether can be mentioned. butanol (MMB), 2-methoxybutanol (2MB), 3-methoxybutanol (3MB), ethylene glycol monoisopropyl ether (iPG), diethylene glycol isopropyl methyl ether ( IPDM), dipropylene glycol monomethyl ether (DPM), diethylene glycol ethyl methyl ether (MEDG), triethylene glycol dimethyl ether (DMTG) and diethylene glycol dimethyl ether (DMDG) at least one compound. The said water-soluble glycol ether compound may be used individually by 1 type, and may be used in combination of a plurality of types. Examples of combinations of the above water-soluble glycol ethers include PS and MMB, PS and 3MB, PS and IPDM, PS and DPM, PS and DMTG, ETB and MMB, ETB and DPM, MMB and DPM, and MMB and DMTG. Furthermore, of course, three or more of the above-mentioned water-soluble glycol ether compounds may be combined.

於本實施形態之一態樣中,上述水溶性二醇醚化合物亦可為具有以下之式1、式2或式3所示之結構之化合物。 HO-[C3 H6 -O]2 -R1 (式1) R2 -O-[(CH2 )2 -O]3 -R3 (式2) CH3 -CR4 R5 -CR6 R7 -CH2 -OH (式3) (式1中,R1 表示碳數1~3之烷基。式2中,R2 表示碳數1或2之烷基,R3 表示氫原子或碳數1或2之烷基。式3中,R4 及R6 中之一者表示氫原子,另一者表示碳數1或2之烷氧基。式3中,R5 及R7 中之一者表示氫原子,另一者表示氫原子或者碳數1或2之烷基)。In one aspect of this embodiment, the water-soluble glycol ether compound may also be a compound having a structure represented by the following formula 1, formula 2 or formula 3. HO-[C 3 H 6 -O] 2 -R 1 (Formula 1) R 2 -O-[(CH 2 ) 2 -O] 3 -R 3 (Formula 2) CH 3 -CR 4 R 5 -CR 6 R 7 -CH 2 -OH (Formula 3) (In Formula 1, R 1 represents an alkyl group having 1 to 3 carbon atoms. In Formula 2, R 2 represents an alkyl group having 1 or 2 carbon atoms, and R 3 represents a hydrogen atom or An alkyl group with 1 or 2 carbon atoms. In Formula 3, one of R 4 and R 6 represents a hydrogen atom, and the other represents an alkoxy group with 1 or 2 carbon atoms. In Formula 3, among R 5 and R 7 One of them represents a hydrogen atom, and the other represents a hydrogen atom or an alkyl group having 1 or 2 carbon atoms).

式1中,作為-[C3 H6 -O]2 -所示之基,例如可列舉-[(CH2 )3 -O]2 -所示之基、-[CH2 CH(CH3 )-O]2 -所示之基、及-[CH(CH3 )CH2 -O]2 -所示之基。於本實施形態中,式1中之-[C3 H6 -O]2 -所示之基較佳為-[CH2 CH(CH3 )-O]2 -所示之基。In Formula 1, as a group represented by -[C 3 H 6 -O] 2 -, for example, a group represented by -[(CH 2 ) 3 -O] 2 -, -[CH 2 CH(CH 3 ) A group represented by -O] 2 - and a group represented by -[CH(CH 3 )CH 2 -O] 2 -. In this embodiment, the group represented by -[C 3 H 6 -O] 2 - in Formula 1 is preferably a group represented by -[CH 2 CH(CH 3 )-O] 2 -.

而且,該等水溶性二醇醚化合物中,若為乙二醇單丙醚、乙二醇單第三丁醚、3-甲氧基-3-甲基丁醇、二丙二醇單甲醚、三乙二醇二甲醚等,則就安全性、與疏水性化合物之相溶性(沖洗性)、乾燥性之理由而言,可用作更佳之水溶性二醇醚化合物。Moreover, among these water-soluble glycol ether compounds, if it is ethylene glycol monopropyl ether, ethylene glycol mono-tertiary butyl ether, 3-methoxy-3-methyl butanol, dipropylene glycol monomethyl ether, tripropylene glycol Glycol dimethyl ether or the like can be used as a more preferable water-soluble glycol ether compound from the viewpoint of safety, compatibility with hydrophobic compounds (rinsing properties), and drying properties.

2.水 構成清洗劑時,其特徵在於:相對於水溶性二醇醚化合物100重量份,將水之調配量設為50~1000重量份之範圍內之值。換言之,相對於上述水溶性二醇醚化合物100重量份,上述水之調配量為50~1000重量份。 其理由在於:若水之調配量過少,則有所獲得之清洗劑之引火性變高或產生對阻劑之不良影響(接觸角變化)之情況。 另一方面,若水之調配量過多,則有利用清洗劑之清洗性或助焊劑之再附著防止性顯著下降之情況。2. Water When constituting a cleaning agent, it is characterized in that the mixing amount of water is set to a value within the range of 50 to 1000 parts by weight with respect to 100 parts by weight of the water-soluble glycol ether compound. In other words, the mixing amount of the water is 50 to 1000 parts by weight relative to 100 parts by weight of the water-soluble glycol ether compound. The reason for this is that, if the amount of water to be prepared is too small, the flammability of the obtained cleaning agent may become high, or an adverse effect (change in contact angle) on the resist may occur. On the other hand, when the preparation amount of water is too large, the cleaning property by the cleaning agent or the re-adhesion prevention property of the flux may be remarkably lowered.

因此,構成清洗劑時,相對於水溶性二醇醚化合物100重量份,較佳為將水之調配量設為80~600重量份之範圍內之值,進而較佳為設為100~400重量份之範圍內之值。換言之,相對於上述水溶性二醇醚化合物100重量份,水之調配量較佳為80~600重量份,進而較佳為100~400重量份。 而且,作為對水溶性二醇醚化合物調配之水,較佳為純水(離子交換水、蒸餾水等),較佳為具有導電率為10 μS/cm左右之純淨性,更佳為具有1 μS/cm左右之純淨性。換言之,上述水較佳為其導電率為1~10 μS/cm,更佳為1~5 μS/cm。Therefore, when the cleaning agent is constituted, it is preferable to set the compounding amount of water to a value within the range of 80 to 600 parts by weight, more preferably 100 to 400 parts by weight, relative to 100 parts by weight of the water-soluble glycol ether compound. value within the range. In other words, with respect to 100 parts by weight of the above water-soluble glycol ether compound, the amount of water to be formulated is preferably 80 to 600 parts by weight, and more preferably 100 to 400 parts by weight. In addition, as the water for preparing the water-soluble glycol ether compound, pure water (ion-exchanged water, distilled water, etc.) is preferable, and it is preferable to have a purity of about 10 μS/cm of conductivity, more preferably 1 μS The purity of about /cm. In other words, the above-mentioned water preferably has a conductivity of 1 to 10 μS/cm, more preferably 1 to 5 μS/cm.

3.溶解度 又,關於清洗劑之特性,其特徵在於:將相對於該清洗劑之單位體積(100 ml)之苯甲醇之溶解度設為10 vol%以上之值。換言之,相對於上述清洗劑之單位體積(100 ml)之苯甲醇之溶解度為10 vol%以上。 即,本發明中使用之清洗劑係為了於使用特定之洗淨劑、例如苯甲醇或疏水性二醇醚化合物之情形時,亦清洗附著有其等之被洗淨物,而具備上述構成。 此處,將苯甲醇之溶解度作為指標之原因在於:苯甲醇、疏水性二醇醚化合物之中,於該清洗劑中之溶解性最低者為苯甲醇。 又,其原因在於:只要相對於該清洗劑之單位體積(100 ml)之苯甲醇之溶解度為10 vol%以上之值,則可使洗淨時之濁度之值之變化極力下降,而可維持富有透明性之清洗劑之狀態。3. Solubility Moreover, regarding the characteristic of a cleaning agent, it is characterized in that the solubility of benzyl alcohol with respect to the unit volume (100 ml) of this cleaning agent is set to the value of 10 vol% or more. In other words, the solubility of benzyl alcohol relative to the unit volume (100 ml) of the above cleaning agent is 10 vol% or more. That is, the cleaning agent used in the present invention has the above-mentioned configuration in order to also clean the object to be cleaned to which the same is adhered even when a specific cleaning agent such as benzyl alcohol or a hydrophobic glycol ether compound is used. Here, the reason for using the solubility of benzyl alcohol as an index is that among benzyl alcohol and the hydrophobic glycol ether compound, the one with the lowest solubility in the cleaning agent is benzyl alcohol. The reason for this is that as long as the solubility of benzyl alcohol relative to the unit volume (100 ml) of the cleaning agent is 10 vol% or more, the change in the turbidity value during cleaning can be reduced as much as possible. Maintain the state of a transparent cleaning agent.

但是,若相對於該清洗劑之單位體積(100 ml)之苯甲醇之溶解度過大,則有可使用之水溶性二醇醚化合物之種類過度受限之情況。 因此,較佳為將相對於該清洗劑之單位體積(100 ml)之苯甲醇之溶解度設為15 vol%~40 vol%之範圍內之值,進而較佳為設為20 vol%~30 vol%之範圍內之值。However, if the solubility of benzyl alcohol per unit volume (100 ml) of the cleaning agent is too large, the types of water-soluble glycol ether compounds that can be used may be excessively limited. Therefore, the solubility of benzyl alcohol relative to the unit volume (100 ml) of the cleaning agent is preferably set to a value within the range of 15 vol% to 40 vol%, and more preferably 20 vol% to 30 vol% value within the range of %.

此處,參照圖1,對相對於清洗劑之單位體積(100 ml)之苯甲醇之溶解度(vol%)與相溶性(沖洗性或清洗性)之評分(相對值)之關係進行說明。 即,於圖1之橫軸表示相對於清洗劑之單位體積之苯甲醇之溶解度(vol%),於縱軸表示相溶性(沖洗性或清洗性)之評分(相對值)。此處,縱軸之評分0、1、2、3、4及5分別與下述實施例中之清洗性之評價E、D、C、B、A'及A對應。 而且,根據圖1中之特性曲線判斷,當苯甲醇之溶解度為5 vol%左右時,評分尚較低,但當苯甲醇之溶解度超過10 vol%時,有評分急遽變高之傾向。 而且,苯甲醇之溶解度(vol%)超過15 vol%左右到至少25 vol%左右時,可獲得最高之評分。 因此,瞭解到藉由將清洗劑中之苯甲醇之溶解度適當調整為10 vol%以上,關於相溶性(沖洗性或清洗性)之評價,可獲得良好之結果。Here, referring to FIG. 1 , the relationship between the solubility (vol%) of benzyl alcohol per unit volume (100 ml) of the cleaning agent and the score (relative value) of compatibility (rinsing property or cleaning property) will be described. That is, the horizontal axis in FIG. 1 represents the solubility (vol%) of benzyl alcohol per unit volume of the cleaning agent, and the vertical axis represents the compatibility (rinsing property or cleaning property) score (relative value). Here, the scores of 0, 1, 2, 3, 4, and 5 on the vertical axis correspond to the evaluations E, D, C, B, A', and A of the cleaning properties in the following examples, respectively. Moreover, according to the characteristic curve in Figure 1, when the solubility of benzyl alcohol is about 5 vol%, the score is still low, but when the solubility of benzyl alcohol exceeds 10 vol%, the score tends to increase sharply. Furthermore, when the solubility (vol%) of benzyl alcohol exceeds about 15 vol% to at least about 25 vol%, the highest score can be obtained. Therefore, it was found that by appropriately adjusting the solubility of benzyl alcohol in the cleaning agent to 10 vol% or more, good results can be obtained in the evaluation of compatibility (rinsing property or cleaning property).

4.特定沸點之胺化合物 又,於本發明中使用之清洗劑中,較佳為調配大氣壓下之沸點為250℃以下之胺化合物。即,上述清洗劑較佳為進而包含沸點為250℃以下之胺化合物。 其理由在於:藉由調配具有該沸點之胺化合物,可於不太妨礙清洗劑之再生之狀況下提高助焊劑之溶解度,進而可謀求洗淨性之提昇。 而且,其原因在於:藉由調配該胺化合物,亦可有效地防止助焊劑之再附著,使該清洗劑亦發揮作為洗淨劑之功能。 因此,更佳為將該胺化合物之沸點設為120~230℃之範圍內之值,進而較佳為設為140~220℃之範圍內之值。4. Amine compounds with specific boiling point Moreover, in the cleaning agent used by this invention, it is preferable to mix|blend the amine compound whose boiling point in atmospheric pressure is 250 degrees C or less. That is, it is preferable that the said cleaning agent further contains the amine compound whose boiling point is 250 degrees C or less. The reason for this is that the solubility of the flux can be increased without hindering the regeneration of the cleaning agent by preparing the amine compound having the boiling point, thereby improving the cleaning performance. Furthermore, the reason is that the re-adhesion of the flux can be effectively prevented by preparing the amine compound, and the cleaning agent can also function as a cleaning agent. Therefore, it is more preferable to set the boiling point of this amine compound to the value within the range of 120-230 degreeC, and it is more preferable to set it as the value within the range of 140-220 degreeC.

於本實施形態中,「胺化合物」係指以烴基或芳香族原子團取代氨之氫原子所成之化合物。上述胺化合物包含一級胺、二級胺及三級胺。又,於另一態樣中,上述胺化合物包含脂肪族胺及芳香族胺。於又一態樣中,上述胺化合物包含單胺、二胺及多胺。In this embodiment, the "amine compound" refers to a compound obtained by substituting a hydrocarbon group or an aromatic atomic group for the hydrogen atom of ammonia. The above-mentioned amine compound includes a primary amine, a secondary amine, and a tertiary amine. Moreover, in another aspect, the said amine compound contains an aliphatic amine and an aromatic amine. In yet another aspect, the above-mentioned amine compounds include monoamines, diamines, and polyamines.

又,較佳為將具有此種沸點之胺化合物之調配量相對於清洗劑中所含之水溶性二醇醚化合物100重量份通常設為0.1~10重量份之範圍內之值。換言之,該胺化合物之調配量較佳為相對於上述水溶性二醇醚化合物100重量份為0.1~10重量份。 即,其原因在於:若調配過少,則有無法獲得胺化合物之調配效果之情況。 另一方面,其原因在於:若過度調配,則有使構成洗淨裝置之金屬、基板中之導體等腐蝕或臭氣變強之情況。 因此,上述胺化合物之調配量更佳為相對於清洗劑中所含之水溶性二醇醚化合物100重量份設為0.2~5重量份之範圍內之值,進而較佳為設為0.5~3重量份之範圍內之值。Moreover, it is preferable to make the compounding quantity of the amine compound which has such a boiling point into the value within the range of 0.1-10 weight part normally with respect to 100 weight part of water-soluble glycol ether compounds contained in a cleaning agent. In other words, it is preferable that the compounding quantity of this amine compound is 0.1-10 weight part with respect to 100 weight part of said water-soluble glycol ether compounds. That is, the reason for this is that when the amount of the compound is too small, the compounding effect of the amine compound may not be obtained. On the other hand, the reason for this is that, if the mixture is excessively mixed, the metal constituting the cleaning device, the conductors in the substrate, and the like may be corroded, or the odor may become stronger. Therefore, the compounding amount of the above-mentioned amine compound is more preferably a value within the range of 0.2 to 5 parts by weight with respect to 100 parts by weight of the water-soluble glycol ether compound contained in the cleaning agent, and more preferably 0.5 to 3 parts by weight Values within the range of parts by weight.

又,較佳為將沸點為250℃以下之胺化合物之引火點設為30~100℃之範圍內之值。即,上述胺化合物較佳為其引火點為30~100℃。 其原因在於:若為具有此種引火點之胺化合物,則即便相對較多地調配,亦幾乎不會表現出清洗劑之引火點之變動。Moreover, it is preferable to set the flash point of the amine compound whose boiling point is 250 degrees C or less into the value within the range of 30-100 degreeC. That is, the above-mentioned amine compound preferably has a flash point of 30 to 100°C. The reason for this is that in the case of an amine compound having such a flash point, even if it is mixed in a relatively large amount, the flash point of the cleaning agent hardly changes.

因此,作為沸點為250℃以下之胺化合物之較佳例,可列舉N,N,N',N'-四甲基-1,6-己二胺(TMHMDA)、N,N,N',N'-四甲基-1,4-二胺基丁烷(TMDAB)、N,N,N',N'-四甲基-1,3-二胺基丙烷(TMDAP)、二丁胺(DBA)、N,N-二乙基羥基胺(DEHA)、N-乙基乙醇胺(MEM)中之單獨一種或兩種以上之組合。作為兩種以上之上述胺化合物之組合,例如可列舉DBA及DEHA。Therefore, as a preferable example of the amine compound whose boiling point is 250 ℃ or less, N,N,N',N'-tetramethyl-1,6-hexanediamine (TMHMDA), N,N,N', N'-tetramethyl-1,4-diaminobutane (TMDAB), N,N,N',N'-tetramethyl-1,3-diaminopropane (TMDAP), dibutylamine ( DBA), N,N-diethylhydroxylamine (DEHA), N-ethylethanolamine (MEM) alone or a combination of two or more. As a combination of the said amine compound of 2 or more types, DBA and DEHA are mentioned, for example.

於本實施形態之一態樣中,沸點為250℃以下之胺化合物亦可為具有以下之式4~式7之任一者所示之結構之化合物。式7中,-Cq H2q -所示之基可為直鏈狀(於q為1~4之整數之情形時),亦可為支鏈狀(於q為2~4之整數之情形時)。式7中,-Cr H2r -所示之基可為直鏈狀(於r為1~4之整數之情形時),亦可為支鏈狀(於r為2~4之整數之情形時)。 (CH3 )2 -N-(CH2 )n -N-(CH3 )2 (式4) (H-(CH2 )m )2 -NH (式5) (H-(CH2 )p )2 -N-OH (式6) H-Cq H2q -NH-Cr H2r -OH (式7) (式4中,n表示3~6之整數。式5中,m表示4或5之整數。式6中,p表示2~4之整數。式7中,q表示1~4之整數,r表示1~4之整數)。In an aspect of this embodiment, the amine compound whose boiling point is 250 degrees C or less may be a compound having a structure represented by any one of the following formulae 4 to 7. In formula 7, the group represented by -C q H 2q - may be linear (when q is an integer of 1 to 4) or branched (when q is an integer of 2 to 4) Time). In formula 7, the group represented by -C r H 2r - may be linear (when r is an integer of 1 to 4) or branched (when r is an integer of 2 to 4) Time). (CH 3 ) 2 -N-(CH 2 ) n -N-(CH 3 ) 2 (Formula 4) (H-(CH 2 ) m ) 2 -NH (Formula 5) (H-(CH 2 ) p ) 2 -N-OH (Formula 6) HC q H 2q -NH-C r H 2r -OH (Formula 7) (In Formula 4, n represents an integer of 3 to 6. In Formula 5, m represents an integer of 4 or 5 In Formula 6, p represents an integer of 2 to 4. In Formula 7, q represents an integer of 1 to 4, and r represents an integer of 1 to 4).

5.其他調配成分 又,作為清洗劑中調配之其他成分,可列舉抗氧化劑、抗靜電劑、界面活性劑、黏度調整劑等中之至少一種。 而且,該等成分之調配量可分別根據調配目的而適當決定,通常相對於清洗劑之整體量,較佳為設為0.01~10重量%之範圍內之值。5. Other ingredients Moreover, as another component mix|blended with a cleaning agent, at least 1 sort(s) of antioxidant, an antistatic agent, a surfactant, a viscosity modifier, etc. are mentioned. Moreover, the compounding amount of these components can be suitably determined according to the compounding purpose, respectively, but it is generally preferable to set it as the value within the range of 0.01-10weight% with respect to the whole quantity of a cleaning agent.

6.引火點 較佳為將依據JIS K 2265-1及4(引火點之求得方法)而測定之清洗劑之引火點設為50℃以上之值。即,上述清洗劑較佳為其引火點為50℃以上。 其理由在於:即便於清洗劑具有引火點之情形時,只要為其值為50℃以上,亦更容易操作,並且可進而提昇安全性。 但是,於清洗劑具有引火點之情形時,若其值超過120℃,則有就再生方面而言可使用之清洗劑之調配成分之種類過度受限或成本變高而經濟上不利之情況。 因此,較佳為將清洗劑之引火點設為60~120℃之範圍內之值,進而較佳為設為70~100℃之範圍內之值。6. Ignition point Preferably, the flash point of the cleaning agent measured in accordance with JIS K 2265-1 and 4 (method for obtaining flash point) is set to a value of 50° C. or higher. That is, it is preferable that the above-mentioned cleaning agent has a flash point of 50° C. or higher. The reason for this is that even when the cleaning agent has an ignition point, as long as the value is 50° C. or higher, it is easier to handle, and the safety can be further improved. However, when the cleaning agent has a flash point, if the value exceeds 120° C., the types of ingredients that can be used in the cleaning agent for regeneration are excessively limited, or the cost increases, which is economically disadvantageous. Therefore, it is preferable to set the flash point of the cleaning agent to a value within a range of 60 to 120°C, and more preferably to a value within a range of 70 to 100°C.

7.透光率 又,較佳為將室溫至80℃之溫度範圍內之清洗劑之透光率(可見光透過率)設為90%以上之值。即,上述清洗劑較佳為室溫至80℃之溫度範圍內之透光率為90%以上。 其理由在於:藉由在此種溫度範圍(室溫至80℃)內具有特定之透光率,可判斷不會相分離,事實上不具有濁點。因此,既然於特定溫度範圍內不具有濁點,則可提供使用便利性良好之清洗劑。 即,其原因在於:如此,於清洗劑未發生相分離而透明之期間,可使作為前一步驟之洗淨步驟中使用之苯甲醇、疏水性二醇醚化合物等有效地相溶。並且,其原因在於:此時亦不會發生助焊劑之再附著,可充分地作為清洗劑發揮功能。 因此,更佳為將室溫至80℃之溫度範圍內之清洗劑之透光率設為95%以上之值,進而較佳為設為98%以上之值。上述透光率之上限於無損本發明之效果之範圍內並無特別限制,例如可列舉100%以下。 再者,透光率之測定係使用分光光度計(日本分光股份有限公司製造,製品名:紫外可見分光光度計V-530),於可見光(波長660 nm)、室溫(25℃)~80℃之條件下進行。7. Light transmittance Moreover, it is preferable to set the light transmittance (visible light transmittance) of the cleaning agent in the temperature range of room temperature to 80 degreeC to the value of 90% or more. That is, the above-mentioned cleaning agent preferably has a light transmittance of 90% or more in a temperature range from room temperature to 80°C. The reason for this is that by having a specific light transmittance in such a temperature range (room temperature to 80° C.), it can be judged that there is no phase separation, and in fact, there is no cloud point. Therefore, since it does not have a cloud point in a specific temperature range, a cleaning agent with good ease of use can be provided. That is, the reason is that the benzyl alcohol, the hydrophobic glycol ether compound, etc. used in the cleaning step which is the previous step can be effectively compatible with each other while the cleaning agent is transparent without phase separation. In addition, the reason for this is that the re-adhesion of the flux does not occur at this time, and it can sufficiently function as a cleaning agent. Therefore, it is more preferable to set the light transmittance of the cleaning agent in a temperature range of room temperature to 80° C. to a value of 95% or more, and more preferably to a value of 98% or more. The above-mentioned light transmittance is not particularly limited as long as the effect of the present invention is not impaired, and for example, 100% or less can be mentioned. Furthermore, the light transmittance was measured using a spectrophotometer (manufactured by JASCO Corporation, product name: UV-Vis Spectrophotometer V-530) under visible light (wavelength 660 nm) and room temperature (25°C) ~ 80 ℃ conditions.

8.接觸角 又,關於本發明中使用之清洗劑,較佳為減少對被洗淨物之表面改質。 即,可謂即便本發明中使用之清洗劑與被洗淨物接觸,被洗淨物之乾燥後之水之接觸角變化亦非常少,本發明之清洗劑對被洗淨物造成之影響亦極少。 更具體而言,較佳為於將相對於表面經感光性阻焊劑硬化體保護之印刷基板之阻劑表面的水之初始接觸角設為θ1 ,且將相對於在30℃之清洗劑中浸漬10分鐘後之該阻劑表面的水之接觸角設為θ2 時,將該等接觸角之差之絕對值|θ2 -θ1 |設為3°以下之值。 換言之,較佳為於將相對於表面經感光性阻焊劑硬化體保護之印刷基板之阻劑表面的水之初始接觸角設為θ1 ,且將相對於將上述印刷基板於30℃之清洗劑中浸漬10分鐘後,於100℃、5分鐘之條件下進行乾燥之上述印刷基板之阻劑表面的水之接觸角設為θ2 時,接觸角θ2 與θ1 之差之絕對值|θ2 -θ1 |為3°以下。 其理由在於:若該接觸角之差之絕對值超過3°,則有阻劑與密封樹脂之密接性或電絕緣性、進而機械強度過度下降之情況。 因此,更佳為將該接觸角之差之絕對值|θ2 -θ1 |設為2°以下之值,進而較佳為設為1°以下之值。上述接觸角之差之絕對值|θ2 -θ1 |之下限並無特別限制,例如可列舉0°以上。8. Contact Angle In addition, the cleaning agent used in the present invention is preferably to reduce surface modification of the object to be cleaned. That is, even if the cleaning agent used in the present invention comes into contact with the object to be cleaned, the change in the contact angle of water after drying the object to be cleaned is very small, and the cleaning agent of the present invention has very little influence on the object to be cleaned. . More specifically, it is preferable to set the initial contact angle with respect to the water on the resist surface of the printed circuit board whose surface is protected by the photosensitive solder resist cured body as θ 1 , and set the initial contact angle with respect to the water in the cleaning agent at 30° C. When the contact angle of water on the surface of the resist after immersion for 10 minutes is set to θ 2 , the absolute value |θ 21 | of the difference between the contact angles is set to a value of 3° or less. In other words, it is preferable to set the initial contact angle with respect to the water on the resist surface of the printed circuit board whose surface is protected by the photosensitive solder resist cured body as θ 1 , and set the initial contact angle with respect to the cleaning agent of the printed circuit board at 30° C. The absolute value of the difference between the contact angles θ 2 and θ 1 | θ 2 −θ 1 | is 3° or less. The reason for this is that when the absolute value of the difference between the contact angles exceeds 3°, the adhesion between the resist and the sealing resin, the electrical insulating properties, and the mechanical strength may be excessively lowered. Therefore, it is more preferable to set the absolute value |θ 2 −θ 1 | of the difference between the contact angles to a value of 2° or less, and more preferably to set it to a value of 1° or less. The lower limit of the absolute value |θ 2 −θ 1 | of the difference between the contact angles is not particularly limited, and for example, it is 0° or more.

9.製造方法 本實施形態之清洗劑之製造方法包括將上述水溶性二醇醚化合物及水等成分混合之步驟。關於該進行混合之步驟,只要將上述水溶性二醇醚化合物及水等成分均勻地混合,則可使用任何方法。作為進行混合之步驟,例如可列舉於燒瓶中添加特定之成分並利用磁力攪拌器進行攪拌混合。又,於化學設備等中,亦可以工業規模將上述水溶性二醇醚化合物及水等成分混合。9. Manufacturing method The manufacturing method of the cleaning agent of this embodiment includes the step of mixing components such as the above-mentioned water-soluble glycol ether compound and water. Regarding the step of mixing, any method can be used as long as the components such as the water-soluble glycol ether compound and water are uniformly mixed. As a step of mixing, for example, adding a specific component to a flask, and stirring and mixing with a magnetic stirrer can be mentioned. Moreover, in a chemical facility etc., components, such as the said water-soluble glycol ether compound and water, can also be mixed on an industrial scale.

[第2實施形態] 第2實施形態係一種清洗劑之使用方法,其特徵在於具有下述步驟(1)~步驟(2)。 (1)將附著於被洗淨物之助焊劑利用包含苯甲醇及疏水性二醇醚化合物、或者任一者之洗淨液洗淨之步驟。 (2)使用清洗劑清洗於上述步驟(1)中洗淨之被洗淨物之步驟,該清洗劑係至少包含水溶性二醇醚化合物及水,且苯甲醇之溶解度為10 vol%以上者,且相對於水溶性二醇醚化合物100重量份,將水之調配量設為50~1000重量份。 即,第2實施形態為以具有步驟(1)~步驟(2)為特徵之使用特定洗淨劑及清洗劑之助焊劑之洗淨方法。[Second Embodiment] The second embodiment is a method of using a cleaning agent, characterized by having the following steps (1) to (2). (1) A step of cleaning the flux adhering to the object to be cleaned with a cleaning solution containing benzyl alcohol, a hydrophobic glycol ether compound, or any of them. (2) The step of cleaning the object to be cleaned in the above step (1) with a cleaning agent, the cleaning agent contains at least a water-soluble glycol ether compound and water, and the solubility of benzyl alcohol is 10 vol% or more. , and relative to 100 parts by weight of the water-soluble glycol ether compound, the preparation amount of water is set to 50 to 1000 parts by weight. That is, the second embodiment is a cleaning method characterized by the steps (1) to (2) using a specific cleaning agent and a flux of the cleaning agent.

於上述第2實施形態之另一態樣中,上述清洗劑之使用方法係包括下述步驟(1)~(2)之清洗劑之使用方法。 (1)使用包含苯甲醇及疏水性二醇醚化合物、或者任一者之洗淨劑,將附著於被洗淨物之助焊劑洗淨之步驟 (2)使用清洗劑清洗於上述步驟(1)中洗淨之上述被洗淨物之步驟,該清洗劑係至少包含水溶性二醇醚化合物及水,且上述苯甲醇之溶解度為10 vol%以上者,且相對於上述水溶性二醇醚化合物100重量份,上述水之調配量為50~1000重量份In another aspect of the above-mentioned second embodiment, the method of using the cleaning agent includes the following steps (1) to (2) of the method of using the cleaning agent. (1) Step of cleaning the flux adhering to the object to be cleaned using a cleaning agent containing benzyl alcohol, a hydrophobic glycol ether compound, or any of them (2) The step of cleaning the above-mentioned object to be cleaned in the above-mentioned step (1) with a cleaning agent, the cleaning agent contains at least a water-soluble glycol ether compound and water, and the solubility of the above-mentioned benzyl alcohol is 10 vol% The above, and with respect to 100 parts by weight of the water-soluble glycol ether compound, the amount of the water to be formulated is 50 to 1000 parts by weight.

1.步驟(1) 步驟(1)係將焊接之半導體元件、例如BGA(ball grid array,球柵陣列)、CSP(chip size package,晶片尺寸封裝)、PGA(pin grid array,針柵陣列)、LGA(land grid array,接點柵陣列)等半導體零件、半導體搭載TAB(tape automated bonding,卷帶自動接合)帶、半導體搭載引線框架、半導體搭載電容器、半導體搭載電阻、半導體元件用基板等被洗淨物使用洗淨劑洗淨之步驟。 即,由於在該等被洗淨物之焊接時使用助焊劑,故而於焊接之部分附著有助焊劑。 而且,此種助焊劑以松香為主成分,含有有機酸鹽、縮水甘油醚化合物、含氧酸、(二)羧酸等。 又,由於在加熱下進行焊接,故而該助焊劑亦含有松香等之熱變性體。 因此,由於非常難以使用水溶性之二醇醚化合物將助焊劑去除,故而助焊劑之去除較佳為使用疏水性之二醇醚化合物或苯甲醇。1. Step (1) Step (1) is to solder semiconductor components, such as BGA (ball grid array, ball grid array), CSP (chip size package, chip size package), PGA (pin grid array, pin grid array), LGA (land grid array) , contact grid array) and other semiconductor parts, semiconductor mounting TAB (tape automated bonding, tape and tape automatic bonding) tape, semiconductor mounting lead frames, semiconductor mounting capacitors, semiconductor mounting resistors, semiconductor element substrates, etc. cleaning steps. That is, since the flux is used in the soldering of the objects to be cleaned, the flux adheres to the soldered portion. Moreover, this type of flux contains rosin as a main component, and contains an organic acid salt, a glycidyl ether compound, an oxyacid, a (di)carboxylic acid, and the like. In addition, since the soldering is performed under heating, the flux also contains thermally denatured substances such as rosin. Therefore, since it is very difficult to use a water-soluble glycol ether compound to remove the flux, it is preferable to use a hydrophobic glycol ether compound or benzyl alcohol for the removal of the flux.

因此,作為使用之苯甲醇類(有時亦簡稱為「苯甲醇」)之較佳例,可列舉乙基苯甲醇、甲基苯甲醇、苯甲醇等,該等係單獨使用或以兩種以上之組合使用。 而且,尤其是於本發明中,最佳為使用苯甲醇。 其理由在於:若為苯甲醇,則即便為相對短時間,亦可顯示出優異之洗淨性。Therefore, preferable examples of the benzyl alcohols to be used (sometimes abbreviated as "benzyl alcohol") include ethyl benzyl alcohol, methyl benzyl alcohol, benzyl alcohol, etc., which are used alone or in combination of two or more kinds. used in combination. Moreover, especially in this invention, it is preferable to use benzyl alcohol. The reason for this is that in the case of benzyl alcohol, even for a relatively short period of time, excellent detergency can be exhibited.

又,作為本發明中使用之疏水性二醇醚化合物之例,可列舉丙二醇單丁醚(BFG)、二丙二醇二甲醚(DMFDG)、二丙二醇單丁醚(BFDG)、二丙二醇單丙醚(PFDG)、二乙二醇單己醚(HeDG)、乙二醇單苯醚(PhG)、二乙二醇單苯醚(PhDG)、乙二醇單苄醚(BzG)、丙二醇單苯醚(PhFG)、二乙二醇二丁醚(DBDG)等中之單獨一種或兩種以上之組合。再者,作為此處使用之疏水性二醇醚化合物,例如較佳為表現出於水中之溶解度(測定溫度:20℃)為50重量%以下之疏水性者。Further, examples of the hydrophobic glycol ether compound used in the present invention include propylene glycol monobutyl ether (BFG), dipropylene glycol dimethyl ether (DMFDG), dipropylene glycol monobutyl ether (BFDG), and dipropylene glycol monopropyl ether. (PFDG), diethylene glycol monohexyl ether (HeDG), ethylene glycol monophenyl ether (PhG), diethylene glycol monophenyl ether (PhDG), ethylene glycol monobenzyl ether (BzG), propylene glycol monophenyl ether (PhFG), diethylene glycol dibutyl ether (DBDG), etc. alone or in combination of two or more. In addition, as the hydrophobic glycol ether compound used here, it is preferable that the solubility in water (measurement temperature: 20 degreeC) shows the hydrophobicity of 50 weight% or less, for example.

進而,於本發明中,亦可將苯甲醇與疏水性二醇醚化合物這兩者混合而使用。 又,亦可於苯甲醇或疏水性二醇醚化合物中調配其他成分。 再者,作為洗淨劑中調配之其他成分,可列舉水溶性二醇醚化合物、胺化合物、抗氧化劑、抗靜電劑、界面活性劑、防銹劑、黏度調整劑等中之至少一者。Furthermore, in this invention, you may mix and use both benzyl alcohol and a hydrophobic glycol ether compound. Moreover, other components can also be mix|blended with benzyl alcohol or a hydrophobic glycol ether compound. In addition, as other components mix|blended with a detergent, at least one of a water-soluble glycol ether compound, an amine compound, antioxidant, an antistatic agent, a surfactant, a rust inhibitor, a viscosity modifier, etc. is mentioned.

2.步驟(2) 步驟(2)係使用特定之清洗劑清洗於步驟(1)中使用特定洗淨劑洗淨之被洗淨物之步驟。 而且,於步驟(2)中,藉由使用於第1實施形態中說明之清洗劑,可將步驟(1)之洗淨步驟中使用之苯甲醇等之溶解度調整為10 vol%以上之較高之值。 因此,即便起因於步驟(1)之特定洗淨劑而相對於步驟(2)之清洗劑流入相對大量之苯甲醇,清洗劑亦不會於室溫至80℃之間相分離,濁度不會下降,而可維持特定之透明性。2. Step (2) The step (2) is a step of using a specific cleaning agent to clean the object to be cleaned using the specific cleaning agent in the step (1). Furthermore, in the step (2), by using the cleaning agent described in the first embodiment, the solubility of the benzyl alcohol or the like used in the cleaning step in the step (1) can be adjusted to be as high as 10 vol% or more value. Therefore, even if a relatively large amount of benzyl alcohol flows into the cleaning agent of step (2) due to the specific cleaning agent of step (1), the cleaning agent will not phase-separate between room temperature and 80°C, and the turbidity will not be reduced. will decrease while maintaining a certain level of transparency.

又,本發明中使用之清洗劑藉由如上述般於水溶性二醇醚化合物中調配特定量之水,可將苯甲醇之溶解度保持為10 vol%以上。 因此,可使起因於洗淨劑而混入至清洗劑之苯甲醇或疏水性二醇醚化合物容易地相溶。 而且,根據本發明之清洗劑,亦可有效地抑制溶解於洗淨劑中之助焊劑之再附著,亦發揮作為洗淨液之功能,因此可獲得純淨度非常高之被洗淨物。In addition, the cleaning agent used in the present invention can maintain the solubility of benzyl alcohol at 10 vol% or more by mixing a specific amount of water with the water-soluble glycol ether compound as described above. Therefore, the benzyl alcohol or the hydrophobic glycol ether compound mixed into the cleaning agent due to the cleaning agent can be easily compatible with each other. Furthermore, according to the cleaning agent of the present invention, the re-adhesion of the flux dissolved in the cleaning agent can be effectively suppressed, and the cleaning agent can also function as a cleaning liquid, so that a cleaning object with a very high degree of purity can be obtained.

3.乾燥步驟 較佳為於進行清洗處理(步驟(2))後,實施使被洗淨物乾燥之步驟。 關於該乾燥條件,可適當設定,但較佳為將乾燥溫度通常設為60~120℃之範圍內之值,更佳為設為80~100℃之範圍內之值。 而且,於該範圍內之乾燥溫度下,通常藉由吹送熱風1~20分鐘、較佳為5~10分鐘而進行乾燥。 如此可於短時間內乾燥之原因在於採用如下構成:將本發明之清洗劑設為水系,沸點相對較高,但少量添加特定之二醇醚。 因此,藉由以上述方式進行乾燥,將清洗劑之調配成分幾乎完全去除,而成為除防銹劑等有意殘留之成分以外,於被洗淨物之表面幾乎不殘留多餘成分之狀態。 [實施例]3. Drying step It is preferable to perform the step of drying the object to be washed after the washing process (step (2)). The drying conditions can be appropriately set, but the drying temperature is preferably set to a value within a range of 60 to 120°C, more preferably within a range of 80 to 100°C. Moreover, at the drying temperature within this range, drying is usually performed by blowing hot air for 1 to 20 minutes, preferably 5 to 10 minutes. The reason why this can be dried in a short time is that the cleaning agent of the present invention is water-based and has a relatively high boiling point, but a small amount of a specific glycol ether is added. Therefore, by drying in the above-described manner, the preparation components of the cleaning agent are almost completely removed, and the surface of the object to be cleaned is in a state where almost no excess components remain except for the components intentionally remaining such as the rust inhibitor. [Example]

其次,示出本發明之實施例而更詳細地對本發明進行說明,但本發明並不受該等之限定。 再者,於下表中表記構成實施例之清洗劑時所使用之化合物之名稱以及其簡稱及其物性。Next, although the Example of this invention is shown and this invention is demonstrated in detail, this invention is not limited to these. In addition, in the following table, the names of the compounds used to constitute the cleaning agents of the examples, their abbreviations and their physical properties are shown.

[表1]

Figure 108104125-A0304-0001
[Table 1]
Figure 108104125-A0304-0001

[實施例1] 1.步驟(1) 作為洗淨裝置,使用微型清潔器MC3USHD-1.5E(Kaken Tech股份有限公司製造),並且於其洗淨槽中收容作為洗淨液之苯甲醇。 繼而,使洗淨裝置動作,將作為被洗淨物之附半導體元件之基板洗淨。 即,使用收容於洗淨槽之作為洗淨液之苯甲醇,使被洗淨物浸漬於其中,於70℃、5分鐘之條件下進行超音波洗淨。[Example 1] 1. Step (1) As a cleaning device, a micro cleaner MC3USHD-1.5E (manufactured by Kaken Tech Co., Ltd.) was used, and benzyl alcohol as a cleaning solution was accommodated in the cleaning tank. Next, the cleaning device is operated to clean the substrate with the semiconductor element as the object to be cleaned. That is, using benzyl alcohol as a cleaning solution contained in a cleaning tank, the object to be cleaned was immersed in it, and ultrasonic cleaning was performed under the conditions of 70° C. for 5 minutes.

2.步驟(2) 繼而,使用搬送裝置將洗淨槽中洗淨之被洗淨物移動至清洗槽。 即,於收容清洗液之清洗槽中,於30℃、5分鐘之條件下,對被洗淨物進行對清洗劑之浸漬處理,進而進行清洗處理。將該清洗劑之組成及特性示於表2。 再者,於貯存清洗劑之清洗槽設置有特定之蒸餾裝置,對清洗液進行蒸餾,進行相溶之苯甲醇之分離。2. Step (2) Next, the to-be-cleaned object washed in the washing tank is moved to the washing tank using a conveying device. That is, in the cleaning tank which accommodated the cleaning liquid, under the conditions of 30 degreeC and 5 minutes, the to-be-cleaned object was immersed in the cleaning agent, and the cleaning process was further performed. The composition and characteristics of this cleaning agent are shown in Table 2. Furthermore, a specific distillation device is installed in the cleaning tank for storing the cleaning agent, and the cleaning solution is distilled to separate the compatible benzyl alcohol.

3.乾燥步驟 將以上述方式進行清洗處理之被洗淨物自清洗槽取出,於100℃、5分鐘之乾燥條件下進行熱風乾燥。 其結果,目視確認到自被洗淨物之表面將清洗劑等完全去除。3. Drying step The object to be cleaned subjected to the cleaning treatment in the above manner was taken out from the cleaning tank, and was dried with hot air under the drying conditions of 100° C. and 5 minutes. As a result, it was visually confirmed that the cleaning agent and the like were completely removed from the surface of the object to be washed.

4.物性評價(1) (1)苯甲醇之溶解度之測定方法 於容量200 ml之量筒中稱取100 ml之清洗劑。於其中滴加1 ml之苯甲醇並進行攪拌。若攪拌而溶液均勻透明,則再次滴加1 ml之苯甲醇並進行攪拌。 繼而,反覆進行上述滴加及攪拌,測定攪拌後發生白濁/分離之時點所滴加之苯甲醇之總容量(ml),測定最終相對於清洗劑溶解了多少ml之苯甲醇。 由此算出苯甲醇之溶解量(vol%),設為於清洗劑中之苯甲醇之溶解度。4. Evaluation of physical properties (1) (1) Determination method of the solubility of benzyl alcohol Weigh 100 ml of detergent into a 200 ml graduated cylinder. 1 ml of benzyl alcohol was added dropwise thereto and stirred. If the solution is uniform and transparent after stirring, add 1 ml of benzyl alcohol dropwise again and stir. Then, the above-mentioned dropwise addition and stirring were repeated, and the total volume (ml) of benzyl alcohol added dropwise at the point when cloudiness/separation occurred after stirring was measured, and finally how much ml of benzyl alcohol dissolved in the cleaning agent was measured. From this, the dissolved amount (vol%) of benzyl alcohol was calculated, and it was set as the solubility of benzyl alcohol in a cleaning agent.

(2)清洗性(沖洗性)之評價方法 將苯甲醇及清洗劑各200 g分別收容於容量300 ml之燒杯內部。其後,苯甲醇係將溫度維持於60℃,清洗劑係將溫度維持於30℃。 繼而,將環氧玻璃基板收容至放入有苯甲醇之燒杯之內部,於該狀態下,使該放入有苯甲醇之燒杯內之磁力攪拌器旋轉,進行10分鐘之浸漬。 繼而,使磁力攪拌器之旋轉停止,將環氧玻璃基板自苯甲醇取出後,將環氧玻璃基板收容於放入有清洗劑之燒杯之內部,於該狀態下,使該放入有清洗劑之燒杯內之磁力攪拌器旋轉,進行特定時間之浸漬。 繼而,使磁力攪拌器之旋轉停止,將環氧玻璃基板自清洗劑取出,使用保持於100℃之循環烘箱,進行10分鐘之乾燥。 其後,將經乾燥之環氧玻璃基板自循環烘箱取出,目視觀察表面,對照以下之基準,進行清洗劑之清洗性(沖洗性)評價。 A:清洗時間5分鐘且無苯甲醇之液體殘留。 A':清洗時間7分鐘且無苯甲醇之液體殘留。 B:清洗時間10分鐘且無苯甲醇之液體殘留。 C:清洗時間10分鐘且有少許苯甲醇之液體殘留。 D:清洗時間10分鐘且有苯甲醇之大量液體殘留。 E:清洗時間15分鐘且有苯甲醇之大量液體殘留。(2) Evaluation method of cleaning property (rinsing property) 200 g each of benzyl alcohol and cleaning agent were placed in a beaker with a capacity of 300 ml. After that, the temperature of the benzyl alcohol system was maintained at 60°C, and the temperature of the cleaning agent system was maintained at 30°C. Next, the epoxy glass substrate was accommodated in the beaker in which the benzyl alcohol was placed, and in this state, the magnetic stirrer in the beaker in which the benzyl alcohol was placed was rotated, and immersion was performed for 10 minutes. Then, the rotation of the magnetic stirrer was stopped, and the glass epoxy substrate was taken out from the benzyl alcohol, and then the glass epoxy substrate was accommodated in the beaker containing the cleaning agent, and in this state, the cleaning agent was placed in the glass epoxy substrate. The magnetic stirrer in the beaker rotates to carry out the immersion for a specific time. Then, the rotation of the magnetic stirrer was stopped, the glass epoxy substrate was taken out from the cleaning agent, and dried for 10 minutes using a circulating oven maintained at 100°C. After that, the dried epoxy glass substrate was taken out from the circulation oven, the surface was visually observed, and the cleaning property (rinsing property) of the cleaning agent was evaluated against the following criteria. A: The cleaning time is 5 minutes and there is no liquid residue of benzyl alcohol. A': The cleaning time was 7 minutes and no liquid of benzyl alcohol remained. B: The cleaning time was 10 minutes and no liquid of benzyl alcohol remained. C: The cleaning time was 10 minutes and a little liquid of benzyl alcohol remained. D: The cleaning time was 10 minutes and a large amount of liquid of benzyl alcohol remained. E: The cleaning time was 15 minutes and a large amount of liquid of benzyl alcohol remained.

(3)乾燥性之評價方法 將清洗劑200 g收容於容量300 ml之燒杯內部後,將溫度維持於30℃。 繼而,將環氧玻璃基板收容於放入有200 g之清洗劑之燒杯之內部,於該狀態下,使該燒杯內之磁力攪拌器旋轉,進行10分鐘之浸漬。繼而,使磁力攪拌器之旋轉停止,將環氧玻璃基板自清洗劑取出,使用保持於100℃之循環烘箱,進行特定時間之乾燥。其後,將經乾燥之環氧玻璃基板自循環烘箱取出,目視觀察表面,對照以下之基準,進行清洗劑之乾燥性評價。 A:5分鐘以內且可乾燥。 A':7分鐘以內且可乾燥。 B:10分鐘以內且可乾燥。 C:10分鐘之乾燥且有少許液體殘留。 D:10分鐘之乾燥且有大量液體殘留。(3) Evaluation method of dryness After storing 200 g of the cleaning agent in a beaker with a capacity of 300 ml, the temperature was maintained at 30°C. Next, the epoxy glass substrate was accommodated in a beaker containing 200 g of cleaning agent, and in this state, the magnetic stirrer in the beaker was rotated to perform immersion for 10 minutes. Then, the rotation of the magnetic stirrer was stopped, the glass epoxy substrate was taken out from the cleaning agent, and dried for a specific time using a circulating oven maintained at 100°C. Then, the dried epoxy glass substrate was taken out from the circulation oven, the surface was visually observed, and the drying property of the cleaning agent was evaluated against the following criteria. A: It can be dried within 5 minutes. A': It can be dried within 7 minutes. B: It can be dried within 10 minutes. C: 10 minutes of drying with a little liquid remaining. D: 10 minutes of drying with a large amount of liquid remaining.

(4)離子交換水接觸角度之測定方法 將表面經感光性阻焊劑(日立化成工業(股)製造之SR系列)保護之印刷配線基板用作接觸角測定標準樣品。測定相對於洗淨前之阻焊劑表面、及利用各種清洗劑於攪拌浸漬30℃/10分鐘之條件下進行清洗處理後於熱風100℃/5分鐘之條件下進行乾燥處理之阻劑表面,離子交換水之接觸角之變化(|θ2 -θ1 |)。此處,θ1 表示相對於洗淨前之阻焊劑表面的離子交換水之接觸角(初始接觸角),θ2 表示相對於實施上述清洗處理及乾燥處理後之阻劑表面的離子交換水之接觸角。(4) Measurement method of ion-exchanged water contact angle A printed wiring board whose surface was protected by a photosensitive solder resist (SR series manufactured by Hitachi Chemical Co., Ltd.) was used as a contact angle measurement standard sample. Relative to the surface of the solder resist before cleaning, and the surface of the resist that was cleaned with various cleaning agents under the condition of stirring and immersing at 30°C/10 minutes and then dried under the condition of hot air at 100°C/5 minutes, the ionic Changes in the contact angle of exchange water (|θ 2 −θ 1 |). Here, θ 1 represents the contact angle (initial contact angle) with respect to the ion-exchanged water on the surface of the solder resist before cleaning, and θ 2 represents the contact angle with respect to the ion-exchanged water on the surface of the resist after performing the above-mentioned cleaning treatment and drying treatment. Contact angle.

(5)濁點之測定方法 將樣品(清洗劑)之液溫設為20℃,一面測定外觀一面逐漸地升溫,將樣品開始發生白濁或分離時之溫度設為濁點。 但是,該濁點較佳為至少於室溫至80℃之溫度範圍內不存在。 即,其原因在於:由於在此種使用溫度範圍(室溫至80℃)內不具有濁點而維持透明性,故而可提供使用便利性良好之清洗劑。 因此,如此藉由於特定溫度範圍內具有透明性而具有特定之透光率,從而於室溫至80℃之溫度範圍內不會相分離的情況於實用上較為便利。 再者,下述表2~表4中之濁點之「無」之評價係指於20℃~80℃之範圍內清洗劑不發生白濁及分離。(5) Determination method of cloud point The liquid temperature of the sample (cleaning agent) was set to 20° C., the temperature was gradually increased while measuring the appearance, and the temperature at which the sample started to become cloudy or separated was set as the cloud point. However, the cloud point is preferably absent in a temperature range of at least room temperature to 80°C. That is, since it does not have a cloud point in such a use temperature range (room temperature - 80 degreeC), and maintains transparency, it is because it can provide the cleaning agent with favorable usability. Therefore, it is practically convenient to have a specific light transmittance due to transparency in a specific temperature range, so that no phase separation occurs in a temperature range from room temperature to 80°C. In addition, the evaluation of "None" of the cloud point in the following Tables 2 to 4 means that the cleaning agent does not become cloudy or separate in the range of 20°C to 80°C.

(6)濁度之測定方法、助焊劑之再附著性評價 使用市售之後焊劑(型號:SPARKLE FLUX PO-Z-7(千往金屬工業(股)製造),自該後焊劑蒸餾去除溶劑成分後,將回收之固形物成分殘渣(助焊劑)作為試樣。 而且,以相對於苯甲醇成為3重量%之方式添加助焊劑。 將以此方式獲得之混入有助焊劑之苯甲醇溶液於各清洗劑中添加1重量%,使用水質計WA-1(日本電色工業(股)製造)測定濁度。將該濁度作為助焊劑之再附著性之指標。再者,可謂濁度越接近於0則越透明且均勻而不易再附著。(6) Measurement method of turbidity, evaluation of re-adhesion of flux A commercially available post-flux (model: SPARKLE FLUX PO-Z-7 (manufactured by Sento Metal Industry Co., Ltd.) was used, and after the solvent was distilled off from the post-flux, the recovered solid residue (flux) was used as a sample . And flux was added so that it might become 3 weight% with respect to benzyl alcohol. 1% by weight of the flux-mixed benzyl alcohol solution obtained in this way was added to each cleaning agent, and the turbidity was measured using a water quality meter WA-1 (manufactured by Nippon Denshoku Kogyo Co., Ltd.). The haze was used as an index of the re-adhesion of the flux. In addition, it can be said that the closer the turbidity is to 0, the more transparent and uniform it is, and the more difficult it is to reattach.

(7)引火點之測定方法 清洗劑之引火點係依據JIS K 2265-1及4(引火點之求得方法)而測定。 再者,關於引火點,較佳為不具有引火點,但即便有引火點,亦較佳為50℃以上之溫度。此處,「不具有引火點」係指於室溫以上且上述清洗劑之沸點以下之範圍內不存在引火點。(7) Determination method of ignition point The flash point of the cleaning agent was measured in accordance with JIS K 2265-1 and 4 (method for obtaining flash point). In addition, it is preferable that a flash point does not have a flash point, but even if there is a flash point, the temperature of 50 degreeC or more is preferable. Here, "having no flash point" means that there is no flash point in the range above room temperature and below the boiling point of the cleaning agent.

[實施例2] 於實施例2中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS),使用相同量之ETB,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 2] In Example 2, the same amount of ETB was used in place of the ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, and the treatment of the object to be washed was performed in the same manner. The obtained results are shown in Table 2.

[實施例3] 於實施例3中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS),使用相同量之MMB,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 3] In Example 3, the same amount of MMB was used in place of the ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, and the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 2.

[實施例4] 於實施例4中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS),使用相同量之iPG,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 4] In Example 4, the same amount of iPG was used in place of the ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, and the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 2.

[實施例5] 於實施例5中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS),使用相同量之DPM,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 5] In Example 5, the same amount of DPM was used in place of the ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, and the treatment of the object to be washed was performed in the same manner. The obtained results are shown in Table 2.

[實施例6] 於實施例6中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS),使用相同量之MEDG,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 6] In Example 6, the same amount of MEDG was used instead of the ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, and the treatment of the object to be washed was performed in the same manner. The obtained results are shown in Table 2.

[實施例7] 於實施例7中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS),使用相同量之DMTG,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 7] In Example 7, the same amount of DMTG was used in place of the ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, and the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 2.

[實施例8] 於實施例8中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS),使用相同量之DMDG,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 8] In Example 8, the same amount of DMDG was used in place of the ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, and the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 2.

[實施例9] 於實施例9中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,將PS之使用量設為20重量份,並將水之量改為80重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 9] In Example 9, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, the amount of PS used was set to 20 parts by weight, and the amount of water was changed to 80 parts by weight. Parts by weight, other than this, the treatment of the object to be washed is carried out in the same manner. The obtained results are shown in Table 2.

[實施例10] 於實施例10中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用PS 15重量份及MMB 15重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 10] In Example 10, in place of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, 15 parts by weight of PS and 15 parts by weight of MMB were used in the same manner. Carry out the treatment of the cleaned objects. The obtained results are shown in Table 2.

[實施例11] 於實施例11中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS),使用PS15重量份及MMB15重量份,進而使用作為胺化合物之TMHMDA1重量份,並將水之量改為69重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 11] In Example 11, instead of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 15 parts by weight of PS and 15 parts by weight of MMB were used, and 1 part by weight of TMHMDA as an amine compound was used, and water Except that the amount was changed to 69 parts by weight, the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 2.

[實施例12] 於實施例12中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS),使用PS 15重量份及MMB 15重量份,進而分別使用作為胺化合物之DBA 0.5重量份及DEHA 0.5重量份,並將水之量改為69重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 12] In Example 12, instead of the ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, 15 parts by weight of PS and 15 parts by weight of MMB were used, and 0.5 parts by weight of DBA as an amine compound was used respectively and DEHA 0.5 parts by weight, except that the amount of water was changed to 69 parts by weight, the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 2.

[實施例13] 於實施例13中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用PS 20重量份及MMB 20重量份,進而將水之量改為60重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 13] In Example 13, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 20 parts by weight of PS and 20 parts by weight of MMB were used, and then the amount of water was changed to 60 Parts by weight, other than this, the treatment of the object to be washed is carried out in the same manner. The obtained results are shown in Table 2.

[實施例14] 於實施例14中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用ETB 30重量份,進而使用作為胺化合物之TMHMDA 1重量份,進而將水之量改為69重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 14] In Example 14, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 30 parts by weight of ETB was used, and then 1 part by weight of TMHMDA as an amine compound was used, and then Except that the amount of water was changed to 69 parts by weight, the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 2.

[實施例15] 於實施例15中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用DPM 30重量份,進而使用作為胺化合物之DBA 0.5重量份及DEHA 0.5重量份,進而將水之量改為69重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表2。[Example 15] In Example 15, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 30 parts by weight of DPM was used, and 0.5 parts by weight of DBA and 0.5 parts by weight of DEHA were used as amine compounds Parts by weight, and the amount of water was changed to 69 parts by weight, and the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 2.

[實施例16] 於實施例16中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用PS 30重量份及DPM 5重量份,進而將水之量改為65重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表3。[Example 16] In Example 16, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 30 parts by weight of PS and 5 parts by weight of DPM were used, and then the amount of water was changed to 65 Parts by weight, other than this, the treatment of the object to be washed is carried out in the same manner. The obtained results are shown in Table 3.

[實施例17] 於實施例17中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用PS 10重量份及DMTG 30重量份,進而將水之量改為60重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表3。[Example 17] In Example 17, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 10 parts by weight of PS and 30 parts by weight of DMTG were used, and then the amount of water was changed to 60 Parts by weight, other than this, the treatment of the object to be washed is carried out in the same manner. The obtained results are shown in Table 3.

[實施例18] 於實施例18中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用ETB 10重量份及MMB 20重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表3。[Example 18] In Example 18, in place of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, 10 parts by weight of ETB and 20 parts by weight of MMB were used in the same manner. Carry out the treatment of the cleaned objects. The obtained results are shown in Table 3.

[實施例19] 於實施例19中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用ETB 10重量份及DPM 15重量份,進而將水之量改為75重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表3。[Example 19] In Example 19, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, 10 parts by weight of ETB and 15 parts by weight of DPM were used, and then the amount of water was changed to 75 parts by weight. Parts by weight, other than this, the treatment of the object to be washed is carried out in the same manner. The obtained results are shown in Table 3.

[實施例20] 於實施例20中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用MMB 25重量份及DPM 15重量份,進而將水之量改為60重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表3。[Example 20] In Example 20, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 25 parts by weight of MMB and 15 parts by weight of DPM were used, and then the amount of water was changed to 60 Parts by weight, other than this, the treatment of the object to be washed is carried out in the same manner. The obtained results are shown in Table 3.

[實施例21] 於實施例21中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用MMB 15重量份及DMTG 20重量份,進而使用作為胺化合物之TMHMDA 1重量份,進而將水之量改為64重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表3。[Example 21] In Example 21, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 15 parts by weight of MMB and 20 parts by weight of DMTG were used, and then TMHMDA 1 as an amine compound was used Parts by weight, and the amount of water was changed to 64 parts by weight, and the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 3.

[實施例22] 於實施例22中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用PS 15重量份及MMB 15重量份,進而使用作為胺化合物之TMDAP 1重量份,進而將水之量改為69重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表3。[Example 22] In Example 22, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 15 parts by weight of PS and 15 parts by weight of MMB were used, and then TMDAP 1 as an amine compound was used Parts by weight, and the amount of water was changed to 69 parts by weight, and the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 3.

[實施例23] 於實施例23中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用PS 15重量份及3MB 15重量份,進而將水之量改為70重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表3。[Example 23] In Example 23, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 15 parts by weight of PS and 15 parts by weight of 3MB were used, and then the amount of water was changed to 70 Parts by weight, other than this, the treatment of the object to be washed is carried out in the same manner. The obtained results are shown in Table 3.

[實施例24] 於實施例24中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用PS 20重量份及IPDM 20重量份,進而將水之量改為60重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表3。[Example 24] In Example 24, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, 20 parts by weight of PS and 20 parts by weight of IPDM were used, and then the amount of water was changed to 60 Parts by weight, other than this, the treatment of the object to be washed is carried out in the same manner. The obtained results are shown in Table 3.

[比較例1] 於比較例1中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,將PS之使用量改為80重量份,並將水之使用量改為20重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表4。[Comparative Example 1] In Comparative Example 1, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, the amount of PS used was changed to 80 parts by weight, and the amount of water was changed to 20 parts by weight, other than that, the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 4.

[比較例2] 於比較例2中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用PS 15重量份、BFG 3重量份,進而將水之使用量改為82重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表4。[Comparative Example 2] In Comparative Example 2, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 15 parts by weight of PS and 3 parts by weight of BFG were used, and then the amount of water used was changed to 82 parts by weight, other than that, the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 4.

[比較例3] 於比較例3中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用BFG 40重量份,並將水之量改為60重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表4。[Comparative Example 3] In Comparative Example 3, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 40 parts by weight of BFG was used, and the amount of water was changed to 60 parts by weight, in addition to this Otherwise, the treatment of the object to be washed is carried out in the same manner. The obtained results are shown in Table 4.

[比較例4] 於比較例4中,使用DMFDG 25重量份代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,並將水之量改為75重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表4。[Comparative Example 4] In Comparative Example 4, 25 parts by weight of DMFDG was used to replace 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, and the amount of water was changed to 75 parts by weight, except that , in the same way to deal with the objects to be cleaned. The obtained results are shown in Table 4.

[比較例5] 於比較例5中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用DMFDG 20重量份及MMB 10重量份,並使用作為胺化合物之MEM 1重量份,並將水之量改為69重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表4。[Comparative Example 5] In Comparative Example 5, instead of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in step (2) of Example 1, 20 parts by weight of DMFDG and 10 parts by weight of MMB were used, and MEM 1 as an amine compound was used Except for changing the amount of water to 69 parts by weight, the treatment of the object to be washed was carried out in the same manner. The obtained results are shown in Table 4.

[比較例6] 於比較例6中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用DEDG 30重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表4。[Comparative Example 6] In Comparative Example 6, 30 parts by weight of DEDG was used in place of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, and the cleaning was carried out in the same manner. processing. The obtained results are shown in Table 4.

[比較例7] 於比較例7中,代替實施例1之步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用iBG 30重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表4。[Comparative Example 7] In Comparative Example 7, except that 30 parts by weight of iBG was used in place of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in the step (2) of Example 1, the cleaning was carried out in the same manner. processing. The obtained results are shown in Table 4.

[比較例8] 於實施例1中,代替步驟(2)中使用之乙二醇單丙醚(PS)30重量份,使用乙醇60重量份,並將水之量改為40重量份,除此以外,以相同之方式進行被洗淨物之處理。將所獲得之結果示於表4。[Comparative Example 8] In Example 1, in place of 30 parts by weight of ethylene glycol monopropyl ether (PS) used in the step (2), 60 parts by weight of ethanol was used, and the amount of water was changed to 40 parts by weight. The way to carry out the treatment of the object to be cleaned. The obtained results are shown in Table 4.

[表2]

Figure 108104125-A0304-0002
[Table 2]
Figure 108104125-A0304-0002

[表3]

Figure 108104125-A0304-0003
[table 3]
Figure 108104125-A0304-0003

[表4]

Figure 108104125-A0304-0004
[Table 4]
Figure 108104125-A0304-0004

5.物性評價(2) (1)透光率之測定方法 利用以下之方法測定實施例1~24及比較例1~8之清洗劑之透光率。首先,將清洗劑200 g收容於容量300 ml之燒杯。繼而,維持於特定之溫度(20、40或80℃),使用磁力攪拌器使燒杯內之攪拌件旋轉,對清洗劑進行攪拌。將攪拌後之清洗劑立刻收容於分光光度計之槽後,於以下之條件下測定其透光率。將測定結果示於表5。根據表5之結果,確認到實施例1~24之清洗劑係室溫至80℃之溫度範圍內之透光率為90%以上。 分光光度計:紫外可見分光光度計V-530(日本分光股份有限公司製造) 測定波長:可見光(660 nm)5. Evaluation of physical properties (2) (1) Measurement method of light transmittance The light transmittances of the cleaning agents of Examples 1 to 24 and Comparative Examples 1 to 8 were measured by the following method. First, put 200 g of cleaning agent in a beaker with a capacity of 300 ml. Then, maintaining at a specific temperature (20, 40 or 80° C.), using a magnetic stirrer, the stirring member in the beaker is rotated to stir the cleaning agent. Immediately after the stirring cleaning agent was stored in the tank of the spectrophotometer, the light transmittance was measured under the following conditions. The measurement results are shown in Table 5. From the results in Table 5, it was confirmed that the cleaning agents of Examples 1 to 24 had a light transmittance of 90% or more in the temperature range from room temperature to 80°C. Spectrophotometer: UV-Vis Spectrophotometer V-530 (manufactured by JASCO Corporation) Measurement wavelength: visible light (660 nm)

[表5]

Figure 108104125-A0304-0005
[產業上之可利用性][table 5]
Figure 108104125-A0304-0005
[Industrial Availability]

如以上所說明般,根據本發明,藉由將水溶性二醇醚化合物之調配量與水之調配量之比率設為特定範圍內之值,並且將苯甲醇之溶解度設為特定值以上,可顯著提高環境安全性(例如作業環境安全性)。又,根據本發明,不僅先前之水溶性二醇醚化合物,亦可使苯甲醇、疏水性二醇醚化合物等疏水性溶劑對被洗淨物進行之清洗性及乾燥性提昇。As described above, according to the present invention, by setting the ratio of the compounding amount of the water-soluble glycol ether compound to the compounding amount of water to a value within a specific range, and setting the solubility of benzyl alcohol to a specific value or more, it is possible to Significantly improve environmental safety (eg work environment safety). Furthermore, according to the present invention, not only the conventional water-soluble glycol ether compounds but also the cleaning properties and drying properties of the objects to be cleaned by hydrophobic solvents such as benzyl alcohol and hydrophobic glycol ether compounds can be improved.

又,根據本發明,由於洗淨後之清洗性亦優異,並且洗淨性及助焊劑之再附著防止性亦提昇,故而可作為清洗劑及洗淨劑兩用。Furthermore, according to the present invention, since the cleaning property after cleaning is also excellent, and the cleaning property and the re-adhesion prevention property of the flux are also improved, it can be used as both a cleaning agent and a cleaning agent.

進而,本發明係使用特定清洗劑之使用方法,因此使用特定洗淨劑將被洗淨物有效率地洗淨後,可有效率地獲得環境安全性(例如作業環境安全性)及再生性優異,並且洗淨劑之殘留較少之被洗淨物。 因此,根據本發明之清洗劑及使用其之使用方法,極大期待產業上對被洗淨物安全且有效率地而且價廉地進行洗淨或清洗。Furthermore, since the present invention is a method of using a specific cleaning agent, after the object to be cleaned is efficiently washed with the specific cleaning agent, environmental safety (for example, work environment safety) and excellent reproducibility can be efficiently obtained. , and the object to be cleaned with less residue of detergent. Therefore, according to the cleaning agent of the present invention and a method of using the same, industrially, safe, efficient and inexpensive cleaning or cleaning of objects to be cleaned is greatly expected.

如上述般,對本發明之實施形態及實施例進行了說明,但亦自最初便預定將上述各實施形態及各實施例之構成適當組合之情況。As described above, the embodiments and examples of the present invention have been described, but it is also intended to appropriately combine the configurations of the above-described embodiments and examples from the beginning.

應理解本次揭示之實施形態及實施例於所有方面均為例示,並非限制性者。本發明之範圍係由申請專利範圍而非上述實施形態及實施例表示,意圖包含與申請專利範圍均等之含義及範圍內之全部變更。It should be understood that the embodiments and examples disclosed this time are illustrative in all respects and not restrictive. The scope of the present invention is shown by the scope of the patent application rather than the above-described embodiments and examples, and is intended to include the meaning equivalent to the scope of the patent application and all changes within the scope.

圖1係供以對相對於清洗劑之單位體積(100 ml)之苯甲醇之溶解度(vol%)與相溶性(沖洗性)之評分(相對值)之關係進行說明之圖。FIG. 1 is a graph for explaining the relationship between the solubility (vol%) of benzyl alcohol relative to the unit volume (100 ml) of the cleaning agent and the score (relative value) of compatibility (rinsing property).

Claims (8)

一種清洗劑,其係至少包含水溶性二醇醚化合物及水,且苯甲醇之溶解度為10 vol%以上者,且 相對於上述水溶性二醇醚化合物100重量份,上述水之調配量為50~1000重量份。A cleaning agent comprising at least a water-soluble glycol ether compound and water, and the solubility of benzyl alcohol is more than 10 vol%, and The compounding quantity of the said water is 50-1000 weight part with respect to 100 weight part of said water-soluble glycol ether compounds. 如請求項1之清洗劑,其於室溫至80℃之溫度範圍內之透光率為90%以上。For the cleaning agent of claim 1, its light transmittance in the temperature range from room temperature to 80°C is more than 90%. 如請求項1或2之清洗劑,其引火點為50℃以上。If the cleaning agent of claim 1 or 2, its ignition point is above 50 ℃. 如請求項1或2之清洗劑,其中於將相對於表面經感光性阻焊劑硬化體保護之印刷基板之表面的水之初始接觸角設為θ1 ,且 將相對於將上述印刷基板於30℃之清洗劑中浸漬10分鐘後,於100℃、5分鐘之條件下進行乾燥之上述印刷基板之表面的水之接觸角設為θ2 時, 接觸角θ2 與θ1 之差之絕對值|θ2 -θ1 |為3°以下。The cleaning agent according to claim 1 or 2, wherein the initial contact angle with respect to water on the surface of the printed circuit board whose surface is protected by the photosensitive solder resist cured body is set to θ 1 , and the initial contact angle with respect to the surface of the printed circuit board with respect to the above-mentioned printed circuit board is set at 30 The absolute value of the difference between the contact angles θ 2 and θ 1 when the contact angle of water on the surface of the printed circuit board dried at 100° C. for 5 minutes after being immersed in a cleaning agent at 100° C. for 5 minutes is θ 22 −θ 1 | is 3° or less. 如請求項1或2之清洗劑,其中上述水溶性二醇醚化合物之沸點為250℃以下。The cleaning agent according to claim 1 or 2, wherein the boiling point of the water-soluble glycol ether compound is 250°C or lower. 如請求項1或2之清洗劑,其中上述水溶性二醇醚化合物係選自由乙二醇單丙醚、乙二醇單第三丁醚、3-甲氧基-3-甲基丁醇、3-甲氧基丁醇、乙二醇單異丙醚、二乙二醇異丙基甲醚、二丙二醇單甲醚、二乙二醇乙基甲醚、三乙二醇二甲醚、及二乙二醇二甲醚所組成之群中之至少1種化合物。The cleaning agent according to claim 1 or 2, wherein the above water-soluble glycol ether compound is selected from ethylene glycol monopropyl ether, ethylene glycol monotertiary butyl ether, 3-methoxy-3-methylbutanol, 3-Methoxybutanol, ethylene glycol monoisopropyl ether, diethylene glycol isopropyl methyl ether, dipropylene glycol monomethyl ether, diethylene glycol ethyl methyl ether, triethylene glycol dimethyl ether, and At least one compound in the group consisting of diethylene glycol dimethyl ether. 如請求項1或2之清洗劑,其進而包含沸點為250℃以下之胺化合物,且 該胺化合物之調配量相對於上述水溶性二醇醚化合物100重量份為0.1~10重量份。The cleaning agent according to claim 1 or 2, further comprising an amine compound with a boiling point of 250°C or less, and The compounding quantity of this amine compound is 0.1-10 weight part with respect to 100 weight part of said water-soluble glycol ether compounds. 一種清洗劑之使用方法,其包括下述步驟(1)~(2): (1)使用包含苯甲醇及疏水性二醇醚化合物、或者任一者之洗淨劑,將附著於被洗淨物之助焊劑洗淨之步驟; (2)使用清洗劑清洗上述步驟(1)中洗淨之上述被洗淨物之步驟,該清洗劑係至少包含水溶性二醇醚化合物及水,且上述苯甲醇之溶解度為10 vol%以上者,而且相對於上述水溶性二醇醚化合物100重量份,上述水之調配量為50~1000重量份。A method of using a cleaning agent, comprising the following steps (1) to (2): (1) A step of cleaning the flux adhering to the object to be cleaned using a cleaning agent containing benzyl alcohol and a hydrophobic glycol ether compound, or any of them; (2) The step of cleaning the object to be cleaned in the above step (1) with a cleaning agent, the cleaning agent contains at least a water-soluble glycol ether compound and water, and the solubility of the benzyl alcohol is 10 vol% or more Moreover, the compounding quantity of the said water is 50-1000 weight part with respect to 100 weight part of said water-soluble glycol ether compounds.
TW108104125A 2018-02-26 2019-02-01 Cleaning agents and how to use them TWI756511B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-032126 2018-02-26
JP2018032126 2018-02-26

Publications (2)

Publication Number Publication Date
TW201940684A TW201940684A (en) 2019-10-16
TWI756511B true TWI756511B (en) 2022-03-01

Family

ID=67688322

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108104125A TWI756511B (en) 2018-02-26 2019-02-01 Cleaning agents and how to use them

Country Status (4)

Country Link
JP (1) JP7320839B2 (en)
CN (1) CN110741738B (en)
TW (1) TWI756511B (en)
WO (1) WO2019163465A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7468226B2 (en) * 2019-09-02 2024-04-16 荒川化学工業株式会社 Detergent, method for regenerating detergent, and cleaning method
JP7144892B1 (en) 2022-01-20 2022-09-30 義彦 星原 cleaning equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200508385A (en) * 2003-08-27 2005-03-01 Kaken Tech Co Ltd Cleaning agent for removing solder flux and method for cleaning solder flux
CN105087185A (en) * 2014-05-20 2015-11-25 化研科技株式会社 Original liquid for detergent composition, detergent composition and cleaning method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07197095A (en) * 1993-12-29 1995-08-01 Olympus Optical Co Ltd Detergent composition for rosin flux
JPH0959698A (en) * 1995-08-23 1997-03-04 Asahi Chem Ind Co Ltd Detergent composition for metal mask
JPH10219155A (en) * 1997-02-10 1998-08-18 Olympus Optical Co Ltd Composition and method for peeling coating film
JPH10339958A (en) * 1997-06-05 1998-12-22 Toray Ind Inc Rinse solution for photosensitive polyimide
JP2002156765A (en) 2000-08-01 2002-05-31 Nagase Chemtex Corp Composition of rinsing and peeling liquid
JP5546171B2 (en) 2008-07-17 2014-07-09 化研テック株式会社 Quick-drying liquid composition and draining method using the same
JP6458964B2 (en) 2016-09-27 2019-01-30 荒川化学工業株式会社 Azeotropic cleaning agent and its regeneration method, cleaning method, and cleaning agent kit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200508385A (en) * 2003-08-27 2005-03-01 Kaken Tech Co Ltd Cleaning agent for removing solder flux and method for cleaning solder flux
CN105087185A (en) * 2014-05-20 2015-11-25 化研科技株式会社 Original liquid for detergent composition, detergent composition and cleaning method

Also Published As

Publication number Publication date
JP7320839B2 (en) 2023-08-04
CN110741738A (en) 2020-01-31
TW201940684A (en) 2019-10-16
CN110741738B (en) 2023-08-29
WO2019163465A1 (en) 2019-08-29
JPWO2019163465A1 (en) 2020-12-17

Similar Documents

Publication Publication Date Title
JP5428859B2 (en) Cleaning composition for removing lead-free solder flux and method for removing lead-free solder flux
US7776808B2 (en) Cleaning agent for removing solder flux and method for cleaning solder flux
US5397495A (en) Stabilization of silicate solutions
US5431847A (en) Aqueous cleaning concentrates
KR102176804B1 (en) Screen plate cleaner composition
US5433885A (en) Stabilization of silicate solutions
JPWO2012005068A1 (en) Stock solution for cleaning composition, cleaning composition and cleaning method
WO2011027673A1 (en) Cleaning agent for removal of, removal method for, and cleaning method for water-soluble, lead-free solder flux
TWI756511B (en) Cleaning agents and how to use them
KR101847208B1 (en) Detergent composition for flat panel display device
KR20090045859A (en) Stripping agent for polyimide
CN108774597B (en) Circuit board acid cleaning agent and preparation method thereof
JP3233279B2 (en) Cleaning composition and cleaning method
JPH0362895A (en) Detergent composition
KR101128865B1 (en) Formulation of cleaner for removing residual flux after reflow and cleaning method by using it
JP7372662B2 (en) Cleaning compositions and stock solutions for cleaning compositions
KR20080111268A (en) Cleaning solution composition and cleaning method using the same
USRE35017E (en) Method for removing soldering flux with alkaline salts, an alkali metal silicate and anionic polymer
CN108570683B (en) Steel mesh water-based cleaning agent and preparation method thereof
JP7372661B2 (en) Cleaning compositions and stock solutions for cleaning compositions
KR20110121122A (en) A detergent composition for a glass substrate of flat panel display device
KR20110123971A (en) Cleaning composition for removing polyimide
CN115426781A (en) PCB (printed circuit board) printing oil pollution prevention processing technology
JP2024115058A (en) Detergent composition and concentrate for detergent composition
KR101344168B1 (en) Polyimide Removing compositions