TWI752344B - Optical system device, bi-convex lens - Google Patents
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- 230000005499 meniscus Effects 0.000 claims description 7
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- 230000031700 light absorption Effects 0.000 description 7
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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Abstract
一種光學系統裝置1,其將從光源照射出來的照射光平行化且將由該照射光所產生的照射面上的照度均勻化,該光學系統裝置1具備: 雙凸透鏡20,其被設置在照射光的照射方向上,具有位於照射方向的入射側的第1面21與位於照射方向的射出側的第2面22,該第2面22被形成將入射的照射光平行化的曲率半徑,該第1面21被形成將由第2面22射出的照射光所產生的照射面上的照度均勻化的曲率半徑;及, 光圈30,其被配置於光源與前述雙凸透鏡20之間且讓前述照射光的一部分通過。An optical system device 1 that parallelizes irradiated light irradiated from a light source and uniformizes the illuminance on an irradiated surface generated by the irradiated light, the optical system device 1 comprising: The lenticular lens 20 is provided in the irradiation direction of the irradiation light, and has a first surface 21 located on the incident side in the irradiation direction and a second surface 22 located on the emission side in the irradiation direction, and the second surface 22 is formed to be incident on the radius of curvature of the parallelized irradiated light, the first surface 21 is formed with a radius of curvature that uniformizes the illuminance on the irradiated surface generated by the irradiated light emitted from the second surface 22; and, The aperture 30 is arranged between the light source and the lenticular lens 20 and allows a part of the irradiation light to pass therethrough.
Description
本發明關於將從光源照射出來的照射光進行平行化及均勻化的技術。The present invention relates to a technique for parallelizing and homogenizing irradiated light emitted from a light source.
以往,使用了多數個紫外線LED等的紫外線發光元件之紫外光照射裝置,被用於紫外線硬化型樹脂的硬化等,而這樣的紫外線硬化型樹脂的硬化,為了使硬化不會產生不均,希望在照射面上具有均勻的照度。又,在利用遮罩並藉由LED光來進行曝光的情況下,因為在曝光對象與遮罩之間產生間隙且LED光的放射角度為120°左右,為了提高精度,需要以照射光相對於照射面呈垂直的方式,將照射光進行平行化。一般來說,針對這種照射光的平行化是使用拋物面鏡等。Conventionally, ultraviolet light irradiation devices using a large number of ultraviolet light-emitting elements such as ultraviolet LEDs have been used for curing of ultraviolet curable resins, etc. In order to prevent uneven curing of such ultraviolet curable resins, it is desirable to It has uniform illuminance on the irradiated surface. In addition, in the case of exposing with LED light using a mask, a gap is formed between the exposure target and the mask and the radiation angle of the LED light is about 120°. The irradiation surface is vertical, and the irradiation light is parallelized. Generally, a parabolic mirror or the like is used for the parallelization of such irradiation light.
針對照射面中的照度的均勻化,一般來說,是利用蠅眼透鏡等,而作為與此相關的技術,已知一種光照射裝置,其特徵在於,具備:在平面上排列的複數個發光元件之LED陣列光源;分別將從各發光元件射出的光進行準直之第1照明光學系統;將從第1照明光學系統射出的光集中到焦點位置之第2照明光學系統;及,蠅眼積分器,其具有在平面上排列的複數個透鏡,並提高從第2照明光學系統射出的光在各透鏡的入射面處入射的照度的均勻性;該蠅眼積分器的入射面,被配置在第2照明光學系統的焦點位置,而各發光元件的發光面與蠅眼積分器的入射面為共軛關係,各發光元件的圖像被形成於蠅眼積分器的入射面(例如,參照專利文獻1)。Generally, a fly's eye lens or the like is used to homogenize the illuminance on the irradiated surface, and as a technique related to this, a light irradiating device is known, which includes a plurality of light emitting devices arranged on a plane. The LED array light source of the element; the first illumination optical system for collimating the light emitted from each light-emitting element; the second illumination optical system for concentrating the light emitted from the first illumination optical system to the focal position; and, the fly's eye integral a device, which has a plurality of lenses arranged on a plane, and improves the uniformity of the illuminance incident on the incident surface of each lens of the light emitted from the second illumination optical system; the incidence surface of the fly-eye integrator is arranged on the At the focal position of the second illumination optical system, the light-emitting surface of each light-emitting element is in a conjugate relationship with the incident surface of the fly-eye integrator, and the image of each light-emitting element is formed on the incident surface of the fly-eye integrator (for example, refer to the patent Reference 1).
[先前專利文獻] (專利文獻) 專利文獻1:日本特開2016-200787號公報。[Previous Patent Literature] (patent literature) Patent Document 1: Japanese Patent Laid-Open No. 2016-200787.
[發明所欲解決的問題] 在將照射光平行化且將由照射光所產生的照射面上的照度均勻化的情況下,必須具有將照度進行均勻的裝置與將照射光平行化的裝置這二者,如此一來,會有裝置大型化的問題。[Problems to be Solved by Invention] When parallelizing the irradiated light and uniformizing the illuminance on the irradiated surface by the irradiated light, it is necessary to have both a device for uniformizing the illuminance and a device for parallelizing the irradiated light. The problem of equipment enlargement.
本發明是為了解決上述問題點而開發出來,目的在於提供一種光學系統裝置、雙凸透鏡,以更省空間的方式將照射光平行化且將由照射光所產生的照射面上的照度均勻化為目的。The present invention has been developed in order to solve the above-mentioned problems, and an object of the present invention is to provide an optical system device and a lenticular lens for collimating the irradiated light in a more space-saving manner and for uniformizing the illuminance on the irradiated surface by the irradiated light. .
[解決問題的技術手段] 為了解決上述問題,本發明的一個態樣是一種光學系統裝置,其將從光源照射出來的照射光平行化且將由該照射光所產生的照射面上的照度均勻化,該光學系統裝置具備:雙凸透鏡,其被設置在前述照射光的照射方向上,具有位於前述照射方向的入射側的第1面與位於前述照射方向的射出側的第2面,前述第2面被形成將入射的照射光平行化的曲率半徑,前述第1面被形成將由第2面射出的照射光所產生的照射面上的照度均勻化的曲率半徑;及,光圈,其被配置於前述光源與前述雙凸透鏡之間且讓前述照射光的一部分通過。[Technical means to solve the problem] In order to solve the above-mentioned problems, one aspect of the present invention is an optical system device that collimates irradiated light irradiated from a light source and uniformizes the illuminance on an irradiated surface generated by the irradiated light, the optical system device includes: The lenticular lens is provided in the irradiation direction of the irradiation light, and has a first surface located on the incident side in the irradiation direction and a second surface located on the emission side in the irradiation direction, and the second surface is formed to be incident on the irradiation The curvature radius of light collimation is formed on the first surface to make the illuminance on the irradiation surface uniform by the irradiation light emitted from the second surface; and the aperture is arranged between the light source and the lenticular lens. At the same time, part of the aforementioned irradiated light is allowed to pass therethrough.
又,本發明的一個態樣是一種光學系統裝置,其將從光源照射出來的照射光平行化且將由該照射光所產生的照射面上的照度均勻化,該光學系統裝置具備:凹凸透鏡,其被設置在前述照射光的照射方向上,具有位於前述照射方向的入射側並形成凹面的第1面與位於前述照射方向的射出側並形成凸面的第2面,前述第2面被形成將入射的照射光平行化的曲率半徑,前述第1面被形成將由第2面射出的照射光所產生的照射面上的照度均勻化的曲率半徑;至少1個照射部,其作為前述光源;光圈,其被配置於前述照射部與前述雙凸透鏡之間且讓前述照射光的一部分通過;及,配光角變換部,其被配置於前述照射部與前述光圈之間,並將從前述照射部照射出來的照射光的配光角變窄。Another aspect of the present invention is an optical system device that collimates irradiated light irradiated from a light source and uniformizes the illuminance on an irradiated surface by the irradiated light, the optical system device comprising: a meniscus lens, It is arranged in the irradiation direction of the irradiation light, and has a first surface located on the incident side in the irradiation direction and forming a concave surface, and a second surface located on the exit side in the irradiation direction and forming a convex surface, and the second surface is formed to The radius of curvature of the parallelized incident irradiated light, the first surface is formed with a radius of curvature of the illuminance on the irradiated surface due to the irradiated light emitted from the second surface; at least one irradiating part is used as the light source; Aperture , which is arranged between the irradiating portion and the lenticular lens and allows a part of the irradiated light to pass therethrough; The light distribution angle of the irradiated irradiation light is narrowed.
又,本發明的一個態樣是一種雙凸透鏡,其將入射的照射光平行化且將由該照射光所產生的照射面上的照度均勻化,該雙凸透鏡的特徵在於:具有位於前述照射方向的入射側的第1面與位於前述照射方向的射出側的第2面,前述第2面被形成將入射的照射光平行化的曲率半徑,前述第1面被形成將由第2面射出的照射光所產生的照射面上的照度均勻化的曲率半徑。Another aspect of the present invention is a lenticular lens that parallelizes incident irradiated light and uniformizes the illuminance on an irradiated surface by the irradiated light, the lenticular lens being characterized by having a The first surface on the incident side and the second surface on the emission side in the irradiation direction, the second surface is formed with a radius of curvature that parallelizes the incident irradiation light, and the first surface is formed with the irradiation light to be emitted from the second surface The radius of curvature at which the illuminance on the resulting irradiated surface is homogenized.
[發明的效果] 藉由本發明,能以更省空間的方式將照射光平行化且將由照射光所產生的照射面上的照度均勻化。[Effect of invention] According to the present invention, the irradiated light can be parallelized and the illuminance on the irradiated surface by the irradiated light can be made uniform in a more space-saving manner.
以下,一邊參照圖面一邊說明本發明的實施形態。Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[第1實施形態] 首先,說明關於第1實施形態的光學系統裝置。第1圖是表示本實施形態的光學系統裝置的概略斜視圖。又,第2圖是表示光學系統裝置的構成的概略側視圖。再者,在第2圖中,表示光圈(apertures)及光吸收部的橫截面,該橫截面是藉由通過光軸並且平行光軸的平面來截取而得。[1st Embodiment] First, the optical system device of the first embodiment will be described. FIG. 1 is a schematic perspective view showing an optical system device of the present embodiment. 2 is a schematic side view showing the configuration of the optical system device. Moreover, in FIG. 2, the cross section of apertures and a light absorption part is shown, and this cross section is obtained by the plane which passed through the optical axis and is parallel to the optical axis.
如第1圖及第2圖所示,本實施形態的光學系統裝置1,具備照射部10、雙凸透鏡20、光圈30及光吸收部40,該照射部10是照射出紫外線光的紫外線LED光源,該雙凸透鏡20被配置成可以讓由照射部10所產生的照射光入射,該光圈30被配置在照射部10與雙凸透鏡20之間的靠照射部10側,該光吸收部40被配置在照射部10與雙凸透鏡20之間的靠雙凸透鏡20側。藉由此光學系統裝置1,可以利用由照射部10所產生的照射光來形成與雙凸透鏡20的光軸方向垂直的照射面。As shown in FIGS. 1 and 2, the
光圈30是具有與雙凸透鏡20的光軸方向垂直的平面之板狀部件,並形成有貫通光軸方向的孔部31。此孔部31是形成為圓形且此圓的中心與雙凸透鏡20的光軸一致。藉由這樣的光圈30,由照射部10所產生的照射光的一部分會從孔部31射出,並藉此結果來規定對於雙凸透鏡20的入射光的光源的尺寸。The
光吸收部40是形成為中空的方筒狀並在該內壁面形成有光吸收面之部件,並且在入射側也就是照射部10和光圈30側及射出側也就是雙凸透鏡20側分別形成有開口,而這些開口是被形成作為入射側開口部41、射出側開口部42。對於入射側開口部41而言,以僅通過孔部31的照射光會入射至光吸收部40內的方式來配置光圈30。又,從射出側開口部42射出的照射光會入射到雙凸透鏡20。又,光吸收部40的內壁表面也就是光吸收面的反射率顯著地低,並期望為4%以下,藉此,在入射到光吸收部40的照射光之中,照射到內壁的照射光大部分會被內壁表面吸收,而不會從射出側開口部42射出。再者,光吸收部40並不限於中空的方筒狀,亦可作成一種在入射側及射出側具有開口之筒狀部件,其被形成為僅使以可藉由雙凸透鏡20進行平行化的角度入射的照射光可從射出側開口部42射出。再者,光吸收部40的光軸方向的長度,也就是從入射側開口部41到射出側開口部42的距離,是基於雙凸透鏡20的焦點距離的長度。The
雙凸透鏡20是一種雙凸透鏡,其具有朝向照射光的入射側的第1面21與朝向射出側的第2面22之曲面,該第1面21與第2面22的形狀不同。在本實施形態中,這樣的第1面21及第2面22中的任一者,為了提升精度而形成為非球面,但亦可以形成為球面。第1面21主要具有將藉由從雙凸透鏡20射出的照射光所產生的照射面上的照度均勻化的功能,第2面22主要具有將入射到雙凸透鏡20的照射光平行化的功能。The
第2面22的曲率半徑r2
是以下述方式來決定:在將光角度設為θ,將光源的大小(孔部31的直徑)設為X,並將雙凸透鏡20的焦點距離設為f的情況下,將第1面21假設為平面,並設為f=r2
/2,又以X=2來形成孔部31,藉由X×f×tanθ的公式,也就是r2
×tanθ的公式,來規定光角度θ而決定。此處,光角度θ是由與照射面垂直的垂直線及從雙凸透鏡20射出的照射光所夾的角度,其中θ=0的情況下為理想的平行光,但實際上是設定成例如1°等的盡可能接近0的値。The radius of curvature r 2 of the
第1面21的曲率半徑r1
是以下述方式來決定:關於來自被形成為以上述方式來決定的曲率半徑r2
的第2面22的射出光,在與光軸垂直的平面上的照度部分佈成為均勻。換言之,第1面21的曲率半徑r1
是基於第2面的曲率半徑r2
而決定。The radius of curvature r 1 of the
此處,說明關於第1面的曲率半徑與透鏡直徑的關係。第5圖是表示第1面的入射側的曲率半徑與透鏡直徑的關係的圖。第6圖是表示第1面的透鏡直徑所對應的入射側的曲率半徑的圖。Here, the relationship between the radius of curvature of the first surface and the diameter of the lens will be described. FIG. 5 is a diagram showing the relationship between the radius of curvature of the incident side of the first surface and the diameter of the lens. FIG. 6 is a diagram showing the radius of curvature of the incident side corresponding to the lens diameter of the first surface.
如第5圖所示,在將藉由從雙凸透鏡20射出的照射光所產生的照射面上的照度均勻化的第1面21中,該入射側的曲率半徑r1
與透鏡直徑d之間,成立r1
=5.64×d的公式,而具體値係圖示於第6圖。再者,實際上,在具有該透鏡直徑d的第1面21中,亦可以具有包括在上述公式中的一次係數5.64的±15%的範圍內的曲率半徑r1
。As between, on the surface irradiated by the illumination light irradiated from the
接著,說明光學系統裝置的效果。第3圖是表示光線追蹤的模擬結果的圖。又,第4圖是表示相對於照射面的X軸座標的非同調放射照度的圖。再者,第4圖的X座標値是作為平面的照射面中的其中一方的軸的値。Next, the effects of the optical system device will be described. FIG. 3 is a diagram showing a simulation result of ray tracing. Moreover, FIG. 4 is a figure which shows the non-coherent irradiance with respect to the X-axis coordinate of an irradiation surface. In addition, the X-coordinate value in FIG. 4 is the value of one of the axes of the irradiated surface which is a plane.
如第3圖所示,藉由針對光學系統裝置1的照射光的光線追蹤的模擬結果,可以理解在從照射部照射出來的照射光中,僅有並未朝向光吸收部40的內壁的照射光入射到雙凸透鏡20並進行平行化。As shown in FIG. 3 , from the simulation result of ray tracing of the irradiated light of the
又,如第4圖所示,藉由光學系統裝置1,可以理解藉由雙凸透鏡20的第1面21,照射面的照度被均勻化。In addition, as shown in FIG. 4 , it can be understood that the illuminance of the irradiation surface is uniformized by the
[第2實施形態] 接著,說明關於第2實施形態的光學系統裝置。第7圖是表示本實施形態的光學系統裝置的構成的概略側視圖。再者,在第7圖中,與第2圖同樣地,表示光圈及光吸收部的橫截面,該橫截面是藉由通過光軸並且平行光軸的平面來截取而得。[Second Embodiment] Next, an optical system device according to the second embodiment will be described. FIG. 7 is a schematic side view showing the configuration of the optical system device of the present embodiment. In addition, in FIG. 7, similarly to FIG. 2, the cross section of a diaphragm and a light absorption part is shown, and this cross section is cut|disconnected by the plane which passed the optical axis and was parallel to the optical axis.
如第7圖所示,本實施形態的光學系統裝置1a,與第1實施形態不同的點在於:具備代替照射部10之2個照射部10a、10b,並且進一步具備導光部50。As shown in FIG. 7 , the
2個照射部10a、10是分別照射波長彼此不同的光的LED光源,並且與照射部10同樣地,是配置成經由光圈30的孔部31將照射光入射到光吸收部40的入射側開口部41。The two irradiating
導光部50被配置成位於照射部10a、10b與光圈30之間。此導光部50被形成為中空的筒狀,並將該內壁表面形成作為將照射光全反射的光反射面,並且在入射側也就是照射部10a、10b側形成有第1開口部51及在射出側也就是光圈30側形成有第2開口部52。藉由此導光部50,分別從照射部10a、10b入射到第1開口部51的光在導光部50內混合,並從第2開口部52入射到光圈30的孔部31。The
作為這樣的導光部50,例如可舉出:進行集光或NA(Numerical Aperture:數值孔徑)變換的CPC(Compound Parabolic Concentrator:複合拋物面集光器);或是進行導光、均勻化的光導管。Examples of such a
藉由本實施形態的光學系統裝置1a,可以將波長彼此不同的光所混合的射出光平行化並且將照射面上的照度均勻化。再者,在本實施形態中,光學系統裝置1a是作成具備2個照射部10a、10b,但亦可以具備至少2個照射部。With the
[第3實施形態] 接著,說明關於第3實施形態的光學系統裝置。第8圖是表示本實施形態的光學系統裝置的構成的概略側視圖。再者,在第8圖中,與第2圖同樣地,表示光圈及光吸收部的橫截面,該橫截是藉由通過光軸並且平行光軸的平面來截取而得。[third embodiment] Next, an optical system device according to the third embodiment will be described. FIG. 8 is a schematic side view showing the configuration of the optical system device of the present embodiment. In addition, in FIG. 8, similarly to FIG. 2, the cross section of a diaphragm and a light absorption part is shown, and this cross section is taken by the plane which passes through the optical axis and is parallel to the optical axis.
如第8圖所示,本實施形態的光學系統裝置1b,與第2實施形態不同的點在於:進一步具備2個配光角變換部60a、60b。As shown in FIG. 8, the
配光角變換部60a是設置成對應於照射部10a,而配光角變換部60b是設置成對應於照射部10b,配光角變換部60a、60b中的任一者是將照射部10a、10b的配光角度變窄的平凸透鏡,並以該平面部朝向入射側且該凸面部朝向射出側的方式設置在照射部10a、10b上。此處,配光角變換部60a、60b分別被設置成其平面部密接在照射部10a、10b的發光面上。The light distribution
藉由本實施形態的光學系統裝置1b,分別對應於照射部10a、10b來設置配光角變換部60a、60b,而將照射部10a、10b的配光角度變窄,藉此來提升照射面上的照度。In the
再者,光學系統裝置1b,亦可以具備一種將入射側形成為凹面之凹凸透鏡(未圖示)來代替雙凸透鏡20。此凹凸透鏡,其朝向入射側的第1面是形成為凹面,此點不同於雙凸透鏡20。又,第1面,與雙凸透鏡20的第1面21同樣地,主要具有將藉由從凹凸透鏡射出的照射光所產生的照射面上的照度均勻化的功能。第1面的曲率半徑亦與雙凸透鏡20的第1面21同樣地,是以來自第2面的射出光在與光軸垂直的平面上的照度部分佈成為均勻的方式來決定。藉由具備這樣的凹凸透鏡之光學系統裝置1b,可以將由於配光角變換部60a而使其配光角變窄的照射光擴散,而在射出側的第2面平衡良好地進行配光。Furthermore, the
[第4實施形態] 接著,說明關於第4實施形態的光學系統裝置。第9圖是表示本實施形態的光學系統裝置的構成的概略側視圖。再者,在第9圖中,與第2圖同樣地,表示光圈及光吸收部的橫截面,該橫截面是藉由通過光軸並且平行光軸的平面來截取而得。[4th Embodiment] Next, an optical system device according to the fourth embodiment will be described. FIG. 9 is a schematic side view showing the configuration of the optical system device of the present embodiment. In addition, in FIG. 9, similarly to FIG. 2, the cross section of a diaphragm and a light absorption part is shown, and this cross section is cut|disconnected by the plane which passes the optical axis and is parallel to the optical axis.
如第9圖所示,本實施形態的光學系統裝置1c,與第3實施形態不同的點在於:具備導光部50a來代替導光部50,並且進一步具備旋轉驅動部70。As shown in FIG. 9 , the
導光部50a與導光部50不同的點在於:其軸方向朝向光軸方向,並可繞著旋轉軸旋轉地設置到光學系統裝置1c,且在該外周壁上形成有齒輪。導光部50a的旋轉軸,在與由光學系統裝置1c所產生的照射方向平行的平面上,期望其軸心位置位於與光軸大約一致的位置。The light guide portion 50a differs from the
旋轉驅動部70是經由導光部50a所形成的齒輪來驅動導光部50a使其繞著該旋轉軸旋轉之驅動裝置,例如,構成為超音波馬達、直流馬達。The
藉由本實施形態的光學系統裝置1c,可以藉由導光部50a旋轉,將預定期間中的照射面的照度均勻化。According to the
再者,上述4個實施形態可以分別與其他實施形態組合。例如,第3實施形態的光學系統裝置1b中的導光部50,亦可以代替第4實施形態的光學系統裝置1c中的導光部50a來構成。Furthermore, the above-mentioned four embodiments may be combined with other embodiments, respectively. For example, the
本發明在不脫離該要旨或主要特徴的情況下,能以其他各種形式來實施。因此,前述實施形態的所有點僅單純作為例示,並不應限定解釋。本發明的範圍係由申請專利範圍所表示,說明書本文並未具有任何拘束。此外,屬於申請專利範圍的均等範圍內的全部變化、各種改良、代替以及改質,全部皆在本發明的範圍內。The present invention can be implemented in various other forms without departing from the gist or main features. Therefore, all points of the aforementioned embodiments are merely illustrative and should not be interpreted as limiting. The scope of the present invention is indicated by the scope of the patent application, and the description herein does not have any restriction. In addition, all changes, various improvements, substitutions, and modifications within the scope of equivalents within the scope of the claims are all within the scope of the present invention.
1:光學系統裝置
1a:光學系統裝置
1b:光學系統裝置
1c:光學系統裝置
10:照射部
10a:照射部
10b:照射部
20:雙凸透鏡
21:第1面
22:第2面
30:光圈
31:孔部
40:光吸收部
41:入射側開口部
42:射出側開口部
50:導光部
50a:導光部
51:第1開口部
52:第2開口部
60a:配光角變換部
60b:配光角變換部1:
第1圖是表示第1實施形態的光學系統裝置的構成的概略斜視圖。 第2圖是表示第1實施形態的光學系統裝置的構成的概略側視圖。 第3圖是表示光線追蹤的模擬結果的圖。 第4圖是表示相對於照射面的X軸座標之非同調放射照度的圖。 第5圖是表示第1面的入射側的曲率半徑與透鏡直徑的關係的圖。 第6圖是表示第1面的透鏡直徑所對應的入射側的曲率半徑的圖。 第7圖是表示第2實施形態的光學系統裝置的構成的概略側視圖。 第8圖是表示第3實施形態的光學系統裝置的構成的概略側視圖。 第9圖是表示第4實施形態的光學系統裝置的構成的概略側視圖。FIG. 1 is a schematic perspective view showing the configuration of an optical system device according to the first embodiment. FIG. 2 is a schematic side view showing the configuration of the optical system device according to the first embodiment. FIG. 3 is a diagram showing a simulation result of ray tracing. FIG. 4 is a diagram showing the incoherent irradiance with respect to the X-axis coordinates of the irradiation surface. FIG. 5 is a diagram showing the relationship between the radius of curvature of the incident side of the first surface and the diameter of the lens. FIG. 6 is a diagram showing the radius of curvature of the incident side corresponding to the lens diameter of the first surface. FIG. 7 is a schematic side view showing the configuration of an optical system device according to the second embodiment. Fig. 8 is a schematic side view showing the configuration of an optical system device according to a third embodiment. FIG. 9 is a schematic side view showing the configuration of an optical system device according to a fourth embodiment.
國內寄存資訊 (請依寄存機構、日期、號碼順序註記) 無Domestic storage information (please note in the order of storage institution, date and number) none
國外寄存資訊 (請依寄存國家、機構、日期、號碼順序註記) 無Foreign deposit information (please mark in the order of deposit country, institution, date and number) none
10:照射部 10: Irradiation part
20:雙凸透鏡 20: Double convex lens
30:光圈 30: Aperture
31:孔部 31: Hole
40:光吸收部 40: light absorption part
41:入射側開口部 41: Incident side opening
42:射出側開口部 42: Exit side opening
Claims (9)
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PCT/JP2018/037207 WO2020070859A1 (en) | 2018-10-04 | 2018-10-04 | Optical system device and biconvex lens |
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TWI752344B true TWI752344B (en) | 2022-01-11 |
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KR (1) | KR20200041958A (en) |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2002341246A (en) * | 2001-05-18 | 2002-11-27 | Hittsu Kenkyusho:Kk | Light source unit |
US20040227998A1 (en) * | 2003-05-12 | 2004-11-18 | Sony Corporation | Lens, light irradiation apparatus, and laser pointer |
US20100027108A1 (en) * | 2007-02-21 | 2010-02-04 | Stefan Wilhelm | Confocal laser microscope |
JP2013077482A (en) * | 2011-09-30 | 2013-04-25 | Mitsubishi Electric Corp | Light box device |
TW201605074A (en) * | 2014-07-28 | 2016-02-01 | 晶元光電股份有限公司 | Light-emitting apparatus |
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JP2009071065A (en) * | 2007-09-13 | 2009-04-02 | Seiko Epson Corp | Stage device and exposure device |
KR101064478B1 (en) * | 2009-06-24 | 2011-09-15 | 경북대학교 산학협력단 | Plane light emitting back light unit and lamp using point light source |
JP5901036B2 (en) * | 2012-07-27 | 2016-04-06 | シャープ株式会社 | Lighting device |
TWI578068B (en) * | 2015-01-05 | 2017-04-11 | 穎台科技股份有限公司 | Direct back-lit light guide structure, light guide plate and back-light module |
JP6529809B2 (en) | 2015-04-14 | 2019-06-12 | 株式会社サーマプレシジョン | Light irradiation apparatus and exposure apparatus |
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2018
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- 2018-10-04 CN CN201880098410.0A patent/CN112955805B/en active Active
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002341246A (en) * | 2001-05-18 | 2002-11-27 | Hittsu Kenkyusho:Kk | Light source unit |
US20040227998A1 (en) * | 2003-05-12 | 2004-11-18 | Sony Corporation | Lens, light irradiation apparatus, and laser pointer |
US20100027108A1 (en) * | 2007-02-21 | 2010-02-04 | Stefan Wilhelm | Confocal laser microscope |
JP2013077482A (en) * | 2011-09-30 | 2013-04-25 | Mitsubishi Electric Corp | Light box device |
TW201605074A (en) * | 2014-07-28 | 2016-02-01 | 晶元光電股份有限公司 | Light-emitting apparatus |
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KR20200041958A (en) | 2020-04-22 |
CN112955805A (en) | 2021-06-11 |
WO2020070859A1 (en) | 2020-04-09 |
TW202028801A (en) | 2020-08-01 |
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