TWI747510B - Electrostatic discharge protection circuits and semiconductor circuits - Google Patents
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本發明係關於一種半導體電路,且特別是關於一種靜電放電保護電路。The present invention relates to a semiconductor circuit, and more particularly to an electrostatic discharge protection circuit.
隨著積體電路的半導體製程的發展,半導體元件尺寸已縮小至次微米階段,以增進積體電路的性能以及運算速度,但元件尺寸的縮減,卻出現了一些可靠度的問題,尤以積體電路對靜電放電(Electrostatic Discharge, ESD)的防護能力影響最大。當元件尺寸由於先進的製程技術而減小,靜電放電的防護能力也降低許多,結果造成元件的ESD耐受力大幅降低。因此,需要靜電放電保護電路來保護元件不受靜電放電所損壞。然而,傳統的靜電放電保護電路包括一電容-電阻電路,其占用較大的面積,不利於積體電路的尺寸縮小化。With the development of the semiconductor manufacturing process of integrated circuits, the size of semiconductor components has been reduced to the sub-micron stage to improve the performance and operation speed of integrated circuits. However, the reduction of component size has caused some reliability problems, especially The body circuit has the greatest impact on the protection capability of Electrostatic Discharge (ESD). When the size of the device is reduced due to advanced process technology, the protection against electrostatic discharge is also reduced a lot, resulting in a significant reduction in the ESD tolerance of the device. Therefore, an electrostatic discharge protection circuit is needed to protect the components from being damaged by electrostatic discharge. However, the conventional electrostatic discharge protection circuit includes a capacitor-resistor circuit, which occupies a large area, which is not conducive to the reduction of the size of the integrated circuit.
本發明之一實施例提供一種靜電放電保護電路,可其用於一半導體元件。此半導體元件具有一第一汲/源極電極以及一第二汲/源極電極,且由一深井區包圍。靜電放電保護電路包括一第一控制電路以及一第一放電電路。第一控制電路電性連接於半導體元件的第一汲/源極電極與一電源端之間,且具有一第一控制端。第一控制端電性連接深井區,且第一控制電路產生一第一控制信號。第一放電電路電性連接第一汲/源極電極與電源端之間,且受控於第一控制信號。當於第一汲/源極電極上發生一靜電放電事件時,第一控制電路根據深井區的電位狀態以及第一汲/源極電極的電位狀態來產生第一控制信號,且第一放電電路根據第一控制信號提供介於第一汲/源極電極與電源端之間的一第一放電路徑。An embodiment of the present invention provides an electrostatic discharge protection circuit, which can be used in a semiconductor device. The semiconductor device has a first drain/source electrode and a second drain/source electrode, and is surrounded by a deep well region. The electrostatic discharge protection circuit includes a first control circuit and a first discharge circuit. The first control circuit is electrically connected between the first drain/source electrode of the semiconductor element and a power terminal, and has a first control terminal. The first control terminal is electrically connected to the deep well area, and the first control circuit generates a first control signal. The first discharge circuit is electrically connected between the first drain/source electrode and the power terminal, and is controlled by a first control signal. When an electrostatic discharge event occurs on the first drain/source electrode, the first control circuit generates a first control signal according to the potential state of the deep well region and the potential state of the first drain/source electrode, and the first discharge circuit A first discharge path between the first drain/source electrode and the power terminal is provided according to the first control signal.
本發明之一實施例提供一種半導體電路。此半導體電路包括一半導體元件、一第一控制電路、以及一第一放電電路。半導體元件形成在一井區,且具有一第一汲/源極電極以及一第二汲/源極電極。井區由一深井區包圍。井區具有一第一導電類型,且深井區具有不同於第一導電類型的一第二導電類型。靜電放電保護電路包括一第一控制電路以及一第一放電電路。第一控制電路電性連接於第一汲/源極電極與一電源端之間,且具有一第一控制端。第一控制端電性連接深井區,且第一控制電路產生一第一控制信號。第一放電電路電性連接第一汲/源極電極與電源端之間,且受控於第一控制信號。當於第一汲/源極電極上發生一靜電放電事件時,第一控制電路根據深井區的一電位狀態以及第一汲/源極電極的一電位狀態來產生第一控制信號,且第一放電電路根據第一控制信號提供介於第一汲/源極電極與電源端之間的一第一放電路徑。An embodiment of the present invention provides a semiconductor circuit. The semiconductor circuit includes a semiconductor element, a first control circuit, and a first discharge circuit. The semiconductor element is formed in a well region and has a first drain/source electrode and a second drain/source electrode. The well area is surrounded by a deep well area. The well region has a first conductivity type, and the deep well region has a second conductivity type different from the first conductivity type. The electrostatic discharge protection circuit includes a first control circuit and a first discharge circuit. The first control circuit is electrically connected between the first drain/source electrode and a power terminal, and has a first control terminal. The first control terminal is electrically connected to the deep well area, and the first control circuit generates a first control signal. The first discharge circuit is electrically connected between the first drain/source electrode and the power terminal, and is controlled by a first control signal. When an electrostatic discharge event occurs on the first drain/source electrode, the first control circuit generates a first control signal according to a potential state of the deep well region and a potential state of the first drain/source electrode, and the first The discharge circuit provides a first discharge path between the first drain/source electrode and the power terminal according to the first control signal.
為使本發明之上述目的、特徵和優點能更明顯易懂,下文特舉一較佳實施例,並配合所附圖式,作詳細說明如下。In order to make the above-mentioned objects, features and advantages of the present invention more obvious and understandable, a preferred embodiment is specifically cited below in conjunction with the accompanying drawings, which will be described in detail as follows.
第1A圖係表示根據本發明一實施例之半導體電路。參閱第1A圖,半導體電路1包括半導體元件10、靜電放電保護電路11、以及二極體12~13。在第1A圖的實施例中,半導體元件10為一N型電晶體,其具有閘極電極G、汲極電極D、以及源極電極S。於後文中,將以電晶體做為半導體元件10例來說明各實施例。第2A圖顯示電晶體10的結構截面圖。FIG. 1A shows a semiconductor circuit according to an embodiment of the present invention. Referring to FIG. 1A, the
參閱第2A圖,電晶體10形成在基底20,其中,基底20的導電類型為P型。一N型深井區21形成在基底20中,其中,L21表示N型深井區21與基底20之間的邊界。在深井區21中,形成P型井區22以及N型摻雜區25。兩N型摻雜區23與24形成在井區22中,且一閘極介電層26形成在基底20上且介於摻雜區23與24之間。在此實施例中,N型摻雜區25在深井區21形成的位置接近N型摻雜區23。一閘極層27形成在閘極介電層26上,其中,閘極層27為一金屬層或多晶矽層。摻雜區23與24以及閘極層27形成電晶體10。如第1A與2A圖所示,摻雜區23作為電晶體10的汲極區,與摻雜區23電性連接的接觸電極作為汲極電極D。摻雜區24作為電晶體10的源極區,與摻雜區24電性連接的接觸電極作為源極電極S。閘極層27電性連接的接觸電極作為閘極電極G。在本發明實施例中,一接觸電極CE20電性連接摻雜區25。當半導體電路1處於正常操作模式時,一高操作電壓VDD提供至接觸電極CE20;當半導體電路1處於非正常操作模式時,高操作電壓VDD未提供至接觸電極CE20,即接觸電極CE20的電位狀態為浮接(floating)。根據第2A圖的截面圖可得知,電晶體10形成在深井區21內,詳細來說,電晶體10係由深井區21所包圍。第1A圖中顯示邊界L21,其包圍電晶體10,藉以示意第2A圖中電晶體10與深井區21的配置關係。
Referring to FIG. 2A, the
再次參閱第1A圖,二極體12之陰極電性連接電晶體10的汲極電極D,且其陽極電性連接電源端T10。二極體13之陰極電性連接電晶體10的源極電極S,且其陽極電性連接電源端T10。當半導體電路1處於正常操作模式時,一低操作電壓VSS或一接地電壓GND提供至電源端T10(在後文中,將以低操操作電壓VSS為例來說明本發明個實施例);當半導體電路1處於非正常操作模式時,沒有任何電壓提供至電源端T10,即電源端T10的電位狀態為浮接。
Referring to FIG. 1A again, the cathode of the
參閱第1A與2A圖,靜電放電保護電路11電性連接汲極電極D,且包括控制電路110與放電電路111。控制電路110具有一控制端T11,其電性連接接觸電極CE20於節點ND10。在此實施例中,控制電路110包括反向器112。反向器112具有輸入端T12以及輸出端T13,且輸入端T12電性連接控制電路11的控制端T11。反向器112包括P型電晶體P110以及N型電晶體N110。P型電
晶體P110的閘極電性連接輸入端T12,其源極電性連接電晶體10的汲極電極D,且其汲極電性連接輸出端T13。N型電晶體N110的閘極電性連接輸入端T12,其汲極電性連接輸出端T13,且其源極電性連接電源端T10。放電電路111包括N型電晶體N111。N型電晶體N111的閘極電性連接反向器112的輸出端T13,其汲極電性連接電晶體10的汲極電極D,且其源極電性連接電源端T10。基於控制電路110的電路架構與電晶體10的連接,控制電路110根據深井區21的電位狀態,且基於汲極電極D的電位狀態或電源端T10的電位狀態來產生控制信號S10。相關敘述請參閱後文。
Referring to FIGS. 1A and 2A, the electrostatic
當半導體電路1處於非正常操作模式時,高操作電壓VDD未提供至接觸電極CE20,且沒有任何電壓提供至電源端T10,即接觸電極CE20與電源端T10的電位狀態皆為浮接。由於反向器112的輸入端T12透過控制端T11與節點ND10電性連接接觸電極CE20,因此,輸入端T12亦處於浮接狀態,使得P型電晶體P110導通而N型電晶體N110關閉。當於汲極電極D上發生一靜電放電事件時,汲極電極D的電位瞬間提高。透過導通的P型電晶體P110,輸出端T13處於一高電位狀態,即控制信號S10具有一高電壓位準。N型電晶體N111根據此高電壓位準的控制信號S10而導通,使得在汲極電極D與電源端T10之間具有一放電路徑。汲極電極D上的靜電電荷透過此放電路徑傳導至電源端T10,藉此保護耦接電晶體10的電路或元件不受靜電電荷的破壞。
When the
在此實施例中,當半導體電路1處於非正常操作模式且於汲極電極D上發生一靜電放電事件時,由於N型電晶體N111導通且二極體13的連接架構(其陽極電性連接電源端T10,且其陰極電性
連接源極電極S),另一放電路徑形成於在電源端T10與源極電極S之間。因此,當汲極電極D上發生一靜電放電事件時,汲極電極D上的靜電電荷除了可傳導至電源端T10,更可傳導至源極電極S。
In this embodiment, when the
當半導體電路1處於正常操作模式時,高操作電壓VDD提供至接觸電極CE20且低操作電壓VSS提供至電源端T10,即接觸電極CE20處於高電位狀態,而電源端T10處於低電位狀態。在正常操作模式下,由於反向器112的輸入端T12透過控制端T11與節點ND10電性連接接觸電極CE20,輸入端T12處於一高電位狀態,使得N型電晶體N110導通而P型電晶體P110關閉。輸出端T13則基於低操作電壓VSS而處於一低電位狀態,即控制信號S10具有一低電壓位準。N型電晶體N111根據此低電壓位準的控制信號S10而關閉。在正常操作模式下,由於N型電晶體N111關閉,使得汲極電極D與電源端T10不具有放電路徑,即阻斷了前述的放電路徑。
When the
在其他實施例中,靜電放電保護電路11也電性連接源極電極S。在此實施例中,如2B圖所示,在深井區21中更形成N型摻雜區28,且一接觸電極CE21電性連接摻雜區28。當半導體電路1處於正常操作模式時,高操作電壓VDD提供至接觸電極CE21;當半導體電路1處於非正常操作模式時,高操作電壓VDD未提供至接觸電極CE21,即接觸電極CE21的電位狀態為浮接。在此實施例中,N型摻雜區28在深井區21形成的位置接近N型摻雜區(源極區)24。參閱第1B圖,靜電放電保護電路11更包括控制電路113與放電電路114。控制電路113具有一控制端T14,其電性連接接觸電極CE21於節點ND11。控制電路113包括反向器115。反向器115具有輸入端T15以及輸出端T16,且輸入端T15電性連接控制電路
113的控制端T14。反向器115包括P型電晶體P113以及N型電晶體N113。P型電晶體P113的閘極電性連接輸入端T15,其源極電性連接電晶體10的源極電極S,且其汲極電性連接輸出端T16。N型電晶體N113的閘極電性連接輸入端T15,其汲極電性連接輸出端T16,且其源極電性連接電源端T10。放電電路114包括N型電晶體N114。N型電晶體N114的閘極電性連接反向器115的輸出端T16,其汲極電性連接電晶體10的源極電極S,且其源極電性連接電源端T10。基於控制電路113的電路架構與電晶體10的連接,控制電路113根據深井區21的電位狀態,且基於源極電極S的電位狀態或電源端T10的電位狀態來產生控制信號S11。相關敘述請參閱後文。
In other embodiments, the electrostatic
當半導體電路1處於非正常操作模式時,高操作電壓VDD未提供至接觸電極CE21,且沒有任何電壓提供至電源端T10,即接觸電極CE21與電源端T10的電位狀態皆為浮接。由於反向器115的輸入端T15透過控制端T14與節點ND11電性連接接觸電極CE21,因此,輸入端T15亦處於浮接狀態,使得P型電晶體P113導通而N型電晶體N113關閉。當於源極電極S上發生一靜電放電事件時,源極電極S的電位瞬間提高。透過導通的P型電晶體P113,輸出端T16處於一高電位狀態,即控制信號S11具有一高電壓位準。N型電晶體N114根據此高電壓位準的控制信號S11而導通,使得在源極電極S與電源端T10之間具有一放電路徑。源極電極S上的靜電電荷透過此放電路徑傳導至電源端T10,藉此保護耦接電晶體10的電路或元件不受靜電電荷的破壞。
When the
在此實施例中,當半導體電路1處於非正常操作模式且於源極電極S上發生一靜電放電事件時,由於N型電晶體N114導
通且二極體12的連接架構(其陽極電性連接電源端T10,且其陰極電性連接汲極電極D),另一放電路徑形成於在電源端T10與汲極電極D之間。因此,當源極電極S上發生一靜電放電事件時,源極電極S上的靜電電荷除了可傳導至電源端T10,更可傳導至汲極電極D。
In this embodiment, when the
當半導體電路1處於正常操作模式時,高操作電壓VDD提供至接觸電極CE21且低操作電壓VSS提供至電源端T10,即接觸電極CE21處於高電位狀態,而電源端T10處於低電位狀態。在正常操作模式下,由於反向器115的輸入端T15透過控制端T14與節點ND11電性連接接觸電極CE21,輸入端T15處於一高電位狀態,使得N型電晶體N113導通而P型電晶體P113關閉。輸出端T16則基於低操作電壓VSS而處於一低電位狀態,即控制信號S11具有一低電壓位準。N型電晶體N114根據此低電壓位準的控制信號S11而關閉。在正常操作模式下,由於N型電晶體N114關閉,使得源極電極S與電源端T10不具有放電路徑,即阻斷了前述的放電路徑。
When the
在其他實施例中,與電晶體10的汲極電極D電性連接的靜電放電保護電路具有其他電路架構。參閱第1A與3圖,與第1A圖比較起來,第3圖中靜電放電電路11的控制電路110’更包括反向器300。反向器300具有輸入端T30以及輸出端T31,且輸入端T30電性連接反向器112的輸出端T13。反向器300包括P型電晶體P300以及N型電晶體N300。P型電晶體P300的閘極電性連接輸入端T30,其源極電性連接電晶體10的汲極電極D,且其汲極電性連接輸出端T31。N型電晶體N300的閘極電性連接輸入端T30,其汲極電性連接輸出端T31,且其源極電性連接電源端T10。此外,基於控制電路110’的架構,第3圖中靜電放電電路11的放電電路111’包
括P型電晶體P301,取代了第1A圖的N型電晶體N111。參閱第3圖,P型電晶體P301的閘極電性連接反向器300的輸出端T31,其源極電性連接電晶體10的汲極電極D,且其汲極電性連接電源端T10。
In other embodiments, the electrostatic discharge protection circuit electrically connected to the drain electrode D of the
參閱前文關於第1A圖的敘述,在非正常操作模式時,高操作電壓VDD未提供至接觸電極CE20,且沒有任何電壓提供至電源端T10,即接觸電極CE20與電源端T10的電位狀態皆為浮接。當於汲極電極D上發生一靜電放電事件時,反向器112的輸出端T13處於一高電位狀態。根據輸出端T13的高電位狀態,N型電晶體N300導通,而P型電晶體P300關閉。透過導通的N型電晶體N300,輸出端T31基於電源端T10的浮接狀態而處於一低電壓位準,即控制信號S10’具有一低電壓位準。P型電晶體P301根據此低電壓位準的控制信號S10’而導通,使得在汲極電極D與電源端T10之間具有一放電路徑。汲極電極D上的靜電電荷透過此放電路徑傳導至電源端T10,藉此保護耦接電晶體10的電路或元件不受靜電電荷的破壞。
Refer to the description of Figure 1A above, in the abnormal operation mode, the high operating voltage VDD is not provided to the contact electrode CE20, and no voltage is provided to the power supply terminal T10, that is, the potential states of the contact electrode CE20 and the power supply terminal T10 are both Floating. When an electrostatic discharge event occurs on the drain electrode D, the output terminal T13 of the
在此實施例中,當半導體電路1處於非正常操作模式且於汲極電極D上發生一靜電放電事件時,由於P型電晶體P301導通且二極體13的連接架構(其陽極電性連接電源端T10,且其陰極電性連接源極電極S),另一放電路徑形成於在電源端T10與源極電極S之間。因此,當汲極電極D上發生一靜電放電事件時,汲極電極D上的靜電電荷除了可傳導至電源端T10,更可傳導至源極電極S。
In this embodiment, when the
同樣的,參閱前文關於第1A圖的敘述,當半導體電路1處於正常操作模式時,高操作電壓VDD提供至接觸電極CE20且低操作電壓VSS提供至電源端T10,即接觸電極CE20處於高電位
狀態,而電源端T10處於低電位狀態。在正常操作模式下,輸出端T13處於一低電位狀態。根據輸出端T13的低電位狀態,P型電晶體P300導通,而N型電晶體N300關閉。透過導通的P型電晶體P300,輸出端T31基於電晶體10操作時汲極電極D的電位而處於一高電壓位準,即控制信號S10’具有一高電壓位準。P型電晶體P301根據此高電壓位準的控制信號S10’而關閉。在正常操作模式下,由於P型電晶體P301關閉,使得汲極電極D與電源端T10不具有放電路徑,即阻斷了前述的放電路徑。
Similarly, referring to the previous description of Figure 1A, when the
根據上述個實施例,本案之靜電放電保護電路不具有習知技術所採用的一電容-電阻電路,因此占用較小的面積。 According to the above-mentioned embodiment, the electrostatic discharge protection circuit of this case does not have a capacitor-resistor circuit used in the prior art, and therefore occupies a smaller area.
雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此項技藝者,在不脫離本發明之精神和範圍內,當可作更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed as above in preferred embodiments, it is not intended to limit the present invention. Anyone familiar with the art can make changes and modifications without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of protection shall be subject to the scope of the attached patent application.
1:半導體電路 1: Semiconductor circuit
10:半導體元件 10: Semiconductor components
11:靜電放電保護電路 11: Electrostatic discharge protection circuit
12、13:二極體 12, 13: Diode
20:基底 20: Base
21:N型深井區 21: N-type deep well area
22:P型井區 22: P-type well area
23:N型摻雜區(汲極區) 23: N-type doped region (drain region)
24:N型摻雜區(源極區) 24: N-type doped region (source region)
25:N型摻雜區 25: N-type doped region
26:閘極介電層 26: Gate dielectric layer
27:閘極層 27: Gate layer
28:N型摻雜區 28: N-type doped region
110、110’:控制電路 110, 110’: Control circuit
111、111’:放電電路 111, 111’: Discharge circuit
112:反向器 112: Inverter
113:控制電路 113: control circuit
114:放電電路 114: Discharge circuit
115、300:反向器 115, 300: Inverter
CE20、CE21:接觸電極 CE20, CE21: contact electrode
D:汲極電極 D: Drain electrode
G:閘極電極 G: Gate electrode
GND:接地電壓 GND: Ground voltage
L21:邊界 L21: Border
N110、N111、N113、N114、N300:N型電晶體 N110, N111, N113, N114, N300: N-type transistor
ND10、ND11:節點 ND10, ND11: Node
P110、P113、P300、P301:P型電晶體 P110, P113, P300, P301: P-type transistor
S:源極電極 S: source electrode
S10、S10'、S11:控制信號 S10, S10', S11: control signal
T10:電源端 T10: power terminal
T11、T14:控制端 T11, T14: control terminal
T12、T15、T30:輸入端 T12, T15, T30: input terminal
T13、T16、T31:輸出端 T13, T16, T31: output terminal
VDD:高操作電壓 VDD: High operating voltage
VSS:低操作電壓 VSS: Low operating voltage
第1A圖表示根據本發明一實施例之半導體電路。 第1B圖表示根據本發明另一實施例之半導體電路。 第2A圖表示根據本發明一實施例之電晶體的結構截面圖。 第2B圖表示根據本發明另一實施例之電晶體的結構截面圖。 第3圖表示根據本發明另一實施例之半導體電路。 FIG. 1A shows a semiconductor circuit according to an embodiment of the present invention. FIG. 1B shows a semiconductor circuit according to another embodiment of the present invention. FIG. 2A shows a cross-sectional view of the structure of a transistor according to an embodiment of the present invention. FIG. 2B shows a cross-sectional view of the structure of a transistor according to another embodiment of the present invention. Figure 3 shows a semiconductor circuit according to another embodiment of the present invention.
1:半導體電路 1: Semiconductor circuit
10:半導體元件 10: Semiconductor components
11:靜電放電保護電路 11: Electrostatic discharge protection circuit
12、13:二極體 12, 13: Diode
110:控制電路 110: control circuit
111:放電電路 111: Discharge circuit
112:反向器 112: Inverter
D:汲極電極 D: Drain electrode
G:閘極電極 G: Gate electrode
GND:接地電壓 GND: Ground voltage
L21:邊界 L21: Border
N110、N111:N型電晶體 N110, N111: N-type transistor
ND10:節點 ND10: Node
P110:P型電晶體 P110: P-type transistor
S:源極電極 S: source electrode
S10:控制信號 S10: Control signal
T10:電源端 T10: power terminal
T11:控制端 T11: Control terminal
T12:輸入端 T12: input
T13:輸出端 T13: output
VSS:低操作電壓 VSS: Low operating voltage
Claims (22)
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