TWI742219B - Optical film and polarizing plate - Google Patents

Optical film and polarizing plate Download PDF

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TWI742219B
TWI742219B TW106145950A TW106145950A TWI742219B TW I742219 B TWI742219 B TW I742219B TW 106145950 A TW106145950 A TW 106145950A TW 106145950 A TW106145950 A TW 106145950A TW I742219 B TWI742219 B TW I742219B
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resin
thickness
optical film
film
polymer
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TW201831323A (en
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井上恭輔
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日商日本瑞翁股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)
  • Laminated Bodies (AREA)

Abstract

一種光學薄膜,其厚度方向延遲之絕對值為3 nm以下,衝擊強度為2×10−2 J以上,且水蒸氣穿透率為10 g/(m2 ⋅24h)以下。An optical film with an absolute value of retardation in the thickness direction of 3 nm or less, an impact strength of 2×10 −2 J or more, and a water vapor transmission rate of 10 g/(m 2 ⋅24h) or less.

Description

光學薄膜及偏光板Optical film and polarizing plate

本發明係關於一種光學薄膜及偏光板。The present invention relates to an optical film and polarizing plate.

一般而言,偏光板具備偏光件及偏光件保護薄膜。通常使用由樹脂而成之光學薄膜作為偏光件保護薄膜(參照專利文獻1:日本專利公開第2011-013378號公報)。Generally speaking, the polarizing plate includes a polarizer and a polarizer protective film. An optical film made of resin is generally used as a polarizer protective film (refer to Patent Document 1: Japanese Patent Publication No. 2011-013378).

設置於液晶顯示裝置之偏光板通常於偏光件之兩側具備偏光件保護薄膜。此些偏光件保護薄膜中,就實現良好視角特性的觀點而言,設置於偏光件之液晶單元側之內側偏光件保護薄膜,以延遲(retardation)之絕對值為小者為人所企求。於此,申請人為了作為內側偏光件保護薄膜使用,進行了由難以發現延遲之樹脂而成之光學薄膜之研究。The polarizing plate installed in the liquid crystal display device usually has a polarizing member protective film on both sides of the polarizing member. Among these polarizer protective films, from the viewpoint of achieving good viewing angle characteristics, the inner polarizer protective film disposed on the liquid crystal cell side of the polarizer is desired to have a smaller absolute value of retardation. Here, the applicant has conducted research on an optical film made of a resin whose retardation is difficult to find in order to use it as an inner polarizer protective film.

然而,藉由難以發現延遲之樹脂而形成之光學薄膜於薄膜運送時容易發生破損斷裂,特別於修整(trimming)處理之際容易破損斷裂。一般而言,光學薄膜於被製造作為寬幅且長條狀之薄膜之後,將沿其縱向方向連續運送並同時施加各種處理。然而,於進行為將光學薄膜加工成期望尺寸之修整處理作為前述處理時,容易於施加修整處理之部分發生破損斷裂。因此,為了使用由難以發現延遲之樹脂而成之光學薄膜作為內側偏光件保護薄膜,企求改善其運送性,並企求能於抑制破損斷裂發生的同時進行運送。However, an optical film formed by a resin whose retardation is hard to find is prone to breakage during film transportation, especially during trimming processing. Generally speaking, after the optical film is manufactured as a wide and long film, it is continuously transported along its longitudinal direction and various treatments are applied at the same time. However, when the finishing treatment for processing the optical film into a desired size is performed as the aforementioned treatment, the part where the finishing treatment is applied is likely to be damaged or broken. Therefore, in order to use an optical film made of a resin whose retardation is difficult to detect as an inner polarizer protective film, it is desired to improve its transportability and to be able to transport while suppressing the occurrence of breakage.

並且,為了能適用於多樣環境,內側偏光件保護薄膜以於嚴酷環境中難以發生變形者為佳。特別是就抑制偏光板之翹曲所致之畫質降低或抑制偏光板自裝置脫落的觀點而言,內側偏光件保護薄膜,以於高溫高濕環境中可抑制具備該內側偏光件保護薄膜之偏光板翹曲之程度而難以發生變形者為人所企求。然而,申請人進行研究時,過往之樹脂中,雖有難以發現延遲或能形成運送性優異之薄膜之樹脂,但並未尋獲更能於高溫高濕環境中抑制翹曲者。In addition, in order to be applicable to various environments, the inner polarizer protective film is preferably one that is difficult to deform in a harsh environment. Especially from the viewpoint of suppressing the deterioration of the image quality caused by the warpage of the polarizing plate or preventing the polarizing plate from falling off the device, the inner polarizer protective film can prevent the inner polarizer protective film from being equipped with the inner polarizer protective film in a high-temperature and high-humidity environment. The degree of warpage of the polarizer that is difficult to deform is desired. However, when the applicant conducted research, although it was difficult to find a resin that delays or can form a film with excellent transportability among the previous resins, it did not find a resin that can better suppress warpage in a high temperature and high humidity environment.

本發明為有鑑於前述課題而發想,並以提供延遲小、運送性優異且能於高溫高濕環境中抑制翹曲發生之光學薄膜;以及具備前述光學薄膜之偏光板;為目的。The present invention was conceived in view of the foregoing problems, and aims to provide an optical film with low retardation, excellent transportability, and capable of suppressing warpage in a high-temperature and high-humidity environment; and a polarizing plate provided with the foregoing optical film.

本發明人有鑑於前述課題而專心致志進行研究之結果,發現厚度方向延遲之絕對值、衝擊強度及水蒸氣穿透率於指定範圍之光學薄膜可解決前述課題,進而完成本發明。In view of the foregoing problems, the inventors have devoted themselves to the research and found that an optical film with the absolute value of the retardation in the thickness direction, the impact strength and the water vapor transmission rate within the specified range can solve the foregoing problems, and then complete the present invention.

亦即,本發明包含下述內容。That is, the present invention includes the following contents.

[1]一種光學薄膜,其厚度方向延遲之絕對值為3 nm以下,衝擊強度為2×10−2 J以上,且水蒸氣穿透率為10 g/(m2 ⋅24h)以下。[1] An optical film with an absolute value of retardation in the thickness direction of 3 nm or less, an impact strength of 2×10 −2 J or more, and a water vapor transmission rate of 10 g/(m 2 ⋅24h) or less.

[2]如[1]所記載之光學薄膜,其中前述光學薄膜具備以樹脂C形成之核心層、以樹脂S1形成於前述核心層之一側之第一表層及以樹脂S2形成於前述核心層之另一側之第二表層;前述樹脂C之於40 μm之厚度時之厚度方向延遲之絕對值為3 nm以下,前述樹脂S1之於40 μm之厚度時之衝擊強度為5×10−2 J以上,且前述樹脂S2之於40 μm之厚度時之衝擊強度為5×10−2 J以上。[2] The optical film according to [1], wherein the optical film includes a core layer formed of resin C, a first surface layer formed on one side of the core layer with resin S1, and a resin S2 formed on the core layer The second surface layer on the other side; the absolute value of the thickness direction retardation of the aforementioned resin C at a thickness of 40 μm is less than 3 nm, and the impact strength of the aforementioned resin S1 at a thickness of 40 μm is 5×10 −2 J or more, and the impact strength of the aforementioned resin S2 at a thickness of 40 μm is 5×10 −2 J or more.

[3]如[2]所記載之光學薄膜,其中前述樹脂C含有嵌段共聚物之氫化物,前述樹脂S1及前述樹脂S2含有含脂環結構聚合物。[3] The optical film according to [2], wherein the resin C contains a hydrogenated product of a block copolymer, and the resin S1 and the resin S2 contain an alicyclic structure-containing polymer.

[4]如[2]或[3]所記載之光學薄膜,其中前述第一表層之厚度Ts1及前述第二表層之厚度Ts2之總和相對於前述核心層之厚度Tc之比((Ts1+Ts2)/Tc)為0.05~0.4。[4] The optical film as described in [2] or [3], wherein the ratio of the sum of the thickness Ts1 of the first surface layer and the thickness Ts2 of the second surface layer to the thickness Tc of the core layer ((Ts1+Ts2 )/Tc) is 0.05~0.4.

[5]如[1]~[4]所記載之任一項之光學薄膜,其厚度為50 μm以下。[5] The optical film as described in any one of [1] to [4], which has a thickness of 50 μm or less.

[6]一種偏光板,其具備如記載於[1]~[5]之任一項之光學薄膜與偏光件。[6] A polarizing plate provided with the optical film and polarizing member as described in any one of [1] to [5].

若根據本發明,則可提供延遲小、運送性優異且能於高溫高濕環境中抑制翹曲發生之光學薄膜;以及具備前述光學薄膜之偏光板。According to the present invention, it is possible to provide an optical film with low retardation, excellent transportability and capable of suppressing warpage in a high-temperature and high-humidity environment; and a polarizing plate provided with the aforementioned optical film.

以下將揭示關於本發明之實施型態及例示物以詳細說明。然而,本發明並非限定於以下所揭示之實施型態及例示物,在未脫離本發明之申請專利範圍及其均等範圍之範圍中得任意變更並實施。Hereinafter, the embodiments and examples of the present invention will be disclosed for detailed description. However, the present invention is not limited to the embodiments and examples disclosed below, and can be arbitrarily changed and implemented without departing from the scope of the present invention's patent application and its equivalent scope.

於以下說明中,除非另有註明,否則薄膜或層體之面內延遲(retardation)Re為由Re=(nx−ny)×d所表示之值。另外,除非另有註明,否則薄膜或層體之厚度方向延遲Rth為由Rth=[(nx+ny)/2−nz]×d所表示之值。於此,nx表示為垂直於薄膜或層體之厚度方向之方向(面內方向)且賦予最大折射率之方向的折射率。ny表示為薄膜或層體之前述面內方向且正交於nx之方向之方向的折射率。nz表示薄膜或層體之厚度方向的折射率。d表示薄膜或層體之厚度。除非另有註明,否則延遲之量測波長為590 nm。In the following description, unless otherwise noted, the in-plane retardation Re of the film or layer is the value represented by Re=(nx−ny)×d. In addition, unless otherwise noted, the thickness direction retardation Rth of the film or layer is the value represented by Rth=[(nx+ny)/2−nz]×d. Here, nx represents the refractive index in the direction perpendicular to the thickness direction of the film or layer (in-plane direction) and in the direction that gives the maximum refractive index. ny represents the refractive index of the aforementioned in-plane direction of the film or layer and the direction orthogonal to the direction of nx. nz represents the refractive index in the thickness direction of the film or layer. d represents the thickness of the film or layer. Unless otherwise noted, the measurement wavelength of retardation is 590 nm.

於以下說明中,除非另有註明,否則所謂「偏光板」不僅為剛直的組件,亦包含例如樹脂製之薄膜般之具有可撓性的組件。In the following description, unless otherwise noted, the so-called "polarizing plate" is not only a rigid component, but also includes a flexible component such as a resin film.

於以下說明中,所謂「長條狀」之薄膜,係稱相對於幅寬具有5倍以上之長度之薄膜,以具有10倍或以上之長度為佳,具體係稱為具有收捲成輥狀以儲存或運輸程度之長度之薄膜。長條狀之薄膜之長度上限並無特別限制,例如得為相對於幅寬之10萬倍以下。In the following description, the so-called "long strip" film refers to a film having a length of 5 times or more relative to the width of the film, preferably having a length of 10 times or more. Specifically, it is referred to as having a length that is wound into a roll. Film with the length of storage or transportation. The upper limit of the length of the long film is not particularly limited. For example, it may be 100,000 times or less relative to the width of the film.

於以下說明中,除非另有註明,否則所謂某個面之傾斜方向意謂既非平行、亦非垂直於該面之方向,具體係指前述面之極角為大於0°且小於90°之範圍的方向。In the following description, unless otherwise noted, the so-called inclination direction of a plane means a direction neither parallel nor perpendicular to the plane. Specifically, it means that the polar angle of the aforementioned plane is greater than 0° and less than 90° The direction of the range.

於以下說明中,除非另有註明,否則所謂環烴基意謂芳環、環烷烴、環烯烴等含環狀結構之烴基,另外所謂鏈烴化合物意謂不含此環烴基的烴化合物。In the following description, unless otherwise noted, the so-called cyclic hydrocarbon group means an aromatic ring, cycloalkane, cycloalkene, and other cyclic structure-containing hydrocarbon groups, and the so-called chain hydrocarbon compound means a hydrocarbon compound that does not contain the cyclic hydrocarbon group.

[1.光學薄膜之概要][1. Overview of optical film]

本發明之光學薄膜,其(ii)厚度方向延遲之絕對值、(iii)衝擊強度及(iv)水蒸氣穿透率係位於指定範圍。In the optical film of the present invention, (ii) the absolute value of the retardation in the thickness direction, (iii) the impact strength and (iv) the water vapor transmission rate are within the specified range.

具體而言,光學薄膜之厚度方向延遲之絕對值通常為3 nm以下,以2 nm以下為佳,以1.5 nm以下為較佳,以1.0 nm以下為更佳。Specifically, the absolute value of the retardation in the thickness direction of the optical film is usually 3 nm or less, preferably 2 nm or less, preferably 1.5 nm or less, and more preferably 1.0 nm or less.

如前所述之厚度方向延遲之絕對值小之光學薄膜,於作為偏光板之內側偏光件保護薄膜使用的情況下,可改善具備該偏光板之液晶顯示裝置之視角特性。特別是如此之光學薄膜於作為設置於面內切換(In-Plane Switching,IPS)型之液晶顯示裝置之液晶單元之觀看面之內側偏光件保護薄膜使用的情況下,可獲得顯著效果。具體而言,自液晶顯示裝置之顯示面之傾斜方向觀看該顯示面的情況下,可抑制影像之非意圖著色。The aforementioned optical film with a small absolute value of retardation in the thickness direction can improve the viewing angle characteristics of a liquid crystal display device equipped with the polarizer when used as a protective film for the inner polarizer of a polarizer. In particular, such an optical film can be used as a protective film for the inner polarizer of the viewing surface of the liquid crystal cell of an In-Plane Switching (IPS) type liquid crystal display device, and it can achieve significant effects. Specifically, when the display surface of the liquid crystal display device is viewed from the oblique direction of the display surface, unintended coloring of the image can be suppressed.

並且,本發明之光學薄膜更以其(i)面內延遲之絕對值為於指定範圍者為佳。具體而言,光學薄膜之面內延遲之絕對值以6 nm以下為佳,以3 nm以下為較佳,以2 nm以下為更佳,其中以1.5 nm以下為佳,尤以1.0 nm以下為佳。厚度方向延遲之絕對值及面內延遲之絕對值之二者為如此之小之光學薄膜,可更顯著發揮用作偏光板之內側偏光件保護薄膜的情況下所獲得之視角特性的改善效果。In addition, the optical film of the present invention preferably has an absolute value of (i) in-plane retardation within a specified range. Specifically, the absolute value of the in-plane retardation of the optical film is preferably 6 nm or less, preferably 3 nm or less, more preferably 2 nm or less, among them, it is preferably 1.5 nm or less, especially 1.0 nm or less good. Both the absolute value of the retardation in the thickness direction and the absolute value of the in-plane retardation are such small optical films, which can significantly improve the viewing angle characteristics obtained when used as the protective film for the inner polarizer of the polarizing plate.

薄膜之面內延遲及厚度方向延遲得使用AXOMETRICS公司製之「AxoScan」作為量測裝置而於波長590 nm量測。於使用前述量測裝置量測薄膜之厚度方向延遲的情況下,使用該薄膜之平均折射率。於此,所謂平均折射率,係稱薄膜之面內方向之相互垂直之2方向之折射率及該薄膜之厚度方向之折射率之平均值。並且,於具有多層平均折射率相異之薄膜之多層薄膜的情況下,此多層薄膜之平均折射率得採用該多層薄膜所含各層之平均折射率之基於層體厚度比的加權平均。The in-plane retardation and thickness direction retardation of the film can be measured at a wavelength of 590 nm using "AxoScan" manufactured by AXOMETRICS as a measuring device. In the case of measuring the retardation in the thickness direction of the film using the aforementioned measuring device, the average refractive index of the film is used. Here, the so-called average refractive index refers to the average value of the refractive index in the two directions perpendicular to each other in the in-plane direction of the film and the refractive index in the thickness direction of the film. In addition, in the case of a multilayer film having multiple films with different average refractive indexes, the average refractive index of the multilayer film may be a weighted average of the average refractive indexes of the layers contained in the multilayer film based on the layer thickness ratio.

光學薄膜之衝擊強度通常為2×10−2 J以上,以4.0×10−2 J以上為佳,以6.0×10−2 J以上為較佳。如此具有高衝擊強度之光學薄膜難以發生因薄膜運送時之衝擊所致之破損斷裂,例如難以於修整處理之際破損斷裂。因此,如此具有高衝擊強度之光學薄膜由於運送性優異,而可於抑制破損斷裂發生的同時順利進行運送。光學薄膜之衝擊強度雖愈大愈佳,但就薄化光學薄膜的觀點及易於進行製造的觀點而言,以30×10−2 J以下為佳,以25×10−2 J以下為較佳,以20×10−2 J以下為更佳。The impact strength of the optical film is usually 2×10 −2 J or more, preferably 4.0×10 −2 J or more, and 6.0×10 −2 J or more. Such an optical film with high impact strength is difficult to break due to the impact during film transportation, for example, it is difficult to break and break during the trimming process. Therefore, the optical film with such high impact strength has excellent transportability, and can be transported smoothly while suppressing the occurrence of breakage. Although the impact strength of the optical film is larger, the better, but from the viewpoint of thinning the optical film and the ease of manufacture, 30×10 −2 J or less is preferable, and 25×10 −2 J or less is preferable , Preferably less than 20×10 −2 J.

衝擊強度能藉由進行對於由治具固定之薄膜使用指定撞錘(striker)之衝擊試驗而量測。考量薄膜之厚度為小,故不使用市售之衝擊試驗機,而以如實施例中之評價項目的欄位所記載而量測衝擊強度者為佳。The impact strength can be measured by performing an impact test using a specified striker on the film fixed by the jig. Considering that the thickness of the film is small, it is better not to use a commercially available impact tester, but to measure the impact strength as described in the column of the evaluation item in the embodiment.

光學薄膜水蒸氣穿透率通常為10 g/(m2 ⋅24h)以下,以8 g/(m2 ⋅24h)以下為佳,以6 g/(m2 ⋅24h)以下為較佳。水蒸氣穿透率為如此之低之光學薄膜於高溫高濕環境中,該光學薄膜自身難以發生變形。並且,使用此光學薄膜作為偏光件保護薄膜時,因可抑制水滲入偏光件,故可抑制因水分所致之偏光件內之應力產生。因此,水蒸氣穿透率為如前所述之低之光學薄膜藉由作為內側偏光件保護薄膜使用,可抑制具備該內側偏光件保護薄膜之偏光板於高溫高濕環境下之翹曲。光學薄膜之水蒸氣穿透率愈低愈佳,理想為0 g/(m2 ⋅24h)。The water vapor transmission rate of optical film is usually 10 g/(m 2 ⋅24h) or less, preferably 8 g/(m 2 ⋅24h) or less, and preferably 6 g/(m 2 ⋅24h) or less. For an optical film with such a low water vapor transmission rate in a high-temperature and high-humidity environment, the optical film itself is difficult to deform. Moreover, when this optical film is used as a polarizer protective film, since water can be prevented from penetrating into the polarizer, the generation of stress in the polarizer due to moisture can be suppressed. Therefore, an optical film with a low water vapor transmission rate as described above can be used as an inner polarizer protective film to suppress the warpage of the polarizer provided with the inner polarizer protective film under high temperature and high humidity environments. The lower the water vapor transmission rate of the optical film, the better, and the ideal value is 0 g/(m 2 ⋅24h).

光學薄膜之水蒸氣穿透率得使用水蒸氣穿透度量測裝置(MOCON公司製之「PERMATRAN-W」),遵從JIS K 7129 B法,於溫度40℃且濕度90%RH之條件下量測。The water vapor transmission rate of the optical film must be measured using a water vapor transmission measurement device ("PERMATRAN-W" manufactured by MOCON), which complies with the JIS K 7129 B method, and is measured at a temperature of 40°C and a humidity of 90%RH Measurement.

前述光學薄膜通常係作為樹脂薄膜而形成。於令(ii)厚度方向延遲之絕對值、(iii)衝擊強度及(iv)水蒸氣穿透率落於上述指定範圍之範圍時,此光學薄膜之層結構可為任意。光學薄膜可藉由例如組合由延遲發現性小之樹脂所形成之層體與由衝擊強度優異之樹脂所形成之層體而實現。The aforementioned optical film is usually formed as a resin film. When (ii) the absolute value of the retardation in the thickness direction, (iii) the impact strength and (iv) the water vapor transmission rate fall within the above specified range, the layer structure of the optical film can be arbitrary. The optical film can be realized by, for example, combining a layer formed of a resin with low retardation and a layer formed of a resin with excellent impact strength.

[2.光學薄膜之一實施型態][2. One implementation type of optical film]

以下將說明關於光學薄膜之具體實施型態。圖1係概略表示關於本發明之一實施型態之光學薄膜的剖面圖。The following will explain the specific implementation of the optical film. FIG. 1 is a schematic cross-sectional view of an optical film related to an embodiment of the present invention.

如圖1所示,關於本發明之一實施型態之光學薄膜100具備以樹脂C形成之核心層110、以樹脂S1形成於核心層110之一側之第一表層120及以樹脂S2形成於核心層110之另一側之第二表層130。作為樹脂C,使用延遲之絕對值為小之樹脂。並且,作為樹脂S1及S2,使用衝擊強度優異之樹脂。如此,藉由於衝擊強度優異之樹脂S1及S2所形成之第一表層120與第二表層130之間設置延遲之絕對值為小之樹脂C所形成之核心層110,可獲得上述光學薄膜。As shown in FIG. 1, an optical film 100 related to an embodiment of the present invention includes a core layer 110 formed of resin C, a first surface layer 120 formed on one side of the core layer 110 with resin S1, and a resin S2 formed on The second surface layer 130 on the other side of the core layer 110. As resin C, a resin whose absolute value of retardation is small is used. In addition, as the resins S1 and S2, resins with excellent impact strength are used. In this way, the above-mentioned optical film can be obtained by providing the core layer 110 formed by the resin C having a small absolute value of the retardation between the first surface layer 120 and the second surface layer 130 formed by the resins S1 and S2 with excellent impact strength.

前述光學薄膜100雖亦可包含任意層體,但以核心層110與第一表層120之間未有任意層體介入而直接接觸者為佳,並且以核心層110與第二表層130之間未有任意層體介入而直接接觸者為佳。Although the aforementioned optical film 100 may also include any layer, it is preferred that there is no layer between the core layer 110 and the first surface layer 120 and directly contact, and there is no layer between the core layer 110 and the second surface layer 130. Direct contact with any layer is preferred.

[3.核心層][3. Core layer]

核心層係以延遲之絕對值為小之樹脂C所形成之層體。樹脂C之於40 μm之厚度時之厚度方向延遲之絕對值通常為3 nm以下,以2 nm以下為佳,以1.5 nm以下為較佳,以1.0 nm以下為更佳。藉由包含厚度方向延遲之絕對值為如此之小之樹脂C形成之核心層,能縮小光學薄膜自身之延遲之絕對值。再者,就特別縮小光學薄膜之延遲之絕對值的觀點而言,樹脂C之於40 μm之厚度時之面內延遲之絕對值以2 nm以下為佳,以1.5 nm以下為較佳,以1.0 nm以下為更佳。The core layer is a layer formed by resin C whose absolute value of retardation is small. The absolute value of the thickness direction retardation of the resin C at a thickness of 40 μm is usually 3 nm or less, preferably 2 nm or less, preferably 1.5 nm or less, and more preferably 1.0 nm or less. By including the core layer formed by the resin C whose absolute value of the retardation in the thickness direction is so small, the absolute value of the retardation of the optical film itself can be reduced. Furthermore, from the viewpoint of particularly reducing the absolute value of the retardation of the optical film, the absolute value of the in-plane retardation of the resin C at a thickness of 40 μm is preferably 2 nm or less, preferably 1.5 nm or less. 1.0 nm or less is more preferable.

於此,所謂樹脂C之於40 μm之厚度時之面內延遲及厚度方向延遲,係稱以此樹脂C所形成之厚度40 μm之薄膜之面內延遲及厚度方向延遲。樹脂C之於40 μm之厚度時之面內延遲及厚度方向延遲,可藉由使用樹脂C製造厚度40 μm之樣品薄膜且量測此樣品薄膜之面內延遲及厚度方向延遲而求得。Herein, the in-plane retardation and thickness-direction retardation of resin C at a thickness of 40 μm are referred to as the in-plane retardation and thickness-direction retardation of a film with a thickness of 40 μm formed by this resin C. The in-plane retardation and thickness-direction retardation of resin C at a thickness of 40 μm can be obtained by using resin C to produce a sample film with a thickness of 40 μm and measuring the in-plane retardation and thickness-direction retardation of the sample film.

作為前述樹脂C,可使用包含聚合物且更視需求而得包含任意成分之樹脂。其中作為前述樹脂,以包含嵌段共聚物之氫化物之樹脂為佳。特別是作為此嵌段共聚物之氫化物,尤以包含具有含環烴基化合物氫化物單元(a)之嵌段A及具有鏈烴化合物氫化物單元(b)之嵌段B的聚合物為佳。以下有時適當將如此聚合物稱為「聚合物X」。藉由使用如此包含聚合物X之樹脂C,可輕易獲得具有上述各種特性之光學薄膜。As the aforementioned resin C, a resin containing a polymer and more optionally containing optional components can be used. Among them, as the aforementioned resin, a resin containing a hydrogenated product of a block copolymer is preferable. In particular, as the hydrogenated product of this block copolymer, a polymer containing block A having a hydride unit (a) of a cyclic hydrocarbon compound and a block B having a hydride unit of a chain hydrocarbon compound (b) is particularly preferred. . Hereinafter, such a polymer may be referred to as "polymer X" as appropriate. By using the resin C containing the polymer X in this way, an optical film having the above-mentioned various characteristics can be easily obtained.

含環烴基化合物氫化物單元(a),係具有下述結構之結構單元:將含環烴基化合物聚合,藉由此聚合而獲得之單元若具有不飽和鍵結則進一步氫化此不飽和鍵結而獲得之結構。惟含環烴基化合物氫化物單元(a)只要具有該結構,則亦包含由任何製造方法所獲得之單元。The hydride unit (a) of the cyclic hydrocarbon group-containing compound is a structural unit having the following structure: the cyclic hydrocarbon group-containing compound is polymerized, and the unit obtained by the polymerization is further hydrogenated if the unsaturated bond is present. The obtained structure. However, the hydride unit (a) of the cyclic hydrocarbon group-containing compound includes units obtained by any manufacturing method as long as it has this structure.

含環烴基化合物氫化物單元(a)以具有下述結構之芳香族乙烯基化合物氫化物單元(a)者為佳:將芳香族乙烯基化合物聚合,氫化其不飽和鍵結而獲得之結構。惟芳香族乙烯基化合物氫化物單元(a)只要具有該結構,則亦包含由任何製造方法所獲得之單元。The cyclic hydrocarbon group-containing compound hydride unit (a) is preferably an aromatic vinyl compound hydride unit (a) having the following structure: a structure obtained by polymerizing an aromatic vinyl compound and hydrogenating the unsaturated bond. However, the aromatic vinyl compound hydride unit (a) includes units obtained by any manufacturing method as long as it has this structure.

與前述相同,於本申請中,例如聚合苯乙烯(styrene),有時將具有氫化其不飽和鍵結而獲得之結構之結構單元稱為苯乙烯氫化物單元。苯乙烯氫化物單元亦只要具有該結構,則亦包含由任何製造方法所獲得之單元。Similar to the foregoing, in this application, for example, styrene is sometimes referred to as a styrene hydride unit with a structural unit obtained by hydrogenating its unsaturated bond. As long as the styrene hydride unit has this structure, it also includes a unit obtained by any manufacturing method.

作為芳香族乙烯基化合物氫化物單元(a)之例,可列舉由以下結構式(1)所表示之結構單元。Examples of the aromatic vinyl compound hydride unit (a) include structural units represented by the following structural formula (1).

【化1】

Figure 02_image001
(1)【化1】
Figure 02_image001
(1)

於結構式(1)中,RC 表示脂環烴基。舉例而言,RC 可列舉:環己基等環己基類;十氫萘基(decahydronaphthyl)類等。In the structural formula (1), R C represents an alicyclic hydrocarbon group. For example, R C includes: cyclohexyls such as cyclohexyl; decahydronaphthyls and the like.

結構式(1)中,R1 、R2 及R3 係各自獨立表示氫原子、鏈烴基、鹵素原子、烷氧基、羥基、酯基、氰基、醯胺基、醯亞胺基、矽基或以極性基取代之鏈烴基。並且,作為極性基,可列舉例如:鹵素原子、烷氧基、羥基、酯基、氰基、醯胺基、醯亞胺基或矽基。其中,就耐熱性、低多折射性及機械強度等觀點而言,以氫原子及碳數1~6個之鏈烴基作為R1 、R2 及R3 者為佳。作為鏈烴基,以飽和烴基為佳,以烷基為較佳。In the structural formula (1), R 1 , R 2 and R 3 each independently represent a hydrogen atom, a chain hydrocarbon group, a halogen atom, an alkoxy group, a hydroxyl group, an ester group, a cyano group, an amide group, an amide group, and silicon Groups or chain hydrocarbon groups substituted with polar groups. Moreover, as a polar group, a halogen atom, an alkoxy group, a hydroxyl group, an ester group, a cyano group, an amido group, an amido group, or a silyl group can be mentioned, for example. Among them, from the viewpoints of heat resistance, low multi-refraction properties, and mechanical strength, hydrogen atoms and a chain hydrocarbon group having 1 to 6 carbon atoms are preferred as R 1 , R 2 and R 3. As the chain hydrocarbon group, a saturated hydrocarbon group is preferred, and an alkyl group is preferred.

作為芳香族乙烯基化合物氫化物單元(a)之較佳具體例,可列舉由下述式(1-1)所表示之結構單元。由式(1-1)所表示之結構單元為苯乙烯氫化物單元。As a preferable specific example of the aromatic vinyl compound hydride unit (a), a structural unit represented by the following formula (1-1) can be cited. The structural unit represented by the formula (1-1) is a styrene hydride unit.

【化2】

Figure 02_image003
(1-1)【化2】
Figure 02_image003
(1-1)

含環烴基化合物氫化物單元(a)之例示物中具有立體異構物者,亦可使用其任一之立體異構物。含環烴基化合物氫化物單元(a)可僅使用一種,亦可以任意比例組合二種以上使用。If there are stereoisomers in the exemplified cyclic hydrocarbon group-containing compound hydride unit (a), any of the stereoisomers may also be used. The hydride unit (a) of the cyclic hydrocarbon group-containing compound may be used alone or in combination of two or more in any ratio.

嵌段A雖以僅包括含環烴基化合物氫化物單元(a)者為佳,但得含有含環烴基化合物氫化物單元(a)以外之任意單元。作為任意結構單元之例,可列舉:含環烴基化合物氫化物單元(a)以外之基於乙烯基化合物之結構單元。於嵌段A中之任意結構單元之含有率以10重量%以下為佳,以5重量%以下為較佳,以1重量%以下為更佳。Although the block A preferably includes only the hydride unit (a) of the cyclic hydrocarbon group-containing compound, it may contain any unit other than the hydride unit (a) of the cyclic hydrocarbon group-containing compound. As an example of an arbitrary structural unit, the structural unit based on a vinyl compound other than the hydride unit (a) of a cyclic hydrocarbon group containing compound is mentioned. The content of any structural unit in block A is preferably 10% by weight or less, preferably 5% by weight or less, and more preferably 1% by weight or less.

鏈烴化合物氫化物單元(b)係具有下述結構之結構單元:將鏈烴化合物聚合,藉由此聚合而獲得之單元若具有不飽和鍵結則進一步氫化此不飽和鍵結而獲得之結構。惟鏈烴化合物氫化物單元(b)只要具有該結構,則亦包含由任何製造方法所獲得之單元。The chain hydrocarbon compound hydride unit (b) is a structural unit having the following structure: a structure obtained by polymerizing a chain hydrocarbon compound, and if the unit obtained by the polymerization has an unsaturated bond, the unsaturated bond is further hydrogenated. . As long as the hydride unit (b) of the only chain hydrocarbon compound has this structure, it also includes a unit obtained by any manufacturing method.

鏈烴化合物氫化物單元(b)以具有下述結構之二烯化合物氫化物單元(b)者為佳:將二烯化合物聚合,所獲得之聚合物若具有不飽和鍵結則氫化此不飽和鍵結而獲得之結構。惟二烯化合物氫化物單元(b)只要具有該結構,則亦包含由任何製造方法所獲得之單元。The chain hydrocarbon compound hydride unit (b) is preferably a diene compound hydride unit (b) having the following structure: the diene compound is polymerized, and if the obtained polymer has an unsaturated bond, the unsaturated bond is hydrogenated Structure obtained by bonding. Only the diene compound hydride unit (b) includes units obtained by any manufacturing method as long as it has this structure.

與前述相同,於本申請中,例如聚合異戊二烯(isoprene),有時將具有氫化其不飽和鍵結而獲得之結構之結構單元稱為異戊二烯氫化物單元。異戊二烯氫化物單元亦只要具有該結構,則亦包含由任何製造方法所獲得之單元。Same as the foregoing, in the present application, for example, polymerizing isoprene, a structural unit having a structure obtained by hydrogenating its unsaturated bond is sometimes referred to as an isoprene hydride unit. The isoprene hydride unit also includes units obtained by any manufacturing method as long as it has this structure.

二烯化合物氫化物單元(b)以聚合直鏈共軛二烯化合物等共軛二烯化合物且具有氫化其不飽和鍵結而獲得之結構者為佳。作為其例,可列舉由以下結構式(2)所表示之結構單元,及由以下結構式(3)所表示之結構單元。The diene compound hydride unit (b) is preferably one that polymerizes a conjugated diene compound such as a linear conjugated diene compound and has a structure obtained by hydrogenating the unsaturated bond. As an example, the structural unit represented by the following structural formula (2), and the structural unit represented by the following structural formula (3) are mentioned.

【化3】

Figure 02_image005
(2)【化3】
Figure 02_image005
(2)

於結構式(2)中,R4 ~R9 係各自獨立表示氫原子、鏈烴基、鹵素原子、烷氧基、羥基、酯基、氰基、醯胺基、醯亞胺基、矽基或以極性基取代之鏈狀烴基。並且,作為極性基,可列舉例如:鹵素原子、烷氧基、羥基、酯基、氰基、醯胺基、醯亞胺基或矽基。其中,就耐熱性、低多折射性及機械強度等的觀點而言,以氫原子及碳數1~6個之鏈烴基作為R4 ~R9 者為佳。作為鏈烴基,以飽和烴基為佳,以烷基為較佳。In the structural formula (2), R 4 to R 9 each independently represent a hydrogen atom, a chain hydrocarbon group, a halogen atom, an alkoxy group, a hydroxyl group, an ester group, a cyano group, an amido group, an imino group, a silyl group or A chain hydrocarbon group substituted with a polar group. Moreover, as a polar group, a halogen atom, an alkoxy group, a hydroxyl group, an ester group, a cyano group, an amido group, an amido group, or a silyl group can be mentioned, for example. Among them, from the viewpoints of heat resistance, low multi-refraction properties, mechanical strength, etc., hydrogen atoms and a chain hydrocarbon group having 1 to 6 carbon atoms are preferably R 4 to R 9. As the chain hydrocarbon group, a saturated hydrocarbon group is preferred, and an alkyl group is preferred.

【化4】

Figure 02_image007
(3)【化4】
Figure 02_image007
(3)

於結構式(3)中,R10 ~R15 係各自獨立表示氫原子、鏈烴基、鹵素原子、烷氧基、羥基、酯基、氰基、醯胺基、醯亞胺基、矽基或以極性基取代之鏈烴基。並且,作為極性基,可列舉例如:鹵素原子、烷氧基、羥基、酯基、氰基、醯胺基、醯亞胺基或矽基。其中,就耐熱性、低多折射性及機械強度等的觀點而言,以氫原子及碳數1~6個之鏈烴基作為R10 ~R15 者為佳。作為鏈烴基,以飽和烴基為佳,以烷基為較佳。In the structural formula (3), R 10 to R 15 each independently represent a hydrogen atom, a chain hydrocarbon group, a halogen atom, an alkoxy group, a hydroxyl group, an ester group, a cyano group, an amido group, an imino group, a silyl group, or A chain hydrocarbon group substituted with a polar group. Moreover, as a polar group, a halogen atom, an alkoxy group, a hydroxyl group, an ester group, a cyano group, an amido group, an amido group, or a silyl group can be mentioned, for example. Among them, from the viewpoints of heat resistance, low multi-refraction properties, mechanical strength, etc., hydrogen atoms and a chain hydrocarbon group having 1 to 6 carbon atoms are preferably R 10 to R 15. As the chain hydrocarbon group, a saturated hydrocarbon group is preferred, and an alkyl group is preferred.

作為二烯化合物氫化物單元(b)之較佳具體例,可列舉由以下式(2-1)~(2-3)所表示之結構單元。由式(2-1)~(2-3)所表示之結構單元為異戊二烯氫化物單元。Preferred specific examples of the diene compound hydride unit (b) include structural units represented by the following formulas (2-1) to (2-3). The structural units represented by formulas (2-1) to (2-3) are isoprene hydride units.

【化5】

Figure 02_image009
(2-1)
Figure 02_image011
(2-2)
Figure 02_image013
(2-3)【化5】
Figure 02_image009
(2-1)
Figure 02_image011
(2-2)
Figure 02_image013
(2-3)

鏈烴化合物氫化物單元(b)之例示物中具有立體異構物者,亦可使用其任一之立體異構物。鏈烴化合物氫化物單元(b)可僅使用1種,亦可以任意比例組合2種以上使用。If there are stereoisomers in the examples of the chain hydrocarbon compound hydride unit (b), any of the stereoisomers can also be used. The chain hydrocarbon compound hydride unit (b) may be used alone or in combination of two or more in any ratio.

嵌段B雖以僅由含鏈烴化合物氫化物單元(b)組成者為佳,但得含有鏈烴化合物氫化物單元(b)以外之任意單元。作為任意結構單元之例,可列舉:鏈烴化合物氫化物單元(b)以外之基於乙烯基化合物之結構單元。於嵌段B中之任意結構單元之含有率以10重量%以下為佳,以5重量%以下為較佳,以1重量%以下為更佳。Although the block B is preferably composed only of the chain hydrocarbon compound hydride unit (b), it may contain any unit other than the chain hydrocarbon compound hydride unit (b). As an example of an arbitrary structural unit, the structural unit based on a vinyl compound other than a chain hydrocarbon compound hydride unit (b) is mentioned. The content of any structural unit in block B is preferably 10% by weight or less, preferably 5% by weight or less, and more preferably 1% by weight or less.

聚合物X以具有每一個分子一個嵌段B及連結於其二端之每一個分子二個嵌段A之三嵌段分子結構者為佳。亦即,聚合物X以三嵌段共聚物為佳,所述三嵌段共聚物包含每一個分子一個嵌段B;連結於嵌段B之一端且具有含環烴基化合物氫化物單元(a)之每一個分子一個嵌段A1;及連結於嵌段B之另一端且具有含環烴基化合物氫化物單元(a)之每一個分子一個嵌段A2。此時,嵌段A1與嵌段A2可相同,亦可相異。The polymer X preferably has a triblock molecular structure of one block B per molecule and two blocks A per molecule connected to its two ends. That is, the polymer X is preferably a triblock copolymer, and the triblock copolymer includes one block B per molecule; it is connected to one end of the block B and has a cyclic hydrocarbon-containing compound hydride unit (a) One block A1 per molecule; and one block A2 per molecule connected to the other end of block B and having a cyclic hydrocarbon-containing compound hydride unit (a). At this time, the block A1 and the block A2 may be the same or different.

於聚合物X中,嵌段A與嵌段B之重量比(A/B)以落入指定範圍為佳。具體而言,重量比(A/B)以50/50以上為佳,以65/35以上為較佳,以80/20以上為更佳,且以99/1以下為佳,以95/5以下為較佳,以90/10以下為更佳。嵌段A與嵌段B之重量比(A/B)為前述範圍之聚合物X之光彈性係數為小,且延遲發現性為小。因此,可輕易獲得延遲之絕對值小的核心層。In polymer X, the weight ratio (A/B) of block A to block B should fall within the specified range. Specifically, the weight ratio (A/B) is preferably 50/50 or more, preferably 65/35 or more, more preferably 80/20 or more, and preferably 99/1 or less, 95/5 The following is preferable, and 90/10 or less is more preferable. The weight ratio (A/B) of the block A to the block B is in the aforementioned range. The photoelastic coefficient of the polymer X is small, and the retardation discovery is small. Therefore, the core layer with a small absolute value of delay can be easily obtained.

並且,上述聚合物X之水蒸氣吸收性通常為低。因此,藉由使用聚合物X,因水蒸氣難以穿透核心層,故可容易獲得水蒸氣穿透率低之光學薄膜。In addition, the water vapor absorptivity of the polymer X is generally low. Therefore, by using polymer X, it is difficult for water vapor to penetrate the core layer, so an optical film with low water vapor transmission rate can be easily obtained.

聚合物X之製造方法並未特別受到限定,而得採用任意的製造方法。例如藉由準備對應於含環烴基化合物氫化物單元(a)及鏈烴化合物氫化物單元(b)之單體,令此些材料聚合,氫化所獲得之聚合物,而得製造聚合物X。The manufacturing method of the polymer X is not particularly limited, and any manufacturing method may be adopted. For example, by preparing monomers corresponding to the cyclic hydrocarbon-containing compound hydride unit (a) and the chain hydrocarbon compound hydride unit (b), polymerizing these materials, and hydrogenating the obtained polymer, the polymer X is produced.

作為對應於含環烴基化合物氫化物單元(a)之單體,得使用芳香族乙烯基化合物。作為其例,可列舉苯乙烯、α-甲基苯乙烯、α-乙基苯乙烯、α-丙基苯乙烯、α-異丙基苯乙烯、α-三級丁基苯乙烯、2-甲基苯乙烯、3-甲基苯乙烯、4-甲基苯乙烯、2,4-二異丙基苯乙烯、2,4-二甲基苯乙烯、4-三級丁基苯乙烯、5-三級丁基-2-甲基苯乙烯、單氯苯乙烯、二氯苯乙烯、單氟苯乙烯及4-苯基苯乙烯等苯乙烯類;乙烯基環己烷及3-甲基異丙烯基環己烷等乙烯基環己烷類;以及4-乙烯基環己烯、4-異丙烯基環己烯、1-甲基-4-乙烯基環己烯、1-甲基-4-異丙烯基環己烯、2-甲基-4-乙烯基環己烯及2-甲基-4-異丙烯基環己烯等乙烯基環己烯類。此些單體可單獨使用1種,亦可以任意比例組合2種以上使用。As the monomer corresponding to the hydride unit (a) of the cyclic hydrocarbon group-containing compound, an aromatic vinyl compound can be used. As an example, styrene, α-methylstyrene, α-ethylstyrene, α-propylstyrene, α-isopropylstyrene, α-tertiary butylstyrene, 2-methylstyrene Styrene, 3-methylstyrene, 4-methylstyrene, 2,4-diisopropylstyrene, 2,4-dimethylstyrene, 4-tertiarybutylstyrene, 5- Styrenes such as tertiary butyl-2-methylstyrene, monochlorostyrene, dichlorostyrene, monofluorostyrene and 4-phenylstyrene; vinylcyclohexane and 3-methylisopropene Cyclohexane and other vinyl cyclohexanes; and 4-vinylcyclohexene, 4-isopropenylcyclohexene, 1-methyl-4-vinylcyclohexene, 1-methyl-4- Vinyl cyclohexenes such as isopropenylcyclohexene, 2-methyl-4-vinylcyclohexene, and 2-methyl-4-isopropenylcyclohexene. These monomers can be used individually by 1 type, and can also be used in combination of 2 or more types in arbitrary ratios.

作為對應於鏈烴化合物氫化物單元(b)之例,可列舉:丁二烯、異戊二烯、2,3-二甲基-1,3-丁二烯、1,3-戊二烯及1,3-己二烯等直鏈共軛二烯類。此些單體可單獨使用1種,亦可以任意比例組合2種以上使用。Examples of the hydride unit (b) corresponding to the chain hydrocarbon compound include butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, and 1,3-pentadiene And 1,3-hexadiene and other linear conjugated dienes. These monomers can be used individually by 1 type, and can also be used in combination of 2 or more types in arbitrary ratios.

作為聚合的反應樣式,通常得採用陰離子聚合。並且,聚合亦可用塊狀聚合、溶液聚合等之任一者進行。其中,為了連續進行聚合反應及氫化反應,而以溶液聚合為佳。As the reaction mode of polymerization, anionic polymerization is usually used. In addition, the polymerization may be performed by any of bulk polymerization, solution polymerization, and the like. Among them, in order to continuously carry out the polymerization reaction and the hydrogenation reaction, solution polymerization is preferred.

作為聚合之反應溶劑之例,可列舉:正丁烷、正戊烷、異戊烷、正己烷、正庚烷及異辛烷等脂族烴溶劑;環戊烷、環己烷、甲基環戊烷、甲基環己烷及十氫萘(decalin)等脂環烴溶劑;以及苯及甲苯等芳香族烴溶劑。其中若使用脂族烴溶劑及脂環烴溶劑,亦可就此作為氫化反應中之非活性溶劑使用而為佳。Examples of reaction solvents for polymerization include: aliphatic hydrocarbon solvents such as n-butane, n-pentane, isopentane, n-hexane, n-heptane, and isooctane; cyclopentane, cyclohexane, methyl ring Alicyclic hydrocarbon solvents such as pentane, methylcyclohexane and decalin; and aromatic hydrocarbon solvents such as benzene and toluene. Among them, if aliphatic hydrocarbon solvents and alicyclic hydrocarbon solvents are used, they can also be used as inactive solvents in the hydrogenation reaction.

反應溶劑可單獨使用一種,亦可以任意比例組合二種以上使用。The reaction solvent can be used alone or in combination of two or more in any ratio.

反應溶劑通常以相對於總單體100重量份成為200~10,000重量份之比例使用。The reaction solvent is usually used at a ratio of 200 to 10,000 parts by weight with respect to 100 parts by weight of the total monomers.

聚合之際,通常使用聚合起始劑。作為聚合起始劑之例,可列舉:正丁基鋰、二級丁基鋰、三級丁基鋰、己基鋰及苯基鋰等單有機鋰;以及二鋰甲烷、1,4-二鋰丁烷及1,4-二鋰-2-乙基環己烷等多官能性有機鋰化合物。聚合起始劑可單獨使用1種,亦可以任意比例組合2種以上使用。During polymerization, a polymerization initiator is usually used. Examples of polymerization initiators include monoorganolithium such as n-butyl lithium, secondary butyl lithium, tertiary butyl lithium, hexyl lithium, and phenyl lithium; and dilithium methane and 1,4-dilithium. Multifunctional organolithium compounds such as butane and 1,4-dilithium-2-ethylcyclohexane. A polymerization initiator may be used individually by 1 type, and may be used combining 2 or more types in arbitrary ratios.

作為製造含有嵌段A1、嵌段A2及嵌段B作為聚合物X之三嵌段共聚物之情況之製造方法之例,可列舉包含下述第一步驟~第三步驟之製造方法。於此,稱為「單體組成物」之材料不僅包含二種以上物質之混合物,亦包含由單一物質構成之材料。As an example of a production method in the case of producing a triblock copolymer containing block A1, block A2, and block B as polymer X, a production method including the following first to third steps can be cited. Here, the material called "monomer composition" includes not only a mixture of two or more substances, but also a material composed of a single substance.

第一步驟:令含有芳香族乙烯基化合物之單體組成物(a1)聚合而形成嵌段A之步驟。The first step: the step of polymerizing the monomer composition (a1) containing the aromatic vinyl compound to form the block A.

第二步驟:於此嵌段A之一端,令含有二烯化合物之單體組成物(b)聚合而形成嵌段B,進而形成A-B之二嵌段聚合物之步驟。The second step: at one end of the block A, the monomer composition (b) containing the diene compound is polymerized to form the block B, and then the step of forming the AB diblock polymer.

第三步驟:於此二嵌端聚合物之嵌段B側之末端,令含有芳香族乙烯基化合物之單體組成物(a2)聚合而獲得三嵌段共聚物之步驟。惟單體組成物(a1)與單體組成物(a2)可相同亦可相異。The third step: a step of polymerizing the monomer composition (a2) containing an aromatic vinyl compound at the end of the block B side of the diblocker polymer to obtain a triblock copolymer. However, the monomer composition (a1) and the monomer composition (a2) may be the same or different.

於分別聚合各自嵌段之際,於各個嵌段內,為了抑制某一成分之接鏈過長而得使用聚合促進劑及隨機發生劑(randomizer)。例如於藉由陰離子聚合而進行聚合之情況中,得使用路易斯鹼(Lewis base)化合物作為隨機發生劑。作為路易斯鹼化合物之具體例,可列舉:二甲醚、二乙醚、二異丙醚、二丁醚、四氫呋喃、二苯醚、乙二醇二乙醚及乙二醇甲基苯基醚等醚化合物;四甲基乙二胺、三甲胺、三乙胺及吡啶(pyridine)等三級胺化合物;三級戊醇鉀及三級丁醇鉀等鹼金屬醇鹽化合物;以及三苯基膦等膦(phosphine)化合物。此些材料可單獨使用1種,亦可以任意比例組合2種以上使用。When each block is polymerized separately, in each block, a polymerization accelerator and a randomizer must be used in order to prevent the chain of a certain component from being too long. For example, in the case of polymerization by anionic polymerization, a Lewis base compound must be used as a random generator. Specific examples of Lewis base compounds include ether compounds such as dimethyl ether, diethyl ether, diisopropyl ether, dibutyl ether, tetrahydrofuran, diphenyl ether, ethylene glycol diethyl ether, and ethylene glycol methyl phenyl ether. ; Tertiary amine compounds such as tetramethylethylenediamine, trimethylamine, triethylamine and pyridine; alkali metal alkoxide compounds such as potassium tertiary pentanoxide and potassium tertiary butoxide; and phosphines such as triphenylphosphine (Phosphine) compound. These materials can be used alone or in combination of two or more in any ratio.

聚合溫度雖只要可進行聚合則並無限制,但通常為0℃以上,以20℃以上為佳,且通常為200℃以下,以100℃以下為佳,以80℃以下為較佳。Although the polymerization temperature is not limited as long as the polymerization can be carried out, it is usually 0°C or higher, preferably 20°C or higher, and usually 200°C or lower, preferably 100°C or lower, and preferably 80°C or lower.

聚合後,若有需要則得藉由任意方法自反應混合物回收聚合物。作為回收方法之例,可列舉:蒸汽汽提(steam stripping)法、直接去溶劑法及醇凝固法。並且,於聚合時使用於氫化反應中之非活性溶劑作為反應溶劑之情況中,可不自聚合溶液回收聚合物,而可就此提供於氫化步驟。After polymerization, if necessary, the polymer can be recovered from the reaction mixture by any method. Examples of the recovery method include a steam stripping method, a direct solvent removal method, and an alcohol coagulation method. In addition, when the inert solvent used in the hydrogenation reaction is used as the reaction solvent during polymerization, the polymer may not be recovered from the polymerization solution, but may be provided in the hydrogenation step as it is.

聚合物之氫化方法並無特別限制,而得採用任意方法。舉例而言,氫化得使用適當的氫化觸媒而進行。更具體而言,於有機溶劑中,得使用含有選自由鎳、鈷、鐵、銠、鈀、鉑、釕及錸而成之群組之至少一金屬之氫化觸媒而進行氫化。氫化觸媒可使用非均一系觸媒,亦可使用均相觸媒。氫化觸媒可單獨使用一種,亦可以任意比例組合二種以上使用。The method of hydrogenation of the polymer is not particularly limited, and any method may be adopted. For example, hydrogenation can be carried out using a suitable hydrogenation catalyst. More specifically, in an organic solvent, a hydrogenation catalyst containing at least one metal selected from the group consisting of nickel, cobalt, iron, rhodium, palladium, platinum, ruthenium, and rhenium is used for hydrogenation. The hydrogenation catalyst can be a heterogeneous catalyst or a homogeneous catalyst. The hydrogenation catalyst may be used alone or in combination of two or more in any ratio.

非均相觸媒可就此使用金屬或金屬化合物,亦可由適當的載體承載而使用。作為載體之例,可列舉:活性炭、矽石、氧化鋁、碳化鈣、二氧化鈦、氧化鎂、氧化鋯、矽藻土及碳化矽。載體中之觸媒的承載量通常為0.01重量%以上,以0.05重量%以上為佳,且通常為80重量%以下,以60重量%以下為佳。The heterogeneous catalyst can use a metal or a metal compound for this purpose, or it can be carried by a suitable carrier for use. Examples of the carrier include activated carbon, silica, alumina, calcium carbide, titanium dioxide, magnesium oxide, zirconium oxide, diatomaceous earth, and silicon carbide. The loading capacity of the catalyst in the carrier is usually 0.01% by weight or more, preferably 0.05% by weight or more, and usually 80% by weight or less, preferably 60% by weight or less.

作為均相觸媒之例,可列舉:組合鎳、鈷或鐵之化合物與有機金屬化合物(例如有機鋁化合物、有機鋰化合物)之觸媒;以及銠、鈀、鉑、釕及錸等有機金屬錯合物觸媒。作為鎳、鈷或鐵之化合物之例,可列舉:此些金屬之乙醯丙酮鹽、環烷酸鹽、環戊二烯基化合物及環戊二烯基二氯化合物。作為有機鋁化合物之例,可列舉:三乙基鋁、三異丁基鋁等烷基鋁;氯化二乙基鋁、二氯化乙基鋁等鹵化鋁;以及氫化二異丁基鋁等氫化烷基鋁。Examples of homogeneous catalysts include: catalysts that combine compounds of nickel, cobalt, or iron with organometallic compounds (for example, organoaluminum compounds, organolithium compounds); and organometals such as rhodium, palladium, platinum, ruthenium, and rhenium Complex catalyst. Examples of nickel, cobalt, or iron compounds include acetone acetonates, naphthenates, cyclopentadienyl compounds, and cyclopentadienyl dichloride compounds of these metals. Examples of organoaluminum compounds include: aluminum alkyls such as triethyl aluminum and triisobutyl aluminum; aluminum halides such as diethyl aluminum chloride and ethyl aluminum dichloride; and diisobutyl aluminum hydride. Alkyl aluminum hydride.

作為有機金屬錯合物觸媒之例,可列舉例如:上述各金屬之γ-二氯-π-苯錯合物、二氯參(三苯膦)錯合物、氯氫三苯膦錯合物等金屬錯合物。Examples of organometallic complex catalysts include, for example, γ-dichloro-π-benzene complexes, dichloroginseng (triphenylphosphine) complexes, and triphenylphosphine complexes of the aforementioned metals. Metal complexes such as objects.

氫化觸媒之使用量相對於聚合物100重量份,通常為0.01重量份以上,以0.05重量份以上為佳,以0.1重量份以上為較佳,且通常為100重量份以下,以50重量份以下為佳,以30重量份以下為較佳。The amount of hydrogenation catalyst used relative to 100 parts by weight of the polymer is usually 0.01 parts by weight or more, preferably 0.05 parts by weight or more, preferably 0.1 parts by weight or more, and usually 100 parts by weight or less, 50 parts by weight The following is preferable, and 30 parts by weight or less is preferable.

氫化反應之際之反應溫度通常為10℃~250℃,但因所謂可提升氫化率且可縮小聚合物鏈切斷反應之理由,而以50℃以上為佳,以80℃以上為較佳,且以200℃以下為佳,以180℃以下為較佳。並且,反應時之壓力雖通常為0.1 MPa~30 MPa,但就上述理由再加上操作性之觀點而言,以1 MPa以上為佳,以2 MPa以上為較佳,且以20 MPa以下為佳,以10 MPa以下為較佳。The reaction temperature during the hydrogenation reaction is usually 10°C to 250°C, but for the reason that the hydrogenation rate can be increased and the polymer chain scission reaction can be reduced, it is preferably 50°C or higher, and more preferably 80°C or higher. And it is preferably 200°C or less, preferably 180°C or less. In addition, although the pressure during the reaction is usually 0.1 MPa to 30 MPa, from the above-mentioned reasons plus the viewpoint of operability, 1 MPa or more is preferable, 2 MPa or more is more preferable, and 20 MPa or less is preferable Better, preferably 10 MPa or less.

氫化率通常為90%以上,以95%以上為佳,以97%以上為較佳。藉由提升氫化率,可提升聚合物X之低多折射性及熱穩定性等。氫化率可藉由質子核磁共振儀(1 H-NMR)量測。The hydrogenation rate is usually 90% or more, preferably 95% or more, and more preferably 97% or more. By increasing the hydrogenation rate, the low polyrefraction and thermal stability of polymer X can be improved. The hydrogenation rate can be measured by proton nuclear magnetic resonance ( 1 H-NMR).

樹脂C所含有之聚合物之重量平均分子量Mw以50000以上為佳,以55000以上為較佳,以60000以上為更佳,且以80000以下為佳,以75000以下為較佳,以70000以下為更佳。藉由重量平均分子量Mw位於前述範圍中,可輕易獲得具有上述特性之光學薄膜。特別藉由縮小重量平均分子量,可有效縮小延遲發現性。The weight average molecular weight Mw of the polymer contained in resin C is preferably 50,000 or more, preferably 55,000 or more, more preferably 60,000 or more, and preferably 80,000 or less, preferably 75,000 or less, preferably 70,000 or less Better. With the weight average molecular weight Mw in the aforementioned range, an optical film with the above-mentioned characteristics can be easily obtained. In particular, by reducing the weight average molecular weight, the delay discovery can be effectively reduced.

樹脂C所含有之聚合物之分子量分布(重量平均分子量(Mw)/數量平均分子量(Mn))以2.0以下為佳,以1.7以下為較佳,尤以1.5以下為佳,且以1.0以上為佳。藉由重量平均分子量Mw位於前述範圍中,可降低聚合物黏度且提升成形性。而且,可有效縮小延遲發現性。The molecular weight distribution (weight average molecular weight (Mw)/number average molecular weight (Mn)) of the polymer contained in resin C is preferably 2.0 or less, preferably 1.7 or less, particularly preferably 1.5 or less, and 1.0 or more good. With the weight average molecular weight Mw in the aforementioned range, the viscosity of the polymer can be reduced and the moldability can be improved. Moreover, the delay detection can be effectively reduced.

聚合物之重量平均分子量Mw及數量平均分子量Mn,得藉由四氫呋喃作為溶劑之凝膠滲透層析術(gel permeation chromatography)而量測作為聚苯乙烯換算之值。The weight average molecular weight Mw and the number average molecular weight Mn of the polymer are measured as polystyrene conversion values by gel permeation chromatography with tetrahydrofuran as a solvent.

樹脂C可單獨含有1種聚合物,亦可以任意比例組合而含有2種以上聚合物。The resin C may contain one type of polymer alone, or two or more types of polymers may be combined in any ratio.

就容易獲得期望光學薄膜的觀點而言,樹脂C中之聚合物之比例以90重量%以上為佳,以95重量%以上為較佳,尤以97重量%以上為佳。From the viewpoint of easily obtaining the desired optical film, the proportion of the polymer in the resin C is preferably 90% by weight or more, more preferably 95% by weight or more, and particularly preferably 97% by weight or more.

樹脂C亦可含有任意成分組合於上述聚合物。作為任意成分,可列舉例如:無機微粒;抗氧化劑、熱穩定劑、紫外線吸收劑、近紅外線吸收劑等穩定劑;潤滑劑、塑化劑等樹脂改良劑;染料或顏料等著色劑;及抗靜電劑。作為此些任意成分,可單獨使用1種,亦可以任意比例組合2種以上使用。惟就顯著發揮本發明之效果的觀點而言,以任意成分之含有比例為少者為佳。舉例而言,任意成分之總計比例相對於樹脂C所含有之聚合物100重量份,以10重量份以下為佳,以5重量份以下為較佳,以3重量份以下為更佳。Resin C may contain arbitrary components in combination with the above-mentioned polymer. Examples of optional components include inorganic fine particles; stabilizers such as antioxidants, heat stabilizers, ultraviolet absorbers, and near-infrared absorbers; resin modifiers such as lubricants and plasticizers; colorants such as dyes or pigments; and Electrostatic agent. As these arbitrary components, 1 type may be used individually, and 2 or more types may be combined and used in arbitrary ratios. However, from the viewpoint of remarkably exerting the effect of the present invention, it is better to make the content ratio of the optional component smaller. For example, the total ratio of the optional components relative to 100 parts by weight of the polymer contained in the resin C is preferably 10 parts by weight or less, preferably 5 parts by weight or less, and more preferably 3 parts by weight or less.

樹脂C之於40 μm之厚度時之水蒸氣穿透率通常為100 g/(m2 ⋅24h)以下,以50 g/(m2 ⋅24h)以下為佳,以10 g/(m2 ⋅24h)以下為較佳。藉由使用水蒸氣穿透率為如此之低之樹脂C,可降低光學薄膜自身之水蒸氣穿透率。The water vapor transmission rate of resin C at a thickness of 40 μm is usually below 100 g/(m 2 ⋅24h), preferably below 50 g/(m 2 ⋅24h), and 10 g/(m 2 ⋅ 24h) The following are preferred. By using resin C with such a low water vapor transmission rate, the water vapor transmission rate of the optical film itself can be reduced.

於此,所謂樹脂C之於40 μm之厚度時之水蒸氣穿透率,係指以此樹脂C形成之厚度40 μm之薄膜之水蒸氣穿透率。樹脂C之於40 μm之厚度時之水蒸氣穿透率,可藉由使用樹脂C製造厚度40 μm之樣品薄膜並量測此樣品薄膜之水蒸氣穿透率而求得。Herein, the water vapor transmission rate of resin C at a thickness of 40 μm refers to the water vapor transmission rate of a film with a thickness of 40 μm formed by this resin C. The water vapor transmission rate of resin C at a thickness of 40 μm can be obtained by using resin C to make a sample film with a thickness of 40 μm and measuring the water vapor transmission rate of the sample film.

核心層因係以延遲之絕對值為小之樹脂C所形成,故通常該核心層之延遲之絕對值為小。具體而言,核心層之面內延遲之絕對值以2 nm以下為佳,以1.0 nm以下為較佳,以0.5 nm以下為更佳。並且,核心層之厚度方向延遲之絕對值以2 nm以下為佳,以1.0 nm以下為較佳,以0.5 nm以下為更佳。Since the core layer is formed by resin C whose absolute value of retardation is small, the absolute value of retardation of the core layer is usually small. Specifically, the absolute value of the in-plane retardation of the core layer is preferably 2 nm or less, preferably 1.0 nm or less, and more preferably 0.5 nm or less. In addition, the absolute value of the thickness direction retardation of the core layer is preferably 2 nm or less, preferably 1.0 nm or less, and more preferably 0.5 nm or less.

薄膜所包含之層體之面內延遲及厚度方向延遲,得由該薄膜之R0及R40、自該薄膜去除一部分層體之試料薄膜之R0及R40、以及該層體之平均折射率而計算。於此,所謂R0係表示於薄膜之主面之法線方向所量測之延遲,表示該薄膜之面內延遲。並且,所謂R40係表示於相對於薄膜之主面之法線方向40°之角度之方向所量測之延遲。此些R0與R40得使用AXOMETRICS公司製之「AxoScan」作為量測裝置而於波長590 nm量測。再者,薄膜所包含之層體之平均折射率,得藉由使用該層體所包含之樹脂製造樣品薄膜且量測此樣品薄膜之折射率而求得。The in-plane retardation and thickness direction retardation of the layer contained in the film can be calculated from the R0 and R40 of the film, the R0 and R40 of the sample film with a part of the layer removed from the film, and the average refractive index of the layer. Here, the so-called R0 represents the retardation measured in the normal direction of the main surface of the film, and represents the in-plane retardation of the film. In addition, the so-called R40 represents the retardation measured in the direction of an angle of 40° with respect to the normal direction of the main surface of the film. These R0 and R40 have to be measured at a wavelength of 590 nm using "AxoScan" manufactured by AXOMETRICS as a measuring device. Furthermore, the average refractive index of the layer contained in the film can be obtained by manufacturing a sample film using the resin contained in the layer and measuring the refractive index of the sample film.

核心層之厚度以20 μm以上為佳,以25 μm以上為較佳,以30 μm以上為更佳,且以80 μm以下為佳,以60 μm以下為較佳,以40 μm以下為更佳。藉由核心層之厚度位於前述範圍之下限值以上,可降低延遲之值,並且藉由位於前述範圍之上限值以下,可薄化光學薄膜。The thickness of the core layer is preferably 20 μm or more, preferably 25 μm or more, more preferably 30 μm or more, and preferably 80 μm or less, preferably 60 μm or less, more preferably 40 μm or less . When the thickness of the core layer is above the lower limit of the aforementioned range, the retardation value can be reduced, and by being below the upper limit of the aforementioned range, the optical film can be thinned.

並且,第一表層之厚度Ts1及第二表層之厚度Ts2之總和相對於核心層之厚度Tc之比((Ts1+Ts2)/Tc)以落入指定範圍為佳(參照圖1)。具體而言,前述厚度之比((Ts1+Ts2)/Tc)以0.05以上為佳,以0.15以上為較佳,以0.25以上為更佳,且以0.4以下為佳,以0.38以下為較佳,以0.35以下為更佳。藉由前述厚度之比((Ts1+Ts2)/Tc)位於前述範圍之下限值以上,可有效提升光學薄膜之耐衝擊性,並且藉由位於前述範圍之上限值以下,可有效縮小光學薄膜之延遲之絕對值。In addition, the ratio of the sum of the thickness Ts1 of the first surface layer and the thickness Ts2 of the second surface layer to the thickness Tc of the core layer ((Ts1+Ts2)/Tc) should preferably fall within the specified range (refer to FIG. 1). Specifically, the ratio of the aforementioned thickness ((Ts1+Ts2)/Tc) is preferably 0.05 or more, preferably 0.15 or more, more preferably 0.25 or more, and preferably 0.4 or less, preferably 0.38 or less , Preferably 0.35 or less. By the ratio of the aforementioned thickness ((Ts1+Ts2)/Tc) above the lower limit of the aforementioned range, the impact resistance of the optical film can be effectively improved, and by being below the upper limit of the aforementioned range, the optical film can be effectively reduced. The absolute value of the retardation of the film.

[4.第一表層][4. The first surface layer]

第一表層係以衝擊強度優異之樹脂S1形成於核心層之一側之層體。此樹脂S1之於40 μm之厚度時之衝擊強度為以5×10−2 J以上為佳,以7×10−2 J以上為較佳,以9×10−2 J以上為更佳。藉由將以衝擊強度如此優異之樹脂S1所形成之第一表層與以衝擊強度同樣優異之樹脂S2所形成之第二表層組合而包含,可提升光學薄膜自身之衝擊強度。就容易進行光學薄膜之製造的觀點而言,樹脂S1之於40 μm之厚度時之衝擊強度之上限以30×10−2 J以下為佳,以25×10−2 J以下為較佳,以20×10−2 J以下為更佳。The first surface layer is a layered body formed on one side of the core layer with resin S1 having excellent impact strength. The impact strength of this resin S1 at a thickness of 40 μm is preferably 5×10 −2 J or more, preferably 7×10 −2 J or more, and more preferably 9×10 −2 J or more. By combining the first surface layer formed by resin S1 with such excellent impact strength and the second surface layer formed by resin S2 having the same excellent impact strength, the impact strength of the optical film itself can be improved. From the viewpoint of ease of manufacturing optical films, the upper limit of the impact strength of resin S1 at a thickness of 40 μm is preferably 30×10 −2 J or less, preferably 25×10 −2 J or less. 20×10 −2 J or less is better.

於此,所謂樹脂S1之於40 μm之厚度時之衝擊強度,係指以此樹脂S1形成之厚度40 μm之薄膜之衝擊強度。樹脂S1之於40 μm之厚度時之衝擊強度,可藉由使用樹脂S1製造厚度40 μm之樣品薄膜並量測此樣品薄膜之衝擊強度而求得。Here, the so-called impact strength of resin S1 at a thickness of 40 μm refers to the impact strength of a film with a thickness of 40 μm formed by this resin S1. The impact strength of the resin S1 at a thickness of 40 μm can be obtained by using the resin S1 to make a sample film with a thickness of 40 μm and measuring the impact strength of the sample film.

作為前述樹脂S1,可使用包含聚合物且更視需求而得包含任意成分之樹脂。其中作為前述樹脂,以包含含脂環結構之聚合物之樹脂為佳。以下有時適當將含脂環結構之聚合物稱為「含脂環結構聚合物」。含脂環結構聚合物因其機械強度優異,故可有效提升光學薄膜之衝擊強度。並且,含脂環結構聚合物因其吸濕性低,故可有效減少光學薄膜之水蒸氣穿透率。再者,含脂環結構聚合物通常具有優異的透明性、尺寸穩定性及輕量性。As the aforementioned resin S1, a resin containing a polymer and more optionally containing any components can be used. Among them, as the aforementioned resin, a resin containing an alicyclic structure-containing polymer is preferred. Hereinafter, the alicyclic structure-containing polymer may be appropriately referred to as the "alicyclic structure-containing polymer". The alicyclic structure polymer has excellent mechanical strength, so it can effectively improve the impact strength of the optical film. In addition, the alicyclic structure-containing polymer has low hygroscopicity, so it can effectively reduce the water vapor transmission rate of the optical film. Furthermore, alicyclic structure-containing polymers generally have excellent transparency, dimensional stability, and light weight.

含脂環結構聚合物為重複單元中具有脂環結構之聚合物,。可列舉例如:藉由使用環烯烴作為單體之聚合反應而得獲得之聚合物或其氫化物等。並且,作為前述之含脂環結構聚合物,可使用於主鏈中含有脂環結構之聚合物及於側鏈含有脂環結構之聚合物之任一者。作為脂環結構,雖可列舉例如:環烷烴結構、環烯烴結構等,但就熱穩定性等的觀點而言,以環烷烴結構為佳。The alicyclic structure-containing polymer is a polymer with an alicyclic structure in the repeating unit. For example, a polymer obtained by a polymerization reaction using a cycloolefin as a monomer or a hydrogenated product thereof can be cited. Furthermore, as the aforementioned alicyclic structure-containing polymer, it can be used for any of a polymer containing an alicyclic structure in the main chain and a polymer containing an alicyclic structure in the side chain. The alicyclic structure includes, for example, a cycloalkane structure, a cycloalkene structure, etc., but from the viewpoint of thermal stability and the like, a cycloalkane structure is preferred.

一個脂環結構所含有之碳數以4個以上為佳,以5個以上為較佳,以6個以上為更佳,且以30個以下為佳,以20個以下為較佳,以15個以下為更佳。藉由一個脂環結構所含有之碳數位於上述範圍內,可令機械強度、耐熱性及成形性取得高度平衡。The number of carbons contained in an alicyclic structure is preferably 4 or more, preferably 5 or more, more preferably 6 or more, and preferably 30 or less, preferably 20 or less, preferably 15 The following is better. As the number of carbons contained in an alicyclic structure is within the above range, a high balance of mechanical strength, heat resistance and formability can be achieved.

含脂環結構聚合物中之具有脂環結構之重複單元之比例,以30重量%以上為佳,以50重量%以上為較佳,以70重量%以上為更佳,尤以90重量%以上為佳。藉由令具有脂環結構之重複單元之比例如前所述之多,可提升耐熱性。The proportion of repeating units with alicyclic structure in the alicyclic structure-containing polymer is preferably 30% by weight or more, preferably 50% by weight or more, more preferably 70% by weight or more, especially 90% by weight or more Better. By increasing the ratio of repeating units having an alicyclic structure, for example, as described above, heat resistance can be improved.

並且,於含脂環結構聚合物中,具有脂環結構之結構單元以外之剩餘部分並未特別限定,得視使用目的而適當選擇。In addition, in the alicyclic structure-containing polymer, the remainder other than the structural unit having the alicyclic structure is not particularly limited, and may be appropriately selected depending on the purpose of use.

作為含脂環結構聚合物,可使用具結晶性者及不具結晶性者之任一者,亦可將二者組合使用。於此,所謂具結晶性之聚合物,係稱具有熔點Mp之聚合物。並且,所謂具有熔點Mp之聚合物,亦即可使用示差掃描熱量計(DSC)觀測熔點Mp之聚合物。藉由使用具結晶性之含脂環結構聚合物,可特別提升光學薄膜之衝擊強度。並且,藉由使用不具結晶性之含脂環結構聚合物,可降低光學薄膜之製造成本。As the alicyclic structure-containing polymer, any one of crystalline and non-crystalline can be used, or a combination of the two can be used. Herein, the so-called crystalline polymer is referred to as a polymer having a melting point Mp. In addition, the so-called polymer having a melting point Mp can also be a polymer having a melting point Mp observed by a differential scanning calorimeter (DSC). By using a crystalline polymer containing alicyclic structure, the impact strength of the optical film can be particularly improved. Moreover, by using a non-crystalline polymer containing alicyclic structure, the manufacturing cost of the optical film can be reduced.

作為具結晶性之含脂環結構聚合物,可列舉例如下述聚合物(α)~聚合物(δ)。其中,因易獲得耐熱性優異之光學薄膜,而以聚合物(β)作為具結晶性之含脂環結構聚合物為佳。 聚合物(α):具結晶性之環烯烴單體之開環聚合物。 聚合物(β):具結晶性之聚合物(α)之氫化物。 聚合物(γ):具結晶性之環烯烴單體之加成聚合物。 聚合物(δ):具結晶性之聚合物(γ)之氫化物。Examples of the crystalline alicyclic structure-containing polymer include the following polymers (α) to (δ). Among them, since it is easy to obtain optical films with excellent heat resistance, it is better to use polymer (β) as a crystalline alicyclic structure polymer. Polymer (α): a ring-opening polymer of crystalline cycloolefin monomer. Polymer (β): Hydrogenated product of crystalline polymer (α). Polymer (γ): addition polymer of crystalline cycloolefin monomer. Polymer (δ): Hydrogenated product of crystalline polymer (γ).

具體而言,作為具結晶性之含脂環結構聚合物,以包括具結晶性之二環戊二烯之開環聚合物及具結晶性之二環戊二烯之開環聚合物之氫化物為佳,以具結晶性之二環戊二烯之開環聚合物之氫化物為較佳。於此,所謂二環戊二烯之開環聚合物,係稱相對於總結構單元之源自二環戊二烯之結構單元之比例通常為50重量%以上、以70重量%以上為佳、以90重量%以上為較佳、以100重量%為更佳之聚合物。Specifically, as a crystalline polymer containing alicyclic structure, it includes crystalline dicyclopentadiene ring-opening polymer and crystalline dicyclopentadiene ring-opening polymer hydride Preferably, the hydrogenated product of a ring-opening polymer of dicyclopentadiene with crystallinity is preferred. Here, the so-called ring-opening polymer of dicyclopentadiene means that the ratio of the structural units derived from dicyclopentadiene relative to the total structural units is usually 50% by weight or more, preferably 70% by weight or more. 90% by weight or more is preferable, and 100% by weight is a more preferable polymer.

於製造光學薄膜之前,具結晶性之含脂環結構聚合物亦可未結晶化。然而,於已製造光學薄膜之後,該光學薄膜所包含之具結晶性之含脂環結構聚合物通常藉由結晶化而可具有高結晶化度。具體結晶化度之範圍得視期望性能而適當選擇,但以10%以上為佳,以15%以上為較佳。藉由將光學薄膜所包含之含脂環結構聚合物之結晶化度定為前述範圍之下限值以上,可對於光學薄膜賦予高度耐熱性及耐藥品性。結晶化度得藉由X射線繞射法量測。Before manufacturing the optical film, the crystalline alicyclic structure-containing polymer can also be uncrystallized. However, after the optical film has been manufactured, the crystalline alicyclic structure-containing polymer contained in the optical film usually has a high degree of crystallinity by crystallization. The specific crystallinity range can be appropriately selected according to the desired performance, but it is preferably 10% or more, and more preferably 15% or more. By setting the crystallinity of the alicyclic structure-containing polymer contained in the optical film to be more than the lower limit of the aforementioned range, it is possible to impart high heat resistance and chemical resistance to the optical film. The degree of crystallinity is measured by X-ray diffraction method.

具結晶性之含脂環結構聚合物之熔點Mp以200℃以上為佳,以230℃以上為較佳,且以290℃以下為佳。藉由使用具有如此熔點Mp之具結晶性之含脂環結構聚合物,可獲得成形性與耐熱性取得更優異平衡之光學薄膜。The melting point Mp of the crystalline alicyclic structure-containing polymer is preferably 200°C or higher, preferably 230°C or higher, and preferably 290°C or lower. By using a crystalline alicyclic structure-containing polymer having such a melting point Mp, an optical film with a more excellent balance between moldability and heat resistance can be obtained.

如前所述之具結晶性之含脂環結構聚合物,得藉由例如國際專利公開第2016/067893號所記載之方法而製造。The crystalline alicyclic structure-containing polymer as described above can be produced by, for example, the method described in International Patent Publication No. 2016/067893.

另一方面,不具結晶性之含脂環結構聚合物,可列舉例如:(1)降𦯉烯(norbornene)聚合物、(2)單環的環烯烴聚合物、(3)環狀共軛二烯聚合物、(4)乙烯基脂環烴聚合物及此些之氫化物等。其中,就透明性及成形性之觀點而言,以降𦯉烯系聚合物及其氫化物為較佳。On the other hand, non-crystalline polymers containing alicyclic structures include, for example: (1) norbornene polymers, (2) monocyclic cycloolefin polymers, (3) cyclic conjugated two Vinyl polymers, (4) vinyl alicyclic hydrocarbon polymers and hydrogenated products of these. Among them, from the viewpoints of transparency and moldability, norene-based polymers and their hydrogenated products are preferred.

作為降𦯉烯系聚合物,可列舉例如:降𦯉烯單體之開環聚合物、降𦯉烯單體與能開環共聚之其他單體所形成之開環共聚物及此些之氫化物;降𦯉烯單體之加成聚合物、降𦯉烯單體與能共聚之其他單體所形成之加成共聚物等。其中,就透明性的觀點而言,尤以降𦯉烯單體之開環聚合物之氫化物為佳。Examples of norrene-based polymers include: ring-opening polymers of norrene monomers, ring-opening copolymers formed by norrene monomers and other monomers capable of ring-opening copolymerization, and hydrogenated products of these ; Addition polymers of norene monomers, addition copolymers of norene monomers and other monomers that can be copolymerized, etc. Among them, from the viewpoint of transparency, hydrogenated products of ring-opening polymers of norene monomers are particularly preferred.

上述之含脂環結構聚合物,可選自例如日本專利公開第2002-321302號公報所揭示之聚合物。The aforementioned alicyclic structure-containing polymer can be selected from, for example, those disclosed in Japanese Patent Publication No. 2002-321302.

作為不具結晶性之含脂環結構聚合物,因市售有各式各樣的商品,故得於其中適當選擇具有期望特性者而使用。作為此市售品之例,可列舉:商品名「ZEONOR」(日本瑞翁股份有限公司製)、「ARTON」(JSR股份有限公司製)、「APEL」(三井化學股份有限公司製)、「TOPAS」(POLYPLASTICS股份有限公司製)之商品群。As a non-crystalline alicyclic structure-containing polymer, there are various products on the market, so it is necessary to appropriately select those with desired characteristics among them and use them. As an example of this commercially available product, there may be mentioned the trade names "ZEONOR" (manufactured by Zeon Corporation), "ARTON" (manufactured by JSR Co., Ltd.), "APEL" (manufactured by Mitsui Chemicals Co., Ltd.), and " "TOPAS" (manufactured by POLYPLASTICS Co., Ltd.) is a product group.

樹脂S1所包含之聚合物之玻璃轉移溫度Tg以80℃以上為佳,以85℃以上為較佳,以100℃以上為更佳,且以250℃以下為佳,以170℃以下為較佳。玻璃轉移溫度為於如此範圍之聚合物,於高溫下使用時難以發生變形及應力,而具有優異耐久性。The glass transition temperature Tg of the polymer contained in the resin S1 is preferably 80°C or higher, preferably 85°C or higher, more preferably 100°C or higher, and preferably 250°C or lower, preferably 170°C or lower . A polymer with a glass transition temperature in this range is unlikely to be deformed and stressed when used at high temperatures, and has excellent durability.

樹脂S1所含有之聚合物之重量平均分子量(Mw)以1,000以上為佳,以2,000以上為較佳,以10,000以上為更佳,尤以25,000以上為佳,且以1,000,000以下為佳,以500,000以下為較佳,以100,000以下為更佳,其中以80,000以下為佳,特別以50,000以下為佳。具有如此重量平均分子量之聚合物,其成形加工性與耐熱性取得優異平衡。The weight average molecular weight (Mw) of the polymer contained in the resin S1 is preferably 1,000 or more, preferably 2,000 or more, more preferably 10,000 or more, especially 25,000 or more, and preferably 1,000,000 or less, preferably 500,000 The following are preferable, and 100,000 or less is more preferable, among which 80,000 or less is preferable, and 50,000 or less is particularly preferable. A polymer with such a weight average molecular weight has an excellent balance between molding processability and heat resistance.

樹脂S1所含有之聚合物之分子量分布(Mw/Mn)以1.0以上為佳,以1.2以上為較佳,以1.5以上為更佳,且以10以下為佳,以4.0以下為較佳,以3.5以下為更佳。於此,Mn表示數量平均分子量。具有如此分子量分布之聚合物,其成形加工性優異。The molecular weight distribution (Mw/Mn) of the polymer contained in the resin S1 is preferably 1.0 or more, preferably 1.2 or more, more preferably 1.5 or more, and preferably 10 or less, preferably 4.0 or less, 3.5 or less is better. Here, Mn represents the number average molecular weight. A polymer having such a molecular weight distribution has excellent molding processability.

樹脂S1可單獨含有1種聚合物,亦可以任意比例組合而含有2種以上聚合物。The resin S1 may contain one type of polymer alone, or two or more types of polymers may be combined in any ratio.

就容易獲得期望光學薄膜的觀點而言,樹脂S1中之聚合物之比例以50重量%以上為佳,以70重量%以上為較佳,以80重量%以上為更佳,尤以90重量%以上為佳。From the viewpoint of easily obtaining the desired optical film, the proportion of the polymer in the resin S1 is preferably 50% by weight or more, preferably 70% by weight or more, more preferably 80% by weight or more, especially 90% by weight The above is better.

樹脂S1亦可含有任意成分組合於上述聚合物。作為任意成分之例,可列舉與已列舉作為樹脂C得含有之任意成分者相同之例。並且,任意成分可單獨使用1種,亦可以任意比例組合2種以上使用。然而,就顯著發揮本發明之效果的觀點而言,以任意成分之含有比例為少者為佳。舉例而言,任意成分之總計比例相對於樹脂S1所含有之聚合物100重量份,以50重量份以下為佳,以30重量份以下為較佳,以20重量份以下為更佳,尤以10重量份以下為佳。Resin S1 may contain arbitrary components in combination with the above-mentioned polymer. As an example of the optional component, the same example as the optional component contained as the resin C has been exemplified. In addition, the arbitrary component may be used individually by 1 type, and may be used in combination of 2 or more types in arbitrary ratios. However, from the viewpoint of remarkably exerting the effects of the present invention, the content ratio of the optional components is preferably smaller. For example, the total proportion of the arbitrary components relative to 100 parts by weight of the polymer contained in the resin S1 is preferably 50 parts by weight or less, preferably 30 parts by weight or less, more preferably 20 parts by weight or less, especially 10 parts by weight or less is preferable.

樹脂S1之於40 μm之厚度時之水蒸氣穿透率通常為100 g/(m2 ⋅24h)以下,以50 g/(m2 ⋅24h)以下為佳,以10 g/(m2 ⋅24h)以下為較佳。藉由使用水蒸氣穿透率為如此之低之樹脂S1,可降低光學薄膜自身之水蒸氣穿透率。The water vapor transmission rate of resin S1 at a thickness of 40 μm is usually below 100 g/(m 2 ⋅24h), preferably below 50 g/(m 2 ⋅24h), and 10 g/(m 2 ⋅ 24h) The following are preferred. By using resin S1 with such a low water vapor transmission rate, the water vapor transmission rate of the optical film itself can be reduced.

於此,所謂樹脂S1之於40 μm之厚度時之水蒸氣穿透率,係指以此樹脂S1形成之厚度40 μm之薄膜之水蒸氣穿透率。樹脂S1之於40 μm之厚度時之水蒸氣穿透率,可藉由使用樹脂S1製造厚度40 μm之樣品薄膜並量測此樣品薄膜之水蒸氣穿透率而求得。Herein, the water vapor transmission rate of the resin S1 at a thickness of 40 μm refers to the water vapor transmission rate of a film with a thickness of 40 μm formed by the resin S1. The water vapor transmission rate of the resin S1 at a thickness of 40 μm can be obtained by manufacturing a sample film with a thickness of 40 μm using the resin S1 and measuring the water vapor transmission rate of the sample film.

就獲得延遲之絕對值為小之光學薄膜的觀點而言,以第一表層之延遲之絕對值為小者為佳。具體而言,第一表層之面內延遲之絕對值以2 nm以下為佳,以1.5 nm以下為較佳,以1.0 nm以下為更佳。並且,第一表層之厚度方向延遲之絕對值以2.0 nm以下為佳,以1.5 nm以下為較佳,以1.0 nm以下為更佳。From the viewpoint of obtaining an optical film with a small absolute value of retardation, it is better that the absolute value of the retardation of the first surface layer is small. Specifically, the absolute value of the in-plane retardation of the first surface layer is preferably 2 nm or less, preferably 1.5 nm or less, and more preferably 1.0 nm or less. In addition, the absolute value of the retardation in the thickness direction of the first surface layer is preferably 2.0 nm or less, preferably 1.5 nm or less, and more preferably 1.0 nm or less.

第一表層之厚度以1.0 μm以上為佳,以2.0 μm以上為較佳,以3.0 μm以上為更佳,且以9 μm以下為佳,以7 μm以下為較佳,以5 μm以下為更佳。藉由第一表層之厚度為前述範圍之下限值以上,可有效提升光學薄膜之衝擊強度,並且藉由為前述範圍之上限值以下,可有效縮小光學薄膜之延遲之絕對值。The thickness of the first surface layer is preferably 1.0 μm or more, preferably 2.0 μm or more, more preferably 3.0 μm or more, and preferably 9 μm or less, preferably 7 μm or less, more preferably 5 μm or less good. Since the thickness of the first surface layer is above the lower limit of the aforementioned range, the impact strength of the optical film can be effectively increased, and by being below the upper limit of the aforementioned range, the absolute value of the retardation of the optical film can be effectively reduced.

[5.第二表層][5. The second surface layer]

第二表層係以衝擊強度優異之樹脂S2形成於核心層之另一側之層體。此樹脂S2之於40 μm之厚度時之衝擊強度係位於與樹脂S1之於40 μm之厚度時之衝擊強度之範圍相同之範圍。惟樹脂S2之於40 μm之厚度時之衝擊強度可與樹脂S1之於40 μm之厚度時之衝擊強度相同,亦可相異。藉由將以衝擊強度如此優異之樹脂S2形成之第二表層及以衝擊強度同樣優異之樹脂S1形成之第一表層組合而包含,可提升光學薄膜自身之衝擊強度。The second surface layer is a layer body formed on the other side of the core layer with resin S2 with excellent impact strength. The impact strength of the resin S2 at a thickness of 40 μm is in the same range as the impact strength of the resin S1 at a thickness of 40 μm. However, the impact strength of resin S2 at a thickness of 40 μm can be the same as or different from that of resin S1 at a thickness of 40 μm. By combining the second surface layer formed of resin S2 having such excellent impact strength and the first surface layer formed of resin S1 having such excellent impact strength, the impact strength of the optical film itself can be improved.

於此,所謂樹脂S2之於40 μm之厚度時之衝擊強度,係指以此樹脂S2形成之厚度40 μm之薄膜之衝擊強度。樹脂S2之於40 μm之厚度時之衝擊強度,可與樹脂S1之於40 μm之厚度時之衝擊強度藉由相同的方法量測。Here, the so-called impact strength of resin S2 at a thickness of 40 μm refers to the impact strength of a film with a thickness of 40 μm formed by this resin S2. The impact strength of resin S2 at a thickness of 40 μm can be measured by the same method as the impact strength of resin S1 at a thickness of 40 μm.

作為前述樹脂S2,得任意使用已說明作為樹脂S1之範圍者。藉此,由第二表層可獲得與第一表層所致之效果相同的效果。第一表層所包含之樹脂S1與第二表層所包含之樹脂S2雖可相異,但就抑制光學薄膜之製造成本及抑制翹曲的觀點而言,以相同者為佳。As the aforementioned resin S2, it is possible to arbitrarily use what has been described as the range of the resin S1. Thereby, the same effect as that caused by the first surface layer can be obtained from the second surface layer. Although the resin S1 contained in the first surface layer and the resin S2 contained in the second surface layer may be different, the same ones are preferred from the viewpoints of suppressing the manufacturing cost of the optical film and suppressing warpage.

就獲得延遲之絕對值為小之光學薄膜的觀點而言,以第二表層之延遲之絕對值為小者為佳。第二表層之具體面內延遲之絕對值得位於與第一表層之面內延遲之絕對值之範圍相同之範圍。並且,第二表層之具體厚度方向延遲之絕對值得位於與第一表層之厚度方向延遲之絕對值之範圍相同之範圍。From the viewpoint of obtaining an optical film with a small absolute value of retardation, it is better that the absolute value of the retardation of the second surface layer is small. The absolute value of the specific in-plane retardation of the second surface layer is in the same range as the range of the absolute value of the in-plane retardation of the first surface layer. Moreover, the absolute value of the specific thickness direction retardation of the second surface layer is in the same range as the range of the absolute value of the thickness direction retardation of the first surface layer.

就與第一表層相同的觀點而言,第二表層之厚度得位於與第一表層之厚度之範圍相同之範圍。藉此,第二表層中可獲得與第一表層相同的效果。第一表層之厚度與第二表層之厚度雖可相異,但就有效抑制光學薄膜之翹曲的觀點而言,以相同者為佳。From the same viewpoint as the first surface layer, the thickness of the second surface layer should be in the same range as the thickness of the first surface layer. Thereby, the same effect as the first surface layer can be obtained in the second surface layer. Although the thickness of the first surface layer and the thickness of the second surface layer may be different, from the viewpoint of effectively suppressing the warpage of the optical film, the same one is preferred.

[6.任意層體][6. Any layer body]

光學薄膜得視需求而具備任意層體組合於上述核心層、第一表層及第二表層。作為任意層體之例,可列舉:提升薄膜表面硬度之硬塗層(hard coat layer)、優化薄膜滑順性之墊層(mat layer)、抗反射層。然而,就薄化光學薄膜之觀點而言,以光學薄膜並未具備任意層體者為佳。是以,光學薄膜尤以僅依序具備第一表層、核心層及第二表層者為佳。The optical film may have any combination of layers in the core layer, the first surface layer and the second surface layer as required. Examples of any layer include: hard coat layer to increase the surface hardness of the film, mat layer to optimize the smoothness of the film, and anti-reflection layer. However, from the viewpoint of thinning the optical film, it is preferable that the optical film does not have any layer. Therefore, the optical film is particularly preferably only provided with the first surface layer, the core layer and the second surface layer in this order.

[7.光學薄膜之物性及厚度][7. Physical properties and thickness of optical film]

光學薄膜通常為透明的薄膜而令可見光穿透。具體光線穿透率得視光學薄膜之用途而適當選擇。舉例而言,於波長420 nm~780 nm之光線穿透率以85%以上為佳,以88%以上為較佳。Optical films are usually transparent films that allow visible light to pass through. The specific light transmittance can be appropriately selected depending on the use of the optical film. For example, the light transmittance at a wavelength of 420 nm to 780 nm is preferably 85% or more, preferably 88% or more.

光學薄膜之厚度以5 μm以上為佳,以15 μm以上為較佳,以25 μm以上為更佳,且以50 μm以下為佳,以45 μm以下為較佳,以40 μm以下為更佳。藉由光學薄膜之厚度位於前述範圍之下限值以上,可有效提升光學薄膜之衝擊強度,或可有效降低水蒸氣穿透率。並且,藉由光學薄膜之厚度位於前述範圍之上限值以下,可有效縮小光學薄膜之延遲之絕對值。The thickness of the optical film is preferably 5 μm or more, preferably 15 μm or more, more preferably 25 μm or more, and preferably 50 μm or less, preferably 45 μm or less, more preferably 40 μm or less . As the thickness of the optical film is above the lower limit of the aforementioned range, the impact strength of the optical film can be effectively increased, or the water vapor transmission rate can be effectively reduced. Moreover, since the thickness of the optical film is below the upper limit of the aforementioned range, the absolute value of the retardation of the optical film can be effectively reduced.

[8.光學薄膜之製造方法][8. Manufacturing method of optical film]

光學薄膜之製造方法並未特別受到限定而得採用任意製造方法。舉例而言,製備樹脂C、樹脂S1及樹脂S2,藉由將此些材料成形為期望形狀,得製造光學薄膜。作為用以成形樹脂C、樹脂S2及樹脂S2之成形方法之較佳例,可列舉藉由共擠製法之熔融擠製成形。藉由進行此熔融擠製成形,可有效率地製造具有期望各層厚度之光學薄膜。The manufacturing method of the optical film is not particularly limited, and any manufacturing method may be adopted. For example, resin C, resin S1, and resin S2 are prepared, and these materials are formed into desired shapes to produce optical films. As a preferable example of the molding method for molding the resin C, the resin S2, and the resin S2, melt extrusion molding by a co-extrusion method can be cited. By performing this melt extrusion forming, an optical film with a desired thickness of each layer can be manufactured efficiently.

進行藉由共擠製法之熔融擠製成形之際之樹脂之溫度(以下有時適當稱為「擠製溫度」)並未特別受到限定,得為分別令各樹脂熔融之溫度,且得適當設定適於成形之溫度。具體而言,以Tg+80℃以上為佳,以Tg+100℃以上為較佳,且以Tg+180℃以下為佳,以Tg+170℃以下為較佳。於此之「Tg」表示樹脂C、樹脂S1及樹脂S2之玻璃轉移溫度中之最高溫度。藉由將擠製溫度定為前述範圍之下限值以上,可充分提升樹脂之流動性且可優化成形性,並且藉由定為前述範圍之上限值以下,可抑制樹脂之劣化。The temperature of the resin at the time of melt extrusion molding by the co-extrusion method (hereinafter sometimes referred to as the "extrusion temperature") is not particularly limited, and may be the temperature at which each resin is melted, and may be set appropriately Suitable temperature for forming. Specifically, Tg+80°C or higher is preferred, Tg+100°C or higher is preferred, Tg+180°C or lower is preferred, and Tg+170°C or lower is preferred. Here, "Tg" represents the highest temperature among the glass transition temperatures of resin C, resin S1, and resin S2. By setting the extrusion temperature above the lower limit of the aforementioned range, the fluidity of the resin can be sufficiently improved and the moldability can be optimized, and by setting the extrusion temperature below the upper limit of the aforementioned range, the deterioration of the resin can be suppressed.

藉由將如前所述而成之樹脂C、樹脂S1及樹脂S2成形為層狀,可獲得沿其厚度方向依序具備以樹脂S1形成之層體、以樹脂C形成之層體及以樹脂S2形成之層體之多層薄膜。此多層薄膜通常作為長條狀薄膜而獲得。如此而獲得之多層薄膜得就此作為光學薄膜使用。並且前述多層薄膜亦可視需求施加任意處理,而使用藉此所獲得者作為光學薄膜。By forming the resin C, the resin S1 and the resin S2 as described above into layers, it is possible to obtain a layered body formed of resin S1, a layered body formed of resin C, and a layered body formed of resin C in order along the thickness direction. S2 is a layered multilayer film. This multilayer film is usually obtained as a long film. The multilayer film thus obtained can be used as an optical film as it is. In addition, the aforementioned multilayer film can also be subjected to arbitrary treatments as required, and the obtained one can be used as an optical film.

[9.光學薄膜之用途][9. Use of optical film]

上述光學薄膜得適用於液晶顯示裝置等顯示裝置中作為保護其他層體之保護薄膜。其中,光學薄膜適合作為偏光件保護薄膜,特別適合作為顯示裝置之內側偏光件保護薄膜。The above-mentioned optical film can be suitably used as a protective film for protecting other layers in display devices such as liquid crystal display devices. Among them, the optical film is suitable as a protective film for polarizers, and is particularly suitable for a protective film for inner polarizers of display devices.

於一實施型態中,偏光板具備偏光件與上述光學薄膜。光學薄膜於偏光板中得作為偏光件保護薄膜發揮功能。此偏光板於光學薄膜與偏光件之間亦可更具備用以接合二者之接合劑層。In one embodiment, the polarizer includes a polarizer and the above-mentioned optical film. The optical film functions as a polarizer protective film in the polarizing plate. The polarizing plate can also be further provided with a bonding agent layer between the optical film and the polarizing element for bonding the two.

偏光件並未特別受到限定,而得使用任意偏光件。作為偏光件之例,可列舉於聚乙烯醇薄膜吸附碘、二色性染料等材料之後進行延伸加工者。作為構成接合劑層之接合劑,可列舉將各種聚合物作為基礎聚合物者。作為此基礎聚合物之例,可列舉例如:丙烯酸聚合物、矽氧聚合物、聚酯、聚胺酯、聚醚及合成橡膠。The polarizer is not particularly limited, and any polarizer may be used. As an example of a polarizer, a polyvinyl alcohol film adsorbs iodine, dichroic dyes, and other materials and then stretches it. Examples of the bonding agent constituting the bonding agent layer include those using various polymers as the base polymer. As an example of this base polymer, for example, acrylic polymer, silicone polymer, polyester, polyurethane, polyether, and synthetic rubber can be cited.

偏光板所具備之偏光件與保護薄膜之數量雖係任意,但偏光板通常得具備1層偏光件及設置於其雙面之2層保護薄膜。此2層保護薄膜中,可二者皆為上述光學薄膜,亦可僅其中一者為上述光學薄膜。特別是於具備光源及液晶單元且於此液晶單元之光源側及顯示面側之二者具有偏光板之液晶顯示裝置中,尤以具備光學薄膜作為於光源側之位置中所使用之保護薄膜而非於顯示面側之偏光件所使用之保護薄膜為佳。藉由具有此結構,而可容易構成具有傾斜視角漏光及顏色不均皆為小之良好顯示品質之液晶顯示裝置。Although the number of polarizers and protective films provided in the polarizer is arbitrary, the polarizer usually has one layer of polarizer and two layers of protective films provided on both sides of the polarizer. In the two-layer protective film, both of them may be the above-mentioned optical film, or only one of them may be the above-mentioned optical film. Especially in a liquid crystal display device equipped with a light source and a liquid crystal cell and having polarizing plates on both the light source side and the display surface side of the liquid crystal cell, an optical film is particularly provided as a protective film used in the position on the light source side. The protective film used for the polarizer that is not on the side of the display surface is better. By having this structure, it is easy to construct a liquid crystal display device with good display quality with oblique viewing angle light leakage and small color unevenness.

作為適當設置前述偏光板之液晶顯示裝置,可列舉具備例如面內切換(In-Plane Switching,IPS)模式、垂直配向(Vertical Alignment,VA)模式、多域垂直配向(Multi-domain Vertical Alignment,MVA)模式、連續風車狀配向(Continuous Pinwheel Alignment,CPA)模式、混合配向向列(Hybrid Alignment Nematic,HAN)模式、扭曲向列(Twisted Nematic,TN)模式、超扭曲向列(Super-Twisted Nematic,STN)模式、光學補償彎曲(Optical Compensated Bend,OCB)模式等驅動方式之液晶單元的液晶顯示裝置,其中因光學薄膜所致之傾斜視角漏光及顏色不均之抑制效果顯著,而尤以具備IPS模式之液晶單元之液晶顯示裝置為佳。As a liquid crystal display device with the aforementioned polarizing plate appropriately arranged, for example, an in-plane switching (In-Plane Switching, IPS) mode, a vertical alignment (Vertical Alignment, VA) mode, and a multi-domain vertical alignment (Multi-domain Vertical Alignment, MVA) can be cited. ) Mode, Continuous Pinwheel Alignment (CPA) mode, Hybrid Alignment Nematic (HAN) mode, Twisted Nematic (TN) mode, Super-Twisted Nematic, STN) mode, optical compensated bend (Optical Compensated Bend, OCB) mode and other driving methods of the liquid crystal display device of the liquid crystal cell, in which the oblique viewing angle caused by the optical film has a significant effect of suppressing light leakage and color unevenness, and it is especially equipped with IPS The liquid crystal display device of the liquid crystal cell of the mode is preferred.

[實施例][Example]

以下,將揭示實施例而針對本發明具體說明。然而,本發明並非限定於以下所揭示之實施例,於未脫離本發明之申請專利範圍及其均等範圍之範圍中得任意變更實施。Hereinafter, embodiments will be disclosed and the present invention will be specifically described. However, the present invention is not limited to the embodiments disclosed below, and can be implemented with any changes within the scope of the patent application and the equivalent scope of the present invention.

於以下之說明中,除非另有註明,否則表示份量之「%」及「份」以重量為基準。而且,除非另有註明,否則說明於以下之操作係於常溫常壓大氣中進行。In the following description, unless otherwise noted, the "%" and "parts" of the weight are based on weight. Moreover, unless otherwise noted, the operations described below are performed in an atmosphere of normal temperature and pressure.

[評價方法][Evaluation method]

[分子量之量測方法][Measuring method of molecular weight]

聚合物之重量平均分子量及數量平均分子量,為於38℃量測作為取決於以四氫呋喃作為沖提液之凝膠滲透層析術之標準聚苯乙烯換算值。作為量測裝置可使用TOSOH公司製之HLC8020GPC。The weight average molecular weight and number average molecular weight of the polymer are measured at 38°C as a standard polystyrene conversion value determined by gel permeation chromatography with tetrahydrofuran as the eluent. As a measuring device, HLC8020GPC manufactured by TOSOH can be used.

[玻璃轉移溫度及熔點Mp之量測方法][Measurement method of glass transition temperature and melting point Mp]

將於氮氣氣體環境下加熱至300℃之試料以液態氮急速冷卻,使用示差掃描熱量計(DSC),分別求得以10℃/min升溫之試料之玻璃轉移溫度Tg及熔點Mp。The sample heated to 300°C in a nitrogen atmosphere is rapidly cooled with liquid nitrogen, and the glass transition temperature Tg and melting point Mp of the sample heated at 10°C/min are calculated using a differential scanning calorimeter (DSC).

[氫化率之量測方法][Measuring method of hydrogenation rate]

聚合物之氫化率為以鄰二氯苯-d4 作為溶劑而於145℃藉由1 H-NMR量測而量測。The hydrogenation rate of the polymer was measured by 1 H-NMR measurement at 145°C using o-dichlorobenzene-d 4 as a solvent.

[聚合物之外消旋二單元組之比例之量測方法][Method for measuring the proportion of racemic diunits in polymers]

以鄰二氯苯-d4 作為溶劑而於200℃適用反閘去耦合(inverse-gated decoupling)法進行聚合物之13 C-NMR量測。此13 C-NMR量測之結果中,以鄰二氯苯-d4 之127.5 ppm之峰值作為基準偏移,判斷源自内消旋二單元組之43.35 ppm之訊號與源自外消旋二單元組之43.43ppm之訊號。基於此些訊號之強度比,求得聚合物之外消旋二單元組之比例。Using o-dichlorobenzene-d 4 as the solvent, the inverse-gated decoupling method was applied to carry out the 13 C-NMR measurement of the polymer at 200°C. In the result of 13 C-NMR measurement, the 127.5 ppm peak value of o-dichlorobenzene-d 4 was used as the reference offset to determine the 43.35 ppm signal derived from the meso group and the signal derived from the racem group. The signal of 43.43ppm of the unit group. Based on the intensity ratio of these signals, the ratio of the racemic diad of the polymer is obtained.

[層體之厚度之量測方法][Measuring method of layer thickness]

將光學薄膜包埋於環氧樹脂之後,使用切片機(microtome;大和光機工業公司製之「RUB-2100」)切成0.05 μm之厚度。使用穿透式電子顯微鏡觀察所呈現之剖面,而量測光學薄膜所包含之各層體之厚度。After embedding the optical film in epoxy resin, it was sliced into a thickness of 0.05 μm using a microtome ("RUB-2100" manufactured by Daiwa Koki Kogyo Co., Ltd.). A transmission electron microscope was used to observe the presented cross-section, and to measure the thickness of each layer contained in the optical film.

[衝擊強度之量測方法][Measurement method of impact strength]

圖2係概略表示使用於實施例及比較例之光學薄膜之衝擊強度之量測裝置的立體圖。並且,圖3係概略表示使用於實施例及比較例之光學薄膜之衝擊強度之量測裝置的剖面圖。使用此些圖2~圖3所示之量測裝置而量測光學薄膜之衝擊強度。Fig. 2 is a perspective view schematically showing an apparatus for measuring the impact strength of optical films used in Examples and Comparative Examples. In addition, FIG. 3 is a cross-sectional view schematically showing a measuring device for the impact strength of optical films used in Examples and Comparative Examples. The impact strength of the optical film was measured using the measuring devices shown in FIGS. 2 to 3.

藉由具備形成為中空圓筒形之上部夾環201及下部夾環202之治具,而水平固定作為試驗片之薄膜10a。上部夾環201及下部夾環202之內徑(以箭號A3表示)為4 cm。令作為撞錘之鋼球211(彈珠臺彈珠,重5g,直徑11 mm)自各種高度沿箭號A1方向自由落下,落至固定於治具之薄膜10a的上表面10U中,治具內之中心軸上的位置15P。前述高度h表示鋼球211之最下部之水平面H1與薄膜10a之上表面10U之距離。此高度於圖3中以箭號A2表示。調查薄膜10a未破之情況與薄膜10a已破之情況之界線之高度h。而且,將於前述界線之高度時之鋼球211之位能定為衝擊強度。The film 10a, which is a test piece, is horizontally fixed by a jig provided with an upper clamp ring 201 and a lower clamp ring 202 formed into a hollow cylindrical shape. The inner diameter of the upper clamp ring 201 and the lower clamp ring 202 (indicated by arrow A3) is 4 cm. Make the steel ball 211 (pinball ball, weight 5g, diameter 11 mm) used as a ram to fall freely from various heights in the direction of arrow A1, and fall into the upper surface 10U of the film 10a fixed on the jig. The position on the central axis of the inner is 15P. The aforementioned height h represents the distance between the lowermost horizontal plane H1 of the steel ball 211 and the upper surface 10U of the film 10a. This height is indicated by arrow A2 in Figure 3. Investigate the height h of the boundary between the unbroken condition of the film 10a and the broken condition of the film 10a. Moreover, the position of the steel ball 211 at the height of the aforementioned boundary line is determined as the impact strength.

[光學薄膜之運送性之評價方法][Evaluation method of transportability of optical film]

圖4係概略表示將使用於實施例及比較例之修整用刃1及2沿垂直於薄膜運送方向之平面切開來之剖面的剖面圖。4 is a cross-sectional view schematically showing a cross section of the trimming blades 1 and 2 used in the embodiment and the comparative example cut along a plane perpendicular to the film conveying direction.

後述實施例及比較例中,於水平運送光學薄膜的同時進行該光學薄膜之修整。此修正係如圖4所示,藉由組合配置於光學薄膜3之重力方向上方之圓形皿形刃1與配置於光學薄膜3之重力方向下方之碗形刃2而進行。並且,前述之皿形刃1及碗形刃2之組合配置成碗形刃2之外周接觸於光學薄膜3。再者,前述之皿形刃1及碗形刃2之組合於光學薄膜3之幅寬方向之兩端部各設置1組,而總計設置2組。如此使用皿形刃1及碗形刃2之修整中,於進入皿形刃1及碗形刃2之間之部分中達成光學薄膜3之連續修整。In the following Examples and Comparative Examples, the optical film is trimmed while the optical film is transported horizontally. This correction is performed by combining the circular dish-shaped blade 1 arranged above the gravity direction of the optical film 3 and the bowl-shaped blade 2 arranged below the gravity direction of the optical film 3 as shown in FIG. 4. In addition, the combination of the aforementioned dish-shaped blade 1 and the bowl-shaped blade 2 is arranged such that the outer periphery of the bowl-shaped blade 2 is in contact with the optical film 3. Furthermore, the aforementioned combination of the bowl-shaped blade 1 and the bowl-shaped blade 2 is provided at both ends of the optical film 3 in the width direction each in one group, and a total of two groups are provided. In the dressing using the dish-shaped blade 1 and the bowl-shaped blade 2 in this way, the continuous dressing of the optical film 3 is achieved in the part that enters between the dish-shaped blade 1 and the bowl-shaped blade 2.

以運送速度5 m/min沿其縱向方向運送光學薄膜3之同時,持續30分鐘之光學薄膜3之修整。然後,光學薄膜3未破損斷裂者則判定為「良」,光學薄膜3以修整所致之破裂為原因而破損斷裂者則判定為「不良」。於此,所謂光學薄膜3之破損斷裂,係稱光學薄膜3沿作為其運送方向之縱向方向以外之方向斷開之現象。The optical film 3 is trimmed for 30 minutes while the optical film 3 is transported along its longitudinal direction at a transport speed of 5 m/min. Then, if the optical film 3 is not broken or broken, it is judged as "good", and the optical film 3 is judged as "bad" if it is broken due to the breakage caused by trimming. Herein, the so-called breakage of the optical film 3 refers to a phenomenon in which the optical film 3 is broken in a direction other than the longitudinal direction as its conveying direction.

[延遲之量測方法][Delay measurement method]

準備光學薄膜之各層所包含之樹脂之料粒(pellet)。將各樹脂之料粒熔融擠製成形以製作樣品薄膜。使用折射率膜厚量測裝置(METRICON公司製之「稜鏡耦合器」),於量測波長405 nm、532 nm及633 nm量測此樣品薄膜之折射率。對於此些之於量測波長405 nm、532 nm及633 nm所獲得之量測值,藉由擬合於柯西(Cauchy)色散公式而算出於量測波長590 nm之折射率。Prepare the pellets of the resin contained in each layer of the optical film. The pellets of each resin were melt-extruded to form a sample film. Using a refractive index film thickness measuring device ("Fu Coupler" manufactured by METRICON), the refractive index of the sample film was measured at measurement wavelengths of 405 nm, 532 nm and 633 nm. For these measured values obtained at the measurement wavelengths of 405 nm, 532 nm and 633 nm, the refractive index at the measurement wavelength of 590 nm is calculated by fitting to the Cauchy dispersion formula.

前述於波長590 nm之折射率之量測,係沿樣品薄膜之擠製方向、垂直於前述擠製方向之面內方向及厚度方向分別進行。然後,求得此樣品薄膜之於波長590 nm之平均折射率,作為前述擠製方向、垂直於前述擠製方向之面內方向及厚度方向之折射率之平均,並將此定為對應該樣品薄膜之層體之平均折射率。The aforementioned measurement of the refractive index at a wavelength of 590 nm was performed along the extrusion direction of the sample film, the in-plane direction perpendicular to the aforementioned extrusion direction, and the thickness direction. Then, the average refractive index of the sample film at a wavelength of 590 nm was obtained as the average of the refractive index of the aforementioned extrusion direction, the in-plane direction perpendicular to the aforementioned extrusion direction, and the thickness direction, and this was determined as the corresponding sample The average refractive index of the layer of the film.

算出光學薄膜之平均折射率ntotal ,作為光學薄膜所包含之各層體之平均折射率之基於層體厚度比之加權平均。具體而言,自下述式(X)算出光學薄膜之於量測波長590 nm之平均折射率ntotal 。 ntotal =ns1 ×[ds1 /(ds1 +dc +ds2 )]+nc ×[dc /(ds1 +dc +ds2 )]+ns2 ×[ds2 /(ds1 +dc +ds2 )]  (X) (前述式(X)中,ns1 表示第一表層之於量測波長590 nm之平均折射率,ds1 表示第一表層之厚度,nc 表示核心層之於量測波長590 nm之平均折射率,dc 表示核心層之厚度,ns2 表示第二表層之於量測波長590 nm之平均折射率,ds2 表示第二表層之厚度。)The average refractive index n total of the optical film is calculated as the weighted average of the average refractive index of each layer contained in the optical film based on the thickness ratio of the layer. Specifically, the average refractive index n total of the optical film at the measurement wavelength of 590 nm is calculated from the following formula (X). n total =n s1 ×[d s1 /(d s1 +d c +d s2 )]+n c ×[d c /(d s1 +d c +d s2 )]+n s2 ×[d s2 /(d s1 +d c +d s2 )] (X) (In the aforementioned formula (X), n s1 represents the average refractive index of the first surface layer at the measurement wavelength of 590 nm, d s1 represents the thickness of the first surface layer, and n c represents The average refractive index of the core layer at the measurement wavelength of 590 nm, d c represents the thickness of the core layer, n s2 represents the average refractive index of the second surface layer at the measurement wavelength of 590 nm, and d s2 represents the thickness of the second surface layer.)

使用量測裝置(AXOMETRICS公司製之「AxoScan」)於量測波長590 nm量測光學薄膜之R0及R40。Use a measuring device ("AxoScan" manufactured by AXOMETRICS) to measure R0 and R40 of the optical film at a measuring wavelength of 590 nm.

自前述光學薄膜之R0及R40以及光學薄膜之平均折射率ntotal ,計算於波長590 nm之光學薄膜之厚度方向延遲。From the R0 and R40 of the aforementioned optical film and the average refractive index n total of the optical film, the thickness direction retardation of the optical film at a wavelength of 590 nm is calculated.

並且,使用砂紙#100自光學薄膜去除第一表層,更以砂紙#2000拋光表面,而獲得包含核心層及第二表層之試料薄膜。算出試料薄膜之平均折射率nave ,作為此試料薄膜所包含之各層體之平均折射率之基於層體厚度比之加權平均。具體而言,自下述式(Y)算出試料薄膜之於量測波長590 nm之平均折射率nave 。 nave =nc ×[dc /(dc +ds2 )]+ns2 ×[ds2 /(dc +ds2 )]  (Y) (前述式(Y)中,符號之意義與式(X)相同。)In addition, sandpaper #100 was used to remove the first surface layer from the optical film, and the surface was polished with sandpaper #2000 to obtain a sample film including a core layer and a second surface layer. Calculate the average refractive index nave of the sample film as a weighted average of the average refractive index of each layer contained in the sample film based on the layer thickness ratio. Specifically, the average refractive index nave of the sample film at the measurement wavelength of 590 nm was calculated from the following formula (Y). n ave =n c ×[d c /(d c +d s2 )]+n s2 ×[d s2 /(d c +d s2 )] (Y) (In the aforementioned formula (Y), the meaning of the symbol is the same as that of the formula (X) Same.)

使用量測裝置(AXOMETRICS公司製之「AxoScan」)於量測波長590 nm量測此試料薄膜之R0及R40。Use a measuring device ("AxoScan" manufactured by AXOMETRICS) to measure the R0 and R40 of the sample film at a measuring wavelength of 590 nm.

自試料薄膜之R0及R40以及試料薄膜之平均折射率nave 計算於波長590 nm之試料薄膜之面內延遲及厚度方向延遲。而且,藉由自包含第一表層之光學薄膜之面內延遲及厚度方向延遲,減去不包含第一表層之試料薄膜之面內延遲及厚度方向延遲,而求得第一表層之面內延遲及厚度方向延遲。From the R0 and R40 of the sample film and the average refractive index nave of the sample film, the in-plane retardation and thickness direction retardation of the sample film with a wavelength of 590 nm are calculated. Furthermore, the in-plane retardation and thickness direction retardation of the optical film including the first surface layer are subtracted from the in-plane retardation and thickness direction retardation of the sample film not including the first surface layer to obtain the in-plane retardation of the first surface layer And the thickness direction is retarded.

再者,使用砂紙#100自試料薄膜去除第二表層,更以砂紙#2000拋光表面,而獲得核心層。自核心層之R0及R40以及核心層之平均折射率nc 計算於波長590 nm之核心層之面內延遲及厚度方向延遲。Furthermore, the second surface layer was removed from the sample film with sandpaper #100, and the surface was polished with sandpaper #2000 to obtain the core layer. The in-plane retardation and thickness direction retardation of the core layer at a wavelength of 590 nm are calculated from the R0 and R40 of the core layer and the average refractive index n c of the core layer.

並且,藉由自包含第二表層之試料薄膜之面內延遲及厚度方向延遲,減去核心層之面內延遲及厚度方向延遲,而求得第二表層之面內延遲及厚度方向延遲。And, by subtracting the in-plane retardation and the thickness direction retardation of the core layer from the in-plane retardation and the thickness direction retardation of the sample film including the second surface layer, the in-plane retardation and the thickness direction retardation of the second surface layer are obtained.

[視角特性之評價方法][Evaluation method of viewing angle characteristics]

於光學薄膜使用電暈(corona)處理裝置(春日電機公司製),以放電量50 W⋅min/m2 施加電暈處理。以接合液(日本合成化學公司製之「GOHSEFIMER Z200」)介入施加電暈處理面之光學薄膜與聚乙烯醇製之偏光件(厚度23 μm)之間,而使施加電暈處理之光學薄膜及偏光件之其中一表面以彼此面對之狀態重疊,並使用輥式層壓機予以貼合。以接合液介入如此所獲得之多層薄膜與偏光件保護薄膜之間而使二者重疊,並使用輥式層壓機予以貼合,所述偏光件保護薄膜係由以與前述相同條件施加電暈處理之包含含脂環結構聚合物之樹脂(日本瑞翁股份有限公司製;玻璃轉移溫度126℃)所形成者,且厚度為40 μm。藉此,獲得具有(偏光件保護薄膜)/(接合層)/(偏光件)/(接合層)/(光學薄膜)之層結構之偏光板。A corona treatment device (manufactured by Kasuga Denki Co., Ltd.) was used for the optical film, and the corona treatment was applied at a discharge rate of 50 W⋅min/m 2. Use bonding fluid (“GOHSEFIMER Z200” manufactured by Nippon Gosei Chemical Co., Ltd.) to intervene between the optical film on the corona-treated surface and the polarizer made of polyvinyl alcohol (thickness 23 μm) to make the corona-treated optical film and One of the surfaces of the polarizing member is overlapped in a state facing each other, and is laminated using a roll laminator. The multilayer film and the polarizer protective film thus obtained are interposed with a bonding liquid to overlap them, and they are laminated using a roll laminator. The polarizer protective film is subjected to corona under the same conditions as the foregoing. The processed resin contains alicyclic structure polymer (manufactured by Zeon Co., Ltd.; glass transition temperature: 126°C), and the thickness is 40 μm. Thereby, a polarizing plate with a layer structure of (polarizer protective film)/(bonding layer)/(polarizer)/(bonding layer)/(optical film) is obtained.

準備市售電視作為IPS型液晶顯式裝置。取出此電視之觀看側之偏光板(亦即較接近顯示面之偏光板),裝設使用實施例或比較例中所製造之光學薄膜所製造之前述偏光板以取而代之。之後,令電視顯示黑畫面,且觀察顯示面。自顯示面之極角約為40°之方向且於方位角0°~180°之範圍中進行觀察。觀察之結果,顯示面之色調若可隱約看出偏藍則判定為「不良」,若無法確認色調則判定為「良」。A commercially available TV is prepared as an IPS-type liquid crystal display device. Take out the polarizing plate on the viewing side of the TV (that is, the polarizing plate closer to the display surface), and install the aforementioned polarizing plate manufactured using the optical film manufactured in the embodiment or the comparative example to replace it. After that, let the TV display a black screen and observe the display surface. The polar angle from the display surface is about 40° and the observation is made in the range of azimuth angle of 0°~180°. As a result of the observation, if the hue of the display surface is slightly bluish, it is judged as "bad", and if the hue cannot be confirmed, it is judged as "good".

[水蒸氣穿透率之量測方法][Measurement method of water vapor transmission rate]

遵從JIS K 7129 B法,使用水蒸氣穿透度量測裝置(MOCON公司製之「PERMATRAN-W」)於溫度40℃且濕度90%RH之條件下量測光學薄膜之水蒸氣穿透率。Comply with the JIS K 7129 B method, use a water vapor transmission measuring device ("PERMATRAN-W" manufactured by MOCON) to measure the water vapor transmission rate of the optical film at a temperature of 40°C and a humidity of 90%RH.

[翹曲之評價方法][Method of evaluating warpage]

以肉眼觀察如同於前述[視角特性之評價方法]所說明而製造之偏光板。觀察之結果,光學薄膜表面未確認有凹凸,外觀為良好。Observe the polarizing plate manufactured as described in the aforementioned [Evaluation Method of Viewing Angle Characteristics] with the naked eye. As a result of the observation, unevenness was not confirmed on the surface of the optical film, and the appearance was good.

切割前述偏光板而獲得邊長100 mm之正方形。將所獲得之薄膜片靜置於溫度調整為60℃且濕度調整為90%之高溫恆濕槽100小時。之後,自高溫恆濕槽取出薄膜片,且放置於平坦玻璃之上。此時,因薄膜片之翹曲所致之該薄膜片之端部浮起2 mm以上之情況則判定為「不良」,浮起量未達2 mm之情況則判定為「良」。Cut the aforementioned polarizing plate to obtain a square with a side length of 100 mm. The obtained film sheet was placed in a high temperature and humidity tank with a temperature adjusted to 60° C. and a humidity adjusted to 90% for 100 hours. After that, the film sheet was taken out from the high temperature and humidity tank and placed on the flat glass. At this time, if the end of the film sheet floats by more than 2 mm due to the warpage of the film sheet, it is judged as "bad", and if the amount of float is less than 2 mm, it is judged as "good".

[製造例1.包含嵌段共聚物之氫化物之樹脂I之製造][Production Example 1. Production of Resin I Containing Hydrogenated Block Copolymers]

(第一階段:聚合反應所致之第一嵌段St1之伸長)(The first stage: the elongation of the first block St1 caused by the polymerization reaction)

於已充分乾燥且以氮氣置換之具備攪拌裝置的不鏽鋼製反應器中,裝入脫水環已烷320份、苯乙烯75份及二丁醚0.38份,於60℃攪拌的同時添加正丁基鋰溶液(以15重量%含有之已烷溶液)0.41份以起始聚合反應,進而進行第一階段之聚合反應。於反應開始後1小時之時間點,自反應混合物取樣且藉由氣相層析術(gas chromatography,GC)分析試料之結果,其聚合轉化率為99.5%。In a fully dried and nitrogen-replaced stainless steel reactor equipped with a stirring device, 320 parts of dehydrated cyclohexane, 75 parts of styrene, and 0.38 parts of dibutyl ether are charged, and n-butyl lithium is added while stirring at 60°C. 0.41 part of the solution (15% by weight in hexane) was used to initiate the polymerization reaction, and then proceed to the first stage of the polymerization reaction. At 1 hour after the start of the reaction, a sample was taken from the reaction mixture and the sample was analyzed by gas chromatography (GC). As a result, the polymerization conversion rate was 99.5%.

(第二階段:聚合反應所致之第二嵌段Ip之伸長)(The second stage: the elongation of the second block Ip caused by the polymerization reaction)

於上述第一階段中所獲得之反應混合物添加異戊二烯15份,以起始後續第二階段之聚合反應。於第二階段之聚合反應開始後1小時之時點,自反應混合物取樣且藉由GC分析試料之結果,其聚合轉化率為99.5%。15 parts of isoprene was added to the reaction mixture obtained in the above-mentioned first stage to initiate the subsequent second stage of polymerization reaction. At 1 hour after the start of the second stage of the polymerization reaction, a sample was taken from the reaction mixture and the sample was analyzed by GC. As a result, the polymerization conversion rate was 99.5%.

(第三階段:聚合反應所致之第三嵌段St2之伸長)(The third stage: the elongation of the third block St2 caused by the polymerization reaction)

於上述第二階段中所獲得之反應混合物添加苯乙烯10份,以起始後續第三階段之聚合反應。於第三階段之聚合反應開始後1小時之時間點,自反應混合物取樣試料,且量測所獲得之嵌段共聚物之重量平均分子量Mw及數量平均分子量Mn。並且於此時間點藉由GC分析所取樣之試料之結果,其聚合轉化率為幾乎100%。之後立即於反應混合物添加異丙醇0.2份以令反應停止。藉此獲得包含嵌段共聚物之混合物。Add 10 parts of styrene to the reaction mixture obtained in the above second stage to initiate the subsequent third stage polymerization reaction. At 1 hour after the start of the polymerization reaction in the third stage, a sample was sampled from the reaction mixture, and the weight average molecular weight Mw and number average molecular weight Mn of the block copolymer obtained were measured. And at this point of time, the result of GC analysis of the sampled samples showed that the polymerization conversion rate was almost 100%. Immediately afterwards, 0.2 part of isopropanol was added to the reaction mixture to stop the reaction. In this way, a mixture containing a block copolymer is obtained.

所獲得之嵌段共聚物可知為具有第一苯乙烯嵌段St1/異戊二烯嵌段Ip/第二苯乙烯嵌段St2=75/15/10之重量比之三嵌段分子結構之聚合物。此嵌段共聚物之重量平均分子量(Mw)為70,900,分子量分布(Mw/Mn)為1.5。The obtained block copolymer can be known as a polymerization of a triblock molecular structure with a weight ratio of the first styrene block St1/isoprene block Ip/the second styrene block St2=75/15/10 Things. The weight average molecular weight (Mw) of this block copolymer is 70,900, and the molecular weight distribution (Mw/Mn) is 1.5.

(第四階段:嵌段共聚物之氫化)(The fourth stage: hydrogenation of block copolymer)

隨後,將包含上述嵌段共聚物之混合物輸送至具備攪拌裝置之耐壓反應器,添加並混合作為氫化觸媒之矽藻土承載型鎳觸媒(日揮觸媒化成公司製之「E22U」,鎳承載量60%)8.0份及脫水環己烷100份。以氫氣置換反應器內部,進一步攪拌溶液且同時供給氫氣,而於溫度190℃且壓力4.5 MPa進行氫化反應8小時。藉由氫化反應將嵌段共聚物氫化,而獲得聚合物X。所獲得之反應溶液所包含之聚合物X之重量平均分子量(Mw)為63,300,分子量分布(Mw/Mn)為1.5。Subsequently, the mixture containing the above-mentioned block copolymer was transported to a pressure-resistant reactor equipped with a stirring device, and a diatomaceous earth-supported nickel catalyst ("E22U" manufactured by Nikkei Catalytic Kasei Co., Ltd.) as a hydrogenation catalyst was added and mixed. Nickel carrying capacity 60%) 8.0 parts and dehydrated cyclohexane 100 parts. The inside of the reactor was replaced with hydrogen, the solution was further stirred and hydrogen was supplied at the same time, and the hydrogenation reaction was performed at a temperature of 190° C. and a pressure of 4.5 MPa for 8 hours. The block copolymer is hydrogenated by a hydrogenation reaction to obtain polymer X. The weight average molecular weight (Mw) of the polymer X contained in the obtained reaction solution was 63,300, and the molecular weight distribution (Mw/Mn) was 1.5.

(第五階段:去除揮發成分)(The fifth stage: remove volatile components)

氫化反應結束後,過濾反應溶液以去除氫化觸媒。之後,於反應溶液添加溶解係酚系抗氧化劑之肆[3-(3,5-二-三級丁基-4-羥苯基)丙酸]新戊四酯(pentaerythrityl tetrakis[3-(3,5-di-t -butyl-4-hydroxyphenyl)propionate])(松原產業公司製之「Songnox 1010」)0.1份之二甲苯溶液2.0份,並使其溶解。After the hydrogenation reaction is completed, the reaction solution is filtered to remove the hydrogenation catalyst. After that, add [3-(3,5-di-tertiary butyl-4-hydroxyphenyl) propionic acid] pentaerythrityl tetrakis[3-(3 ,5-di- t -butyl-4-hydroxyphenyl)propionate]) ("Songnox 1010" manufactured by Songyuan Sangyo Co., Ltd.) 0.1 part of xylene solution 2.0 parts, and dissolve it.

隨後,使用圓筒形濃縮乾燥器(日立製作所公司製之「KONTORO」),於溫度260℃且壓力0.001 MPa以下自上述溶液去除係溶劑之環己烷、二甲苯及其他揮發成分。將熔融聚合物自模具(die)擠製成條(strand)狀,冷卻後,使用造粒機(pelletizer)製作包含聚合物X之樹脂I之料粒。Subsequently, a cylindrical concentration dryer (“KONTORO” manufactured by Hitachi, Ltd.) was used to remove cyclohexane, xylene, and other volatile components from the above solution at a temperature of 260°C and a pressure of 0.001 MPa or less. The molten polymer is extruded from a die into a strand shape, and after cooling, a pelletizer is used to produce pellets of the resin I containing the polymer X.

所獲得之料粒狀之樹脂I所包含之聚合物X之重量平均分子量(Mw)為62,200,分子量分布(Mw/Mn)為1.5,氫化率幾乎為100%。The weight average molecular weight (Mw) of the polymer X contained in the obtained pelletized resin I was 62,200, the molecular weight distribution (Mw/Mn) was 1.5, and the hydrogenation rate was almost 100%.

[製造例2.包含二環戊二烯之開環聚合物之氫化物之樹脂II之製造][Manufacturing Example 2. Manufacturing of resin II containing hydrogenated product of ring-opening polymer of dicyclopentadiene]

(二環戊二烯之開環聚合物之氫化物之合成)(Synthesis of hydride of ring-opening polymer of dicyclopentadiene)

於充分乾燥金屬製之耐壓反應器之後,以氮氣置換。於此金屬製耐壓反應器加入環己烷154.5份、二環戊二烯(內型異構物含有率99%以上)之濃度為70%之環己烷溶液42.8份(作為二環戊二烯之份量為30份)及1-己烯1.9份,且加熱至53℃。After fully drying the metal pressure-resistant reactor, replace it with nitrogen. Into this metal pressure-resistant reactor, 154.5 parts of cyclohexane and 42.8 parts of cyclohexane solution with 70% concentration of dicyclopentadiene (endoisomer content of 99% or more) (as dicyclopentadiene) The amount of ene is 30 parts) and 1.9 parts of 1-hexene, and heated to 53°C.

於將四氯鎢苯醯亞胺(四氫呋喃)錯合物0.014份溶解於0.70份之甲苯之溶液中,加入濃度為19%之二乙基乙氧鋁(diethyl aluminum ethoxide)/正己烷溶液0.061份,且攪拌10分鐘,以製備觸媒溶液。Dissolve 0.014 parts of tetrachlorotungsten phenylimide (tetrahydrofuran) complex in 0.70 parts of toluene solution, add 19% diethyl aluminum ethoxide/n-hexane solution 0.061 parts , And stirred for 10 minutes to prepare a catalyst solution.

將此觸媒溶液加入耐壓反應器中,以起始開環聚合反應。之後,於保持53℃的同時令其反應4小時,而獲得二環戊二烯之開環聚合物之溶液。This catalyst solution is added to the pressure-resistant reactor to initiate the ring-opening polymerization reaction. After that, it was allowed to react for 4 hours while maintaining 53°C to obtain a solution of a ring-opening polymer of dicyclopentadiene.

所獲得之二環戊二烯之開環聚合物之數量平均分子量(Mn)及重量平均分子量(Mw)分別為8,750及28,100,由此些求得之分子量分布(Mw/Mn)為3.21。The number average molecular weight (Mn) and weight average molecular weight (Mw) of the obtained ring-opening polymer of dicyclopentadiene were 8,750 and 28,100, respectively, and the molecular weight distribution (Mw/Mn) obtained from these was 3.21.

將作為停止劑之1,2-乙二醇0.037份加入所獲得之二環戊二烯之開環聚合物之溶液200份,加熱至60℃,攪拌1小時以令聚合反應停止。於此,加入類水滑石化合物(協和化學工業公司製之「KYOWAAD(註冊商標)2000」)1份,加熱至60℃,攪拌1小時。之後,加入過濾助劑(昭和化學工業公司製之「Radiolite(註冊商標)#1500」)0.4份,使用PP打褶濾芯(ADVANTEC東洋公司製之「TCP-HX」)過濾分開吸附劑與溶液。0.037 parts of 1,2-ethylene glycol as a stopping agent was added to 200 parts of the obtained solution of the ring-opening polymer of dicyclopentadiene, heated to 60°C, and stirred for 1 hour to stop the polymerization reaction. Here, 1 part of the hydrotalcite-like compound ("KYOWAAD (registered trademark) 2000" manufactured by Kyowa Chemical Industry Co., Ltd.) was added, heated to 60°C, and stirred for 1 hour. After that, 0.4 parts of filter aid ("Radiolite (registered trademark) #1500" made by Showa Chemical Industry Co., Ltd.) was added, and the adsorbent and the solution were separated by filtration using a PP pleated filter element ("TCP-HX" made by ADVANTEC Toyo Co., Ltd.).

於過濾後之二環戊二烯之開環聚合物之溶液200(聚合物份量30份)份加入環己烷100份,添加氯氫化羰基参(三苯基膦)釕(chlorohydridocarbonyl tris(triphenylphosphine) ruthenium)0.0043份,於氫氣壓6 MPa且180℃進行氫化反應4小時。藉此,獲得包含二環戊二烯之開環聚合物之氫化物之反應液。此反應液中析出氫化物而成為漿料溶液。Add 200 parts (30 parts of polymer) to the filtered dicyclopentadiene ring-opening polymer solution, add 100 parts of cyclohexane, and add chlorohydridocarbonyl tris(triphenylphosphine) ruthenium) 0.0043 parts, hydrogenation reaction was carried out at a hydrogen pressure of 6 MPa and 180°C for 4 hours. Thereby, a reaction liquid containing the hydrogenated product of the ring-opening polymer of dicyclopentadiene is obtained. The hydride precipitates in this reaction liquid and becomes a slurry solution.

使用離心機分離前述反應液所包含之氫化物與溶液,於60℃減壓乾燥24小時,而獲得具結晶性之二環戊二烯之開環聚合物之氫化物28.5份。此氫化物之氫化率為99%以上,玻璃轉移溫度Tg為95℃,結晶化溫度Tc為180℃,熔點Mp為262℃,外消旋二單元組之比例為89%。The hydride and the solution contained in the aforementioned reaction liquid were separated by a centrifuge, and dried under reduced pressure at 60° C. for 24 hours to obtain 28.5 parts of the hydride of the ring-opening polymer of dicyclopentadiene with crystallinity. The hydrogenation rate of this hydride is over 99%, the glass transition temperature Tg is 95°C, the crystallization temperature Tc is 180°C, the melting point Mp is 262°C, and the ratio of the racemic diad is 89%.

(料粒之製造)(Manufacture of pellets)

將抗氧化劑(肆[亞甲基-3-(3’,5’-二-三級丁基-4’-羥基苯基)丙酸]甲酯;BASF Japan公司製之「Irganox(註冊商標)1010」)1.1份混合於前述之二環戊二烯之開環聚合物之氫化物100份,而獲得樹脂II。Antioxidant (4-[methylene-3-(3',5'-di-tertiarybutyl-4'-hydroxyphenyl) propionate] methyl ester; "Irganox (registered trademark) manufactured by BASF Japan 1010") 1.1 parts are mixed with 100 parts of the hydrogenated product of the aforementioned ring-opening polymer of dicyclopentadiene to obtain resin II.

將此樹脂II投入具備4個內徑3 mmΦ之模具孔之雙軸擠製機(東芝機械公司製之「TEM-37B」)。使用前述雙軸擠製機,藉由熱熔融擠製成形,而令樹脂成形為條狀之成形體。以條切機(strand cutter)細切此成形體,而獲得包含二環戊二烯之開環聚合物之氫化物之樹脂II之料粒。前述之雙軸擠製機之運轉條件如下所示。 l 機筒設定溫度:270℃~280℃ l 模具設定溫度:250℃ l 螺桿轉速:145 rpm l 進料機轉速:50 rpmPut this resin II into a biaxial extruder ("TEM-37B" manufactured by Toshiba Machine Co., Ltd.) with 4 mold holes with an inner diameter of 3 mmΦ. Using the aforementioned biaxial extruder, the resin is molded into a strip-shaped molded body by hot melt extrusion. A strand cutter is used to finely cut this shaped body to obtain pellets of resin II containing the hydrogenated product of the ring-opening polymer of dicyclopentadiene. The operating conditions of the aforementioned twin-shaft extruder are as follows. l Barrel setting temperature: 270℃~280℃ l Mold setting temperature: 250℃ l Screw speed: 145 rpm l Feeder speed: 50 rpm

[實施例1][Example 1]

將由製造例1所製造之樹脂I投入至料斗。而且,將所投入之樹脂I作為核心層用之樹脂C,而供給於多歧管模具(multi-manifold die)。The resin I manufactured in Manufacturing Example 1 was put into the hopper. Furthermore, the injected resin I is used as the resin C for the core layer, and is supplied to a multi-manifold die.

另一方面,將由製造例2所製造之樹脂II投入至另一料斗。而且,將所投入之樹脂II作為第一表層用之樹脂S1及第二表層用之樹脂S2,而供給於前述多歧管模具。On the other hand, the resin II manufactured by Manufacturing Example 2 was put into another hopper. Furthermore, the injected resin II is supplied as the resin S1 for the first surface layer and the resin S2 for the second surface layer to the aforementioned manifold mold.

隨後,以熔融狀態自多歧管模具將核心層用之樹脂C、第一表層用之樹脂S1及第二表層用之樹脂S2擠製成薄膜狀。而且,將所擠製之樹脂澆鑄於冷卻輥而予以冷卻,以製造依序具備第一表層/核心層/第二表層之薄膜。將核心層用之樹脂C之玻璃轉移溫度定為TgC,將前述熔融擠出之溫度設定於TgC+50℃~TgC+200℃之範圍。自所獲得之薄膜藉由修整而去除其幅寬方向之兩端之部分,而獲得薄膜幅寬約600 mm之長條狀光學薄膜。Subsequently, the resin C for the core layer, the resin S1 for the first surface layer, and the resin S2 for the second surface layer are extruded into a film shape from the multi-manifold mold in a molten state. Furthermore, the extruded resin is cast on a cooling roll and cooled to produce a film with a first surface layer/core layer/second surface layer in sequence. The glass transition temperature of the resin C for the core layer is set as TgC, and the temperature of the aforementioned melt extrusion is set in the range of TgC+50°C to TgC+200°C. The obtained film is trimmed to remove the parts at both ends in the width direction of the film to obtain a long optical film with a film width of about 600 mm.

以上述方法評價所獲得之光學薄膜。The obtained optical film was evaluated by the above method.

[實施例2][Example 2]

藉由調整多歧管模具中之樹脂C、樹脂S1及樹脂S2之擠製量,而如表1所示變更核心層、第一表層及第二表層之厚度。除以上事項以外,其餘藉由與實施例1相同之操作進行光學薄膜之製造及評價。By adjusting the extrusion amount of resin C, resin S1 and resin S2 in the multi-manifold mold, the thickness of the core layer, the first surface layer and the second surface layer were changed as shown in Table 1. Except for the above matters, the production and evaluation of the optical film were carried out by the same operation as in Example 1.

[實施例3][Example 3]

改用包含不具結晶性之含脂環結構聚合物之樹脂III(降𦯉烯聚合物;日本瑞翁股份有限公司製之「ZEONOR」;玻璃轉移溫度126℃)取代由製造例2所製造之樹脂II作為第一表層用之樹脂S1及第二表層用之樹脂S2。並且,藉由調整多歧管模具中之樹脂C、樹脂S1及樹脂S2之擠製量,而如表1所示變更核心層、第一表層及第二表層之厚度。除以上事項以外,其餘藉由與實施例1相同之操作進行光學薄膜之製造及評價。Change to resin III containing alicyclic structure polymer without crystallinity (Norene polymer; "ZEONOR" manufactured by Zeon Corporation; glass transition temperature 126°C) instead of the resin manufactured in Manufacturing Example 2 II is used as the resin S1 for the first surface layer and the resin S2 for the second surface layer. In addition, by adjusting the extrusion amounts of resin C, resin S1 and resin S2 in the multi-manifold mold, the thickness of the core layer, the first surface layer and the second surface layer were changed as shown in Table 1. Except for the above matters, the production and evaluation of the optical film were carried out by the same operation as in Example 1.

[實施例4][Example 4]

改用包含不具結晶性之含脂環結構聚合物之樹脂IV(降𦯉烯聚合物;日本瑞翁股份有限公司製之「ZEONOR」;玻璃轉移溫度163℃)取代樹脂III作為第一表層用之樹脂S1及第二表層用之樹脂S2。並且,藉由調整多歧管模具中之樹脂C、樹脂S1及樹脂S2之擠製量,而如表1所示變更第一表層及第二表層之厚度。除以上事項以外,其餘藉由與實施例3相同之操作進行光學薄膜之製造及評價。Use Resin IV (Norene polymer; "ZEONOR" made by Zeon Co., Ltd.; glass transition temperature 163°C) containing a non-crystalline alicyclic structure polymer instead of Resin III as the first surface layer Resin S1 and resin S2 for the second surface layer. In addition, by adjusting the extrusion amounts of resin C, resin S1 and resin S2 in the multi-manifold mold, the thickness of the first surface layer and the second surface layer were changed as shown in Table 1. Except for the above matters, the production and evaluation of the optical film were performed by the same operation as in Example 3.

[比較例1][Comparative Example 1]

使用由製造例1所製造之樹脂I作為核心層用之樹脂C、第一表層用之樹脂S1及第二表層用之樹脂S2之全部。除以上事項以外,其餘藉由與實施例1相同之操作,進行具備僅由樹脂I形成之層體之單層結構之光學薄膜之製造及評價。The resin I manufactured in Manufacturing Example 1 was used as all of the resin C for the core layer, the resin S1 for the first surface layer, and the resin S2 for the second surface layer. Except for the above matters, by the same operations as in Example 1, the production and evaluation of an optical film of a single-layer structure having a layered body formed only of resin I were performed.

[比較例2][Comparative Example 2]

使用由製造例2所製造之樹脂II作為核心層用之樹脂C、第一表層用之樹脂S1及第二表層用之樹脂S2之全部。除以上事項以外,其餘藉由與實施例1相同之操作,進行具備僅由樹脂II形成之層體之單層結構之光學薄膜之製造及評價。The resin II manufactured in Manufacturing Example 2 was used as all of the resin C for the core layer, the resin S1 for the first surface layer, and the resin S2 for the second surface layer. Except for the above matters, the rest was performed by the same operation as in Example 1 to manufacture and evaluate an optical film of a single-layer structure having a layered body formed only of resin II.

[比較例3][Comparative Example 3]

使用與使用於實施例3相同之樹脂III作為核心層用之樹脂C、第一表層用之樹脂S1及第二表層用之樹脂S2之全部。除以上事項以外,其餘藉由與實施例1相同之操作,進行具備僅由樹脂III形成之層體之單層結構之光學薄膜之製造及評價。The same resin III as used in Example 3 was used as all of the resin C for the core layer, the resin S1 for the first surface layer, and the resin S2 for the second surface layer. Except for the above matters, by the same operation as in Example 1, the production and evaluation of an optical film of a single-layer structure having a layered body formed only of resin III were performed.

[比較例4][Comparative Example 4]

藉由調整多歧管模具中之樹脂C、樹脂S1及樹脂S2之擠製量,而如表1所示變更核心層、第一表層及第二表層之厚度。除以上事項以外,其餘藉由與實施例1相同之操作進行光學薄膜之製造及評價。By adjusting the extrusion amount of resin C, resin S1 and resin S2 in the multi-manifold mold, the thickness of the core layer, the first surface layer and the second surface layer were changed as shown in Table 1. Except for the above matters, the production and evaluation of the optical film were carried out by the same operation as in Example 1.

[比較例5][Comparative Example 5]

準備三乙醯纖維素薄膜(FUJIFILM公司製之「Fujitack」,厚度40 μm)作為光學薄膜,以上述方法評價。A triacetyl cellulose film (Fujitack manufactured by FUJIFILM, thickness 40 μm) was prepared as an optical film, and evaluated by the above method.

[結果][result]

前述實施例及比較例之結果表示於下述表格。於下述表格中,簡稱之意義如下所述。 I:包含作為嵌段共聚物之氫化物之聚合物X之樹脂I。 II:包含具結晶性之含脂環結構聚合物之樹脂II。 III:包含不具結晶性之含脂環結構聚合物之樹脂III。 IV:包含不具結晶性之含脂環結構聚合物之樹脂IV。 TAC:三乙醯纖維素。 Re:面內延遲。 Rth:厚度方向延遲。The results of the foregoing Examples and Comparative Examples are shown in the following table. In the following table, the meanings of the abbreviations are as follows. I: Resin I containing polymer X which is a hydrogenated product of a block copolymer. II: Resin II containing crystalline alicyclic structure polymer. III: Resin III containing alicyclic structure polymer without crystallinity. IV: Resin IV containing alicyclic structure polymer without crystallinity. TAC: Triacetyl cellulose. Re: In-plane delay. Rth: Retardation in the thickness direction.

[表1.實施例之結果]

Figure 106145950-A0304-0001
[Table 1. Results of Examples]
Figure 106145950-A0304-0001

[表2.比較例之結果]

Figure 106145950-A0304-0002
[Table 2. Results of Comparative Example]
Figure 106145950-A0304-0002

1‧‧‧皿形刃2‧‧‧碗形刃3‧‧‧光學薄膜10a‧‧‧薄膜10U‧‧‧薄膜之上表面15P‧‧‧中心軸上之位置100‧‧‧光學薄膜110‧‧‧核心層120‧‧‧第一表層130‧‧‧第二表層201‧‧‧上部夾環202‧‧‧下部夾環211‧‧‧鋼球1‧‧‧Dish-shaped blade 2‧‧‧Bowl-shaped blade 3‧‧‧Optical film 10a‧‧‧Film 10U‧‧‧The upper surface of the film 15P‧‧‧Position on the central axis 100‧‧‧Optical film 110‧ ‧‧Core layer 120‧‧‧First surface layer 130‧‧‧Second surface layer 201‧‧‧Upper clamp ring 202‧‧‧Lower clamp ring 211‧‧‧Steel ball

圖1係概略表示關於本發明之一實施型態之光學薄膜的剖面圖。 圖2係概略表示使用於實施例及比較例之光學薄膜之衝擊強度之量測裝置的立體圖。 圖3係概略表示使用於實施例及比較例之光學薄膜之衝擊強度之量測裝置的剖面圖。 圖4係概略表示將使用於實施例及比較例之修整用刃沿垂直於薄膜運送方向之平面切開來之剖面的剖面圖。FIG. 1 is a schematic cross-sectional view of an optical film related to an embodiment of the present invention. Fig. 2 is a perspective view schematically showing an apparatus for measuring the impact strength of optical films used in Examples and Comparative Examples. Fig. 3 is a cross-sectional view schematically showing an apparatus for measuring the impact strength of optical films used in Examples and Comparative Examples. Fig. 4 is a cross-sectional view schematically showing a section of the trimming blade used in the embodiment and the comparative example cut along a plane perpendicular to the film conveying direction.

100‧‧‧光學薄膜 100‧‧‧Optical Film

110‧‧‧核心層 110‧‧‧Core layer

120‧‧‧第一表層 120‧‧‧First surface

130‧‧‧第二表層 130‧‧‧Second Surface

Tc、Ts1、Ts2‧‧‧厚度 Tc, Ts1, Ts2‧‧‧Thickness

Claims (4)

一種光學薄膜,其係於量測波長590nm之厚度方向延遲之絕對值為3nm以下、衝擊強度為2×10-2J以上,且水蒸氣穿透率為10g/(m2.24h)以下的光學薄膜,所述水蒸氣穿透率係遵從JIS K 7129 B法,於溫度40℃且濕度90%RH之條件下量測到者;其中該衝擊強度係令重5g、直徑11mm之鋼球自由落下至經水平固定的該光學薄膜而量測到者,該光學薄膜具備以樹脂C形成之厚度25μm以上的核心層、以樹脂S1形成於該核心層之一側之第一表層及以樹脂S2形成於該核心層之另一側之第二表層,該樹脂C之於40μm之厚度時之厚度方向延遲之絕對值為3nm以下,該樹脂S1之於40μm之厚度時之衝擊強度為5×10-2J以上,該樹脂S2之於40μm之厚度時之衝擊強度為5×10-2J以上,該第一表層之厚度Ts1及該第二表層之厚度Ts2之總和相對於該核心層之厚度Tc之比((Ts1+Ts2)/Tc)為0.05至0.4,該樹脂C之於40μm之厚度時之厚度方向延遲之絕對值,表示以該樹脂C形成之厚度40μm之薄膜之於量測波長590nm之厚度方向延遲之絕對值,該樹脂S1之於40μm之厚度時之衝擊強度,係令重5g、直徑11 mm之鋼球自由落下至以該樹脂S1形成且經水平固定之厚度40μm之薄膜而量測到者,該樹脂S2之於40μm之厚度時之衝擊強度,係令重5g、直徑11mm之鋼球自由落下至以該樹脂S2形成且經水平固定之厚度40μm之薄膜而量測到者。 An optical film that has an absolute value of retardation in the thickness direction at a measuring wavelength of 590nm of 3nm or less, an impact strength of 2×10 -2 J or more, and a water vapor transmission rate of 10g/(m 2 .24h) or less Optical film, the water vapor transmission rate is in accordance with JIS K 7129 B method, measured under the conditions of temperature 40℃ and humidity 90%RH; wherein the impact strength is to make a steel ball weighing 5g and diameter 11mm free When measured when dropped onto the horizontally fixed optical film, the optical film includes a core layer formed of resin C with a thickness of 25 μm or more, a first surface layer formed of resin S1 on one side of the core layer, and resin S2 Formed on the second surface layer on the other side of the core layer, the absolute value of the thickness direction retardation of the resin C at a thickness of 40 μm is 3 nm or less, and the impact strength of the resin S1 at a thickness of 40 μm is 5×10 -2 J or more, the impact strength of the resin S2 at a thickness of 40 μm is 5×10 -2 J or more, the sum of the thickness Ts1 of the first surface layer and the thickness Ts2 of the second surface layer is relative to the thickness of the core layer The ratio of Tc ((Ts1+Ts2)/Tc) is 0.05 to 0.4. The absolute value of the retardation in the thickness direction of the resin C at a thickness of 40μm represents the measured wavelength of a film with a thickness of 40μm formed by the resin C The absolute value of the retardation in the thickness direction of 590nm. The impact strength of the resin S1 at a thickness of 40μm is to make a steel ball weighing 5g and a diameter of 11 mm fall freely to a film with a thickness of 40μm formed by the resin S1 and fixed horizontally When measured, the impact strength of the resin S2 at a thickness of 40μm was measured by allowing a steel ball weighing 5g and a diameter of 11mm to fall freely to a film formed of the resin S2 and having a thickness of 40μm fixed horizontally. By. 如請求項1所述之光學薄膜,其中該樹脂C含有嵌段共聚物之氫化物,該樹脂S1及該樹脂S2含有含脂環結構聚合物。 The optical film according to claim 1, wherein the resin C contains a hydrogenated product of a block copolymer, and the resin S1 and the resin S2 contain an alicyclic structure-containing polymer. 如請求項1或2所述之光學薄膜,其厚度為50μm以下。 The optical film according to claim 1 or 2, which has a thickness of 50 μm or less. 一種偏光板,其具備如請求項1至3之任一項所述之光學薄膜與偏光件。 A polarizing plate comprising the optical film and polarizing member according to any one of claims 1 to 3.
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