TWI740129B - 有機膜形成裝置 - Google Patents

有機膜形成裝置 Download PDF

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Publication number
TWI740129B
TWI740129B TW108113178A TW108113178A TWI740129B TW I740129 B TWI740129 B TW I740129B TW 108113178 A TW108113178 A TW 108113178A TW 108113178 A TW108113178 A TW 108113178A TW I740129 B TWI740129 B TW I740129B
Authority
TW
Taiwan
Prior art keywords
plate
heater
heat
soaking
organic film
Prior art date
Application number
TW108113178A
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English (en)
Chinese (zh)
Other versions
TW201945447A (zh
Inventor
高橋崇史
磯明典
Original Assignee
日商芝浦機械電子裝置股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 日商芝浦機械電子裝置股份有限公司 filed Critical 日商芝浦機械電子裝置股份有限公司
Publication of TW201945447A publication Critical patent/TW201945447A/zh
Application granted granted Critical
Publication of TWI740129B publication Critical patent/TWI740129B/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/32056—Deposition of conductive or semi-conductive organic layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Solid Materials (AREA)
TW108113178A 2018-04-16 2019-04-16 有機膜形成裝置 TWI740129B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2018-078484 2018-04-16
JP2018078484 2018-04-16
JP2019-045511 2019-03-13
JP2019045511A JP6940541B2 (ja) 2018-04-16 2019-03-13 有機膜形成装置

Publications (2)

Publication Number Publication Date
TW201945447A TW201945447A (zh) 2019-12-01
TWI740129B true TWI740129B (zh) 2021-09-21

Family

ID=68340650

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108113178A TWI740129B (zh) 2018-04-16 2019-04-16 有機膜形成裝置

Country Status (3)

Country Link
JP (1) JP6940541B2 (enrdf_load_stackoverflow)
KR (1) KR102231061B1 (enrdf_load_stackoverflow)
TW (1) TWI740129B (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115116887B (zh) 2021-03-17 2025-08-19 芝浦机械电子装置株式会社 有机膜形成装置、及有机膜形成装置的清洁方法
KR102721924B1 (ko) * 2021-07-12 2024-10-24 시바우라 메카트로닉스 가부시끼가이샤 유기막 형성 장치 및 유기막의 제조 방법
JP7366086B2 (ja) * 2021-07-29 2023-10-20 芝浦メカトロニクス株式会社 加熱処理装置
JP7565252B2 (ja) * 2021-08-26 2024-10-10 芝浦メカトロニクス株式会社 加熱処理装置
JP7490692B2 (ja) * 2022-02-03 2024-05-27 芝浦メカトロニクス株式会社 有機膜形成装置
JP2024049807A (ja) * 2022-09-29 2024-04-10 芝浦メカトロニクス株式会社 加熱処理装置
JP2024135329A (ja) 2023-03-22 2024-10-04 芝浦メカトロニクス株式会社 加熱処理装置
JP7685002B2 (ja) 2023-03-23 2025-05-28 芝浦メカトロニクス株式会社 加熱処理装置
JP2025054393A (ja) 2023-09-26 2025-04-08 芝浦メカトロニクス株式会社 加熱処理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1533590A (zh) * 2001-07-25 2004-09-29 ���������ƴ���ʽ���� 处理装置和处理方法
CN106971938A (zh) * 2015-10-30 2017-07-21 东京应化工业株式会社 基板加热装置及基板加热方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3631847B2 (ja) 1996-05-28 2005-03-23 大日本印刷株式会社 真空乾燥装置
JP4981477B2 (ja) * 2007-02-16 2012-07-18 三菱重工業株式会社 真空処理装置及び基板加熱方法
JP5084420B2 (ja) * 2007-09-21 2012-11-28 東京エレクトロン株式会社 ロードロック装置および真空処理システム
JP5478280B2 (ja) * 2010-01-27 2014-04-23 東京エレクトロン株式会社 基板加熱装置および基板加熱方法、ならびに基板処理システム
JP6138610B2 (ja) * 2013-07-10 2017-05-31 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1533590A (zh) * 2001-07-25 2004-09-29 ���������ƴ���ʽ���� 处理装置和处理方法
CN106971938A (zh) * 2015-10-30 2017-07-21 东京应化工业株式会社 基板加热装置及基板加热方法

Also Published As

Publication number Publication date
JP2019184229A (ja) 2019-10-24
JP6940541B2 (ja) 2021-09-29
TW201945447A (zh) 2019-12-01
KR102231061B1 (ko) 2021-03-24
KR20190120709A (ko) 2019-10-24

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