TWI739572B - Vacuum gas replacement device and method for wafer box - Google Patents

Abstract

The present invention relates to a vacuum gas replacement device for a wafer boat box and a method thereof. The main structure includes a wafer boat box carrier, an accommodating space defined in the wafer boat box carrier, and a movably arranged on one side of the wafer boat box carrier The container cover, a wafer boat box body accommodated in the accommodating space, a gas outlet connecting the accommodating space and the inside of the wafer box body, a connecting accommodating space and the gas introduction inside the wafer box body Components, a vacuum device set on the wafer box carrier, an inert gas introduction device set on the wafer box carrier, and a filter element. In this way, the general atmosphere in the wafer boat box body is replaced with pure inert gas by the action of vacuuming first and then filled with inert gas. In the process, the gas type in the wafer boat box carrier where the wafer boat box body is located is the same The inside of the wafer boat box body is the same, and the gas purity of the wafer boat box body is effectively ensured.

Description

Vacuum gas replacement device and method for wafer box

The present invention provides a vacuum gas replacement device and method for a wafer box box, in particular to a wafer box vacuum that can ensure the wafer storage quality in the wafer box body and can improve the gas purity in the wafer box body Gas replacement device and method.

According to the semiconductor manufacturing process, the miniaturization of semiconductor wafers is becoming more and more precise, and the processing process has become more complicated, especially with the halogen-based gas etching process, the residual halogen-based gas after etching and the moisture in the dry air The reaction produces acid. The acid will corrode the semiconductor wafer, which becomes a serious problem. As a countermeasure, the processed wafer (Wafer) is generally stored in the FOUP, and then placed in a water-free vacuum environment or Nitrogen is replaced to prevent acid (acid) from occurring to prevent corrosion of semiconductor wafers. However, when the wafer is stored or the wafer box is being transported, the internal wafers may be charged, causing electrostatic damage to the semiconductor circuit, or dust may adhere to the surface of the wafer due to static electricity. As a countermeasure, a vacuum environment is often used. Or supply nitrogen to remove chemical gases and static electricity, and then remove moisture to prevent the generation of acid on the surface of semiconductor wafers.

However, it is difficult for the wafer boat box itself to create the vacuum environment or fill the nitrogen gas to maintain the best vacuum effect or the quality of the nitrogen gas. Direct operation of the wafer box makes the gas pressure inside the wafer box and the outside drop very large, and at the end of the pumping or filling action, it is easy to lose part of the nitrogen due to the pressure difference and affect the concentration, or mix into the general atmosphere or even Water vapor makes it difficult to ensure the quality of wafer storage.

Therefore, how to solve the above-mentioned conventional problems and deficiencies is the direction that the creators of the present invention and the related manufacturers engaged in this industry are eager to study and improve.

Therefore, in view of the above-mentioned deficiencies, the creator of the present invention collected relevant information, evaluated and considered in many ways, and based on the accumulated years of experience in this industry, through continuous trials and modifications, he designed such a guaranteed crystal boat box. The inventor of the wafer storage quality in the body and the vacuum gas replacement device and method of the wafer boat box that can improve the gas purity in the wafer boat box body.

The main purpose of the present invention is to use the two-stage action of vacuuming and filling with inert gas to optimize the quality of wafer storage inside the wafer box body, and to place the wafer boat box body in the process of gas replacement. Simultaneous gas replacement is performed in the confined space to eliminate the problem of general air or water mixing into the inside of the wafer box body, or loss of inert gas.

In order to achieve the above object, the main structure of the present invention includes: a wafer boat box carrier, an accommodating space, a container cover, a wafer box body, a gas outlet, a gas inlet, a vacuum device, and an inert Gas introduction device and a filter element. The accommodating space is defined in the wafer boat box carrier, the container cover is movably arranged on one side of the wafer boat box carrier to seal the accommodating space, the wafer boat box body is accommodated in the accommodating space, and the gas outlet is arranged in One side of the wafer box body communicates with the accommodating space and the inside of the wafer box body, the gas inlet is arranged on one side of the wafer box body to communicate with the accommodating space and the inside of the wafer box body, and the vacuum device is arranged in the wafer box body. The boat box carrier is provided with a connecting gas outlet, the inert gas introduction device is arranged on the wafer box carrier for connecting the gas introduction piece, and the filter element is arranged between the inert gas introduction device and the gas introduction piece.

When the user uses the present invention to replace the gas of the wafer box body, first put the wafer box body into the containing space, and seal the containing space with the container cover, and then drive the vacuum device to remove it. Connect the gas outlet to make the wafer box body and the accommodating space form a vacuum state, then close the vacuum device and drive the inert gas introduction device, the inert gas introduction device is connected to the gas inlet and outlet, so that the inert gas can pass through a filter element After filling the wafer box body and the accommodating space, the inert gas introduction device is closed and the container cover is opened. Thus, when the wafer box body is disconnected from the vacuum device or the inert gas introduction device, the accommodating space The gas type and gas pressure inside are the same as those inside the wafer box body, and the risk of air or water infiltration or loss of inert gas can be reliably eliminated, so that the inside of the wafer box body that is finally taken out is important for preserving wafers. For the best environment.

With the above technology, it is possible to deal with the creation of a conventional vacuum environment or the filling of nitrogen at the moment when the pumping or filling action ends, that is, it is easy to lose nitrogen or mix into general atmosphere or even moisture, which makes it difficult to ensure the storage of wafers. Make breakthroughs in quality problems, and achieve practical progress to achieve the above advantages sex.

1: Wafer box carrier

11, 11a: accommodating space

12: Container lid

121: Sealing strip

2, 2a: Wafer box body

21, 21a: Wafer

22a: gas outlet

23a: Gas inlet

3.3a: Gas outlet

31a: first guide rod

32a: The first sealing part

33a: first elastic element

4.4a: Gas inlet

41a: second guide rod

42a: The second sealing part

43a: second elastic element

5, 5a: vacuum device

51: Dry vacuum pump

52: Vacuum valve

53: Vacuum suction parts

6, 6a: Inert gas introduction device

61: Nitrogen inlet pipe

62: Nitrogen valve

63: filter element

The first figure is a perspective view of a preferred embodiment of the present invention.

The second figure is a cross-sectional view along the line A-A in the first figure of the preferred embodiment of the present invention.

The third figure is a block flow diagram of the steps of the preferred embodiment of the present invention.

The fourth figure is a schematic diagram of the storage of the preferred embodiment of the present invention.

The fifth figure is a schematic diagram of the vacuum of the preferred embodiment of the present invention.

The sixth figure is a schematic diagram of filling in a preferred embodiment of the present invention.

The seventh figure is a schematic drawing of the preferred embodiment of the present invention.

The eighth figure is a schematic diagram of the action of the gas outlet of another preferred embodiment of the present invention.

The ninth figure is a schematic diagram of the operation of the gas inlet of another preferred embodiment of the present invention.

The tenth figure is a schematic diagram of the reduction seal of another preferred embodiment of the present invention.

In order to achieve the above-mentioned purposes and effects, the technical means and structure adopted by the present invention are illustrated in detail below to illustrate the characteristics and functions of the preferred embodiments of the present invention, so as to fully understand.

Please refer to Figures 1 to 3, which are a three-dimensional perspective view to a block flow diagram of a preferred embodiment of the present invention. From the figures, it can be clearly seen that the present invention includes:

A wafer box carrier 1;

An accommodating space 11 is defined in the wafer box carrier 1;

A container cover 12 is movably arranged on one side of the wafer box carrier 1 to seal the accommodating space 11;

A wafer box body 2 is housed in the accommodating space 11;

A gas outlet 3 is arranged on one side of the wafer boat box body 2 to communicate with the accommodating space 11 and the inside of the wafer boat box body 2;

A gas inlet 4 is arranged on one side of the wafer boat box body 2 to communicate with the accommodating space 11 and the inside of the wafer boat box body 2;

A vacuum device 5 is installed on the wafer box carrier 1 for connecting the gas outlet 3;

An inert gas introduction device 6 is installed on the wafer box carrier 1 for connecting the gas introduction member 4;

A filter element 63 is arranged between the inert gas introduction device 6 and the gas introduction member 4.

The main steps of the vacuum gas replacement method of the wafer boat box of the present invention include:

(a) Containing the wafer boat box body: placing a wafer boat box body in the accommodating space of a wafer boat box carrier, and sealing the accommodating space with a container cover on the side of the wafer boat box carrier;

(b) Drive the vacuum device: drive a vacuum device and connect it to the gas outlet on the side of the wafer box body, so that the wafer box body and the accommodating space form a vacuum state;

(c) Drive the inert gas introduction device: turn off the vacuum device and drive an inert gas introduction device, and connect it to the gas introduction part on the side of the wafer box body, so that the inert gas can fill the wafer box body after passing through a filter element And in the accommodating space;

(d) Take out the wafer boat box body: close the inert gas introduction device and open the container cover to take out the wafer boat box body.

Through the above description, the structure of this technology can be understood, and according to the corresponding cooperation of this structure, the advantages of ensuring the wafer storage quality in the wafer box body 2 and improving the gas purity in the wafer boat box body 2 can be achieved. , And the detailed explanation will be explained below.

Please also refer to the first to seventh figures, which are the perspective view to the schematic drawing of the preferred embodiment of the present invention. When the above-mentioned components are assembled, it can be clearly seen from the figure that the wafer box box The carrier 1 is an open-top container; the container lid 12 is an upper lid pivoted on one side of the wafer box carrier 1, and can be used with a sealing strip 121 to enhance the sealing effect of the accommodating space 11 after the container lid 12 is closed. The gas outlet 3 and the gas inlet 4 are suction nozzles used to close the wafer box body 2; the vacuum device 5 includes a dry vacuum pump 51, a vacuum valve 52 connected to the side of the dry vacuum pump 51, and a connecting gas outlet The vacuum suction part 53 of the part 3; the inert gas introduction device 6 includes a nitrogen introduction pipe 61 and a nitrogen valve 62 connected to one side of the nitrogen introduction pipe 61. The corresponding types of the above-mentioned elements are only examples of preferred embodiments, and any types with the same function belong to the scope of the present invention and are not limited to the above-mentioned examples.

As shown in the fourth figure and step (a), in actual use, first open the container cover 12 of the wafer box carrier 1 upwards, and use the overhead hoist transfer (OHT) system commonly known as overhead cranes. The wafer boat box body 2 is loaded into the wafer boat box carrier 1 from top to bottom, and then the container cover 12 is closed, so that the accommodating space 11 forms a closed space.

As shown in Figure 5 and step (b), after the wafer boat box body 2 is positioned, the vacuum suction member 53 of the vacuum device 5 is connected to the gas outlet member 3 at the bottom of the wafer boat box body 2, and the vacuum of the vacuum device 5 is turned on The valve 52 and the dry vacuum pump 51 that activate the vacuum device 5 are used to extract the general atmosphere in the wafer boat box body 2 through the vacuum suction member 53, and since the gas outlet 3 of the wafer boat box body 2 has been connected to the wafer boat box body 2 Therefore, the action of the vacuum device 5 can actually be extracted together with the general atmosphere in the accommodating space 11. For the storage environment of the wafer 21, this vacuuming action can simultaneously combine the accommodating space 11 and the wafer box body 2 The gas inside (including water vapor in the air) is discharged, so the longer the vacuuming time, the better the effect of the vacuum environment.

As shown in Figure 6 and step (c), the dry vacuum pump 51 of the vacuum device 5 is then turned off, the vacuuming operation is stopped, and the nitrogen introduction pipe 61 of the inert gas introduction device 6 is connected to the gas at the bottom of the crystal boat body 2 The introduction part 4 and the nitrogen valve 62 of the inert gas introduction device 6 are opened to fill nitrogen into the wafer box body 2 through the nitrogen introduction pipe 61 until the nitrogen completely fills the accommodating space 11 and the inside of the wafer box body 2, and The inert gas output by the inert gas introduction device 6 will pass through the filter element 63 first, so that the gas input into the wafer box body 2 is free of dust particles and avoid damaging the wafer 21 inside. At this time, since the gas outlet 3 of the wafer boat box body 2 has been separated from the wafer boat box body 2, the action of the inert gas introduction device 6 can actually be filled with nitrogen together with the accommodating space 11.

As shown in Figure 7 and step (d), the inert gas introduction device 6 is then closed, the nitrogen filling action is stopped, the gas outlet 3 and the gas introduction member 4 are restored to the state of the closed wafer box body 2, and then opened The container cover 12 allows the nitrogen in the accommodating space 11 to be discharged for a period of time, that is, the wafer boat box body 2 can be taken out by a crane. Since the gas outlet 3 and the gas inlet 4 of the wafer boat box body 2 are adjusted to the closed state, the wafer boat box body 2 is still in the containing space 11 filled with nitrogen, and the wafer boat box body 2 and the containing space 11 The gas pressure is the same, so there will be no leakage of nitrogen or general air mixing into the inside of the wafer boat box body 2, thereby ensuring the purity of the gas in the wafer boat box body 2 and providing the best environment for storing the wafer 21.

Please also refer to Figures 8 to 10 at the same time, which are the schematic diagram of the operation of the gas outlet of another preferred embodiment of the present invention to the schematic diagram of the reduction seal. The embodiments are similar, and only have a gas outlet 22 on the main body 2a of the wafer boat box. a and a gas inlet 23a. The gas outlet 3a has a first guide rod 31a movably penetrating the gas outlet 22a, and a first guide rod 31a provided on one side of the first guide rod 31a and located outside the gas outlet 22a. A sealing portion 32a, and a first elastic element 33a provided on the first guide rod 31a so that the first sealing portion 32a closes the gas outlet 22a, and the gas inlet 4a has a movable through the gas inlet The second guide rod 41a of the port 23a, a second sealing portion 42a provided on the side of the second guide rod 41a and located inside the gas inlet 23a, and a second sealing portion 42a provided on the second guide rod 41a so that the second The sealing portion 42a closes the second elastic element 43a of the gas inlet 23a.

According to the above structure, after step (a) of accommodating the wafer box body 2a, step (a1) and step (a2) can be further performed. As shown in Figure 8, when the vacuum device 5a is opened, the accommodating space 11a performs vacuum evacuation. When the air pressure in the accommodating space 11a is lower than the air pressure in the wafer box body 2a, the gas outlet 3a is pulled out due to the negative pressure effect, causing the first sealing portion 32a of the gas outlet 3a to interact with each other. The gas outlet 22a is separated. At this time, the vacuum device 5a can simultaneously vacuum the inside of the wafer boat box body 2a and the accommodating space 11a, and the inside of the wafer boat box body 2a and the accommodating space 11a are in a vacuum state at the same time. When the vacuum device 5a is closed. And when the inside of the wafer box body 2a is in pressure balance with the accommodating space 11a, the gas outlet 3a utilizes the elastic force of a first elastic element 33a to move the gas outlet 3a along the direction of its first guide rod 31a, and The first sealing portion 32a of the gas outlet 3a closes the gas outlet 22a.

According to the above structure, after step (b) of driving the vacuum device 5a, step (b1) can be further performed. As shown in Figure 9, when the inert gas introduction device 6a outputs the inert gas, the gas is pushed by the gas pressure The inlet 4a separates the second sealing portion 42a of the gas inlet 4a from the gas inlet 23a, and when the gas pressure inside the wafer box body 2a is greater than the accommodating space 11a, the gas outlet 3a is made using the pressure difference between the inside and the outside The first sealing portion 32a is separated from the gas outlet 22a. At this time, the inert gas in the wafer boat box body 2a will flow out to the accommodating space 11a. And the accommodating space 11a is filled with inert gas at the same time.

According to the above structure, after step (c) of driving the inert gas introduction device 6a, step (c1) can be further performed. The outlet piece 3a will again close the gas outlet 22a, and the gas inlet piece 4a uses the elastic force of a second elastic element 43a to make the gas inlet piece 4a follow its second guiding rod 41 Moving in the direction a, the second sealing portion 42a of the gas introduction member 4a closes the gas introduction port 23a. The first elastic element 33a is a tension spring, which is located near the inner side of the wafer box body 2a. When the first sealing portion 32a is pulled out, the first sealing portion 32a can be pulled back by its elastic force, and the pulling action The positional relationship between the first guide rod 31a and the gas outlet 22a can be used to limit the gas outlet 3a to only linearly move. In the same way, the second elastic element 43a is also a tension spring, which is arranged at a position close to the outside of the wafer box body 2a. When the second sealing portion 42a is pushed out, its elastic force can be used to pull the second sealing portion 42a back. The pull-back action can utilize the positional relationship between the second guide rod 41a and the gas inlet 23a to limit the gas inlet 4a to only linearly move.

However, the above description is only the preferred embodiments of the present invention, which does not limit the patent scope of the present invention. Therefore, all simple modifications and equivalent structural changes made by using the description and drawings of the present invention should be the same. It is included in the scope of the patent of the present invention, and is hereby stated.

In summary, the vacuum gas replacement device and method of the wafer box box of the present invention can indeed achieve its effects and purposes when used. Therefore, the present invention is truly an invention with excellent practicability and is in line with invention patents. For application requirements, Yan filed an application in accordance with the law. I hope that the review committee will grant the invention as soon as possible to protect the creator's hard work. If the review committee has any doubts, please feel free to write instructions.

1: Wafer box carrier

11: accommodating space

12: Container lid

2: Wafer box body

3: Gas outlet

4: Gas inlet

5: Vacuum device

6: Inert gas introduction device

63: filter element

Claims (8)

A vacuum gas replacement device for the wafer box, which mainly includes: A wafer box carrier; An accommodating space is defined in the wafer box carrier; A container cover movably arranged on one side of the wafer box carrier to seal the accommodating space; A wafer box body is housed in the accommodating space; A gas outlet piece is arranged on one side of the wafer boat box body to communicate with the accommodating space and the inside of the wafer boat box body; A gas inlet is arranged on one side of the wafer boat box body to communicate with the accommodating space and the inside of the wafer boat box body; A vacuum device is installed on the wafer box carrier for connecting the gas outlet; An inert gas introduction device is provided on the wafer box carrier for connecting the gas introduction member; A filter element is arranged between the inert gas introduction device and the gas introduction part. The vacuum gas replacement device of the wafer boat box described in the first item of the scope of patent application, wherein the wafer box body has a gas outlet, and the gas outlet has a first movably penetrating the gas outlet The guide rod, a first sealing part arranged on one side of the first guide rod and outside the gas outlet, and a first elastic element arranged on the first guide rod to close the first sealing part The gas outlet. The vacuum gas replacement device of the wafer boat box described in the first item of the scope of patent application, wherein the wafer box body has a gas inlet, and the gas inlet has a second movably through the gas inlet The guide rod, a second sealing part arranged on one side of the second guide rod and inside the gas inlet, and a second elastic element arranged on the second guide rod to close the second sealing part The gas inlet. A vacuum gas replacement method for a wafer box, the main steps include: (a) Put a wafer boat box body into the accommodating space of a wafer boat box carrier, and seal the accommodating space with a container cover on one side of the wafer boat box carrier; (b) Drive a vacuum device and connect it to the gas outlet on the side of the wafer boat box body, so as to form a vacuum state in the wafer boat box body and the accommodating space; (c) Turn off the vacuum device and drive an inert gas introduction device to connect it to the gas introduction part on the side of the wafer box body, so that the inert gas fills the wafer box body and its contents after passing through a filter element. In the space (d) Close the inert gas introduction device and open the container cover to take out the wafer box body. As described in item 4 of the scope of patent application, the vacuum gas replacement method of the wafer box, wherein step (a) is followed by step (a1) the vacuum device first evacuates the accommodating space, so that the gas outlet is caused by the pressure difference Separate from the gas outlet of the wafer box body. The vacuum gas replacement method of the wafer boat box described in item 5 of the scope of patent application, wherein step (a2) is performed after step (a1) when the pressure inside the wafer box body and the accommodating space is balanced, the gas outlet is used The elastic force of a first elastic element causes the gas outlet to move along the direction of the first guide rod, and the first sealing part of the gas outlet to close the gas outlet. As described in item 6 of the scope of patent application, the vacuum gas replacement method of the wafer boat box, wherein step (b) is followed by step (b1) the inert gas introduction device first performs inert gas on the wafer box body from the gas inlet Introduce to separate the gas outlet from the gas outlet of the wafer box body due to the pressure difference. As described in item 7 of the scope of patent application, the vacuum gas replacement method of the wafer box, wherein step (c) is followed by step (c1) after the pressure of the wafer box body and the accommodating space is balanced, the gas outlet member closes the gas guide At the same time, the gas inlet uses the elastic force of a second elastic element to move the gas inlet along the direction of the second guide rod, and the second sealing part of the gas inlet closes the gas inlet.

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