TWI737804B - Measurement and monitoring methods of abnormal CVD deposition process - Google Patents

Abstract

The present invention is a method for measuring and monitoring abnormalities of CVD deposition process. It is triggered by a sensor during the process of exiting from the entrance and exit of the CVD process machine after the glass substrate is deposited by the CVD process machine. Control the shooting unit to use the monochromatic light source to illuminate the image of the finished glass substrate with the shooting lens, quickly capture the visual measurement calculation of the CVD deposition film on the glass substrate and the edge of the glass substrate, and record it to the storage unit , The software of the judgment unit compares the offset distance of the deposited film, and automatically measures and monitors the offset of the CVD deposited film to meet the real-time and quantitative monitoring mechanism.

Description

Measurement and monitoring methods of abnormal CVD deposition process

The present invention relates to a measurement and monitoring method, in particular to a measurement and monitoring method of abnormal CVD deposition process.

The current TFT (Thin Film Transistor) CVD (Chemical Vapor Deposition) process uses PECVD (Plasma Enhanced Chemical Vapor Deposition). CVD is a high-temperature process and has A large amount of chemical gas flows in, and the glass substrate will be deformed due to high temperature, which will easily cause the position of the glass substrate to move and cause fragments. The shadow frame can fix the glass substrate to prevent the displacement from causing fragments.

Therefore, the TFT CVD deposition process requires a mask frame to cover the glass, and then conduct the electrification of the film deposition. However, once the robot Alignment in the vacuum of the machine is shifted, the mask frame covers the glass incompletely, which will cause The problem of glass fragmentation in the vacuum chamber (Chamber) or Mura (various traces caused by uneven brightness) occurs during the process. The current production line method is to be monitored by personnel through regular sampling and visual inspection, which highlights the lack of instant film deposition in the machine process The offset monitoring mechanism is used as a method of prediction and monitoring to prevent machine failures or after product abnormalities. This not only wastes manpower, cannot achieve real-time monitoring, and the monitoring effect is not good.

In view of the abnormality of the conventional CVD deposition film migration process, the inventors are monitored by personnel using timed sampling and visual inspection methods. It has the above-mentioned shortcomings. Therefore, it is based on the idea of thinking and creation. After this revision and improvement, the present invention was finally launched.

The present invention provides a method for measuring and monitoring abnormalities in a CVD deposition process. A measurement and monitoring system is set up on the outside of a CVD process machine. The front of the CVD process machine is provided with an entrance and exit. The measurement and The monitoring system includes: a photographing unit, a storage unit, and a judging unit. The photographing unit has two monochromatic light sources, at least one sensor, and two photographing lenses. The two monochromatic light sources are set downward on the CVD process machine On both sides above the entrance and exit of the stage, the sensors are arranged around the entrance and exit of the CVD process machine, and the two shooting lenses are arranged upwards on both sides below the entrance and the entrance of the CVD process machine. The CVD deposition process is abnormal. The measurement and monitoring method includes the following steps: (1) The glass substrate is inserted into the entrance and exit of the CVD process machine for the power-on film deposition process. After the glass substrate is deposited by the CVD process machine, the CVD process machine When the entrance and exit exit, the sensor of the shooting unit senses the trigger signal; (2) During the process of exiting the entrance and exit of the CVD process machine from the glass substrate that has been deposited, control the second monochromatic light source of the shooting unit to match the second shooting The lens captures the image of the glass substrate with the deposited film, and quickly captures the visual measurement calculation of the CVD deposited film on the glass substrate and the edge of the glass substrate; (3) Captures and records the accounting information of the glass substrate and the offset measurement of the deposited film The data is sent to the storage unit; (4) The software of the judgment unit compares the above-mentioned measurement data. Once the offset distance of the sinking film exceeds the standard, it is judged as a defective product and is handed over to the production line personnel for subsequent processing, such as sinking film offset If the distance does not exceed the standard, it is judged to be a good product and transported to the next process for follow-up operations.

The main purpose of the method for measuring and monitoring the abnormality of the CVD deposition process of the present invention is that after each piece of glass substrate is deposited by the CVD process machine, it can be automatically carried out when it is withdrawn from the entrance and exit of the CVD process machine. The offset measurement and monitoring of CVD deposition film meets the real-time and quantitative monitoring mechanism, saving manpower and comprehensive monitoring.

Please refer to the first figure, the second figure, the third figure and the fourth figure. The method for measuring and monitoring abnormalities in the CVD deposition process of the present invention is to set up a measurement and monitoring system 10 on a CVD process machine Outside of the stage 20, the front of the CVD process machine 20 is provided with an entrance 21. When the CVD process machine 20 is in operation, the glass substrate 30 is clamped by a robot arm and placed into the CVD process machine 20 through the entrance 21, and the film is deposited by electricity. After the film deposition is completed, the glass substrate 30 is clamped by the robotic arm and the CVD process machine 20 is drawn out from the entrance 21. The measurement and monitoring system 10 includes: a photographing unit 11, a storage unit 12, and a determination unit 13. The photographing unit 11 has two monochromatic light sources 111, two sensors 112, and two photographing lenses 113. The two monochromatic light sources 111 are arranged downward on both sides above the entrance 21 of the CVD process machine 20. The monochromatic lamp The source 111 uses one of red, green, and blue (three primary colors). The sensor 112 is arranged around the entrance 21 of the CVD process machine 20, and the two shooting lenses 113 are arranged on the CVD process machine 20 facing upwards. On the two sides below the entrance 21, the two shooting lenses 113 are photoelectric coupling elements (CCD).

The method for measuring and monitoring abnormalities in the CVD deposition process of the present invention includes the following steps:

(1) Trigger signal step 100. The glass substrate 30 is inserted into the entrance and exit 21 of the CVD process machine 20 for the power-on film deposition process. After the glass substrate 30 is deposited by the CVD process machine 20, the CVD process machine 20 When the entrance and exit 21 exit, the sensor 112 of the photographing unit 11 senses the trigger signal.

(2) Image capture step 200, during the process of exiting the entrance and exit 21 of the CVD process machine 20 of the glass substrate 30 that has been deposited, control the shooting unit 11 of the second monochromatic light source 111 to illuminate and the second shooting lens 113 to shoot This completes the image of the four corners of the glass substrate 30 that has been deposited, and quickly captures the CVD deposited film on the glass substrate 30 and the visual measurement calculation of the edge of the glass substrate 30.

(3) In the recording step 300, the captured account information of the glass substrate 30 and the offset measurement data of the deposited film are recorded to the storage unit 12.

(4) In the comparison step 400, the software of the judging unit 13 compares the above-mentioned measurement data. Once the offset distance of the deposited film exceeds the standard, it is judged as a defective product (NG) and is handed over to the production line personnel for subsequent processing, such as If the offset distance of the sinking film does not exceed the standard, it is judged as good (OK) and transported to the next process for follow-up operations.

From the structure of the above specific embodiment, the following benefits can be obtained:

The method for measuring and monitoring the abnormality of the CVD deposition process of the present invention is that after each piece of glass substrate 30 is deposited by the CVD process machine 20, when it exits from the entrance and exit 21 of the CVD process machine 20, it uses shooting The image method is used for automatic measurement and monitoring of CVD deposition film offset, which meets the real-time and quantitative monitoring mechanism, achieves the effect of saving manpower and comprehensive monitoring, and greatly improves the product yield.

10‧‧‧Measurement and monitoring system 11‧‧‧Shooting unit 111‧‧‧Monochrome light source 112‧‧‧Sensor 113‧‧‧Shooting lens 12‧‧‧Storage unit 13‧‧‧Judging unit 20‧‧ ‧CVD process machine 21‧‧‧Entrance 30‧‧‧Glass substrate 100‧‧‧Trigger signal step 200‧‧‧Image capture step 300‧‧‧Recording step 400‧‧‧Comparison step

The first figure is a schematic diagram of the structure of the present invention. The second figure is a three-dimensional view of the photographing unit of the present invention installed on a CVD process machine. The third figure is a schematic diagram of the shooting action of the shooting unit of the present invention. The fourth diagram is a flow block diagram of the present invention.

111‧‧‧Monochrome light source

112‧‧‧Sensor

113‧‧‧Shooting lens

20‧‧‧CVD process machine

21‧‧‧Entrance and exit

Claims (4)

A method for measuring and monitoring abnormalities in the CVD deposition process. The measurement and monitoring system is set up on the outside of a CVD process machine. The front of the CVD process machine is provided with an entrance and exit. The measurement and monitoring system includes : A photographing unit, a storage unit and a judging unit. The photographing unit has two light sources, at least one sensor and two photographing lenses. The two light sources are arranged downward on both sides of the entrance and exit of the CVD process machine. The sensor is arranged around the entrance and exit of the CVD process machine, and the two shooting lenses are arranged upwards on both sides of the entrance and the entrance of the CVD process machine. The method for measuring and monitoring abnormalities of the CVD deposition film offset process includes The following steps: (1) The glass substrate is put into the entrance and exit of the CVD process machine for the power-on film deposition process. When the glass substrate is deposited by the CVD process machine, it is taken out of the entrance and exit of the CVD process machine. The sensor of the unit senses the trigger signal; (2) During the process of exiting the entrance and exit of the CVD process machine from the glass substrate that has been deposited, control the second light source of the shooting unit to irradiate the second camera lens to photograph the deposited glass substrate Quickly capture the CVD deposition film on the glass substrate and the visual measurement calculation of the edge of the glass substrate; (3) Capture and record the account information of the glass substrate and the deposition offset measurement data to the storage unit; (4) The software of the judgment unit compares the above-mentioned measurement data. Once the offset distance of the sinking film exceeds the standard, it is judged as a defective product and is handed over to the production line staff for subsequent processing. If the sinking film offset distance does not exceed the standard, it is judged as a good product. , Transport to the next process for follow-up operations. The method for measuring and monitoring abnormalities in the CVD deposition process as described in the first item of the patent application, wherein the light source is a monochromatic light source, and the monochromatic light source adopts red, green, and blue (three primary colors) One of them. The method for measuring and monitoring abnormalities of the CVD deposition film offset process described in the first item of the scope of patent application, wherein the shooting lens is a photoelectric coupling device (CCD). The method for measuring and monitoring abnormalities in the CVD deposition process deviation described in the first item of the scope of patent application, wherein the step (2) is to take images of the four corners of the glass substrate on which the deposition is completed.

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