TWI735630B - Mask holding device - Google Patents

Mask holding device Download PDF

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Publication number
TWI735630B
TWI735630B TW106125893A TW106125893A TWI735630B TW I735630 B TWI735630 B TW I735630B TW 106125893 A TW106125893 A TW 106125893A TW 106125893 A TW106125893 A TW 106125893A TW I735630 B TWI735630 B TW I735630B
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linear motor
frame
pin
screw member
rotor
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TW106125893A
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Chinese (zh)
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TW201809901A (en
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米澤良
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日商V科技股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682Mask-wafer alignment

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

本發明可於將光罩固定於沿大致鉛直方向設置之框架之狀態下穩定地使光罩旋轉。 The present invention can stably rotate the photomask in a state where the photomask is fixed to a frame arranged in a substantially vertical direction.

於平台載置移動部,並且於移動部載置光罩保持部40,光罩保持部40具有將被檢查對象之光罩M沿大致鉛直方向保持之大致框狀之框架41、及使框架41旋轉之旋轉機構43。旋轉機構43具有:第1螺母構件433A及第2螺母構件433B,其等設置於位於框架之下側之框部分之兩端附近;第1螺紋構件432A及第2螺紋構件432B,其等與第1螺母構件433A及第2螺母構件433B分別螺合;及旋轉驅動部431,其使第1螺紋構件432A及第2螺紋構件432B以不同之量旋轉。又,於移動部,沿大致鉛直方向設置第1銷438A及第2銷438B,第1螺紋構件432A於第1銷438A之上方設於在俯視時與第1銷438A重疊之位置,第2螺紋構件432B於第2銷438B之上方設於在俯視時與第2銷438B重疊之位置。 A moving part is placed on the platform, and a mask holding part 40 is placed on the moving part. The mask holding part 40 has a substantially frame-shaped frame 41 that holds the mask M of the inspection object in a substantially vertical direction, and a frame 41 Rotating rotating mechanism 43. The rotating mechanism 43 has: a first nut member 433A and a second nut member 433B, which are provided near both ends of the frame portion located on the lower side of the frame; a first screw member 432A and a second screw member 432B, which are the same as the The 1 nut member 433A and the second nut member 433B are respectively screwed together; and the rotation driving part 431 which rotates the first screw member 432A and the second screw member 432B by different amounts. In addition, the moving part is provided with a first pin 438A and a second pin 438B along a substantially vertical direction. The first screw member 432A is provided above the first pin 438A at a position overlapping the first pin 438A in a plan view. The member 432B is provided above the second pin 438B at a position overlapping the second pin 438B in a plan view.

Description

光罩保持裝置 Mask holding device

本發明係關於一種光罩保持裝置。 The invention relates to a mask holding device.

於專利文獻1中揭示有一種將基板垂直地保持之基板保持器。該基板保持器具有供放置基板之下側之兩端附近之2個可偏心旋轉之支持輥、供基板之側面抵接之1個可偏心旋轉之支持輥、及將基板壓抵於該等支持輥之彈簧,且使基板相對於基板保持器旋轉。 Patent Document 1 discloses a substrate holder that vertically holds a substrate. The substrate holder has two eccentrically rotatable support rollers near the two ends of the lower side of the substrate, one eccentrically rotatable support roller for the side surface of the substrate to abut, and press the substrate against the supports The spring of the roller rotates the substrate relative to the substrate holder.

[先前技術文獻] [Prior Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利特公表2007-504675號公報 [Patent Document 1] Japanese Patent Publication No. 2007-504675

然而,於專利文獻1所記載之發明中,無法將基板牢固地固定於基板保持器,有因載台之加速度或衝擊等而導致基板相對於基板保持器移動之虞。 However, in the invention described in Patent Document 1, the substrate cannot be firmly fixed to the substrate holder, and the substrate may move relative to the substrate holder due to acceleration or impact of the stage.

本發明係鑒於此種情況而完成者,其目的在於提供一種能夠 於將光罩固定於沿大致鉛直方向設置之框架之狀態下穩定地使光罩旋轉的光罩保持裝置。 The present invention was completed in view of this situation, and its purpose is to provide a A photomask holding device that stably rotates the photomask in a state where the photomask is fixed to a frame arranged in a substantially vertical direction.

為了解決上述問題,本發明之光罩保持裝置之特徵在於:具備光罩保持部及移動部,該光罩保持部例如具有平台、將被檢查對象之光罩沿大致鉛直方向保持之大致框狀之框架、及使上述框架旋轉之旋轉機構,該移動部係載置於上述平台,並且供載置上述光罩保持部,且以可沿上述平台之長度方向移動之方式設置,上述旋轉機構具有:第1螺母構件及第2螺母構件,其等設置於位於上述框架之下側之框部分之兩端附近;第1螺紋構件及第2螺紋構件,其等與上述第1螺母構件及上述第2螺母構件分別螺合;及旋轉驅動部,其使上述第1螺紋及上述第2螺紋以不同之量旋轉;於上述移動部,沿大致鉛直方向設置第1銷及第2銷,上述第1螺紋構件係於上述第1銷之上方設於在俯視時與上述第1銷重疊之位置,且上述第2螺紋構件係於上述第2銷之上方設於在俯視時與上述第2銷重疊之位置。 In order to solve the above-mentioned problems, the photomask holding device of the present invention is characterized by having a photomask holding portion and a moving portion. The photomask holding portion has, for example, a platform and a substantially frame shape that holds the photomask of the inspection object in a substantially vertical direction. The frame and the rotating mechanism for rotating the frame, the moving part is placed on the platform, and the mask holding part is placed on it, and is arranged to be movable along the length direction of the platform, and the rotating mechanism has : The first nut member and the second nut member are provided near the ends of the frame portion located on the lower side of the frame; the first screw member and the second screw member, etc. are the same as the first nut member and the second 2 nut members are respectively screwed; and a rotation driving part that rotates the first thread and the second thread by different amounts; the moving part is provided with a first pin and a second pin in a substantially vertical direction, and the first A screw member is provided above the first pin at a position overlapping the first pin in a plan view, and the second screw member is provided above the second pin at a position that overlaps the second pin in a plan view. Location.

根據本發明之光罩保持裝置,於平台載置移動部並且於移動部載置光罩保持部,光罩保持部具有將被檢查對象之光罩沿大致鉛直方向保持之大致框狀之框架及使框架旋轉之旋轉機構。而且,旋轉機構具有:第1螺母構件及第2螺母構件,其等設置於位於框架之下側之框部分之兩端附近;第1螺紋構件及第2螺紋構件,其等與第1螺母構件及第2螺母構件分別螺合;及旋轉驅動部,其使第1螺紋構件與第2螺紋構件以不同之量旋轉。藉此,能夠於將光罩固定於沿大致鉛直方向設置之框架之狀態下 使框架(即光罩)旋轉。又,於移動部,沿大致鉛直方向設置第1銷及第2銷,第1螺紋構件係於第1銷之上方設於在俯視時與第1銷重疊之位置,第2螺紋構件係於第2銷之上方設於在俯視時與第2銷重疊之位置。如此,利用剛性較高之第1銷及第2銷支承光罩保持部之載重,並且使第1螺紋構件與第2螺紋構件以不同之量旋轉,藉此,能夠穩定地使框架(即光罩)旋轉。 According to the photomask holding device of the present invention, the moving part is placed on the platform and the photomask holding part is placed on the moving part. The photomask holding part has a substantially frame-shaped frame that holds the photomask of the inspection object in a substantially vertical direction, and Rotating mechanism that rotates the frame. Furthermore, the rotating mechanism has: a first nut member and a second nut member, which are provided near both ends of the frame portion located on the lower side of the frame; a first screw member and a second screw member, which are the same as the first nut member And the second nut member are respectively screwed together; and a rotation driving part that rotates the first screw member and the second screw member by different amounts. With this, the photomask can be fixed to the frame arranged in the substantially vertical direction. Rotate the frame (that is, the photomask). In addition, the moving part is provided with a first pin and a second pin in a substantially vertical direction. The first screw member is provided above the first pin at a position overlapping the first pin in a plan view, and the second screw member is located on the first pin. The upper part of the 2 pin is set at a position overlapping with the 2 pin in a plan view. In this way, the first and second pins with higher rigidity are used to support the load of the mask holding portion, and the first screw member and the second screw member are rotated by different amounts, whereby the frame (that is, the light The cover) rotates.

此處,亦可於上述框架之側面設置用以使光於入射方向返回之反射鏡,上述旋轉驅動部具有:致動器;第1鏈輪,其與上述第1螺紋構件同軸地設置,使上述第1螺紋構件旋轉;第2鏈輪,其與上述第2螺紋構件同軸地設置,使上述第2螺紋構件旋轉;及動力傳遞部,其將致動器之驅動軸與上述第1鏈輪及上述第2鏈輪連結;在俯視時,將上述反射鏡與上述第2螺紋構件之距離設為距離A,將上述反射鏡與上述第1螺紋構件之距離設為距離B,則上述第1鏈輪之齒數α與上述第2鏈輪之齒數β具有齒數α:齒數=距離A:距離B之關係。藉此,能夠以連結第1鏈輪與第2鏈輪之大致平行之線與包含反射鏡之大致鉛直方向之線交叉之位置不移動之方式使框架旋轉。再者,反射鏡係成為框架之位置測定之基準之零件。因此,對反射鏡之位置進行測定而獲得之光罩之位置與本來應存在之光罩之位置不會產生偏移。 Here, a mirror for returning light in the incident direction may also be provided on the side surface of the frame, and the rotation driving part has: an actuator; a first sprocket, which is arranged coaxially with the first screw member, The first screw member rotates; the second sprocket is arranged coaxially with the second screw member to rotate the second screw member; and a power transmission unit that connects the drive shaft of the actuator with the first sprocket And the second sprocket; in a plan view, the distance between the reflector and the second screw member is set to distance A, and the distance between the reflector and the first screw member is set to distance B, then the first The number of teeth α of the sprocket and the number of teeth β of the second sprocket have a relationship of the number of teeth α: number of teeth = distance A: distance B. Thereby, the frame can be rotated so that the position where the substantially parallel line connecting the first sprocket and the second sprocket intersects with the substantially vertical line including the mirror does not move. Furthermore, the reflector is a part that becomes the reference for the position determination of the frame. Therefore, the position of the mask obtained by measuring the position of the reflector will not deviate from the position of the mask that should exist.

此處,亦可於上述平台之上表面形成沿上述平台之長度方向之槽,上述移動部具有:下表面氣墊,其朝向上述槽之底面噴出空氣;側面氣墊,其朝向上述槽之側面噴出空氣;及移動構件本體,其設置上述下表面氣墊及上述側面氣墊;上述第1銷及上述第2銷中,下端設置於上述 下表面氣墊且上端設置於上述移動構件本體,上述第1螺紋構件及上述第2螺紋構件係下端設置於上述移動構件本體,且上述移動構件本體沿上述槽移動。藉此,能夠使光罩保持部之載重經由下表面氣墊而由剛性較高之槽支承。又,於側面氣墊與槽之間、及下表面氣墊與槽之底面之間形成空氣層,因此,能夠使移動部或光罩保持部容易地移動。 Here, a groove along the longitudinal direction of the platform may also be formed on the upper surface of the platform, and the moving part has: a lower surface air cushion which sprays air toward the bottom surface of the groove; a side air cushion which sprays air toward the side surface of the groove And the moving member body, which is provided with the lower surface air cushion and the side air cushion; in the first pin and the second pin, the lower end is set in the above The lower surface is air-cushioned and the upper end is arranged on the moving member body, the lower ends of the first screw member and the second screw member are arranged on the moving member body, and the moving member body moves along the groove. Thereby, the load of the mask holding part can be supported by the groove with high rigidity via the lower surface air cushion. In addition, an air layer is formed between the side air cushion and the groove, and between the lower surface air cushion and the bottom surface of the groove, so that the moving part or the mask holding part can be easily moved.

此處,亦可為,上述下表面氣墊具有設置於上述移動構件本體之第1端附近之第1下表面氣墊、及設置於上述移動構件本體之與上述第1端為相反側之第2端附近之第2下表面氣墊,於上述第1下表面氣墊之底面大致中央部,形成噴出空氣之第1開口部,於上述第2下表面氣墊之底面大致中央部,形成噴出空氣之第2開口部,上述第1螺紋構件及上述第1銷設於在俯視時與上述第1開口部重疊之位置,且上述第2螺紋構件及上述第2銷設於在俯視時與上述第2開口部重疊之位置。藉此,可藉由設置於移動構件本體之兩端附近之下表面氣墊而穩定地支承光罩保持部。又,支承光罩保持部之載重之第1螺紋構件及第1銷、第2螺紋構件及上述第2銷位於與下表面氣墊之底面上所形成之開口部(形成於下表面氣墊之底面大致中央部)於俯視時重疊之位置,因此,即便檢查對象之光罩M之重量發生變化,亦不會對移動構件本體造成力矩變化。因此,可藉由下表面氣墊使光罩保持部穩定地浮起。 Here, the lower surface air cushion may have a first lower surface air cushion provided near the first end of the moving member body, and a second end provided on the moving member body opposite to the first end. The second lower surface air cushion in the vicinity forms a first opening for blowing air at approximately the center of the bottom surface of the first lower surface air cushion, and a second opening for blowing air is formed at approximately the center of the bottom surface of the second lower surface air cushion. Part, the first screw member and the first pin are provided at a position overlapping the first opening in a plan view, and the second screw member and the second pin are provided at a position overlapping the second opening in a plan view的的位置。 The location. Thereby, the mask holding portion can be stably supported by the air cushions provided on the lower surface near both ends of the moving member body. In addition, the first screw member and the first pin, the second screw member, and the second pin that support the load of the mask holding portion are located in the opening formed on the bottom surface of the lower surface air cushion (formed on the bottom surface of the lower surface air cushion approximately The central part) overlaps in a plan view. Therefore, even if the weight of the mask M of the inspection object changes, it will not cause a torque change to the moving member body. Therefore, the mask holding portion can be stably floated by the air cushion on the lower surface.

此處,亦可於上述移動構件本體之上表面側,分別於中心軸與上述第1銷大致一致之位置設置第1斜角滾珠軸承,於中心軸與上述第2銷大致一致之位置設置第2斜角滾珠軸承,上述第1螺紋構件之下端樞轉支承於上述第1斜角滾珠軸承,且上述第2螺紋構件之下端樞轉支承於上 述第2斜角滾珠軸承。藉此,即便由於框架之旋轉而受到徑向載重及軸向載重,亦能夠順暢地使第1螺紋構件或第2螺紋構件旋轉。 Here, on the upper surface side of the moving member body, a first bevel ball bearing may be provided at a position where the central axis is substantially coincident with the first pin, and a first angular ball bearing may be provided at a position where the central axis is substantially coincident with the second pin. 2 Bevel ball bearings, the lower end of the first screw member is pivotally supported by the first bevel ball bearing, and the lower end of the second screw member is pivotally supported on the upper Describe the second angular ball bearing. Thereby, even if a radial load and an axial load are received due to the rotation of the frame, the first screw member or the second screw member can be smoothly rotated.

此處,亦可具有使上述移動部沿上述平台之長度方向移動之第1線性馬達、及追隨上述第1線性馬達而驅動之第2線性馬達,於上述移動部設置上述第1線性馬達之轉子,於上述框架之上側,以相對於水平方向傾斜之方式設置導引構件,於上述導引構件,以可沿上述導引構件移動之方式設置上述第2線性馬達之轉子,並且設置使上述第2線性馬達之轉子相對於上述導引構件固定之固定構件。藉此,可使用第1線性馬達及第2線性馬達使框架等穩定地移動。又,即便伴隨框架之旋轉而第2線性馬達之轉子之位置發生改變,亦能夠再重新調整為正確之相位位置,因此,可無問題地驅動上部線性馬達。 Here, there may be a first linear motor that moves the moving part along the longitudinal direction of the platform, and a second linear motor driven by following the first linear motor, and the rotor of the first linear motor is provided on the moving part , On the upper side of the frame, a guide member is provided so as to be inclined with respect to the horizontal direction, and the rotor of the second linear motor is provided on the guide member so as to be movable along the guide member, and the rotor of the second linear motor is provided so that the first 2 A fixed member in which the rotor of the linear motor is fixed to the above-mentioned guide member. Thereby, the frame etc. can be moved stably by using the 1st linear motor and the 2nd linear motor. In addition, even if the position of the rotor of the second linear motor changes with the rotation of the frame, it can be readjusted to the correct phase position. Therefore, the upper linear motor can be driven without problems.

根據本發明,能夠於將光罩固定於沿大致鉛直方向設置之框架之狀態下穩定地使光罩旋轉。 According to the present invention, it is possible to stably rotate the photomask in a state where the photomask is fixed to a frame arranged in a substantially vertical direction.

1:光罩檢查裝置 1: Optical mask inspection device

10:平台 10: Platform

10a:下表面 10a: lower surface

10b、10c:凹部 10b, 10c: recess

10d:支持面 10d: Support surface

10e:上表面 10e: upper surface

10f:槽 10f: slot

10g、10h:側面 10g, 10h: side

10i:底面 10i: bottom surface

14f:板部 14f: Board Department

20:攝像部 20: Camera Department

21:柱 21: Column

22、22a、22b:相機 22, 22a, 22b: camera

23a、23b:照射部 23a, 23b: Irradiation part

24:安裝構件 24: Install components

30:移動部 30: Mobile Department

31:移動構件本體 31: Moving component body

31a、31b:側面 31a, 31b: side

31c、31d:孔 31c, 31d: hole

31e、31f:孔 31e, 31f: hole

32、33:側面氣墊 32, 33: side air cushion

32a、33a:前端面 32a, 33a: front face

32b:結合部 32b: Joint

33b:滑動部 33b: Sliding part

32c、33c:氣墊部 32c, 33c: Air cushion

32d、33d:貫通孔 32d, 33d: through hole

32e、33e:孔口 32e, 33e: orifice

33f:前端面 33f: Front face

34、341、342:下表面氣墊 34, 341, 342: lower surface air cushion

34a:貫通孔 34a: Through hole

34b:孔口 34b: Orifice

34c:下表面 34c: lower surface

34d:側面 34d: side

34e:孔 34e: hole

34f:開口部 34f: opening

35:凸部 35: convex

36:彈性構件 36: Elastic member

37:塞子 37: Stopper

38、39:配管 38, 39: Piping

40:光罩保持部 40: Mask holding part

41:框架 41: Frame

41a:爪部 41a: Claw

41b、41c:反射器 41b, 41c: reflector

41d:下框部分 41d: Lower frame part

41e:上框部分 41e: upper frame part

41f:保持部 41f: Holding part

41g:保持構件 41g: holding member

42:調整機構 42: adjustment mechanism

42a:第1塊體 42a: Block 1

42b:第2塊體 42b: The second block

43:旋轉機構 43: Rotating mechanism

51、52:減振台 51, 52: Vibration damping table

53:光源 53: light source

54:導光構件 54: Light guide member

61:下部線性馬達 61: Lower linear motor

61a:轉子 61a: Rotor

62:上部線性馬達 62: Upper linear motor

62a:轉子 62a: Rotor

63:轉子導件 63: Rotor guide

64:制動機構 64: brake mechanism

65:彈性構件 65: elastic member

71:上部框 71: upper frame

72:定位用銷 72: positioning pin

73:板部 73: Board Department

74:柱 74: Column

141:輸入輸出裝置 141: Input and output devices

142:網路 142: Network

143:記憶媒體 143: Memory Media

151:CPU 151: CPU

151a:控制部 151a: Control Department

152:RAM 152: RAM

153:ROM 153: ROM

154:輸入輸出介面 154: Input and output interface

155:通訊介面 155: Communication interface

156:媒體介面 156: Media Interface

163:目標座標計算部 163: Target Coordinate Calculation Department

431:旋轉驅動部 431: Rotation Drive

431a:輸出軸 431a: output shaft

432A:第1螺紋構件 432A: 1st threaded member

432B:第2螺紋構件 432B: 2nd screw member

433A:第1螺母構件 433A: The first nut member

433B:第2螺母構件 433B: 2nd nut member

434、434a、435、436:鏈輪 434, 434a, 435, 436: sprocket

437、437a、437b:動力傳遞部 437, 437a, 437b: power transmission part

438A:第1銷 438A: Pin 1

438B:第2銷 438B: 2nd pin

438a:球狀部 438a: spherical part

438b:棒狀部 438b: Rod

438c:孔 438c: hole

439A:第1軸承 439A: 1st bearing

439B:第2軸承 439B: 2nd bearing

圖1係表示第1實施形態之光罩檢查裝置1之概略之立體圖。 FIG. 1 is a perspective view showing the outline of the mask inspection apparatus 1 of the first embodiment.

圖2係表示光罩檢查裝置1之概略之前視圖。 FIG. 2 is a schematic front view showing the mask inspection device 1.

圖3係表示移動部30之概略之圖。 FIG. 3 is a diagram showing the outline of the moving part 30.

圖4係用以說明移動部30之概略圖,且係將光罩檢查裝置1局部放大之俯視圖。 FIG. 4 is a schematic diagram for explaining the moving part 30, and is a plan view showing a part of the mask inspection device 1 enlarged.

圖5係表示光罩保持部40、尤其是框架41及旋轉機構43之概略之圖。 FIG. 5 is a diagram showing the outline of the mask holding portion 40, especially the frame 41 and the rotation mechanism 43. As shown in FIG.

圖6係表示旋轉機構43之概略之圖。 FIG. 6 is a diagram showing the outline of the rotating mechanism 43. As shown in FIG.

圖7係表示反射器41b及向反射器41b照射光之照射部23a之概略之立體圖。 FIG. 7 is a schematic perspective view showing the reflector 41b and the irradiation part 23a that irradiates light to the reflector 41b.

圖8係對轉子62a及其移動機構進行說明之圖。 Fig. 8 is a diagram illustrating the rotor 62a and its moving mechanism.

圖9係表示光罩檢查裝置1之電氣構成之方塊圖。 FIG. 9 is a block diagram showing the electrical structure of the photomask inspection device 1. As shown in FIG.

圖10係對控制部151a所進行之下部線性馬達61(轉子61a)、上部線性馬達62(轉子62a)之控制進行說明之圖。 Fig. 10 is a diagram illustrating the control of the lower linear motor 61 (rotor 61a) and the upper linear motor 62 (rotor 62a) performed by the control unit 151a.

以下,參照圖式對本發明之實施形態進行詳細說明。本發明之檢查裝置係於大致鉛直方向上保持被檢查對象之光罩M,並使相機等於大致鉛直方向上移動而檢查光罩M上所形成之圖案之缺陷。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The inspection device of the present invention holds the mask M of the inspected object in a substantially vertical direction, and makes the camera move in the substantially vertical direction to inspect the defects of the pattern formed on the mask M.

於本實施形態中,設為檢查對象之光罩M係用以製造例如有機EL或液晶顯示裝置之顯示裝置用之基板之曝光用光罩。光罩M係於一邊為1m左右之大型之大致矩形形狀之基板上形成1個或多個影像裝置用轉印圖案而成者。本實施形態尤其適於形成有高密度之圖案而需要高感度之檢查的有機EL顯示器用之光罩M之檢查。 In this embodiment, the photomask M set as the inspection object is an exposure photomask for manufacturing a substrate for a display device such as an organic EL or liquid crystal display device. The mask M is formed by forming one or more image device transfer patterns on a large, substantially rectangular substrate with a side of about 1 m. This embodiment is particularly suitable for the inspection of the photomask M for the organic EL display which is formed with high-density patterns and requires high-sensitivity inspection.

<第1實施形態> <First Embodiment>

圖1係表示第1實施形態之光罩檢查裝置1之概略之立體圖。圖2係表示光罩檢查裝置1之概略之前視圖。於本說明書中,將大致沿平台10(於下文進行詳細敍述)之長度方向之方向定義為x方向,將鉛 直方向定義為y方向,將與x方向及y方向正交之方向定義為z方向。再者,於圖1、2中,為了說明而對一部分構成省略圖示。 FIG. 1 is a perspective view showing the outline of the mask inspection apparatus 1 of the first embodiment. FIG. 2 is a schematic front view showing the mask inspection device 1. In this specification, the direction roughly along the length of the platform 10 (described in detail below) is defined as the x direction, and the lead The straight direction is defined as the y direction, and the direction orthogonal to the x direction and the y direction is defined as the z direction. In addition, in FIGS. 1 and 2, the illustration of a part of the configuration is omitted for description.

光罩檢查裝置1主要具有平台10、攝像部20、移動部30、光罩保持部40及減振台51、52。 The mask inspection apparatus 1 mainly includes a platform 10, an imaging unit 20, a moving unit 30, a mask holding unit 40, and vibration damping tables 51 and 52.

平台10構成為載台,支持於設置於設置面F上之多處(6處)之減振台51、52上。 The platform 10 is configured as a carrier, and is supported on the vibration damping tables 51 and 52 installed at multiple locations (6 locations) on the installation surface F.

平台10係橫寬W為4500mm左右、深度D為1200mm左右、厚度T為400mm左右之大致長方體形狀(厚板狀)之石製構件。平台10具有下表面10a及與下表面10a平行之上表面10e。 The platform 10 is a stone member of a substantially rectangular parallelepiped shape (thick plate shape) with a horizontal width W of about 4500 mm, a depth D of about 1200 mm, and a thickness T of about 400 mm. The platform 10 has a lower surface 10a and an upper surface 10e parallel to the lower surface 10a.

於平台10之下表面10a,形成大致立方體形狀之凹部10b、10c。凹部10b係於下表面10a之4個角之各者,各形成一處。凹部10c係沿下表面10a之長邊分別各形成一處,合計形成2處。為了保持平台10之強度,而將凹部10b、10c之深度D1設為平台10之厚度T之0.3~0.5倍。又,凹部10b、10c之深度D1、即支持面10d之高度係以如下方式設定:自支持面10d仰視光罩檢查裝置1整體之重心G之角度θ(參照圖2)成為60度以下之儘可能小之角度(例如,大致30度)。 On the lower surface 10a of the platform 10, recesses 10b and 10c of substantially cubic shape are formed. The concave portion 10b is formed at each of the four corners of the lower surface 10a, and is formed in one place. The recesses 10c are formed at one place each along the long side of the lower surface 10a, forming two places in total. In order to maintain the strength of the platform 10, the depth D1 of the recesses 10b and 10c is set to be 0.3 to 0.5 times the thickness T of the platform 10. In addition, the depth D1 of the recesses 10b and 10c, that is, the height of the support surface 10d, is set as follows: the angle θ (refer to FIG. 2) of the center of gravity G of the entirety of the mask inspection device 1 as viewed from the support surface 10d is less than 60 degrees Possibly a small angle (for example, approximately 30 degrees).

於凹部10b之內部,設置載置於設置面F上之減振台51。於凹部10c之內部,設置載置於設置面F上之減振台52。減振台51係主動減振台,減振台52係支承重量之被動減振台。減振台51、52業已公知,因此省略說明。 Inside the recess 10b, a vibration damping table 51 placed on the installation surface F is provided. Inside the recess 10c, a vibration damping table 52 placed on the installation surface F is provided. The damping table 51 is an active damping table, and the damping table 52 is a passive damping table that supports the weight. The vibration damping tables 51 and 52 are already known, so the description is omitted.

減振台51、52之高度高於凹部10b、10c之深度D1。因此,藉由減振台51、52支持支持面10d,而平台10經由減振台51、52而載置於 設置面F上。藉此,能夠降低以支持面10d為基準時之光罩檢查裝置1之重心G。 The height of the damping tables 51, 52 is higher than the depth D1 of the recesses 10b, 10c. Therefore, the support surface 10d is supported by the vibration damping tables 51 and 52, and the platform 10 is placed on the vibration damping tables 51 and 52 Set face F on. Thereby, it is possible to lower the center of gravity G of the photomask inspection apparatus 1 when the support surface 10d is used as a reference.

於平台10之上表面10e,形成槽10f(上表面10e包含槽10f)。槽10f係使移動部30移動時之導件。為了提高平台10之強度,槽10f係沿平台10之長度方向(x方向)而形成於俯視時(自+y方向觀察時)不與凹部10b、10c重疊之位置。 On the upper surface 10e of the platform 10, a groove 10f is formed (the upper surface 10e includes the groove 10f). The groove 10f is a guide when the moving part 30 is moved. In order to improve the strength of the platform 10, the groove 10f is formed along the length direction (x direction) of the platform 10 at a position where it does not overlap the recesses 10b and 10c when viewed from the +y direction.

槽10f之深度D2遠小於平台10之厚度T。又,為了使重心G成為最低,而槽10f之深度D2係以如下方式設定:相機22a(於下文進行詳細敍述)抵接於上表面10e時之相機22之光軸ax(參照圖2)與由移動部30(於下文進行詳細敍述)支持之光罩M之下端一致。於本實施形態中,槽10f之深度D2為60mm左右。因此,即便形成槽10f,亦能夠使平台10之剛性為充分高之狀態。 The depth D2 of the groove 10f is much smaller than the thickness T of the platform 10. In addition, in order to make the center of gravity G the lowest, the depth D2 of the groove 10f is set as follows: the optical axis ax of the camera 22 (refer to FIG. 2) when the camera 22a (described in detail below) abuts on the upper surface 10e The lower end of the mask M supported by the moving part 30 (described in detail below) is consistent. In this embodiment, the depth D2 of the groove 10f is about 60 mm. Therefore, even if the groove 10f is formed, the rigidity of the platform 10 can be sufficiently high.

攝像部20主要具有自平台10向上方突出而設置之柱21、設置於柱21之相機22(參照圖2)及設置於柱21之照射部23a、23b(參照圖1)。 The imaging unit 20 mainly includes a pillar 21 protruding upward from the platform 10, a camera 22 (refer to FIG. 2) provided on the pillar 21, and irradiation parts 23a and 23b (refer to FIG. 1) provided on the pillar 21.

柱21係以自上表面10e向上方(+y方向)突出之方式安裝於平台10。柱21由陶瓷等形成。為了降低重心G,較佳為將柱21製成中空。 The column 21 is installed on the platform 10 so as to protrude upward (+y direction) from the upper surface 10e. The pillar 21 is formed of ceramics or the like. In order to lower the center of gravity G, it is preferable to make the column 21 hollow.

相機22係例如CCD相機或作為特殊之CCD相機之TDI相機,具有2個相機22a、22b。相機22a、22b分別具有將g光線及e光線轉換為平行光之物鏡、將通過物鏡之g光線與e光線分離之光學構件(例如,同時具有偏振分光鏡與分色濾光片之功能之構件)、使經光學構件分離之g 光線及e光線分別成像之2組成像透鏡、及使利用2組成像透鏡成像之g光線及e光線分別圖像化之攝像元件。如此,相機22a、22b能夠使透射光與反射光同時圖像化。再者,相機22a、22b可使用業已公知之技術,因此,省略詳細之說明。 The camera 22 is, for example, a CCD camera or a TDI camera as a special CCD camera, and has two cameras 22a and 22b. The cameras 22a and 22b respectively have an objective lens that converts g-ray and e-ray into parallel light, and an optical member that separates g-ray and e-ray passing through the objective lens (for example, a member that has the functions of a polarizing beam splitter and a dichroic filter at the same time ), g separated by optical components The two-component imaging lens for forming light and e-rays separately, and the imaging element for imaging the g-ray and e-ray that are imaged by the two-component imaging lens. In this way, the cameras 22a and 22b can simultaneously image the transmitted light and the reflected light. Furthermore, the cameras 22a and 22b can use well-known technologies, and therefore, detailed descriptions are omitted.

相機22a、22b係沿y方向相鄰設置2個。於相機22與柱21之間設置包含氣墊(未圖示)之移動機構(未圖示)。於該移動機構,以光軸ax與z軸平行之方式設置相機22。 Two cameras 22a and 22b are arranged adjacent to each other in the y direction. A moving mechanism (not shown) including an air cushion (not shown) is provided between the camera 22 and the column 21. In the moving mechanism, the camera 22 is set so that the optical axis ax and the z axis are parallel.

藉由未圖示之移動機構於上下方向(y方向)上移動,而相機22於上下方向(y方向)上移動。移動機構使2個相機22a、22b於相機22a抵接於平台10之上表面10e之初始位置與相機22b位於柱21之上端附近之上端位置(參照圖2之二點鏈線)之間沿柱21移動。 The camera 22 moves in the vertical direction (y direction) by a moving mechanism not shown in the figure. The moving mechanism makes the two cameras 22a and 22b move along the column between the initial position where the camera 22a abuts on the upper surface 10e of the platform 10 and the upper end position of the camera 22b near the upper end of the column 21 (refer to the two-dot chain line in FIG. 2). 21 mobile.

又,攝像部20具有未圖示之透射照明光源及反射照明光源。透射照明光源係設置於光罩M之背面側(-z側),照射所謂之g光線(例如波長為435.84[nm]之光)。反射照明光源係設置於光罩M之正面側(+z側),照射所謂之e光線(例如波長為546.07[nm]之光)。相機22同時接收自透射照明光源照射之g光線及自反射照明光源照射之e光線之光,並使其等圖像化。藉由將以此方式利用相機22所獲得之圖像與圖案資訊(於下文進行詳細敍述)加以比較,而進行光罩M之檢查。 In addition, the imaging unit 20 has a transmission illumination light source and a reflection illumination light source which are not shown. The transmitted illumination light source is installed on the back side (-z side) of the mask M, and irradiates the so-called g-ray (for example, light with a wavelength of 435.84 [nm]). The reflected illumination light source is arranged on the front side (+z side) of the mask M, and irradiates the so-called e-ray (for example, light with a wavelength of 546.07 [nm]). The camera 22 simultaneously receives the light of the g-ray irradiated from the transmission illumination light source and the e-ray irradiated from the self-reflective illumination light source, and images them. The inspection of the mask M is performed by comparing the image obtained by using the camera 22 in this way with the pattern information (described in detail below).

再者,相機22之數量並不限於2個,亦可為1個(相機22a、22b之一者)。然而,於使用2個相機22a、22b之情形時,分別利用相機22a、22b對光罩M之檢查區域之下半部分及上半部分進行拍攝,將各部分之攝像資料與圖案資訊加以比較,藉此,與使用1個相機之情形相比,可獲得2 倍之效率。因此,較理想為相機22具有2個相機22a、22b。 Furthermore, the number of cameras 22 is not limited to two, and may be one (one of the cameras 22a and 22b). However, when two cameras 22a and 22b are used, the cameras 22a and 22b are used to photograph the lower part and the upper part of the inspection area of the mask M, and the photographic data of each part is compared with the pattern information. By this, compared with the case of using 1 camera, 2 Times the efficiency. Therefore, it is preferable that the camera 22 has two cameras 22a and 22b.

照射部23a係例如線性干涉儀,且設置於柱21。自光源53(參照圖1)照射之光經由導光構件54(參照圖1)等而導向照射部23a。照射部23a將所導入之光沿大致水平方向朝向反射器41b照射。關於照射部23a,將於下文進行詳細敍述。 The irradiation unit 23a is, for example, a linear interferometer, and is provided on the column 21. The light irradiated from the light source 53 (see FIG. 1) is guided to the irradiating portion 23a via the light guide member 54 (see FIG. 1) and the like. The irradiating part 23a irradiates the introduced light toward the reflector 41b in a substantially horizontal direction. The irradiation part 23a will be described in detail below.

移動部30載置於平台10,並且供載置包含保持光罩M之框架41(於下文進行詳細敍述)之光罩保持部40。圖3係表示移動部30之概略之圖。移動部30主要具有移動構件本體31、側面氣墊32、33、下表面氣墊34(341、342)及凸部35。 The moving part 30 is placed on the platform 10, and a mask holding part 40 including a frame 41 (described in detail below) for holding the mask M is placed. FIG. 3 is a diagram showing the outline of the moving part 30. The moving part 30 mainly includes a moving member body 31, side air cushions 32 and 33, a lower surface air cushion 34 (341, 342 ), and a convex part 35.

移動構件本體31係於上方設置光罩保持部40之棒狀構件。為了輕量化,而移動構件本體31由鋁形成。於移動構件本體31之側面,設置側面氣墊32、33。關於側面氣墊32、33,將於下文進行詳細敍述。 The moving member main body 31 is a rod-shaped member in which a mask holding portion 40 is provided on the upper side. In order to reduce the weight, the moving member body 31 is formed of aluminum. On the side surface of the moving member body 31, side air cushions 32 and 33 are provided. The side air cushions 32 and 33 will be described in detail below.

又,於移動構件本體31之下側,設置下表面氣墊34。下表面氣墊34係俯視時(自上方(+y方向)觀察時)為大致矩形形狀之構件,具有設置於移動構件本體31之+x側之端之下表面氣墊341及設置於移動構件本體31之-x側之端之下表面氣墊342。下表面氣墊341經由第1銷438A(於圖3中省略圖示,參照圖5、6,於下文進行詳細敍述)而設置於移動構件本體31之下側(-y側),下表面氣墊342經由第2銷438B(於圖3中省略圖示,參照圖5、6,於下文進行詳細敍述)而設置於移動構件本體31之下側。下表面氣墊34中下表面氣墊341與下表面氣墊342為相同構成。關於下表面氣墊341、342,將於下文進行詳細敍述。 In addition, a lower surface air cushion 34 is provided on the lower side of the moving member main body 31. The bottom surface air cushion 34 is a substantially rectangular member in plan view (when viewed from above (+y direction)), and has a bottom surface air cushion 341 provided on the +x side end of the moving member body 31 and installed on the moving member body 31 The air cushion 342 on the lower surface of the end of the -x side. The lower surface air cushion 341 is provided on the lower side (-y side) of the moving member body 31 via the first pin 438A (illustration omitted in FIG. 3, refer to FIGS. 5 and 6 and described in detail below), and the lower surface air cushion 342 The second pin 438B (illustration omitted in FIG. 3, refer to FIGS. 5 and 6 and described in detail below) is provided on the lower side of the moving member main body 31. In the lower surface air cushion 34, the lower surface air cushion 341 and the lower surface air cushion 342 have the same structure. The lower surface air cushions 341 and 342 will be described in detail below.

於移動構件本體31之上側,設置凸部35。凸部35係板狀 構件,於內部設置第1軸承439A或第2軸承439B(於圖4中省略圖示,參照圖5、6,於下文進行詳細敍述)。 On the upper side of the moving member body 31, a convex portion 35 is provided. Convex 35 is plate-shaped As the component, a first bearing 439A or a second bearing 439B is provided inside (illustration is omitted in FIG. 4, and is described in detail below with reference to FIGS. 5 and 6).

圖4係用以說明移動部30之概略圖,且係將光罩檢查裝置1局部放大之俯視圖。於圖4中,以粗虛線箭頭表示空氣之流動。 FIG. 4 is a schematic diagram for explaining the moving part 30, and is a plan view showing a part of the mask inspection device 1 enlarged. In Figure 4, the flow of air is represented by a thick dashed arrow.

側面氣墊32、33係大致圓筒形狀之構件。側面氣墊32係設置於移動構件本體31之側面31a,側面氣墊33係設置於與側面31a為相反側之側面31b。側面氣墊32之前端面32a與槽10f之側面10g對向,側面氣墊33之前端面33a與槽10f之側面10h對向。再者,前端面32a所對向之側面10g係基準面,以較高之精度(例如,面精度為2μm左右,非基準面之側面10h之面精度為5μm左右)形成。 The side air cushions 32 and 33 are substantially cylindrical members. The side air cushion 32 is provided on the side surface 31a of the moving member body 31, and the side air cushion 33 is provided on the side surface 31b opposite to the side surface 31a. The front end surface 32a of the side air cushion 32 opposes the side surface 10g of the groove 10f, and the front end surface 33a of the side air cushion 33 opposes the side surface 10h of the groove 10f. Furthermore, the side surface 10g facing the front end surface 32a is a reference surface, and is formed with high accuracy (for example, the surface accuracy of the side surface 10h is about 2 μm, and the surface accuracy of the non-reference surface 10h is about 5 μm).

側面氣墊32具有大致圓筒形狀之結合部32b及大致圓筒形狀之氣墊部32c。結合部32b之直徑小於氣墊部32c之直徑,而得以保持結合部32b之前端面與孔31c之底面抵接之狀態。結合部32b設置於形成於移動構件本體31之孔31c之內部。於結合部32b之外周面與孔31c之內周面之間,設置彈性構件36(例如,O型環)。 The side air cushion 32 has a substantially cylindrical joint portion 32b and a substantially cylindrical air cushion portion 32c. The diameter of the connecting portion 32b is smaller than the diameter of the air cushion portion 32c, so that the front end surface of the connecting portion 32b is in contact with the bottom surface of the hole 31c. The coupling portion 32b is provided inside the hole 31c formed in the main body 31 of the moving member. Between the outer peripheral surface of the coupling portion 32b and the inner peripheral surface of the hole 31c, an elastic member 36 (for example, an O-ring) is provided.

側面氣墊33具有大致圓筒形狀之滑動部33b及大致圓筒形狀之氣墊部33c。滑動部33b之直徑小於氣墊部33c之直徑。又,滑動部33b係可相對於移動構件本體31移動地設置於具有較滑動部33b之直徑大之直徑之孔31d之內部(於下文進行詳細敍述)。於滑動部33b之外周面與孔31d之內周面之間,設置彈性構件36,以使所供給之空氣不逸出。 The side air cushion 33 has a sliding portion 33b having a substantially cylindrical shape and an air cushion portion 33c having a substantially cylindrical shape. The diameter of the sliding portion 33b is smaller than the diameter of the air cushion portion 33c. In addition, the sliding portion 33b is movably provided in the hole 31d having a diameter larger than that of the sliding portion 33b so as to be movable relative to the moving member main body 31 (described in detail below). Between the outer circumferential surface of the sliding portion 33b and the inner circumferential surface of the hole 31d, an elastic member 36 is provided so that the supplied air does not escape.

於側面氣墊32、33,分別於內部形成貫通孔32d、33d。於貫通孔32d、33d之內部,形成有孔口32e、33e。貫通孔32d、33d與形成於 移動構件本體31之管狀之孔31e連接。孔31e係自未圖示之泵等供給之空氣之通路,且一端由塞子37覆蓋,另一端與配管38連結,上述配管38與泵等連結。其結果,經由配管38而對孔31d與滑動部33b之間之空間及貫通孔32d、33d供給空氣。 In the side air cushions 32 and 33, through holes 32d and 33d are formed inside, respectively. Inside the through holes 32d and 33d, holes 32e and 33e are formed. The through holes 32d and 33d are formed in The tubular hole 31e of the moving member body 31 is connected. The hole 31e is a passage of air supplied from a pump or the like not shown, and one end is covered by a plug 37, and the other end is connected to a pipe 38, which is connected to a pump or the like. As a result, air is supplied to the space between the hole 31d and the sliding portion 33b and the through holes 32d and 33d through the pipe 38.

供給至貫通孔32d之空氣通過孔口32e而自貫通孔32d之前端面32a側之開口部朝向側面10g噴出(參照圖4之粗虛線箭頭)。又,供給至貫通孔33d之空氣通過孔口33e而自貫通孔33d之前端面33a側之開口部朝向側面10h噴出(參照圖4之粗虛線箭頭)。藉此,於側面10g與側面氣墊32之前端面32a之間及側面10h與側面氣墊33之前端面33a之間形成較薄之空氣層。 The air supplied to the through-hole 32d passes through the orifice 32e and is ejected from the opening on the front end surface 32a side of the through-hole 32d toward the side surface 10g (refer to the thick broken line arrow in FIG. 4). In addition, the air supplied to the through hole 33d passes through the orifice 33e and is ejected from the opening on the front end surface 33a side of the through hole 33d toward the side surface 10h (refer to the thick broken line arrow in FIG. 4). Thereby, a thinner air layer is formed between the side surface 10g and the front end surface 32a of the side air cushion 32 and between the side surface 10h and the front end surface 33a of the side air cushion 33.

供給至滑動部33b與孔31d之間之空間之空氣推壓滑動部33b之前端面33f,而使滑動部33b於側面31b之法線方向(z方向)上移動。藉由滑動部33b於z方向上移動,而自動地調整側面10g與前端面32a之間隔及側面10h與前端面33a之間隔。 The air supplied to the space between the sliding portion 33b and the hole 31d presses the front end surface 33f of the sliding portion 33b to move the sliding portion 33b in the normal direction (z direction) of the side surface 31b. By moving the sliding portion 33b in the z direction, the distance between the side surface 10g and the front end surface 32a and the distance between the side surface 10h and the front end surface 33a are automatically adjusted.

若將前端面33f之面積設為SPI,將自貫通孔32d、33d噴出之空氣之壓力設為PPI,則對滑動部33b、即側面氣墊33施加之力f為SPI與PPI之積(f=SPI×PPI)。為了配合槽10f之寬度使側面氣墊33移動,而必須相較於側面氣墊33、即前端面33a之面積SPd減小前端面33f之面積SPI(於本實施形態中,面積SPI為面積SPd之0.5~0.8倍左右)。側面氣墊32、即前端面32a之面積係與前端面33a之面積相同之面積SPd,因此,移動構件本體31於槽10f中自動地保持其位置。 If the area of the front end surface 33f is set to S PI and the pressure of the air ejected from the through holes 32d and 33d is set to P PI , the force f applied to the sliding portion 33b, that is, the side air cushion 33 is the difference between S PI and P PI Product (f=S PI ×P PI ). In order to move the side air cushion 33 according to the width of the groove 10f, the area S PI of the front end surface 33f must be reduced compared to the side air cushion 33, that is, the area S Pd of the front end surface 33a (in this embodiment, the area S PI is the area 0.5~0.8 times of S Pd). Cushion 32 side, i.e., the area of the front end face area 32a of the system and the distal end surface 33a of the same area S Pd, therefore, the movable member body 31 in the groove 10f automatically held in its position.

經由側面10g與前端面32a之間及側面10h與前端面33a之 間所形成之較薄之空氣層而側面氣墊32、33使槽10f之側面擴張。由於平台10為石製,且槽10f之尺寸不變化,故而側面氣墊32、33即移動部30由槽10f導引。 Between the side surface 10g and the front end surface 32a and between the side surface 10h and the front end surface 33a The thinner air layer formed between the side air cushions 32 and 33 expands the side surface of the groove 10f. Since the platform 10 is made of stone and the size of the groove 10f does not change, the side air cushions 32, 33, that is, the moving part 30, are guided by the groove 10f.

滑動部33b之直徑小於孔31d之直徑,因此,滑動部33b之中心軸可相對於孔31d之中心軸(移動構件本體31之形成有孔31d之側面之法線方向)傾斜。因此,於側面10g與側面10h不平行之情形時,亦能夠使側面10g與前端面32a平行,使側面10h與前端面33a平行。 The diameter of the sliding portion 33b is smaller than the diameter of the hole 31d. Therefore, the central axis of the sliding portion 33b can be inclined with respect to the central axis of the hole 31d (the normal direction of the side surface of the movable member body 31 where the hole 31d is formed). Therefore, even when the side surface 10g and the side surface 10h are not parallel, the side surface 10g can be made parallel to the front end surface 32a, and the side surface 10h can be made parallel to the front end surface 33a.

於下表面氣墊341、342(於圖4中省略圖示),於內部形成管狀之貫通孔34a。貫通孔34a係自未圖示之泵等供給之空氣之通路。貫通孔34a係一端於下表面34c開口,另一端於側面34d開口。貫通孔34a之於側面34d開口之開口部與配管39連結,上述配管39與泵等連結。其結果,經由配管39而對貫通孔34a供給空氣。 On the lower surface of the air cushions 341, 342 (not shown in FIG. 4), a tubular through hole 34a is formed inside. The through hole 34a is a passage for air supplied from a pump or the like not shown. One end of the through hole 34a is opened on the lower surface 34c, and the other end is opened on the side surface 34d. The opening portion of the through hole 34a that opens on the side surface 34d is connected to a pipe 39, and the pipe 39 is connected to a pump or the like. As a result, air is supplied to the through hole 34a via the pipe 39.

自配管39供給至貫通孔34a之空氣通過孔口34b(於圖4中省略圖示,參照圖6),而自下表面氣墊341、342之下表面34c側之開口部34f朝向槽10f之底面10i噴出。其結果,藉由自貫通孔34a噴出之空氣,而於底面10i與下表面34c之間形成較薄之空氣層(參照圖6之虛線箭頭)。藉此,下表面氣墊341、342自槽10f之底面浮起。 The air supplied from the pipe 39 to the through hole 34a passes through the orifice 34b (not shown in FIG. 4, refer to FIG. 6), and the opening 34f on the side of the lower surface 34c of the lower surface air cushions 341, 342 faces the bottom surface of the groove 10f 10i squirted. As a result, by the air ejected from the through hole 34a, a thin air layer is formed between the bottom surface 10i and the lower surface 34c (refer to the dashed arrow in FIG. 6). Thereby, the lower surface air cushions 341 and 342 float from the bottom surface of the groove 10f.

返回至圖1、2之說明。光罩保持部40主要具有框架41、變更光罩M之下邊之高度方向(y方向)之位置之調整機構42(於圖2中省略圖示)及使框架41旋轉之旋轉機構43。 Return to the description of Figures 1 and 2. The mask holding portion 40 mainly includes a frame 41, an adjustment mechanism 42 (not shown in FIG. 2) that changes the position of the lower side of the mask M in the height direction (y direction), and a rotation mechanism 43 that rotates the frame 41.

框架41以包圍保持鉛直之光罩M之外周之方式形成為大致框狀。框架41係成為位置檢測等之基準之基準框。 The frame 41 is formed in a substantially frame shape so as to surround the outer periphery of the mask M maintained in a vertical direction. The frame 41 is a reference frame that serves as a reference for position detection and the like.

框架41係以光罩M之表面(形成有圖案之面)與xy平面平行之方式保持光罩M。於框架41,設置多個抓持光罩M之爪部41a(於圖2中省略圖示)。 The frame 41 holds the mask M such that the surface of the mask M (the surface on which the pattern is formed) is parallel to the xy plane. The frame 41 is provided with a plurality of claws 41a for gripping the mask M (illustration omitted in FIG. 2).

於框架41之上側,設置定子62a(於下文進行詳細敍述)。又,於框架41之上側,設置保持部41f。保持部41f以不與定子62a重疊之方式錯開設置於框架41之背側(-z側)。保持部41f例如係氣墊,夾持設置於上部框71之薄板狀之板部73。藉此,以框架41不會以x軸為中心傾斜之方式支持框架41。再者,氣墊41可使用業已公知之技術,因此,省略詳細之說明。 On the upper side of the frame 41, a stator 62a (described in detail below) is provided. In addition, on the upper side of the frame 41, a holding portion 41f is provided. The holding portion 41f is staggeredly opened and placed on the back side (-z side) of the frame 41 so as not to overlap the stator 62a. The holding portion 41f is, for example, an air cushion, and sandwiches the thin plate-shaped plate portion 73 provided on the upper frame 71. Thereby, the frame 41 is supported so that the frame 41 does not incline with the x-axis as the center. Furthermore, the air cushion 41 can use a well-known technology, and therefore, a detailed description is omitted.

於框架41之側面,以沿橫向(x方向)突出之方式設置反射器41b、41c。反射器41b、41c係使光於入射方向返回之反射鏡(例如復歸反射器),用於檢測框架41之x方向之位置。反射器41b係設置於框架41之下端附近,反射器41c係設置於框架41之上端附近。關於反射器41b、41c,將於下文進行詳細敍述。 On the side surface of the frame 41, reflectors 41b and 41c are provided in a manner protruding in the lateral direction (x direction). The reflectors 41b and 41c are mirrors (such as retroreflectors) that return light in the incident direction, and are used to detect the position of the frame 41 in the x direction. The reflector 41b is disposed near the lower end of the frame 41, and the reflector 41c is disposed near the upper end of the frame 41. The reflectors 41b and 41c will be described in detail below.

於框架41之下方,設置調整機構42及旋轉機構43。調整機構42沿x方向形成多個。調整機構42具有上表面相對於xz平面傾斜之第1塊體42a及下表面相對於xz平面傾斜之第2塊體42b,藉由改變第1塊體42a與第2塊體42b之相對位置關係,而進行高度之調整。調整機構42業已公知,因此,省略詳細之說明。 Below the frame 41, an adjustment mechanism 42 and a rotation mechanism 43 are provided. The adjustment mechanism 42 is formed in plural along the x direction. The adjustment mechanism 42 has a first block 42a whose upper surface is inclined with respect to the xz plane and a second block 42b whose lower surface is inclined with respect to the xz plane, by changing the relative positional relationship between the first block 42a and the second block 42b , And adjust the height. The adjustment mechanism 42 is already known, and therefore, a detailed description is omitted.

旋轉機構43係設置於位於框架41之下側之框部分之兩端附近。以下,對旋轉機構43進行詳細說明。 The rotating mechanism 43 is arranged near both ends of the frame part located on the lower side of the frame 41. Hereinafter, the rotation mechanism 43 will be described in detail.

圖5係表示光罩保持部40、尤其是框架41及旋轉機構43 之概略之圖。於圖5中,省略爪部41a及調整機構42之圖示。圖6係表示旋轉機構43之概略之圖。又,於圖6中,以粗虛線箭頭表示空氣之流動。 FIG. 5 shows the mask holder 40, especially the frame 41 and the rotating mechanism 43 The schematic diagram. In FIG. 5, illustration of the claw portion 41a and the adjustment mechanism 42 is omitted. FIG. 6 is a diagram showing the outline of the rotating mechanism 43. As shown in FIG. In addition, in Fig. 6, the flow of air is indicated by a thick dashed arrow.

再者,第1螺紋構件432A、第1螺母構件433A、第1銷438A及第1軸承439A、與第2螺紋構件432B、第2螺母構件433B、第2銷438B及第2軸承439B為相同構成。因此,於圖6中,僅對第1螺紋構件432A、第1螺母構件433A、第1銷438A及第1軸承439A進行圖示。又,於圖6中,省略對調整機構42及動力傳遞部437之圖示。 Furthermore, the first screw member 432A, the first nut member 433A, the first pin 438A, and the first bearing 439A have the same configuration as the second screw member 432B, the second nut member 433B, the second pin 438B, and the second bearing 439B. . Therefore, in FIG. 6, only the first screw member 432A, the first nut member 433A, the first pin 438A, and the first bearing 439A are illustrated. In addition, in FIG. 6, illustration of the adjustment mechanism 42 and the power transmission portion 437 is omitted.

旋轉機構43主要具有旋轉驅動部431、第1螺紋構件432A及第2螺紋構件432B、第1螺母構件433A及第2螺母構件433B、鏈輪434、434a、435、436、動力傳遞部437(437a、437b)、第1銷438A及第2銷438B、以及第1軸承439A及第2軸承439B。 The rotation mechanism 43 mainly includes a rotation driving portion 431, a first screw member 432A and a second screw member 432B, a first nut member 433A and a second nut member 433B, sprockets 434, 434a, 435, 436, and a power transmission portion 437 (437a , 437b), the first pin 438A and the second pin 438B, and the first bearing 439A and the second bearing 439B.

於位於框架41之下側之下框部分41d,於底面部分嵌入有第1螺母構件433A及第2螺母構件433B。第1螺母構件433A及第2螺母構件433B由摩擦係數較小之材料、例如銅合金等形成。第1螺母構件433A及第2螺母構件433B分別沿大致鉛直方向(y方向)設置。 The first nut member 433A and the second nut member 433B are fitted into the bottom surface portion of the lower frame portion 41d located on the lower side of the frame 41. The first nut member 433A and the second nut member 433B are formed of a material with a small friction coefficient, such as a copper alloy. The first nut member 433A and the second nut member 433B are respectively provided in a substantially vertical direction (y direction).

第1螺母構件433A及第2螺母構件433B分別設置於下框部分41d之兩端附近。於圖5中,第1螺母構件433A係設置於左端附近(+x端附近),第2螺母構件433B係設置於右端附近(-x端附近)。 The first nut member 433A and the second nut member 433B are respectively provided in the vicinity of both ends of the lower frame portion 41d. In FIG. 5, the first nut member 433A is provided near the left end (near the +x end), and the second nut member 433B is provided near the right end (near the -x end).

第1螺紋構件432A及第2螺紋構件432B係使用剛性較高之螺紋、例如梯形螺紋。第1螺紋構件432A及第2螺紋構件432B分別沿大致鉛直方向(y方向)設置。第1螺紋構件432A與第1螺母構件433A螺合,第2螺紋構件432B與第2螺母構件433B螺合。 The first screw member 432A and the second screw member 432B use a screw with high rigidity, such as a trapezoidal screw. The first screw member 432A and the second screw member 432B are respectively provided in a substantially vertical direction (y direction). The first screw member 432A is screwed with the first nut member 433A, and the second screw member 432B is screwed with the second nut member 433B.

框架41或光罩M之重量之大致一半(例如,200kg左右)落在第1螺紋構件432A及第2螺紋構件432B上,因此,第1螺紋構件432A及第2螺紋構件432B必須耐載重性優異。又,為了能夠進行細微量(例如,微米單位或次微米單位)之定位,較理想為設為藉由研磨加工形成之高精度之螺紋(研磨螺紋)。 Roughly half of the weight of the frame 41 or the mask M (for example, about 200 kg) falls on the first screw member 432A and the second screw member 432B. Therefore, the first screw member 432A and the second screw member 432B must have excellent load resistance . In addition, in order to be able to perform positioning of fine and small amounts (for example, micron units or sub-micron units), it is preferable to set a high-precision thread (ground thread) formed by grinding processing.

第1螺紋構件432A之中心軸與第1銷438A及第1軸承439A之中心軸大致一致。又,第2螺紋構件432B之中心軸與第2銷438B及第2軸承439B之中心軸大致一致。換言之,第1螺紋構件432A係於第1銷438A之上方設於在俯視時與第1銷438A重疊之位置,第2螺紋構件432B係於第2銷438B之上方設於俯視時與第2銷438B重疊之位置。 The center axis of the first screw member 432A is substantially coincident with the center axis of the first pin 438A and the first bearing 439A. In addition, the center axis of the second screw member 432B is substantially coincident with the center axis of the second pin 438B and the second bearing 439B. In other words, the first screw member 432A is located above the first pin 438A at a position overlapping with the first pin 438A when viewed from the top, and the second screw member 432B is located above the second pin 438B and is located above the second pin 438B when viewed from the top. 438B overlapping position.

旋轉驅動部431係電動馬達等致動器,具有輸出軸431a。鏈輪434與輸出軸431a一體化。又,鏈輪434a及鏈輪435與第1螺紋構件432A一體化,鏈輪436藉由壓入等而與第2螺紋構件432B一體化。鏈輪434與輸出軸431a、鏈輪434a、435與第1螺紋構件432A、鏈輪436與第2螺紋構件432B亦可藉由厭氧性接著劑等強力接著劑而一體化,還可藉由鍵及螺紋而一體化。 The rotation driving unit 431 is an actuator such as an electric motor, and has an output shaft 431a. The sprocket 434 is integrated with the output shaft 431a. In addition, the sprocket 434a and the sprocket 435 are integrated with the first screw 432A, and the sprocket 436 is integrated with the second screw 432B by press fitting or the like. The sprocket 434 and the output shaft 431a, the sprockets 434a, 435 and the first threaded member 432A, the sprocket 436 and the second threaded member 432B can also be integrated by a strong adhesive such as an anaerobic adhesive, or by The key and the thread are integrated.

鏈輪435之齒數為α,鏈輪436之齒數為β。齒數β多於齒數α。鏈輪434a之齒數可以獲得所需之減速比之方式任意決定。 The number of teeth of sprocket 435 is α, and the number of teeth of sprocket 436 is β. The number of teeth β is more than the number of teeth α. The number of teeth of the sprocket 434a can be arbitrarily determined in such a way that the required reduction ratio can be obtained.

若將反射器41b與第2螺紋構件432B之俯視時之距離(x方向之距離)設為距離A,將反射器41b與第1螺紋構件432A之俯視時之距離(x方向之距離)設為距離B,則鏈輪435之齒數α與鏈輪436之齒數β具有齒數α:齒數β=距離A:距離B之關係。例如,若設為距離B =3×距離A,則齒數α:齒數β=1:3。藉此,第1螺紋構件432A之y方向之移動量與第2螺紋構件432B之y方向之移動量之比成為距反射器41b之距離之反比。 If the distance between the reflector 41b and the second screw member 432B in plan view (the distance in the x direction) is taken as the distance A, the distance between the reflector 41b and the first screw member 432A in plan view (the distance in the x direction) is taken as For distance B, the number of teeth α of sprocket 435 and the number of teeth β of sprocket 436 have the relationship of number of teeth α: number of teeth β=distance A: distance B. For example, if set to distance B =3×distance A, then the number of teeth α: the number of teeth β=1:3. Thereby, the ratio of the movement amount of the first screw member 432A in the y direction to the movement amount of the second screw member 432B in the y direction becomes the inverse ratio of the distance from the reflector 41b.

鏈輪434與鏈輪434a係藉由動力傳遞部437a而連結,鏈輪435與鏈輪436係藉由動力傳遞部437b而連結。動力傳遞部437a、437b係將輸出軸431a之旋轉傳遞至鏈輪435、436者,可使用鏈條或正時皮帶等。於本實施形態中,動力傳遞部437a、437b使用鏈條。再者,於不使用鏈輪434a之情形時,1根動力傳遞部將鏈輪434與鏈輪435、436連結即可。 The sprocket 434 and the sprocket 434a are connected by the power transmission part 437a, and the sprocket 435 and the sprocket 436 are connected by the power transmission part 437b. The power transmission parts 437a and 437b transmit the rotation of the output shaft 431a to the sprockets 435 and 436, and a chain or a timing belt can be used. In this embodiment, chains are used for the power transmission parts 437a and 437b. In addition, when the sprocket 434a is not used, one power transmission part may connect the sprocket 434 and the sprockets 435 and 436.

第1銷438A及第2銷438B係於下側具有大致半球面之棒狀構件,且沿大致鉛直方向設置。如圖6所示,第1銷438A及第2銷438B具有大致球體形狀之球狀部438a及於下端面形成有大致半球面之孔438c之棒狀部438b。孔438c之底面與球狀部438a之上端之大致半球面抵接。 The first pin 438A and the second pin 438B are rod-shaped members having a substantially hemispherical surface on the lower side, and are provided in a substantially vertical direction. As shown in FIG. 6, the first pin 438A and the second pin 438B have a substantially spherical spherical portion 438a and a rod-shaped portion 438b having a substantially hemispherical hole 438c formed on the lower end surface. The bottom surface of the hole 438c is in contact with the substantially hemispherical surface of the upper end of the spherical portion 438a.

棒狀部438b插入至沿上下方向(y方向)貫通移動構件本體31之孔而一體化。於本實施形態中,於棒狀部438b之外周面形成公螺紋(未圖示),該公螺紋與形成於孔31f之母螺紋(未圖示)螺合,上述孔31f沿y方向貫通移動構件本體31。藉此,將棒狀部438b、即第1銷438A及第2銷438B固定於移動構件本體31。 The rod-shaped portion 438b is inserted into a hole penetrating the moving member body 31 in the vertical direction (y direction) to be integrated. In this embodiment, a male thread (not shown) is formed on the outer peripheral surface of the rod-shaped portion 438b, and the male thread is screwed with a female thread (not shown) formed in the hole 31f, and the hole 31f penetrates and moves in the y direction Component body 31. Thereby, the rod-shaped portion 438 b, that is, the first pin 438A and the second pin 438B are fixed to the moving member main body 31.

球狀部438a係設置於形成於下表面氣墊341、342之上表面之孔34e。孔34e之底面為大致半球面,且孔34e之底面與球狀部438a之下端之大致半球面抵接。因此,下表面氣墊341、342可相對於第1銷438A及第2銷438B(移動構件本體31)擺動。 The spherical portion 438a is provided in the hole 34e formed on the upper surface of the lower surface air cushions 341, 342. The bottom surface of the hole 34e is a substantially hemispherical surface, and the bottom surface of the hole 34e abuts the substantially hemispherical surface at the lower end of the spherical portion 438a. Therefore, the lower surface air cushions 341 and 342 can swing with respect to the first pin 438A and the second pin 438B (moving member body 31).

第1軸承439A及第2軸承439B係設置於設於移動構件本 體31之上表面側之凸部35之內部。第1軸承439A及第2軸承439B較理想為使用即便受到徑向載重及軸向載重亦能夠順暢地活動之斜角滾珠軸承。 The first bearing 439A and the second bearing 439B are installed in the moving member. The inside of the convex portion 35 on the upper surface side of the body 31. The first bearing 439A and the second bearing 439B are preferably angular ball bearings that can move smoothly even under radial load and axial load.

於移動構件本體31之上表面側,於中心軸與第1銷438A及第2銷438B大致一致之位置,分別設置第1軸承439A及第2軸承439B。第1螺紋構件432A之下端樞轉支承於第1軸承439A,第2螺紋構件432B之下端樞轉支承於第2軸承439B。 On the upper surface side of the moving member main body 31, a first bearing 439A and a second bearing 439B are respectively provided at positions where the central axis substantially coincides with the first pin 438A and the second pin 438B. The lower end of the first screw member 432A is pivotally supported by the first bearing 439A, and the lower end of the second screw member 432B is pivotally supported by the second bearing 439B.

框架41或光罩M之載重經由第1螺紋構件432A及第2螺紋構件432B以及第1軸承439A及第2軸承439B而由剛性較高而不會變形之第1銷438A及第2銷438B支承。第1銷438A及第2銷438B分別由下表面氣墊341、342支持。 The load of the frame 41 or the mask M is supported by the first pin 438A and the second pin 438B, which have high rigidity without deformation, via the first screw member 432A and the second screw member 432B, and the first bearing 439A and the second bearing 439B. . The first pin 438A and the second pin 438B are supported by lower surface air cushions 341 and 342, respectively.

如此,能夠使光罩保持部40等之載重經由剛性最高之第1銷438A及第2銷438B以及下表面氣墊341、342而由剛性之較高之平台10支承。又,下表面氣墊341、342係設置於移動構件本體31之兩端附近,因此,能夠穩定地支承光罩保持部40等之載重。 In this way, the load of the mask holding portion 40 and the like can be supported by the platform 10 with higher rigidity via the first pin 438A and the second pin 438B with the highest rigidity and the lower surface air cushions 341 and 342. In addition, the lower surface air cushions 341 and 342 are provided in the vicinity of both ends of the moving member main body 31, so that the load of the mask holding portion 40 and the like can be stably supported.

又,第1螺紋構件432A及第1銷438A係設於在俯視時與開口部34f重疊之位置(第2螺紋構件432B及第2銷438B亦同樣)。於本實施形態中,噴出空氣之開口部34f(參照圖6之虛線箭頭)之中心軸與第1螺紋構件432A、第1銷438A等之中心軸一致。而且,開口部34f於俯視時形成於下表面氣墊341、342之大致中心處。因此,將光罩保持部40等之載重施加至下表面氣墊341、342之中心,藉此,下表面氣墊341、342能夠使光罩保持部40等穩定地浮起。 In addition, the first screw member 432A and the first pin 438A are provided at a position overlapping the opening 34f in a plan view (the same applies to the second screw member 432B and the second pin 438B). In this embodiment, the center axis of the opening 34f (refer to the dashed arrow in FIG. 6) through which the air is ejected coincides with the center axis of the first screw member 432A, the first pin 438A, and the like. In addition, the opening 34f is formed at the approximate center of the lower surface air cushions 341, 342 when viewed from above. Therefore, the load of the mask holding portion 40 and the like is applied to the center of the lower surface air cushions 341 and 342, whereby the lower surface air cushions 341 and 342 can stably float the mask holding portion 40 and the like.

其次,對利用旋轉機構43使框架41旋轉之方法進行說明。若使旋轉驅動部431驅動,則輸出軸431a及鏈輪434旋轉,藉由動力傳遞部437a而鏈輪435旋轉,並且藉由動力傳遞部437b而鏈輪436旋轉。第1螺紋構件432A與鏈輪435之旋轉一同旋轉,第2螺紋構件432B與鏈輪436之旋轉一同旋轉。 Next, a method of rotating the frame 41 by the rotating mechanism 43 will be described. When the rotation driving unit 431 is driven, the output shaft 431a and the sprocket 434 rotate, the sprocket 435 is rotated by the power transmission unit 437a, and the sprocket 436 is rotated by the power transmission unit 437b. The first screw member 432A rotates with the rotation of the sprocket 435, and the second screw member 432B rotates with the rotation of the sprocket 436.

鏈輪436之齒數β多於鏈輪435之齒數α,因此,鏈輪435壓入等之第1螺紋構件432A與鏈輪436壓入等之第2螺紋構件432B相比旋轉更多。因此,第1螺紋構件432A之y方向之移動量大於第2螺紋構件432B之y方向之移動量。 The number of teeth β of the sprocket 436 is more than the number of teeth α of the sprocket 435. Therefore, the first screw member 432A such as the sprocket 435 press-fitting rotates more than the second screw member 432B such as the sprocket 436 press-fitting. Therefore, the movement amount of the first screw member 432A in the y direction is greater than the movement amount of the second screw member 432B in the y direction.

於第1螺紋構件432A之位置,框架41以第1螺紋構件432A之y方向之移動量移動,於第2螺紋構件432B之位置,框架41以第2螺紋構件432B之y方向之移動量移動。藉此,框架41旋轉。 At the position of the first screw member 432A, the frame 41 moves by the movement amount of the first screw member 432A in the y direction, and at the position of the second screw member 432B, the frame 41 moves by the movement amount of the second screw member 432B in the y direction. Thereby, the frame 41 rotates.

尤其是,於本實施形態中,齒數α:齒數β=距離A:距離B,因此,以反射器41b之x方向之位置O為基準,框架41以位置O不移動之方式畫弧地旋轉(參照圖5之箭頭)。此處,所謂位置O,係指將鏈輪435、436連結之大致平行之線與包含反射器41b之大致鉛直方向之線交叉之位置。再者,框架41最大限度旋轉時的第1螺紋構件432A之位置之y方向之移動量為±3mm左右。 In particular, in this embodiment, the number of teeth α: the number of teeth β=distance A: distance B, therefore, based on the position O of the reflector 41b in the x direction, the frame 41 rotates in an arc so that the position O does not move ( Refer to the arrow in Figure 5). Here, the position O refers to a position where a substantially parallel line connecting the sprockets 435 and 436 intersects with a substantially vertical line including the reflector 41b. In addition, the movement amount in the y direction of the position of the first screw member 432A when the frame 41 rotates to the maximum is about ±3 mm.

再者,伴隨框架41之旋轉,設置於框架41之上端之保持部41f亦旋轉。但是,保持部41f係夾持板部73者,因此,不會因高度方向之變化而產生問題。 Furthermore, as the frame 41 rotates, the holding portion 41f provided at the upper end of the frame 41 also rotates. However, since the holding portion 41f clamps the plate portion 73, there is no problem due to a change in the height direction.

又,伴隨框架41之旋轉,第1螺紋構件432A及第2螺紋構 件432B之x方向之位置亦稍微變化。但是,於第1螺紋構件432A與第1螺母構件433A之間、及第2螺紋構件432B與第2螺母構件433B之間存在間隙。因此,即便因框架41之旋轉而第1螺紋構件432A、第2螺紋構件432B之水平方向(x方向)之位置稍微偏移,亦不會產生不良狀況。 In addition, with the rotation of the frame 41, the first screw member 432A and the second screw member The position of the piece 432B in the x direction is also slightly changed. However, there are gaps between the first screw member 432A and the first nut member 433A, and between the second screw member 432B and the second nut member 433B. Therefore, even if the positions of the first screw member 432A and the second screw member 432B in the horizontal direction (x direction) are slightly shifted due to the rotation of the frame 41, no problems will occur.

進而,伴隨框架41之旋轉,而第1螺紋構件432A及第2螺紋構件432B之延伸設置方向自大致鉛直方向傾斜地變化。但是,由於第1軸承439A、第2軸承439B使用斜角滾珠軸承,故而即便第1螺紋構件432A、第2螺紋構件432B傾斜,亦能夠使第1螺紋構件432A、第2螺紋構件432B旋轉。 Furthermore, with the rotation of the frame 41, the extending direction of the first screw member 432A and the second screw member 432B changes obliquely from the substantially vertical direction. However, since the first bearing 439A and the second bearing 439B use angular ball bearings, even if the first screw member 432A and the second screw member 432B are inclined, the first screw member 432A and the second screw member 432B can be rotated.

若將框架41之旋轉角度設為Φ,則反射器41b於高度方向(y方向)上僅移動H1×cosΦ。然而,由於角度Φ微小,故而cosΦ大致為1,而反射器41b之高度方向之位置幾乎不變化。因此,使用反射器41b之框架41之位置檢測不會產生不良狀況。 If the rotation angle of the frame 41 is Φ, the reflector 41b moves only H1×cosΦ in the height direction (y direction). However, since the angle Φ is small, cosΦ is approximately 1, and the position of the reflector 41b in the height direction hardly changes. Therefore, the position detection of the frame 41 using the reflector 41b will not cause problems.

此處,對框架41之位置檢測機構進行說明。如圖1、2所示,自照射部23a向反射器41b照射光,並自照射部23b向反射器41c照射光。主要使用照射部23a及反射器41b進行框架41之位置檢測。照射部23b及反射器41c輔助性地用於修正在框架41之移動中因平台10之翹曲等產生之縱傾所引起的誤差。 Here, the position detection mechanism of the frame 41 will be described. As shown in FIGS. 1 and 2, the reflector 41b is irradiated with light from the irradiating portion 23a, and the reflector 41c is irradiated with light from the irradiating portion 23b. The illuminating part 23a and the reflector 41b are mainly used to detect the position of the frame 41. The irradiating portion 23b and the reflector 41c are supplementarily used to correct errors caused by the vertical tilt caused by the warpage of the platform 10 during the movement of the frame 41.

圖7係表示反射器41b及向反射器41b照射光之照射部23a之概略之立體圖。再者,反射器41b與反射器41c、及照射部23a與照射部23b為相同構成,因此,以下,對反射器41b及照射部23a進行說明,而對反射器41c及照射部23a省略說明。 FIG. 7 is a schematic perspective view showing the reflector 41b and the irradiation part 23a that irradiates light to the reflector 41b. In addition, the reflector 41b and the reflector 41c, and the irradiation part 23a and the irradiation part 23b have the same structure, so below, the reflector 41b and the irradiation part 23a are demonstrated, and the description of the reflector 41c and the irradiation part 23a is abbreviate|omitted.

照射部23a經由安裝構件24而設置於柱21。反射器41b經由保持構件41g而設置於框架41之側面,該保持構件41g由常溫附近之熱膨脹率非常小之高性能金屬材料(例如,超級鍛鋼)形成。反射器41b係以自框架41之側面沿水平方向(此處,-x方向)突出之方式設置。保持構件41g所包含之3根棒材係藉由棒材等進行補強。 The irradiation part 23a is provided on the column 21 via the mounting member 24. The reflector 41b is provided on the side surface of the frame 41 via a holding member 41g, which is formed of a high-performance metal material (for example, super forged steel) with a very small thermal expansion coefficient near room temperature. The reflector 41b is arranged to protrude from the side surface of the frame 41 in the horizontal direction (here, the -x direction). The three bars included in the holding member 41g are reinforced with bars or the like.

自照射部23a照射之光被反射器41b反射,並入射至照射部23a。基於自照射部23a照射並被反射器41b反射之光,檢測照射部23a與反射器41b之距離、即框架41之x方向之位置。照射部23a、反射器41b及使用該等之位置檢測方法可使用公知之技術,因此,省略說明。 The light irradiated from the irradiation part 23a is reflected by the reflector 41b, and enters the irradiation part 23a. Based on the light irradiated from the irradiating portion 23a and reflected by the reflector 41b, the distance between the irradiating portion 23a and the reflector 41b, that is, the position of the frame 41 in the x direction is detected. The illuminating part 23a, the reflector 41b, and the position detection method using these can use a well-known technique, and therefore, description is omitted.

返回至圖1、2之說明。光罩檢查裝置1具有使移動部30沿平台10之槽10f(亦可為上表面10e)移動之下部線性馬達61(參照圖9)、及追隨下部線性馬達61而驅動(於下文進行詳細敍述)之上部線性馬達62(參照圖9)。 Return to the description of Figures 1 and 2. The mask inspection device 1 has a lower linear motor 61 (refer to FIG. 9) that allows the moving part 30 to move along the groove 10f (or upper surface 10e) of the platform 10, and drives to follow the lower linear motor 61 (described in detail below ) Upper linear motor 62 (refer to Fig. 9).

下部線性馬達61主要具有轉子61a及未圖示之定子,上部線性馬達62主要具有轉子62a及定子62b。轉子61a係設置於移動構件本體31,轉子62a係設置於框架41之上側。下部線性馬達61之未圖示之定子係設置於平台10,上部線性馬達62之定子62b係設置於上部框71。再者,上部框71如圖2所示,係由柱21及由例如鋁製之中空方棒形成之柱74支承。 The lower linear motor 61 mainly includes a rotor 61a and a stator (not shown), and the upper linear motor 62 mainly includes a rotor 62a and a stator 62b. The rotor 61 a is installed on the moving member body 31, and the rotor 62 a is installed on the upper side of the frame 41. The stator (not shown) of the lower linear motor 61 is installed on the platform 10, and the stator 62 b of the upper linear motor 62 is installed on the upper frame 71. Furthermore, as shown in FIG. 2, the upper frame 71 is supported by a column 21 and a column 74 formed of, for example, a hollow square rod made of aluminum.

移動部30靠近光罩檢查裝置1之重心G(參照圖2),因此,主要使用下部線性馬達61使框架41等(包含移動部30)於x方向上移動。然而,框架41之高度為1.5m~2m左右,因此,於使框架41於x方向上移動之情形時,若僅藉由下部線性馬達61,則加速時框架41之上部之移動 延遲,結果導致框架41變形為平行四邊形狀。因此,於框架41之上方設置上部線性馬達62,以使加速時框架41之上部之移動不延遲。 The moving part 30 is close to the center of gravity G (refer to FIG. 2) of the mask inspection apparatus 1, and therefore, the lower linear motor 61 is mainly used to move the frame 41 and the like (including the moving part 30) in the x direction. However, the height of the frame 41 is about 1.5m~2m. Therefore, when the frame 41 is moved in the x direction, if only the lower linear motor 61 is used, the upper part of the frame 41 will move during acceleration. The delay, as a result, causes the frame 41 to deform into a parallelogram shape. Therefore, an upper linear motor 62 is provided above the frame 41 so that the movement of the upper part of the frame 41 is not delayed during acceleration.

然而,於本實施形態中,框架41旋轉,因此,伴隨框架41之旋轉而轉子62a之水平方向(x方向)及垂直方向(y方向)之位置改變。尤其是,水平方向之移動成為上部線性馬達62之相位之偏移之原因。因此,設置使轉子62a之水平方向(x方向)及垂直方向(y方向)之位置移動之移動機構。再者,轉子61a係設置於不於y方向及Z方向上移動之移動部30,因此,可忽略因框架41之旋轉導致之水平方向及垂直方向之移動。 However, in this embodiment, the frame 41 rotates, and therefore, the position of the rotor 62a in the horizontal direction (x direction) and the vertical direction (y direction) changes with the rotation of the frame 41. In particular, the movement in the horizontal direction causes the phase shift of the upper linear motor 62. Therefore, a moving mechanism for moving the position of the rotor 62a in the horizontal direction (x direction) and the vertical direction (y direction) is provided. Furthermore, the rotor 61a is provided in the moving part 30 that does not move in the y direction and the Z direction, so the horizontal and vertical movement caused by the rotation of the frame 41 can be ignored.

圖8係對轉子62a及其移動機構進行說明之圖。移動機構主要具有軌道63、滑塊64、彈性構件65及制動機構66。 Fig. 8 is a diagram illustrating the rotor 62a and its moving mechanism. The moving mechanism mainly includes a rail 63, a slider 64, an elastic member 65, and a braking mechanism 66.

軌道63係相對於水平方向傾斜地設置於位於框架41之上側之上框部分41e。軌道63之傾斜大致沿以框架41之旋轉中心O為頂點之等腰三角形之底邊(參照圖5)。於軌道63,沿長度方向形成槽63a。 The rail 63 is installed in the upper frame portion 41e located on the upper side of the frame 41 obliquely with respect to the horizontal direction. The inclination of the rail 63 is substantially along the base of the isosceles triangle with the rotation center O of the frame 41 as the vertex (refer to FIG. 5). In the rail 63, a groove 63a is formed along the length direction.

滑塊64於側視時為大致

Figure 106125893-A0305-02-0025-1
字形狀,設置於軌道63。於滑塊64之對向之2個側面,分別以向內側突出之方式形成插入至槽63a之凸部(未圖示)。於該凸部設置多個鋼球(未圖示),於滑塊64沿軌道63移動時,該鋼球滾動,藉此,滑塊64順暢地移動。 The slider 64 is approximately
Figure 106125893-A0305-02-0025-1
The shape of the character is set on the track 63. On the two opposite side surfaces of the slider 64, a convex portion (not shown) inserted into the groove 63a is formed so as to protrude inward, respectively. A plurality of steel balls (not shown) are provided on the convex portion, and when the slider 64 moves along the rail 63, the steel balls roll, whereby the slider 64 moves smoothly.

於滑塊64設置轉子62a。因此,轉子62a與滑塊64同樣地,可沿軌道63移動。 A rotor 62a is provided on the slider 64. Therefore, the rotor 62a can move along the rail 63 like the slider 64.

彈性構件65對轉子62a施加向圖8中之左下方向(參照圖8之箭頭)外拉之方向之力。作為彈性構件65,可使用例如盤簧。 The elastic member 65 applies a force to the rotor 62a in the lower left direction in FIG. 8 (refer to the arrow in FIG. 8) in a pulling direction. As the elastic member 65, for example, a coil spring can be used.

制動機構66具有夾具(未圖示)。制動機構66藉由將空氣 封入而使夾具打開,藉由抽出空氣而將夾具壓抵於軌道63之側面63b,從而使滑塊64相對於軌道63固定。軌道63、滑塊64、彈性構件65、制動機構66可使用業已公知之技術,因此,省略詳細之說明。 The brake mechanism 66 has a clamp (not shown). The brake mechanism 66 The clamp is enclosed to open the clamp, and the clamp is pressed against the side surface 63b of the rail 63 by evacuating air, thereby fixing the slider 64 with respect to the rail 63. The rail 63, the slider 64, the elastic member 65, and the braking mechanism 66 can use well-known technologies, and therefore, detailed descriptions are omitted.

於光罩檢查裝置1之上部框71(於圖1中省略圖示),設置定位用銷72。藉由使框架41朝+x方向移動,而使轉子62a抵接於定位用銷72。藉由使框架41進一步朝+x方向移動,而轉子62a克服彈性構件65之施壓力而沿軌道63向-x方向(參照圖8之中空箭頭)移動。 A positioning pin 72 is provided on the upper frame 71 (illustration omitted in FIG. 1) of the mask inspection device 1. By moving the frame 41 in the +x direction, the rotor 62a is brought into contact with the positioning pin 72. By further moving the frame 41 in the +x direction, the rotor 62a overcomes the pressure of the elastic member 65 and moves along the rail 63 in the −x direction (refer to the hollow arrow in FIG. 8).

定位用銷72係設置於當框架41位於裝載位置(光罩M之更換位置,於圖1中表示框架41位於裝載位置之狀態)或較之更靠-x側時轉子62a抵接於定位用銷72的位置。 The positioning pin 72 is provided when the frame 41 is in the loading position (the replacement position of the mask M, shown in FIG. 1 shows the state in which the frame 41 is in the loading position) or closer to the -x side when the rotor 62a abuts against the positioning The location of the pin 72.

若轉子62a移動至正確之位置,則轉子62a藉由制動機構66而固定於軌道63。再者,所謂正確之位置,係指下部線性馬達61之相位與上部線性馬達62之相位相等之位置,係能夠於加速之瞬間輸出正確之轉矩之位置。 If the rotor 62a moves to the correct position, the rotor 62a is fixed to the rail 63 by the braking mechanism 66. Furthermore, the so-called correct position refers to the position where the phase of the lower linear motor 61 is equal to the phase of the upper linear motor 62, and is the position where the correct torque can be output at the moment of acceleration.

再者,軌道63為棒狀,轉子62a雖然呈直線狀移動,但由於距旋轉中心O之距離較遠,故而與由框架41之旋轉所致之轉子62a之移動軌跡(弧)大致相同。 Furthermore, the rail 63 is rod-shaped, and although the rotor 62a moves linearly, since the distance from the rotation center O is relatively long, it is substantially the same as the movement trajectory (arc) of the rotor 62a caused by the rotation of the frame 41.

再者,轉子62a較理想為設置於盡可能接近框架41之旋轉中心之位置、即框架41之上框部分41e之-x端附近。又,轉子62a較理想為如圖2所示般z方向(前後方向)之位置與重心G大致一致。 Furthermore, the rotor 62a is preferably arranged as close as possible to the rotation center of the frame 41, that is, near the -x end of the upper frame portion 41e of the frame 41. In addition, it is desirable that the position of the rotor 62a in the z direction (front-rear direction) substantially coincides with the center of gravity G as shown in FIG. 2.

圖9係表示光罩檢查裝置1之電氣構成之方塊圖。光罩檢查裝置1具有CPU(Central Processing Unit)151、RAM(Random Access Memory) 152、ROM(Read Only Memory)153、輸入輸出介面(I/F)154、通訊介面(I/F)155及媒體介面(I/F)156,該等與相機22a、22b、照射部23a、23b、爪部41a、調整機構42、旋轉驅動部431、光源53、下部線性馬達61、上部線性馬達62、制動機構66等相互連接。 FIG. 9 is a block diagram showing the electrical structure of the photomask inspection device 1. As shown in FIG. The mask inspection device 1 has a CPU (Central Processing Unit) 151, RAM (Random Access Memory) 152, ROM (Read Only Memory) 153, input and output interface (I/F) 154, communication interface (I/F) 155, and media interface (I/F) 156, which are related to cameras 22a, 22b, illumination unit 23a, 23b, the claw portion 41a, the adjustment mechanism 42, the rotation driving portion 431, the light source 53, the lower linear motor 61, the upper linear motor 62, the braking mechanism 66, and the like are connected to each other.

CPU151基於儲存於RAM152、ROM153中之程式動作,而進行各部之控制。自相機22a、22b、照射部23a、23b等對CPU151輸入訊號。自CPU151輸出之訊號輸出至調整機構42、旋轉驅動部431、光源53、下部線性馬達61、上部線性馬達62、制動機構66等。 The CPU 151 operates based on the programs stored in the RAM 152 and the ROM 153 to control each part. Signals are input to the CPU 151 from the cameras 22a and 22b, the irradiation units 23a and 23b, and the like. The signal output from the CPU 151 is output to the adjustment mechanism 42, the rotation driving unit 431, the light source 53, the lower linear motor 61, the upper linear motor 62, the braking mechanism 66, and the like.

RAM152係揮發性記憶體。ROM153係記憶有各種控制程式等之非揮發性記憶體。CPU151基於儲存於RAM152、ROM153中之程式動作,而進行各部之控制。ROM153儲存光罩檢查裝置1之啟動時CPU151所進行之啟動程式或依存於光罩檢查裝置1之硬體之程式等。又,ROM153儲存與光罩M上所描繪之圖案之位置及形狀有關之資訊即圖案資訊(例如,設計資訊)、將自照射部23a、23b照射之光被反射器41b、41c反射後返回至照射部23a、23b之時間與框架41之x方向之位置建立關聯之位置資訊、將旋轉驅動部431之驅動量與框架41之旋轉角度建立關聯之旋轉資訊等。RAM152儲存CPU151所執行之程式及CPU151所使用之資料等。 RAM152 is a volatile memory. ROM153 is a non-volatile memory with various control programs. The CPU 151 operates based on the programs stored in the RAM 152 and the ROM 153 to control each part. The ROM 153 stores the startup program performed by the CPU 151 when the photomask inspection device 1 is activated, or the program that depends on the hardware of the photomask inspection device 1, etc. In addition, the ROM 153 stores information related to the position and shape of the pattern drawn on the mask M, that is, pattern information (for example, design information), and returns the light irradiated from the irradiating parts 23a, 23b by the reflectors 41b, 41c to The position information that associates the time of the irradiating parts 23a and 23b with the position of the frame 41 in the x direction, the rotation information that associates the driving amount of the rotation driving part 431 with the rotation angle of the frame 41, and so on. RAM152 stores programs executed by CPU151 and data used by CPU151.

CPU151經由輸入輸出介面154而控制鍵盤或滑鼠等輸入輸出裝置141。通訊介面155經由網路142自其他機器接收資料並發送至CPU151,並且將CPU151所生成之資料經由網路142發送至其他機器。 The CPU 151 controls an input and output device 141 such as a keyboard or a mouse through the input and output interface 154. The communication interface 155 receives data from other machines via the network 142 and sends it to the CPU 151, and sends data generated by the CPU 151 to other machines via the network 142.

媒體介面156讀取儲存於記憶媒體143中之程式或資料,並儲存至RAM152中。再者,記憶媒體143例如為IC卡、SD卡、DVD等。 The media interface 156 reads programs or data stored in the storage medium 143 and stores them in the RAM 152. Furthermore, the storage medium 143 is, for example, an IC card, SD card, DVD, or the like.

再者,實現各功能之程式例如自記憶媒體143讀出,經由RAM152而安裝至光罩檢查裝置1,並由CPU151執行。 Furthermore, a program for realizing each function is read from the storage medium 143, installed in the photomask inspection apparatus 1 via the RAM 152, and executed by the CPU 151.

CPU151具有基於輸入訊號控制光罩檢查裝置1之各部之控制部151a之功能。控制部151a係藉由執行CPU151所讀入之特定之程式而構築。關於控制部151a所進行之處理,將於下文進行詳細敍述。 The CPU 151 has a function of controlling the control unit 151a of each part of the photomask inspection apparatus 1 based on the input signal. The control unit 151a is constructed by executing a specific program read by the CPU151. The processing performed by the control unit 151a will be described in detail below.

圖9所示之光罩檢查裝置1之構成係於說明本實施形態之特徵時對主要構成進行了說明,並不排除例如一般之資訊處理裝置所具備之構成。光罩檢查裝置1之構成要素可根據處理內容而分類為更多之構成要素,亦可為由1個構成要素執行多個構成要素之處理。 The configuration of the photomask inspection device 1 shown in FIG. 9 was described in the description of the main configuration of the features of the present embodiment, and does not exclude, for example, the configuration of a general information processing device. The constituent elements of the mask inspection device 1 may be classified into more constituent elements according to the processing content, or a single constituent element may perform processing of a plurality of constituent elements.

其次,對光罩檢查裝置1之動作進行說明。首先,控制部151a控制爪部41a等,而將光罩M保持於框架41。又,控制部151a藉由調整機構42而調整光罩M之下邊之高度方向(y方向)之位置。此時,移動部30位於平台10之+x方向之端附近之裝載位置。 Next, the operation of the photomask inspection device 1 will be described. First, the control portion 151a controls the claw portion 41a and the like to hold the mask M to the frame 41. In addition, the control unit 151a adjusts the position of the lower side of the mask M in the height direction (y direction) by the adjustment mechanism 42. At this time, the moving part 30 is located at the loading position near the end of the platform 10 in the +x direction.

其次,控制部151a控制下部線性馬達61、上部線性馬達62,使移動部30沿槽10f朝-x方向移動,而使光罩M自安裝位置移動至檢查位置。 Next, the control unit 151a controls the lower linear motor 61 and the upper linear motor 62 to move the moving unit 30 in the −x direction along the groove 10f to move the mask M from the mounting position to the inspection position.

具體而言,控制部151a自未圖示之泵等對側面氣墊32、33供給空氣,而自貫通孔32d、33d噴出空氣。又,自移動部30之未圖示之泵等對下表面氣墊34供給空氣,而自貫通孔34a噴出空氣。 Specifically, the control unit 151a supplies air to the side air cushions 32 and 33 from a pump or the like not shown, and ejects air from the through holes 32d and 33d. In addition, air is supplied to the lower surface air cushion 34 from a pump or the like not shown in the moving part 30, and air is ejected from the through hole 34a.

繼而,控制部151a控制下部線性馬達61、上部線性馬達62,而對移動構件本體31施加-x方向之力。圖10係對控制部151a所進行之下部線性馬達61(轉子61a)、上部線性馬達62(轉子62a)之控制進行說明 之圖。 Then, the control unit 151 a controls the lower linear motor 61 and the upper linear motor 62 to apply a force in the −x direction to the moving member body 31. FIG. 10 illustrates the control of the lower linear motor 61 (rotor 61a) and the upper linear motor 62 (rotor 62a) performed by the control unit 151a 之图.

下部線性馬達61(轉子61a)與上部線性馬達62(轉子62a)並聯連接。因此,控制部151a同時向下部線性馬達61之轉子61a及上部線性馬達62之轉子62a輸出訊號。 The lower linear motor 61 (rotor 61a) and the upper linear motor 62 (rotor 62a) are connected in parallel. Therefore, the control unit 151a simultaneously outputs signals to the rotor 61a of the lower linear motor 61 and the rotor 62a of the upper linear motor 62.

具體而言,控制部151a將訊號分別輸出至轉子61a、62a之U相、V相、W相,控制部151a基於其結果預先求出轉子61a、62a之U相、V相、W相之功率因數(功率因數資訊)。然後,控制部151a基於自CPU151輸出之脈衝等,計算當前時間點之目標座標(位置指令)。進而,控制部151a計算對所計算出之位置指令進行一次微分之一次微分項、及對位置指令進行二次微分之二次微分項。 Specifically, the control unit 151a outputs signals to the U-phase, V-phase, and W-phase of the rotors 61a, 62a, respectively, and the control unit 151a obtains the U-phase, V-phase, and W-phase powers of the rotors 61a, 62a in advance based on the results. Factor (power factor information). Then, the control unit 151a calculates the target coordinates (position command) at the current time point based on the pulses output from the CPU 151 and the like. Furthermore, the control unit 151a calculates a first-order derivative term that differentiates the calculated position command first, and a second-order derivative term that performs second-order differentiation on the position command.

控制部151a進行將比例動作、積分動作、微分動作組合之PID控制、及基於位置指令、一次微分項、二次微分項、以及為了管理轉子61a、62a之位置而成為基準之原點訊號之前饋控制。然後,控制部151a係基於控制結果、功率因數資訊等生成驅動訊號。驅動訊號係與U相、V相、W相之各者對應之訊號,由未圖示之放大器分別放大之後,分別輸出至轉子61a、62a之U相、V相、W相之線圈。 The control unit 151a performs PID control combining proportional action, integral action, and derivative action, and feeds forward based on the position command, the first derivative term, the second derivative term, and the origin signal that becomes the reference for managing the positions of the rotors 61a and 62a. control. Then, the control unit 151a generates a driving signal based on the control result, power factor information, and the like. The driving signal is a signal corresponding to each of the U-phase, V-phase, and W-phase. After being amplified by an amplifier (not shown), they are respectively output to the U-phase, V-phase, and W-phase coils of the rotors 61a and 62a.

於本實施形態中,對靠近重心G之下部線性馬達61(轉子61a)供給較大之電流,對遠離重心G之上部線性馬達62(轉子62a)供給較小之電流。例如,使流經轉子61a之電流值與流經轉子62a之電流值之比與轉子61a和重心G之距離及轉子62a與重心G之距離成反比。 In this embodiment, a relatively large current is supplied to the linear motor 61 (rotor 61a) below the center of gravity G, and a relatively small current is supplied to the linear motor 62 (rotor 62a) above the center of gravity G far from it. For example, the ratio of the current value flowing through the rotor 61a to the current value flowing through the rotor 62a is inversely proportional to the distance between the rotor 61a and the center of gravity G and the distance between the rotor 62a and the center of gravity G.

例如,將流經下部線性馬達61之轉子61a之電流設為i1u、i1v、i1w,將流經上部線性馬達62之轉子62a之電流設為i2u、i2v、i2w。若轉子 62a與重心G之高度方向之距離Hhigh(參照圖2)為轉子61a與重心G之高度方向之距離Hlow(參照圖2)之4倍(Hhigh=Hlow×4),則設為i1u=4×i2u、i1v=4×i2v、i1w=4×i2w。為此,於轉子61a之內部電阻R1u、R1v、R1w、轉子62a之內部電阻R2u、R2v、R2w、及插入至控制部151a與轉子61a之間之電阻Ru、Rv、Rw之間,設為R1u:(R2u+Ru)=1:4、R1v:(R2v+Rv)=1:4、R1w:(R2w+Rw)=1:4。藉此,上部線性馬達62追隨下部線性馬達61而以較下部線性馬達61弱之力驅動。 For example, the currents flowing through the rotor 61a of the lower linear motor 61 are set to i 1u , i 1v , and i 1w , and the currents flowing through the rotor 62a of the upper linear motor 62 are set to i 2u , i 2v , and i 2w . If the distance H high between the rotor 62a and the center of gravity G in the height direction (refer to Figure 2) is 4 times the distance H low (refer to Figure 2) between the rotor 61a and the center of gravity G in the height direction (H high = H low × 4), then Set i 1u =4×i 2u , i 1v =4×i 2v , and i 1w =4×i 2w . For this reason, the internal resistances R 1u , R 1v , R 1w of the rotor 61 a, the internal resistances R 2u , R 2v , R 2w of the rotor 62 a, and the resistances Ru, Rv, Rw inserted between the control part 151 a and the rotor 61 a R 1u : (R 2u +Ru)=1:4, R 1v :(R 2v +Rv)=1:4, R 1w :(R 2w +Rw)=1:4. Thereby, the upper linear motor 62 follows the lower linear motor 61 and is driven with a weaker force than the lower linear motor 61.

於驅動下部線性馬達61、上部線性馬達62時,於側面氣墊32、33與槽10f之側面10g、10h之間、及下表面氣墊34與槽10f之底面10i之間形成空氣層,因此,能夠容易地使移動部30或光罩保持部40移動。 When driving the lower linear motor 61 and the upper linear motor 62, an air layer is formed between the side air cushions 32, 33 and the side surfaces 10g, 10h of the groove 10f, and between the lower surface air cushion 34 and the bottom surface 10i of the groove 10f. The moving part 30 or the mask holding part 40 is easily moved.

控制部151a控制光源53等,而自照射部23a照射光。又,控制部151a係自照射部23a獲取關於自照射部23a照射之光被反射器41b反射後至被照射部23a接收之時間之資訊,並將其與位置資訊(儲存於ROM153中)進行比較等,藉此檢測框架41之x方向之位置。控制部151a一面以此方式檢測框架41之位置一面控制下部線性馬達61、上部線性馬達62,使框架41向預先規定之特定之位置移動。 The control part 151a controls the light source 53, etc., and irradiates light from the irradiation part 23a. In addition, the control unit 151a obtains information from the irradiation unit 23a about the time from the time the light irradiated from the irradiation unit 23a is reflected by the reflector 41b to the time it is received by the irradiation unit 23a, and compares it with the position information (stored in the ROM153) Etc., thereby detecting the position of the frame 41 in the x direction. While detecting the position of the frame 41 in this way, the control portion 151a controls the lower linear motor 61 and the upper linear motor 62 to move the frame 41 to a predetermined specific position.

又,控制部151a控制光源53等,而自照射部23b照射光。繼而,以與對照射部23a進行之處理相同之方式檢測框架41之x方向之位置。但是,控制部151a將基於照射部23b所求出之距離用於檢測框架41之變形等,而不用於框架41之位置控制。 Moreover, the control part 151a controls the light source 53, etc., and irradiates light from the irradiation part 23b. Then, the position of the frame 41 in the x direction is detected in the same manner as the processing performed on the irradiation section 23a. However, the control unit 151a uses the distance obtained based on the irradiation unit 23b to detect the deformation of the frame 41, and not to control the position of the frame 41.

若光罩M移動至檢查位置,則控制部151a控制攝像部20而檢測光罩M上所形成之圖案。繼而,控制部151a獲取圖案之資訊,檢測 圖案中之沿著x方向之圖案(以下,稱為圖案x)相對於x方向以何種程度傾斜。 When the mask M is moved to the inspection position, the control unit 151a controls the imaging unit 20 to detect the pattern formed on the mask M. Then, the control unit 151a obtains the information of the pattern and detects In the pattern, the pattern along the x direction (hereinafter referred to as pattern x) is inclined to the x direction.

控制部151a檢測出圖案x之傾斜後,基於旋轉資訊(儲存於ROM153中),控制旋轉驅動部431使框架41旋轉,而使圖案中之水平方向之成分大致水平(修正傾斜)。 After detecting the tilt of the pattern x, the control unit 151a controls the rotation driving unit 431 to rotate the frame 41 based on the rotation information (stored in the ROM 153) so that the horizontal component in the pattern is substantially level (corrected tilt).

控制部151a使框架41旋轉後,控制下部線性馬達61及上部線性馬達62,使框架41朝+x方向移動至預先規定之位置(儲存於ROM153中)。該位置係如下位置,即,轉子62a抵接於定位用銷72,而定位用銷72使轉子62a移動至下部線性馬達61之相位與上部線性馬達62之相位一致之位置。 After the control unit 151a rotates the frame 41, it controls the lower linear motor 61 and the upper linear motor 62 to move the frame 41 in the +x direction to a predetermined position (stored in the ROM 153). This position is a position where the rotor 62a abuts against the positioning pin 72, and the positioning pin 72 moves the rotor 62a to a position where the phase of the lower linear motor 61 and the phase of the upper linear motor 62 coincide.

其後,控制部151a控制下部線性馬達61及上部線性馬達62,使框架41(光罩M)再次移動至檢查位置。然後,控制部151a藉由攝像部20進行光罩M之檢查。於本實施形態中,同時自透射照明光源照射g光線,且自反射照明光源照射e光線,並利用相機22a、22b同時接收該等而使該等圖像化。繼而,將由相機22a拍攝到之圖像及由相機22b拍攝到之圖像分別與基於圖案資訊(儲存於ROM153中)所生成之圖像加以比較,藉此發現圖案之缺陷等。再者,控制部151a亦可對由相機22a拍攝到之圖像與由相機22b拍攝到之圖像進行差分運算,而求出2張圖像之差異,藉此發現圖案之缺陷等。光罩M之檢查方法可使用業已公知之技術,因此,省略詳細之說明。 After that, the control unit 151a controls the lower linear motor 61 and the upper linear motor 62 to move the frame 41 (mask M) to the inspection position again. Then, the control unit 151a performs inspection of the mask M by the imaging unit 20. In this embodiment, the g-ray is irradiated from the transmission illuminating light source at the same time, and the e-ray is irradiated from the reflection illuminating light source at the same time, and the cameras 22a and 22b are used to simultaneously receive these to make the images. Then, the image captured by the camera 22a and the image captured by the camera 22b are respectively compared with the image generated based on the pattern information (stored in the ROM 153), thereby discovering the defects of the pattern and the like. Furthermore, the control unit 151a can also perform a difference calculation between the image captured by the camera 22a and the image captured by the camera 22b to find the difference between the two images, thereby discovering pattern defects and the like. The inspection method of the mask M can use the well-known technology, therefore, the detailed description is omitted.

光罩M整面之檢查結束後,控制部151a控制下部線性馬達61及上部線性馬達62,而使框架41(光罩M)再次移動至裝載位置。然後, 更換光罩M,移至下一光罩M之檢查。 After the inspection of the entire surface of the mask M is completed, the control unit 151a controls the lower linear motor 61 and the upper linear motor 62 to move the frame 41 (mask M) to the loading position again. Then, Replace the mask M and move to the inspection of the next mask M.

根據本實施形態,能夠一面將光罩M牢固地固定於沿大致鉛直方向設置之框架41,一面使光罩M(框架41)旋轉。藉此,能夠使與光罩M上所形成之圖案之x軸平行之線與x軸平行。尤其是,可精細地調整第1螺紋構件432A、第2螺紋構件432B之旋轉量,因此,可精細地調整光罩M(框架41)之旋轉量,而可使與圖案之x軸平行之線與x軸大致完全平行。具體而言,可於x方向之位置相距1m之距離下將與圖案之x軸平行之線之高度方向之偏移設為0.5~1μm以內。 According to this embodiment, it is possible to firmly fix the mask M to the frame 41 provided in the substantially vertical direction while rotating the mask M (frame 41). Thereby, the line parallel to the x-axis of the pattern formed on the mask M can be made parallel to the x-axis. In particular, the amount of rotation of the first screw member 432A and the second screw member 432B can be finely adjusted. Therefore, the amount of rotation of the mask M (frame 41) can be finely adjusted, and the line parallel to the x-axis of the pattern can be made finely. It is approximately completely parallel to the x-axis. Specifically, the offset in the height direction of the line parallel to the x-axis of the pattern can be set to within 0.5~1μm under the distance of 1m between the positions in the x direction.

例如,於使用圖像處理(主動對準)修正與圖案之x軸平行之線之傾斜之情形時,12~24μm左右之修正為限度。又,若與圖案之x軸平行之線中斷,則利用圖像處理無法應對,而無法進行檢查。相對於此,藉由使光罩M(框架41)旋轉,而即便於利用圖像處理無法應對之情形時,亦能夠確實地進行檢查。 For example, when using image processing (active alignment) to correct the inclination of the line parallel to the x-axis of the pattern, the correction of about 12~24μm is the limit. In addition, if the line parallel to the x-axis of the pattern is interrupted, it cannot be handled by image processing, and inspection cannot be performed. On the other hand, by rotating the mask M (frame 41), even when the situation cannot be dealt with by image processing, the inspection can be performed reliably.

又,根據本實施形態,鏈輪435之齒數α:鏈輪436之齒數β=反射器41b與第2螺紋構件432B之x方向之距離A:反射器41b與第1螺紋構件432A之x方向之距離B,因此,能夠以反射器41b之x方向之位置O為基準使框架41旋轉。因此,即便使框架41旋轉,反射器41b之y方向之位置亦幾乎不變化。藉此,於利用雷射干涉儀(包含照射部23a、光源53)確認位置之作為基準框之框架41之位置檢測時不會產生不良狀況,且可於將光罩M牢固地固定於框架41之狀態下使框架41旋轉。 Furthermore, according to this embodiment, the number of teeth of the sprocket 435 α: the number of teeth of the sprocket 436 β=the distance between the reflector 41b and the second screw member 432B in the x direction A: the difference between the reflector 41b and the first screw member 432A in the x direction The distance B therefore makes it possible to rotate the frame 41 based on the position O of the reflector 41b in the x direction. Therefore, even if the frame 41 is rotated, the position of the reflector 41b in the y direction hardly changes. As a result, when the position of the frame 41 as the reference frame is checked by the laser interferometer (including the irradiating part 23a and the light source 53), there will be no defects in the position detection, and the mask M can be firmly fixed to the frame 41 In this state, the frame 41 is rotated.

又,根據本實施形態,藉由使本身旋轉,可製成簡單之機構而防止因機構複雜化引起之不良狀況。例如,於在基準框(此處為框架41) 之內側進而設置框(內側框),藉由使內側框旋轉而使光罩M旋轉之情形時,機構變得複雜,由此導致框變厚或框之強度降低。又,於使內側框旋轉時,對內側框施加力,因此,即便將基準框與內側框固定,亦有由於移動部30之加速度等外力導致內側框相對於基準框微觀上移動之虞。同樣地,於使光罩M相對於基準框旋轉之情形時,亦對光罩M施加力,因此,即便使光罩M相對於基準框固定,亦有由於外力導致光罩M相對於基準框微觀上移動之虞。其結果,不能使對基準框之位置進行測定所獲得之光罩M之位置與本來應存在之光罩M之位置不產生偏移。 In addition, according to the present embodiment, by rotating itself, a simple mechanism can be made to prevent defects caused by the complexity of the mechanism. For example, in the reference frame (here frame 41) A frame (inner frame) is further provided on the inner side, and when the mask M is rotated by rotating the inner frame, the mechanism becomes complicated, which results in the thickening of the frame or the reduction of the strength of the frame. Furthermore, when the inner frame is rotated, force is applied to the inner frame. Therefore, even if the reference frame and the inner frame are fixed, the inner frame may move microscopically relative to the reference frame due to external forces such as acceleration of the moving part 30. Similarly, when the photomask M is rotated relative to the reference frame, force is also applied to the photomask M. Therefore, even if the photomask M is fixed relative to the reference frame, the photomask M may be relative to the reference frame due to external force. The fear of microscopic movement. As a result, the position of the mask M obtained by measuring the position of the reference frame cannot be offset from the position of the mask M that should exist.

相對於此,於本實施形態中,使基準框(框架41)本身移動,因此,光罩M不會相對於基準框移動,而對框架41之位置進行測定所獲得之光罩M之位置與本來應存在之光罩M之位置不會產生偏移。 In contrast, in the present embodiment, the reference frame (frame 41) itself is moved. Therefore, the mask M does not move relative to the reference frame, and the position of the mask M obtained by measuring the position of the frame 41 is compared with The position of the mask M that should exist will not shift.

又,根據本實施形態,設置下部線性馬達61及上部線性馬達62,且以可於x方向上移動之方式設置轉子62a,藉此,即便伴隨框架41之旋轉而轉子62a之位置發生改變,亦可藉由使轉子62a移動而無問題地驅動上部線性馬達62。 In addition, according to the present embodiment, the lower linear motor 61 and the upper linear motor 62 are provided, and the rotor 62a is provided so as to be movable in the x direction, so that even if the position of the rotor 62a changes with the rotation of the frame 41, The upper linear motor 62 can be driven without any problem by moving the rotor 62a.

再者,於本實施形態中,移動部30沿形成於平台10之上表面10e之槽10f移動,但亦可不於平台10形成槽,而使移動部30於上表面10e上移動。例如,亦可於上表面10e設置導軌等,而使移動部30沿該導軌等移動。 Furthermore, in this embodiment, the moving part 30 moves along the groove 10f formed on the upper surface 10e of the platform 10. However, the moving part 30 may be moved on the upper surface 10e without forming a groove in the platform 10. For example, a rail or the like may be provided on the upper surface 10e, and the moving part 30 may be moved along the rail or the like.

以上,參照圖式對本發明之實施形態進行了詳細說明,但具體構成並不限於該實施形態,亦包含不脫離本發明之主旨之範圍之設計變更等。 As mentioned above, the embodiment of the present invention has been described in detail with reference to the drawings, but the specific configuration is not limited to the embodiment, and also includes design changes that do not depart from the scope of the spirit of the present invention.

尤其是,本發明既可提供一種光罩保持裝置(光罩保持部),亦可提供一種光罩檢查裝置,該光罩檢查裝置具備:光罩保持裝置;柱,其以自平台之上表面向上方突出之方式設置於平台;攝像部,其設置於柱,對形成於光罩之圖案進行拍攝;光照射部,其設置於柱,對反射鏡照射光;及控制部,其獲取由攝像部拍攝到之圖案之資訊,以圖案中之水平方向之成分成為大致水平之方式控制旋轉驅動部,且控制光照射部而檢測框架之水平方向之位置。 In particular, the present invention can provide a photomask holding device (a photomask holding portion), and can also provide a photomask inspection device. The photomask inspection device includes: a photomask holding device; It is arranged on the platform in a manner protruding upward; the imaging part is arranged on the pillar to photograph the pattern formed on the mask; the light irradiation part is arranged on the pillar to irradiate light to the mirror; and the control part, which is captured by the camera For the information of the pattern captured by the part, the rotation driving part is controlled so that the horizontal component in the pattern becomes approximately horizontal, and the light irradiating part is controlled to detect the horizontal position of the frame.

又,於本發明中,所謂「大致」,係不僅包含嚴格相同之情形,還包含不失同一性之程度之誤差或變形之概念。例如,所謂大致立方體形狀,並不限於嚴格為立方體形狀之情形。例如,於平台10形成有凹部10b等,但若將平台10視作整體則為大致立方體形狀。又,例如,於僅表達為鉛直、一致等之情形時,不僅包含嚴格為鉛直、一致等之情形,還包含大致鉛直、大致一致等之情形。 In addition, in the present invention, the term "approximately" not only includes the exact same conditions, but also includes the concept of errors or distortions to the extent that they do not lose identity. For example, the so-called substantially cubic shape is not limited to the case of strictly cubic shape. For example, although the recessed part 10b etc. are formed in the platform 10, if the platform 10 is regarded as a whole, it will become a substantially cubic shape. In addition, for example, when expressing only the case of verticality, uniformity, etc., not only the case of strictly verticality, uniformity, etc., but also the case of substantially verticality, substantially uniformity, etc. are included.

又,於本發明中,所謂「附近」,係如下概念:例如為A之附近時,表示A之近旁且可包含A亦可不包含A。 In addition, in the present invention, the so-called "nearby" refers to the following concept: for example, when it is in the vicinity of A, it means the vicinity of A and may or may not include A.

31‧‧‧移動構件本體 31‧‧‧Moving component body

40‧‧‧光罩保持部 40‧‧‧Mask holding part

41‧‧‧框架 41‧‧‧Frame

41b‧‧‧反射器 41b‧‧‧Reflector

41c‧‧‧反射器 41c‧‧‧Reflector

41d‧‧‧下框部分 41d‧‧‧The lower frame part

41e‧‧‧上框部分 41e‧‧‧Upper frame part

41f‧‧‧保持部 41f‧‧‧Retention Department

43‧‧‧旋轉機構 43‧‧‧Rotating mechanism

62a‧‧‧轉子 62a‧‧‧Rotor

63‧‧‧轉子導件 63‧‧‧Rotor guide

64‧‧‧制動機構 64‧‧‧Brake mechanism

65‧‧‧彈性構件 65‧‧‧Elastic member

341‧‧‧下表面氣墊 341‧‧‧Lower surface air cushion

342‧‧‧下表面氣墊 342‧‧‧Lower surface air cushion

431‧‧‧旋轉驅動部 431‧‧‧Rotation drive unit

431a‧‧‧輸出軸 431a‧‧‧Output shaft

432A‧‧‧第1螺紋構件 432A‧‧‧First threaded member

432B‧‧‧第2螺紋構件 432B‧‧‧Second threaded member

433A‧‧‧第1螺母構件 433A‧‧‧The first nut member

433B‧‧‧第2螺母構件 433B‧‧‧Second nut member

434‧‧‧鏈輪 434‧‧‧Sprocket

434a‧‧‧鏈輪 434a‧‧‧Sprocket

435‧‧‧鏈輪 435‧‧‧Sprocket

436‧‧‧鏈輪 436‧‧‧Sprocket

437‧‧‧動力傳遞部 437‧‧‧Power Transmission Department

437a‧‧‧動力傳遞部 437a‧‧‧Power Transmission Department

437b‧‧‧動力傳遞部 437b‧‧‧Power Transmission Department

438A‧‧‧第1銷 438A‧‧‧1st pin

438B‧‧‧第2銷 438B‧‧‧Second pin

439A‧‧‧第1軸承 439A‧‧‧The first bearing

439B‧‧‧第2軸承 439B‧‧‧Second bearing

A‧‧‧距離 A‧‧‧Distance

B‧‧‧距離 B‧‧‧Distance

H1‧‧‧距離 H1‧‧‧Distance

O‧‧‧位置 O‧‧‧Location

M‧‧‧光罩 M‧‧‧Mask

Φ‧‧‧旋轉角度 Φ‧‧‧Rotation angle

Claims (9)

一種光罩保持裝置,其特徵在於具備:平台;光罩保持部,其具有將被檢查對象之光罩沿大致鉛直方向保持之大致框狀之框架、與使上述框架旋轉之旋轉機構;及移動部,其載置於上述平台並且供載置上述光罩保持部,且以可沿上述平台之長度方向移動之方式設置;上述旋轉機構具有:第1螺母構件及第2螺母構件,其等設置於位於上述框架之下側之框部分之兩端附近;第1螺紋構件及第2螺紋構件,其等與上述第1螺母構件及上述第2螺母構件分別螺合;及旋轉驅動部,其使上述第1螺紋構件及上述第2螺紋構件以不同之量旋轉;於上述移動部,沿大致鉛直方向設置有第1銷及第2銷,上述第1螺紋構件係於上述第1銷之上方設置於在俯視時與上述第1銷重疊之位置,且上述第2螺紋構件係於上述第2銷之上方設置於在俯視時與上述第2銷重疊之位置。 A photomask holding device, characterized by comprising: a platform; a photomask holding portion having a substantially frame-shaped frame for holding the photomask of an object under inspection in a substantially vertical direction, and a rotating mechanism for rotating the frame; and moving Section, which is placed on the platform and for placing the mask holding section, and is provided in a manner movable along the length direction of the platform; the rotation mechanism has: a first nut member and a second nut member, etc. In the vicinity of both ends of the frame portion located on the lower side of the frame; a first threaded member and a second threaded member, which are respectively screwed with the first nut member and the second nut member; and a rotation drive part which makes The first screw member and the second screw member rotate by different amounts; the moving part is provided with a first pin and a second pin in a substantially vertical direction, and the first screw member is installed above the first pin At a position overlapping with the first pin in a plan view, and the second screw member is provided above the second pin at a position overlapping with the second pin in a plan view. 如申請專利範圍第1項之光罩保持裝置,其中於上述框架之側面,設置用以使光於入射方向返回之反射鏡,上述旋轉驅動部具有:致動器;第1鏈輪,其與上述第1螺紋構件同軸地設置,使上述第1螺紋構件旋轉;第2鏈輪,其與上述第2螺紋構件同軸地設置,使上述第2螺紋構件旋轉;及動力傳遞部,其將致動器之驅動軸與上述第1鏈輪及上述第2鏈輪連結;且 在俯視時,將上述反射鏡與上述第2螺紋構件之距離設為距離A,將上述反射鏡與上述第1螺紋構件之距離設為距離B,則上述第1鏈輪之齒數α與上述第2鏈輪之齒數β具有齒數α:齒數β=距離A:距離B之關係。 For example, the mask holding device of the first item of the scope of patent application, wherein a mirror for returning light in the incident direction is provided on the side of the frame, and the rotation driving part has: an actuator; a first sprocket, which is connected with The first screw member is provided coaxially to rotate the first screw member; a second sprocket is provided coaxially with the second screw member to rotate the second screw member; and a power transmission portion that will actuate The drive shaft of the gear is connected to the first sprocket and the second sprocket; and In a plan view, assuming that the distance between the mirror and the second screw member is a distance A, and the distance between the mirror and the first screw member is a distance B, the number of teeth α of the first sprocket is equal to that of the first screw member. 2 The number of teeth β of the sprocket has the relationship of the number of teeth α: the number of teeth β=distance A: distance B. 如申請專利範圍第1或2項之光罩保持裝置,其中於上述平台之上表面,形成沿上述平台之長度方向之槽,上述移動部具有:下表面氣墊,其朝向上述槽之底面噴出空氣;側面氣墊,其朝向上述槽之側面噴出空氣;及移動構件本體,其設置上述下表面氣墊及上述側面氣墊;上述第1銷及上述第2銷中,下端設置於上述下表面氣墊,且上端設置於上述移動構件本體,上述第1螺紋構件及上述第2螺紋構件中,下端設置於上述移動構件本體,且上述移動構件本體沿上述槽移動。 For example, the mask holding device of item 1 or 2 of the scope of patent application, wherein a groove along the length direction of the platform is formed on the upper surface of the platform, and the moving part has: a lower surface air cushion, which sprays air toward the bottom surface of the groove Side air cushion, which sprays air toward the side of the groove; and the moving member body, which is provided with the lower surface air cushion and the side air cushion; in the first pin and the second pin, the lower end is set on the lower surface air cushion, and the upper end The lower end of the movable member body is provided in the movable member body, the first screw member and the second screw member, and the lower end is provided in the movable member body, and the movable member body moves along the groove. 如申請專利範圍第3項之光罩保持裝置,其中上述下表面氣墊具有:第1下表面氣墊,其設置於上述移動構件本體之第1端附近;及第2下表面氣墊,其設置於上述移動構件本體之與上述第1端為相反側之第2端附近;於上述第1下表面氣墊之底面大致中央部,形成噴出空氣之第1開口部,於上述第2下表面氣墊之底面大致中央部,形成噴出空氣之第2開口部, 上述第1螺紋構件及上述第1銷係設於在俯視時與上述第1開口部重疊之位置,且上述第2螺紋構件及上述第2銷係設於在俯視時與上述第2開口部重疊之位置。 For example, the mask holding device of item 3 of the scope of patent application, wherein the lower surface air cushion has: a first lower surface air cushion disposed near the first end of the moving member body; and a second lower surface air cushion disposed on the above Near the second end of the moving member body on the opposite side to the first end; in the approximate center of the bottom surface of the first lower surface air cushion, a first opening for ejecting air is formed, and the bottom surface of the second lower surface air cushion is approximately In the center part, a second opening for blowing out air is formed, The first screw member and the first pin are provided at a position overlapping with the first opening in a plan view, and the second screw member and the second pin are provided at a position overlapping with the second opening in a plan view的的位置。 The location. 如申請專利範圍第3項之光罩保持裝置,其中於上述移動構件本體之上表面側,分別於中心軸與上述第1銷大致一致之位置設置第1斜角滾珠軸承,於中心軸與上述第2銷大致一致之位置設置第2斜角滾珠軸承,且上述第1螺紋構件之下端樞轉支承於上述第1斜角滾珠軸承,上述第2螺紋構件之下端樞轉支承於上述第2斜角滾珠軸承。 For example, the mask holding device of item 3 of the scope of patent application, wherein on the upper surface side of the moving member body, first angular ball bearings are respectively provided at positions where the central axis and the first pin are approximately the same, and the central axis and the above A second angled ball bearing is provided at a position substantially coincident with the second pin, and the lower end of the first screw member is pivotally supported by the first angled ball bearing, and the lower end of the second screw member is pivotally supported by the second angled ball bearing. Angular ball bearings. 如申請專利範圍第1或2項之光罩保持裝置,其具有使上述移動部沿上述平台之長度方向移動之第1線性馬達、及追隨上述第1線性馬達而驅動之第2線性馬達,於上述移動部,設置上述第1線性馬達之轉子,於上述框架之上側,以相對於水平方向傾斜之方式設置導引構件,且於上述導引構件,以可沿上述導引構件移動之方式設置上述第2線性馬達之轉子,並且設置使上述第2線性馬達之轉子相對於上述導引構件固定之固定構件。 For example, the mask holding device of item 1 or 2 of the scope of patent application has a first linear motor that moves the moving part along the length of the platform, and a second linear motor that follows the first linear motor to drive, and The moving part is provided with the rotor of the first linear motor, a guide member is provided on the upper side of the frame so as to be inclined with respect to the horizontal direction, and the guide member is provided so as to be movable along the guide member The rotor of the second linear motor is further provided with a fixing member that fixes the rotor of the second linear motor with respect to the guide member. 如申請專利範圍第3項之光罩保持裝置,其具有使上述移動部沿上述平台之長度方向移動之第1線性馬達、及追隨上述第1線性馬達而驅動之第2線性馬達, 於上述移動部,設置上述第1線性馬達之轉子,於上述框架之上側,以相對於水平方向傾斜之方式設置導引構件,且於上述導引構件,以可沿上述導引構件移動之方式設置上述第2線性馬達之轉子,並且設置使上述第2線性馬達之轉子相對於上述導引構件固定之固定構件。 For example, the mask holding device of item 3 of the scope of patent application has a first linear motor that moves the moving part along the length of the platform, and a second linear motor that follows the first linear motor to drive, The rotor of the first linear motor is installed in the moving part, a guide member is installed on the upper side of the frame so as to be inclined with respect to the horizontal direction, and the guide member is movable along the guide member The rotor of the second linear motor is provided, and a fixing member that fixes the rotor of the second linear motor with respect to the guide member is provided. 如申請專利範圍第4項之光罩保持裝置,其具有使上述移動部沿上述平台之長度方向移動之第1線性馬達、及追隨上述第1線性馬達而驅動之第2線性馬達,於上述移動部,設置上述第1線性馬達之轉子,於上述框架之上側,以相對於水平方向傾斜之方式設置導引構件,且於上述導引構件,以可沿上述導引構件移動之方式設置上述第2線性馬達之轉子,並且設置使上述第2線性馬達之轉子相對於上述導引構件固定之固定構件。 For example, the mask holding device of the fourth item of the patent application has a first linear motor that moves the moving part along the length of the platform, and a second linear motor that follows the first linear motor and drives it to move Section, the rotor of the first linear motor is provided, a guide member is provided on the upper side of the frame so as to be inclined with respect to the horizontal direction, and the guide member is provided so as to be movable along the guide member. 2 The rotor of the linear motor is provided with a fixing member that fixes the rotor of the second linear motor with respect to the guide member. 如申請專利範圍第5項之光罩保持裝置,其具有使上述移動部沿上述平台之長度方向移動之第1線性馬達、及追隨上述第1線性馬達而驅動之第2線性馬達,於上述移動部,設置上述第1線性馬達之轉子,於上述框架之上側,以相對於水平方向傾斜之方式設置導引構件,且於上述導引構件,以可沿上述導引構件移動之方式設置上述第2線 性馬達之轉子,並且設置使上述第2線性馬達之轉子相對於上述導引構件固定之固定構件。 For example, the mask holding device of item 5 of the scope of patent application has a first linear motor that moves the moving part along the length of the platform, and a second linear motor that follows the first linear motor and drives it to move Section, the rotor of the first linear motor is provided, a guide member is provided on the upper side of the frame so as to be inclined with respect to the horizontal direction, and the guide member is provided so as to be movable along the guide member. 2-wire The rotor of the linear motor is provided with a fixing member that fixes the rotor of the second linear motor with respect to the guide member.
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