TWI735539B - Coating device and coating method - Google Patents

Coating device and coating method Download PDF

Info

Publication number
TWI735539B
TWI735539B TW106105548A TW106105548A TWI735539B TW I735539 B TWI735539 B TW I735539B TW 106105548 A TW106105548 A TW 106105548A TW 106105548 A TW106105548 A TW 106105548A TW I735539 B TWI735539 B TW I735539B
Authority
TW
Taiwan
Prior art keywords
coating liquid
coating
pressure
applicator
pump
Prior art date
Application number
TW106105548A
Other languages
Chinese (zh)
Other versions
TW201741036A (en
Inventor
谷義則
岡本俊一
伊藤俊文
鈴木暁雄
Original Assignee
日商東麗工程股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東麗工程股份有限公司 filed Critical 日商東麗工程股份有限公司
Publication of TW201741036A publication Critical patent/TW201741036A/en
Application granted granted Critical
Publication of TWI735539B publication Critical patent/TWI735539B/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • B05C5/0258Coating heads with slot-shaped outlet flow controlled, e.g. by a valve
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1007Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material
    • B05C11/1013Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material responsive to flow or pressure of liquid or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1026Valves
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/26Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface

Landscapes

  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Spray Control Apparatus (AREA)

Abstract

本發明將塗佈於被塗佈構件之塗膜之厚度設為所需之厚度。 塗佈裝置5之塗佈器10具有積存塗佈液之積存部13、噴出塗佈液之噴出口11、及使該等積存部13與噴出口11相連之狹縫狀流路12,且對基板7自噴出口11噴出塗佈液。塗佈裝置5具備:移動機構20,其使塗佈器10相對於基板7沿與被塗佈面8平行之方向移動;泵30,其將塗佈液供給至塗佈器10;及控制裝置50。控制裝置50於一面進行塗佈器10之移動一面對基板7自噴出口11噴出塗佈液之塗佈動作時,進行用以一面使塗佈器10內之塗佈液為負壓一面自泵30將塗佈液供給至塗佈器10之控制。In the present invention, the thickness of the coating film applied to the member to be coated is set to the desired thickness. The coater 10 of the coating device 5 has a reservoir 13 for accumulating the coating liquid, an ejection port 11 for ejecting the coating liquid, and a slit-like flow path 12 connecting the reservoir 13 and the ejection port 11, and is opposed to The substrate 7 ejects the coating liquid from the ejection port 11. The coating device 5 includes: a moving mechanism 20 that moves the coater 10 relative to the substrate 7 in a direction parallel to the coated surface 8; a pump 30 that supplies the coating liquid to the coater 10; and a control device 50. When the control device 50 moves the coater 10 on one side and sprays the coating liquid from the ejection port 11 on the substrate 7, it performs the self-pumping while making the coating liquid in the coater 10 negative pressure. 30 supplies the coating liquid to the control of the coater 10.

Description

塗佈裝置及塗佈方法Coating device and coating method

本發明係關於一種用以於被塗佈構件形成塗膜之塗佈裝置及塗佈方法。The present invention relates to a coating device and coating method for forming a coating film on a coated member.

作為用以於被塗佈構件(例如矽晶圓般之圓形基板)以均勻之厚度形成塗膜之塗佈裝置,狹縫式塗佈機或旋轉塗佈機已廣為人知,但各自特性不同,根據其特性而擴展用途。 狹縫式塗佈機例如用於向液晶顯示器之彩色濾光片或TFT(thin-film transistor,薄膜電晶體)基板之塗膜形成。狹縫式塗佈機亦能夠應對大型玻璃基板,且充分發揮塗佈液之利用效率較高(亦即,塗佈液之浪費較少)之特性。 旋轉塗佈機就應對大型基板或塗佈液之利用效率之觀點而言較狹縫式塗佈機差,但可相對容易地對如矽晶圓般之圓形基板形成均勻之厚度之塗膜,從而廣泛地用於半導體之製造領域。 但是,近年來,於半導體之製造領域中,為了提高塗佈液之利用效率,亦逐漸使用狹縫式塗佈機(例如,參照專利文獻1及專利文獻2)。狹縫式塗佈機具有塗佈器(亦稱為噴嘴、狹縫模嘴),於其內部形成有狹縫狀之流路,且其前端成為塗佈液之噴出口。噴出口具有細長形狀,具有較圓形基板(矽晶圓)之直徑更大之寬度尺寸。 而且,於使基板與塗佈器(噴出口)對向之狀態下使該等相對移動,藉由在基板與塗佈器之間產生之塗佈液(塗佈液之液滴)之表面張力,可將塗佈液自噴出口噴出(引出)。因此,於與細長之噴出口對向而存在基板之部分,噴出(引出)塗佈液,相對於此,於無基板之部分不噴出(不引出)塗佈液。其結果,對於如矽晶圓等般之圓形基板,能夠不浪費地消耗塗佈液,而於需要之部分形成塗膜,從而可提高塗佈液之利用效率。 又,此種狹縫式塗佈機(亦稱為毛細管塗佈機)先前係使塗佈器之噴出口向上之構成,但如專利文獻1及專利文獻2所揭示般,提出有使噴出口向下者。於該狹縫式塗佈機中,設為使塗佈器之噴出口向下之狀態,並進行將該塗佈器內之塗佈液之壓力(內壓)保持為負壓之控制。然後,藉由在基板與塗佈器之間產生之塗佈液(塗佈液之液滴)之表面張力將塗佈液自塗佈器引出,而將塗佈液效率良好地塗佈於如矽晶圓般之圓形基板。 再者,使噴出口向下之優點在於如下方面:能夠使基板之塗佈面向上,由此,基板之處理變得簡易,及可抑制塗佈後之液體流動。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特開2013-98371號公報 [專利文獻2]日本專利特開2015-192984號公報As a coating device used to form a coating film with a uniform thickness on a coated member (such as a round substrate like a silicon wafer), slit coaters or spin coaters have been widely known, but their characteristics are different. Expand the use according to its characteristics. The slit coater is used, for example, to form a coating film on a color filter of a liquid crystal display or a TFT (thin-film transistor) substrate. The slit coater can also handle large glass substrates, and fully utilize the characteristics of higher utilization efficiency of the coating liquid (that is, less waste of the coating liquid). The spin coater is inferior to the slit coater in terms of the utilization efficiency of large substrates or coating liquids, but it can relatively easily form a uniform thickness of the coating film on a round substrate like a silicon wafer , Which is widely used in the field of semiconductor manufacturing. However, in recent years, in the field of semiconductor manufacturing, in order to improve the utilization efficiency of the coating liquid, a slit coater has gradually been used (for example, refer to Patent Document 1 and Patent Document 2). The slit coater has a coater (also referred to as a nozzle or a slit die nozzle), a slit-shaped flow path is formed inside the coater, and the front end of the coater becomes a spray outlet for the coating liquid. The ejection port has a slender shape and a width dimension larger than the diameter of a circular substrate (silicon wafer). In addition, the relative movement of the substrate and the coater (ejection port) is caused by the surface tension of the coating liquid (droplets of the coating liquid) generated between the substrate and the coater. , The coating liquid can be ejected (extracted) from the ejection port. Therefore, the coating liquid is ejected (extracted) from the portion where the substrate is opposite to the elongated ejection port, while the coating liquid is not ejected (not drawn) on the portion without the substrate. As a result, for circular substrates such as silicon wafers, the coating liquid can be consumed without wasting, and a coating film can be formed on the required part, thereby improving the utilization efficiency of the coating liquid. In addition, this type of slit coater (also referred to as a capillary coater) has previously been configured with the nozzle of the coater upward, but as disclosed in Patent Document 1 and Patent Document 2, it has been proposed to make the nozzle Downward. In the slit coater, the spray outlet of the coater is placed downward, and the pressure (internal pressure) of the coating liquid in the coater is controlled to be a negative pressure. Then, the coating liquid is drawn out from the applicator by the surface tension of the coating liquid (droplets of the coating liquid) generated between the substrate and the applicator, so that the coating liquid can be efficiently applied to such as A round substrate like a silicon wafer. Furthermore, the advantage of making the ejection orifice downward lies in the following aspects: the coating surface of the substrate can be made upward, thereby simplifying the processing of the substrate and suppressing the flow of liquid after coating. [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent Laid-Open No. 2013-98371 [Patent Document 2] Japanese Patent Laid-Open No. 2015-192984

[發明所欲解決之問題] 於使用將塗佈器之噴出口設為向下之毛細管塗佈機將塗佈液塗佈於基板之情形時,對塗佈液之膜厚產生影響之主要之控制參數係塗佈器內之壓力或塗佈速度。即便使用該等控制參數進行控制而進行塗佈,亦必需以較高之精度進行控制,以使膜厚穩定地再現。 上述專利文獻1所記載之毛細管塗佈機構成為於塗佈器之內部形成有積存塗佈液之窄幅之貯存室,且對該貯存室之壓力(氣壓)進行控制。若貯存室之塗佈液自噴出口噴出、亦即若為了塗佈而消耗塗佈液,則貯存室之塗佈液之液面降低。雖可對塗佈器(貯存室)自外部重新供給塗佈液,但由於貯存室為窄幅,故而伴隨塗佈液之消耗(及供給)之液面高度之變動較大,其結果,將貯存室之壓力保持為固定之控制實質上較為困難。 又,上述專利文獻2所記載之毛細管塗佈機具備經由配管與塗佈器連接之積存塗佈液之罐,基於設置於塗佈器之壓力感測器之測定值對上述罐之壓力進行反饋控制,以使塗佈器內之壓力成為固定。但是,存在如下情況:因塗佈液於自罐至塗佈器為止之流路(配管)內流動時產生之壓力損失,而塗佈液之動作變慢,控制之響應性降低。即,存在如下問題:即便對罐之壓力進行控制,亦會於因該控制所致之壓力變化反映於塗佈器內之壓力之前產生時間偏差,其結果,塗佈器內之壓力不會變成所需之壓力、或者塗佈器內之壓力變動。 如上所述般,若塗佈器內之壓力之控制不穩定,則自塗佈器噴出之塗佈液之噴出量變動,其結果,形成於被塗佈構件上之塗膜之膜厚有可能不會變得均勻。 因此,本發明係為了解決如上述般之毛細管塗佈機(毛細管塗佈)之問題而完成者,其目的在於提供一種能夠使形成於被塗佈構件之塗膜之厚度為所需之厚度之塗佈裝置及塗佈方法。 [解決問題之技術手段] 本發明之塗佈裝置具備:塗佈器,其具有積存塗佈液之積存部、噴出塗佈液之噴出口、及使上述積存部與上述噴出口相連之狹縫狀流路,且自該噴出口對被塗佈構件噴出塗佈液;移動機構,其使上述塗佈器與上述被塗佈構件沿與該被塗佈構件之被塗佈面平行之方向相對移動;泵,其對上述塗佈器供給塗佈液;以及控制裝置,其於一面進行上述相對移動一面對上述被塗佈構件自上述噴出口噴出塗佈液之塗佈動作時,進行用以一面使上述塗佈器內之塗佈液為負壓一面自上述泵將塗佈液供給至上述塗佈器之控制。 根據該塗佈裝置,可進行如下之毛細管塗佈,即,能夠自噴出口噴出塗佈液,而將所需厚度之塗膜形成於被塗佈構件(被塗佈面)上。 又,上述控制裝置可於上述塗佈動作時,進行將與自上述噴出口噴出之塗佈液之量對應之塗佈液自上述泵供給至上述塗佈器之控制。 根據該構成,於塗佈動作時,由於將與藉由自噴出口噴出而消耗之塗佈液之量對應之塗佈液自泵供給至塗佈器,故而容易進行將所需厚度之塗膜形成於被塗佈構件(被塗佈面)上之毛細管塗佈之控制。 又,上述塗佈裝置進而具備:壓力賦予裝置,其使壓力作用於上述塗佈器內之塗佈液;及壓力感測器,其測定上述塗佈器內之塗佈液之壓力;且上述控制裝置可藉由上述壓力賦予裝置進行上述塗佈器內之塗佈液之壓力控制,以使上述塗佈器內之塗佈液為負壓,並且基於上述壓力感測器之測定結果進行利用上述泵之塗佈液之調整控制。 根據該構成,進行用以將塗佈器內之壓力(負壓)保持為固定之壓力控制,將所需厚度之塗膜形成於被塗佈構件(被塗佈面)上之毛細管塗佈之控制變得容易。 又,於使塗佈液附著於被塗佈構件之塗佈開始部時,較佳為適當地控制塗佈液之噴出量而自塗佈開始部獲得所需之膜厚。因此,上述控制裝置較佳為,藉由上述泵將塗佈液供給至上述塗佈器以便進行開始對上述被塗佈構件附著塗佈液之液體附著動作,於藉由該供給使上述塗佈器內之塗佈液之壓力提高之後,若檢測出該壓力之降低,則停止利用上述泵供給塗佈液。 若自泵對塗佈器進行塗佈液之供給,則塗佈器內之塗佈液之壓力暫時變高,由此,塗佈液自噴出口噴出。然後,若塗佈液接觸於被塗佈構件,則因塗佈液之表面張力而欲進一步引出塗佈器內之塗佈液,由此,塗佈器內之壓力降低。因此,若檢測出該壓力之降低,則停止利用泵供給塗佈液,藉此,能夠防止於液體附著動作時過剩之塗佈液附著於被塗佈構件。 又,為了進行上述液體附著動作,上述塗佈裝置較佳為進而具備:罐,其通過配管與上述塗佈器連接而積存塗佈液;壓力調整器,其調整積存於上述罐之塗佈液之壓力,以將上述塗佈器內之塗佈液之壓力保持為特定之值;及閥,其能夠將上述塗佈器與上述罐連通及阻斷;且上述控制裝置係於藉由上述閥阻斷上述塗佈器與上述罐之連通之狀態下,藉由上述泵將塗佈液供給至上述塗佈器,若之後檢測出上述壓力之降低,則停止利用上述泵供給塗佈液,並且使上述閥動作而使上述罐與上述塗佈器連通。 根據該構成,於液體附著動作時,能夠於自噴出口噴出之塗佈液附著於被塗佈構件之後,將塗佈器內之塗佈液之壓力保持為固定值(負壓)。 又,本發明之塗佈方法係用以自塗佈器之噴出口對被塗佈構件噴出塗佈液而進行毛細管塗佈之方法,該塗佈器具有積存塗佈液之積存部、噴出塗佈液之噴出口、及使上述積存部與上述噴出口相連之狹縫狀流路;該塗佈方法進行一面使上述塗佈器與上述被塗佈構件沿與該被塗佈構件之被塗佈面平行之方向相對移動、一面對該被塗佈構件自上述噴出口噴出塗佈液之塗佈動作,且於上述塗佈動作時,一面使上述塗佈器內之塗佈液為負壓一面自與該塗佈器相連之泵將塗佈液供給至該塗佈器。 根據該塗佈方法,可進行如下之毛細管塗佈,即,能夠自噴出口噴出塗佈液,而將所需厚度之塗膜形成於被塗佈構件(被塗佈面)上。 又,於上述塗佈動作時,將與自上述噴出口噴出之塗佈液之量對應之塗佈液自上述泵供給至上述塗佈器。 根據該構成,於塗佈動作時,由於將與藉由自噴出口噴出而消耗之塗佈液之量對應之塗佈液自泵供給至塗佈器,故而容易進行將所需厚度之塗膜形成於被塗佈構件(被塗佈面)上之毛細管塗佈之控制。 又,藉由壓力感測器測定上述塗佈器內之塗佈液之壓力,為使上述塗佈器內之塗佈液為負壓而進行該塗佈器內之塗佈液之壓力控制,並且基於上述壓力感測器之測定結果進行利用上述泵之塗佈液之調整控制。 根據該構成,進行用以將塗佈器內之壓力(負壓)保持為固定之壓力控制,將所需厚度之塗膜形成於被塗佈構件(被塗佈面)上之毛細管塗佈之控制變得容易。 又,於使塗佈液附著於被塗佈構件之塗佈開始部時,較佳為適當地控制塗佈液之噴出量而自塗佈開始部起獲得所需之膜厚。因此,較佳為藉由上述泵將塗佈液供給至上述塗佈器,以便進行開始對上述被塗佈構件附著塗佈液之液體附著動作,於藉由該供給使上述塗佈器內之塗佈液之壓力提高之後,若檢測出該壓力之降低,則停止利用上述泵供給塗佈液。 若自泵對塗佈器進行塗佈液之供給,則塗佈器內之塗佈液之壓力暫時變高,由此,塗佈液自噴出口噴出。然後,若塗佈液接觸於被塗佈構件,則因塗佈液之表面張力而欲進一步引出塗佈器內之塗佈液,由此,塗佈器內之壓力降低。因此,若檢測出該壓力之降低,則停止利用泵供給塗佈液,藉此,能夠防止於液體附著動作時過剩之塗佈液附著於被塗佈構件。 又,為了進行上述液體附著動作,較佳為,於上述塗佈器中設置有閥,該閥通過配管與積存塗佈液之罐連接並且能夠將該塗佈器與該罐連通及阻斷,能夠藉由壓力調整器調整積存於上述罐之塗佈液之壓力,以將上述塗佈器內之塗佈液之壓力保持為特定之值,於藉由上述閥阻斷上述塗佈器與上述罐之連通之狀態下,藉由上述泵將塗佈液供給至上述塗佈器,若之後檢測出上述壓力之降低,則停止利用上述泵供給塗佈液,並且使上述閥動作而使上述罐與上述塗佈器連通。 根據該構成,於液體附著動作時,能夠於自噴出口噴出之塗佈液附著於被塗佈構件之後,將塗佈器內之塗佈液之壓力保持為固定值(負壓)。 [發明之效果] 根據本發明,可藉由利用泵將供給至塗佈器之塗佈液之量控制為特定之量,而抑制因自塗佈器噴出至被塗佈構件之塗佈液之表面張力而欲自噴出口噴出至塗佈器外之塗佈液之量。其結果,於塗佈動作時,能夠將塗佈器內之塗佈液維持為負壓,而使塗佈於被塗佈構件之塗膜之厚度為所需之厚度。[Problem to be solved by the invention] When the coating liquid is applied to the substrate using a capillary coater with the nozzle of the applicator set downward, the main influence on the film thickness of the coating liquid is The control parameter is the pressure in the coater or the coating speed. Even if the coating is controlled by using these control parameters, it must be controlled with high precision to make the film thickness reproduce stably. The capillary coating mechanism described in Patent Document 1 has a narrow storage chamber in which the coating liquid is stored in the coater, and the pressure (air pressure) of the storage chamber is controlled. If the coating liquid in the storage chamber is ejected from the ejection port, that is, if the coating liquid is consumed for coating, the liquid level of the coating liquid in the storage chamber is lowered. Although it is possible to re-supply the coating liquid to the coater (storage chamber) from the outside, since the storage chamber is narrow, the liquid level with the consumption (and supply) of the coating liquid fluctuates greatly. As a result, the It is substantially difficult to control the pressure of the storage chamber to be fixed. In addition, the capillary coater described in Patent Document 2 includes a tank for storing the coating liquid connected to the coater via a pipe, and feedbacks the pressure of the tank based on the measured value of the pressure sensor provided in the coater Control so that the pressure in the applicator becomes constant. However, there are cases in which the action of the coating liquid becomes slow due to the pressure loss that occurs when the coating liquid flows in the flow path (piping) from the tank to the applicator, and the responsiveness of control decreases. That is, there is a problem that even if the pressure of the tank is controlled, there will be a time deviation before the pressure change caused by the control is reflected in the pressure in the applicator. As a result, the pressure in the applicator will not become The required pressure, or the pressure change in the applicator. As described above, if the control of the pressure in the applicator is unstable, the amount of the coating liquid sprayed from the applicator fluctuates. As a result, the thickness of the coating film formed on the member to be coated may be Will not become uniform. Therefore, the present invention was completed in order to solve the problem of the capillary coater (capillary coating) as described above, and its object is to provide a coating film that can be formed on a member to be coated to a desired thickness. Coating device and coating method. [Technical Means for Solving the Problem] The coating device of the present invention includes an applicator having a storage portion for storing the coating liquid, an ejection port for ejecting the coating liquid, and a slit connecting the storage portion and the ejection port A flow path, and spray the coating liquid from the nozzle to the member to be coated; a moving mechanism that causes the applicator and the member to be coated to face each other in a direction parallel to the coated surface of the member to be coated Pump, which supplies the coating liquid to the applicator; and the control device, which performs the relative movement on one side and the coating action of spraying the coating liquid from the ejection port on the surface of the coated member. Control of supplying the coating liquid from the pump to the applicator while keeping the coating liquid in the applicator at a negative pressure. According to this coating device, capillary coating can be performed in which the coating liquid can be ejected from the ejection port to form a coating film of a desired thickness on the member (coated surface) to be coated. In addition, the control device may perform control for supplying the coating liquid corresponding to the amount of the coating liquid ejected from the ejection port from the pump to the applicator during the coating operation. According to this structure, during the coating operation, since the coating liquid corresponding to the amount of the coating liquid consumed by ejecting from the ejection port is supplied to the coater from the pump, it is easy to form a coating film with a desired thickness Control of capillary coating on the coated member (coated surface). In addition, the coating device further includes: a pressure applying device that applies pressure to the coating liquid in the applicator; and a pressure sensor that measures the pressure of the coating liquid in the applicator; and The control device can control the pressure of the coating liquid in the applicator by the pressure applying device, so that the coating liquid in the applicator is at a negative pressure, and use it based on the measurement result of the pressure sensor Adjustment and control of the coating liquid of the above pump. According to this structure, pressure control is performed to keep the pressure (negative pressure) in the coater constant, and the capillary coating is performed to form a coating film of a desired thickness on the coated member (coated surface). Control becomes easy. In addition, when the coating liquid is attached to the coating start portion of the member to be coated, it is preferable to appropriately control the ejection amount of the coating liquid to obtain a desired film thickness from the coating start portion. Therefore, it is preferable for the control device to supply the coating liquid to the applicator by the pump so as to start the liquid adhering action of adhering the coating liquid to the member to be coated, and to cause the coating liquid to be applied by the supply. After the pressure of the coating liquid in the container is increased, if the pressure drop is detected, the supply of the coating liquid by the above-mentioned pump is stopped. If the coating liquid is supplied to the applicator from the pump, the pressure of the coating liquid in the applicator temporarily increases, whereby the coating liquid is ejected from the ejection port. Then, if the coating liquid contacts the member to be coated, the coating liquid in the applicator will be drawn out further due to the surface tension of the coating liquid, thereby reducing the pressure in the applicator. Therefore, if the pressure drop is detected, the supply of the coating liquid by the pump is stopped, thereby preventing the excess coating liquid from adhering to the member to be coated during the liquid adhering operation. Furthermore, in order to perform the above-mentioned liquid adhesion operation, the coating device preferably further includes: a tank which is connected to the applicator via a pipe to store the coating liquid; and a pressure regulator which adjusts the coating liquid stored in the tank The pressure is used to maintain the pressure of the coating liquid in the applicator at a specific value; and a valve that can connect and block the applicator and the tank; and the control device is connected to and blocked by the valve In the state that the communication between the applicator and the tank is blocked, the coating liquid is supplied to the applicator by the pump, and if a decrease in the pressure is detected later, the supply of the coating liquid by the pump is stopped, and The valve is operated to connect the tank and the applicator. According to this configuration, during the liquid adhesion operation, after the coating liquid ejected from the ejection port adheres to the member to be coated, the pressure of the coating liquid in the applicator can be maintained at a fixed value (negative pressure). In addition, the coating method of the present invention is a method for capillary coating by spraying the coating liquid from the nozzle of the coater to the member to be coated. The spray outlet of the cloth liquid, and the slit-like flow path connecting the reservoir and the spray outlet; the coating method is performed while the applicator and the member to be coated are aligned with the member to be coated The cloth surface is relatively moved in a parallel direction, while facing the coated member, spraying the coating liquid from the above-mentioned nozzle, and during the above-mentioned coating operation, while making the coating liquid in the above-mentioned applicator negative The pressure side supplies the coating liquid to the applicator from a pump connected to the applicator. According to this coating method, capillary coating can be performed in which the coating liquid can be ejected from the ejection port to form a coating film of a desired thickness on the member (coated surface) to be coated. In addition, during the coating operation, the coating liquid corresponding to the amount of the coating liquid ejected from the ejection port is supplied to the applicator from the pump. According to this structure, during the coating operation, since the coating liquid corresponding to the amount of the coating liquid consumed by ejecting from the ejection port is supplied to the coater from the pump, it is easy to form a coating film with a desired thickness Control of capillary coating on the coated member (coated surface). In addition, the pressure of the coating liquid in the applicator is measured by a pressure sensor, and the pressure of the coating liquid in the applicator is controlled in order to make the coating liquid in the applicator a negative pressure. And based on the measurement result of the pressure sensor, the adjustment control of the coating liquid using the pump is performed. According to this structure, pressure control is performed to keep the pressure (negative pressure) in the coater constant, and the capillary coating is performed to form a coating film of a desired thickness on the coated member (coated surface). Control becomes easy. In addition, when the coating liquid is attached to the coating start portion of the member to be coated, it is preferable to appropriately control the ejection amount of the coating liquid to obtain a desired film thickness from the coating start portion. Therefore, it is preferable to supply the coating liquid to the applicator by the pump in order to perform the liquid adhering action of starting to adhere the coating liquid to the member to be coated, and the supply of the coating liquid in the applicator After the pressure of the coating liquid is increased, if the pressure drop is detected, the supply of the coating liquid by the above-mentioned pump is stopped. If the coating liquid is supplied to the applicator from the pump, the pressure of the coating liquid in the applicator temporarily increases, whereby the coating liquid is ejected from the ejection port. Then, if the coating liquid contacts the member to be coated, the coating liquid in the applicator will be drawn out further due to the surface tension of the coating liquid, thereby reducing the pressure in the applicator. Therefore, if the pressure drop is detected, the supply of the coating liquid by the pump is stopped, thereby preventing the excess coating liquid from adhering to the member to be coated during the liquid adhering operation. In addition, in order to perform the above-mentioned liquid adhesion operation, it is preferable that a valve is provided in the above-mentioned applicator, and the valve is connected to a tank storing the coating liquid through a pipe and can communicate and block the applicator and the tank. The pressure of the coating liquid stored in the tank can be adjusted by a pressure regulator to keep the pressure of the coating liquid in the applicator at a specific value, and the valve can block the applicator and the When the tank is in communication, the pump is used to supply the coating liquid to the applicator. If the pressure drop is detected later, the pump is stopped to supply the coating liquid, and the valve is operated to make the tank Connect with the above-mentioned applicator. According to this configuration, during the liquid adhesion operation, after the coating liquid ejected from the ejection port adheres to the member to be coated, the pressure of the coating liquid in the applicator can be maintained at a fixed value (negative pressure). [Effects of the Invention] According to the present invention, the amount of the coating liquid supplied to the applicator can be controlled to a specific amount by using a pump, thereby suppressing the amount of coating liquid ejected from the applicator to the member to be coated. The surface tension is the amount of the coating liquid to be ejected from the ejection port to the outside of the applicator. As a result, during the coating operation, the coating liquid in the coater can be maintained at a negative pressure, so that the thickness of the coating film applied to the member to be coated can be a desired thickness.

以下,一面參照圖式,一面對本發明之實施形態進行說明。 [關於塗佈裝置之構成] 圖1係對塗佈裝置之整體構成進行說明之概略構成圖。該塗佈裝置5係用以對例如為單片狀之被塗佈構件噴出塗佈液,而形成均勻之厚度之塗膜之裝置。再者,於本實施形態中說明之被塗佈構件為圓形基板7(參照圖2(A)),具體而言為圓形之矽晶圓。 塗佈裝置5具備位於較基板7更靠上側之塗佈器10(亦稱為噴嘴、狹縫模嘴),自該塗佈器10噴出塗佈液,而將塗佈液塗佈於基板7之上表面。基板7之上表面成為供塗佈液塗佈之被塗佈面8,基板7以該被塗佈面8向上之姿勢支持於平台9上,並於該狀態下進行塗佈。 塗佈裝置5除了具備噴出塗佈液之上述塗佈器10以外,還具備:移動機構20,其使基板7與塗佈器10相對移動;泵30,其用於將塗佈液供給至塗佈器10;壓力賦予裝置40,其使壓力作用於塗佈器10內之塗佈液;控制裝置50,其係由進行各種控制之電腦構成;及壓力感測器60,其用以對塗佈器10內之塗佈液之壓力進行計測。 對塗佈器10進行說明。如圖2(A)所示般,塗佈器10係由一方向較長之直線狀之噴嘴構成,且於其下端,設置有噴出塗佈液之於一方向較長之噴出口11。如上述般基板7(被塗佈面8)為圓形,噴出口11具有較基板7之直徑D(基板7之上述一方向之最大尺寸)更大之寬度尺寸W(W>D)。因此,於塗佈器10(噴出口11),產生於正下方存在基板7之部分、及於正下方不存在基板7之部分,又,該等部分各自之範圍(長度)係根據基板7與塗佈器10(噴出口11)之相對位置而變化。圖2(A)係表示塗佈器10及基板7之立體圖,圖2(B)係該塗佈器10中之於正下方存在基板7之部分之剖視圖,圖2(C)係塗佈器10中之於正下方不存在基板7之部分之剖視圖。 如圖2(B)(C)所示般,塗佈器10具有積存塗佈液之積存部13、噴出塗佈液之噴出口11、及使積存部13與噴出口11相連之狹縫狀流路12。該等積存部13、狹縫狀流路12及噴出口11係沿一方向(與圖2(B)(C)之紙面正交之方向)形成為較長。積存部13係為了暫時積存自噴出口11噴出之塗佈液而擴大之區域。狹縫狀流路12之下端為噴出口11。而且,於該塗佈器10中,自噴出口11對基板7向下噴出塗佈液。於下述之塗佈動作時,積存部13及狹縫狀流路12成為被塗佈液填滿之狀態(亦即,充滿狀態)。於本實施形態中,自噴出口11噴出塗佈液之方向為向下,但並不限定於此,亦可為傾斜向下,又,亦存在設為橫向(向水平方向)、向上、傾斜向上之情況。 於圖1中,壓力感測器60設置於塗佈器10,係測定塗佈器10內之塗佈液之壓力之感測器。於本實施形態中,壓力感測器60之檢測部(感測器部)於積存部13露出,測定積存部13之塗佈液之壓力(內壓)。壓力感測器60之測定結果被輸入至控制裝置50。再者,以下,「塗佈器10內之壓力」意指積存部13之塗佈液之壓力。 塗佈裝置5具備裝置基台6、及搭載於該裝置基台6且於其上放置基板7之平台9。平台9上之基板7之被塗佈面8為水平。而且,於本實施形態中,能夠藉由移動機構20使塗佈器10相對於平台9移動。 移動機構20具備設置於裝置基台6之軌道21、沿該軌道21於水平方向上移動之可動區塊22、及使可動區塊22移動之線性致動器23。而且,塗佈器10搭載於可動區塊22。藉由該移動機構20,能夠使塗佈器10相對於處於固定狀態之平台9上之基板7於水平方向上移動。再者,移動機構20只要為使塗佈器10與基板7沿與基板7之被塗佈面8平行之方向相對移動之構成即可,雖未圖示,但亦可為使平台9(基板7)相對於處於固定狀態之塗佈器10移動之構成。又,移動機構20具備使塗佈器10沿上下方向移動之升降致動器24。由此,能夠調整塗佈器10(噴出口11)相對於基板7之高度。移動機構20係藉由控制裝置50控制,可以特定之速度(具體而言為固定速度)使塗佈器10於水平方向上移動。 於該塗佈裝置5中,於使基板7與塗佈器10(噴出口11)於上下方向上對向之狀態下,藉由移動機構20使其等相對移動,藉由作用於在基板7與塗佈器10之間產生之塗佈液(塗佈液之液滴3)之表面張力,而使塗佈液自塗佈器10噴出。因此,對於細長之噴出口11,於如圖2(B)所示般存在基板7之部分噴出塗佈液,相對於此,於如圖2(C)所示般無基板7之部分未噴出塗佈液。由此,於將圓形基板7設為塗佈對象之情形時,能夠不浪費塗佈液,而於需要之部分形成塗膜,從而提高塗佈液之利用效率。 於圖1中,泵30具有對塗佈器10供給所需量之塗佈液之功能。泵30能夠精度良好地送出任意流量之塗佈液,例如為注射泵(定量泵)。塗佈器10與泵30係通過配管81而連接,於配管81設置有開關切換閥71。泵30係藉由控制裝置50控制,控制每單位時間之塗佈液之進給量,而將塗佈液供給至塗佈器10。藉由利用泵30將塗佈液供給至塗佈器10,而自該塗佈器10之噴出口11噴出塗佈液。又,泵30亦能夠藉由進行與用以供給塗佈液之動作相反之動作,而抽吸塗佈器10側之塗佈液。該抽吸動作於下文進行說明,但可於對泵30補充塗佈液、及控制模式(其2)時進行。 又,塗佈裝置5進而具備積存塗佈液之罐(第一罐)35。該罐35係通過自上述配管81延長之配管83而與泵30連接。於配管83設置有開關切換閥73。可積存於罐35之塗佈液之容量較泵30之容量更大,積存於罐35之塗佈液成為用以補充至泵30之塗佈液。 壓力賦予裝置40包含罐(第二罐)41及壓力調整器42。罐41積存塗佈液,並且通過配管82與塗佈器10連接。於配管82設置有開關切換閥72,於閥72為開狀態下,能夠於罐41與塗佈器10(積存部13)之間流通塗佈液。閥72能夠將塗佈器10與第二罐41連通及阻斷。可積存於罐41之塗佈液之容量較塗佈器10之積存部13之容量(容積)更大。 壓力調整器42係由調節器構成,使作用於罐41之塗佈液之壓力變化。壓力調整器42係藉由控制裝置50而控制,調整罐41之塗佈液之壓力(內壓)。由於罐41與塗佈器10係通過配管82而連接,故而可藉由調整罐41之塗佈液之壓力,而將塗佈器10(積存部13)之塗佈液之壓力控制為特定之壓力。例如,可藉由將罐41之塗佈液之壓力(錶壓)調整為負壓,而使塗佈器10(積存部13)之塗佈液之壓力(錶壓)為負壓。 如此,於本實施形態中,壓力調整器42係用以調整積存於罐41之塗佈液之壓力以將塗佈器10內之塗佈液之壓力保持為特定之值(負壓)者,由該等壓力調整器42及罐41構成使壓力(負壓)作用於塗佈器10內之塗佈液之壓力賦予裝置40。 於具備以上之構成之塗佈裝置5中,包含分別與塗佈器10相連之泵控制線路L1及壓力控制線路L2。於泵控制線路L1包含配管81、83、閥71、73、泵30及第一罐35。於壓力控制線路L2包含配管82、閥72、第二罐41及壓力調整器42。於下述之塗佈動作及液體附著動作之各者中,可選擇性地使用該等泵控制線路L1及壓力控制線路L2中之一者或兩者。 本實施形態之塗佈裝置5具有兩個控制模式用於塗佈動作,可擇一地採用。因此,於記憶於控制裝置50之記憶機構之電腦程式中,包含兩個控制模式之程式,可選擇性地執行。再者,所謂上述塗佈動作係指如下動作,即,一面藉由移動機構20(線性致動器23)進行基板7與塗佈器10之相對移動,一面對該基板7自噴出口11噴出塗佈液。 以下,對藉由具備上述構成之塗佈裝置5而進行之塗佈方法進行說明。於該塗佈方法中,包含開始對基板7附著塗佈液之液體附著動作,繼該液體附著動作之後進行塗佈動作。 [控制模式(其1)] 圖3~圖5係對塗佈方法進行說明之說明圖。再者,於以下之說明中,將泵30與塗佈器10之間之閥71稱為第一閥71,將第二罐41與塗佈器10之間之閥72稱為第二閥72,將第一罐35與泵30之間之閥73稱為第三閥73。 如圖3(A)所示般,自塗佈器10進行塗佈液之初始送出(初始送出步驟)。為此,打開第一閥71,藉由使泵30動作而自噴出口11噴出微量之塗佈液。於該初始送出步驟中,塗佈器10未存在於基板7上。 其次,進行塗佈器10之噴出口11之擦拭(擦拭步驟:參照圖3(B))。此時,泵30處於停止之狀態。 其次,將塗佈器10之高度位置設為相對於平台9上之基板7為特定之位置。塗佈器10之高度調整係藉由升降致動器24(參照圖1)而進行。例如,將噴出口11與被塗佈面8之間隔設為數十μm。又,藉由線性致動器23(參照圖1),以使噴出口11位於基板7之塗佈開始位置(基板7之緣部)之正上方之方式使塗佈器10移動(準備移動步驟)。 於該準備移動步驟完成之前之期間內,進行將第二罐41之塗佈液之壓力設定為低於大氣壓之處理(以下,稱為事前處理)。 於事前處理中,於壓力控制線路L2中,將第二罐41之塗佈液之壓力設定為特定之減壓值(特定之負壓值)。該減壓值(負壓值)係設定於控制裝置50之值,且係用以使塗佈器10之塗佈液之壓力為特定之負壓值之值。具體而言,設為與於進行塗佈動作時使塗佈器10之塗佈液產生之負壓值相同之值。第二罐41之塗佈液之負壓(減壓)係藉由壓力調整器42而進行。以上之處理為事前處理。 藉由該事前處理,在上述準備移動步驟之前,第二閥72為關狀態,於該狀態下第二罐41之塗佈液之壓力不會對塗佈器10之塗佈液之壓力產生影響,雖於下文進行說明,但可藉由將第二閥72打開,而使第二罐41之塗佈液之負壓作用於塗佈器10之塗佈液之壓力,而使塗佈器10之塗佈液之壓力瞬時變成負壓。 其次,使泵30動作,而將塗佈液供給至塗佈器10(參照圖4(A))。此時,利用泵30之塗佈液之供給量為超少量,較塗佈動作時之供給量少。由此,自噴出口11噴出微量之塗佈液。又,藉由利用泵30供給塗佈液,而塗佈器10內之塗佈液之壓力上升,且接近於大氣壓。 然後,若自噴出口11噴出之微量之塗佈液接觸於基板7(參照圖4(B)),則塗佈器10內之壓力急遽地降低(恢復為低於大氣壓之負壓)。其原因在於,因與基板7接觸之塗佈液之表面張力及毛細管減少(毛細管),而塗佈器10內之塗佈液被引出至基板7側。 由於壓力感測器60時刻測定塗佈器10內之壓力,故而若於控制裝置50檢測出因塗佈液接觸於基板7所致之塗佈器10內之壓力降低,則將第二閥72打開(參照圖4(C))。進而,停止利用泵30供給塗佈液。由此,與進行上述事前處理協動,而塗佈器10之塗佈液受到第二罐41之塗佈液之壓力之影響,塗佈器10之塗佈液之壓力成為負壓。其結果,可防止塗佈液自塗佈器10繼續流出,而於基板7與噴出口11之間形成塗佈液之液滴3(參照圖4(C))。 以上之圖4(A)~(C)所示之步驟為上述液體附著動作(液體附著步驟),於該液體附著動作中,如上述般,藉由控制裝置50進行以下控制。亦即,藉由泵30將塗佈液供給至塗佈器10,以便進行開始對基板7附著塗佈液之液體附著動作,於藉由該供給使塗佈器10內之塗佈液之壓力提高之後,若藉由壓力感測器60檢測出該壓力之降低,則停止利用泵30供給塗佈液。進而,於本實施形態中,於藉由第二閥72阻斷塗佈器10與第二罐41之連通之狀態(亦即,第二閥72為關狀態)下,藉由泵30將塗佈液供給至塗佈器10,若之後藉由壓力感測器60檢測出壓力之降低,則停止利用泵30供給塗佈液,並且使第二閥72動作(亦即,將第二閥72打開)而使第二罐41與塗佈器10連通。 根據該液體附著動作,若自泵30對塗佈器10進行塗佈液之供給,則塗佈器10內之塗佈液之壓力暫時變高,由此,自噴出口11噴出塗佈液。然後,若塗佈液接觸於基板7,則因塗佈液之表面張力而欲進一步引出塗佈器10內之塗佈液,由此,塗佈器10內之壓力降低。因此,若藉由壓力感測器60檢測出該壓力之降低,則停止利用泵30供給塗佈液,藉此能夠防止於液體附著動作時過剩之塗佈液附著於基板7。進而,能夠藉由將第二閥72打開使第二罐41與塗佈器10連通,而於自噴出口11噴出之塗佈液附著於基板7之後,將塗佈器10內之塗佈液之壓力保持為固定值(負壓)。 如上所述般進行液體附著動作,若因第二罐41之塗佈液之壓力之影響,而塗佈器10內之塗佈液之壓力變成負壓(若兩者之壓力變為相等),則將第二閥72關閉。然後,如圖5(A)所示般,進行塗佈動作(塗佈步驟)。於該步驟中,藉由移動機構20(線性致動器23)使塗佈器10開始於水平方向移動,並且開始利用泵30供給塗佈液。然後,一面使塗佈器10於水平方向上移動,一面進行利用泵30之塗佈液之供給。 於本實施形態中,塗佈器10之移動速度為固定。此處,由於基板7為圓形,故而如上述般(參照圖2),於塗佈器10(噴出口11),產生於正下方存在基板7之部分、及於正下方不存在基板7之部分,又,該等部分各自之範圍係根據基板7與塗佈器10之相對位置而變化。而且,對於細長之噴出口11,於如圖2(B)所示般存在基板7之部分噴出塗佈液,相對於此,於如圖2(C)所示般無基板7之部分未進行塗佈液之噴出。 因此,為了使塗佈器10以固定速度移動將塗佈液塗佈於圓形基板7而將固定膜厚之塗膜形成於基板7上,應自噴出口11噴出之塗佈液之量需根據塗佈器10相對於基板7之位置而不同。因此,進行如下控制(定量噴出控制),即,自泵30,並非送出固定量之塗佈液,而送出為將固定膜厚之塗膜形成於基板7上所必需之量。亦即,自泵30送出之塗佈液之量設為與根據基板7之寬度方向之變化(形狀變化)而變化之塗佈液量(上述必需之量)相當之量。再者,基板7之上述寬度方向係與塗佈器10(噴出口11)之長度方向一致之方向。 如上述般自泵30送出之塗佈液之量設定於記憶於控制裝置50之記憶機構之電腦程式。亦即,於電腦程式中,包含將塗佈器10與基板7之相對位置、和於該位置之塗佈液之噴出量(供給量)建立了對應關係之資料,基於該資料,控制裝置50使泵30及移動機構20進行動作。由此,即便不使用壓力感測器60之計測值,亦能夠自塗佈器10噴出已設定之量之塗佈液,從而將固定之膜厚形成於基板7上。再者,基於位置之上述噴出量係根據要形成之塗膜而預先求出之值,根據塗膜而改變。 又,於塗佈動作開始時,執行上述事前處理,塗佈器10內之塗佈液之壓力被設為負壓,而且,自噴出口11噴出之塗佈液量自泵30被補給至塗佈器10,故而塗佈器10內之壓力於塗佈動作之期間內,保持負壓之狀態而維持為固定值。 如上所述般,於控制模式(其1)下,於塗佈動作時,藉由控制裝置50進行以下控制。亦即,於塗佈動作時,進行用以將與藉由自噴出口11噴出而消耗之塗佈液之量對應之塗佈液自泵30供給至塗佈器10之控制。藉由該控制,一面將塗佈器10內之塗佈液維持為負壓,一面將所需之均勻厚度之塗膜形成於基板7(被塗佈面8)上之毛細管塗佈之控制變得容易。 然後,如圖5(B)所示般,當塗佈器10(噴出口11)到達至基板7之塗佈結束位置(基板之緣部)時,停止利用泵30之塗佈液之供給。 若停止供給,則雖未圖示,但藉由升降致動器24使塗佈器10上升,並將第一閥71關閉,將第三閥73打開。然後,泵30抽吸第一罐35之塗佈液進行補充,為下次塗佈做準備。又,塗佈有塗佈液之基板7自平台9被卸除,並被搬送至乾燥機。 藉由以上操作,於控制模式(其1)下,進行利用泵30供給藉由塗佈而消耗之塗佈液之控制。於該控制時,壓力控制線路L2之第二閥72處於關之狀態,僅利用泵控制線路L1之泵30進行液體供給。泵30僅以與預先設定之自塗佈器10之塗佈液之噴出量對應之量,對塗佈器10供給塗佈液。此時,向塗佈器10供給之塗佈液量設定為較藉由因毛細管現象及塗佈動作而於基板7與塗佈器10之間之塗佈液之液滴3產生之剪切力而欲被引出至塗佈器10之外之塗佈液之量略少,由此,成為伴隨抑制噴出之供給。其結果,雖藉由泵30供給塗佈液,但於塗佈器10內,自噴出口11作用欲將塗佈液向外引出之力,塗佈器10內之塗佈液被保持為負壓之狀態。 [控制模式(其2)] 自塗佈器10進行塗佈液之初始送出之初始送出步驟、進行塗佈器10之噴出口11之擦拭之擦拭步驟、及以使噴出口11位於基板7之塗佈開始位置(基板7之緣部)之正上方之方式使塗佈器10移動之準備移動步驟係與上述控制模式(其1)中之初始送出步驟(圖3(A))、擦拭步驟(圖3(B))、及準備移動步驟(圖3(C))同樣地進行。 又,於準備移動步驟完成之前之期間內進行上述事前處理之方面亦與控制模式(其1)相同。 然後,開始進行使對基板7附著塗佈液開始之液體附著動作(液體附著步驟)。該液體附著動作與圖4(A)~(C)所示之控制模式(其1)之液體附著動作(液體附著步驟)相同。 關於與控制模式(其1)相同之方面之說明於此省略。 當液體附著動作完成時,於基板7與噴出口11之間形成塗佈液之液滴3(參照圖4(C))。進行液體附著動作,藉由將第二閥72打開使第二罐41與塗佈器10連通,可於自噴出口11噴出之塗佈液附著於基板7之後,將塗佈器10內之塗佈液之壓力保持為固定值(負壓)。 當因第二罐41之塗佈液之壓力之影響,使塗佈器10內之塗佈液之壓力變成負壓時,於上述控制模式(其1)下,關閉第二閥72(參照圖5(A)),但於控制模式(其2)下,第二閥72維持開狀態(參照圖6(A))。然後,進行塗佈動作(塗佈步驟)。於該步驟中,開始利用移動機構20(線性致動器23)使塗佈器10於水平方向移動,並且藉由控制第二罐41之塗佈液之壓力而將與該第二罐41相連之塗佈器10之塗佈液之壓力保持為固定值(固定之負壓值),進而,成為能夠利用泵30向塗佈器10供給塗佈液之狀態。亦即,一面藉由移動機構20使塗佈器10於水平方向上移動,一面藉由控制裝置50進行利用第二罐41及壓力調整器42之壓力控制、以及利用泵30進行塗佈液供給之供給控制。 於塗佈動作中進行之上述壓力控制係藉由將第二罐41之塗佈液之壓力保持為設定值,而使塗佈器10之塗佈液之壓力成為特定(固定)之負壓值之控制。 又,於塗佈動作中進行之上述供給控制係基於壓力感測器60之計測值之反饋控制。即,控制裝置50時時刻刻檢測壓力感測器60之計測值之變化,於其變化量超過閾值(容許值)之情形時,進行利用泵30之塗佈液之供給或抽吸。若具體地進行說明,則於利用壓力感測器60所得之計測值降低且其變化量超過閾值之情形時,進行供給塗佈液之動作,於計測值上升且其變化量超過閾值之情形時,進行抽吸塗佈液之動作。如此,控制裝置50藉由進行利用泵30之塗佈液之供給或抽吸之調整動作,而使塗佈器10之塗佈液壓力進一步穩定。 又,於控制模式(其2)下,塗佈器10之移動速度亦為固定。此處,由於基板7為圓形,故而如上述般(參照圖2),於塗佈器10(噴出口11),產生於正下方存在基板7之部分、及於正下方不存在基板7之部分,又,該等部分各自之範圍係根據基板7與塗佈器10之相對位置而變化。而且,對於細長之噴出口11,於如圖2(B)所示般存在基板7之部分噴出塗佈液,相對於此,於如圖2(C)所示般無基板7之部分未進行塗佈液之噴出。 因此,為了使塗佈器10以固定速度移動將塗佈液塗佈於圓形基板7而將固定之膜厚形成於基板7上,應自噴出口11噴出之塗佈液之量需根據塗佈器10相對於基板7之位置而不同。因此,進行如下控制,即,自泵30,並非送出固定量之塗佈液,而送出為將固定膜厚之塗膜形成於基板7上所必需之量。進而,於該控制模式(其2)下,如上述般,基於壓力感測器60之測定值進行利用泵30之塗佈液之供給或抽吸之控制,而調整塗佈器10內之壓力(設為固定)。亦即,自泵30送出之塗佈液之量成為與根據基板7之寬度方向之變化(形狀變化)而變化之塗佈液量(上述必需之量)相當之量、和藉由進行基於壓力感測器60之測定值之控制而供給或抽吸塗佈液之塗佈液量之和。 於上述控制模式(其1)下,自泵30送出之塗佈液之量設定於預先記憶於控制裝置50之電腦程式,但於控制模式(其2)下,自泵30送出之塗佈液之量會根據壓力感測器60之測定值而時刻變化。 如上所述般,於塗佈動作時,藉由控制裝置50,進行以下控制。亦即,於塗佈動作時,為了將塗佈器10內之塗佈液維持為負壓而藉由壓力賦予裝置40(第二罐41及壓力調整器42)進行塗佈器10內之塗佈液之壓力控制,並且基於壓力感測器60之測定結果,進行包含利用泵30之塗佈液之供給及抽吸在內之調整控制。 再者,於塗佈動作開始時,執行上述事前處理,塗佈器10之塗佈液之壓力被設為負壓,而且,即便塗佈動作開始,亦藉由壓力賦予裝置40而維持塗佈器10之負壓,又,亦基於壓力感測器60之測定結果進行利用泵30之控制,因此,塗佈器10之塗佈液之壓力保持負壓之狀態而維持為固定值。 藉由該控制,進行用以將塗佈器10內之壓力(負壓)保持為固定之壓力控制,將均勻厚度之塗膜形成於基板7(被塗佈面8)上之毛細管塗佈之控制變得容易。 而且,於本實施形態中,如圖6(B)所示般,於平台9上除了設置有基板7以外,還設置有與該基板7之緣部(塗佈結束側之緣部)鄰接之虛設板65,塗佈器10沿基板7移動並通過基板7之塗佈結束位置(基板7之緣部),直至到達至虛設板65為止,持續噴出塗佈液。然後,當塗佈器10(噴出口11)到達至虛設板65之特定位置時,停止利用泵30之塗佈液之調整(噴出),並且將第二閥72關閉。 然後,雖未圖示,但藉由升降致動器24使塗佈器10上升,並將第一閥71關閉,將第三閥73打開。然後,泵30抽吸第一罐35之塗佈液進行補充,為下次塗佈做準備。又,塗佈有塗佈液之基板7被自平台9卸除,並搬送至乾燥機。 再者,亦可省略虛設板65而如控制模式(其1)般使塗佈動作結束,又,亦可於控制模式(其1)下採用虛設板65。 於該控制模式(其2)下,將泵控制線路L1之第一閥71及壓力控制線路L2之第二閥72之兩者設為開之狀態而進行控制。若一面進行塗佈動作一面藉由設置於塗佈器10之壓力感測器60偵測壓力之降低,則可藉由利用泵30對塗佈器10進行微量之液供給,而使塗佈器10內之壓力恢復至原來之設定值。藉由對該操作於短時間內進行反饋控制,可將塗佈器10內之壓力保持為固定。 再者,關於利用泵30之液體供給量,亦可設為與預測之塗佈液之消耗對應之量,但更佳為設為於已設定之液供給量與實際之液消耗量產生差異時進行反饋控制而調整後之值。 [控制模式(其1)及(其2)] 於具備上述構成之塗佈裝置5中,控制裝置50可根據塗佈條件,選擇性地採用泵控制線路L1及壓力控制線路L2中之一者或兩者。亦即,根據塗佈條件,擇一地選擇控制模式(其1)或控制模式(其2)。作為塗佈條件,例如有形成於基板7之膜厚、或塗佈速度(塗佈器10之移動速度)等。 進而對在控制模式(其1)及(其2)之各者下進行之液體附著動作(塗佈開始時之著液方法)進行說明。如圖4(A)所示般,於將壓力控制線路L2之第二閥72設為關、將泵控制線路L1之第一閥71設為開之狀態下,藉由自泵30供給塗佈液,而自塗佈器10緩慢地噴出微量之塗佈液。此時,塗佈器10內之壓力自負壓狀態變化成正壓方向。然後,若自塗佈器10噴出之塗佈液附著於基板7(參照圖4(B)),則將塗佈器10與基板7之間相連之塗佈液(液滴3)因表面張力而欲擴展黏附,藉此產生欲將塗佈液自塗佈器10引出之力。藉由該力,塗佈器10內之壓力變化成負壓方向。若藉由壓力感測器60偵測出此種塗佈器10內之壓力變化,則以如下方式進行壓力控制線路L2及泵控制線路L1之切換。 即,基於塗佈器10內之壓力變化,使泵30停止,並將壓力控制線路L2之第二閥72設為開(參照圖4(C))。由此,塗佈器10內之壓力變成預先藉由壓力控制線路L2(第二罐41)而設定之壓力。此時,可藉由進行將自上述壓力變化起至利用泵30之塗佈液之供給停止為止之時間、及自上述壓力變化起至將第二閥72打開為止之時間設為利用計時器所設定之特定時間之控制,而控制於塗佈開始時自塗佈器10噴出之塗佈液之量。 於將第二閥72設為開之後,於利用泵30進行塗膜厚控制之情形時(控制模式(其1)),再次將第二閥72設為關,並利用泵30進行塗佈液之供給。於藉由壓力控制進行塗膜厚控制之情形時(控制模式(其2)),直接將第二閥72設為開之狀態,進行與設定壓力對應之壓力固定控制。 進而,於在基板7之塗佈開始部附著塗佈液時,藉由利用泵30進行塗佈液之供給,而將因毛細管現象而欲噴出至塗佈器10之外之塗佈液之量抑制為必要最小限度。又,藉由根據塗佈器10之壓力變化偵測塗佈液之著液時機,而即便為少量之塗佈液噴出亦可使其確實地著液,從而能夠獲得穩定之塗佈開始部之膜厚。 如上所述般,於上述兩個控制模式之各者下,控制裝置50係於塗佈動作時,進行用以於將塗佈器10內之塗佈液維持為負壓之狀態下自泵30將塗佈液供給至塗佈器10之控制。根據該構成,於塗佈動作時,可利用泵30將供給至塗佈器10之塗佈液之量控制為特定之量,又,可抑制因自塗佈器10噴出至基板7之塗佈液之表面張力及毛細管現象而欲自噴出口11噴出至塗佈器10外之塗佈液之量。因此,可進行如下之毛細管塗佈,即,能夠自噴出口11向下噴出塗佈液,將所需厚度(均勻厚度)之塗膜形成於基板7(被塗佈面8)上。 而且,藉由將此種塗佈裝置5執行之塗佈方法(毛細管塗佈)應用於製品之製造方法,能夠穩定地製造形成有遍及整個面具有均勻之膜厚之塗膜之高品質之製品。 [應用條件] 作為能夠應用於以上所說明之塗佈裝置5之塗佈液,就塗佈性而言較佳為黏度為1~100000 mPa·S且為牛頓式(Newtonian)者,但亦可應用於具有觸變性之塗佈液。作為可具體地應用之塗佈液之例,除了具有彩色濾光片用黑矩陣、RGB色像素形成用塗佈液以外,還具有如下等:抗蝕劑液、保護層材、柱形成材料等、或半導體用黏著層用塗佈液、平坦化用塗佈液、保護膜用塗佈液、抗蝕劑液、著色層用塗佈液、螢光發光層用塗佈液、TFT用正型抗蝕劑等。 作為基板(被塗佈構件)7,除了矽晶圓或玻璃以外,亦可使用鋁等金屬板、陶瓷板、膜等。基板(被塗佈構件)7之形狀可為矩形形狀,又,亦可為圓形等非矩形形狀。進而,亦可藉由將複數個非矩形形狀之基板沿塗佈器10之長度方向排列配置,而對該等基板7同時進行塗佈。進而,作為使用之塗佈條件,塗佈速度為0.1~100 mm/秒、更佳為0.5~20 mm/秒、塗佈器10之噴出口11與基板7之被塗佈面8之間之間隙(狹縫間隙)為50~1000 μm、更佳為100~500 μm、塗佈厚度於濕式狀態下為0.5~100 μm、更佳為1~50 μm。 [實施例1] 對採用控制模式(其1)之情形時之實施例進行說明。 藉由圖1所示之塗佈裝置5,對直徑f100×厚度0.53 mm之圓形矽晶圓塗佈聚醯亞胺。聚醯亞胺係黏度4400 mPa・s、且固形物成分濃度19%者。作為塗佈器10,使用噴出口11之塗佈寬度方向(長度方向、Y方向)之長度為150 mm、噴出口11之間隙(X方向長度)為0.4 mm者。為了測定該塗佈器10之積存部13之塗佈液之壓力,設置有壓力感測器60。 而且,於利用泵30之噴出量控制下,以濕式膜厚成為40 μm之方式,規定與塗佈寬度變化對應之噴出量,以塗佈開始時之塗佈器10內之壓力為-20 Pa(錶壓)、塗佈速度0.5 mm/秒之條件進行塗佈。 藉由150℃之加熱板使已塗佈之基板7乾燥10分鐘。於乾燥後觀察塗佈狀況,結果於f100之面區域整個面形成有厚度8 μm之塗膜,於除了塗佈外周部之2 mm範圍以外之直徑96 mm以內之範圍內,膜厚不均為良好之±3%以下。 [實施例2] 對採用控制模式(其2)之情形時之另一實施例進行說明。 藉由圖1所示之塗佈裝置5,對直徑f100×厚度0.53 mm之圓形矽晶圓塗佈彩色光阻劑。彩色光阻劑係黏度4 mPa・s、且固形物成分濃度15%者。作為塗佈器10,使用噴出口11之塗佈寬度方向(長度方向、Y方向)長度為150 mm、噴出口11之間隙(X方向長度)為0.2 mm者。為了測定該塗佈器10之積存部13之塗佈液之壓力,設置有壓力感測器60。 而且,作為利用定壓控制之噴出量控制,藉由泵30實施塗佈器10內之壓力變動之修正。 於將塗佈開始時之塗佈器10內之壓力設為-180 Pa(錶壓),且塗佈速度2 mm/秒之條件下,一面以使噴出壓之變動作為閾值而為5 Pa以內之方式對泵30進行反饋控制,一面進行塗佈動作。 對已塗佈之基板7,進行60秒之以25秒到達至65 Pa之真空乾燥,之後藉由120℃之加熱板進而乾燥10分鐘。 於乾燥後觀察塗佈狀況,結果於f100之面區域整個面形成有厚度800 nm之塗膜,於除了塗佈外周部之2 mm範圍以外之直徑96 mm以內之範圍內,膜厚不均為良好之±3%以下。 於如本實施形態般將自塗佈器10(噴出口11)噴出塗佈液之方向設為向下之情形時(向下毛細管塗佈之情形時),將塗佈器10內之塗佈液設為負壓之意義在於以下之(1)(2)。 (1)為了使塗佈器10內之塗佈液不會(因自重)自由地自噴出口11流出。 (2)為了調整形成於基盤7上之膜厚。 再者,亦可以塗佈液之噴出方向變成向上(包含傾斜向上)之方式構成塗佈裝置5。於該情形時(向上毛細管塗佈之情形時),雖未圖示,但(若參考圖1進行說明,則)於與噴出口11向下之情形時相同之狀態下,於噴出口11與其上方之基板7之間形成塗佈液之液滴,使噴出口11附近(狹縫狀流路12)之塗佈液變成負壓。於該動作時,藉由壓力調整器42對罐41施加之壓力值係基於噴出口11附近之塗佈液變成特定之負壓而算出之壓力值,亦可並非負壓。然後,於該狀態下進行塗佈動作。亦即,於塗佈動作時,藉由控制裝置50執行用以一面使塗佈器10內之噴出口11附近之塗佈液為負壓一面自泵30將塗佈液供給至塗佈器10之控制。具體而言,進行將與自噴出口11噴出之塗佈液之量對應之塗佈液自泵30供給至塗佈器10之控制。亦即,進行基於上述控制模式(其1)之塗佈動作。而且,該控制裝置50亦具有如下功能,即,藉由壓力賦予裝置40進行塗佈器10內之塗佈液之壓力控制,以將塗佈器10內之噴出口11附近之塗佈液維持為負壓,並且基於壓力感測器60之測定結果進行利用泵30之塗佈液之調整控制。亦即,亦可進行基於上述控制模式(其2)之塗佈動作。再者,於該向上毛細管塗佈之情形時,使塗佈器10內之噴出口11附近之塗佈液為負壓之意義在於上述(2)。 [附記] 此次揭示之實施形態於所有方面為例示而並非限制性者。本發明之申請專利範圍並非限定於上述實施形態,包含與申請專利範圍所記載之構成均等之範圍內之所有變更。 於上述實施形態中,將被塗佈構件設為單片狀之基板7,但亦可並非單片狀而為連續之構件。Hereinafter, the embodiments of the present invention will be described with reference to the drawings. [Regarding the configuration of the coating device] Fig. 1 is a schematic configuration diagram illustrating the overall configuration of the coating device. The coating device 5 is a device for spraying a coating liquid on, for example, a single sheet-shaped member to be coated to form a coating film of uniform thickness. Furthermore, the coated member described in this embodiment is a circular substrate 7 (refer to FIG. 2(A)), specifically, a circular silicon wafer. The coating device 5 is provided with an applicator 10 (also referred to as a nozzle or a slit die nozzle) located on the upper side of the substrate 7, and the coating liquid is sprayed from the applicator 10 to apply the coating liquid to the substrate 7 Above the surface. The upper surface of the substrate 7 becomes the coated surface 8 for coating with the coating liquid. The substrate 7 is supported on the platform 9 with the coated surface 8 facing upward, and the coating is performed in this state. In addition to the above-mentioned coater 10 for spraying the coating liquid, the coating device 5 also includes: a moving mechanism 20 for relatively moving the substrate 7 and the coater 10; and a pump 30 for supplying the coating liquid to the coating The cloth device 10; the pressure imparting device 40, which causes pressure to act on the coating liquid in the applicator 10; the control device 50, which is composed of a computer that performs various controls; and the pressure sensor 60, which is used for coating The pressure of the coating liquid in the cloth device 10 is measured. The coater 10 will be described. As shown in FIG. 2(A), the applicator 10 is composed of a straight nozzle that is long in one direction, and at its lower end is provided with a nozzle 11 that is long in one direction for spraying the coating liquid. As described above, the substrate 7 (coated surface 8) is circular, and the ejection port 11 has a larger width dimension W (W>D) than the diameter D of the substrate 7 (the maximum dimension of the substrate 7 in the above-mentioned one direction). Therefore, in the applicator 10 (the ejection port 11), the part where the substrate 7 exists directly below and the part where the substrate 7 does not exist directly below are generated. In addition, the respective ranges (lengths) of these parts are based on the substrate 7 and The relative position of the applicator 10 (jet port 11) changes. Fig. 2(A) is a perspective view showing the coater 10 and the substrate 7, Fig. 2(B) is a cross-sectional view of the part of the coater 10 where the substrate 7 is located directly below, and Fig. 2(C) is the coater 10 is a cross-sectional view of the portion where the substrate 7 is not located directly below. As shown in Fig. 2(B)(C), the applicator 10 has a reservoir 13 for accumulating the coating liquid, an ejection port 11 for ejecting the coating liquid, and a slit shape connecting the reservoir 13 and the ejection port 11 Flow path 12. The reservoir 13, the slit-shaped flow path 12, and the ejection port 11 are formed to be long in one direction (the direction orthogonal to the paper surface of Fig. 2(B)(C)). The storage part 13 is an area expanded in order to temporarily store the coating liquid ejected from the ejection port 11. The lower end of the slit-shaped flow path 12 is a discharge port 11. In addition, in the coater 10, the coating liquid is ejected from the ejection port 11 toward the substrate 7 downward. During the coating operation described below, the reservoir 13 and the slit-like flow path 12 are in a state filled with the coating liquid (that is, a full state). In the present embodiment, the direction in which the coating liquid is sprayed from the spray outlet 11 is downward, but it is not limited to this, and it may be inclined downward, and it may also be horizontal (toward the horizontal direction), upward, and inclined upward. The situation. In FIG. 1, a pressure sensor 60 is provided in the applicator 10, and is a sensor for measuring the pressure of the coating liquid in the applicator 10. In the present embodiment, the detection part (sensor part) of the pressure sensor 60 is exposed in the reservoir 13, and the pressure (internal pressure) of the coating liquid in the reservoir 13 is measured. The measurement result of the pressure sensor 60 is input to the control device 50. In addition, in the following, the “pressure in the applicator 10” means the pressure of the coating liquid in the reservoir 13. The coating device 5 includes a device base 6 and a platform 9 mounted on the device base 6 and on which a substrate 7 is placed. The coated surface 8 of the substrate 7 on the platform 9 is horizontal. Furthermore, in this embodiment, the applicator 10 can be moved relative to the platform 9 by the moving mechanism 20. The moving mechanism 20 includes a rail 21 provided on the device base 6, a movable block 22 that moves in the horizontal direction along the rail 21, and a linear actuator 23 that moves the movable block 22. Furthermore, the applicator 10 is mounted on the movable block 22. With the moving mechanism 20, the applicator 10 can be moved in a horizontal direction relative to the substrate 7 on the platform 9 in a fixed state. Furthermore, the moving mechanism 20 only needs to be configured to relatively move the applicator 10 and the substrate 7 in a direction parallel to the coated surface 8 of the substrate 7. Although not shown, it may be configured to move the platform 9 (substrate 7) A structure that moves relative to the applicator 10 in a fixed state. In addition, the moving mechanism 20 includes a lift actuator 24 that moves the applicator 10 in the vertical direction. Thereby, the height of the coater 10 (discharge port 11) relative to the substrate 7 can be adjusted. The moving mechanism 20 is controlled by the control device 50 and can move the applicator 10 in the horizontal direction at a specific speed (specifically, a fixed speed). In this coating device 5, in a state where the substrate 7 and the applicator 10 (discharge port 11) are opposed to each other in the vertical direction, the moving mechanism 20 moves the substrate 7 relative to each other. The surface tension of the coating liquid (droplet 3 of the coating liquid) generated between the coating liquid and the coater 10 causes the coating liquid to be ejected from the coater 10. Therefore, for the elongated ejection port 11, the coating liquid is ejected in the portion where the substrate 7 is present as shown in FIG. 2(B), while the coating liquid is not ejected in the portion where there is no substrate 7 as shown in FIG. 2(C).涂液。 Coating solution. Therefore, when the circular substrate 7 is used as the coating target, the coating liquid can be formed without wasting the coating liquid, and the coating film can be formed on the necessary part, thereby improving the utilization efficiency of the coating liquid. In FIG. 1, the pump 30 has the function of supplying a required amount of coating liquid to the applicator 10. The pump 30 can accurately deliver the coating liquid at any flow rate, and is, for example, a syringe pump (quantitative pump). The applicator 10 and the pump 30 are connected by a pipe 81, and the pipe 81 is provided with an on-off switching valve 71. The pump 30 is controlled by the control device 50 to control the feeding amount of the coating liquid per unit time, and supply the coating liquid to the coater 10. By supplying the coating liquid to the coater 10 by the pump 30, the coating liquid is ejected from the ejection port 11 of the coater 10. In addition, the pump 30 can also suck the coating liquid on the side of the applicator 10 by performing an operation opposite to the operation for supplying the coating liquid. This suction operation will be described below, but it can be performed when the pump 30 is refilled with the coating liquid and in the control mode (Part 2). In addition, the coating device 5 further includes a tank (first tank) 35 that stores the coating liquid. The tank 35 is connected to the pump 30 through a pipe 83 extended from the pipe 81 described above. The piping 83 is provided with an on-off switching valve 73. The volume of the coating liquid that can be stored in the tank 35 is larger than that of the pump 30, and the coating liquid stored in the tank 35 becomes the coating liquid for replenishing the pump 30. The pressure applying device 40 includes a tank (second tank) 41 and a pressure regulator 42. The tank 41 stores the coating liquid, and is connected to the applicator 10 through a pipe 82. The piping 82 is provided with an on-off switching valve 72, and when the valve 72 is in an open state, the coating liquid can flow between the tank 41 and the applicator 10 (reservoir 13). The valve 72 can communicate and block the applicator 10 and the second tank 41. The volume of the coating liquid that can be stored in the tank 41 is larger than the volume (volume) of the storage portion 13 of the applicator 10. The pressure regulator 42 is composed of a regulator, and changes the pressure of the coating liquid acting on the tank 41. The pressure regulator 42 is controlled by the control device 50 to adjust the pressure (internal pressure) of the coating liquid in the tank 41. Since the tank 41 and the applicator 10 are connected by the pipe 82, the pressure of the coating liquid in the applicator 10 (reservoir 13) can be controlled to a specific value by adjusting the pressure of the coating liquid in the tank 41 pressure. For example, by adjusting the pressure (gauge pressure) of the coating liquid in the tank 41 to a negative pressure, the pressure (gauge pressure) of the coating liquid in the applicator 10 (reservoir 13) can be a negative pressure. Thus, in this embodiment, the pressure regulator 42 is used to adjust the pressure of the coating liquid stored in the tank 41 to maintain the pressure of the coating liquid in the applicator 10 at a specific value (negative pressure). The pressure regulator 42 and the tank 41 constitute a pressure applying device 40 for applying pressure (negative pressure) to the coating liquid in the applicator 10. The coating device 5 having the above configuration includes a pump control line L1 and a pressure control line L2 respectively connected to the coater 10. The pump control line L1 includes pipes 81, 83, valves 71, 73, a pump 30, and a first tank 35. The pressure control line L2 includes a pipe 82, a valve 72, a second tank 41, and a pressure regulator 42. In each of the following coating operation and liquid adhesion operation, one or both of the pump control circuit L1 and the pressure control circuit L2 can be selectively used. The coating device 5 of this embodiment has two control modes for coating operations, and one of them can be used alternatively. Therefore, among the computer programs stored in the memory mechanism of the control device 50, programs including two control modes can be selectively executed. Furthermore, the above-mentioned coating action refers to the following action, namely, while the substrate 7 and the coater 10 are relatively moved by the moving mechanism 20 (linear actuator 23), while the substrate 7 is ejected from the ejection port 11涂液。 Coating solution. Hereinafter, the coating method performed by the coating apparatus 5 provided with the above-mentioned structure is demonstrated. In this coating method, a liquid adhesion operation of starting to adhere the coating liquid to the substrate 7 is included, and the application operation is performed after the liquid adhesion operation. [Control Mode (Part 1)] Figs. 3 to 5 are explanatory diagrams explaining the coating method. Furthermore, in the following description, the valve 71 between the pump 30 and the applicator 10 is referred to as the first valve 71, and the valve 72 between the second tank 41 and the applicator 10 is referred to as the second valve 72 , The valve 73 between the first tank 35 and the pump 30 is called the third valve 73. As shown in FIG. 3(A), the initial delivery of the coating liquid from the coater 10 (initial delivery step) is performed. For this reason, the first valve 71 is opened, and a small amount of coating liquid is discharged from the discharge port 11 by operating the pump 30. In this initial delivery step, the applicator 10 is not present on the substrate 7. Next, wipe the ejection port 11 of the applicator 10 (wiping step: refer to FIG. 3(B)). At this time, the pump 30 is in a stopped state. Next, the height position of the applicator 10 is set to a specific position relative to the substrate 7 on the platform 9. The height adjustment of the applicator 10 is performed by the lift actuator 24 (refer to FIG. 1). For example, the distance between the ejection port 11 and the coated surface 8 is set to several tens of μm. In addition, the linear actuator 23 (refer to FIG. 1) moves the coater 10 so that the ejection port 11 is located directly above the coating start position of the substrate 7 (the edge of the substrate 7) (preparatory movement step) ). During the period before the completion of the preparatory movement step, a process of setting the pressure of the coating liquid in the second tank 41 to be lower than the atmospheric pressure (hereinafter referred to as pre-processing) is performed. In the pre-processing, in the pressure control circuit L2, the pressure of the coating liquid in the second tank 41 is set to a specific reduced pressure value (a specific negative pressure value). The pressure reduction value (negative pressure value) is set at the value of the control device 50, and is used to make the pressure of the coating liquid of the applicator 10 a specific negative pressure value. Specifically, it is set to the same value as the negative pressure value generated by the coating liquid of the applicator 10 during the coating operation. The negative pressure (decompression) of the coating liquid in the second tank 41 is performed by the pressure regulator 42. The above processing is pre-processing. Through this pre-processing, the second valve 72 is in the closed state before the above-mentioned pre-movement step. In this state, the pressure of the coating liquid in the second tank 41 will not affect the pressure of the coating liquid in the applicator 10 Although described below, the second valve 72 can be opened to cause the negative pressure of the coating liquid in the second tank 41 to act on the pressure of the coating liquid in the applicator 10 to make the applicator 10 The pressure of the coating liquid becomes negative pressure instantaneously. Next, the pump 30 is operated to supply the coating liquid to the applicator 10 (see FIG. 4(A)). At this time, the supply amount of the coating liquid by the pump 30 is an extremely small amount, which is less than the supply amount during the coating operation. As a result, a small amount of coating liquid is ejected from the ejection port 11. Furthermore, by supplying the coating liquid by the pump 30, the pressure of the coating liquid in the applicator 10 rises and approaches the atmospheric pressure. Then, if a small amount of the coating liquid ejected from the ejection port 11 contacts the substrate 7 (see FIG. 4(B)), the pressure in the applicator 10 drops sharply (returns to a negative pressure lower than atmospheric pressure). The reason is that the surface tension of the coating liquid in contact with the substrate 7 and the capillary (capillary) are reduced, and the coating liquid in the applicator 10 is drawn to the side of the substrate 7. Since the pressure sensor 60 measures the pressure in the applicator 10 at all times, if the control device 50 detects the decrease in the pressure in the applicator 10 caused by the contact of the coating liquid on the substrate 7, the second valve 72 Open (refer to Figure 4(C)). Furthermore, the supply of the coating liquid by the pump 30 is stopped. Thus, in coordination with the above-mentioned pre-processing, the coating liquid of the applicator 10 is affected by the pressure of the coating liquid in the second tank 41, and the pressure of the coating liquid of the applicator 10 becomes a negative pressure. As a result, it is possible to prevent the coating liquid from continuing to flow out from the coater 10 and to form droplets 3 of the coating liquid between the substrate 7 and the ejection port 11 (see FIG. 4(C)). The steps shown in FIGS. 4(A) to (C) above are the above-mentioned liquid adhesion operation (liquid adhesion step). In this liquid adhesion operation, the following control is performed by the control device 50 as described above. That is, the coating liquid is supplied to the coater 10 by the pump 30 so that the liquid adhesion action of starting to adhere the coating liquid to the substrate 7 is performed, and the pressure of the coating liquid in the coater 10 is increased by this supply After the increase, if the pressure drop is detected by the pressure sensor 60, the supply of the coating liquid by the pump 30 is stopped. Furthermore, in this embodiment, in a state where the communication between the applicator 10 and the second tank 41 is blocked by the second valve 72 (that is, the second valve 72 is in the closed state), the coating is removed by the pump 30 The distributing liquid is supplied to the applicator 10, and if the pressure sensor 60 detects the pressure drop later, the pump 30 is stopped to supply the coating liquid, and the second valve 72 is activated (that is, the second valve 72 Open) so that the second tank 41 communicates with the applicator 10. According to this liquid adhesion operation, when the coating liquid is supplied to the applicator 10 from the pump 30, the pressure of the coating liquid in the applicator 10 temporarily increases, and the coating liquid is ejected from the ejection port 11 as a result. Then, if the coating liquid contacts the substrate 7, the coating liquid in the applicator 10 will be drawn out further due to the surface tension of the coating liquid, so that the pressure in the applicator 10 is reduced. Therefore, if the pressure sensor 60 detects the pressure drop, the supply of the coating liquid by the pump 30 is stopped, thereby preventing the excess coating liquid from adhering to the substrate 7 during the liquid adhering operation. Furthermore, by opening the second valve 72, the second tank 41 communicates with the applicator 10, and after the coating liquid sprayed from the ejection port 11 adheres to the substrate 7, the coating liquid in the applicator 10 can be The pressure is maintained at a fixed value (negative pressure). Perform the liquid adhesion action as described above. If the pressure of the coating liquid in the applicator 10 becomes negative due to the influence of the pressure of the coating liquid in the second tank 41 (if the pressures of the two become equal), Then the second valve 72 is closed. Then, as shown in FIG. 5(A), a coating operation (coating step) is performed. In this step, the applicator 10 starts to move in the horizontal direction by the moving mechanism 20 (linear actuator 23), and the pump 30 starts to supply the coating liquid. Then, while the applicator 10 is moved in the horizontal direction, the supply of the coating liquid by the pump 30 is performed. In this embodiment, the moving speed of the applicator 10 is fixed. Here, since the substrate 7 is circular, as described above (refer to FIG. 2), in the applicator 10 (ejection port 11), a portion where the substrate 7 exists directly below and a portion where the substrate 7 does not exist directly below are generated. In addition, the respective ranges of these portions vary according to the relative positions of the substrate 7 and the applicator 10. In addition, for the elongated ejection port 11, the coating liquid is ejected at the portion where the substrate 7 is present as shown in FIG. 2(B), while the coating liquid is not ejected at the portion where the substrate 7 is not present as shown in FIG. 2(C). The spray of coating liquid. Therefore, in order to move the applicator 10 at a fixed speed to apply the coating liquid on the circular substrate 7 and to form a fixed film thickness of the coating film on the substrate 7, the amount of the coating liquid that should be ejected from the ejection port 11 needs to be based on The position of the applicator 10 relative to the substrate 7 is different. Therefore, the following control (quantitative discharge control) is performed, that is, instead of sending a fixed amount of the coating liquid from the pump 30, the amount necessary to form a coating film of a fixed thickness on the substrate 7 is sent. That is, the amount of the coating liquid sent from the pump 30 is set to an amount equivalent to the amount of the coating liquid (the aforementioned necessary amount) that changes in accordance with the change (shape change) of the substrate 7 in the width direction. In addition, the above-mentioned width direction of the substrate 7 is a direction that coincides with the longitudinal direction of the applicator 10 (discharge port 11). The amount of the coating liquid sent from the pump 30 as described above is set in the computer program stored in the memory mechanism of the control device 50. That is, the computer program includes data that establishes a correspondence between the relative position of the coater 10 and the substrate 7 and the ejection amount (supply amount) of the coating liquid at that position. Based on this data, the control device 50 The pump 30 and the moving mechanism 20 are operated. Thereby, even if the measured value of the pressure sensor 60 is not used, a set amount of coating liquid can be ejected from the applicator 10 to form a fixed film thickness on the substrate 7. In addition, the above-mentioned ejection amount based on the position is a value obtained in advance according to the coating film to be formed, and changes according to the coating film. In addition, when the coating operation starts, the above-mentioned pre-processing is performed, the pressure of the coating liquid in the coater 10 is set to negative pressure, and the amount of coating liquid ejected from the ejection port 11 is replenished from the pump 30 to the coating Therefore, the pressure in the applicator 10 maintains a negative pressure during the coating operation and maintains a fixed value. As described above, in the control mode (Part 1), during the coating operation, the control device 50 performs the following control. That is, during the coating operation, control is performed to supply the coating liquid corresponding to the amount of the coating liquid consumed by ejecting from the ejection port 11 from the pump 30 to the applicator 10. With this control, the coating liquid in the coater 10 is maintained at a negative pressure, while the capillary coating with the required uniform thickness is formed on the substrate 7 (coated surface 8). Easy. Then, as shown in FIG. 5(B), when the coater 10 (discharge port 11) reaches the coating end position of the substrate 7 (the edge of the substrate), the supply of the coating liquid by the pump 30 is stopped. If the supply is stopped, although not shown, the applicator 10 is raised by the raising and lowering actuator 24, the first valve 71 is closed, and the third valve 73 is opened. Then, the pump 30 sucks the coating liquid in the first tank 35 for replenishment, and prepares for the next coating. In addition, the substrate 7 coated with the coating liquid is removed from the platform 9 and transported to the dryer. Through the above operations, in the control mode (Part 1), the pump 30 is used to control the supply of the coating liquid consumed by the coating. During this control, the second valve 72 of the pressure control line L2 is in a closed state, and only the pump 30 of the pump control line L1 is used for liquid supply. The pump 30 supplies the coating liquid to the applicator 10 only in an amount corresponding to the discharge amount of the coating liquid from the applicator 10 set in advance. At this time, the amount of coating liquid supplied to the applicator 10 is set to be higher than the shear force generated by the droplet 3 of the coating liquid between the substrate 7 and the applicator 10 due to the capillary phenomenon and the coating action On the other hand, the amount of the coating liquid to be drawn out of the applicator 10 is slightly smaller, and therefore, it becomes a supply accompanied by suppression of ejection. As a result, although the coating liquid is supplied by the pump 30, in the coater 10, a force to draw the coating liquid out from the ejection port 11 acts, and the coating liquid in the coater 10 is maintained at a negative pressure The state. [Control Mode (Part 2)] Perform the initial discharging step of initial discharging of the coating liquid from the applicator 10, the wiping step of wiping the spray outlet 11 of the applicator 10, and the discharging outlet 11 is located on the substrate 7 The preparatory movement step of moving the coater 10 by the method directly above the coating start position (the edge of the substrate 7) is the same as the initial sending step (Figure 3(A)) and the wiping step in the above-mentioned control mode (Part 1) (FIG. 3(B)) and the pre-movement step (FIG. 3(C)) are performed in the same manner. In addition, the above-mentioned pre-processing is also the same as the control mode (Part 1) during the period before the preparation for movement step is completed. Then, the liquid attaching operation (liquid attaching step) that starts attaching the coating liquid to the substrate 7 is started. This liquid adhesion operation is the same as the liquid adhesion operation (liquid adhesion step) of the control mode (Part 1) shown in Figs. 4(A) to (C). The description of the same aspects as the control mode (Part 1) is omitted here. When the liquid adhering action is completed, a droplet 3 of the coating liquid is formed between the substrate 7 and the ejection port 11 (refer to FIG. 4(C)). Perform the liquid adhesion action. By opening the second valve 72 to communicate the second tank 41 with the applicator 10, the coating liquid sprayed from the nozzle 11 can be applied to the substrate 7 and then the coating in the applicator 10 can be applied. The pressure of the liquid is maintained at a fixed value (negative pressure). When the pressure of the coating liquid in the applicator 10 becomes negative due to the pressure of the coating liquid in the second tank 41, in the above control mode (Part 1), close the second valve 72 (refer to the figure) 5(A)), but in the control mode (Part 2), the second valve 72 is maintained in an open state (refer to FIG. 6(A)). Then, the coating operation (coating step) is performed. In this step, start to use the moving mechanism 20 (linear actuator 23) to move the applicator 10 in the horizontal direction, and connect the second tank 41 to the second tank 41 by controlling the pressure of the coating liquid in the second tank 41 The pressure of the coating liquid of the applicator 10 is maintained at a fixed value (a fixed negative pressure value), and further, the pump 30 can be used to supply the coating liquid to the applicator 10. That is, while the applicator 10 is moved in the horizontal direction by the moving mechanism 20, the pressure control by the second tank 41 and the pressure regulator 42 is performed by the control device 50, and the coating liquid is supplied by the pump 30 The supply control. The above-mentioned pressure control performed in the coating operation is to keep the pressure of the coating liquid in the second tank 41 at a set value, so that the pressure of the coating liquid in the applicator 10 becomes a specific (fixed) negative pressure value的控制。 The control. In addition, the above-mentioned supply control performed during the coating operation is feedback control based on the measured value of the pressure sensor 60. That is, the control device 50 constantly detects changes in the measured value of the pressure sensor 60, and when the change exceeds a threshold value (allowable value), the pump 30 supplies or sucks the coating liquid. Specifically, when the measured value obtained by the pressure sensor 60 decreases and the amount of change exceeds the threshold, the operation of supplying the coating liquid is performed, and when the measured value rises and the amount of change exceeds the threshold , Carry out the action of sucking the coating liquid. In this way, the control device 50 further stabilizes the pressure of the coating liquid of the applicator 10 by performing the adjustment operation of the supply or suction of the coating liquid by the pump 30. Moreover, in the control mode (Part 2), the moving speed of the applicator 10 is also fixed. Here, since the substrate 7 is circular, as described above (refer to FIG. 2), in the applicator 10 (ejection port 11), a portion where the substrate 7 exists directly below and a portion where the substrate 7 does not exist directly below are generated. In addition, the respective ranges of these portions vary according to the relative positions of the substrate 7 and the applicator 10. In addition, for the elongated ejection port 11, the coating liquid is ejected at the portion where the substrate 7 is present as shown in FIG. 2(B), while the coating liquid is not ejected at the portion where the substrate 7 is not present as shown in FIG. 2(C). The spray of coating liquid. Therefore, in order to move the applicator 10 at a fixed speed to apply the coating liquid on the circular substrate 7 and form a fixed film thickness on the substrate 7, the amount of the coating liquid that should be ejected from the ejection port 11 needs to be based on the coating The position of the device 10 relative to the substrate 7 is different. Therefore, control is performed such that, instead of sending a fixed amount of the coating liquid from the pump 30, the amount necessary to form a coating film with a fixed film thickness on the substrate 7 is sent out. Furthermore, in this control mode (Part 2), as described above, the supply or suction of the coating liquid by the pump 30 is controlled based on the measured value of the pressure sensor 60, and the pressure in the applicator 10 is adjusted. (Set as fixed). That is, the amount of the coating liquid sent from the pump 30 becomes an amount equivalent to the amount of the coating liquid (the above-mentioned necessary amount) that changes in accordance with the change (shape change) of the substrate 7 in the width direction, and by performing pressure-based The control of the measurement value of the sensor 60 is the sum of the amount of coating liquid supplied or sucked by the coating liquid. In the above control mode (Part 1), the amount of coating liquid sent from the pump 30 is set in the computer program stored in the control device 50 in advance, but in the control mode (Part 2), the coating liquid sent from the pump 30 The amount will vary from time to time according to the measured value of the pressure sensor 60. As described above, during the coating operation, the control device 50 performs the following control. That is, during the coating operation, in order to maintain the coating liquid in the coater 10 at a negative pressure, the pressure applying device 40 (the second tank 41 and the pressure regulator 42) performs the coating in the coater 10 The pressure of the liquid distribution is controlled, and based on the measurement result of the pressure sensor 60, the adjustment control including the supply and suction of the coating liquid by the pump 30 is performed. Furthermore, when the coating operation starts, the above-mentioned pre-processing is performed, and the pressure of the coating liquid of the applicator 10 is set to a negative pressure, and even if the coating operation starts, the pressure applying device 40 maintains the coating. The negative pressure of the applicator 10 is also controlled by the pump 30 based on the measurement result of the pressure sensor 60. Therefore, the pressure of the coating liquid of the applicator 10 maintains a negative pressure and maintains a fixed value. With this control, pressure control is performed to keep the pressure (negative pressure) in the coater 10 constant, and a uniform thickness of the coating film is formed on the substrate 7 (coated surface 8) of the capillary coating Control becomes easy. Moreover, in this embodiment, as shown in FIG. 6(B), in addition to the substrate 7 provided on the platform 9, there is also provided an edge portion of the substrate 7 (edge portion on the side where the coating is completed) adjacent to For the dummy plate 65, the applicator 10 moves along the substrate 7 and passes the coating end position of the substrate 7 (the edge of the substrate 7) until it reaches the dummy plate 65, and continues to spray the coating liquid. Then, when the coater 10 (discharge port 11) reaches a specific position of the dummy plate 65, the adjustment (discharge) of the coating liquid by the pump 30 is stopped, and the second valve 72 is closed. Then, although not shown, the applicator 10 is raised by the raising and lowering actuator 24, the first valve 71 is closed, and the third valve 73 is opened. Then, the pump 30 sucks the coating liquid in the first tank 35 for replenishment, and prepares for the next coating. In addition, the substrate 7 coated with the coating liquid is removed from the platform 9 and transported to the dryer. Furthermore, the dummy board 65 may be omitted and the coating operation may be ended as in the control mode (No. 1), and the dummy board 65 may be used in the control mode (No. 1). In this control mode (Part 2), both the first valve 71 of the pump control line L1 and the second valve 72 of the pressure control line L2 are set to an open state for control. If the pressure sensor 60 provided in the applicator 10 detects the pressure drop while the coating operation is being performed, the pump 30 can be used to supply a small amount of liquid to the applicator 10, so that the applicator The pressure within 10 returns to the original set value. By performing feedback control on this operation in a short time, the pressure in the applicator 10 can be kept constant. Furthermore, regarding the liquid supply amount by the pump 30, it can also be set to the amount corresponding to the predicted consumption of the coating liquid, but it is more preferable to set it when there is a difference between the set liquid supply amount and the actual liquid consumption amount. The adjusted value after feedback control. [Control Mode (Part 1) and (Part 2)] In the coating device 5 with the above-mentioned configuration, the control device 50 can selectively adopt one of the pump control circuit L1 and the pressure control circuit L2 according to the coating conditions Or both. That is, according to the coating conditions, the control mode (No. 1) or the control mode (No. 2) is selected alternatively. The coating conditions include, for example, the thickness of the film formed on the substrate 7, the coating speed (the moving speed of the coater 10), and the like. Furthermore, the liquid adhesion operation (liquid deposit method at the start of coating) performed in each of the control modes (Part 1) and (Part 2) will be described. As shown in Figure 4(A), in the state where the second valve 72 of the pressure control line L2 is set to off and the first valve 71 of the pump control line L1 is set to open, the coating is supplied from the pump 30 The coating liquid is slowly ejected from the applicator 10 with a small amount of coating liquid. At this time, the pressure in the applicator 10 changes from a negative pressure state to a positive pressure direction. Then, if the coating liquid ejected from the coater 10 adheres to the substrate 7 (refer to FIG. 4(B)), the coating liquid (droplet 3) connected between the coater 10 and the substrate 7 is caused by surface tension. In order to extend the adhesion, the force to draw the coating liquid from the applicator 10 is generated. With this force, the pressure in the applicator 10 changes to a negative pressure direction. If the pressure change in the applicator 10 is detected by the pressure sensor 60, the pressure control circuit L2 and the pump control circuit L1 are switched in the following manner. That is, based on the pressure change in the applicator 10, the pump 30 is stopped, and the second valve 72 of the pressure control line L2 is opened (refer to FIG. 4(C)). Thereby, the pressure in the applicator 10 becomes the pressure set in advance by the pressure control line L2 (the second tank 41). At this time, the time from the pressure change to the stop of the supply of the coating liquid by the pump 30 and the time from the pressure change to the opening of the second valve 72 can be used as a timer. The control of the set specific time is to control the amount of coating liquid sprayed from the coater 10 at the beginning of coating. After the second valve 72 is set to open, when the pump 30 is used for coating film thickness control (control mode (Part 1)), the second valve 72 is set to be closed again, and the pump 30 is used for coating liquid The supply. When the coating film thickness is controlled by pressure control (control mode (Part 2)), the second valve 72 is directly set to the open state, and the pressure fixed control corresponding to the set pressure is performed. Furthermore, when the coating liquid is adhered to the coating start portion of the substrate 7, the amount of the coating liquid to be ejected out of the coater 10 due to the capillary phenomenon is reduced by supplying the coating liquid by the pump 30 Suppression is the minimum necessary. In addition, by detecting the timing of the coating liquid deposition based on the pressure change of the applicator 10, even a small amount of the coating liquid can be ejected reliably, and a stable coating start portion can be obtained. Film thickness. As described above, in each of the above two control modes, the control device 50 is used to maintain the coating liquid in the applicator 10 at a negative pressure from the pump 30 during the coating operation. The coating liquid is supplied to the control of the coater 10. According to this configuration, during the coating operation, the pump 30 can be used to control the amount of the coating liquid supplied to the coater 10 to a specific amount, and it is possible to prevent the coating from being ejected from the coater 10 to the substrate 7 The amount of the coating liquid to be ejected from the ejection port 11 to the outside of the applicator 10 due to the surface tension of the liquid and the capillary phenomenon. Therefore, capillary coating can be performed in which the coating liquid can be ejected downward from the ejection port 11 to form a coating film of a desired thickness (uniform thickness) on the substrate 7 (coated surface 8). Moreover, by applying the coating method (capillary coating) performed by the coating device 5 to the manufacturing method of the product, it is possible to stably manufacture high-quality products with a coating film having a uniform thickness over the entire surface. . [Application conditions] As a coating liquid that can be applied to the coating device 5 described above, in terms of coating properties, a viscosity of 1 to 100,000 mPa·S and a Newtonian (Newtonian) is preferable, but it can also be used Applied to coating liquid with thixotropy. As an example of a coating liquid that can be specifically applied, in addition to a black matrix for color filters and a coating liquid for forming RGB color pixels, there are also the following: resist liquid, protective layer material, pillar forming material, etc. , Or coating liquid for adhesive layer for semiconductor, coating liquid for planarization, coating liquid for protective film, resist liquid, coating liquid for colored layer, coating liquid for fluorescent light-emitting layer, positive type for TFT Resist etc. As the substrate (member to be coated) 7, in addition to silicon wafers and glass, metal plates such as aluminum, ceramic plates, films, and the like can also be used. The shape of the substrate (coated member) 7 may be a rectangular shape, or may be a non-rectangular shape such as a circle. Furthermore, by arranging a plurality of non-rectangular substrates along the length direction of the coater 10, the substrates 7 can be coated simultaneously. Furthermore, as the coating conditions used, the coating speed is 0.1-100 mm/sec, more preferably 0.5-20 mm/sec, between the ejection port 11 of the coater 10 and the coated surface 8 of the substrate 7 The gap (slit gap) is 50 to 1000 μm, more preferably 100 to 500 μm, and the coating thickness in the wet state is 0.5 to 100 μm, more preferably 1 to 50 μm. [Embodiment 1] An embodiment when the control mode (Part 1) is adopted will be described. The coating device 5 shown in FIG. 1 is used to coat polyimide on a round silicon wafer with a diameter of f100 and a thickness of 0.53 mm. Polyimide has a viscosity of 4400 mPa·s and a solid content of 19%. As the coater 10, the length in the coating width direction (length direction, Y direction) of the ejection port 11 is 150 mm, and the gap (length in the X direction) of the ejection port 11 is 0.4 mm. In order to measure the pressure of the coating liquid in the reservoir 13 of the applicator 10, a pressure sensor 60 is provided. Furthermore, under the control of the ejection amount by the pump 30, the ejection amount corresponding to the change in the coating width is specified so that the wet film thickness becomes 40 μm, and the pressure in the coater 10 at the start of coating is -20 Coating is carried out under the conditions of Pa (gauge pressure) and coating speed of 0.5 mm/sec. The coated substrate 7 was dried for 10 minutes on a hot plate at 150°C. After drying, the coating conditions were observed. As a result, a coating film with a thickness of 8 μm was formed on the entire surface area of f100. The film thickness was not uniform within the range of 96 mm in diameter except the 2 mm range of the outer periphery of the coating. Good ±3% or less. [Embodiment 2] Another embodiment when the control mode (Part 2) is adopted will be described. With the coating device 5 shown in FIG. 1, a color photoresist is coated on a round silicon wafer with a diameter of f100 × a thickness of 0.53 mm. Color photoresist has a viscosity of 4 mPa·s and a solid content of 15%. As the coater 10, the length of the coating width direction (length direction, Y direction) of the ejection port 11 is 150 mm, and the gap (length in the X direction) of the ejection port 11 is 0.2 mm. In order to measure the pressure of the coating liquid in the reservoir 13 of the applicator 10, a pressure sensor 60 is provided. In addition, as the discharge amount control by constant pressure control, the correction of the pressure fluctuation in the applicator 10 is performed by the pump 30. Set the pressure in the coater 10 at the start of coating to -180 Pa (gauge pressure), and the coating speed is 2 mm/sec, with the variation of the ejection pressure as the threshold value, within 5 Pa In this way, the pump 30 is feedback controlled, and the coating action is performed at the same time. The coated substrate 7 was vacuum-dried to 65 Pa in 25 seconds for 60 seconds, and then dried on a hot plate at 120° C. for 10 minutes. The coating condition was observed after drying. As a result, a coating film with a thickness of 800 nm was formed on the entire surface area of f100. The film thickness was not uniform in the range of 96 mm in diameter except the 2 mm range of the outer periphery of the coating. Good ±3% or less. When the direction of spraying the coating liquid from the coater 10 (discharge port 11) is set downward as in the present embodiment (in the case of downward capillary coating), the coating in the coater 10 The meaning of setting the liquid to negative pressure lies in the following (1) and (2). (1) To prevent the coating liquid in the applicator 10 from flowing freely from the ejection port 11 (due to its own weight). (2) To adjust the thickness of the film formed on the substrate 7. Furthermore, the coating device 5 may be constructed in such a way that the ejection direction of the coating liquid becomes upward (including oblique upward). In this case (when the capillary is coated upward), although not shown, (if described with reference to FIG. 1), in the same state as when the ejection port 11 is downward, the ejection port 11 and its The coating liquid droplets are formed between the upper substrate 7 and the coating liquid in the vicinity of the ejection port 11 (the slit-shaped flow path 12) becomes a negative pressure. During this operation, the pressure value applied to the tank 41 by the pressure regulator 42 is a pressure value calculated based on the coating liquid near the ejection port 11 becoming a specific negative pressure, and may not be a negative pressure. Then, the coating operation is performed in this state. That is, during the coating operation, the control device 50 is used to supply the coating liquid from the pump 30 to the coater 10 while making the coating liquid near the ejection port 11 in the coater 10 a negative pressure.的控制。 The control. Specifically, control is performed to supply the coating liquid corresponding to the amount of the coating liquid ejected from the ejection port 11 from the pump 30 to the applicator 10. That is, the coating operation based on the above-mentioned control mode (Part 1) is performed. Moreover, the control device 50 also has the following function, that is, the pressure applying device 40 controls the pressure of the coating liquid in the coater 10 to maintain the coating liquid near the ejection port 11 in the coater 10 It is a negative pressure, and the adjustment control of the coating liquid by the pump 30 is performed based on the measurement result of the pressure sensor 60. That is, the coating operation based on the above-mentioned control mode (Part 2) can also be performed. Furthermore, in the case of the upward capillary coating, the significance of making the coating liquid near the ejection port 11 in the applicator 10 a negative pressure lies in the above (2). [Supplementary Note] The implementation form disclosed this time is illustrative in all respects and not restrictive. The scope of the patent application of the present invention is not limited to the above-mentioned embodiments, and includes all changes within the scope equivalent to the composition described in the scope of the patent application. In the above-mentioned embodiment, the coated member is a single-piece substrate 7, but it may not be a single-piece but a continuous member.

3‧‧‧塗佈液之液滴5‧‧‧塗佈裝置6‧‧‧裝置基台7‧‧‧基板(被塗佈構件)8‧‧‧被塗佈面9‧‧‧平台10‧‧‧塗佈器11‧‧‧噴出口12‧‧‧狹縫狀流路13‧‧‧積存部20‧‧‧移動機構21‧‧‧軌道22‧‧‧可動區塊23‧‧‧線性致動器24‧‧‧升降致動器30‧‧‧泵35‧‧‧第一罐40‧‧‧壓力賦予裝置41‧‧‧第二罐42‧‧‧壓力調整器50‧‧‧控制裝置60‧‧‧壓力感測器65‧‧‧虛設板71‧‧‧第一閥72‧‧‧第二閥73‧‧‧第三閥81‧‧‧配管82‧‧‧配管83‧‧‧配管D‧‧‧直徑L1‧‧‧泵控制線路L2‧‧‧壓力控制線路W‧‧‧寬度尺寸3‧‧‧Droplets of coating liquid ‧‧Applicator 11‧‧‧Ejection port 12‧‧‧Slit flow path 13‧‧‧Reservoir 20‧‧‧Moving mechanism 21‧‧‧Track 22‧‧‧Moving block 23‧‧‧Linear actuation Actuator 24‧‧‧Lift actuator 30‧‧‧Pump 35‧‧‧First tank 40‧‧‧Pressure applying device 41‧‧‧Second tank 42‧‧‧Pressure regulator 50‧‧‧Control device 60 ‧‧‧Pressure sensor 65‧‧‧Dummy plate 71‧‧‧First valve 72‧‧‧Second valve 73‧‧‧Third valve 81‧‧‧Piping 82‧‧‧Piping 83‧‧‧Piping D ‧‧‧Diameter L1‧‧‧Pump control circuit L2‧‧‧Pressure control circuit W‧‧‧Width dimension

圖1係對塗佈裝置之整體構成進行說明之概略構成圖。 圖2(A)~(C)係塗佈器及基板之說明圖。 圖3(A)~(C)係對塗佈方法進行說明之說明圖。 圖4(A)~(C)係對塗佈方法進行說明之說明圖。 圖5(A)、(B)係對塗佈方法進行說明之說明圖。 圖6(A)、(B)係對塗佈方法進行說明之說明圖。Fig. 1 is a schematic configuration diagram illustrating the overall configuration of the coating device. Figure 2 (A) ~ (C) are explanatory diagrams of the coater and the substrate. 3(A) to (C) are explanatory diagrams explaining the coating method. 4(A) to (C) are explanatory diagrams explaining the coating method. Fig. 5 (A) and (B) are explanatory diagrams explaining the coating method. Fig. 6 (A) and (B) are explanatory diagrams explaining the coating method.

3‧‧‧塗佈液之液滴 3‧‧‧Drops of coating liquid

5‧‧‧塗佈裝置 5‧‧‧Coating device

6‧‧‧裝置基台 6‧‧‧Installation abutment

7‧‧‧基板(被塗佈構件) 7‧‧‧Substrate (component to be coated)

8‧‧‧被塗佈面 8‧‧‧Coated surface

9‧‧‧平台 9‧‧‧Platform

10‧‧‧塗佈器 10‧‧‧Applicator

11‧‧‧噴出口 11‧‧‧Ejection outlet

12‧‧‧狹縫狀流路 12‧‧‧Slit flow path

13‧‧‧積存部 13‧‧‧Accumulation Department

20‧‧‧移動機構 20‧‧‧Mobile mechanism

21‧‧‧軌道 21‧‧‧Orbit

22‧‧‧可動區塊 22‧‧‧movable block

23‧‧‧線性致動器 23‧‧‧Linear actuator

24‧‧‧升降致動器 24‧‧‧Lift actuator

30‧‧‧泵 30‧‧‧Pump

35‧‧‧第一罐 35‧‧‧The first pot

40‧‧‧壓力賦予裝置 40‧‧‧Pressure giving device

41‧‧‧第二罐 41‧‧‧The second pot

42‧‧‧壓力調整器 42‧‧‧Pressure Regulator

50‧‧‧控制裝置 50‧‧‧Control device

60‧‧‧壓力感測器 60‧‧‧Pressure Sensor

71‧‧‧第一閥 71‧‧‧First valve

72‧‧‧第二閥 72‧‧‧Second valve

73‧‧‧第三閥 73‧‧‧Third valve

81‧‧‧配管 81‧‧‧Piping

82‧‧‧配管 82‧‧‧Piping

83‧‧‧配管 83‧‧‧Piping

L1‧‧‧泵控制線路 L1‧‧‧Pump control circuit

L2‧‧‧壓力控制線路 L2‧‧‧Pressure control circuit

Claims (12)

一種塗佈裝置,其具備:塗佈器,其具有積存塗佈液之積存部、噴出塗佈液之噴出口、及使上述積存部與上述噴出口相連之狹縫狀流路,且自該噴出口對被塗佈構件噴出塗佈液;移動機構,其使上述塗佈器與上述被塗佈構件沿與該被塗佈構件之被塗佈面平行之方向相對移動;泵,其通過與上述塗佈器連接之配管而與上述塗佈器相連,且對上述積存部供給塗佈液;以及控制裝置,其於一面進行上述相對移動一面對上述被塗佈構件自上述噴出口噴出塗佈液之塗佈動作時,於上述塗佈動作的整個過程中進行用以一面使上述積存部內之塗佈液維持為負壓一面自上述泵將塗佈液供給至上述塗佈器之控制;且具備:罐,其積存塗佈液且與上述塗佈器相連;壓力調整器,其藉由將上述罐中之塗佈液之壓力調整為負壓,而使上述積存部中之塗佈液之壓力成為負壓;且為了在上述被塗佈構件與上述噴出口之間形成由塗佈液所成之液滴,上述壓力調整器調整上述罐中之塗佈液之壓力,而藉由上述壓力的影響將上述積存部中之塗佈液之壓力設定為負壓;上述控置裝置在形成有上述液滴的狀態下,一面進行上述相對移動一面進行從上述噴出口對上述被塗佈構件噴出塗佈液之塗佈動作時,進行 用以一面維持由上述壓力之影響所產生之上述積存部內之塗佈液之負壓,一面從上述泵對上述塗佈器供給塗佈液之控制。 A coating device comprising: an applicator having a storage portion for storing a coating liquid, an ejection port for ejecting the coating liquid, and a slit-like flow path connecting the storage portion and the ejection port, and The ejection port ejects the coating liquid to the member to be coated; a moving mechanism that makes the applicator and the member to be coated relatively move in a direction parallel to the coated surface of the member to be coated; a pump, which passes and The pipe to which the applicator is connected is connected to the applicator and supplies the coating liquid to the reservoir; and a control device that performs the relative movement on one side and ejects the coating from the ejection port toward the member to be coated During the coating operation of the cloth liquid, control is performed during the entire process of the coating operation to maintain the coating liquid in the reservoir at a negative pressure while supplying the coating liquid from the pump to the applicator; And equipped with: a tank which stores the coating liquid and is connected to the above-mentioned applicator; and a pressure regulator which adjusts the pressure of the coating liquid in the above-mentioned tank to a negative pressure so that the coating liquid in the storage part The pressure becomes negative pressure; and in order to form droplets formed by the coating liquid between the coated member and the ejection port, the pressure regulator adjusts the pressure of the coating liquid in the tank, and the pressure of the coating liquid in the tank is adjusted by the above The influence of pressure sets the pressure of the coating liquid in the reservoir to a negative pressure; the control device, in the state where the liquid droplets are formed, performs the relative movement from the ejection port to the coated member During the coating action of spraying the coating liquid, proceed It is used to maintain the negative pressure of the coating liquid in the reservoir caused by the influence of the pressure, while controlling the supply of the coating liquid from the pump to the applicator. 如請求項1之塗佈裝置,其中上述控制裝置於上述塗佈動作時,進行將與自上述噴出口噴出之塗佈液之量對應之塗佈液自上述泵供給至上述塗佈器之控制。 The coating device of claim 1, wherein the control device performs control for supplying the coating liquid corresponding to the amount of coating liquid ejected from the ejection port from the pump to the coating device during the coating operation . 如請求項1之塗佈裝置,其中上述罐與上述壓力調整器構成使壓力作用於上述塗佈器內之塗佈液之壓力賦予裝置;且進而具備壓力感測器,其對上述塗佈器內之塗佈液之壓力進行測定;且上述控制裝置藉由上述壓力賦予裝置進行上述塗佈器內之塗佈液之壓力控制,以將上述塗佈器內之塗佈液維持為負壓,並且基於上述壓力感測器之測定結果進行利用上述泵之塗佈液之調整控制。 The coating device of claim 1, wherein the tank and the pressure regulator constitute a pressure applying device for applying pressure to the coating liquid in the applicator; The pressure of the coating liquid in the coating device is measured; and the control device controls the pressure of the coating liquid in the coating device by the pressure applying device to maintain the coating liquid in the coating device at a negative pressure, And based on the measurement result of the pressure sensor, the adjustment control of the coating liquid using the pump is performed. 如請求項2之塗佈裝置,其中上述罐與上述壓力調整器構成使壓力作用於上述塗佈器內之塗佈液之壓力賦予裝置;且進而具備壓力感測器,其對上述塗佈器內之塗佈液之壓力進行測定;且上述控制裝置藉由上述壓力賦予裝置進行上述塗佈器內之塗佈液之壓力控制,以將上述塗佈器內之塗佈液維持為負壓,並且基於上述壓力感測器之測定結果進行利用上述泵之塗佈液之調整控制。 The coating device of claim 2, wherein the tank and the pressure regulator constitute a pressure applying device for applying pressure to the coating liquid in the coating device; The pressure of the coating liquid in the coating device is measured; and the control device controls the pressure of the coating liquid in the coating device by the pressure applying device to maintain the coating liquid in the coating device at a negative pressure, And based on the measurement result of the pressure sensor, the adjustment control of the coating liquid using the pump is performed. 如請求項1至4中任一項之塗佈裝置,其中上述控制裝置係藉由上述泵將塗佈液供給至上述塗佈器,以便進行開始對上述被塗佈構件附著塗佈液之液體附著動作,於藉由該供給使上述塗佈器內之塗佈液之壓力提高之後,若檢測出該壓力之降低,則停止利用上述泵供給塗佈液。 The coating device according to any one of claims 1 to 4, wherein the control device supplies the coating liquid to the applicator by the pump so as to start attaching the coating liquid to the coated member In the adhesion operation, after the pressure of the coating liquid in the applicator is increased by the supply, if the pressure drop is detected, the supply of the coating liquid by the pump is stopped. 如請求項5之塗佈裝置,其進而具備:閥,其能夠將上述塗佈器與上述罐連通及阻斷;且上述控制裝置係於藉由上述閥阻斷上述塗佈器與上述罐之連通之狀態下,藉由上述泵將塗佈液供給至上述塗佈器,若之後檢測出上述壓力之降低,則停止利用上述泵供給塗佈液,並且使上述閥動作而使上述罐與上述塗佈器連通。 The coating device of claim 5, further comprising: a valve capable of connecting and blocking the coating device and the tank; and the control device is configured to block the coating device and the tank by the valve In the connected state, the coating liquid is supplied to the applicator by the pump, and if the pressure drop is detected later, the supply of the coating liquid by the pump is stopped, and the valve is operated to make the tank and the The spreader is connected. 一種塗佈方法,其係用以自塗佈器之噴出口對被塗佈構件噴出塗佈液而進行毛細管塗佈之方法,該塗佈器具有積存塗佈液之積存部、噴出塗佈液之噴出口、及使上述積存部與上述噴出口相連之狹縫狀流路;且可從通過連接於上述塗佈器之配管而與上述塗佈器相連之泵對上述積存部供給塗佈液;且該塗佈方法進行如下之塗佈動作:一面使上述塗佈器與上述被塗佈構件沿與該被塗佈構件之被塗佈面平行之方向相對移動,一面自上述噴出口對該被塗佈構件噴出塗佈液,且於上述塗佈動作時,於上述塗佈動作的整個過程中一面使上述積存部內之塗佈液維持為負壓,一面自上述泵將塗佈液供給至該塗佈器;且使積存塗佈液之罐連接於上述塗佈器,且能夠藉由壓力調整器將上 述罐中之塗佈液之壓力調整為負壓,而使上述積存部中之塗佈液之壓力成為負壓;其中為了在上述被塗佈構件與上述噴出口之間形成由塗佈液所成之液滴,上述壓力調整器調整上述罐中之塗佈液之壓力,而藉由上述壓力的影響將上述積存部中之塗佈液之壓力設定為負壓;在形成有上述液滴的狀態下,進行塗佈動作時,一面維持由上述壓力之影響所產生之上述積存部內之塗佈液之負壓,一面從上述泵對上述塗佈器供給塗佈液。 A coating method, which is a method for capillary coating by spraying a coating liquid from the nozzle of a coating device to a member to be coated, the coating device having a reservoir for storing the coating liquid, and spraying the coating liquid The ejection port, and the slit-shaped flow path connecting the reservoir and the ejection outlet; and the coating liquid can be supplied to the reservoir from a pump connected to the applicator through a pipe connected to the applicator ; And the coating method performs the following coating action: while the applicator and the coated member are relatively moved in a direction parallel to the coated surface of the coated member, and on the same side from the ejection port The member to be coated sprays the coating liquid, and during the coating operation, the coating liquid in the reservoir is maintained at a negative pressure during the entire process of the coating operation, and the coating liquid is supplied from the pump to the The coater; and the tank that stores the coating liquid is connected to the coater, and the pressure regulator can be used to The pressure of the coating liquid in the tank is adjusted to a negative pressure, so that the pressure of the coating liquid in the reservoir becomes a negative pressure; wherein, in order to form the coating liquid between the coated member and the ejection port The pressure regulator adjusts the pressure of the coating liquid in the tank, and the pressure of the coating liquid in the reservoir is set to a negative pressure by the influence of the pressure; In the state, during the coating operation, while maintaining the negative pressure of the coating liquid in the reservoir due to the influence of the pressure, the coating liquid is supplied from the pump to the applicator. 如請求項7之塗佈方法,其中於上述塗佈動作時,將與自上述噴出口噴出之塗佈液之量對應之塗佈液自上述泵供給至上述塗佈器。 The coating method according to claim 7, wherein during the coating operation, the coating liquid corresponding to the amount of the coating liquid ejected from the ejection port is supplied from the pump to the applicator. 如請求項7之塗佈方法,其係藉由壓力感測器測定上述塗佈器內之塗佈液之壓力,進行該塗佈器內之塗佈液之壓力控制以將上述塗佈器內之塗佈液維持為負壓,並且基於上述壓力感測器之測定結果進行利用上述泵之塗佈液之調整控制。 Such as the coating method of claim 7, which measures the pressure of the coating liquid in the applicator by a pressure sensor, and controls the pressure of the coating liquid in the applicator to control the pressure in the applicator. The coating liquid is maintained at a negative pressure, and the adjustment control of the coating liquid by the pump is performed based on the measurement result of the pressure sensor. 如請求項8之塗佈方法,其係藉由壓力感測器測定上述塗佈器內之塗佈液之壓力,進行該塗佈器內之塗佈液之壓力控制以將上述塗佈器內之塗佈液維持為負壓,並且基於上述壓力感測器之測定結果進行利用上述泵之塗佈液之調整控制。 Such as the coating method of claim 8, which measures the pressure of the coating liquid in the applicator by a pressure sensor, and controls the pressure of the coating liquid in the applicator to control the pressure in the applicator. The coating liquid is maintained at a negative pressure, and the adjustment control of the coating liquid by the pump is performed based on the measurement result of the pressure sensor. 如請求項7至10中任一項之塗佈方法,其中藉由上述泵將塗佈液供給至上述塗佈器,以便進行開始對上述被塗佈構件附著塗佈液之液體附著動作,於藉由該供給使上述塗佈器內之塗佈液之壓力提高之後,若檢測出該壓力之降低,則停止利用上述泵供給塗佈液。 The coating method according to any one of claims 7 to 10, wherein the coating liquid is supplied to the applicator by the pump so as to perform the liquid adhering action to start adhering the coating liquid to the member to be coated, and After the pressure of the coating liquid in the applicator is increased by this supply, if the pressure drop is detected, the supply of the coating liquid by the pump is stopped. 如請求項11之塗佈方法,其中於上述塗佈器中,設置有閥,該閥通過配管與積存塗佈液之上述罐連接,並且能夠將該塗佈器與該罐連通及阻斷,於藉由上述閥阻斷上述塗佈器與上述罐之連通之狀態下,藉由上述泵將塗佈液供給至上述塗佈器,若之後檢測出上述壓力之降低,則停止利用上述泵供給塗佈液,並且使上述閥動作而使上述罐與上述塗佈器連通。 The coating method of claim 11, wherein a valve is provided in the applicator, the valve is connected to the tank storing the coating liquid through a pipe, and the applicator can be connected to and blocked from the tank, In the state where the communication between the applicator and the tank is blocked by the valve, the coating liquid is supplied to the applicator by the pump, and if the pressure drop is detected later, the supply by the pump is stopped The coating liquid is applied, and the valve is operated to connect the tank and the applicator.
TW106105548A 2016-02-26 2017-02-20 Coating device and coating method TWI735539B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP??2016-035472 2016-02-26
JP2016035472A JP6804850B2 (en) 2016-02-26 2016-02-26 Coating device and coating method

Publications (2)

Publication Number Publication Date
TW201741036A TW201741036A (en) 2017-12-01
TWI735539B true TWI735539B (en) 2021-08-11

Family

ID=59685085

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106105548A TWI735539B (en) 2016-02-26 2017-02-20 Coating device and coating method

Country Status (5)

Country Link
JP (1) JP6804850B2 (en)
KR (1) KR20180116300A (en)
CN (1) CN108698073B (en)
TW (1) TWI735539B (en)
WO (1) WO2017145675A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108043662B (en) * 2018-01-23 2024-06-21 佛山市雅路斯工业设备有限公司 Coating head
JP7219562B2 (en) * 2018-07-19 2023-02-08 東レ株式会社 Coating method and coating device
JP2020116519A (en) * 2019-01-23 2020-08-06 東レ株式会社 Application device and application method
CN110538774A (en) * 2019-09-09 2019-12-06 惠州锂威新能源科技有限公司 Coating system with pressure compensation device and application method thereof
JP6808304B1 (en) * 2020-01-14 2021-01-06 中外炉工業株式会社 Coating device
JP7135015B2 (en) * 2020-02-03 2022-09-12 東レエンジニアリング株式会社 Coating device and coating method
JP7500992B2 (en) 2020-02-25 2024-06-18 東レ株式会社 Coating device and coating method
CN113663872B (en) * 2020-06-29 2022-05-17 上海德沪涂膜设备有限公司 Coating device for improving utilization rate of high-viscosity material
FR3116461B1 (en) * 2020-11-26 2022-12-23 S A S 3Dceram Sinto Machine for manufacturing raw parts in ceramic or metallic material
JP7309297B2 (en) * 2021-03-03 2023-07-18 株式会社Screenホールディングス Liquid supply device, coating device, aging device, liquid supply method, and aging method
JP2022143661A (en) * 2021-03-18 2022-10-03 株式会社Screenホールディングス Substrate coating device and substrate coating method
JP2024127644A (en) 2023-03-09 2024-09-20 株式会社Screenホールディングス SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015141513A1 (en) * 2014-03-19 2015-09-24 東レ株式会社 Coating device, coating method, and method for manufacturing display component

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3414572B2 (en) * 1996-02-06 2003-06-09 東レ株式会社 Coating device and coating method
JP2006142530A (en) * 2004-11-17 2006-06-08 Noritsu Koki Co Ltd Covering apparatus
JP4802068B2 (en) * 2006-09-04 2011-10-26 株式会社ヒラノテクシード Coating equipment
JP5507523B2 (en) * 2011-11-01 2014-05-28 東京エレクトロン株式会社 Coating processing apparatus, coating processing method, program, and computer storage medium
JP6125783B2 (en) * 2012-09-24 2017-05-10 東レエンジニアリング株式会社 Coating apparatus and coating method
DE102012224264A1 (en) * 2012-12-21 2014-06-26 Robert Bosch Gmbh Method for wet coating of substrate for electrode of lithium ion battery cell, involves adjusting pressure of coating material in spray head when detected deviation of film thickness is above predetermined desired layer thickness
CN104781016B (en) * 2013-02-28 2017-03-29 Lg化学株式会社 Slot-form die apparatus for coating
JP5834048B2 (en) * 2013-05-24 2015-12-16 富士機械工業株式会社 Double-side coating device
JP2015192984A (en) * 2014-03-17 2015-11-05 東レ株式会社 Coater and coating method
CN104190597B (en) * 2014-08-19 2017-02-01 苏州市益维高科技发展有限公司 Quantitative gluing amount control device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015141513A1 (en) * 2014-03-19 2015-09-24 東レ株式会社 Coating device, coating method, and method for manufacturing display component

Also Published As

Publication number Publication date
CN108698073B (en) 2021-06-11
JP2017148769A (en) 2017-08-31
JP6804850B2 (en) 2020-12-23
WO2017145675A1 (en) 2017-08-31
KR20180116300A (en) 2018-10-24
CN108698073A (en) 2018-10-23
TW201741036A (en) 2017-12-01

Similar Documents

Publication Publication Date Title
TWI735539B (en) Coating device and coating method
TWI673110B (en) Coating device, coating method, and manufacturing method of member for display
JP2015192984A (en) Coater and coating method
JP2798503B2 (en) Liquid coating method and coating device
KR20100119880A (en) Device and method for applying application liquid
TW201637724A (en) Fluid discharging device, method for discharging fluid and fluid coating device
JP2014180604A (en) Intermittent coating apparatus and intermittent coating method and method for manufacturing displaying member
JP5309588B2 (en) Coating liquid coating apparatus and coating method
JP2001137764A (en) Coating apparatus and coating method
JP6901616B2 (en) Coating device and coating method
JP4848109B2 (en) Coating device
TWI322717B (en) Coating device
JP4799390B2 (en) Application method
TW200610580A (en) Method for preventing coater and coating head from clogging
KR101309037B1 (en) Slit coater
WO2011033866A1 (en) Coating device and coating method
JP2018001082A (en) Coating device and coating method
KR100775122B1 (en) A dischange control structure and a coating apparatus using the same
JP7219562B2 (en) Coating method and coating device
JP6355367B2 (en) Coating method and coating apparatus
JP6960111B2 (en) Coating equipment
JP6288692B2 (en) Liquid coating apparatus and coating method
JP2017154086A (en) Coating apparatus and coating method
JP2010175919A (en) Spinless coat device and color filter substrate
JP2018001124A (en) Coating device and coating method

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees