TWI731536B - 具有孔洞以及遮光膜之複合布 - Google Patents

具有孔洞以及遮光膜之複合布 Download PDF

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TWI731536B
TWI731536B TW108148454A TW108148454A TWI731536B TW I731536 B TWI731536 B TW I731536B TW 108148454 A TW108148454 A TW 108148454A TW 108148454 A TW108148454 A TW 108148454A TW I731536 B TWI731536 B TW I731536B
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light
film
shielding
cloth
particles
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TW202112535A (zh
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李君敏
黃泳彬
李國興
葉佩宜
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財團法人工業技術研究院
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Abstract

一種具有孔洞之複合布，至少包含：一表層布、一遮光膜以及一底層布。遮光膜係與表層布及底層布貼附為一體；遮光膜為含有遮蔽光之微粒或粉體之薄膜或奈米纖維膜；表層布、底層布及遮光膜中至少一者具有複數個孔洞。

Description

具有孔洞以及遮光膜之複合布
本案係有關於一種具有孔洞以及遮光膜之複合布。
傳統上所使用的可透視的遮光布，例如網布，通常會藉由深色的紗線經由織造設計(例如，交叉或交錯編織的方式)來完成具有孔洞的簾布。此類的簾布為了能達成遮光，必須使用深色的紗線做為基底，並且受限於織造的設計，孔洞的樣式及排列變化性也會因此受限。
本案係提供一種具有孔洞之複合布，該複合布兼具遮光及具清晰可視的效果。
在一實施例中，複合布至少包含有表層布、遮光膜以及底層布，其中，遮光膜係與表層布及底層布貼附為一體；遮光膜為含有遮蔽光之微粒或粉體；以及表層布、底層布與遮光膜中至少一者具有複數個孔洞。
於另一實施例中，遮光膜為膠膜或奈米纖維膜。
於另一實施例中，遮光膜的材質為聚胺酯或是熱塑性聚酯彈性體。
於另一實施例中，微粒或粉體為碳黑微粒或是銫鎢微粒，並且微粒或粉體的重量佔該遮光膜的重量的20wt%~60wt%。複合布之總光線穿透率係小於30%。
於另一些實施例中，遮光膜例如是添加碳黑微粒或粉體之碳黑改質遮光膜、添加銫鎢微粒或粉體之銫鎢改質遮光膜、添加奈米碳管微粒或粉體之奈米碳管改質遮光膜、添加石墨烯微粒或粉體之石墨烯改質遮光膜、添加焦炭微粒或粉體之焦炭改質遮光膜以及添加碳化鋯微粒或粉體之碳化鋯改質遮光膜之前述遮光膜的任一者。
於另一實施例中，表層布及底層布為織布或不織布。
於另一實施例中，在遮光膜兩面施加黏膠，以分別與表層布及該底層布貼合。
於另一實施例中，遮光膜係藉由熱壓與該表層布及該底層布貼合。
於另一實施例中，表層布、底層布與遮光膜中至少一者具有之複數個孔洞，其係為沖孔而成、雷射融熔燒而成、織布織造而成、及/或不織布製程而形成。
於另一實施例中，該複數個孔洞的總面積佔複合布之面積的比例係大於0.25%。
於另一實施例中，複合布之霧度值係低於33%。
於另一實施例中，遮光膜之厚度係在1 µm以上且在80 µm以下。
本案另提供一種遮光奈米纖維膜，其藉由在遮光奈米纖維膜中加入遮蔽光微粒或粉體來達成遮光之效果。
於另一實施例中，一種遮光奈米纖維膜，其奈米纖維膜材質為聚胺酯或是熱塑性聚酯彈性體，其中，遮光奈米纖維膜含有遮蔽光微粒或粉體，且遮蔽光微粒或粉體之重量佔整體遮光奈米纖維膜重量的20wt%~60wt %。
於另一實施例中，遮光奈米纖維膜之總光線穿透率小於30 % 。
於另一實施例中，遮光奈米纖維膜係為添加碳黑微粒或粉體之碳黑改質遮光膜、添加銫鎢微粒或粉體之銫鎢改質遮光膜、添加奈米碳管微粒或粉體之奈米碳管改質遮光膜、添加石墨烯微粒或粉體之石墨烯改質遮光膜、添加焦炭微粒或粉體之焦炭改質遮光膜以及添加碳化鋯微粒或粉體之碳化鋯改質遮光膜。
於另一實施例中，遮光奈米纖維膜之厚度係在1µm以上且在80µm以下。
基於上述，本案之複合布係在表層布、底層布及含有遮蔽光微粒或粉體之遮光膜中至少一者形成有複數個孔洞，而兼具遮光及透光的效果，達到清晰可視的效果。
第1圖為本案之具有孔洞之複合布A之示意圖。從第1圖可看出複合布A有三層結構，複合布A至少包含表層布1、遮光膜2以及底層布3。其中，表層布1、遮光膜2以及底層布3中至少任一者具有孔洞，再將表層布1、遮光膜2以及底層布3貼附為一體。本案之具有孔洞之複合布A並不限於上述組成方式，在一實施例中，具有孔洞之複合布A可由表層布1及遮光膜2貼附後進行造孔，再與底層布3貼附為一體後形成；在另一實施例中，具有孔洞之複合布A亦可由底層布3與遮光膜2貼附後進行造孔，再與表層布1貼附為一體後形成；在另一實施例中，具有孔洞之複合布A係由表層布1、遮光膜2、底層布3以及另一布或另一遮光膜貼附為一體後，造孔後而成。上述實施例中，遮光膜係與表層布或底層布中之至少一者貼附後再進行造孔以得到孔洞，可以防止表層布或底層布斷絲或脫紗。在另一實施例中，具有孔洞之複合布A係由具有織造孔之表層布1或底層布3，與遮光膜2貼附為一體後而成。上述造孔之方式係為但不限於沖孔或是雷射熱熔造孔的方式等，也可因織造或不織布製程而於表層布或底層布形成孔洞。在一實施例中，複數個孔洞4之總面積佔具有孔洞之複合布A的面積至少0.25%的比例，且孔洞的樣式並不限於本案圖式所揭示的內容。
第2圖係第1圖之具有孔洞之複合布A之剖面圖。如第2圖所示，遮光膜2係藉由黏膠5而與表層布1及底層布3黏合。遮光膜2與表層布1及底層布3也可藉由熱壓的方式貼合在一起(未示於圖式)。
遮光膜2為含有遮蔽光微粒或粉體之膠膜或是奈米纖維膜。在一實施例中，遮光膜2的材質為聚胺酯或是熱塑性聚酯彈性體。在一實施例中，遮蔽光微粒或粉體係使用可見光(波長範圍在380-780nm之間)反射率及近紅外光(波長範圍在780-2100nm之間)反射率皆須小於5%的材料(在粉體錠片穿透率>0.5%的情形下)，此係透過VIS-NIR積分球光譜儀進行反射光測試後得知。在一實施例中，本案之遮光膜2為添加碳黑微粒或粉體之碳黑改質遮光膜、添加銫鎢微粒或粉體之銫鎢改質遮光膜、添加奈米碳管微粒或粉體之奈米碳管改質遮光膜、添加石墨烯微粒或粉體之石墨烯改質遮光膜、添加焦炭微粒或粉體之焦炭改質遮光膜以及添加碳化鋯微粒或粉體之碳化鋯改質遮光膜中之任一者。
遮光膜2中所含的遮蔽光微粒或粉體之重量係佔整體遮光膜2之重量之20wt%~60wt%，以保持遮光膜2擁有一定的透光效果，但不完全失去遮光膜2之遮光效果，其中wt%代表重量(weight, wt)百分濃度。在一實施例中，遮光膜2的厚度係為1 µm以上且在80 µm以下。
本揭露之表層布1及底層布3係使用織布或不織布。在一實施例中，表層布1及底層布3係使用梭織布或針織布。在一實施例中，表層布1以及底層布3係選用淺色布。
為能定義清晰可視度，本案的實施例透過霧度值 (Haze value) 的方式來界定是否為清晰可視。霧度值的計算公式如下所示：
Figure 02_image001
其中，
Figure 02_image003
為總光線穿透率(Total Luminous Transmittance)，
Figure 02_image005
為擴散光線穿透率 (Diffuse Luminous Transmittance)，其中，
Figure 02_image007
其中，
Figure 02_image009
為平行光線穿透率 (Parallel Luminous Transmittance)。其中，
Figure 02_image011
擴散光線穿透率 (Diffuse Luminous Transmittance)及
Figure 02_image013
平行光線穿透率 (Parallel Luminous Transmittance)皆係透過VIS-NIR積分球光譜儀進行量測後得知。通常來說，霧度值愈高，表示清晰可視度愈低。本案所指清晰可視係指霧度值小於33%。
第3A圖及第3B圖分別為本案第一實施例及第二實施例之具有孔洞之複合布之示意圖。請參閱表1及第3A圖、及第3B圖，其中本案之第一實施例、第二實施例及第二A實施例中的表層布及底層布係使用淺色梭織布，而遮光膜係使用添加50wt%碳黑之碳黑改質聚氨酯（Polyurethane，PU）奈米纖維膜。
實施例 遮光膜材質 Tp (%) Td (%) 霧度值 (%)
第一 添加50wt%碳黑之 碳黑PU奈米纖維膜 4.5 0.8 15.1
第二 6.0 1.0 14.3
第二A 0.25 0.1 28.5
表1
請參閱表1及第3A圖，本案之第一實施例將表層布、遮光膜以及底層布三者貼合後，以造孔的方式形成如第3A圖的圖案，該圖案的平行光線穿透率為4.5%，對應所量測到的擴散光線穿透率為0.8%，經計算後，可得到本案之第一實施例的霧度值為15.1%，可達到清晰可視效果。
請參閱表1及第3B圖，本案之第二實施例及第二A實施例係將表層布、遮光膜以及底層布三者貼合後，以造孔的方式形成如第3B圖的圖案，該圖案的平行光線穿透率分別為6.0%以及0.25%，對應所量測到的擴散光線穿透率分別為1.0%以及0.1%，經計算後，可得到本案之第二實施例以及第二A實施例的霧度值分別為14.3%以及28.5%，在效果上係可達到清晰可視的效果。
請參閱表2，為本案的第三實施例至第六實施例，該四者實施例(第三實施例至第六實施例未示於圖式)中的表層布及底層布係使用淺色梭織布，而遮光膜係使用添加20wt%碳黑之碳黑改質PU膠膜。
實施例 遮光膜材質 Tp (%) Td (%) 霧度值 (%)
第三 添加20wt%碳黑之 碳黑PU膠膜 3.0 0.7 18.9
第四 6.05 0.63 9.43
第五 7.38 0.77 9.46
第六 11.76 0.93 7.34
表2
請參閱表2，本案的第三實施例至第六實施例係將表層布、遮光膜以及底層布三者貼合後，以造孔的方式形成不同的平行光線穿透率。本案的第三實施例至第六實施例的平行光線穿透率分別為3.0%、6.05%、7.38%以及11.76%，而對應量測到的擴散光線穿透率分別為0.7%、0.63%、0.77%以及0.93%，經計算後，分別可得到霧度值為18.9%、9.43%、9.46%以及7.34%。本案的第三實施例至第六實施例之複合布均可達到清晰可視效果。
請參閱表3，為本案的第七實施例至第十實施例(第七實施例至第十實施例未示於圖式)的表層布及底層布係使用淺色梭織布，而遮光膜係使用碳黑改質PU奈米纖維膜，碳黑微粒重量佔整體遮光膜之重量的50wt%。
實施例 遮光膜材質 Tp (%) Td (%) 霧度值 (%)
第七   添加50wt%碳黑之 碳黑PU奈米纖維膜 2.85 0.67 19.0
第八 5.75 1.07 15.63
第九 7.29 1.07 12.77
第十 12.16 1.62 11.76
表3
請參閱表3，第七實施例至第十實施例係將表層布、遮光膜以及底層布三者貼合後，以造孔的方式形成不同的平行光線穿透率。第七實施例至第十實施例的平行光線穿透率分別為2.85%、5.75%、7.29%以及12.16%，而對應量測到的擴散光線穿透率分別為0.67%、1.07%、1.07%以及1.62%，經計算後，分別可得到霧度值為19.0%、15.63%、12.77%以及11.76%。第七實施例至第十實施例之複合布皆具有清晰可視效果。
請參閱表4及表5，比較例1至3以及第十一實施例至第十三實施例中的表層布及底層布係使用淺色梭織布，遮光膜係使用銫鎢PU膠膜。銫鎢PU膠膜所添加的銫鎢微粒係但不限定為氧化銫鎢 (CsxWO3)。
比較例 遮光膜材質 Tp (%) Td (%) 霧度值 (%)
1 無添加銫鎢之 銫鎢PU膠膜 4.71 11.8 71
2 添加5wt%銫鎢之 銫鎢PU膠膜 4.68 2.8 37
3 添加10wt%銫鎢之 銫鎢PU膠膜 4.65 2.3 33
表4
實施例 遮光膜材質 Tp (%) Td (%) 霧度值 (%)
第十一 添加20wt%銫鎢之 銫鎢PU膠膜 4.63 1.9 29
第十二 添加30wt%銫鎢之 銫鎢PU膠膜 4.61 1.5 25
第十三 添加50wt%銫鎢之 銫鎢PU膠膜 4.60 0.82 15
表5
請參閱表4，比較例1至比較例3係將表層布、遮光膜以及底層布三者貼合後，以造孔的方式形成近似的平行光線穿透率。比較例1至比較例3的遮光膜分別添加不同的重量百分濃度的銫鎢微粒，分別為 0 wt% (無添加)、5 wt%以及 10 wt%。比較例1至比較例3的平行光線穿透率分別為4.71%、4.68%以及4.65%，而對應量測到的擴散光線穿透率分別為11.8%、2.8%以及2.3%，經計算後，分別可得到霧度值為71%、37%以及33%。比較例1至比較例3之複合布皆無清晰可視效果。
請參閱表5，本案的第十一實施例至第十三實施例係將表層布、遮光膜以及底層布三者貼合後，以造孔的方式形成近似的平行光線穿透率。第十一實施例至第十三實施例的遮光膜分別添加不同的重量百分濃度的銫鎢微粒，分別為20 wt%、30 wt%以及 50 wt%。第十一實施例至第十三實施例的平行光線穿透率分別為4.63%、4.61%以及4.60%，而對應量測到的擴散光線穿透率分別為1.9%、1.5%以及0.82%，經計算後，分別可得到霧度值為29%、25%以及15%。本案的第十一實施例至第十三實施例之複合布具有清晰可視效果。
請參照表4及表5，雖然比較例1至3的平行光線穿透率係近似於本案的第十一實施例至第十三實施例，但比較例1至3由於所添加的銫鎢微粒的重量百分濃度較低，影響擴散光線穿透率以及霧度值。若遮光層中所添加的遮蔽光微粒的重量百分濃度不足，即小於20wt%，則會造成複合布皆無清晰可視效果。本案之實施例的遮光膜所添加的遮蔽光微粒的重量百分濃度係在20wt%以上且在60wt%以下，以能達成清晰可視效果。
請參照表6，比較例4、5以及本案的第十四實施例中的表層布及底層布係使用淺色梭織布，遮光膜係分別使用二氧化鈦改質PU膠膜、透明PU膠膜以及添加碳黑微粒之碳黑PU奈米纖維膜(重量百分濃度50 wt%)。表6中三個態樣雖具有相同的平行光線穿透率(皆為4.5%)，但由於選用的遮光膜不同，而造成不同的清晰效果。比較例4、5在相同的平行光線穿透率下，會產生較高的霧度值，而導致無清晰可視效果；本案的實施例在遮光膜添加遮蔽光微粒(本案的第十四實施例係添加碳黑微粒)，在相同的平行光線穿透率下，則會有較低的霧度值，使得使用者透過本案的複合布可得到清晰可視的效果。
  遮光膜材質 Tp (%) Td (%) 霧度值 (%)
比較例4 光觸媒(TiO2 )改質PU膠膜 4.5 9.3 67.4
比較例5 透明PU膠膜 4.5 11.8 72.4
第十四實施例 碳黑PU奈米纖維膜 4.5 0.8 15.1
表6
本案另提出一種遮光奈米纖維膜，其係含有遮蔽光微粒或粉體膜。在一實施例中，遮光膜2的材質為聚胺酯或是熱塑性聚酯彈性體。在一實施例中，遮蔽光微粒或粉體係使用可見光(波長範圍在380-780nm之間)反射率及近紅外光(波長範圍在780-2100nm之間)反射率皆須小於5%的材料(在粉體錠片穿透率>0.5%的情形下)，此係透過VIS-NIR積分球光譜儀進行反射光測試後得知。因此，本案之遮光奈米纖維膜為添加碳黑微粒或粉體之碳黑改質遮光膜、添加銫鎢微粒或粉體之銫鎢改質遮光膜、添加奈米碳管微粒或粉體之奈米碳管改質遮光膜、添加石墨烯微粒或粉體之石墨烯改質遮光膜、添加焦炭微粒或粉體之焦炭改質遮光膜以及添加碳化鋯微粒或粉體之碳化鋯改質遮光膜中之任一者。
遮光奈米纖維膜中所含的遮蔽光微粒或粉體之重量係佔整體遮光奈米纖維膜之重量之20wt%~60wt%，以能保持遮光奈米纖維膜擁有遮光效果，其中wt%代表重量(weight, wt)百分濃度。在一實施例中，遮光膜2的厚度係為1 µm以上且在80 µm以下。
請參照表7，第十五實施例及第十六實施例分別係添加60wt%以及30wt%碳黑微粒或粉體之碳黑聚氨酯（Polyurethane，PU）奈米纖維膜。經測試後，可以分別得到小於1.0%以及小於6.0%之擴散光線穿透率。
實施例 遮光膜材質 Td (%)
十五 添加60wt%碳黑之 碳黑PU奈米纖維膜 >1.0
十六 添加30wt%碳黑之 碳黑PU奈米纖維膜 >6.0
表7
請參表8，第十七實施例及第十八實施例分別係添加50wt%以及20wt%銫鎢微粒或粉體之銫鎢聚氨酯（Polyurethane，PU）奈米纖維膜。經測試後，可以分別得到小於24.5%以及小於29.2%之擴散光線穿透率。
實施例 遮光膜材質 Td (%)
十七 添加50wt%銫鎢之 銫鎢PU奈米纖維膜 >24.5
十八 添加20wt%銫鎢之 銫鎢PU奈米纖維膜 >29.2  
表8
由表7及表8可以得知，添加重量百分比愈大的碳黑或銫鎢微粒或粉體之奈米纖維膜，可以得到較佳的遮光效果；而添加碳黑的遮蔽效果會比添加銫鎢的遮蔽效果好，但此兩種微粒或粉體皆可使用在本案的複合布中。
本案之具有孔洞之複合布由於遮光膜、表層布及底層布中之至少一者具有孔洞，另藉由在遮光膜中加入含有遮蔽光微粒或粉體，以及限定平行光線穿透率的範圍，更能同時達到透光及遮光的效果，所以能透過本案之具有孔洞之複合布，可以清晰地看到複合布後方之景色。
雖然本案已以實施例揭露如上，然其並非用以限定本案，任何所屬技術領域中具有通常知識者，在不脫離本案之精神和範圍內，當可作些許之更動與潤飾，故本案之保護範圍當視後附之申請專利範圍所界定者為準。
A:具孔洞之複合布 1:表層布 2:遮光膜 3:底層布 4:孔洞 5:黏膠
為讓本案的上述特徵能更明顯易懂，下文特舉實施例，並配合所附圖式作詳細說明如下。
第1圖為本案之具有孔洞之複合布示意圖。
第2圖為第1圖之具有孔洞之複合布之剖面圖。
第3A圖及第3B圖分別為本案第一實施例及第二實施例之具有孔洞之複合布之示意圖。
A:具孔洞之複合布
1:表層布
2:遮光膜
3:底層布
4:孔洞

Claims (15)

  1. 一種具有孔洞之複合布，該複合布至少包含： 一表層布； 一遮光膜，該遮光膜係含有遮蔽光之微粒或粉體；以及 一底層布， 其中該表層布及該底層布分別配置於該遮光膜之兩側， 其中該表層布、該底層布與該遮光膜中至少一者具有複數個孔洞， 其中該複合布之總光線穿透率係小於30%。
  2. 如申請專利範圍第1項所述的具有孔洞之複合布，其中該遮光膜為膠膜或是奈米纖維膜。
  3. 如申請專利範圍第2項所述的具有孔洞之複合布，其該遮光膜的材質為聚胺酯或熱塑性聚酯彈性體。
  4. 如申請專利範圍第1項所述的具有孔洞之複合布，其中該遮蔽光微粒或粉體之重量佔該遮光膜之重量的20wt%~60wt%。
  5. 如申請專利範圍第1項所述的具有孔洞之複合布，其中該遮光膜係為添加碳黑微粒或粉體之碳黑改質遮光膜、添加銫鎢微粒或粉體之銫鎢改質遮光膜、添加奈米碳管微粒或粉體之奈米碳管改質遮光膜、添加石墨烯微粒或粉體之石墨烯改質遮光膜、添加焦炭微粒或粉體之焦炭改質遮光膜以及添加碳化鋯微粒或粉體之碳化鋯改質遮光膜之任一者。
  6. 如申請專利範圍第1項所述的具有孔洞之複合布，其中該表層布及該底層布為織布或不織布。
  7. 如申請專利範圍第1項所述的具有孔洞之複合布，其中該遮光膜係藉由黏膠，以分別與該表層布及該底層布貼合。
  8. 如申請專利範圍第1項所述的具有孔洞之複合布，其中該遮光膜係藉由熱壓與該表層布及該底層布貼合。
  9. 如申請專利範圍第1項所述的具有孔洞之複合布，其中該複數個孔洞之總面積為該複合布面積之至少0.25%。
  10. 如申請專利範圍第1項所述的具有孔洞之複合布，其中該複合布之霧度值係小於33%。
  11. 如申請專利範圍第1項所述的具有孔洞之複合布，其中該遮光膜之厚度係在1µm以上且在80µm以下。
  12. 一種遮光奈米纖維膜，其材質為聚胺酯或是熱塑性聚酯彈性體，其中，該遮光奈米纖維膜含有遮蔽光微粒或粉體，該遮蔽光微粒或粉體之重量佔整體遮光奈米纖維膜重量的20wt%~60wt %。
  13. 如申請專利範圍第12項所述之遮光奈米纖維膜，其中該遮光奈米纖維膜之總光線穿透率小於30 % 。
  14. 如申請專利範圍第12項所述之遮光奈米纖維膜，其中該遮光奈米纖維膜係為添加碳黑微粒或粉體之碳黑改質遮光膜、添加銫鎢微粒或粉體之銫鎢改質遮光膜、添加奈米碳管微粒或粉體之奈米碳管改質遮光膜、添加石墨烯微粒或粉體之石墨烯改質遮光膜、添加焦炭微粒或粉體之焦炭改質遮光膜以及添加碳化鋯微粒或粉體之碳化鋯改質遮光膜。
  15. 如申請專利範圍第14項所述之遮光奈米纖維膜，該遮光奈米纖維膜之厚度係在1µm以上且在80µm以下。
TW108148454A 2019-03-27 2019-12-30 具有孔洞以及遮光膜之複合布 TWI731536B (zh)

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Citations (2)

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US4687692A (en) * 1985-04-15 1987-08-18 Fuji Photo Film Co., Ltd. Packaging material for photosensitive materials
JP2008271828A (ja) * 2007-04-27 2008-11-13 Yupo Corp 農業用光反射シート

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CN1531570A (zh) * 2000-12-08 2004-09-22 Sa 电磁能适应材料
US7666562B2 (en) * 2006-02-23 2010-02-23 Lexmark International, Inc. Image forming media containing reflecting pigment

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4687692A (en) * 1985-04-15 1987-08-18 Fuji Photo Film Co., Ltd. Packaging material for photosensitive materials
JP2008271828A (ja) * 2007-04-27 2008-11-13 Yupo Corp 農業用光反射シート

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