TWI727900B - Display panel - Google Patents

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TWI727900B
TWI727900B TW109134627A TW109134627A TWI727900B TW I727900 B TWI727900 B TW I727900B TW 109134627 A TW109134627 A TW 109134627A TW 109134627 A TW109134627 A TW 109134627A TW I727900 B TWI727900 B TW I727900B
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isolation portion
layer
display area
encapsulation layer
electrode
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TW109134627A
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TW202215614A (en
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張崇綸
黃名宏
王錚亮
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友達光電股份有限公司
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Priority to CN202110251108.8A priority patent/CN113035887B/en
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1218Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or structure of the substrate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/844Encapsulations

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The display panel has a display region and a non-display region surrounding the display region. The display panel includes an array substrate, a first electrode, a pixel defining layer, a light emitting layer, a first isolation portion and at least one second isolation portion. The first electrode is on the array substrate and is on the display region. The pixel defining layer is on the first electrode. The pixel defining layer has an opening overlapping the first electrode. The light emitting layer is in the opening. The first isolation portion is on the array substrate and is on the non-display region. The second isolation portion is on the first isolation portion. The second isolation portion has a shape having wide top and narrow bottom. The second isolation portion has a maximum width smaller than a width of the first isolation portion.

Description

顯示面板Display panel

本發明是有關於一種顯示面板。The present invention relates to a display panel.

有機發光二極體(organic light emitting diode;OLED)顯示面板因為具有高色彩飽和度、應答速度快及高對比的性能展現,受到了廣泛的應用。為了避免有機發光二極體受到環境中的水氣和氧氣所影響,會對其進行封裝。封裝包括在其上方覆蓋有機層,並會採用雙堤防(dam)來防止此有機層溢流到外面。然而,雙堤防侷限了顯示面板的邊框大小,使得邊框無法向內縮減。若欲將雙堤防變為單堤防,又會遇到有機層溢流的問題。因此,如何在避免有機層溢流下,並縮減邊框實為相關領域的開發重點。Organic light emitting diode (OLED) display panels are widely used because of their high color saturation, fast response speed and high contrast performance. In order to prevent the organic light emitting diode from being affected by moisture and oxygen in the environment, it will be encapsulated. The encapsulation includes covering an organic layer on top of it, and double dams will be used to prevent this organic layer from overflowing to the outside. However, the double embankment limits the size of the frame of the display panel, so that the frame cannot be reduced inward. If you want to change the double dike into a single dike, you will encounter the problem of organic layer overflow. Therefore, how to avoid overflow of the organic layer and reduce the frame is the focus of development in related fields.

本發明提供一種顯示面板,可防止有機層溢流(overflow)。The present invention provides a display panel, which can prevent overflow of the organic layer.

本發明的顯示面板具有顯示區及環繞顯示區的非顯示區。顯示面板包括陣列基板、第一電極、畫素定義層、發光層、第一隔離部及至少一第二隔離部。第一電極位於陣列基板上且位於顯示區。畫素定義層位於第一電極上,畫素定義層具有和第一電極重疊的開口。發光層位於開口內。第一隔離部位於陣列基板上且位於非顯示區。第二隔離部位於第一隔離部上,第二隔離部的形狀為上寬下窄,且第二隔離部的最大寬度小於第一隔離部的寬度。The display panel of the present invention has a display area and a non-display area surrounding the display area. The display panel includes an array substrate, a first electrode, a pixel definition layer, a light-emitting layer, a first isolation portion, and at least one second isolation portion. The first electrode is located on the array substrate and located in the display area. The pixel defining layer is located on the first electrode, and the pixel defining layer has an opening overlapping the first electrode. The light-emitting layer is located in the opening. The first isolation part is located on the array substrate and in the non-display area. The second isolation portion is located on the first isolation portion, the shape of the second isolation portion is wide at the top and narrow at the bottom, and the maximum width of the second isolation portion is smaller than the width of the first isolation portion.

本發明的顯示面板具有顯示區及環繞顯示區的非顯示區。顯示面板包括陣列基板、第一電極、畫素定義層、發光層、第一隔離部及無機封裝層。第一電極位於陣列基板上且位於顯示區。畫素定義層位於第一電極上,畫素定義層具有和第一電極重疊的開口。發光層位於開口內。第一隔離部位於陣列基板上且位於非顯示區。無機封裝層自第一隔離部的側面延伸至第一隔離部的頂面,無機封裝層具有重疊於第一隔離部的頂面的至少一開口。The display panel of the present invention has a display area and a non-display area surrounding the display area. The display panel includes an array substrate, a first electrode, a pixel definition layer, a light-emitting layer, a first isolation part, and an inorganic encapsulation layer. The first electrode is located on the array substrate and located in the display area. The pixel defining layer is located on the first electrode, and the pixel defining layer has an opening overlapping the first electrode. The light-emitting layer is located in the opening. The first isolation part is located on the array substrate and in the non-display area. The inorganic encapsulation layer extends from the side surface of the first isolation portion to the top surface of the first isolation portion, and the inorganic encapsulation layer has at least one opening overlapping the top surface of the first isolation portion.

本發明的顯示面板具有顯示區及環繞顯示區的一非顯示區。顯示面板包括陣列基板、第一電極、畫素定義層、發光層、第一隔離部及至少一第二隔離部。第一電極位於陣列基板上且位於顯示區。畫素定義層位於第一電極上,畫素定義層具有和第一電極重疊的開口。發光層位於開口內。第一隔離部位於陣列基板上且位於非顯示區。第二隔離部位於第一隔離部上,第二隔離部的最大寬度和第一隔離部的寬度的比值為0.1至0.95,且第二隔離部的上表面具有波浪形狀。The display panel of the present invention has a display area and a non-display area surrounding the display area. The display panel includes an array substrate, a first electrode, a pixel definition layer, a light-emitting layer, a first isolation portion, and at least one second isolation portion. The first electrode is located on the array substrate and located in the display area. The pixel defining layer is located on the first electrode, and the pixel defining layer has an opening overlapping the first electrode. The light-emitting layer is located in the opening. The first isolation part is located on the array substrate and in the non-display area. The second isolation portion is located on the first isolation portion, the ratio of the maximum width of the second isolation portion to the width of the first isolation portion is 0.1 to 0.95, and the upper surface of the second isolation portion has a wave shape.

基於上述,在本發明一實施例的顯示面板中,顯示面板包括第一隔離部及第二隔離部,第一隔離部位於陣列基板上且位於非顯示區。第二隔離部位於第一隔離部上。第二隔離部的形狀為上寬下窄,且第二隔離部的最大寬度小於第一隔離部的寬度,可避免有機封裝層因為毛細現象而溢流(overflow)出第一隔離部和第二隔離部,提升側向封裝的可靠度。Based on the foregoing, in the display panel of an embodiment of the present invention, the display panel includes a first isolation portion and a second isolation portion, and the first isolation portion is located on the array substrate and located in the non-display area. The second isolation part is located on the first isolation part. The shape of the second isolation part is wide at the top and narrow at the bottom, and the maximum width of the second isolation part is smaller than the width of the first isolation part, which can prevent the organic encapsulation layer from overflowing out of the first isolation part and the second isolation part due to capillary phenomenon. The isolation part improves the reliability of the lateral packaging.

在本發明另一實施例的顯示面板中,無機封裝層自第一隔離部的側面延伸至第一隔離部的頂面,無機封裝層具有重疊於第一隔離部的頂面的至少一開口。開口如水溝般可以將有機封裝層局限於開口中,可避免有機封裝層因為毛細現象而溢流(overflow)出第一隔離部和第二隔離部,提升側向封裝的可靠度。In a display panel according to another embodiment of the present invention, the inorganic encapsulation layer extends from the side surface of the first isolation portion to the top surface of the first isolation portion, and the inorganic encapsulation layer has at least one opening overlapping the top surface of the first isolation portion. The opening can confine the organic encapsulation layer to the opening like a gutter, which can prevent the organic encapsulation layer from overflowing out of the first isolation portion and the second isolation portion due to the capillary phenomenon, thereby improving the reliability of the lateral packaging.

在本發明另一實施例的顯示面板中,第二隔離部的最大寬度和第一隔離部的比值為0.1至0.95,且第二隔離部的上表面具有波浪形狀,可避免有機封裝層因為毛細現象而溢流(overflow)出第一隔離部和第二隔離部,提升側向封裝的可靠度。In another embodiment of the display panel of the present invention, the ratio of the maximum width of the second isolation portion to the first isolation portion is 0.1 to 0.95, and the upper surface of the second isolation portion has a wavy shape, which can prevent the organic encapsulation layer from being capillary. This phenomenon overflows out of the first isolation part and the second isolation part, which improves the reliability of the lateral packaging.

第1圖是依照本發明一實施例的顯示面板10的俯視示意圖,第2圖是沿著第1圖的剖線I-I’的剖面示意圖。請一併參照第1圖及第2圖,顯示面板10具有顯示區AA及環繞顯示區AA的非顯示區NA。陣列基板100包括基板102及設置於基板102上的畫素陣列104,畫素陣列104配置於顯示區AA。在本實施例中,基板102例如是可撓性基板,例如聚合物基板或塑膠基板。舉例而言,基板102的材質為聚醯亞胺(polyimide;PI)。FIG. 1 is a schematic top view of a display panel 10 according to an embodiment of the present invention, and FIG. 2 is a schematic cross-sectional view taken along the section line I-I' of FIG. Please refer to FIG. 1 and FIG. 2 together, the display panel 10 has a display area AA and a non-display area NA surrounding the display area AA. The array substrate 100 includes a substrate 102 and a pixel array 104 disposed on the substrate 102, and the pixel array 104 is disposed in the display area AA. In this embodiment, the substrate 102 is, for example, a flexible substrate, such as a polymer substrate or a plastic substrate. For example, the material of the substrate 102 is polyimide (PI).

畫素陣列104包括多個畫素PX。為了方便說明,第1圖中繪示了第一方向D1與第二方向D2,且第一方向D1與第二方向D2相異,例如第一方向D1與第二方向D2分別為第1圖的橫向方向與縱向方向,且其彼此呈正交關係。各畫素PX沿著第一方向D1及第二方向D2排列。各畫素PX可包括主動元件T1。主動元件T1配置於基板102上,且具有閘極G、源極S、汲極D以及半導體圖案SC。陣列基板100還可包括緩衝層105、閘絕緣層106、層間絕緣層108及平坦層112。閘絕緣層106配置於半導體圖案SC及閘極G之間。舉例而言,主動元件T1的閘極G可選擇性地配置於半導體圖案SC的上方,以形成頂部閘極型薄膜電晶體(top gate TFT),但本發明不以此為限。根據其他的實施例,主動元件T1的閘極G也可配置在半導體圖案SC的下方,即閘極G位於半導體圖案SC與基板102之間,以形成底部閘極型薄膜電晶體(bottom gate TFT)。The pixel array 104 includes a plurality of pixels PX. For the convenience of description, the first direction D1 and the second direction D2 are shown in Fig. 1, and the first direction D1 and the second direction D2 are different. For example, the first direction D1 and the second direction D2 are as shown in Fig. 1 respectively. The transverse direction and the longitudinal direction are orthogonal to each other. The pixels PX are arranged along the first direction D1 and the second direction D2. Each pixel PX may include an active element T1. The active device T1 is disposed on the substrate 102 and has a gate G, a source S, a drain D, and a semiconductor pattern SC. The array substrate 100 may further include a buffer layer 105, a gate insulating layer 106, an interlayer insulating layer 108, and a flat layer 112. The gate insulating layer 106 is disposed between the semiconductor pattern SC and the gate electrode G. For example, the gate G of the active device T1 can be selectively disposed above the semiconductor pattern SC to form a top gate TFT, but the invention is not limited to this. According to other embodiments, the gate G of the active device T1 can also be arranged under the semiconductor pattern SC, that is, the gate G is located between the semiconductor pattern SC and the substrate 102 to form a bottom gate TFT (bottom gate TFT). ).

緩衝層105設置於基板102與主動元件T1之間。緩衝層105的材質例如是氮化矽(SiN)或氧化矽(SiO)。舉例而言,緩衝層105例如是由下至上為氮化矽、氧化矽、氮化矽及氧化矽的疊層結構。The buffer layer 105 is disposed between the substrate 102 and the active device T1. The material of the buffer layer 105 is, for example, silicon nitride (SiN) or silicon oxide (SiO). For example, the buffer layer 105 is a stacked structure of silicon nitride, silicon oxide, silicon nitride, and silicon oxide from bottom to top.

在本實施例中,半導體圖案SC可包括源極區SR、通道區CH以及汲極區DR。於其他實施例中,半導體圖案SC還可包括位於源極區SR及通道區CH之間的輕摻雜源極區(未示)以及位於汲極區DR與通道區CH之間的輕摻雜汲極區(未示)。且閘極G重疊於半導體圖案SC的通道區CH,但本發明不以此為限。根據其他的實施例,半導體圖案SC可僅包括源極區SR、通道區CH及汲極區DR。In this embodiment, the semiconductor pattern SC may include a source region SR, a channel region CH, and a drain region DR. In other embodiments, the semiconductor pattern SC may further include a lightly doped source region (not shown) between the source region SR and the channel region CH, and a lightly doped source region (not shown) between the drain region DR and the channel region CH Drain region (not shown). In addition, the gate electrode G overlaps the channel region CH of the semiconductor pattern SC, but the invention is not limited to this. According to other embodiments, the semiconductor pattern SC may only include the source region SR, the channel region CH, and the drain region DR.

層間絕緣層108配置於閘絕緣層106上,且覆蓋主動元件T1的閘極G。主動元件T1的源極S與汲極D配置於層間絕緣層108上,且分別重疊於半導體圖案SC的源極區SR及汲極區DR。舉例而言,主動元件T1的源極S與汲極D都貫穿層間絕緣層108以及閘絕緣層106,以分別電性連接半導體圖案SC的源極區SR及汲極區DR。The interlayer insulating layer 108 is disposed on the gate insulating layer 106 and covers the gate G of the active device T1. The source S and the drain D of the active device T1 are disposed on the interlayer insulating layer 108, and overlap the source region SR and the drain region DR of the semiconductor pattern SC, respectively. For example, the source S and the drain D of the active device T1 both penetrate the interlayer insulating layer 108 and the gate insulating layer 106 to respectively electrically connect the source region SR and the drain region DR of the semiconductor pattern SC.

在本實施例中,半導體圖案SC的材質例如是低溫多晶矽(low temperature poly silicon;LTPS)半導體,也就是說,主動元件T1可以是低溫多晶矽薄膜電晶體。然而,本發明不限於此,於其他實施例中,主動元件T1也可以是非晶矽薄膜電晶體(amorphous silicon TFT,a-Si TFT)、微晶矽薄膜電晶體(micro Si TFT)或金屬氧化物電晶體(metal oxide transistor)。In this embodiment, the material of the semiconductor pattern SC is, for example, a low temperature poly silicon (LTPS) semiconductor, that is, the active device T1 may be a low temperature poly silicon thin film transistor. However, the present invention is not limited to this. In other embodiments, the active device T1 may also be an amorphous silicon TFT (a-Si TFT), a micro Si TFT, or a metal oxide. Metal oxide transistor.

平坦層112覆蓋主動元件T1的源極S、汲極D以及層間絕緣層108的部分表面,並可選擇性地具有重疊於主動元件T1之汲極D的開口。平坦層112覆蓋層間絕緣層108與汲極D的部分表面。平坦層112的材料包括無機材料(例如:氧化矽、氮化矽、氮氧化矽、其它合適的材料或上述至少二種材料的堆疊 層)、有機材料(例如:聚酯類(PET)、聚烯類、聚丙醯類、聚碳酸酯類、聚環氧烷類、聚苯烯類、聚醚類、聚酮類、聚醇類、聚醛類、其它合適的材料或上述之組合)、其它合適的材料或上述之組合。The flat layer 112 covers the source S, the drain D of the active device T1 and part of the surface of the interlayer insulating layer 108, and may optionally have an opening overlapping the drain D of the active device T1. The flat layer 112 covers part of the surface of the interlayer insulating layer 108 and the drain electrode D. The material of the flat layer 112 includes inorganic materials (for example: silicon oxide, silicon nitride, silicon oxynitride, other suitable materials or stacked layers of at least two of the above), organic materials (for example: polyester (PET), poly Alkenes, polypropylenes, polycarbonates, polyalkylene oxides, polyphenylenes, polyethers, polyketones, polyols, polyaldehydes, other suitable materials or combinations of the above), others Suitable materials or a combination of the above.

顯示面板10還包括第一電極E1、畫素定義層114及發光層116。第一電極E1位於陣列基板100上且位於顯示區AA。畫素定義層114位於平坦層112上,換言之,平坦層112配置於基板102及畫素定義層114之間。畫素定義層114具有和第一電極E1重疊的開口,發光層116位於開口內。顯示面板10還包括電洞傳輸層(hole transfer layer,HTL)118、電子傳輸層(electron transfer layer,ETL)120及第二電極E2。第一電極E1、電洞傳輸層118、發光層116、電子傳輸層120及第二電極E2依序堆疊於平坦層112上並共同構成發光單元122。The display panel 10 further includes a first electrode E1, a pixel definition layer 114, and a light-emitting layer 116. The first electrode E1 is located on the array substrate 100 and located in the display area AA. The pixel definition layer 114 is located on the flat layer 112, in other words, the flat layer 112 is disposed between the substrate 102 and the pixel definition layer 114. The pixel definition layer 114 has an opening overlapping the first electrode E1, and the light-emitting layer 116 is located in the opening. The display panel 10 further includes a hole transfer layer (HTL) 118, an electron transfer layer (ETL) 120, and a second electrode E2. The first electrode E1, the hole transport layer 118, the light emitting layer 116, the electron transport layer 120, and the second electrode E2 are sequentially stacked on the flat layer 112 and collectively constitute the light emitting unit 122.

在本實施例中,第一電極E1可做為發光單元122的陽極(anode),第二電極E2可做為發光單元122的陰極(cathode),但本發明不以此為限。發光層116例如包括紅色發光層、藍色發光層及綠色發光層。In this embodiment, the first electrode E1 can be used as an anode of the light emitting unit 122, and the second electrode E2 can be used as a cathode of the light emitting unit 122, but the invention is not limited thereto. The light-emitting layer 116 includes, for example, a red light-emitting layer, a blue light-emitting layer, and a green light-emitting layer.

第一電極E1可對應地連接主動元件T1。第一電極E1貫穿平坦層112與主動元件T1的汲極D電性連接。於一些實施例中,第一電極E1例如是光穿透式電極,光穿透式電極的材質包括金屬氧化物,例如銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、或其它合適的氧化物、或者是上述至少兩者之堆疊層,但本發明並不以此為限。於其他實施例中,第一電極E1也可以是反射式電極,反射式電極的材質包括金屬、合金、或其他合適的材料、或是金屬材料與其他導電材料的堆疊層。The first electrode E1 can be connected to the active element T1 correspondingly. The first electrode E1 penetrates the flat layer 112 and is electrically connected to the drain D of the active device T1. In some embodiments, the first electrode E1 is, for example, a light-transmitting electrode, and the material of the light-transmitting electrode includes metal oxide, such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide , Or other suitable oxides, or a stacked layer of at least two of the above, but the present invention is not limited to this. In other embodiments, the first electrode E1 may also be a reflective electrode, and the material of the reflective electrode includes a metal, an alloy, or other suitable materials, or a stacked layer of a metal material and other conductive materials.

各發光單元122的電洞傳輸層118及發光層116例如是透過噴墨塗佈技術(Ink Jet Printing;IJP)形成於開口中。於本實施例中,第二電極E2例如是光穿透式電極,光穿透式電極的材質包括金屬氧化物,例如銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、或其它合適的氧化物、或者是上述至少兩者之堆疊層,但本發明並不以此為限。在其他實施例中,第二電極E2也可以是反射式電極,反射式電極的材質包括金屬、合金、或其他合適的材料、或是金屬材料與其他導電材料的堆疊層。The hole transport layer 118 and the light-emitting layer 116 of each light-emitting unit 122 are formed in the opening by, for example, ink jet printing (IJP). In this embodiment, the second electrode E2 is, for example, a light-transmitting electrode. The material of the light-transmitting electrode includes metal oxides, such as indium tin oxide, indium zinc oxide, aluminum tin oxide, and aluminum zinc oxide. , Or other suitable oxides, or a stacked layer of at least two of the above, but the present invention is not limited to this. In other embodiments, the second electrode E2 may also be a reflective electrode, and the material of the reflective electrode includes a metal, an alloy, or other suitable materials, or a stacked layer of a metal material and other conductive materials.

顯示面板10還可包括間隙物PS,間隙物PS設置於畫素定義層114及平坦層112上上,且配置用以支撐基板102。第二電極E2還覆蓋畫素定義層114的部分表面及間隙物PS。當顯示面板10被致能(enabled)時,第一電極E1與第二電極E2之間因分別具有高電位與接地電位而產生電流,致使發光單元122發出用以顯示畫面的影像光束。The display panel 10 may further include a spacer PS. The spacer PS is disposed on the pixel definition layer 114 and the flat layer 112 and configured to support the substrate 102. The second electrode E2 also covers part of the surface of the pixel definition layer 114 and the spacer PS. When the display panel 10 is enabled, a current is generated between the first electrode E1 and the second electrode E2 due to the high potential and the ground potential respectively, so that the light-emitting unit 122 emits an image beam for displaying images.

顯示面板10還包括封裝結構124。舉例而言,封裝結構124可以是薄膜封裝(thin film encapsulation;TFE)結構,且包括依序設置於陣列基板100上的第一無機封裝層126、有機封裝層128及第二無機封裝層130。第一無機封裝層126可以阻隔水氣和氧氣進入發光單元122和陣列基板100。第一無機封裝層126在基板102的垂直投影面積大於有機封裝層128在基板102的垂直投影的面積,且第二無機封裝層130在基板102的垂直投影面積大於有機封裝層128在基板102的垂直投影的面積,可避免側向的水氣自有機封裝層128入侵發光單元122。The display panel 10 also includes an encapsulation structure 124. For example, the encapsulation structure 124 may be a thin film encapsulation (TFE) structure, and includes a first inorganic encapsulation layer 126, an organic encapsulation layer 128, and a second inorganic encapsulation layer 130 sequentially disposed on the array substrate 100. The first inorganic encapsulation layer 126 can block moisture and oxygen from entering the light emitting unit 122 and the array substrate 100. The vertical projection area of the first inorganic encapsulation layer 126 on the substrate 102 is larger than the vertical projection area of the organic encapsulation layer 128 on the substrate 102, and the vertical projection area of the second inorganic encapsulation layer 130 on the substrate 102 is larger than that of the organic encapsulation layer 128 on the substrate 102. The area of the vertical projection can prevent lateral moisture from invading the light-emitting unit 122 from the organic encapsulation layer 128.

第一無機封裝層126及第二無機封裝層130的形成方式可以是化學氣相沉積(chemical vapor deposition;CVD),有機封裝層128的形成方式可以是噴墨印刷(ink jet printing;IJP)。於本實施例中,第一無機封裝層126的邊界(border)126a及第二無機封裝層130的邊界130a是透過蝕刻製程所定義,可使第一無機封裝層126的邊界126a及第二無機封裝層130的邊界130a往內縮減,換言之,可以大幅縮短第一無機封裝層126及第二無機封裝層130在顯示面板10的非顯示區NA的長度,使顯示面板10具有窄邊框,有利於使顯示面板10應用於可延展(stretchable)顯示面板。The first inorganic encapsulation layer 126 and the second inorganic encapsulation layer 130 may be formed by chemical vapor deposition (CVD), and the organic encapsulation layer 128 may be formed by ink jet printing (IJP). In this embodiment, the border 126a of the first inorganic encapsulation layer 126 and the border 130a of the second inorganic encapsulation layer 130 are defined by an etching process, so that the border 126a of the first inorganic encapsulation layer 126 and the second inorganic encapsulation layer 126 The boundary 130a of the encapsulation layer 130 is reduced inwardly. In other words, the length of the first inorganic encapsulation layer 126 and the second inorganic encapsulation layer 130 in the non-display area NA of the display panel 10 can be greatly shortened, so that the display panel 10 has a narrow frame, which is beneficial to The display panel 10 is applied to a stretchable display panel.

於本實施例中,顯示面板10還包括第一隔離部132及至少一第二隔離部134。第一隔離部132位於陣列基板100上且位於非顯示區NA。第二隔離部134位於第一隔離部132上。第一隔離部132可用於定義有機封裝層128的噴塗範圍。第一隔離部132和第一無機封裝層126的邊界126a及第二無機封裝層130的邊界130a的距離為1微米至1000微米。於一實施例中,第一隔離部132和第一無機封裝層126的邊界126a及第二無機封裝層130的邊界130a的距離為1微米至240微米。In this embodiment, the display panel 10 further includes a first isolation portion 132 and at least one second isolation portion 134. The first isolation portion 132 is located on the array substrate 100 and located in the non-display area NA. The second isolation portion 134 is located on the first isolation portion 132. The first isolation portion 132 may be used to define the spraying range of the organic encapsulation layer 128. The distance between the first isolation portion 132 and the boundary 126a of the first inorganic encapsulation layer 126 and the boundary 130a of the second inorganic encapsulation layer 130 is 1 micrometer to 1000 micrometers. In one embodiment, the distance between the boundary 126a of the first isolation portion 132 and the first inorganic encapsulation layer 126 and the boundary 130a of the second inorganic encapsulation layer 130 is 1 micrometer to 240 micrometers.

於本實施例中,第一隔離部132具有子部132A及位於子部132A上的子部132B,子部132A及子部132B的材料包括正型光阻。舉例而言,子部132A和畫素定義層114可為同一膜層,換言之,子部132A和畫素定義層114具有相同厚度及相同材料。子部132B和間隙物PS可為同一膜層,換言之,子部132B和間隙物PS具有相同厚度及相同材料。於本實施例中,第一隔離部132和第二隔離部134的材料不同。In this embodiment, the first isolation portion 132 has a sub-portion 132A and a sub-portion 132B located on the sub-portion 132A, and the material of the sub-portion 132A and the sub-portion 132B includes a positive photoresist. For example, the sub-portion 132A and the pixel definition layer 114 may be the same film layer, in other words, the sub-portion 132A and the pixel definition layer 114 have the same thickness and the same material. The sub-part 132B and the spacer PS may be the same film layer, in other words, the sub-part 132B and the spacer PS have the same thickness and the same material. In this embodiment, the materials of the first isolation portion 132 and the second isolation portion 134 are different.

由於第一無機封裝層126的邊界126a及第二無機封裝層130的邊界130a往內縮減,使得邊界126a及邊界130a和有機封裝層128之間的距離縮短。於本實施例中,第二隔離部134的形狀為上寬下窄,且第二隔離部134的最大寬度134w1小於第一隔離部的寬度132w,藉由有機封裝層128跨過障礙體(即第一隔離部132及第二隔離部134)之位能增加去抵銷有機封裝層128與第一無機封裝層126之內聚力,可避免有機封裝層128因為毛細現象而溢流(overflow)出第一隔離部132和第二隔離部134,提升側向封裝的可靠度。舉例而言,第二隔離部134的最大寬度134w1為10微米至100微米。第一隔離部132的寬度132w為10微米至100微米,舉例而言,寬度132w為50微米。第二隔離部134的最大寬度134w1和第二隔離部134的最小寬度134w2的比值為1.1至2。As the boundary 126a of the first inorganic encapsulation layer 126 and the boundary 130a of the second inorganic encapsulation layer 130 shrink inward, the distance between the boundary 126a and the boundary 130a and the organic encapsulation layer 128 is shortened. In this embodiment, the shape of the second isolation portion 134 is wide at the top and narrow at the bottom, and the maximum width 134w1 of the second isolation portion 134 is smaller than the width 132w of the first isolation portion. The organic encapsulation layer 128 spans the obstacle (ie The position of the first isolation portion 132 and the second isolation portion 134) can be increased to offset the cohesion of the organic encapsulation layer 128 and the first inorganic encapsulation layer 126, which can prevent the organic encapsulation layer 128 from overflowing due to capillary phenomena. An isolation portion 132 and a second isolation portion 134 improve the reliability of the lateral packaging. For example, the maximum width 134w1 of the second isolation portion 134 is 10 micrometers to 100 micrometers. The width 132w of the first isolation portion 132 is 10 micrometers to 100 micrometers, for example, the width 132w is 50 micrometers. The ratio of the maximum width 134w1 of the second isolation portion 134 to the minimum width 134w2 of the second isolation portion 134 is 1.1 to 2.

第一無機封裝層126的材料包括無機材料,例如氧化矽、氮化矽、氮氧化矽、其它合適的材料或上述至少二種材料的堆疊層。The material of the first inorganic encapsulation layer 126 includes inorganic materials, such as silicon oxide, silicon nitride, silicon oxynitride, other suitable materials, or a stacked layer of at least two of the foregoing materials.

有機封裝層128的材料包括有機材料,例如聚酯類(PET)、聚烯類、聚丙醯類、聚碳酸酯類、聚環氧烷類、聚苯烯類、聚醚類、聚酮類、聚醇類、聚醛類、其它合適的材料或上述之組合。The material of the organic encapsulation layer 128 includes organic materials, such as polyesters (PET), polyolefins, polypropylenes, polycarbonates, polyalkylene oxides, polyphenylenes, polyethers, polyketones, Polyols, polyaldehydes, other suitable materials or a combination of the above.

第二隔離部134的剖面形狀呈煙囪狀,換言之,第二隔離部134的寬度由下往上先呈定值(例如最小寬度134w2)再逐漸變大再呈定值(例如最大寬度134w1)。這樣的多重障礙的設計可以有效阻隔毛細現象的發生。The cross-sectional shape of the second isolation portion 134 is chimney-shaped. In other words, the width of the second isolation portion 134 first assumes a constant value (for example, the minimum width 134w2) from bottom to top, then gradually increases and then assumes a constant value (for example, the maximum width 134w1). Such a multi-barrier design can effectively block the occurrence of capillary phenomena.

於本實施例中,畫素定義層114、間隙物PS及第一隔離部132的材料包括正型光阻,第二隔離部134的材料包括負型光阻。舉例而言,第二隔離部134例如是透過整面地沉積負型光阻材料,再透過曝光顯影所形成的,使得第二隔離部134的形狀可藉由曝光時間所控制。於本實施例中,第二隔離部134的數量為單個。In this embodiment, the material of the pixel definition layer 114, the spacer PS, and the first isolation portion 132 includes a positive photoresist, and the material of the second isolation portion 134 includes a negative photoresist. For example, the second isolation portion 134 is formed by depositing a negative photoresist material on the entire surface, and then through exposure and development, so that the shape of the second isolation portion 134 can be controlled by the exposure time. In this embodiment, the number of the second isolation portion 134 is single.

第3圖及第4圖是依照本發明一實施例的第一隔離部132及第二隔離部134的其他態樣的剖面示意圖,請先參照第3圖,第二隔離部134的數量為多個,舉例而言,第3圖中繪示第二隔離部134的數量為二個,相鄰的兩個第二隔離部134之間形成溝槽136,溝槽136有如蓄水池般可以將有機封裝層128局限於溝槽136中,可避免有機封裝層128因為毛細現象而溢流(overflow)出第一隔離部132和第二隔離部134,提升側向封裝的可靠度。於其他實施例中,第二隔離部134的數量為三個(見第4圖)。然而本發明不限於此,於其他實施例中,第二隔離部134的數量可大於三個。FIGS. 3 and 4 are schematic cross-sectional views of other aspects of the first isolation portion 132 and the second isolation portion 134 according to an embodiment of the present invention. Please refer to FIG. 3 first, the number of the second isolation portions 134 is large For example, in Figure 3, the number of second isolation portions 134 is two. A trench 136 is formed between two adjacent second isolation portions 134. The trench 136 is like a reservoir. The organic encapsulation layer 128 is confined in the trench 136, which can prevent the organic encapsulation layer 128 from overflowing out of the first isolation portion 132 and the second isolation portion 134 due to capillary phenomena, thereby improving the reliability of the lateral packaging. In other embodiments, the number of the second isolation portion 134 is three (see FIG. 4). However, the present invention is not limited to this. In other embodiments, the number of the second isolation portion 134 may be greater than three.

於本實施例中,溝槽136的寬度由下往上自定值(例如最大寬度136w1)而逐漸變小再變為定值(例如最小寬度136w2)。In this embodiment, the width of the trench 136 is set from bottom to top (for example, the maximum width 136w1), gradually becomes smaller and then becomes a fixed value (for example, the minimum width 136w2).

如前所述,第二隔離部134可透過曝光顯影所形成,第二隔離部134的形狀可藉由曝光時間所控制,如此一來,可使得第二隔離部134具有其他形狀。As mentioned above, the second isolation portion 134 can be formed through exposure and development, and the shape of the second isolation portion 134 can be controlled by the exposure time. In this way, the second isolation portion 134 can have other shapes.

第5圖是依照本發明另一實施例的顯示面板10a的剖面示意圖,請參照第5圖,第二隔離部134的剖面形狀呈倒梯形,換言之,第二隔離部134的寬度由下往上逐漸變大,即第二隔離部134的寬度由下往上自最小寬度134w2變為最大寬度134w1。於本實施例中,第二隔離部134的數量為單個。FIG. 5 is a schematic cross-sectional view of a display panel 10a according to another embodiment of the present invention. Please refer to FIG. 5. The cross-sectional shape of the second isolation portion 134 is an inverted trapezoid. In other words, the width of the second isolation portion 134 is from bottom to top It gradually becomes larger, that is, the width of the second isolation portion 134 changes from the minimum width 134w2 to the maximum width 134w1 from bottom to top. In this embodiment, the number of the second isolation portion 134 is single.

第6圖及第7圖是依照本發明一實施例的第一隔離部132及第二隔離部134的其他態樣的剖面示意圖,請先參照第6圖,第二隔離部134的數量為多個,舉例而言,第6圖中繪示第二隔離部134的數量為二個,相鄰的兩個第二隔離部134之間形成溝槽136,溝槽136的寬度由下往上逐漸變小,即溝槽136的寬度由下往上自最大寬度136w1逐漸變小為最小寬度136w2,溝槽136有如蓄水池般可以將有機封裝層128局限於溝槽136中,可避免有機封裝層128因為毛細現象而溢流(overflow)出第一隔離部132和第二隔離部134,提升側向封裝的可靠度。於其他實施例中,第二隔離部134的數量為三個(見第7圖)。然本發明不限於此,於其他實施例中,第二隔離部134的數量可大於三個。FIGS. 6 and 7 are schematic cross-sectional views of other aspects of the first isolation portion 132 and the second isolation portion 134 according to an embodiment of the present invention. Please refer to FIG. 6, the number of the second isolation portions 134 is large For example, Figure 6 shows that the number of second isolation portions 134 is two. A trench 136 is formed between two adjacent second isolation portions 134, and the width of the trench 136 gradually increases from bottom to top. Decrease, that is, the width of the trench 136 gradually decreases from the maximum width 136w1 to the minimum width 136w2 from bottom to top. The trench 136 acts like a reservoir to confine the organic encapsulation layer 128 in the trench 136 and avoid organic encapsulation. The layer 128 overflows out of the first isolation portion 132 and the second isolation portion 134 due to the capillary phenomenon, which improves the reliability of the lateral packaging. In other embodiments, the number of the second isolation portion 134 is three (see FIG. 7). However, the present invention is not limited to this. In other embodiments, the number of the second isolation portion 134 may be greater than three.

第8圖是依照本發明另一實施例之顯示面板10b的剖面示意圖,請參照第8圖,本實施例的顯示面板10b與第2圖的顯示面板10的主要差異在於:第二隔離部134的形狀不同。在本實施例中,第二隔離部134位於第一隔離部132上,第一隔離部132的寬度132w為10微米至100微米,舉例而言,寬度132w為50微米,第二隔離部134的最大寬度134w1和第一隔離部132的寬度132w的比值為0.1至0.95,且第二隔離部134的上表面134T具有波浪形狀。FIG. 8 is a schematic cross-sectional view of a display panel 10b according to another embodiment of the present invention. Please refer to FIG. 8. The main difference between the display panel 10b of this embodiment and the display panel 10 of FIG. 2 lies in the second isolation portion 134 The shapes are different. In this embodiment, the second isolation portion 134 is located on the first isolation portion 132, and the width 132w of the first isolation portion 132 is 10 micrometers to 100 micrometers. For example, the width 132w is 50 micrometers, and the width 132w of the second isolation portion 134 is 50 micrometers. The ratio of the maximum width 134w1 to the width 132w of the first isolation portion 132 is 0.1 to 0.95, and the upper surface 134T of the second isolation portion 134 has a wave shape.

於本實施例中,第一隔離部132和第二隔離部134的材料相同,且兩者材料例如是正型光阻,其中第二隔離部134和第一隔離部132可透過先沉積正型光阻材料,接著進行第一次曝光以形成第一隔離部132,再進行第二次曝光以形成第二隔離部134,其中第二次曝光的曝光範圍的寬度小於第一次曝光的曝光範圍的寬度,舉例而言,第一次曝光的曝光範圍的寬度為10微米至100微米,第二次曝光的曝光範圍的寬度為10微米至95微米。In this embodiment, the materials of the first isolation portion 132 and the second isolation portion 134 are the same, and the materials of the two are, for example, positive photoresist, where the second isolation portion 134 and the first isolation portion 132 can pass through the first deposition of positive light. The resist material is then subjected to a first exposure to form the first isolation portion 132, and then a second exposure is performed to form the second isolation portion 134, wherein the width of the exposure range of the second exposure is smaller than that of the first exposure The width, for example, the width of the exposure range of the first exposure is 10 μm to 100 μm, and the width of the exposure range of the second exposure is 10 μm to 95 μm.

第一隔離部132及第二隔離部134共同形成雙層階梯式的側壁,藉由有機封裝層128跨過障礙體(即第一隔離部132及第二隔離部134)之位能增加去抵銷有機封裝層128與第一無機封裝層126之內聚力,可避免有機封裝層128因為毛細現象而溢流(overflow)出第一隔離部132和第二隔離部134,提升側向封裝的可靠度。第一隔離部132和第一無機封裝層126的邊界126a及第二無機封裝層130的邊界130a的距離為1微米至1000微米。於一實施例中,第一隔離部132和第一無機封裝層126的邊界126a及第二無機封裝層130的邊界130a的距離為1微米至240微米。於本實施例中,第二隔離部134的數量為單個。The first isolation portion 132 and the second isolation portion 134 together form a double-layer stepped side wall, and the position of the organic encapsulation layer 128 across the barrier (ie, the first isolation portion 132 and the second isolation portion 134) can increase the resistance Pin the cohesion between the organic encapsulation layer 128 and the first inorganic encapsulation layer 126 to prevent the organic encapsulation layer 128 from overflowing out of the first isolation portion 132 and the second isolation portion 134 due to capillary phenomena, thereby improving the reliability of lateral packaging . The distance between the first isolation portion 132 and the boundary 126a of the first inorganic encapsulation layer 126 and the boundary 130a of the second inorganic encapsulation layer 130 is 1 micrometer to 1000 micrometers. In one embodiment, the distance between the boundary 126a of the first isolation portion 132 and the first inorganic encapsulation layer 126 and the boundary 130a of the second inorganic encapsulation layer 130 is 1 micrometer to 240 micrometers. In this embodiment, the number of the second isolation portion 134 is single.

第9圖是依照本發明另一實施例之顯示面板10c的剖面示意圖,請參照第9圖,本實施例的顯示面板10c與第8圖的顯示面板10b的主要差異在於:第二隔離部134的數量為多個,舉例而言,第9圖中繪示第二隔離部134的數量為二個,第二隔離部134的最大寬度134w1為10微米,相鄰的兩個第二隔離部134之間形成溝槽136,溝槽136有如蓄水池般可以將有機封裝層128局限於溝槽136中,可避免有機封裝層128因為毛細現象而溢流(overflow)出第一隔離部132和第二隔離部134,提升側向封裝的可靠度。於其他實施例中,第二隔離部134的數量為三個(見第10圖)。然本發明不限於此,於其他實施例中,第二隔離部134的數量可大於三個。Fig. 9 is a schematic cross-sectional view of a display panel 10c according to another embodiment of the present invention. Please refer to Fig. 9. The main difference between the display panel 10c of this embodiment and the display panel 10b of Fig. 8 lies in the second isolation portion 134 The number is multiple. For example, in Figure 9, the number of the second isolation portion 134 is two, the maximum width 134w1 of the second isolation portion 134 is 10 microns, and two adjacent second isolation portions 134 A trench 136 is formed therebetween. The trench 136 can confine the organic encapsulation layer 128 in the trench 136 like a reservoir, and can prevent the organic encapsulation layer 128 from overflowing out of the first isolation portion 132 and the first isolation portion 132 and due to capillary phenomenon. The second isolation portion 134 improves the reliability of the lateral packaging. In other embodiments, the number of the second isolation portion 134 is three (see FIG. 10). However, the present invention is not limited to this. In other embodiments, the number of the second isolation portion 134 may be greater than three.

第11圖是依照本發明另一實施例之顯示面板10d的剖面示意圖,請參照第11圖,本實施例的顯示面板10d與第2圖的顯示面板10的主要差異在於:第一無機封裝層126自第一隔離部132的側面延伸至第一隔離部132的頂面,第一無機封裝層126具有重疊於第一隔離部132的頂面的至少一開口138。第一無機封裝層126的開口138可藉由遮罩(mask)製程或是蝕刻製程所製作。開口138如水溝般可以將有機封裝層128局限於開口138中,可避免有機封裝層128因為毛細現象而溢流(overflow)出第一隔離部132,提升側向封裝的可靠度。於本實施例中,第一隔離部132的寬度132w為10微米至100微米,舉例而言,寬度132w為50微米。開口138的二側壁垂直於第一隔離部132的頂面,也就是說,開口138之斷差無緩坡,換言之,開口138具有垂直面,可提高有機封裝層128溢流的難度。於本實施例中,開口138的數量為單個。FIG. 11 is a schematic cross-sectional view of a display panel 10d according to another embodiment of the present invention. Please refer to FIG. 11. The main difference between the display panel 10d of this embodiment and the display panel 10 of FIG. 2 is: the first inorganic encapsulation layer 126 extends from the side surface of the first isolation portion 132 to the top surface of the first isolation portion 132, and the first inorganic encapsulation layer 126 has at least one opening 138 overlapping the top surface of the first isolation portion 132. The opening 138 of the first inorganic encapsulation layer 126 can be made by a mask process or an etching process. The opening 138 can confine the organic encapsulation layer 128 in the opening 138 like a gutter, which can prevent the organic encapsulation layer 128 from overflowing out of the first isolation portion 132 due to the capillary phenomenon, and improve the reliability of the lateral packaging. In this embodiment, the width 132w of the first isolation portion 132 is 10 micrometers to 100 micrometers, for example, the width 132w is 50 micrometers. The two sidewalls of the opening 138 are perpendicular to the top surface of the first isolation portion 132, that is, the gap of the opening 138 has no gentle slope. In other words, the opening 138 has a vertical surface, which can increase the difficulty of overflow of the organic encapsulation layer 128. In this embodiment, the number of openings 138 is single.

於本實施例中,第一隔離部132具有子部132A及子部132B,其相關敘述相同於第2圖,故於此不再贅述。In this embodiment, the first isolation portion 132 has a sub-portion 132A and a sub-portion 132B, and the related description is the same as that in FIG. 2, so it will not be repeated here.

第12圖及第13圖是依照本發明一實施例的第一無機封裝層126及第一隔離部132的其他態樣的剖面示意圖。請先參照第12圖,開口138的數量為多個,舉例而言,第12圖中繪示開口138的數量為二個。接著請參照第13圖,開口138的數量為三個。然而本發明不限於此,於其他實施例中,開口138的數量可大於三個。12 and 13 are schematic cross-sectional views of other aspects of the first inorganic encapsulation layer 126 and the first isolation portion 132 according to an embodiment of the present invention. Please refer to FIG. 12 first. The number of openings 138 is multiple. For example, FIG. 12 shows that the number of openings 138 is two. Next, referring to Figure 13, the number of openings 138 is three. However, the present invention is not limited to this. In other embodiments, the number of openings 138 may be greater than three.

綜上所述,在本發明一實施例的顯示面板中,顯示面板包括第一隔離部及第二隔離部,第一隔離部位於陣列基板上且位於非顯示區。第二隔離部位於第一隔離部上。第二隔離部的形狀為上寬下窄,且第二隔離部的最大寬度小於第一隔離部的寬度,藉由有機封裝層跨過障礙體(即第一隔離部及第二隔離部)之位能增加去抵銷有機封裝層與第一無機封裝層之內聚力,可避免有機封裝層因為毛細現象而溢流(overflow)出第一隔離部和第二隔離部,提升側向封裝的可靠度。在本發明另一實施例的顯示面板中,第二隔離部的最大寬度和第一隔離部的比值為0.1至0.95,且第二隔離部的上表面具有波浪形狀,使第一隔離部及第二隔離共同形成雙層階梯式的側壁,藉由有機封裝層跨過障礙體(即第一隔離部及第二隔離部)之位能增加去抵銷有機封裝層與第一無機封裝層之內聚力,可避免有機封裝層因為毛細現象而溢流(overflow)出第一隔離部和第二隔離部,提升側向封裝的可靠度。在本發明另一實施例的顯示面板中,無機封裝層自第一隔離部的側面延伸至第一隔離部的頂面,無機封裝層具有重疊於第一隔離部的頂面的至少一開口。無機封裝層的開口可藉由遮罩(mask)製程或是蝕刻製程所製作。開口如水溝般可以將有機封裝層局限於開口中,可避免有機封裝層因為毛細現象而溢流(overflow)出第一隔離部和第二隔離部,提升側向封裝的可靠度。In summary, in the display panel of an embodiment of the present invention, the display panel includes a first isolation portion and a second isolation portion, and the first isolation portion is located on the array substrate and located in the non-display area. The second isolation part is located on the first isolation part. The shape of the second isolation portion is wide at the top and narrow at the bottom, and the maximum width of the second isolation portion is smaller than the width of the first isolation portion. The organic encapsulation layer crosses the barrier (ie, the first isolation portion and the second isolation portion). Potential energy increases to offset the cohesion between the organic encapsulation layer and the first inorganic encapsulation layer, which can prevent the organic encapsulation layer from overflowing out of the first isolation part and the second isolation part due to capillary phenomenon, and improve the reliability of lateral packaging . In another embodiment of the display panel of the present invention, the ratio of the maximum width of the second isolation portion to the first isolation portion is 0.1 to 0.95, and the upper surface of the second isolation portion has a wave shape, so that the first isolation portion and the first isolation portion The two isolations together form a double-layer stepped sidewall. The position of the organic encapsulation layer across the barriers (ie, the first isolation portion and the second isolation portion) can be increased to offset the cohesion of the organic encapsulation layer and the first inorganic encapsulation layer Therefore, the organic encapsulation layer can be prevented from overflowing out of the first isolation part and the second isolation part due to the capillary phenomenon, and the reliability of the lateral packaging can be improved. In a display panel according to another embodiment of the present invention, the inorganic encapsulation layer extends from the side surface of the first isolation portion to the top surface of the first isolation portion, and the inorganic encapsulation layer has at least one opening overlapping the top surface of the first isolation portion. The opening of the inorganic encapsulation layer can be made by a mask process or an etching process. The opening can confine the organic encapsulation layer to the opening like a gutter, which can prevent the organic encapsulation layer from overflowing out of the first isolation portion and the second isolation portion due to the capillary phenomenon, thereby improving the reliability of the lateral packaging.

10,10a,10b,10c,10d:顯示面板10, 10a, 10b, 10c, 10d: display panel

100:陣列基板100: Array substrate

102:基板102: substrate

104:畫素陣列104: pixel array

105:緩衝層105: buffer layer

106:閘絕緣層106: gate insulation

108:層間絕緣層108: Interlayer insulation layer

112:平坦層112: Flat layer

114:畫素定義層114: Pixel Definition Layer

116:發光層116: luminescent layer

118:電洞傳輸層118: hole transport layer

120:電子傳輸層120: electron transport layer

122:發光單元122: light-emitting unit

124:封裝結構124: Package structure

126:第一無機封裝層126: The first inorganic encapsulation layer

126a:邊界126a: boundary

128:有機封裝層128: organic encapsulation layer

130:第二無機封裝層130: second inorganic encapsulation layer

130a:邊界130a: boundary

132:第一隔離部132: First Isolation Department

132w:寬度132w: width

134:第二隔離部134: Second Isolation Department

134T:上表面134T: upper surface

134w1:最大寬度134w1: Maximum width

134w2:最小寬度134w2: minimum width

136:溝槽136: Groove

138:開口138: Open

AA:顯示區AA: Display area

CH:通道區CH: Channel area

D:汲極D: Dip pole

D1:第一方向D1: First direction

D2:第二方向D2: second direction

DR:汲極區DR: Drain region

E1:電極E1: Electrode

E2:第二電極E2: second electrode

G:閘極G: Gate

I-I’:剖線I-I’: Sectional line

NA:非顯示區NA: non-display area

PS:間隙物PS: Spacer

PX:畫素PX: pixel

S:源極S: source

SC:半導體圖案SC: Semiconductor pattern

SR:源極區SR: Source region

T1:主動元件T1: Active component

閱讀以下詳細敘述並搭配對應之圖式,可了解本揭露之多個樣態。需留意的是,圖式中的多個特徵並未依照該業界領域之標準作法繪製實際比例。事實上,所述之特徵的尺寸可以任意的增加或減少以利於討論的清晰性。 第1圖是依照本發明一實施例的顯示面板的俯視示意圖。 第2圖是沿著第1圖的剖線I-I’的剖面示意圖。 第3圖是依照本發明一實施例的第一隔離部及第二隔離部的其他態樣的剖面示意圖。 第4圖是依照本發明一實施例的第一隔離部及第二隔離部的其他態樣的剖面示意圖。 第5圖是依照本發明另一實施例的顯示面板的剖面示意圖。 第6圖是依照本發明一實施例的第一隔離部及第二隔離部的其他態樣的剖面示意圖。 第7圖是依照本發明一實施例的第一隔離部及第二隔離部的其他態樣的剖面示意圖。 第8圖是依照本發明另一實施例之顯示面板的剖面示意圖。 第9圖是依照本發明另一實施例之顯示面板的剖面示意圖。 第10圖是依照本發明另一實施例的第一隔離部及第二隔離部的其他態樣的剖面示意圖。 第11圖是依照本發明另一實施例之顯示面板的剖面示意圖。 第12圖是依照本發明另一實施例的第一隔離部及第一無機封裝層的其他態樣的剖面示意圖。 第13圖是依照本發明另一實施例的第一隔離部及第一無機封裝層的其他態樣的剖面示意圖。 Read the following detailed description and match the corresponding diagrams to understand many aspects of this disclosure. It should be noted that many of the features in the drawing are not drawn in actual proportions according to the standard practice in the industry. In fact, the size of the features can be increased or decreased arbitrarily to facilitate the clarity of the discussion. FIG. 1 is a schematic top view of a display panel according to an embodiment of the invention. Fig. 2 is a schematic cross-sectional view taken along the section line I-I' of Fig. 1. FIG. 3 is a schematic cross-sectional view of other aspects of the first isolation portion and the second isolation portion according to an embodiment of the present invention. FIG. 4 is a schematic cross-sectional view of other aspects of the first isolation portion and the second isolation portion according to an embodiment of the present invention. FIG. 5 is a schematic cross-sectional view of a display panel according to another embodiment of the invention. FIG. 6 is a schematic cross-sectional view of other aspects of the first isolation portion and the second isolation portion according to an embodiment of the present invention. FIG. 7 is a schematic cross-sectional view of other aspects of the first isolation portion and the second isolation portion according to an embodiment of the present invention. FIG. 8 is a schematic cross-sectional view of a display panel according to another embodiment of the invention. FIG. 9 is a schematic cross-sectional view of a display panel according to another embodiment of the invention. FIG. 10 is a schematic cross-sectional view of other aspects of the first isolation portion and the second isolation portion according to another embodiment of the present invention. FIG. 11 is a schematic cross-sectional view of a display panel according to another embodiment of the invention. FIG. 12 is a schematic cross-sectional view of another aspect of the first isolation portion and the first inorganic encapsulation layer according to another embodiment of the present invention. FIG. 13 is a schematic cross-sectional view of another aspect of the first isolation portion and the first inorganic encapsulation layer according to another embodiment of the present invention.

國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic deposit information (please note in the order of deposit institution, date and number) no Foreign hosting information (please note in the order of hosting country, institution, date, and number) no

10:顯示面板 10: Display panel

100:陣列基板 100: Array substrate

102:基板 102: substrate

105:緩衝層 105: buffer layer

106:閘絕緣層 106: gate insulation

108:層間絕緣層 108: Interlayer insulation layer

112:平坦層 112: Flat layer

114:畫素定義層 114: Pixel Definition Layer

116:發光層 116: luminescent layer

118:電洞傳輸層 118: hole transport layer

120:電子傳輸層 120: electron transport layer

122:發光單元 122: light-emitting unit

124:封裝結構 124: Package structure

126:第一無機封裝層 126: The first inorganic encapsulation layer

126a:邊界 126a: boundary

128:有機封裝層 128: organic encapsulation layer

130:第二無機封裝層 130: second inorganic encapsulation layer

130a:邊界 130a: boundary

132:第一隔離部 132: First Isolation Department

132A:子部 132A: Subsection

132B:子部 132B: Subsection

132w:寬度 132w: width

134:第二隔離部 134: Second Isolation Department

134w1:最大寬度 134w1: Maximum width

134w2:最小寬度 134w2: minimum width

AA:顯示區 AA: Display area

CH:通道區 CH: Channel area

D:汲極 D: Dip pole

DR:汲極區 DR: Drain region

E1:第一電極 E1: first electrode

E2:第二電極 E2: second electrode

G:閘極 G: Gate

I-I’:剖線 I-I’: Sectional line

NA:非顯示區 NA: non-display area

PS:間隙物 PS: Spacer

S:源極 S: source

SC:半導體圖案 SC: Semiconductor pattern

SR:源極區 SR: Source region

T1:主動元件 T1: Active component

Claims (10)

一種顯示面板,具有一顯示區及環繞該顯示區的一非顯示區,且包括:一陣列基板;一第一電極,位於該陣列基板上且位於該顯示區;及一畫素定義層,位於該第一電極上,其中該畫素定義層具有和該第一電極重疊的一開口;一發光層,位於該開口內;一第一隔離部,位於該陣列基板上且位於該非顯示區;及至少一第二隔離部,位於該第一隔離部上,該第二隔離部的形狀為上寬下窄,且該第二隔離部的最大寬度小於該第一隔離部的寬度。 A display panel has a display area and a non-display area surrounding the display area, and includes: an array substrate; a first electrode located on the array substrate and located in the display area; and a pixel definition layer located in On the first electrode, the pixel definition layer has an opening overlapping the first electrode; a light-emitting layer is located in the opening; a first isolation portion is located on the array substrate and located in the non-display area; and At least one second isolation portion is located on the first isolation portion, the shape of the second isolation portion is wide at the top and narrow at the bottom, and the maximum width of the second isolation portion is smaller than the width of the first isolation portion. 如請求項1所述之顯示面板,其中該第二隔離部的數量為多個,且相鄰的兩個該些第二隔離部之間形成一溝槽。 The display panel according to claim 1, wherein the number of the second isolation portions is multiple, and a trench is formed between two adjacent second isolation portions. 如請求項2所述之顯示面板,其中該溝槽的寬度由下往上逐漸變小。 The display panel according to claim 2, wherein the width of the groove gradually decreases from bottom to top. 如請求項2所述之顯示面板,其中該溝槽的寬度由下往上自一第一定值而逐漸變小再變為一第二定值。 The display panel according to claim 2, wherein the width of the groove gradually decreases from a first constant value from bottom to top, and then becomes a second constant value. 如請求項1所述之顯示面板,其中該第二隔離部的最大寬度和該第二隔離部的最小寬度的比值為1.1至2。 The display panel according to claim 1, wherein the ratio of the maximum width of the second isolation portion to the minimum width of the second isolation portion is 1.1 to 2. 如請求項1所述之顯示面板,其中該第二隔離部的材料包括負型光阻。 The display panel according to claim 1, wherein the material of the second isolation portion includes a negative photoresist. 一種顯示面板,具有一顯示區及環繞該顯示區的一非顯示區,且包括:一陣列基板;一第一電極,位於該陣列基板上且位於該顯示區;及一畫素定義層,位於該第一電極上,其中該畫素定義層具有和該第一電極重疊的一開口;一發光層,位於該開口內;一第一隔離部,位於該陣列基板上且位於該非顯示區;一第一無機封裝層,自該第一隔離部的側面延伸至該第一隔離部的頂面,該第一無機封裝層具有重疊於該第一隔離部的頂面的至少一開口,該第一無機封裝層的該至少一開口自該第一無機封裝層的頂面延伸至該第一無機封裝層的底面;及一第二無機封裝層,位於該第一無機封裝層上且填入該至少一開口,該第二無機封裝層自該非顯示區延伸至該顯示區。 A display panel has a display area and a non-display area surrounding the display area, and includes: an array substrate; a first electrode located on the array substrate and located in the display area; and a pixel definition layer located in On the first electrode, the pixel definition layer has an opening overlapping the first electrode; a light-emitting layer located in the opening; a first isolation portion located on the array substrate and located in the non-display area; The first inorganic encapsulation layer extends from the side surface of the first isolation portion to the top surface of the first isolation portion, the first inorganic encapsulation layer has at least one opening overlapping the top surface of the first isolation portion, and the first The at least one opening of the inorganic encapsulation layer extends from the top surface of the first inorganic encapsulation layer to the bottom surface of the first inorganic encapsulation layer; and a second inorganic encapsulation layer located on the first inorganic encapsulation layer and filled in the at least An opening, and the second inorganic encapsulation layer extends from the non-display area to the display area. 如請求項7所述之顯示面板,其中該開口的二側壁垂直於該第一隔離部的頂面。 The display panel according to claim 7, wherein the two side walls of the opening are perpendicular to the top surface of the first isolation portion. 一種顯示面板,具有一顯示區及環繞該顯示區的一非顯示區,且包括:一陣列基板;一第一電極,位於該陣列基板上且位於該顯示區;及一畫素定義層,位於該第一電極上,其中該畫素定義層具有和該第一電極重疊的一開口;一發光層,位於該開口內;一第一隔離部,位於陣列基板上且位於非顯示區;及至少一第二隔離部,位於該第一隔離部上,其中該第二隔離部的最大寬度和該第一隔離部的寬度的比值為0.1至0.95,且該第二隔離部的上表面具有波浪形狀。 A display panel has a display area and a non-display area surrounding the display area, and includes: an array substrate; a first electrode located on the array substrate and located in the display area; and a pixel definition layer located in On the first electrode, the pixel definition layer has an opening overlapping the first electrode; a light-emitting layer is located in the opening; a first isolation portion is located on the array substrate and located in the non-display area; and at least A second isolation portion located on the first isolation portion, wherein the ratio of the maximum width of the second isolation portion to the width of the first isolation portion is 0.1 to 0.95, and the upper surface of the second isolation portion has a wave shape . 如請求項9所述之顯示面板,還包括:一無機封裝層,位於該陣列基板上且位於該非顯示區,其中該第一隔離部和該無機封裝層的邊界的距離為1微米至1000微米。 The display panel according to claim 9, further comprising: an inorganic encapsulation layer located on the array substrate and in the non-display area, wherein the distance between the first isolation portion and the boundary of the inorganic encapsulation layer is 1 μm to 1000 μm .
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160307971A1 (en) * 2015-04-16 2016-10-20 Samsung Display Co., Ltd. Organic light emitting diode display
US20190245015A1 (en) * 2018-02-08 2019-08-08 Samsung Display Co., Ltd. Organic light-emitting display device and method of manufacturing the same
US20200067017A1 (en) * 2018-08-24 2020-02-27 Samsung Display Co., Ltd. Display apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107104127B (en) * 2017-04-27 2019-11-22 上海天马有机发光显示技术有限公司 Organic light emitting display panel and display device
CN108807478B (en) * 2018-06-07 2021-06-22 武汉华星光电半导体显示技术有限公司 Display panel and electronic device
KR102663324B1 (en) * 2018-11-01 2024-05-02 엘지디스플레이 주식회사 Electroluminesence display having a through-hole in display area
CN110212113B (en) * 2019-05-31 2021-11-09 京东方科技集团股份有限公司 Electroluminescent display substrate, preparation method thereof and electroluminescent display device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160307971A1 (en) * 2015-04-16 2016-10-20 Samsung Display Co., Ltd. Organic light emitting diode display
US20190245015A1 (en) * 2018-02-08 2019-08-08 Samsung Display Co., Ltd. Organic light-emitting display device and method of manufacturing the same
US20200067017A1 (en) * 2018-08-24 2020-02-27 Samsung Display Co., Ltd. Display apparatus

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