TWI727588B - Photomask table and photoetching system - Google Patents

Abstract

The present invention belongs to the technical field of lithography and discloses a photomask table and a photoetching system. The photomask table includes: a support base; a plate bearing table, which is slidably connected to the upper end surface of the support base; and two sets of Y-direction motion mechanisms are arranged on On the supporting base, two groups of Y-direction movement mechanisms are respectively arranged on both sides of the plate bearing table in the X direction; the X-direction movement mechanism is arranged on the Y-direction movement mechanism and connected with the plate plate, and the Y-direction movement mechanism drives the X direction The movement mechanism moves along the Y direction, which is perpendicular to the X direction. The lithography system includes the above-mentioned mask stage. The photomask stage and the photoetching system disclosed in the present invention can reduce the volume of the photomask stage and the photoetching system, and reduce the cost of the photomask stage and the photoetching system.

Description

Photomask table and photoetching system

The present invention relates to the field of lithography technology, for example, to a reticle stage mechanism and a lithography system.

The photolithography system is mainly used for the manufacture of integrated circuit ICs or other micro devices. With photolithography equipment, multilayer photomasks with different photomask patterns can be sequentially imaged on silicon coated with photoresist under precise alignment. Chips or substrates, such as semiconductor wafers or LCD panels, etc. The lithography system is usually divided into a step lithography system and a step and scan lithography system. Among them, the step and scan lithography system uses the scanning movement of the projection light field to image. In the process of imaging the reticle image, the reticle and the wafer At the same time, it moves relative to the projection system and the projection beam. Therefore, for a step-and-scan lithography system, a corresponding device is required as the carrier of the mask plate and the silicon wafer, and the needs of lithography can be met by the relative precise movement between the carrier loaded with the mask plate and the silicon wafer. , The carrier used to carry the mask plate is the plate table, and the carrier used to carry the silicon wafer/substrate is called the plate table. The plate table and the plate table are divided into the mask table sub-system and work in the lithography system In each sub-system, it is the core module of each sub-system.

During the operation of the lithography system, the plate table has to perform large-stroke movement in the scanning direction and fine-tuned movement in all directions to meet the high-speed and high-precision movement requirements of the plate table. Therefore, the photomask table system in the related technology usually adopts The driving structure of the coarse-fine motion stack. Figure 1 is related The schematic diagram of the structure of the reticle stage system provided by the technology, as shown in FIG. 1, the reticle stage system provided by the related technology is composed of a coarse motion stage 150 and a fine motion stage 140 superimposed on it. Among them, the coarse motion stage 150 uses the left linear motor 130, the right linear motor 120 and the guide rail 160 to form a high-speed and large-stroke bilateral drive system; the fine motion stage 140 is driven by the X-direction voice coil motor 170 and the Y-direction voice coil motor 180. The mask stage performs real-time high-precision fine-tuning to meet the requirements of motion accuracy.

In the photomask table system provided by the related art, since the micro-motion and micro-motion driving devices are both arranged on the coarse motion table and driven by the coarse motion driving device, on the one hand, the size of the coarse motion table is increased, resulting in the overall structural size of the mask table. The enlargement is not conducive to the miniaturization of the mask stage system. On the other hand, it increases the driving burden of the coarse-motion driving device, resulting in an increase in cost and a decrease in motion accuracy.

The invention provides a photomask table, which reduces the size of the photomask table and reduces the operating cost of the photomask table.

The invention provides a photoetching system, which reduces the volume of the photoetching system and reduces the photoetching cost.

The present invention adopts the following technical means:

A photomask table, including:

Support base

The plate bearing table is slidably connected to the upper end surface of the aforementioned supporting base;

Two groups of Y-direction movement mechanisms are arranged on the aforementioned support base, and the two groups of aforementioned Y-direction movement mechanisms are respectively arranged on both sides of the aforementioned plate-bearing platform along the X direction;

The X-direction movement mechanism is arranged on the aforementioned Y-direction movement mechanism and connected with the aforementioned plate table. The aforementioned Y-direction movement mechanism drives the aforementioned X-direction movement mechanism to move in the Y direction, and the aforementioned Y direction is perpendicular to the aforementioned X direction.

Optionally, the support base has a first mounting surface and a second mounting surface, the first mounting surface and the second mounting surface are both parallel to the plane formed by the X direction and the Y direction, and the first mounting surface is higher than the first mounting surface. There are two mounting surfaces, and the plate bearing table is arranged on the first mounting surface, and the Y-direction movement mechanism is arranged on the second mounting surface.

Optionally, the aforementioned X-direction movement mechanism and the aforementioned Y-direction movement mechanism are connected by a rotating adjustment assembly.

Optionally, the aforementioned rotation adjustment assembly includes a conversion bearing, one of the aforementioned X-direction movement mechanism and the aforementioned Y-direction movement mechanism is connected to the inner ring of the aforementioned conversion bearing, and the other is connected to the outer ring of the aforementioned conversion bearing. The axis is perpendicular to the aforementioned X direction and the aforementioned Y direction, respectively.

Optionally, the aforementioned Y-direction movement mechanism includes:

In the linear motor, the Y-direction stator portion of the linear motor is connected to the side surface of the support base and arranged along the Y direction, and the Y-direction mover portion of the linear motor is connected to the X-direction motion mechanism.

Optionally, the aforementioned Y-direction movement mechanism further includes:

The Y-direction guide rail is arranged on the aforementioned second mounting surface along the aforementioned Y-direction;

The Y-direction slider is slidably connected to the Y-direction guide rail, and the Y-direction slider is connected to the Y-direction mover part.

Optionally, the aforementioned Y-direction movement mechanism further includes:

The lower end surface of the first connecting plate is connected with the aforementioned Y-direction slider, and its upper end surface is connected with the aforementioned X-direction movement mechanism.

Optionally, the aforementioned Y-direction movement mechanism further includes:

Y-direction displacement detection device for detecting the displacement of the aforementioned Y-direction movement mechanism along the aforementioned Y-direction; and/or

The Y-direction limiting device is arranged on the aforementioned second mounting surface and is used to limit the limit displacement of the aforementioned Y-direction motion mechanism.

Optionally, the Y-direction displacement detection device includes a first grating ruler assembly, and the first grating ruler assembly includes:

The first scale grating is arranged on the aforementioned second mounting surface along the aforementioned Y direction;

The first grating reading head is arranged facing the aforementioned first scale grating and connected with the aforementioned Y-direction mover part;

The aforementioned Y-direction limiting device includes an optical limiting component and/or a limiting buffer component, the aforementioned limiting buffer component includes a hydraulic buffer set at two extreme positions of the aforementioned Y-direction motion mechanism, and the aforementioned optical limiting component includes:

Two first light sensors are arranged at intervals along the aforementioned Y direction, and the aforementioned first light sensors include a transmitting part and a receiving part arranged oppositely along the aforementioned X direction;

The light-shielding baffle is connected to the Y-direction mover part, and the light-shielding baffle can extend between the emitting part and the receiving part to block the transmission of light between the emitting part and the receiving part. Pass.

Optionally, the aforementioned X-direction motion mechanism includes:

In the voice coil motor, the X-direction stator portion of the voice coil motor is connected to the Y-direction movement mechanism, and the X-direction mover portion of the voice coil motor is connected to the plate platform.

Optionally, the aforementioned X-direction motion mechanism includes:

An X-direction displacement detection device for detecting the displacement of the aforementioned X-direction movement mechanism along the aforementioned X-direction; and/or

The X-direction limiting device is used to limit the limit displacement of the aforementioned X-direction motion mechanism.

Optionally, the aforementioned X-direction movement mechanism further includes:

The second connecting plate is respectively connected with the aforementioned Y-direction movement mechanism and the aforementioned X-direction stator part;

The sliding plate is slidably connected to the second connecting plate and can slide in the X direction relative to the second connecting plate. The sliding plate is respectively connected to the mover part and the plate platform.

Optionally, the aforementioned X-direction movement mechanism further includes:

The X guide assembly is arranged between the second connecting plate and the sliding plate along the X direction.

Optionally, the aforementioned X-guide component includes:

At least a pair of cross roller guide rails are arranged in parallel, one of the pair of cross roller guide rails is connected to the second connecting plate, and the other is connected to the sliding plate.

Optionally, the aforementioned mask stage further includes:

For the adapter, the X-direction movement mechanism is connected to the plate platform through the adapter, and the stiffness of the adapter in the Y direction is lower than the stiffness of the adapter in the X and Rz directions.

Optionally, an adsorption vacuum chamber is opened on the upper end surface of the plate table, a first adsorption air channel is opened inside the plate table, and the first adsorption air channel is respectively connected to the adsorption vacuum chamber and the vacuum device.

Optionally, the lower end surface of the plate bearing table is provided with air flotation holes, and the inside of the plate plate table is provided with an air-filling channel, and the air-filling channels are respectively connected with the air flotation hole and the air filling device.

Optionally, a preload vacuum chamber is opened on the lower end of the plate table, a second suction channel is opened inside the plate table, and the second suction channel is respectively connected with the preload vacuum chamber and the vacuum device.

Optionally, the lower end surface of the plate table is provided with an air floating cushion, the air floating cushion is provided with an air passage, and the lower end surface of the air floating cushion is provided with an air outlet communicating with the air passage. The device is connected.

Optionally, a magnetic preload assembly is provided between the plate table and the support base, the magnetic preload assembly includes an electromagnet and a metal piece, and one of the plate table and the support base is provided with the electromagnet, The other is provided with the aforementioned metal piece, and the aforementioned electromagnet and the aforementioned metal piece are arranged directly opposite.

A photolithography system includes the photomask stage as described above.

The photomask table provided by the present invention has the Y-direction movement mechanism and the X-direction movement mechanism arranged on both sides of the plate-bearing table along the X direction, and the X movement mechanism is connected with the Y-direction movement mechanism, so that the Y-direction movement mechanism is directly The X-direction motion mechanism is connected to the plate table, avoiding additional coarse motion tables and micro-movement tables to realize the connection between the Y-direction motion mechanism, X-direction motion mechanism and the plate table, simplifying the structural complexity of the mask table and reducing The cost of the mask stage, and due to the Y-direction movement mechanism It only needs to drive the X-direction movement mechanism and the plate to move, reduce the load of the Y-direction movement mechanism, and improve the accuracy of the Y-direction movement; at the same time, because the X-direction movement mechanism and the Y-direction movement mechanism are arranged on the same side of the plate, it improves The compact structure of the reticle stage reduces the overall size of the reticle stage, which is conducive to the miniaturization of the reticle stage.

The lithography system provided by the present invention, due to the use of the above-mentioned mask stage, reduces the volume of the lithography system, reduces the cost of the lithography system, and increases the movement speed and accuracy of the lithography system.

1: Support base

2: Y-direction movement mechanism

3: X-direction movement mechanism

4: plate platform

5: Adapter board

6: Conversion bearing

11: Mounting through holes

12: Install the convex part

121: The first mounting surface

13: The second mounting surface

14: Third mounting surface

15: metal parts

120: Right linear motor

130: Left linear motor

140: Fine Motion Table

150: coarse motion table

160: Rail

170: X direction voice coil motor

180: Y direction voice coil motor

21: Linear motor

211: Y-direction stator part

212: Y-direction mover part

22: Y guide component

221: Y-direction rail

222: Y-direction slider

23: The first connection board

24: fixed parts

25: The first grating ruler assembly

251: The first ruler raster

252: The first grating reading head

26: Optical limit component

261: The first light sensor

262: light shading baffle

27: Hydraulic buffer

28: Zero position light sensor

31: Voice coil motor

311: X-direction mover part

312: X-direction stator part

32: X guide assembly

321: Cross Roller Guide

33: The second connecting plate

34: Sliding board

35: The second grating reading head

36: second light sensor

37: limit column

38: Anti-collision structure

39: The first mounting plate

310: second mounting plate

41: Bearing boss

411: Adsorption vacuum chamber

42: Air floating boss

421: Floating Hole

43: Preload boss

431: preload vacuum chamber

44: Gas circuit adapter block

441: Airway connector

45: Air Floatation Cushion

451: Vent Hole

46: Electromagnet

47: light through hole

51: body part

52: Reinforcement board

53: Strengthening Department

[Figure 1] Schematic diagram of the structure of the mask stage system provided by the related technology.

[Fig. 2] is a schematic diagram of the structure of the mask stage provided by the first embodiment of the present invention.

[Figure 3] is a schematic diagram of the structure of the support base and the Y-direction movement mechanism provided by the first embodiment of the present invention.

[Fig. 4] is a partial enlarged view of I in Fig. 3.

[Fig. 5] is a schematic diagram of the structure of the X-direction movement mechanism provided by the first embodiment of the present invention.

[Figure 6] is a schematic diagram of the Rz-direction adjustment of the mask stage provided by the first embodiment of the present invention.

[Fig. 7] is a schematic diagram of the structure of the adapter board provided in the first embodiment of the present invention.

[Fig. 8] is a schematic diagram of the front structure of the plate bearing table provided in the first embodiment of the present invention.

[Figure 9] is a schematic diagram of the reverse structure of the plate bearing table provided in the first embodiment of the present invention.

[Figure 10] is a schematic diagram of the structure of the plate bearing table and the supporting base provided in the second embodiment of the present invention.

[Fig. 11] is a schematic diagram of the reverse structure of the plate bearing table provided in the second embodiment of the present invention.

The present invention will be further described in detail below in conjunction with the drawings and embodiments. It can be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be further noted that, for ease of description, only a part of the structure related to the present invention but not all of the structure is shown in the drawings.

In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected", and "fixed" should be interpreted broadly. For example, they may be fixedly connected, detachably connected, or integrated. ; It can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be a connection between two components or an interaction relationship between two components. For those with ordinary knowledge in the field, the specific meaning of the above terms in the present invention can be understood in specific situations.

In the present invention, unless expressly stipulated and limited otherwise, the "up" or "below" of the first feature on the second feature may include direct contact between the first and second features, or may include the first and second features Not in direct contact but in contact with other characteristics between them. Moreover, "above", "above" and "above" the second feature of the first feature include the first feature being directly above and obliquely above the second feature, or it only means that the level of the first feature is higher than the second feature. The first feature "below", "below" and "below" the second feature includes the first feature directly below and obliquely below the second feature, or it only means that the level of the first feature is smaller than the second feature.

In the description of this embodiment, the terms "up", "down", "right" and other orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, and are only for ease of description and simplified operation. It does not indicate or imply that the pointed device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation of the present invention. In addition, the terms "first" and "second" are only used to distinguish them in description and have no special meaning.

Example one

FIG. 2 is a schematic diagram of the structure of a mask stage provided by an embodiment of the present invention. As shown in FIG. 2, this embodiment provides a mask stage for carrying a mask plate in a lithography system and driving the mask plate to achieve a large stroke The high-speed and high-precision movement combined with scanning movement and fine-tuning movement meets the lithography needs of integrated circuit ICs or micro devices.

The photomask table provided in this embodiment includes a supporting base 1, a plate bearing table 4, an X-direction movement mechanism 3, and a Y-direction movement mechanism 2. Among them, the support base 1 is used to support and fix the structure on the entire mask table, and provide an interface for objective lens installation and light transmission; the plate table 4 is set on the top surface of the support base 1, and is used to carry the mask plate to achieve light The transfer of the mask plate on the mask table and the movement of the mask plate; the X-direction movement mechanism 3 is connected with the plate holder 4 and drives the plate holder 4 to move in the X direction; the Y-direction movement mechanism 2 is set on the support base 1 , And is connected with the X-direction movement mechanism 3, and drives the X-direction movement mechanism 3 to move in the Y direction, so as to realize the movement of the plate bearing table 4 in the Y direction.

The above-mentioned X direction and Y direction are the directions shown in Figure 1. It should be noted that, in general, in a lithography system, the mask stage usually drives the mask plate to move and adjust in the horizontal direction, that is, the X direction and Y direction. The surface formed by the direction is a horizontal plane. However, in some special applications, the mask stage can also drive the mask plate to move and adjust on a plane inclined relative to the horizontal plane, that is, at this time, the plane formed by the X direction and the Y direction can be a plane inclined relative to the horizontal plane. In this embodiment, the plane formed by the X direction and the Y direction is taken as a horizontal plane for example.

In this embodiment, the mask plate performs a large-stroke scanning movement in the Y direction. The X-direction can be fine-tuned by the X-direction motion mechanism 3.

In this embodiment, the Y-direction movement mechanism 2 and the X-direction movement mechanism 3 are both arranged on both sides of the plate holder 4 along the X direction, and the X-direction movement mechanism 3 is connected to the Y-direction movement mechanism 2. In this setting method, the Y-direction movement mechanism 2 is directly connected to the plate bearing table 4 through the X-direction movement mechanism 3, avoiding additional coarse movement tables and micro-movement tables to realize Y-direction movement mechanism 2, X-direction movement mechanism 3 and plate bearing table The connection between 4 reduces the structural complexity of the mask stage and reduces the cost of the mask stage. Since the Y-direction movement mechanism 2 only needs to drive the X-direction movement mechanism 3 and the plate table 4 to move, the Y-direction movement mechanism 2 is reduced. Load, improve the accuracy of Y-direction movement; at the same time, because the X-direction movement mechanism 3 and Y-direction movement mechanism 2 are arranged on the same side of the plate table 4, the structure compactness of the reticle stage is improved, and the overall size of the reticle stage is reduced. , Which is conducive to the miniaturization design of the mask stage.

Fig. 3 is a schematic structural diagram of a support base and a Y-direction movement mechanism provided by the first embodiment of the present invention. As shown in Fig. 3, the support base 1 is an integral mounting base of the mask stage and provides structural support for external installation. In this embodiment, the support base 1 is basically a rectangular structure, and its length along the Y direction is determined according to the scanning stroke of the mask stage moving in the Y direction, and its width along the X direction is based on the size of the mask plate and the Y direction. It is determined by the size of the motion mechanism 2. The center of the support base 1 is provided with a mounting through hole 11 for placing the objective lens and providing an optical path for the objective lens.

The supporting base 1 has a first mounting surface 121 and a second mounting surface 13, and both the first mounting surface 121 and the second mounting surface 13 are parallel to a plane formed by the X direction and the Y direction. The first mounting surface 121 is higher than the second mounting surface 13, and the second mounting surface 13 is located in the middle of the supporting base 1, and the second mounting surface 13 is located on both sides of the supporting base 1 along the X direction.

The plate bearing table 4 is installed on the first mounting surface 121, the Y-direction motion mechanism 2 is provided on the second mounting surface 13, and the X-direction motion mechanism 3 is provided on the Y-direction motion mechanism 2 and is located at Above the first mounting surface 121. By providing a first mounting surface 121 on the upper surface of the support base 1, and a second mounting surface 13 on both sides of the first mounting surface 121, the first mounting surface 121 is used for mounting the platen 4, and the second mounting surface 13 is used to install the Y-direction movement mechanism 2, which can realize the layered installation of the Y-direction movement mechanism 2 and the plate bearing table 4 while ensuring the strength of the support base 1, reducing the overall thickness of the mask table.

In this embodiment, since the installation through hole 11 penetrates the upper and lower surfaces of the support base 1, the upper surface of the support base 1 has two installation protrusions 12 arranged in parallel, and the two installation protrusions 12 are respectively arranged in the installation through holes 11. On both sides of the mounting protrusion 12, the upper end surface forms a first mounting surface 121. Since the first mounting surface 121 is formed by the upper end surfaces of the two mounting protrusions 12, the area of the first mounting surface 121 can be reduced, the flatness of the first mounting surface 121 can be improved, and the processing cost of the first mounting surface 121 can be reduced. In other embodiments, the support base 1 can be made into a "convex" structure with a high middle and low sides. The first mounting surface 121 is the upper end surface of the "convex" structure, and the mounting through hole 11 penetrates the "convex" structure. The upper end surface of the type structure. In this embodiment, the formation of the first mounting surface 121 only needs to facilitate the processing and shaping of the supporting base 1 and the first mounting surface 121.

In this embodiment, two Y-direction motion mechanisms 2 are provided along the X direction of the support base 1, and the two Y-direction motion mechanisms 2 are respectively provided on the corresponding second mounting surface 13, and each Y-direction motion mechanism 2 Both can drive the plate bearing table 4 connected to it to move in the Y direction. When the two Y-direction movement mechanisms 2 move synchronously, the plate-bearing platform 4 moves in the Y direction as a whole, so as to realize the scanning movement or fine-tuning movement of the mask plate in the Y direction. When the movement of the two Y-direction motion mechanisms 2 is not synchronized, since the two Y-direction motion mechanisms 2 are respectively connected to the two sides of the plate bearing platform 4, the Y-direction movement displacement difference occurs on both sides of the plate bearing platform 4, which results in the plate bearing platform 4 Generate a rotational movement around the Z direction. In this embodiment, the Z direction is a direction perpendicular to the plane where the X direction and the Y direction are located.

By setting the Y-direction movement mechanism 2 on both sides of the plate bearing table 4, the rotational movement of the plate plate 4 around the Z direction can be realized by the asynchronous movement of the two Y-direction movement mechanisms 2, thereby realizing the Rz direction. Fine-tuning can further improve the movement and adjustment accuracy of the mask stage, and improve the quality of lithography; and because the Rz-direction adjustment mechanism is no longer required, the overall structure of the mask stage can be simplified, the overall size of the mask stage can be reduced, and the light can be reduced. The design cost of the mask table is conducive to the realization of the miniaturized design of the mask table; at the same time, the synchronous movement of the two Y-direction motion mechanisms 2 can balance the forces on both sides of the plate table 4 and improve the smooth movement of the plate table 4 Performance to ensure the accuracy of the movement of the plate 4.

In other embodiments, it is further possible to provide a Y-direction movement mechanism 2 only on one side of the plate bearing table 4, and the other side of the plate bearing table 4 is slidably connected to the plate bearing table 4 by using a Y-direction guide assembly. The movement of the plate bearing table 4 along the Y direction can be realized. At this time, the rotation around the Z axis can be achieved by setting an additional Rz adjustment mechanism, or by setting two X-direction motion mechanisms 3 on both sides of the plate table 4, so that the X-direction motion mechanism 3 is connected to the plate Near the two opposite corners of the stage 4, fine adjustment in the Rz direction can also be achieved.

FIG. 4 is a partial enlarged view of I in FIG. 3. As shown in FIG. 4, in this embodiment, the Y-direction motion mechanism 2 includes a linear motor 21. The Y-direction stator portion 211 of the linear motor 21 is arranged along the Y direction, and the Y-direction mover portion 212 of the linear motor 21 cooperates with the Y-direction stator portion 211 and can move in the Y direction relative to the Y-direction stator portion 211. By setting the linear motor 21, the direct transmission of linear motion can be realized, the structure is simple, the response is rapid, and the motion precision is high, which is beneficial to improve the speed and accuracy of the plate 4 moving along the Y direction. In this embodiment, the linear motor 21 can be a U-shaped slot linear motor 21, which has a simple structure and is convenient to set up. The type of the linear motor 21 may further be a tube type or a flat type structure.

In this embodiment, the two side walls of the support base 1 in the X direction are respectively formed with a third mounting surface 14, and the Y-direction stator portion 211 of the linear motor 21 can be optionally connected to the third mounting surface 14, which is beneficial to save Y-direction movement. The arrangement space required by the mechanism 2 on the second mounting surface 13 reduces the size of the mask stage in the height direction, improves the overall compactness of the mask stage, and further reduces the required size of the mask stage. In other embodiments, the linear motor 21 can also be connected to the second mounting surface 13.

In order to provide the movement accuracy of the Y-direction movement mechanism 2, the Y-direction movement mechanism 2 optionally includes a Y-direction guide assembly 22 to guide the movement of the Y-direction movement mechanism 2. The Y-direction component 22 includes a Y-direction guide rail 221 and a Y-direction slider 222. The Y-direction guide rail 221 is arranged on the second mounting surface 13 along the Y direction. The Y-direction slider 222 cooperates with the Y-direction guide rail 221 and cooperates with the Y-direction mover.部212连接。 Section 212 is connected.

In this embodiment, the Y-direction guide rail 221 is a convex sliding rail structure, which is detachably connected to the support base 1, which facilitates the installation, setting and replacement of the Y-direction guide rail 221. In other embodiments, the Y-direction guide rail 221 may be a groove structure opened on the second mounting surface 13, and the Y-direction slider 222 is slidably connected in the groove structure and can slide along the groove wall of the groove structure.

In some embodiments, the Y-direction movement mechanism 2 further includes a first connecting plate 23, which is disposed above the Y-direction slider 222 and connected to the upper end surface of the Y-direction slider 222. And the first connecting plate 23 is respectively connected with the X-direction movement mechanism 3 and the Y-direction mover portion 212. With the first connecting plate 23, the linear motor 21 can drive the Y-direction slider 222 to move along the Y-direction guide rail 221, and synchronously drive the X-direction movement mechanism 3 to move, thereby improving the compactness of the structure. And since the Y-direction slider 222 is not directly connected to the X-direction moving mechanism 3 and the Y-direction mover part 212, the Y-direction slider 222 can adopt a universal design, which simplifies the design and processing cost of the Y-direction slider 222. It is convenient to repair and replace the Y-direction slider 222. In other embodiments, the Y-direction slider 222 can also be designed to directly connect the Y-direction slider 222 to the X-direction movement mechanism 3 and/or the Y-direction mover portion 212.

In this embodiment, optionally, two Y-direction sliders 222 are provided along the length of the Y-direction guide rail 221, and the upper end surfaces of the two Y-direction sliders 222 are connected to the first connecting plate 23, which is beneficial to improve Y The stability of the movement and the stability of the connection with the X-directional movement mechanism 3.

In this embodiment, the upper end surface of the Y-direction stator portion 211 and the first connecting plate 23 are connected by the fixing member 24, which facilitates the installation and replacement of various components.

Optionally, the Y-direction movement mechanism 2 further includes a Y-direction displacement detection device for detecting the movement displacement of the Y-direction movement mechanism 2 in the Y direction. In this embodiment, the Y-direction displacement detection device can optionally adopt a first grating ruler assembly 25, which includes a first ruler grating 251 and a first grating reading head 252, and the first ruler grating 251 is arranged along the Y direction On the second mounting surface 13, the first grating reading head 252 is connected to the Y-direction mover portion 212 and is arranged directly opposite to the first scale grating 251. In this embodiment, the first scale grating 251 is arranged on the side of the Y-direction guide 221 away from the platen 4, and the first grating reading head 252 is arranged on the fixing member 24. By using a grating ruler to detect the Y-direction displacement, the detection stroke is large, the detection accuracy is high, and the response is fast, which can improve the adjustment accuracy and speed of the Y-direction movement mechanism 2. In other embodiments, a distance sensor, a displacement sensor, etc. may be further used to measure the Y-direction displacement.

Optionally, the Y-direction movement mechanism 2 further includes a Y-direction limiting device for limiting the limit position of the Y-direction movement mechanism 2 moving along both sides of the Y direction, so as to prevent the Y-direction movement mechanism 2 from exceeding the movement range and causing interference with other structures. Interference or collision, improve Y-direction movement mechanism 2 The reliability and safety of the operation.

In this embodiment, the Y-direction limiting device includes a light limiting component 26, and the light limiting component 26 includes a light shielding baffle 262 and two first light sensors 261. The two first light sensors 261 are arranged at intervals along the Y direction, and the first light sensor 261 includes a transmitting part and a receiving part arranged opposite to each other along the X direction. The light-shielding baffle 262 is connected to the first connecting plate 23, and when the Y-direction motion mechanism 2 runs to the extreme positions corresponding to the two first light sensors 261, the light-shielding baffle 262 is located at the corresponding first light sensor. Between the receiving part and the emitting part of the detector 261, the light between the emitting part and the receiving part is shielded.

When there is no obstruction between the transmitting part and the receiving part, the receiving part can receive the optical signal from the transmitting part and output the corresponding level information. When there is a shield between the transmitter and the receiver, the receiver cannot receive or can only receive the light signal from a part of the transmitter, and transmits a signal of a different level than when it is not shielded. Therefore, it can be judged whether there is a light shielding baffle 262 based on the level signal output by the light sensor. When the light shielding baffle 262 is present, that is, the Y-direction motion mechanism 2 runs to the corresponding limit position.

In this embodiment, the optional first light sensor 261 is an interruption type photointerrupter, and its transmitting part and receiving part are integrally arranged on both sides of the housing, and a U-shaped groove is formed. When the 262 extends into the U-shaped groove, it can block the light of the photoelectric interrupter. In other embodiments, the first light sensor 261 may further be a blocking type photoelectric switch or the like.

In this embodiment, the optional first connecting plate 23 is provided with a light shielding baffle 262 on both sides along the Y direction, and each light shielding baffle 262 cooperates with the first light sensor 261 on the corresponding side to achieve the limit position. For detection, the two first light sensors 261 can be installed at both ends of the Y-direction guide rail 221 respectively, and the setting positions of the light shielding baffle 262 and the first light sensor 261 are more intuitive Convenience. In other implementations, only one light-shielding baffle 262 may be provided. At this time, the positions of the two first light sensors 261 move according to the two extreme positions of the Y-direction movement and the light-shielding baffle 262 is on the first connecting plate 23. The location is determined.

In this embodiment, one of the first light sensors 261 is further provided with a zero position light sensor 28 on the side away from the other first light sensor 261 for determining the initial position of the Y-direction movement mechanism 2. Position and reset the Y-direction movement mechanism 2 to improve the movement accuracy of the Y-direction movement mechanism 2.

By setting the first light sensor 261 to detect the motion limit position of the Y-direction motion mechanism 2, the response speed is fast and the accuracy is high, and the motion feedback speed of the Y-direction motion mechanism 2 is improved, which is more conducive to the control speed of the Y-direction motion mechanism 2. And the improvement of control accuracy. In other embodiments, the Y-direction limit component may further be a contact switch, such as a micro switch.

In some embodiments, the Y-direction limiting device further includes a limiting buffer component, and the limiting buffer component includes hydraulic buffers 27 disposed at both ends of the Y-direction guide rail 221. When the Y-direction movement mechanism 2 moves to two extreme positions, the corresponding side of the first connecting plate 23 contacts the corresponding hydraulic shock absorber 27. The setting of the hydraulic buffer 27 can further limit the limit position of the moving part in the Y-direction movement mechanism 2, and can play a buffering effect on the movement of the moving part, and prevent the moving part from becoming rigid with other structures during the movement. Collision, etc., play a protective role for the Y-direction movement mechanism 2 and improve the structural reliability and safety of the Y-direction movement mechanism 2.

Fig. 5 is a schematic structural diagram of the X-direction movement mechanism provided by the first embodiment of the present invention. As shown in Fig. 5, the X-direction movement mechanism 3 is arranged on the Y-direction movement mechanism 2, and is used to realize the movement of the plate bearing table 4 in the X direction. Fine-tuning. The X-direction motion mechanism 3 includes a voice coil motor 31. The X-direction stator portion 312 of the voice coil motor 31 is connected to the first connecting plate 23 of the Y-direction motion mechanism 2. The voice coil The X-direction mover portion 311 of the motor 31 is connected to the plate holder 4. By providing the voice coil motor 31 as the driving unit of the X-direction motion mechanism 3, the volume of the X-direction motion mechanism 3 can be reduced, and the adjustment accuracy of the X-direction motion accuracy can be improved.

In order to facilitate the connection between the voice coil motor 31 and the Y-direction movement mechanism 2 and the plate holder 4, optionally, the X-direction movement mechanism 3 further includes a second connecting plate 33 and a sliding plate 34. The lower surface of the second connecting plate 33 is connected to the first connecting plate 23, and the side of the second connecting plate 33 away from the plate holder 4 is connected to the X-direction stator portion 312 by the first mounting plate 39. The sliding plate 34 is arranged above the second connecting plate 33 and is connected to the X-direction mover portion 311 by the second mounting plate 310. The sliding plate 34 can be driven by the Y-direction mover portion 212 relative to the second connecting plate. 33 slides in the X direction. At the same time, the sliding plate 34 is connected to the plate bearing table 4 so that the X-direction movement of the sliding plate 34 drives the plate bearing table 4 to move in the X direction.

In order to improve the reliability and accuracy of the sliding plate 34 moving in the X direction, an X guide assembly 32 is optionally provided between the sliding plate 34 and the second connecting plate 33. In this embodiment, the X guide assembly 32 includes two pairs of cross roller guide rails 321, and the two pairs of cross roller guide rails 321 are arranged in parallel on both sides of the sliding plate 34 along the Y direction. In some embodiments, one of each pair of cross roller guide rails 321 is connected to the second connecting plate 33 and the other is connected to the sliding plate 34 to improve the guiding stability and accuracy of the X guide assembly 32. In another embodiment, only a pair of cross roller guide rails 321 may be provided in the middle of the sliding plate 34, or only one cross roller guide rail 321 may be provided. In another embodiment, the cooperation of the X-direction linear guide rail and the X-direction sliding block can be further used to realize the sliding guide between the sliding plate 34 and the second connecting plate 33.

In this embodiment, optionally, the X-direction movement mechanism 3 further includes an X-direction displacement detection device. In this embodiment, the X-direction displacement detection device includes a second grating ruler group The second scale grating of the second grating ruler assembly is arranged on the second connecting plate 33 along the X direction, and the second grating reading head 35 of the second grating ruler assembly is connected to the sliding plate 34 and is arranged opposite to the second scale grating . In other embodiments, the X-direction displacement detection device may further be a sensor for distance measurement, such as a distance sensor.

In this embodiment, the X-direction motion mechanism 3 further includes an X-direction limiting device for limiting the limit displacement of the X-direction motion mechanism 3. In this embodiment, the X-limiting device includes a second light sensor 36, the second light sensor 36 is connected to the sliding plate 34, and the side of the second connecting plate 33 facing the sliding plate 34 is provided with a receiving groove , The middle part of the accommodating groove is provided with a light shield, the second light sensor 36 includes a transmitting part and a receiving part which are arranged oppositely, the transmitting part and the receiving part extend into the accommodating groove, and when the X-direction movement mechanism 3 is in the initial state In the state, the light blocking member is located between the emitting part and the receiving part. When the X-direction movement mechanism 3 is at the two extreme positions of the X-direction movement, the light blocking member does not block the light between the emitting part and the receiving part, so that it can The output signal of the second light sensor 36 is used to determine whether the X-direction motion mechanism 3 runs to the limit position. Wherein, the second light sensor 36 may be a photo-interrupter, a photoelectric switch, or the like. In other embodiments, the X-direction limiting device may further be a structure that can be used for limiting and outputting information, such as a contact switch.

In this embodiment, the X limit device further includes a limit post 37 and a limit slot for realizing mechanical limit, one of the sliding plate 34 and the second connecting plate 33 is provided with a limit post 37, and the other One is correspondingly provided with a limit slot, the limit post 37 extends into the limit slot, and the travel distance of the X-direction movement mechanism 3 is limited by the movable distance of the limit post 37 in the limit slot. In other embodiments, the X limit device can further realize the mechanical limit of the two extreme positions of the X-direction motion mechanism 3 in the X direction by using other structures.

In this embodiment, the X-direction movement mechanism 3 further includes a sliding plate 34. The anti-collision structure 38 facing the plate bearing table 4 side. When the sliding plate 34 moves to the limit position in the direction of the plate bearing table 4, the anti-collision structure 38 contacts the plate bearing table 4 to prevent the X-direction movement mechanism 3 Further movement, and avoid the rigid collision of the sliding plate 34 and other structures with the plate bearing platform 4 to cause damage to the plate bearing platform 4 or the sliding plate 34 and other structures, thereby improving the movement reliability and safety of the X-direction motion mechanism 3.

In this embodiment, both sides of the plate bearing table 4 along the X direction are provided with X-direction movement mechanisms 3 to improve the reliability and stability of the plate bearing table 4 moving along the X direction. In order to reduce the cost of the mask stage, in this embodiment, optionally, one of the X-direction motion mechanisms 3 can eliminate the provision of the voice coil motor 31 and the X-direction displacement detection device, and the other structures remain the same.

6 is a schematic diagram of the Rz-direction adjustment of the reticle stage provided in the first embodiment of the present invention, in which (a) in FIG. 6 is a schematic diagram of the structure when the reticle stage is only adjusted in the X direction and/or the Y direction, in FIG. 6 (b) is a schematic diagram of the structure when the mask stage is adjusted in the Rz direction. As shown in Fig. 6, in this embodiment, the X-direction movement mechanism 3 is connected to the Y-direction movement mechanism 2, and the asynchronous movement of the two Y-direction movement mechanisms 2 will cause the two Y-direction movement mechanisms 2 to be arranged respectively. The position of the upper X-direction motion mechanism 3 is misaligned, so that the connecting line of the two X-direction motion mechanisms 3 is inclined relative to the X direction. In order to realize the decoupling of the X-direction movement mechanism 3 and the Y-direction movement mechanism 2, a rotation adjustment assembly is arranged between the X-direction movement mechanism 3 and the Y-direction movement mechanism 2, so that the X-direction movement mechanism 3 is connected to the Y-direction movement mechanism by rotating the adjustment assembly. The movement mechanism 2 can be rotatably connected. Therefore, when the two Y-direction motion mechanisms 2 are used to adjust the plate holder 4 by α degrees in the Rz direction, the X-direction motion mechanism 3 is deflected relative to the Y-direction motion mechanism 2 to make the connection between the two X-direction motion mechanisms 3 It is inclined at an angle of α to the X direction, so that the connection relationship between the X-direction movement mechanism 3 and the plate bearing table 4 remains unchanged, and the X-direction movement mechanism 3 still acts on the plate bearing table 4 in a direction perpendicular to the side of the plate bearing table 4 , Ensure the adjustment accuracy of the X-direction movement mechanism 3.

In this embodiment, the rotation adjustment assembly is a conversion bearing 6. In some embodiments, the first connecting plate 23 is provided with a bearing mounting hole, and the diameter of the bearing mounting hole matches the outer diameter of the outer ring of the conversion bearing 6, so that the outer ring of the conversion bearing 6 is fixedly connected to the first connecting plate 23 , The inner ring of the conversion bearing 6 is connected with the second connecting plate 33, so that the relative rotation between the inner ring and the outer ring of the conversion bearing 6 realizes the rotation of the X-direction motion mechanism 3 relative to the Y-direction motion mechanism 2.

In other embodiments, the first connecting plate 23 and the second connecting plate 33 may also be fixedly connected, that is, there is no relative rotation between the X-direction movement mechanism 3 and the Y-direction movement mechanism 2. At this time, the X-direction motion mechanism 3 and the plate bearing table 4 can be hingedly connected to the plate plate 4 by universal ball hinges or joint bearings, so that the force of the X-direction motion mechanism 3 can be applied to the plate plate 4 vertically. .

In this embodiment, the X-direction movement mechanism 3 is connected by an adapter plate 5. Since one of the two X-direction motion mechanisms 3 can omit the provision of the voice coil motor 31, etc., the upper end surfaces of the two X-direction motion mechanisms 3 are not on the same plane. In order to solve the problem that the two X-direction motion mechanisms 3 are in the Z-direction For the problem of equal height, the adapter plate 5 can be selected as a reed structure, and the rigidity of the reed structure in the Ry direction is low, and the rigidity in the X direction and Rz direction is higher, so that the reed structure can occur around the Y direction. Certain bending deformation, while maintaining the connection relationship with the X-direction motion mechanism 3 in the X direction and the Rz direction.

Fig. 7 is a schematic diagram of the structure of the adapter plate provided in the first embodiment of the present invention. As shown in Fig. 7, the adapter can adopt any of the structures shown in Fig. 7 (a), (b) or (c). In Figure 7 (a), the reed structure includes a plate-shaped body portion 51 and spaced apart along the X direction of the body portion 51 The thickness of the reinforcement 53 is greater than the thickness of the main body 51, so that the rigidity in the X direction and the Rz direction is increased, and the rigidity in the Ry direction is reduced. In Fig. 7(b), the length of the reed structure in the X direction is greater than its length in the Y direction, and the thickness at both ends of the reed structure in the X direction is greater than the thickness of the middle part to reduce the rigidity in the Ry direction. In Figure 7(c), the main body portion 51 of the reed structure is a sheet-like structure with a thickness of about 1mm. A 304 stainless steel sheet metal can be selected, and the two sides of the reed structure along the X direction are connected with reinforcing plates 52 , To enhance the strength in the X and Y directions. This embodiment only provides an exemplary structure of the adapter plate 5, and the adapter plate 5 may further be other structures with less rigidity in the Ry direction and greater rigidity in the X direction and Rz direction.

FIG. 8 is a schematic diagram of the front structure of the plate plate provided in the first embodiment of the present invention, and FIG. 9 is a schematic diagram of the back structure of the plate plate provided in the first embodiment of the present invention. As shown in Figures 8 and 9, in this embodiment, the middle of the plate table 4 is provided with a light-transmitting through hole 47 for the optical path of the objective lens, and the upper end surface of the plate table 4 is provided with a carrier for carrying the mask plate. The boss 41, and the plate-bearing platform 4 and the bearing boss 41 are an integrated structure. In this embodiment, the light-transmitting through hole 47 is a rectangular hole, and two supporting bosses 41 are respectively provided on the two sides of the light-transmitting through hole 47 along the Y direction to improve the stability of carrying the photomask. In other embodiments, the position setting and number setting of the bearing boss 41 can be set according to requirements.

Optionally, in this embodiment, the plate bearing platform 4 has an air-foot structure as a whole, the upper end surface of the bearing boss 41 is provided with a suction vacuum chamber 411, and the plate bearing platform 4 is provided with a first suction air passage, and each bearing boss The adsorption vacuum chambers 411 on 41 are all connected with the first adsorption air passage, and the first adsorption air passage is connected with a vacuuming device. When the mask plate is placed on the plate holder 4 and mounted on the bearing boss 41, by means of a vacuum device, the air between the mask plate and the bearing boss 41 is absorbed by the vacuum chamber 411 and the first suction The air passage is emptied, so as to realize the bearing boss 41 and the plate bearing 4 The close suction between the two can realize the fixation of the mask plate on the plate bearing table 4.

In this embodiment, the lower end surface of the plate bearing table 4 is provided with an air floating hole 421, and the inside of the plate bearing table 4 is further provided with an air-filling channel, the air-filling channel is connected with the air floating hole 421, and the air-filling channel is arranged outside the plate 4 The inflator is connected. When the inflator is inflated into the plate table 4 through the inflatable channel, the air flow is discharged between the plate table 4 and the support base 1 through the air floating holes 421, so that a layer of air mold is formed between the plate table 4 and the support base 1. , The plate bearing table 4 can float on the supporting base 1 to the top under the action of the air mold, reducing the contact friction force between the plate bearing table 4 and the supporting base 1, thereby improving the X-direction movement mechanism 3 and the Y-direction movement mechanism 2 The load is increased, and the movement speed and movement accuracy of the plate table 4 are improved.

In this embodiment, the plate bearing platform 4 is provided with an air floating hole 421 at least near each top corner of its bottom surface. Optionally, the air flotation holes 421 located on the same side are symmetrical with respect to the vertical line of the side, so as to realize the stable support of the plate bearing table 4 under the action of air flotation. In other embodiments, each side of the bottom surface of the plate bearing table 4 may further be provided with three or more air floating holes 421.

In this embodiment, the lower end surface of the plate bearing platform 4 is provided with an air bearing boss 42. The surface of the air bearing boss 42 protrudes from the lower surface of the plate bearing platform 4, and the end faces of all the air bearing bosses 42 are located on the same plane. Above, the air flotation hole 421 is opened on the air flotation boss 42. In order to reduce the processing difficulty of the plate bearing table 4 and the supporting base 1, the flatness of the end surface of the air floatation boss 42 is improved, and at the same time, the gas flow required for air floatation is reduced.

Optionally, in this embodiment, the bottom surface of the plate bearing platform 4 is further provided with a preloading boss 43, and the end surface of the preloading boss 43 is parallel to the end surface of the air bearing boss 42. The preloading boss 43 is provided with a preloading vacuum chamber 431, a second adsorption air passage is arranged inside the plate bearing table 4, and the second adsorption air passage is respectively connected to the preloading vacuum chamber 431 and a vacuuming device arranged outside the plate bearing table 4. borrow With the vacuum device, the gas between the supporting base 1 and the preloading boss 43 can be evacuated through the preloading vacuum chamber 431 and the second adsorption air passage to realize the gas adsorption between the preloading boss 43 and the supporting base 1 , So as to realize the stable connection between the supporting base 1 and the plate bearing platform 4, avoid the plate bearing platform 4 from moving during the process of loading and unloading the photomask plate, and ensure the smooth transfer of the photomask plate.

In this embodiment, a preloading boss 43 is provided on both sides of each air bearing boss 42 to facilitate effective air evacuation between the contact surface of the plate bearing table 4 and the supporting base 1. In other embodiments, the position and number of the air floating boss 42 can be set according to actual needs.

In this embodiment, a gas path adapter block 44 is further provided on one side of the plate bearing table 4, and the gas path adapter block 44 is respectively provided with a gas path connector 441 corresponding to the first adsorption air channel, the second inflation air channel, and the inflation air channel. It is used to realize the connection between the first adsorption air passage, the second inflation air passage and the inflation air passage inside the plate 4 and the vacuum device or the inflation device.

It should be noted that opening an adsorption air channel or vacuum air channel in the air foot is a conventional technical means in the art, and will not be repeated in this embodiment.

This embodiment further provides a lithography system, including the above-mentioned mask stage.

Example two

This embodiment provides a photomask table, which includes a supporting base 1, an X-direction movement mechanism 3, a Y-direction movement mechanism 2, and a plate-bearing platform 4, and the like. Compared with the reticle stage provided in the first embodiment, the support base 1, the X-direction movement mechanism 3, and the Y-direction movement mechanism 2 of the reticle stage provided in this embodiment are all the same as those in the reticle stage of the embodiment. The difference lies in the structure of the plate bearing table 4 of the photomask table provided in this embodiment and the plate bearing table 4 of the first embodiment.

Figure 10 is a schematic diagram of the structure of the plate bearing table and the supporting base provided by an embodiment of the present invention Fig. 11 is a schematic diagram of the reverse structure of the plate bearing table provided by an embodiment of the present invention. As shown in Figs. 10 and 11, unlike the first embodiment, the plate bearing table 4 provided in this embodiment has a non-air-footed structure. An air floatation pad 45 is provided at the bottom of the plate bearing table 4, and the air floatation pad 45 is provided separately from the plate bearing table 4, and is connected by bonding or hot pressing. The end surface of the air cushion 45 is provided with an air outlet 451, and an air passage communicating with the air outlet 451 is provided inside the air cushion 45, and the air passage is further connected to an external inflator. By arranging the air bearing pad 45 connected to the plate bearing table 4, it is possible to avoid the opening of an inflatable channel for the air flotation hole 421 inside the plate bearing table 4 to vent air, simplify the processing of the plate bearing table 4, and can apply general commercial air bearing Pad 45 to reduce cost. In this embodiment, the air floatation pads 45 are arranged at least near the four corners of the bottom of the plate bearing table 4, and the two air floatation pads 45 on the same side are arranged symmetrically with respect to the vertical line of the side.

In some embodiments, a magnetic preload component is further provided between the plate bearing table 4 and the support base 1, and the magnetic preload component includes an electromagnet 46 and a metal piece 15. In this embodiment, the electromagnet 46 is arranged on the bottom surface of the plate bearing table 4, and the metal piece 15 is arranged on the support base 1 at a position corresponding to the electromagnet 46. The electromagnet 46 is energized, and the connection between the plate bearing table 4 and the supporting base 1 is realized by the magnetic attraction effect of the electromagnet 46 on the metal piece 15. And because the metal piece 15 is arranged on the support base 1, the long metal piece 15 can be arranged and the metal piece 15 is arranged along the Y direction, so that the end surface of the metal piece 15 can be used as the preload surface and the air float at the same time. Guide surface. In other implementations, it is also possible that the metal piece 15 is arranged on the bottom of the plate bearing table 4 and the electromagnet 46 is arranged on the supporting base 1.

In this embodiment, an electromagnet 46 is provided on both sides of each air bearing pad 45 to realize a stable connection between the plate bearing table 4 and the supporting base 1 to ensure the stability of the upper and lower plates of the mask plate. Sex.

Other structures of the mask stage provided in this embodiment can be configured with reference to the first embodiment, which will not be described in detail in this embodiment.

This embodiment further provides a lithography system, including the above-mentioned mask stage.

1: Support base

2: Y-direction movement mechanism

3: X-direction movement mechanism

4: plate platform

5: Adapter board

13: The second mounting surface

14: Third mounting surface

121: The first mounting surface

Claims (20)

A photomask table, which is characterized by comprising: a supporting base (1); a plate bearing table (4), which is slidably connected to the upper end surface of the aforementioned supporting base (1); and two sets of Y-direction movement mechanisms (2) are arranged On the aforementioned support base (1), and the two groups of the aforementioned Y-direction movement mechanisms (2) are respectively arranged on both sides of the aforementioned plate-plate (4) along the X direction; the X-direction movement mechanism (3) is arranged on the aforementioned Y-direction The movement mechanism (2) is connected to the plate bearing platform (4), the Y-direction movement mechanism (2) drives the X-direction movement mechanism (3) to move in the Y direction, and the Y direction is perpendicular to the X direction; wherein, The aforementioned X-direction movement mechanism (3) and the aforementioned Y-direction movement mechanism (2) are connected by a rotating adjustment assembly. As described in the first item of the scope of patent application, the support base (1) has a first mounting surface (121) and a second mounting surface (13), the first mounting surface (121) and the first mounting surface (121) The two mounting surfaces (13) are both parallel to the plane formed by the X direction and the Y direction, the first mounting surface (121) is higher than the second mounting surface (13), and the plate table (4) is set on the first On the mounting surface (121), the Y-direction movement mechanism (2) is arranged on the second mounting surface (13). As described in the first item of the scope of the patent application, the rotation adjustment assembly includes a conversion bearing (6), one of the X-direction motion mechanism (3) and the Y-direction motion mechanism (2) is combined with the foregoing conversion The inner ring of the bearing (6) is connected, and the other is connected to the outer ring of the aforementioned conversion bearing (6). The axis of the aforementioned conversion bearing (6) is perpendicular to the aforementioned X direction and the aforementioned Y direction, respectively. straight. As described in the second item of the patent application, the Y-direction motion mechanism (2) includes a linear motor (21), and the Y-direction stator part (211) of the linear motor (21) is connected to the support The side surface of the base (1) is arranged along the aforementioned Y direction, and the Y-direction mover part (212) of the aforementioned linear motor (21) is connected with the aforementioned X-direction movement mechanism (3). As described in item 4 of the scope of patent application, the aforementioned Y-direction movement mechanism (2) further comprises: a Y-direction guide rail (221) arranged on the aforementioned second mounting surface (13) along the aforementioned Y direction; The Y-direction slider (222) is slidably connected to the Y-direction guide rail (221), and the Y-direction slider (222) is connected to the Y-direction mover part (212). As described in item 5 of the scope of patent application, the aforementioned Y-direction movement mechanism (2) further includes: a first connecting plate (23), the lower end of which is connected to the aforementioned Y-direction slider (222), which The upper end surface is connected with the aforementioned X-direction movement mechanism (3). As described in item 4 of the scope of patent application, the Y-direction movement mechanism (2) further includes: a Y-direction displacement detection device for detecting the movement of the Y-direction movement mechanism (2) in the aforementioned Y direction Displacement; and/or Y-direction limiting device, arranged on the aforementioned second mounting surface (13), used to limit the limit displacement of the aforementioned Y-direction motion mechanism (2). Such as the mask stage described in item 7 of the scope of patent application, in which the Y-direction displacement detection device mentioned above A first grating ruler assembly (25) is included, and the first grating ruler assembly (25) includes: a first ruler grating (251) arranged on the second mounting surface (13) along the Y direction; a first grating reading head (252), it is arranged facing the aforementioned first scale grating (251) and connected with the aforementioned Y-direction mover part (212); the aforementioned Y-direction limiter includes an optical limit component (26) and/or a limit buffer component, The aforementioned limit buffer assembly includes hydraulic buffers (27) arranged at two extreme positions of the aforementioned Y-direction movement mechanism (2), and the aforementioned optical limit assembly (26) includes: two first light sensors (261) , Arranged at intervals along the Y-direction, the first light sensor (261) includes a transmitting part and a receiving part oppositely arranged along the X-direction; the light shielding baffle (262) is connected to the Y-direction mover part (212) The aforementioned light shielding baffle (262) can extend between the aforementioned emitting portion and the aforementioned receiving portion to block the transmission of light between the aforementioned emitting portion and the aforementioned receiving portion. As described in the first item of the scope of patent application, the X-direction movement mechanism (3) includes a voice coil motor (31), the X-direction stator part (312) of the voice coil motor (31) and the foregoing The Y-direction movement mechanism (2) is connected, and the X-direction mover part (311) of the voice coil motor (31) is connected to the plate plate (4). The mask stage described in item 9 of the scope of patent application, wherein the X-direction movement mechanism (3) includes: an X-direction displacement detection device for detecting the displacement of the X-direction movement mechanism (3) in the aforementioned X direction ; And/or X-direction limiting device for limiting the limit displacement of the aforementioned X-direction motion mechanism (3). As described in item 9 of the scope of patent application, the aforementioned X-direction movement mechanism (3) further includes: a second connecting plate (33) which is respectively connected to the aforementioned Y-direction movement mechanism (2) and the aforementioned X-direction stator Part (312) is connected; the sliding plate (34) is slidably connected with the aforementioned second connecting plate (33), and can slide in the aforementioned X direction relative to the aforementioned second connecting plate (33), the aforementioned sliding plates (34) are respectively It is connected with the mover part and the plate bearing platform (4). As described in item 11 of the scope of patent application, the aforementioned X-direction movement mechanism (3) further comprises: an X guide assembly (32), which is arranged on the aforementioned second connecting plate (33) and the aforementioned X-direction along the aforementioned X-direction. Between the sliding plates (34). As described in item 12 of the scope of patent application, the aforementioned X guide assembly (32) includes: at least a pair of cross roller guides (321) arranged in parallel, and a pair of the aforementioned cross roller guides (321) One of them is connected with the aforementioned second connecting plate (33), and the other is connected with the aforementioned sliding plate (34). The mask stage described in item 1 of the scope of patent application, wherein the mask stage further includes: an adapter, and the X-direction movement mechanism (3) is connected to the plate stage (4) by the adapter The stiffness of the adapter in the Y direction is lower than the stiffness of the adapter in the X and Rz directions. Such as the mask table described in item 1 of the scope of patent application, wherein the upper part of the aforementioned plate table (4) An adsorption vacuum chamber (411) is opened on the end surface, a first adsorption air passage is opened inside the plate plate (4), and the first adsorption air passage is respectively connected with the adsorption vacuum chamber (411) and a vacuum device. For example, the mask table described in item 15 of the scope of patent application, wherein the lower end surface of the plate bearing table (4) is provided with an air floating hole (421), and the inside of the plate bearing table (4) is provided with an inflatable channel. They are respectively connected with the aforementioned air flotation hole (421) and the inflator. For example, the mask stage described in item 16 of the scope of patent application, wherein a preload vacuum chamber (431) is opened on the lower end surface of the plate table (4), and a second suction channel is opened inside the plate table (4), The aforementioned second adsorption channel is respectively connected with the aforementioned preload vacuum chamber (431) and the aforementioned vacuum device. For example, the mask stage described in item 1 of the scope of patent application, wherein the lower end surface of the plate table (4) is provided with an air floatation cushion (45), the air floatation cushion (45) is provided with an air passage, and the air floatation The lower end surface of the cushion (45) is provided with an air outlet (451) communicating with the aforementioned air passage, and the aforementioned air floating cushion (45) is connected with a vacuuming device. As described in item 1 of the scope of patent application, a magnetic preload assembly is provided between the plate table (4) and the support base (1), and the magnetic preload assembly includes an electromagnet (46) And metal parts (15), one of the plate table (4) and the supporting base (1) is provided with the electromagnet (46), the other is provided with the metal part (15), and the electromagnet (46) ) Is arranged directly opposite to the aforementioned metal piece (15). A photolithography system characterized by including a mask stage as described in any one of items 1 to 19 in the scope of the patent application.

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