TWI721417B - Treatment liquid discharging device, treatment liquid discharging method, substrate processing device, and on-off valve adjustment method - Google Patents

Abstract

The treatment liquid ejection device (1) is provided with: a judging section (12) for judging the closing speed of the opening and closing valve (72), the opening and closing valve (72) is used to open and close the nozzle (251) to supply the treatment liquid The liquid supply flow path; and the imaging unit (65), when the on-off valve (72) closes the processing liquid supply flow path and stops ejecting the processing liquid from the nozzle (251), the nozzle (251) is photographed from a direction different from the ejection direction The flow path of the tip portion of the nozzle (251) and the ejection path of the processing liquid extending forward along the ejection direction of the processing liquid from the tip of the nozzle (251); the determination section (12) is based on the nozzle (251) photographed by the imaging section (65) The flow path of the tip of the nozzle (251) in the original image of the ejection path and the image of the ejection path are subjected to a predetermined determination process to determine whether the closing speed of the on-off valve (72) is appropriate or Whether it is slower or faster than the appropriate speed is a distinction between the locking speed of the on-off valve (72).

Description

Processing liquid ejection device, processing liquid ejection method, substrate processing device, and opening and closing Valve adjustment method

The present invention relates to a technique for determining the closing speed of an opening and closing valve for opening and closing a supply flow path of a treatment liquid, and a technique for discharging the treatment liquid.

Patent Document 1 discloses a coating liquid supply device that supplies a coating liquid such as a photoresist liquid to a substrate from a nozzle, and forms a coating film on the substrate. The coating liquid supply device opens and closes a gas valve provided in a coating liquid supply pipe connected to the nozzle, thereby performing supply of the coating liquid from the nozzle and stopping the supply of the coating liquid from the nozzle. In the coating process of the coating liquid, when uneven coating of the coating liquid occurs on the substrate, the film thickness becomes uneven, which adversely affects the subsequent steps.

In this coating liquid supply device, when the gas valve is closed at a certain locking speed while the coating liquid is being supplied from the nozzle, the spray width of the coating liquid is gradually narrowed in accordance with the closing speed of the gas valve. Finally, the coating liquid is cut off at a certain position between the tip of the nozzle and the substrate. The liquid cut-off position is changed according to the closing speed of the gas valve.

The coating liquid supply device sucks back and sucks the coating liquid above the liquid cutoff position back to the nozzle. The coating liquid below the liquid shutoff position faces the surface of the substrate, becomes a thin line, and drops. In addition, multiple drops are generated in the cut-off part of the coating liquid It drops and falls to the substrate more slowly than a thin linear coating liquid.

In this coating liquid supply device, the occurrence of uneven coating is related to the height of the liquid cutoff position and is not related to the occurrence of droplets. Therefore, the coating liquid supply device uses a camera to photograph and detect the liquid cutoff position between the nozzle tip and the substrate, and adjust the closing speed of the gas valve so that the liquid cutoff position exists in a range where coating unevenness does not occur, thereby Seek to prevent uneven coating.

[Prior Technical Literature]

[Patent Literature]

Patent Document 1: Japanese Patent Application Laid-Open No. 2000-82646.

However, in the coating liquid supply device of Patent Document 1, since the closing speed of the gas valve is adjusted in accordance with the liquid shutoff position, the closing speed of the gas valve becomes too slow, and after the closing of the gas valve, it temporarily continues intermittently. Falling droplets may cause uneven coating. In addition, in the coating liquid supply device, as a result of the adjustment, the closing speed of the gas valve will become faster, and because the so-called water hammer produces on the tip of the nozzle except for the tip that has adhered to the nozzle. There is no area outside of the droplets on the inner wall surface, and the droplets that have adhered to the inner wall surface may fall onto the substrate and cause uneven coating. That is, in the coating liquid supply device, there is a distinction that the closing speed of the opening and closing valve cannot be accurately determined whether the closing speed of the opening and closing valve is appropriate or whether it is too fast or too slow.

The present invention was developed to solve such a problem, and its object is to provide a method that can improve the accuracy of the determination of the closing speed of the on-off valve installed in the processing liquid supply piping connected to the nozzle.

In order to solve the above-mentioned problems, the processing liquid ejection device of the first aspect is used to eject the processing liquid from the nozzle, and is provided with: a judging section for judging the closing speed of the opening and closing valve, and the opening and closing valve is used for supplying processing to the nozzle The processing liquid supply flow path of the liquid is opened and closed; and the imaging part is used to photograph the tip of the nozzle from a direction different from the ejection direction when the opening and closing valve closes the processing liquid supply flow path and stops ejecting the processing liquid from the nozzle The flow path of the nozzle and the ejection path of the processing liquid extending forward along the ejection direction of the processing liquid from the tip of the nozzle; the determination unit is based on the flow path and the ejection path of the tip of the nozzle photographed by the imaging section In the original image, the flow path of the nozzle tip and the image of the ejection path are subjected to a predetermined determination process to determine whether the closing speed of the opening and closing valve is appropriate or whether it is slower or faster than the appropriate speed. Distinguish the locking speed of the on-off valve.

The processing liquid ejection device of the second aspect is that in the processing liquid ejection device of the first aspect, the determination unit is provided with: a feature quantity calculation unit for the flow path between the original image and the tip of the nozzle Corresponding to the first image of the first image area and the image of each of the second image of the second image area corresponding to the ejection path, calculate the difference between the processing liquid in each of the first image and the second image. A predetermined feature amount corresponding to the area of the image; and a predetermined basic determination unit that applies a predetermined determination rule to the feature amount of the first image and the feature amount of the second image, thereby determining the closure of the opening and closing valve The aforementioned distinction of speed.

The processing liquid ejection device of the third aspect is that in the processing liquid ejection device of the second aspect, the end of the first image region on the downstream side of the ejection direction of the processing liquid is separated from the tip of the nozzle to the The upstream side of the discharge direction of the treatment liquid.

The processing liquid ejection device of the fourth aspect is that in the processing liquid ejection device of the second aspect or the third aspect, the aforementioned determination rule is the following rule: when the flow path at the tip of the aforementioned nozzle is not in a liquid-tight state , It is determined that the locking speed of the aforementioned opening and closing valve is too fast; when the front of the aforementioned nozzle When the flow path at the end is in a liquid-tight state and the processing liquid exists in the ejection path, it is determined that the closing speed of the on-off valve is too slow.

The processing liquid ejection device of the fifth aspect is that in the processing liquid ejection device of the first aspect, the judging unit is provided with a classifier, and the classification of the closing speed of the opening and closing valve is judged by the classifier. It is used to determine whether the closing speed of the opening and closing valve is appropriate or whether it is slower or faster than the appropriate speed based on the flow path of the nozzle tip and the image of the ejection path in the original image. The classification of the blocking speed: The classifier is generated by mechanical learning in advance using the flow path of the nozzle tip and the sampling image of the ejection path in the original image.

The processing liquid ejection device of the sixth aspect is that in the processing liquid ejection device of the fifth aspect, the classifier is based on the first image area in the original image corresponding to the flow path at the tip of the nozzle. The image and the image of each of the second image in the second image area corresponding to the ejection path determine the distinction of the locking speed of the opening and closing valve; the classifier uses the sampling of each of the first image and the second image The image is generated by mechanical learning in advance.

The processing liquid ejection device of the seventh aspect is that in the processing liquid ejection device of the sixth aspect, the end of the first image area on the downstream side of the ejection direction of the processing liquid is separated from the tip of the nozzle to the The upstream side of the discharge direction of the treatment liquid.

The processing liquid ejection device of the eighth aspect is the processing liquid ejection device of any one of the first aspect to the seventh aspect, and the imaging unit is in the on-off valve to block and stop the processing liquid supply flow path. After the treatment liquid is sprayed from the nozzle, the flow path at the tip of the nozzle and the spray path of the treatment liquid extending forward from the tip of the nozzle along the spraying direction of the treatment liquid are photographed in time sequence; The device system is further provided with: an image generating unit based on the flow path and the ejection path of the tip of the nozzle photographed by the photographing unit The time series image generates derivative images of the flow path at the tip of the nozzle and the ejection path; the determination unit determines the distinction of the closing speed of the on-off valve based on the derivative image generated by the image generation unit.

The processing liquid ejection device of the ninth aspect is the processing liquid ejection device of any one of the first aspect to the eighth aspect, and further includes: a pipe connecting the processing liquid supply source and the aforementioned nozzle, and The processing liquid supplied by the processing liquid supply source is guided to the nozzle; and a driving mechanism for opening and closing the opening and closing valve; the opening and closing valve is provided in the middle of the path of the piping; the processing liquid ejection device is further provided with : The locking speed adjusting unit adjusts the operation of the driving mechanism so that the locking speed becomes an appropriate speed based on the classification of the closing speed of the on-off valve determined by the determining unit.

The processing liquid ejection device of the tenth aspect is that in the processing liquid ejection device of the ninth aspect, the on-off valve is a gas valve that is supplied with a predetermined gas and performs a blocking operation at a blocking speed corresponding to the supply flow rate of the gas The drive mechanism is provided with: a gas supply source, which supplies the gas to the gas valve; a gas supply pipe, which connects the gas supply source and the gas valve; a solenoid valve, which is installed in the gas supply pipe for The gas flow path in the gas supply pipe is opened and closed; and a motor-driven needle valve is installed in the gas supply pipe to control the gas flowing in the gas supply pipe according to the degree of opening The flow rate; the locking speed adjusting unit adjusts the opening degree of the motor-driven needle valve in such a way that the locking speed of the gas valve becomes an appropriate speed.

The processing liquid ejection device of the eleventh aspect is that in the processing liquid ejection device of the ninth aspect, the on-off valve is a gas valve, which is supplied with a predetermined gas and is blocked at a blocking speed corresponding to the supply flow rate of the gas Operation; the drive mechanism is provided with: a gas supply source, which supplies the gas to the gas valve; a gas supply pipe, which connects the gas supply source and the gas valve; and an electric pneumatic regulator, which is set It is placed in the gas supply piping and controls the opening and closing of the flow path and flow rate of the gas flowing in the gas supply piping in accordance with the voltage; the locking speed adjusting unit adjusts the locking speed of the gas valve to an appropriate speed The degree of openness of the electro-pneumatic regulator.

The processing liquid ejection device of the twelfth aspect is the processing liquid ejection device of the ninth aspect. The opening and closing valve is a motor valve for opening and closing at a speed corresponding to the number of rotations of the motor, and includes: The main body is provided in the middle of the path of the piping; and a motor that opens and closes the valve body; the drive mechanism is provided with the motor; the locking speed adjusting unit is such that the locking speed of the motor valve becomes an appropriate speed Adjust the movement of the aforementioned motor.

The processing liquid ejection device of the thirteenth aspect is the processing liquid ejection device of the tenth aspect, and further includes: an opening and closing sensor that detects the opening and closing of the gas valve; and a timing adjustment unit that is attached to the solenoid valve After performing the action of setting the gas valve to the closed state, the delay time until the gas valve is actually closed is measured based on the output of the opening and closing sensor, and the gas valve is closed at a predetermined timing according to the measurement result Adjust the timing of the operation for the solenoid valve to set the gas valve to the closed state.

The fourteenth aspect of the judging device is for judging the stop state of the processing liquid ejected from the nozzle, and is provided with: an imaging section for opening and closing the processing liquid supply flow path for supplying the processing liquid to the nozzle When the valve closes the process liquid supply flow path and stops ejecting the process liquid from the nozzle, the flow path at the tip of the nozzle is photographed from a direction different from the ejection direction, and from the tip of the nozzle toward the front along the ejection direction of the process liquid The extended ejection path of the processing liquid; and the judging section, based on the flow path of the nozzle tip and the ejection path in the original image of the nozzle shot by the imaging section. The image of the above-mentioned opening and closing valve is subjected to a predetermined determination process to determine whether the closing speed of the opening and closing valve is appropriate or whether it is slower or faster than the appropriate speed. This area of the closing speed of the opening and closing valve Minute.

The processing liquid ejection method of the fifteenth aspect is for ejecting the processing liquid from the nozzle, and is provided with: a judging step of judging the closing speed of the opening and closing valve, and the opening and closing valve is used to supply the processing liquid to the nozzle The supply flow path is opened and closed; and the photographing step is to photograph the flow path at the tip of the nozzle and the flow path along the tip of the nozzle when the on-off valve closes the processing liquid supply flow path and stops spraying the processing liquid from the nozzle The ejection path of the processing liquid extending forward in the ejection direction of the processing liquid; the foregoing determination step is based on the flow path of the tip of the nozzle captured in the foregoing shooting step and the tip of the nozzle in the original image of the ejection path The image of the flow path of the part and the ejection path is subjected to a predetermined determination process to determine whether the closing speed of the opening and closing valve is appropriate, or whether the closing speed of the opening and closing valve is slower or faster than an appropriate speed, which distinguishes the closing speed of the opening and closing valve.

The processing liquid ejection method of the sixteenth aspect is that in the processing liquid ejection method of the fifteenth aspect, the aforementioned determination step is provided with: a feature quantity calculation step for the difference between the original image and the tip of the nozzle The first image of the first image area corresponding to the flow path and the image of the second image of the second image area corresponding to the ejection path are calculated, and the processing in each of the first image and the second image is calculated The predetermined feature quantity corresponding to the area of the liquid image; and the predetermined basic determination step is to apply a predetermined determination rule to the feature quantity of the first image and the feature quantity of the second image, thereby determining the opening and closing valve The aforementioned distinction of the locking speed.

The processing liquid ejection method of the seventeenth aspect is that in the processing liquid ejection method of the sixteenth aspect, the end of the first image area on the downstream side of the ejection direction of the processing liquid is separated from the tip of the nozzle To the upstream side of the ejection direction of the processing liquid.

The processing liquid ejection method of the eighteenth aspect is that in the processing liquid ejection method of the sixteenth aspect or the seventeenth aspect, the aforementioned determination rule is the following rule: when the tip of the aforementioned nozzle When the flow path of the nozzle is not in a liquid-tight state, it is determined that the closing speed of the on-off valve is too fast; when the flow path at the tip of the nozzle is in a liquid-tight state and the processing liquid is present in the ejection path, it is determined as the aforementioned The closing speed of the on-off valve is too slow.

The processing liquid ejection method of the nineteenth aspect is that in the processing liquid ejection method of the fifteenth aspect, the aforementioned determination step is a step of judging the closing speed of the opening and closing valve by a classifier, and the aforementioned classifier is based on the aforementioned In the original image, the flow path at the tip of the nozzle and the image of the ejection path determine whether the closing speed of the opening and closing valve is appropriate or whether it is slower or faster than the appropriate speed. This distinguishes the closing speed of the opening and closing valve; The classifier is generated by mechanical learning in advance using the flow path at the tip of the nozzle in the original image and the sampling image of the image of the ejection path.

The processing liquid ejection method of the twentieth aspect is that in the processing liquid ejection method of the nineteenth aspect, the classifier is based on the first image area in the original image corresponding to the flow path at the tip of the nozzle The first image and the second image in the second image area corresponding to the ejection path are used to determine the distinction of the closing speed of the opening and closing valve; the classifier uses each of the first image and the second image The sampled image of is generated in advance by mechanical learning.

The processing liquid ejection method of the twenty-first aspect is that in the processing liquid ejection method of the twentieth aspect, the end of the first image area on the downstream side of the ejection direction of the processing liquid is from the tip of the nozzle It leaves to the upstream side of the ejection direction of the processing liquid.

The processing liquid ejection method of the twenty-second aspect is the processing liquid ejection method of any one of the fifteenth aspect to the twenty-first aspect, the aforementioned photographing step is the following step: After the process liquid supply flow path is blocked and the ejection of the process liquid from the nozzle is stopped, the flow path at the tip of the nozzle and the process that extends forward from the tip of the nozzle in the ejection direction of the process liquid are sequentially photographed in time. The jetting path of the liquid; the aforementioned processing liquid jetting method is It is further provided with: an image generation step of generating a derivative of the flow path of the nozzle tip portion and the ejection path based on the time series image of the flow path of the nozzle tip portion and the ejection path taken in the foregoing imaging step Image; the foregoing determination step is the following step: based on the foregoing derivative image generated in the foregoing image generation step, determine the distinction of the locking speed of the opening and closing valve.

The processing liquid ejection method of the twenty-third aspect is the processing liquid ejection method in the processing liquid ejection device, and is provided with any one of the fifteenth aspect to the twenty-second aspect; The processing liquid ejection device is provided with: piping that connects the processing liquid supply source and the nozzle, and guides the processing liquid supplied from the processing liquid supply source to the nozzle; and a driving mechanism that opens and closes the opening and closing valve Operation; the opening and closing valve is provided in the middle of the path of the piping; the treatment liquid spraying method further includes: a locking speed adjustment step is based on the classification of the locking speed of the opening and closing valve determined in the judgment step, and the locking is The operation of the aforementioned driving mechanism is adjusted in such a way that the speed becomes an appropriate speed.

The processing liquid ejection method of the twenty-fourth aspect is that in the processing liquid ejection method of the twenty-third aspect, the on-off valve is a gas valve, which is supplied with a predetermined gas, and is blocked in response to the supply flow rate of the gas The speed is blocked; the drive mechanism is equipped with: a gas supply source, which supplies the gas to the gas valve; a gas supply pipe, which connects the gas supply source and the gas valve; and a solenoid valve, which is installed in the gas supply pipe , Used to open and close the flow path of the gas in the gas supply pipe; and a motor-driven needle valve is installed in the gas supply pipe to control the gas flowing in the gas supply pipe according to the degree of opening The flow rate; the locking speed adjustment step is a step of adjusting the opening degree of the motor-driven needle valve in such a way that the locking speed of the gas valve becomes an appropriate speed.

The processing liquid ejection method of the twenty-fifth aspect is that in the processing liquid ejection method of the twenty-third aspect, the aforementioned on-off valve is a gas valve, which is supplied with a predetermined gas and responds to the previous The lock speed of the gas supply flow rate performs a lock operation; the drive mechanism is provided with: a gas supply source, which supplies the gas to the gas valve; a gas supply pipe, which connects the gas supply source and the gas valve; and electro-pneumatic The regulator is installed in the gas supply piping and controls the opening and closing and flow rate of the flow path of the gas flowing in the gas supply piping according to the voltage; the locking speed adjustment step is to make the closing speed of the gas valve into an appropriate speed The way to adjust the opening degree of the aforementioned electro-pneumatic regulator.

The processing liquid ejection method of the twenty-sixth aspect is that in the processing liquid ejection device of the twenty-third aspect, the above-mentioned on-off valve is a motor valve that opens and closes at a speed corresponding to the number of rotations of the motor, and includes There are: the valve body is installed in the middle of the path of the piping; and the motor is to open and close the valve body; the driving mechanism is equipped with the motor; the locking speed adjustment step is to make the locking speed of the motor valve appropriate The step of adjusting the movement of the aforementioned motor by means of speed.

The processing liquid ejection method of the twenty-seventh aspect is the processing liquid ejection method of the twenty-fourth aspect, further comprising: an opening and closing detection step, which detects the opening and closing of the gas valve; and a timing adjustment step, which is described above After the solenoid valve performs the action of setting the gas valve to the closed state, the delay time until the gas valve is actually closed is measured based on the opening degree of the gas valve detected in the opening and closing detection step, and the gas valve is preset According to the measurement results, adjust the timing of the action for the solenoid valve to set the gas valve to the closed state according to the measurement result.

The twenty-eighth aspect of the judging method is for judging the stop state of the processing liquid ejected from the nozzle, and includes: a photographing step for opening and closing the processing liquid supply flow path for supplying the processing liquid to the nozzle When the on-off valve closes the process liquid supply flow path and stops ejecting the process liquid from the nozzle, the flow path at the tip of the nozzle is photographed from a direction different from the ejection direction, and the tip of the nozzle is directed along the ejection direction of the process liquid. The aforementioned treatment of the front extension The ejection path of the liquid; and the determining step, based on the flow path of the nozzle tip and the image of the ejection path in the original image of the nozzle tip portion and the ejection path captured in the foregoing shooting step A predetermined determination process is performed to determine whether the closing speed of the opening and closing valve is appropriate, or whether it is slower or faster than the appropriate speed, which distinguishes the closing speed of the opening and closing valve.

According to the first aspect of the invention, the judging section of the processing liquid ejection device is based on the image of the flow path of the nozzle tip portion and the processing liquid ejection path taken by the imaging section, the inside of the nozzle tip portion and the processing liquid ejection path The original image to determine the distinction of the closing speed of the opening and closing valve. In this flow path, when the closing speed of the on-off valve is too fast, there is almost no processing liquid; the discharge path is when the closing speed of the on-off valve is too slow, and there are droplets of the processing liquid. Therefore, the determination unit can determine the division to which the closing speed of the opening and closing valve belongs based on the images corresponding to the two regions having a different relationship between the closing speed of the opening and closing valve and the detected state of presence of the processing liquid. Therefore, it is possible to improve the accuracy of the discrimination of the closing speed of the on-off valve.

According to the second aspect of the invention, the feature quantity calculation unit of the determination unit is each of the first image corresponding to the flow path at the tip of the nozzle and the second image corresponding to the ejection path of the processing liquid at the tip of the nozzle, Calculate the predetermined feature quantity corresponding to the area of the image of the processing liquid. The predetermined basic determination unit of the determination unit applies a predetermined determination rule to the feature amount of the first image and the feature amount of the second image, thereby determining the distinction between the closing speed of the on-off valve. Therefore, since the determination unit detects the presence of the image of the processing liquid separately for the first image and the second image and determines the distinction of the closing speed of the on-off valve, the accuracy of the determination can be improved.

According to the third aspect of the invention, the end of the first image area on the downstream side of the ejection direction of the processing liquid is separated from the tip of the nozzle, that is, from the end of the second image area on the upstream side of the ejection direction to The upstream side of the ejection direction. Therefore, the judging part will not start from the ejection direction The image of the end of the first image area on the downstream side of the image area extending to the tip of the nozzle is used for the judgment of the closing speed of the on-off valve. This image area is an area where it is difficult to identify the relationship between the presence of the processing liquid and the closing speed of the on-off valve. Therefore, in the case where the area is not used for determination, the accuracy of determination can be further improved.

According to the fourth aspect of the invention, the determination rule is the following rule: when the flow path at the tip of the nozzle is not in a liquid-tight state, it is determined that the closing speed of the on-off valve is too fast; when the flow path is in a liquid-tight state and is When the processing liquid is present in the ejection path of the processing liquid extending from the tip of the nozzle, it is determined that the closing speed of the on-off valve is too slow. Therefore, it is possible to improve the accuracy of the discrimination of the closing speed of the on-off valve.

According to the fifth aspect of the invention, the classifier uses sampling images of the flow path of the nozzle tip and the ejection path of the processing liquid and is generated by mechanical learning in advance, and the judging unit judges the closing speed of the on-off valve by the classifier The distinction. Therefore, even in the case where an image different from the sampled image is given, the accuracy of determining the lock speed can be improved.

According to the sixth aspect of the invention, the classifier is based on the first image of the first image area corresponding to the flow path and the first image of the first image area corresponding to the flow path among the images of the flow path at the tip of the nozzle and the ejection path of the processing liquid captured by the imaging unit. The images of each of the second images in the second image area corresponding to the path are generated by mechanical learning in a way of judging the distinction of the closing speed of the opening and closing valve. Since the classifier can learn the relationship between the distinction between the image and the locking speed of the opening and closing valve for each of the first image and the second image, the accuracy of the classification of the classifier can be improved.

According to the seventh aspect of the invention, the end of the first image area on the downstream side of the ejection direction of the processing liquid is separated from the tip of the nozzle, that is, from the end of the second image area on the upstream side of the ejection direction to The upstream side of the ejection direction. Therefore, the classifier of the determination unit does not use the image of the image region from the end of the first image region on the downstream side of the ejection direction to the tip of the nozzle to distinguish the closing speed of the on-off valve. The image area is difficult to specify The area of the relationship between the presence of the treatment fluid and the closing speed of the on-off valve. Therefore, in the case where the area is not used for determination, the accuracy of determination can be further improved.

According to the eighth aspect of the invention, the image generating unit generates the tip of the nozzle based on the time-series image of the imaging target area including the flow path of the tip of the nozzle and the ejection path of the processing liquid extending forward from the tip of the nozzle. A derivative image of the flow path and the ejection path of the treatment liquid; the judging unit judges the distinction of the closing speed of the on-off valve based on the derivative image. Since the temporal change in the state of the treatment liquid can also be reflected in the determination result, the accuracy of the determination can be improved.

According to the ninth aspect of the invention, even when the closing speed of the opening and closing valve determined by the determining unit is inappropriate, the closing speed adjusting unit can adjust the driving mechanism of the opening and closing valve in accordance with the determined closing speed of the opening and closing valve. Therefore, the closing speed of the on-off valve can be easily adjusted to an appropriate speed.

According to the tenth aspect of the invention, when the opening and closing valve is a gas valve and the opening and closing valve driving mechanism is equipped with a solenoid valve and a motor-driven needle valve, the motor can be adjusted so that the closing speed of the gas valve becomes an appropriate speed The opening degree of the driven needle valve.

According to the eleventh aspect of the invention, the opening degree of the electropneumatic regulator can be adjusted in such a way that the closing speed of the gas valve becomes an appropriate speed.

According to the twelfth aspect of the invention, the operation of the motor can be adjusted so that the closing speed of the motor valve becomes an appropriate speed.

According to the thirteenth aspect of the invention, the delay time after the solenoid valve opens the flow path in the gas supply piping until the gas valve actually closes is measured based on the output of the opening and closing sensor, and the timing adjustment unit uses the gas valve to predetermine The timing of closing is adjusted according to the measurement result to make the solenoid valve open the flow path in the gas supply piping. Therefore, even when the delay occurs due to differences in the diameter and length of the processing liquid supply pipe between each processing liquid ejection device When there are differences between each processing liquid ejection device, it can be adjusted in a manner that the gas valve is locked at a predetermined timing.

According to the fourteenth aspect of the invention, the judging section of the judging device is based on the inside of the nozzle tip and the ejecting path of the processing liquid in the image of the flow path of the nozzle tip and the ejection path of the processing liquid captured by the imaging section The original image to determine the distinction of the closing speed of the opening and closing valve. In this flow path, when the closing speed of the on-off valve is too fast, there is almost no processing liquid; the discharge path is when the closing speed of the on-off valve is too slow, and there are droplets of the processing liquid. Therefore, the determination unit can determine the division to which the closing speed of the opening and closing valve belongs based on the images corresponding to the two regions having a different relationship between the closing speed of the opening and closing valve and the detected state of presence of the processing liquid. Therefore, it is possible to improve the accuracy of the discrimination of the closing speed of the on-off valve.

According to the fifteenth aspect of the invention, the determination step of the processing liquid ejection method is based on the flow path of the nozzle tip and the processing liquid in the original image of the nozzle tip flow path and the processing fluid ejection path. The image of the ejection path determines the division of the closing speed of the on-off valve. In this flow path, when the closing speed of the on-off valve is too fast, there is almost no processing liquid; the discharge path is when the closing speed of the on-off valve is too slow, and there are droplets of the processing liquid. Therefore, in the determining step, it is possible to determine the division to which the closing speed of the opening and closing valve belongs based on the images corresponding to the two regions having a different relationship between the closing speed of the opening and closing valve and the detected state of presence of the processing liquid. Therefore, it is possible to improve the accuracy of the discrimination of the closing speed of the on-off valve.

According to the twenty-eighth aspect of the invention, the judging step of the judging method is based on the flow path of the nozzle tip and the ejection path of the processing liquid in the original image of the nozzle tip portion and the ejection path of the processing liquid. The image of the path determines the division of the closing speed of the on-off valve. In this flow path, when the closing speed of the on-off valve is too fast, there is almost no processing liquid; the discharge path is when the closing speed of the on-off valve is too slow, and there are droplets of the processing liquid. Therefore, in the determination step, it is possible to depend on the relationship between the closing speed of the on-off valve and the detected presence of the processing liquid. The images corresponding to the same two areas are used to determine the division of the closing speed of the on-off valve. Therefore, it is possible to improve the accuracy of the discrimination of the closing speed of the on-off valve.

1. 1A: Substrate processing unit (processing liquid ejection device)

7, 7A: Treatment liquid supply system

10: Substrate processing equipment group

11: CPU

12: Judgment Department

13: Feature calculation section

14: Prescribed Basic Judgment Department

16: Image generation department

17: Locking speed adjustment department

18: Timing adjustment department

19: Mechanical Learning Department

21: Ministry of Communications

22: Internet

23: server

29: Bus line

31: Gas supply source

32: Solenoid valve

33: Needle valve

34, 74: Piping

50: Photography subject area

51: internal area

52: Front area

65: Camera (Photography Department)

71: Treatment liquid supply source

72, 72A: On-off valve

73: Open and close sensor

100, 100A: substrate processing equipment

110: Index area

111: Carrier table

120: Treatment area

121: Chamber (frame)

122: Moving in and out

130, 130B, 130C: control section

131: Control Panel

132, 132A: drive mechanism

141: Display

142: Input Department

161: Disk

162: ROM

163: RAM

200: Processing Department

221: Rotation Fixture

251: Nozzle

252: front end

300: Locking speed judging device

720: Valve body

721: Motor

A, B, C: area

AR1: Spray direction

C1: Carrier

CR: Handling robot

G0: Image (original image)

G1: The first image (image)

G2: Second image (image)

GI, Gk: image

H1: Gas

IR: substrate handling device (transfer robot)

K1: Judgment rules

K2: classifier

L1: Treatment liquid

L2: droplet

NN1: Neural Network

P: Substrate accepting position

PG: Program

TG1: Flow path

TG2: ejection path

W: substrate

FIG. 1 is a schematic plan view for schematically showing an example of a substrate processing apparatus provided with a substrate processing unit of Embodiment 1 (Embodiment 2).

FIG. 2 is a diagram for schematically showing a configuration example of the substrate processing unit of the first embodiment.

FIG. 3 is a diagram for graphically showing an example of the relationship between the state of the processing liquid at the tip of the nozzle and whether it is good or not when spraying is stopped.

4 is a flowchart for showing an example of the operation of the substrate processing unit of the first embodiment.

FIG. 5 is a flowchart for showing an example of the operation of the substrate processing unit of the first embodiment.

FIG. 6 is a diagram for graphically showing an example of the relationship between the state of the processing liquid at the tip of the nozzle when the ejection is stopped and the division of the closing speed of the on-off valve.

FIG. 7 is a diagram for graphically showing an example of the relationship between the state of the processing liquid at the tip of the nozzle when the ejection is stopped and the division of the closing speed of the on-off valve.

FIG. 8 is a schematic diagram for schematically showing the matching between the input image and the clustered classification.

FIG. 9 is a diagram for schematically showing a configuration example of the substrate processing unit of the second embodiment.

Fig. 10 is a diagram schematically showing a configuration example of another embodiment of the control unit.

Fig. 11 is a diagram schematically showing a configuration example of another embodiment of the control unit.

Hereinafter, the embodiment will be described with reference to the drawings. The following embodiment is an example that has embodied the present invention, and is not an example for limiting the technical scope of the present invention. In addition, in the drawings referred to below, for easy understanding, the dimensions and numbers of each part are An exaggerated or simplified depiction of the situation. In addition, in each figure, the same reference number is attached|subjected to the part which has the same structure and function, and the overlapping description is abbreviate|omitted in the following description. The up-down direction is the vertical direction, and is upward with respect to the substrate side of the spin chuck.

(1) Configuration of substrate processing apparatus 100

The configuration of the substrate processing apparatus 100 will be described with reference to FIG. 1. FIG. 1 is a schematic plan view for schematically showing a substrate processing apparatus 100. As shown in FIG. The substrate processing apparatus 100 includes the substrate processing unit 1 of the first embodiment.

The substrate processing apparatus 100 is a system for processing a plurality of substrates W such as semiconductor wafers. The surface shape of the substrate W is slightly circular. The substrate processing apparatus 100 includes a plurality of substrate processing units 1. The substrate processing apparatus 100 can process the substrates W piece by piece and continuously in each substrate processing unit 1, and can process a plurality of substrates W in parallel by the plurality of substrate processing units 1.

The substrate processing apparatus 100 is provided with a plurality of areas (processing blocks) arranged side by side, and specifically includes an indexer cell 110, a processing area 120, and a control unit 130. The control unit 130 controls the index area 110 And various action mechanisms included in the processing area 120 and so on.

<Index area 110>

The index area 110 is an area for transferring the unprocessed substrate W received from the outside of the device to the processing area 120, and transporting the unprocessed substrate W received from the processing area 120 to the outside of the device. The index area 110 is provided with: a carrier stage 111 for placing a plurality of carriers (carrier) C1; and a substrate transport device (ie, transfer robot) IR for performing the substrate W relative to each carrier Move in and move out of C1.

The carrier C1 that has accommodated a plurality of substrates W is carried in from the outside of the apparatus by OHT (Overhead Hoist Transfer) or the like, and is placed on the carrier table 111. Unprocessed substrates W are taken out piece by piece from the carrier C1 and processed inside the device, and the processed substrates W that have finished processing inside the device are again housed in the carrier C1. Receive The carrier C1 containing the processed substrate W is carried out to the outside of the device by OHT or the like. In this way, the carrier stage 111 functions as a substrate stacking section for stacking the unprocessed substrate W and the processed substrate W. In addition, as the form of the carrier C1, it can be a FOUP (Front Opening Unified Pod; front opening wafer transfer box) for storing the substrate W in a closed space, or it can be a SMIF (Standard Mechanical Inter Face; standard manufacturing interface). ) Box, or OC (Open Cassette) in which the contained substrate W is in contact with the outside air.

The transfer robot IR system is equipped with: a plurality of hands (for example, four), which support the substrate W from below, whereby the substrate W can be held in a horizontal posture (the main surface of the substrate W is a horizontal posture); and a plurality of arms , Department of moving multiple hands respectively. The transfer robot IR takes out the unprocessed substrate W from the carrier C1 that has been placed on the carrier table 111, and transfers the taken out substrate W to the transfer robot CR (described later) in the substrate transfer position P. In addition, the transfer robot IR receives the processed substrate W from the transfer robot CR in the substrate transfer position P, and stores the received substrate W in the carrier C1 that has been placed on the carrier table 111. The IR system of the transfer robot can simultaneously use multiple hands and transfer substrates W.

<Processing area 120>

The processing area 120 is an area for processing the substrate W. The processing area 120 is provided with a plurality of substrate processing units 1 and a transfer robot CR, which carries in and unloads the substrates W to and from the plurality of substrate processing units 1. The transfer robot CR and the control unit 130 are substrate transfer devices. Here, a plurality of (for example, three) substrate processing units 1 are stacked in the vertical direction, and constitute one substrate processing apparatus group 10. In addition, a plurality of (four in the example of the drawing) substrate processing apparatus group 10 is arranged in a cluster shape (house shape) so as to surround the transfer robot CR. Therefore, a plurality of substrate processing units 1 are respectively arranged around the transfer robot CR. The substrate processing unit 1 holds the substrate arranged on the upper side (upper side in the vertical direction) of the unshown autorotating jig in a contactable and contact-releasable manner by the autorotating jig, and the autorotating jig is centered on a predetermined rotation axis. Rotate side to the substrate Perform predetermined treatments (for example, chemical solution treatment, rinse treatment, or drying treatment, etc.).

The conveying robot CR is a robot for conveying the substrate W while supporting the substrate W unilaterally. The transfer robot CR takes out the processed substrate W from the designated substrate processing unit 1 and transfers the taken-out substrate W to the transfer robot IR in the substrate transfer position P. In addition, the transfer robot CR receives the unprocessed substrate W from the transfer robot IR in the substrate transfer position P, and transfers the received substrate W to the designated substrate processing unit 1. Similar to the transfer robot IR, the transfer robot CR also has a plurality of (for example, four) hands; and a plurality of arms, which move the plurality of hands, respectively. The transfer robot CR system can simultaneously use a plurality of hands to transfer the substrate W.

Each substrate processing unit 1 is provided with a chamber 121 (hereinafter also referred to as a frame 121), and the chamber 121 forms a processing space inside. The housing 121 is formed with a carry-in/outlet 122, and the carry-in/outlet 122 is used for the transfer robot to insert the hand of the transfer robot into the inside of the frame 121. A shutter (not shown) is provided at the carry-in and carry-out exit 122, and the shutter can be opened and closed according to the control of the control unit 130. The shutter is opened when the substrate W is carried into and out of the housing 121, and is closed when the substrate W is processed. The substrate processing unit 1 is arranged in a space where a transfer robot is arranged so that the carry-out and carry-out entrances are opposed to each other. The specific configuration of the substrate processing unit 1 will be described later.

<Control Unit 130>

The control unit 130 controls the actions of each of the transfer robot IR, the transfer robot CR, and the group of substrate processing units 1. As the configuration of the hardware of the control unit 130, a computer similar to a general computer can be used. That is, the control unit 130 combines, for example, a CPU (Central Processing Unit; central processing unit) 11, a ROM (Read Only Memory) 162 that belongs to a memory dedicated for reading, and a memory that can be read and written freely. The RAM (Random Access Memory; random access memory) 163 and the disk 161 are electrically connected to the bus line 29 to form a structure. The CPU 11 performs various calculations, the ROM 162 stores the basic programs, and the RAM 163 memory Various information, Disk 161 series pre First memorize the program PG and data. The display unit 141 such as the liquid crystal panel and the input unit 142 such as the keyboard are also electrically connected to the bus line 29. The disk 161 also stores a recipe (not shown), a determination rule K1, a classifier K2, etc. The library is used to specify the processing content and processing sequence of the substrate W.

In the control section 130, the CPU 11 as the main control section performs arithmetic processing in accordance with the sequence written in the program PG, thereby realizing various functional sections for controlling each section of the substrate processing apparatus 100. Specifically, the CPU 11 operates as various functional units such as the determination unit 12, the feature quantity calculation unit 13, the predetermined basic determination unit 14, the video generation unit 16, the locking speed adjustment unit 17, the timing adjustment unit 18, and the machine learning unit 19 . The determination unit 12 includes a feature quantity calculation unit 13 and a predetermined basic determination unit 14. In addition, part or all of the functional units implemented in the control unit 130 may also be implemented in hardware by a dedicated logic circuit or the like.

(2) Configuration of substrate processing unit 1

FIG. 2 is a diagram for schematically showing a configuration example of the substrate processing unit 1 of the first embodiment.

The substrate processing unit (that is, the processing liquid ejection device) 1 can, for example, supply processing liquid to a main surface (that is, the upper surface) of the substrate W that is rotating in a plane, thereby performing various treatments on the upper surface of the substrate W. . As the treatment liquid L1, for example, pure water can be used. The treatment liquid L1 is not limited to pure water, but can also be: carbonated water, ionized water, ozone water or reduced water (hydrogen water) and other functional water; ammonia water, a mixture of ammonia water and hydrogen peroxide water, hydrochloric acid and hydrogen peroxide A mixture of water, a mixture of hydrofluoric acid, sulfuric acid and hydrogen peroxide, or a chemical solution such as isopropyl alcohol.

As shown in FIG. 2, the substrate processing unit 1 includes, for example, a processing unit 200 that processes the substrate W with a processing liquid L1 while rotating the held substrate W; and a processing liquid supply system 7 that supplies the processing unit 200 Treatment liquid L1; and the control unit 130.

(2-1) Processing part 200

The processing unit 200 is provided with a rotation jig 221 and a nozzle 251 in the housing 121. The processing unit 200 holds the substrate W from below by a rotation jig (hereinafter also referred to as a rotation holding mechanism) 221 while holding the substrate W from below. The substrate W is rotated with a predetermined rotation axis as the center. The processing unit 200 supplies the processing liquid L1 to the substrate W from the nozzle 251 and performs processing of the substrate W.

The rotation jig 221 is provided with: a disc-shaped spin base with a slightly horizontal main surface; and a rotation mechanism that passes through the center of the rotation base and extends the spin base in the vertical direction. The rotation axis rotates as the center. A plurality of holding pins are erected on the peripheral edge of the rotation base, and the plurality of holding pins hold the peripheral edge of the substrate W in a contactable and contact-releasable manner. The rotation jig 221 holds the peripheral edge portion of the substrate W with a plurality of holding pins, thereby holding the substrate W in a slightly horizontal posture such that the upper surface of the rotation base and the lower surface of the substrate W face each other. The center of the held substrate W is located on the rotation axis of the rotation base. The rotation jig 221 rotates the rotation base with the rotation axis as the center in this state, thereby rotating the substrate W with the rotation axis as the center.

The nozzle 251 is arranged above the substrate W held by the rotation jig 221 and supplies the processing liquid L1 from the processing liquid supply source 71 of the processing liquid supply system 7 via the pipe 74. The nozzle 251 ejects the supplied processing liquid L1 to the main surface of the substrate W rotated by the rotation jig 221. The main surface of the substrate W is treated with a chemical liquid. At least the tip side part (the part close to the side of the substrate W) of the nozzle 251 is made of, for example, a transparent material. As a material with a transparent material, for example, PFA (tetrafluoroethylene-par fluoro alkyl vinyl ether copolymer; tetrafluoroethylene copolymer) resin or quartz can be used. Therefore, the processing liquid L1 in the flow path existing in the tip portion of the nozzle 251 is captured by the camera 65 described later. In addition, the processing liquid L1 supplied to the nozzle 251 passes through the flow path TG1 at the tip of the nozzle 251 and is ejected toward the substrate W through the ejection path TG2 extending from the tip 252 of the nozzle 251 toward the downstream side of the ejection direction AR1.

The operations of loading the substrate W into the processing unit 200 and unloading the substrate W from the processing unit 200 are performed by a robot or the like in a state in which the nozzle 251 is arranged at the retracted position by a predetermined moving mechanism. The substrate W carried into the processing unit 200 is held by the rotation jig 221 in a contactable and contact-releasable manner.

(2-2) Treatment liquid supply system 7

The processing liquid supply system 7 is provided with: a processing liquid supply source 71, which supplies processing liquid L1; a pipe (that is, a processing liquid supply pipe) 74; and an on-off valve 72, which is provided in the middle of the path of the pipe 74 for connecting the pipe The flow path in 74 is opened and closed. The pipe 74 connects the processing liquid supply source 71 and the nozzle 251, and guides the processing liquid L1 supplied from the processing liquid supply source 71 to the nozzle 251. The on-off valve 72 is a gas valve, which is supplied with a predetermined gas to perform a closing operation at a speed corresponding to the supply flow rate of the gas.

The processing liquid supply system 7 is further provided with a drive mechanism 132 for causing the opening and closing valve 72 to open and close. The driving mechanism 132 supplies gas H1 for controlling the opening and closing operations of the opening and closing valve 72.

The driving mechanism 132 is provided with: a gas supply source 31, which supplies gas H1 to the on-off valve 72; a pipe (that is, a gas supply pipe) 34, which connects the gas supply source 31 and the on-off valve 72; and a solenoid valve 32, which is installed in the pipe 34. Used to open and close the flow path of the gas H1 in the pipe 34; and a motor-driven needle valve 33 is installed in the pipe 34 to control the gas H1 flowing in the pipe 34 according to the opening degree of the needle valve 33 Of traffic. The driving mechanism 132 may also be provided with an electro-pneumatic regulator instead of the needle valve 33. The electro-pneumatic regulator is installed in the pipe 34 to control the opening and closing of the flow path and the flow rate of the gas H1 flowing in the pipe 34 in accordance with the supplied voltage.

The gas supply source 31 has, for example, a bottle (bottle) that contains high-pressure gas H1; and a valve (that is, a pressure regulator) that reduces the pressure of the high-pressure gas H1 derived from the bottle to a certain value . The gas supply source 31 may also be provided outside the substrate processing apparatus 100.

(2-3) Locking speed judging device 300

The substrate processing unit 1 is further provided with a locking speed determination device (that is, a determination device) 300. The locking speed determining device 300 determines the division to which the locking speed of the opening and closing valve 72 belongs, and the opening and closing valve 72 is used to open and close the flow path for supplying the treatment liquid L1 to the nozzle 251 (that is, the treatment liquid supply flow path).

The locking speed determination device 300 is provided with a camera 65 installed in the housing 121, and a control unit 130 (more specifically, the determination unit 12). The camera 65 is electrically connected to the control unit 130.

(2-3-1) Camera 65

The camera 65 includes, for example, a lens, an imaging element, and a control processing circuit (none of which is shown). The lens system images the optical image of the subject to the imaging element. The imaging element converts the optical image of the object into an electrical signal and supplies it to the control processing circuit. The control processing circuit is electrically connected to the control unit 130, and follows the control signal supplied by the control unit 130 to make the imaging element perform the shooting action, and process the various electrical signals supplied from the imaging element and convert it into a digital image of multiple values. In this way, an image signal is generated and supplied to the control unit 130, and the image signal is used to display an image corresponding to the effective pixel number of the imaging element.

That is, the camera 65 processes the various electrical signals supplied from the imaging element and converts it into a digital image, thereby generating an image signal and outputting it to the control unit 130. The image signal is used to display the effective pixel number of the imaging element. The corresponding image. The control unit 130 stores the image signal (image) in, for example, the magnetic disk 161.

Specifically, when the on-off valve 72 closes the flow path and stops discharging the processing liquid L1 from the nozzle 251, the camera 65 follows the control of the control unit 130 to capture a predetermined imaging target area 50 in the housing 121 to obtain the image G0. The imaging target area 50 includes a flow path at the tip of the nozzle 251 and a discharge path of the processing liquid L1, which extends forward from the tip (discharge port) 252 of the nozzle 251 in the discharge direction AR1 of the processing liquid L1. The camera 65 photographs from a direction different from the ejection direction AR1. In FIG. 2, the flow path at the tip of the nozzle 251 includes an internal area 51, and the ejection path of the processing liquid L1 extending from the tip 252 of the nozzle 251 forward in the ejection direction AR1 includes a front area 52. In addition, the imaging target area 50 includes an inner area 51 and a front area 52.

(2-3-2) Judging section 12

The judging unit 12 of the locking speed judging device 300 performs predetermined judgment processing based on the internal area 51 of the tip of the nozzle 251 and the image of the area 52 in front of the nozzle 251 in the image G0 of the photographic target area 50 captured by the camera 65. This judges whether the closing speed of the opening and closing valve 72 is appropriate or whether it is slower or faster than a predetermined appropriate speed (that is, the target speed or the target closing speed). This distinguishes the closing speed of the opening and closing valve 72. That is, the determination unit 12 of the lock-up speed determination device 300 determines a stopped state in which the ejection of the processing liquid L1 from the nozzle 251 is stopped.

The determination unit 12 includes a feature quantity calculation unit 13 and a predetermined basic determination unit 14.

The feature amount calculation unit 13 is for the first image G1 of the area A (first image area) corresponding to the inner area 51 and the area B corresponding to the front area 52 in the image G0 of the imaging target area 50 captured by the camera 65 ( The image of each of the second image G2 in the second image area) calculates a predetermined feature amount corresponding to the area of the image of the processing liquid L1 in each of the first image G1 and the second image G2. As the feature quantity, for example, the sum of pixel values in the gray scales of the respective pixels in the regions of the first video G1 and the second video G2, the sum of brightness, the standard deviation of pixel values, or the standard deviation of brightness, etc. are used.

The predetermined basic determination unit 14 applies a predetermined determination rule K1 to the feature amount of the first image G1 and the feature amount of the second image G2, thereby determining the distinction between the closing speed of the on-off valve 72.

For example, the following rule is adopted as the determination rule K1: when the internal area 51 is not in a liquid-tight state, it is determined that the closing speed of the on-off valve 72 is too fast; when the internal area 51 is in a liquid-tight state and the treatment liquid L1 exists in the front area 52 At this time, it is determined that the closing speed of the on-off valve 72 is too slow.

In addition, the judging unit 12 of the locking speed judging device 300 is provided with a classifier K2. The classifier K2 determines whether the closing speed of the on-off valve 72 is appropriate or less than the internal area 51 of the tip of the nozzle 251 and the image of the area 52 in front of the nozzle 251 in the image G0 of the imaging target area 50 captured by the camera 65. Whether the appropriate speed is slow or fast is a distinction between the closing speed of the on-off valve 72. That is, the determining unit 12 determines the closing speed of the on-off valve 72 by the classifier K2 The distinction.

The classifier K2 is a machine that uses the sampled images of the internal area 51 of the tip portion of the nozzle 251 and the area 52 in front of the nozzle 251 in the image G0 of the imaging target area 50 taken by the camera 65 and is performed by the machine learning unit 19 in advance. Generated by learning.

The machine learning unit 19 stores the generated classifier K2 on the disk 161. The classifier K2 is memorized, for example, as a program or parameter for realizing the function of the classifier K2. The machine learning unit 19 uses, for example, a neighborhood method, a support vector machine, a random forest classifier (random forest), a neural network, etc. as an algorithm for machine learning.

In addition, the machine learning unit 19 may also be updated periodically or irregularly in an off-line manner. In addition, it is also possible to further sample images (teacher data) for the machine learning unit 19 that has previously performed machine learning, and perform on-line learning and update.

In addition, although the substrate processing apparatus 100 includes a plurality of substrate processing units 1, the classifier K2 generated for one substrate processing unit 1 through mechanical learning can also be used to control the on-off valves 72 in the other substrate processing units 1. .

(2-3-3) Processing of time series images performed by the blocking speed judging device 300

The camera 65 follows the control of the control unit 130. After the on-off valve 72 closes the flow path and stops spraying the treatment liquid L1 from the nozzle 251, it photographs the photographic target area 50 sequentially in time. The photographic target area 50 includes: The inner region 51 of the tip of the nozzle 251 and the front region 52 extend forward from the tip of the nozzle 251 along the ejection direction AR1 of the processing liquid L1.

<Image generation unit 16>

The locking speed determining device 300 is further provided with an image generating unit 16.

The image generation unit 16 generates the internal area 51 of the tip of the nozzle 251 and the area 52 in front of the nozzle 251 based on the time series image of the photographic target area 50 captured by the camera 65 The image (that is, the derived image). In more detail, the image generation unit 16 generates a derivative image based on, for example, a time-series image taken during a period of time after a certain period of time has elapsed immediately after the ejection of the processing liquid L1 from the nozzle 251 has been stopped. The certain period of time is, for example, 3 seconds. Furthermore, the determination unit 12 determines the division of the closing speed of the on-off valve 72 based on the derivative image generated by the image generation unit 16. The determination unit 12 applies the same determination processing as the determination processing applied to the image G0 (the determination processing using the determination rule K1 or the classifier K2, etc.) to the derivative image, thereby performing determination.

The image generation unit 16 applies a predetermined selection rule to the pixel value of each pixel of the same coordinate in each time series image, and obtains the pixel value of the pixel of the coordinate in the derivative image. As the selection rule, for example, processing for obtaining the average value or the integrated value of the pixel values of the respective pixels at the same coordinate is adopted.

In addition, the following rule may also be adopted as the selection rule: For the internal area 51 of the tip of the nozzle 251, among the pixel values of the pixels using the same coordinates, the pixel value closest to the pixel value of the spatial area where the processing liquid L1 is not present Pixel value; for the second image G2 of the area 52 in front of the nozzle 251, the pixel value of the pixel value of each pixel using the same coordinates is the pixel value that is closest to the pixel value of the area where the processing liquid L1 exists.

(2-4) Locking speed adjustment part 17

The substrate processing unit 1 is further provided with: a locking speed adjustment unit 17 which adjusts the drive based on the division of the closing speed of the opening and closing valve 72 determined by the closing speed judgment device 300 of the opening and closing valve 72, and adjusts the drive so that the closing speed becomes an appropriate speed. Action of mechanism 132. The locking speed adjusting unit 17 adjusts the opening degree of the needle valve 33 so that the closing speed of the opening and closing valve 72 becomes an appropriate speed. In more detail, the locking speed adjusting unit 17 supplies a control signal for adjusting the opening degree of the needle valve 33 to the control board 131. The control board 131 supplies the drive current corresponding to the supplied control signal to the motor of the needle valve 33 to operate the motor. Thereby, the opening degree of the needle valve 33 is adjusted.

(2-5) Timing adjustment section 18

The substrate processing unit 1 is further provided with a timing adjustment unit 18. In addition, the processing liquid supply system 7 is further provided with an opening and closing sensor 73 that detects the opening and closing of the opening and closing valve 72. The opening/closing sensor 73 supplies an output signal to the control unit 130. Since the on-off valve 72 is controlled to open and close by gas, after the solenoid valve 32 opens the flow path in the pipe 34, there is a delay time (that is, the discharge stop delay time) until the on-off valve 72 is actually closed, that is, After the operation for setting the on-off valve 72 to the closed state is performed, a delay time occurs until the on-off valve 72 is actually closed.

The timing adjustment unit 18 measures the delay time based on the output of the opening/closing sensor 73, and adjusts the timing at which the solenoid valve 32 opens the flow path in the pipe 34 by closing the opening/closing valve 72 at a predetermined timing based on the measurement result.

(3) Regarding the state of the processing liquid L1 when the ejection is stopped

FIG. 3 is a diagram for graphically showing an example of the relationship between the state of the processing liquid L1 at the tip of the nozzle 251 and whether it is good or not when the ejection is stopped.

The state of the three passages of the processing liquid L1 in the tip portion of the nozzle 251 when the ejection is stopped is displayed at the top of the graph of FIG. 3. In the second stage from the top, it is described whether the three states of the treatment liquid L1 shown in the top stage are good. In the second stage from the bottom, the correspondence relationship between the three states of the processing liquid L1 displayed in the uppermost stage and the closing speed of the on-off valve 72 is displayed. The locking speed of the opening and closing valve 72 is adjusted by a motor-driven needle valve 33 (speed controller). In the lowermost section, the correspondence between the three states of the treatment liquid L1 displayed in the uppermost section and the lag time of stopping ejection is displayed. The discharge stop lag time is the delay time after the solenoid valve 32 performs an operation of closing the on-off valve 72 by an ON operation or an off operation until the on-off valve 72 is actually closed. The discharge stop delay time is changed by the closing speed of the on-off valve 72, the length and diameter of the pipe 74, the water head of the treatment liquid L1, and the like.

As shown in FIG. 3, the state of the processing liquid L1 at the tip of the nozzle 251 when the state of spraying the processing liquid L1 from the nozzle 251 is stopped is changed by the closing speed of the on-off valve 72.

When the closing speed of the on-off valve 72 is too slow, after the nozzle 251 stops discharging the processing liquid L1, the droplets L2 of the processing liquid L1 temporarily continue to fall. That is, the state of the processing liquid L1 in the tip portion of the nozzle 251 becomes a poor state. In addition, since the closing speed of the on-off valve 72 is slow, the discharge stop delay time is long.

When the closing speed of the on-off valve 72 is too fast, so-called water tapping causes the tip of the nozzle to produce a droplet L2 that adheres to the inner wall surface and stays at the tip 252 of the nozzle 251. There is no processing liquid L1. area. These droplets L2 will then fall onto the substrate W. That is, the state of the processing liquid L1 in the tip portion of the nozzle 251 becomes a poor state. In addition, since the closing speed of the on-off valve 72 is fast, the discharge stop delay time is short.

As long as the closing speed of the on-off valve 72 is appropriate, the tip portion of the nozzle 251 becomes substantially liquid-tight due to the treatment liquid L1, and the droplet L2 will not continue to fall temporarily after stopping. That is, the state of the processing liquid L1 in the tip portion of the nozzle 251 becomes a better state. In addition, the discharge stop delay time is the time between when the closing speed of the on-off valve 72 is too fast and when it is too slow.

As shown in FIG. 3, in order to obtain a good state of the processing liquid L1 when the ejection is stopped, the closing speed of the on-off valve 72 needs to be set to an appropriate speed corresponding to the piping system of the substrate processing unit 1.

(4) Operation of substrate processing unit 1

4 and 5 are flowcharts for showing an example of the operation of the substrate processing unit 1. 4 is a flowchart of a case where the determination unit 12 of the control unit 130 applies a predetermined determination rule K1 to determine the closing speed of the on-off valve 72. FIG. 5 is a flowchart showing how the determination unit 12 determines the closing speed of the on-off valve 72 using the classifier K2.

6 and 7 are used to graphically display the difference between the state of the processing liquid L1 at the tip of the nozzle 251 and the closing speed of the opening and closing valve 72 when the nozzle 251 stops spraying the processing liquid L1 A diagram of an example of the relationship between.

In FIGS. 6 and 7, for each of the three states of "appropriate", "too slow", and "too fast", the closing speed of the on-off valve 72 is illustrated as "state 1 after stop" and "state 2 after stop". The two states are the states of the processing liquid L1 after the processing liquid L1 is stopped. These two states are respectively schematically displayed by the image G0 of the photographic target area 50 captured by the camera 65.

Areas A and B are displayed in each image G0 in FIG. 6, and area C is displayed in each image G0 in FIG. 7. Except for these differences, the two images G0 displayed at the same position in the graph in FIG. 6 and FIG. 7 are the same images.

When the closing speed of the opening and closing valve 72 is appropriate, the lower end of the processing liquid L1 immediately after the stop is stopped at a position that coincides with the front end 252 of the nozzle 251 or is slightly higher than the front end 252 of the nozzle 251. After the ejection is stopped, the processing liquid L2 does not fall from the tip 252 of the nozzle 251.

In the case where the closing speed of the opening and closing valve 72 is too slow, the liquid droplet L2 does not fall in the stopped state 1, and the lower end surface of the processing liquid L1 has a convex shape downward from the front end 252 of the nozzle 251. In addition, in the second state after the stop, the droplet L2 falls, and the lower end of the processing liquid L1 coincides with the tip 252 of the nozzle 251. In addition, the lower end of the processing liquid L1 does not necessarily have to coincide with the front end 252 of the nozzle 251, and the lower end of the processing liquid L1 may maintain a convex shape. In this case, the drop of the liquid drop L2 and the lower end surface of the treatment liquid L1 have the same convex shape as the state after the stop at the same time.

When the closing speed of the on-off valve 72 is too fast, in the state after the stop, so-called water tapping is generated at the tip of the nozzle except for the droplets L2 adhering to the inner wall surface and remaining on the tip 252 of the nozzle 251. Outside the droplet L2, there is no area where the treatment liquid L1 exists. The lower end surface of the processing liquid L1 is located far above the front end 252 of the nozzle 251. In addition, in the second state after the stop, a liquid droplet L2 of a size that closes the tip 252 of the nozzle 251 is generated. In addition, as in the stopped state, a region where the processing liquid L1 is not present is generated at the tip of the nozzle, and the lower end surface of the processing liquid L1 is located far above the tip 252 of the nozzle 251. State 1 after stopping and State 2 after stopping In this case, the droplets L2 remaining at the tip of the nozzle 251 may become particles during drying.

Hereinafter, the operation of the substrate processing unit 1 (locking speed determining device 300) will be described with reference to FIGS. 6 and 7 and the like as appropriate and based on the flowcharts of FIGS. 4 and 5.

(4-1) Operation of the situation where the determination unit 12 uses the predetermined basic determination unit 14

Hereinafter, referring to FIG. 6 as appropriate and based on the flowchart of FIG. 4, the operation of the substrate processing unit 1 in the case where the predetermined basic determination unit 14 of the determination unit 12 determines the closing speed of the on-off valve 72 using the determination rule K1 will be described.

In step S10 of FIG. 4, the camera 65 captures the imaging target area 50 after the on-off valve 72 closes the flow path and the nozzle 251 stops spraying the treatment liquid L1. The imaging target area 50 is the internal area 51 including the tip of the nozzle 251. (FIG. 6) and the front area 52 of the tip portion of the nozzle 251. The captured image (that is, the original image) G0 is supplied to the control unit 130.

In step S20, the feature amount calculation unit 13 calculates predetermined feature amounts for the first image G1 and the second image G2 of each of the area A (FIG. 6) and the area B (FIG. 6), and the area A is related to the nozzle The tip portion of the nozzle 251 corresponds to the internal region 51 in the flow path, and the region B corresponds to the front region 52 on the ejection path of the processing liquid L1 in the tip portion of the nozzle 251.

In addition, the regions A and B have the width of the tip (discharge port) 252 of the nozzle 251, and are set to be elongated in the discharge direction AR1 of the processing liquid L1.

In step S30, the predetermined basic determination unit 14 determines whether the region A is in the liquid-tight state caused by the processing liquid L1 based on the feature amount of the first image G1.

When the result of this determination is that the area A is not in a liquid-tight state, the predetermined basic determination unit 14 determines in step S40 that the closing speed of the on-off valve 72 is too fast.

In step S50, the closing speed adjusting section 17 of the substrate processing unit 1 adjusts the motor-driven needle valve 33 to the gas flowing in the pipe 34 so that the closing speed of the opening and closing valve 72 becomes slower. The flow rate of H1, and the processing system moves to step S90.

When the result of the determination in step S30 is that the area A is in a liquid-tight state, the processing system proceeds to step S60.

In step S60, the predetermined basic determination unit 14 determines whether or not the region B is a space in which the processing liquid L1 is hardly present based on the feature amount of the second video G2.

When the result of this determination is that the processing liquid L1 exists in the area B, the processing system proceeds to step S70.

In step S70, the predetermined basic determination unit 14 determines that the closing speed of the on-off valve 72 is too slow.

In step S80, the closing speed adjusting unit 17 adjusts the flow rate of the gas H1 flowing through the pipe 34 by the motor-driven needle valve 33 so that the closing speed of the opening and closing valve 72 becomes faster.

In step S90, in order to reflect the result of adjusting the flow rate of the gas H1, the substrate processing unit 1 temporarily ejects the processing liquid L1 from the nozzle 251, and then stops the ejection again. After that, the processing system returns to step S10, and the substrate processing unit 1 performs each processing after step S10.

When the result of the determination in step S60 is that the area B is a space where the processing liquid L1 hardly exists, the substrate processing unit 1 ends the operation of FIG. 4.

In the operation of FIG. 4, the basic determination unit 14 is prescribed to use the determination rule K1 as the following rule: when the internal area 51 is not in a liquid-tight state, it is determined that the closing speed of the on-off valve 72 is too fast; when the internal area 51 is liquid When the closed state and the processing liquid L1 exists in the front area 52, it is determined that the closing speed of the on-off valve 72 is too slow. In addition, the predetermined basic determination unit 14 applies the determination rule K1 to the feature amount of the first image G1 and the feature amount of the second image G2, thereby determining the distinction between the closing speed of the on-off valve 72.

As shown in FIG. 6, the end of the region A on the downstream side in the ejection direction AR1 of the processing liquid L1 is separated from the tip of the nozzle 251 toward the upstream side of the ejection direction AR1 of the processing liquid L1. Therefore, the judgment The fixed portion 12 does not use the image of the image region extending from the end of the region of the first image G1 to the tip of the nozzle 251 in the downstream side of the ejection direction AR1 for the determination of the closing speed of the on-off valve 72. This image area is an area where it is difficult to identify the relationship between the presence of the processing liquid L1 and the closing speed of the on-off valve 72. Therefore, in the case where the area is not used for determination, the accuracy of determination can be improved.

(4-2) Operation of the case where the determination unit 12 uses the classifier K2

Hereinafter, referring to FIG. 7 as appropriate and based on the flowchart of FIG. 5, the operation of the substrate processing unit 1 in a case where the determination unit 12 uses the classifier K2 to determine the closing speed of the on-off valve 72 will be described.

In step S110 in FIG. 5, the machine learning unit 19 is configured to include the area C (FIG. 7) including the inside (flow path) of the tip portion of the nozzle 251 and the ejection path of the processing liquid L1 in front of the tip portion of the nozzle 251 The images are classified into groups of "appropriate", "too slow", and "too fast" for the closing speed of the on-off valve to perform mechanical learning. The machine learning unit 19 stores the classifier K2 generated by machine learning on the disk 161.

In addition, for the example of FIG. 6, in the case where the determination unit 12 applies the classifier K2, the classifier K2 is based on the first of the region A corresponding to the inner region 51 in the image G0 of the photographic target region 50 captured by the camera 65 The image of each of the image G1 and the second image G2 of the area B corresponding to the front area 52 (FIG. 6) determines the division of the closing speed of the on-off valve 72. The classifier K2 uses the sampled images of each of the first image G1 and the second image G2 and is generated by mechanical learning in advance.

In step S120, the camera 65 captures the imaging target area 50 when the on-off valve 72 closes the flow path and stops ejecting the treatment liquid L1 from the nozzle 251. The imaging target area 50 includes the interior (flow path) of the tip portion of the nozzle 251 And the ejection path of the processing liquid L1 in front of the tip of the nozzle 251.

In step S130, the determining unit 12 classifies the image of the region C in the captured image (original image) G0 by the classifier K2, and determines the division to which the closing speed of the on-off valve 72 belongs.

In addition, the area C has the width of the tip (ejection port) 252 of the nozzle 251, and is The ejection direction AR1 of the processing liquid L1 is set to be elongated. The area C in FIG. 7 becomes a slightly longer area than the area after the areas A and B in FIG. 6 are merged. This is because the areas A and B are separated from each other.

In step S140, the determination unit 12 determines whether the locking speed has been classified (determined) as "too fast".

When the result of the determination is that the locking speed has been classified as "too fast", the processing system moves to step S150.

In step S150, the locking speed adjusting section 17 of the substrate processing unit 1 adjusts the motor-driven needle valve 33 to adjust the flow rate of the gas H1 flowing in the pipe 34 so that the closing speed of the opening and closing valve 72 becomes slower, and the processing system moves Go to step S180.

When the result of the determination in step S140 is that the closing speed of the on-off valve 72 is not classified as "too fast", the processing system proceeds to step S160.

In step S160, the determination unit 12 determines whether the closing speed of the on-off valve 72 has been classified as "too slow".

When the result of the determination is that the locking speed has been classified as "too slow", the processing system moves to step S170.

In step S170, the closing speed adjusting unit 17 adjusts the flow rate of the gas H1 flowing through the pipe 34 by the motor-driven needle valve 33 so that the closing speed of the opening and closing valve 72 becomes faster.

In step S180, in order to reflect the result of adjusting the flow rate of the gas H1, the substrate processing unit 1 temporarily ejects the processing liquid L1 from the nozzle 251, and then stops the ejection again. After that, the processing system returns to step S120, and the substrate processing unit 1 performs each processing following step S120.

In the case where the result of the determination in step S160 is that the closing speed of the on-off valve 72 is not classified as "too slow", the substrate processing unit 1 ends the operation of FIG. 5.

FIG. 8 is a schematic diagram showing the matching between the image G1 near the front end 252 of the nozzle 251 and the closing speed of the opening and closing valves classified into a plurality of groups in advance. match It is performed by the well-known neural network (NN1), for example. The blocking speed is grouped in multiple groups such as "too fast", "appropriate" and "too slow" in advance. Each group system corresponds to each feature vector generated in advance. The respective feature vectors are derived from the respective images Gk corresponding to the respective states of the treatment liquid L1 immediately after stopping in the vicinity of the front end 252 (more specifically, the sum of the pixel values or brightness of the respective images Gk, or the pixel value Or the standard deviation of brightness) is generated in advance. In the example of FIG. 8, each group of locking speed is schematically displayed by the corresponding images Gk. The NN1-like neural network has an input layer, an intermediate layer (hidden layer), and an output layer. The similar neural network NN1 may also have a plurality of intermediate layers.

The quasi-neural network NN1 learns in advance the correspondence between each image G1 near the front end 252 immediately after stopping the ejection of the treatment liquid L1 by the camera 65 and the feature vector corresponding to the image G1 among the above-mentioned feature vectors. The captured image G1 is matched with the most corresponding feature vector through image recognition by the neural network NN1. With this, it can be determined that the ejection is stopped. The matching system shown in FIG. 8 corresponds to the processing of step S140 and step S160 described above.

In addition, although the images GI and Gk in FIG. 8 show images near the tip 252 of the nozzle 251, they are not necessarily only the images near the tip 252 of the nozzle 251. The overall image captured by the imaging element may be used as Feature vector learning. In this case, the machine learning unit 19 focuses on the difference between the nozzle tip states generated in a plurality of overall images and performs learning.

(5) Configuration of substrate processing apparatus 100A

FIG. 1 is also used to schematically show a schematic top view of the substrate processing apparatus 100A. The substrate processing apparatus 100A includes the substrate processing unit 1A of the second embodiment. As shown in FIG. 1, the substrate processing apparatus 100A is configured to be the same as the substrate processing apparatus 100 except that it includes a plurality of substrate processing units 1A instead of the plurality of substrate processing units 1.

FIG. 9 is a diagram for schematically showing a configuration example of the substrate processing unit 1A of the second embodiment.

The substrate processing unit (that is, the processing liquid ejection device) 1A has the same configuration as the substrate processing unit 1 except that the processing liquid supply system 7A is provided in place of the processing liquid supply system 7 of the substrate processing unit 1. Like the substrate processing unit 1, the substrate processing unit 1A can discharge the processing liquid L1 to the substrate W and process the substrates W piece by piece. The substrate processing apparatus 100A can process a plurality of substrates W in parallel by a plurality of substrate processing units 1A.

The processing liquid supply system 7A of the substrate processing unit 1A is provided with an on-off valve (that is, a motor valve) 72A and a driving mechanism 132A instead of the on-off valve 72 and the driving mechanism 132 of the processing liquid supply system 7, and is configured to interact with the processing liquid. The supply system 7 is the same.

The on-off valve 72A is provided with a valve body 720 and a motor (that is, an electric motor) 721, and the motor 721 is an opening and closing mechanism that drives the valve body 720, thereby opening and closing the on-off valve 72A. The valve body 720 is provided in the middle of the path of the pipe 74. The valve body 720 is provided with a rod-shaped body, not shown, for example. The rod-shaped system can open and close the valve body 720 by transversing the direction of the pipe 74. That is, the rod-shaped system can open and close the valve body 720 by transversing the direction of the pipe 74. The flow path of the piping 74 can be opened and closed by advancing and retreating. The rod-shaped system is, for example, connected to a ball screw mechanism not shown, which is connected to the rotating shaft of the motor 721; when the motor 721 rotates, the rod-shaped system is at a speed corresponding to the rotation speed of the motor 721. Advance and retreat according to the direction of rotation. Thereby, the opening degree and the opening and closing speed of the valve body 720 are arbitrarily adjusted. The control unit 130 supplies a control signal corresponding to the target opening and closing speed to the control board 131, and the control board 131 supplies a driving current corresponding to the control signal to the motor 721. The opening and closing valve 72A performs opening and closing operations at a speed corresponding to the number of rotations (rotation speed) of the motor 721. In other words, the on-off valve 72A has a current value corresponding to the drive current supplied by the control board 131 (when the motor 721 is, for example, a DC (Direct Current) motor, it is the current value of the drive current, and when the motor 721 is, for example, a stepping motor When motor) is the frequency of the pulse wave of the drive current, the speed is switched on and off. That is, the driving mechanism 132A is a motor 721 provided with a control board 131 and an on-off valve 72A to adjust the closing speed of the on-off valve 72A. The locking speed adjusting unit 17 changes the locking speed of the opening and closing valve 72A (valve body 720) to an appropriate speed (target closing speed). The method of locking the speed) supplies the control signal to the control board 131 and adjusts the action of the motor 721.

Compared with the on-off valve 72 which is a gas-driven gas valve, the motor-driven on-off valve 72A is more responsive, and can immediately close the on-off valve 72A when the motor 721 performs the action of closing the on-off valve 72A. Since the on-off valve 72 is controlled to open and close by the gas H1, although the above-mentioned stop discharge delay time occurs, since the on-off valve 72A is controlled to open and close by the motor 721, there is no equivalent to the on-off valve 72A. The delay time of the stop of the discharge in the on-off valve 72 is delayed. Therefore, in the substrate processing unit 1A, the control unit 130 may not include the timing adjustment unit 18.

FIG. 10 is a diagram schematically showing a control unit 130B as a configuration example of another embodiment of the control unit 130 of the substrate processing apparatuses 100 and 100A.

As shown in FIG. 10, the machine learning unit 19 is installed in the server 23, and the server 23 is installed outside the substrate processing apparatus 100. The machine learning department of the machine learning section 19 is performed offline. In addition, the determination unit 12 and the classifier K2 are also provided in the server 23. The control unit 130B is connected to the network 22 via the communication unit 21, and the external server 23 is connected to the network 22.

The CPU 11 of the control unit 130B communicates information with the determination unit 12, the machine learning unit 19, and the classifier K2 provided in the server 23 via the communication unit 21 and the network 22. The control unit 130B is configured to be the same as the control unit 130 except that the machine learning unit 19, the determination unit 12, and the classifier K2 are not provided with the control unit 130.

As exemplified by the control unit 130B in FIG. 10, the determination unit 12, the feature quantity calculation unit 13, the predetermined basic determination unit 14, the image generation unit 16, and the locking speed adjustment unit 17 realized by the CPU 11 of the control unit 130 A part of each functional unit such as the timing adjustment unit 18 and the machine learning unit 19 is provided in an external server 23. When this functional unit is provided in the server 23, matching (judgment) common to a plurality of substrate processing units can be performed.

In addition, the machine learning unit 19 may be updated periodically or irregularly in an offline manner. In addition, it is also possible to further add sampling images to the machine learning unit 19 that has been machine learning in advance. Like (teacher profile) and perform online learning and update. Furthermore, other CPUs can also be used via the network 22, and online learning can be performed by sampling images (teacher data).

FIG. 11 is a diagram schematically showing a control unit 130C of another embodiment of the configuration example of the control unit 130 of the substrate processing apparatuses 100 and 100A. As shown in FIG. 11, the control unit 130C is configured to perform the same operations as the control unit 130 except that the classifier K2 is stored in the ROM 162 instead of the magnetic disk 161. In this way, the classifier K2 can also be stored in the ROM162.

According to the opening and closing valve closing speed judging device of the first and second embodiments of the above-mentioned structure, the judging unit 12 is based on the flow path (internal area) of the tip portion of the nozzle 251 in the original image G0 of the photographic target area 50 taken by the camera 65. 51) and the image of the ejection path (front area 52) of the processing liquid L1, and determine the distinction between the closing speeds of the on-off valves 72 and 72A. Here, the imaging target area 50 includes the flow path of the tip of the nozzle 251 and the flow path from the nozzle 251 The front end 252 of the A1 extends along the ejection path of the treatment liquid L1 extending in the ejection direction AR1. The inner area 51 is a process liquid L1 that hardly exists when the closing speed of the on-off valves 72 and 72A is too slow, and the front area 52 is where droplets of the process liquid L1 are present when the closing speed of the on-off valves 72 and 72A is too slow. Therefore, the determining unit 12 can determine the division of the closing speed of the opening and closing valves 72, 7A based on the images corresponding to the two regions that are different in the relationship between the closing speed of the opening and closing valve 72 and the detected existence relationship of the processing liquid L1 . Therefore, it is possible to improve the determination accuracy of the discrimination of the closing speed of the on-off valves 72 and 72A.

In addition, according to the opening and closing valve closing speed judging devices of the first and second embodiments, the feature quantity calculating unit 13 of the judging unit 12 is based on the first image G1 corresponding to the internal area 51 of the tip portion of the nozzle 251 and the image G1 corresponding to the nozzle 251. For each of the second image G2 corresponding to the front region 52 of the front end, a predetermined feature amount corresponding to the area of the image of the processing liquid L1 is calculated. The predetermined basic determination unit 14 of the determination unit 12 applies a predetermined determination rule K1 to the feature amount of the first image G1 and the feature amount of the second image G2, thereby determining the distinction between the closing speeds of the on-off valves 72 and 72A. Therefore, the determination unit 12 separately detects the presence of the image of the processing liquid L1 for the first image G1 and the second image G2 and determines The division of the closing speed of the on-off valves 72 and 72A can improve the accuracy of the determination.

In addition, according to the opening and closing valve closing speed determining device of the first and second embodiments, the end of the region of the first image G1 on the downstream side of the ejection direction AR1 of the processing liquid L1 is from the tip of the nozzle 251 toward the ejection direction AR1 The upstream side is separated, that is, from the end of the region B on the upstream side of the ejection direction AR1 toward the upstream side of the ejection direction AR1. Therefore, the judging unit 12 does not use the image from the end of the region of the first image G1 on the downstream side of the ejection direction AR1 to the image region of the tip of the nozzle 251 to distinguish the closing speed of the opening and closing valves 72, 72A. determination. This image area is an area where it is difficult to identify the relationship between the presence of the processing liquid L1 and the closing speed of the on-off valves 72 and 72A. Therefore, in the case where the area is not used for determination, the accuracy of determination can be further improved.

In addition, according to the opening and closing valve closing speed determining device of the first and second embodiments, the determination rule K1 is the following rule: when the internal area 51 of the tip portion of the nozzle 251 is not in a liquid-tight state, it is determined that the opening and closing valves 72, 72A The locking speed of the nozzle 251 is too fast; when the internal area 51 of the tip of the nozzle 251 is in a liquid-tight state and the processing liquid L1 is present in the area 52 extending from the tip of the nozzle 251, it is determined that the closing speed of the opening and closing valves 72, 72A is too high slow. Therefore, it is possible to improve the determination accuracy of the division of the closing speed of the on-off valves 72 and 72A.

In addition, according to the closing speed determination device of the opening and closing valve of the first and second embodiments, the classifier uses the sampled image of the area C and is generated by mechanical learning in advance, and the area C is the internal area including the tip portion of the nozzle 251 The areas of both areas 51 and the front area 52 of the nozzle 251 correspond to each other; the judging unit 12 judges the division of the closing speeds of the on-off valves 72 and 72A by the classifier. Therefore, even in the case where an image different from the sampled image is given, the accuracy of determining the lock speed can be improved.

In addition, according to the closing speed determination device of the opening and closing valve of the first and second embodiments, the classifier is generated by mechanical students in the following manner: based on the image G0 of the photographic target area 50 taken by the camera 65 and the inner area 51 Corresponding to the first image G1 of area A and the front For each image of the second image G2 of the area B corresponding to the area 52, the distinction between the closing speeds of the on-off valves 72 and 72A is determined. Since the classifier can learn the relationship between the distinction between the image and the locking speed of the opening and closing valves 72 and 72A in each image of the first image G1 and the second image G2, the determination accuracy of the classifier can be improved.

In addition, according to the opening and closing valve closing speed determining device of the first and second embodiments, the end of the region of the first image G1 on the downstream side of the ejection direction AR1 of the processing liquid L1 is separated from the tip of the nozzle 251 to the ejection direction. The upstream side of AR1, that is, the distance from the end of the region B in the upstream side of the ejection direction AR1 to the upstream side of the ejection direction AR1. Therefore, the classifier of the determination unit 12 does not use the image that extends from the end of the region of the first image G1 on the downstream side of the ejection direction AR1 to the image region of the tip of the nozzle 251 for the closing speed of the opening and closing valves 72 and 72A. Judgment of the distinction. This image area is an area where it is difficult to identify the relationship between the presence of the processing liquid L1 and the closing speed of the on-off valves 72 and 72A. Therefore, in the case where the area is not used for determination, the accuracy of determination can be further improved.

In addition, according to the closing speed determination device of the opening and closing valve of the first and second embodiments, the image generating unit 16 is based on the imaging of the internal area 51 including the tip of the nozzle 251 and the front area 52 extending forward from the tip of the nozzle 251 The time series image of the target area 50 generates images of the inner area 51 of the tip portion of the nozzle 251 and the area 52 in front of the nozzle 251; the determination unit 12 determines the division of the closing speeds of the on-off valves 72 and 72A based on the images. Since the temporal change in the state of the treatment liquid L1 can also be reflected in the determination result, the accuracy of the determination can be improved.

In addition, the processing liquid ejection device according to the first and second embodiments of the present embodiment constructed as described above, because the closing speed adjusting unit 17 is not suitable even when the closing speed of the opening and closing valves 72, 72A determined by the closing speed determining device of the opening and closing valve is inappropriate. The drive mechanism of the opening and closing valves 72 and 72A can be adjusted in accordance with the determined closing speed of the opening and closing valves 72 and 72A, so that the closing speed can be easily adjusted to an appropriate speed. Therefore, the start-up time of the processing liquid ejection device can be shortened.

In addition, according to the processing liquid ejection device of the first embodiment, when the on-off valve 72 is a gas valve and the drive mechanism 132 of the on-off valve 72 includes the solenoid valve 32 and the motor-driven needle valve 33, the gas valve ( The opening degree of the motor-driven needle valve 33 is adjusted so that the closing speed of the opening and closing valve 72) becomes an appropriate speed.

In addition, according to the processing liquid ejection device of the first embodiment, the delay time after the solenoid valve 32 opens the flow path of the pipe 34 until the gas valve is actually closed is measured based on the output of the opening/closing sensor 73, and the timing adjustment unit 18 is The timing of the solenoid valve 32 to open the flow path in the pipe 34 is adjusted based on the measurement result in such a manner that the gas valve is closed at a predetermined timing. Therefore, even in the case where the delay time is different for each substrate processing unit 1 because the diameter and length of the pipe 74 belonging to the supply piping of the processing liquid L1 are different for each substrate processing unit 1, the gas can be used The valve is adjusted in a predetermined time sequence blocking manner.

In addition, according to the method for determining the closing speed of the opening and closing valve in the first and second embodiments described above, the determination step is based on the internal area 51 of the tip of the nozzle 251 and the front of the nozzle 251 in the original image G0 of the photographic target area 50. The image of the area 52 determines the division of the closing speed of the on-off valves 72 and 72A. The internal area 51 is the treatment liquid L1 that becomes almost non-existent when the closing speed of the on-off valves 72 and 72A is too fast; the front area 52 is liquid in which the treatment liquid L1 exists when the closing speed of the on-off valves 72 and 72A is too slow. drop. Therefore, in the determination step, it is possible to determine whether the opening and closing valves 72, 72A are locked based on the images corresponding to the two regions having a different relationship between the closing speeds of the opening and closing valves 72, 72A and the detected presence state of the processing liquid L1. The division to which the speed belongs. Therefore, it is possible to improve the determination accuracy of the discrimination of the closing speed of the on-off valves 72 and 72A.

In addition, according to the discharge method of the treatment liquid L1 of the first and second embodiments described above, even in the case where the closing speed of the opening and closing valves 72, 72A is judged to be inappropriate in the closing speed judgment method of the opening and closing valve, it can be adapted to the situation. The judged division of the closing speed of the on-off valves 72, 72A is to adjust the drive mechanism of the on-off valves 72, 72A in the closing speed adjustment step, so it can be easily Adjust the blocking speed to an appropriate speed.

Although the present invention has been shown and described in detail, the above description is only illustrative in all aspects and not restrictive. Therefore, the present invention can appropriately change or omit the embodiment within the scope of the present invention.

1. 1A: Substrate processing unit (processing liquid ejection device)

10: Substrate processing equipment group

11: CPU

12: Judgment Department

13: Feature calculation section

14: Prescribed Basic Judgment Department

16: Image generation department

17: Locking speed adjustment department

18: Timing adjustment department

19: Mechanical Learning Department

29: Bus line

100, 100A: substrate processing equipment

110: Index area

111: Carrier table

120: Treatment area

121: Chamber (frame)

122: Moving in and out

130: Control Department

141: Display

142: Input Department

161: Disk

162: ROM

163: RAM

C1: Carrier

IR: substrate handling device (transfer robot)

K1: Judgment rules

K2: classifier

P: Substrate accepting position

PG: Program

W: substrate

Claims (24)

A processing liquid ejection device for ejecting processing liquid from a nozzle having a transparent tip side portion, and is provided with: a judging section for judging the closing speed of an opening and closing valve, and the opening and closing valve is used to supply the processing liquid to the nozzle The process liquid supply flow path is opened and closed; the drive mechanism makes the opening and closing valve open and close; the locking speed adjustment unit is based on the classification of the closing speed of the opening and closing valve judged by the judgment unit, and the locking speed becomes appropriate The speed method is used to adjust the operation of the driving mechanism; and the imaging unit, when the on-off valve closes the processing liquid supply flow path and stops the processing liquid from the nozzle, photographs the tip of the nozzle from a direction different from the ejection direction The flow path of the nozzle and the ejection path of the processing liquid extending forward from the tip of the nozzle along the ejection direction of the processing liquid; the determination unit is further provided with: a feature quantity calculation unit for the nozzle photographed by the imaging unit The first image of the first image area corresponding to the flow path of the nozzle tip in the original image of the ejection path and the second image of the second image area corresponding to the ejection path For the images of both parties, a predetermined feature amount corresponding to the area of the image of the processing liquid in each is calculated; and a predetermined basic determination unit that applies a predetermined determination rule to the feature amount of the first image and the first image The aforementioned feature quantities of the two images are used to determine the aforementioned distinction of the closing speed of the opening/closing valve; the judgment processing of the aforementioned predetermined basic judgment unit is performed to determine whether the closing speed of the opening/closing valve is appropriate or slower than the appropriate speed. It is also faster to distinguish the locking speed of the opening and closing valve; the locking speed adjustment unit adjusts the operation of the driving mechanism in a manner that adjusts the closing speed of the opening and closing valve in response to the judgment of the predetermined basic judgment unit. The processing liquid ejection device according to claim 1, wherein the end of the first image area on the downstream side of the ejection direction of the processing liquid is separated from the tip of the nozzle to the upstream side of the ejection direction of the processing liquid. The processing liquid ejection device described in claim 1 or 2, wherein the foregoing determination rule is the following rule: when the flow path at the tip of the nozzle is not in a liquid-tight state, it is determined that the closing speed of the opening and closing valve is too fast; When the flow path at the tip of the nozzle is in a liquid-tight state and the processing liquid exists in the ejection path, it is determined that the closing speed of the on-off valve is too slow. The processing liquid ejection device described in claim 1, wherein the judging unit is provided with a classifier, and the classification of the closing speed of the opening and closing valve is judged by the classifier, and the classifier is used to determine the difference in the original image The flow path at the tip of the nozzle and the image of the ejection path determine whether the closing speed of the opening/closing valve is appropriate or whether it is slower or faster than the appropriate speed. The classification of the closing speed of the opening/closing valve; the aforementioned classifier system A sample image of the image of the flow path of the nozzle tip and the ejection path in the original image is used and generated by mechanical learning in advance. The processing liquid ejection device described in claim 4, wherein the classifier is based on the first image in the first image area corresponding to the flow path of the tip of the nozzle in the original image and the first image corresponding to the ejection path The second image in the two image areas is determined by the aforementioned classification of the locking speed of the opening and closing valve; the aforementioned classifier uses the sampled images of each of the aforementioned first image and the aforementioned second image and is generated by mechanical learning in advance . The processing liquid ejection device according to claim 5, wherein the end of the first image area on the downstream side of the ejection direction of the processing liquid is separated from the tip of the nozzle Open to the upstream side of the discharge direction of the treatment liquid. The processing liquid ejection device according to any one of Claims 1 or 2, 4 to 6, wherein the imaging unit is configured to perform after the opening and closing valve closes the processing liquid supply flow path and stops ejecting the processing liquid from the nozzle Timely photograph the flow path of the tip of the nozzle and the ejection path of the processing liquid extending forward from the tip of the nozzle along the ejection direction of the processing liquid; the processing liquid ejecting device is further provided with: an image generating unit , Based on the time series images of the flow path at the tip of the nozzle and the ejection path captured by the imaging unit, generate derivative images of the flow path at the tip of the nozzle and the ejection path; the determination section is based on the image The derivative image generated by the generating unit determines the division of the closing speed of the on-off valve. The processing liquid ejection device described in any one of claim 1 or 2, 4 to 6, wherein the on-off valve is a gas valve, which is supplied with a predetermined gas and is blocked at a blocking speed corresponding to the supply flow rate of the gas Operation; The drive mechanism is provided with: a gas supply source, which supplies the gas to the gas valve; a gas supply pipe, which connects the gas supply source and the gas valve; a solenoid valve, which is installed in the gas supply pipe for Opening and closing the gas flow path in the gas supply pipe; and a motor-driven needle valve is installed in the gas supply pipe to control the flow rate of the gas flowing in the gas supply pipe according to the degree of opening; The locking speed adjusting unit adjusts the opening degree of the motor-driven needle valve so that the closing speed of the gas valve becomes an appropriate speed. The processing liquid ejection device described in any one of claim 1 or 2, 4 to 6, wherein the on-off valve is a gas valve, which is supplied with a predetermined gas and is blocked at a blocking speed corresponding to the supply flow rate of the gas Operation; The drive mechanism is equipped with: a gas supply source, which supplies the gas to the gas valve; a gas supply pipe, which connects the gas supply source and the gas valve; and an electro-pneumatic regulator, which is installed in the gas supply pipe , And control the opening and closing of the flow path and flow rate of the gas flowing in the gas supply piping in accordance with the voltage; the locking speed adjustment unit adjusts the opening of the electro-pneumatic regulator so that the closing speed of the gas valve becomes an appropriate speed degree. The processing liquid ejection device described in claim 1 or any one of 2, 4 to 6, wherein the above-mentioned on-off valve is a motor valve that is used to open and close at a speed corresponding to the number of rotations of the motor, and includes: The main body is provided in the middle of the path of the piping; and a motor that opens and closes the valve body; the drive mechanism is provided with the motor; the locking speed adjusting unit is such that the locking speed of the motor valve becomes an appropriate speed Adjust the movement of the aforementioned motor. The processing liquid ejection device described in claim 9, which is further provided with: an opening/closing sensor for detecting the opening and closing of the gas valve; and a timing adjustment unit for setting the gas valve to a closed state on the solenoid valve After the operation, the delay time until the gas valve is actually closed is measured according to the output of the opening/closing sensor, and the gas valve is closed at a predetermined time sequence, and the measurement result is adjusted to make the solenoid valve remove the gas The timing of the action when the valve is set to the closed state. A processing liquid ejection method is used to eject processing liquid from a nozzle having a transparent tip side portion, and has: a determining step, which determines the closing speed of an opening and closing valve, and the opening and closing valve is used to supply the processing liquid to the nozzle The process liquid supply flow path is opened and closed; the photographing step is to photograph the flow path at the tip of the nozzle and from the tip of the nozzle when the opening and closing valve closes the process liquid supply flow path and stops spraying the process liquid from the nozzle. The ejection path of the processing liquid extending forward along the ejection direction of the processing liquid; and the locking speed adjustment step is based on the distinction of the closing speed of the on-off valve determined in the judgment step, and the locking speed becomes an appropriate speed The method adjusts the operation of the driving mechanism that causes the opening and closing valve to open and close; the determination step is further provided with: a feature quantity calculation step for the flow path of the tip portion of the nozzle photographed in the photographing step and the aforementioned In the original image of the ejection path, both the first image of the first image area corresponding to the flow path of the nozzle tip and the second image of the second image area corresponding to the ejection path are calculated to be compared with each The predetermined feature amount corresponding to the area of the image of the processing liquid in the above; and the predetermined basic determination step is to apply the predetermined determination rule to the feature amount of the first image and the feature amount of the second image, by This judges the aforementioned division of the closing speed of the opening and closing valve; performing predetermined judgment processing based on the aforementioned predetermined basic judgment step to determine whether the closing speed of the opening and closing valve is appropriate or whether it is slower or faster than the appropriate speed. The distinction of the valve's locking speed; the aforementioned locking speed adjustment step is determined based on the aforementioned prescribed basic judgment step The division of the locking speed of the on-off valve is to adjust the operation of the driving mechanism so that the locking speed becomes an appropriate speed. The processing liquid ejection method according to claim 12, wherein the end of the first image area on the downstream side of the ejection direction of the processing liquid is separated from the tip of the nozzle to the upstream side of the ejection direction of the processing liquid. The processing liquid ejection method described in claim 12 or 13, wherein the foregoing determination rule is the following rule: when the flow path at the tip of the nozzle is not in a liquid-tight state, it is determined that the closing speed of the opening and closing valve is too fast; When the flow path at the tip of the nozzle is in a liquid-tight state and the processing liquid exists in the ejection path, it is determined that the closing speed of the on-off valve is too slow. The processing liquid ejection method described in claim 12, wherein the determination step is a step of determining the locking speed of the opening and closing valve by a classifier, and the classifier is based on the flow at the tip of the nozzle in the original image. The image of the path and the ejection path is used to determine whether the closing speed of the opening and closing valve is appropriate or whether it is slower or faster than the appropriate speed. The closing speed of the opening and closing valve is distinguished; the foregoing classifier uses the foregoing in the original image The sampling image of the image of the flow path at the tip of the nozzle and the aforementioned ejection path is generated by mechanical learning in advance. The processing liquid ejection method described in claim 15, wherein the classifier is based on the first image in the first image area corresponding to the flow path of the tip of the nozzle in the original image and the first image corresponding to the ejection path The second image in the two image areas is determined by the aforementioned classification of the locking speed of the opening and closing valve; the aforementioned classifier uses the sampled images of each of the aforementioned first image and the aforementioned second image and is generated by mechanical learning in advance . The processing liquid ejection method described in claim 16, wherein the ejection method of the processing liquid is The end of the first image region on the downstream side is separated from the tip of the nozzle to the upstream side in the ejection direction of the processing liquid. The processing liquid ejection method according to any one of claim 12 or 13, or 15 to 17, wherein the photographing step is the following step: the processing liquid supply flow path is blocked at the on-off valve and the ejection process from the nozzle is stopped After liquid, the flow path of the tip of the nozzle and the ejection path of the processing liquid extending forward from the tip of the nozzle along the ejection direction of the processing liquid are photographed in time sequence; the processing liquid ejection method is further provided with: : The image generation step is based on the time series images of the flow path at the tip of the nozzle and the ejection path captured in the shooting step to generate a derivative image of the flow path at the tip of the nozzle and the ejection path; The determining step is a step of determining the distinction of the locking speed of the on-off valve based on the derivative image generated in the image generating step. The processing liquid ejection method described in any one of claim 12, 13, or 15 to 17, wherein the on-off valve is a gas valve, which is supplied with a predetermined gas and is blocked at a blocking speed corresponding to the supply flow rate of the gas Operation; The drive mechanism is provided with: a gas supply source, which supplies the gas to the gas valve; a gas supply pipe, which connects the gas supply source and the gas valve; a solenoid valve, which is installed in the gas supply pipe for Opening and closing the gas flow path in the gas supply pipe; and a motor-driven needle valve is installed in the gas supply pipe to control the flow rate of the gas flowing in the gas supply pipe according to the degree of opening; The aforementioned locking speed adjustment step is based on the aforementioned closing speed of the gas valve becoming appropriate The step of adjusting the opening degree of the aforementioned motor-driven needle valve by means of speed. The processing liquid ejection method described in any one of claim 12, 13, or 15 to 17, wherein the on-off valve is a gas valve, which is supplied with a predetermined gas and is blocked at a blocking speed corresponding to the supply flow rate of the gas Operation; The drive mechanism is equipped with: a gas supply source, which supplies the gas to the gas valve; a gas supply pipe, which connects the gas supply source and the gas valve; and an electro-pneumatic regulator, which is installed in the gas supply pipe , And control the opening and closing of the flow path and flow rate of the gas flowing in the gas supply pipe according to the voltage; the locking speed adjustment step is to adjust the opening of the electro-pneumatic regulator in such a way that the closing speed of the gas valve becomes an appropriate speed The steps of the degree. The processing liquid spraying method described in any one of claim 12, 13, or 15 to 17, wherein the above-mentioned on-off valve is a motor valve that is used to open and close at a speed corresponding to the number of rotations of the motor, and includes: The main body is provided in the middle of the path of the piping; and the motor opens and closes the valve main body; the drive mechanism is equipped with the motor; the locking speed adjustment step is such that the locking speed of the motor valve becomes an appropriate speed Steps to adjust the movement of the aforementioned motor. The processing liquid ejection method described in claim 19, further comprising: an opening and closing detection step, which detects the opening and closing of the gas valve; and a timing adjustment step, which is an operation of setting the gas valve to a closed state in the solenoid valve Then, the delay time until the gas valve is actually closed is measured according to the opening degree of the gas valve detected in the opening and closing detection step, and the gas valve is closed at a predetermined timing, and the adjustment is performed according to the measurement result. Make the aforementioned electromagnetic The valve sets the sequence of the operation of the aforementioned gas valve in the closed state. A substrate processing apparatus is provided with: a nozzle having a transparent front end side portion and used to spray a processing liquid onto a substrate; an opening and closing valve for opening and closing a processing liquid supply flow path for supplying the processing liquid to the nozzle; a driving mechanism , Is to make the opening and closing valve open and close; the imaging part is to photograph the flow path of the tip of the nozzle from a direction different from the ejection direction and the process that extends forward from the tip of the nozzle along the ejection direction of the processing liquid The ejection path of the liquid; and the control unit for controlling the drive mechanism; the control unit for the first image in the first image area corresponding to the flow path of the tip of the nozzle in the original image captured by the imaging unit and The image of each of the second images in the second image area corresponding to the ejection path is adjusted in accordance with the predetermined feature amount corresponding to the area of the image of the processing liquid in each of the first image and the second image The operation of the driving mechanism is controlled by the method of the closing speed of the opening and closing valve. A method for adjusting an opening and closing valve is used in a substrate processing apparatus. The substrate processing apparatus includes a nozzle, an opening and closing valve, a drive mechanism, an imaging unit, and a feature quantity calculation unit. The nozzle has a transparent tip side portion and is used to eject the substrate For the treatment liquid, the opening and closing valve is used to open and close the treatment liquid supply flow path for supplying the treatment liquid to the nozzle, the driving mechanism is to open and close the opening and closing valve, and the imaging unit is to image the above from a direction different from the ejection direction. The flow path of the tip portion of the nozzle and the ejection path of the processing liquid extending forward from the tip of the nozzle along the ejection direction of the processing liquid, the feature quantity calculating unit calculates a predetermined value based on the original image taken by the imaging unit Feature; The feature calculation unit is for the first image of the first image area corresponding to the flow path of the tip of the nozzle in the original image taken by the imaging unit And the image of each of the second image in the second image area corresponding to the ejection path, and calculate the predetermined feature amount corresponding to the area of the image of the processing liquid in each of the first image and the second image ; The aforementioned opening and closing valve adjusts the locking speed in response to the aforementioned characteristic quantity and by the action of the aforementioned drive mechanism.

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