TWI710658B - Manufacturing chamber and heat treatment furnace for SiC high temperature oxidation process - Google Patents

Manufacturing chamber and heat treatment furnace for SiC high temperature oxidation process Download PDF

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TWI710658B
TWI710658B TW107146147A TW107146147A TWI710658B TW I710658 B TWI710658 B TW I710658B TW 107146147 A TW107146147 A TW 107146147A TW 107146147 A TW107146147 A TW 107146147A TW I710658 B TWI710658 B TW I710658B
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heat insulation
flange
annular
boat
quartz
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TW107146147A
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TW202006172A (en
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李旭剛
陳志兵
姜豔杰
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大陸商北京北方華創微電子裝備有限公司
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • F27B17/0016Chamber type furnaces
    • F27B17/0025Especially adapted for treating semiconductor wafers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D5/00Supports, screens, or the like for the charge within the furnace
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D5/00Supports, screens, or the like for the charge within the furnace
    • F27D5/0037Supports specially adapted for semi-conductors
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D5/00Supports, screens, or the like for the charge within the furnace
    • F27D5/0068Containers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/02Supplying steam, vapour, gases, or liquids
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D9/00Cooling of furnaces or of charges therein
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00Subject matter not provided for in other groups of this subclass
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00Subject matter not provided for in other groups of this subclass
    • F27D99/0073Seals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D5/00Supports, screens, or the like for the charge within the furnace
    • F27D2005/0081Details
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/02Supplying steam, vapour, gases, or liquids
    • F27D2007/023Conduits
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D9/00Cooling of furnaces or of charges therein
    • F27D2009/0002Cooling of furnaces
    • F27D2009/001Cooling of furnaces the cooling medium being a fluid other than a gas
    • F27D2009/0013Cooling of furnaces the cooling medium being a fluid other than a gas the fluid being water

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

本發明提供一種用於SiC高溫氧化製程的製作腔室及熱處理爐,該製作腔室包括:筒狀隔熱裝置,內部具有封閉的隔熱空間;隔熱板組件,包括複數個沿垂直方向疊置在一起的隔熱板;隔熱板元件鄰接設置在筒狀隔熱裝置的上方;以及工藝舟,用於承載被加工工件;工藝舟鄰接設置在隔熱板組件的上方。本發明提供的用於SiC高溫氧化製程的製作腔室,其不僅具有較高的使用溫度、較小的爐腔體積,而且可以簡化設備整體結構。The present invention provides a manufacturing chamber and a heat treatment furnace used in a SiC high-temperature oxidation process. The manufacturing chamber includes: a cylindrical heat insulation device with a closed heat insulation space inside; and a heat insulation board assembly including a plurality of stacked in a vertical direction The heat insulation boards are arranged together; the heat insulation board elements are adjacently arranged above the cylindrical heat insulation device; and the craft boat is used to carry the workpiece to be processed; the craft boat is arranged adjacently above the heat insulation board assembly. The manufacturing chamber for the SiC high-temperature oxidation process provided by the present invention not only has a higher use temperature and a smaller furnace cavity volume, but also can simplify the overall structure of the equipment.

Description

用於SiC高溫氧化製程的製作腔室及熱處理爐Manufacturing chamber and heat treatment furnace for SiC high temperature oxidation process

本發明涉及半導體製造領域,具體地,涉及一種用於SiC高溫氧化製程的製作腔室及熱處理爐。 The invention relates to the field of semiconductor manufacturing, in particular, to a manufacturing chamber and a heat treatment furnace used in a SiC high temperature oxidation process.

SiC材料具有寬頻隙、高飽和漂移速度、高熱導率、高臨界擊穿電場等突出優點,屬第三代半導體材料,適合製備高功率、高頻、高壓、高溫、抗輻照電子器件。 SiC material has outstanding advantages such as wide frequency gap, high saturation drift speed, high thermal conductivity, and high critical breakdown electric field. It belongs to the third generation of semiconductor materials and is suitable for preparing high-power, high-frequency, high-pressure, high-temperature, radiation-resistant electronic devices.

SiC材料是唯一可以直接氧化生長SiO2薄膜的寬禁帶半導體,最常用的方法是採用高溫乾氧或濕氧的熱氧化方法來生長SiO2薄膜,並且熱氧化製程獲得SiO2薄膜和介面特性的品質是最好的。 SiC material is the only wide-bandgap semiconductor that can directly oxidize and grow SiO 2 films. The most commonly used method is to grow SiO 2 films using high-temperature dry oxygen or wet oxygen thermal oxidation methods, and the thermal oxidation process obtains SiO 2 films and interface characteristics The quality is the best.

SiC高溫氧化製程的溫度高達1500℃,常規高溫設備無法滿足製作要求。目前業內利用高溫氧化爐進行SiC片的高溫氧化製程,高溫氧化爐是SiC器件積體電路生產線的關鍵製作設備。 The temperature of the SiC high-temperature oxidation process is as high as 1500°C, and conventional high-temperature equipment cannot meet the manufacturing requirements. At present, the industry uses a high-temperature oxidation furnace for the high-temperature oxidation process of SiC wafers, and the high-temperature oxidation furnace is a key production equipment of the SiC device integrated circuit production line.

現有的一種高溫退火爐的最高溫度為1950℃,使用溫度較低,不利於離子啟動,器件電學性能不易提高。同時,製作腔內的隔熱擋板數量很多,腔室容積較大,不利於腔室製作溫度均勻性、氣密性、潔淨度等關鍵指標控制。此外,對進氣管路的冷卻的過渡結構冗長,不利於設備整體優化。 The highest temperature of an existing high-temperature annealing furnace is 1950°C, which is low in use temperature, which is not conducive to ion start, and the electrical performance of the device is not easily improved. At the same time, the number of heat insulation baffles in the manufacturing chamber is large, and the chamber volume is large, which is not conducive to the control of key indicators such as temperature uniformity, air tightness, and cleanliness of the chamber. In addition, the transition structure for cooling the intake pipe is lengthy, which is not conducive to the overall optimization of the equipment.

本發明旨在至少解決現有技術中存在的技術問題之一’提出了一種用於SiC高溫氧化製程的製作腔室及熱處理爐,其不僅具有較高的使用溫度、較小的爐腔體積,而且可以簡化設備整體結構。 The present invention aims to solve at least one of the technical problems existing in the prior art. It proposes a manufacturing chamber and heat treatment furnace for SiC high-temperature oxidation process, which not only has a higher use temperature and a smaller furnace chamber volume, but also The overall structure of the equipment can be simplified.

為實現本發明的目的而提供一種用於SiC高溫氧化製程的製作腔室,包括:一筒狀隔熱裝置,內部具有封閉的隔熱空間;一隔熱板組件,包括複數個沿垂直方向疊置在一起的隔熱板;所述隔熱板組件鄰接設置在所述筒狀隔熱裝置的上方;以及一工藝舟,用於承載一被加工工件;所述工藝舟鄰接設置在所述隔熱板組件的上方。 In order to achieve the objective of the present invention, a manufacturing chamber for SiC high-temperature oxidation process is provided, which includes: a cylindrical heat insulation device with a closed heat insulation space inside; and a heat insulation board assembly including a plurality of stacked in a vertical direction Heat insulation boards placed together; the heat insulation board assembly is arranged adjacently above the cylindrical heat insulation device; and a craft boat for carrying a workpiece to be processed; the craft boat is arranged adjacent to the partition Above the hot plate assembly.

較佳地,所述筒狀隔熱裝置包括:一石英筒,所述石英筒的一上端和一下端均為封閉端,內部形成封閉的所述隔熱空間,且所述石英筒設有貫穿其上端和下端的一穿孔;一石英管,所述石英管密封穿設在所述石英筒的所述穿孔內;以及一隔熱材料,填充在所述石英管與所述石英筒之間的所述隔熱空間內。 Preferably, the cylindrical heat insulation device includes: a quartz cylinder, an upper end and a lower end of the quartz cylinder are both closed ends, the enclosed heat insulation space is formed inside, and the quartz cylinder is provided with a through hole A perforation at the upper and lower ends; a quartz tube, the quartz tube is sealed and penetrated in the perforation of the quartz cylinder; and a heat insulation material filled in between the quartz tube and the quartz cylinder Inside the thermal insulation space.

較佳地,所述製作腔室還包括一舟裝卸法蘭,所述舟裝卸法蘭密封抵靠在所述石英筒的下端,用於支撐所述筒狀隔熱裝置、所述隔熱板組件和所述工藝舟並能升降移動,一進氣管密封穿設在所述舟裝卸法蘭上並與所述石英管的內部連通。 Preferably, the production chamber further includes a boat loading and unloading flange, and the boat loading and unloading flange is sealed against the lower end of the quartz cylinder for supporting the cylindrical heat insulation device and the heat insulation plate The components and the craft boat can move up and down, and an air inlet pipe is sealed through the boat loading and unloading flange and communicates with the inside of the quartz tube.

較佳地,所述石英筒的下端設有一過濾孔,所述過濾孔將所述隔熱空間與所述石英筒的外部連通,且所述過濾孔內設有一篩檢程式;所述舟裝卸法蘭內設有一夾層管路,所述夾層管路的一端與所述過濾孔連通,所述夾層管路的另一端與一第二抽氣裝置連通。 Preferably, the lower end of the quartz cylinder is provided with a filter hole, the filter hole communicates the heat insulation space with the outside of the quartz cylinder, and a screening program is provided in the filter hole; the boat loading and unloading A sandwich pipeline is arranged in the flange, one end of the sandwich pipeline is communicated with the filter hole, and the other end of the sandwich pipeline is communicated with a second suction device.

較佳地,所述石英筒的一下端與所述舟裝卸法蘭之間設置有一第四密封圈,所述第四密封圈環繞在所述過濾孔周圍。 Preferably, a fourth sealing ring is arranged between the lower end of the quartz cylinder and the boat loading and unloading flange, and the fourth sealing ring surrounds the filter hole.

較佳地,所述石英筒的下端與所述舟裝卸法蘭之間還設置有一第五密封圈,並且所述石英管的一下端開口、所述過濾孔和所述第四密封圈均位於所述第五密封圈環繞的密封區域內。 Preferably, a fifth sealing ring is provided between the lower end of the quartz cylinder and the boat loading and unloading flange, and the lower end opening of the quartz tube, the filter hole and the fourth sealing ring are all located In the sealing area surrounded by the fifth sealing ring.

較佳地,所述隔熱板元件設置有貫穿每個所述隔熱板厚度的一通氣孔,且所述通氣孔與所述石英管的內部連通,用於將製程氣體輸送至所述工藝舟所在區域。 Preferably, the heat insulation board element is provided with a vent hole penetrating the thickness of each heat insulation board, and the vent hole communicates with the inside of the quartz tube for transporting process gas to the process boat your region.

較佳地,所述製作腔室還包括:一製作管體,所述製作管體的上端封閉,下端敞開;所述製作管體的軸向垂直設置;一內筒體,所述內筒體的上端和下端均敞開,且同軸設置在所述製作管體內部;所述內筒體與所述製作管體之間形成環形間隙;所述筒狀隔熱裝置、所述隔熱板組件和所述工藝舟能升入到所述內筒體內部;以及一工藝管法蘭,為環形結構;所述工藝管法蘭與所述製作管體的下端和所述內筒體的下端均密封連接;所述工藝管法蘭的頂面設有向下凹陷的一環形氣槽,所述環形氣槽與所述環形間隙對接連通;所述工藝管法蘭內設有與所述環形氣槽連通的一橫向氣道,所述橫向氣道與一第一抽氣裝置連通。 Preferably, the production chamber further includes: a production tube body, the upper end of the production tube body is closed, and the lower end is open; the axial direction of the production tube body is vertically arranged; an inner cylinder body, the inner cylinder body The upper end and the lower end are both open and coaxially arranged inside the production tube; an annular gap is formed between the inner cylinder and the production tube; the cylindrical heat insulation device, the heat insulation board assembly and The process boat can rise into the inner cylinder; and a process pipe flange, which has a ring structure; the process pipe flange is sealed with the lower end of the production pipe and the lower end of the inner cylinder Connection; the top surface of the process pipe flange is provided with a downwardly recessed annular gas groove, and the annular gas groove is in butt communication with the annular gap; the process pipe flange is provided with the annular gas A transverse air passage communicated with the groove, and the transverse air passage communicates with a first suction device.

較佳地,所述工藝管法蘭對接安裝在一爐筒法蘭上;所述爐筒法蘭為環形結構,固定安裝在一製作管體上,所述爐筒法蘭位於所述工藝管法蘭的上方並圍繞在所述製作管體的外側周圍;所述工藝管法蘭的頂面設有向上突出的環一形凸緣,所述環形凸緣環繞在所述製作管體的外側周圍;並且,在所述爐筒法蘭的下表面設置有一環形凹槽,所述環形凸緣 伸入到所述環形凹槽中;所述環形凸緣的上表面、所述環形凹槽的與所述環形凸緣的上表面相對的表面以及所述製作管體的外周壁共同構成一環形空間,所述環形空間內設有一第一密封圈。 Preferably, the process tube flange is butt-mounted on a furnace barrel flange; the furnace barrel flange has a ring structure and is fixedly installed on a fabricated tube body, and the furnace barrel flange is located on the process tube Above the flange and surrounding the outer side of the production tube; the top surface of the process pipe flange is provided with an upwardly protruding annular flange, the annular flange surrounds the outer side of the production tube Around; and, an annular groove is provided on the lower surface of the furnace barrel flange, the annular flange Extends into the annular groove; the upper surface of the annular flange, the surface of the annular groove opposite to the upper surface of the annular flange, and the outer peripheral wall of the pipe body together form an annular shape A first sealing ring is arranged in the annular space.

較佳地,所述工藝管法蘭與所述爐筒法蘭內均設有一環形冷卻水道。 Preferably, both the process pipe flange and the furnace barrel flange are provided with an annular cooling water channel.

較佳地,在所述爐筒法蘭中設置有一測溫套管,所述測溫套管的檢測端位於所述爐筒法蘭的內周壁上,所述測溫套管的另一端穿過所述爐筒法蘭延伸出去;並且,在所述測溫套管中設置有一溫度感測器。 Preferably, a temperature measuring sleeve is arranged in the furnace tube flange, the detection end of the temperature measuring sleeve is located on the inner peripheral wall of the furnace tube flange, and the other end of the temperature measuring sleeve passes through Extends through the furnace barrel flange; and a temperature sensor is arranged in the temperature measuring sleeve.

較佳地,所述製作管體、所述內筒體、所述隔熱板組件以及所述筒狀隔熱裝置均為圓柱體狀,並且同軸線設置;所述隔熱板元件的外緣與所述內筒體的內壁之間具有一間隙,用於將製作氣體輸送至所述工藝舟所在區域。 Preferably, the production tube, the inner cylinder, the heat insulation board assembly, and the cylindrical heat insulation device are all cylindrical and arranged coaxially; the outer edge of the heat insulation board element There is a gap between the inner cylinder and the inner wall of the inner cylinder for conveying the production gas to the area where the craft boat is located.

作為另一個技術方案,本發明還提供一種用於SiC高溫氧化製程的熱處理爐,所述熱處理爐包括本發明提供的上述製作腔室。 As another technical solution, the present invention also provides a heat treatment furnace for SiC high-temperature oxidation process, the heat treatment furnace includes the above-mentioned manufacturing chamber provided by the present invention.

本發明具有以下有益效果: The present invention has the following beneficial effects:

本發明提供的用於SiC高溫氧化製程的製作腔室及熱處理爐的技術方案中,製作腔室包括筒狀隔熱裝置,內部具有封閉的隔熱空間;隔熱板組件,包括複數個沿垂直方向疊置在一起的隔熱板;以及工藝舟,鄰接設置在隔熱板組件的上方。通過配合使用筒狀隔熱裝置和隔熱板元件,可以更有效地阻隔工藝舟所在區域內的高溫輻射,從而可以提高工藝舟所在區域的使用溫度達到2000℃以上,以滿足高性能器件的製作要求,而且筒狀 隔熱裝置和隔熱板元件的體積較小,從而可以減小爐腔體積,簡化設備整體結構。 In the technical solution for the production chamber and heat treatment furnace for the SiC high-temperature oxidation process provided by the present invention, the production chamber includes a cylindrical heat insulation device with a closed heat insulation space inside; and the heat insulation board assembly includes a plurality of vertical Heat insulation boards stacked together in directions; and a craft boat, which are adjacently arranged above the heat insulation board assembly. By using the cylindrical heat insulation device and the heat insulation board elements, the high temperature radiation in the area where the craft boat is located can be blocked more effectively, so that the operating temperature of the area where the craft boat is located can be increased to more than 2000 ℃ to meet the production of high-performance devices Request, and cylindrical The volume of the heat insulation device and the heat insulation board element is small, which can reduce the volume of the furnace cavity and simplify the overall structure of the equipment.

1:製作管體 1: Make the tube body

2:內筒體 2: inner cylinder

3:工藝舟 3: Craft boat

4:隔熱板 4: Insulation board

5:筒狀隔熱裝置 5: Cylindrical heat insulation device

6:第一密封圈 6: The first sealing ring

7:爐筒法蘭 7: Furnace flange

8:第一抽氣裝置 8: The first exhaust device

9:工藝管法蘭 9: Process pipe flange

10:舟裝卸法蘭 10: Boat loading and unloading flange

11:環形間隙 11: Annular gap

13:夾層管路 13: Sandwich pipeline

16:第二密封圈 16: The second sealing ring

17:第三密封圈 17: The third sealing ring

18:第四密封圈 18: The fourth sealing ring

19:第五密封圈 19: Fifth sealing ring

20:測溫套管 20: Thermowell

21:溫度感測器 21: Temperature sensor

22:進氣管 22: intake pipe

41:通氣孔 41: Vent

51:石英筒 51: Quartz Cylinder

52:石英管 52: Quartz tube

53:隔熱材料 53: Insulation material

71:第二冷卻通道 71: second cooling channel

91:環形氣槽 91: Annular air groove

92:橫向氣道 92: transverse airway

93:第一冷卻通道 93: The first cooling channel

94:環形凸緣 94: Ring flange

131:出氣端 131: Exhausting End

第一圖為本發明實施例提供的用於SiC高溫氧化製程的製作腔室的剖視圖。 The first figure is a cross-sectional view of a manufacturing chamber used for a SiC high-temperature oxidation process provided by an embodiment of the present invention.

第二圖為本發明實施例採用的筒狀隔熱裝置的剖視圖。 The second figure is a cross-sectional view of the cylindrical heat insulation device used in the embodiment of the present invention.

第三圖為第一圖中I區域的放大圖。 The third image is an enlarged view of area I in the first image.

第四圖為本發明實施例採用的測溫套管的結構圖。 The fourth figure is a structural diagram of the temperature measuring sleeve used in the embodiment of the present invention.

為使本領域的技術人員更好地理解本發明的技術方案,下面結合附圖來對本發明提供的用於SiC高溫氧化製程的製作腔室及熱處理爐進行詳細描述。 In order to enable those skilled in the art to better understand the technical solutions of the present invention, the manufacturing chamber and heat treatment furnace for SiC high temperature oxidation process provided by the present invention will be described in detail below in conjunction with the accompanying drawings.

請參閱第一圖,本發明實施例提供的用於SiC高溫氧化製程的製作腔室,其包括筒狀隔熱裝置5、隔熱板元件和工藝舟(boat)3,其中,筒狀隔熱裝置5的內部具有封閉的隔熱空間。隔熱板組件包括複數個沿垂直方向疊置在一起的隔熱板4,該隔熱板組件鄰接設置在筒狀隔熱裝置5的上方。工藝舟3用於承載被加工工件,該工藝舟3鄰接設置在隔熱板組件的上方。 Please refer to the first figure. The manufacturing chamber for the SiC high temperature oxidation process provided by the embodiment of the present invention includes a cylindrical heat insulation device 5, a heat insulation plate element and a craft boat 3, wherein the cylindrical heat insulation The inside of the device 5 has a closed thermal insulation space. The heat insulation board assembly includes a plurality of heat insulation boards 4 stacked together in a vertical direction, and the heat insulation board assembly is adjacently arranged above the cylindrical heat insulation device 5. The craft boat 3 is used to carry the workpiece to be processed, and the craft boat 3 is arranged adjacently above the heat insulation board assembly.

通過配合使用筒狀隔熱裝置5和隔熱板元件,可以使腔室內的溫度在垂直方向上呈階梯分佈,即,由下而上逐漸提高,例如,腔室在最下層的隔熱板4以下的區域的溫度為1300℃。由此,可以更有效地阻隔工藝舟3所在區域內的高溫輻射,進而可以工藝舟3所在區域的使用溫度提高 到2000℃以上,以滿足高性能器件的製作要求,而且筒狀隔熱裝置5和隔熱板元件的體積較小,從而可以減小爐腔體積,簡化設備整體結構。 By using the cylindrical heat insulation device 5 and the heat insulation board element in combination, the temperature in the chamber can be distributed in a vertical direction in a stepped manner, that is, gradually increase from bottom to top. For example, the chamber is on the bottom insulation board 4 The temperature in the following area is 1300°C. As a result, the high temperature radiation in the area where the process boat 3 is located can be blocked more effectively, and the use temperature of the area where the process boat 3 is located can be increased. The temperature is above 2000°C to meet the manufacturing requirements of high-performance devices, and the volume of the cylindrical heat insulation device 5 and the heat insulation plate element is small, so that the volume of the furnace cavity can be reduced and the overall structure of the equipment can be simplified.

此外,由於上述筒狀隔熱裝置5的隔熱效果較好,可以在使用溫度滿足製作要求的前提下,降低加熱功率,從而可以降低製作成本。 In addition, since the above-mentioned cylindrical heat insulation device 5 has a better heat insulation effect, the heating power can be reduced on the premise that the use temperature meets the production requirements, thereby reducing the production cost.

在本實施例中,如第二圖所示,筒狀隔熱裝置5包括石英筒51、石英管52和隔熱材料53,其中,石英筒51的上端和下端均為封閉端,石英筒51內部形成封閉的隔熱空間,且石英筒51設有貫穿其上端和下端的穿孔,最佳地,該穿孔位於石英筒51的縱向軸線上;石英管52密封穿設在石英筒51的該穿孔內,作為供製作氣體通過的進氣管道,該石英管52的進氣口與外部的氣源管路連接。隔熱材料53填充在石英管52與石英筒51之間的隔熱空間內。該隔熱材料53例如為保溫棉。當然,在實際應用中,隔熱空間內也可以是真空的。 In this embodiment, as shown in the second figure, the cylindrical heat insulating device 5 includes a quartz cylinder 51, a quartz tube 52 and a heat insulating material 53, wherein the upper and lower ends of the quartz cylinder 51 are both closed ends, and the quartz cylinder 51 A closed heat-insulating space is formed inside, and the quartz cylinder 51 is provided with a perforation penetrating the upper and lower ends thereof. Preferably, the perforation is located on the longitudinal axis of the quartz cylinder 51; the quartz tube 52 is sealed through the perforation of the quartz cylinder 51 Inside, as an air inlet pipe for the production gas to pass through, the air inlet of the quartz tube 52 is connected to an external air source pipe. The heat insulating material 53 is filled in the heat insulating space between the quartz tube 52 and the quartz cylinder 51. The heat insulating material 53 is, for example, heat insulating cotton. Of course, in practical applications, the insulation space can also be vacuum.

在本實施例中,隔熱板元件設置有貫穿每個隔熱板4厚度的通氣孔41,且該通氣孔41與上述石英管52的內部連通,用於將製作氣體輸送至工藝舟3所在區域。 In this embodiment, the heat shield element is provided with a vent 41 penetrating the thickness of each heat shield 4, and the vent 41 communicates with the inside of the quartz tube 52, and is used to deliver the production gas to the process boat 3 area.

視情況而定,隔熱板4與腔室內壁之間具有環形間隙,這樣,製作氣體在經由通氣孔41進入工藝舟3所在區域的同時,還能夠經由該環形間隙進入工藝舟3所在區域。由此,可以使製作氣體更均勻地進入製作區,從而可以提高製作均勻性。 Depending on the situation, there is an annular gap between the heat insulation board 4 and the inner wall of the chamber, so that the production gas can enter the area of the craft boat 3 through the vent 41 while also entering the area of the craft boat 3 through the annular gap. As a result, the production gas can enter the production area more uniformly, and the production uniformity can be improved.

另外,借助筒狀隔熱裝置5和隔熱板元件,可以使腔室在製作區以下的區域的溫度在垂直方向上呈階梯分佈,從而使經過石英管52和通氣孔41的製作氣體能夠在到達製作區之前被預熱,從而可以提高製作效率。 In addition, with the help of the cylindrical heat insulation device 5 and the heat insulation plate element, the temperature of the chamber below the production area can be distributed stepwise in the vertical direction, so that the production gas passing through the quartz tube 52 and the vent 41 can be It is preheated before reaching the production area, which can improve production efficiency.

在本實施例中,工藝舟3鄰接設置在隔熱板組件5的上方,用於承載被加工工件。具體地,工藝舟3包括支架,在該支架上設置有沿垂直方向間隔排布的固定槽,每個固定槽用於承載一個被加工工件。在實際應用中,固定槽的數量可以達到50個,且工藝舟3可以用於裝載多種規格的被加工工件,例如直徑為6寸或者4寸的SiC晶圓。 In this embodiment, the craft boat 3 is arranged adjacently above the heat insulation board assembly 5 for carrying the workpiece to be processed. Specifically, the craft boat 3 includes a support, on which fixed grooves are arranged at intervals along the vertical direction, and each fixed groove is used to carry a workpiece to be processed. In practical applications, the number of fixed grooves can reach 50, and the process boat 3 can be used to load workpieces of various specifications, such as SiC wafers with a diameter of 6 inches or 4 inches.

在本實施例中,製作腔室還包括舟裝卸法蘭(flange)10,該舟裝卸法蘭10密封抵靠在石英筒51的下端,用於支撐筒狀隔熱裝置5、隔熱板元件和工藝舟3並能作升降移動,進氣管22密封穿設在舟裝卸法蘭10上並與石英管52的內部連通。 In this embodiment, the production chamber further includes a boat loading and unloading flange (flange) 10, the boat loading and unloading flange 10 is sealed against the lower end of the quartz cylinder 51, and is used to support the cylindrical heat insulation device 5 and the heat insulation plate element. It can move up and down with the craft boat 3, and the air inlet pipe 22 is sealed through the boat loading and unloading flange 10 and communicates with the inside of the quartz tube 52.

在本實施例中,如第三圖所示,石英筒51的下端設有過濾孔,該過濾孔將上述隔熱空間與石英筒51的外部連通,且過濾孔內設有篩檢程式14,用於過濾自隔熱結構5排出的氣體中的雜質。並且,舟裝卸法蘭10內設有夾層管路13,該夾層管路13的一端與過濾孔連通,夾層管路13的另一端與第二抽氣裝置(圖中未示出)連通。借助篩檢程式14和夾層管路13,可以抽取並過濾隔熱空間內的氣體,保證隔熱空間內的材料放出的氣體不會對工藝舟3所在區域造成污染,從而可以提高腔室內的潔淨度。 In this embodiment, as shown in the third figure, the lower end of the quartz cylinder 51 is provided with a filter hole, which communicates the above-mentioned heat insulation space with the outside of the quartz cylinder 51, and a screening program 14 is provided in the filter hole. Used to filter impurities in the gas discharged from the thermal insulation structure 5. In addition, the boat loading and unloading flange 10 is provided with an interlayer pipeline 13, one end of the interlayer pipeline 13 communicates with the filter hole, and the other end of the interlayer pipeline 13 communicates with a second air extraction device (not shown in the figure). With the help of the screening program 14 and the interlayer pipeline 13, the gas in the thermal insulation space can be extracted and filtered to ensure that the gas emitted by the materials in the thermal insulation space will not pollute the area where the craft boat 3 is located, thereby improving the cleanliness of the chamber degree.

在本實施例中,石英筒51的下端與舟裝卸法蘭10之間設置有第四密封圈18,該第四密封圈18環繞在上述過濾孔周圍,用於密封過濾孔,從而保證隔熱空間的密封性。視情況而定,第四密封圈18為V型密封圈。 In this embodiment, a fourth sealing ring 18 is provided between the lower end of the quartz cylinder 51 and the boat loading and unloading flange 10. The fourth sealing ring 18 surrounds the filter hole and is used to seal the filter hole to ensure heat insulation. The tightness of the space. Depending on the situation, the fourth sealing ring 18 is a V-shaped sealing ring.

在本實施例中,石英筒51的下端與舟裝卸法蘭10之間還設置有第五密封圈19,並且石英管51的下端開口、過濾孔和第四密封圈19均位於第五密封圈18環繞的密封區域內。視情況而定,第五密封圈19為星型密封圈。 In this embodiment, a fifth sealing ring 19 is also provided between the lower end of the quartz cylinder 51 and the boat mounting flange 10, and the lower end opening of the quartz tube 51, the filter hole and the fourth sealing ring 19 are all located in the fifth sealing ring. 18 surrounding the sealed area. Depending on the situation, the fifth sealing ring 19 is a star-shaped sealing ring.

在本實施例中,製作腔室還包括製作管體1、內筒體2和工藝管法蘭9。其中,製作管體1的上端封閉,下端敞開;並且,製作管體1的軸向垂直設置。內筒體2的上端和下端均敞開,且同軸設置在製作管體1內部;內筒體2與製作管體1之間形成環形間隙11。並且,筒狀隔熱裝置5、隔熱板元件和工藝舟3能夠相對於內筒體2作升降運動,以能升入到內筒體2內部,或者自內筒體2移出。這樣,可以更方便地對工藝舟3進行更換,以及對筒狀隔熱裝置5、隔熱板元件和工藝舟3等的零件進行維護。 In this embodiment, the production chamber further includes a production tube body 1, an inner cylinder body 2 and a process tube flange 9. Wherein, the upper end of the tube 1 is closed and the lower end is open; and the axial direction of the tube 1 is vertically arranged. The upper and lower ends of the inner cylinder 2 are open, and are coaxially arranged inside the manufacturing tube 1; an annular gap 11 is formed between the inner cylinder 2 and the manufacturing tube 1. In addition, the cylindrical heat insulation device 5, the heat insulation board element and the craft boat 3 can move up and down relative to the inner cylinder 2 so as to be able to rise into the inner cylinder 2 or move out from the inner cylinder 2. In this way, the process boat 3 can be replaced more conveniently, and the parts such as the cylindrical heat insulation device 5, the heat insulation plate element, and the process boat 3 can be maintained.

視情況而定,製作管體1和內筒體2均採用超純石墨製作,且在二者的內、外表面形成熱解碳塗層,以保證腔室內部的氣密性。 Depending on the situation, the tube body 1 and the inner cylinder body 2 are made of ultra-pure graphite, and a pyrolytic carbon coating is formed on the inner and outer surfaces of the two to ensure the air tightness of the chamber.

如第一圖和第三圖所示,工藝管法蘭9為環形結構,該工藝管法蘭9與製作管體1的下端和內筒體2的下端均密封連接;並且,工藝管法蘭9的頂面設有向下凹陷的環形氣槽91,該環形氣槽91與環形間隙11對接連通;工藝管法蘭9內設有與環形氣槽91連通的橫向氣道92,該橫向氣道92與第一抽氣裝置8連通。環形間隙11、環形氣槽91和橫向氣道92,構成與內筒體2內部連通的排氣通道,完成反應的氣體經由該排氣通道排出。 As shown in the first and third figures, the process pipe flange 9 has an annular structure, and the process pipe flange 9 is hermetically connected to the lower end of the production pipe body 1 and the lower end of the inner cylinder body 2; and, the process pipe flange The top surface of 9 is provided with a downwardly recessed annular gas groove 91 which is connected to the annular gap 11; the process pipe flange 9 is provided with a transverse air passage 92 communicating with the annular gas groove 91. 92 is in communication with the first suction device 8. The annular gap 11, the annular gas groove 91 and the transverse air passage 92 constitute an exhaust passage communicating with the inside of the inner cylinder 2 through which the reacted gas is discharged.

在本實施例中,工藝管法蘭9對接安裝在爐筒法蘭7上,該爐筒法蘭7為環形結構,固定安裝在製作管體1上,並且爐筒法蘭7位於工藝管法蘭9的上方並圍繞在製作管體1的外側周圍。 In this embodiment, the process tube flange 9 is butt-mounted on the furnace tube flange 7. The furnace tube flange 7 has a ring structure and is fixedly installed on the manufacturing tube body 1, and the furnace tube flange 7 is located in the process tube method. The blue 9 is above and around the outer periphery of the tube body 1 made.

視情況而定,在舟裝卸法蘭10與工藝管法蘭9之間設置有第二密封圈16,用於對二者之間的間隙進行密封,從而保證製作管體1與內筒體2之間的環形間隙以及內筒體2內部的封閉性。 Depending on the situation, a second sealing ring 16 is provided between the boat loading and unloading flange 10 and the process pipe flange 9 to seal the gap between the two to ensure the production of the pipe body 1 and the inner cylinder body 2. The annular gap between and the sealing of the inner cylinder 2.

在本實施例中,夾層管路13的出氣端131位於舟裝卸法蘭10與工藝管法蘭9之間;並且,第二密封圈16位於夾層管路13的出氣端131的內側;並且,在舟裝卸法蘭10與工藝管法蘭9之間設置有第三密封圈17,該 第三密封圈17位於夾層管路13的出氣端131的外側。借助上述第二密封圈16和第三密封圈17,可以對舟裝卸法蘭10與工藝管法蘭9之間的間隙進行雙重密封,同時對夾層管路13的出氣端131進行密封。 In this embodiment, the gas outlet end 131 of the interlayer pipeline 13 is located between the boat loading and unloading flange 10 and the process pipe flange 9; and the second sealing ring 16 is located inside the gas outlet end 131 of the interlayer pipeline 13; and, A third sealing ring 17 is provided between the boat loading and unloading flange 10 and the process pipe flange 9. The third sealing ring 17 is located outside the air outlet 131 of the interlayer pipeline 13. With the aid of the second sealing ring 16 and the third sealing ring 17, the gap between the boat loading and unloading flange 10 and the process pipe flange 9 can be double-sealed, and the gas outlet end 131 of the sandwich pipeline 13 can be sealed at the same time.

視情況而定,第三密封圈17為V型密封圈。這種密封圈的變形量較大,密封效果較好。第二密封圈16可以為O型密封圈。 Depending on the situation, the third sealing ring 17 is a V-shaped sealing ring. This kind of seal ring has a large deformation and a better sealing effect. The second sealing ring 16 may be an O-shaped sealing ring.

並且,工藝管法蘭9的頂面設有向上突出的環形凸緣94,該環形凸緣94環繞在製作管體1的外側周圍;並且,在爐筒法蘭7的下表面設置有環形凹槽,環形凸緣94伸入到該環形凹槽中。環形凸緣94的上表面、環形凹槽的與環形凸緣94的上表面相對的表面以及製作管體1的外周壁共同構成環形空間,該環形空間內設有第一密封圈6,用於對工藝管法蘭9與製作管體1之間的間隙進行密封,從而保證製作管體1內的封閉性。視情況而定,該第一密封圈6為全氟橡膠圈。 In addition, the top surface of the process pipe flange 9 is provided with an upwardly protruding annular flange 94, which surrounds the outer periphery of the manufacturing tube body 1; and, an annular recess is provided on the lower surface of the furnace flange 7 Groove, the annular flange 94 extends into the annular groove. The upper surface of the annular flange 94, the surface of the annular groove opposite to the upper surface of the annular flange 94, and the outer peripheral wall of the pipe body 1 together constitute an annular space. The annular space is provided with a first sealing ring 6 for The gap between the process pipe flange 9 and the production pipe body 1 is sealed, so as to ensure the sealability in the production pipe body 1. Depending on the situation, the first sealing ring 6 is a perfluoro rubber ring.

綜上所述,借助由上述第一隻第五密封圈構成的密封系統,可以提高腔室的氣密性,有效降低整個系統的氣體洩漏量。 In summary, with the aid of the sealing system constituted by the first and fifth sealing rings, the air tightness of the chamber can be improved, and the gas leakage of the entire system can be effectively reduced.

在本實施例中,工藝管法蘭9內設置有環形的第一冷卻通道93,通過向該第一冷卻通道93中通入冷卻媒介(例如冷卻水)來冷卻工藝管法蘭9,進而間接冷卻工藝管法蘭9附近的零件。同樣的,爐筒法蘭7內設有環形的第二冷卻通道71。通過向第二冷卻通道71中通入冷卻媒介來冷卻爐筒法蘭7,從而間接冷卻爐筒法蘭7附近的零件。 In this embodiment, the process tube flange 9 is provided with an annular first cooling channel 93, and the process tube flange 9 is cooled by passing a cooling medium (such as cooling water) into the first cooling channel 93, thereby indirectly Cool the parts near the flange 9 of the process pipe. Similarly, an annular second cooling channel 71 is provided in the furnace flange 7. The furnace flange 7 is cooled by passing a cooling medium into the second cooling channel 71, thereby indirectly cooling the parts near the furnace flange 7.

借助上述第一冷卻通道93和第二冷卻通道71,可以有效降低高溫對密封圈的影響,從而可以避免密封圈在高溫條件下失效。通過實驗發現,上述第一冷卻通道93和第二冷卻通道71可以將密封圈的溫度變化控制在200℃以下。 With the above-mentioned first cooling channel 93 and second cooling channel 71, the influence of high temperature on the sealing ring can be effectively reduced, so that the sealing ring can be prevented from failing under high temperature conditions. It is found through experiments that the first cooling channel 93 and the second cooling channel 71 can control the temperature change of the seal ring below 200°C.

在本實施例中,如第四圖所示,在爐筒法蘭7中設置有測溫套管20,該測溫套管20的檢測端位於爐筒法蘭7的內周壁上,以能夠靠近製作管體1。測溫套管20的另一端穿過爐筒法蘭7延伸出去;並且,在測溫套管20中設置有溫度感測器21。 In this embodiment, as shown in the fourth figure, a temperature measuring sleeve 20 is provided in the furnace tube flange 7. The detection end of the temperature measuring sleeve 20 is located on the inner peripheral wall of the furnace tube flange 7 to enable Close to the production tube 1. The other end of the temperature measuring sleeve 20 extends through the furnace barrel flange 7; and a temperature sensor 21 is provided in the temperature measuring sleeve 20.

視情況而定,測溫套管20為波紋管。最佳地,該波紋管的外徑很小,以滿足超高溫環境的使用。 Depending on the situation, the temperature measuring sleeve 20 is a bellows. Optimally, the outer diameter of the bellows is small to meet the use of ultra-high temperature environments.

在本實施例中,製作管體1、內筒體2、隔熱板元件以及筒狀隔熱裝置5均為圓柱體狀,並且同軸線設置;並且,隔熱板元件的外緣與內筒體2的內壁之間具有間隙,用於將製作氣體輸送至工藝舟3所在區域。這樣,製作氣體在經由隔熱板4的通氣孔41進入工藝舟3所在區域的同時,還能夠經由隔熱板元件的外緣與內筒體2的內壁之間的間隙進入工藝舟3所在區域。由此,可以使製作氣體更均勻地進入製作區,從而可以提高製作均勻性。 In this embodiment, the tube body 1, the inner cylinder body 2, the heat insulation board element, and the cylindrical heat insulation device 5 are all cylindrical, and are arranged coaxially; and the outer edge of the heat insulation board element and the inner cylinder There is a gap between the inner walls of the body 2 for transporting the production gas to the area where the process boat 3 is located. In this way, while the production gas enters the area of the craft boat 3 through the vent 41 of the heat insulation plate 4, it can also enter the craft boat 3 through the gap between the outer edge of the heat shield element and the inner wall of the inner cylinder 2. area. As a result, the production gas can enter the production area more uniformly, and the production uniformity can be improved.

通過實驗發現,本發明提供的製作腔室,其最高溫度達到2000℃以上;腔室的氣體洩漏率小於1E-7mbar.l/s;腔室的金屬污染率小於1E+1latoms/cm2It is found through experiments that the maximum temperature of the manufacturing chamber provided by the present invention reaches above 2000°C; the gas leakage rate of the chamber is less than 1E-7mbar.l/s; the metal contamination rate of the chamber is less than 1E+1latoms/cm 2 .

需要說明的是,本發明提供的製作腔室可以應用在例如SiC晶圓的高溫真空熱處理製程中。或者,通過更換熱處理爐的相應零件(例如製作管體)的材料,而無需改變結構,本發明提供的製作腔室還可以應用在溫度較低的諸如矽片的熱處理製程中。 It should be noted that the fabrication chamber provided by the present invention can be applied to, for example, a high-temperature vacuum heat treatment process of SiC wafers. Or, by replacing the materials of the corresponding parts of the heat treatment furnace (for example, making the tube body) without changing the structure, the production chamber provided by the present invention can also be used in the heat treatment process of lower temperature such as silicon wafer.

綜上所述,本發明提供的製作腔室,其包括筒狀隔熱裝置,內部具有封閉的隔熱空間;隔熱板組件,包括複數個沿垂直方向疊置在一起的隔熱板;以及工藝舟,鄰接設置在隔熱板組件的上方。通過配合使用筒狀隔熱裝置和隔熱板元件,可以更有效地阻隔工藝舟所在區域內的高溫 輻射,從而可以提高工藝舟所在區域的使用溫度達到2000℃以上,以滿足高性能器件的製作要求,而且筒狀隔熱裝置和隔熱板元件的體積較小,從而可以減小腔室體積,簡化設備整體結構。 To sum up, the manufacturing chamber provided by the present invention includes a cylindrical heat insulation device with a closed heat insulation space inside; a heat insulation board assembly including a plurality of heat insulation boards stacked together in a vertical direction; and The craft boat is arranged adjacently above the heat insulation board assembly. Through the use of cylindrical heat insulation device and heat insulation board elements, the high temperature in the area where the craft boat is located can be blocked more effectively Radiation, which can increase the operating temperature of the craft boat area to more than 2000 ℃ to meet the production requirements of high-performance devices, and the volume of the cylindrical heat insulation device and heat insulation board components is small, which can reduce the volume of the chamber. Simplify the overall structure of the equipment.

作為另一個技術方案,本發明還提供一種熱處理爐,其包括本發明提供的上述製作腔室。 As another technical solution, the present invention also provides a heat treatment furnace, which includes the above-mentioned production chamber provided by the present invention.

本發明提供的熱處理爐,其通過採用本發明提供的上述製作腔室,不僅具有較高的使用溫度、較小的腔室體積,而且可以簡化設備整體結構。 The heat treatment furnace provided by the present invention not only has a higher use temperature and a smaller chamber volume, but also can simplify the overall structure of the equipment by using the above-mentioned manufacturing chamber provided by the present invention.

可以理解的是,以上實施方式僅僅是為了說明本發明的原理而採用的示例性實施方式,然而本發明並不局限於此。對於本領域內的普通技術人員而言,在不脫離本發明的精神和實質的情況下,可以做出各種變型和改進,這些變型和改進也視為本發明的保護範圍。 It can be understood that the above implementations are merely exemplary implementations used to illustrate the principle of the present invention, but the present invention is not limited thereto. For those of ordinary skill in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also regarded as the protection scope of the present invention.

1‧‧‧製作管體 1‧‧‧Making the tube body

2‧‧‧內筒體 2‧‧‧Inner cylinder

3‧‧‧工藝舟 3‧‧‧Craft Boat

4‧‧‧隔熱板 4‧‧‧Insulation board

5‧‧‧筒狀隔熱裝置 5‧‧‧Cylinder heat insulation device

6‧‧‧第一密封圈 6‧‧‧First sealing ring

7‧‧‧爐筒法蘭 7‧‧‧Flange of furnace tube

8‧‧‧第一抽氣裝置 8‧‧‧The first exhaust device

9‧‧‧工藝管法蘭 9‧‧‧Process pipe flange

10‧‧‧舟裝卸法蘭 10‧‧‧Boat loading and unloading flange

11‧‧‧環形間隙 11‧‧‧Annular gap

13‧‧‧夾層管路 13‧‧‧Sandwich pipe

22‧‧‧進氣管 22‧‧‧Intake pipe

41‧‧‧通氣孔 41‧‧‧Vent

52‧‧‧石英管 52‧‧‧Quartz tube

71‧‧‧第二冷卻通道 71‧‧‧Second cooling channel

91‧‧‧環形氣槽 91‧‧‧Annular air groove

92‧‧‧橫向氣道 92‧‧‧Horizontal airway

93‧‧‧第一冷卻通道 93‧‧‧The first cooling channel

Claims (12)

一種用於SiC高溫氧化製程的製作腔室,包括:一筒狀隔熱裝置,內部具有封閉的一隔熱空間;一隔熱板組件,包括複數個沿垂直方向疊置在一起的隔熱板;所述隔熱板組件鄰接設置在所述筒狀隔熱裝置的上方;以及一工藝舟,用於承載一被加工工件;所述工藝舟鄰接設置在所述隔熱板組件的上方;其中所述筒狀隔熱裝置包括:一石英筒,所述石英筒的上端和下端均為封閉端,內部形成封閉的所述隔熱空間,且所述石英筒設有貫穿其上端和下端的一穿孔;一石英管,所述石英管密封穿設在所述石英筒的所述穿孔內;以及一隔熱材料,填充在所述石英管與所述石英筒之間的所述隔熱空間內。 A manufacturing chamber for SiC high-temperature oxidation process, comprising: a cylindrical heat insulation device with a closed heat insulation space inside; and a heat insulation board assembly including a plurality of heat insulation boards stacked together in a vertical direction The heat insulation board assembly is arranged adjacently above the cylindrical heat insulation device; and a craft boat for carrying a workpiece to be processed; the craft boat is arranged adjacently above the heat insulation board assembly; wherein The cylindrical heat insulation device includes: a quartz cylinder, the upper end and the lower end of the quartz cylinder are both closed ends, the closed heat insulation space is formed inside, and the quartz cylinder is provided with a quartz cylinder penetrating the upper end and the lower end. Perforation; a quartz tube, the quartz tube is sealed through the perforation of the quartz cylinder; and a heat insulating material filled in the heat insulation space between the quartz tube and the quartz cylinder . 如申請專利範圍第1項所述之製作腔室,其中所述製作腔室還包括一舟裝卸法蘭,所述舟裝卸法蘭密封抵靠在所述石英筒的下端,用於支撐所述筒狀隔熱裝置、所述隔熱板組件和所述工藝舟並能升降移動,進氣管密封穿設在所述舟裝卸法蘭上並與所述石英管的內部連通。 The manufacturing chamber described in item 1 of the scope of patent application, wherein the manufacturing chamber further includes a boat loading and unloading flange, and the boat loading and unloading flange is sealed against the lower end of the quartz cylinder for supporting the The cylindrical heat insulation device, the heat insulation board assembly and the craft boat can move up and down, and the air inlet pipe is sealed and penetrated on the boat loading and unloading flange and communicates with the inside of the quartz tube. 如申請專利範圍第2項所述之製作腔室,其中所述石英筒的下端設有一過濾孔,所述過濾孔將所述隔熱空間與所述石英筒的外部連通,且所述過濾孔內設有一篩檢程式;所述舟裝卸法蘭內設有一夾層管路,所述夾層管路的一端與所述過濾孔連通,所述夾層管路的另一端與一第二抽氣裝置連通。 As described in item 2 of the scope of patent application, a filter hole is provided at the lower end of the quartz cylinder, and the filter hole communicates the heat insulation space with the outside of the quartz cylinder, and the filter hole There is a screening program; the boat loading and unloading flange is provided with a sandwich pipeline, one end of the sandwich pipeline is connected with the filter hole, and the other end of the sandwich pipeline is connected with a second air extraction device . 如申請專利範圍第3項所述之製作腔室,其中所述石英筒的下端與所述舟裝卸法蘭之間設置有一第四密封圈,所述第四密封圈環繞在所述過濾孔周圍。 As described in item 3 of the scope of patent application, a fourth sealing ring is arranged between the lower end of the quartz cylinder and the boat loading and unloading flange, and the fourth sealing ring surrounds the filter hole . 如申請專利範圍第4項所述之製作腔室,其中所述石英筒的下端與所述舟裝卸法蘭之間還設置有一第五密封圈,並且所述石英管的下端開口、所述過濾孔和所述第四密封圈均位於所述第五密封圈環繞的密封區域內。 As described in item 4 of the scope of patent application, a fifth sealing ring is provided between the lower end of the quartz cylinder and the boat loading and unloading flange, and the lower end of the quartz tube is open, and the filter Both the hole and the fourth sealing ring are located in the sealing area surrounded by the fifth sealing ring. 如申請專利範圍第1項所述之製作腔室,其中所述隔熱板元件設置有貫穿每個所述隔熱板厚度的一通氣孔,且所述通氣孔與所述石英管的內部連通,用於將製作氣體輸送至所述工藝舟所在區域。 According to the manufacturing chamber described in the first item of the scope of patent application, wherein the heat insulation board element is provided with a vent hole penetrating the thickness of each heat insulation board, and the vent hole communicates with the inside of the quartz tube, It is used to deliver production gas to the area where the craft boat is located. 如申請專利範圍第2項所述之製作腔室,其中所述製作腔室還包括:一製作管體,所述製作管體的上端封閉,下端敞開;所述製作管體的軸向垂直設置;一內筒體,所述內筒體的上端和下端均敞開,且同軸設置在所述製作管體內部;所述內筒體與所述製作管體之間形成環形間隙;所述筒狀隔熱裝置、所述隔熱板組件和所述工藝舟能升入到所述內筒體內部;以及一工藝管法蘭,為環形結構;所述工藝管法蘭與所述製作管體的下端和所述內筒體的下端均密封連接;所述工藝管法蘭的頂面設有向下凹陷的一環形氣槽,所述環形氣槽與所述環形間隙對接連通;所述工藝管法蘭內設有與所述環形氣槽連通的一橫向氣道,所述橫向氣道與一第一抽氣裝置連通。 The manufacturing chamber described in item 2 of the scope of patent application, wherein the manufacturing chamber further includes: a manufacturing tube body, the upper end of the manufacturing tube body is closed, and the lower end is open; the axial direction of the manufacturing tube body is vertically arranged An inner cylinder, the upper and lower ends of the inner cylinder are open, and are coaxially arranged inside the production tube; an annular gap is formed between the inner cylinder and the production tube; the cylindrical The heat insulation device, the heat insulation board assembly and the process boat can be raised into the inner cylinder; and a process pipe flange having a ring structure; the process pipe flange and the manufacturing pipe body The lower end and the lower end of the inner cylinder are both hermetically connected; the top surface of the process pipe flange is provided with an annular gas groove recessed downward, and the annular gas groove is in butt communication with the annular gap; A transverse air passage communicating with the annular air groove is arranged in the pipe flange, and the transverse air passage is communicated with a first air suction device. 如申請專利範圍第7項所述之製作腔室,其中所述工藝管法蘭對接安裝在一爐筒法蘭上;所述爐筒法蘭為環形結構,固定安裝在所述製作管體上,所述爐筒法蘭位於所述工藝管法蘭的上方並圍繞在所述製作管體的外側周圍;所述工藝管法蘭的頂面設有向上突出的一環形凸緣,所述環形凸緣環繞在所述製作管體的外側周圍;並且,在所述爐筒法蘭的下表面設置有一環形凹槽,所述環形凸緣伸入到所述環形凹槽中;所述環形凸緣的上表面、所述環形凹槽的與所述環形凸緣的上表面相對的表面以及所述製作管體的外周壁共同構成一環形空間,所述環形空間內設有一第一密封圈。 The manufacturing chamber described in item 7 of the scope of patent application, wherein the process pipe flange is butt-mounted on a furnace barrel flange; the furnace barrel flange is a ring structure and is fixedly installed on the manufacturing pipe body , The furnace barrel flange is located above the process pipe flange and surrounds the outer side of the production pipe body; the top surface of the process pipe flange is provided with an upwardly protruding annular flange, the ring The flange surrounds the outer side of the production tube; and, an annular groove is provided on the lower surface of the furnace barrel flange, and the annular flange extends into the annular groove; the annular convex The upper surface of the rim, the surface of the annular groove opposite to the upper surface of the annular flange, and the outer peripheral wall of the pipe body together constitute an annular space, and a first sealing ring is arranged in the annular space. 如申請專利範圍第8項所述之製作腔室,其中所述工藝管法蘭與所述爐筒法蘭內均設有一環形冷卻水道。 In the manufacturing chamber described in item 8 of the scope of patent application, an annular cooling water channel is provided in the process pipe flange and the furnace barrel flange. 如申請專利範圍第8項所述之製作腔室,其中在所述爐筒法蘭中設置有測溫套管,所述測溫套管的檢測端位於所述爐筒法蘭的內周壁上,所述測溫套管的另一端穿過所述爐筒法蘭延伸出去;並且,在所述測溫套管中設置有一溫度感測器。 The manufacturing chamber described in item 8 of the scope of patent application, wherein a temperature measuring sleeve is arranged in the furnace barrel flange, and the detection end of the temperature measuring sleeve is located on the inner peripheral wall of the furnace barrel flange , The other end of the temperature measuring sleeve extends out through the furnace barrel flange; and a temperature sensor is arranged in the temperature measuring sleeve. 如申請專利範圍第7項至第10項中任一項所述之製作腔室,其中所述製作管體、所述內筒體、所述隔熱板組件以及所述筒狀隔熱裝置均為圓柱體狀,並且同軸線設置;所述隔熱板元件的外緣與所述內筒體的內壁之間具有間隙,用於將製作氣體輸送至所述工藝舟所在區域。 The manufacturing chamber described in any one of the 7th to 10th items of the scope of the patent application, wherein the manufacturing tube, the inner cylinder, the heat insulation board assembly and the cylindrical heat insulation device are all It is cylindrical and arranged coaxially; there is a gap between the outer edge of the insulation board element and the inner wall of the inner cylinder, which is used to transport the production gas to the area where the process boat is located. 一種用於SiC高溫氧化製程的熱處理爐,其中所述熱處理爐包括申請專利範圍第1項至第11項任一項所述之製作腔室。 A heat treatment furnace for SiC high-temperature oxidation process, wherein the heat treatment furnace includes the production chamber described in any one of items 1 to 11 in the scope of patent application.
TW107146147A 2018-07-18 2018-12-20 Manufacturing chamber and heat treatment furnace for SiC high temperature oxidation process TWI710658B (en)

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