TWI710658B - Manufacturing chamber and heat treatment furnace for SiC high temperature oxidation process - Google Patents
Manufacturing chamber and heat treatment furnace for SiC high temperature oxidation process Download PDFInfo
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- TWI710658B TWI710658B TW107146147A TW107146147A TWI710658B TW I710658 B TWI710658 B TW I710658B TW 107146147 A TW107146147 A TW 107146147A TW 107146147 A TW107146147 A TW 107146147A TW I710658 B TWI710658 B TW I710658B
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
- F27B17/0025—Especially adapted for treating semiconductor wafers
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D5/00—Supports, screens, or the like for the charge within the furnace
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D5/00—Supports, screens, or the like for the charge within the furnace
- F27D5/0037—Supports specially adapted for semi-conductors
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D5/00—Supports, screens, or the like for the charge within the furnace
- F27D5/0068—Containers
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/02—Supplying steam, vapour, gases, or liquids
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D9/00—Cooling of furnaces or of charges therein
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
- F27D99/0073—Seals
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D5/00—Supports, screens, or the like for the charge within the furnace
- F27D2005/0081—Details
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/02—Supplying steam, vapour, gases, or liquids
- F27D2007/023—Conduits
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D9/00—Cooling of furnaces or of charges therein
- F27D2009/0002—Cooling of furnaces
- F27D2009/001—Cooling of furnaces the cooling medium being a fluid other than a gas
- F27D2009/0013—Cooling of furnaces the cooling medium being a fluid other than a gas the fluid being water
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Abstract
本發明提供一種用於SiC高溫氧化製程的製作腔室及熱處理爐,該製作腔室包括:筒狀隔熱裝置,內部具有封閉的隔熱空間;隔熱板組件,包括複數個沿垂直方向疊置在一起的隔熱板;隔熱板元件鄰接設置在筒狀隔熱裝置的上方;以及工藝舟,用於承載被加工工件;工藝舟鄰接設置在隔熱板組件的上方。本發明提供的用於SiC高溫氧化製程的製作腔室,其不僅具有較高的使用溫度、較小的爐腔體積,而且可以簡化設備整體結構。The present invention provides a manufacturing chamber and a heat treatment furnace used in a SiC high-temperature oxidation process. The manufacturing chamber includes: a cylindrical heat insulation device with a closed heat insulation space inside; and a heat insulation board assembly including a plurality of stacked in a vertical direction The heat insulation boards are arranged together; the heat insulation board elements are adjacently arranged above the cylindrical heat insulation device; and the craft boat is used to carry the workpiece to be processed; the craft boat is arranged adjacently above the heat insulation board assembly. The manufacturing chamber for the SiC high-temperature oxidation process provided by the present invention not only has a higher use temperature and a smaller furnace cavity volume, but also can simplify the overall structure of the equipment.
Description
本發明涉及半導體製造領域,具體地,涉及一種用於SiC高溫氧化製程的製作腔室及熱處理爐。 The invention relates to the field of semiconductor manufacturing, in particular, to a manufacturing chamber and a heat treatment furnace used in a SiC high temperature oxidation process.
SiC材料具有寬頻隙、高飽和漂移速度、高熱導率、高臨界擊穿電場等突出優點,屬第三代半導體材料,適合製備高功率、高頻、高壓、高溫、抗輻照電子器件。 SiC material has outstanding advantages such as wide frequency gap, high saturation drift speed, high thermal conductivity, and high critical breakdown electric field. It belongs to the third generation of semiconductor materials and is suitable for preparing high-power, high-frequency, high-pressure, high-temperature, radiation-resistant electronic devices.
SiC材料是唯一可以直接氧化生長SiO2薄膜的寬禁帶半導體,最常用的方法是採用高溫乾氧或濕氧的熱氧化方法來生長SiO2薄膜,並且熱氧化製程獲得SiO2薄膜和介面特性的品質是最好的。 SiC material is the only wide-bandgap semiconductor that can directly oxidize and grow SiO 2 films. The most commonly used method is to grow SiO 2 films using high-temperature dry oxygen or wet oxygen thermal oxidation methods, and the thermal oxidation process obtains SiO 2 films and interface characteristics The quality is the best.
SiC高溫氧化製程的溫度高達1500℃,常規高溫設備無法滿足製作要求。目前業內利用高溫氧化爐進行SiC片的高溫氧化製程,高溫氧化爐是SiC器件積體電路生產線的關鍵製作設備。 The temperature of the SiC high-temperature oxidation process is as high as 1500°C, and conventional high-temperature equipment cannot meet the manufacturing requirements. At present, the industry uses a high-temperature oxidation furnace for the high-temperature oxidation process of SiC wafers, and the high-temperature oxidation furnace is a key production equipment of the SiC device integrated circuit production line.
現有的一種高溫退火爐的最高溫度為1950℃,使用溫度較低,不利於離子啟動,器件電學性能不易提高。同時,製作腔內的隔熱擋板數量很多,腔室容積較大,不利於腔室製作溫度均勻性、氣密性、潔淨度等關鍵指標控制。此外,對進氣管路的冷卻的過渡結構冗長,不利於設備整體優化。 The highest temperature of an existing high-temperature annealing furnace is 1950°C, which is low in use temperature, which is not conducive to ion start, and the electrical performance of the device is not easily improved. At the same time, the number of heat insulation baffles in the manufacturing chamber is large, and the chamber volume is large, which is not conducive to the control of key indicators such as temperature uniformity, air tightness, and cleanliness of the chamber. In addition, the transition structure for cooling the intake pipe is lengthy, which is not conducive to the overall optimization of the equipment.
本發明旨在至少解決現有技術中存在的技術問題之一’提出了一種用於SiC高溫氧化製程的製作腔室及熱處理爐,其不僅具有較高的使用溫度、較小的爐腔體積,而且可以簡化設備整體結構。 The present invention aims to solve at least one of the technical problems existing in the prior art. It proposes a manufacturing chamber and heat treatment furnace for SiC high-temperature oxidation process, which not only has a higher use temperature and a smaller furnace chamber volume, but also The overall structure of the equipment can be simplified.
為實現本發明的目的而提供一種用於SiC高溫氧化製程的製作腔室,包括:一筒狀隔熱裝置,內部具有封閉的隔熱空間;一隔熱板組件,包括複數個沿垂直方向疊置在一起的隔熱板;所述隔熱板組件鄰接設置在所述筒狀隔熱裝置的上方;以及一工藝舟,用於承載一被加工工件;所述工藝舟鄰接設置在所述隔熱板組件的上方。 In order to achieve the objective of the present invention, a manufacturing chamber for SiC high-temperature oxidation process is provided, which includes: a cylindrical heat insulation device with a closed heat insulation space inside; and a heat insulation board assembly including a plurality of stacked in a vertical direction Heat insulation boards placed together; the heat insulation board assembly is arranged adjacently above the cylindrical heat insulation device; and a craft boat for carrying a workpiece to be processed; the craft boat is arranged adjacent to the partition Above the hot plate assembly.
較佳地,所述筒狀隔熱裝置包括:一石英筒,所述石英筒的一上端和一下端均為封閉端,內部形成封閉的所述隔熱空間,且所述石英筒設有貫穿其上端和下端的一穿孔;一石英管,所述石英管密封穿設在所述石英筒的所述穿孔內;以及一隔熱材料,填充在所述石英管與所述石英筒之間的所述隔熱空間內。 Preferably, the cylindrical heat insulation device includes: a quartz cylinder, an upper end and a lower end of the quartz cylinder are both closed ends, the enclosed heat insulation space is formed inside, and the quartz cylinder is provided with a through hole A perforation at the upper and lower ends; a quartz tube, the quartz tube is sealed and penetrated in the perforation of the quartz cylinder; and a heat insulation material filled in between the quartz tube and the quartz cylinder Inside the thermal insulation space.
較佳地,所述製作腔室還包括一舟裝卸法蘭,所述舟裝卸法蘭密封抵靠在所述石英筒的下端,用於支撐所述筒狀隔熱裝置、所述隔熱板組件和所述工藝舟並能升降移動,一進氣管密封穿設在所述舟裝卸法蘭上並與所述石英管的內部連通。 Preferably, the production chamber further includes a boat loading and unloading flange, and the boat loading and unloading flange is sealed against the lower end of the quartz cylinder for supporting the cylindrical heat insulation device and the heat insulation plate The components and the craft boat can move up and down, and an air inlet pipe is sealed through the boat loading and unloading flange and communicates with the inside of the quartz tube.
較佳地,所述石英筒的下端設有一過濾孔,所述過濾孔將所述隔熱空間與所述石英筒的外部連通,且所述過濾孔內設有一篩檢程式;所述舟裝卸法蘭內設有一夾層管路,所述夾層管路的一端與所述過濾孔連通,所述夾層管路的另一端與一第二抽氣裝置連通。 Preferably, the lower end of the quartz cylinder is provided with a filter hole, the filter hole communicates the heat insulation space with the outside of the quartz cylinder, and a screening program is provided in the filter hole; the boat loading and unloading A sandwich pipeline is arranged in the flange, one end of the sandwich pipeline is communicated with the filter hole, and the other end of the sandwich pipeline is communicated with a second suction device.
較佳地,所述石英筒的一下端與所述舟裝卸法蘭之間設置有一第四密封圈,所述第四密封圈環繞在所述過濾孔周圍。 Preferably, a fourth sealing ring is arranged between the lower end of the quartz cylinder and the boat loading and unloading flange, and the fourth sealing ring surrounds the filter hole.
較佳地,所述石英筒的下端與所述舟裝卸法蘭之間還設置有一第五密封圈,並且所述石英管的一下端開口、所述過濾孔和所述第四密封圈均位於所述第五密封圈環繞的密封區域內。 Preferably, a fifth sealing ring is provided between the lower end of the quartz cylinder and the boat loading and unloading flange, and the lower end opening of the quartz tube, the filter hole and the fourth sealing ring are all located In the sealing area surrounded by the fifth sealing ring.
較佳地,所述隔熱板元件設置有貫穿每個所述隔熱板厚度的一通氣孔,且所述通氣孔與所述石英管的內部連通,用於將製程氣體輸送至所述工藝舟所在區域。 Preferably, the heat insulation board element is provided with a vent hole penetrating the thickness of each heat insulation board, and the vent hole communicates with the inside of the quartz tube for transporting process gas to the process boat your region.
較佳地,所述製作腔室還包括:一製作管體,所述製作管體的上端封閉,下端敞開;所述製作管體的軸向垂直設置;一內筒體,所述內筒體的上端和下端均敞開,且同軸設置在所述製作管體內部;所述內筒體與所述製作管體之間形成環形間隙;所述筒狀隔熱裝置、所述隔熱板組件和所述工藝舟能升入到所述內筒體內部;以及一工藝管法蘭,為環形結構;所述工藝管法蘭與所述製作管體的下端和所述內筒體的下端均密封連接;所述工藝管法蘭的頂面設有向下凹陷的一環形氣槽,所述環形氣槽與所述環形間隙對接連通;所述工藝管法蘭內設有與所述環形氣槽連通的一橫向氣道,所述橫向氣道與一第一抽氣裝置連通。 Preferably, the production chamber further includes: a production tube body, the upper end of the production tube body is closed, and the lower end is open; the axial direction of the production tube body is vertically arranged; an inner cylinder body, the inner cylinder body The upper end and the lower end are both open and coaxially arranged inside the production tube; an annular gap is formed between the inner cylinder and the production tube; the cylindrical heat insulation device, the heat insulation board assembly and The process boat can rise into the inner cylinder; and a process pipe flange, which has a ring structure; the process pipe flange is sealed with the lower end of the production pipe and the lower end of the inner cylinder Connection; the top surface of the process pipe flange is provided with a downwardly recessed annular gas groove, and the annular gas groove is in butt communication with the annular gap; the process pipe flange is provided with the annular gas A transverse air passage communicated with the groove, and the transverse air passage communicates with a first suction device.
較佳地,所述工藝管法蘭對接安裝在一爐筒法蘭上;所述爐筒法蘭為環形結構,固定安裝在一製作管體上,所述爐筒法蘭位於所述工藝管法蘭的上方並圍繞在所述製作管體的外側周圍;所述工藝管法蘭的頂面設有向上突出的環一形凸緣,所述環形凸緣環繞在所述製作管體的外側周圍;並且,在所述爐筒法蘭的下表面設置有一環形凹槽,所述環形凸緣 伸入到所述環形凹槽中;所述環形凸緣的上表面、所述環形凹槽的與所述環形凸緣的上表面相對的表面以及所述製作管體的外周壁共同構成一環形空間,所述環形空間內設有一第一密封圈。 Preferably, the process tube flange is butt-mounted on a furnace barrel flange; the furnace barrel flange has a ring structure and is fixedly installed on a fabricated tube body, and the furnace barrel flange is located on the process tube Above the flange and surrounding the outer side of the production tube; the top surface of the process pipe flange is provided with an upwardly protruding annular flange, the annular flange surrounds the outer side of the production tube Around; and, an annular groove is provided on the lower surface of the furnace barrel flange, the annular flange Extends into the annular groove; the upper surface of the annular flange, the surface of the annular groove opposite to the upper surface of the annular flange, and the outer peripheral wall of the pipe body together form an annular shape A first sealing ring is arranged in the annular space.
較佳地,所述工藝管法蘭與所述爐筒法蘭內均設有一環形冷卻水道。 Preferably, both the process pipe flange and the furnace barrel flange are provided with an annular cooling water channel.
較佳地,在所述爐筒法蘭中設置有一測溫套管,所述測溫套管的檢測端位於所述爐筒法蘭的內周壁上,所述測溫套管的另一端穿過所述爐筒法蘭延伸出去;並且,在所述測溫套管中設置有一溫度感測器。 Preferably, a temperature measuring sleeve is arranged in the furnace tube flange, the detection end of the temperature measuring sleeve is located on the inner peripheral wall of the furnace tube flange, and the other end of the temperature measuring sleeve passes through Extends through the furnace barrel flange; and a temperature sensor is arranged in the temperature measuring sleeve.
較佳地,所述製作管體、所述內筒體、所述隔熱板組件以及所述筒狀隔熱裝置均為圓柱體狀,並且同軸線設置;所述隔熱板元件的外緣與所述內筒體的內壁之間具有一間隙,用於將製作氣體輸送至所述工藝舟所在區域。 Preferably, the production tube, the inner cylinder, the heat insulation board assembly, and the cylindrical heat insulation device are all cylindrical and arranged coaxially; the outer edge of the heat insulation board element There is a gap between the inner cylinder and the inner wall of the inner cylinder for conveying the production gas to the area where the craft boat is located.
作為另一個技術方案,本發明還提供一種用於SiC高溫氧化製程的熱處理爐,所述熱處理爐包括本發明提供的上述製作腔室。 As another technical solution, the present invention also provides a heat treatment furnace for SiC high-temperature oxidation process, the heat treatment furnace includes the above-mentioned manufacturing chamber provided by the present invention.
本發明具有以下有益效果: The present invention has the following beneficial effects:
本發明提供的用於SiC高溫氧化製程的製作腔室及熱處理爐的技術方案中,製作腔室包括筒狀隔熱裝置,內部具有封閉的隔熱空間;隔熱板組件,包括複數個沿垂直方向疊置在一起的隔熱板;以及工藝舟,鄰接設置在隔熱板組件的上方。通過配合使用筒狀隔熱裝置和隔熱板元件,可以更有效地阻隔工藝舟所在區域內的高溫輻射,從而可以提高工藝舟所在區域的使用溫度達到2000℃以上,以滿足高性能器件的製作要求,而且筒狀 隔熱裝置和隔熱板元件的體積較小,從而可以減小爐腔體積,簡化設備整體結構。 In the technical solution for the production chamber and heat treatment furnace for the SiC high-temperature oxidation process provided by the present invention, the production chamber includes a cylindrical heat insulation device with a closed heat insulation space inside; and the heat insulation board assembly includes a plurality of vertical Heat insulation boards stacked together in directions; and a craft boat, which are adjacently arranged above the heat insulation board assembly. By using the cylindrical heat insulation device and the heat insulation board elements, the high temperature radiation in the area where the craft boat is located can be blocked more effectively, so that the operating temperature of the area where the craft boat is located can be increased to more than 2000 ℃ to meet the production of high-performance devices Request, and cylindrical The volume of the heat insulation device and the heat insulation board element is small, which can reduce the volume of the furnace cavity and simplify the overall structure of the equipment.
1:製作管體 1: Make the tube body
2:內筒體 2: inner cylinder
3:工藝舟 3: Craft boat
4:隔熱板 4: Insulation board
5:筒狀隔熱裝置 5: Cylindrical heat insulation device
6:第一密封圈 6: The first sealing ring
7:爐筒法蘭 7: Furnace flange
8:第一抽氣裝置 8: The first exhaust device
9:工藝管法蘭 9: Process pipe flange
10:舟裝卸法蘭 10: Boat loading and unloading flange
11:環形間隙 11: Annular gap
13:夾層管路 13: Sandwich pipeline
16:第二密封圈 16: The second sealing ring
17:第三密封圈 17: The third sealing ring
18:第四密封圈 18: The fourth sealing ring
19:第五密封圈 19: Fifth sealing ring
20:測溫套管 20: Thermowell
21:溫度感測器 21: Temperature sensor
22:進氣管 22: intake pipe
41:通氣孔 41: Vent
51:石英筒 51: Quartz Cylinder
52:石英管 52: Quartz tube
53:隔熱材料 53: Insulation material
71:第二冷卻通道 71: second cooling channel
91:環形氣槽 91: Annular air groove
92:橫向氣道 92: transverse airway
93:第一冷卻通道 93: The first cooling channel
94:環形凸緣 94: Ring flange
131:出氣端 131: Exhausting End
第一圖為本發明實施例提供的用於SiC高溫氧化製程的製作腔室的剖視圖。 The first figure is a cross-sectional view of a manufacturing chamber used for a SiC high-temperature oxidation process provided by an embodiment of the present invention.
第二圖為本發明實施例採用的筒狀隔熱裝置的剖視圖。 The second figure is a cross-sectional view of the cylindrical heat insulation device used in the embodiment of the present invention.
第三圖為第一圖中I區域的放大圖。 The third image is an enlarged view of area I in the first image.
第四圖為本發明實施例採用的測溫套管的結構圖。 The fourth figure is a structural diagram of the temperature measuring sleeve used in the embodiment of the present invention.
為使本領域的技術人員更好地理解本發明的技術方案,下面結合附圖來對本發明提供的用於SiC高溫氧化製程的製作腔室及熱處理爐進行詳細描述。 In order to enable those skilled in the art to better understand the technical solutions of the present invention, the manufacturing chamber and heat treatment furnace for SiC high temperature oxidation process provided by the present invention will be described in detail below in conjunction with the accompanying drawings.
請參閱第一圖,本發明實施例提供的用於SiC高溫氧化製程的製作腔室,其包括筒狀隔熱裝置5、隔熱板元件和工藝舟(boat)3,其中,筒狀隔熱裝置5的內部具有封閉的隔熱空間。隔熱板組件包括複數個沿垂直方向疊置在一起的隔熱板4,該隔熱板組件鄰接設置在筒狀隔熱裝置5的上方。工藝舟3用於承載被加工工件,該工藝舟3鄰接設置在隔熱板組件的上方。
Please refer to the first figure. The manufacturing chamber for the SiC high temperature oxidation process provided by the embodiment of the present invention includes a cylindrical
通過配合使用筒狀隔熱裝置5和隔熱板元件,可以使腔室內的溫度在垂直方向上呈階梯分佈,即,由下而上逐漸提高,例如,腔室在最下層的隔熱板4以下的區域的溫度為1300℃。由此,可以更有效地阻隔工藝舟3所在區域內的高溫輻射,進而可以工藝舟3所在區域的使用溫度提高
到2000℃以上,以滿足高性能器件的製作要求,而且筒狀隔熱裝置5和隔熱板元件的體積較小,從而可以減小爐腔體積,簡化設備整體結構。
By using the cylindrical
此外,由於上述筒狀隔熱裝置5的隔熱效果較好,可以在使用溫度滿足製作要求的前提下,降低加熱功率,從而可以降低製作成本。
In addition, since the above-mentioned cylindrical
在本實施例中,如第二圖所示,筒狀隔熱裝置5包括石英筒51、石英管52和隔熱材料53,其中,石英筒51的上端和下端均為封閉端,石英筒51內部形成封閉的隔熱空間,且石英筒51設有貫穿其上端和下端的穿孔,最佳地,該穿孔位於石英筒51的縱向軸線上;石英管52密封穿設在石英筒51的該穿孔內,作為供製作氣體通過的進氣管道,該石英管52的進氣口與外部的氣源管路連接。隔熱材料53填充在石英管52與石英筒51之間的隔熱空間內。該隔熱材料53例如為保溫棉。當然,在實際應用中,隔熱空間內也可以是真空的。
In this embodiment, as shown in the second figure, the cylindrical
在本實施例中,隔熱板元件設置有貫穿每個隔熱板4厚度的通氣孔41,且該通氣孔41與上述石英管52的內部連通,用於將製作氣體輸送至工藝舟3所在區域。
In this embodiment, the heat shield element is provided with a
視情況而定,隔熱板4與腔室內壁之間具有環形間隙,這樣,製作氣體在經由通氣孔41進入工藝舟3所在區域的同時,還能夠經由該環形間隙進入工藝舟3所在區域。由此,可以使製作氣體更均勻地進入製作區,從而可以提高製作均勻性。
Depending on the situation, there is an annular gap between the
另外,借助筒狀隔熱裝置5和隔熱板元件,可以使腔室在製作區以下的區域的溫度在垂直方向上呈階梯分佈,從而使經過石英管52和通氣孔41的製作氣體能夠在到達製作區之前被預熱,從而可以提高製作效率。
In addition, with the help of the cylindrical
在本實施例中,工藝舟3鄰接設置在隔熱板組件5的上方,用於承載被加工工件。具體地,工藝舟3包括支架,在該支架上設置有沿垂直方向間隔排布的固定槽,每個固定槽用於承載一個被加工工件。在實際應用中,固定槽的數量可以達到50個,且工藝舟3可以用於裝載多種規格的被加工工件,例如直徑為6寸或者4寸的SiC晶圓。
In this embodiment, the
在本實施例中,製作腔室還包括舟裝卸法蘭(flange)10,該舟裝卸法蘭10密封抵靠在石英筒51的下端,用於支撐筒狀隔熱裝置5、隔熱板元件和工藝舟3並能作升降移動,進氣管22密封穿設在舟裝卸法蘭10上並與石英管52的內部連通。
In this embodiment, the production chamber further includes a boat loading and unloading flange (flange) 10, the boat loading and unloading
在本實施例中,如第三圖所示,石英筒51的下端設有過濾孔,該過濾孔將上述隔熱空間與石英筒51的外部連通,且過濾孔內設有篩檢程式14,用於過濾自隔熱結構5排出的氣體中的雜質。並且,舟裝卸法蘭10內設有夾層管路13,該夾層管路13的一端與過濾孔連通,夾層管路13的另一端與第二抽氣裝置(圖中未示出)連通。借助篩檢程式14和夾層管路13,可以抽取並過濾隔熱空間內的氣體,保證隔熱空間內的材料放出的氣體不會對工藝舟3所在區域造成污染,從而可以提高腔室內的潔淨度。
In this embodiment, as shown in the third figure, the lower end of the
在本實施例中,石英筒51的下端與舟裝卸法蘭10之間設置有第四密封圈18,該第四密封圈18環繞在上述過濾孔周圍,用於密封過濾孔,從而保證隔熱空間的密封性。視情況而定,第四密封圈18為V型密封圈。
In this embodiment, a
在本實施例中,石英筒51的下端與舟裝卸法蘭10之間還設置有第五密封圈19,並且石英管51的下端開口、過濾孔和第四密封圈19均位於第五密封圈18環繞的密封區域內。視情況而定,第五密封圈19為星型密封圈。
In this embodiment, a
在本實施例中,製作腔室還包括製作管體1、內筒體2和工藝管法蘭9。其中,製作管體1的上端封閉,下端敞開;並且,製作管體1的軸向垂直設置。內筒體2的上端和下端均敞開,且同軸設置在製作管體1內部;內筒體2與製作管體1之間形成環形間隙11。並且,筒狀隔熱裝置5、隔熱板元件和工藝舟3能夠相對於內筒體2作升降運動,以能升入到內筒體2內部,或者自內筒體2移出。這樣,可以更方便地對工藝舟3進行更換,以及對筒狀隔熱裝置5、隔熱板元件和工藝舟3等的零件進行維護。
In this embodiment, the production chamber further includes a
視情況而定,製作管體1和內筒體2均採用超純石墨製作,且在二者的內、外表面形成熱解碳塗層,以保證腔室內部的氣密性。
Depending on the situation, the
如第一圖和第三圖所示,工藝管法蘭9為環形結構,該工藝管法蘭9與製作管體1的下端和內筒體2的下端均密封連接;並且,工藝管法蘭9的頂面設有向下凹陷的環形氣槽91,該環形氣槽91與環形間隙11對接連通;工藝管法蘭9內設有與環形氣槽91連通的橫向氣道92,該橫向氣道92與第一抽氣裝置8連通。環形間隙11、環形氣槽91和橫向氣道92,構成與內筒體2內部連通的排氣通道,完成反應的氣體經由該排氣通道排出。
As shown in the first and third figures, the
在本實施例中,工藝管法蘭9對接安裝在爐筒法蘭7上,該爐筒法蘭7為環形結構,固定安裝在製作管體1上,並且爐筒法蘭7位於工藝管法蘭9的上方並圍繞在製作管體1的外側周圍。
In this embodiment, the
視情況而定,在舟裝卸法蘭10與工藝管法蘭9之間設置有第二密封圈16,用於對二者之間的間隙進行密封,從而保證製作管體1與內筒體2之間的環形間隙以及內筒體2內部的封閉性。
Depending on the situation, a
在本實施例中,夾層管路13的出氣端131位於舟裝卸法蘭10與工藝管法蘭9之間;並且,第二密封圈16位於夾層管路13的出氣端131的內側;並且,在舟裝卸法蘭10與工藝管法蘭9之間設置有第三密封圈17,該
第三密封圈17位於夾層管路13的出氣端131的外側。借助上述第二密封圈16和第三密封圈17,可以對舟裝卸法蘭10與工藝管法蘭9之間的間隙進行雙重密封,同時對夾層管路13的出氣端131進行密封。
In this embodiment, the gas outlet end 131 of the
視情況而定,第三密封圈17為V型密封圈。這種密封圈的變形量較大,密封效果較好。第二密封圈16可以為O型密封圈。
Depending on the situation, the
並且,工藝管法蘭9的頂面設有向上突出的環形凸緣94,該環形凸緣94環繞在製作管體1的外側周圍;並且,在爐筒法蘭7的下表面設置有環形凹槽,環形凸緣94伸入到該環形凹槽中。環形凸緣94的上表面、環形凹槽的與環形凸緣94的上表面相對的表面以及製作管體1的外周壁共同構成環形空間,該環形空間內設有第一密封圈6,用於對工藝管法蘭9與製作管體1之間的間隙進行密封,從而保證製作管體1內的封閉性。視情況而定,該第一密封圈6為全氟橡膠圈。
In addition, the top surface of the
綜上所述,借助由上述第一隻第五密封圈構成的密封系統,可以提高腔室的氣密性,有效降低整個系統的氣體洩漏量。 In summary, with the aid of the sealing system constituted by the first and fifth sealing rings, the air tightness of the chamber can be improved, and the gas leakage of the entire system can be effectively reduced.
在本實施例中,工藝管法蘭9內設置有環形的第一冷卻通道93,通過向該第一冷卻通道93中通入冷卻媒介(例如冷卻水)來冷卻工藝管法蘭9,進而間接冷卻工藝管法蘭9附近的零件。同樣的,爐筒法蘭7內設有環形的第二冷卻通道71。通過向第二冷卻通道71中通入冷卻媒介來冷卻爐筒法蘭7,從而間接冷卻爐筒法蘭7附近的零件。
In this embodiment, the
借助上述第一冷卻通道93和第二冷卻通道71,可以有效降低高溫對密封圈的影響,從而可以避免密封圈在高溫條件下失效。通過實驗發現,上述第一冷卻通道93和第二冷卻通道71可以將密封圈的溫度變化控制在200℃以下。
With the above-mentioned
在本實施例中,如第四圖所示,在爐筒法蘭7中設置有測溫套管20,該測溫套管20的檢測端位於爐筒法蘭7的內周壁上,以能夠靠近製作管體1。測溫套管20的另一端穿過爐筒法蘭7延伸出去;並且,在測溫套管20中設置有溫度感測器21。
In this embodiment, as shown in the fourth figure, a
視情況而定,測溫套管20為波紋管。最佳地,該波紋管的外徑很小,以滿足超高溫環境的使用。
Depending on the situation, the
在本實施例中,製作管體1、內筒體2、隔熱板元件以及筒狀隔熱裝置5均為圓柱體狀,並且同軸線設置;並且,隔熱板元件的外緣與內筒體2的內壁之間具有間隙,用於將製作氣體輸送至工藝舟3所在區域。這樣,製作氣體在經由隔熱板4的通氣孔41進入工藝舟3所在區域的同時,還能夠經由隔熱板元件的外緣與內筒體2的內壁之間的間隙進入工藝舟3所在區域。由此,可以使製作氣體更均勻地進入製作區,從而可以提高製作均勻性。
In this embodiment, the
通過實驗發現,本發明提供的製作腔室,其最高溫度達到2000℃以上;腔室的氣體洩漏率小於1E-7mbar.l/s;腔室的金屬污染率小於1E+1latoms/cm2。 It is found through experiments that the maximum temperature of the manufacturing chamber provided by the present invention reaches above 2000°C; the gas leakage rate of the chamber is less than 1E-7mbar.l/s; the metal contamination rate of the chamber is less than 1E+1latoms/cm 2 .
需要說明的是,本發明提供的製作腔室可以應用在例如SiC晶圓的高溫真空熱處理製程中。或者,通過更換熱處理爐的相應零件(例如製作管體)的材料,而無需改變結構,本發明提供的製作腔室還可以應用在溫度較低的諸如矽片的熱處理製程中。 It should be noted that the fabrication chamber provided by the present invention can be applied to, for example, a high-temperature vacuum heat treatment process of SiC wafers. Or, by replacing the materials of the corresponding parts of the heat treatment furnace (for example, making the tube body) without changing the structure, the production chamber provided by the present invention can also be used in the heat treatment process of lower temperature such as silicon wafer.
綜上所述,本發明提供的製作腔室,其包括筒狀隔熱裝置,內部具有封閉的隔熱空間;隔熱板組件,包括複數個沿垂直方向疊置在一起的隔熱板;以及工藝舟,鄰接設置在隔熱板組件的上方。通過配合使用筒狀隔熱裝置和隔熱板元件,可以更有效地阻隔工藝舟所在區域內的高溫 輻射,從而可以提高工藝舟所在區域的使用溫度達到2000℃以上,以滿足高性能器件的製作要求,而且筒狀隔熱裝置和隔熱板元件的體積較小,從而可以減小腔室體積,簡化設備整體結構。 To sum up, the manufacturing chamber provided by the present invention includes a cylindrical heat insulation device with a closed heat insulation space inside; a heat insulation board assembly including a plurality of heat insulation boards stacked together in a vertical direction; and The craft boat is arranged adjacently above the heat insulation board assembly. Through the use of cylindrical heat insulation device and heat insulation board elements, the high temperature in the area where the craft boat is located can be blocked more effectively Radiation, which can increase the operating temperature of the craft boat area to more than 2000 ℃ to meet the production requirements of high-performance devices, and the volume of the cylindrical heat insulation device and heat insulation board components is small, which can reduce the volume of the chamber. Simplify the overall structure of the equipment.
作為另一個技術方案,本發明還提供一種熱處理爐,其包括本發明提供的上述製作腔室。 As another technical solution, the present invention also provides a heat treatment furnace, which includes the above-mentioned production chamber provided by the present invention.
本發明提供的熱處理爐,其通過採用本發明提供的上述製作腔室,不僅具有較高的使用溫度、較小的腔室體積,而且可以簡化設備整體結構。 The heat treatment furnace provided by the present invention not only has a higher use temperature and a smaller chamber volume, but also can simplify the overall structure of the equipment by using the above-mentioned manufacturing chamber provided by the present invention.
可以理解的是,以上實施方式僅僅是為了說明本發明的原理而採用的示例性實施方式,然而本發明並不局限於此。對於本領域內的普通技術人員而言,在不脫離本發明的精神和實質的情況下,可以做出各種變型和改進,這些變型和改進也視為本發明的保護範圍。 It can be understood that the above implementations are merely exemplary implementations used to illustrate the principle of the present invention, but the present invention is not limited thereto. For those of ordinary skill in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also regarded as the protection scope of the present invention.
1‧‧‧製作管體 1‧‧‧Making the tube body
2‧‧‧內筒體 2‧‧‧Inner cylinder
3‧‧‧工藝舟 3‧‧‧Craft Boat
4‧‧‧隔熱板 4‧‧‧Insulation board
5‧‧‧筒狀隔熱裝置 5‧‧‧Cylinder heat insulation device
6‧‧‧第一密封圈 6‧‧‧First sealing ring
7‧‧‧爐筒法蘭 7‧‧‧Flange of furnace tube
8‧‧‧第一抽氣裝置 8‧‧‧The first exhaust device
9‧‧‧工藝管法蘭 9‧‧‧Process pipe flange
10‧‧‧舟裝卸法蘭 10‧‧‧Boat loading and unloading flange
11‧‧‧環形間隙 11‧‧‧Annular gap
13‧‧‧夾層管路 13‧‧‧Sandwich pipe
22‧‧‧進氣管 22‧‧‧Intake pipe
41‧‧‧通氣孔 41‧‧‧Vent
52‧‧‧石英管 52‧‧‧Quartz tube
71‧‧‧第二冷卻通道 71‧‧‧Second cooling channel
91‧‧‧環形氣槽 91‧‧‧Annular air groove
92‧‧‧橫向氣道 92‧‧‧Horizontal airway
93‧‧‧第一冷卻通道 93‧‧‧The first cooling channel
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CN111520999B (en) * | 2020-04-14 | 2022-02-22 | 北京北方华创微电子装备有限公司 | Vertical furnace equipment |
CN112461393B (en) * | 2020-12-04 | 2021-06-15 | 中国科学院力学研究所 | Coaxial thermocouple transient heat flow sensor oxidation type insulating layer processing and manufacturing device |
CN112795988A (en) * | 2020-12-29 | 2021-05-14 | 浙江中电环境科技有限公司 | Single crystal furnace for producing silicon carbide semiconductor |
CN115573035A (en) * | 2021-07-06 | 2023-01-06 | 中国电子科技集团公司第四十八研究所 | Silicon carbide high-temperature oxidation furnace device |
CN116499251B (en) * | 2023-06-25 | 2023-09-29 | 苏州小牛自动化设备有限公司 | Furnace tube |
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- 2018-07-18 CN CN201810791938.8A patent/CN110736345B/en active Active
- 2018-12-20 TW TW107146147A patent/TWI710658B/en active
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CN101969021A (en) * | 2010-08-05 | 2011-02-09 | 北京七星华创电子股份有限公司 | Heat preserving barrel and vertical type heat treatment device with same |
CN102653883A (en) * | 2011-02-28 | 2012-09-05 | 株式会社日立国际电气 | Substrate processing apparatus, and method of manufacturing substrate |
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CN110736345B (en) | 2021-01-29 |
WO2020015523A1 (en) | 2020-01-23 |
CN110736345A (en) | 2020-01-31 |
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