TWI705515B - Method for removing fugitive and volatilized gas by transferring carrier board to a multi-piece carrier board - Google Patents

Method for removing fugitive and volatilized gas by transferring carrier board to a multi-piece carrier board Download PDF

Info

Publication number
TWI705515B
TWI705515B TW108120220A TW108120220A TWI705515B TW I705515 B TWI705515 B TW I705515B TW 108120220 A TW108120220 A TW 108120220A TW 108120220 A TW108120220 A TW 108120220A TW I705515 B TWI705515 B TW I705515B
Authority
TW
Taiwan
Prior art keywords
carrier board
carrier
pump
heating lamp
lamp module
Prior art date
Application number
TW108120220A
Other languages
Chinese (zh)
Other versions
TW202046430A (en
Inventor
劉明暉
尹繼甫
梁金堆
劉相賢
Original Assignee
力鼎精密股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 力鼎精密股份有限公司 filed Critical 力鼎精密股份有限公司
Priority to TW108120220A priority Critical patent/TWI705515B/en
Application granted granted Critical
Publication of TWI705515B publication Critical patent/TWI705515B/en
Publication of TW202046430A publication Critical patent/TW202046430A/en

Links

Images

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

一種傳送載板至一多片式載板的除去逸散及揮發出氣體之設備之方法,其步驟包含:a)提供加熱腔室,包含有數個支持區的平面轉盤以及數個加熱燈具模組;b)傳送裝置將第一載板送入第一支持區;c)轉動平面轉盤使第一支持區到達第一加熱燈具模組下對第一載板加熱;d)傳送裝置將第二載板送入第二支持區,轉動平面轉盤使第二支持區到第一加熱燈具模組下;第一支持區被轉動至第二加熱燈具模組下對第一載板加熱;e)平面轉盤將第一支持區轉動回到傳送位置,接著由傳送裝置將第一載板從加熱腔室中取出;以及f)由傳送裝置將待處理載板送入第一支持區。 A method for transferring a carrier board to a multi-piece carrier board to remove fugitive and volatilized gas, the steps include: a) providing a heating chamber, including a plane turntable with several supporting areas and several heating lamp modules B) The conveying device sends the first carrier board into the first supporting area; c) Rotating the plane turntable makes the first supporting area reach the first heating lamp module to heat the first carrier board; d) The conveying device transfers the second carrier The board is sent to the second support area, and the plane turntable is rotated to make the second support area under the first heating lamp module; the first support area is rotated to the second heating lamp module to heat the first carrier; e) the plane turntable The first supporting area is rotated back to the transfer position, and then the first carrier board is taken out from the heating chamber by the conveying device; and f) the carrier board to be processed is sent into the first supporting area by the conveying device.

Description

傳送載板至一多片式載板的除去逸散及揮發出氣體之設備之方法 Method for removing fugitive and volatilized gas by transferring carrier board to a multi-piece carrier board

本發明係關於一種傳送載板的方法,尤指一種依序將載板傳送至一加熱腔室的平面轉盤,使得加熱腔室中的加熱具模組對平面轉盤上的載板加熱的方法。 The present invention relates to a method for transferring a carrier board, in particular to a method for sequentially transferring the carrier board to a flat turntable in a heating chamber, so that the heating tool module in the heating chamber heats the carrier on the flat turntable.

在對載板(在本文中所稱之載板,係指晶圓或同等形狀之玻璃載板、矽(silicon)載板、陶瓷(ceramic)載板等)進行物理氣相沉積製程之前,應先將其加熱至一設定溫度(例如為130℃),使得複合在載板表面中的揮發性氣體與濕氣自載板表面逸出。 Before carrying out the physical vapor deposition process on the carrier (the carrier referred to in this article refers to a wafer or glass carrier of the same shape, silicon carrier, ceramic carrier, etc.) It is first heated to a set temperature (for example, 130° C.), so that the volatile gas and moisture compounded on the surface of the carrier can escape from the surface of the carrier.

傳統除去氣體(包含揮發性氣體以及濕氣)的設備係採用類似爐管烤箱的設備去對所容納之多片載板進行整體加熱。如此雖可對多片載板同時烘烤,但卻無法針對每一片載板的表面均勻地加熱並且控溫,導致影響了氣體與濕氣逸出的效率。因此,當要增加烘烤溫度或時間以確保氣體與濕氣之移除時,亦因此降低除去揮發性氣體設備之效能,或是因烤箱局部(靠近加熱器)之高溫造成載板受損。另外,當前、後兩批載板之加熱溫度需要調整時,則需要等整體烤箱調升或降低至設定溫度,亦會降低除去揮發性氣體設備之處理效率。又, 為達到在真空中順利導熱,需要通入適量氬氣作導熱工作,也因此降低除揮發性氣體之效率與成本。 The traditional equipment for removing gases (including volatile gases and moisture) uses equipment similar to a furnace tube oven to heat the multiple contained carrier plates as a whole. Although it is possible to bake multiple carrier plates at the same time, it is impossible to uniformly heat and control the temperature of the surface of each carrier plate, which affects the efficiency of gas and moisture escape. Therefore, when the baking temperature or time needs to be increased to ensure the removal of gas and moisture, the efficiency of the device for removing volatile gas is also reduced, or the carrier board is damaged due to the high temperature of the oven (near the heater). In addition, when the heating temperature of the current and later two batches of carrier plates needs to be adjusted, it is necessary to wait for the overall oven to be raised or lowered to the set temperature, which will also reduce the processing efficiency of the volatile gas removal equipment. also, In order to achieve smooth heat conduction in vacuum, it is necessary to pass in a proper amount of argon for heat conduction work, thus reducing the efficiency and cost of removing volatile gases.

因此本案發明人提供了一種將多片載板以水平式放置再對其加熱使得每片載板能獨自加熱之設備,並進而提供了一種方法,其係能將多片載板傳送至一多片式載板的除去逸散及揮發出氣體之設備。 Therefore, the inventor of the present case provides a device for placing multiple carrier boards in a horizontal position and heating them so that each carrier board can be heated independently, and further provides a method that can transfer multiple carrier boards to one or more Chip carrier is a device for removing fugitive and volatilized gases.

本發明提供一種一種傳送載板至一多片式載板的除去逸散及揮發出氣體之設備之方法,其步驟包含:a)提供一加熱腔室,其包含一具有數個支持區的平面轉盤以及數個加熱燈具模組;b)藉由一傳送裝置將一第一載板送入一第一支持區,其中該第一支持區位於一傳送位置;c)轉動該平面轉盤使得該第一支持區到達該一第一加熱燈具模組之下,致使該第一加熱燈具模組對該第一載板進行加熱,又一第二支持區亦被轉動至該傳送位置;d)藉由該傳送裝置將一第二載板送入該第二支持區,轉動該平面轉盤使該第二支持區到達該第一加熱燈具模組之下;同時該第一支持區亦被轉動至一第二加熱燈具模組之下,致使該第二加熱燈具模組對該第一載板進行加熱;以及e)當該平面轉盤將該第一支持區轉動回到該傳送位置時,該傳送位置上方的一傳送位置加熱燈具模組對該第一載板進行加熱,接著再藉由該傳送裝置將該第一載板從該加熱腔室中取出。 The present invention provides a method for transferring a carrier board to a multi-piece carrier board for removing fugitive and volatilized gas. The steps include: a) providing a heating chamber, which includes a plane with a plurality of supporting areas Turntable and several heating lamp modules; b) Send a first carrier plate into a first supporting area by a conveying device, wherein the first supporting area is located at a conveying position; c) Rotate the flat turntable so that the first A supporting area reaches under the first heating lamp module, causing the first heating lamp module to heat the first carrier, and another second supporting area is also rotated to the transfer position; d) by The conveying device sends a second carrier board into the second support area, and rotates the plane turntable to make the second support area reach under the first heating lamp module; at the same time, the first support area is also rotated to a second support area. Under the two heating lamp modules, causing the second heating lamp module to heat the first carrier plate; and e) when the planar turntable rotates the first support area back to the conveying position, above the conveying position A conveying position of the heating lamp module heats the first carrier board, and then the first carrier board is taken out from the heating chamber by the conveying device.

如前述之方法,其中步驟d)進一步包含將一第三支持區轉動至傳送位置,藉由傳送裝置將一第三載板送入該第三支持區,轉動該平面轉盤使該第三支持區到達該第一加熱燈具模組之下,又一第四支持區亦被轉動至該傳送 位置,藉由該傳送裝置將一第四載板送入該第四支持區,轉動該平面轉盤使該第四支持區到達該第一加熱燈具模組之下。 As in the aforementioned method, wherein step d) further includes rotating a third supporting area to the transfer position, sending a third carrier plate into the third supporting area by the conveying device, and rotating the flat turntable to make the third supporting area Under the first heating lamp module, another fourth support area is also rotated to the transmission Position, a fourth carrier board is sent into the fourth support area by the conveying device, and the plane turntable is rotated to make the fourth support area reach under the first heating lamp module.

如前述之方法,其中該數個加熱燈具模組中之每一者係使用能發出不同波長範圍之光線的鹵素燈具,該不同波長範圍之光線對該第一載板及該第二載板分別加熱。 As in the aforementioned method, wherein each of the plurality of heating lamp modules uses halogen lamps capable of emitting light of different wavelength ranges, and the light of different wavelength ranges is respectively applied to the first carrier board and the second carrier board. heating.

如前述之方法,其中該加熱腔室中還包含一遮光板,該遮光板上設有數個透光孔。 As in the aforementioned method, the heating chamber further includes a shading plate, and the shading plate is provided with a plurality of light-transmitting holes.

如前述之方法,其中該數個透光孔的數量對應該數個加熱燈具模組的數量。 As in the aforementioned method, the number of the light-transmitting holes corresponds to the number of the heating lamp modules.

如前述之方法,其中該加熱腔室的一底部表面設有一第一穿孔,且一第一抽氣泵組接合至該第一穿孔並與該加熱腔室流體連通。 As in the aforementioned method, a bottom surface of the heating chamber is provided with a first through hole, and a first suction pump group is connected to the first through hole and is in fluid communication with the heating chamber.

如前述之方法,其中該底部表面設有一第二穿孔,且一第二抽氣泵組接合至該第二穿孔並與該加熱腔室流體連通。 As in the aforementioned method, wherein the bottom surface is provided with a second through hole, and a second suction pump set is connected to the second through hole and is in fluid communication with the heating chamber.

如前述之方法,其中在步驟b)至步驟e)中,該第一抽氣泵組保持運作,使得該加熱腔室係維持真空。 As in the aforementioned method, in step b) to step e), the first air extraction pump group keeps operating, so that the heating chamber is kept in vacuum.

如前述之方法,其中在步驟b)至步驟e)中,該第一抽氣泵組以及該第二抽氣泵組保持運作,使得該加熱腔室係維持真空。 As in the aforementioned method, in step b) to step e), the first air extraction pump set and the second air extraction pump set are kept operating, so that the heating chamber maintains a vacuum.

如前述之方法,其中該第一抽氣泵組包含一低溫冷凝泵以及一真空渦輪泵,其中該低溫冷凝泵係串聯該真空渦輪泵且該低溫冷凝泵接合至該第一穿孔。 As in the aforementioned method, the first suction pump group includes a cryogenic condensate pump and a vacuum turbo pump, wherein the cryogenic condensate pump is connected in series with the vacuum turbo pump and the cryogenic condensate pump is connected to the first through hole.

如前述之方法,其中該第二抽氣泵組包含一低溫冷凝泵以及一真空渦輪泵,其中該低溫冷凝泵係串聯該真空渦輪泵且該低溫冷凝泵接合至該第二穿孔。 As in the aforementioned method, the second suction pump group includes a cryogenic condensate pump and a vacuum turbo pump, wherein the cryogenic condensate pump is connected in series with the vacuum turbo pump and the cryogenic condensate pump is connected to the second through hole.

如前述之方法,其中該第一抽氣泵組包含一真空渦輪泵,且該真空渦輪泵接合該第一穿孔;該第二抽氣泵組包含一低溫冷凝泵,且該低溫冷凝泵接合至該第二穿孔。 As in the aforementioned method, wherein the first air extraction pump set includes a vacuum turbo pump, and the vacuum turbo pump is coupled to the first through hole; the second air extraction pump set includes a cryogenic condensate pump, and the cryogenic condensate pump is coupled to the first Two perforations.

10‧‧‧加熱腔室 10‧‧‧Heating chamber

11‧‧‧平面轉盤 11‧‧‧Plane turntable

111‧‧‧支持區 111‧‧‧Support Area

1111‧‧‧第一支持區 1111‧‧‧First Support Area

1112‧‧‧第二支持區 1112‧‧‧Second Support Area

1113‧‧‧第三支持區 1113‧‧‧ Third Support Area

1114‧‧‧第四支持區 1114‧‧‧Fourth Support Area

12‧‧‧加熱燈具模組 12‧‧‧Heating lamp module

121‧‧‧第一加熱燈具模組 121‧‧‧The first heating lamp module

122‧‧‧第二加熱燈具模組 122‧‧‧The second heating lamp module

123‧‧‧第三加熱燈具模組 123‧‧‧The third heating lamp module

13‧‧‧第一穿孔 13‧‧‧First Piercing

14‧‧‧遮光板 14‧‧‧Shading plate

141‧‧‧透光孔 141‧‧‧Light hole

15‧‧‧第二穿孔 15‧‧‧Second Piercing

20‧‧‧第一抽氣泵組 20‧‧‧The first suction pump group

21‧‧‧低溫冷凝泵 21‧‧‧Cryogenic Condensate Pump

22‧‧‧真空渦輪泵 22‧‧‧Vacuum Turbo Pump

30‧‧‧第二抽氣泵組 30‧‧‧Second Air Pump Set

31‧‧‧低溫冷凝泵 31‧‧‧Cryogenic Condensate Pump

32‧‧‧真空渦輪泵 32‧‧‧Vacuum Turbo Pump

33‧‧‧低溫冷凝泵 33‧‧‧Cryogenic Condensate Pump

9‧‧‧傳送裝置 9‧‧‧Transport Device

B‧‧‧底部表面 B‧‧‧Bottom surface

O‧‧‧閘口 O‧‧‧Gate

P‧‧‧傳送位置 P‧‧‧Transfer location

PH‧‧‧傳送位置加熱燈具模組 PH‧‧‧Transfer position heating lamp module

T‧‧‧頂部表面 T‧‧‧Top surface

W1‧‧‧第一載板 W1‧‧‧First carrier board

W2‧‧‧第二載板 W2‧‧‧Second Carrier Board

W3‧‧‧第三載板 W3‧‧‧Third Carrier Board

W4‧‧‧第四載板 W4‧‧‧Fourth Carrier Board

圖1為本發明之方法所對應之設備的立體圖;圖2為本發明之方法所對應之設備的剖面圖;圖3為本發明之方法所對應之設備的俯視圖示意圖,其表示用傳送裝置將載板送入加熱腔室加熱;圖4為本發明之方法所對應之設備的俯視圖示意圖,其表示平面轉盤轉動,並使載板在不同的加熱燈具模組之下加熱;圖5為本發明之方法所對應之設備的俯視圖示意圖,其表示平面轉盤轉動,並使載板在不同的加熱燈具模組之下加熱;圖6為本發明之方法所對應之設備的俯視圖示意圖,其表示平面轉盤轉動,並使載板在不同的加熱燈具模組之下加熱;圖7為本發明之方法所對應之設備的俯視圖示意圖,其表示平面轉盤轉動,並使載板在不同的加熱燈具模組之下加熱;圖8為本發明之方法所對應之設備的俯視圖示意圖,其表示平面轉盤轉動,並使載板在不同的加熱燈具模組之下加熱; 圖9為本發明之方法所對應之設備另一實施方式的剖面圖;圖10為本發明之方法所對應之設備另一實施方式的剖面圖。 Figure 1 is a three-dimensional view of the equipment corresponding to the method of the present invention; Figure 2 is a cross-sectional view of the equipment corresponding to the method of the present invention; Figure 3 is a schematic top view of the equipment corresponding to the method of the present invention, which shows the transfer device The carrier board is fed into the heating chamber for heating; Figure 4 is a schematic top view of the equipment corresponding to the method of the present invention, which shows that the plane turntable rotates and the carrier board is heated under different heating lamp modules; Figure 5 is the present invention The top view schematic diagram of the equipment corresponding to the method, which shows that the plane turntable rotates and the carrier is heated under different heating lamp modules; Figure 6 is a schematic top view of the equipment corresponding to the method of the present invention, which shows the plane turntable Rotate and heat the carrier plate under different heating lamp modules; Figure 7 is a schematic top view of the equipment corresponding to the method of the present invention, which shows that the plane turntable rotates and the carrier plate is placed between different heating lamp modules Lower heating; Figure 8 is a schematic top view of the equipment corresponding to the method of the present invention, which shows that the plane turntable rotates and the carrier is heated under different heating lamp modules; 9 is a cross-sectional view of another embodiment of the device corresponding to the method of the present invention; FIG. 10 is a cross-sectional view of another embodiment of the device corresponding to the method of the present invention.

本發明的傳送載板至一多片式載板的除去逸散及揮發出氣體之設備之方法係可運用在一種用於多片式載板的除去逸散及揮發出氣體的設備之除氣裝置及該設備。如圖1所示,除氣裝置係在一加熱腔室10之下設一第一抽氣泵組20,第一抽氣泵組20與加熱腔室10流體連通,其中第一抽氣泵組20包含一低溫冷凝泵21以及一真空渦輪泵22,其中低溫冷凝泵21係串聯真空渦輪泵22,且真空渦輪泵22在低溫冷凝泵21之下,如圖所示,第一抽氣泵組20可視為直下式的設置。 The method for removing fugitive and volatilized gases from a multi-piece carrier board of the present invention can be applied to the degassing of a device for removing fugitive and volatilized gases from a multi-piece carrier board. The device and the equipment. As shown in Figure 1, the deaeration device is provided with a first air extraction pump set 20 under a heating chamber 10. The first air extraction pump set 20 is in fluid communication with the heating chamber 10, wherein the first air extraction pump set 20 includes a The cryogenic condensate pump 21 and a vacuum turbo pump 22, wherein the cryogenic condensate pump 21 is connected in series with the vacuum turbo pump 22, and the vacuum turbo pump 22 is below the cryogenic condensate pump 21. As shown in the figure, the first air extraction pump group 20 can be regarded as straight down Style setting.

請繼續參閱圖2,係除氣裝置另一實施例的剖面圖,其更詳細說明的是,除氣裝置係在加熱多片式載板時用於除去氣體,包含:加熱腔室10,其包含:一包含有數個支持區111的平面轉盤11;數個加熱燈具模組12,設置在加熱腔室10的一頂部表面T;一第一穿孔13,設置在加熱腔室10的一底部表面B;以及一第一抽氣泵組20,接合至第一穿孔13並與加熱腔室10流體連通;其中,第一抽氣泵組20係垂直地設於加熱腔室10的下方。另外,每一加熱模組12包含一加熱燈具。 Please continue to refer to FIG. 2, which is a cross-sectional view of another embodiment of the degassing device. It is explained in more detail that the degassing device is used to remove gas when heating the multi-plate carrier, and includes: a heating chamber 10, which Including: a plane turntable 11 including a plurality of supporting areas 111; a plurality of heating lamp modules 12 arranged on a top surface T of the heating chamber 10; a first perforation 13 arranged on a bottom surface of the heating chamber 10 B; and a first air extraction pump set 20 connected to the first through hole 13 and fluidly connected with the heating chamber 10; wherein the first air extraction pump set 20 is vertically arranged below the heating chamber 10. In addition, each heating module 12 includes a heating lamp.

請繼續參閱圖3,本發明提供了一種傳送載板至一多片式載板的除去逸散及揮發出氣體之設備之方法,其步驟包含:a)提供一加熱腔室10,其包含一具有數個支持區111的平面轉盤11以及數個加熱燈具模組12;b)藉由一傳送裝置9(傳送裝置9在本案的圖式中係以機械手臂表示,但不以此為限)將一第一載 板W1送入一第一支持區1111,其中第一支持區1111位於一傳送位置P(在本發明中,支持區在傳送位置P才能讓傳送裝置9傳送載板至支持區);c)請參閱圖4,轉動平面轉盤11使得第一支持區1111到達一第一加熱燈具模組121之下,致使第一加熱燈具模組121對第一載板W1進行加熱,又一第二支持區1112亦被轉動至傳送位置P;d)藉由傳送裝置9將一第二載板W2送入第二支持區1112,轉動平面轉盤11使第二支持區1112到達第一加熱燈具模組121之下(請參閱圖5);同時第一支持區1111亦被轉動至一第二加熱燈具模組122之下,致使第二加熱燈具模組122對第一載板W1進行加熱;e)請參閱圖6,當平面轉盤11將第一支持區1111轉動回到傳送位置P時,傳送位置P上方的一傳送位置加熱燈具模組PH對第一載板W1進行加熱,接著再藉由傳送裝置9將第一載板W1從加熱腔室10中取出(本發明圖式中未繪示取出第一載板W1的示意圖);以及f)藉由傳送裝置9將另一待處理載板送入第一支持區1111(僅以文字說明,未以圖式示出)。 Please continue to refer to FIG. 3, the present invention provides a method for removing fugitive and volatilized gas from a multi-chip carrier for transferring a carrier plate. The steps include: a) providing a heating chamber 10, which includes a Planar turntable 11 with several support areas 111 and several heating lamp modules 12; b) by a conveying device 9 (the conveying device 9 is represented by a robotic arm in the drawing of this case, but not limited to this) Will be the first time The board W1 is fed into a first supporting area 1111, wherein the first supporting area 1111 is located at a conveying position P (in the present invention, the supporting area is at the conveying position P to allow the conveying device 9 to convey the carrier board to the supporting area); c) Please 4, rotating the plane turntable 11 makes the first supporting area 1111 reach below a first heating lamp module 121, causing the first heating lamp module 121 to heat the first carrier W1, and a second supporting area 1112 It is also rotated to the transfer position P; d) A second carrier W2 is sent into the second support area 1112 by the transfer device 9, and the plane turntable 11 is rotated to make the second support area 1112 reach under the first heating lamp module 121 (Please refer to Fig. 5); At the same time, the first support area 1111 is also rotated under a second heating lamp module 122, causing the second heating lamp module 122 to heat the first carrier W1; e) Please refer to the figure 6. When the plane turntable 11 rotates the first supporting area 1111 back to the transfer position P, a transfer position heating lamp module PH above the transfer position P heats the first carrier W1, and then the transfer device 9 The first carrier W1 is taken out from the heating chamber 10 (the schematic diagram of taking out the first carrier W1 is not shown in the drawings of the present invention); and f) another carrier to be processed is sent into the first carrier by the conveyor 9 Support area 1111 (explanation only in words, not shown in figures).

加熱腔室10中的平面轉盤11所能放置的載板數量較佳為4至6個,後述係對於能放置4個載板的加熱腔室10之傳送載板之步驟,熟悉本項技術之人士應能理解相同或類似之步驟亦可應於具有超過4個載板的平面轉盤之加熱腔室,本案並不受此實施例之例示所限制。請繼續參閱圖3,本發明的傳送載板至一多片式載板的除去逸散及揮發出氣體之設備之方法包含下列步驟:a)提供如前述的加熱腔室10;b)藉由一傳送裝置9透過一閘口O(閘口O之開啟、關閉及密封可採習知技術之機構,故不加以贅述)將一第一載板W1送入數個支持區111中的一第一支持區1111(應說明的是,加熱腔室10中的數個支持區111的數量較佳為4個至6個,為精簡說明內容,本發明以4個支持區111為示意,但並不以此為限),其中第一支持區1111位於一傳送位置P;c)請參閱圖4,轉動平面轉盤11使 得第一支持區1111到達數個加熱燈具模組12的一第一加熱燈具模組121之下(應說明的是,加熱腔室10中的數個加熱燈具模組12的數量係相對應於支持區111的數量,故如前所述,本發明以4個加熱燈具模組12為示意,但不以此為限),致使第一加熱燈具模組121對第一載板W1進行加熱(在本發明中所述的對載板加熱係指將加熱燈具模組對著載板,使得載板的溫度上升至130度C),又一第二支持區1112亦被轉動至傳送位置P;d)藉由傳送裝置9將一第二載板W2送入第二支持區1112(圖未再示出傳送後續載板的示意圖),請參閱圖5,轉動平面轉盤11使第二支持區1112到達第一加熱燈具模組121之下;同時第一支持區1111亦被轉動至一第二加熱燈具模組122之下,致使第二加熱燈具模組122對第一載板W1進行加熱,又一第三支持區1113亦被轉動至傳送位置P;藉由傳送裝置9將一第三載板W3送入第三支持區1113,轉動平面轉盤11使第三支持區1113到達第一加熱燈具模組121之下,又一第四支持區1114亦被轉動至傳送位置P;請參閱圖7,藉由傳送裝置9將一第四載板W4送入第四支持區1114,轉動平面轉盤11使第四支持區1114到達第一加熱燈具模組121之下;e)請參閱圖8,當平面轉盤11將第一支持區1111轉動回到傳送位置P時,傳送位置P上方的一傳送位置加熱燈具模組PH對第一載板W1進行加熱,接著再藉由傳送裝置9將第一載板W1從加熱腔室10中取出;以及f)藉由傳送裝置9將一待處理載板送入第一支持區1111。 The number of carrier plates that can be placed on the flat turntable 11 in the heating chamber 10 is preferably 4 to 6. The following is the procedure for conveying the carrier plate of the heating chamber 10 that can place four carrier plates, and is familiar with this technology The person should be able to understand that the same or similar steps can also be applied to a heating chamber with a flat turntable with more than 4 carrier plates, and this case is not limited by the example of this embodiment. Please continue to refer to FIG. 3, the method of the present invention for transferring a carrier board to a multi-piece carrier board to remove escaping and volatilized gas includes the following steps: a) providing a heating chamber 10 as described above; b) by A conveying device 9 sends a first carrier board W1 into a first support in a plurality of support areas 111 through a gate O (the opening, closing and sealing of the gate O can be a mechanism of conventional technology, so it will not be repeated) Area 1111 (It should be noted that the number of the support areas 111 in the heating chamber 10 is preferably 4 to 6. To simplify the description, the present invention uses 4 support areas 111 as an illustration, but not This is a limitation), where the first support area 1111 is located at a transfer position P; c) Please refer to Figure 4, rotate the plane turntable 11 so The first support area 1111 reaches below a first heating lamp module 121 of the heating lamp modules 12 (it should be noted that the number of the heating lamp modules 12 in the heating chamber 10 corresponds to The number of support areas 111, therefore, as mentioned above, the present invention uses four heating lamp modules 12 as an example, but not limited to this), so that the first heating lamp module 121 heats the first carrier W1 ( In the present invention, heating the carrier board refers to the heating lamp module facing the carrier board, so that the temperature of the carrier board rises to 130 degrees C), and the second supporting area 1112 is also rotated to the transfer position P; d) A second carrier W2 is sent into the second supporting area 1112 by the conveying device 9 (the schematic diagram of conveying the subsequent carrier is not shown again), please refer to FIG. 5, rotating the plane turntable 11 to make the second supporting area 1112 Reach below the first heating lamp module 121; at the same time, the first support area 1111 is also rotated under a second heating lamp module 122, causing the second heating lamp module 122 to heat the first carrier W1, and A third support area 1113 is also rotated to the transfer position P; a third carrier W3 is sent to the third support area 1113 by the transfer device 9, and the plane turntable 11 is rotated to make the third support area 1113 reach the first heating lamp mold Under the group 121, another fourth support area 1114 is also rotated to the transfer position P; referring to FIG. 7, a fourth carrier W4 is sent into the fourth support area 1114 by the transfer device 9, and the plane turntable 11 is rotated to make The fourth supporting area 1114 reaches below the first heating lamp module 121; e) Please refer to FIG. 8, when the plane turntable 11 rotates the first supporting area 1111 back to the transmission position P, a transmission position above the transmission position P is heated The lamp module PH heats the first carrier W1, and then the first carrier W1 is taken out from the heating chamber 10 by the conveying device 9; and f) a carrier to be processed is sent into by the conveying device 9 The first support area 1111.

可說明的是,本發明使用平面轉盤11上的數個支持區111去放置載板,此即表示前述的第一載板W1、第二載板W2、第三載板W3以及第四載板W4係被傳送裝置9水平地放置在第一支持區1111、第二支持區1112、第三支持區1113以及第四支持區1114中。 It can be explained that the present invention uses several support areas 111 on the flat turntable 11 to place the carrier board, which means the aforementioned first carrier board W1, second carrier board W2, third carrier board W3, and fourth carrier board. The W4 system is placed horizontally in the first support area 1111, the second support area 1112, the third support area 1113, and the fourth support area 1114 by the conveying device 9.

進一步說明的是,數個加熱燈具模組12中之每一者係使用能發出不同波長範圍之光線的鹵素燈具,不同波長範圍之光線對第一載板W1、第二載板W2、第三載板W3、第四載板W4分別加熱。例如,第一加熱燈具模組121放出近紅外線;第二加熱燈具模組122放出遠紅外線,但不以此為限。 It is further explained that each of the heating lamp modules 12 uses halogen lamps that can emit light in different wavelength ranges. The light in different wavelength ranges affects the first carrier W1, the second carrier W2, and the third carrier. The carrier board W3 and the fourth carrier board W4 are heated separately. For example, the first heating lamp module 121 emits near infrared rays; the second heating lamp module 122 emits far infrared rays, but not limited to this.

請再參閱圖2,加熱腔室10中還包含一遮光板14,遮光板14上設有數個透光孔141,透光孔141的數量對應數個加熱燈具模組12的數量。加熱燈具模組12中之每一者通過遮光板14的透光孔141而可直接對著位於加熱燈具模組12之下的載板加熱。即在本發明中,每個載板都是獨立地加熱。 Please refer to FIG. 2 again. The heating chamber 10 further includes a shading plate 14. The shading plate 14 is provided with a plurality of light-transmitting holes 141. The number of the light-transmitting holes 141 corresponds to the number of the heating lamp modules 12. Each of the heating lamp modules 12 can be directly heated to the carrier board located under the heating lamp module 12 through the light-transmitting holes 141 of the shading plate 14. That is, in the present invention, each carrier board is heated independently.

再者,在步驟b)至步驟e)中,第一抽氣泵組20保持運作,使得加熱腔室10係維持真空。 Furthermore, in step b) to step e), the first suction pump group 20 keeps operating, so that the heating chamber 10 is kept in vacuum.

請再參閱圖9,圖示另一實施例,加熱腔室10的底部表面B設有一第二穿孔15,且一第二抽氣泵組30接合至第二穿孔15並與加熱腔室10流體連通。其中第二抽氣泵組30包含一低溫冷凝泵31以及一真空渦輪泵32,其中低溫冷凝泵31係串聯真空渦輪泵32且低溫冷凝泵31接合至該第二穿孔15。 Please refer to FIG. 9 again, which shows another embodiment. The bottom surface B of the heating chamber 10 is provided with a second perforation 15, and a second suction pump set 30 is joined to the second perforation 15 and is in fluid communication with the heating chamber 10 . The second suction pump group 30 includes a cryogenic condensate pump 31 and a vacuum turbo pump 32, wherein the cryogenic condensate pump 31 is connected in series with the vacuum turbo pump 32 and the cryogenic condensate pump 31 is connected to the second through hole 15.

另外,圖10中圖示再一實施例,加熱腔室10的底部表面B設有第一穿孔13以及第二穿孔15,第一抽氣泵組20接合第一穿孔13、第二抽氣泵組30接合第二穿孔15。其中第一抽氣泵組20包含真空渦輪泵22,且真空渦輪泵22接合該第一穿孔13;第二抽氣泵組30包含低溫冷凝泵33,且低溫冷凝泵33接合至該第二穿孔15。在此實施方式中,真空渦輪泵22以及低溫冷凝泵33是並聯運作。 In addition, another embodiment is shown in FIG. 10, the bottom surface B of the heating chamber 10 is provided with a first perforation 13 and a second perforation 15, and the first suction pump group 20 is joined to the first perforation 13, the second suction pump group 30 Join the second through hole 15. The first suction pump group 20 includes a vacuum turbo pump 22, and the vacuum turbo pump 22 is connected to the first perforation 13; the second suction pump group 30 includes a cryogenic condensate pump 33, and the cryogenic condensate pump 33 is connected to the second perforation 15. In this embodiment, the vacuum turbo pump 22 and the cryogenic condensate pump 33 operate in parallel.

再者,在步驟b)至步驟e)中,第一抽氣泵組20以及第二抽氣泵組30保持運作,使得加熱腔室10係維持真空。 Furthermore, in step b) to step e), the first air extraction pump set 20 and the second air extraction pump set 30 are kept operating, so that the heating chamber 10 is maintained in vacuum.

此外,本發明的方法係在一真空環境執行所有的步驟。 In addition, the method of the present invention performs all steps in a vacuum environment.

平面轉盤11連接有相關的驅動裝置,但其裝置及結構非為本發明之重要技術特徵,故不在本文中贅述。 The flat turntable 11 is connected with a related driving device, but its device and structure are not the important technical features of the present invention, so I will not repeat it in this article.

每個支持區的下方還設有溫測儀去偵測載板的溫度,但溫測儀的相關裝置非為本發明之重要技術特徵,亦不在本文中贅述。 There is also a temperature measuring instrument under each support area to detect the temperature of the carrier board, but the related device of the temperature measuring instrument is not an important technical feature of the present invention, and will not be repeated in this article.

本發明之技術內容及技術特點已揭示如上,然而熟悉本項技術之人士仍可能基於本發明之教示及揭示而作種種不背離本發明精神之替換及修飾。因此,本發明之保護範圍應不限於實施例所揭示者,而應包括各種不背離本發明之替換及修飾,並為以下之申請專利範圍所涵蓋。 The technical content and technical features of the present invention have been disclosed above, but those familiar with the technology may still make various substitutions and modifications based on the teaching and disclosure of the present invention without departing from the spirit of the present invention. Therefore, the protection scope of the present invention should not be limited to those disclosed in the embodiments, but should include various substitutions and modifications that do not deviate from the present invention, and are covered by the following patent applications.

10‧‧‧加熱腔室 10‧‧‧Heating chamber

11‧‧‧平面轉盤 11‧‧‧Plane turntable

111‧‧‧支持區 111‧‧‧Support Area

1111‧‧‧第一支持區 1111‧‧‧First Support Area

9‧‧‧傳送裝置 9‧‧‧Transport Device

O‧‧‧閘口 O‧‧‧Gate

P‧‧‧傳送位置 P‧‧‧Transfer location

W1‧‧‧第一載板 W1‧‧‧First carrier board

Claims (11)

一種傳送載板至一多片式載板的除去逸散及揮發出氣體之設備之方法,其步驟包含:a)提供一加熱腔室,其包含一具有數個支持區的平面轉盤以及數個加熱燈具模組;b)藉由一傳送裝置將一第一載板送入一第一支持區,其中該第一支持區位於一傳送位置;c)轉動該平面轉盤使得該第一支持區到達該一第一加熱燈具模組之下,致使該第一加熱燈具模組對該第一載板進行加熱,又一第二支持區亦被轉動至該傳送位置;d)藉由該傳送裝置將一第二載板送入該第二支持區,轉動該平面轉盤使該第二支持區到達該第一加熱燈具模組之下;同時該第一支持區亦被轉動至一第二加熱燈具模組之下,致使該第二加熱燈具模組對該第一載板進行加熱;以及e)當該平面轉盤將該第一支持區轉動回到該傳送位置時,該傳送位置上方的一傳送位置加熱燈具模組對該第一載板進行加熱,接著再藉由該傳送裝置將該第一載板從該加熱腔室中取出;其中該數個加熱燈具模組中之每一者係使用能發出不同波長範圍之光線的鹵素燈具,該不同波長範圍之光線對該第一載板及該第二載板分別加熱。 A method for transferring a carrier board to a multi-piece carrier board for removing fugitive and volatilized gases. The steps include: a) providing a heating chamber, which includes a flat turntable with several supporting areas and several Heating the lamp module; b) Send a first carrier board to a first support area by a conveying device, wherein the first support area is located at a conveying position; c) Rotate the plane turntable so that the first support area reaches Under the first heating lamp module, the first heating lamp module is caused to heat the first carrier, and the second supporting area is also rotated to the conveying position; d) the conveying device A second carrier board is fed into the second supporting area, and the plane turntable is rotated to make the second supporting area reach under the first heating lamp module; at the same time, the first supporting area is also rotated to a second heating lamp module Under the group, causing the second heating lamp module to heat the first carrier; and e) when the planar turntable rotates the first support area back to the transfer position, a transfer position above the transfer position The heating lamp module heats the first carrier board, and then the first carrier board is taken out from the heating chamber by the conveying device; wherein each of the heating lamp modules uses energy For halogen lamps emitting light of different wavelength ranges, the light of different wavelength ranges heats the first carrier board and the second carrier board respectively. 如請求項1所述之方法,其中步驟d)進一步包含將一第三支持區轉動至傳送位置,藉由傳送裝置將一第三載板送入該第三支持區,轉動該平面轉盤使該第三支持區到達該第一加熱燈具模組之下,又一第四支持區亦被轉動至 該傳送位置,藉由該傳送裝置將一第四載板送入該第四支持區,轉動該平面轉盤使該第四支持區到達該第一加熱燈具模組之下。 The method according to claim 1, wherein step d) further comprises rotating a third supporting area to a transfer position, sending a third carrier plate into the third supporting area by a transfer device, and rotating the planar turntable to make the The third support area reaches below the first heating lamp module, and the fourth support area is also rotated to In the transfer position, a fourth carrier board is sent into the fourth support area by the transfer device, and the plane turntable is rotated to make the fourth support area reach below the first heating lamp module. 如請求項1所述之方法,其中該加熱腔室中還包含一遮光板,該遮光板上設有數個透光孔。 The method according to claim 1, wherein the heating chamber further includes a shading plate, and the shading plate is provided with a plurality of light-transmitting holes. 如請求項3所述之方法,其中該數個透光孔的數量對應該數個加熱燈具模組的數量。 The method according to claim 3, wherein the number of the light transmission holes corresponds to the number of the heating lamp modules. 如請求項1或2所述之方法,其中該加熱腔室的一底部表面設有一第一穿孔,且一第一抽氣泵組接合至該第一穿孔並與該加熱腔室流體連通。 The method according to claim 1 or 2, wherein a bottom surface of the heating chamber is provided with a first through hole, and a first suction pump group is connected to the first through hole and is in fluid communication with the heating chamber. 如請求項5所述之方法,其中該底部表面設有一第二穿孔,且一第二抽氣泵組接合至該第二穿孔並與該加熱腔室流體連通。 The method according to claim 5, wherein the bottom surface is provided with a second through hole, and a second suction pump group is connected to the second through hole and is in fluid communication with the heating chamber. 如請求項5所述之方法,其中在步驟b)至步驟e)中,該第一抽氣泵組保持運作,使得該加熱腔室係維持真空。 The method according to claim 5, wherein in step b) to step e), the first suction pump group keeps operating, so that the heating chamber maintains a vacuum. 如請求項6所述之方法,其中在步驟b)至步驟e)中,該第一抽氣泵組以及該第二抽氣泵組保持運作,使得該加熱腔室係維持真空。 The method according to claim 6, wherein in step b) to step e), the first air extraction pump set and the second air extraction pump set are kept in operation, so that the heating chamber maintains a vacuum. 如請求項5所述之方法,其中該第一抽氣泵組包含一低溫冷凝泵以及一真空渦輪泵,其中該低溫冷凝泵係串聯該真空渦輪泵且該低溫冷凝泵接合至該第一穿孔。 The method according to claim 5, wherein the first air extraction pump group includes a cryogenic condensate pump and a vacuum turbo pump, wherein the cryogenic condensate pump is connected in series with the vacuum turbo pump and the cryogenic condensate pump is connected to the first through hole. 如請求項6所述之方法,其中該第二抽氣泵組包含一低溫冷凝泵以及一真空渦輪泵,其中該低溫冷凝泵係串聯該真空渦輪泵且該低溫冷凝泵接合至該第二穿孔。 The method according to claim 6, wherein the second suction pump group includes a cryogenic condensate pump and a vacuum turbo pump, wherein the cryogenic condensate pump is connected in series with the vacuum turbo pump and the cryogenic condensate pump is connected to the second through hole. 如請求項6所述之方法,其中該第一抽氣泵組包含一真空渦輪泵,且該真空渦輪泵接合該第一穿孔;該第二抽氣泵組包含一低溫冷凝泵,且該低溫冷凝泵接合至該第二穿孔。 The method of claim 6, wherein the first air extraction pump set includes a vacuum turbo pump, and the vacuum turbo pump engages the first perforation; the second air extraction pump set includes a cryogenic condensate pump, and the cryogenic condensate pump Join to the second through hole.
TW108120220A 2019-06-12 2019-06-12 Method for removing fugitive and volatilized gas by transferring carrier board to a multi-piece carrier board TWI705515B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW108120220A TWI705515B (en) 2019-06-12 2019-06-12 Method for removing fugitive and volatilized gas by transferring carrier board to a multi-piece carrier board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW108120220A TWI705515B (en) 2019-06-12 2019-06-12 Method for removing fugitive and volatilized gas by transferring carrier board to a multi-piece carrier board

Publications (2)

Publication Number Publication Date
TWI705515B true TWI705515B (en) 2020-09-21
TW202046430A TW202046430A (en) 2020-12-16

Family

ID=74091491

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108120220A TWI705515B (en) 2019-06-12 2019-06-12 Method for removing fugitive and volatilized gas by transferring carrier board to a multi-piece carrier board

Country Status (1)

Country Link
TW (1) TWI705515B (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201642411A (en) * 2015-04-20 2016-12-01 應用材料股份有限公司 Buffer chamber wafer heating mechanism and supporting robots

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201642411A (en) * 2015-04-20 2016-12-01 應用材料股份有限公司 Buffer chamber wafer heating mechanism and supporting robots

Also Published As

Publication number Publication date
TW202046430A (en) 2020-12-16

Similar Documents

Publication Publication Date Title
KR102398918B1 (en) Apparatus and methods for alignment of a susceptor
KR101732348B1 (en) Auto-sequencing inline processing apparatus
KR20160006630A (en) Apparatus and method for pre-baking substrate upstream of process chamber
KR101321690B1 (en) Vacuum processing device, method for moving substrate and alignment mask, alignment method, and film forming method
JP2001229828A5 (en)
JP2021524159A (en) Dual load lock chamber
JP2017092267A (en) Substrate mounting mechanism and substrate processing apparatus
TWI705515B (en) Method for removing fugitive and volatilized gas by transferring carrier board to a multi-piece carrier board
JP2020181886A (en) Substrate processing apparatus and substrate processing method
JP2015088749A (en) Substrate treatment apparatus
TW201404597A (en) Laminating apparatus
TW201631637A (en) Substrate processing apparatus and substrate processing method
JP2022002271A (en) Heating device, substrate processing system, and heating method
JP5274239B2 (en) Deposition equipment
JP6311280B2 (en) Atmosphere replacement device, substrate transfer system, and EFEM
JP2013247128A (en) Thermal treatment apparatus, and method of determining presence or absence of poor shape of treated substrate
JP2007005399A (en) Substrate processing apparatus
KR101049897B1 (en) Apparatus for treating substrate and module including the same
JP2002025904A (en) Heat treatment equipment and substrate treatment device
CN114628231A (en) Substrate impurity removing method and substrate processing apparatus
TWI603168B (en) For semiconductor wafer removal photoresist device
CN117238815B (en) Wafer preheating and cooling device and wafer conveying method
JP2825618B2 (en) Wafer transfer method and wafer transfer apparatus
KR100773285B1 (en) Vacuum processing chamber, manufacturing apparatus and method for plasma display device
TW202017098A (en) Wafer process equipment and method for processing wafer