TWI703225B - Copper alloy for electronic/electric device, copper alloy sheet or strip for electronic/electric device, component for electronic/electric device, terminal, bus bar, and movable piece for relay - Google Patents

Copper alloy for electronic/electric device, copper alloy sheet or strip for electronic/electric device, component for electronic/electric device, terminal, bus bar, and movable piece for relay Download PDF

Info

Publication number
TWI703225B
TWI703225B TW106110851A TW106110851A TWI703225B TW I703225 B TWI703225 B TW I703225B TW 106110851 A TW106110851 A TW 106110851A TW 106110851 A TW106110851 A TW 106110851A TW I703225 B TWI703225 B TW I703225B
Authority
TW
Taiwan
Prior art keywords
copper alloy
mass
electrical
electronic
electrical equipment
Prior art date
Application number
TW106110851A
Other languages
Chinese (zh)
Other versions
TW201738394A (en
Inventor
松永裕
牧一誠
Original Assignee
日商三菱綜合材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商三菱綜合材料股份有限公司 filed Critical 日商三菱綜合材料股份有限公司
Publication of TW201738394A publication Critical patent/TW201738394A/en
Application granted granted Critical
Publication of TWI703225B publication Critical patent/TWI703225B/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/02Alloys based on copper with tin as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/002Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working by rapid cooling or quenching; cooling agents used therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/02Single bars, rods, wires, or strips
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H50/00Details of electromagnetic relays
    • H01H50/14Terminal arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H50/00Details of electromagnetic relays
    • H01H50/54Contact arrangements
    • H01H50/56Contact spring sets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02Contact members
    • H01R13/03Contact members characterised by the material, e.g. plating, or coating materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R4/00Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
    • H01R4/58Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation characterised by the form or material of the contacting members

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electromagnetism (AREA)
  • Conductive Materials (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

The copper alloy includes: 0.15 mass% or more and less than 0.35 mass% of Mg; 0.0005 mass% or more and less than 0.01 mass% of P; and the Cu balance containing inevitable impurities, wherein the conductivity exceeds 75%IACS, the average number of particles of Mg-P-containing compound having the grain size of 0.1 μm or more is 0.5 particle/μm2 in observation by the scanning electron microscope.

Description

電子‧電氣機器用銅合金、電子‧電氣機器用銅合金板條材、電子‧電氣機器用零件、端子、匯流條、及中繼用可動片 Copper alloys for electronic and electrical equipment, copper alloy plates and strips for electronic and electrical equipment, parts for electronic and electrical equipment, terminals, bus bars, and movable pieces for relay

本發明係有關適用於連接器或壓入配合等之端子、導線架、匯流條、中繼用可動片等之電子.電氣機器用零件之電子.電氣機器用銅合金、及由該電子.電氣機器用銅合金所成之電子.電氣機器用銅合金板條材、電子.電氣機器用零件、端子、匯流條、及中繼用可動片者。 The invention relates to electronics suitable for terminals, lead frames, bus bars, movable pieces for relays, etc., such as connectors or press-fitting. Electronic parts for electrical machinery. Copper alloys for electrical equipment, and the electronics. Electronics made of copper alloy for electrical equipment. Copper alloy sheet and strip for electrical equipment, electronics. Electrical equipment parts, terminals, bus bars, and movable pieces for relays.

本申請案係基於2016年3月30日於日本提出申請之日本特願2016-069080號及2017年3月28日於日本提出申請之日本特願2017-063418號而主張優先權,其內容援用於本文。 This application is based on Japanese Patent Application No. 2016-069080 filed in Japan on March 30, 2016 and Japanese Patent Application No. 2017-063418 filed in Japan on March 28, 2017, and the content is quoted In this article.

以往,連接器或壓入配合等之端子、中繼用 可動片、導線架、匯流條等等之電子.電氣機器用零件係使用導電性高的銅或銅合金。 In the past, terminals and relays such as connectors or press-fitting Electronics such as movable pieces, lead frames, bus bars, etc. The parts for electrical equipment use copper or copper alloys with high conductivity.

此處,隨著電子機器或電氣機器等小型化,亦實現該等電子機器或電氣機器等所使用之電子.電氣機器用零件之小型化及薄片化。因此,對構成電子.電氣機器用零件之材料,要求高強度及良好彎曲加工性。且,對於於汽車等之引擎室等之高溫環境下使用之連接器之端子等亦要求耐應力緩和特性。 Here, with the miniaturization of electronic equipment or electrical equipment, the electronics used in such electronic equipment or electrical equipment has also been realized. Miniaturization and thinning of electrical equipment parts. Therefore, the pair constitutes electrons. The materials of electrical equipment parts require high strength and good bending workability. In addition, the terminals of connectors used in high-temperature environments such as the engine room of automobiles are also required to withstand stress relaxation characteristics.

作為連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條等之電子.電氣機器用零件所使用之材料,於例如專利文獻1、2中提案有Cu-Mg系合金。 Used as a connector or press-fit terminal, movable piece for relay, lead frame, bus bar, etc. As materials used for parts for electrical equipment, Cu-Mg alloys are proposed in Patent Documents 1 and 2, for example.

〔先前技術文獻〕 [Prior technical literature] 〔專利文獻〕 〔Patent Literature〕

[專利文獻1]日本專利第5045783號公報(B) [Patent Document 1] Japanese Patent No. 5045783 (B)

[專利文獻2]日本特開2014-114464號公報(A) [Patent Document 2] JP 2014-114464 A (A)

此處,專利文獻1中記載之Cu-Mg系合金中,由於Mg含量多,故導電性不充分,難以適用於要求高導電性之用途。 Here, in the Cu-Mg-based alloy described in Patent Document 1, since the Mg content is large, the conductivity is insufficient, and it is difficult to apply it to applications requiring high conductivity.

且,專利文獻2中記載之Cu-Mg系合金中,Mg含量設為0.01~0.5mass%及P含量設為0.01~0.5mass%,並未 針對冷加工性及彎曲加工性大為劣化之粗大化合物加以考慮,故冷加工性及彎曲加工性不充分。 In addition, in the Cu-Mg-based alloy described in Patent Document 2, the Mg content is 0.01 to 0.5 mass% and the P content is 0.01 to 0.5 mass%. Considering the coarse compound that greatly deteriorates cold workability and bending workability, cold workability and bending workability are insufficient.

再者,上述之Cu-Mg系合金中,由於Mg而使銅合金熔浴黏度上升,故未添加P時,會有鑄造性降低之問題。 Furthermore, in the above-mentioned Cu-Mg-based alloy, the molten bath viscosity of the copper alloy increases due to Mg. Therefore, when P is not added, there is a problem that the castability decreases.

且,最近,隨著電子.電氣機器之輕量化,而實現該等電子機器或電氣機器等所使用之連接器等之端子、中繼用可動片、導線架等之電子.電氣機器用零件之薄片化。因此,連接器等之端子中,為了確保壓接,有必要進行嚴格的彎曲加工,而要求比以往更增加之彎曲加工性。 And, recently, with the electronic. Lightweight electrical equipment, and realize the electronic equipment such as terminals, relay movable pieces, lead frames, etc. used in such electronic equipment or electrical equipment. Thinning of electrical equipment parts. Therefore, in order to ensure crimping, it is necessary to perform strict bending processing in terminals such as connectors, and bending processing properties are required to be increased more than before.

本發明係鑑於前述情況者,其目的在於提供導電性、彎曲加工性優異之電子.電氣機器用銅合金、電子.電氣機器用銅合金板條材、電子.電氣機器用零件、端子、匯流條、及中繼用可動片。 In view of the foregoing, the present invention aims to provide electronics with excellent conductivity and bending workability. Copper alloys for electrical equipment, electronics. Copper alloy sheet and strip for electrical equipment, electronics. Parts for electrical equipment, terminals, bus bars, and movable pieces for relays.

為了解決該課題,本發明一樣態之電子.電氣機器用銅合金(以下稱為「本發明之電子.電氣機器用銅合金」),其特徵係以0.15mass%以上、未達0.35mass%之範圍內含有Mg,以0.0005mass%以上、未達0.01mass%之範圍內含有P,其餘部分由Cu及不可避免雜質所成,且導電率超過75%IACS,並且於掃描型電子顯微鏡觀察中,粒徑0.1μm以上之含有Mg及P之化合物的平均個數為0.5個/μm2以下。 In order to solve this problem, the present invention is the same state of electron. The copper alloy for electrical equipment (hereinafter referred to as "the copper alloy for electronic and electrical equipment of the present invention") is characterized by containing Mg in the range of 0.15 mass% or more and less than 0.35 mass%, and 0.0005 mass% or more. Contain P within the range of 0.01 mass%, the rest is made of Cu and unavoidable impurities, and the conductivity exceeds 75% IACS, and in the scanning electron microscope observation, the compound containing Mg and P with a particle size of 0.1 μm or more The average number of particles is 0.5/μm 2 or less.

依據上述構成之電子.電氣機器用銅合金,由於Mg含量設為0.15mass%以上、未達0.35mass%之範圍內,故銅之母相中固熔Mg,因此不使導電率大幅降低,而可提高強度、耐應力緩和特性。具體而言,由於導電率超過75%IACS,故亦可適用於要求高導電性之用途。且,由於以0.0005mass%以上、未達0.01mass%之範圍內含有P,故可使包含Mg之銅合金熔浴黏度降低,可提高鑄造性。 Based on the above composition of the electronics. For copper alloys for electrical equipment, since the Mg content is set to 0.15mass% or more and less than 0.35mass%, Mg is solid-melted in the mother phase of copper, so the electrical conductivity is not greatly reduced, but the strength and stress resistance can be improved. Relaxation characteristics. Specifically, since the conductivity exceeds 75% IACS, it can also be applied to applications requiring high conductivity. In addition, since P is contained within the range of 0.0005 mass% or more and less than 0.01 mass%, the viscosity of the molten copper alloy containing Mg can be reduced, and the castability can be improved.

而且,於掃描型電子顯微鏡觀察中,粒徑0.1μm以上之含有Mg及P之化合物的平均個數為0.5個/μm2以下,故母相中,成為龜裂起點之粗大含有Mg及P之化合物多數未分散,故成為彎曲加工性提高。因此,可成形複雜形狀之連接器等之端子、中繼用可動片、導線架等之電子.電氣機器用零件等。 In addition, in scanning electron microscope observation, the average number of compounds containing Mg and P with a particle size of 0.1 μm or more is 0.5/μm 2 or less. Therefore, in the matrix, the coarse starting point of cracking contains Mg and P Since most of the compounds are not dispersed, the bending workability improves. Therefore, it is possible to form complex-shaped connectors such as terminals, relay movable pieces, lead frames and other electronics. Parts for electrical equipment, etc.

此處,本發明之電子.電氣機器用銅合金中,較好Mg之含量[Mg](mass%)與P之含量[P](mass%)滿足下述之關係式:[Mg]+20×[P]<0.5。 Here, the electronics of the present invention. In copper alloys for electrical equipment, preferably the content of Mg [Mg] (mass%) and the content of P [P] (mass%) satisfy the following relationship: [Mg]+20×[P]<0.5.

該情況,可抑制含有Mg及P之粗大化合物之生成,可抑制冷加工性及彎曲加工性降低。 In this case, the generation of coarse compounds containing Mg and P can be suppressed, and the decrease in cold workability and bending workability can be suppressed.

且,本發明之電子.電氣機器用銅合金中,較好Mg之含量[Mg](mass%)與P之含量[P](mass%)滿足下述之關係式:[Mg]/[P]≦400。 And, the electronics of the present invention. In copper alloys for electrical equipment, it is preferable that the content of Mg [Mg] (mass%) and the content of P [P] (mass%) satisfy the following relationship: [Mg]/[P]≦400.

該情況,使鑄造性降低之Mg含量與使鑄造性提高之P含量之比率藉由如上述般規定,可確實提高鑄造性。 In this case, the ratio of the Mg content for reducing the castability to the P content for improving the castability is determined as described above, and the castability can be reliably improved.

再者,本發明之電子.電氣機器用銅合金中,較好於對於壓延方向正交之方向進行拉伸試驗時之0.2%耐力為300MPa以上。 Furthermore, the electronics of the present invention. In the copper alloy for electrical equipment, it is preferable that the 0.2% endurance at the time of tensile test in the direction orthogonal to the rolling direction is 300 MPa or more.

該情況下,由於於對於壓延方向正交之方向進行拉伸試驗時之0.2%耐力如上述般規定,故不容易變形,特別適合作為連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條等之電子.電氣機器用零件之銅合金。 In this case, since the 0.2% endurance during the tensile test in the direction orthogonal to the rolling direction is specified as described above, it is not easy to deform, and it is particularly suitable as a connector, a press-fitting terminal, and a movable piece for relay. , Lead frame, bus bar and other electronics. Copper alloy for electrical machinery parts.

又,本發明之電子.電氣機器用銅合金中,較好殘留應力率於150℃、1000小時為50%以上。 Also, the electronics of the present invention. In copper alloys for electrical equipment, the residual stress rate is preferably 50% or more at 150°C for 1000 hours.

該情況下,由於應力緩和率如上述般規定,故即使於高溫環境下使用時亦可將永久變形抑制為較小,例如可抑制連接器端子等之壓接降低。因此,可適用作為於引擎室等之高溫環境下使用之電子機器用零件之材料。 In this case, since the stress relaxation rate is determined as described above, the permanent deformation can be suppressed to be small even when used in a high-temperature environment. For example, it is possible to suppress reduction in crimping of connector terminals and the like. Therefore, it can be used as a material for parts of electronic equipment used in high-temperature environments such as engine rooms.

本發明之其他樣態之電子.電氣機器用銅合金板條材(以下稱為「本發明之電子.電氣機器用銅合金板條材」),其特徵係由上述之電子.電氣機器用銅合金所成。 Other types of electrons of the present invention. Copper alloy sheet and strip for electrical equipment (hereinafter referred to as "electronics of the present invention. Copper alloy sheet and strip for electrical equipment"), which are characterized by the above-mentioned electronic. Made of copper alloy for electrical equipment.

依據該構成之電子.電氣機器用銅合金板條材,由於以上述之電子.電氣機器用銅合金所構成,故導電性、強度、彎曲加工性、耐應力緩和特性優異,特別適合作為連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條等之電子.電氣機器用零件之材料。 Based on the structure of the electronics. Copper alloy plates and strips for electrical equipment, due to the above-mentioned electronics. Electrical equipment is made of copper alloy, so it has excellent electrical conductivity, strength, bending workability, and stress relaxation properties. It is especially suitable for terminals such as connectors or press-fitting, movable pieces for relays, lead frames, bus bars, etc. electronic. Materials for parts of electrical machinery.

又,本發明之電子.電氣機器用銅合金板條材,係包含板材即將其捲取為線圈狀之條材。 Also, the electronics of the present invention. Copper alloy slabs and strips for electrical equipment are strips that include plates that are coiled into coils.

此處,本發明之電子.電氣機器用銅合金板條材中,較好表面具有Sn鍍敷層或Ag鍍敷層。 Here, the electronics of the present invention. In the copper alloy plate and strip for electrical equipment, it is preferable that the surface has a Sn plating layer or an Ag plating layer.

該情況下,由於表面具有Sn鍍敷層或Ag鍍敷層,故特別適合作為連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條等之電子.電氣機器用零件之材料。又,本發明中,「Sn鍍敷」包含純Sn鍍敷或Sn合金鍍敷,「Ag鍍敷」包含純Ag鍍敷或Ag合金鍍敷。 In this case, due to the Sn plating layer or Ag plating layer on the surface, it is particularly suitable as a connector or press-fit terminal, relay movable piece, lead frame, bus bar and other electronics. Materials for parts of electrical machinery. Moreover, in the present invention, "Sn plating" includes pure Sn plating or Sn alloy plating, and "Ag plating" includes pure Ag plating or Ag alloy plating.

本發明之其他樣態之電子.電氣機器用零件(以下稱為「本發明之電子.電氣機器用零件」),其特徵係由上述之電子.電氣機器用銅合金板條材所成。又,本發明之電子.電氣機器用零件係包含連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條等者。該構成之電子.電氣機器用零件由於係使用上述之電子.電氣機器用銅合金板條材製造,故即使於小型化及薄片化時亦可發揮優異特性。 Other types of electrons of the present invention. Parts for electrical equipment (hereinafter referred to as "parts for electronic and electrical equipment of the present invention") are characterized by the aforementioned electronics. It is made of copper alloy plate and strip for electrical equipment. Also, the electronics of the present invention. Parts for electrical equipment include connectors or press-fit terminals, movable pieces for relays, lead frames, bus bars, etc. The composition of the electronics. The parts for electrical machinery use the above-mentioned electronics. Electrical equipment is made of copper alloy slabs, so it can exhibit excellent characteristics even in miniaturization and thinning.

又,本發明之電子.電氣機器用零件中,表面亦可具有Sn鍍敷層或Ag鍍敷層。又,Sn鍍敷層及Ag鍍敷層亦可預先形成於電子.電氣機器用銅合金板條材,亦可於成形電子.電氣機器用零件後形成。 Also, the electronics of the present invention. In the parts for electrical equipment, the surface may have a Sn plating layer or an Ag plating layer. In addition, the Sn plating layer and Ag plating layer can also be pre-formed on the electronics. Copper alloy plates and strips for electrical machines can also be used in forming electronics. After forming parts for electrical equipment.

本發明其他樣態之端子(以下稱為「本發明之端子」),其特徵係由上述之電子.電氣機器用銅合金板條材所成。 Another aspect of the terminal of the present invention (hereinafter referred to as "the terminal of the present invention") is characterized by the above-mentioned electronic. It is made of copper alloy plate and strip for electrical equipment.

該構成之端子,由於係使用上述之電子.電氣機器用銅合金板條材製造,故即使於小型化及薄片化時亦可發揮 優異特性。 The terminal of this structure uses the above-mentioned electrons. Electrical equipment is made of copper alloy sheet and strip, so it can be used even in miniaturization and thinning Excellent characteristics.

且,本發明之端子中,表面亦可具有Sn鍍敷層或Ag鍍敷層。又,Sn鍍敷層及Ag鍍敷層亦可預先形成於電子.電氣機器用銅合金板條材,亦可於成形端子後形成。 Moreover, in the terminal of the present invention, the surface may have a Sn plating layer or an Ag plating layer. In addition, the Sn plating layer and Ag plating layer can also be pre-formed on the electronics. Copper alloy plates and strips for electrical equipment can also be formed after forming terminals.

本發明其他樣態之匯流條(以下稱為「本發明之匯流條」),其特徵係由上述之電子.電氣機器用銅合金板條材所成。 Another aspect of the bus bar of the present invention (hereinafter referred to as "the bus bar of the present invention") is characterized by the above-mentioned electronic. It is made of copper alloy plate and strip for electrical equipment.

此構成之匯流條由於係使用上述之電子.電氣機器用銅合金板條材製造,故即使於小型化及薄片化時亦可發揮優異特性。 The bus bar of this structure uses the above-mentioned electronics. Electrical equipment is made of copper alloy slabs, so it can exhibit excellent characteristics even in miniaturization and thinning.

又,本發明之匯流條中,表面亦可具有Sn鍍敷層或Ag鍍敷層。又,Sn鍍敷層及Ag鍍敷層亦可預先形成於電子.電氣機器用銅合金板條材,亦可於成形匯流條後形成。 Furthermore, in the bus bar of the present invention, the surface may have a Sn plating layer or an Ag plating layer. In addition, the Sn plating layer and Ag plating layer can also be pre-formed on the electronics. Copper alloy plates and strips for electrical equipment can also be formed after bus bars are formed.

本發明其他樣態之中繼用可動片(以下稱為「本發明之中繼用可動片」),其特徵係由上述之電子.電氣機器用銅合金板條材所成。 Another aspect of the movable piece for relaying of the present invention (hereinafter referred to as the "movable piece for relaying of the present invention") is characterized by the above-mentioned electronic. It is made of copper alloy plate and strip for electrical equipment.

該構成之中繼用可動片由於係使用上述之電子.電氣機器用銅合金板條材製造,故即使於小型化及薄片化時亦可發揮優異特性。 The movable piece for relay of this structure uses the above-mentioned electronics. Electrical equipment is made of copper alloy slabs, so it can exhibit excellent characteristics even in miniaturization and thinning.

又,本發明之中繼用可動片中,表面亦可具有Sn鍍敷層或Ag鍍敷層。又,Sn鍍敷層及Ag鍍敷層亦可預先形成於電子.電氣機器用銅合金板條材,亦可於成形中繼用可動片後形成。 In addition, the movable piece for relay of the present invention may have a Sn plating layer or an Ag plating layer on the surface. In addition, the Sn plating layer and Ag plating layer can also be pre-formed on the electronics. Copper alloy plates and strips for electrical equipment can also be formed after forming movable pieces for relay.

依據本發明,可提供導電性、彎曲加工性優異之電子.電氣機器用銅合金、電子.電氣機器用銅合金板條材、電子.電氣機器用零件、端子、匯流條、及中繼用可動片。 According to the present invention, it is possible to provide electronics with excellent conductivity and bending workability. Copper alloys for electrical equipment, electronics. Copper alloy sheet and strip for electrical equipment, electronics. Parts for electrical equipment, terminals, bus bars, and movable pieces for relays.

圖1係本實施形態之電子.電氣機器用銅合金之製造方法之流程圖。 Figure 1 shows the electronics of this embodiment. Flow chart of the manufacturing method of copper alloy for electrical equipment.

圖2A係顯示本實施例之化合物之觀察結果的一例之照片。 Fig. 2A is a photograph showing an example of the observation result of the compound of this example.

圖2B係顯示本實施例之化合物之觀察結果的一例之EDX分析結果。 Figure 2B shows an example of the EDX analysis result of the compound of this example.

以下,針對本發明一實施形態之電子.電氣機器用銅合金加以說明。 Hereinafter, for the electronics of one embodiment of the present invention. Copper alloys are used to illustrate electrical equipment.

本實施形態之電子.電氣機器用銅合金具有如下組成:以0.15mass%以上、未達0.35mass%之範圍內含有Mg,以0.0005mass%以上、未達0.01mass%之範圍內含有P,其餘部分由Cu及不可避免雜質所成。 The electronics of this embodiment. The copper alloy for electrical equipment has the following composition: Mg is contained in the range of 0.15 mass% or more and less than 0.35 mass%, P is contained in the range of 0.0005 mass% or more and less than 0.01 mass%, and the rest is made of Cu and unavoidable Made by impurities.

又,本實施形態之電子.電氣機器用銅合金中,導電 率超過75%IACS。 Also, the electronics of this embodiment. Conductive in copper alloys for electrical equipment The rate exceeds 75% IACS.

而且,本實施形態之電子.電氣機器用銅合金中,於掃描型電子顯微鏡觀察中,粒徑0.1μm以上之含有Mg及P之化合物的平均個數為0.5個/μm2以下。 Moreover, the electronics of this embodiment. In the copper alloy for electrical equipment, the average number of compounds containing Mg and P with a particle size of 0.1 μm or more in the observation with a scanning electron microscope is 0.5 pieces/μm 2 or less.

又,本實施形態之電子.電氣機器用銅合金中,Mg之含量[Mg](mass%)與P之含量[P](mass%)滿足下述之關係式: Also, the electronics of this embodiment. In copper alloys for electrical equipment, the content of Mg [Mg] (mass%) and the content of P [P] (mass%) satisfy the following relationship:

[Mg]+20×[P]<0.5。 [Mg]+20×[P]<0.5.

再者,本實施形態中,Mg之含量[Mg](mass%)與P之含量[P](mass%)滿足下述之關係式: [Mg]/[P]≦400。 Furthermore, in this embodiment, the content of Mg [Mg] (mass%) and the content of P [P] (mass%) satisfy the following relationship: [Mg]/[P]≦400.

又,本實施形態之電子.電氣機器用銅合金中,於對於壓延方向正交之方向進行拉伸試驗時之0.2%耐力為300MPa以上。亦即,本實施形態中,作成電子.電氣機器用銅合金之壓延材,於壓延之最終步驟中於對於壓延方向正交之方向進行拉伸試驗時之0.2%耐力係如上述般規定。 Also, the electronics of this embodiment. In the copper alloy for electrical equipment, the 0.2% endurance at the time of the tensile test in the direction orthogonal to the rolling direction is 300 MPa or more. In other words, in this embodiment, electronic components are made. The 0.2% endurance of the rolled copper alloy for electrical equipment during the tensile test in the direction orthogonal to the rolling direction in the final step of rolling is specified as above.

再者,本實施形態之電子.電氣機器用銅合金中,殘留應力率於150℃、1000小時為50%以上。 Furthermore, the electronics of this embodiment. In copper alloys for electrical equipment, the residual stress rate is 50% or more at 150°C for 1000 hours.

此處,針對規定如上述之成分組成、化合物、各種特性之理由說明如下。 Here, the reasons for defining the above-mentioned component composition, compound, and various characteristics are explained as follows.

(Mg:0.15mass%以上、未達0.35mass%) (Mg: 0.15mass% or more, less than 0.35mass%)

Mg係藉由固熔於銅合金之母相中,而不會使導電率 大幅降低,具有提高強度及耐應力緩和特性之作用的元素。 Mg is solid melted in the mother phase of copper alloy without causing conductivity It is greatly reduced and has the effect of improving the strength and resistance to stress relaxation.

此處,Mg含量未達0.15mass%時,有無法充分發揮其作用效果之虞。另一方面Mg含量為0.35mass%以上時,導電率大幅降低同時銅合金熔浴黏度上升,而有鑄造性降低之虞。 Here, if the Mg content is less than 0.15 mass%, there is a possibility that the effect cannot be fully exhibited. On the other hand, when the Mg content is 0.35 mass% or more, the electrical conductivity is greatly reduced and the viscosity of the copper alloy molten bath increases, which may reduce the castability.

基於以上,本實施形態中,將Mg含量設定於0.15mass%以上、未達0.35mass%之範圍內。 Based on the above, in this embodiment, the Mg content is set to be within a range of 0.15 mass% or more and less than 0.35 mass%.

又,為了進一步提高強度及耐應力緩和特性,Mg含量之下限較好設為0.16mass%以上,又更好設為0.17mass%以上。且,為了確實抑制導電率降低及鑄造性降低,Mg含量之上限較好設為0.30mass%以下,又更好設為0.28mass%以下。 Moreover, in order to further improve the strength and the stress relaxation resistance, the lower limit of the Mg content is preferably set to 0.16 mass% or more, and more preferably set to 0.17 mass% or more. In addition, in order to surely suppress the decrease in electrical conductivity and the decrease in castability, the upper limit of the Mg content is preferably set to 0.30 mass% or less, and more preferably set to 0.28 mass% or less.

(P:0.0005mass%以上、未達0.01mass%) (P: 0.0005mass% or more, less than 0.01mass%)

P係具有提高鑄造性之作用效果之元素。 P is an element that has the effect of improving castability.

此處,P含量未達0.0005mass%時,有其作用效果無法充分發揮之虞。另一方面P含量為0.01mass%以上時,由於容易生成含有Mg及P之粒徑0.1μm以上之粗大化合物,故有以該化合物為破壞起點,於冷加工時或彎曲加工時產生龜裂之虞。 Here, if the P content is less than 0.0005 mass%, the effect may not be fully exhibited. On the other hand, when the P content is 0.01 mass% or more, since it is easy to produce coarse compounds containing Mg and P with a particle size of 0.1 μm or more, this compound may be used as a starting point for damage, and cracks may occur during cold working or bending. .

基於以上,本實施形態中,P含量設定於0.0005mass%以上、未達0.01mass%之範圍內。又,為了確實提高鑄造性,P含量之下限較好為0.0007mass%以 上,又更好為0.001mass%以上。且,為了確實抑制粗大化合物之生成,P含量之上限較好未達0.009mass%,更好未達0.008mass%,又更好為0.0075mass%以下,再更好為0.0050mass%以下。 Based on the above, in the present embodiment, the P content is set within the range of 0.0005 mass% or more and less than 0.01 mass%. In addition, in order to surely improve the castability, the lower limit of the P content is preferably 0.0007 mass% or more It is better to be 0.001 mass% or more. In addition, in order to surely suppress the formation of coarse compounds, the upper limit of the P content is preferably less than 0.009 mass%, more preferably less than 0.008 mass%, still more preferably 0.0075 mass% or less, and still more preferably 0.0050 mass% or less.

([Mg]+20×[P]<0.5) ([Mg]+20×[P]<0.5)

如上述,藉由Mg與P共存,而生成含有Mg及P之化合物。 As mentioned above, by the coexistence of Mg and P, a compound containing Mg and P is generated.

此處,以質量比計,設定Mg之含量[Mg]與P之含量[P]時,於[Mg]+20×[P]為0.5以上時,Mg及P之總量較多,含有Mg及P之化合物粗大化並且高密度分佈,而有冷加工時或彎曲加工時易產生龜裂之虞。 Here, when the content of Mg [Mg] and the content of P [P] are set in terms of mass ratio, when [Mg]+20×[P] is 0.5 or more, the total amount of Mg and P is large and contains Mg The compound of P and P is coarsened and distributed in high density, and it is likely to produce cracks during cold working or bending.

基於以上,本實施形態中,[Mg]+20×[P]設定為未達0.5。又,為了確實抑制化合物粗大化及高密度分佈,且抑制冷加工時或彎曲加工時易產生龜裂之發生,較好[Mg]+20×[P]設定為未達0.48,更好未達0.46。又更好未達0.44。 Based on the above, in this embodiment, [Mg]+20×[P] is set to less than 0.5. In addition, in order to surely suppress the coarsening and high density distribution of the compound, and to suppress the occurrence of cracks during cold working or bending, it is preferable to set [Mg]+20×[P] to less than 0.48, more preferably less than 0.46 . It is better than 0.44.

([Mg]/[P]≦400) ([Mg]/[P]≦400)

由於Mg係具有使銅合金熔浴之黏度上升、使鑄造性降低之作用之元素,故為了確實提高鑄造性,有必要使Mg與P之含量適當化。 Since Mg is an element that has the effect of increasing the viscosity of the copper alloy bath and reducing the castability, it is necessary to make the content of Mg and P appropriate in order to surely improve the castability.

此處,以質量比計,設定Mg之含量[Mg]與P之含量[P]時,[Mg]/[P]超過400時,Mg含量相對於P變多,有 藉由添加P所致之鑄造性提高效果變小之虞。 Here, when the content of Mg [Mg] and the content of P [P] are set in terms of mass ratio, when [Mg]/[P] exceeds 400, the Mg content will increase relative to P. The castability improvement effect due to the addition of P may be reduced.

基於以上,本實施形態中,將[Mg]/[P]設定為400以下。為了更提高鑄造性,[Mg]/[P]較好為350以下,更好為300以下。 Based on the above, in this embodiment, [Mg]/[P] is set to 400 or less. In order to further improve the castability, [Mg]/[P] is preferably at most 350, more preferably at most 300.

又,[Mg]/[P]過度低時,Mg作為化合物被消耗,而有無法獲得Mg之固熔所致之效果之虞。為了抑制含有Mg及P之化合物之生成、確實實現藉由Mg之固熔所致之耐力、耐應力緩和特性之提高,較好[Mg]/[P]之下限超過20,更好超過25。 In addition, when [Mg]/[P] is too low, Mg is consumed as a compound, and there is a possibility that the effect due to the solid solution of Mg cannot be obtained. In order to inhibit the formation of compounds containing Mg and P, and to achieve the improvement of endurance and stress relaxation resistance properties caused by the solid melting of Mg, it is preferable that the lower limit of [Mg]/[P] exceeds 20, and more preferably exceeds 25.

(不可避免雜質:0.1mass%以下) (Inevitable impurities: 0.1mass% or less)

作為其他不可避免雜質,舉例為Ag、B、Ca、sr、Ba、Sc、Y、稀土類元素、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Mn、Re、Fe、Ru、Os、Co、Se、Te、Rh、Ir、Ni、Pd、Pt、Au、Zn、Cd、Hg、Al、Ga、In、Ge、Sn、As、Sb、Tl、Pb、Bi、Be、N、C、Si、Li、H、O、S等。該等不可避免雜質由於具有使導電率降低之作用,故總量為0.1mass%以下。 As other unavoidable impurities, for example, Ag, B, Ca, sr, Ba, Sc, Y, rare earth elements, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Re, Fe, Ru, Os, Co, Se, Te, Rh, Ir, Ni, Pd, Pt, Au, Zn, Cd, Hg, Al, Ga, In, Ge, Sn, As, Sb, Tl, Pb, Bi, Be, N, C, Si, Li, H, O, S, etc. These unavoidable impurities have the effect of reducing the conductivity, so the total amount is less than 0.1 mass%.

又,由於Ag、Zn、Sn容易混入銅中使導電率降低,故總量較好未達500massppm。尤其Sn使導電率大為減少,故較好單獨為未達50massppm。 In addition, since Ag, Zn, and Sn are easily mixed into copper to lower the conductivity, the total amount is preferably less than 500 mass ppm. In particular, Sn greatly reduces the conductivity, so it is preferably less than 50 massppm alone.

再者,Si、Cr、Ti、Zr、Fe、Co尤其可使導電率大幅減少並且因形成化合物而使彎曲加工性劣化,故該等元素總量較好未達500massppm。 Furthermore, Si, Cr, Ti, Zr, Fe, and Co in particular can greatly reduce electrical conductivity and degrade bending workability due to the formation of compounds. Therefore, the total amount of these elements is preferably less than 500 massppm.

(含有Mg及P之化合物) (Compounds containing Mg and P)

本實施形態之電子.電氣機器用銅合金中,於掃描型電子顯微鏡觀察中,粒徑0.1μm以上之含有Mg及P之化合物的平均個數為0.5個/μm2以下。該等尺寸較大之化合物若多量存在,則以該等化合物成為龜裂起點,而使彎曲加工性大幅劣化。 The electronics of this embodiment. In the copper alloy for electrical equipment, the average number of compounds containing Mg and P with a particle size of 0.1 μm or more in the observation with a scanning electron microscope is 0.5 pieces/μm 2 or less. If these large-size compounds are present in large amounts, these compounds will become the starting point of cracks, which greatly deteriorates the bending workability.

調查組織之結果,粒徑0.1μm以上之含有Mg及P之化合物的平均個數為0.5個/μm2以下時,亦即,不存在或少量存在含有Mg及P之化合物時,獲得良好之彎曲加工性。 As a result of tissue investigation, when the average number of compounds containing Mg and P with a particle size of 0.1 μm or more is 0.5/μm 2 or less, that is, when there is no or a small amount of compounds containing Mg and P, good bending is obtained Processability.

再者,為了確實發揮上述作用效果,更好合金中之粒徑0.05μm以上之含有Mg及P之化合物的平均個數為0.5個/μm2以下。 Furthermore, in order to ensure the above-mentioned effects, it is preferable that the average number of compounds containing Mg and P with a particle size of 0.05 μm or more in the alloy is 0.5 pieces/μm 2 or less.

又,含有Mg及P之化合物的平均個數係使用場射出型掃描電子顯微鏡,以倍率:5萬倍,視野:約4.8μm2進行10視野觀察,算出其平均值。 In addition, the average number of compounds containing Mg and P was observed using a field emission scanning electron microscope at a magnification of 50,000 times and a field of view: approximately 4.8 μm 2 and the average value was calculated.

且,含有Mg及P之化合物之粒徑係設為化合物之長徑(於期間與粒界不相切之條件下於粒內拉出最長直線之長度)與短徑(於與長徑直角相交之方向,於期間與粒界不相切之條件下拉出最長直線之長度)之平均值。粒徑0.1μm以上之含有Mg及P之化合物的每單位面積之平均個數(個數密度)主要可藉由鑄造速度與中間熱處理溫度、熱處理時間而控制。為了減低上述化合物每單位面積 之平均個數(個數密度)時,可藉由將鑄造速度設定為快速、中間熱處理設定為高溫短時間而達成。鑄造速度與中間熱處理條件係適當選擇。 And, the particle size of the compound containing Mg and P is set as the long diameter of the compound (the length of the longest straight line drawn in the grain under the condition that the period is not tangent to the grain boundary) and the short diameter (when it intersects with the long diameter at right angles). The average value of the length of the longest straight line drawn under the condition that the period is not tangent to the grain boundary). The average number per unit area (number density) of compounds containing Mg and P with a particle size of 0.1 μm or more can be controlled mainly by casting speed, intermediate heat treatment temperature, and heat treatment time. In order to reduce the above compound per unit area The average number (number density) can be achieved by setting the casting speed to fast and the intermediate heat treatment to high temperature and short time. The casting speed and intermediate heat treatment conditions are appropriately selected.

(導電率:超過75%IACS) (Conductivity: more than 75%IACS)

本實施形態之電子.電氣機器用銅合金中,藉由將導電率設為超過75%IACS,而可良好地使用作為連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條等之電子.電氣機器用零件。 The electronics of this embodiment. In the copper alloy for electrical equipment, by setting the conductivity to exceed 75% IACS, it can be used well as electronics such as connectors, press-fit terminals, movable pieces for relays, lead frames, and bus bars. Parts for electrical equipment.

又,導電率較好超過76%IACS,更好超過77%IACS,又更好超過78%IACS,再更好超過80%IACS。 In addition, the conductivity preferably exceeds 76% IACS, more preferably exceeds 77% IACS, still more preferably exceeds 78% IACS, and still more preferably exceeds 80% IACS.

(0.2%耐力:300MPa以上) (0.2% endurance: above 300MPa)

本實施形態之電子.電氣機器用銅合金中,藉由將0.2%耐力設為300MPa以上,成為特別適合作為連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條等之電子.電氣機器用零件之材料。又,本實施形態中,對於壓延方向正交之方向進行拉伸試驗時之0.2%耐力設為300MPa以上。 The electronics of this embodiment. Among the copper alloys for electrical equipment, by setting the 0.2% endurance to 300 MPa or more, it is particularly suitable for use as connectors, press-fit terminals, movable pieces for relays, lead frames, and bus bars. Materials for parts of electrical machinery. In addition, in this embodiment, the 0.2% resistance when the tensile test is performed in the direction orthogonal to the rolling direction is set to 300 MPa or more.

此處,上述之0.2%耐力較好為325MPa以上,更好350MPa以上。 Here, the aforementioned 0.2% endurance is preferably 325 MPa or more, more preferably 350 MPa or more.

(殘留應力率:50%以上) (Residual stress rate: more than 50%)

本實施形態之電子.電氣機器用銅合金中,如上述,殘留應力率於150℃、1000小時設為50%以上。 The electronics of this embodiment. In the copper alloy for electrical equipment, as described above, the residual stress rate is set to 50% or more at 150°C for 1000 hours.

該條件下之殘留應力率高時,即使於高溫環境下使用時,亦可將永久變形抑制為較小,可抑制壓接之降低。因此,本實施形態之電子機器用銅合金可適合作為在如汽車之引擎室周圍之高溫環境下使用之端子。本實施形態中,對於壓延方向正交之方向進行應力緩和試驗時之殘留應力率於150℃、1000小時設為50%以上。 When the residual stress rate under this condition is high, even when used in a high-temperature environment, the permanent deformation can be suppressed to be small, and the reduction of the crimping can be suppressed. Therefore, the copper alloy for electronic equipment of this embodiment can be suitably used as a terminal for use in a high-temperature environment around the engine room of an automobile. In this embodiment, the residual stress rate when the stress relaxation test is performed in the direction orthogonal to the rolling direction is set to 50% or more at 150°C for 1000 hours.

此處,上述殘留應力率較好於150℃、1000小時為60%以上,更好於150℃、1000小時為70%以上。 Here, the above-mentioned residual stress ratio is preferably at least 60% at 150°C and 1000 hours, and more preferably at least 70% at 150°C and 1000 hours.

以下,針對如此構成之本實施形態之電子.電氣機器用銅合金之製造方法參考圖1所示之流程圖加以說明。 Hereinafter, for the electronics of this embodiment constructed in this way. The manufacturing method of the copper alloy for electrical equipment is described with reference to the flowchart shown in Figure 1.

(熔解.鑄造步驟S01) (Melting. Casting step S01)

首先,於熔解銅原料所得之銅熔浴中,添加前述元素進行成分調整,製出銅合金熔浴。又,各種元素之添加中,可使用元素單體或母合金。且,亦可將含上述元素之原料作為銅原料並熔解。又,亦可使用本合金之回收材及廢料材。此處,銅熔浴較好為純度99.99mass%以上之所謂4NCu或99.999mass%以上之所謂5NCu。熔解步驟中,為了抑制Mg之氧化,且為了減低氫濃度,較好藉由H2O之蒸氣壓低的惰性環境(例如Ar氣體)進行環境熔解,熔解時之保持時間較好侷限於最小限度。 First, in the copper molten bath obtained by melting the copper raw materials, the aforementioned elements are added to adjust the composition to prepare a copper alloy molten bath. In addition, for the addition of various elements, a single element or a master alloy can be used. In addition, a raw material containing the above-mentioned elements may be used as a copper raw material and melted. In addition, recycled materials and scrap materials of this alloy can also be used. Here, the copper molten bath is preferably a so-called 4NCu with a purity of 99.99 mass% or more or a so-called 5NCu with a purity of 99.999 mass% or more. In the melting step, in order to suppress the oxidation of Mg and to reduce the hydrogen concentration, it is preferable to perform environmental melting in an inert environment with a low vapor pressure of H 2 O (for example, Ar gas), and the retention time during melting is preferably limited to a minimum.

接著,將經成分調整之銅合金熔浴注入鑄模中製出鑄塊。又,考慮量產時,較好使用連續鑄造法或半連續鑄造法。 Then, the copper alloy molten bath whose composition has been adjusted is injected into the mold to produce an ingot. In addition, when considering mass production, it is preferable to use a continuous casting method or a semi-continuous casting method.

此時,熔浴凝固時,含有Mg及P之化合物作為晶析物而形成,故藉由加快凝固速度,可使含有Mg及P之化合物尺寸更微細。因此,熔浴之冷卻速度較好為0.5℃/sec以上,更好為1℃/sec以上,最好為15℃/sec以上。 At this time, when the molten bath solidifies, the compound containing Mg and P is formed as a crystallization product. Therefore, by increasing the solidification rate, the size of the compound containing Mg and P can be made finer. Therefore, the cooling rate of the molten bath is preferably 0.5°C/sec or more, more preferably 1°C/sec or more, most preferably 15°C/sec or more.

(均質化/熔體化步驟S02) (Homogenization/meltization step S02)

其次,為了使所得鑄塊均質化及熔體化而進行加熱處理。鑄塊內部,存在有於凝固過程中因Mg偏析並濃縮而發生之以Cu及Mg為主成分之金屬間化合物等。因此,為了使該等偏析及金屬間化合物等消失或減低,而藉由進行將鑄塊加熱至300℃以上900℃以下之加熱處理,而於鑄塊內,使Mg均質擴散,使Mg固熔於母相中。又,該均質化/熔體化步驟S02較好在非氧化性或還原性環境中實施。 Next, heat treatment is performed in order to homogenize and melt the obtained ingot. Inside the ingot, there are intermetallic compounds with Cu and Mg as the main components that occur due to the segregation and concentration of Mg during the solidification process. Therefore, in order to make the segregation and intermetallic compounds disappear or reduce, the ingot is heated to 300°C or more and 900°C or less by heating treatment, so that Mg is uniformly diffused in the ingot, and the Mg is solidified. In the mother phase. In addition, the homogenization/melting step S02 is preferably carried out in a non-oxidizing or reducing environment.

此處,加熱溫度未達300℃時,熔體化變不完全,有於母相中殘存較多以Cu及Mg為主成分之金屬間化合物之虞。另一方面,加熱溫度超過900℃時,銅材料之一部分成為液相,有組織或表面狀態變不均一之虞。因此,加熱溫度設定於300℃以上900℃以下之範圍。 Here, if the heating temperature does not reach 300°C, the melt will be incomplete, and there is a possibility that a large amount of intermetallic compounds mainly composed of Cu and Mg will remain in the mother phase. On the other hand, when the heating temperature exceeds 900°C, a part of the copper material becomes a liquid phase, and the structure or surface state may become uneven. Therefore, the heating temperature is set in the range of 300°C or more and 900°C or less.

又,為了後述之粗加工效率化與組織均一化,亦可於前述均質化/熔體化步驟S02之後進行熱加工。該情況, 加工方法並未特別限定,可採用例如壓延、拉線、擠出、溝槽壓延、鍛造、壓製等。且,熱加工溫度較好為300℃以上900℃以下之範圍內。 In addition, in order to increase the efficiency of rough processing and homogenize the structure described later, hot working may be performed after the homogenization/melting step S02 described above. This situation, The processing method is not particularly limited, and, for example, rolling, drawing, extrusion, groove rolling, forging, pressing, etc. can be used. In addition, the hot working temperature is preferably within a range of 300°C or more and 900°C or less.

(粗加工步驟S03) (Rough machining step S03)

為了加工為特定形狀而進行粗加工。又,該粗加工步驟S03中之溫度條件並未特別限定,但為了抑制再結晶,或為了提高尺寸精度,較好設為冷加工或溫加工之-200℃至200℃之範圍內,特佳為常溫。關於加工率(壓延率),較好為20%以上,更好為30%以上。且關於加工方法並未特別限定,可採用例如壓延、拉線、擠出、溝槽壓延、鍛造、壓製等。 Rough machining is performed for processing into a specific shape. In addition, the temperature conditions in the rough processing step S03 are not particularly limited, but in order to suppress recrystallization or to improve dimensional accuracy, it is preferably in the range of -200°C to 200°C for cold working or warm working, and particularly preferably Room temperature. Regarding the processing rate (rolling rate), it is preferably 20% or more, more preferably 30% or more. The processing method is not particularly limited, and for example, rolling, drawing, extrusion, groove rolling, forging, pressing, etc. can be used.

(中間熱處理步驟S04) (Intermediate heat treatment step S04)

於粗加工步驟S03後,基於用以徹底熔體化、再結晶組織化或加工性提高之軟化為目的而實施熱處理。熱處理方法並未特別限定,但為了不使藉由晶析等所形成之上述化合物之粒徑增大,有必要為高溫、短時間之熱處理步驟,故較佳以400℃以上900℃以下之保持溫度、5秒以上1小時以下之保持時間,更好500℃以上900℃以下之保持溫度、5秒以上30分鐘以下之保持時間進行熱處理。且於非氧化環境或還原性環境中進行熱處理。 After the rough processing step S03, heat treatment is performed for the purpose of complete melting, recrystallization, or softening for improving workability. The heat treatment method is not particularly limited, but in order not to increase the particle size of the above-mentioned compound formed by crystallization, etc., a high temperature and short time heat treatment step is necessary, so it is preferably maintained at 400°C or higher and 900°C or lower Heat treatment at a temperature, a holding time of 5 seconds or more and 1 hour or less, more preferably a holding temperature of 500°C or more and 900°C or less, and a holding time of 5 seconds or more and 30 minutes or less. And heat treatment in non-oxidizing environment or reducing environment.

又,加熱後之冷卻方法並未特別限定,但較好採用水淬冷等之冷卻速度為200℃/min以上之方法。 In addition, the cooling method after heating is not particularly limited, but it is preferable to use a method in which the cooling rate such as water quenching is 200°C/min or more.

又,粗加工步驟S03及中間熱處理步驟S04亦可重複實施。 In addition, the rough machining step S03 and the intermediate heat treatment step S04 may be repeatedly implemented.

(整飾加工步驟S05) (Finishing step S05)

為了將中間熱處理步驟S04後之銅材料加工為特定形狀,而進行整飾加工。又,該經整飾加工步驟S05中之溫度條件並未特別限定,但為了抑制再結晶,或為了抑制軟化,較好設為冷加工或溫加工之-200℃至200℃之範圍內,特佳為常溫。且,加工率雖適當選擇為近似於最終形狀,但為了於整飾加工步驟S05中藉由加工硬化而提高強度,加工率較好為20%以上。且於實現強度進一步提高時,更好加工率設為30%以上,又更好加工率設為40%以上,最好設為60%以上。且由於加工率增加而使彎曲加工性劣化,故較好設為99%以下。 In order to process the copper material after the intermediate heat treatment step S04 into a specific shape, finishing processing is performed. In addition, the temperature conditions in the finishing step S05 are not particularly limited, but in order to suppress recrystallization, or to suppress softening, it is preferably in the range of -200°C to 200°C for cold working or warm working, and particularly preferred For normal temperature. In addition, although the processing rate is appropriately selected to approximate the final shape, in order to increase the strength by work hardening in the finishing step S05, the processing rate is preferably 20% or more. When the strength is further improved, the processing rate is preferably set to 30% or more, and the processing rate is more preferably set to 40% or more, preferably 60% or more. In addition, the increase in the processing rate deteriorates the bending workability, so it is preferably set to 99% or less.

(整飾熱處理步驟S06) (Finishing heat treatment step S06)

其次,對於藉由整飾加工步驟S05所得之塑性加工材,為了提高耐應力緩和特性及低溫燒鈍硬化,且為了去除殘留變形,而實施整飾熱處理。 Next, for the plastic processed material obtained in the finishing process step S05, finishing heat treatment is performed in order to improve the stress relaxation resistance and low-temperature burnt hardening, and to remove residual deformation.

熱處理溫度較好設為100℃以上800℃以下之範圍內,更好為200℃以上700℃以下之範圍內。又,該整飾熱處理步驟S06中,有必要以避免因再結晶而使強度大幅降低之方式,設定熱處理條件(溫度、時間、冷卻速度)。 The heat treatment temperature is preferably within a range of from 100°C to 800°C, more preferably within a range of from 200°C to 700°C. In addition, in this finishing heat treatment step S06, it is necessary to set the heat treatment conditions (temperature, time, cooling rate) in order to avoid a method of greatly reducing the strength due to recrystallization.

例如較好設為於300℃保持1秒至120秒左右。該熱處理較好於非氧化環境或還原性環境中進行。 For example, it is preferable to maintain at 300°C for about 1 second to 120 seconds. This heat treatment is preferably performed in a non-oxidizing environment or a reducing environment.

熱處理方法並未特別限定,但基於製造成本減低之效果,較好為利用連續燒鈍爐之短時間熱處理。 The heat treatment method is not particularly limited, but based on the effect of reducing the manufacturing cost, a short-time heat treatment using a continuous bake furnace is preferred.

再者,上述之整飾加工步驟S05及整飾熱處理步驟S06亦可重複實施。 Furthermore, the finishing step S05 and finishing heat treatment step S06 described above can also be repeated.

如此,製出本實施形態之電子.電氣機器用銅合金板條材(板材或將其作成線圈形狀之條材)。又,該電子.電氣機器用銅合金板條材之板厚設為超過0.05mm且3.0mm以下之範圍內,較好設為超過0.1mm且未達3.0mm之範圍內。電子.電氣機器用銅合金板條材之板厚為0.05mm以下時,不利於使用作為大電流用途之導體,板厚超過3.0mm時,難以壓製沖壓加工。 In this way, the electronics of this embodiment is produced. Copper alloy strips for electrical equipment (plates or strips made into coils). Also, the electronic. The thickness of the copper alloy sheet material for electrical equipment is set to be in the range of more than 0.05 mm and 3.0 mm or less, preferably in the range of more than 0.1 mm and less than 3.0 mm. electronic. When the thickness of the copper alloy sheet and strip for electrical equipment is less than 0.05mm, it is not conducive to use as a conductor for large current applications. When the thickness exceeds 3.0mm, it is difficult to press and press.

此處,本實施形態之電子.電氣機器用銅合金板條材可直接使用於電子.電氣機器用零件,但亦可於板面之一面或兩面上,形成膜厚0.1~100μm左右之Sn鍍敷層或Ag鍍敷層。此時,電子.電氣機器用銅合金板條材之板厚較好為鍍敷層厚之10~1000倍。 Here, the electronics of this embodiment. Copper alloy plates and strips for electrical equipment can be used directly in electronics. For electrical equipment parts, it is also possible to form a Sn plating layer or Ag plating layer with a film thickness of about 0.1-100μm on one or both sides of the board. At this time, electronic. The thickness of the copper alloy sheet and strip for electrical equipment is preferably 10 to 1000 times the thickness of the plating layer.

再者,藉由將本實施形態之電子.電氣機器用銅合金(電子.電氣機器用銅合金板條材)作為材料,實施沖壓加工或彎曲加工等,而可成形例如連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條之電子.電氣機器用零件。 Furthermore, by combining the electronics of this embodiment. Copper alloy for electrical equipment (copper alloy plate and strip for electronic and electrical equipment) is used as a material, which can be formed by pressing or bending, etc., and forming terminals such as connectors or press-fitting, movable pieces for relays, and lead frames , The electronics of the bus bar. Parts for electrical equipment.

依據如以上構成之本實施形態的電子.電氣 機器用銅合金,由於Mg含量設為0.15mass%以上、未達0.35mass%之範圍內,故藉由Mg於銅之母相中固熔,而不使導電率大幅降低,可提高強度、耐應力緩和特性。又,由於P設為0.0005mass%以上、未達0.01mass%之範圍內,故可使含Mg之銅合金熔浴黏度降低,而可提高鑄造性。 Based on the electronics of this embodiment constructed as above. electric For copper alloys for machinery, the Mg content is set to be above 0.15mass% but not within the range of 0.35mass%. Therefore, by solid melting of Mg in the mother phase of copper, the electrical conductivity can be improved and the strength and resistance can be improved. Stress relaxation characteristics. In addition, since P is set to be within the range of 0.0005 mass% or more and less than 0.01 mass%, the molten bath viscosity of the copper alloy containing Mg can be reduced, and the castability can be improved.

且,本實施形態之電子.電氣機器用銅合金中,由於導電率設為超過75%IACS,故亦可適用於要求高導電性之用途。 And, the electronics of this embodiment. In copper alloys for electrical equipment, since the conductivity is set to exceed 75% IACS, it can also be applied to applications requiring high conductivity.

而且,本實施形態之電子.電氣機器用銅合金中,由於於掃描型電子顯微鏡觀察中,粒徑0.1μm以上之含有Mg及P之化合物的平均個數設為0.5個/μm2以下,故於母相中,並未多數分散成為龜裂起點之粗大的含有Mg及P之化合物,而提高彎曲加工性。因此,可成形複雜形狀之連接器等之端子、中繼用可動片、導線架等之電子.電氣機器用零件。 Moreover, the electronics of this embodiment. In copper alloys for electrical equipment, the average number of compounds containing Mg and P with a particle size of 0.1μm or more is set to 0.5/μm 2 or less in the scanning electron microscope observation, so there are not many in the matrix Disperse the coarse Mg and P-containing compounds that become the starting point of cracks to improve bending workability. Therefore, it is possible to form complex-shaped connectors such as terminals, relay movable pieces, lead frames and other electronics. Parts for electrical equipment.

又,本實施形態之電子.電氣機器用銅合金中,由於Mg之含量[Mg](mass%)與P之含量[P](mass%)滿足[Mg]+20×[P]<0.5之關係式,故可抑制Mg及P之粗大化合物之生成,可抑制冷加工性及彎曲加工性降低。 Also, the electronics of this embodiment. In copper alloys for electrical equipment, since the content of Mg [Mg] (mass%) and the content of P [P] (mass%) satisfy the relational expression of [Mg]+20×[P]<0.5, it can suppress Mg and The formation of coarse compounds of P can suppress the decrease in cold workability and bending workability.

再者,本實施形態之電子.電氣機器用銅合金中,由於Mg之含量[Mg](mass%)與P之含量[P](mass%)滿足[Mg]/[P]≦400之關係式,故使鑄造性降低之Mg含量 與使鑄造性提高之P含量之比率適當化,藉由P之添加效果而可確實提高鑄造性。 Furthermore, the electronics of this embodiment. In copper alloys for electrical equipment, since the content of Mg [Mg] (mass%) and the content of P [P] (mass%) satisfy the relational expression of [Mg]/[P]≦400, Mg which reduces the castability content The ratio of the content of P to improve the castability is appropriate, and the castability can be reliably improved by the effect of adding P.

又,本實施形態之電子.電氣機器用銅合金中,由於0.2%耐力設為300MPa以上,殘留應力率於150℃、1000小時設為50%以上,故強度、耐應力緩和特性優異,特別適合作為連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條等之電子.電氣機器用零件之材料。 Also, the electronics of this embodiment. In the copper alloy for electrical equipment, the 0.2% endurance is set to 300 MPa or more, and the residual stress rate is set to 50% or more at 150°C and 1000 hours. Therefore, it has excellent strength and stress relaxation characteristics, and is particularly suitable for connectors or press-fitting. The terminal, relay movable piece, lead frame, bus bar and other electronics. Materials for parts of electrical machinery.

又,本實施形態之電子.電氣機器用銅合金板條材,由於係以上述之電子.電氣機器用銅合金構成,故藉由對該電子.電氣機器用銅合金板條材進行彎曲加工等,可製造連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條等之電子.電氣機器用零件。 Also, the electronics of this embodiment. Copper alloy plates and strips for electrical equipment are based on the above-mentioned electronics. The electrical equipment is made of copper alloy, so by the electronic. Copper alloy plates and strips for electrical equipment are used for bending processing, etc., and can be used to manufacture connectors or press-fit terminals, movable pieces for relays, lead frames, bus bars and other electronics. Parts for electrical equipment.

又,於表面形成Sn鍍敷層或Ag鍍敷層時,特別適合作為連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條等之電子.電氣機器用零件之材料。 In addition, when the Sn plating layer or Ag plating layer is formed on the surface, it is particularly suitable as a connector or press-fit terminal, a movable piece for relay, a lead frame, a bus bar, etc. Materials for parts of electrical machinery.

再者,本實施形態之電子.電氣機器用零件(連接器或壓入配合等之端子、中繼用可動片、導線架、匯流條等),由於係以上述之電子.電氣機器用銅合金構成,故即使小型化及薄片化亦可發揮優異特性。 Furthermore, the electronics of this embodiment. Parts for electrical equipment (connectors or press-fit terminals, movable pieces for relays, lead frames, bus bars, etc.) are based on the above-mentioned electronics. The electrical equipment is made of copper alloy, so even if it is miniaturized and thinned, it can exhibit excellent characteristics.

以上雖針對本發明實施形態之電子.電氣機器用銅合金、電子.電氣機器用銅合金板條材、電子.電氣機器用零件(端子、匯流條等)加以說明,但本發明不限定於該等,在不脫離本發明技術思想之範圍內可適當變 更。 Although the above is for the electronics of the embodiment of the present invention. Copper alloys for electrical equipment, electronics. Copper alloy sheet and strip for electrical equipment, electronics. Parts for electrical equipment (terminals, bus bars, etc.) are described, but the present invention is not limited to these, and can be appropriately changed without departing from the technical idea of the present invention more.

例如,上述實施形態係針對電子.電氣機器用銅合金之製造方法之一例加以說明,但電子.電氣機器用銅合金之製造方法不限於實施形態中記載者,亦可適當選擇既有製造方法製造。 For example, the above embodiment is aimed at electronics. An example of the manufacturing method of copper alloy for electrical equipment is explained, but electronic. The manufacturing method of the copper alloy for electrical equipment is not limited to those described in the embodiment, and an existing manufacturing method may be appropriately selected.

〔實施例〕 [Example]

以下,針對欲確認本發明效果而進行之確認實驗結果加以說明。 Hereinafter, the results of confirmation experiments performed to confirm the effects of the present invention will be described.

準備由純度99.99mass%以上之無氧銅(ASTM B152 C10100)所成銅原料,將其裝入高純度石墨坩鍋內,於設為Ar氣體環境之環境爐內進行高頻熔解。於所得銅熔浴內,添加各種添加元素調製為表1所示之成分組成,注液於鑄模中製出鑄塊。又,本發明例2、19、20係使用隔熱材(ISOWOOL)鑄模,本發明例21、22係使用碳鑄模,本發明例1、3~18、23~34、比較例1~3係使用具備水冷功能之銅合金鑄模,比較例4、5係使用具備加熱功能之附加熱器之鐵製鑄模作為鑄造用之鑄模。鑄塊大小設為厚約100mm×寬約150mm×長約300mm。 Prepare a copper raw material made of oxygen-free copper (ASTM B152 C10100) with a purity of 99.99 mass% or more, put it into a high-purity graphite crucible, and conduct high-frequency melting in an environmental furnace set in an Ar atmosphere. In the obtained copper molten bath, various additional elements are added to prepare the composition shown in Table 1, and the liquid is poured into the casting mold to form an ingot. In addition, examples 2, 19, and 20 of the present invention use heat insulating material (ISOWOOL) molds, examples 21 and 22 of the present invention use carbon molds, examples 1, 3 to 18, 23 to 34 of the present invention, and comparative examples 1 to 3 A copper alloy mold with water cooling function was used. Comparative Examples 4 and 5 used iron molds with a heater with heating function as casting molds. The size of the ingot is set to be about 100 mm thick × about 150 mm wide × about 300 mm long.

面研削該鑄塊之澆鑄表面附近,以成為最終製品板厚為0.5mm之方式,切出鑄塊並調整大小。 Surface grinding near the casting surface of the ingot, cut out the ingot and adjust the size so that the thickness of the final product is 0.5mm.

該塊體於Ar氣體環境中,以表2記載之溫度條件進行4小時加熱,進行均質化/熔體化處理。 The block was heated in an Ar gas atmosphere under the temperature conditions described in Table 2 for 4 hours to perform homogenization/melting treatment.

隨後,以表2記載之條件實施粗壓延後,使 用鹽浴以表2記載之溫度條件進行熱處理。 Subsequently, after rough rolling was performed under the conditions described in Table 2, the Heat treatment in a salt bath under the temperature conditions described in Table 2.

進行熱處理之銅材料,為了作成適於適當最終形狀而實施切斷,並且為了去除氧化被膜而實施表面研削。隨後於常溫以表2記載之壓延率實施整飾壓延(整飾加工),製出厚0.5mm、寬約150mm、長200mm之薄板。 The heat-treated copper material is cut in order to be suitable for the final shape, and the surface is ground to remove the oxide film. Subsequently, finishing rolling (finishing processing) was performed at room temperature at the rolling rate described in Table 2 to produce a thin plate with a thickness of 0.5 mm, a width of about 150 mm, and a length of 200 mm.

接著,於整飾壓延(整飾加工)後,以表2所示之條件,於Ar環境中實施整飾熱處理,隨後,進行水淬冷,作成特性評價用薄板。 Next, after finishing rolling (finishing processing), finishing heat treatment was performed in an Ar environment under the conditions shown in Table 2, and then water quenching was performed to produce a sheet for characteristic evaluation.

(鑄造性) (Castability)

作為鑄造性評價,觀察前述鑄造時有無表面粗糙。以目視幾乎完全未見到表面粗糙者記為A,發生深度未達1mm之小表面粗糙者記為B,發生深度1mm以上且未達2mm之表面粗糙者記為C。且發生深度2mm以上之大的表面粗糙者記為D,並於期間停止評價。評價結果示於表3。 As the castability evaluation, the presence or absence of surface roughness during the aforementioned casting was observed. If the surface roughness is almost completely unobserved by visual inspection, it is recorded as A, the small surface roughness with a depth of less than 1mm is recorded as B, and the surface roughness with a depth of 1mm or more and less than 2mm is recorded as C. And the surface roughness with a depth of 2mm or more was recorded as D, and the evaluation was stopped during the period. The evaluation results are shown in Table 3.

又,所謂表面粗糙深度係指自鑄塊端部朝向中央之表面粗糙深度。 In addition, the so-called surface roughness depth refers to the surface roughness depth from the end of the ingot toward the center.

(化合物觀察) (Compound Observation)

對於各試料之壓延面,進行鏡面研磨、離子蝕刻。為了確認含有Mg及P之化合物,使用FE-SEM(場射出型掃描電子顯微鏡),以1萬倍視野(約120μm2/視野)進行觀察。 The rolled surface of each sample was subjected to mirror polishing and ion etching. In order to confirm the compound containing Mg and P, an FE-SEM (field emission scanning electron microscope) was used to observe with a field of view of 10,000 times (approximately 120 μm 2 /field).

其次,為了調查含有Mg及P之化合物之密度(個/μm2),選擇1萬倍視野(約120μm2/視野),於該區域,以5萬倍連續進行10視野(約4.8μm2/視野)之拍攝。關於金屬間化合物之粒徑,係設為金屬間化合物之長徑(於期間與粒界不相切之條件下於粒內拉出最長直線之長度)與短徑(於與長徑直角相交之方向,於期間與粒界不相切之條件下拉出最長直線之長度)之平均值。接著,求出粒徑0.1μm以上之含有Mg及P之化合物與粒徑0.05μm以上之含有Mg及P之化合物之密度(個/μm2)。化合物之觀察結果之一例示於圖2A及圖2B。 Next, in order to investigate the density of the compound containing Mg and P (units/μm 2 ), a 10,000-fold field of view (approximately 120 μm 2 /field of view) was selected, and 10 fields of view (approximately 4.8 μm 2 / Field of view) shooting. Regarding the particle size of the intermetallic compound, it is set as the long axis (the length of the longest straight line drawn from the grain under the condition that the period is not tangent to the grain boundary) and the short axis (at the intersection with the long axis at right angles) of the intermetallic compound. Direction, the average value of the length of the longest straight line drawn during the period when the grain boundary is not tangent Next, the density (pieces/μm 2 ) of the compound containing Mg and P with a particle size of 0.1 μm or more and the compound containing Mg and P with a particle size of 0.05 μm or more was determined. An example of the observation results of the compound is shown in Figure 2A and Figure 2B.

(機械特性) (Mechanical characteristics)

自特性評價用條材採取由JIS Z 2241所規定之13B號試驗片,藉由JIS Z 2241之支距法(offset method),測定0.2%耐力。又,試驗片係於與壓延方向正交方向採取。評價結果示於表3。 For self-characteristic evaluation strips, a test piece No. 13B specified by JIS Z 2241 was taken, and 0.2% endurance was measured by the offset method of JIS Z 2241. In addition, the test piece was taken in a direction orthogonal to the rolling direction. The evaluation results are shown in Table 3.

(導電率) (Conductivity)

自特性評價用條材採取寬10mm×長150mm之試驗片,藉由4端子法求出電阻。且使用微米進行試驗片之尺寸測定,算出試驗片體積。接著,自所測定之電阻值與體積,算出導電率。又,試驗片係以其長度方向對於特定評價用條材之壓延方向垂直之方式採取。評價結果示於表3。 A test piece with a width of 10 mm × a length of 150 mm was taken from the strip for characteristic evaluation, and the resistance was determined by the 4-terminal method. And use micrometers to measure the size of the test piece, and calculate the volume of the test piece. Next, the conductivity is calculated from the measured resistance value and volume. In addition, the test piece was taken so that its length direction was perpendicular to the rolling direction of the specific evaluation strip. The evaluation results are shown in Table 3.

(耐應力緩和特性) (Resistance to stress relaxation characteristics)

耐應力緩和特性試驗係藉由根據日本伸銅協會技術標準JCBA-T309:2004之單端螺固式之方法負荷應力,測定於150℃之溫度保持1000小時後之殘留應力率。評價結果示於表3。 The stress relaxation characteristic test is to measure the residual stress rate after being kept at a temperature of 150℃ for 1000 hours by the method of load stress in accordance with the technical standard JCBA-T309:2004 of the Japan Copper Elongation Association. The evaluation results are shown in Table 3.

作為試驗方法,係自特性評價用條材於對於壓延方向正交之方向採取試驗片(寬10mm),以將試驗片之表面最大應力成為耐力之80%之方式,將初期撓曲位移設定為2mm,調整跨距長。以下式決定上述表面最大應力。 As a test method, a test piece (width 10mm) is taken from the strip for property evaluation in a direction orthogonal to the rolling direction, and the initial flexural displacement is set to be such that the maximum surface stress of the test piece becomes 80% of the endurance 2mm, adjust the span length. The following formula determines the maximum stress on the surface.

表面最大應力(MPa)=1.5Etδ0/Ls 2 Maximum surface stress (MPa)=1.5Etδ 0 /L s 2

惟, but,

E:楊氏模數(MPa) E: Young's modulus (MPa)

t:試料厚度(t=0.5mm) t: sample thickness (t=0.5mm)

δ0:初期撓曲位移(2mm) δ 0 : Initial deflection displacement (2mm)

Ls:跨距長(mm) L s :Span length (mm)

於150℃之溫度保持1000小時後之彎曲傾向後,測定殘留應力率,評價耐應力緩和特性。又使用下式算出殘留應力率。 After maintaining the bending tendency at a temperature of 150°C for 1000 hours, the residual stress ratio was measured to evaluate the stress relaxation resistance. The residual stress rate was calculated using the following formula.

殘留應力率(%)=(1-δt0)×100 Residual stress rate (%)=(1-δ t0 )×100

惟, but,

δt:於150℃之溫度保持1000小時後之永久撓曲位移(mm)-於常溫保持24小時後之永久撓曲位移(mm) δ t :Permanent flexural displacement after keeping at 150℃ for 1000 hours (mm)-Permanent flexural displacement after keeping at room temperature for 24 hours (mm)

δ0:初期撓曲位移(mm) δ 0 : Initial deflection displacement (mm)

(彎曲加工性) (Bending workability)

根據日本伸銅協會技術標準JCBA-T307:2007之4試驗方法進行彎曲加工。以彎曲軸對於壓延方向成為正交方向之方式,自特性評價用薄板採取複數片寬10mm×長30mm之試驗片,使用彎曲角度為90度,且彎曲半徑於整飾壓延率超過85%時為0.5mm(R/t=1.0),於整飾壓延率為85%以下時彎曲半徑為0.3mm(R/t=0.6)之W型治具,進行W彎曲試驗。 Bending is carried out according to the 4 test method of the Japanese Copper Drawing Association technical standard JCBA-T307: 2007. With the bending axis being orthogonal to the rolling direction, a plurality of test pieces of 10mm wide×30mm long are used for the self-characteristic evaluation sheet, the bending angle is 90 degrees, and the bending radius is when the finishing rolling rate exceeds 85% 0.5mm (R/t=1.0), W-shaped fixture with a bending radius of 0.3mm (R/t=0.6) when the finishing rolling rate is less than 85%, perform W bending test

以目視觀察彎曲部之外周部觀察到龜裂時記為「C」,觀察到較大皺褶時記為B,未見到斷裂或微細龜裂、較大皺褶時記為A進行判定。又,A及B係判斷為可容許之彎曲加工性。評價結果示於表3。 When a crack is observed on the outer periphery of the curved part by visual observation, it is recorded as "C", when a large wrinkle is observed, it is recorded as B, and when no fracture or fine cracks or large wrinkles are seen, it is recorded as A for judgment. In addition, A and B are judged to be allowable bending workability. The evaluation results are shown in Table 3.

Figure 106110851-A0202-12-0027-1
Figure 106110851-A0202-12-0027-1

Figure 106110851-A0202-12-0028-2
Figure 106110851-A0202-12-0028-2

Figure 106110851-A0202-12-0029-3
Figure 106110851-A0202-12-0029-3

比較例1係Mg含量少於本發明範圍(0.15mass%以上、未達0.35mass%之範圍),耐力及耐應力緩和特性不充分。 In Comparative Example 1, the Mg content is less than the range of the present invention (0.15 mass% or more and less than 0.35 mass%), and the endurance and stress relaxation properties are insufficient.

比較例2係Mg含量多於本發明範圍(0.15mass%以上、未達0.35mass%之範圍),導電率低。 In Comparative Example 2, the Mg content is more than the range of the present invention (0.15 mass% or more and less than 0.35 mass%), and the conductivity is low.

比較例3係P含量多於本發明範圍(0.0005mass%以上、未達0.01mass%之範圍),於中間壓延發生龜裂,無法評價。 In Comparative Example 3, the P content was more than the range of the present invention (0.0005 mass% or more and less than 0.01 mass%), cracks occurred during the intermediate rolling and could not be evaluated.

比較例4、5係Mg及P含量較多,且鑄造時之冷卻速度慢,故化合物多,彎曲加工性差。 In Comparative Examples 4 and 5, the Mg and P contents were large, and the cooling rate during casting was slow, so there were many compounds and poor bending workability.

相對於此,本發明例中,確認鑄造性、強度(0.2%耐力)、導電率、耐應力緩和特性(殘留應力率)、彎曲加工性優異。基於以上,確認依據本發明例,可提供導電性、彎曲加工性優異之電子.電氣機器用銅合金、電子.電氣機器用銅合金板條材。 In contrast, in the examples of the present invention, it was confirmed that the castability, strength (0.2% endurance), electrical conductivity, stress relaxation resistance (residual stress ratio), and bending workability were excellent. Based on the above, it is confirmed that according to the example of the present invention, it is possible to provide electronics with excellent conductivity and bending workability. Copper alloys for electrical equipment, electronics. Copper alloy plates and strips for electrical machines.

〔產業上之可利用性〕 〔Industrial availability〕

本發明提供即使使用於伴隨小型化而薄片化之構件時,亦具備優異導電性及彎曲加工性之電子.電氣機器用銅合金、電子.電氣機器用銅合金板條材、電子.電氣機器用零件、端子、匯流條、及中繼用可動片。 The present invention provides electronics with excellent electrical conductivity and bending workability even when used in components that are thinned with miniaturization. Copper alloys for electrical equipment, electronics. Copper alloy sheet and strip for electrical equipment, electronics. Parts for electrical equipment, terminals, bus bars, and movable pieces for relays.

Claims (15)

一種電子電氣機器用銅合金,其特徵為以0.15mass%以上、未達0.35mass%之範圍內含有Mg,以0.0005mass%以上、未達0.01mass%之範圍內含有P,其餘部分由Cu及不可避免雜質所成,且導電率超過75%IACS,並且於掃描型電子顯微鏡觀察中,粒徑0.1μm以上之含有Mg及P之化合物的平均個數為0.5個/μm2以下。 A copper alloy for electronic and electrical equipment, which is characterized by containing Mg in the range of 0.15 mass% or more and less than 0.35 mass%, and P in the range of 0.0005 mass% or more and less than 0.01 mass%, and the remaining part is made of Cu and Impurities are unavoidable, and the conductivity exceeds 75% IACS, and in scanning electron microscope observation, the average number of compounds containing Mg and P with a particle size of 0.1μm or more is 0.5/μm 2 or less. 如請求項1之電子電氣機器用銅合金,其中Mg之含量[Mg](mass%)與P之含量[P](mass%)滿足下述之關係式:[Mg]+20×[P]<0.5。 For example, the copper alloy for electrical and electronic equipment in claim 1, where the content of Mg [Mg] (mass%) and the content of P [P] (mass%) satisfy the following relationship: [Mg]+20×[P] <0.5. 如請求項1或2之電子電氣機器用銅合金,其中Mg之含量[Mg](mass%)與P之含量[P](mass%)滿足下述之關係式:[Mg]/[P]≦400。 For example, the copper alloy for electrical and electronic equipment in claim 1 or 2, where the content of Mg [Mg] (mass%) and the content of P [P] (mass%) satisfy the following relationship: [Mg]/[P] ≦400. 如請求項1或2之電子電氣機器用銅合金,其中於對於壓延方向正交之方向進行拉伸試驗時之0.2%耐力為300MPa以上。 Such as claim 1 or 2 of the copper alloy for electrical and electronic equipment, wherein the 0.2% endurance is 300 MPa or more when the tensile test is carried out in the direction orthogonal to the rolling direction. 如請求項1或2之電子電氣機器用銅合金,其中殘留應力率於150℃、1000小時為50%以上。 Such as claim 1 or 2 of the copper alloy for electrical and electronic equipment, in which the residual stress rate is 50% or more at 150°C for 1000 hours. 一種電子電氣機器用銅合金板條材,其特徵係由如請求項1至5中任一項之電子電氣機器用銅合金所成。 A copper alloy plate and strip for electrical and electronic equipment, characterized by being made of the copper alloy for electrical and electronic equipment as claimed in any one of claims 1 to 5. 如請求項6之電子電氣機器用銅合金板條材,其 表面具有Sn鍍敷層或Ag鍍敷層。 For example, the copper alloy plate and strip for electronic and electrical equipment in claim 6, which The surface has a Sn plating layer or Ag plating layer. 一種電子電氣機器用零件,其特徵係由如請求項6或7之電子電氣機器用銅合金板條材所成。 A part for electrical and electronic equipment, characterized by being made of copper alloy plates and strips for electrical and electronic equipment as in Claim 6 or 7. 如請求項8之電子電氣機器用零件,其表面具有Sn鍍敷層或Ag鍍敷層。 For example, the electronic and electrical equipment parts of claim 8 have Sn plating layer or Ag plating layer on the surface. 一種端子,其特徵係由如請求項6或7之電子電氣機器用銅合金板條材所成。 A terminal characterized by being made of copper alloy strips for electrical and electronic equipment as in Claim 6 or 7. 如請求項10之端子,其表面具有Sn鍍敷層或Ag鍍敷層。 For example, the terminal of claim 10 has a Sn plating layer or Ag plating layer on its surface. 一種匯流條,其特徵係由如請求項6或7之電子電氣機器用銅合金板條材所成。 A bus bar characterized by being made of copper alloy plates and strips for electrical and electronic equipment as in Claim 6 or 7. 如請求項12之匯流條,其表面具有Sn鍍敷層或Ag鍍敷層。 For example, the bus bar of claim 12 has a Sn plating layer or Ag plating layer on its surface. 一種中繼用可動片,其特徵係由如請求項6或7之電子電氣機器用銅合金板條材所成。 A movable piece for relay, which is characterized by being made of copper alloy plates and strips for electrical and electronic equipment as in claim 6 or 7. 如請求項14之中繼用可動片,其表面具有Sn鍍敷層或Ag鍍敷層。 For example, the movable piece for relay of claim 14 has a Sn plating layer or Ag plating layer on its surface.
TW106110851A 2016-03-30 2017-03-30 Copper alloy for electronic/electric device, copper alloy sheet or strip for electronic/electric device, component for electronic/electric device, terminal, bus bar, and movable piece for relay TWI703225B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2016069080 2016-03-30
JP2016-069080 2016-03-30
JP2017063418A JP6226098B2 (en) 2016-03-30 2017-03-28 Copper alloy for electronic and electrical equipment, copper alloy sheet material for electronic and electrical equipment, electronic and electrical equipment parts, terminals, bus bars, and movable pieces for relays
JP2017-063418 2017-03-28

Publications (2)

Publication Number Publication Date
TW201738394A TW201738394A (en) 2017-11-01
TWI703225B true TWI703225B (en) 2020-09-01

Family

ID=60043970

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106110851A TWI703225B (en) 2016-03-30 2017-03-30 Copper alloy for electronic/electric device, copper alloy sheet or strip for electronic/electric device, component for electronic/electric device, terminal, bus bar, and movable piece for relay

Country Status (6)

Country Link
EP (1) EP3438298B1 (en)
JP (1) JP6226098B2 (en)
KR (1) KR102296652B1 (en)
CN (1) CN108431257B (en)
MX (1) MX2018011658A (en)
TW (1) TWI703225B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11319615B2 (en) 2016-03-30 2022-05-03 Mitsubishi Materials Corporation Copper alloy for electronic and electrical equipment, copper alloy plate strip for electronic and electrical equipment, component for electronic and electrical equipment, terminal, busbar, and movable piece for relay
US11203806B2 (en) 2016-03-30 2021-12-21 Mitsubishi Materials Corporation Copper alloy for electronic and electrical equipment, copper alloy plate strip for electronic and electrical equipment, component for electronic and electrical equipment, terminal, busbar, and movable piece for relay
JP6780187B2 (en) 2018-03-30 2020-11-04 三菱マテリアル株式会社 Copper alloys for electronic / electrical equipment, copper alloy strips for electronic / electrical equipment, parts for electronic / electrical equipment, terminals, and busbars
JP7180102B2 (en) * 2018-03-30 2022-11-30 三菱マテリアル株式会社 Copper alloys for electronic and electrical equipment, copper alloy sheet materials for electronic and electrical equipment, parts for electronic and electrical equipment, terminals and bus bars
US11104977B2 (en) 2018-03-30 2021-08-31 Mitsubishi Materials Corporation Copper alloy for electronic/electric device, copper alloy sheet/strip material for electronic/electric device, component for electronic/electric device, terminal, and busbar
JP7180101B2 (en) * 2018-03-30 2022-11-30 三菱マテリアル株式会社 Copper alloys for electronic and electrical equipment, copper alloy sheet materials for electronic and electrical equipment, parts for electronic and electrical equipment, terminals and bus bars
MX2021007760A (en) 2018-12-26 2021-08-05 Mitsubishi Materials Corp Copper alloy plate, plating film-attached copper alloy plate, and methods respectively for manufacturing these products.
CN110172609A (en) * 2019-05-16 2019-08-27 红河学院 A kind of high-strength high-conductivity copper magnesium system alloy and preparation method thereof
JP7443737B2 (en) * 2019-12-10 2024-03-06 三菱マテリアル株式会社 Copper alloy plate, copper alloy plate with plating film, and manufacturing method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201518517A (en) * 2013-08-30 2015-05-16 Dowa Metaltech Co Ltd Cuppor alloy plate and method for producing the same and conductive parts
CN105369050A (en) * 2009-12-23 2016-03-02 三菱伸铜株式会社 Cu-Mg-P based copper alloy material and method of producing the same

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3778318A (en) * 1969-02-24 1973-12-11 Cooper Range Co Copper base composition
JPS5045783Y2 (en) 1971-08-06 1975-12-25
JPS58199835A (en) * 1982-05-19 1983-11-21 Sumitomo Electric Ind Ltd Copper alloy for electric or electronic apparatus
JP2661462B2 (en) * 1992-05-01 1997-10-08 三菱伸銅株式会社 Straight line excellent in repeated bending property: Cu alloy ultrafine wire of 0.1 mm or less
JP4333881B2 (en) * 2003-09-24 2009-09-16 株式会社マテリアルソルーション Continuous casting mold and copper alloy continuous casting method
JP5848169B2 (en) * 2012-03-14 2016-01-27 Dowaメタルテック株式会社 Silver plating material
WO2013150627A1 (en) * 2012-04-04 2013-10-10 三菱伸銅株式会社 Cu-mg-p-based copper alloy plate having excellent fatigue resistance, and method for manufacturing same
JP5908796B2 (en) * 2012-06-05 2016-04-26 三菱伸銅株式会社 Cu-Mg-P-based copper alloy plate excellent in mechanical formability and method for producing the same
JP6054085B2 (en) * 2012-07-24 2016-12-27 三菱伸銅株式会社 Cu-Mg-P-based copper alloy sheet excellent in spring limit value characteristics and fatigue resistance after bending and method for producing the same
JP6055242B2 (en) * 2012-08-30 2016-12-27 三菱伸銅株式会社 Cu-Mg-P-based copper alloy Sn plated plate and method for producing the same
JP6076724B2 (en) 2012-12-06 2017-02-08 古河電気工業株式会社 Copper alloy material and method for producing the same
JP5962707B2 (en) * 2013-07-31 2016-08-03 三菱マテリアル株式会社 Copper alloy for electronic / electric equipment, copper alloy plastic working material for electronic / electric equipment, manufacturing method of copper alloy plastic working material for electronic / electric equipment, electronic / electric equipment parts and terminals
JP5847787B2 (en) * 2013-11-26 2016-01-27 Jx日鉱日石金属株式会社 Copper alloy sheet with excellent conductivity and stress relaxation properties
JP6187629B1 (en) * 2016-03-30 2017-08-30 三菱マテリアル株式会社 Copper alloy for electronic and electric equipment, copper alloy plastic working material for electronic and electric equipment, parts for electronic and electric equipment, terminals, and bus bars

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105369050A (en) * 2009-12-23 2016-03-02 三菱伸铜株式会社 Cu-Mg-P based copper alloy material and method of producing the same
TW201518517A (en) * 2013-08-30 2015-05-16 Dowa Metaltech Co Ltd Cuppor alloy plate and method for producing the same and conductive parts

Also Published As

Publication number Publication date
JP6226098B2 (en) 2017-11-08
TW201738394A (en) 2017-11-01
EP3438298A4 (en) 2019-12-11
MX2018011658A (en) 2018-12-19
KR20180125449A (en) 2018-11-23
EP3438298B1 (en) 2021-03-17
JP2017186664A (en) 2017-10-12
CN108431257A (en) 2018-08-21
KR102296652B1 (en) 2021-08-31
CN108431257B (en) 2020-07-28
EP3438298A1 (en) 2019-02-06

Similar Documents

Publication Publication Date Title
TWI703225B (en) Copper alloy for electronic/electric device, copper alloy sheet or strip for electronic/electric device, component for electronic/electric device, terminal, bus bar, and movable piece for relay
TWI709651B (en) Copper alloy for electronic/electric device, copper alloy sheet or strip for electronic/electric device, component for electronic/electric device, terminal, bus bar, and movable piece for relay
WO2017170699A1 (en) Copper alloy for electronic and electrical equipment, copper alloy plate strip for electronic and electrical equipment, component for electronic and electrical equipment, terminal, busbar, and movable piece for relays
TWI665318B (en) Copper alloy for electronic and electric device, plastically-worked copper alloy material for electronic and electric device, electronic and electric device, terminal and bus bar
CN103502487B (en) The manufacture method of copper alloy for electronic apparatus, copper alloy for electronic apparatus, copper alloy for electronic apparatus plastic working material and electronics assembly
EP2952595B1 (en) Copper alloy and material rolled thereof for electronic device and method for producing this alloy
WO2011142428A1 (en) Copper alloy for electronic device, method for producing copper alloy for electronic device, and copper alloy rolled material for electronic device
CN103842551B (en) The manufacture method of copper alloy for electronic apparatus, copper alloy for electronic apparatus, copper alloy for electronic apparatus stocking and electronics assembly
WO2012073777A1 (en) Copper alloy for electronic devices, method for producing copper alloy for electronic devices, and copper alloy rolled material for electronic devices
JP5910790B1 (en) Copper alloy for electronic and electric equipment, copper alloy plastic working material for electronic and electric equipment, parts for electronic and electric equipment, terminals, and bus bars
TWI701351B (en) Copper alloy for electronic and electric device, plastically-worked copper alloy material for electronic and electric device, electronic and electric device, terminal and bus bar
TWI740842B (en) Copper alloy for electronic and electric device, plastically-worked copper alloy material for electronic and electric device, electronic and electric device, terminal and bus bar
JP6680042B2 (en) Copper alloys for electronic / electrical devices, plastic alloys for electronic / electrical devices, parts for electronic / electrical devices, terminals, and bus bars
JP6187629B1 (en) Copper alloy for electronic and electric equipment, copper alloy plastic working material for electronic and electric equipment, parts for electronic and electric equipment, terminals, and bus bars
WO2015087624A1 (en) Copper alloy for electronic/electric device, copper alloy plastic working material for electronic/electric device, and component and terminal for electronic/electric device
JP2014111810A (en) Copper alloy, copper alloy plastic processing material, component and terminal, for electronic and electrical equipment
JP6248386B2 (en) Copper alloys for electronic and electrical equipment, electronic and electrical equipment parts and terminals