TWI700530B - Method for protecting camera hole - Google Patents

Method for protecting camera hole Download PDF

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TWI700530B
TWI700530B TW108118546A TW108118546A TWI700530B TW I700530 B TWI700530 B TW I700530B TW 108118546 A TW108118546 A TW 108118546A TW 108118546 A TW108118546 A TW 108118546A TW I700530 B TWI700530 B TW I700530B
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lens hole
color filter
thin film
film transistor
filter substrate
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TW108118546A
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Chinese (zh)
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TW202043868A (en
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陳煒杰
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大陸商業成科技(成都)有限公司
大陸商業成光電(深圳)有限公司
英特盛科技股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1341Filling or closing of cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1341Filling or closing of cells
    • G02F1/13415Drop filling process

Abstract

This invention provides to a method for protecting a camera hole. A sealing layer is applied on a periphery of each camera hole unit on a color filter substrate. An ultraviolet film is coated on the sealing layer, and the ultraviolet film is located above the camera hole of the camera hole unit. A thin film transistor substrate is correspondingly covered on the color filter substrate. A drilling area which is corresponding to the camera hole is drilled in a drilling area of the thin film transistor substrate. After drilling, the scraps of the thin film transistor substrate dropped on the color filter substrate are cleaned. Finally, the ultraviolet film is removed. The problem that the camera hole is stained and scratched is effectively solved, and then the subsequent anti-reflection film can be attached to the camera.

Description

鏡頭孔的防護方法How to protect the lens hole

本發明係有關一種鏡頭孔的防護方法,指一種利用塗佈及移除UV膠膜製程來防護鏡頭孔髒污及刮傷之技術領域。The present invention relates to a method for protecting a lens hole, and refers to a technical field of protecting the lens hole from dirt and scratches by coating and removing UV glue film.

按,在科技迅速發展趨勢中,筆記型電腦滿足了人類對「移動性」資訊的需求,加上筆記型電腦在可攜性設計、效能、及週邊和軟體的附加價值逐漸提昇的情況下,相較於桌上型PC其功能價格比的差距已逐漸縮小。此外,筆記型電腦以附加無線傳輸功能、CD-RW和PC-Camera等硬體產品及軟體的加值應用,把筆記型電腦從傳統資訊產品的角色、逐漸提昇成資訊家電產品的整合應用平台,對消費者的吸引力亦逐漸提昇。According to the rapid development trend of technology, notebook computers have met human needs for "mobile" information. In addition, notebook computers have gradually increased their portability design, performance, and the added value of peripherals and software. Compared with desktop PCs, the gap in the price-to-feature ratio has gradually narrowed. In addition, notebook computers with additional wireless transmission functions, CD-RW and PC-Camera and other hardware products and software value-added applications have gradually upgraded the notebook computer from the role of traditional information products to an integrated application platform for information home appliances. , The attractiveness to consumers has gradually increased.

續就,在筆記型電腦的普及率逐漸提昇後,使用視訊通訊方式也相當普及,NB Camera使用多以視訊需求為主。其中,於NB Camera AR Film貼合的製程中,需將對應鏡頭孔位置的TFT玻璃基板部分鑽取出來,之後再進行AR Film的貼合。然而,在TFT玻璃基板鑽取過程中,TFT玻璃基板表層的保護層碎屑會掉落至CF基板表面及鏡頭孔中,並沾黏在鏡頭孔內表面,由於不容易清潔鏡頭孔而導致有髒污問題;此外,TFT玻璃基板鑽取過程中所產生的玻璃碎屑掉落至CF基板表面及鏡頭孔中,也會在清潔過程中造成鏡頭孔的刮傷問題。因此,如何解決製程中鏡頭孔的髒污及刮傷問題是亟待解決的問題。Continuing, after the penetration rate of notebook computers has gradually increased, the use of video communication methods is also quite popular, and the use of NB Camera is mostly based on video requirements. Among them, in the NB Camera AR Film bonding process, the part of the TFT glass substrate corresponding to the lens hole position needs to be drilled out, and then the AR Film is bonded. However, during the drilling process of the TFT glass substrate, the debris of the protective layer on the surface of the TFT glass substrate will fall to the surface of the CF substrate and the lens hole, and stick to the inner surface of the lens hole. It is difficult to clean the lens hole. Dirty problem; in addition, the glass debris generated during the drilling of the TFT glass substrate falls onto the surface of the CF substrate and the lens hole, which will also cause the lens hole to be scratched during the cleaning process. Therefore, how to solve the problem of dirt and scratches of the lens hole in the manufacturing process is an urgent problem to be solved.

有鑑於此,本發明遂針對上述先前技術之缺失,提出一種鏡頭孔的防護方法,以有效克服上述之該等問題。In view of this, the present invention addresses the above-mentioned shortcomings of the prior art and proposes a lens hole protection method to effectively overcome the above-mentioned problems.

本發明之主要目的在提供一種鏡頭孔的防護方法,其在大量製作鏡頭孔單元中利用點膠方式塗佈UV膠膜及固化製程以作為鏡頭孔的防護,在鑽孔過程中能有效避免碎屑掉落於鏡頭孔中而造成髒污難以清理問題,更甚者產生刮傷的不良率問題,於鑽孔後僅需過簡單的清洗作業就可以移除UV膠膜,便於進行下一製程流程,實能達到鏡頭孔的防護功效。The main purpose of the present invention is to provide a method for protecting the lens hole, which uses the dispensing method to coat the UV film and the curing process in the mass production of the lens hole unit to protect the lens hole, which can effectively avoid chipping during the drilling process. Swarf falls in the lens hole and causes the problem of dirt and difficulty in cleaning, and even worse, the problem of defective rate of scratches. After drilling, the UV film can be removed after a simple cleaning operation, which is convenient for the next process The process can actually achieve the protective effect of the lens hole.

為達以上之目的,本發明提供一種鏡頭孔的防護方法,其應用一電子裝置的鏡頭模組,鏡頭孔的防護方法包括下列步驟:提供一彩色濾光片基板,其上具有複數個鏡頭孔單元;於每一鏡頭孔單元的周緣塗佈一密封層;於密封層上點塗佈一紫外線膠膜,且位於鏡頭孔單元的鏡頭孔上方;將一薄膜電晶體基板對應覆蓋於彩色濾光片基板上;於薄膜電晶體基板之一鑽孔區域進行鑽孔,鑽孔區域係對應鏡頭孔上方;清洗薄膜電晶體基板於鑽孔後掉落於彩色濾光片基板上的碎屑;以及移除紫外線膠膜,最後再貼附一抗反射膜於鏡頭孔上方,即可完成無髒污及刮傷的鏡頭孔防護效果。To achieve the above objectives, the present invention provides a method for protecting a lens hole, which uses a lens module of an electronic device. The method for protecting the lens hole includes the following steps: providing a color filter substrate with a plurality of lens holes Unit; Coat a sealing layer on the periphery of each lens hole unit; Dot coat a UV adhesive film on the sealing layer, and is located above the lens hole of the lens hole unit; Cover a thin film transistor substrate corresponding to the color filter On the chip substrate; drill holes in one of the drilling areas of the thin film transistor substrate, the drilling area corresponding to the lens hole; cleaning the thin film transistor substrate after drilling the debris on the color filter substrate; and Remove the UV film, and finally attach an anti-reflection film on the top of the lens hole to complete the lens hole protection without dirt and scratches.

其中,薄膜電晶體基板上更沈積一保護層,其位於薄膜電晶體基板與彩色濾光片基板之間,保護層係為多元氯化鋁(Poly Aluminium Chloride, PAC)。Among them, a protective layer is deposited on the thin film transistor substrate, which is located between the thin film transistor substrate and the color filter substrate, and the protective layer is Poly Aluminium Chloride (PAC).

其中,於塗佈紫外線膠膜的步驟之後,更包含一液晶滴入於彩色濾光片基板的步驟。Among them, after the step of coating the ultraviolet adhesive film, a step of dropping a liquid crystal onto the color filter substrate is further included.

其中,於薄膜電晶體基板對應覆蓋於彩色濾光片基板上的步驟之後,更包含一紫外線固化步驟。Wherein, after the step of covering the color filter substrate with the thin film transistor substrate, an ultraviolet curing step is further included.

其中,於移除紫外線膠膜的步驟之後,更包括貼附一抗反射膜於鏡頭孔上方的步驟。Wherein, after the step of removing the ultraviolet glue film, it further includes a step of attaching an anti-reflection film above the lens hole.

其中,彩色濾光片基板上更包含複數個支撐元件,其位於該彩色濾光片基板之一遮光層上,此些支撐元件係作為薄膜電晶體基板與彩色濾光片基板之間的支撐作用,能夠避免在薄膜電晶體基板鑽孔時,所掉落的基板區塊刮傷遮光層。Among them, the color filter substrate further includes a plurality of supporting elements, which are located on a light-shielding layer of the color filter substrate, and these supporting elements serve as a support between the thin film transistor substrate and the color filter substrate , It can avoid scratching the light shielding layer by the dropped substrate block when drilling the thin film transistor substrate.

其中,薄膜電晶體基板之鑽孔區域係利用一鑽頭進行鑽孔形成一開孔。Wherein, the drilling area of the thin film transistor substrate is drilled with a drill bit to form an opening.

其中,紫外線膠膜係為紫外線硬化膠膜或紫外線水解膠膜。Among them, the ultraviolet film is an ultraviolet curing film or an ultraviolet hydrolyzing film.

以上所述僅能用以闡述本發明所欲解決的問題、解決問題的技術手段、及其產生的功效等等,本發明之具體細節將在下文的實施方式及相關圖式中詳細介紹。The above description can only be used to illustrate the problem to be solved by the present invention, the technical means to solve the problem, and the effects produced by it, etc. The specific details of the present invention will be described in detail in the following embodiments and related drawings.

本發明乃亟思加以改良創新,並經多年苦心孤詣潛心研究後,研發出一種鏡頭孔的防護方法,能夠突破現有鏡頭孔於貼合抗反射膜的製程中的所造成髒污及刮傷等瓶頸。以下將以圖式揭露本發明之複數個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明,也就是說,在本發明的實施方式中,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。The present invention is eager to improve and innovate, and after years of painstaking research, a lens hole protection method has been developed, which can break through the bottlenecks such as dirt and scratches caused by the existing lens hole in the process of laminating anti-reflection film. . Hereinafter, multiple embodiments of the present invention will be disclosed in the form of drawings. For clear description, many practical details will be described in the following description. However, it should be understood that these practical details should not be used to limit the present invention. That is to say, in the embodiments of the present invention, some conventionally used structures and elements will be shown in a simple schematic manner in the drawings. It.

請參閱第1圖,為本發明之步驟流程圖。鏡頭孔的防護方法係應用一電子裝置的鏡頭模組,請同時參閱第2A圖至2D圖,為本發明的製作步驟流程圖。鏡頭孔的防護方法包括下列步驟:如步驟S10,提供一彩色濾光片基板10,其上具有複數個鏡頭孔單元102,如第2A圖所示。彩色濾光片基板10是彩色液晶顯示器(LCD)由灰階變為彩色的關鍵零組件,藉由LCD內部的背光模組提供光源,再搭配驅動IC與液晶控制形成灰階顯示,將光源穿過彩色濾光片的光阻彩色層形成彩色顯示畫面。而彩色濾光片(Color Filter)基本結構是由玻璃基板(Glass Substrate)、遮光層(Black Matrix)、彩色層(Color Layer)、保護層(Over Coat)及ITO導電膜所組成,由於彩色濾光片基板10的組成結構已為現有通用技術,故在此不多贅述。彩色濾光片基板的製造方法有十多種,較常用的技術有顏料分散法、染色法、印刷法及電著法,其中以顏料分散法因具備高信賴性、高解析度、及耐高溫特性,廣為業者採用,當然,可視實際的設計需求做適當的變化,故本發明不以此為限。Please refer to Figure 1, which is a flowchart of the steps of the present invention. The method for protecting the lens hole is to use a lens module of an electronic device. Please also refer to FIGS. 2A to 2D, which are a flow chart of the manufacturing steps of the present invention. The method for protecting the lens hole includes the following steps: in step S10, a color filter substrate 10 is provided with a plurality of lens hole units 102 thereon, as shown in FIG. 2A. The color filter substrate 10 is a key component for the color liquid crystal display (LCD) to change from gray to color. The backlight module inside the LCD provides the light source, and the driver IC and liquid crystal control are used to form a gray scale display. The photoresist color layer of the color filter forms a color display screen. The basic structure of the color filter (Color Filter) is composed of a glass substrate (Glass Substrate), a black matrix (Black Matrix), a color layer (Color Layer), a protective layer (Over Coat) and an ITO conductive film. The composition structure of the optical sheet substrate 10 has been the existing general technology, so it will not be repeated here. There are more than ten manufacturing methods for color filter substrates. The more commonly used technologies include pigment dispersion, dyeing, printing, and electrical writing. The pigment dispersion method has high reliability, high resolution, and high temperature resistance. The characteristics are widely adopted by the industry. Of course, it can be changed appropriately according to actual design requirements, so the present invention is not limited to this.

接續步驟S12,於每一鏡頭孔單元102的周緣塗佈一密封層(sealant)12;再如步驟S14,於密封層12上點塗佈一紫外線膠膜14,如第2B圖所示,紫外線膠膜14係為紫外線硬化膠膜或紫外線水解膠膜,且紫外線膠膜14位於鏡頭孔單元102的鏡頭孔上方(容後詳述)。紫外線水解膠膜(又稱UV水解膠)可在水中解膠的光硬化樹脂,為高吸水率的材料,具有優異的柔韌性,耐黃變、固化速度快、與玻璃附著性良好、不斷膠、不殘留餘膠、保持玻璃原片的光潔性,對玻璃加工前後帶來極大的保護便利,對玻璃基材無腐蝕,因此本發明在此以應用紫外線水解膠膜為例,作為鏡頭孔製程過程中的臨時性保護作用,當然,在此不侷限於所使用紫外線膠膜14的材質。Following step S12, a sealant 12 is coated on the periphery of each lens hole unit 102; then, in step S14, a UV adhesive film 14 is dot-coated on the sealing layer 12, as shown in Figure 2B, The adhesive film 14 is an ultraviolet curing adhesive film or an ultraviolet hydrolyzable adhesive film, and the ultraviolet adhesive film 14 is located above the lens hole of the lens hole unit 102 (detailed later). Ultraviolet hydrolyzable adhesive film (also known as UV hydrolyzed adhesive) is a light-hardening resin that can dissolve in water. It is a material with high water absorption. It has excellent flexibility, yellowing resistance, fast curing speed, good adhesion to glass, and continuous glue. , No residual glue, maintain the smoothness of the original glass, bring great protection to the glass before and after processing, and no corrosion to the glass substrate, so the present invention takes the application of ultraviolet hydrolyzable film as an example here as the lens hole manufacturing process The temporary protection during the process, of course, is not limited to the material of the ultraviolet film 14 used here.

如步驟S16,將液晶16滴入於彩色濾光片基板10上,也就是ODE(one-drop filling process) 製程,如第2C圖所示。再如步驟S18,將一薄膜電晶體基板18對應覆蓋於彩色濾光片基板10上,如第2D圖所示。以TFT-LCD面板的製程而言,薄膜電晶體基板18與彩色濾光片基板10中間是夾著一層液晶16,每一鏡頭孔單元102的周緣塗佈一密封層12也就是將液晶16密封於內。當電流通過電晶體產生電場變化,造成液晶分子偏轉,藉以改變光線的偏極性,再利用偏光片決定畫素的明暗狀態;此外,彩色濾光片基板10形成每個畫素各包含紅、藍、綠三顏色,這些發出紅、藍、綠色彩的畫素便構成了面板上的影像畫面。換句話說,薄膜電晶體基板18能夠呈現彩色的影像就是靠彩色濾光片基板10,背光源透過液晶16及驅動IC的控制形成灰階光源,而彩色濾光片基板10上塗佈著紅、綠、藍三色彩色光阻,光源再通過彩色濾光片即形成紅、綠、藍色光,最後在人眼中混合形成彩色影像。In step S16, the liquid crystal 16 is dropped on the color filter substrate 10, which is an ODE (one-drop filling process) process, as shown in FIG. 2C. In step S18, a thin film transistor substrate 18 is correspondingly covered on the color filter substrate 10, as shown in FIG. 2D. In terms of the TFT-LCD panel manufacturing process, a layer of liquid crystal 16 is sandwiched between the thin film transistor substrate 18 and the color filter substrate 10, and the periphery of each lens hole unit 102 is coated with a sealing layer 12, which seals the liquid crystal 16 Within. When the current passes through the transistor, the electric field changes, causing the liquid crystal molecules to deflect, thereby changing the polarization of the light, and then using the polarizer to determine the light and dark state of the pixels; in addition, the color filter substrate 10 forms each pixel containing red and blue. The three colors of red, blue, and green form the image on the panel. In other words, the thin film transistor substrate 18 can present color images by relying on the color filter substrate 10. The backlight is controlled by the liquid crystal 16 and the driver IC to form a gray-scale light source, and the color filter substrate 10 is coated with red , Green and blue color photoresist, the light source passes through the color filter to form red, green and blue light, and finally mixed to form a color image in the human eye.

接續步驟S20,進行紫外線固化,紫外線膠膜14 主要應用於鏡頭孔上作為暫時固定與保護,防止因中間製程產生的損傷,故紫外線膠膜14於上膠後,透過紫外線光照射,能在數秒之內讓膠水固化,一般固化時間相當短,一般依照紫外線能量的不同,例如365nm、500-1000 mJ/cm2,照射時間為10秒~60秒即可固化,操作方便,在此,係將紫外線固化係連同密封層12一起固化。Following step S20, UV curing is performed. The UV adhesive film 14 is mainly applied to the lens hole as a temporary fixation and protection to prevent damage caused by the intermediate process. Therefore, the UV adhesive film 14 is irradiated with ultraviolet light after being glued and can be used in a few seconds. The glue is cured within, generally the curing time is quite short, generally according to the difference of UV energy, such as 365nm, 500-1000 mJ/cm2, the irradiation time is 10 seconds to 60 seconds, it can be cured, and the operation is convenient. Here, the UV The curing system is cured together with the sealing layer 12.

接續,為進一步說明本發明如何達到防護功效,請同時參閱3A圖至3F圖,為本發明的另一製作步驟流程圖,以製作一個鏡頭孔單元的防護製程為例說明。如第3A圖所示,彩色濾光片基板10上更包含複數個支撐元件20,其位於彩色濾光片基板10之一遮光層104上,此些支撐元件20係作為薄膜電晶體基板18與彩色濾光片基板10之間的支撐作用。薄膜電晶體基板18上更沈積一保護層22,其位於薄膜電晶體基板18與彩色濾光片基板10之間,保護層22係為多元氯化鋁((Poly Aluminium Chloride, PAC)。將紫外線膠膜14製作於鏡頭孔單元102的鏡頭孔106上方之後,且紫外線膠膜14的面積大於鏡頭孔106,故可以完全覆蓋住鏡頭孔106,如步驟S22,於薄膜電晶體基板18之一鑽孔區域182利用一鑽頭24進行鑽孔,以形成一開孔,鑽孔區域182係對應鏡頭孔106上方,如第3B圖所示。再如第3C圖,鑽孔後所擷取出來的薄膜電晶體基板18的區塊直接移除即可,其中,沈積於薄膜電晶體基板18上的保護層22也會一併被部分移除,此時,鑽孔後會產生許多薄膜電晶體基板18及保護層22掉落的碎屑於彩色濾光片基板10上,也就是掉落分佈於此些支撐元件20及紫外線膠膜14的表面上。Next, in order to further explain how the present invention achieves the protection effect, please refer to FIGS. 3A to 3F at the same time, which is a flowchart of another production step of the present invention, taking the protection process of manufacturing a lens hole unit as an example. As shown in Figure 3A, the color filter substrate 10 further includes a plurality of supporting elements 20, which are located on a light-shielding layer 104 of the color filter substrate 10. These supporting elements 20 serve as the thin film transistor substrate 18 and The supporting function between the color filter substrates 10. A protective layer 22 is further deposited on the thin film transistor substrate 18, which is located between the thin film transistor substrate 18 and the color filter substrate 10. The protective layer 22 is polyaluminium chloride ((Poly Aluminium Chloride, PAC). The adhesive film 14 is formed above the lens hole 106 of the lens hole unit 102, and the area of the ultraviolet adhesive film 14 is larger than the lens hole 106, so it can completely cover the lens hole 106. As step S22, drill on one of the thin film transistor substrates 18 The hole area 182 is drilled with a drill bit 24 to form an opening. The drilled area 182 corresponds to the top of the lens hole 106, as shown in Fig. 3B. As shown in Fig. 3C, the film extracted after drilling The blocks of the transistor substrate 18 can be directly removed. Among them, the protective layer 22 deposited on the thin film transistor substrate 18 will also be partially removed. At this time, many thin film transistor substrates 18 will be produced after drilling. The debris dropped from the protective layer 22 and the color filter substrate 10 are dropped and distributed on the surfaces of the supporting elements 20 and the ultraviolet film 14.

接續步驟S24,清洗薄膜電晶體基板18於鑽孔後掉落於彩色濾光片基板10上的碎屑,如第3D圖所示,可利用泡水或超音波洗淨讓紫外線膠膜14溶解於水中或是讓紫外線膠膜14起解膠作用而脫離鏡頭孔106,若使用溫水解膠的方式,可以讓整個製程達到環保效果,同時能提高製程效率。最後,如步驟S26,移除紫外線膠膜14,若是讓紫外線膠膜14起解膠作用而脫離鏡頭孔106的方式,則如第3E圖所示,可以用黏棒26將紫外線膠膜14自鏡頭孔106上黏起移除掉,如此一來,即可完成無髒污及刮傷的鏡頭孔防護效果。接著可進行下一道製程,如第3F圖所示,將一抗反射膜28貼附於鏡頭孔106上方,抗反射膜(Anti Reflection Coating)28,又稱AR 鍍膜,利用入射光與反射光相互干射而抵消的作用來減少光線的反射,增加玻璃或透明基板的透光度。Following step S24, cleaning the debris dropped on the color filter substrate 10 after drilling the thin film transistor substrate 18, as shown in Figure 3D, can be washed with water or ultrasonic waves to dissolve the ultraviolet film 14 In the water or let the ultraviolet film 14 play a role of dissolving the glue and detach from the lens hole 106, if the warm hydrolyzed glue is used, the whole process can achieve environmental protection effect, and the process efficiency can be improved. Finally, in step S26, the ultraviolet adhesive film 14 is removed. If the ultraviolet adhesive film 14 is used to release the glue and detach from the lens hole 106, as shown in FIG. 3E, the ultraviolet adhesive film 14 can be removed from The lens hole 106 is glued and removed, so that the lens hole protection effect without dirt and scratches can be completed. Then you can proceed to the next process. As shown in Figure 3F, an anti-reflection film 28 is attached to the top of the lens hole 106. The anti-reflection coating (Anti Reflection Coating) 28, also known as AR coating, uses the incident light and reflected light to interact with each other. The effect of dry radiation and offset to reduce the reflection of light and increase the transmittance of glass or transparent substrate.

其中,在步驟S22中,薄膜電晶體基板18之一鑽孔區域182利用一鑽頭24對薄膜電晶體基板18的鑽孔區域182進行鑽孔後,有可能薄膜電晶體基板18的區塊直接掉落至彩色濾光片基板10上,因此,如第4圖所示,本發明設計彩色濾光片基板10上設有此些支撐元件20,作為薄膜電晶體基板18與彩色濾光片基板10之間的支撐作用,同時作為保護作用,具體而言,就是薄膜電晶體基板18的區塊會直接掉落至此些支撐元件20上,此些支撐元件20具有減緩衝擊力度的效果,進而達到防止薄膜電晶體基板18的區塊切片刮傷彩色濾光片基板10上的遮光層104,而影響產品外觀及製程良率。Wherein, in step S22, after the drilling area 182 of the thin film transistor substrate 18 is drilled by a drill bit 24, the area of the thin film transistor substrate 18 may be directly dropped. Falling on the color filter substrate 10, therefore, as shown in Figure 4, the design of the present invention is provided with these supporting elements 20 on the color filter substrate 10 as the thin film transistor substrate 18 and the color filter substrate 10 The supporting effect between the TFT substrate 18 is also used as a protective effect. Specifically, the area of the thin film transistor substrate 18 will directly fall onto the supporting elements 20. The supporting elements 20 have the effect of reducing the impact force, thereby preventing The section slices of the thin film transistor substrate 18 scratch the light shielding layer 104 on the color filter substrate 10, which affects the appearance of the product and the process yield.

綜上所述,本發明在大量製作鏡頭孔單元中,利用點膠方式塗佈UV膠膜及固化製程以作為鏡頭孔的防護,在鑽孔過程中能有效避免碎屑掉落於鏡頭孔中而造成髒污難以清理問題,更甚者產生刮傷的不良率問題,於鑽孔後僅需過簡單的清洗作業就可以移除UV膠膜,便於進行下一製程流程,實能達到鏡頭孔的防護功效,實能增加製程便利性及有效降低成本。In summary, in the mass production of lens hole units, the present invention utilizes the dispensing method to coat the UV film and the curing process to protect the lens hole, which can effectively prevent debris from falling into the lens hole during the drilling process. This causes the problem of dirt and difficulty to clean, and even worse, the problem of defective rate of scratches. After drilling, the UV film can be removed after a simple cleaning operation, which is convenient for the next process and can actually reach the lens hole. The protective effect of this can actually increase the convenience of the manufacturing process and effectively reduce the cost.

唯以上所述者,僅為本發明之較佳實施例而已,並非用來限定本發明實施之範圍。故即凡依本發明申請範圍所述之特徵及精神所為之均等變化或修飾,均應包括於本發明之申請專利範圍內。Only the above are merely preferred embodiments of the present invention, and are not used to limit the scope of the present invention. Therefore, all equivalent changes or modifications made in accordance with the characteristics and spirit of the application scope of the present invention shall be included in the patent application scope of the present invention.

10:彩色濾光片基板 102:鏡頭孔單元 104:遮光層 106:鏡頭孔 12:密封層 14:紫外線膠膜 16:液晶 18:薄膜電晶體基板 182:鑽孔區域 20:支撐元件 22:保護層 24:鑽頭 26:黏棒 28:抗反射膜10: Color filter substrate 102: lens hole unit 104: shading layer 106: lens hole 12: Sealing layer 14: UV film 16: LCD 18: Thin film transistor substrate 182: Drilling area 20: Support element 22: protective layer 24: Drill 26: Sticky stick 28: Anti-reflective film

第1圖為本發明的步驟流程圖。 第2A圖至第2D圖為本發明的製作步驟流程圖。 第3A圖至第3F圖為本發明的另一製作步驟流程圖。 第4圖為本發明的防護結構剖視圖。 Figure 1 is a flowchart of the steps of the present invention. Figures 2A to 2D are flow charts of the production steps of the present invention. Figures 3A to 3F are flowcharts of another production step of the present invention. Figure 4 is a cross-sectional view of the protective structure of the present invention.

Claims (10)

一種鏡頭孔的防護方法,其應用於一電子裝置的鏡頭模組,該鏡頭孔的防護方法包括下列步驟: 提供一彩色濾光片基板,其上具有複數個鏡頭孔單元; 於每一該鏡頭孔單元的周緣塗佈一密封層; 於該密封層上點塗佈一紫外線膠膜,且位於該鏡頭孔單元的鏡頭孔上方; 將一薄膜電晶體基板對應覆蓋於該彩色濾光片基板上; 於該薄膜電晶體基板之一鑽孔區域進行鑽孔,該鑽孔區域係對應該鏡頭孔上方; 清洗該薄膜電晶體基板於該鑽孔後掉落於該彩色濾光片基板上的碎屑;以及 移除該紫外線膠膜。 A method for protecting a lens hole is applied to a lens module of an electronic device. The method for protecting the lens hole includes the following steps: Provide a color filter substrate with a plurality of lens hole units; Coating a sealing layer on the periphery of each lens hole unit; Spot-coating an ultraviolet adhesive film on the sealing layer and located above the lens hole of the lens hole unit; Correspondingly cover a thin film transistor substrate on the color filter substrate; Drill a hole in a drilling area of the thin film transistor substrate, and the drilling area corresponds to the top of the lens hole; Cleaning the thin film transistor substrate dropped on the color filter substrate after the drilling; and Remove the UV film. 如請求項1所述之鏡頭孔的防護方法,其中該薄膜電晶體基板上更沈積一保護層,其位於該薄膜電晶體基板與該彩色濾光片基板之間。The lens hole protection method according to claim 1, wherein a protective layer is further deposited on the thin film transistor substrate, which is located between the thin film transistor substrate and the color filter substrate. 如請求項2所述之鏡頭孔的防護方法,其中該保護層係為多元氯化鋁。The lens hole protection method according to claim 2, wherein the protection layer is polyaluminum chloride. 如請求項1所述之鏡頭孔的防護方法,其中於塗佈該紫外線膠膜的步驟之後,更包含一液晶滴入於該彩色濾光片基板上的步驟。The lens hole protection method according to claim 1, wherein after the step of coating the ultraviolet film, a step of dropping a liquid crystal onto the color filter substrate is further included. 如請求項1所述之鏡頭孔的防護方法,其中於該薄膜電晶體基板對應覆蓋於該彩色濾光片基板上的步驟之後,更包含一紫外線固化步驟。The method for protecting the lens hole according to claim 1, wherein after the step of covering the color filter substrate with the thin film transistor substrate, an ultraviolet curing step is further included. 如請求項1所述之鏡頭孔的防護方法,其中於移除該紫外線膠膜的步驟之後,更包括貼附一抗反射膜於該鏡頭孔上方的步驟。The method for protecting the lens hole according to claim 1, wherein after the step of removing the ultraviolet adhesive film, it further comprises a step of attaching an anti-reflection film above the lens hole. 如請求項1所述之鏡頭孔的防護方法,其中該彩色濾光片基板上更包含複數個支撐元件。The lens hole protection method according to claim 1, wherein the color filter substrate further comprises a plurality of supporting elements. 如請求項7所述之鏡頭孔的防護方法,其中該些支撐元件係位於該彩色濾光片基板之一遮光層上。The method for protecting the lens aperture according to claim 7, wherein the supporting elements are located on a light-shielding layer of the color filter substrate. 如請求項1所述之鏡頭孔的防護方法,其中該薄膜電晶體基板之該鑽孔區域係利用一鑽頭進行鑽孔形成一開孔。The lens hole protection method according to claim 1, wherein the drilling area of the thin film transistor substrate is drilled with a drill bit to form an opening. 如請求項1所述之鏡頭孔的防護方法,其中該紫外線膠膜係為紫外線硬化膠膜或紫外線水解膠膜。The method for protecting the lens aperture according to claim 1, wherein the ultraviolet film is an ultraviolet curing film or an ultraviolet hydrolyzing film.
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