TWI700120B - Multi-tray ballast vapor draw systems - Google Patents

Abstract

A system for supplying vaporized precursor includes an enclosure including an output. A plurality of trays is arranged in a stacked, spaced configuration inside the enclosure. The plurality of trays is configured to hold liquid precursor. A first conduit fluidly connects a carrier gas supply to the enclosure and includes a plurality of openings. A first valve is arranged along the first conduit and is configured to selectively control delivery of the carrier gas from the carrier gas supply through the first conduit to the plurality of openings in the first conduit. The plurality of openings is configured to direct the carrier gas across the liquid precursor in the plurality of trays, respectively. The output of the enclosure provides a mixture of the carrier gas and the vaporized precursor.

Description

Multi-tray ballast steam suction system

The present disclosure relates to systems and methods for supplying vaporized precursors to substrate processing tools.

The previous technical description provided here is for the purpose of describing the background of the disclosure in general. The work of the inventor described in this paragraph of the prior art and the viewpoints of the explanations that do not have prior technical qualifications in other aspects at the time of application are not explicitly or implicitly recognized as the prior art of the disclosure.

Substrate processing tools are used to process substrates such as semiconductor wafers. This processing usually involves exposing the substrate in the processing chamber to a vaporized precursor. Just as an example, when depositing layers on a substrate, such as chemical vapor deposition (CVD, plasma-enhanced CVD), plasma-enhanced CVD (PECVD), atomic layer deposition (ALD), plasma Enhanced ALD (PEALD, plasma-enhanced ALD) and fluorine free tungsten (FFW) procedures involve exposing the substrate to one or more vaporized precursors.

One way to generate vaporized precursors involves vaporizing liquid precursors. It is difficult to vaporize liquid precursors with low vapor pressure (generally less than 1 Torr at room temperature) and high viscosity (> 5 cP). Liquid precursors with low vapor pressure and high viscosity are prone to recondensation and cannot be vaporized by direct liquid injection (because high-viscosity liquids are not easy to atomize). In addition, liquid precursors that decompose at temperatures far below the boiling point are not suitable for vaporization after atomization. Systems and methods for vaporizing precursors with low to medium vapor pressure generally include vapor suction, bubbler, or flow over a single surface of liquid inside an ampoule. Other options are the use of atomizers and vaporizers. However, for precursors with low to medium flow rates, gasifiers are not ideal.

The standard bubbler can make the carrier gas saturated with precursors. However, the carrier gas flow rate is usually limited due to concerns about splashing. A single surface flow-over system (where the carrier gas flows into the ampoule instead of the liquid) can increase the total pressure in the ampoule so that the vaporized precursor can flow from the ampoule to the processing chamber . However, the carrier gas is not saturated with vapor, and the amount of vaporized precursor that can be transported to the processing chamber is relatively small.

A system for supplying gasification precursors includes a housing, and the housing includes an output end. Plural trays are arranged in a stacked and spaced structure inside the casing. The plurality of trays are used to hold liquid precursors. A first conduit fluidly connects a carrier gas supply part with the housing, and includes a plurality of openings. A first valve is arranged along the first duct and used to selectively control the delivery of carrier gas from the carrier gas supply part through the first duct to the plurality of openings in the first duct. The plurality of openings are used for guiding the carrier gas to cross the liquid precursors in the plurality of trays respectively. The output end of the shell provides a mixture of the carrier gas and the gasification precursor.

A method of supplying vaporized precursors includes arranging a plurality of trays into a stacked and spaced structure inside a housing; filling the plurality of trays at least partially with a liquid precursor; and using a first conduit to supply a carrier gas Fluidly connected with the housing; controlling the carrier gas delivery from the carrier gas supply part through the first conduit to the plurality of openings in the first conduit; configuring the plurality of openings in the first conduit to guide the carrier gas respectively Crossing the liquid precursor in the plurality of trays; and providing a mixture of the carrier gas and the vaporized precursor at an output end of the shell.

We can understand the scope of applicability of this disclosure from the detailed description, request items and drawings. The detailed description and specific examples are prepared for illustrative purposes only, and are not intended to limit the scope of the disclosure.

The present disclosure relates to a system and method for increasing the vaporization of the precursor by using the increased surface interface area between the carrier gas and the liquid precursor in an upward flow, ballast or carrier gas type system. In one example, the increased surface area is provided by multiple trays containing liquid precursors. Multiple gas outlets increase the interaction of carrier gas/precursor. These systems and methods also provide improved heat transfer from the heater to the liquid/vapor interface. For example, this heater may be arranged in the central support member in the chamber.

These systems and methods include systems for refilling multiple trays. Merely as an example, we can use one or more liquid level sensors to equalize the liquid filling rate in each of the multi-trays to control the liquid level of the liquid precursor in the multi-trays. For example, with or without the use of carrier gas, these systems and methods can be used as high surface area vapor suction systems to increase vapor flow rate for intermediate vapor pressure precursors.

Referring now to FIGS. 1A and 1B, the vaporized precursor delivery system 100 supplies the vaporized precursor to the processing chamber 102 for processing a substrate 104 (for example, a semiconductor wafer). In several examples, the flow control device 106 such as a valve, a restriction orifice, or a mass flow controller may be used to control the supply of vaporization precursor to the processing chamber 104.

The vaporized precursor delivery system 100 includes a housing 108 and a tray assembly 110 disposed in the housing 108. The tray assembly 110 includes multiple trays 112-1, 112-2... and 112-N (collectively referred to as tray 112). Each tray 112 may include openings 114-1, 114-2... And 114 -N (collectively referred to as the opening 114) to provide an installation position connected to the support member 120. Alternatively, this support member can be omitted and an alternative support mechanism can be used. For example, these trays can be supported by the sides of the housing (for example using slots or protrusions) or spacers can be used between the edges of the trays. The sides of the tray 112 are open to allow the carrier gas to flow freely therebetween. For example, the tray 112 may have a circular, square, rectangular, uniform, non-uniform, or other cross-section. The tray 112 may be configured in a stacked, evenly spaced configuration to allow the carrier gas to flow freely across the liquid precursor. Each tray 112 defines a volume for containing and storing liquid precursors. In some examples, the support member 120 and the tray 112 may be made of thermally conductive materials, such as stainless steel, aluminum, or other materials that allow heat transfer.

The liquid precursor storage tank 130 supplies the liquid precursor to the tray 112 via the valve 134 and one or more conduits 140. Gravity, pumping, or inert propellant gas such as helium can be used to increase pipeline pressure. The duct 140 may pass through the opening in each tray 112. The openings 142-1, 142-2... and 142-N in the duct 140 are configured to supply liquid precursors to each of the trays 112-1, 112-2... and 112-N.

In other examples, as shown in FIG. 1B, the duct 140 is arranged along one side of the tray 112 and includes extensions 250-1, 250-2... and 250-N (collectively referred to as Extension 250). The protrusion 250 in FIG. 1B extends inward (or inward and downward) to deliver the liquid precursor to the tray 112.

We can use the valve 152 and the conduit 154 to periodically fill the liquid precursor storage tank 130 through the bulk storage tank 150. The carrier gas 162 can be supplied by one or more valves and/or a mass flow controller (MFC) and the conduit 166 denoted by 164. The conduit 166 includes one or more restricted openings or groups of restricted openings configured to guide the carrier gas across each tray 112. Each opening group may include multiple openings that provide multi-directional carrier gas flow. The openings 170-1, 170-2... And 170 -N in the duct 166 convey the carrier gas above the tray 112.

In some examples, the heater 180 can be used to indirectly heat the support member 120, which transfers heat to the tray 112 and the liquid precursor within the tray 112. Alternatively, the heater may be arranged inside this supporting member. In several examples, one or more vibration devices 184 can be used to vibrate the support member 120 (as shown) or to vibrate the tray 112 alone.

The controller 200 can be used to control one or more valves in the gasification precursor delivery system 100. For example, the controller 200 can control the flow control device 106 to adjust the amount of vaporized precursor delivered to the processing chamber 104. The controller 200 can be connected to one or more liquid level sensors 204 to sense the liquid level of the liquid precursor in one or more of the trays 112. Based on the sensed liquid level of the liquid precursor in one or more of the trays 112, the controller 200 can be used to control the valve 134 to supply additional liquid precursor. The controller 200 can be used to control the valve 164 to adjust the flow of carrier gas across the tray 112. The controller 200 can be connected with one or more liquid level sensors 208 to sense the liquid level of the liquid precursor in the liquid precursor storage tank 130. Based on the sensing level of the liquid precursor storage tank 130, the controller 200 can be used to control the valve 134 to supply additional liquid precursor to refill the liquid precursor storage tank 130.

Referring now to Figures 1B and 1C, examples of various control methods are shown. In FIG. 1B, a pressure-based mass flow controller (MFC) or variable orifice designated by 251 can be set to a fixed value and used to provide a floating pressure. The pressure sensor 252 provides feedback to the controller 200, which controls the MFC 254. In FIG. 1C, a fixed pressure method is shown, which includes a pressure-based MFC 260 and a variable restriction orifice 264. The pressure sensor 266 provides pressure feedback to the controller 200, which controls the variable restriction orifice 264 and the MFC 254. Alternatively, the pressure sensor may provide feedback to a back pressure controller placed downstream of the position of the pressure sensor. This back pressure controller is essentially an orifice, which is controlled at a certain opening until it reaches the required pressure upstream of it. This control method is used when a fixed total pressure in the ampoule is desired.

Referring now to FIG. 2A, the multi-tray ballast system 300 includes a housing 108 and a multi-tray assembly 310 disposed in the housing 108. The multi-tray assembly 310 includes multi-trays 312-1, 312-2... and 312-N (collectively referred to as trays 312). The trays 312-1, 312-2... and 312-N include liquid openings 320-1, 320-2... and 320-N arranged at one or both ends thereof. Liquid openings 320-1, 320-2... and 320-N-1 (or N, if the bottom tray 312 contains liquid openings) (collectively referred to as liquid openings 320) are arranged in parts of the tray 312. These parts are It is located above the upper facing surface 324 of the tray 312 to allow a predetermined volume or predetermined surface area of the liquid precursor to accumulate in the corresponding tray 312 before flowing through the liquid opening 320.

Now referring to Figures 2B and 2C, we can deliver liquid precursors in several other ways. For example, in Figure 2B, the liquid precursor is transported from the side. When there is a sufficient volume of liquid precursor, the liquid precursor will flow through one or more liquid openings 320 in the tray 312-1. Some of the liquid precursors will be directly discharged to the immediately lower tray (such as tray 312-2), and some of the liquid precursors will flow along the bottom surface of the tray 312-1 due to the liquid surface tension and attractive force. As we can understand, the additional exposed surface area of the liquid precursor is provided by the liquid precursor flowing along the bottom surface of the tray 312 (compared to the system in Figures 1B and 1C). In FIG. 2C, the liquid precursor is delivered to the top tray 312-1, and the opening 320 is used to supply the liquid precursor to the lower tray 312. Referring now to FIG. 3, a method 400 is shown. At 404, the multiple trays are arranged in the chamber. At 408, the liquid precursor is delivered to the trays. At 412, the method determines whether the level of the liquid precursor in the tray is sufficient. If not, the method returns to 408. If 412 is correct, then at 416 the trays are optionally heated or vibrated. At 420, the carrier air supply is optionally supplied across the trays and between the trays. At 424, the vaporized precursor is delivered to the processing chamber. At 430, the method determines whether the processing is complete. If not, the method returns to 412. Otherwise, the method continues at 440 and stops delivering the vaporized precursor to the processing chamber.

Referring now to FIG. 4, the ring 500 may be configured above each tray. The ring 500 includes protrusions 502-1, 502-2... and 502-Z (collectively referred to as protrusions 502), where Z is an integer greater than one. The convex portion 502 is shown to protrude inward substantially in the radial direction. The end of the convex portion 502 includes openings or nozzles 504-1, 504-2... and 504-Z (collectively referred to as openings or nozzles 504) to guide the carrier gas on the surface of the tray. The nozzle 504 may be designed for choked flow and high velocity at the outlet. The protrusion 502 may have any suitable configuration. The convex portion 502 may be straight, curved, curved (as shown in FIG. 4) or any other suitable configuration. The convex portion 502 may have a curved configuration to increase turbulence. The protrusion 502 may be curved in the circumferential direction to produce the displayed spiral flow pattern and/or bend downward toward the surface of the tray.

Referring now to Figures 5A and 5B, another ring 530 is shown. In FIG. 5A, the ring 530 includes cross bars 534-1, 534-2... and 534-F (collectively referred to as cross bars 534), where F is an integer, and these cross bars are spaced apart from each other and extend from one side of the ring 530 To the opposite side of ring 530. The bars 534 can be arranged in a parallel manner as shown or arranged in other patterns. In Figure 5B, openings 540-1, 540-2... and 540-A (collectively referred to as openings 540), where A is an integer, these openings are shown to be arranged on one side of one of the crossbars 534 to allow flow Guide the surface of the tray. The nozzle may be arranged in the opening 540. These nozzles can be designed for choke and high velocity at the outlet.

As we can understand, in some examples, the opening 540 can be arranged on the opposite surface of the crossbar 534 to guide the carrier gas in the opposite direction. This configuration can help increase turbulence. This configuration is also particularly helpful when the liquid precursor flows along the bottom surface of the tray.

Referring now to FIG. 6, a conduit 550 having openings 550-1, 550-2... and 550-N can be used to guide the vaporized precursor and carrier gas to the processing chamber.

Referring now to Figures 7A and 7B, a separation ring 600 may be used. The separating ring 600 may include a first ring part 608 and a second ring part 620. The first ring portion 608 is connected to a carrier gas source and includes protrusions 612-1, 612-2... and 612-S (collectively referred to as protrusions 612). These protrusions have openings or nozzles 616-1, 616- 2... and 616-S (collectively referred to as an opening or nozzle 616) to guide the carrier gas on the liquid contained in the tray. In other examples, the nozzle 616 may be directly disposed on the first ring portion 608 without using the convex portion 612.

In FIG. 7A, the second ring portion 620 includes openings 622-1, 622-2... and 622-T (where T is an integer greater than 1) (collectively referred to as openings 622), which are located in the second ring portion 620 On the inner surface of the radial direction to recover the gasification precursor and carrier gas. The openings 622 can be evenly spaced and can be connected to a manifold. The size and number of the openings 622 in the second ring portion 620 are selected to provide a high conduction path so that the vapor can flow without pressure drop.

In FIG. 7B, the second ring portion 620 includes protrusions 634-1, 634-2... and 634-R (collectively referred to as protrusions 634) (where R is an integer greater than 1), these protrusions are drawn from the ring Extend to recover gasification precursor and carrier gas. The opening 636 at the end of the convex portion 634 on the second ring portion 620 may be a high-conductivity opening, so as to enable the vapor to flow without pressure drop.

The ducts used to direct the airflow to the surface of the liquid may include openings in tubes or protrusions that are attached to the surface of the liquid in the tray to increase turbulence. Turbulence increases the heat and mass transfer coefficient and increases the rate of vaporization from each tray. If the ability to refill the tray keeps the liquid level in the tray fixed, this type of guide protrusion will become feasible (otherwise the drop in the liquid level will cause a change in the surface dynamics). Likewise, vibration devices can be used to increase turbulence.

The above description is merely illustrative in nature, and is in no way intended to limit the content of the disclosure, its application, or use. We can implement various teachings in this disclosure in various forms. Therefore, although the content of this disclosure contains specific examples, the true scope of the content of this disclosure should not be so limited, because we will understand other changes when we study the drawings, specifications, and the following claims. As used herein, the term "at least one of A, B, and C" should be interpreted as the use of non-exclusive logical "or" to express the logical (A or B or C) meaning. We should understand that one or more steps in a method can be executed in a different order (or at the same time) without changing the principles of this disclosure.

In this application, the following definitions are included, and the term "controller" can be replaced by the term "circuit". For example, in system-on-chip (system-on-chip), the term "controller" can be classified as the following, part of the following, or including the following: Application Specific Integrated Circuit (ASIC) ; Digital, analog, or mixed analog/digital discrete circuit; digital, analog, or mixed analog/digital integrated circuit; combinational logic circuit; field programmable gate array (FPGA, field programmable gate array); for code execution ( Shared, dedicated, or collective) processor; (shared, dedicated, or collective) memory used to store the code executed by the processor; other suitable hardware components to provide the functions; or some of the above Or a combination of all.

As used above, the term "code" can include software, firmware, and/or microcode, and can be classified into programs, routines, functions, classes, and/or objects (objects). The term "shared processor" includes a single processor used to execute some or all code from multiple controllers. The term "collective processor" includes a processor that is combined with additional processors to execute some or all of the code from one or more controllers. The term "shared memory" includes a single memory used to store some or all codes from multiple controllers. The term "collective memory" includes a memory combined with additional memory to store some or all codes from one or more controllers. The term "memory" can be a subset of the term "computer readable media". The term "computer-readable media" does not include temporary electrical and electromagnetic signals that propagate through the media, and therefore can be regarded as tangible and non-temporary. Non-limiting examples of non-transitory tangible computer-readable media include non-volatile memory, volatile memory, magnetic storage, and optical storage.

We can partially or completely implement the equipment and methods described in this application by one or more computer programs, which are executed by one or more processors. The computer program includes processor executable instructions stored on at least one non-transitory tangible computer readable medium. The computer program may also contain and/or rely on stored data.

100‧‧‧Gasification precursor conveying system 102‧‧‧Processing chamber 104‧‧‧Substrate 106‧‧‧Flow control device 108‧‧‧Shell 110‧‧‧Tray assembly 112-1‧‧‧Tray 112- 2‧‧‧Tray 112-N‧‧‧Tray 114-1‧‧‧ Opening 114-2‧‧‧ Opening 114-N‧‧‧ Opening 120‧‧‧Supporting member 130‧‧‧Liquid precursor storage tank 134‧ ‧‧Valve 140‧‧‧Conduit 142-1‧‧‧Opening 142-2‧‧‧Opening 142-N‧‧‧Opening 150‧‧‧Bulk storage tank 152‧‧‧Valve 154‧‧‧Conduit 162‧‧‧ Carrier gas 164‧‧‧Valve and/or mass flow controller 166‧‧‧Conduit 170-1‧‧‧Opening 170-2‧‧‧Opening 170-N‧‧‧Opening 180‧‧‧Heater 184‧‧‧ Vibration device 200‧‧‧Controller 204‧‧‧Liquid level sensor 208‧‧‧Liquid level sensor 250-1‧‧‧Extended part 250-2‧‧‧Extended part 250-N‧‧‧ Extension 251‧‧‧Pressure-based mass flow controller or variable orifice 252‧‧‧Pressure sensor 254‧‧‧MFC260‧‧‧Pressure-based MFC264‧‧‧Variable restriction hole Port 266‧‧‧Pressure sensor 300‧‧‧Multi-tray ballast system 310‧‧‧Multi-tray assembly 312-1‧‧‧Tray 312-2‧‧‧Tray 312-N‧‧‧Tray 320-1‧ ‧‧Liquid opening 320-2‧‧‧Liquid opening 320-3‧‧‧Liquid opening 324‧‧‧Upper surface 400‧‧‧Method 404‧‧‧Arrangement of multiple trays in the chamber 408‧‧‧Place the liquid Is the precursor transported to the tray 412‧‧‧ sufficient? 416‧‧‧ can optionally heat or vibrate the tray 420‧‧‧ can optionally make the carrier gas flow across the trays and between the trays 424‧‧‧will The vaporization precursor is transported to the processing chamber 430‧‧‧Is the processing completed? 440‧‧‧Stop transporting the vaporization precursor to the processing chamber 500‧‧‧ Ring 502-1‧‧‧Protrusion 502-2‧‧ ‧Protrusion 502-Z‧‧‧Protrusion 504-1‧‧ Opening or nozzle 504-2‧‧‧ Opening or nozzle 504-Z‧‧‧ Opening or nozzle 530‧‧‧Ring 534‧‧‧Cross bar 534 -1‧‧‧Cross bar 534-2‧‧‧Cross bar 534-F‧‧‧Cross bar 540-1‧‧ Opening 540-2‧‧‧ Opening 540-A‧‧‧ Opening 550 -1‧‧‧Aperture 550-2‧‧‧Aperture 550-N‧‧‧Aperture 600‧‧‧Separation ring 608‧‧‧First ring part 612-1‧‧‧Protrusion 612-2‧‧‧Protrusion 612-S‧‧‧Protrusion 616-1‧‧ Opening or nozzle 616-2‧‧‧ Opening or nozzle 616-S‧‧‧ Opening or nozzle 620‧‧‧Second ring part 622-1‧‧‧ Opening 622-2‧‧‧ opening 622-3‧‧‧ opening 622-T‧‧‧ opening 634-1‧‧‧ convex 634-2‧‧‧ convex 634-R‧‧‧ convex 636‧‧‧ opening

We can get a more thorough understanding of the content of this disclosure from the detailed description and accompanying drawings. Among them:

According to the present disclosure, FIG. 1A shows an example of a multi-tray ballast vapor suction system;

According to the disclosure, FIG. 1B shows an example of part of a multi-tray ballast vapor suction system;

According to the present disclosure, FIG. 1C shows another example of part of a multi-tray ballast steam suction system;

According to the present disclosure, FIG. 2A shows another example of a multi-tray ballast vapor suction system;

According to the present disclosure, Figures 2B and 2C show an example of an alternative liquid delivery system for a multi-tray ballast vapor suction system;

According to the present disclosure, FIG. 3 shows a method for transporting the vaporized precursor to the substrate processing system;

According to the present disclosure, FIG. 4 shows an example of a ring containing nozzles, where the nozzles protrude inward to guide the carrier gas on the tray;

According to the present disclosure, FIG. 5A shows another example of a ring containing nozzles, where the nozzles are arranged on the cross bar to guide the carrier gas on the tray;

Figure 5B is an enlarged bottom view of the nozzle on one of the bars of Figure 5A;

Figure 6 shows a catheter with an opening for guiding the vaporized precursor and carrier gas to the processing chamber; and

According to the present disclosure, FIGS. 7A and 7B show examples of the split ring.

In these drawings, reference symbols may be used repeatedly to indicate similar and/or identical elements.

100‧‧‧Gasification precursor delivery system

102‧‧‧Processing chamber

104‧‧‧Substrate

106‧‧‧Flow control device

108‧‧‧Shell

110‧‧‧Tray assembly

112-1‧‧‧Tray

112-2‧‧‧Tray

112-N‧‧‧Tray

114-1‧‧‧Opening

114-2‧‧‧Opening

114-N‧‧‧ Opening

120‧‧‧Supporting member

130‧‧‧Liquid precursor storage tank

134‧‧‧valve

140‧‧‧Conduit

142-1‧‧‧Opening

142-2‧‧‧Opening

142-N‧‧‧Opening

150‧‧‧Bulk storage tank

152‧‧‧valve

154‧‧‧Conduit

162‧‧‧Carrier Gas

164‧‧‧Valve and/or mass flow controller

166‧‧‧Conduit

170-1‧‧‧Opening

170-2‧‧‧Opening

170-N‧‧‧Opening

180‧‧‧Heater

184‧‧‧Vibration device

200‧‧‧Controller

204‧‧‧Liquid level sensor

208‧‧‧Liquid level sensor

Claims (23)

A system for supplying gasification precursors, the system comprising: a housing including an output end; a plurality of trays arranged in a stacked and spaced structure inside the housing; a first conduit for fluidly connecting a carrier gas Is supplied to the housing; a second conduit includes at least one opening, and supplies a liquid precursor to one or more of the plurality of trays, wherein the plurality of trays are used to contain the liquid precursor, wherein the plurality of trays The end of each tray includes one or more holes, and a part of the liquid precursor is discharged through the one or more holes to an immediately lower tray; a first valve is arranged along the first duct, And used to selectively control the transport of the carrier gas from a carrier gas supply part through the first conduit; and a second valve arranged along the second conduit and used to selectively control the liquid precursor from A liquid precursor source is transported through the at least one opening in the second conduit to the at least one of the plurality of trays, wherein the output end of the housing provides a mixture of the carrier gas and the vaporized precursor. A system for supplying gasification precursors, the system comprising: a housing including an output end; a plurality of trays arranged in a stacked and spaced structure inside the housing; a first conduit for fluidly connecting a carrier gas Is supplied to the housing; a second conduit includes at least one opening, and supplies a liquid precursor to one or more of the plurality of trays, wherein the plurality of trays are used to contain the liquid precursor, Wherein the second conduit includes a first plurality of openings, the first plurality of openings are configured to supply part of the liquid precursor to the plurality of trays respectively, and wherein the first plurality of openings includes the at least one opening; a first valve , Arranged along the first conduit, and used to selectively control the transport of the carrier gas from a carrier gas supply part through the first conduit; and a second valve arranged along the second conduit, and used to Selectively controlling the transport of the liquid precursor from a liquid precursor source through the at least one opening in the second conduit to the at least one of the plurality of trays, wherein the output end of the housing provides the carrier gas and A mixture of the gasification precursors. The system for supplying vaporized precursors according to the second item of the patent application, wherein: the second valve is used to selectively control the liquid precursor from the liquid precursor source through the first in the second conduit The conveyance of plural openings to the plural pallets. The system for supplying vaporized precursors as described in item 1 or 2 of the scope of patent application, wherein: the second conduit guides the liquid precursor to a top tray of the plurality of trays; and the liquid precursor from the bottom The top tray is discharged downward to the other trays of the plural trays. The system for supplying vaporized precursors as described in item 1 or 2 of the scope of patent application, wherein: a plurality of the liquid precursors in each tray of the plurality of trays are discharged to an adjacent lower tray; and A number of the liquid precursors in each tray of the plurality of trays flow along the bottom surface of the corresponding tray of one of the plurality of trays due to liquid surface tension and attractive force. The system for supplying vaporized precursors as described in item 1 or 2 of the scope of the patent application, wherein: the plurality of trays have different sizes to accommodate different amounts of the liquid precursor; and each tray of the plurality of trays The discharge system enters an adjacent lower tray, and the size of each tray in the plurality of trays is smaller than the adjacent lower tray. The system for supplying vaporized precursors as described in item 2 of the scope of patent application, wherein: the end of each tray in the plurality of trays includes one or more holes, and a part of the liquid precursor passes through the one or more The holes are discharged to an immediately lower tray. The system for supplying gasification precursors as described in item 1 of the scope of the patent application further includes a bottom tray, wherein the bottom tray is not included in the plurality of trays and does not have a discharge hole. The system for supplying a gasification precursor as described in item 1 or 2 of the scope of patent application, wherein the first conduit includes a second plurality of openings, wherein each of the second plurality of openings is configured to distribute a part of the carrier gas Supply the liquid precursor toward or across each of the plurality of trays. The system for supplying vaporized precursors as described in item 1 or 2 of the scope of patent application, wherein the first conduit only guides the liquid precursor to one of the plurality of trays. The system for supplying vaporized precursor as described in item 1 or 2 of the scope of the patent application further includes: a liquid level sensor for sensing the liquid level of the liquid precursor in at least one of the plurality of trays And a controller that selectively controls the second valve based on the liquid level. The system for supplying gasification precursors as described in item 1 or 2 of the scope of patent application further includes a supporting member arranged in the shell, wherein: the plurality of trays are connected with the supporting member; and the plurality of trays define a An opening, and the opening in which the support member passes through the plurality of trays. The system for supplying gasification precursors as described in item 12 of the scope of patent application, wherein the supporting member and the plurality of trays are made of thermally conductive materials. The system for supplying gasification precursors according to item 12 of the scope of patent application, wherein: the plurality of trays include N trays each defining an opening, wherein N is an integer greater than 1; the support member passes through the N trays At least N-1 of the N trays include at least one opening, the at least one opening is located at the end of the at least N-1 trays of the N trays; and when the at least N -1 When the liquid level of the liquid precursor in one of the trays is greater than a predetermined liquid level, the liquid precursor passes through the at least one opening of the N-1 trays to reach the adjacent one of the N trays The lower tray. The system for supplying gasification precursors as described in item 1 or 2 of the scope of patent application, wherein each tray of the plurality of trays is spaced apart from at least one adjacent tray of the plurality of trays by a predetermined distance. As described in item 1 or 2 of the scope of patent application, the system for supplying gasification precursors further includes: a plurality of rings, each of which is arranged above a corresponding tray in the plurality of trays, wherein each ring of the plurality of rings contains a plurality of The crossbar includes a nozzle for guiding the carrier gas to the liquid precursor in at least one of the plurality of trays. As described in item 1 or 2 of the scope of patent application, the system for supplying gasification precursors further comprises a plurality of separation rings respectively arranged on one of the plurality of trays corresponding to the tray, wherein each separation ring of the plurality of separation rings Contains: a first ring part, including protrusions and nozzles for guiding the carrier gas to the liquid precursor in the plurality of trays; and a second ring part, including a part for collecting the vaporized precursor Open up. As described in item 1 or 2 of the scope of patent application, the system for supplying gasification precursors further includes a third conduit, and the third conduit includes a plurality of openings respectively arranged adjacent to the plurality of trays to collect the gasification precursors , Wherein the output end of the housing is connected with the second conduit. The system for supplying a gasification precursor as described in item 1 or 2 of the scope of the patent application, wherein: the second conduit includes a protruding part; and each of the protruding parts extends inward, and Guide a portion of the liquid precursor in each of the plurality of trays. The system for supplying a gasification precursor as described in item 1 or 2 of the scope of the patent application further comprises: a plasma chamber; and a flow control device for controlling the mixture of the carrier gas and the gasification precursor from the The flow from the output end of the housing to the plasma chamber. The system for supplying gasification precursors as described in item 1 or 2 of the scope of the patent application further comprises: a supporting member arranged in the housing, wherein the plurality of trays are connected to the supporting member; and at least one heater, It is connected with the supporting member or arranged inside the supporting member, wherein the heater is dedicated to heating the supporting member, and wherein heat energy is transferred from the supporting member to the plurality of trays and the liquid precursor. The system for supplying gasification precursors as described in item 1 or 2 of the scope of patent application further includes: A supporting member arranged in the housing, wherein the plurality of trays are connected with the supporting member; and a vibration device for vibrating at least one of the supporting member and the plurality of trays. As described in item 1 or 2 of the scope of the patent application, the system for supplying gasification precursors further includes a plurality of rings, each of which is arranged above a corresponding tray in the plurality of trays, wherein each ring in the plurality of rings contains (i ) A convex portion and one or more nozzles, or (ii) a plurality of cross bars and nozzles.

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