TWI697967B - Thin die separation method and apparatus thereof - Google Patents

Thin die separation method and apparatus thereof Download PDF

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TWI697967B
TWI697967B TW108130583A TW108130583A TWI697967B TW I697967 B TWI697967 B TW I697967B TW 108130583 A TW108130583 A TW 108130583A TW 108130583 A TW108130583 A TW 108130583A TW I697967 B TWI697967 B TW I697967B
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unit
negative pressure
seat
thin wafer
base
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TW108130583A
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TW202109689A (en
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石敦智
黃良印
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均華精密工業股份有限公司
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Abstract

A thin die separation apparatus comprises: a seat unit; a negative pressure unit coupled to the seat unit; and a scraper unit installed on top of the seat unit; wherein, the scraper unit is raised and lowered relative to the seat unit, and the scraper unit reciprocates from a side end of the seat unit toward a center of the seat unit. The thin die separation apparatus supports the ends of the thin die attached to the film, the film at the bottom end of the thin die is removed so that the thin wafer can maintain its integrity when the thin die and the film are separated from each other. A thin die separation method is also disclosed.

Description

薄晶片分離方法及其裝置Thin wafer separation method and device

一種薄晶片分離方法及其裝置,尤指一種能夠將薄晶片與膜體二者相互分離之方法與其裝置。A method and device for separating thin wafers, especially a method and device capable of separating thin wafers and membranes from each other.

現今的行動電話、數位相機或晶片卡之各種電子產品於輕薄化與多樣化的需求下,其係各廠商係持續開發出多功能基體電路與大容量記憶體。然多功能基體電路或大容量記憶體的體積係因應現有之趨勢,而朝向輕薄短小的需求發展。Nowadays, various electronic products such as mobile phones, digital cameras, or chip cards are under the demand for thinness and diversification. Various manufacturers continue to develop multi-functional substrate circuits and large-capacity memory. However, the volume of the multi-functional base circuit or the large-capacity memory is developing towards the demand of lightness, thinness and shortness in accordance with the current trend.

該趨勢或該需求係使基體電路的封裝技術面臨極大的挑戰,為此晶片薄型化係已儼然成為各廠商發展的趨勢。薄型化晶片亦被稱為薄晶片。This trend or demand causes the packaging technology of the base circuit to face great challenges. Therefore, the thinning of the chip has become the development trend of various manufacturers. Thinned wafers are also called thin wafers.

然現有的晶片之加工方式係將複數個晶片黏附於一膜體,在將該些晶片移至下一製程。若欲將晶片與膜體相互分離時,一頂針係由膜體的底端向上頂出,藉由一向上的推抵力量,以使晶片與膜體相互分離。However, the existing chip processing method is to adhere a plurality of chips to a film body, and then move the chips to the next process. If it is desired to separate the chip and the membrane from each other, a thimble is pushed up from the bottom end of the membrane, and an upward pushing force is used to separate the wafer and the membrane from each other.

上述之加工方式係應用於一般具有相當厚度的晶片,若將頂針頂出方式,則上述之薄晶片係無法承受頂針的向上推抵力量,而使薄晶片產生毀損或斷裂的情況,故各廠商無不思考如何於薄晶片與膜體相互分離時,薄晶片不會毀損或斷裂的裝置或方式。The above-mentioned processing method is applied to wafers with considerable thickness. If the ejector pin is ejected, the above-mentioned thin wafer cannot withstand the upward pushing force of the ejector pin, and the thin wafer will be damaged or broken. Therefore, various manufacturers Everyone thinks about how the thin chip will not be damaged or broken when the thin chip and the film body are separated from each other.

有鑑於上述之課題,本發明之目的在於提供一種薄晶片分離方法及其裝置,其係將貼附於膜體之薄晶片的兩端予以撐高,再將位於薄晶片底端之膜體予以去除,藉此使得薄晶片與膜體二者相互分離時,薄晶片能夠保持其完整性。In view of the above-mentioned problems, the object of the present invention is to provide a thin wafer separation method and device, which raises both ends of the thin wafer attached to the film body, and then lifts the film body located at the bottom end of the thin wafer Removal, so that when the thin wafer and the film body are separated from each other, the thin wafer can maintain its integrity.

為了達到上述之目的,本發明之技術手段在於提供一種薄晶片分離方法,其步驟包含有: 一膜體係貼附有至少一薄晶片,該膜體相對於該薄晶片之兩端的位置係被一上升的刮刀單元所撐高;以及 該刮刀單元係由該薄晶片的兩端朝向該薄晶片的中央移動,以將該膜體由該薄晶片的底端予以刮除,而使該薄晶片與該膜體相互分離。 In order to achieve the above objective, the technical means of the present invention is to provide a thin wafer separation method, the steps of which include: At least one thin chip is attached to a film system, and the position of the film body relative to the two ends of the thin chip is supported by a rising squeegee unit; and The squeegee unit moves from both ends of the thin wafer toward the center of the thin wafer to scrape the film body from the bottom end of the thin wafer to separate the thin wafer and the film body from each other.

本發明復提供一種薄晶片分離裝置,其包含有: 一座體單元; 一負壓單元,其係耦接該座體單元;以及 一刮刀單元,其係設於該座體單元的頂端; 其中,該刮刀單元係相對於該座體單元升降,並且該刮刀單元係由該座體單元的兩側朝向該座體單元的中央往復運動。 The present invention further provides a thin wafer separation device, which includes: A body unit A negative pressure unit, which is coupled to the base unit; and A scraper unit, which is arranged at the top of the base unit; Wherein, the scraper unit is raised and lowered relative to the base unit, and the scraper unit reciprocates from both sides of the base unit toward the center of the base unit.

綜合上述,本發明之薄晶片分離方法及其裝置,其係將貼附於膜體之薄晶片的兩端使用一刮刀單元予以撐高,再利用刮刀單元將位於薄晶片底端之膜體予以刮除,藉此將膜體與薄晶片二者相互分離,並且保持薄晶片之完整性。In summary, the thin wafer separation method and device of the present invention uses a squeegee unit to lift both ends of the thin wafer attached to the film body, and then uses the squeegee unit to transfer the film body at the bottom end of the thin wafer Scrape, thereby separating the film and the thin wafer from each other, and maintain the integrity of the thin wafer.

以下係藉由特定的具體實施例說明本發明之實施方式,所屬技術領域中具有通常知識者可由本說明書所揭示之內容,輕易地瞭解本發明之其他優點與功效。The following is a specific embodiment to illustrate the implementation of the present invention. Those skilled in the art can easily understand the other advantages and effects of the present invention from the contents disclosed in this specification.

請配合參考第1圖至第3圖所示,本發明係一種薄晶片分離裝置,其包含有一連桿10、一連桿座11、一負壓單元12、一負壓座13、一下座14、一動力單元15、一上座16、一支撐座17、一刮刀單元18、一連動單元19與一蓋體20。連桿座11、負壓座13、下座14、上座16與支撐座17係能夠視為一座體單元。Please refer to FIGS. 1 to 3 together. The present invention is a thin wafer separation device, which includes a connecting rod 10, a connecting rod seat 11, a negative pressure unit 12, a negative pressure seat 13, and a lower seat 14. , A power unit 15, an upper base 16, a support base 17, a scraper unit 18, a linkage unit 19 and a cover 20. The connecting rod seat 11, the negative pressure seat 13, the lower seat 14, the upper seat 16 and the support seat 17 can be regarded as a single body unit.

請配合參考第4圖所示,連桿10的一端係耦接一驅動單元30,驅動單元30係能夠為一凸輪總成、一馬達單元、一齒輪箱總成、一油壓缸總成或一汽壓缸總成。連桿10的另端係穿過連桿座11。Please refer to Fig. 4, one end of the connecting rod 10 is coupled to a drive unit 30. The drive unit 30 can be a cam assembly, a motor unit, a gear box assembly, a hydraulic cylinder assembly or A steam pressure cylinder assembly. The other end of the connecting rod 10 passes through the connecting rod seat 11.

連桿座11具有一連桿孔110,以供連桿10的另端貫穿。The connecting rod seat 11 has a connecting rod hole 110 for the other end of the connecting rod 10 to pass through.

負壓單元12係設於連桿座10的頂端,負壓單元12為二負壓管120,該二負壓管120係耦接一負壓裝置,該負壓裝置係為一抽氣馬達。The negative pressure unit 12 is arranged at the top of the connecting rod base 10, and the negative pressure unit 12 is two negative pressure tubes 120, and the two negative pressure tubes 120 are coupled to a negative pressure device, and the negative pressure device is an exhaust motor.

負壓座13係設於負壓單元12之間,負壓座13係與連桿10的另端耦接。負壓座13的兩端分別具有一凹槽130,以供負壓管120容置。The negative pressure seat 13 is arranged between the negative pressure units 12, and the negative pressure seat 13 is coupled to the other end of the connecting rod 10. Both ends of the negative pressure seat 13 are respectively provided with a groove 130 for receiving the negative pressure tube 120.

下座14係耦接負壓座13的頂端,下座14的底端具有一容槽140,下座14頂端具有一動力槽141,動力槽141的底端具有一動力孔142。動力孔142係使動力槽141與容槽140相通。下座14更具有二下孔143,各下孔143係供各負壓管120的一端貫穿。The lower base 14 is coupled to the top end of the negative pressure base 13, the bottom end of the lower base 14 has a receiving groove 140, the top end of the lower base 14 has a power groove 141, and the bottom end of the power groove 141 has a power hole 142. The power hole 142 makes the power groove 141 communicate with the receiving groove 140. The lower base 14 further has two lower holes 143, and each of the lower holes 143 is for one end of each negative pressure tube 120 to penetrate.

動力單元15係設於容槽140中,動力單元15的一端係由動力孔141延伸至動力槽141。動力單元15係為一馬達。The power unit 15 is arranged in the receiving groove 140, and one end of the power unit 15 extends from the power hole 141 to the power groove 141. The power unit 15 is a motor.

上座16係設於下座14的頂端。上座16更具有二上孔160,各上孔160係供各負壓壓管120的一端貫穿。The upper seat 16 is set at the top of the lower seat 14. The upper base 16 further has two upper holes 160, and each upper hole 160 is for one end of each negative pressure tube 120 to penetrate.

支撐座17係設於上座17的頂端,支撐座17具有至少一導孔170。The supporting base 17 is disposed at the top end of the upper base 17, and the supporting base 17 has at least one guide hole 170.

刮刀單元18具有二刮刀180,二刮刀180係分別設於支撐座17的兩端,各刮刀180的一端係穿過導孔170延伸至動力槽141。The scraper unit 18 has two scrapers 180. The two scrapers 180 are respectively disposed at two ends of the support base 17. One end of each scraper 180 extends through the guide hole 170 to the power groove 141.

連動單元19係設於動力槽141,連動單元19為兩相互嚙合的齒條190。各齒條190係耦接與其對應的刮刀180。二齒條190更耦接動力單元15延伸至動力槽141的一端。The linkage unit 19 is arranged in the power slot 141, and the linkage unit 19 is two racks 190 meshing with each other. Each rack 190 is coupled to its corresponding scraper 180. The two racks 190 are further coupled to the power unit 15 and extend to one end of the power groove 141.

蓋體20係蓋覆連桿10的一端、連桿座11、負壓單元12、負壓座13、下座14、動力單元15、上座16、支撐座17、刮刀單元18與連動單元19。蓋體20的頂端具有一座孔200,座孔200係供支撐座17延伸至其中。蓋體20的頂端更具有複數個相通的負壓槽201,負壓槽201係耦接負壓管120的一端。The cover 20 covers one end of the connecting rod 10, the connecting rod seat 11, the negative pressure unit 12, the negative pressure seat 13, the lower seat 14, the power unit 15, the upper seat 16, the supporting seat 17, the scraper unit 18 and the linkage unit 19. The top end of the cover 20 has a seat hole 200, and the seat hole 200 is for the support seat 17 to extend into it. The top end of the cover 20 further has a plurality of communicating negative pressure grooves 201, and the negative pressure groove 201 is coupled to one end of the negative pressure tube 120.

如第1圖、第2圖所與第5圖所示,若一膜體41貼附有至少一薄晶片40,該膜體41係設於蓋體20的頂端。負壓單元12係提供一負壓,該負壓係分佈於負壓槽201,以吸附膜體41。前述之貼附有薄晶片40之膜體41係位於支撐座17的上方。As shown in FIG. 1, FIG. 2 and FIG. 5, if at least one thin chip 40 is attached to a film body 41, the film body 41 is disposed on the top end of the cover body 20. The negative pressure unit 12 provides a negative pressure, and the negative pressure is distributed in the negative pressure groove 201 to adsorb the film body 41. The aforementioned film body 41 to which the thin chip 40 is attached is located above the support base 17.

請配合參考第4圖、第5圖與第6圖所示,當驅動單元30驅動連桿10,以使刮刀單元18上升時,二刮刀180係撐起貼附有薄晶片40之膜體41。動力單元15係驅動連動單元19,以使刮刀180由支撐座17的兩端,並被導孔170所引導,而朝向支撐座17的中央移動,於刮刀180朝向支撐座17的中央移動過程中,以將膜體41由薄晶片40的底端予以刮除,而使薄晶片41與膜體40相互分離。Please refer to Fig. 4, Fig. 5 and Fig. 6, when the driving unit 30 drives the connecting rod 10 to raise the squeegee unit 18, the two squeegees 180 support the film body 41 with the thin wafer 40 attached. . The power unit 15 drives the linkage unit 19 so that the scraper 180 is guided by the two ends of the support base 17 and guided by the guide hole 170, and moves toward the center of the support base 17, while the scraper 180 moves toward the center of the support base 17 , In order to scrape the film body 41 from the bottom end of the thin wafer 40, so that the thin wafer 41 and the film body 40 are separated from each other.

若薄晶片40與膜體41已相互分離,動力單元15係驅動刮刀180回到支撐座17的兩端。驅動單元30係回復至最初位置,以使刮刀180下降,而能夠再次進行下次刮除膜體41之動作。If the thin wafer 40 and the film body 41 have been separated from each other, the power unit 15 drives the scraper 180 back to the two ends of the support base 17. The drive unit 30 returns to the initial position so that the scraper 180 is lowered, so that the next operation of scraping the film 41 can be performed again.

本發明係一種薄晶片分離方法,其步驟包含有:The present invention is a method for separating thin wafers. The steps include:

請配合參考第1圖與第5圖所示,一膜體41係貼附有至少一薄晶片40。膜體41係放置於蓋體20的頂端,負壓單元12係提供一負壓氣體給蓋體20的頂端,以將膜體41吸附於蓋體20的頂端。Please refer to FIG. 1 and FIG. 5 together. At least one thin chip 40 is attached to a film body 41. The membrane 41 is placed on the top of the lid 20, and the negative pressure unit 12 provides a negative pressure gas to the top of the lid 20 to adsorb the membrane 41 on the top of the lid 20.

貼附有薄晶片40之膜體41係位於一支撐座17的上方,支撐座17係設於蓋體20的頂端。The film body 41 to which the thin chip 40 is attached is located above a support base 17, and the support base 17 is provided at the top of the cover 20.

如第5圖與第6圖所示,一刮刀單元18係上升,以將貼附有薄晶片40之膜體41的兩端予以撐起,刮刀單元18係由支撐座17的兩端朝向支撐座17的中央移動,以將膜體41由薄晶片40的底端予以刮除,而使薄晶片40與膜體41相互分離。As shown in Figs. 5 and 6, a squeegee unit 18 is raised to support both ends of the film body 41 to which the thin wafer 40 is attached. The squeegee unit 18 is supported by both ends of the support base 17 facing toward The center of the seat 17 moves to scrape the film body 41 from the bottom end of the thin wafer 40 to separate the thin wafer 40 and the film body 41 from each other.

請再配合參考第6圖所示,當刮刀單元18係由支撐座17的兩端朝向支撐座17的中央移動時,位於薄晶片40底端的膜體41係開始由薄晶片40的端部朝向其中央垂落,即膜體41由薄晶片40的端部朝向其中央開始分離。Please refer to Figure 6 again. When the squeegee unit 18 moves from the ends of the support base 17 toward the center of the support base 17, the film body 41 at the bottom end of the thin wafer 40 starts to face from the end of the thin wafer 40 The center hangs down, that is, the film body 41 starts to separate from the end of the thin wafer 40 toward the center.

請配合第7圖與第2圖所示,當刮刀單元18位於支撐座17中央時候,二刮刀180的其一刮刀180可維持原位置,另一刮刀180可下降至一位置,藉此使得薄晶片40與膜體41相互分離。Please cooperate with Figures 7 and 2, when the scraper unit 18 is located in the center of the support base 17, one scraper 180 of the two scrapers 180 can maintain the original position, and the other scraper 180 can be lowered to a position, thereby making it thin The wafer 40 and the film body 41 are separated from each other.

若薄晶片40與膜體41相互分離,刮刀單元18係由支撐座17的中央回復至最初位置,並且於回到最初位置後,刮刀單元18下降。If the thin wafer 40 and the film body 41 are separated from each other, the squeegee unit 18 is returned to the initial position from the center of the support base 17, and after returning to the initial position, the squeegee unit 18 is lowered.

綜合上述,本發明係先將貼附於膜體41之薄晶片40設於支撐座17的頂端,刮刀單元18係將該薄晶片40予以撐高,而後刮刀單元18係由該薄晶片40的兩端朝向該薄晶片40的中央移動,以將位於薄晶片40底端之膜體41予以刮除,藉由本發明之方法與其裝置,當薄晶片40與膜體41二者相互分離時,薄晶片40係能夠保持其完整性。In summary, in the present invention, the thin wafer 40 attached to the film body 41 is first set on the top of the support base 17, the squeegee unit 18 supports the thin wafer 40, and the rear squeegee unit 18 is supported by the thin wafer 40 The two ends move toward the center of the thin wafer 40 to scrape off the film body 41 located at the bottom end of the thin wafer 40. With the method and device of the present invention, when the thin wafer 40 and the film body 41 are separated from each other, the thin The chip 40 can maintain its integrity.

以上所述之具體實施例,僅係用於例釋本發明之特點及功效,而非用於限定本發明之可實施範疇,於未脫離本發明上揭之精神與技術範疇下,任何運用本發明所揭示內容而完成之等效改變及修飾,均仍應為下述之申請專利範圍所涵蓋。The specific embodiments described above are only used to illustrate the features and effects of the present invention, not to limit the scope of implementation of the present invention. Any use of the present invention does not deviate from the spirit and technical scope of the present invention. The equivalent changes and modifications of the disclosed content of the invention shall still be covered by the following patent application scope.

10:連桿10: connecting rod

11:連桿座11: Connecting rod seat

110:連桿孔110: connecting rod hole

12:負壓單元12: Negative pressure unit

120:負壓管120: negative pressure tube

13:負壓座13: Negative pressure seat

130:凹槽130: Groove

14:下座14: Lower seat

140:容槽140: container

141:動力槽141: Power Slot

142:動力孔142: power hole

143:下孔143: lower hole

15:動力單元15: Power unit

16:上座16: go up

160:上孔160: upper hole

17:支撐座17: Support seat

170:導孔170: pilot hole

18:刮刀單元18: Scraper unit

180:刮刀180: scraper

19:連動單元19: Linkage unit

190:齒條190: rack

20:蓋體20: Lid

200:座孔200: seat hole

201:負壓槽201: negative pressure tank

30:驅動單元30: drive unit

40:薄晶片40: thin wafer

41:膜體41: membrane body

第1圖為本發明之一種薄晶片分離裝置之立體示意圖。 第2圖為本發明之薄晶片分離裝置之立體分解示意圖。 第3圖為本發明之薄晶片分離裝置之另一立體分解示意圖。 第4圖為本發明之薄晶片分離裝置與一驅動單元之示意圖。 第5圖為本發明之一刮刀單元撐起一具有薄晶片之膜體之動作示意圖。 第6圖為本發明之刮刀單元將膜體由薄晶片處刮除之動作示意圖。 第7圖為本發明之刮刀單元將膜體由薄晶片處刮除之另一動作示意圖。 Figure 1 is a perspective view of a thin wafer separation device of the present invention. Figure 2 is a three-dimensional exploded schematic view of the thin wafer separation device of the present invention. Figure 3 is another three-dimensional exploded schematic view of the thin wafer separation device of the present invention. Figure 4 is a schematic diagram of the thin wafer separation device and a driving unit of the present invention. Fig. 5 is a schematic diagram of the action of a squeegee unit of the present invention supporting a film with a thin wafer. Figure 6 is a schematic diagram of the action of the squeegee unit of the present invention to scrape the film from the thin wafer. Figure 7 is a schematic diagram of another action of the squeegee unit of the present invention to scrape the film from the thin wafer.

10:連桿 10: connecting rod

11:連桿座 11: Connecting rod seat

110:連桿孔 110: connecting rod hole

12:負壓單元 12: Negative pressure unit

120:負壓管 120: negative pressure tube

13:負壓座 13: Negative pressure seat

130:凹槽 130: Groove

14:下座 14: Lower seat

140:容槽 140: container

141:動力槽 141: Power Slot

142:動力孔 142: power hole

143:下孔 143: lower hole

15:動力單元 15: Power unit

16:上座 16: go up

160:上孔 160: upper hole

17:支撐座 17: Support seat

170:導孔 170: pilot hole

18:刮刀單元 18: Scraper unit

180:刮刀 180: scraper

19:連動單元 19: Linkage unit

190:齒條 190: rack

20:蓋體 20: Lid

200:座孔 200: seat hole

201:負壓槽 201: negative pressure tank

Claims (13)

一種薄晶片分離方法,其步驟包含有:一膜體係貼附有至少一薄晶片,貼附有該薄晶片之該膜體係位於一支撐座的上方,該支撐座係設於一蓋體的頂端,一負壓單元係提供一負壓氣體給該蓋體的頂端,以將該膜體吸附於該蓋體的頂端,該膜體相對於該薄晶片之兩端的位置係被一上升的刮刀單元所撐高;以及該刮刀單元係由該薄晶片的兩端朝向該薄晶片的中央移動,以將該膜體由該薄晶片的底端予以刮除,而使該薄晶片與該膜體相互分離。 A method for separating thin wafers, the steps include: attaching at least one thin wafer to a membrane system, the membrane system to which the thin wafer is attached is located above a support seat, and the support seat is arranged on the top of a cover , A negative pressure unit provides a negative pressure gas to the top of the cover to adsorb the film to the top of the cover, and the position of the film relative to the two ends of the thin wafer is lifted by a scraper unit And the squeegee unit is moved from the two ends of the thin wafer toward the center of the thin wafer to scrape the film from the bottom end of the thin wafer, so that the thin wafer and the film are mutually Separation. 如申請專利範圍第1項所述之薄晶片分離方法,其中該刮刀單元係由該支撐座的兩端朝向該支撐座的中央移動,以將該膜體由該薄晶片的底端予以刮除;若該薄晶片與該膜體相互分離,該刮刀單元係由該支撐座的中央回復至一最初位置,並且於回到該最初位置後,該刮刀單元係下降。 The thin wafer separation method described in the first item of the patent application, wherein the squeegee unit is moved from the two ends of the support base toward the center of the support base to scrape the film from the bottom end of the thin wafer If the thin wafer and the film are separated from each other, the squeegee unit is returned to an initial position from the center of the support base, and after returning to the initial position, the squeegee unit is lowered. 如申請專利範圍第1項所述之薄晶片分離方法,其中該刮刀單元具有二刮刀,該些刮刀係由該支撐座的兩端朝向該支撐座的中央移動,其一該刮刀係維持原位置,另一該刮刀下降至一位置,藉此使得該薄晶片與該膜體相互分離。 The thin wafer separation method described in claim 1, wherein the squeegee unit has two squeegees, and the squeegees move from both ends of the support base toward the center of the support base, and one of the squeegees maintains the original position , The other squeegee is lowered to a position, thereby separating the thin wafer and the film body from each other. 一種薄晶片分離裝置,其包含有:一座體單元,其具有一支撐座;一負壓單元,其係耦接該座體單元; 一蓋體,其係蓋覆該負壓單元,該蓋體的頂端係供該支撐座容置,貼附有薄晶片之膜體係位於該支撐座的上方,該負壓單元係提供一負壓氣體給該蓋體的頂端,以將該膜體吸附於該蓋體的頂端;以及一刮刀單元,其係設於該座體單元的頂端;其中,該刮刀單元係相對於該座體單元升降,並且該刮刀單元係由該座體單元的兩側朝向該座體單元的中央往復運動。 A thin wafer separation device, comprising: a base unit with a support base; a negative pressure unit coupled to the base unit; A cover body covering the negative pressure unit, the top end of the cover body is for the support seat to accommodate, the film system attached with the thin wafer is located above the support seat, and the negative pressure unit provides a negative pressure Gas is given to the top of the cover to absorb the film on the top of the cover; and a scraper unit is arranged on the top of the base unit; wherein the scraper unit is lifted and lowered relative to the base unit , And the scraper unit reciprocates from both sides of the base unit toward the center of the base unit. 如申請專利範圍第4項所述之薄晶片分離裝置,其中該座體單元具有一下座、一上座與該支撐座,該下座係設於該負壓單元之間,該上座係設於該下座的頂端,該支撐座係設於該上座的頂端,該刮刀單元係設於該支撐座的兩端。 For the thin wafer separation device described in item 4 of the scope of patent application, wherein the base unit has a lower base, an upper base and the support base, the lower base is arranged between the negative pressure unit, and the upper base is arranged on the The top of the lower seat, the support seat is arranged on the top of the upper seat, and the scraper unit is arranged on both ends of the support seat. 如申請專利範圍第5項所述之薄晶片分離裝置,其更具有一連桿,該連桿的一端係耦接一驅動單元;該座體單元進一步具有一連桿座,該連桿座係耦接該負壓單元,該連桿座具有一連桿孔,以供該連桿的另端貫穿;該蓋體係蓋覆該連桿座、該下座、該上座、該支撐座與該刮刀單元。 For example, the thin wafer separation device described in item 5 of the scope of patent application has a connecting rod, one end of the connecting rod is coupled to a driving unit; the base unit further has a connecting rod seat, the connecting rod seat is Coupled to the negative pressure unit, the connecting rod seat has a connecting rod hole for the other end of the connecting rod to penetrate; the cover system covers the connecting rod seat, the lower seat, the upper seat, the support seat and the scraper unit. 如申請專利範圍第6項所述之薄晶片分離裝置,其中該驅動單元係能夠為一凸輪總成、一馬達單元、一齒輪箱總成、一油壓缸總成或一汽壓缸總成。 For the thin wafer separation device described in item 6 of the scope of patent application, the driving unit can be a cam assembly, a motor unit, a gear box assembly, a hydraulic cylinder assembly, or a gas cylinder assembly. 如申請專利範圍第6項所述之薄晶片分離裝置,其中該座體單元更具有一負壓座,該負壓座係設於該負壓單元之間,該負壓座係與該連桿的另端耦接;該下座係耦接該負壓座的頂端。 The thin wafer separation device described in item 6 of the scope of patent application, wherein the base unit further has a negative pressure seat, the negative pressure seat is arranged between the negative pressure unit, and the negative pressure seat is connected to the connecting rod The other end is coupled; the lower seat is coupled to the top end of the negative pressure seat. 如申請專利範圍第8項所述之薄晶片分離裝置,其中該負壓單元為二負壓管,該二負壓管係耦接一負壓裝置;該負壓座的兩端分別具有一凹槽,以供該二負壓管容置;該下座具有二下孔,各該下孔係供各該負壓管的一端貫穿;該上座更具有二上孔,各該上孔係供各該負壓壓管的一端貫穿;該蓋體的頂端具有複數個相通的負壓槽,該負壓槽係耦接該負壓管的一端。 The thin wafer separation device described in item 8 of the scope of patent application, wherein the negative pressure unit is two negative pressure tubes, and the two negative pressure tubes are coupled to a negative pressure device; both ends of the negative pressure seat are respectively provided with a concave Slot for the two negative pressure tubes to be accommodated; the lower seat has two lower holes, each of the lower holes is for one end of the negative pressure tube to penetrate; the upper seat has two upper holes, each of the upper holes for each One end of the negative pressure pipe penetrates; the top end of the cover has a plurality of communicating negative pressure grooves, and the negative pressure groove is coupled to one end of the negative pressure pipe. 如申請專利範圍第5項所述之薄晶片分離裝置,其中該下座的底端具有一容槽,該下座頂端具有一動力槽,該動力槽的底端具有一動力孔,該動力孔係使該動力槽與該容槽相通;該容槽中具有一動力單元,該動力單元的一端係由該動力孔延伸至該動力槽;該動力槽中具有一連動單元,該連動單元係分別耦接該刮刀單元與該動力單元延伸至該動力槽的一端。 The thin wafer separation device described in item 5 of the scope of patent application, wherein the bottom end of the lower base has a receiving groove, the top end of the lower base has a power groove, the bottom end of the power groove has a power hole, and the power hole The power slot is connected to the receiving slot; the receiving slot has a power unit, one end of the power unit extends from the power hole to the power slot; the power slot has a linkage unit, and the linkage unit is respectively The scraper unit and the power unit are coupled to each other and extend to one end of the power groove. 如申請專利範圍第9項所述之薄晶片分離裝置,其中該動力單元係為一馬達;該刮刀單元具有二刮刀;該連動單元為兩相互嚙合的齒條,各該齒條係耦接與其對應的該刮刀,以及耦接該動力單元延伸至該動力槽的一端。 In the thin wafer separation device described in claim 9, wherein the power unit is a motor; the squeegee unit has two squeegees; the interlocking unit is two mutually meshing racks, and each rack is coupled to it The corresponding scraper is coupled to the power unit and extends to one end of the power groove. 如申請專利範圍第5項所述之薄晶片分離裝置,其中該支撐座具有至少一導孔,該刮刀單元的一端係由該導孔延伸至該下座;該蓋體的頂端具有一座孔,該座孔係供該支撐座延伸至其中,該蓋體的頂端更具有複數個相通的負壓槽,該些負壓槽係耦接該負壓單元。 The thin wafer separation device described in item 5 of the scope of patent application, wherein the support base has at least one guide hole, and one end of the scraper unit extends from the guide hole to the lower base; the top of the cover has a hole, The seat hole is for the support seat to extend into, and the top end of the cover body further has a plurality of communicating negative pressure grooves, and the negative pressure grooves are coupled to the negative pressure unit. 如申請專利範圍第11項所述之薄晶片分離裝置,其中該膜體相對於該薄晶片之兩端的位置係被上升的該刮刀單元所撐高,該些刮刀係由該支撐座的兩端朝向該支撐座的中央移動,其一該刮刀係維持原位置,另一該刮刀下降至一位置,藉此使得該薄晶片與該膜體相互分離。 The thin wafer separation device described in claim 11, wherein the positions of the film body relative to the two ends of the thin wafer are supported by the rising squeegee unit, and the squeegees are supported by both ends of the support base Moving toward the center of the support base, one of the squeegee blades maintains the original position, and the other squeegee blade is lowered to a position, thereby separating the thin wafer and the film body from each other.
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