TWI691609B - Multi-plate material linear vapor deposition device - Google Patents

Multi-plate material linear vapor deposition device Download PDF

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TWI691609B
TWI691609B TW105144013A TW105144013A TWI691609B TW I691609 B TWI691609 B TW I691609B TW 105144013 A TW105144013 A TW 105144013A TW 105144013 A TW105144013 A TW 105144013A TW I691609 B TWI691609 B TW I691609B
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plating material
vapor deposition
crucible
evaporation
space
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TW201823490A (en
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徐榮懋
梁仕昌
魏肇男
倪國裕
薄慧雲
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國家中山科學研究院
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Abstract

本發明提供一種多鍍材線性蒸鍍裝置,包括一主坩鍋、一次坩鍋、複數鍍材加熱器及一蒸鍍腔體。主坩鍋及次坩鍋之內壁與外壁係夾設形成夾層,並於夾層填充有熱媒介質,主坩鍋供以承載一第一鍍材,次坩鍋供以承載一第二鍍材;鍍材加熱器供以透過熱媒介質均勻加熱第一鍍材及第二鍍材;蒸鍍腔體設於主坩鍋及次坩鍋一側並具有一線性蒸鍍口,且內部具有供以導入第二鍍材蒸氣之一導流空間,與供以導入第一鍍材蒸氣之一加熱空間,蒸鍍腔體對應加熱空間設有一蒸鍍加熱器,以使加熱空間之溫度高於導流空間之溫度,並第一鍍材之蒸氣與第二鍍材之蒸氣係一併自線性蒸鍍口向外流出進行蒸鍍,藉此以有效提高鍍材使用率及製備薄膜的均勻性。 The invention provides a multi-plating material linear vapor deposition device, which comprises a main crucible, a primary crucible, a plurality of plated material heaters and a vapor deposition cavity. The inner and outer walls of the main crucible and the secondary crucible are sandwiched to form an interlayer, and the interlayer is filled with a heat medium. The main crucible is used to carry a first plating material, and the secondary crucible is used to carry a second plating material. ; The plating material heater is used to heat the first plating material and the second plating material uniformly through the heat medium; the evaporation cavity is provided on the side of the main crucible and the secondary crucible and has a linear evaporation port, and there is a supply inside A diversion space for introducing the second plating material vapor, and a heating space for introducing the first plating material vapor, and a vapor deposition heater corresponding to the heating space of the vapor deposition chamber, so that the temperature of the heating space is higher than the The temperature of the flow space, and the vapor of the first plating material and the vapor of the second plating material flow out from the linear evaporation port together for evaporation, thereby effectively improving the utilization rate of the plating material and the uniformity of the prepared film.

Description

多鍍材線性蒸鍍裝置 Multi-plate material linear vapor deposition device

本發明係與蒸鍍裝置領域相關,尤其是一種可有效因應各類OLED發光層蒸鍍材特性調整,以提升OLED發光層整體均勻性之多鍍材線性蒸鍍裝置。 The invention relates to the field of vapor deposition devices, in particular to a multi-plating material linear vapor deposition device that can effectively adjust the characteristics of various OLED light emitting layer vapor deposition materials to improve the overall uniformity of the OLED light emitting layer.

在顯示技術領域中,利用OLED(Organic Light Emitting Diode,有機發光二極體)技術所製成的顯示器,因具有輕薄、可撓曲、高亮度、可視角廣及節能等優點,遂成為未來平面顯示器的主要趨勢。 In the field of display technology, displays made with OLED (Organic Light Emitting Diode) technology have become the future plane due to their advantages of thinness, flexibility, high brightness, wide viewing angle and energy saving. The main trends of monitors.

OLED之基本結構依序為一透明陽極、一電洞傳輸層、一發光層、一電子傳輸層及一金屬陰極。OLED目前主要透過蒸鍍方式製成,如點蒸鍍或線性蒸鍍等,其中以線性蒸鍍為使用大宗。 The basic structure of OLED is a transparent anode, a hole transport layer, a light emitting layer, an electron transport layer and a metal cathode in this order. OLED is currently mainly made by evaporation, such as spot evaporation or linear evaporation, etc. Among them, linear evaporation is mainly used.

在OLED線性蒸鍍製程中,常見有因各獨立線性蒸鍍源蒸發角度與製程溫度不同而產生互相干涉的情況,使製成之薄膜均勻性大幅降低。且各獨立線性蒸鍍源擺放之位置,在被鍍材往垂直蒸鍍源方向移動時,也會使製備的薄膜縱深成分產生不均勻之現象。在前述影響下,均勻性不佳之薄膜係導致日後產品具有良率參差不齊之問題。此外,在加 熱蒸鍍材料部分,由於均溫性不佳,除了增加對應加熱器具之熱損耗外,蒸鍍材料之蒸發狀態亦不夠穩定,使蒸鍍材料的使用率大幅降低。 In the OLED linear vapor deposition process, it is common for each independent linear vapor deposition source to have an evaporation angle and a process temperature that interfere with each other, which greatly reduces the uniformity of the film produced. Moreover, when the positions of the independent linear vapor deposition sources are moved to the direction of the vertical vapor deposition source, the depth component of the prepared film will also be uneven. Under the aforementioned influence, the poor uniformity of the film leads to the problem of uneven yield in the future. In addition, in the heating vapor deposition material part, due to the poor temperature uniformity, in addition to increasing the heat loss of the corresponding heating appliance, the evaporation state of the vapor deposition material is not stable enough, which greatly reduces the utilization rate of the vapor deposition material.

為解決先前技術之缺點,本發明係提供一種多鍍材線性蒸鍍裝置,其係透過熱媒加熱方式提高鍍材受熱均勻度,以提高鍍材使用率,並可有效防止當蒸鍍材料蒸發溫度差異過大時所造成的鍍膜不均現象,以提供具高品質之OLED發光層薄膜。 In order to solve the shortcomings of the prior art, the present invention provides a multi-plating material linear vapor deposition device, which uses a heat medium heating method to improve the uniformity of the heating of the plating material to improve the utilization rate of the plating material and can effectively prevent the evaporation of the evaporation material The uneven coating caused by the temperature difference is too large to provide a high-quality OLED light-emitting layer film.

本發明係提供一種多鍍材線性蒸鍍裝置,係包括:一主坩鍋,其內壁與外壁夾設形成夾層,並於夾層填充有熱媒介質,該主坩鍋供以承載一第一鍍材;一次坩鍋,其內壁與外壁夾設形成夾層,並於夾層填充有熱媒介質,該次坩鍋供以承載一第二鍍材;複數鍍材加熱器,分設於該主坩鍋及該次坩鍋外側,以透過熱媒介質均勻加熱該第一鍍材及該第二鍍材;及一蒸鍍腔體,設於該主坩鍋及該次坩鍋一側並具有一線性蒸鍍口,該蒸鍍腔體內部具有一導流空間與一加熱空間,且該蒸鍍腔體對應該加熱空間設有一蒸鍍加熱器,以使該加熱空間之溫度高於該導流空間之溫度;該加熱空間供以導入該第一鍍材之蒸氣,該導流空間供以導入該第二鍍材之蒸氣,並該第一鍍材之蒸氣與該第二鍍材之蒸氣係一併自該線性蒸鍍口向外流出。藉此,除透過熱媒介質使該 等鍍材加熱器之熱能可對該主坩鍋及該次坩鍋各區域達到均勻加熱外,透過該導流空間與該加熱空間之設置,係可提供具不同溫度之空間使該第一鍍材及該第二鍍材之蒸氣不會相互干涉,而可順利一併自該線性蒸鍍口流出進行鍍膜製程,提升後續製備薄膜之均勻度。 The invention provides a multi-plating material linear vapor deposition device, which comprises: a main crucible whose inner wall and outer wall are sandwiched to form an interlayer, and the interlayer is filled with a heat medium, and the main crucible is used to carry a first Plating material; primary crucible, the inner wall and outer wall of which are sandwiched to form an interlayer, and the interlayer is filled with heat medium, the secondary crucible is used to carry a second plating material; a plurality of plating material heaters are located in the main The outer sides of the crucible and the secondary crucible are used to uniformly heat the first plating material and the second plating material through a heat medium; and a vapor deposition cavity is provided on one side of the main crucible and the secondary crucible and has A linear vapor deposition port, the vapor deposition cavity has a diversion space and a heating space, and the vapor deposition cavity is provided with a vapor deposition heater corresponding to the heating space, so that the temperature of the heating space is higher than the guide The temperature of the flow space; the heating space is used to introduce the steam of the first plating material, the flow space is used to introduce the steam of the second plating material, and the steam of the first plating material and the steam of the second plating material It flows out from the linear evaporation port together. In this way, in addition to the heat energy of the plated material heaters through the heat medium to achieve uniform heating of the main crucible and the secondary crucible regions, through the arrangement of the diversion space and the heating space, it can provide The spaces with different temperatures prevent the vapors of the first plating material and the second plating material from interfering with each other, and can smoothly flow out from the linear vapor deposition port for the coating process, improving the uniformity of the subsequent film preparation.

本發明之一實施例中,該蒸鍍加熱器係設於該蒸鍍腔體內部,以防止熱能逸失至外部環境而產生之熱能損耗,提升該蒸鍍加熱器之運作效能。 In one embodiment of the present invention, the evaporation heater is disposed inside the evaporation cavity to prevent heat energy loss caused by heat energy escaping to the external environment and improve the operation efficiency of the evaporation heater.

本發明之一實施例中,該蒸鍍腔體內設有一加熱室,該加熱空間並由該加熱室框圍形成,且該蒸鍍加熱器係環設於該加熱室外側,藉此係可更完整地區隔該加熱空間與該導流空間,特別在該第一鍍材之蒸氣溫度與該第二鍍材之蒸氣溫度差異甚鉅之情況下,更可進一步於該蒸鍍腔體內隔絕兩者。 In one embodiment of the present invention, a heating chamber is provided in the vapor deposition chamber, and the heating space is formed by the frame of the heating chamber, and the vapor deposition heater loop is disposed outside the heating chamber, by which the Completely separate the heating space and the diversion space, especially when the vapor temperature of the first plating material and the vapor temperature of the second plating material are very different, the two can be further isolated in the vapor deposition chamber .

本發明之一實施例中,該蒸鍍腔體內更具有複數絕熱板,該等絕熱板對應該蒸鍍腔體側面設置,並為間隔排列,各相鄰之該等絕熱板係夾設形成一真空層。藉此,可有效地防止該蒸鍍加熱器之熱能向外逸失,且亦可防止外界環境影響。 In one embodiment of the present invention, the evaporation chamber further has a plurality of insulation plates, the insulation plates are arranged corresponding to the sides of the evaporation chamber, and are arranged at intervals, and each of the adjacent insulation plates is sandwiched to form a Vacuum layer. Thereby, the heat energy of the evaporation heater can be effectively prevented from escaping outward, and the influence of the external environment can also be prevented.

本發明之一實施例中,該多鍍材線性蒸鍍裝置更具有複數溫控組件,分別與該鍍材加熱器連接設置以依據該第一鍍材及該第二鍍材控制對應之該等鍍材加熱器溫度,藉 此係可因應該第一鍍材與該第二鍍材之材料特性控制該等鍍材加熱器依據相符之升溫曲線進行加熱。 In one embodiment of the present invention, the multi-plating material linear vapor deposition device further has a plurality of temperature control components, which are respectively connected to the plating material heaters to control the corresponding ones according to the first plating material and the second plating material The temperature of the plated material heater can be controlled according to the material characteristics of the first plated material and the second plated material to heat the plated material heater according to a matching heating curve.

本發明之一實施例中,該多鍍材線性蒸鍍裝置更具有複數壓力偵測器,分別與該主坩鍋及該次坩鍋連接設置以偵測該主坩鍋及該次坩鍋內部之壓力值,藉此以即時監控該第一鍍材與該第二鍍材之蒸發量,並可依據所需之發光層薄膜材料比例對該第一鍍材及該第二鍍材控制其蒸發百分比。 In one embodiment of the present invention, the multi-plating material linear vapor deposition device further has a plurality of pressure detectors respectively connected to the main crucible and the secondary crucible to detect the interior of the main crucible and the secondary crucible The pressure value, so as to monitor the evaporation amount of the first plating material and the second plating material in real time, and can control the evaporation of the first plating material and the second plating material according to the required ratio of the light-emitting layer film material percentage.

本發明之一實施例中,該多鍍材線性蒸鍍裝置係可使該主坩鍋之飽和蒸氣壓力係大於該加熱空間之背景壓力;該次坩鍋之飽和蒸氣壓力係大於該導流空間之背景壓力。藉此可確保該第一鍍材之蒸氣與該第二鍍材之蒸氣分別穩定均勻地流向該加熱空間與該導流空間內,維持蒸鍍製程之穩定性。 In one embodiment of the present invention, the multi-plating material linear vapor deposition device is such that the saturated vapor pressure of the main crucible is greater than the background pressure of the heating space; the saturated vapor pressure of the secondary crucible is greater than the diversion space Background pressure. This can ensure that the steam of the first plating material and the steam of the second plating material flow stably and evenly into the heating space and the diversion space, respectively, and maintain the stability of the vapor deposition process.

本發明之一實施例中,該熱媒介質係為導熱油、醇類、碳氫化合物、汞、水或其他種類之導熱介質。 In one embodiment of the present invention, the heat medium is heat conductive oil, alcohol, hydrocarbon, mercury, water, or other types of heat conductive medium.

綜上所述,本發明之多鍍材線性蒸鍍裝置透過於該主坩鍋及該次坩鍋設置夾層與熱媒介質的方式,提高該第一鍍材與該第二鍍材的受熱均勻性,以及該等鍍材加熱器之加熱效能,並可防止加熱不均影響蒸鍍材料之均勻性、甚或導致部分蒸氣產生凝結現象。並且、該加熱空間與該導流空間的設置,使該蒸鍍腔體可同時導入具相異溫度之蒸鍍材料 蒸氣,防止蒸氣彼此影響進而造成熱裂解失效及降低製備薄膜均勻性等情況發生。尤對普遍以具有蒸發溫度差異甚鉅之各種發光材料製備而成的OLED發光層薄膜,透過本發明之多鍍材線性蒸鍍裝置更可有效大幅提升蒸鍍製成的薄膜均勻性。 In summary, the multi-plating material linear vapor deposition device of the present invention improves the uniform heating of the first plating material and the second plating material by providing an interlayer and a heat medium in the main crucible and the secondary crucible Performance, and the heating efficiency of these plated material heaters, and can prevent uneven heating affecting the uniformity of the evaporation material, or even causing condensation of some vapors. In addition, the arrangement of the heating space and the diversion space enables the vapor deposition chamber to simultaneously introduce vapors of vapor deposition materials with different temperatures, preventing the vapors from affecting each other and causing thermal cracking failure and reducing the uniformity of the prepared film. . Especially for the OLED light-emitting layer film generally prepared by using various light-emitting materials with very large evaporation temperature differences, the multi-plating material linear evaporation device of the present invention can effectively effectively improve the uniformity of the film made by evaporation.

以上之概述與接下來的詳細說明及附圖,皆是為了能進一步說明本發明達到預定目的所採取的方式、手段及功效。而有關本發明的其他目的及優點,將在後續的說明及圖示中加以闡述。 The above summary, the following detailed description and the accompanying drawings are intended to further illustrate the methods, means and effects of the present invention to achieve the intended purpose. The other objects and advantages of the present invention will be explained in the subsequent description and illustration.

1‧‧‧線性蒸鍍裝置 1‧‧‧Linear evaporation equipment

10‧‧‧主坩鍋 10‧‧‧Main crucible

101‧‧‧夾層 101‧‧‧ Mezzanine

102‧‧‧熱媒介質 102‧‧‧Hot media

11‧‧‧次坩鍋 11‧‧‧ times crucible

111‧‧‧夾層 111‧‧‧ Mezzanine

112‧‧‧熱媒介質 112‧‧‧Hot medium

12‧‧‧鍍材加熱器 12‧‧‧ Plated material heater

13‧‧‧蒸鍍腔體 13‧‧‧Evaporation chamber

131‧‧‧線性蒸鍍口 131‧‧‧Linear evaporation port

132‧‧‧導流空間 132‧‧‧Diversion space

133‧‧‧加熱空間 133‧‧‧Heating space

134‧‧‧蒸鍍加熱器 134‧‧‧Evaporation heater

135‧‧‧絕熱板 135‧‧‧Insulation board

1351‧‧‧真空層 1351‧‧‧Vacuum layer

136‧‧‧加熱室 136‧‧‧Heating room

14‧‧‧溫控組件 14‧‧‧Temperature control components

15‧‧‧壓力偵測器 15‧‧‧pressure detector

2‧‧‧第一鍍材 2‧‧‧First plating material

3‧‧‧第二鍍材 3‧‧‧Second plating

第1圖,為本發明之多鍍材線性蒸鍍裝置較佳實施例之裝置示意圖。 Fig. 1 is a schematic diagram of an apparatus of a preferred embodiment of a multi-plating material linear evaporation apparatus of the present invention.

第2圖,為本發明之多鍍材線性蒸鍍裝置較佳實施例之應用示意圖。 Figure 2 is a schematic diagram of the application of the preferred embodiment of the multi-plating material linear vapor deposition device of the present invention.

第3圖,為本發明之多鍍材線性蒸鍍裝置較佳實施例另一實施態樣之裝置示意圖。 FIG. 3 is a schematic diagram of another embodiment of the multi-plating material linear vapor deposition device of the present invention.

以下係藉由特定的具體實例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點與功效。 The following is a description of the embodiments of the present invention by specific specific examples. Those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification.

請參閱第1及2圖,其係為本發明之多鍍材線性蒸 鍍裝置較佳實施例之裝置示意圖與應用示意圖。本發明係揭示一種可提升OLED發光層薄膜均勻性之多鍍材線性蒸鍍裝置1,該多鍍材線性蒸鍍裝置1係供以使用複數發光材料,透過蒸鍍方式製備OLED之發光層薄膜,其包括一主坩鍋10、一次坩鍋11、複數鍍材加熱器12及一蒸鍍腔體13。 Please refer to Figs. 1 and 2, which are schematic diagrams of apparatuses and application diagrams of preferred embodiments of the multi-plating material linear vapor deposition apparatus of the present invention. The invention discloses a multi-plating material linear vapor deposition device 1 capable of improving the uniformity of an OLED luminescent layer film. The multi-plating material linear vapor deposition device 1 is used for preparing a OLED luminescent layer film by vapor deposition using a plurality of luminescent materials It includes a main crucible 10, a primary crucible 11, a plurality of plated material heaters 12, and a vapor deposition chamber 13.

該主坩鍋10係供以承載一第一鍍材2,且該主坩鍋10內壁與外壁夾設形成夾層101,並於夾層101填充有熱媒介質102。該次坩鍋11供以承載一第二鍍材3,且同樣地,該次坩鍋11之內壁與外壁夾設形成夾層111,且於夾層111填充有熱媒介質112。該等鍍材加熱器12係分設於該主坩鍋10及該次坩鍋11外側,以透過熱媒介質102、112均勻加熱該第一鍍材2及該第二鍍材3。其中,該等鍍材加熱器12之熱能係透過熱媒介質102、112進行傳導,熱媒介質102、112可選用導熱性佳之液體或氣體,以於加熱後在夾層101、111內形成流動,將熱能均勻帶往該主坩鍋10及該次坩鍋11各區域,進而達到均勻整體受熱之功效,使該第一鍍材2與該第二鍍材3均溫加熱以形成材料蒸氣,有效維持蒸鍍材料使用率,並可避免受到外界環境影響對該第一鍍材2及該第二鍍材3之加熱效能。 The main crucible 10 is used to carry a first plating material 2, and the inner wall and the outer wall of the main crucible 10 are sandwiched to form an interlayer 101, and the interlayer 101 is filled with a heat medium 102. The secondary crucible 11 is provided to carry a second plating material 3, and similarly, the inner wall and the outer wall of the secondary crucible 11 are sandwiched to form an interlayer 111, and the interlayer 111 is filled with a heat medium 112. The plated material heaters 12 are separately arranged outside the main crucible 10 and the secondary crucible 11 to uniformly heat the first plated material 2 and the second plated material 3 through the heat media 102, 112. Among them, the heat energy of the plated material heater 12 is conducted through the thermal media 102, 112, and the thermal media 102, 112 can be selected liquid or gas with good thermal conductivity to form a flow in the interlayer 101, 111 after heating, The heat energy is evenly brought to each area of the main crucible 10 and the secondary crucible 11, so as to achieve the effect of uniform overall heating, so that the first plating material 2 and the second plating material 3 are heated at a uniform temperature to form a material vapor, which is effective The utilization rate of the vapor deposition material is maintained, and the heating performance of the first plating material 2 and the second plating material 3 affected by the external environment can be avoided.

該蒸鍍腔體13設於該主坩鍋10及該次坩鍋11一側,且具有一線性蒸鍍口131,該蒸鍍腔體13內部具有一導流空間132與一加熱空間133,且該蒸鍍腔體13對應該加熱空間133設有一蒸鍍加熱器134,以使該加熱空間133之溫度高於該 導流空間132之溫度。該加熱空間133供以導入該第一鍍材2之蒸氣,該導流空間132供以導入該第二鍍材3之蒸氣,並該第一鍍材2之蒸氣與該第二鍍材3之蒸氣係一併自該線性蒸鍍口131向外流出。由於該蒸鍍腔體13內部分隔形成該導流空間132與該加熱空間133,以分別導入該第一鍍材2及該第二鍍材3之蒸氣,因此即可因應該第一鍍材2與該第二鍍材3之材料特性,提供具不同溫度之空間,使該第一鍍材2及該第二鍍材3之蒸氣不會相互干涉,可順利一併自該線性蒸鍍口131流出進行鍍膜製程,提升後續製備薄膜之均勻度,同時防止因該第一鍍材2與該第二鍍材3之蒸發溫度有所差異而產生之熱裂解失效情況,尤其在選用之該第一鍍材2與該第二鍍材3之蒸發溫度差異極大的情況下,該多鍍材線性蒸鍍裝置1更可發揮其效能,有效地防止前述各種影響發光層薄膜均勻性之情況發生。此外,透過該蒸鍍腔體13使該第一鍍材2與該第二鍍材3之蒸氣一併由該線性蒸鍍口131流出進行蒸鍍,係可有效避免如習知技術受多組獨立線源擺放位置與噴發角度相互干涉,進而影響後續製備薄膜均勻度之情況。 The vapor deposition chamber 13 is provided on one side of the main crucible 10 and the secondary crucible 11, and has a linear vapor deposition port 131. The vapor deposition chamber 13 has a diversion space 132 and a heating space 133, Moreover, the vapor deposition chamber 13 is provided with a vapor deposition heater 134 corresponding to the heating space 133, so that the temperature of the heating space 133 is higher than the temperature of the diversion space 132. The heating space 133 is used for introducing steam of the first plating material 2, the diversion space 132 is used for introducing steam of the second plating material 3, and the steam of the first plating material 2 and the second plating material 3 The steam flows out from the linear vapor deposition port 131 together. Since the evaporation cavity 132 and the heating space 133 are formed separately to introduce the vapor of the first plating material 2 and the second plating material 3, respectively, the first plating material 2 With the material characteristics of the second plating material 3, a space with different temperatures is provided, so that the vapors of the first plating material 2 and the second plating material 3 will not interfere with each other, and the linear vapor deposition port 131 can be smoothly and collectively The coating process is carried out to improve the uniformity of the subsequent film preparation, and at the same time prevent the thermal cracking failure caused by the difference in the evaporation temperature of the first plating material 2 and the second plating material 3, especially in the selection of the first In the case where the difference in the evaporation temperature between the plating material 2 and the second plating material 3 is extremely large, the multi-plating material linear vapor deposition device 1 can further exert its effectiveness, effectively preventing the aforementioned various conditions that affect the uniformity of the light-emitting layer film. In addition, the vapor of the first plating material 2 and the second plating material 3 flows out of the linear evaporation port 131 through the evaporation cavity 13 for evaporation, which can effectively avoid multiple sets of conventional techniques. The position of the independent line source interferes with the eruption angle, which in turn affects the uniformity of the subsequent film preparation.

較佳者,該蒸鍍加熱器134係設於該蒸鍍腔體13內部,藉此可有效防止該蒸鍍加熱器134受外部環境影響而增加熱能損耗,以提升加熱效能使該加熱空間133維持於所需溫度。此外,為進一步增強隔熱效能,該蒸鍍腔體13內更具有複數絕熱板135,該等絕熱板135對應該蒸鍍腔體13側面設置 並為間隔排列,各相鄰之該等絕熱板135並夾設形成一真空層1351,藉此透過該等絕熱板135與其間之真空狀態,係可有效阻絕熱能經由傳遞而逸失至外界,降低該蒸鍍加熱器134之作功熱損,避免該加熱空間133冷卻影響該第一鍍材2之蒸氣狀態。於本實施例中,係以該等絕熱板135對應於該加熱空間132內表面設置為例,惟其設置方式並不以此為限,甚可藉由該等絕熱板135之擺放態樣而進一步防止該加熱空間133之溫度影響該導流空間132之溫度。 Preferably, the vaporization heater 134 is disposed inside the vaporization chamber 13, thereby effectively preventing the vaporization heater 134 from being affected by the external environment and increasing heat energy loss, so as to improve heating efficiency and make the heating space 133 Maintain at the required temperature. In addition, in order to further enhance the thermal insulation performance, the vapor deposition chamber 13 further has a plurality of heat insulation plates 135, the heat insulation plates 135 are arranged on the side of the vapor deposition chamber 13 and are arranged at intervals, each of the adjacent heat insulation plates 135 is interposed to form a vacuum layer 1351, through which the heat insulation plate 135 and the vacuum state between them can effectively prevent the heat energy from escaping to the outside through transmission, reduce the work heat loss of the evaporation heater 134, and avoid The cooling of the heating space 133 affects the vapor state of the first plating material 2. In this embodiment, the heat-insulating plates 135 are arranged corresponding to the inner surface of the heating space 132 as an example, but the arrangement method is not limited to this, even by the arrangement of the heat-insulating plates 135 It further prevents the temperature of the heating space 133 from affecting the temperature of the diversion space 132.

於本實施例中,該多鍍材線性蒸鍍裝置1更具有複數溫控組件14,其分別與該鍍材加熱器12連接設置以依據該第一鍍材2及該第二鍍材3控制對應之該等鍍材加熱器12溫度。由於OLED發光層係由不同之發光材料蒸鍍構成,依循不同的蒸鍍材料特性,其所需的蒸發溫度亦不盡相同,因此基於該第一鍍材2與該第二鍍材3的特性,透過各該溫控組件14即可控制對應之該等鍍材加熱器12依據所需的升溫曲線適切地對該第一鍍材2及該第二鍍材3進行加熱。 In this embodiment, the multi-plating material linear vapor deposition device 1 further has a plurality of temperature control components 14 which are respectively connected to the plating material heater 12 to control according to the first plating material 2 and the second plating material 3 Corresponding to the temperature of the plated material heaters 12. Since the OLED light-emitting layer is formed by vapor deposition of different luminescent materials, according to different vapor deposition material characteristics, the required evaporation temperature is also different, so based on the characteristics of the first plating material 2 and the second plating material 3 Through the temperature control components 14, the corresponding plated material heaters 12 can be controlled to appropriately heat the first plated material 2 and the second plated material 3 according to the required heating curve.

進一步地,該多鍍材線性蒸鍍裝置1更具有複數壓力偵測器15,其分別與該主坩鍋10及該次坩鍋11連接設置,以偵測該主坩鍋10及該次坩鍋11內部之壓力值,藉此即可精準地控制該第一鍍材2及該第二鍍材3之蒸發量,進而使兩者以預期比例形成發光層薄膜,且可保持發光層薄膜之材料分布均一性。例如,當該第一鍍材2與該第二鍍材3分別屬 於構成發光層薄膜之主發光體(Host)與摻雜物(Dopant)時,利用該等壓力偵測器15隨時監控兩者之壓力進而得知其蒸發狀態,進一步可藉此調整屬於摻雜物之該第一鍍材2或該第二鍍材3的蒸發百分比,以使製備的發光層薄膜具有所需的摻雜比例。此外,於本實施例中,係使該主坩鍋10之飽和蒸汽壓力大於該加熱空間133之背景壓力,該次坩鍋11之飽和蒸氣壓力大於該導流空間132之背景壓力,維持壓力大小於前述條件,則可確保該第一鍍材2之蒸氣與該第二鍍材3之蒸氣,分別穩定持續地流往該加熱空間133與該導流空間132內,以穩定整體蒸鍍製程。除了前述的壓力條件,當該多鍍材線性蒸鍍裝置1針對基材進行鍍膜時,亦可調整使該蒸鍍腔體13內部之蒸氣壓力大於基材所設置之腔體內部環境壓力,利用壓差使該第一鍍材2與該第二鍍材3之蒸氣由該線性蒸鍍口131流出時具有高指向性。 Further, the multi-plating material linear vapor deposition device 1 further has a plurality of pressure detectors 15 respectively connected to the main crucible 10 and the secondary crucible 11 to detect the primary crucible 10 and the secondary crucible The pressure value inside the pot 11 can accurately control the evaporation amount of the first plating material 2 and the second plating material 3, so that the two can form a light-emitting layer film in a desired ratio, and can maintain the light-emitting layer film Uniform material distribution. For example, when the first plating material 2 and the second plating material 3 belong to the main luminous body (Host) and the dopant (Dopant) constituting the light emitting layer film, the pressure detector 15 is used to monitor both at any time The pressure is then used to know the evaporation state, and the evaporation percentage of the first plating material 2 or the second plating material 3 belonging to the dopant can be adjusted to make the prepared luminescent layer film have the required doping ratio . In addition, in this embodiment, the saturated vapor pressure of the primary crucible 10 is greater than the background pressure of the heating space 133, and the saturated vapor pressure of the secondary crucible 11 is greater than the background pressure of the diversion space 132 to maintain the pressure level Under the foregoing conditions, the steam of the first plating material 2 and the steam of the second plating material 3 can be stably and continuously flowed into the heating space 133 and the diversion space 132, respectively, to stabilize the overall vapor deposition process. In addition to the aforementioned pressure conditions, when the multi-plating material linear vapor deposition device 1 performs coating on a substrate, the vapor pressure inside the vapor deposition chamber 13 may be adjusted to be greater than the ambient pressure inside the cavity provided by the substrate. The pressure difference makes the vapor of the first plating material 2 and the second plating material 3 flow out from the linear vapor deposition port 131 with high directivity.

當蒸鍍製備OLED發光層薄膜時,係將該第一鍍材2置於該主坩鍋10內,該第二鍍材3置於該次坩鍋11內,並透過該等溫控組件14分別依據該第一鍍材2與該第二鍍材3之材料特性,控制對應之該等鍍材加熱器12進行加熱。該第一鍍材2與該第二鍍材3加熱後形成之蒸氣分別流往該加熱空間133與該導流空間132內,由於該第一鍍材2之蒸氣溫度較高,透過該蒸鍍加熱器134即可使該加熱空間133保持所需溫度,防止該第一鍍材2之蒸氣凝結,而較低溫之該第二鍍材3蒸氣 則流往該導流空間132內,最後與該第一鍍材2蒸氣一併自該線性蒸鍍口131流出以製備OLED發光層薄膜。並在蒸鍍製程中,透過前述之壓力偵測器15可隨時得知該第一鍍材2與該第二鍍材3之蒸發狀況,利於隨時調整該第一鍍材2與該第二鍍材3蒸發量,有效控制兩者於發光層薄膜之比例,且提升發光層薄膜之整體均勻度。 When the OLED luminescent layer film is prepared by vapor deposition, the first plating material 2 is placed in the primary crucible 10, the second plating material 3 is placed in the secondary crucible 11, and passes through the temperature control components 14 According to the material characteristics of the first plating material 2 and the second plating material 3, the corresponding plating material heaters 12 are controlled to heat. The steam formed by heating the first plating material 2 and the second plating material 3 flows into the heating space 133 and the deflector space 132 respectively. Since the steam temperature of the first plating material 2 is high, the vapor plating passes through The heater 134 can maintain the heating space 133 at a desired temperature to prevent the steam of the first plating material 2 from condensing, and the steam of the second plating material 3 at a lower temperature flows into the diversion space 132, and finally The vapor of the first plating material 2 flows out from the linear evaporation port 131 together to prepare an OLED light emitting layer film. During the vapor deposition process, the evaporation status of the first plating material 2 and the second plating material 3 can be known at any time through the aforementioned pressure detector 15, which is convenient for adjusting the first plating material 2 and the second plating material at any time The evaporation amount of the material 3 can effectively control the ratio of the two to the light-emitting layer film, and improve the overall uniformity of the light-emitting layer film.

請繼續參閱第3圖,其係為本發明之多鍍材線性蒸鍍裝置較佳實施例另一實施態樣之裝置示意圖。於本實施態樣中,該蒸鍍腔體13內設有一加熱室136,該加熱空間133並由該加熱室136框圍而成,且該蒸鍍加熱器134係環設於該加熱室136外側,於此係揭示該透過該加熱室136分隔出該加熱空間133與該導流空間132之另種該蒸鍍腔體13結構態樣,藉此可更為完整地於該蒸鍍腔體13內部區隔該加熱空間133與該導流空間132,且該蒸鍍加熱器134亦屬設置於該蒸鍍腔體13內,同樣可有效防止熱能逸失進而具有極高之加熱效率。 Please continue to refer to FIG. 3, which is a schematic diagram of another embodiment of the preferred embodiment of the multi-plating material linear vapor deposition device of the present invention. In this embodiment, a heating chamber 136 is provided in the vapor deposition chamber 13, the heating space 133 is framed by the heating chamber 136, and the vapor deposition heater 134 is looped around the heating chamber 136 Outside, it is disclosed here that another structure of the vapor deposition chamber 13 that separates the heating space 133 and the diversion space 132 through the heating chamber 136 can be more complete in the vapor deposition chamber 13 internally separates the heating space 133 and the diversion space 132, and the vapor deposition heater 134 is also disposed in the vapor deposition chamber 13, which can also effectively prevent heat energy from escaping and thus have extremely high heating efficiency.

綜上所述,本發明之多鍍材線性蒸鍍裝置係透過於該主坩鍋及該次坩鍋設置夾層與熱媒介質的方式,提高該第一鍍材與該第二鍍材的受熱均勻性,防止加熱不均導致部分蒸氣產生凝結現象。並且,透過該加熱空間與該導流空間的設置,使該蒸鍍腔體可同時導入具相異溫度之蒸鍍材料蒸氣,防止蒸氣彼此干涉進而降低製備薄膜均勻性造成熱裂解失效等情況發生。尤對普遍以具有蒸發溫度差異甚鉅之各種 發光材料製備而成的OLED發光層薄膜,透過本發明之多鍍材線性蒸鍍裝置係可有效大幅提升蒸鍍製成的薄膜均勻性。此外,透過將該蒸鍍加熱器設於該蒸鍍腔體內部以及該等絕熱板之設置,係可達到防止熱能逸失之功效,進而可提升該蒸鍍加熱器之加熱效能,並使該加熱空間維持於所需溫度。進一步地,本發明之多鍍材線性蒸鍍裝置係可透過該等溫控組件及該等壓力偵測器,以因應不同的材料控制該等鍍材加熱器以提供所需升溫曲線,並隨時監控該主坩鍋與該次坩鍋之壓力狀態,而利於調整該第一鍍材與該第二鍍材之蒸發狀態,使製備的發光層薄膜具有預期的材料比例且具有極佳之均勻性。 In summary, the multi-plating material linear vapor deposition device of the present invention improves the heating of the first plating material and the second plating material by providing a sandwich layer and a heat medium in the main crucible and the secondary crucible Uniformity to prevent condensation of some vapors caused by uneven heating. In addition, through the arrangement of the heating space and the diversion space, the vapor deposition chamber can simultaneously introduce vapors of vapor deposition materials with different temperatures to prevent the vapors from interfering with each other to reduce the uniformity of the prepared film and cause thermal cracking failure. . Especially for the OLED light-emitting layer film generally prepared with various luminescent materials with very large evaporation temperature differences, the multi-plating material linear evaporation device of the present invention can effectively greatly improve the uniformity of the film made by evaporation. In addition, by arranging the vaporization heater inside the vaporization cavity and the arrangement of the heat-insulating plates, the effect of preventing heat energy from escaping can be achieved, and the heating efficiency of the vaporization heater can be improved, and the heating The space is maintained at the required temperature. Further, the multi-plating material linear vapor deposition device of the present invention can control the plating material heaters according to different materials to provide the required heating curve through the temperature control components and the pressure detectors, and at any time Monitor the pressure state of the primary crucible and the secondary crucible, and facilitate the adjustment of the evaporation state of the first plating material and the second plating material, so that the prepared luminescent layer film has the expected material ratio and has excellent uniformity .

上述之實施例僅為例示性說明本發明之特點及其功效,而非用於限制本發明之實質技術內容的範圍。任何熟習此技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修飾與變化。因此,本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above-mentioned embodiments are only illustrative of the characteristics and effects of the present invention, rather than limiting the scope of the essential technical content of the present invention. Anyone who is familiar with this skill can modify and change the above embodiments without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the rights of the present invention should be as listed in the scope of patent application mentioned later.

1‧‧‧多鍍材線性蒸鍍裝置 1‧‧‧Multi-plate material linear vapor deposition device

10‧‧‧主坩鍋 10‧‧‧Main crucible

101‧‧‧夾層 101‧‧‧ Mezzanine

102‧‧‧熱媒介質 102‧‧‧Hot media

11‧‧‧次坩鍋 11‧‧‧ times crucible

111‧‧‧夾層 111‧‧‧ Mezzanine

112‧‧‧熱媒介質 112‧‧‧Hot medium

12‧‧‧鍍材加熱器 12‧‧‧ Plated material heater

13‧‧‧蒸鍍腔體 13‧‧‧Evaporation chamber

131‧‧‧線性蒸鍍口 131‧‧‧Linear evaporation port

132‧‧‧導流空間 132‧‧‧Diversion space

133‧‧‧加熱空間 133‧‧‧Heating space

134‧‧‧蒸鍍加熱器 134‧‧‧Evaporation heater

135‧‧‧絕熱板 135‧‧‧Insulation board

1351‧‧‧真空層 1351‧‧‧Vacuum layer

14‧‧‧溫控組件 14‧‧‧Temperature control components

15‧‧‧壓力偵測器 15‧‧‧pressure detector

Claims (6)

一種多鍍材線性蒸鍍裝置,用於製備具有相異蒸發溫度之各種發光材料的OLED發光層薄膜,係包括:一主坩鍋,其內壁與外壁夾設形成夾層,並於夾層填充有熱媒介質,該主坩鍋供以承載一第一鍍材;一次坩鍋,其內壁與外壁夾設形成夾層,並於夾層填充有熱媒介質,該次坩鍋供以承載一第二鍍材;複數鍍材加熱器,分設於該主坩鍋及該次坩鍋外側,以透過熱媒介質均勻加熱該第一鍍材及該第二鍍材;以及一蒸鍍腔體,設於該主坩鍋及該次坩鍋一側並具有一線性蒸鍍口,該蒸鍍腔體內部具有一導流空間與一加熱空間,且該蒸鍍腔體內部對應該加熱空間設有一蒸鍍加熱器,以使該加熱空間之溫度高於該導流空間之溫度,該蒸鍍腔體內設有一加熱室,該加熱空間並由該加熱室框圍形成,且該蒸鍍加熱器係環設於該加熱室外側,藉此係可更完整地區隔該加熱空間與該導流空間;該加熱空間供以導入該第一鍍材之蒸氣,該導流空間供以導入該第二鍍材之蒸氣,該第一鍍材之蒸氣的溫度高於該第二鍍材之蒸氣,該蒸鍍腔體同時導入該二相異溫度之蒸氣,並使該第一鍍材之蒸氣與該第二鍍材之蒸氣一併自該線性蒸鍍口向外流出。 A multi-plating material linear evaporation device for preparing OLED luminescent layer films of various luminescent materials with different evaporation temperatures includes: a main crucible whose inner wall and outer wall are interposed to form an interlayer, and the interlayer is filled with For the heat medium, the primary crucible is used to carry a first plating material; the primary crucible is sandwiched between the inner wall and the outer wall to form an interlayer, and the interlayer is filled with a heat medium, and the secondary crucible is used to carry a second Plated materials; plural plated material heaters, which are arranged outside the main crucible and the secondary crucible, to uniformly heat the first plated material and the second plated material through the heat medium; and a vapor deposition chamber, provided A linear vapor deposition port is provided on one side of the main crucible and the secondary crucible. The vapor deposition chamber has a diversion space and a heating space, and the vapor deposition chamber is provided with a steam corresponding to the heating space. A plating heater so that the temperature of the heating space is higher than the temperature of the diversion space, a heating chamber is provided in the evaporation chamber, the heating space is formed by the heating chamber frame, and the evaporation heater loop It is arranged outside the heating room, so that the heating space and the diversion space can be more completely separated; the heating space is used to introduce steam of the first plating material, and the diversion space is used to introduce the second plating material Steam, the temperature of the steam of the first plating material is higher than the steam of the second plating material, the vaporization chamber simultaneously introduces the steam of two different temperatures, and makes the steam of the first plating material and the second The vapor of the plating material flows out from the linear evaporation port together. 如請求項1所述之多鍍材線性蒸鍍裝置,其中該蒸鍍腔體內更具有複數絕熱板,該等絕熱板對應該蒸鍍腔體側面設 置,並為間隔排列,各相鄰之該等絕熱板係夾設形成一真空層。 The multi-material linear vapor deposition device according to claim 1, wherein the vapor deposition chamber further has a plurality of heat insulation plates, and the heat insulation plates correspond to the side of the vapor deposition chamber It is arranged and arranged at intervals, and the adjacent insulation boards are sandwiched to form a vacuum layer. 如請求項2所述之多鍍材線性蒸鍍裝置,其中更具有複數溫控組件,分別與該鍍材加熱器連接設置、以依據該第一鍍材及該第二鍍材控制對應之該等鍍材加熱器溫度。 The multi-plating material linear vapor deposition device according to claim 2, further comprising a plurality of temperature control components, which are respectively connected to the plating material heater and set to control the corresponding corresponding to the first plating material and the second plating material Wait for the temperature of the plated material heater. 如請求項2所述之多鍍材線性蒸鍍裝置,其中更具有複數壓力偵測器,分別與該主坩鍋及該次坩鍋連接設置、以偵測該主坩鍋及該次坩鍋內部之壓力值。 The multi-plating material linear vapor deposition device as described in claim 2, further comprising a plurality of pressure detectors respectively connected to the main crucible and the secondary crucible to detect the main crucible and the secondary crucible Internal pressure value. 如請求項2所述之多鍍材線性蒸鍍裝置,其中該主坩鍋之飽和蒸氣壓力係大於該加熱空間之背景壓力,該次坩鍋之飽和蒸氣壓力係大於該導流空間之背景壓力。 The multi-material linear vapor deposition device as described in claim 2, wherein the saturated vapor pressure of the main crucible is greater than the background pressure of the heating space, and the saturated vapor pressure of the secondary crucible is greater than the background pressure of the diversion space . 如請求項1所述之多鍍材線性蒸鍍裝置,其中該熱媒介質係為導熱油、醇類、碳氫化合物、汞、水或其他種類之導熱介質。 The multi-plating material linear vapor deposition device as described in claim 1, wherein the heat medium is heat conduction oil, alcohol, hydrocarbon, mercury, water or other kinds of heat conduction medium.
TW105144013A 2016-12-30 2016-12-30 Multi-plate material linear vapor deposition device TWI691609B (en)

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Publication number Priority date Publication date Assignee Title
WO2011074551A1 (en) * 2009-12-18 2011-06-23 平田機工株式会社 Vacuum deposition method and vacuum deposition apparatus
CN104962864A (en) * 2015-07-23 2015-10-07 京东方科技集团股份有限公司 Crucible device and vapor deposition apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011074551A1 (en) * 2009-12-18 2011-06-23 平田機工株式会社 Vacuum deposition method and vacuum deposition apparatus
CN104962864A (en) * 2015-07-23 2015-10-07 京东方科技集团股份有限公司 Crucible device and vapor deposition apparatus

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