TWI676038B - Dynamic characteristic test device and dynamic characteristic test method - Google Patents

Dynamic characteristic test device and dynamic characteristic test method Download PDF

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TWI676038B
TWI676038B TW105108880A TW105108880A TWI676038B TW I676038 B TWI676038 B TW I676038B TW 105108880 A TW105108880 A TW 105108880A TW 105108880 A TW105108880 A TW 105108880A TW I676038 B TWI676038 B TW I676038B
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switch
semiconductor
diode
current
transistor
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TW201641947A (en
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坂本陽一
Yoichi Sakamoto
瀧田伸幸
Nobuyuki Takita
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日商新東工業股份有限公司
Sintokogio, Ltd.
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Abstract

本發明之動態特性測試裝置具有:電源;電抗器;選擇電路,其具有電性串聯連接之第1、第2開關部、電性並聯連接於第1開關部之第3二極體、及電性並聯連接於第2開關部之第4二極體,且用於將第1半導體或第2半導體選為開關測定對象;第3開關部,其切換自電源對第1半導體或第2半導體之電流之供給及阻斷;及控制裝置,其切換控制各開關部之接通狀態及斷開狀態。將第1、第2半導體電性連接之第1連接部、與將第1、第2開關部電性連接之第2連接部係經由電抗器而電性連接。控制裝置係於開始第1半導體之開關測定時,將第2、第3開關部設為接通狀態,相應於第1半導體之開關測定之結束而將第2開關部設為斷開狀態後,將第3開關部設為斷開狀態。 The dynamic characteristic test device of the present invention includes: a power source; a reactor; and a selection circuit having a first and a second switching portion electrically connected in series, a third diode electrically connected in parallel to the first switching portion, and an electric circuit. The second diode is connected in parallel to the fourth diode of the second switching unit, and is used to select the first semiconductor or the second semiconductor as the measurement object of the switch. The third switching unit is switched from the power supply to the first semiconductor or the second semiconductor. Supply and interruption of current; and a control device that switches and controls the ON state and OFF state of each switch section. The first connection portion electrically connecting the first and second semiconductors and the second connection portion electrically connecting the first and second switching portions are electrically connected through a reactor. When the control device starts the switch measurement of the first semiconductor, the second and third switch sections are turned on, and after the switch measurement of the first semiconductor is completed, the second switch section is turned off. The third switch section is turned off.

Description

動態特性測試裝置及動態特性測試方法 Dynamic characteristic test device and method

本揭示係關於一種動態特性測試裝置及動態特性測試方法。 The present disclosure relates to a dynamic characteristic test device and a dynamic characteristic test method.

先前以來,作為絕緣閘型雙極電晶體(IGBT:Insulated Gate Bipolar Transistor)等之功率半導體模組之檢查,係進行動態特性(AC:Alternating Current:交流電流)測試(例如參照專利文獻1)。例如,專利文獻1所記載之測試裝置係使用高壓電源對電容器進行充電,於電容器被充電之狀態下進行開關測定。 In the past, inspections of power semiconductor modules such as insulated gate bipolar transistors (IGBTs) have been performed with dynamic characteristic (AC: Alternating Current) tests (for example, see Patent Document 1). For example, the test device described in Patent Document 1 uses a high-voltage power source to charge a capacitor, and performs a switch measurement while the capacitor is charged.

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2013-160572號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2013-160572

於先前之測試裝置中,因蓄積於電容器之能量係於動態特性測試電路中被消耗,故於每次進行開關測試時,必須使用高壓電源對電容器進行充電。因此,隨著動態特性測試之進行,電力使用量增加。 In the previous test device, since the energy accumulated in the capacitor was consumed in the dynamic characteristic test circuit, the capacitor must be charged with a high-voltage power supply every time a switch test is performed. Therefore, as the dynamic characteristic test is performed, the amount of power used increases.

於本技術領域中,期望減少動態特性測試之電力使用量。 In the art, it is desirable to reduce the amount of power used for dynamic characteristics testing.

本發明之一形態之動態特性測試裝置係進行被測試器件之動態特性測試者,該被測試器件包含電性串聯連接之第1半導體及第2半導體、電性並聯連接於第1半導體之第1二極體、及電性並聯連接於第2 半導體之第2二極體。該動態特性測試裝置包含:電源,其供給用於動態特性測試之電流,且可充電;電抗器,其成為第1半導體及第2半導體之負載;選擇電路,其具有電性串聯連接之第1開關部、第2開關部、電性並聯連接於第1開關部之第3二極體、及電性並聯連接於第2開關部之第4二極體,且用於將第1半導體及第2半導體中之任一者選為開關測定對象;第3開關部,其切換自電源對第1半導體或第2半導體之電流之供給及阻斷;及控制裝置,其切換控制第1開關部、第2開關部及第3開關部之接通狀態及斷開狀態。將第1半導體及第2半導體電性連接之第1連接部、與將第1開關部及第2開關部電性連接之第2連接部係經由電抗器而電性連接。電源之正極端子電性連接於第1二極體之陰極及第3二極體之陰極,電源之負極端子電性連接於第2二極體之陽極及第4二極體之陽極。控制裝置係於開始第1半導體之開關測定時,將第2開關部及第3開關部設為接通狀態,相應於第1半導體之開關測定之結束而將第2開關部設為斷開狀態後,將第3開關部設為斷開狀態。 A dynamic characteristic test device according to one aspect of the present invention is a dynamic characteristic tester for a device under test. The device under test includes a first semiconductor and a second semiconductor electrically connected in series, and a first semiconductor electrically connected in parallel to the first semiconductor. Diode and electrical connection in parallel The second diode of a semiconductor. The dynamic characteristic testing device includes: a power source that supplies a current for dynamic characteristic testing and is rechargeable; a reactor that becomes a load of the first semiconductor and a second semiconductor; and a selection circuit that has a first electrical series connection The switching section, the second switching section, a third diode electrically connected in parallel to the first switching section, and a fourth diode electrically connected in parallel to the second switching section, and are used to connect the first semiconductor and the first semiconductor. Any one of 2 semiconductors is selected as the measurement target of the switch; the third switch section switches the supply and interruption of the current from the power source to the first semiconductor or the second semiconductor; and a control device that switches and controls the first switch section, The on and off states of the second and third switch sections. The first connection portion electrically connecting the first semiconductor and the second semiconductor and the second connection portion electrically connecting the first switching portion and the second switching portion are electrically connected through a reactor. The positive terminal of the power source is electrically connected to the cathode of the first diode and the cathode of the third diode, and the negative terminal of the power source is electrically connected to the anode of the second diode and the anode of the fourth diode. When the control device starts the switch measurement of the first semiconductor, the second switch section and the third switch section are turned on, and the second switch section is turned off in response to the completion of the switch measurement of the first semiconductor. Then, the third switch section is turned off.

根據該動態特性測試裝置,於開始第1半導體之開關測定時,將第2開關部及第3開關部設為接通狀態,相應於第1半導體之開關測定之結束而將第2開關部設為斷開狀態後,將第3開關部設為斷開狀態。於第1半導體之開關測定時,自電源供給至第1半導體之電流係自第1半導體及第2半導體之第1連接部朝向第1開關部及第2開關部之第2連接部而流動於電抗器中,於結束第1半導體之開關測定之時點,能量蓄積於電抗器中。因此,藉由相應於第1半導體之開關測定結束而將第2開關部設定為斷開狀態,形成自電源之負極端子起經過第2二極體、電抗器、第3二極體及第3開關部而返回至電源之正極端子之電流路徑,蓄積於電抗器之能量作為電流而流動於電源之正極端子。藉此,可回收第1半導體之開關測定中所使用之電源能量(電力)之一部 分。其結果,可減少動態特性測試之電力使用量。再者,於本說明書中,所謂「電性連接」,不僅包含連接對象之2個要素直接連接之情形,亦包含於連接對象之2個要素間,連接有可電性導通之其他要素之情形。作為其他要素,可包含繼電器及電晶體等開關部等。 According to this dynamic characteristic test device, when the switch measurement of the first semiconductor is started, the second switch section and the third switch section are turned on, and the second switch section is set in response to the completion of the switch measurement of the first semiconductor. After being in the off state, the third switch section is turned off. During the measurement of the switch of the first semiconductor, the current supplied from the power source to the first semiconductor flows from the first connection portion of the first semiconductor and the second semiconductor toward the first connection portion and the second connection portion of the second switch portion. In the reactor, when the switching measurement of the first semiconductor is completed, energy is accumulated in the reactor. Therefore, the second switch section is set to the off state according to the completion of the switch measurement of the first semiconductor, and the second diode, the reactor, the third diode, and the third diode are formed to pass from the negative terminal of the power source. In the current path of the switching unit and returning to the positive terminal of the power source, the energy stored in the reactor flows as a current to the positive terminal of the power source. As a result, a part of the power source energy (electricity) used for the switch measurement of the first semiconductor can be recovered. Minute. As a result, it is possible to reduce the amount of power used in the dynamic characteristic test. Furthermore, in this specification, "electrical connection" includes not only the case where two elements of the connection object are directly connected, but also the case where other elements which are electrically conductive are connected between the two elements of the connection object. . Other elements may include a switching unit such as a relay and a transistor.

控制裝置亦可於開始第2半導體之開關測定時,將第1開關部及第3開關部設為接通狀態,且於相應於第2半導體之開關測定之結束而將第1開關部設為斷開狀態後,將第3開關部設為斷開狀態。於該情形時,於第2半導體之開關測定時,自電源供給至第2半導體之電流係自第1開關部及第2開關部之第2連接部朝向第1半導體及第2半導體之第1連接部而流動於電抗器中,於結束第2半導體之開關測定之時點,能量蓄積於電抗器中。因此,藉由相應於第2半導體之開關測定之結束而將第1開關部設定為斷開狀態,形成自電源之負極端子經過第4二極體、電抗器、第1二極體及第3開關部而返回至電源之正極端子之電流路徑,蓄積於電抗器之能量作為電流而流動於電源之正極端子。藉此,可回收第2半導體之開關測定中使用之電源能量(電力)之一部分。其結果,可進一步減少動態特性測試之電力使用量。 The control device may also set the first switch section and the third switch section to the ON state when starting the switch measurement of the second semiconductor, and set the first switch section to the end of the switch measurement corresponding to the second semiconductor. After the OFF state, the third switch section is set to the OFF state. In this case, during the measurement of the switch of the second semiconductor, the current supplied from the power source to the second semiconductor is from the first switch portion and the second connection portion of the second switch portion toward the first semiconductor and the second semiconductor first portion. The connection portion flows into the reactor, and at the time when the switching measurement of the second semiconductor is completed, energy is accumulated in the reactor. Therefore, the first switch section is set to the off state according to the end of the switch measurement of the second semiconductor, and the negative terminal formed from the power source passes through the fourth diode, the reactor, the first diode, and the third In the current path of the switching unit and returning to the positive terminal of the power source, the energy stored in the reactor flows as a current to the positive terminal of the power source. As a result, a part of the power source energy (electricity) used for the switch measurement of the second semiconductor can be recovered. As a result, it is possible to further reduce the power consumption of the dynamic characteristic test.

第1開關部及第2開關部可為電晶體。於該情形時,可高速地切換第1開關部及第2開關部之接通狀態與斷開狀態,可提高開關測定之精度。 The first switch portion and the second switch portion may be transistors. In this case, the on-state and off-state of the first switch section and the second switch section can be switched at high speed, and the accuracy of the switch measurement can be improved.

本發明之進而另一形態之動態特性測試方法係進行被測試器件之動態特性測試者,該被測試器件包含電性串聯連接之第1半導體及第2半導體、電性並聯連接於第1半導體之第1二極體、及電性並聯連接於第2半導體之第2二極體。該動態特性測試方法包含以下步驟:藉由將具有電性串聯連接之第1開關部、第2開關部、電性並聯連接於第1開關部之第3二極體、及電性並聯連接於第2開關部之第4二極體之選擇電路之第2開關部設為接通狀態,將第1半導體選為開關測定對象, 藉由將電性串聯連接於可充電之電源之第3開關部設為接通狀態,對第1半導體供給電流,進行第1半導體之開關測定;藉由相應於第1半導體之開關測定之結束,將第2開關部設為斷開狀態,而回收第1半導體之開關測定中使用之能量;及於回收第1半導體之開關測定中使用之能量之步驟之後,將第3開關部設為斷開狀態。將第1半導體及第2半導體電性連接之第1連接部、與將第1開關部及第2開關部電性連接之第2連接部係經由電抗器電性連接。電源之正極端子電性連接於第1二極體之陰極及第3二極體之陰極,電源之負極端子電性連接於第2二極體之陽極及第4二極體之陽極。 According to still another aspect of the present invention, a dynamic characteristic test method is a tester for a dynamic characteristic of a device under test. The device under test includes a first semiconductor and a second semiconductor electrically connected in series and electrically connected in parallel to the first semiconductor. The first diode and the second diode electrically connected in parallel to the second semiconductor. The dynamic characteristic test method includes the following steps: a first switching portion having electrical series connection, a second switching portion, a third diode electrically connected in parallel to the first switching portion, and an electrical parallel connection in The second switch section of the fourth diode selection circuit of the second switch section is turned on, and the first semiconductor is selected as the switch measurement target. The third switch section electrically connected in series to the rechargeable power source is turned on, and the first semiconductor is supplied with current to perform the switch measurement of the first semiconductor. The switch measurement corresponding to the first semiconductor is completed. , The second switch section is turned off, and the energy used in the switch measurement of the first semiconductor is recovered; and after the step of recovering the energy used in the switch measurement of the first semiconductor, the third switch section is turned off On. The first connection portion that electrically connects the first semiconductor and the second semiconductor and the second connection portion that electrically connects the first switch portion and the second switch portion are electrically connected through a reactor. The positive terminal of the power source is electrically connected to the cathode of the first diode and the cathode of the third diode, and the negative terminal of the power source is electrically connected to the anode of the second diode and the anode of the fourth diode.

根據該動態特性測試方法,於開始第1半導體之開關測定時,將第2開關部及第3開關部設為接通狀態,且於相應於第1半導體之開關測定之結束而將第2開關部設為斷開狀態後,將第3開關部設為斷開狀態。於第1半導體之開關測定時,自電源供給至第1半導體之電流係自第1半導體及第2半導體之第1連接部朝向第1開關部及第2開關部之第2連接部而流動於電抗器中,於結束第1半導體之開關測定之時點,能量蓄積於電抗器中。因此,藉由相應於第1半導體之開關測定之結束而將第2開關部設定為斷開狀態,形成自電源之負極端子經過第2二極體、電抗器、第3二極體及第3開關部而返回至電源之正極端子之電流路徑,蓄積於電抗器之能量作為電流而流動於電源之正極端子。藉此,可回收第1半導體之開關測定中使用之電源能量(電力)之一部分。其結果,可減少動態特性測試之電力使用量。 According to this dynamic characteristic test method, when the switch measurement of the first semiconductor is started, the second switch section and the third switch section are turned on, and the second switch is turned on at the end of the switch measurement corresponding to the first semiconductor. After the part is turned off, the third switch part is turned off. During the measurement of the switch of the first semiconductor, the current supplied from the power source to the first semiconductor flows from the first connection portion of the first semiconductor and the second semiconductor toward the first connection portion and the second connection portion of the second switch portion. In the reactor, when the switching measurement of the first semiconductor is completed, energy is accumulated in the reactor. Therefore, the second switch section is set to the off state according to the end of the switch measurement of the first semiconductor, and the negative terminal formed from the power source passes through the second diode, the reactor, the third diode, and the third In the current path of the switching unit and returning to the positive terminal of the power source, the energy stored in the reactor flows as a current to the positive terminal of the power source. As a result, a part of the power source energy (electricity) used for the switch measurement of the first semiconductor can be recovered. As a result, it is possible to reduce the amount of power used in the dynamic characteristic test.

本發明之進而另一形態之動態特性測試方法亦可進而包含以下之步驟:藉由將選擇電路之第1開關部設為接通狀態,將第2半導體選為開關測定對象,藉由將第3開關部設為接通狀態,對第2半導體供給電流,進行第2半導體之開關測定;藉由相應於第2半導體之開關測定之結束,將第1開關部設為斷開狀態,而回收第2半導體之開關測定中 使用之能量;於回收第2半導體之開關測定中使用之能量之步驟之後,將第3開關部設為斷開狀態。於該情形時,於第2半導體之開關測定時,自電源供給至第2半導體之電流係自第1開關部及第2開關部之第2連接部朝向第1半導體及第2半導體之第1連接部而流動於電抗器中,於結束第2半導體之開關測定之時點,能量蓄積於電抗器中。因此,藉由相應於第2半導體之開關測定之結束而將第1開關部設定為斷開狀態,形成自電源之負極端子經過第4二極體、電抗器、第1二極體及第3開關部而返回至電源之正極端子之電流路徑,蓄積於電抗器之能量作為電流而流動於電源之正極端子。藉此,可回收第2半導體之開關測定中使用之電源能量(電力)之一部分。其結果,可減少動態特性測試之電力使用量。 According to yet another aspect of the present invention, the dynamic characteristic test method may further include the following steps: by setting the first switch section of the selection circuit to the on state, selecting the second semiconductor as the switch measurement object, and 3 The switch section is set to the ON state, and a current is supplied to the second semiconductor to perform the switch measurement of the second semiconductor; the switch section is set to the OFF state corresponding to the end of the switch measurement of the second semiconductor, and recovered Switch measurement of the second semiconductor Energy used; after the step of recovering the energy used in the switch measurement of the second semiconductor, the third switch section is turned off. In this case, during the measurement of the switch of the second semiconductor, the current supplied from the power source to the second semiconductor is from the first switch portion and the second connection portion of the second switch portion toward the first semiconductor and the second semiconductor first portion. The connection portion flows into the reactor, and at the time when the switching measurement of the second semiconductor is completed, energy is accumulated in the reactor. Therefore, the first switch section is set to the off state according to the end of the switch measurement of the second semiconductor, and the negative terminal formed from the power source passes through the fourth diode, the reactor, the first diode, and the third In the current path of the switching unit and returning to the positive terminal of the power source, the energy stored in the reactor flows as a current to the positive terminal of the power source. As a result, a part of the power source energy (electricity) used for the switch measurement of the second semiconductor can be recovered. As a result, it is possible to reduce the amount of power used in the dynamic characteristic test.

根據本發明,可減少動態特性測試之電力使用量。 According to the present invention, it is possible to reduce the power consumption of the dynamic characteristic test.

1‧‧‧動態特性測試裝置 1‧‧‧Dynamic characteristic test device

1A‧‧‧動態特性測試裝置 1A‧‧‧Dynamic characteristic test device

10‧‧‧測試電路 10‧‧‧test circuit

10A‧‧‧測試電路 10A‧‧‧Test circuit

11‧‧‧電源電容器(電源) 11‧‧‧Power Capacitor (Power)

12‧‧‧主開關部 12‧‧‧Main switch department

13‧‧‧選擇電路 13‧‧‧Selection circuit

14‧‧‧過電流防止電路 14‧‧‧Overcurrent prevention circuit

15‧‧‧高速阻斷電路 15‧‧‧High-speed blocking circuit

16‧‧‧選擇電路 16‧‧‧Selection circuit

17‧‧‧選擇電路 17‧‧‧Selection circuit

20‧‧‧過電流檢測電路 20‧‧‧ overcurrent detection circuit

21‧‧‧電流感測器 21‧‧‧Current sensor

22‧‧‧電流感測器 22‧‧‧Current sensor

23‧‧‧比較器 23‧‧‧ Comparator

24‧‧‧比較器 24‧‧‧ Comparator

30‧‧‧控制裝置 30‧‧‧Control device

50‧‧‧DUT(被測試器件) 50‧‧‧DUT (device under test)

50A‧‧‧DUT(被測試器件) 50A‧‧‧DUT (device under test)

Cd‧‧‧連接部(第1連接部) Cd‧‧‧ connecting part (first connecting part)

Cs‧‧‧連接部(第2連接部) Cs‧‧‧ connecting part (second connecting part)

D1‧‧‧二極體 D1‧‧‧diode

D2‧‧‧二極體 D2‧‧‧ Diode

D3‧‧‧二極體 D3‧‧‧ Diode

D4‧‧‧二極體 D4‧‧‧ Diode

Dcf‧‧‧二極體 Dcf‧‧‧ Diode

Dcr‧‧‧二極體 Dcr‧‧‧ Diode

Ddn‧‧‧電晶體(第2二極體) Ddn‧‧‧Transistor (second diode)

Ddnu‧‧‧二極體(第2二極體) Ddnu‧‧‧ Diode (2nd Diode)

Dhn‧‧‧電晶體 Dhn‧‧‧ Transistor

Ddnv‧‧‧二極體(第2二極體) Ddnv‧‧‧ Diode (2nd Diode)

Ddnw‧‧‧二極體(第2二極體) Ddnw‧‧‧ Diode (2nd Diode)

Ddp‧‧‧二極體(第1二極體) Ddp‧‧‧Diode (1st Diode)

Ddpu‧‧‧二極體(第1二極體) Ddpu‧‧‧ Diode (1st Diode)

Ddpv‧‧‧二極體(第1二極體) Ddpv‧‧‧ Diode (1st Diode)

Ddpw‧‧‧二極體(第1二極體) Ddpw‧‧‧ Diode (1st Diode)

Dhn‧‧‧二極體(第4二極體) Dhn‧‧‧ Diode (4th Diode)

Dhp‧‧‧二極體(第3二極體) Dhp‧‧‧ Diode (3rd Diode)

Dif‧‧‧二極體 Dif‧‧‧ Diode

Dir‧‧‧二極體 Dir‧‧‧ Diode

Ec‧‧‧能量 Ec‧‧‧Energy

Ic‧‧‧電流 Ic‧‧‧ current

IL‧‧‧電流 IL‧‧‧Current

Iqcf‧‧‧電流 Iqcf‧‧‧Current

Iqcr‧‧‧電流 Iqcr‧‧‧Current

Iqdn‧‧‧電流 Iqdn‧‧‧Current

Iqhp‧‧‧電流 Iqhp‧‧‧Current

Iqp‧‧‧電流 Iqp‧‧‧Current

Iqcf‧‧‧電流 Iqcf‧‧‧Current

Iqcr‧‧‧電流 Iqcr‧‧‧Current

Iqdn‧‧‧電流 Iqdn‧‧‧Current

Iqdp‧‧‧電流 Iqdp‧‧‧Current

Iqif‧‧‧電流 Iqif‧‧‧Current

Iqir‧‧‧電流 Iqir‧‧‧ current

Iqhn‧‧‧電流 Iqhn‧‧‧ current

Iqhp‧‧‧電流 Iqhp‧‧‧Current

Iqp‧‧‧電流 Iqp‧‧‧Current

L‧‧‧電抗器 L‧‧‧ Reactor

N‧‧‧端子 N‧‧‧terminal

O‧‧‧端子 O‧‧‧terminal

P‧‧‧端子 P‧‧‧Terminal

Pn1‧‧‧電流路徑 Pn1‧‧‧ current path

Pn2‧‧‧電流路徑 Pn2‧‧‧ current path

Pn3‧‧‧電流路徑 Pn3‧‧‧ current path

Pn4‧‧‧電流路徑 Pn4‧‧‧ current path

Pn5‧‧‧電流路徑 Pn5‧‧‧ current path

Pn41‧‧‧電流路徑 Pn41‧‧‧ current path

Pn42‧‧‧電流路徑 Pn42‧‧‧ current path

Pn43‧‧‧電流路徑 Pn43‧‧‧Current Path

Pp1‧‧‧電流路徑 Pp1‧‧‧ current path

Pp2‧‧‧電流路徑 Pp2‧‧‧ current path

Pp3‧‧‧電流路徑 Pp3‧‧‧ current path

Pp41‧‧‧電流路徑 Pp41‧‧‧Current Path

Pp42‧‧‧電流路徑 Pp42‧‧‧ current path

Qcf‧‧‧電晶體(第5開關部) Qcf‧‧‧ Transistor (5th Switching Section)

Qcr‧‧‧電晶體(第5開關部) Qcr‧‧‧ Transistor (5th Switching Section)

Qdn‧‧‧電晶體(第2半導體) Qdn‧‧‧ Transistor (Second Semiconductor)

Qdnu‧‧‧電晶體(第2半導體) Qdnu‧‧‧ Transistor (Second Semiconductor)

Qdnv‧‧‧電晶體(第2半導體) Qdnv‧‧‧ Transistor (Second Semiconductor)

Qdnw‧‧‧電晶體(第2半導體) Qdnw‧‧‧ Transistor (Second Semiconductor)

Qdp‧‧‧電晶體(第1半導體) Qdp‧‧‧ Transistor (1st Semiconductor)

Qdpu‧‧‧電晶體(第1半導體) Qdpu‧‧‧ Transistor (1st Semiconductor)

Qdpv‧‧‧電晶體(第1半導體) Qdpv‧‧‧ Transistor (1st Semiconductor)

Qdpw‧‧‧電晶體(第1半導體) Qdpw‧‧‧ Transistor (1st Semiconductor)

Qhn‧‧‧電晶體(第2開關部) Qhn‧‧‧ Transistor (2nd Switching Section)

Qhp‧‧‧電晶體(第1開關部) Qhp‧‧‧ Transistor (1st Switching Section)

Qi‧‧‧電晶體 Qi‧‧‧Transistor

Qif‧‧‧電晶體 Qif‧‧‧ Transistor

Qir‧‧‧電晶體 Qir‧‧‧ Transistor

Qp‧‧‧電晶體(第3開關部) Qp‧‧‧Transistor (3rd Switching Section)

Ref_N‧‧‧過電流閾值 Ref_N‧‧‧Overcurrent threshold

Ref_P‧‧‧過電流閾值 Ref_P‧‧‧Overcurrent threshold

Sqcf‧‧‧閘極信號 Sqcf‧‧‧Gate signal

Sqcr‧‧‧閘極信號 Sqcr‧‧‧Gate signal

Sqdn‧‧‧閘極信號 Sqdn‧‧‧Gate signal

Sqdp‧‧‧閘極信號 Sqdp‧‧‧Gate signal

Sqdnu‧‧‧閘極信號 Sqdnu‧‧‧Gate signal

Sqdnv‧‧‧閘極信號 Sqdnv‧‧‧Gate signal

Sqdnw‧‧‧閘極信號 Sqdnw‧‧‧Gate signal

Sqdpu‧‧‧閘極信號 Sqdpu‧‧‧Gate signal

Sqdpv‧‧‧閘極信號 Sqdpv‧‧‧Gate signal

Sqdpw‧‧‧閘極信號 Sqdpw‧‧‧Gate signal

Sqhn‧‧‧閘極信號 Sqhn‧‧‧Gate signal

Sqhp‧‧‧閘極信號 Sqhp‧‧‧Gate signal

Sqif‧‧‧閘極信號 Sqif‧‧‧Gate signal

Sqir‧‧‧閘極信號 Sqir‧‧‧Gate signal

Sqp‧‧‧閘極信號 Sqp‧‧‧Gate signal

Sswn‧‧‧繼電器信號 Sswn‧‧‧Relay signal

Sswp‧‧‧繼電器信號 Sswp‧‧‧Relay signal

Sswu‧‧‧繼電器信號 Sswu‧‧‧Relay signal

Sswv‧‧‧繼電器信號 Sswv‧‧‧Relay signal

Ssww‧‧‧繼電器信號 Ssww‧‧‧Relay signal

Swn‧‧‧開關 Swn‧‧‧Switch

Swp‧‧‧開關 Swp‧‧‧Switch

Swu‧‧‧開關 Swu‧‧‧Switch

Swv‧‧‧開關 Swv‧‧‧Switch

SWw‧‧‧開關 SWw‧‧‧Switch

圖1係示意性表示一實施形態之動態特性測試裝置之電路圖。 FIG. 1 is a circuit diagram schematically showing a dynamic characteristic test device according to an embodiment.

圖2係圖1之動態特性測試裝置之N側開關測定之時序圖。 FIG. 2 is a timing chart of the N-side switch measurement of the dynamic characteristic test device of FIG. 1. FIG.

圖3係表示圖2之N側開關測定之開關接通時之電流路徑之圖。 FIG. 3 is a diagram showing a current path when a switch measured by the N-side switch of FIG. 2 is turned on.

圖4係表示圖2之N側開關測定之開關斷開時之電流路徑之圖。 FIG. 4 is a diagram showing a current path when the switch measured by the N-side switch of FIG. 2 is turned off.

圖5係表示圖2之N側開關測定之能量回收時之電流路徑之圖。 FIG. 5 is a diagram showing a current path during energy recovery measured by the N-side switch of FIG. 2.

圖6係圖1之動態特性測試裝置之P側開關測定之時序圖。 FIG. 6 is a timing chart of the P-side switch measurement of the dynamic characteristic test device of FIG. 1. FIG.

圖7係表示圖6之P側開關測定之開關接通時之電流路徑之圖。 FIG. 7 is a diagram showing a current path when the switch measured by the P-side switch of FIG. 6 is turned on.

圖8係表示圖6之P側開關測定之開關斷開時之電流路徑之圖。 FIG. 8 is a diagram showing a current path when the switch measured by the P-side switch in FIG. 6 is turned off.

圖9係表示圖6之P側開關測定之能量回收時之電流路徑之圖。 FIG. 9 is a diagram showing a current path during energy recovery measured by the P-side switch of FIG. 6.

圖10係比較例之N側開關測定之時序圖。 FIG. 10 is a timing chart of the N-side switch measurement of the comparative example.

圖11係比較例之P側開關測定之時序圖。 Fig. 11 is a timing chart of the P-side switch measurement of the comparative example.

圖12係包含圖1之動態特性測試裝置之過電流防止處理之N側開 關測定之時序圖。 FIG. 12 is an N-side opening including an overcurrent prevention process of the dynamic characteristic test device of FIG. 1 The timing chart of the measurement.

圖13係表示圖12之N側開關測定之過電流防止處理時之電流路徑之圖。 FIG. 13 is a diagram showing a current path during an overcurrent prevention process measured by the N-side switch of FIG. 12.

圖14係包含圖1之動態特性測試裝置之過電流防止處理之P側開關測定之時序圖。 FIG. 14 is a timing chart of the P-side switch measurement including the overcurrent prevention processing of the dynamic characteristic test device of FIG. 1. FIG.

圖15係表示圖14之P側開關測定之過電流防止處理時之電流路徑之圖。 FIG. 15 is a diagram showing a current path during an overcurrent prevention process measured by the P-side switch of FIG. 14. FIG.

圖16係表示包含使用圖1之動態特性測試裝置之高速阻斷電路之過電流防止處理之N側開關測定之時序圖。 FIG. 16 is a timing chart showing the measurement of an N-side switch including an overcurrent prevention process using a high-speed blocking circuit using the dynamic characteristic test device of FIG. 1. FIG.

圖17係表示使用圖16之N側開關測定之高速阻斷電路之過電流防止處理時之電流路徑之圖。 FIG. 17 is a diagram showing a current path during an overcurrent prevention process of the high-speed blocking circuit measured using the N-side switch of FIG. 16.

圖18係包含使用圖1之動態特性測試裝置之高速阻斷電路之過電流防止處理時之P側開關測定之時序圖。 FIG. 18 is a timing chart of P-side switch measurement during overcurrent prevention processing including the high-speed blocking circuit using the dynamic characteristic test device of FIG. 1. FIG.

圖19係表示使用圖18之P側開關測定之高速阻斷電路之過電流防止處理時之電流路徑之圖。 FIG. 19 is a diagram showing a current path during an overcurrent prevention process of the high-speed blocking circuit measured using the P-side switch of FIG. 18.

圖20係圖1之動態特性測試裝置之N側短路容量測定之時序圖。 FIG. 20 is a timing chart for the measurement of the N-side short-circuit capacity of the dynamic characteristic test device of FIG. 1.

圖21係圖1之動態特性測試裝置之P側短路容量測定之時序圖。 FIG. 21 is a timing chart of the P-side short-circuit capacity measurement of the dynamic characteristic test device of FIG. 1. FIG.

圖22係表示圖1之動態特性測試裝置之變化例之電路圖。 FIG. 22 is a circuit diagram showing a modified example of the dynamic characteristic test device of FIG. 1. FIG.

圖23係表示圖22之動態特性測試裝置之N側開關測定之過電流防止處理時之電流路徑之圖。 FIG. 23 is a diagram showing a current path during an overcurrent prevention process measured by an N-side switch of the dynamic characteristic test device of FIG. 22.

圖24係表示圖22之動態特性測試裝置之P側開關測定之過電流防止處理時之電流路徑之圖。 FIG. 24 is a diagram showing a current path during an overcurrent prevention process measured by a P-side switch of the dynamic characteristic test device of FIG. 22.

圖25(a)、(b)係用於比較圖1之動態特性測試裝置之過電流防止處理與圖22之動態特性測試裝置之過電流防止處理之圖。 25 (a) and (b) are diagrams for comparing the overcurrent prevention processing of the dynamic characteristic test device of FIG. 1 with the overcurrent prevention processing of the dynamic characteristic test device of FIG.

圖26係表示圖1之動態特性測試裝置之另一變化例之電路圖。 FIG. 26 is a circuit diagram showing another modified example of the dynamic characteristic testing device of FIG. 1. FIG.

以下就本發明之實施形態,一面參照圖式一面進行說明。再者,於圖式之說明中,對同一要素標註相同之符號,並省略重複之說明。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. Moreover, in the description of the drawings, the same elements are denoted by the same symbols, and repeated descriptions are omitted.

圖1係示意性表示一實施形態之動態特性測試裝置之電路圖。如圖1所示,動態特性測試裝置1係實施DUT50之動態特性測試之裝置,包含測試電路10、過電流檢測電路20、及控制裝置30。動態特性測試裝置1進行作為動態特性測試之開關測定及短路容量測定(SC測定)等。於開關測定中,可測定IGBT特性及二極體特性。作為IGBT特性,有上升時間、下降時間、接通延遲時間、斷開延遲時間、斷開突波電壓、閘極電荷、接通損失及斷開損失等。作為二極體特性,有逆向恢復時間、逆向恢復電流、及逆向恢復能量等。 FIG. 1 is a circuit diagram schematically showing a dynamic characteristic test device according to an embodiment. As shown in FIG. 1, the dynamic characteristic test device 1 is a device that performs a dynamic characteristic test of the DUT 50, and includes a test circuit 10, an overcurrent detection circuit 20, and a control device 30. The dynamic characteristic test device 1 performs switch measurement, short-circuit capacity measurement (SC measurement), and the like as a dynamic characteristic test. In switching measurement, IGBT characteristics and diode characteristics can be measured. As IGBT characteristics, there are rise time, fall time, turn-on delay time, turn-off delay time, turn-off surge voltage, gate charge, turn-on loss and turn-off loss. Diode characteristics include reverse recovery time, reverse recovery current, and reverse recovery energy.

DUT50係動態特性測試裝置1之被測試器件,其包含電性串聯連接之2個半導體元件之2in1類型之功率半導體模組。具體而言,DUT50包含電晶體Qdp、Qdn(第1半導體、第2半導體)、二極體Ddp、Ddn。電晶體Qdp、Qdn係IGBT。電晶體Qdp之射極與電晶體Qdn之集極相互電性連接。於電晶體Qdp、Qdn之集極,分別電性連接有二極體Ddp、Ddn之陰極,於電晶體Qdp、Qdn之射極,分別電性連接有二極體Ddp、Ddn之陽極。即,電晶體Qdp、Qdn係於相同之方向電性串聯連接,二極體Ddp係電性並聯連接於電晶體Qdp之回流二極體,二極體Ddn係電性並聯連接於電晶體Qdn之回流二極體。DUT50具有P端子、O端子及N端子。P端子電性連接於電晶體Qdp之集極及二極體Ddp之陰極,N端子電性連接於電晶體Qdn之射極及二極體Ddn之陽極,O端子電性連接於電晶體Qdp之射極、電晶體Qdn之集極、二極體Ddp之陽極及二極體Ddn之陰極。即,O端子電性連接於將電晶體Qdp、Qdn電性連接之連接部Cd(第1連接部)。例如,DUT50可使用於1相之逆變器電路,電晶體Qdp可使用於上橋臂,電晶體Qdn可使用於 下橋臂。 The DUT50 is a device under test of the dynamic characteristic test device 1, which includes a 2in1 type power semiconductor module of two semiconductor elements electrically connected in series. Specifically, the DUT 50 includes transistors Qdp and Qdn (first semiconductor and second semiconductor), and diodes Ddp and Ddn. The transistors Qdp and Qdn are IGBTs. The emitter of the transistor Qdp and the collector of the transistor Qdn are electrically connected to each other. The cathodes of the diodes Ddp and Ddn are electrically connected to the collectors of the transistors Qdp and Qdn, and the anodes of the diodes Ddp and Ddn are electrically connected to the emitters of the transistors Qdp and Qdn, respectively. That is, the transistors Qdp and Qdn are electrically connected in series in the same direction, the diode Ddp is electrically connected in parallel to the return diode of the transistor Qdp, and the diode Ddn is electrically connected in parallel to the transistor Qdn. Reflux diode. The DUT50 has a P terminal, an O terminal, and an N terminal. The P terminal is electrically connected to the collector of the transistor Qdp and the cathode of the diode Ddp, the N terminal is electrically connected to the emitter of the transistor Qdn and the anode of the diode Ddn, and the O terminal is electrically connected to the transistor Qdp Emitter, collector of transistor Qdn, anode of diode Ddp, and cathode of diode Ddn. That is, the O terminal is electrically connected to the connection portion Cd (first connection portion) which electrically connects the transistors Qdp and Qdn. For example, DUT50 can be used for 1-phase inverter circuits, transistor Qdp can be used for the upper bridge arm, and transistor Qdn can be used for Lower bridge arm.

測試電路10係用於實施DUT50之動態特性測試之電路。測試電路10具備電源電容器11、主開關部12、選擇電路13、過電流防止電路14、高速阻斷電路15、選擇電路16、及電抗器L。電源電容器11係對測試電路10供給用於動態特性測試之電流之電源。作為電源電容器11,例如可使用頻率特性優異之濾波電容器。若蓄積於電源電容器11之能量(電荷)減少,則電源電容器11會連接於未圖示之高壓電源,由高壓電源進行充電。 The test circuit 10 is a circuit for performing a dynamic characteristic test of the DUT50. The test circuit 10 includes a power supply capacitor 11, a main switching unit 12, a selection circuit 13, an overcurrent prevention circuit 14, a high-speed blocking circuit 15, a selection circuit 16, and a reactor L. The power supply capacitor 11 is a power supply for supplying a current for a dynamic characteristic test to the test circuit 10. As the power supply capacitor 11, for example, a filter capacitor having excellent frequency characteristics can be used. When the energy (charge) stored in the power source capacitor 11 decreases, the power source capacitor 11 is connected to a high-voltage power source (not shown) and is charged by the high-voltage power source.

主開關部12係切換自電源電容器11對DUT50(電晶體Qdp或電晶體Qdn)之電流供給及阻斷之電路。主開關部12包含電晶體Qp(第3開關部)、及二極體Dp。電晶體Qp係IGBT。於電晶體Qp之集極電性連接有二極體Dp之陰極,於電晶體Qp之射極電性連接有二極體Dp之陽極。即,二極體Dp係電性並聯連接於電晶體Qp之回流二極體。電晶體Qp之集極電性連接於電源電容器11之+端子(正極端子),電晶體Qp之射極電性連接於後述之電晶體Qhp之集極、二極體Dhp之陰極、開關SWp之一端、及DUT50之P端子。 The main switching section 12 is a circuit that switches and blocks the current supply to the DUT50 (transistor Qdp or transistor Qdn) from the power supply capacitor 11. The main switching section 12 includes a transistor Qp (third switching section) and a diode Dp. The transistor Qp is an IGBT. The cathode of the diode Dp is electrically connected to the collector of the transistor Qp, and the anode of the diode Dp is electrically connected to the emitter of the transistor Qp. That is, the diode Dp is a reflux diode which is electrically connected in parallel to the transistor Qp. The collector of the transistor Qp is electrically connected to the + terminal (positive terminal) of the power supply capacitor 11, and the emitter of the transistor Qp is electrically connected to the collector of the transistor Qhp described later, the cathode of the diode Dhp, and the switch SWp. One end and P terminal of DUT50.

選擇電路13係用於將DUT50中所含之電晶體Qdp、Qdn中之任一者選為開關測定對象之電路。選擇電路13包含電晶體Qhp、Qhn(第1開關部、第2開關部)、二極體Dhp、Dhn(第3二極體、第4二極體)。電晶體Qhp、Qhn係IGBT。於電晶體Qhp、Qhn之集極分別電性連接有二極體Dhp、Dhn之陰極,於電晶體Qhp、Qhn之射極分別電性連接有二極體Dhp、Dhn之陽極。即,二極體Dhp係電性並聯連接於電晶體Qhp之回流二極體,二極體Dhn係電性並聯連接於電晶體Qhn之回流二極體。電晶體Qhp之射極與電晶體Qhn之集極相互電性連接,且電性連接於後述之電晶體Qcf之集極及二極體Dcf之陰極。即,電晶體Qhp、Qhn係於相同之方向電性串聯連接,將電晶體Qhp、Qhn電性連接之連 接部Cs(第2連接部)係藉由高速阻斷電路15及電抗器L而電性連接於DUT50之O端子。電晶體Qhp之集極電性連接於電晶體Qp之射極、二極體Dp之陽極、開關SWp之一端、及DUT50之P端子。電晶體Qhn之射極電性連接於電源電容器11之一端子(負極端子)、開關SWn之另一端、及DUT50之N端子。 The selection circuit 13 is a circuit for selecting any one of the transistors Qdp and Qdn included in the DUT 50 as a switch measurement target. The selection circuit 13 includes transistors Qhp and Qhn (a first switching unit and a second switching unit), and diodes Dhp and Dhn (a third diode and a fourth diode). The transistors Qhp and Qhn are IGBTs. The cathodes of the diodes Dhp and Dhn are electrically connected to the collectors of the transistors Qhp and Qhn, respectively, and the anodes of the diodes Dhp and Dhn are electrically connected to the emitters of the transistors Qhp and Qhn, respectively. That is, the diode Dhp is electrically connected in parallel to the reflow diode of the transistor Qhp, and the diode Dhn is electrically connected in parallel to the reflow diode of the transistor Qhn. The emitter of the transistor Qhp and the collector of the transistor Qhn are electrically connected to each other, and are electrically connected to the collector of the transistor Qcf described later and the cathode of the diode Dcf. That is, the transistors Qhp and Qhn are electrically connected in series in the same direction, and the transistors Qhp and Qhn are electrically connected. The connection portion Cs (second connection portion) is electrically connected to the O terminal of the DUT 50 through the high-speed blocking circuit 15 and the reactor L. The collector of the transistor Qhp is electrically connected to the emitter of the transistor Qp, the anode of the diode Dp, one terminal of the switch SWp, and the P terminal of the DUT50. The emitter of the transistor Qhn is electrically connected to one terminal (negative terminal) of the power capacitor 11, the other terminal of the switch SWn, and the N terminal of the DUT 50.

過電流防止電路14係用於消耗蓄積於電抗器L之能量之電路。過電流防止電路14電性並聯地設置於電抗器L。過電流防止電路14包含電晶體Qif、Qir、及二極體Dif、Dir。電晶體Qif、Qir係IGBT。於電晶體Qif、Qir之集極分別電性連接有二極體Dif、Dir之陰極,於電晶體Qif、Qir之射極分別電性連接有二極體Dif、Dir之陽極。即,二極體Dif係電性並聯連接於電晶體Qif之回流二極體,二極體Dir係電性並聯連接於電晶體Qir之回流二極體。電晶體Qif之射極與電晶體Qir之射極相互電性連接。即,電晶體Qif、Qir係於相互相反之方向電性串聯連接。電晶體Qif之集極電性連接於後述之電晶體Qcr之集極、二極體Dcr之陰極及電抗器L之一端。電晶體Qir之集極電性連接於電抗器L之另一端、開關SWp之另一端、開關SWn之一端、及DUT50之O端子。 The overcurrent prevention circuit 14 is a circuit for consuming energy stored in the reactor L. The overcurrent prevention circuit 14 is provided in the reactor L electrically in parallel. The overcurrent prevention circuit 14 includes transistors Qif and Qir, and diodes Dif and Dir. Transistors Qif and Qir are IGBTs. The cathodes of the diodes Dif and Dir are respectively electrically connected to the collectors of the transistors Qif and Qir, and the anodes of the diodes Dif and Dir are respectively electrically connected to the emitters of the transistors Qif and Qir. That is, the diode Dif is electrically connected in parallel to the reflow diode of the transistor Qif, and the diode Dir is electrically connected in parallel to the reflow diode of the transistor Qir. The emitter of the transistor Qif and the emitter of the transistor Qir are electrically connected to each other. That is, the transistors Qif and Qir are electrically connected in series in opposite directions. The collector of the transistor Qif is electrically connected to the collector of the transistor Qcr described later, the cathode of the diode Dcr, and one end of the reactor L. The collector of the transistor Qir is electrically connected to the other end of the reactor L, the other end of the switch SWp, one end of the switch SWn, and the O terminal of the DUT50.

高速阻斷電路15係用於藉由過電流防止電路14使蓄積於電抗器L之能量高速消耗之電路。高速阻斷電路15係電性串聯地設置於電抗器L。高速阻斷電路15包含電晶體Qcf、Qcr、及二極體Dcf、Dcr。電晶體Qcf、Qcr係IGBT。於電晶體Qcf、Qcr之集極,分別電性連接有二極體Dcf、Dcr之陰極,於電晶體Qcf、Qcr之射極,分別電性連接有二極體Dcf、Dcr之陽極。即,二極體Dcf係電性並聯連接於電晶體Qcf之回流二極體,電晶體Dcr係電性並聯連接於電晶體Qcr之回流二極體。電晶體Qcf之射極與電晶體Qcr之射極相互電性連接。即,電晶體Qcf、Qcr係於相互相反之方向電性串聯連接。電晶體Qcf之集極電性連接於電晶體Qhp之射極、電晶體Qhn之集極、二極體Dhp之陽極及二 極體Dhn之陰極。電晶體Qcr之集極係電性連接於電晶體Qif之集極、二極體Dif之陰極及電抗器L之一端。 The high-speed blocking circuit 15 is a circuit for high-speed consumption of the energy accumulated in the reactor L by the overcurrent prevention circuit 14. The high-speed blocking circuit 15 is electrically connected to the reactor L in series. The high-speed blocking circuit 15 includes transistors Qcf and Qcr, and diodes Dcf and Dcr. Transistors Qcf and Qcr are IGBTs. The cathodes of the diodes Dcf and Dcr are electrically connected to the collectors of the transistors Qcf and Qcr, and the anodes of the diodes Dcf and Dcr are electrically connected to the emitters of the transistors Qcf and Qcr, respectively. That is, the diode Dcf is electrically connected in parallel to the reflow diode of the transistor Qcf, and the transistor Dcr is electrically connected in parallel to the reflow diode of the transistor Qcr. The emitter of the transistor Qcf and the emitter of the transistor Qcr are electrically connected to each other. That is, the transistors Qcf and Qcr are electrically connected in series in opposite directions. The collector of transistor Qcf is electrically connected to the emitter of transistor Qhp, the collector of transistor Qhn, the anode of diode Dhp and two The cathode of the polar body Dhn. The collector of the transistor Qcr is electrically connected to the collector of the transistor Qif, the cathode of the diode Dif and one end of the reactor L.

選擇電路16係用於將DUT50所包含之電晶體Qdp、Qdn之任一者選為短路容量測定對象之電路。選擇電路16包含開關SWp、SWn。開關SWp、SWn為繼電器。開關SWp之一端電性連接於電晶體Qp之射極、二極體Dp之陽極、電晶體Qhp之集極、二極體Dhp之陰極及DUT50之P端子。開關SWp之另一端與開關SWn之一端相互電性連接,且電性連接於電抗器L之另一端、電晶體Qir之集極、二極體Dir之陰極及DUT50之O端子。開關SWn之另一端係電性連接於電源電容器11之-端子、電晶體Qhn之射極、二極體Dhn之陽極、及DUT50之N端子。 The selection circuit 16 is a circuit for selecting any one of the transistors Qdp and Qdn included in the DUT 50 as a short-circuit capacity measurement target. The selection circuit 16 includes switches SWp and SWn. The switches SWp and SWn are relays. One terminal of the switch SWp is electrically connected to the emitter of the transistor Qp, the anode of the diode Dp, the collector of the transistor Qhp, the cathode of the diode Dhp, and the P terminal of the DUT50. The other end of the switch SWp and one end of the switch SWn are electrically connected to each other, and are electrically connected to the other end of the reactor L, the collector of the transistor Qir, the cathode of the diode Dir, and the O terminal of the DUT50. The other end of the switch SWn is electrically connected to the-terminal of the power capacitor 11, the emitter of the transistor Qhn, the anode of the diode Dhn, and the N terminal of the DUT50.

電抗器L係動態特性測試之負載。即,電抗器L成為電晶體Qdp、Qdn之負載。電抗器L之一端電性連接於電晶體Qcr之集極及二極體Dcr之陰極,電抗器L之另一端電性連接於DUT50之O端子。 Reactor L is the load for dynamic characteristics test. That is, the reactor L becomes a load of the transistors Qdp and Qdn. One end of the reactor L is electrically connected to the collector of the transistor Qcr and the cathode of the diode Dcr, and the other end of the reactor L is electrically connected to the O terminal of the DUT50.

過電流檢測電路20係檢測流動於測試電路10及DUT50中之過電流之電路。過電流檢測電路20包含電流感測器21、電流感測器22、比較器23、及比較器24。 The overcurrent detection circuit 20 is a circuit that detects an overcurrent flowing in the test circuit 10 and the DUT 50. The overcurrent detection circuit 20 includes a current sensor 21, a current sensor 22, a comparator 23, and a comparator 24.

電流感測器21係於N側開關測定時,檢測流動於測試電路10及DUT50中之電流之電流值的感測器。電流感測器21設置於連接DUT50之N端子與電源電容器11之-端子之配線之N端子附近。電流感測器21將檢測出之電流值輸出至比較器23。電流感測器22係於P側開關測定時,檢測流動於測試電路10及DUT50中之電流之電流值的感測器。電流感測器22設置於連接DUT50之P端子與電晶體Qp之射極之配線之P端子附近。電流感測器22將檢測出之電流值輸出至比較器24。 The current sensor 21 is a sensor that detects the current value of the current flowing in the test circuit 10 and the DUT 50 during the N-side switch measurement. The current sensor 21 is provided near the N terminal of the wiring connecting the N terminal of the DUT 50 and the-terminal of the power capacitor 11. The current sensor 21 outputs the detected current value to the comparator 23. The current sensor 22 is a sensor that detects the current value of the current flowing in the test circuit 10 and the DUT 50 during the P-side switch measurement. The current sensor 22 is provided near the P terminal of the wiring connecting the P terminal of the DUT50 and the emitter of the transistor Qp. The current sensor 22 outputs the detected current value to the comparator 24.

比較器23係比較由電流感測器21檢測出之電流值與N側之過電流閾值Ref_N,並將比較結果輸出至控制裝置30。過電流閾值Ref_N係 用於檢測過電流而預設之值。於比較器23中,於+端子輸入N側之過電流閾值Ref_N,於-端子輸入由電流感測器21檢測出之電流值。於該情形時,比較器23係當電流感測器21檢測出之電流值為過電流閾值Ref_N以下之情形時,將高位準之輸出信號輸出至控制裝置30,當電流感測器21檢測出之電流值大於過電流閾值Ref_N之情形時,將低位準之輸出信號輸出至控制裝置30。 The comparator 23 compares the current value detected by the current sensor 21 with the overcurrent threshold value Ref_N on the N side, and outputs the comparison result to the control device 30. Over current threshold Ref_N Preset value for detecting overcurrent. In the comparator 23, an overcurrent threshold value Ref_N on the N side of the + terminal is input, and a current value detected by the current sensor 21 is input in the-terminal. In this case, the comparator 23 outputs a high-level output signal to the control device 30 when the current value detected by the current sensor 21 is below the overcurrent threshold Ref_N, and when the current sensor 21 detects When the current value is greater than the overcurrent threshold Ref_N, a low-level output signal is output to the control device 30.

比較器24係比較由電流感測器22檢測出之電流值與P側之過電流閾值Ref_P,並將比較結果輸出至控制裝置30。過電流閾值Ref_P係用於檢測過電流而預設之值。於比較器24中,於+端子輸入P側之過電流閾值Ref_P,於-端子輸入由電流感測器22檢測出之電流值。於該情形時,比較器24係當電流感測器22檢測出之電流值為過電流閾值Ref_P以下之情形時,將高位準之輸出信號輸出至控制裝置30,當電流感測器22檢測出之電流值大於過電流閾值Ref_P之情形時,將低位準之輸出信號輸出至控制裝置30。 The comparator 24 compares the current value detected by the current sensor 22 with the overcurrent threshold value Ref_P on the P side, and outputs the comparison result to the control device 30. The overcurrent threshold Ref_P is a preset value for detecting overcurrent. In the comparator 24, an overcurrent threshold Ref_P on the + terminal input P side is input, and a current value detected by the current sensor 22 is input at the-terminal. In this case, the comparator 24 outputs a high-level output signal to the control device 30 when the current value detected by the current sensor 22 is below the overcurrent threshold Ref_P, and when the current sensor 22 detects When the current value is greater than the overcurrent threshold Ref_P, a low-level output signal is output to the control device 30.

控制裝置30係進行用於切換電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr、Qdp、Qdn及開關SWp、SWn之接通狀態(導通狀態)與斷開狀態(阻斷狀態)之切換控制之控制器。控制裝置30係藉由對電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr、Qdp、Qdn分別輸出閘極信號Sqp、Sqhp、Sqhn、Sqif、Sqir、Sqcf、Sqcr、Sqdp、Sqdn,而切換各電晶體之接通狀態與斷開狀態。控制裝置30係藉由對開關SWp、SWn分別輸出繼電器信號Sswp、Sswn,而切換各開關之接通狀態與斷開狀態。利用控制裝置30進行之切換控制係於以下之各測定中詳細進行說明。再者,所謂電晶體之接通狀態,係指集極-射極間電性導通之狀態;所謂電晶體之斷開狀態,係指集極-射極間電性阻斷之狀態。又,於電晶體為IGBT之情形時,藉由閘極-射極間電壓而切換接通狀態與斷開狀態。於以下之說明中,為方便起見,設定為於對電晶體供 給高位準之閘極信號之情形時,電晶體成為接通狀態,於對電晶體供給低位準之閘極信號時,電晶體成為斷開狀態。 The control device 30 is used to switch the on state (on state) and off state (off state) of the transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr, Qdp, Qdn and the switches SWp, SWn. Controller for switching control. The control device 30 outputs gate signals Sqp, Sqhp, Sqhn, Sqif, Sqir, Sqcf, Sqcr, Sqdp, Sqdn to the transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr, Qdp, Qdn, and Sqir, Sqcf, Sqcr, Sqdp, Sqdn, respectively. Switch on and off states of each transistor. The control device 30 outputs the relay signals Sswp and Sswn to the switches SWp and SWn, respectively, to switch the on state and the off state of each switch. The switching control by the control device 30 will be described in detail in each measurement below. Moreover, the so-called on-state of the transistor refers to a state where the collector-emitter is electrically conductive; the so-called off-state of the transistor refers to a state where the collector-emitter is electrically blocked. When the transistor is an IGBT, the on-state and off-state are switched by the gate-emitter voltage. In the following description, for convenience, it is set to supply the transistor. When a high-level gate signal is given, the transistor is turned on, and when a low-level gate signal is supplied to the transistor, the transistor is turned off.

(開關測定) (Switch measurement)

其次,就使用動態特性測試裝置1之開關測定進行說明。首先,就電晶體Qdn之開關測定(有稱為「N側開關測定」之情形)進行說明。圖2係動態特性測試裝置1之N側開關測定之時序圖。圖3係表示N側開關測定之開關接通時之電流路徑之圖。圖4係表示N側開關測定之開關斷開時之電流路徑之圖。圖5係表示N側開關測定之能量回收時之電流路徑之圖。 Next, switch measurement using the dynamic characteristic tester 1 will be described. First, the switching measurement of the transistor Qdn (sometimes referred to as "N-side switching measurement") will be described. FIG. 2 is a timing chart of the measurement of the N-side switch of the dynamic characteristic test device 1. FIG. FIG. 3 is a diagram showing a current path when a switch measured by an N-side switch is turned on. Fig. 4 is a diagram showing a current path when a switch measured by an N-side switch is turned off. FIG. 5 is a diagram showing a current path during energy recovery measured by an N-side switch.

再者,於開關測定中,因繼電器信號Sswp、Sswn始終被設定為低位準,開關SWp、SWn始終為斷開狀態,故於各步驟中省略繼電器信號及開關之說明。又,於以下之說明中,將自電源電容器11供給之電流設為Ic、將於電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr、Qdp、Qdn中流動之電流分別設為電流Iqp、Iqhp、Iqhn、Iqif、Iqir、Iqcf、Iqcr、Iqdp、Iqdn、且將於電抗器L中流動之電流作為電流IL而進行說明。又,流動於各電晶體中之電流係於自集極流向射極之情形時設為正值,自射極流向集極或自回流二極體之陽極流向陰極(順向)之情形時為負值。流動於電抗器L中之電流係於朝DUT50之O端子流動之情形時為正值,朝其相反方向流動之情形時為負值。又,雖各步驟中圖示為相同之長度,但各步驟之時間無需相同,而可根據需要予以適當調整。於各步驟中,各電晶體之切換控制時序可相同,亦可不同。 Furthermore, in the switch measurement, the relay signals Sswp and Sswn are always set to a low level, and the switches SWp and SWn are always off. Therefore, the description of the relay signals and switches is omitted in each step. In the following description, the current supplied from the power supply capacitor 11 is set to Ic, and the currents flowing through the transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr, Qdp, and Qdn are set to the current Iqp, respectively. , Iqhp, Iqhn, Iqif, Iqir, Iqcf, Iqcr, Iqdp, Iqdn, and the current flowing through the reactor L will be described as the current IL. In addition, the current flowing in each transistor is set to a positive value when it flows from the collector to the emitter, and when the anode flows from the emitter to the collector or from the anode of the recirculating diode to the cathode (forward). Negative value. The current flowing in the reactor L is a positive value when it flows toward the O terminal of the DUT50, and a negative value when it flows in the opposite direction. In addition, although the steps are shown as having the same length, the time of each step does not need to be the same, and can be appropriately adjusted as needed. In each step, the switching control timing of each transistor can be the same or different.

如圖2所示,於步驟ST11中,控制裝置30係將閘極信號Sqp、Sqhp、Sqhn、Sqif、Sqir、Sqcf、Sqcr、Sqdp、Sqdn均設定為低位準而輸出。因此,電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr、Qdp、Qdn均為斷開狀態,各電晶體中未流動電流。又,電源電容器11之能 量Ec(電荷)例如設為滿充電狀態。 As shown in FIG. 2, in step ST11, the control device 30 sets the gate signals Sqp, Sqhp, Sqhn, Sqif, Sqir, Sqcf, Sqcr, Sqdp, and Sqdn to the low level and outputs them. Therefore, the transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr, Qdp, and Qdn are all in an off state, and no current flows in each transistor. The power capacitor 11 The amount Ec (charge) is set to a fully charged state, for example.

接著,於步驟ST12中,控制裝置30係將閘極信號Sqp、Sqhp、Sqcf、Sqcr、Sqdn設定為高位準,將除以此外之閘極信號設定為低位準而輸出。藉此,電晶體Qp、Qhp、Qcf、Qcr、Qdn成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖3所示,形成自電源電容器11之+端子起依序經過電晶體Qp、電晶體Qhp、電晶體Qcf、電晶體Qcr、電抗器L及電晶體Qdn而返回至電源電容器11之-端子之電流路徑Pn1,於電流路徑Pn1中流動自電源電容器11供給之電流。於該狀態下,電流Ic、Iqp、Iqhp、Iqcf、-Iqcr、IL、Iqdn之電流量隨著時間之經過而增加,另一方面,電源電容器11之能量Ec則隨著時間之經過而減少。又,電晶體Qhn、Qif、Qir、Qdp中未流動電流Iqhn、Iqif、Iqir、Iqdp。即,於步驟ST12中,控制裝置30係藉由將電晶體Qhp設為接通狀態,而將電晶體Qdn設為開關測定對象,藉由將電晶體Qp、Qcf、Qcr設為接通狀態,自電源電容器11對電晶體Qdn供給電流。 Next, in step ST12, the control device 30 sets the gate signals Sqp, Sqhp, Sqcf, Sqcr, and Sqdn to a high level, and outputs the gate signals divided by the other to a low level. Accordingly, the transistors Qp, Qhp, Qcf, Qcr, and Qdn are turned on, and the other transistors are turned off. At this time, as shown in FIG. 3, the transistor Qp, transistor Qhp, transistor Qcf, transistor Qcr, reactor L, and transistor Qdn are sequentially returned to the power capacitor 11 from the + terminal of the power capacitor 11. The current path Pn1 of the-terminal flows a current supplied from the power supply capacitor 11 in the current path Pn1. In this state, the currents of the currents Ic, Iqp, Iqhp, Iqcf, -Iqcr, IL, and Iqdn increase with the passage of time. On the other hand, the energy Ec of the power capacitor 11 decreases with the passage of time. In addition, the currents Iqhn, Iqif, Iqir, and Iqdp do not flow through the transistors Qhn, Qif, Qir, and Qdp. That is, in step ST12, the control device 30 sets the transistor Qhp to the on state, sets the transistor Qdn to the switch measurement object, and sets the transistors Qp, Qcf, and Qcr to the on state. A current is supplied from the power supply capacitor 11 to the transistor Qdn.

接著,於步驟ST13中,控制裝置30將閘極信號Sqp、Sqhp、Sqcf、Sqcr設定為高位準,將除此以外之閘極信號設定為低位準而輸出。即,自步驟ST12起僅閘極信號Sqdn自高位準變更為低位準,除此以外之閘極信號未變更。藉此,電晶體Qp、Qhp、Qcf、Qcr成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖4所示,形成依序於電晶體Qhp、電晶體Qcf、電晶體Qcr、電抗器L及二極體Ddp循環之電流路徑Pn2,將要開始步驟ST13之前流動於電流路徑Pn1之電流係朝電流路徑Pn2流動。因此,電流Ic、Iqp、Iqdn之電流量成為0,因未自電源電容器11供給電流,故能量Ec無變化。此時,因能量被電晶體Qhp、電晶體Qcf、電晶體Qcr、電抗器L及二極體Ddp之電阻成分等消耗,故電流Iqhp、Iqcf、-Iqcr、IL、於二極體Ddp中流動之電流-Iqdp之電流量,係自將要開始步驟ST13之前流動於電流路徑Pn1之電 流之電流量隨著時間之經過而逐漸減少。又,電流Iqhn、Iqif、Iqir之電流量仍為0。 Next, in step ST13, the control device 30 sets the gate signals Sqp, Sqhp, Sqcf, and Sqcr to a high level, and outputs the other gate signals to a low level. That is, from step ST12, only the gate signal Sqdn is changed from a high level to a low level, and the other gate signals are not changed. As a result, the transistors Qp, Qhp, Qcf, and Qcr are turned on, and the other transistors are turned off. At this time, as shown in FIG. 4, a current path Pn2 formed in sequence with the transistor Qhp, the transistor Qcf, the transistor Qcr, the reactor L, and the diode Ddp cycle is formed, and will flow through the current path Pn1 before starting step ST13. The current flows toward the current path Pn2. Therefore, the current amounts of the currents Ic, Iqp, and Iqdn become 0, and since no current is supplied from the power supply capacitor 11, the energy Ec does not change. At this time, because the energy is consumed by the transistor Qhp, the transistor Qcf, the transistor Qcr, the reactor L, and the resistance components of the diode Ddp, the current Iqhp, Iqcf, -Iqcr, IL, flows in the diode Ddp The amount of current-Iqdp is the current flowing in the current path Pn1 before the step ST13 is to be started. The amount of current flowing gradually decreases with the passage of time. In addition, the current amounts of the currents Iqhn, Iqif, and Iqir are still zero.

接著,於步驟ST14中,與步驟ST12同樣地,控制裝置30係將閘極信號Sqp、Sqhp、Sqcf、Sqcr、Sqdn設定為高位準,將除此以外之閘極信號設定為低位準而輸出。即,自步驟ST13起僅閘極信號Sqdn自低位準變更為高位準,除此以外之閘極信號未變更。藉此,形成電流路徑Pn1,自將要開始步驟ST14之前流動於電流路徑Pn2之電流及自電源電容器11供給之電流係朝電流路徑Pn1流動。此時,電流Ic、Iqp、Iqhp、Iqcf、-Iqcr、IL、Iqdn之電流量較將要開始步驟ST14之前流動於電流路徑Pn2之電流之電流量,隨著時間之經過而進一步增加,另一方面,電源電容器11之能量Ec則隨著時間之經過而進一步減少。又,電晶體Qhn、Qif、Qir、Qdp中,並未流動有電流Iqhn、Iqif、Iqir、Iqdp。 Next, in step ST14, as in step ST12, the control device 30 sets the gate signals Sqp, Sqhp, Sqcf, Sqcr, and Sqdn to a high level, and outputs the other gate signals to a low level. That is, from step ST13, only the gate signal Sqdn is changed from a low level to a high level, and the other gate signals are not changed. Thereby, the current path Pn1 is formed, and the current flowing in the current path Pn2 before the step ST14 is started and the current supplied from the power supply capacitor 11 flow toward the current path Pn1. At this time, the currents of the currents Ic, Iqp, Iqhp, Iqcf, -Iqcr, IL, and Iqdn are larger than those of the current flowing in the current path Pn2 before the start of step ST14. The energy Ec of the power supply capacitor 11 is further reduced with the passage of time. In addition, the currents Iqhn, Iqif, Iqir, and Iqdp do not flow through the transistors Qhn, Qif, Qir, and Qdp.

接著,於步驟ST15中,與步驟ST13同樣地,控制裝置30將閘極信號Sqp、Sqhp、Sqcf、Sqcr設定為高位準,將除此以外之閘極信號設定為低位準而輸出。即,自步驟ST14起僅閘極信號Sqdn自高位準變更為低位準,除此以外之閘極信號並未變更。藉此,形成電流路徑Pn2,將要開始步驟ST15之前流動於電流路徑Pn1之電流係朝電流路徑Pn2流動。此時,與步驟ST13同樣地,電流Ic、Iqp、Iqdn之電流量成為0,電流Iqhp、Iqcf、-Iqcr、IL、-Iqdp之電流量隨著時間之經過而逐漸減少。又,電流Iqhn、Iqif、Iqir之電流量仍為0。又,因未自電源電容器11供給電流,故能量Ec無變化。於該時點,可獲得N側開關測定所需之波形。即,截至將步驟ST12~ST15之電晶體Qdn設為斷開狀態為止,可獲得電晶體Qdn之開關測定所需之波形。這表示將步驟ST12~ST15之電晶體Qdn設為斷開狀態為止之處理,可稱為狹義之電晶體Qdn之開關測定。 Next, in step ST15, similarly to step ST13, the control device 30 sets the gate signals Sqp, Sqhp, Sqcf, and Sqcr to a high level, and outputs the other gate signals to a low level. That is, from step ST14, only the gate signal Sqdn is changed from a high level to a low level, and the other gate signals are not changed. Thereby, the current path Pn2 is formed, and the current flowing through the current path Pn1 before starting step ST15 flows toward the current path Pn2. At this time, as in step ST13, the current amounts of the currents Ic, Iqp, and Iqdn become 0, and the current amounts of the currents Iqhp, Iqcf, -Iqcr, IL, and -Iqdp gradually decrease with the passage of time. In addition, the current amounts of the currents Iqhn, Iqif, and Iqir are still zero. Since no current is supplied from the power supply capacitor 11, the energy Ec does not change. At this point, the waveform required for the N-side switch measurement can be obtained. That is, until the transistor Qdn of steps ST12 to ST15 is set to the off state, a waveform required for the switch measurement of the transistor Qdn can be obtained. This means that the process until the transistor Qdn of steps ST12 to ST15 is turned off can be referred to as a switch measurement of the transistor Qdn in a narrow sense.

其後,控制裝置30將閘極信號Sqhp自高位準變更為低位準。藉此,電晶體Qp、Qcf、Qcr成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖5所示,形成自電源電容器11之-端子起依序經過二極體Dhn、電晶體Qcf、電晶體Qcr、電抗器L、二極體Ddp及電晶體Qp而返回至電源電容器11之+端子之電流路徑Pn3,於將要將閘極信號Sqhp切換為低位準之前,流動於電流路徑Pn2之電流係朝電流路徑Pn3流動。因此,電流Iqhp之電流量成為0。又,因電流路徑Pn3係自電源電容器11之-端子朝向+端子,故將電源電容器11充電,能量Ec隨著時間之經過而增加,另一方面,電流-Iqhn(於二極體Dhn中流動之電流)、Iqcf、-Iqcr、IL、-Iqdp、-Iqp、-Ic(自電源電容器11之-端子朝+端子流動之電流)之電流量係隨著時間之經過而減少。又,電流Iqdn、Iqif、Iqir之電流量仍為0。 Thereafter, the control device 30 changes the gate signal Sqhp from a high level to a low level. Accordingly, the transistors Qp, Qcf, and Qcr are turned on, and the other transistors are turned off. At this time, as shown in FIG. 5, from the-terminal of the power capacitor 11, the diode Dhn, the transistor Qcf, the transistor Qcr, the reactor L, the diode Ddp, and the transistor Qp are sequentially returned to the power source. The current path Pn3 of the + terminal of the capacitor 11 before the gate signal Sqhp is to be switched to a low level, the current flowing in the current path Pn2 flows toward the current path Pn3. Therefore, the amount of current Iqhp becomes zero. Since the current path Pn3 is from the-terminal of the power capacitor 11 to the + terminal, the power capacitor 11 is charged, and the energy Ec increases with the passage of time. On the other hand, the current -Iqhn (flows in the diode Dhn) The amount of current), Iqcf, -Iqcr, IL, -Iqdp, -Iqp, -Ic (the current flowing from the-terminal to the + terminal of the power capacitor 11) decreases with the passage of time. In addition, the current amounts of the currents Iqdn, Iqif, and Iqir are still zero.

接著,於步驟ST16中,維持與步驟ST15相同之狀態,於電流路徑Pn3中流動之電流之電流量成為0,電源電容器11之能量Ec大致恢復至滿充電狀態。 Next, in step ST16, the same state as that in step ST15 is maintained, the current amount of the current flowing in the current path Pn3 becomes 0, and the energy Ec of the power supply capacitor 11 is substantially restored to a fully charged state.

接著,於步驟ST17中,控制裝置30將閘極信號Sqp、Sqhp、Sqhn、Sqif、Sqir、Sqcf、Sqcr、Sqdp、Sqdn均設定為低位準而輸出。因此,電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr、Qdp、Qdn均成為斷開狀態,各電晶體中未流動電流。如此,結束N側開關測定。再者,亦可由未圖示之檢測電路等檢測流動於電流路徑Pn3中之電流之電流量成為特定閾值以下之情形,控制裝置30則藉由來自檢測電路之輸出信號,檢測流動於電流路徑Pn3中之電流之電流量大致成為0(能量回收處理之結束)。特定閾值例如設定為0,或稍大於0之值。且,控制裝置30亦可依從於檢測到能量回收處理之結束而進行步驟ST17之處理。 Next, in step ST17, the control device 30 sets the gate signals Sqp, Sqhp, Sqhn, Sqif, Sqir, Sqcf, Sqcr, Sqdp, and Sqdn to the low level and outputs them. Therefore, the transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr, Qdp, and Qdn are turned off, and no current flows in each transistor. In this way, the N-side switch measurement is completed. In addition, a detection circuit or the like may be used to detect a situation where the amount of current flowing in the current path Pn3 becomes below a specific threshold, and the control device 30 detects the flow through the current path Pn3 by an output signal from the detection circuit. The amount of current in the current is approximately 0 (the end of the energy recovery process). The specific threshold value is set to, for example, 0, or a value slightly larger than 0. Moreover, the control device 30 may perform the processing of step ST17 in accordance with detecting the end of the energy recovery processing.

如以上般,控制裝置30係於開始N側開關測定時,將電晶體Qp、 Qhp、Qcf、Qcr設為接通狀態,且相應於N側開關測定之波形擷取之結束,將電晶體Qhp設為斷開狀態,藉此回收於N側開關測定中所使用之能量。又,控制裝置30係於回收於N側開關測定中所使用之能量後,將電晶體Qp、Qcf、Qcr設為斷開狀態。因此,因於N側開關測定結束時,能量Ec大致成為滿充電狀態,故無需為進行下一測定而使用高壓電源進行電源電容器11之充電。 As described above, when the control device 30 starts the N-side switch measurement, the transistor Qp, Qhp, Qcf, Qcr are set to the on state, and corresponding to the end of waveform acquisition of the N-side switch measurement, the transistor Qhp is set to the off state, thereby recovering the energy used in the N-side switch measurement. The control device 30 recovers the energy used in the N-side switch measurement and sets the transistors Qp, Qcf, and Qcr to the off state. Therefore, since the energy Ec is almost fully charged at the end of the N-side switch measurement, it is not necessary to use a high-voltage power supply to charge the power supply capacitor 11 for the next measurement.

其次,就電晶體Qdp之開關測定(有時稱為「P側開關測定」)進行說明。圖6係動態特性測試裝置1之P側開關測定之時序圖。圖7係表示P側開關測定之開關接通時之電流路徑之圖。圖8係表示P側開關測定之開關斷開時之電流路徑之圖。圖9係表示P側開關測定之能量回收時之電流路徑之圖。 Next, switching measurement of the transistor Qdp (sometimes referred to as "P-side switching measurement") will be described. FIG. 6 is a timing chart of the P-side switch measurement of the dynamic characteristic test device 1. FIG. Fig. 7 is a diagram showing a current path when a switch measured by a P-side switch is turned on. Fig. 8 is a diagram showing a current path when a switch measured by a P-side switch is turned off. Fig. 9 is a diagram showing a current path during energy recovery measured by a P-side switch.

如圖6所示,因步驟ST21係與圖2之步驟ST11相同,故省略相關說明。接著,於步驟ST22中,控制裝置30將閘極信號Sqp、Sqhn、Sqcf、Sqcr、Sqdp設定為高位準,將除此以外之閘極信號設定為低位準而輸出。藉此,電晶體Qp、Qhn、Qcf、Qcr、Qdp成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖7所示,形成自電源電容器11之+端子起依序經過電晶體Qp、電晶體Qdp、電抗器L、電晶體Qcr、電晶體Qcf及電晶體Qhn而返回至電源電容器11之-端子之電流路徑Pp1,於電流路徑Pp1中,流動自電源電容器11供給之電流。於該狀態下,電流Ic、Iqp、Iqdp、-IL、Iqcr、-Iqcf、Iqhn之電流量隨著時間之經過而增加,另一方面,電源電容器11之能量Ec隨著時間之經過而減少。又,於電晶體Qhp、Qif、Qir、Qdn中未流動電流Iqhp、Iqif、Iqir、Iqdn。即,於步驟ST22中,控制裝置30係藉由將電晶體Qhn設為接通狀態而將電晶體Qdp作為開關測定對象,藉由將電晶體Qp、Qcf、Qcr設為接通狀態而自電源電容器11對電晶體Qdp供給電流。 As shown in FIG. 6, since step ST21 is the same as step ST11 of FIG. 2, the related description is omitted. Next, in step ST22, the control device 30 sets the gate signals Sqp, Sqhn, Sqcf, Sqcr, and Sqdp to the high level, and outputs the other gate signals to the low level. Accordingly, the transistors Qp, Qhn, Qcf, Qcr, and Qdp are turned on, and the other transistors are turned off. At this time, as shown in FIG. 7, from the + terminal of the power capacitor 11, the transistor Qp, the transistor Qdp, the reactor L, the transistor Qcr, the transistor Qcf, and the transistor Qhn are sequentially returned to the power capacitor 11. The-terminal current path Pp1 flows a current supplied from the power supply capacitor 11 in the current path Pp1. In this state, the currents of the currents Ic, Iqp, Iqdp, -IL, Iqcr, -Iqcf, and Iqhn increase with the passage of time. On the other hand, the energy Ec of the power capacitor 11 decreases with the passage of time. In addition, the currents Iqhp, Iqif, Iqir, and Iqdn do not flow through the transistors Qhp, Qif, Qir, and Qdn. That is, in step ST22, the control device 30 sets the transistor Qhn to the on state and sets the transistor Qdp as the switching measurement target, and sets the transistors Qp, Qcf, and Qcr to the on state to self-power The capacitor 11 supplies a current to the transistor Qdp.

接著,於步驟ST23中,控制裝置30係將閘極信號Sqp、Sqhn、 Sqcf、Sqcr設定為高位準,將除此以外之閘極信號設定為低位準而輸出。即,自步驟ST22起僅閘極信號Sqdp自高位準變更為低位準,除此以外之閘極信號未變更。藉此,電晶體Qp、Qhn、Qcf、Qcr成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖8所示,形成依序於電晶體Qhn、二極體Ddn、電抗器L、電晶體Qcr及電晶體Qcf循環之電流路徑Pp2,於即將開始步驟ST23之前流動於電流路徑Pp1之電流係朝電流路徑Pp2流動。因此,電流Ic、Iqp、Iqdp之電流量成為0,因未自電源電容器11供給電流,故能量Ec無變化。此時,因能量被電晶體Qhn、二極體Ddn、電抗器L、電晶體Qcr及電晶體Qcf之電阻成分等消耗,故電流Iqhn、-Iqdn(於二極體Ddn中流動之電流)、-IL、Iqcr、-Iqcf之電流量,係自將要開始步驟ST23之前流動於電流路徑Pp1中之電流之電流量隨著時間之經過而逐漸減少。又,電流Iqhp、Iqif、Iqir之電流量仍為0。 Next, in step ST23, the control device 30 sends the gate signals Sqp, Sqhn, Sqcf and Sqcr are set to a high level, and other gate signals are set to a low level and output. That is, from step ST22, only the gate signal Sqdp is changed from the high level to the low level, and the other gate signals are not changed. As a result, the transistors Qp, Qhn, Qcf, and Qcr are turned on, and the other transistors are turned off. At this time, as shown in FIG. 8, a current path Pp2 formed in sequence with the transistor Qhn, the diode Ddn, the reactor L, the transistor Qcr, and the transistor Qcf is formed, and flows in the current path Pp1 immediately before step ST23 is started. The current flows toward the current path Pp2. Therefore, the current amounts of the currents Ic, Iqp, and Iqdp become 0, and since no current is supplied from the power supply capacitor 11, the energy Ec does not change. At this time, because the energy is consumed by the resistance components of the transistor Qhn, the diode Ddn, the reactor L, the transistor Qcr, and the transistor Qcf, the currents Iqhn, -Iqdn (the current flowing in the diode Ddn), The current amounts of -IL, Iqcr, and -Iqcf are the current amounts of the currents flowing in the current path Pp1 before step ST23 is started, and gradually decrease with the passage of time. In addition, the current amounts of the currents Iqhp, Iqif, and Iqir are still zero.

接著,於步驟ST24中,與步驟ST22同樣地,控制裝置30係將閘極信號Sqp、Sqhn、Sqcf、Sqcr、Sqdp設定為高位準,將除此以外之閘極信號設定為低位準而輸出。即,自步驟ST23起僅閘極信號Sqdp自低位準變更為高位準,除此以外之閘極信號未變更。藉此,形成電流路徑Pp1,於將要開始步驟ST24之前,流動於電流路徑Pp2之電流及自電源電容器11供給之電流係朝電流路徑Pp1流動。此時,電流Ic、Iqp、Iqdp、-IL、Iqcr、-Iqcf、Iqhn之電流量自將要開始步驟ST24之前流動於電流路徑Pp2之電流之電流量,隨著時間之經過而進一步增加,另一方面,電源電容器11之能量Ec係隨著時間之經過而進一步減少。又,於電晶體Qhp、Qif、Qir、Qdn中未流動電流Iqhp、Iqif、Iqir、Iqdn。 Next, in step ST24, similar to step ST22, the control device 30 sets the gate signals Sqp, Sqhn, Sqcf, Sqcr, and Sqdp to a high level, and outputs the other gate signals to a low level. That is, from step ST23, only the gate signal Sqdp is changed from the low level to the high level, and the other gate signals are not changed. Thereby, the current path Pp1 is formed, and before the step ST24 is started, the current flowing in the current path Pp2 and the current supplied from the power supply capacitor 11 flow toward the current path Pp1. At this time, the currents of the currents Ic, Iqp, Iqdp, -IL, Iqcr, -Iqcf, and Iqhn have further increased with the passage of time from the current flowing in the current path Pp2 before the start of step ST24. On the one hand, the energy Ec of the power supply capacitor 11 is further reduced over time. In addition, the currents Iqhp, Iqif, Iqir, and Iqdn do not flow through the transistors Qhp, Qif, Qir, and Qdn.

接著,於步驟ST25中,與步驟ST23同樣地,控制裝置30將閘極信號Sqp、Sqhn、Sqcf、Sqcr設定為高位準,將除此以外之閘極信號 設定為低位準而輸出。即,自步驟ST24起僅閘極信號Sqdp自高位準變更為低位準,除此以外之閘極信號未變更。藉此,形成電流路徑Pp2,於將要開始步驟ST25之前流動於電流路徑Pp1之電流係朝電流路徑Pp2流動。此時,與步驟S23同樣地,電流Ic、Iqp、Iqdp之電流量成為0,電流Iqhn、-Iqdn、-IL、Iqcr、-Iqcf之電流量係隨著時間之經過而逐漸減少。又,電流Iqhp、Iqif、Iqir之電流量仍為0。又,因未自電源電容器11供給電流,故能量Ec無變化。於該時點可獲得P側開關測定所需之波形。即,藉由將步驟ST22~ST25之電晶體Qdp設為斷開狀態為止,可獲得電晶體Qdp之開關測定所需之波形。這表示將步驟ST22~ST25之電晶體Qdp設為斷開狀態為止之處理,可稱為狹義之電晶體Qdp之開關測定。 Next, in step ST25, as in step ST23, the control device 30 sets the gate signals Sqp, Sqhn, Sqcf, and Sqcr to a high level, and sets other gate signals Set to low level and output. That is, from step ST24, only the gate signal Sqdp is changed from the high level to the low level, and the other gate signals are not changed. Thereby, the current path Pp2 is formed, and the current flowing in the current path Pp1 before the step ST25 is started is flowing toward the current path Pp2. At this time, as in step S23, the current amounts of the currents Ic, Iqp, and Iqdp become 0, and the current amounts of the currents Iqhn, -Iqdn, -IL, Iqcr, and -Iqcf gradually decrease as time passes. In addition, the current amounts of the currents Iqhp, Iqif, and Iqir are still zero. Since no current is supplied from the power supply capacitor 11, the energy Ec does not change. At this point, the waveform required for the P-side switch measurement can be obtained. That is, until the transistor Qdp of steps ST22 to ST25 is turned off, a waveform required for the switch measurement of the transistor Qdp can be obtained. This means that the process until the transistor Qdp of steps ST22 to ST25 is turned off can be referred to as a switch measurement of the transistor Qdp in a narrow sense.

其後,控制裝置30將閘極信號Sqhn自高位準變更為低位準。藉此,電晶體Qp、Qcf、Qcr成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖9所示,形成自電源電容器11之-端子起依序經過二極體Ddn、電抗器L、電容器Qcr、電晶體Qcf、二極體Dhp及電晶體Qp而返回至電源電容器11之+端子之電流路徑Pp3,於將要將閘極信號Sqhn切換為低位準之前,流動於電流路徑Pp2之電流朝電流路徑Pp3流動。因此,電流Iqhn之電流量成為0。再者,因電流路徑Pp3係自電源電容器11之-端子朝向+端子,故將電源電容器11充電,能量Ec隨著時間之經過而增加,另一方面,電流-Iqdn、-IL、Iqcr、-Iqcf、-Iqhp(於二極體Dhp中流動之電流)、-Iqp、-Ic之電流量隨著時間之經過而減少。又,電流Iqdp、Iqif、Iqir之電流量仍為0。 Thereafter, the control device 30 changes the gate signal Sqhn from a high level to a low level. Accordingly, the transistors Qp, Qcf, and Qcr are turned on, and the other transistors are turned off. At this time, as shown in FIG. 9, from the-terminal of the power capacitor 11, the diode Ddn, the reactor L, the capacitor Qcr, the transistor Qcf, the diode Dhp, and the transistor Qp are sequentially returned to the power capacitor. The current path Pp3 of the + terminal of 11 is before the gate signal Sqhn is switched to a low level, the current flowing in the current path Pp2 flows toward the current path Pp3. Therefore, the current amount of the current Iqhn becomes zero. Furthermore, since the current path Pp3 is from the-terminal of the power capacitor 11 to the + terminal, the power capacitor 11 is charged, and the energy Ec increases with the passage of time. On the other hand, the currents -Iqdn, -IL, Iqcr,- The amount of current Iqcf, -Iqhp (current flowing in the diode Dhp), -Iqp, -Ic decreases with the passage of time. In addition, the current amounts of the currents Iqdp, Iqif, and Iqir are still zero.

接著,於步驟ST26中,持續與步驟ST25相同之狀態,於電流路徑Pp3中流動之電流之電流量成為0,電源電容器11之能量Ec大致恢復至滿充電狀態。 Next, in step ST26, the same state as in step ST25 is continued, the amount of current flowing in the current path Pp3 becomes 0, and the energy Ec of the power supply capacitor 11 is restored to a fully charged state.

接著,於步驟ST27中,控制裝置30將閘極信號Sqp、Sqhp、 Sqhn、Sqif、Sqir、Sqcf、Sqcr、Sqdp、Sqdn均設定為低位準而輸出。因此,電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr、Qdp、Qdn均成為斷開狀態,各電晶體中未流動電流。如此,P側開關測定結束。再者,亦可由未圖示之檢測電路等檢測電流路徑Pp3中流動之電流之電流量成為特定閾值以下,控制裝置30則藉由來自檢測電路之輸出信號,檢測電流路徑Pp3中流動之電流之電流量大致成為0(能量回收處理之結束)。特定閾值例如設定為0,或稍大於0之值。又,控制裝置30亦可相應於檢測到能量回收處理之結束而進行步驟ST27之處理。 Next, in step ST27, the control device 30 sends the gate signals Sqp, Sqhp, Sqhn, Sqif, Sqir, Sqcf, Sqcr, Sqdp, and Sqdn are all set to a low level and output. Therefore, the transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr, Qdp, and Qdn are turned off, and no current flows in each transistor. In this way, the P-side switch measurement is completed. Furthermore, the amount of current flowing in the current path Pp3 may be detected by a detection circuit or the like not shown, and the control device 30 may detect the amount of current flowing in the current path Pp3 by an output signal from the detection circuit. The amount of current is approximately 0 (the end of the energy recovery process). The specific threshold value is set to, for example, 0, or a value slightly larger than 0. In addition, the control device 30 may perform the processing of step ST27 in response to detecting the end of the energy recovery processing.

如以上般,控制裝置30係於開始P側開關測定時,將電晶體Qp、Qhn、Qcf、Qcr設為接通狀態,且相應於P側開關測定之波形擷取結束,將電晶體Qhn設為斷開狀態,藉此回收P側開關測定中所使用之能量。再者,控制裝置30係於回收於P側開關測定中所使用之能量後,將電晶體Qp、Qcf、Qcr設為斷開狀態。因此,因於P側開關測定結束時能量Ec大致成為滿充電狀態,故無需為下一測定而利用高壓電源進行電源電容器11之充電。 As described above, when the control device 30 starts the P-side switch measurement, the transistors Qp, Qhn, Qcf, and Qcr are turned on, and the waveform acquisition corresponding to the P-side switch measurement is completed, and the transistor Qhn is set In the off state, the energy used in the measurement of the P-side switch is recovered. The control device 30 recovers the energy used in the P-side switch measurement and sets the transistors Qp, Qcf, and Qcr to the off state. Therefore, since the energy Ec is approximately fully charged at the end of the P-side switch measurement, it is not necessary to charge the power supply capacitor 11 with a high-voltage power supply for the next measurement.

其次,就使用動態特性測試裝置1之開關測定之比較例進行說明。圖10係比較例之N側開關測定之時序圖。圖11係比較例之P側開關測定之時序圖。如圖10所示,比較例之N側開關測定與圖2之N側開關測定相比,不同之處在於將閘極信號Sqhp自高位準切換為低位準之時序。具體而言,於比較例之N側開關測定中,於步驟ST115及步驟ST116中,控制裝置30將閘極信號Sqhp維持在高位準。因此,流動於電流路徑Pn2之電流(電流Iqhp、Iqcf、-Iqcr、IL、-Iqdp)之電流量係隨著時間之經過而逐漸減少,最終成為0,但電源電容器11未被充電。因此,於進行下一測定之前,必須利用高壓電源對電源電容器11充電。 Next, a comparative example of the switch measurement using the dynamic characteristic tester 1 will be described. FIG. 10 is a timing chart of the N-side switch measurement of the comparative example. Fig. 11 is a timing chart of the P-side switch measurement of the comparative example. As shown in FIG. 10, the N-side switch measurement of the comparative example is different from the N-side switch measurement of FIG. 2 in that the timing of switching the gate signal Sqhp from a high level to a low level is different. Specifically, in the N-side switch measurement of the comparative example, in steps ST115 and ST116, the control device 30 maintains the gate signal Sqhp at a high level. Therefore, the amount of current (currents Iqhp, Iqcf, -Iqcr, IL, and -Iqdp) flowing in the current path Pn2 gradually decreases with the passage of time and eventually becomes 0, but the power supply capacitor 11 is not charged. Therefore, before the next measurement is performed, the power supply capacitor 11 must be charged with a high-voltage power supply.

同樣地,如圖11所示,比較例之P側開關測定與圖6之P側開關測定相比,不同之處在於將閘極信號Sqhn自高位準切換為低位準之時序。具體而言,於比較例之P側開關測定中,於步驟ST125及步驟ST126中,控制裝置30係將閘極信號Sqhn維持在高位準。因此,流動於電流路徑Pp2之電流(電流Iqhn、-Iqdn、-IL、Iqcr、-Iqcf)之電流量係隨著時間之經過而逐漸減少,最終成為0,但電源電容器11未被充電。因此,於進行下一測定之前,必須利用高壓電源對電源電容器11進行充電。 Similarly, as shown in FIG. 11, the P-side switch measurement of the comparative example is different from the P-side switch measurement of FIG. 6 in that the gate signal Sqhn is switched from the high level to the low level timing. Specifically, in the measurement of the P-side switch of the comparative example, in steps ST125 and ST126, the control device 30 maintains the gate signal Sqhn at a high level. Therefore, the amount of current (currents Iqhn, -Iqdn, -IL, Iqcr, and -Iqcf) flowing in the current path Pp2 gradually decreases with the passage of time and eventually becomes 0, but the power supply capacitor 11 is not charged. Therefore, before performing the next measurement, the power supply capacitor 11 must be charged with a high-voltage power supply.

其次,就動態特性測試裝置1之過電流防止進行說明。首先,就N側開關測定之過電流防止進行說明。圖12係包含動態特性測試裝置1之過電流防止處理之N側開關測定之時序圖。圖13係表示N側開關測定之過電流防止處理時之電流路徑之圖。 Next, the overcurrent prevention of the dynamic characteristic test device 1 will be described. First, the overcurrent prevention measured by the N-side switch will be described. FIG. 12 is a timing chart of the N-side switch measurement including the overcurrent prevention processing of the dynamic characteristic test device 1. FIG. 13 is a diagram showing a current path during an overcurrent prevention process measured by an N-side switch.

如圖12所示,因步驟ST31~步驟ST33之閘極信號係與圖2之步驟ST11~ST13相同,故省略相關說明。於本例中,於步驟ST33中,假定為因DUT50不良,電晶體Qdn無法成為斷開狀態之情形。於該情形時,於步驟ST32以後,於電流路徑Pn1中,電流(電流Ic、Iqp、Iqhp、Iqcf、-Iqcr、IL、Iqdn)持續流動,隨著時間之經過,其電流量持續增加。 As shown in FIG. 12, since the gate signals of steps ST31 to ST33 are the same as steps ST11 to ST13 of FIG. 2, the related description is omitted. In this example, in step ST33, it is assumed that the transistor Qdn cannot be turned off due to a defective DUT50. In this case, after step ST32, in the current path Pn1, currents (currents Ic, Iqp, Iqhp, Iqcf, -Iqcr, IL, Iqdn) continue to flow, and the amount of current continues to increase over time.

再者,於步驟ST34中,於電流路徑Pn1中流動之電流之電流量變得大於N側之過電流閾值Ref_N,比較器23將低位準之輸出信號輸出至控制裝置30。繼而,控制裝置30相應於自比較器23接收到低位準之輸出信號而檢測過電流,將閘極信號Sqp、Sqhp自高位準變更為低位準,將閘極信號Sqir自低位準變更為高位準。藉此,電晶體Qcf、Qcr、Qir、Qdn成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖13所示,形成依序於電晶體Qcf、電晶體Qcr、電抗器L、電晶體Qdn及二極體Dhn循環之電流路徑Pn41,且形成依序於電抗器L、 電晶體Qir及二極體Dif循環之電流路徑Pn42。又,流動於電流路徑Pn1之過電流分支成電流路徑Pn41及電流路徑Pn42而流動。藉此,可防止過電流持續朝測試電路10及DUT50流動。 Furthermore, in step ST34, the current amount of the current flowing in the current path Pn1 becomes larger than the overcurrent threshold Ref_N on the N side, and the comparator 23 outputs a low-level output signal to the control device 30. Then, the control device 30 detects the overcurrent in response to the low level output signal received from the comparator 23, changes the gate signals Sqp, Sqhp from the high level to the low level, and changes the gate signal Sqir from the low level to the high level . Accordingly, the transistors Qcf, Qcr, Qir, and Qdn are turned on, and the other transistors are turned off. At this time, as shown in FIG. 13, a current path Pn41 sequentially formed by the transistor Qcf, the transistor Qcr, the reactor L, the transistor Qdn, and the diode Dhn cycle is formed, and the reactor L, Current path Pn42 of transistor Qir and diode Dif cycle. The overcurrent flowing in the current path Pn1 is branched into a current path Pn41 and a current path Pn42 and flows. This can prevent an overcurrent from continuously flowing toward the test circuit 10 and the DUT 50.

接著,於步驟ST35中,與步驟ST15同樣地,控制裝置30自步驟ST34之閘極信號之狀態,僅將閘極信號Sqdn自高位準變更為低位準,不變更除此以外之閘極信號。然而,因DUT50不良,故電晶體Qdn未成為斷開狀態,各電晶體維持與步驟ST34相同之狀態。又,因於電流路徑Pn41中流動之電流於電流路徑Pn41中循環,能量被電晶體Qcf、電晶體Qcr、電抗器L、電晶體Qdn及二極體Dhn之電阻成分等消耗,故其電流量隨著時間之經過而不斷減少。同樣地,因於電流路徑Pn42中流動之電流於電流路徑Pn42中循環,能量被電抗器L、電晶體Qir及二極體Dif之電阻成分等消耗,故其電流量隨著時間之經過而不斷減少。 Next, in step ST35, similarly to step ST15, the control device 30 only changes the gate signal Sqdn from the high level to the low level from the state of the gate signal in step ST34, and does not change the other gate signals. However, because the DUT50 is defective, the transistor Qdn is not turned off, and each transistor is maintained in the same state as in step ST34. In addition, since the current flowing in the current path Pn41 is circulated in the current path Pn41, energy is consumed by the resistance components of the transistor Qcf, the transistor Qcr, the reactor L, the transistor Qdn, and the diode Dhn, so the current amount Decreasing over time. Similarly, because the current flowing in the current path Pn42 circulates in the current path Pn42, the energy is consumed by the resistance components of the reactor L, the transistor Qir, and the diode Dif, so the current amount continues as time passes. cut back.

接著,於步驟ST36中,維持步驟ST35之閘極信號之狀態,於電流路徑Pn41及電流路徑Pn42中流動之電流之電流量進一步減少而成為0。 Next, in step ST36, the state of the gate signal in step ST35 is maintained, and the current amount of the current flowing in the current path Pn41 and the current path Pn42 is further reduced to zero.

接著,於步驟ST37中,控制裝置30將閘極信號Sqp、Sqhp、Sqhn、Sqif、Sqir、Sqcf、Sqcr、Sqdp、Sqdn均設定為低位準而輸出。因此,電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr、Qdp、Qdn均成為斷開狀態,各電晶體中未流動電流。再者,亦可由未圖示之檢測電路等檢測流動於電流路徑Pn41及電流路徑Pn42中之電流之電流量成為特定閾值以下之情形,控制裝置30則藉由來自檢測電路之輸出信號,檢測流動於電流路徑Pn41及電流路徑Pn42中之電流之電流量大致成為0(能量消耗處理結束)。特定閾值例如設定為0,或稍大於0之值。又,控制裝置30亦可相應於檢測到能量消耗處理結束而進行步驟ST37之處理。 Next, in step ST37, the control device 30 sets the gate signals Sqp, Sqhp, Sqhn, Sqif, Sqir, Sqcf, Sqcr, Sqdp, and Sqdn to low levels and outputs them. Therefore, the transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr, Qdp, and Qdn are turned off, and no current flows in each transistor. In addition, a detection circuit or the like may also be used to detect a case where the amount of current flowing in the current path Pn41 and the current path Pn42 falls below a specific threshold, and the control device 30 detects the flow by an output signal from the detection circuit. The current amount of the current in the current path Pn41 and the current path Pn42 becomes approximately 0 (the end of the energy consumption process). The specific threshold value is set to, for example, 0, or a value slightly larger than 0. In addition, the control device 30 may perform the processing of step ST37 in response to detecting the end of the energy consumption processing.

綜上所述,控制裝置30係藉由相應於於N側開關測定中檢測出過電流,而將電晶體Qp、Qhp設為斷開狀態,且將電晶體Qir設為接通狀態,而使過電流防止電路14動作。藉此,產生過電流時蓄積於電抗器L之能量被過電流防止電路14消耗,於N側開關測定中,可防止過多之過電流朝DUT50流動。 In summary, the control device 30 sets the transistors Qp and Qhp to the off state and sets the transistor Qir to the on state by detecting an overcurrent corresponding to the N-side switch measurement. The overcurrent prevention circuit 14 operates. Thereby, the energy accumulated in the reactor L when the overcurrent is generated is consumed by the overcurrent prevention circuit 14, and in the N-side switch measurement, it is possible to prevent excessive overcurrent from flowing to the DUT 50.

其次,就P側開關測定之過電流防止進行說明。圖14係包含動態特性測試裝置1之過電流防止處理之P側開關測定之時序圖。圖15係表示P側開關測定之過電流防止處理時之電流路徑之圖。 Next, the overcurrent prevention measured by the P-side switch will be described. FIG. 14 is a timing chart of the P-side switch measurement including the overcurrent prevention processing of the dynamic characteristic test device 1. Fig. 15 is a diagram showing a current path during an overcurrent prevention process measured by a P-side switch.

如圖14所示,因步驟ST41~步驟ST43之閘極信號係與圖6之步驟ST21~ST23相同,故省略相關說明。於本例中,於步驟ST43中,假定為因DUT50不良,電晶體Qdp無法成為斷開狀態之情形。於該情形時,於步驟ST42以後,於電流路徑Pp1中,電流(電流Ic、Iqp、Iqdp、-IL、Iqcr、-Iqcf、Iqdn)持續流動,隨著時間之經過,其電流量持續增加。 As shown in FIG. 14, since the gate signals of steps ST41 to ST43 are the same as steps ST21 to ST23 of FIG. 6, the related description is omitted. In this example, in step ST43, it is assumed that the transistor Qdp cannot be turned off due to a defective DUT50. In this case, after step ST42, in the current path Pp1, currents (currents Ic, Iqp, Iqdp, -IL, Iqcr, -Iqcf, Iqdn) continue to flow, and the amount of current continues to increase over time.

再者,於步驟ST44中,電流路徑Pp1中流動之電流之電流量變得大於P側之過電流閾值Ref_P,比較器24將低位準之輸出信號輸出至控制裝置30。且,控制裝置30相應於自比較器24接收到低位準之輸出信號而檢測過電流,將閘極信號Sqp、Sqhn自高位準變更為低位準,使閘極信號Sqif自低位準變更為高位準。藉此,電晶體Qcf、Qcr、Qif、Qdp成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖15所示,形成依序於電抗器L、電晶體Qcr、電晶體Qcf、二極體Dhp及電晶體Qdp循環之電流路徑Pp41,且形成依序於電抗器L、電晶體Qif及二極體Dir循環之電流路徑Pp42。又,流動於電流路徑Pp1之過電流分支成電流路徑Pp41及電流路徑Pp42而流動。藉此,可防止過電流持續朝測試電路10及DUT50流動。 Furthermore, in step ST44, the current amount of the current flowing in the current path Pp1 becomes larger than the overcurrent threshold Ref_P on the P side, and the comparator 24 outputs a low-level output signal to the control device 30. In addition, the control device 30 detects an overcurrent in response to the low level output signal received from the comparator 24, changes the gate signals Sqp, Sqhn from a high level to a low level, and changes the gate signal Sqif from a low level to a high level. . Accordingly, the transistors Qcf, Qcr, Qif, and Qdp are turned on, and the other transistors are turned off. At this time, as shown in FIG. 15, a current path Pp41 is sequentially formed in the loop of the reactor L, the transistor Qcr, the transistor Qcf, the diode Dhp, and the transistor Qdp, and the reactor L, the transistor, and the transistor are sequentially formed. Current path Pp42 of Qif and diode Dir cycle. The overcurrent flowing in the current path Pp1 is branched into a current path Pp41 and a current path Pp42 and flows. This can prevent an overcurrent from continuously flowing toward the test circuit 10 and the DUT 50.

接著,於步驟ST45中,與步驟ST25同樣地,控制裝置30自步驟 ST44之閘極信號之狀態,僅將閘極信號Sqdp自高位準變更為低位準,不變更除此以外之閘極信號。然而,因DUT50不良,故電晶體Qdp未成為斷開狀態,各電晶體維持與步驟ST44相同之狀態。又,因於電流路徑Pp41中流動之電流於電流路徑Pp41中循環,能量被電抗器L、電晶體Qcr、電晶體Qcf、二極體Dhp及電晶體Qdp之電阻成分等消耗,故其電流量隨著時間之經過而不斷減少。同樣地,因於電流路徑Pp42中流動之電流於電流路徑Pp42中循環,能量被電抗器L、電晶體Qif及二極體Dir之電阻成分等消耗,故其電流量隨著時間之經過而不斷減少。 Next, in step ST45, similarly to step ST25, the control device 30 proceeds from step For the state of the gate signal of ST44, only the gate signal Sqdp is changed from a high level to a low level, and other gate signals are not changed. However, because the DUT50 is defective, the transistor Qdp is not turned off, and each transistor is maintained in the same state as in step ST44. In addition, because the current flowing in the current path Pp41 circulates in the current path Pp41, the energy is consumed by the resistance components of the reactor L, the transistor Qcr, the transistor Qcf, the diode Dhp, and the transistor Qdp, so the current amount Decreasing over time. Similarly, because the current flowing in the current path Pp42 circulates in the current path Pp42, the energy is consumed by the reactor L, the transistor Qif, and the resistance component of the diode Dir, so the current amount continues as time passes. cut back.

接著,於步驟ST46中,維持步驟ST45之閘極信號之狀態,電流路徑Pp41及電流路徑Pp42中流動之電流之電流量進一步減少而成為0。 Next, in step ST46, the state of the gate signal in step ST45 is maintained, and the current amount of the current flowing in the current path Pp41 and the current path Pp42 is further reduced to zero.

接著,於步驟ST47中,控制裝置30將閘極信號Sqp、Sqhp、Sqhn、Sqif、Sqir、Sqcf、Sqcr、Sqdp、Sqdn均設定為低位準而輸出。因此,電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr、Qdp、Qdn均成為斷開狀態,各電晶體中未流動電流。再者,亦可由未圖示之檢測電路等檢測流動於電流路徑Pp41及電流路徑Pp42中之電流之電流量成為特定閾值以下,控制裝置30則藉由來自檢測電路之輸出信號,檢測流動於電流路徑Pp41及電流路徑Pp42中之電流之電流量大致成為0(能量消耗處理結束)。特定閾值例如設定為0,或稍大於0之值。又,控制裝置30亦可依從於檢測到能量消耗處理結束而進行步驟ST47之處理。 Next, in step ST47, the control device 30 sets the gate signals Sqp, Sqhp, Sqhn, Sqif, Sqir, Sqcf, Sqcr, Sqdp, and Sqdn to the low level and outputs them. Therefore, the transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr, Qdp, and Qdn are turned off, and no current flows in each transistor. In addition, the amount of current flowing in the current path Pp41 and the current path Pp42 may be detected by a detection circuit or the like that is not shown below a specific threshold value. The control device 30 detects the current flowing through the output signal from the detection circuit. The current amounts of the currents in the path Pp41 and the current path Pp42 are approximately 0 (the energy consumption process ends). The specific threshold value is set to, for example, 0, or a value slightly larger than 0. In addition, the control device 30 may perform the processing of step ST47 in response to detecting the end of the energy consumption processing.

綜上所述,控制裝置30係依從於於P側開關測定中檢測出過電流,藉由將電晶體Qp、Qhn設為斷開狀態,且將電晶體Qif設為接通狀態,而使過電流防止電路14動作。藉此,產生過電流時蓄積於電抗器L之能量被過電流防止電路14消耗,於P側開關測定中,可防止過 多之過電流朝DUT50流動。 In summary, the control device 30 is based on the detection of the overcurrent in the P-side switch measurement, and the transistor Qp and Qhn are set to the off state, and the transistor Qif is set to the on state to make the The current prevention circuit 14 operates. Thereby, the energy accumulated in the reactor L when an overcurrent is generated is consumed by the overcurrent prevention circuit 14, and during the measurement of the P-side switch, the overcurrent can be prevented. Too much overcurrent flows towards the DUT50.

進而,就使用高速阻斷電路15之過電流防止進行說明。首先,就使用高速阻斷電路15之N側開關測定之過電流防止進行說明。圖16係包含使用動態特性測試裝置1之高速阻斷電路之過電流防止處理之N側開關測定之時序圖。圖17係表示N側開關測定之使用高速阻斷電路之過電流防止處理時之電流路徑之圖。 Furthermore, the overcurrent prevention using the high-speed blocking circuit 15 will be described. First, the overcurrent prevention measured using the N-side switch of the high-speed blocking circuit 15 will be described. FIG. 16 is a timing chart of the N-side switch measurement including the overcurrent prevention processing using the high-speed blocking circuit of the dynamic characteristic test device 1. FIG. FIG. 17 is a diagram showing a current path when an overcurrent prevention process using a high-speed blocking circuit is measured for an N-side switch.

圖16所示之閘極信號之時序圖與圖12所示之閘極信號之時序圖相比,不同之點係於步驟ST54中,控制裝置30依從於檢測出過電流,進而將閘極信號Sqcf、Sqcr自高位準變更為低位準。因此,若檢測出過電流,則電晶體Qir、Qdn成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖17所示,因電流路徑Pn41並未形成,僅形成電流路徑Pn42,故流動於電流路徑Pn1之過電流朝電流路徑Pn42流動。又,因於電流路徑Pn42中流動之電流係藉由於電流路徑Pn42中循環而消耗能量,故其電流量隨著時間之經過而不斷減少。 The timing diagram of the gate signal shown in FIG. 16 is different from the timing diagram of the gate signal shown in FIG. 12. The difference is in step ST54. The control device 30 detects the overcurrent in accordance with the gate signal, and further changes the gate signal. Sqcf, Sqcr changed from high level to low level. Therefore, if an overcurrent is detected, the transistors Qir and Qdn are turned on, and the other transistors are turned off. At this time, as shown in FIG. 17, since the current path Pn41 is not formed, and only the current path Pn42 is formed, the overcurrent flowing in the current path Pn1 flows toward the current path Pn42. In addition, since the current flowing in the current path Pn42 consumes energy due to the circulation in the current path Pn42, the amount of current decreases continuously with the passage of time.

綜上所述,控制裝置30係依從於N側開關測定中檢測出過電流,將電晶體Qp、Qhp設為斷開狀態,且將電晶體Qir設為接通狀態,而使過電流防止電路14動作,進而,藉由將電晶體Qcf、Qcr設為斷開狀態,使高速阻斷電路15動作。藉此,產生過電流時蓄積於電抗器L之能量係作為電流而流動於過電流防止電路14,而被過電流防止電路14消耗。於不使高速阻斷電路15動作之情形時,流動於電流路徑Pn1之過電流係分支成電流路徑Pn41及電流路徑Pn42而流動。此時,有助於過電流之消耗之電阻值係成為電流路徑Pn41之電阻成分之電阻值與電流路徑Pn42之電阻成分之電阻值之合成電流值,且較電流路徑Pn42之電阻成分之電阻值更小。因此,相較於不使高速阻斷電路15動作之情形,使高速阻斷電路15動作之情形因其有助於過電流之消耗之電阻值變大,故可於短時間內消耗蓄積於電抗器L之能量,於N側開關測定 中,可更確實地防止過多之過電流朝DUT50流動。 To sum up, the control device 30 detects the overcurrent in the N-side switch measurement, sets the transistors Qp and Qhp to the off state, and sets the transistor Qir to the on state to make the overcurrent prevention circuit 14 operations, and further, the transistors Qcf and Qcr are turned off to operate the high-speed blocking circuit 15. Accordingly, the energy accumulated in the reactor L when an overcurrent is generated flows through the overcurrent prevention circuit 14 as a current, and is consumed by the overcurrent prevention circuit 14. When the high-speed blocking circuit 15 is not operated, the overcurrent flowing in the current path Pn1 is branched into a current path Pn41 and a current path Pn42 and flows. At this time, the resistance value contributing to the consumption of the overcurrent is the combined current value of the resistance value of the resistance component of the current path Pn41 and the resistance value of the resistance component of the current path Pn42, and is greater than the resistance value of the resistance component of the current path Pn42. smaller. Therefore, compared with the case where the high-speed blocking circuit 15 is not operated, the case where the high-speed blocking circuit 15 is operated is because the resistance value which contributes to the consumption of the overcurrent becomes larger, so it can be consumed and accumulated in the reactance in a short time. The energy of the device L is measured at the N-side switch In this way, it is possible to more reliably prevent excessive overcurrent from flowing to the DUT50.

其次,就使用高速阻斷電路15之P側開關測定之過電流防止進行說明。圖18係包含使用動態特性測試裝置1之高速阻斷電路之過電流防止處理之P側開關測定之時序圖。圖19係P側開關測定之使用高速阻斷電路之過電流防止處理時之電流路徑之圖。 Next, the overcurrent prevention measured using the P-side switch of the high-speed blocking circuit 15 will be described. FIG. 18 is a timing chart of the P-side switch measurement including overcurrent prevention processing using the high-speed blocking circuit of the dynamic characteristic test device 1. FIG. Fig. 19 is a diagram showing a current path when an overcurrent prevention process using a high-speed blocking circuit is measured by a P-side switch.

圖18所示之閘極信號之時序圖與圖14所示之閘極信號之時序圖相比,不同之點係於步驟ST64中,控制裝置30隨著檢測出過電流,進而將閘極信號Sqcf、Sqcr自高位準變更為低位準。因此,若檢測出過電流,則電晶體Qif、Qdp成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖19所示,因電流路徑Pp41並未形成,僅形成電流路徑Pp42,故流動於電流路徑Pp1之過電流朝電流路徑Pp42流動。又,因於電流路徑Pp42中流動之電流係藉由於電流路徑Pp42中循環而消耗能量,故其電流量隨著時間之經過而不斷減少。 The timing diagram of the gate signal shown in FIG. 18 is different from the timing diagram of the gate signal shown in FIG. 14. The difference is in step ST64. The control device 30 detects the overcurrent and further changes the gate signal. Sqcf, Sqcr changed from high level to low level. Therefore, if an overcurrent is detected, the transistors Qif and Qdp are turned on, and the other transistors are turned off. At this time, as shown in FIG. 19, since the current path Pp41 is not formed, and only the current path Pp42 is formed, the overcurrent flowing in the current path Pp1 flows toward the current path Pp42. In addition, since the current flowing in the current path Pp42 consumes energy due to the circulation in the current path Pp42, the amount of current decreases continuously with the passage of time.

綜上所述,控制裝置30係依從於P側開關測定中檢測出過電流,藉由將電晶體Qp、Qhn設為斷開狀態,且將電晶體Qif設為接通狀態,使過電流防止電路14動作,進而,藉由將電晶體Qcf、Qcr設為斷開狀態,而使高速阻斷電路15動作。藉此,產生過電流時蓄積於電抗器L之能量係作為電流而流動於過電流防止電路14,並被過電流防止電路14消耗。於不使高速阻斷電路15動作之情形時,流動於電流路徑Pp1之過電流係分支成電流路徑Pp41及電流路徑Pp42而流動。此時,有助於過電流之消耗之電阻值係成為電流路徑Pp41之電阻成分之電阻值與電流路徑Pp42之電阻成分之電阻值之合成電流值,且較電流路徑Pp42之電阻成分之電阻值更小。因此,相較於不使高速阻斷電路15動作之情形,使高速阻斷電路15動作之情形因其有助於過電流之消耗之電阻值變大,故可於短時間內消耗蓄積於電抗器L之能量,於p側開關測定中,可更確實地防止過多之過電流朝DUT50流動。 In summary, the control device 30 detects the overcurrent in accordance with the measurement of the P-side switch, and sets the transistors Qp and Qhn to the off state, and sets the transistor Qif to the on state to prevent overcurrent. The circuit 14 operates, and further, the transistors Qcf and Qcr are turned off to operate the high-speed blocking circuit 15. As a result, the energy accumulated in the reactor L when an overcurrent is generated flows through the overcurrent prevention circuit 14 as a current and is consumed by the overcurrent prevention circuit 14. When the high-speed blocking circuit 15 is not operated, the overcurrent flowing in the current path Pp1 is branched into a current path Pp41 and a current path Pp42 and flows. At this time, the resistance value contributing to the consumption of the overcurrent is the combined current value of the resistance value of the resistance component of the current path Pp41 and the resistance value of the resistance component of the current path Pp42, and is greater than the resistance value of the resistance component of the current path Pp42. smaller. Therefore, compared with the case where the high-speed blocking circuit 15 is not operated, the case where the high-speed blocking circuit 15 is operated is because the resistance value which contributes to the consumption of the overcurrent becomes larger, so it can be consumed and accumulated in the reactance in a short time. In the measurement of the p-side switch, the energy of the device L can more reliably prevent excessive overcurrent from flowing to the DUT50.

(短路容量測定) (Measurement of short-circuit capacity)

其次,對使用動態特性測定裝置1之短路容量測量進行說明。首先,就電晶體Qdn之短路容量測定(有時稱為「N側短路容量測定」)進行說明。圖20係動態特性測試裝置1之N側短路容量測定之時序圖。如圖20所示,於步驟ST71中,控制裝置30將繼電器信號Sswp、Sswn及閘極信號Sqp、Sqhp、Sqhn、Sqif、Sqir、Sqcf、Sqcr、Sqdp、Sqdn均設定為低位準而輸出。因此,開關SWp、SWn及電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr、Qdp、Qdn均為斷開狀態,各電晶體及開關中未流動電流。 Next, the short-circuit capacity measurement using the dynamic characteristic measuring device 1 will be described. First, the short-circuit capacity measurement of the transistor Qdn (sometimes referred to as "N-side short-circuit capacity measurement") will be described. FIG. 20 is a timing chart of the N-side short-circuit capacity measurement of the dynamic characteristic test device 1. FIG. As shown in FIG. 20, in step ST71, the control device 30 sets the relay signals Sswp, Sswn and the gate signals Sqp, Sqhp, Sqhn, Sqif, Sqir, Sqcf, Sqcr, Sqdp, and Sqdn to low levels and outputs them. Therefore, the switches SWp, SWn and the transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr, Qdp, Qdn are all in an off state, and no current flows in each transistor and switch.

接著,於步驟ST72中,控制裝置30係將繼電器信號Sswp及閘極信號Sqp、Sqdn設定為高位準,將繼電器信號Sswn及閘極信號Sqhp、Sqhn、Sqif、Sqir、Sqcf、Sqcr、Sqdp設定為低位準而輸出。藉此,開關SWp及電晶體Qp、Qdn成為接通狀態,除此以外之開關及電晶體成為斷開狀態。此時,形成自電源電容器11之+端子起依序經過電晶體Qp、開關SWp及電晶體Qdn而返回至電源電容器11之-端子之電流路徑,電流流動於該電流路徑中。如此,短路電流流動於電晶體Qdn中,而未經由電抗器L。 Next, in step ST72, the control device 30 sets the relay signal Sswp and the gate signals Sqp, Sqdn to a high level, and sets the relay signal Sswn and the gate signals Sqhp, Sqhn, Sqif, Sqir, Sqcf, Sqcr, Sqdp to Low level and output. Thereby, the switch SWp and the transistors Qp and Qdn are turned on, and the other switches and the transistors are turned off. At this time, a current path is formed from the + terminal of the power supply capacitor 11 to the-terminal of the power capacitor 11 through the transistor Qp, the switch SWp, and the transistor Qdn in this order, and a current flows in the current path. In this way, the short-circuit current flows in the transistor Qdn without passing through the reactor L.

接著,於步驟ST73中,控制裝置30係與步驟ST71同樣地,將繼電器信號Sswp、Sswn及閘極信號Sqp、Sqhp、Sqhn、Sqif、Sqir、Sqcf、Sqcr、Sqdp、Sqdn均設定為低位準而輸出。藉此,所有開關及電晶體皆成為斷開狀態,各電晶體及開關中未流動電流。藉由以上一連串之處理,進行N側短路容量測定。 Next, in step ST73, the control device 30 sets the relay signals Sswp, Sswn, and the gate signals Sqp, Sqhp, Sqhn, sqif, Sqir, Sqcf, Sqcr, Sqdp, and Sqdn to the low level similarly to step ST71. Output. As a result, all switches and transistors are turned off, and no current flows through the transistors and switches. Through the above series of processes, the N-side short-circuit capacity is measured.

其次,就電晶體Qdp之短路容量測定(有時稱為「P側短路容量測定」)進行說明。圖21係動態特性測試裝置1之P側短路容量測定之時序圖。如圖21所示,於步驟ST81中,控制裝置30係將繼電器信號Sswp、Sswn及閘極信號Sqp、Sqhp、Sqhn、Sqif、Sqir、Sqcf、Sqcr、 Sqdp、Sqdn均設定為低位準而輸出。因此,開關SWp、SWn及電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr、Qdp、Qdn均成為斷開狀態,各電晶體及開關中並未流動有電流。 Next, the short-circuit capacity measurement (sometimes called "P-side short-circuit capacity measurement") of the transistor Qdp will be described. FIG. 21 is a timing chart of the P-side short-circuit capacity measurement of the dynamic characteristic test device 1. FIG. As shown in FIG. 21, in step ST81, the control device 30 transmits the relay signals Sswp, Sswn and the gate signals Sqp, Sqhp, Sqhn, Sqif, Sqir, Sqcf, Sqcr, Sqdp and Sqdn are set to low level and output. Therefore, the switches SWp, SWn and the transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr, Qdp, Qdn are all turned off, and no current flows through the transistors and switches.

接著,於步驟ST82中,控制裝置30將繼電器信號Sswn及閘極信號Sqp、Sqdp設定為高位準,將繼電器信號Sswp及閘極信號Sqhp、Sqhn、Sqif、Sqir、Sqcf、Sqcr、Sqdn設定為低位準而輸出。藉此,開關SWn及電晶體Qp、Qdp成為接通狀態,除此以外之開關及電晶體成為斷開狀態。此時,形成自電源電容器11之+端子起依序經過電晶體Qp、電晶體Qdp及開關SWn而返回至電源電容器11之-端子之電流路徑,電流流動於該電流路徑中。如此,短路電流流動於電晶體Qdp中,而未經由電抗器L。 Next, in step ST82, the control device 30 sets the relay signal Sswn and the gate signals Sqp and Sqdp to a high level, and sets the relay signal Sswp and the gate signals Sqhp, Sqhn, Sqif, Sqir, Sqcf, Sqcr, and Sqdn to low levels. Output. Thereby, the switch SWn and the transistors Qp and Qdp are turned on, and the other switches and the transistors are turned off. At this time, a current path is formed from the + terminal of the power supply capacitor 11 to the-terminal of the power supply capacitor 11 through the transistor Qp, the transistor Qdp, and the switch SWn in this order, and a current flows in the current path. In this way, the short-circuit current flows in the transistor Qdp without passing through the reactor L.

接著,於步驟ST83中,控制裝置30係與步驟ST81同樣地,將繼電器信號Sswp、Sswn及閘極信號Sqp、Sqhp、Sqhn、Sqif、Sqir、Sqcf、Sqcr、Sqdp、Sqdn均設定為低位準而輸出。藉此,所有開關及電晶體均成為斷開狀態,各電晶體及開關中未流動電流。藉由以上之一連串之處理,進行P側短路容量測定。 Next, in step ST83, the control device 30 sets the relay signals Sswp, Sswn, and the gate signals Sqp, Sqhp, Sqhn, sqif, Sqir, Sqcf, Sqcr, Sqdp, and Sqdn to the low level similarly to step ST81. Output. As a result, all switches and transistors are turned off, and no current flows through the transistors and switches. Through one of the above-mentioned series of processes, the P-side short-circuit capacity is measured.

於以上所說明之動態特性測試裝置1中,於開始電晶體Qdn之開關測定時,電晶體Qp、Qhp、Qcf、Qcr被設定為接通狀態,相應於電晶體Qdn之開關測定(用於開關測定之波形擷取)結束,電晶體Qhp被設定為斷開狀態後,電晶體Qp、Qcf、Qcr被設定為斷開狀態。於電晶體Qdn之開關測定時,自電源電容器11供給至電晶體Qdn之電流係自連接部Cs朝向連接部Cd而流動於電抗器L中,於電晶體Qdn之開關測定(用於開關測定之波形擷取)結束之時點,能量蓄積於電抗器L。因此,藉由相應於電晶體Qdn之開關測定(用於開關測定之波形擷取)結束,電晶體Qhp被設定為斷開狀態,形成自電源電容器11之-端子起依序經過二極體Dhn、電晶體Qcf、電晶體Qcr、電抗器L、二極體Ddp及 電晶體Qp而返回至電源電容器11之+端子之電流路徑Pn3,蓄積於電抗器L之能量作為電流朝電源電容器11之+端子流動。藉此,可回收電晶體Qdn之開關測定中所使用之電源電容器11之能量(電力)之一部分。其結果,可降低動態特性測試之電力使用量。又,可縮短為進行下一測定而對電源電容器11進行充電之時間,可縮短(加快)機器循環週期。 In the dynamic characteristic test device 1 described above, when the switching measurement of the transistor Qdn is started, the transistors Qp, Qhp, Qcf, and Qcr are set to the ON state, corresponding to the switching measurement of the transistor Qdn (for switching After the measurement waveform is acquired, the transistor Qhp is set to the off state, and the transistors Qp, Qcf, and Qcr are set to the off state. During the switching measurement of the transistor Qdn, the current supplied from the power supply capacitor 11 to the transistor Qdn flows from the connection portion Cs toward the connection portion Cd and flows in the reactor L. In the switching measurement of the transistor Qdn (for switching measurement At the end of the waveform capture), energy is accumulated in the reactor L. Therefore, by the end of the switch measurement (waveform capture for switch measurement) corresponding to the transistor Qdn, the transistor Qhp is set to the off state, and the diode Dhn is sequentially passed from the-terminal of the power capacitor 11 , Transistor Qcf, transistor Qcr, reactor L, diode Ddp and The transistor Qp returns to the current path Pn3 of the + terminal of the power capacitor 11, and the energy accumulated in the reactor L flows as a current toward the + terminal of the power capacitor 11. Thereby, a part of the energy (electricity) of the power supply capacitor 11 used in the switching measurement of the transistor Qdn can be recovered. As a result, it is possible to reduce the power consumption of the dynamic characteristic test. In addition, the time for charging the power supply capacitor 11 for the next measurement can be shortened, and the cycle time of the machine can be shortened (accelerated).

又,於動態特性測試裝置1中,於開始電晶體Qdp之開關測定時,電晶體Qp、Qhn、Qcf、Qcr被設定為接通狀態,而相應於電晶體Qdp之開關測定(用於開關測定之波形擷取)結束,電晶體Qhn被設定為斷開狀態後,電晶體Qp、Qcf、Qcr被設定為斷開狀態。於電晶體Qdp之開關測定時,自電源電容器11供給至電容器Qdp之電流係自連接部Cd朝向連接部Cs流動於電抗器L中,於電晶體Qdp之開關測定(用於開關測定之波形擷取)結束之時點,能量蓄積於電抗器L。因此,藉由相應於電晶體Qdp之開關測定(用於開關測定之波形擷取)結束,電晶體Qhn被設定為斷開狀態,形成自電源電容器11之-端子起依序經過二極體Ddn、電抗器L、電晶體Qcr、電晶體Qcf、二極體Dhp及電晶體Qp而返回至電源電容器11之+端子之電流路徑Pp3,蓄積於電抗器L之能量作為電流朝電源電容器11之+端子流動。藉此,可回收電晶體Qdp之開關測定中使用之電源電容器11之能量(電力)之一部分。其結果,可進一步減少動態特性測試之電力使用量。又,可縮短為進行下一測定而對電源電容器11進行充電之時間,從而可縮短(加快)機器循環週期。 Further, in the dynamic characteristic test device 1, when the switching measurement of the transistor Qdp is started, the transistors Qp, Qhn, Qcf, and Qcr are set to the ON state, and the switching measurement corresponding to the transistor Qdp (for switching measurement After the waveform capture) is completed, the transistor Qhn is set to the off state, and the transistors Qp, Qcf, and Qcr are set to the off state. During the switching measurement of the transistor Qdp, the current supplied from the power capacitor 11 to the capacitor Qdp flows in the reactor L from the connection portion Cd toward the connection portion Cs. At the time of completion, energy is accumulated in the reactor L. Therefore, by the end of the switch measurement (waveform capture for switch measurement) corresponding to the transistor Qdp, the transistor Qhn is set to the off state, and the diode Ddn is sequentially passed from the-terminal of the power capacitor 11 , Reactor L, transistor Qcr, transistor Qcf, diode Dhp, and transistor Qp return to the current path Pp3 of the + terminal of the power capacitor 11, and the energy accumulated in the reactor L is used as a current toward the + of the power capacitor 11 The terminal flows. Thereby, a part of the energy (electricity) of the power supply capacitor 11 used in the switching measurement of the transistor Qdp can be recovered. As a result, it is possible to further reduce the power consumption of the dynamic characteristic test. In addition, the time for charging the power supply capacitor 11 for the next measurement can be shortened, and the cycle time of the machine can be shortened (fastened).

又,於動態特性測定裝置1中,藉由將電晶體Qhp設為接通狀態而將電晶體Qdn選為開關測定對象,於電晶體Qdn之開關測定中,於電抗器L中流動自連接部Cs朝向連接部Cd之電流。又,藉由將電晶體Qhn設為接通狀態而將電晶體Qdp選為開關測定對象,於電晶體Qdp之 開關測定中,於電抗器L中流動自連接部Cd朝向連接部Cs之電流。即,於電抗器L中,可流動有雙向之電流。又,於電晶體Qdn之開關測定中,若於動態特性測試裝置1中檢測到超過過電流閾值Ref_N之電流量之過電流之情形時,藉由將電晶體Qir設為接通狀態,形成於電抗器L、電晶體Qir及二極體Dif循環之電流路徑Pn42。且,蓄積於電抗器L之能量作為電流流動於該電流路徑Pn42中而被消耗。另一方面,於電晶體Qdp之開關測定中,於動態特性測試裝置1中檢測出超過過電流閾值Ref_P之電流量之過電流之情形時,藉由將電晶體Qif設為接通狀態,形成於電抗器L、電晶體Qif及二極體Dir循環之電流路徑Pp42。且,蓄積於電抗器L之能量作為電流於該電流路徑Pp42中流動而被消耗。如此,於包含電性串聯連接之電晶體Qdp及電晶體Qdn之DUT50之動態特性測試裝置1中,雖於電抗器L中流動有雙向之電流,但可防止任一方向上額外之過電流朝DUT50流動。藉此,可避免動態特性測試裝置1之故障等。其結果,可減少零件更換等之維護頻率,亦有助於成本之降低。 In addition, in the dynamic characteristic measuring device 1, the transistor Qdn is selected as the switch measurement object by setting the transistor Qhp to the on state, and during the switch measurement of the transistor Qdn, it flows from the connection portion in the reactor L The current of Cs toward the connection portion Cd. In addition, by setting the transistor Qhn to the on state, the transistor Qdp is selected as the measurement target of the switch, and During the switching measurement, a current flowing from the connection portion Cd toward the connection portion Cs flows through the reactor L. That is, a bidirectional current can flow through the reactor L. In addition, in the switching measurement of the transistor Qdn, if an overcurrent exceeding the overcurrent threshold Ref_N is detected in the dynamic characteristic test device 1, the transistor Qir is turned on and formed in Current path Pn42 of reactor L, transistor Qir and diode Dif cycle. The energy stored in the reactor L is consumed as a current flowing through the current path Pn42. On the other hand, in the switching measurement of the transistor Qdp, when an overcurrent exceeding the overcurrent threshold Ref_P is detected in the dynamic characteristic test device 1, the transistor Qif is turned on to form Current path Pp42 in the reactor L, transistor Qif and diode Dir cycle. The energy stored in the reactor L is consumed as a current flowing in the current path Pp42. In this way, in the dynamic characteristic test device 1 including a transistor Qdp electrically connected in series and a transistor Ddn50 of the transistor Qdn, although a bidirectional current flows in the reactor L, it is possible to prevent additional overcurrent in any direction from going to the DUT50. flow. Thereby, a failure or the like of the dynamic characteristic test device 1 can be avoided. As a result, the frequency of maintenance such as replacement of parts can be reduced, and the cost can be reduced.

二極體Dif係電晶體Qif之回流二極體,二極體Dir係電晶體Qir之回流二極體。二極體Dif係以其之順向成為自連接部Cd朝向連接部Cs之方向之方式配置,二極體Dir係以其之順向成為自連接部Cs朝向連接部Cd之方向之方式配置。如此,因使用用於保護電晶體Qif、Qir之回流二極體形成上述電流路徑Pn42、Pp42,故可一面抑制零件之增加,一面防止雙向之額外之過電流朝DUT50流動。 The diode Dif is a reflow diode of a transistor Qif, and the diode Dir is a reflow diode of a transistor Qir. The diode Dif is arranged so that its forward direction becomes the direction from the connecting portion Cd to the connecting portion Cs, and the diode Dir is arranged so that its forward direction becomes the direction from the connecting portion Cs to the connecting portion Cd. In this way, the reflow diodes for protecting the transistors Qif and Qir are used to form the above-mentioned current paths Pn42 and Pp42. Therefore, it is possible to suppress the increase of parts and prevent an extra bidirectional excess current from flowing to the DUT50.

又,於電晶體Ddn之開關測定中,於檢測出過電流之情形時,電晶體Qir被設定為接通狀態,且進而將電晶體Qcf、Qcr設定為斷開狀態,藉此可阻斷與電流路徑Pn42不同之電流路徑Pn41。因此,可使蓄積於電抗器L之能量作為電流而流動於過電流防止電路14(電流路徑Pn42)中,可高速地消耗蓄積於電抗器L之能量。同樣地,於電晶體 Qdp之開關測定中,於檢測出過電流之情形時,電晶體Qif被設定為接通狀態,且進而將電晶體Qcf、Qcr設定為斷開狀態,藉此可阻斷與電流路徑Pp42不同之電流路徑Pp41。因此,可使蓄積於電抗器L之能量作為電流而流動於過電流防止電路14(電流路徑Pp42)中,可高速地消耗蓄積於電抗器L之能量。 In the switch measurement of the transistor Ddn, when an overcurrent is detected, the transistor Qir is set to the on state, and the transistors Qcf and Qcr are set to the off state, thereby blocking the connection with The current path Pn42 is different from the current path Pn41. Therefore, the energy accumulated in the reactor L can be made to flow as an electric current in the overcurrent prevention circuit 14 (current path Pn42), and the energy accumulated in the reactor L can be consumed at high speed. Similarly, for transistors In the Qdp switch measurement, when an overcurrent is detected, the transistor Qif is set to the on state, and the transistors Qcf and Qcr are set to the off state, thereby blocking the difference from the current path Pp42. Current path Pp41. Therefore, the energy accumulated in the reactor L can be made to flow as an electric current in the overcurrent prevention circuit 14 (current path Pp42), and the energy accumulated in the reactor L can be consumed at high speed.

再者,本發明之動態特性測試裝置及動態特性測試方法並非限定於上述實施形態。例如,電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr並非限定於IGBT,只要為可切換接通狀態與斷開狀態之開關部即可。例如,作為電晶體Qp、Qhp、Qhn、Qif、Qir、Qcf、Qcr,亦可使用FET(Field Effect Transistor:場效電晶體)、雙極電晶體等其他電晶體,及可高速動作之繼電器等。藉由使用電晶體,可高速地切換接通狀態與斷開狀態,且可提高包含開關測定之動態特性測試之精度。 Furthermore, the dynamic characteristic test device and the dynamic characteristic test method of the present invention are not limited to the above-mentioned embodiments. For example, the transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr are not limited to IGBTs, as long as they are switch sections that can switch on and off states. For example, as transistors Qp, Qhp, Qhn, Qif, Qir, Qcf, Qcr, other transistors such as FET (Field Effect Transistor), bipolar transistors, and relays that can operate at high speed can be used. . By using a transistor, the on-state and off-state can be switched at high speed, and the accuracy of the dynamic characteristic test including the switch measurement can be improved.

又,亦可取代電源電容器11,使用其他可充電之電源。又,於並非以於開關測定中進行能量回收為目的之情形時,可使用無法充電之電源,且亦可不設置主開關部12。於該情形時,電源電容器11之+端子係電性連接於電晶體Qhp之集極、二極體Dhp之陰極、開關SWp之一端、電晶體Qdp之集極、及二極體Ddp之陰極,電源電容器11之-端子係電性連接於電晶體Qhn之射極、二極體Dhn之陽極、開關SWn之另一端、電晶體Qdn之射極、及二極體Ddn之陽極。 In addition, instead of the power supply capacitor 11, another rechargeable power supply may be used. When the purpose is not to perform energy recovery during switch measurement, a power source that cannot be charged may be used, and the main switch unit 12 may not be provided. In this case, the + terminal of the power capacitor 11 is electrically connected to the collector of the transistor Qhp, the cathode of the diode Dhp, one terminal of the switch SWp, the collector of the transistor Qdp, and the cathode of the diode Ddp. The-terminal of the power capacitor 11 is electrically connected to the emitter of the transistor Qhn, the anode of the diode Dhn, the other end of the switch SWn, the emitter of the transistor Qdn, and the anode of the diode Ddn.

又,於以進行開關測定之能量回收為目的之情形時,亦可不設置過電流防止電路14及高速阻斷電路15。於該情形時,電晶體Qhp之射極及電晶體Qhn之集極與電抗器L之一端電性連接。 When the purpose is to perform energy recovery for switch measurement, the overcurrent prevention circuit 14 and the high-speed blocking circuit 15 may not be provided. In this case, the emitter of the transistor Qhp and the collector of the transistor Qhn are electrically connected to one end of the reactor L.

高速阻斷電路15只要於高速地阻斷N側開關測定之過電流之情形時,至少將電晶體Qcf設為斷開狀態即可,於高速地阻斷P側開關測定之過電流之情形時,至少將電晶體Qcr設為斷開狀態即可。又,高速阻斷電路15只要於高速地阻斷N側開關測定之過電流之情形時,與電 抗器L串聯而設置於電流路徑Pn41中之未與電流路徑Pn42重疊之部分即可。又,高速阻斷電路15只要於高速地阻斷P側開關測定之過電流之情形時,與電抗器L串聯而設置於電流路徑Pp41中之未與電流路徑Pp42重疊之部分即可。高速阻斷電路15例如可設置於DUT50與電抗器L之間。又,高速阻斷電路15只要具備可切換導通狀態與阻斷狀態之開關部即可,例如亦可為1個繼電器等。 The high-speed blocking circuit 15 only needs to set the transistor Qcf to the off state when the overcurrent measured by the N-side switch is blocked at a high speed, and when the overcurrent measured by the P-side switch is blocked at a high speed. , At least the transistor Qcr can be set to the off state. In addition, when the high-speed blocking circuit 15 blocks the overcurrent measured by the N-side switch at high speed, The reactor L may be connected in series and provided in a portion of the current path Pn41 that does not overlap the current path Pn42. In addition, when the high-speed blocking circuit 15 blocks the overcurrent measured by the P-side switch at high speed, it may be provided in series with the reactor L and placed in a portion of the current path Pp41 that does not overlap the current path Pp42. The high-speed blocking circuit 15 may be provided between the DUT 50 and the reactor L, for example. In addition, the high-speed blocking circuit 15 only needs to include a switching unit that can switch between an on-state and an off-state, and may be, for example, a relay.

又,過電流防止電路14只要為可防止雙向之過電流之構成即可。過電流防止電路14例如可為逆阻IGBT。更具體而言,過電流防止電路14只要於自連接部Cd朝向連接部Cs之一方向上,具備電性串聯連接之開關部及二極體,於自連接部Cs朝向連接部Cd之另一方向上,具備電性串聯連接之開關部及二極體即可。一方向之二極體係以其之順向成為一方向之方式配置,另一方向之二極體只要以其之順向成為另一方向之方式配置即可。 The overcurrent prevention circuit 14 may be configured to prevent bidirectional overcurrent. The overcurrent prevention circuit 14 may be, for example, a reverse resistance IGBT. More specifically, the overcurrent prevention circuit 14 only needs to have a switch portion and a diode electrically connected in series in one direction from the connection portion Cd to the connection portion Cs, and another direction from the connection portion Cs to the connection portion Cd. It only needs to be provided with a switch part and a diode which are electrically connected in series. The bipolar system in one direction is configured in such a manner that its forward direction becomes one direction, and the diode in the other direction may be configured in such a manner that its forward direction becomes the other direction.

如圖22所示,過電流防止電路14例如可作為二極體電橋構成。若具體地進行說明,則變化例之過電流防止電路14包含電晶體Qi、二極體Di、二極體D1~D4。電晶體Qi係IGBT。於電晶體Qi之集極,電性連接有二極體Di之陰極,於電晶體Qi之射極,電性連接有二極體Di之陽極。即,二極體Di係電性並聯連接於電晶體Qi之回流二極體。電晶體Qi之集極電性連接於二極體D1之陰極及二極體D3之陰極,電晶體Qi之射極電性連接於二極體D2之陽極及二極體D4之陽極。二極體D1之陽極及二極體D2之陰極相互電性連接,且電性連接於電晶體Qcr之集極、二極體Dcr之陰極及電抗器L之一端。二極體D3之陽極及二極體D4之陰極相互電性連接,且電性連接於電抗器L之另一端、開關SWp之另一端、開關SWn之一端及DUT50之O端子。 As shown in FIG. 22, the overcurrent prevention circuit 14 can be configured as a diode bridge, for example. To be more specific, the overcurrent prevention circuit 14 according to the modification includes the transistor Qi, the diode Di, and the diodes D1 to D4. Transistor Qi series IGBT. A cathode of the diode Di is electrically connected to a collector of the transistor Qi, and an anode of the diode Di is electrically connected to an emitter of the transistor Qi. That is, the diode Di is electrically connected in parallel to the reflow diode of the transistor Qi. The collector of transistor Qi is electrically connected to the cathode of diode D1 and the cathode of diode D3, and the emitter of transistor Qi is electrically connected to the anode of diode D2 and the anode of diode D4. The anode of diode D1 and the cathode of diode D2 are electrically connected to each other, and are electrically connected to the collector of transistor Qcr, the cathode of diode Dcr, and one end of reactor L. The anode of the diode D3 and the cathode of the diode D4 are electrically connected to each other, and are electrically connected to the other end of the reactor L, the other end of the switch SWp, one end of the switch SWn, and the O terminal of the DUT50.

例如,於圖12之步驟ST34中,於電流路徑Pn1中流動之電流(電流Ic、Iqp、Iqhp、Iqcf、-Iqcr、IL、Iqdn)之電流量增加,變得較N側 之過電流閾值Ref_N更大,於比較器23將低位準之輸出信號輸出至控制裝置30之情形時,控制裝置30係相應於自比較器23接收到低位準之輸出信號而檢測過電流,將閘極信號Sqp、Sqhp自高位準變更為低位準。藉此,電晶體Qcf、Qcr、Qdn成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖23所示,形成電流路徑Pn41,流動於電流路徑Pn1中之過電流朝電流路徑Pn41流動。 For example, in step ST34 of FIG. 12, the amount of current (currents Ic, Iqp, Iqhp, Iqcf, -Iqcr, IL, Iqdn) flowing in the current path Pn1 increases and becomes more than the N side The overcurrent threshold Ref_N is larger. When the comparator 23 outputs a low-level output signal to the control device 30, the control device 30 detects the overcurrent corresponding to the low-level output signal received from the comparator 23, and The gate signals Sqp and Sqhp are changed from a high level to a low level. As a result, the transistors Qcf, Qcr, and Qdn are turned on, and the other transistors are turned off. At this time, as shown in FIG. 23, a current path Pn41 is formed, and an overcurrent flowing in the current path Pn1 flows toward the current path Pn41.

接著,控制裝置30將閘極信號Sqi自低位準變更為高位準。藉此,電晶體Qi進而成為接通狀態,而如圖23所示,形成依序於電抗器L、二極體D3、電晶體Qi及二極體D2循環之電流路徑Pn43,流動於電流路徑Pn41中之電流之一部分朝電流路徑Pn43流動。且,因於電流路徑Pn41中流動之電流於電流路徑Pn41中循環,能量被電晶體Qcf、電晶體Qcr、電抗器L、電晶體Qdn及二極體Dhn之電阻成分等消耗,故其電流量隨著時間之經過而不斷減少。同樣地,因於電流路徑Pn43中流動之電流於電流路徑Pn43中循環,能量被電抗器L、二極體D3、電晶體Qi及二極體D2之電阻成分等消耗,故其電流量隨著時間之經過而不斷減少。 Next, the control device 30 changes the gate signal Sqi from a low level to a high level. As a result, the transistor Qi is further turned on, and as shown in FIG. 23, a current path Pn43 that flows in the order of the loop of the reactor L, the diode D3, the transistor Qi, and the diode D2 is formed and flows in the current path. Part of the current in Pn41 flows toward the current path Pn43. And, because the current flowing in the current path Pn41 circulates in the current path Pn41, the energy is consumed by the resistance components of the transistor Qcf, the transistor Qcr, the reactor L, the transistor Qdn, and the diode Dhn, so the current amount Decreasing over time. Similarly, because the current flowing in the current path Pn43 circulates in the current path Pn43, the energy is consumed by the resistance components of the reactor L, the diode D3, the transistor Qi, and the diode D2, so the current amount varies with As time passes, it decreases.

又,於圖14之步驟ST44中,於電流路徑Pp1中流動之電流(電流Ic、Iqp、Iqdp、-IL、Iqcr、-Iqcf、Iqhn)之電流量增加,變得較P側之過電流閾值Ref_P更大,於比較器24將低位準之輸出信號輸出至控制裝置30之情形時,控制裝置30係相應於自比較器24接收到低位準之輸出信號而檢測過電流,將閘極信號Sqp、Sqhn自高位準變更為低位準。藉此,電晶體Qcf、Qcr、Qdp成為接通狀態,除此以外之電晶體成為斷開狀態。此時,如圖24所示,形成電流路徑Pp41,流動於電流路徑Pp1中之過電流朝電流路徑Pp41流動。 In step ST44 of FIG. 14, the current amount of the currents (currents Ic, Iqp, Iqdp, -IL, Iqcr, -Iqcf, and Iqhn) flowing in the current path Pp1 increases and becomes larger than the overcurrent threshold value on the P side. Ref_P is larger. When the comparator 24 outputs a low-level output signal to the control device 30, the control device 30 detects an overcurrent corresponding to the low-level output signal received from the comparator 24, and outputs the gate signal Sqp , Sqhn changed from a high level to a low level. Thereby, the transistors Qcf, Qcr, and Qdp are turned on, and the other transistors are turned off. At this time, as shown in FIG. 24, a current path Pp41 is formed, and an overcurrent flowing in the current path Pp1 flows toward the current path Pp41.

接著,控制裝置30將閘極信號Sqi自低位準變更為高位準。藉此,電晶體Qi進而成為接通狀態,而如圖24所示,形成依序於電抗器 L、二極體D1、電晶體Qi及二極體D4循環之電流路徑Pp43,流動於電流路徑Pp41中之電流之一部分朝電流路徑Pp43流動。又,因於電流路徑Pp41中流動之電流於電流路徑Pp41循環,能量被電抗器L、電晶體Qcr、電晶體Qcf、二極體Dhp及電晶體Qdp之電阻成分等消耗,故其電流量隨著時間之經過而不斷減少。同樣地,因於電流路徑Pp43中流動之電流於電流路徑Pp43循環,能量被電抗器L、二極體D1、電晶體Qi及二極體D4之電阻成分等消耗,故其電流量隨著時間之經過而不斷減少。於如此構成之過電流防止電路14中,亦可防止動態特性測試裝置1之雙向之過電流。 Next, the control device 30 changes the gate signal Sqi from a low level to a high level. Thereby, the transistor Qi is further turned on, and as shown in FIG. 24, the reactor is sequentially formed by the reactor. A part of the current path Pp43 circulated by L, diode D1, transistor Qi, and diode D4, a part of the current flowing in the current path Pp41 flows toward the current path Pp43. In addition, because the current flowing in the current path Pp41 circulates in the current path Pp41, the energy is consumed by the resistance components of the reactor L, the transistor Qcr, the transistor Qcf, the diode Dhp, and the transistor Qdp, so the current amount varies with As time passes, it decreases. Similarly, since the current flowing in the current path Pp43 is circulated in the current path Pp43, the energy is consumed by the resistance components of the reactor L, the diode D1, the transistor Qi, and the diode D4, so that the amount of current thereof varies with time. Passing through and decreasing. The overcurrent prevention circuit 14 configured in this way can also prevent bidirectional overcurrent in the dynamic characteristic test device 1.

再者,如圖25(a)所示,於過電流防止電路14係由電晶體Qif、Qir及二極體Dif、Dir構成之情形時,於N側開關測定中,即便於將電晶體Qp、Qhp設為斷開狀態之前將電晶體Qir設為接通狀態,亦未流動有不經由電抗器L之短路電流。如此,於過電流防止電路14由電晶體Qif、Qir及二極體Dif、Dir構成之情形時,將電容器Qp、Qhp設為斷開狀態之時序與將電晶體Qir設為接通狀態之時序之順序係任意,P側開關測定亦為相同之情形。 Furthermore, as shown in FIG. 25 (a), when the overcurrent prevention circuit 14 is composed of transistors Qif and Qir and diodes Dif and Dir, even when the transistor Qp is measured in the N-side switch measurement, When Qhp is set to the off state, the transistor Qir is set to the on state, and no short-circuit current does not flow through the reactor L. In this way, when the overcurrent prevention circuit 14 is composed of the transistors Qif and Qir and the diodes Dif and Dir, the timing of setting the capacitors Qp and Qhp to the off state and the timing of setting the transistor Qir to the on state The order is arbitrary, and the measurement of the P-side switch is the same.

另一方面,如圖25(b)所示,於過電流防止電路14係由二極體電橋構成之情形時,於N側開關測定中,若於將電晶體Qp、Qhp設為斷開狀態之前將電晶體Qi設為接通狀態,則形成自電源電容器11之+端子起經過電晶體Qp、電晶體Qhp、電晶體Qcf、電晶體Qcr、二極體D1、二極體Qi、二極體D4及電晶體Qdn而返回至電源電容器11之-端子之電流路徑Pn5。因電流路徑Pn5係不經由電抗器L之電流路徑,故於動態特性測試裝置1中流動短路電流。因此,於過電流防止電路14係由二極體電橋構成之情形時,於使過電流防止電路14動作時,必須於將電晶體Qp、Qhp設為斷開狀態後,將電晶體Qi設為接通狀態。P側開關亦為相同之情形。 On the other hand, as shown in FIG. 25 (b), when the overcurrent prevention circuit 14 is constituted by a diode bridge, if the transistors Qp and Qhp are turned off during the N-side switch measurement, Before the transistor Qi is turned on, the transistor Qp, transistor Qhp, transistor Qcf, transistor Qcr, diode D1, diode Qi, and The electrode body D4 and the transistor Qdn return to the current path Pn5 of the − terminal of the power supply capacitor 11. Since the current path Pn5 is a current path that does not pass through the reactor L, a short-circuit current flows in the dynamic characteristic test device 1. Therefore, when the overcurrent prevention circuit 14 is constituted by a diode bridge, when the overcurrent prevention circuit 14 is operated, the transistors Qp and Qhp must be turned off, and then the transistor Qi must be set to Is on. The same applies to the P-side switch.

如此,於過電流防止電路14係由電晶體Qif、Qir及二極體Dif、Dir構成之情形時,因電晶體Dif、Qir電性串聯連接,故藉由將電晶體Qif、Qir之任一者設定為接通狀態,於過電流防止電路14中,僅流動有一方向之電流。因此,於N側開關測定中,即便於將電晶體Qp、Qhp設為斷開狀態之前將電晶體Qir設為接通狀態,電晶體Qdn中亦未流動短路電流;於P側開關測定中,即便於將電晶體Qp、Qhn設為斷開狀態之前將電晶體Qif設為接通狀態,電晶體Qdp中亦未流動短路電流。因此,可減少使過電流防止電路14動作之時序之限制,可使控制簡單化。 Thus, in the case where the overcurrent prevention circuit 14 is composed of the transistors Qif and Qir and the diodes Dif and Dir, the transistors Dif and Qir are electrically connected in series. Therefore, any one of the transistors Qif and Qir is connected in series. One is set to the on state, and in the overcurrent prevention circuit 14, only a current flows in one direction. Therefore, in the N-side switch measurement, even if the transistor Qir is set to the on state before the transistors Qp and Qhp are turned off, no short-circuit current flows in the transistor Qdn; in the P-side switch measurement, That is, it is convenient to set the transistor Qif to the on state before setting the transistors Qp and Qhn to the off state, and no short-circuit current flows in the transistor Qdp. Therefore, it is possible to reduce the limitation of the timing for operating the overcurrent prevention circuit 14 and simplify the control.

又,DUT50並非限定於2in1類型之功率半導體模組,只要為包含電晶體Qdp及電晶體Qdn之器件即可。例如,DUT50亦可為4in1類型、6in1類型及8in1類型等之功率半導體模組。 In addition, the DUT50 is not limited to a 2in1 type power semiconductor module, as long as it is a device including a transistor Qdp and a transistor Qdn. For example, DUT50 can also be 4in1 type, 6in1 type and 8in1 type power semiconductor modules.

圖26係表示動態特性測試裝置之另一變化例之電路圖。圖26所示之動態特性測試裝置1A係使用6in1類型之功率半導體模組作為DUT之情形時之動態特性測試裝置。動態特性測試裝置1A與動態特性測試裝置1相比,不同之點在於取代DUT50,將DUT50A作為被測試器件,及取代測試電路10而具備測試電路10A。測試電路10A與測試電路10相比,不同之點在於進而具備選擇電路17。再者,於圖26中,省略過電流檢測電路20之圖示。 Fig. 26 is a circuit diagram showing another modified example of the dynamic characteristic tester. The dynamic characteristic test device 1A shown in FIG. 26 is a dynamic characteristic test device when a 6in1 type power semiconductor module is used as a DUT. The dynamic characteristic test device 1A is different from the dynamic characteristic test device 1 in that it replaces DUT50, uses DUT50A as a device under test, and includes test circuit 10A instead of test circuit 10. The test circuit 10A is different from the test circuit 10 in that it further includes a selection circuit 17. Note that, in FIG. 26, the illustration of the overcurrent detection circuit 20 is omitted.

DUT50A係包含6個電晶體之6in1類型之功率半導體模組。具體而言,DUT50A係並列地共有3相(U、V、W相)DUT50之電晶體Qdp、Qdn及二極體Ddp、Ddn之組。即,DUT50A具有作為U相用之電晶體Qdpu、Qdnu及二極體Ddpu、Ddnu(第1二極體、第2二極體),具有作為V相用之電晶體Qdpv、Qdnv及二極體Ddpv、Ddnv(第1二極體、第2二極體),具有作為W相用之電晶體Qdpw、Qdnw及二極體Ddpw、Ddnw。DUT50A具有P端子、U端子、V端子、W端子及N端子。P端 子電性連接於電晶體Ddpu、Qdpv、Qdpw之集極,N端子電性連接於電晶體Qdnu、Qdnv、Qdnw之射極。U端子電性連接於電晶體Qdpu之射極及電晶體Qdnu之集極,V端子電性連接於電晶體Qdpv之射極及電晶體Qdnv之集極,W端子電性連接於電晶體Qdpw之射極及電晶體Qdnw之集極。例如,DUT50A可使用於3相之逆變器電路中,電晶體Qdpu可使用於U相之上橋臂,電晶體Qdnu可使用於U相之下橋臂,電晶體Qdpv可使用於V相之上橋臂,電晶體Qdnv可使用於V相之下橋臂,電晶體Qdpw可使用於W相之上橋臂,電晶體Qdnw可使用於W相之下橋臂。 DUT50A is a 6in1 type power semiconductor module containing 6 transistors. Specifically, the DUT50A is a group of three-phase (U, V, W-phase) DUT50 transistors Qdp, Qdn and diodes Ddp, Ddn in parallel. That is, the DUT50A includes transistors Qdpu, Qdnu and diodes Ddpu, Ddnu (first diode, second diode) for the U-phase, and transistors Qdpv, Qdnv, and diode for the V-phase. Ddpv and Ddnv (the first diode and the second diode) include transistors Qdpw and Qdnw for the W phase and diodes Ddpw and Ddnw. DUT50A has P terminal, U terminal, V terminal, W terminal and N terminal. P end The daughter is electrically connected to the collectors of the transistors Ddpu, Qdpv, and Qdpw, and the N terminal is electrically connected to the emitters of the transistors Qdnu, Qdnv, and Qdnw. The U terminal is electrically connected to the transistor Qdpu emitter and the transistor Qdnu collector, the V terminal is electrically connected to the transistor Qdpv emitter and the transistor Qdnv collector, and the W terminal is electrically connected to the transistor Qdpw. Emitter and collector of transistor Qdnw. For example, DUT50A can be used in 3-phase inverter circuits. Transistor Qdpu can be used for U-phase bridge arms. Transistor Qdnu can be used for U-phase bridge arms. Transistor Qdpv can be used for V-phase ones. On the upper bridge arm, the transistor Qdnv can be used for the bridge arm below the V phase, the transistor Qdpw can be used for the bridge arm above the W phase, and the transistor Qdnw can be used for the bridge arm below the W phase.

選擇電路17係用於選擇DUT50A中所含之3相(U、V、W相)之電晶體Qdp、Qdn中之進行開關測定之相之電晶體Qdp、Qdn之電路。選擇電路17包含開關SWu、SWv、SWw。開關SWu、SWv、SWw係繼電器。開關SWu、SWv、SWw之一端相互電性連接,且電性連接於電抗器L之另一端、電晶體Qir之集極、二極體Dir之陰極、開關SWp之另一端、及開關SWn之一端。開關SWu、SWv、SWw之另一端分別電性連接於DUT50A之U、V、W端子。 The selection circuit 17 is a circuit for selecting the three-phase (U, V, W-phase) transistors Qdp and Qdn included in the DUT50A to perform the switching measurement of the transistors Qdp and Qdn. The selection circuit 17 includes switches SWu, SWv, and SWw. The switches SWu, SWv, and SWw are relays. One ends of the switches SWu, SWv, and SWw are electrically connected to each other, and are electrically connected to the other end of the reactor L, the collector of the transistor Qir, the cathode of the diode Dir, the other end of the switch SWp, and one end of the switch SWn. . The other ends of the switches SWu, SWv, and SWw are electrically connected to the U, V, and W terminals of the DUT50A, respectively.

於如此構成之動態特性測試裝置1A中,控制裝置30係藉由進而對電晶體Qdpu、Qdnu、Qdpv、Qdnv、Qdpw、Qdnw分別輸出閘極信號Sqdpu、Sqdnu、Sqdpv、Sqdnv、Sqdpw、Sqdnw,而切換各電晶體之接通狀態與斷開狀態。又,控制裝置30係藉由對開關SWu、SWv、SWw分別輸出繼電器信號Sswu、Sswv、Ssww,而切換各開關之接通狀態與斷開狀態。DUT為其他類型之功率半導體模組之情形時,亦可與動態特性測試裝置1A同樣地構成。 In the dynamic characteristic test device 1A thus configured, the control device 30 outputs gate signals Sqdpu, Sqdnu, Sqdpv, Sqdnv, Sqdpw, and Sqdnw to the transistors Qdpu, Qdnu, Qdpv, Qdnv, Qdpw, and Qdnw, respectively, and Switch on and off states of each transistor. In addition, the control device 30 outputs the relay signals Sswu, Sswv, and Ssww to the switches SWu, SWv, and SWw, respectively, to switch the on state and the off state of each switch. When the DUT is a power semiconductor module of another type, it may be configured in the same manner as the dynamic characteristic test device 1A.

Claims (13)

一種動態特性測試裝置,其係進行被測試器件之動態特性測試者,該被測試器件包含電性串聯連接之第1半導體及第2半導體、電性並聯連接於上述第1半導體之第1二極體、及電性並聯連接於上述第2半導體之第2二極體;且該動態特性測試裝置包含:電源,其供給用於上述動態特性測試之電流,且可充電;電抗器,其成為上述第1半導體及上述第2半導體之負載;選擇電路,其具有電性串聯連接之第1開關部及第2開關部、電性並聯連接於上述第1開關部之第3二極體、及電性並聯連接於上述第2開關部之第4二極體,且用於選擇上述第1半導體及上述第2半導體中之任一者作為開關測定之對象;第3開關部,其切換自上述電源對上述第1半導體或上述第2半導體之電流之供給及阻斷;及控制裝置,其切換控制上述第1開關部、上述第2開關部及上述第3開關部之接通狀態及斷開狀態;且將上述第1半導體及上述第2半導體電性連接之第1連接部、與將上述第1開關部及上述第2開關部電性連接之第2連接部係經由上述電抗器而電性連接;上述電源之正極端子電性連接於上述第1二極體之陰極及上述第3二極體之陰極;上述電源之負極端子電性連接於上述第2二極體之陽極及上述第4二極體之陽極;且上述第3開關部包含:第1電晶體、及與上述第1電晶體電性並聯連接之第5二極體;上述第5二極體之陰極係電性連接至上述電源之上述正極端子;上述控制裝置係於開始上述第1半導體之開關測定時,將上述第2開關部及上述第3開關部設為接通狀態;上述控制裝置係:相應於上述第1半導體之開關測定之結束而將上述第2開關部設為斷開狀態,藉此形成自上述電源之上述負極端子起依序經過上述第2二極體、上述電抗器、上述第3二極體及上述第3開關部而返回至上述電源之上述正極端子的第1電流路徑,而回收上述第1半導體之開關測定中所使用之能量(energy)。A dynamic characteristic tester is a tester for dynamic characteristics of a device under test. The device under test includes a first semiconductor and a second semiconductor electrically connected in series, and a first diode electrically connected in parallel to the first semiconductor. And a second diode electrically connected in parallel to the second semiconductor; and the dynamic characteristic test device includes: a power source that supplies a current for the dynamic characteristic test and is rechargeable; a reactor that becomes the above The load of the first semiconductor and the second semiconductor; a selection circuit having a first switch portion and a second switch portion electrically connected in series, a third diode electrically connected in parallel to the first switch portion, and The second diode is connected in parallel to the fourth diode of the second switching unit, and is used to select any one of the first semiconductor and the second semiconductor as the measurement target of the switch. The third switching unit is switched from the power source. Supply and interruption of current to the first semiconductor or the second semiconductor; and a control device that switches and controls the on states of the first switch section, the second switch section, and the third switch section, and Off state; and the first connection portion electrically connecting the first semiconductor and the second semiconductor, and the second connection portion electrically connecting the first switching portion and the second switching portion are via the reactor. And the electrical connection; the positive terminal of the power supply is electrically connected to the cathode of the first diode and the cathode of the third diode; the negative terminal of the power supply is electrically connected to the anode of the second diode and The anode of the fourth diode; and the third switch unit includes: a first transistor and a fifth diode electrically connected in parallel with the first transistor; and a cathode system of the fifth diode The positive terminal connected to the power supply; the control device sets the second switch section and the third switch section to the ON state when the switch measurement of the first semiconductor is started; the control device is: corresponding to When the measurement of the switch of the first semiconductor is completed, the second switch section is turned off, thereby forming the second diode, the reactor, and the third switch in order from the negative terminal of the power supply. Diode and above The three switching units return to the first current path of the positive terminal of the power supply, and recover the energy used in the switch measurement of the first semiconductor. 如請求項1之動態特性測試裝置,其中上述控制裝置係:於相應於上述第1半導體之開關測定之結束而將上述第2開關部設為斷開狀態後,將上述第3開關部設為斷開狀態。For example, the dynamic characteristic test device of claim 1, wherein the control device is: after the second switch section is turned off in response to the end of the switch measurement of the first semiconductor, the third switch section is set as Disconnected. 如請求項2之動態特性測試裝置,其中上述控制裝置係:於相應於上述第1半導體之開關測定之結束而將上述第2開關部設為斷開狀態後,相應於流動於上述第1電流路徑之電流的電流量成為特定之閾值以下,而將上述第3開關部設為斷開狀態。For example, the dynamic characteristic test device according to claim 2, wherein the control device is: after the second switch section is set to the off state corresponding to the end of the switch measurement of the first semiconductor, corresponding to the first current flowing The current amount of the path current is equal to or less than a specific threshold value, and the third switch unit is turned off. 如請求項1至3中任一項之動態特性測試裝置,其中上述控制裝置係於開始上述第2半導體之開關測定時,將上述第1開關部及上述第3開關部設為接通狀態,上述控制裝置係:相應於上述第2半導體之開關測定之結束而將上述第1開關部設為斷開狀態,藉此形成自上述電源之上述負極端子起依序經過上述第4二極體、上述電抗器、上述第1二極體及上述第3開關部而返回至上述電源之上述正極端子的第2電流路徑,而回收上述第2半導體之開關測定中所使用之能量。For example, the dynamic characteristic test device according to any one of claims 1 to 3, wherein the control device sets the first switch portion and the third switch portion to an ON state when starting the switch measurement of the second semiconductor, The control device is: in response to the end of the switch measurement of the second semiconductor, the first switch section is set to the off state, thereby forming the negative electrode terminal of the power supply to sequentially pass through the fourth diode, The reactor, the first diode, and the third switching unit return to the second current path of the positive terminal of the power supply, and recover the energy used in the switching measurement of the second semiconductor. 如請求項4之動態特性測試裝置,其中上述控制裝置係:於相應於上述第2半導體之開關測定之結束而將上述第1開關部設為斷開狀態後,將上述第3開關部設為斷開狀態。For example, the dynamic characteristic test device of claim 4, wherein the control device is: after the first switch section is set to the off state corresponding to the end of the switch measurement of the second semiconductor, the third switch section is set to Disconnected. 如請求項5之動態特性測試裝置,其中上述控制裝置係:於相應於上述第2半導體之開關測定之結束而將上述第1開關部設為斷開狀態後,相應於流動於上述第2電流路徑之電流的電流量成為特定之閾值以下,而將上述第3開關部設為斷開狀態。For example, the dynamic characteristic test device according to claim 5, wherein the control device is: after the first switch portion is turned off in response to the end of the switch measurement of the second semiconductor, the second current corresponds to the second current flowing The current amount of the path current is equal to or less than a specific threshold value, and the third switch unit is turned off. 如請求項1至3中任一項之動態特性測試裝置,其中上述第1開關部及上述第2開關部係電晶體。The dynamic characteristic test device according to any one of claims 1 to 3, wherein the first switch section and the second switch section are transistors. 一種動態特性測試方法,其係進行被測試器件之動態特性測試者,該被測試器件包含電性串聯連接之第1半導體及第2半導體、電性並聯連接於上述第1半導體之第1二極體、及電性並聯連接於上述第2半導體之第2二極體;且該動態特性測試方法包含如下步驟:藉由將具有電性串聯連接之第1開關部及第2開關部、電性並聯連接於上述第1開關部之第3二極體、及電性並聯連接於上述第2開關部之第4二極體之選擇電路之上述第2開關部設為接通狀態,來選擇上述第1半導體作為開關測定之對象,且將電性串聯連接於可充電之電源之第3開關部設為接通狀態,而進行上述第1半導體之開關測定;及相應於上述第1半導體之開關測定之結束,將上述第2開關部設為斷開狀態,藉此形成第1電流路徑,回收上述第1半導體之開關測定中使用之能量;其中將上述第1半導體及上述第2半導體電性連接之第1連接部、與將上述第1開關部及上述第2開關部電性連接之第2連接部係經由電抗器電性連接;上述電源之正極端子電性連接於上述第1二極體之陰極及上述第3二極體之陰極;且上述電源之負極端子電性連接於上述第2二極體之陽極及上述第4二極體之陽極;上述第3開關部包含:第1電晶體、及電性並聯連接於上述第1電晶體之第5二極體;上述第5二極體之陰極係電性連接至上述電源之上述正極端子;上述第1電流路徑係:自上述電源之上述負極端子起,依序經過上述第2二極體、上述電抗器、上述第3二極體及上述第3開關部而返回至上述電源之上述正極端子之路徑。A dynamic characteristic test method is a tester for dynamic characteristics of a device under test. The device under test includes a first semiconductor and a second semiconductor electrically connected in series, and a first diode electrically connected in parallel to the first semiconductor. And the second diode connected electrically in parallel to the second semiconductor; and the dynamic characteristic test method includes the following steps: by electrically connecting the first switch section and the second switch section having electrical series connection, The third switching element connected in parallel to the first switching portion and the second switching portion of the selection circuit electrically connected in parallel to the fourth diode of the second switching portion are set to the ON state to select the above. The first semiconductor is the object of the switch measurement, and the third switch portion electrically connected in series to the rechargeable power source is set to the ON state, and the switch measurement of the first semiconductor is performed; and the switch corresponding to the first semiconductor is performed. At the end of the measurement, the second switch unit is turned off to form a first current path to recover the energy used in the switch measurement of the first semiconductor; the first semiconductor and the second semiconductor are recovered. The first connection portion of the semiconductor electrical connection and the second connection portion that electrically connects the first switch portion and the second switch portion are electrically connected through a reactor; the positive terminal of the power source is electrically connected to the first connection portion. The cathode of 1 diode and the cathode of the third diode; and the negative terminal of the power supply is electrically connected to the anode of the second diode and the anode of the fourth diode; and the third switch section includes : The first transistor and the fifth diode electrically connected in parallel to the first transistor; the cathode of the fifth diode is electrically connected to the positive terminal of the power source; the first current path is : The path from the negative terminal of the power source to the positive terminal of the power source in sequence through the second diode, the reactor, the third diode, and the third switching unit in this order. 如請求項8之動態特性測試方法,其於回收上述第1半導體之開關測定中使用之能量之步驟後,進一步包含將上述第3開關部設為斷開狀態之步驟。For example, the dynamic characteristic test method of claim 8 further includes a step of setting the third switch section to an off state after the step of recovering the energy used in the switch measurement of the first semiconductor. 如請求項9之動態特性測試方法,其於相應於上述第1半導體之開關測定之結束而將上述第2開關部設為斷開狀態後,相應於流動於上述第1電流路徑之電流的電流量成為特定之閾值以下,而將上述第3開關部設為斷開狀態。If the dynamic characteristic test method of the item 9 is requested, the current corresponding to the current flowing in the first current path is set to the off state corresponding to the end of the switch measurement of the first semiconductor, and the second switch is turned off. When the amount is equal to or less than a specific threshold, the third switching unit is turned off. 如請求項8至10中任一項之動態特性測試方法,其進而包含如下步驟:藉由將上述選擇電路之上述第1開關部設為接通狀態,來選擇上述第2半導體作為開關測定之對象,且將上述第3開關部設為接通狀態,而進行上述第2半導體之開關測定;及相應於上述第2半導體之開關測定之結束,將上述第1開關部設為斷開狀態,藉此形成自上述電源之上述負極端子起依序經過上述第4二極體、上述電抗器、上述第1二極體及上述第3開關部而返回至上述電源之上述正極端子之第2電流路徑,而回收上述第2半導體之開關測定中使用之能量。The dynamic characteristic test method according to any one of claims 8 to 10, further comprising the step of: selecting the second semiconductor as a switch to be measured by setting the first switch portion of the selection circuit to an on state. The object, and set the third switch part to the on state to perform the switch measurement of the second semiconductor; and corresponding to the end of the switch measurement of the second semiconductor, to set the first switch part to the off state, Thereby, a second current is returned from the negative terminal of the power source to the positive terminal of the power source through the fourth diode, the reactor, the first diode, and the third switch in this order. Path to recover the energy used in the switch measurement of the second semiconductor. 如請求項11之動態特性測試方法,其於回收上述第2半導體之開關測定中使用之能量之步驟後,進一步包含將上述第3開關部設為斷開狀態之步驟。For example, the dynamic characteristic test method of claim 11 further includes a step of setting the third switch section to an off state after the step of recovering the energy used in the switch measurement of the second semiconductor. 如請求項12之動態特性測試方法,其於相應於上述第2半導體之開關測定之結束而將上述第1開關部設為斷開狀態後,相應於流動於上述第2電流路徑之電流的電流量成為特定之閾值以下,而將上述第3開關部設為斷開狀態。For example, if the dynamic characteristic test method of claim 12 is performed, the current corresponding to the current flowing through the second current path is set to the off state corresponding to the end of the switch measurement of the second semiconductor, and the first switch is turned off. When the amount is equal to or less than a specific threshold, the third switching unit is turned off.
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