TWI671262B - Ammonia concentration lifting device - Google Patents
Ammonia concentration lifting device Download PDFInfo
- Publication number
- TWI671262B TWI671262B TW107129701A TW107129701A TWI671262B TW I671262 B TWI671262 B TW I671262B TW 107129701 A TW107129701 A TW 107129701A TW 107129701 A TW107129701 A TW 107129701A TW I671262 B TWI671262 B TW I671262B
- Authority
- TW
- Taiwan
- Prior art keywords
- plate
- gas
- space
- ammonia
- concentration
- Prior art date
Links
Abstract
本發明為一種氨氣濃度提升裝置,包括一外殼體、複數個板槽及一冷卻單元。複數個板槽以層疊的方式設置於外殼體的容置空間內,並將容置空間區隔成為一流動空間。外殼體的下方連接至少一氣體輸入端及至少一液體輸出端,而外殼體的上方則連接至少一氣體輸出端。由氣體輸入端進入的低濃度氨氣會經由流動空間傳輸至氣體輸出端,其中低濃度氨氣沿著流動空間輸送時溫度會逐漸下降,使得低濃度氨氣中的水氣凝結,以提高氨氣的濃度,並可由氣體輸出端輸出高濃度氨氣。The invention is an ammonia gas concentration increasing device, which comprises an outer shell, a plurality of plate grooves and a cooling unit. The plurality of plate grooves are arranged in the accommodating space of the outer shell in a stacked manner, and the accommodating space is separated into a flowing space. At least one gas input end and at least one liquid output end are connected below the outer casing, and at least one gas output end is connected above the outer casing. The low-concentration ammonia gas entering from the gas input end will be transmitted to the gas output end through the flow space. The temperature of the low-concentration ammonia gas will gradually decrease as it is transported along the flow space, so that the water vapor in the low-concentration ammonia gas will condense to increase the ammonia Gas concentration, and high-concentration ammonia can be output from the gas output.
Description
本發明是有關於一種氨氣濃度提升裝置,其中低濃度氨氣在傳輸時溫度會逐漸下降,使得氨氣中的水氣凝結成水溶液,藉此以提高氨氣的濃度。The invention relates to an ammonia concentration increasing device, in which the temperature of a low-concentration ammonia gas gradually decreases during transmission, so that the water gas in the ammonia gas condenses into an aqueous solution, thereby increasing the ammonia gas concentration.
氨氣是半導體製程中重要的材料,以發光二極體(LED)為例,純氨是製造LED的氮化鎵晶體的重要材料,一般LED廠使用之純氨雖為6N5(99.99995%)以上的等級,但純氨仍無法避免含有微量的有機物,例如丙酮、異丙醇、甲烷、乙烷、丙烷、乙烯、丙烯等等。當LED廠以MOCVD製程在高溫下(750~1050℃)合成氮化鎵時,有機物將會裂解為烷類、烯類、一氧化碳、二氧化碳、碳粒、烯酮等等的衍生雜質。這些衍生雜質會使氮化鎵晶體產生差排,形成晶體的缺陷,而至使氮化鎵的生產良率降低。然而,要去除純氨中所含的微量有機物目前仍是極難克服的技術問題。Ammonia is an important material in the semiconductor manufacturing process. Taking light emitting diodes (LEDs) as an example, pure ammonia is an important material for the manufacture of gallium nitride crystals for LEDs. Although the pure ammonia used in LED factories is generally 6N5 (99.99995%) or more Grade, but pure ammonia still cannot avoid traces of organic matter, such as acetone, isopropanol, methane, ethane, propane, ethylene, propylene and so on. When LED factories synthesize gallium nitride at a high temperature (750 ~ 1050 ° C) in the MOCVD process, organic substances will be cracked into derived impurities such as alkanes, olefins, carbon monoxide, carbon dioxide, carbon particles, ketene, and the like. These derivatized impurities will cause differential rows of gallium nitride crystals and form crystal defects, which will reduce the production yield of gallium nitride. However, it is still a very difficult technical problem to remove the trace organic compounds contained in pure ammonia.
在另一方面,每提供100公斤的純氨進入LED製程,將會有80公斤的氨氣被排出製程,而一般排出製程的氨氣濃度約為10%~15%,並包括氫氣、氮氣、甲烷、微量氣體(一氧化碳、二氧化碳、烯酮)及粒狀物(碳粒及金屬鎵),一般大都將這些排出的氨氣視為廢棄物而不再利用。On the other hand, for every 100 kilograms of pure ammonia supplied to the LED process, 80 kilograms of ammonia will be discharged from the process, and the ammonia concentration in the general discharge process is about 10% to 15%, and includes hydrogen, nitrogen, Methane, trace gases (carbon monoxide, carbon dioxide, ketene) and particulate matter (carbon particles and metallic gallium) are generally regarded as waste and are no longer used.
本發明提出一種氨氣濃度提升裝置,可用以處理半導體製程中所產生的低濃度氨氣,並產生高濃度氨氣。藉此可將低濃度氨氣回收再利用,而處理過程中所產生的水溶液更符合環保法規的排放標準。為此本發明不僅可降低半導體製程的成本,亦可降低排放氣體對環境所造成的污染。The invention proposes an ammonia gas concentration increasing device, which can be used to process low-concentration ammonia gas generated in a semiconductor manufacturing process and generate high-concentration ammonia gas. In this way, low-concentration ammonia can be recovered and reused, and the aqueous solution produced during the treatment process is more in compliance with the discharge standards of environmental protection regulations. For this reason, the invention can not only reduce the cost of the semiconductor manufacturing process, but also reduce the environmental pollution caused by the exhaust gas.
本發明提出一種氨氣濃度提升裝置,主要包括複數個層疊設置的板槽,並在各個板槽之間形成一流動空間。此外板槽的上表面具有一容置槽,可用以容納凝結的水溶液,其中容置槽內的水溶液可降低板槽下表面的溫度,並有利於低濃度氨氣中的水氣凝結在板槽的下表面,並提高氨氣的濃度。The invention provides an ammonia gas concentration increasing device, which mainly includes a plurality of plate grooves arranged in a stack, and forms a flow space between the plate grooves. In addition, the upper surface of the plate tank is provided with an accommodating tank, which can be used for containing the condensed aqueous solution. The aqueous solution in the accommodating tank can reduce the temperature of the lower surface of the plate tank, and is beneficial to the condensation of water vapor in the low-concentration ammonia gas in the plate tank. The lower surface and increase the ammonia concentration.
本發明提出一種氨氣濃度提升裝置,主要於一外殼體內設置複數個層疊設置的板槽,並透過板槽將外殼體內的容置空間區隔成一流動空間。外殼體的下方設置至少一氣體輸入端及至少一液體輸出端,而外殼體的上方則設置至少一氣體輸出端。由氣體輸入端進入的低濃度氨氣會經由流動空間輸送至氣體輸出端,並透過冷卻單元、板槽及/或容置槽內的水溶液逐漸冷卻低濃度氨氣,使得低濃度氨氣內的水氣凝結成水溶液,藉此以去除低濃度氨氣內的水氣,並於氣體輸出端輸出一高濃度氨氣。此外凝結的水溶液中的氨含量很低,符合環保法規的排放標準,並可由液體輸出端排出。The invention proposes an ammonia gas concentration increasing device. A plurality of stacked plate grooves are mainly arranged in an outer shell body, and the accommodation space in the outer shell body is divided into a flow space through the plate grooves. At least one gas input end and at least one liquid output end are disposed below the outer casing, and at least one gas output end is disposed above the outer casing. The low-concentration ammonia gas entering from the gas input end is transported to the gas output end through the flow space, and the low-concentration ammonia gas is gradually cooled through the aqueous solution in the cooling unit, plate tank and / or accommodating tank, so that the The water gas is condensed into an aqueous solution, thereby removing the water gas in the low-concentration ammonia gas, and outputting a high-concentration ammonia gas at the gas output end. In addition, the ammonia content in the condensed aqueous solution is very low, meets the discharge standards of environmental protection regulations, and can be discharged from the liquid output end.
本發明提出一種氨氣濃度提升裝置,包括:複數個板槽,以層疊的方式設置,板槽包括一板體及至少一側板,其中板體包括一上表面及一下表面,而側板設置於板體的上表面,使得側板與板體的上表面之間形成至少一容置槽;一外殼體,包括一容置空間、至少一氣體輸入端、至少一氣體輸出端及至少一液體輸出端,層疊設置的板槽設置於容置空間內,並將容置空間區隔成為一流動空間,其中氣體輸入端、氣體輸出端及液體輸出端流體連通流動空間;及一冷卻單元,位於層疊設置的複數個板槽的上方。The invention proposes an ammonia concentration increasing device, comprising: a plurality of plate grooves, which are arranged in a stacked manner, the plate grooves include a plate body and at least one side plate, wherein the plate body includes an upper surface and a lower surface, and the side plate is provided on the plate The upper surface of the body, so that at least one receiving groove is formed between the side plate and the upper surface of the plate body; an outer shell includes an accommodating space, at least one gas input end, at least one gas output end, and at least one liquid output end, The stacked grooves are arranged in the accommodating space, and the accommodating space is separated into a flow space, wherein the gas input end, the gas output end, and the liquid output end are in fluid communication with the flow space; and a cooling unit is located in the cascade set Above the plurality of plate slots.
在本發明氨氣濃度提升裝置一實施例中,其中相鄰的板槽之間存在一間隔空間。In an embodiment of the ammonia concentration increasing device of the present invention, a space exists between adjacent plate grooves.
在本發明氨氣濃度提升裝置一實施例中,其中外殼體包括複數個殼板,而容置空間則位於複數個殼板內,相鄰的板槽分別連接外殼體的相面對的兩個殼板上,並於板槽與殼板之間形成一連通道,且間隔空間及開連通道構成流動空間。In an embodiment of the ammonia concentration increasing device of the present invention, the outer shell includes a plurality of shell plates, and the accommodating space is located in the plurality of shell plates. Adjacent plate slots are respectively connected to two opposite sides of the outer shell. The shell plate forms a continuous channel between the plate groove and the shell plate, and the space and the open channel constitute a flow space.
在本發明氨氣濃度提升裝置一實施例中,其中側板、板體的上表面及外殼體形成容置槽。In an embodiment of the ammonia concentration increasing device of the present invention, the side plate, the upper surface of the plate body, and the outer shell body form an accommodation groove.
在本發明氨氣濃度提升裝置一實施例中,其中氣體輸入端為一低濃度氨氣的輸入口,氣體輸出端為一高濃度氨氣的輸出口,而液體輸出端則為一水溶液的輸出口。In an embodiment of the ammonia concentration increasing device of the present invention, the gas input end is an input port of low-concentration ammonia gas, the gas output end is an output port of high-concentration ammonia gas, and the liquid output end is an output of an aqueous solution. mouth.
在本發明氨氣濃度提升裝置一實施例中,其中流動空間流體連接氣體輸入端及氣體輸出端,由氣體輸入端進入的低濃度氨氣經由流動空間傳輸至氣體輸出端。In an embodiment of the ammonia concentration increasing device of the present invention, the flowing space is fluidly connected to the gas input end and the gas output end, and the low-concentration ammonia gas entering from the gas input end is transmitted to the gas output end through the flow space.
在本發明氨氣濃度提升裝置一實施例中,其中氣體輸入端及液體輸出端靠近外殼體的底部,而氣體輸出端則靠近外殼體的頂部。In an embodiment of the ammonia concentration increasing device of the present invention, the gas input end and the liquid output end are near the bottom of the outer shell, and the gas output end is near the top of the outer shell.
在本發明氨氣濃度提升裝置一實施例中,其中板體的上表面及下表面分別具有複數個凹陷部。In an embodiment of the ammonia concentration increasing device of the present invention, the upper surface and the lower surface of the plate body each have a plurality of recessed portions.
在本發明氨氣濃度提升裝置一實施例中,其中設置於板體的上表面的側板與板體的上表面的凹陷部形成容置槽。In an embodiment of the ammonia concentration increasing device of the present invention, the side plate provided on the upper surface of the plate body and the recessed portion on the upper surface of the plate body form an accommodation groove.
在本發明氨氣濃度提升裝置一實施例中,其中相鄰的板槽的凹陷部之間存在一間隔空間,且間隔空間的剖面為六邊形、正六邊形、四邊形、多邊形、圓形或圓弧形。In an embodiment of the ammonia concentration increasing device of the present invention, a space exists between the recessed portions of adjacent plate grooves, and the cross-section of the space is hexagonal, regular hexagon, quadrilateral, polygonal, circular, or Oval.
請參閱圖1,為本發明氨氣濃度提升裝置一實施例的構造示意圖。如圖所示,本發明所述的氨氣濃度提升裝置10主要包括一外殼體11、複數個板槽13及一冷卻單元17。Please refer to FIG. 1, which is a schematic structural diagram of an embodiment of an ammonia concentration increasing device according to the present invention. As shown in the figure, the ammonia concentration increasing device 10 according to the present invention mainly includes an outer shell 11, a plurality of plate grooves 13, and a cooling unit 17.
外殼體11包括複數個殼板110,並於複數個殼板110內形成一容置空間111,而複數個板體13則設置在外殼體11的容置空間111內。在本發明一實施例中,外殼體11可以是正方體或長方體,當然在實際應用時外殼體11亦可以是其它不同形狀的立體構造。The outer shell 11 includes a plurality of shell plates 110, and an accommodating space 111 is formed in the plurality of shell plates 110. The plurality of plate bodies 13 are disposed in the accommodating space 111 of the outer shell 11. In an embodiment of the present invention, the outer casing 11 may be a cube or a rectangular parallelepiped. Of course, in actual application, the outer casing 11 may also be a three-dimensional structure with different shapes.
外殼體11包括至少一氣體輸入端151、至少一氣體輸出端153及至少一液體輸出端155,其中氣體輸入端151、氣體輸出端153及液體輸出端155皆流體連通外殼體11內的容置空間111。在本發明一實施例中,氣體輸入端151及液體輸出端155靠近外殼體11的底部,而氣體輸出端153則靠近外殼體11的頂部。The outer casing 11 includes at least one gas input terminal 151, at least one gas output terminal 153, and at least one liquid output terminal 155. The gas input terminal 151, the gas output terminal 153, and the liquid output terminal 155 are in fluid communication with the contents of the outer casing 11. Space 111. In an embodiment of the present invention, the gas input terminal 151 and the liquid output terminal 155 are near the bottom of the outer casing 11, and the gas output terminal 153 is near the top of the outer casing 11.
在本發明一實施例中,氣體輸出端153的設置高度高於氣體輸入端151及液體輸出端155,另外氣體輸入端151的設置高度則高於液體輸出端155。在使用時由下方的氣體輸入端151進入的氣體,會自然通過外殼體11內的容置空間111,並由上方的氣體輸出端153輸出。In an embodiment of the present invention, the installation height of the gas output terminal 153 is higher than the gas input terminal 151 and the liquid output terminal 155, and the installation height of the gas input terminal 151 is higher than the liquid output terminal 155. During use, the gas entering from the lower gas input terminal 151 will naturally pass through the accommodation space 111 in the outer casing 11 and be output by the upper gas output terminal 153.
複數個板槽13以層疊的方式設置,並於相鄰的板槽13之間形成一間隔空間113,例如位於上方的板槽13的下表面134與位於下方的板槽13的上表面132之間存在間隔空間113。此外各個板槽13包括一板體131及一側板133,其中板體131包括一上表面132及一下表面134,而側板133設置在板體131的上表面132,並在側板133及板體131的上表面132之間形成一容置槽135。The plurality of plate grooves 13 are arranged in a stacked manner, and a space 113 is formed between adjacent plate grooves 13, for example, the lower surface 134 of the upper plate groove 13 and the upper surface 132 of the lower plate groove 13. There is a space 113 between them. In addition, each plate groove 13 includes a plate body 131 and a side plate 133, wherein the plate body 131 includes an upper surface 132 and a lower surface 134, and the side plate 133 is disposed on the upper surface 132 of the plate body 131, and the side plate 133 and the plate body 131 A receiving groove 135 is formed between the upper surfaces 132.
在本發明一實施例中,板槽13的側板133可設置在板體131的周圍,如圖2所示,板體131為長方形,並於板體131的四個邊皆設置側板133,以在板體131與側板133之間形成容置槽135。圖3中虛線構造為外殼體11,在將板槽13設置在外殼體11內部時,可使得相鄰的板槽13的一端分別連接外殼體11不同的殼板110或相面對的兩個殼板110。例如若最下方的板槽13的一端連接外殼體11的右殼板112,則與最下方的板槽13相鄰的另一板槽13的一端則連接外殼體11的左殼板114,而上方的其他板槽13則交錯方式分別連接在外殼體11相面對的兩個殼板110上,如此板槽13的一端與外殼體11的殼板110之間將會形成一連通道115,如圖3所示。In an embodiment of the present invention, the side plates 133 of the plate groove 13 may be disposed around the plate body 131. As shown in FIG. 2, the plate body 131 is rectangular, and the side plates 133 are provided on all four sides of the plate body 131. An accommodation groove 135 is formed between the plate body 131 and the side plate 133. The dotted line in FIG. 3 is configured as the outer shell 11. When the plate groove 13 is provided inside the outer shell 11, one end of the adjacent plate groove 13 can be connected to different shell plates 110 of the outer shell 11 or two facing plates.壳 板 110。 The shell plate 110. For example, if one end of the lowermost plate groove 13 is connected to the right shell plate 112 of the outer casing 11, one end of another plate groove 13 adjacent to the lowermost plate groove 13 is connected to the left shell plate 114 of the outer casing 11, and The other plate grooves 13 above are connected to the two shell plates 110 facing each other in a staggered manner, so that one end of the plate groove 13 and the shell plate 110 of the outer body 11 will form a connecting channel 115, such as Shown in Figure 3.
在本發明另一實施例中,板槽13的側板133可設置在板體131的至少一側邊,如圖4所示,板體131為長方形,並於板體131的一個邊上設置側板133。圖5中虛線構造為外殼體,其中板槽13連接在外殼體11的內表面後,板體131、側板133及外殼體11之間將會形成容置槽135,如圖5所示。In another embodiment of the present invention, the side plate 133 of the plate groove 13 may be disposed on at least one side of the plate body 131. As shown in FIG. 4, the plate body 131 is rectangular, and a side plate is provided on one side of the plate body 131. 133. The dashed line in FIG. 5 is configured as an outer casing. After the plate groove 13 is connected to the inner surface of the outer casing 11, an accommodation groove 135 will be formed between the plate 131, the side plate 133 and the outer casing 11, as shown in FIG. 5.
間隔空間113會與連通道115流體連接,並形成一流體連接氣體輸入端151及氣體輸出端153的流動空間117。具體而言,本發明將層疊設置的板槽13設置於外殼體11的容置空間111內,並將容置空間111區隔成為流動空間117,其中氣體輸入端151、氣體輸出端153及液體輸出端155流體連通流動空間117。由外殼體11下方的氣體輸入端151進入的氣體會經由流動空間117,傳送至外殼體11上方的氣體輸出端153。此外在傳輸的過程中,氣體會與板槽13接觸。The separation space 113 is fluidly connected to the communication channel 115 and forms a flow space 117 fluidly connecting the gas input end 151 and the gas output end 153. Specifically, in the present invention, the stacked plate grooves 13 are arranged in the accommodation space 111 of the outer casing 11, and the accommodation space 111 is separated into a flow space 117, wherein the gas input end 151, the gas output end 153, and the liquid The output end 155 is in fluid communication with the flow space 117. The gas entering from the gas input terminal 151 below the outer casing 11 is transmitted to the gas output terminal 153 above the outer casing 11 through the flow space 117. In addition, the gas will come into contact with the plate groove 13 during the transfer.
冷卻單元17設置在層疊設置的板槽13的上方,例如冷卻單元17可設置在外殼體11的頂部。冷卻單元17可用以降低板槽13、容置空間111內部的氣體及液體的溫度,並使得氣體中的水氣凝結成水溶液。The cooling unit 17 is disposed above the stacked plate grooves 13. For example, the cooling unit 17 may be disposed on the top of the outer casing 11. The cooling unit 17 can be used to reduce the temperature of the gas and the liquid inside the plate groove 13 and the accommodating space 111, and cause the water vapor in the gas to condense into an aqueous solution.
在本發明一實施例中,氣體輸入端151為一低濃度氨氣121的輸入口,氣體輸出端153為一高濃度氨氣123的輸出口,而液體輸出端155則為一水溶液125的輸出口。在實際應用時可將低濃度氨氣121由氣體輸入端151輸入外殼體11內,低濃度氨氣121在進入外殼體11後,會經由流動空間117傳送至氣體輸出端153。In an embodiment of the present invention, the gas input 151 is an input of a low-concentration ammonia 121, the gas output 153 is an output of a high-concentration ammonia 123, and the liquid output 155 is an output of an aqueous solution 125 mouth. In practical applications, the low-concentration ammonia gas 121 can be input into the outer casing 11 through the gas input terminal 151. After entering the outer casing 11, the low-concentration ammonia gas 121 is transmitted to the gas output terminal 153 through the flow space 117.
由於冷卻單元17的作用,外殼體11內的板槽13的溫度會低於外界的溫度。低濃度氨氣121在接觸板槽13後,低濃度氨氣121內的水氣會因為溫度下降而凝結在板槽13的下表面134,藉此以去除氨氣中的水氣。此外凝結的水溶液125會因為重力的作用,而流到下方板槽13的容置槽135內,使得板槽13的容置槽135內的水溶液125慢慢增加。Due to the cooling unit 17, the temperature of the plate groove 13 in the outer casing 11 is lower than the temperature of the outside. After the low-concentration ammonia gas 121 contacts the plate tank 13, the water gas in the low-concentration ammonia gas 121 will condense on the lower surface 134 of the plate tank 13 due to the temperature drop, thereby removing the water gas in the ammonia gas. In addition, the condensed aqueous solution 125 will flow into the receiving groove 135 of the lower plate groove 13 due to the effect of gravity, so that the aqueous solution 125 in the receiving groove 135 of the plate groove 13 gradually increases.
由於板槽13的容置槽135內具有水溶液125,可使得板槽13的下表面134維持較低的溫度。低濃度氨氣121與板槽13的下表面134接觸後,溫度亦會下降,使得低濃度氨氣121內的水氣凝結在板槽13的下表面134,並流到下方板槽13的容置槽135內。Since the accommodating tank 135 of the plate tank 13 has an aqueous solution 125 therein, the lower surface 134 of the plate tank 13 can be maintained at a relatively low temperature. After the low-concentration ammonia gas 121 is in contact with the lower surface 134 of the plate tank 13, the temperature will also drop, so that the moisture in the low-concentration ammonia gas 121 condenses on the lower surface 134 of the plate tank 13 and flows to the capacity of the lower plate tank 13. Set in the groove 135.
此外當容置槽135內累積的水溶液125高度超過側板133時,水溶液125將會溢流到下方的板槽13及/或外殼體11的底部,最後再由外殼體11的液體輸出端155排出。In addition, when the height of the aqueous solution 125 accumulated in the containing tank 135 exceeds the side plate 133, the aqueous solution 125 will overflow to the bottom of the plate tank 13 and / or the bottom of the outer casing 11 and then be discharged from the liquid output end 155 of the outer casing 11 .
具體來說,本發明將複數個板槽13以堆疊的方式設置在外殼體11內部,並在外殼體11內部形成流動空間117。由氣體輸入端151進入的低濃度氨氣121會沿著流動空間117移動,其中低濃度氨氣121內的水氣會因為溫度下降,而凝結在各個板槽13的下表面134,並累積在各個板槽13的容置槽135內,藉此以達到提高氨氣濃度的目的。Specifically, in the present invention, a plurality of plate grooves 13 are arranged inside the outer casing 11 in a stacked manner, and a flow space 117 is formed inside the outer casing 11. The low-concentration ammonia gas 121 entering from the gas input terminal 151 will move along the flow space 117. The water gas in the low-concentration ammonia gas 121 will condense on the lower surface 134 of each plate groove 13 due to the temperature drop, and accumulate on the The accommodating grooves 135 of each plate groove 13 are used to achieve the purpose of increasing the ammonia gas concentration.
在本發明實施例中,越靠近冷卻單元17的空間、板槽13及容置槽135內的水溶液125的溫度越低,而越遠離冷卻單元17的空間、板槽13及容置槽135內的水溶液125的溫度則較高。In the embodiment of the present invention, the closer to the space of the cooling unit 17, the temperature of the aqueous solution 125 in the plate tank 13 and the containing tank 135 is, the further away from the space of the cooling unit 17, the plate tank 13 and the containing tank 135 is. The temperature of the aqueous solution 125 is higher.
因此氨氣121的溫度會隨著接近冷卻單元17而逐漸下降,並使得氨氣121的含水量逐漸降低,而氨氣的濃度則會逐漸增加。具體來說,當氨氣輸送至最上方的板槽13與冷卻單元17時,氨氣內大部分的水氣會因為溫度下降而析出,並凝結在冷卻單元17的下表面。此外冷凝的水溶液125會累積在最靠近冷卻單元17的板槽13的容置槽135內,而產生的一高濃度氨氣123則會由氣體輸出端123輸出外殼體11。Therefore, the temperature of the ammonia gas 121 will gradually decrease as it approaches the cooling unit 17, and the water content of the ammonia gas 121 will gradually decrease, while the concentration of the ammonia gas will gradually increase. Specifically, when the ammonia gas is delivered to the uppermost plate groove 13 and the cooling unit 17, most of the water gas in the ammonia gas will be precipitated due to the temperature drop and condensed on the lower surface of the cooling unit 17. In addition, the condensed aqueous solution 125 will accumulate in the accommodating tank 135 closest to the plate tank 13 of the cooling unit 17, and a high-concentration ammonia gas 123 will be output to the outer casing 11 through the gas output terminal 123.
在本發明一實施例中,外殼體11內的壓力可介於1.0至9.0atm之間,由氣體輸入端151進入的低濃度氨氣121的質量濃度則可介於10%至90%或10%至99%之間,而冷卻單元17的溫度則可為攝氏10度以下。當板槽13的數量為三層,冷卻單元17的溫度為攝氏10度時,質量濃度40%的低濃度氨氣在通過氨氣濃度提升裝置10後,可由氣體輸出端123輸出質量濃度99%的高濃度氨氣123。當然以上的數據僅為本發明的一實施例,並非本發明權利範圍的限制。In an embodiment of the present invention, the pressure in the outer casing 11 may be between 1.0 and 9.0 atm, and the mass concentration of the low-concentration ammonia 121 entering from the gas input terminal 151 may be between 10% and 90% or 10 % To 99%, and the temperature of the cooling unit 17 may be below 10 degrees Celsius. When the number of the plate grooves 13 is three layers and the temperature of the cooling unit 17 is 10 degrees Celsius, the low-concentration ammonia with a mass concentration of 40% can pass through the ammonia gas concentration increasing device 10, and the gas output terminal 123 can output a mass concentration of 99%. Of high concentration ammonia 123. Of course, the above data is only an embodiment of the present invention, and is not a limitation on the scope of rights of the present invention.
具體來說氨氣濃度提升裝置10輸出的高濃度氨氣123的濃度,會隨著冷卻單元17的溫度及板槽13的數量與面積而改變,而使用者可依據需求調整。因此冷卻單元17的溫度及板槽13的數量與面積並非本發明權利範圍的限制。Specifically, the concentration of the high-concentration ammonia gas 123 output by the ammonia gas concentration increasing device 10 will change with the temperature of the cooling unit 17 and the number and area of the plate grooves 13, and the user can adjust it according to demand. Therefore, the temperature of the cooling unit 17 and the number and area of the plate grooves 13 are not limited by the scope of the present invention.
此外冷卻單元17可以是一般常見的壓縮機冷卻系統或者是液體冷卻循環系統,例如冷卻單元17可包括至少一輸入端171及至少一輸出端173,其中冷卻液由輸入端171進入冷卻單元17,並由輸出端173輸出。In addition, the cooling unit 17 may be a common compressor cooling system or a liquid cooling circulation system. For example, the cooling unit 17 may include at least one input terminal 171 and at least one output terminal 173. The cooling liquid enters the cooling unit 17 from the input terminal 171. And output from the output terminal 173.
請參閱圖6,為本發明氨氣濃度提升裝置又一實施例的構造示意圖。如圖所示,本發明所述的氨氣濃度提升裝置20的主要包括一外殼體21、複數個板槽23及一冷卻單元27,本發明實施例的剖面方向與圖1實施例的剖面方向垂直。Please refer to FIG. 6, which is a schematic structural diagram of another embodiment of an ammonia concentration increasing device according to the present invention. As shown in the figure, the ammonia concentration increasing device 20 according to the present invention mainly includes an outer shell 21, a plurality of plate grooves 23, and a cooling unit 27. The cross-sectional direction of the embodiment of the present invention is the same as that of the embodiment of FIG. vertical.
在本發明實施例中,如圖7及圖8所示,板槽23包括一板體231及至少一側板233,其中板體231包括一上表面232及一下表面234,並於上表面232及下表面234上形成複數個凹陷部237。具體來說可以將平板彎折或加壓成型,以在板體231上形成複數個凹陷部237。板體231的上表面232的凹陷部237的一端或兩端可設置側板233,使得側板233與板體231上表面232的凹陷部237形成一容置槽235。In the embodiment of the present invention, as shown in FIGS. 7 and 8, the plate groove 23 includes a plate body 231 and at least one side plate 233. The plate body 231 includes an upper surface 232 and a lower surface 234, and the upper surface 232 and A plurality of recessed portions 237 are formed on the lower surface 234. Specifically, the flat plate may be bent or press-molded to form a plurality of recessed portions 237 on the plate body 231. One or both ends of the recessed portion 237 of the upper surface 232 of the plate 231 may be provided with a side plate 233, so that the side plate 233 and the recessed portion 237 of the upper surface 232 of the plate 231 form an accommodation groove 235.
複數個板槽23以層疊方式設置,如圖9及圖10,當兩個板槽23重疊時,兩個相鄰的板槽23的凹陷部237之間可形成至少一間隔空間213。此外兩個相鄰的板槽23的兩端不重疊,並在板槽23的一端與外殼體21之間形成一連通道215,使得間隔空間213及連通道215流體連接形成一流動空間217,例如兩個板槽23上設置有側板233的側邊不重疊。The plurality of plate grooves 23 are arranged in a stacked manner. As shown in FIGS. 9 and 10, when two plate grooves 23 overlap, at least one space 213 may be formed between the recessed portions 237 of two adjacent plate grooves 23. In addition, two ends of two adjacent plate grooves 23 do not overlap, and a continuous passage 215 is formed between one end of the plate groove 23 and the outer casing 21, so that the space 213 and the connection passage 215 are fluidly connected to form a flow space 217, for example, The side edges of the two plate grooves 23 provided with the side plates 233 do not overlap.
在本發明上述實施例中,兩個相鄰的板槽23的凹陷部237所形成的間隔空間213的剖面為六邊形或正六邊形,使得間隔空間213形成一六邊形或正六邊形的柱狀體。在不同實施例中,兩個板槽23所形成的間隔空間213的剖面亦可為其他幾何形狀,例如圓形、橢圓形、圓弧形、半圓型、四邊形、菱形等。In the above embodiment of the present invention, the cross-section of the space 213 formed by the recessed portions 237 of two adjacent plate grooves 23 is a hexagon or a regular hexagon, so that the space 213 forms a hexagon or a regular hexagon. Columnar body. In different embodiments, the cross-section of the space 213 formed by the two plate grooves 23 may also have other geometric shapes, such as a circle, an oval, a circular arc, a semicircle, a quadrangle, a diamond, and the like.
在本發明實施例中,在兩個相鄰的板槽23中,位於上方的板槽23的下表面234接觸下方的板槽23的上表面232,但在實際應用時相鄰的板槽23並不一定要相接觸,亦可使得位於上方的板槽23的下表面234與位於下方的板槽23的上表面232之間存在一間隔。In the embodiment of the present invention, in two adjacent plate grooves 23, the lower surface 234 of the upper plate groove 23 contacts the upper surface 232 of the lower plate groove 23, but in actual application, the adjacent plate groove 23 It is not necessary to make contact with each other, and there may be a gap between the lower surface 234 of the upper plate groove 23 and the upper surface 232 of the lower plate groove 23.
以上所述者,僅為本發明之一較佳實施例而已,並非用來限定本發明實施之範圍,即凡依本發明申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾,均應包括於本發明之申請專利範圍內。The above is only a preferred embodiment of the present invention, and is not intended to limit the scope of implementation of the present invention, that is, any change in shape, structure, characteristics, and spirit according to the scope of the patent application for the present invention is equivalent to Modifications shall all be included in the scope of patent application of the present invention.
10‧‧‧氨氣濃度提升裝置10‧‧‧Ammonia concentration raising device
11‧‧‧外殼體11‧‧‧ Outer shell
110‧‧‧殼板110‧‧‧Shell plate
111‧‧‧容置空間111‧‧‧accommodation space
112‧‧‧右殼板112‧‧‧Right shell plate
113‧‧‧間隔空間113‧‧‧ Space
114‧‧‧左殼板114‧‧‧Left shell plate
115‧‧‧連通道115‧‧‧ with access
117‧‧‧流動空間117‧‧‧mobile space
121‧‧‧低濃度氨氣121‧‧‧ low concentration ammonia
123‧‧‧高濃度氨氣123‧‧‧High concentration ammonia
125‧‧‧水溶液125‧‧‧ water solution
13‧‧‧板槽13‧‧‧Slot
131‧‧‧板體131‧‧‧ plate
132‧‧‧上表面132‧‧‧upper surface
133‧‧‧側板133‧‧‧Side panel
134‧‧‧下表面134‧‧‧ lower surface
135‧‧‧容置槽135‧‧‧Receiving slot
151‧‧‧氣體輸入端151‧‧‧Gas input
153‧‧‧氣體輸出端153‧‧‧Gas output
155‧‧‧液體輸出端155‧‧‧Liquid output terminal
17‧‧‧冷卻單元17‧‧‧cooling unit
171‧‧‧輸入端171‧‧‧input
173‧‧‧輸出端173‧‧‧output
20‧‧‧氨氣濃度提升裝置20‧‧‧Ammonia concentration raising device
21‧‧‧外殼體21‧‧‧ outer shell
213‧‧‧間隔空間213‧‧‧space
215‧‧‧連通道215‧‧‧ with access
217‧‧‧流動空間217‧‧‧mobile space
23‧‧‧板槽23‧‧‧Slot
231‧‧‧板體231‧‧‧board
232‧‧‧上表面232‧‧‧upper surface
233‧‧‧側板233‧‧‧Side
234‧‧‧下表面234‧‧‧ lower surface
235‧‧‧容置槽235‧‧‧Receiving slot
237‧‧‧凹陷部237‧‧‧ Depression
27‧‧‧冷卻單元27‧‧‧cooling unit
圖1:為本發明氨氣濃度提升裝置一實施例的構造示意圖。FIG. 1 is a schematic structural diagram of an embodiment of an ammonia concentration increasing device according to the present invention.
圖2:為本發明氨氣濃度提升裝置的板槽一實施例的立體示意圖。FIG. 2 is a schematic perspective view of an embodiment of a plate groove of the ammonia concentration increasing device of the present invention.
圖3:為本發明氨氣濃度提升裝置的板槽及殼體一實施例的立體示意圖。FIG. 3 is a schematic perspective view of an embodiment of a plate groove and a casing of the ammonia concentration increasing device of the present invention.
圖4:為本發明氨氣濃度提升裝置的板槽又一實施例的立體示意圖。FIG. 4 is a schematic perspective view of another embodiment of a plate groove of the ammonia concentration increasing device of the present invention.
圖5:為本發明氨氣濃度提升裝置的板槽及殼體又一實施例的立體示意圖。FIG. 5 is a schematic perspective view of another embodiment of a plate groove and a casing of the ammonia concentration increasing device of the present invention.
圖6:為本發明氨氣濃度提升裝置又一實施例的構造示意圖。FIG. 6 is a schematic structural diagram of another embodiment of an ammonia concentration increasing device according to the present invention.
圖7:為本發明氨氣濃度提升裝置的板槽又一實施例的剖面示意圖。FIG. 7 is a schematic cross-sectional view of another embodiment of a plate groove of the ammonia concentration increasing device of the present invention.
圖8:為本發明氨氣濃度提升裝置的板槽又一實施例的立體示意圖。FIG. 8 is a schematic perspective view of another embodiment of a plate groove of the ammonia concentration increasing device of the present invention.
圖9:為本發明氨氣濃度提升裝置中層疊設置的板槽一實施例的剖面示意圖。FIG. 9 is a schematic cross-sectional view of an embodiment of plate grooves stacked in an ammonia gas concentration increasing device of the present invention.
圖10:為本發明氨氣濃度提升裝置中層疊設置的板槽一實施例的立體示意圖。FIG. 10 is a schematic perspective view of an embodiment of plate grooves arranged in a stack in the ammonia concentration increasing device of the present invention.
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW107129701A TWI671262B (en) | 2018-08-24 | 2018-08-24 | Ammonia concentration lifting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW107129701A TWI671262B (en) | 2018-08-24 | 2018-08-24 | Ammonia concentration lifting device |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI671262B true TWI671262B (en) | 2019-09-11 |
TW202009219A TW202009219A (en) | 2020-03-01 |
Family
ID=68618925
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107129701A TWI671262B (en) | 2018-08-24 | 2018-08-24 | Ammonia concentration lifting device |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI671262B (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09142833A (en) * | 1995-11-28 | 1997-06-03 | Taiyo Toyo Sanso Co Ltd | Removal of moisture in ammonia and device therefor |
CN205820906U (en) * | 2016-05-26 | 2016-12-21 | 隆达电子股份有限公司 | Ammonia density promotes system |
-
2018
- 2018-08-24 TW TW107129701A patent/TWI671262B/en not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09142833A (en) * | 1995-11-28 | 1997-06-03 | Taiyo Toyo Sanso Co Ltd | Removal of moisture in ammonia and device therefor |
CN205820906U (en) * | 2016-05-26 | 2016-12-21 | 隆达电子股份有限公司 | Ammonia density promotes system |
Also Published As
Publication number | Publication date |
---|---|
TW202009219A (en) | 2020-03-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI671262B (en) | Ammonia concentration lifting device | |
US7633756B2 (en) | Heat dissipation device with fan holder | |
US20200217595A1 (en) | Heat dissipation assembly | |
US9108846B2 (en) | Method for preparing sulfuric acid by using hydrogen sulfide | |
US8373989B2 (en) | Fan fixing device and fan module having same | |
US20130048256A1 (en) | Heat dissipation device | |
JP2012120999A5 (en) | ||
CN105311881A (en) | High-efficient settling chamber for dust removal | |
KR100978805B1 (en) | Refining method and equipment of high purity nitric oxide using cryogenic freezing trap | |
TWM575023U (en) | Device for increasing ammonia concentration | |
TW200644216A (en) | Multipackage module having stacked packages with asymmetrically arranged die and molding | |
KR101280541B1 (en) | Residual product trap apparatus for semiconductor manufacturing equipment | |
CN112604443A (en) | Exhaust device of semiconductor cleaning equipment | |
TWI669275B (en) | Ammonia treatment unit | |
US7344579B2 (en) | Pipe trap | |
CN104984619A (en) | Compressed gas dehydration device | |
US20130056182A1 (en) | Heat dissipation device | |
CN2915224Y (en) | Oil gas filter | |
TWM575024U (en) | Ammonia water treatment device | |
US7929293B2 (en) | Heat dissipating assembly | |
CN203892154U (en) | Vacuum treatment device | |
CN203315772U (en) | Rectifying tower with packing obliquely arranged | |
CN202363434U (en) | Cover plate, wet etching slot and wet etching device | |
CN201940149U (en) | Vacuum adiabatic high-purity gas low-temperature adsorption purifying equipment | |
EA027599B1 (en) | High flow capacity condenser tube for sulphuric acid condensation |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |