CN201940149U - Vacuum adiabatic high-purity gas low-temperature adsorption purifying equipment - Google Patents
Vacuum adiabatic high-purity gas low-temperature adsorption purifying equipment Download PDFInfo
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- CN201940149U CN201940149U CN2011201793360U CN201120179336U CN201940149U CN 201940149 U CN201940149 U CN 201940149U CN 2011201793360 U CN2011201793360 U CN 2011201793360U CN 201120179336 U CN201120179336 U CN 201120179336U CN 201940149 U CN201940149 U CN 201940149U
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Abstract
The utility model discloses vacuum adiabatic high-purity gas low-temperature adsorption purifying equipment, which comprises a cooling adsorbent liquid nitrogen inlet, a vacuum cavity inlet, an equipment vacuum cavity, an equipment adsorbent container cavity, six low-temperature fins of cooling adsorbent, a high-purity gas adsorption purified product outlet, a cooling adsorbent liquid nitrogen outlet, an adsorbent replacement outlet, an inlet of purified high-purity gas to be adsorbed and a purified gas monitoring pressure gauge. The equipment adsorbent container cavity is positioned inside the equipment vacuum cavity; the outer surface of the equipment vacuum cavity is an outer casing of the equipment; the cooling adsorbent liquid nitrogen inlet is connected to the six low-temperature fins of cooling adsorbent; the vacuum cavity inlet is communicated with the equipment vacuum cavity; and the six low-temperature fins of cooling adsorbent are positioned in the equipment adsorbent container cavity.
Description
Technical field
The utility model relates to vacuum insulation formula high-purity gas cryogenic absorption purifier apparatus, belongs to the special equipment that the gas absorption separation technology field uses.
Background technology
At present, the gas absorption purifier apparatus is used limited aspect purification for gas production, and main cause has two aspects, and gaseous species is various on the one hand, and the gas absorption purifier apparatus mostly can only be at 1-2 kind gas, and popularization is not strong, is difficult to promote the use of; On the other hand, gas purification technology is showing improvement or progress day by day, but real practical, effective, easy purifier apparatus is less.
The utility model content
At the deficiencies in the prior art, heat of adsorption improves the purification performance of adsorbent simultaneously to the influence that purifying produces when solving the high-purity gas adsorption and purification, and the utility model provides a kind of high-purity gas adsorption and purification equipment that can make things convenient for simple and easy replacing adsorbent.
Vacuum insulation formula high-purity gas cryogenic absorption purifier apparatus, comprise: cooling adsorbent liquid nitrogen access port, the vacuum chamber access port, the equipment vacuum chamber, equipment absorbent container chamber, 6 chip low temperature fins of cooling adsorbent, high-purity gas adsorption and purification products export, the adsorbent outlet is changed in the outlet of cooling adsorbent liquid nitrogen, treats adsorption and purification high-purity gas inlet and monitoring purified gases Pressure gauge; Equipment absorbent container chamber is positioned at equipment vacuum chamber inside, and the outer surface of equipment vacuum chamber is the shell of equipment; Cooling adsorbent liquid nitrogen access port is connected to 6 chip low temperature fins of cooling adsorbent, and vacuum chamber access port and equipment vacuum chamber are communicated with; 6 chip low temperature fins of cooling adsorbent are positioned at equipment absorbent container chamber, and the axis of 6 chip low temperature fins of cooling adsorbent is positioned at the positive center in equipment absorbent container chamber; High-purity gas adsorption and purification products export is positioned at the left side, lower end in equipment absorbent container chamber, the outlet of cooling adsorbent liquid nitrogen is positioned at the lower end of 6 chip low temperature fins of cooling adsorbent, change the right side, lower end that the adsorbent outlet is positioned at equipment absorbent container chamber, treat that adsorption and purification high-purity gas inlet is positioned at the right side, upper end in equipment absorbent container chamber, monitoring purified gases Pressure gauge and equipment absorbent container chamber are communicated with.
The equipment vacuum chamber is realized by two tank bodies that vary in size.
Equipment absorbent container chamber holds the adsorbent of purified gases.
Angle is 60 degree between each fin of 6 chip low temperature fins of cooling adsorbent.
Change the adsorbent outlet by pack into different adsorbents or pour out spent sorbents of this outlet.
The present invention can be more simple and easy, be convenient for changing adsorbent; By cooled with liquid nitrogen, improve the absorption property of adsorbent, can more effective raising gas products quality; By vacuum chamber, can keep the stability of the temperature in the equipment, reduce loss simultaneously to liquid nitrogen; By pressure monitor, further improve the adsorbent purification effect, guarantee the using value of this equipment; With a plurality of devices in series, and the different adsorbents of packing into, when purified gases, remove plurality of impurities, can effectively reduce requirement to unstrpped gas.
The utility model is summed up traditional purification for gas mode in long term production, can purifying most gases are obvious to trace impurity removal effect in the high-purity gas, cryogenic absorption is separated to remove the specific impurities effect remarkable.
Description of drawings
Fig. 1 is the cutaway view of high-purity gas cryogenic absorption purifier apparatus of the present utility model.
The specific embodiment
With Fig. 1 is that example is described:
The high-purity gas cryogenic absorption purifier apparatus that the utility model provides comprises: cooling adsorbent liquid nitrogen access port 1, vacuum chamber access port 2, equipment vacuum chamber 3, equipment absorbent container chamber 4,6 chip low temperature fins 5 of cooling adsorbent, high-purity gas adsorption and purification products export 6, cooling adsorbent liquid nitrogen outlet 7, change adsorbent outlet 8, treat adsorption and purification high-purity gas inlet 9 and monitoring purified gases Pressure gauge 10.
Wherein, equipment absorbent container chamber 4 is positioned at equipment vacuum chamber 3 inside, and the outer surface of equipment vacuum chamber 3 is the shell of equipment.
Cooling adsorbent liquid nitrogen access port 1 is connected to 6 chip low temperature fins 5 of cooling adsorbent, and vacuum chamber access port 2 and equipment vacuum chamber 3 are communicated with.
6 chip low temperature fins 5 of cooling adsorbent are positioned at equipment absorbent container chamber 4, and the axis of 6 chip low temperature fins 5 of cooling adsorbent is positioned at the positive center in equipment absorbent container chamber 4.
High-purity gas adsorption and purification products export 6 is positioned at the left side, lower end in equipment absorbent container chamber 4, cooling adsorbent liquid nitrogen outlet 7 is positioned at the lower end of 6 chip low temperature fins 5 of cooling adsorbent, change the right side, lower end that adsorbent outlet 8 is positioned at equipment absorbent container chamber 4, treat that adsorption and purification high-purity gas inlet 9 is positioned at the right side, upper end in equipment absorbent container chamber 4, monitoring purified gases Pressure gauge 10 and equipment absorbent container chamber 4 are communicated with, monitoring purified gases pressure.
Wherein, vacuum chamber access port 2 vacuumizes by vavuum pump when vacuum in the vacuum chamber descends.Equipment vacuum chamber 3 is realized by two tank bodies that vary in size.Equipment absorbent container chamber 4 holds the adsorbent of purified gases.Angle is 60 degree between each fin of 6 chip low temperature fins 5 of cooling adsorbent;
Changing adsorbent outlet 8 can be by pack into different adsorbent or pour out spent sorbents of this outlet.
Wherein, in service at the equipment of present embodiment, at first the equipment vacuum chamber is evacuated to the certain vacuum degree; Pack into by the adsorbent after handling, arrive uniform temperature by cooled with liquid nitrogen, and keep constant; High-purity gas to be purified is passed through inlet feeding equipment; By adjusting liquid nitrogen flow, keep uniform temperature, prevent that temperature from raising; By the monitoring pressure table, keep certain purifying pressure.
Claims (5)
1. vacuum insulation formula high-purity gas cryogenic absorption purifier apparatus, it is characterized in that, described equipment comprises: cooling adsorbent liquid nitrogen access port, vacuum chamber access port, equipment vacuum chamber, equipment absorbent container chamber, 6 chip low temperature fins of cooling adsorbent, high-purity gas adsorption and purification products export, the outlet of cooling adsorbent liquid nitrogen, adsorption and purification high-purity gas inlet and monitoring purified gases Pressure gauge are treated in the outlet of replacing adsorbent; Equipment absorbent container chamber is positioned at equipment vacuum chamber inside, and the outer surface of equipment vacuum chamber is the shell of equipment; Cooling adsorbent liquid nitrogen access port is connected to 6 chip low temperature fins of cooling adsorbent, and vacuum chamber access port and equipment vacuum chamber are communicated with; 6 chip low temperature fins of cooling adsorbent are positioned at equipment absorbent container chamber, and the axis of 6 chip low temperature fins of cooling adsorbent is positioned at the positive center in equipment absorbent container chamber; High-purity gas adsorption and purification products export is positioned at the left side, lower end in equipment absorbent container chamber, the outlet of cooling adsorbent liquid nitrogen is positioned at the lower end of 6 chip low temperature fins of cooling adsorbent, change the right side, lower end that the adsorbent outlet is positioned at equipment absorbent container chamber, treat that adsorption and purification high-purity gas inlet is positioned at the right side, upper end in equipment absorbent container chamber, monitoring purified gases Pressure gauge and equipment absorbent container chamber are communicated with.
2. vacuum insulation formula high-purity gas cryogenic absorption purifier apparatus according to claim 1 is characterized in that the equipment vacuum chamber comprises two tank bodies that vary in size.
3. vacuum insulation formula high-purity gas cryogenic absorption purifier apparatus according to claim 1 is characterized in that equipment absorbent container chamber holds the adsorbent of purified gases.
4. vacuum insulation formula high-purity gas cryogenic absorption purifier apparatus according to claim 1 is characterized in that, angle is 60 degree between each fin of 6 chip low temperature fins of cooling adsorbent.
5. vacuum insulation formula high-purity gas cryogenic absorption purifier apparatus according to claim 1 is characterized in that, changes the adsorbent outlet by pack into different adsorbents or pour out spent sorbents of this outlet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011201793360U CN201940149U (en) | 2011-05-31 | 2011-05-31 | Vacuum adiabatic high-purity gas low-temperature adsorption purifying equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011201793360U CN201940149U (en) | 2011-05-31 | 2011-05-31 | Vacuum adiabatic high-purity gas low-temperature adsorption purifying equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201940149U true CN201940149U (en) | 2011-08-24 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011201793360U Expired - Fee Related CN201940149U (en) | 2011-05-31 | 2011-05-31 | Vacuum adiabatic high-purity gas low-temperature adsorption purifying equipment |
Country Status (1)
| Country | Link |
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| CN (1) | CN201940149U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104128071A (en) * | 2014-08-15 | 2014-11-05 | 苏州市兴鲁空分设备科技发展有限公司 | Helium purifying device |
| CN111589270A (en) * | 2020-05-25 | 2020-08-28 | 郑州大学 | Gas purification device used under vacuum environment and ultrahigh vacuum equipment |
-
2011
- 2011-05-31 CN CN2011201793360U patent/CN201940149U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104128071A (en) * | 2014-08-15 | 2014-11-05 | 苏州市兴鲁空分设备科技发展有限公司 | Helium purifying device |
| CN111589270A (en) * | 2020-05-25 | 2020-08-28 | 郑州大学 | Gas purification device used under vacuum environment and ultrahigh vacuum equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 528234 industrial land, Sha River Water Management Zone, Songgang Town, Nanhai District, Foshan, Guangdong Patentee after: Guangdong SouthChina Special Gas Institute Co., Ltd. Patentee after: GUANGDONG HUATE GASES CO., LTD. Address before: 528234 industrial land, Sha River Water Management Zone, Songgang Town, Nanhai District, Foshan, Guangdong Patentee before: Guangdong SouthChina Special Gas Institute Co., Ltd. Patentee before: Foshan Huate Gases Co., Ltd. |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110824 Termination date: 20180531 |
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| CF01 | Termination of patent right due to non-payment of annual fee |