TWI669777B - Adsorption device, vacuum processing device - Google Patents
Adsorption device, vacuum processing device Download PDFInfo
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- TWI669777B TWI669777B TW105111663A TW105111663A TWI669777B TW I669777 B TWI669777 B TW I669777B TW 105111663 A TW105111663 A TW 105111663A TW 105111663 A TW105111663 A TW 105111663A TW I669777 B TWI669777 B TW I669777B
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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- H—ELECTRICITY
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Abstract
提供一種吸附力不會變弱的吸附裝置。 Provided is an adsorption device in which the adsorption force does not become weak.
將吸附裝置(19a)之受電端子(24)配置在受 電側凹部(23)內,並構成為能夠藉由蓋部(25a)來作覆蓋。在吸附基板(51~53)時,係將吸附裝置(19a)載置於供電台(18a)上,並使供電端子(64)與受電端子(24)作接觸,而對於基板(51~53)和吸附電極(22)之間的等價電容進行充電。在使吸附裝置(19a)作移動時,係一面藉由等價電容之殘留電荷來吸附基板(51~53),一面藉由蓋部(25a)來覆蓋受電側凹部(23),而成為不會使真空槽中之殘留氣體接觸受電端子(24)。係成為不會有受電端子(24)被腐蝕或者是被形成有薄膜的情形,等價電容之殘留電荷係成為不會被放出。 The power receiving terminal (24) of the adsorption device (19a) is disposed in the power receiving side recess (23), and is configured to be covered by the lid portion (25a). When the substrate (5 1 to 5 3 ) is adsorbed, the adsorption device (19a) is placed on the power supply station (18a), and the power supply terminal (64) is brought into contact with the power receiving terminal (24), and for the substrate (5) The equivalent capacitance between 1 ~ 5 3 ) and the adsorption electrode (22) is charged. When the adsorption device (19a) is moved, the substrate (5 1 to 5 3 ) is adsorbed by the residual charge of the equivalent capacitance, and the power receiving side concave portion (23) is covered by the lid portion (25a). The residual gas in the vacuum chamber is not brought into contact with the power receiving terminal (24). In the case where the power receiving terminal (24) is not corroded or a film is formed, the residual charge of the equivalent capacitor is not released.
Description
本發明,係有關於吸附裝置和真空處理裝置,特別是有關於具備有能夠在真空氛圍中而於吸附有基板的狀態下進行移動的吸附裝置和被載置有該吸附裝置之供電台的真空處理裝置。 The present invention relates to an adsorption device and a vacuum processing device, and more particularly to an adsorption device including a vacuum storage device capable of moving in a state in which a substrate is adsorbed in a vacuum atmosphere, and a vacuum supply device on which the adsorption device is placed. Processing device.
當在真空氛圍中而對於基板進行處理的情況時,係進行有將基板載置於吸附裝置上並使其被吸附於吸附裝置處,且藉由對於吸附裝置之溫度作控制,來間接性地對於基板之溫度作控制的方法。 When the substrate is processed in a vacuum atmosphere, the substrate is placed on the adsorption device and adsorbed to the adsorption device, and indirectly controlled by the temperature of the adsorption device. A method of controlling the temperature of a substrate.
近年來,係存在有搭載電池並能夠在藉由電池之動作來將基板作了吸附的狀態下而進行移動之吸附裝置,但是,此係為高價,並且體積亦為大。 In recent years, there has been an adsorption device in which a battery is mounted and the substrate can be moved while being adsorbed by the operation of the battery. However, this is expensive and has a large volume.
又,係周知有下述一般之吸附裝置‧‧‧亦即是,係為無電池之型態,並且,被與吸附裝置之吸附電極作了連接的受電端子、和被與電源作了連接的供電裝置之供電端子,在靜止狀態下係相互接觸,吸附電極與基板之 間之等價電容係被充電,且能夠使受電端子和供電端子相互分離並進行移動,該吸附裝置,係藉由被積蓄在等價電容中之殘留電荷,而就算是在移動中也能夠吸附基板。 Further, it is known that the following general adsorption device ‧ ‧ is a battery-free type, and is connected to a power receiving terminal connected to an adsorption electrode of the adsorption device and connected to a power source The power supply terminals of the power supply device are in contact with each other in a stationary state, and the adsorption electrode and the substrate are The equivalent capacitance is charged, and the power receiving terminal and the power supply terminal can be separated from each other and moved. The adsorption device can be adsorbed even when moving, by the residual charge accumulated in the equivalent capacitor. Substrate.
然而,在此種吸附裝置中,係會有真空處理中之吸附力或移動中之吸附力降低的情形,而要求對此採取對策。 However, in such an adsorption device, there is a case where the adsorption force in the vacuum treatment or the adsorption force during the movement is lowered, and countermeasures are required.
[專利文獻1]日本特開2007-53348號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2007-53348
[專利文獻2]日本特開2009-99674號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2009-99674
[專利文獻3]WO2006-123680號公報 [Patent Document 3] WO2006-123680
本發明,係為了解決上述先前技術之問題而創作者,其目的,係在於提供一種能夠並不使真空處理中或移動中之吸附力降低地而吸附基板之技術。 The present invention has been made in order to solve the problems of the prior art described above, and an object thereof is to provide a technique capable of adsorbing a substrate without lowering the adsorption force during vacuum processing or during movement.
本案發明之發明者們,係發現到:吸附裝置之受電端子,由於係在藉由殘留於等價電容中之殘留電荷而被施加有高電壓之狀態下與真空槽中之導電氣體氛圍作接觸,因此,在移動中,殘留電荷係會被放出,於移動中吸附力係降低。故而,若是防止受電端子之對於導電性氣 體的露出,則係成為不會發生吸附力之降低。 The inventors of the present invention found that the power receiving terminal of the adsorption device is in contact with the conductive gas atmosphere in the vacuum chamber in a state where a high voltage is applied by residual charge remaining in the equivalent capacitor. Therefore, during the movement, the residual charge is released, and the adsorption force is lowered during the movement. Therefore, if it is to prevent the power receiving terminal from being conductive gas When the body is exposed, the decrease in the adsorption force does not occur.
本案發明,係為基於上述之知識所創作者,其係為一種吸附裝置,並具備有:裝置本體;和被設置於前述裝置本體處之受電側凹部;和在前述受電側凹部處而使至少一部分作了露出的受電端子;和被設置在前述裝置本體處並且被與前述受電端子作電性連接之吸附電極,若是使具有電傳導性之氣體狀的物質與被載置於前述裝置本體之表面上的基板作接觸,並且對於前述吸附電極施加電壓,則前述基板會被吸附於前述吸附電極處,該吸附裝置,其特徵為:前述吸附電極,係若是將被設置在前述吸附裝置所被作載置之供電台處且被與電源裝置作了連接的供電端子插入至前述受電側凹部中,並使前述供電端子與前述受電端子之露出部分作接觸,則係被施加有前述電源裝置所輸出之吸附電壓,在前述吸附電壓被施加於前述吸附電極處之後,若是使前述受電端子與前述供電端子相分離,則殘留電荷係殘留在前述吸附電極處,在使前述受電端子與前述供電端子相分離並使前述吸附裝置作移動時,係藉由前述吸附電極之前述殘留電荷而使前述基板被吸附於前述吸附電極處,並且藉由被設置在前述裝置本體處之蓋部,而將前述受電側凹部閉塞。 The invention of the present invention is based on the above-mentioned knowledge, and is an adsorption device comprising: a device body; and a power receiving side recess portion provided at the device body; and at least the power receiving side recess portion a part of the exposed power receiving terminal; and an adsorption electrode disposed at the apparatus body and electrically connected to the power receiving terminal, if the gas-conducting substance having electrical conductivity is placed on the apparatus body The substrate on the surface is in contact, and when a voltage is applied to the adsorption electrode, the substrate is adsorbed to the adsorption electrode. The adsorption device is characterized in that the adsorption electrode is to be disposed in the adsorption device. The power supply terminal placed at the power supply station and connected to the power supply device is inserted into the power receiving side recess, and the power supply terminal is brought into contact with the exposed portion of the power receiving terminal, and the power supply device is applied. The output adsorption voltage is such that the aforementioned power receiving end is applied after the adsorption voltage is applied to the adsorption electrode When the power supply terminal is separated from the power supply terminal, the residual charge remains in the adsorption electrode, and when the power receiving terminal is separated from the power supply terminal and the adsorption device is moved, the residual charge of the adsorption electrode is caused by The substrate is adsorbed to the adsorption electrode, and the power receiving side concave portion is closed by a lid portion provided at the apparatus body.
本案發明,係為一種吸附裝置,其中,前述吸附裝置,係構成為:當前述裝置本體乃身為水平姿勢時,前述蓋部會被開啟並使前述受電端子與前述供電端子之間的接觸成為可能,若是前述供電端子被從前述受電側凹部而拔 去並且前述吸附裝置從水平姿勢而成為鉛直姿勢,則前述受電側凹部係被前述蓋部所閉塞。 The present invention is an adsorption device, wherein the adsorption device is configured such that when the device body is in a horizontal posture, the cover portion is opened and contact between the power receiving terminal and the power supply terminal is Possibly, if the power supply terminal is pulled out from the power receiving side recess When the adsorption device is in a vertical posture from the horizontal posture, the power receiving side concave portion is closed by the lid portion.
本案發明,係為一種吸附裝置,其中,在前述蓋部處,係被設置有伸縮構件,當前述供電端子被插入至前述受電側凹部中時,前述蓋部係被前述供電端子所推壓,前述伸縮構件變形的同時前述蓋部之至少一部分會移動並成為前述受電側凹部被作了開啟的狀態,前述受電端子與前述供電端子係相接觸,若是前述供電端子被從前述受電側凹部而拔去,則前述伸縮構件之變形係回復原狀,藉由前述蓋部,前述受電側凹部係被覆蓋。 The invention is an adsorption device in which a telescopic member is provided at the cover portion, and when the power supply terminal is inserted into the power receiving side recess, the cover portion is pressed by the power supply terminal. At least a part of the cover portion moves while the telescopic member is deformed, and the power receiving side recessed portion is opened. The power receiving terminal is in contact with the power feeding terminal, and the power feeding terminal is pulled out from the power receiving side recessed portion. Then, the deformation of the telescopic member is restored to the original state, and the power receiving side concave portion is covered by the cover portion.
本案發明,係為一種吸附裝置,其中,前述蓋部,係藉由若是被推壓則會變形並且若是推壓被解除則會回復至原本之形狀的材料所形成,當前述供電端子被插入至前述受電側凹部中時,前述蓋部係被前述供電端子所推壓,前述蓋部係變形並成為前述受電側凹部被作了開啟的狀態,前述受電端子與前述供電端子係相接觸,若是前述供電端子被從前述受電側凹部而拔去,則前述蓋部之變形係回復原狀,藉由前述蓋部,前述受電側凹部係被覆蓋。 The invention of the present invention is an adsorption device, wherein the cover portion is formed by deforming if pressed, and returning to the original shape if the pressing is released, when the power supply terminal is inserted into In the power receiving-side recessed portion, the cover portion is pressed by the power supply terminal, the cover portion is deformed, and the power receiving-side recessed portion is opened, and the power receiving terminal is in contact with the power supply terminal. When the power supply terminal is removed from the power receiving side recessed portion, the deformation of the cover portion is restored to the original shape, and the power receiving side concave portion is covered by the cover portion.
又,本案發明,係為一種吸附裝置,並具備有:裝置本體;和被設置在前述裝置本體處之受電端子;和被設置在前述裝置本體處之整流電路;和被設置在前述裝置本體處,並經由前述整流電路而被與前述受電端子作連接之吸附電極,若是使具有電傳導性之氣體狀的物質與被載置於前述裝置本體之表面上的基板作接觸,並且對於前述吸附 電極施加吸附電壓,則前述基板會被吸附於前述吸附電極處,該吸附裝置,其特徵為:前述受電端子,係與前述裝置本體之外部的氛圍相互分離,若是前述吸附裝置被載置於供電台處,則被設置在前述供電台處之供電端子與前述受電端子係以非接觸的狀態而接近,前述受電端子係受電被施加於前述供電端子處之交流電壓,經由前述整流電路,前述吸附電壓係被施加於前述吸附電極處,在使前述吸附裝置從前述供電台而分離並作移動時,係藉由前述吸附電極之殘留電荷而使前述基板被吸附於前述吸附電極處,該吸附裝置,係具備有:能夠與被設置於前述供電台處之供電側接地端子作接觸的受電側接地端子、和將前述吸附電極和前述受電側接地端子之間作導通或遮斷並將前述吸附電極和前述受電端子之間作導通或遮斷之切換裝置、和對於前述切換裝置之連接作切換的控制裝置,在被施加於前述供電端子處之交流電壓中,係重疊有對於前述切換裝置之導通和遮斷作控制的控制訊號,從前述受電端子所受電了的電壓而抽出前述控制訊號,並輸入至前述控制裝置中。 Further, the invention of the present invention is an adsorption device comprising: a device body; and a power receiving terminal provided at the device body; and a rectifying circuit provided at the device body; and being disposed at the device body And the adsorption electrode connected to the power receiving terminal via the rectifying circuit contacts the substrate placed on the surface of the apparatus body with a gas-like substance having electrical conductivity, and the adsorption When the electrode applies an adsorption voltage, the substrate is adsorbed to the adsorption electrode. The adsorption device is characterized in that the power receiving terminal is separated from the atmosphere outside the device body, and if the adsorption device is placed on the adsorption device In the radio station, the power supply terminal provided at the power supply station is in contact with the power receiving terminal in a non-contact state, and the power receiving terminal receives an AC voltage applied to the power supply terminal, and the adsorption is performed via the rectifier circuit. a voltage system is applied to the adsorption electrode, and when the adsorption device is separated from the power supply station and moved, the substrate is adsorbed to the adsorption electrode by residual charges of the adsorption electrode. The power receiving side grounding terminal capable of making contact with the power supply side ground terminal provided at the power supply station, and the conduction and blocking between the adsorption electrode and the power receiving side ground terminal, and the adsorption electrode Switching device for conducting or blocking between the power receiving terminal and the foregoing switching device a control device for switching, wherein a control signal for controlling conduction and blocking of the switching device is superimposed on an AC voltage applied to the power supply terminal, and the voltage received from the power receiving terminal is extracted The control signal is input to the aforementioned control device.
本案發明,係為一種吸附裝置,其中,前述受電端子和前述供電端子,係分別藉由平板電極所構成,若是前述吸附裝置被載置於前述供電台處,則係藉由前述受電端子和前述供電端子而形成電容器。 The present invention is an adsorption device, wherein the power receiving terminal and the power supply terminal are each formed by a plate electrode, and if the adsorption device is placed on the power supply station, the power receiving terminal and the aforementioned power receiving terminal The power supply terminal forms a capacitor.
本案發明,係為一種吸附裝置,其中,前述受電端子和前述供電端子,係分別藉由線圈所構成,若是前述吸附 裝置被載置於前述供電台處,則係形成使前述受電端子和前述供電端子作了磁性耦合之變壓器。 The invention of the present invention is an adsorption device, wherein the power receiving terminal and the power supply terminal are respectively formed by a coil, and the foregoing adsorption When the device is placed on the power supply station, a transformer that magnetically couples the power receiving terminal and the power supply terminal is formed.
本案發明,係為一種吸附裝置,其中,在前述吸附電極上,係被載置有複數之前述基板。 The invention of the present invention is an adsorption device in which a plurality of the substrates are placed on the adsorption electrode.
本案發明,係為一種吸附裝置,其中,具有電傳導性之氣體狀的前述物質,係為電漿。 The invention of the present invention is an adsorption device in which the gas-like substance having electrical conductivity is a plasma.
又,本發明,係為一種真空處理裝置,其特徵為,係具備有:被形成有具有電傳導性之氣體狀的物質之真空槽;和被配置在前述真空槽之內部之供電台;和被設置於前述供電台處之供電端子,前述供電台,係以將吸附裝置可分離地作了配置的方式而構成,當前述吸附裝置被配置在前述供電台處時,被設置在前述吸附裝置處之受電端子,係與前述供電端子作接觸,被與前述供電端子作了連接的電源裝置所輸出之吸附電壓,係經由前述供電端子和前述受電端子,而被施加於被設置在前述吸附裝置處之吸附電極處,被配置於前述吸附裝置處之基板,係被作靜電吸附,前述吸附裝置,係具備有:裝置本體;和被設置在前述裝置本體處之受電側凹部,前述受電端子,係於前述受電側凹部處而使至少一部分作露出,吸附電極,係被設置在前述裝置本體處,並被與前述受電端子作電性連接,構成為若是使具有電傳導性之氣體狀的物質與被載置於前述裝置本體之表面上的基板作接觸,並且對於前述吸附電極施加前述吸附電壓,則前述基板會被吸附於前述吸附電極處,若是將前述供電端子插入至前述受電側凹部中,並 使前述供電端子與前述受電端子之露出部分作接觸,則前述電源裝置所輸出之吸附電壓係經由前述受電端子而被施加於前述吸附電極處,在前述吸附電壓被施加於前述吸附電極處之後,若是使前述受電端子與前述供電端子相分離,則殘留電荷係殘留在前述吸附電極處,在使前述受電端子與前述供電端子相分離並使前述吸附裝置作移動時,係藉由前述吸附電極之前述殘留電荷而使前述基板被吸附於前述吸附電極處,並且藉由被設置在前述裝置本體處之蓋部,而將前述受電側凹部閉塞。 Moreover, the present invention provides a vacuum processing apparatus comprising: a vacuum chamber in which a gas-conducting substance having electrical conductivity is formed; and a power supply station disposed inside the vacuum chamber; and a power supply terminal provided at the power supply station, wherein the power supply station is configured to be detachably arranged, and when the adsorption device is disposed at the power supply station, the adsorption device is provided The power receiving terminal is in contact with the power supply terminal, and the adsorption voltage outputted by the power supply device connected to the power supply terminal is applied to the adsorption device via the power supply terminal and the power receiving terminal. In the adsorption electrode, the substrate disposed at the adsorption device is electrostatically adsorbed, and the adsorption device includes: a device body; and a power receiving side recess provided at the device body, and the power receiving terminal; Attached to the power receiving side recess to expose at least a portion, and the adsorption electrode is disposed at the apparatus body and is The power receiving terminal is electrically connected to each other, and is configured such that a gas-like substance having electrical conductivity is brought into contact with a substrate placed on a surface of the apparatus body, and the adsorption voltage is applied to the adsorption electrode, and the substrate is And being adsorbed to the adsorption electrode, and inserting the power supply terminal into the recess of the power receiving side, and When the power supply terminal is in contact with the exposed portion of the power receiving terminal, the adsorption voltage output from the power supply device is applied to the adsorption electrode via the power receiving terminal, and after the adsorption voltage is applied to the adsorption electrode, When the power receiving terminal is separated from the power supply terminal, residual charge remains in the adsorption electrode, and when the power receiving terminal is separated from the power supply terminal and the adsorption device is moved, the adsorption electrode is The substrate is adsorbed to the adsorption electrode by the residual charge, and the power receiving side concave portion is closed by a lid portion provided at the apparatus body.
本案發明,係為一種真空處理裝置,其中,前述吸附裝置,係構成為:當前述裝置本體乃身為水平姿勢時,前述蓋部會被開啟並使前述受電端子與前述供電端子之間的接觸成為可能,若是前述供電端子被從前述受電側凹部而拔去並且前述吸附裝置從水平姿勢而成為鉛直姿勢,則前述受電側凹部係被前述蓋部所閉塞。 The invention of the present invention is a vacuum processing apparatus, wherein the adsorption device is configured such that when the device body is in a horizontal posture, the cover portion is opened and the contact between the power receiving terminal and the power supply terminal is When the power supply terminal is removed from the power receiving side recessed portion and the suction device is in a vertical posture from the horizontal posture, the power receiving side recessed portion is closed by the cover portion.
本案發明,係為一種真空處理裝置,其中,在前述蓋部處,係被設置有伸縮構件,當前述供電端子被插入至前述受電側凹部中時,前述蓋部係被前述供電端子所推壓,前述伸縮構件變形的同時前述蓋部之至少一部分會移動並成為前述受電側凹部被作了開啟的狀態,前述受電端子與前述供電端子係相接觸,若是前述供電端子被從前述受電側凹部而拔去,則前述伸縮構件之變形係回復原狀,藉由前述蓋部,前述受電側凹部係被覆蓋。 According to the invention, a vacuum processing apparatus is provided, wherein the cover portion is provided with a telescopic member, and when the power supply terminal is inserted into the power receiving side recess, the cover portion is pressed by the power supply terminal When the telescopic member is deformed, at least a part of the cover portion moves to be in a state in which the power receiving side recessed portion is opened, and the power receiving terminal is in contact with the power feeding terminal, and the power feeding terminal is recessed from the power receiving side. When the outer casing is removed, the deformation of the elastic member is restored to the original state, and the power receiving side concave portion is covered by the cover portion.
本案發明,係為一種真空處理裝置,其中,前述蓋 部,係藉由若是被推壓則會變形並且若是推壓被解除則會回復至原本之形狀的材料所形成,當前述供電端子被插入至前述受電側凹部中時,前述蓋部係被前述供電端子所推壓,前述蓋部係變形並成為前述受電側凹部被作了開啟的狀態,前述受電端子與前述供電端子係相接觸,若是前述供電端子被從前述受電側凹部而拔去,則前述蓋部之變形係回復原狀,藉由前述蓋部,前述受電側凹部係被覆蓋。 The invention of the present invention is a vacuum processing apparatus, wherein the cover is The portion is formed by deforming the material if it is pressed, and returning to the original shape if the pressing is released. When the power supply terminal is inserted into the power receiving side recess, the cover portion is When the power supply terminal is pressed, the cover portion is deformed and the power receiving side recessed portion is opened, and the power receiving terminal is in contact with the power feeding terminal, and when the power feeding terminal is removed from the power receiving side recessed portion, The deformation of the cover portion is restored to the original shape, and the power receiving side concave portion is covered by the cover portion.
本案發明,係為一種真空處理裝置,其特徵為,係具備有:被形成有具有電傳導性之氣體狀的物質之真空槽;和被配置在前述真空槽之內部之供電台;和被設置於前述供電台處之供電端子,前述供電台,係以將吸附裝置可分離地作了配置的方式而構成,當前述吸附裝置被配置在前述供電台處時,被設置在前述吸附裝置處之受電端子,係以非接觸而接近前述供電端子,被與前述供電端子作了連接的電源裝置所輸出之交流電壓,係經由前述供電端子而被施加於前述受電端子處,藉由被與前述受電端子作了連接的整流電路而被作了整流之整流電壓,係被施加於被設置在前述吸附裝置處之吸附電極處,被配置於前述吸附裝置處之基板,係被作靜電吸附,前述吸附裝置,係具備有裝置本體,前述整流電路和前述受電端子以及前述吸附電極,係被設置在前述裝置本體處,構成為若是使具有電傳導性之氣體狀的物質與被載置於前述裝置本體之表面上的基板作接觸,並且對於前述吸附電極施加前述整流電壓,則前述基板會被吸附於前述吸附電極處,前述受電端子, 係與前述裝置本體之外部的氛圍相互分離,在對於前述吸附電極施加了前述整流電壓之後,殘留電荷係殘留於前述吸附電極處,在使前述吸附裝置從前述供電台而分離並作移動時,係藉由前述吸附電極之前述殘留電荷而使前述基板被吸附於前述吸附電極處,在前述供電台處,係被設置有供電側接地端子,在前述裝置本體處,係被設置有能夠與前述供電側接地端子作接觸的受電側接地端子、和將前述吸附電極和前述受電側接地端子之間作導通或遮斷並將前述吸附電極和前述受電端子之間作導通或遮斷之切換裝置、和對於前述切換裝置之前述導通和前述遮斷作控制的控制裝置,在被施加於前述供電端子處之交流電壓中,係重疊有對於前述切換裝置之導通和遮斷作控制的控制訊號,從前述受電端子所受電了的電壓而抽出前述控制訊號,並輸入至前述控制裝置中。 The invention of the present invention is a vacuum processing apparatus comprising: a vacuum chamber in which a gas-like substance having electrical conductivity is formed; and a power supply station disposed inside the vacuum chamber; and is provided The power supply terminal at the power supply station is configured such that the adsorption device is detachably disposed, and when the adsorption device is disposed at the power supply station, is disposed at the adsorption device The power receiving terminal is in contact with the power supply terminal without contact, and an AC voltage output from a power supply device connected to the power supply terminal is applied to the power receiving terminal via the power supply terminal, and is received by the power receiving terminal. The rectified voltage obtained by rectifying the rectifier circuit connected to the terminal is applied to the adsorption electrode provided at the adsorption device, and the substrate disposed at the adsorption device is electrostatically adsorbed. The device includes a device body, and the rectifier circuit, the power receiving terminal, and the adsorption electrode are provided in the device The main body is configured such that when a gas-like substance having electrical conductivity is brought into contact with a substrate placed on a surface of the apparatus main body, and the rectifying voltage is applied to the adsorption electrode, the substrate is adsorbed to the foregoing At the adsorption electrode, the aforementioned power receiving terminal, After being separated from the atmosphere outside the apparatus body, after the rectifying voltage is applied to the adsorption electrode, residual charge remains in the adsorption electrode, and when the adsorption device is separated from the power supply station and moved, The substrate is adsorbed to the adsorption electrode by the residual charge of the adsorption electrode, and a power supply side ground terminal is provided at the power supply station, and the device body is provided with the foregoing a power receiving side grounding terminal for contacting the power supply side ground terminal, and a switching device for conducting or blocking between the adsorption electrode and the power receiving side ground terminal, and conducting or blocking between the adsorption electrode and the power receiving terminal, And a control device for controlling the conduction and the blocking of the switching device, wherein an AC signal applied to the power supply terminal is superimposed with a control signal for controlling conduction and blocking of the switching device, The control signal is extracted by the voltage received by the power receiving terminal, and is input to the control Set in.
藉由防止受電端子之變質、腐蝕、被形成薄膜,係成為不會發生吸附力的降低,又,吸附裝置之壽命係變長。 By preventing deterioration of the power receiving terminal, corrosion, and formation of a thin film, the adsorption force is not lowered, and the life of the adsorption device is long.
5、51~53‧‧‧基板 5, 5 1 ~ 5 3 ‧ ‧ substrate
151、152‧‧‧真空處理裝置 15 1 , 15 2 ‧‧‧ Vacuum processing unit
16‧‧‧真空槽 16‧‧‧vacuum tank
18、18a~18e‧‧‧供電台 18, 18a~18e‧‧‧Power supply station
19、19a~19e‧‧‧吸附裝置 19, 19a~19e‧‧‧ adsorption device
21‧‧‧裝置本體 21‧‧‧ device body
24、31、41‧‧‧受電端子 24, 31, 41‧‧‧Receiving terminals
32、42‧‧‧受電側控制端子 32, 42‧‧‧Power-side control terminals
34‧‧‧整流電路 34‧‧‧Rectifier circuit
35‧‧‧受電側控制裝置 35‧‧‧Power receiving side control device
61‧‧‧台本體 61‧‧‧
64、65、75‧‧‧供電端子 64, 65, 75‧‧‧ power supply terminals
66‧‧‧電源裝置 66‧‧‧Power supply unit
67、77‧‧‧供電側控制端子 67, 77‧‧‧Power supply side control terminals
[圖1](a)~(c):用以對於本發明之真空處理裝置作說明之圖。 Fig. 1 (a) to (c) are views for explaining a vacuum processing apparatus of the present invention.
[圖2](a)、(b):用以對於本發明之第1例之吸附裝置作說明的圖。 Fig. 2 (a) and (b) are views for explaining an adsorption device according to a first example of the present invention.
[圖3]用以對於鉛直姿勢之第1例之吸附裝置作說明的圖。 Fig. 3 is a view for explaining an adsorption device of a first example in a vertical posture.
[圖4](a)、(b):用以對於本發明之第2例之吸附裝置作說明的圖。 Fig. 4 (a) and (b) are views for explaining an adsorption device according to a second example of the present invention.
[圖5](a)、(b):用以對於本發明之第3例之吸附裝置作說明的圖。 Fig. 5 (a) and (b) are views for explaining an adsorption device according to a third example of the present invention.
[圖6](a)、(b):用以對於本發明之第4例之吸附裝置作說明的圖。 Fig. 6 (a) and (b) are views for explaining an adsorption device of a fourth example of the present invention.
[圖7](a)、(b):用以對於本發明之第5例之吸附裝置作說明的圖。 Fig. 7 (a) and (b) are views for explaining an adsorption device according to a fifth example of the present invention.
圖1(a)~(c)之元件符號2,係為本發明之真空裝置。 The component symbol 2 of Figs. 1(a) to (c) is a vacuum apparatus of the present invention.
參考圖1(a),此真空裝置2,係具有一台或複數台之真空處理裝置151、152。 Referring to Fig. 1(a), the vacuum apparatus 2 has one or more vacuum processing units 15 1 and 15 2 .
真空處理裝置151、152,係具備有真空槽16,在真空槽16之內部,係被配置有供電台18、和處理部17。 The vacuum processing apparatuses 15 1 and 15 2 are provided with a vacuum chamber 16 in which a power supply table 18 and a processing unit 17 are disposed.
首先,如同圖1(b)中所示一般,從前段之處理裝置141起來將被載置有複數枚之基板5的吸附裝置 19搬入至最初之真空處理裝置151的內部,並載置於供電台18之上。 First, as shown in Fig. 1(b), the adsorption device 19 on which the plurality of substrates 5 are placed is carried into the interior of the first vacuum processing device 15 1 from the processing device 14 1 of the preceding stage, and placed thereon. Above the power supply station 18.
在供電台18處,係被設置有供電裝置60,在吸附裝置19處,係被設置有受電裝置20。供電裝置60,係被與電源裝置66作連接,受電裝置20,係被與設置在吸附裝置19處之一枚的吸附電極22作連接,若是電源裝置66動作並對於供電裝置60施加電壓,則係從供電裝置60而對於受電裝置20供給有電壓。藉由被供給至受電裝置20處之電壓,係從受電裝置20而對於吸附電極22供給有吸附電壓。真空槽16,係被與接地電位作連接。吸附電極22之電位,係不論是正電位或負電位均能夠進行吸附。 At the power supply station 18, a power supply device 60 is provided, and at the adsorption device 19, a power receiving device 20 is provided. The power supply device 60 is connected to the power supply device 66, and the power receiving device 20 is connected to one of the adsorption electrodes 22 provided at the adsorption device 19. If the power supply device 66 operates and applies a voltage to the power supply device 60, A voltage is supplied to the power receiving device 20 from the power supply device 60. The voltage applied to the power receiving device 20 is supplied with an adsorption voltage from the power receiving device 20 to the adsorption electrode 22. The vacuum chamber 16 is connected to the ground potential. The potential of the adsorption electrode 22 can be adsorbed regardless of whether it is a positive potential or a negative potential.
在被載置於吸附裝置19處之複數之基板5的正下位置處,係構成為被配置有吸附電極22,吸附電極22,於此,係為一枚的導電性之板或膜,各基板5,係被載置在較吸附電極22之外周而更內側的場所處。於此,雖係使用有1枚的吸附電極22,但是,係亦可藉由複數之小徑電極來構成吸附電極,並構成為在各小徑電極處係被供給有相同大小之吸附電壓。 At a position immediately below the plurality of substrates 5 placed at the adsorption device 19, the adsorption electrode 22 is disposed, and the adsorption electrode 22 is formed as a conductive plate or film. The substrate 5 is placed on the outer side of the outer periphery of the adsorption electrode 22 at a position further inside. Here, although one adsorption electrode 22 is used, the adsorption electrode may be configured by a plurality of small-diameter electrodes, and the adsorption voltage of the same size may be supplied to each small-diameter electrode.
在真空處理裝置151、152之真空槽16處,係分別被連接有真空排氣裝置68,若是在使真空排氣裝置68動作並對真空槽16之內部作真空排氣而形成了真空氛圍之後,在真空槽16之內部形成電漿,則電漿係成為具有導電性之氣體狀的帶電物質,並與被載置於吸附裝置 19上之基板5和真空槽16之壁面作接觸,而將基板5電性連接於真空槽16。 Vacuum evacuation means 68 are connected to the vacuum chambers 16 of the vacuum processing units 15 1 and 15 2 , respectively, and vacuum is formed by operating the vacuum exhaust unit 68 and vacuuming the inside of the vacuum chamber 16. After the atmosphere, a plasma is formed inside the vacuum chamber 16, and the plasma is a gas-charged substance having conductivity, and is in contact with the wall surface of the substrate 5 and the vacuum chamber 16 placed on the adsorption device 19. The substrate 5 is electrically connected to the vacuum chamber 16 .
各真空槽16,係被與接地電位作連接,基板5,係被與接地電位作連接。 Each of the vacuum chambers 16 is connected to a ground potential, and the substrate 5 is connected to a ground potential.
在基板5和吸附電極22之間,係被形成有等價電容,在使基板5經由電漿來與接地電位作了連接的狀態下,若是對於吸附電極22供給有吸附電壓,則等價電容係被充電,基板5和吸附電極22係相互帶電逆極性之電壓,並於兩者之間產生靜電力,基板5係被靜電吸附於吸附電極22處。 An equivalent capacitance is formed between the substrate 5 and the adsorption electrode 22, and in a state where the substrate 5 is connected to the ground potential via plasma, if an adsorption voltage is supplied to the adsorption electrode 22, the equivalent capacitance is obtained. The substrate 5 and the adsorption electrode 22 are charged with a reverse polarity voltage, and an electrostatic force is generated therebetween, and the substrate 5 is electrostatically adsorbed to the adsorption electrode 22.
在此狀態下,若是使處理部17動作,則基板5係被進行真空處理。 In this state, when the processing unit 17 is operated, the substrate 5 is vacuum-treated.
於此,處理部17,係為噴淋板,從處理部17而導入蝕刻氣體,在真空槽16之內部,係被形成有蝕刻氣體電漿,被吸附於吸附裝置19處之基板5,係成為使形成在基板5之表面上的薄膜被作蝕刻。 Here, the processing unit 17 is a shower plate, and an etching gas is introduced from the processing unit 17, and a plasma gas is formed inside the vacuum chamber 16 to be adsorbed to the substrate 5 at the adsorption device 19. The film formed on the surface of the substrate 5 is etched.
在此真空處理時,藉由吸附,基板5和吸附裝置19係相互密著,熱傳導率係變高。故而,藉由在供電台18處設置加熱裝置或冷卻裝置,並藉由該些之加熱裝置或冷卻裝置來對吸附裝置19作加熱或冷卻,係能夠將基板5加熱或冷卻。 At the time of this vacuum processing, the substrate 5 and the adsorption device 19 are adhered to each other by adsorption, and the thermal conductivity is high. Therefore, the substrate 5 can be heated or cooled by providing a heating device or a cooling device at the power supply station 18 and heating or cooling the adsorption device 19 by the heating device or the cooling device.
在真空處理之期間中,於吸附電極22處,係被供給有吸附電壓,若是真空處理結束,則從供電裝置60所對於受電裝置20之電壓供給係結束,對於吸附電極 22之電壓供給係結束。 During the vacuum processing, an adsorption voltage is supplied to the adsorption electrode 22, and when the vacuum treatment is completed, the voltage supply system from the power supply device 60 to the power receiving device 20 ends, and the adsorption electrode is applied. The voltage supply system of 22 ends.
在該狀態下,藉由搬送裝置等,最初之真空處理裝置151內的吸附裝置19,係被從供電台18而分離,並被移動至下一個的真空處理裝置152之真空槽16的內部,如同圖1(c)中所示一般,新的吸附裝置19係被載置於最初之真空處理裝置151的供電台18處。圖中,元件符號11,係為將真空處理裝置151、152之間和處理裝置141、142之間作連接並在成為了開狀態時使吸附裝置19通過的真空閥。 In this state, the adsorption device 19 in the first vacuum processing device 15 1 is separated from the power supply table 18 by the transfer device or the like, and is moved to the vacuum chamber 16 of the next vacuum processing device 15 2 . Internally, as shown in Fig. 1(c), a new adsorption device 19 is placed at the power supply station 18 of the original vacuum processing unit 15 1 . In the figure, the reference numeral 11 is a vacuum valve that connects between the vacuum processing devices 15 1 and 15 2 and the processing devices 14 1 and 14 2 and passes the adsorption device 19 when it is in an open state.
在移動中之吸附裝置19的受電裝置20處,係並未從供電裝置60而被供給有電壓,但是,就算是對於吸附電極22之電壓供給結束,在吸附電極22和基板5處係仍殘存有相反極性之殘留電荷,藉由殘留電荷之吸附力,基板5係維持於被吸附在吸附裝置19處之狀態。 At the power receiving device 20 of the moving adsorption device 19, no voltage is supplied from the power supply device 60, but even if the voltage supply to the adsorption electrode 22 is completed, the adsorption electrode 22 and the substrate 5 remain. There is a residual charge of opposite polarity, and the substrate 5 is maintained in a state of being adsorbed to the adsorption device 19 by the adsorption force of the residual charge.
針對吸附裝置19和供電台18之具體性的例子作說明。 An example of the specificity of the adsorption device 19 and the power supply station 18 will be described.
圖2、圖4~圖7之元件符號19a~19e,係代表具體性之第1例~第5例的吸附裝置,元件符號18a~18e,係代表與第1例~第5例的吸附裝置19a~19e相對應之具體性之第1例~第5例的供電台。 The component symbols 19a to 19e in FIGS. 2 and 4 to 7 represent the adsorption devices of the first to fifth examples, and the component symbols 18a to 18e represent the adsorption devices of the first to fifth examples. 19a~19e correspond to the specificity of the first to fifth power supply stations.
在第1例~第5例之吸附裝置19a~19e中,吸附電極22,係被配置在將絕緣物形成為板狀所成的裝置本體21之內部,吸附電極22之表面,係構成為並未露出於裝置本體21之外部。 In the adsorption devices 19a to 19e of the first to fifth examples, the adsorption electrode 22 is disposed inside the device body 21 in which the insulator is formed into a plate shape, and the surface of the adsorption electrode 22 is configured as It is not exposed to the outside of the apparatus body 21.
在裝置本體21之表面上,係被載置有複數之基板51~53。在各基板51~53之正下方位置處,係構成為配置有吸附電極22。 On the surface of the apparatus body 21, a plurality of substrates 5 1 to 5 3 are placed. The adsorption electrode 22 is disposed at a position directly below each of the substrates 5 1 to 5 3 .
第1例~第3例之吸附裝置19a~19c的受電裝置20a~20c,係分別具備有:被設置在裝置本體21之裡面側的受電側凹部23、和被配置在受電側凹部23之內部的底面處之受電端子24、以及將受電側凹部23作覆蓋的蓋部25a、25b、25c、25d。受電端子24,係使至少一部分在受電側凹部23內而露出,於此,受電端子24,係藉由金屬等之具有電性導電性之構件來構成,膜表面係露出於受電側凹部23處。 The power receiving devices 20a to 20c of the adsorption devices 19a to 19c of the first to third embodiments are provided with the power receiving side recess 23 provided on the back side of the device body 21 and the inside of the power receiving side recess 23, respectively. The power receiving terminal 24 at the bottom surface and the lid portions 25a, 25b, 25c, and 25d covering the power receiving side recess portion 23 are provided. At least a part of the power receiving terminal 24 is exposed in the power receiving side recess 23, and the power receiving terminal 24 is formed of a member having electrical conductivity such as metal, and the film surface is exposed to the power receiving side recess 23 .
第1例~第3例之供電台18a~18c,係具備有將絕緣物形成為台狀所成之台本體61,第1例~第3例之供電台18a~18c的供電裝置60a~60c,係具備有供電端子64。 The power supply stations 18a to 18c of the first to third examples are provided with the main body 61 in which the insulator is formed in a table shape, and the power supply devices 60a to 60c of the power supply stations 18a to 18c of the first to third examples. The power supply terminal 64 is provided.
於此,第1例~第3例之供電裝置60a~60c,係具備有被形成於台本體61之表面上的供電側凹部63,供電端子64,係在供電側凹部63之底面處,經由彈簧等之供電側伸縮構件62而被作安裝。 Here, the power supply devices 60a to 60c of the first to third examples include the power supply side recessed portion 63 formed on the surface of the stage body 61, and the power supply terminal 64 is provided on the bottom surface of the power supply side recessed portion 63 via The power supply side telescopic member 62 such as a spring is attached.
第1例~第3例之供電台18a~18c的供電端子64之上端,係位置在較台本體61之表面而更上方處,供電端子64之上端的從台本體61之表面起之高度,係被 設為較受電端子24之下端和裝置本體21之底面之間的距離而更長。於此,受電端子24係為膜,膜表面係成為下端。 The upper ends of the power supply terminals 64 of the power supply stations 18a to 18c of the first to third examples are located higher than the surface of the stage body 61, and the upper end of the power supply terminal 64 is raised from the surface of the stage body 61. Department It is set to be longer than the distance between the lower end of the power receiving terminal 24 and the bottom surface of the apparatus body 21. Here, the power receiving terminal 24 is a film, and the film surface is a lower end.
在第1例和第2例之吸附裝置19a、19b處,蓋部25a、25b,係被設置在可旋轉地而被安裝於裝置本體21之底面處的旋轉裝置27處。 In the adsorption devices 19a and 19b of the first and second examples, the lid portions 25a and 25b are provided at the rotation device 27 rotatably attached to the bottom surface of the device body 21.
蓋部25a、25b,係使蓋部25a、25b之邊緣的部份被安裝於旋轉裝置27處,蓋部25a、25b係構成為會與旋轉裝置27一同旋轉。 The lid portions 25a and 25b are such that the edges of the lid portions 25a and 25b are attached to the rotating device 27, and the lid portions 25a and 25b are configured to rotate together with the rotating device 27.
在第1例之吸附裝置19a中,當裝置本體21為水平姿勢時,蓋部25a係藉由自身重量而使被安裝於旋轉裝置27處之部分位置在上方並使其之相反側的部份位置在下方,故而,蓋部25a,係成為不會將受電側凹部23之開口關閉,當裝置本體21為水平姿勢時,蓋部25a係成為鉛直姿勢,受電側凹部23之蓋係成為開啟。 In the adsorption device 19a of the first example, when the apparatus body 21 is in the horizontal posture, the lid portion 25a is a portion of the lid portion 25a that is attached to the rotating device 27 at an upper position and on the opposite side by its own weight. Since the position of the lid portion 25a is such that the opening of the power receiving side recessed portion 23 is not closed, when the apparatus body 21 is in the horizontal posture, the lid portion 25a is in a vertical posture, and the lid of the power receiving side recessed portion 23 is opened.
另一方面,第1例之吸附裝置19a,當如同圖3中所示一般,以使受電側凹部23之被設置有旋轉裝置27之側成為上方並使相反側成為下方的方式而被作了鉛直配置的情況時,蓋部25a係成為鉛直,又,受電側凹部23之開口亦成為鉛直,因此,受電側凹部23,係成為藉由蓋部25a而被作了覆蓋的狀態。 On the other hand, as shown in FIG. 3, the suction device 19a of the first example is formed such that the side of the power receiving-side recess 23 on which the rotating device 27 is provided is upward and the opposite side is downward. In the case of the vertical arrangement, the lid portion 25a is vertical, and the opening of the power receiving-side recess portion 23 is also vertical. Therefore, the power receiving-side recess portion 23 is covered by the lid portion 25a.
在第2例之吸附裝置19b中,蓋部25b,係藉由受電側伸縮構件28而被安裝於裝置本體21處,在蓋部25b並未被作推壓的狀態下,第2例之吸附裝置19b的受 電側凹部23,係成為藉由蓋部25b而被作覆蓋。 In the adsorption device 19b of the second example, the lid portion 25b is attached to the apparatus main body 21 by the power receiving-side elastic member 28, and the second example is adsorbed in a state where the lid portion 25b is not pressed. Device 19b The electric side recessed portion 23 is covered by the lid portion 25b.
在第3例之吸附裝置19c中,具有柔軟性之2枚的蓋部25c、25d,係以使側面相互接觸並覆蓋受電側凹部23的方式而被作設置,2枚的蓋部25c、25d之接觸部分,係構成為會位置於受電側凹部23之中央附近處。 In the adsorption device 19c of the third example, the two cover portions 25c and 25d having flexibility are provided so that the side surfaces are in contact with each other and cover the power receiving side concave portion 23, and the two cover portions 25c and 25d are provided. The contact portion is configured to be positioned near the center of the power receiving side recess portion 23.
在第2例、第3例之吸附裝置19b、19c中,受電側凹部23係藉由蓋部25b、25c、25d而被作覆蓋,當第2例、第3例之吸附裝置19b、19c在真空槽16之內部移動時,真空槽16之內部的殘留氣體,係並不會進入至第2例、第3例之吸附裝置19b、19c的受電側凹部23之內部,相對於此,在第1例之吸附裝置19a中,當成為鉛直姿勢時,由於受電側凹部23係被覆蓋,因此,第1例之吸附裝置19a,若是以鉛直姿勢來作移動,則係能夠成為不會使移動之真空槽16內的殘留氣體進入至受電側凹部23之內部。 In the adsorption devices 19b and 19c of the second and third examples, the power receiving-side recesses 23 are covered by the lid portions 25b, 25c, and 25d, and the adsorption devices 19b and 19c of the second and third examples are When the inside of the vacuum chamber 16 moves, the residual gas inside the vacuum chamber 16 does not enter the inside of the power receiving side recess 23 of the adsorption devices 19b and 19c of the second and third examples. In the adsorption device 19a of the first embodiment, when the power receiving side concave portion 23 is covered, the suction device 19a of the first example can be moved without moving in the vertical posture. The residual gas in the vacuum chamber 16 enters the inside of the power receiving side recess portion 23.
針對將第1例~第3例之吸附裝置19a~19c從被分離配置於第1例~第3例之供電台18a~18c之上方處的狀態起來載置於第1例~第3例之供電台18a~18c上的工程作說明。 The adsorption devices 19a to 19c of the first to third examples are placed in the first to third examples from the state in which they are disposed above the power supply stages 18a to 18c of the first to third examples. The engineering on the power supply stations 18a to 18c will be described.
將第1例~第3例之吸附裝置19a~19c設為水平姿勢,並藉由移動裝置(未圖示),來分別配置於第1例~第3例之供電台18a~18c之上方。 The adsorption devices 19a to 19c of the first to third examples are placed in a horizontal posture, and are placed above the power supply stations 18a to 18c of the first to third examples by a moving device (not shown).
藉由移動裝置,來使第1例~第3例之吸附裝置19a~19c一面維持水平姿勢一面下降。 By moving the apparatus, the adsorption apparatuses 19a to 19c of the first to third examples are lowered while maintaining the horizontal posture.
藉由下降,在第1例之吸附裝置19a中,鉛直姿勢之蓋部25a,係被插入至供電側凹部63之中。 By the lowering, in the adsorption device 19a of the first example, the lid portion 25a in the vertical posture is inserted into the power supply side concave portion 63.
相較於從鉛直姿勢之蓋部25a的下端起直到裝置本體21之底面為止的高度,供電側凹部63之深度係被設為更長,故而,蓋部25a之下端係並不會與供電側凹部63之底面接觸,而受電端子24之下端和供電端子64之上端係會相互接觸。 The depth of the power supply side recess 63 is set to be longer than the height from the lower end of the lid portion 25a in the vertical posture to the bottom surface of the apparatus body 21. Therefore, the lower end of the cover portion 25a does not correspond to the power supply side. The bottom surface of the recess 63 is in contact, and the lower end of the power receiving terminal 24 and the upper end of the power supply terminal 64 are in contact with each other.
在第2例之吸附裝置19b中,供電端子64之上端係與蓋部25b之底面作接觸,若是更進而使第2例之吸附裝置19b下降,則供電端子64係從下方而推壓蓋部25b,受電側伸縮構件28係被作壓縮變形,蓋部25b係被朝向上方而上推,供電端子64係從受電端子24之正下方位置起而被移動,位置在受電側凹部23之內部的受電端子24,係露出於受電側凹部23之外部氛圍中。 In the adsorption device 19b of the second example, the upper end of the power supply terminal 64 is in contact with the bottom surface of the lid portion 25b, and if the adsorption device 19b of the second example is further lowered, the power supply terminal 64 pushes the lid portion from below. 25b, the power receiving side telescopic element 28 is compressed and deformed, and the lid portion 25b is pushed upward, and the power supply terminal 64 is moved from the position immediately below the power receiving terminal 24, and is positioned inside the power receiving side recessed portion 23. The power receiving terminal 24 is exposed to the outside atmosphere of the power receiving side recess 23 .
另一方面,在第3例之吸附裝置19c中,供電端子64,係被配置在當第3例之吸附裝置19c作了下降時供電端子64之上端能夠與2枚的蓋部25c、25d之作了接觸的部份作抵接之位置處。 On the other hand, in the adsorption device 19c of the third example, the power supply terminal 64 is disposed in the upper end of the power supply terminal 64 and the two cover portions 25c and 25d when the adsorption device 19c of the third example is lowered. The part that made the contact is at the location where it is abutted.
2枚的蓋部25c、25d,係藉由若是被推壓則會變形的材料所形成,在供電端子64之上端與2枚的蓋部25c、25d之彼此相互接觸的部份作了抵接之後,若是更進而使第3例之吸附裝置19c下降,則2枚的蓋部25c、25d之接觸部分係被從下方而推壓並被朝向上方而上推,蓋部25c、25d之形狀係彎曲變形,位置在受電端子24之 正下方位置處的蓋部25c、25d之部分係被移動,位置在受電側凹部23之內部的受電端子24,係露出於受電側凹部23之外部氛圍中。 The two cover portions 25c and 25d are formed of a material that is deformed by being pressed, and the upper end of the power supply terminal 64 and the two contact portions 25c and 25d are in contact with each other. Then, when the adsorption device 19c of the third example is lowered, the contact portions of the two cover portions 25c and 25d are pushed downward from the lower side and pushed upward, and the shapes of the cover portions 25c and 25d are Bending deformation, position at the power receiving terminal 24 The portions of the lid portions 25c and 25d at the position immediately below are moved, and the power receiving terminal 24 positioned inside the power receiving side recess portion 23 is exposed to the outside atmosphere of the power receiving side recess portion 23.
若是從該狀態起而第2例和第3例之吸附裝置19b、19c更進一步下降,則供電端子64之上端係在受電側凹部23內移動並接近受電端子24,供電端子64之上端係與受電端子24之下端作接觸。 When the adsorption devices 19b and 19c of the second and third examples are further lowered from this state, the upper end of the power supply terminal 64 moves in the power receiving-side recess 23 and approaches the power receiving terminal 24, and the upper end of the power supply terminal 64 is connected. The lower end of the power receiving terminal 24 makes a contact.
當第1例~第3例之吸附裝置19a~19c的受電端子24之下端與第1例~第3例之供電台18a~18c的供電端子64之上端作了接觸時,裝置本體21之底面與台本體61之表面係並未作接觸,若是更進而使第1例~第3例之吸附裝置19a~19c下降,則供電側伸縮構件62係被壓縮,在供電側伸縮構件62變短的同時,第1例~第3例之吸附裝置19a~19c,係接近第1例~第3例之供電台18a~18c,若是裝置本體21之底面與台本體61之表面相接觸,則第1例~第3例之吸附裝置19a~19c,係成為被載置在第1例~第3例之供電台18a~18c上。 When the lower end of the power receiving terminal 24 of the adsorption devices 19a to 19c of the first to third examples is in contact with the upper end of the power supply terminal 64 of the power supply stages 18a to 18c of the first to third examples, the bottom surface of the apparatus body 21 When the suction devices 19a to 19c of the first to third examples are lowered, the power supply side expansion and contraction members 62 are compressed, and the power supply side expansion and contraction members 62 are shortened. At the same time, the adsorption devices 19a to 19c of the first to third examples are close to the power supply stages 18a to 18c of the first to third examples, and if the bottom surface of the apparatus body 21 is in contact with the surface of the stage body 61, the first The adsorption devices 19a to 19c of the third to third examples are placed on the power supply stages 18a to 18c of the first to third examples.
受電端子24,係被與吸附電極22作電性連接,供電端子64,係被與配置在真空槽16之外部的電源裝置66作電性連接。 The power receiving terminal 24 is electrically connected to the adsorption electrode 22, and the power supply terminal 64 is electrically connected to the power supply device 66 disposed outside the vacuum chamber 16.
在第1例~第3例之供電台18a~18c中,於電源裝置66處,係使用有可變直流電壓源,若是電源裝置66啟動並輸出直流之吸附電壓,則係經由供電端子64和受電端子24而對於吸附電極22施加吸附電壓。 In the power supply stations 18a to 18c of the first to third examples, a variable DC voltage source is used at the power supply unit 66. If the power supply unit 66 starts and outputs a DC adsorption voltage, the power supply terminal 64 is used. An adsorption voltage is applied to the adsorption electrode 22 by the power receiving terminal 24.
之後,如同上述一般,若是在被配置有第1例~第3例之供電台18a~18c之真空槽16的內部,而從處理部17被導入有蝕刻氣體,並產生蝕刻氣體之電漿,則該電漿係成為具有電傳導性之氣體狀的物質,並與第1例~第3例之吸附裝置19a~19c上的基板51~53以及真空槽16之壁面作接觸,基板51~53係被與接地電位作連接,等價電容係被充電,基板51~53,係被吸附在第1例~第3例之吸附裝置19a~19c的吸附電極22處。 Then, as described above, in the vacuum chamber 16 in which the power supply stages 18a to 18c of the first to third examples are disposed, the etching gas is introduced from the processing unit 17, and plasma of the etching gas is generated. Then, the plasma is made of a gas-conducting substance having electrical conductivity, and is in contact with the substrates 5 1 to 5 3 of the adsorption devices 19 a to 19 c of the first to third examples and the wall surface of the vacuum chamber 16 . The 1 to 5 3 series are connected to the ground potential, the equivalent capacitance is charged, and the substrates 5 1 to 5 3 are adsorbed to the adsorption electrodes 22 of the adsorption devices 19a to 19c of the first to third examples.
若是各基板51~53之表面的薄膜被蝕刻,則蝕刻氣體之導入係被停止,電漿係消滅。 When the film on the surface of each of the substrates 5 1 to 5 3 is etched, the introduction of the etching gas is stopped, and the plasma is extinguished.
使電源裝置66之動作停止,接著,將吸附電極22與和真空槽16相同之接地電位作連接,並使被積蓄在等價電容中之電荷放電,之後,藉由移動裝置,來使第1例~第3例之吸附裝置19a~19c從第1例~第3例之供電台18a~18c分離,而使受電端子24與供電端子64相分離。 When the operation of the power supply device 66 is stopped, the adsorption electrode 22 is connected to the same ground potential as the vacuum chamber 16, and the electric charge accumulated in the equivalent capacitance is discharged, and then the first device is moved by the mobile device. The adsorption devices 19a to 19c of the third to third examples are separated from the power supply stages 18a to 18c of the first to third examples, and the power receiving terminal 24 is separated from the power supply terminal 64.
第1例之吸附裝置19a,在供電端子64被從受電側凹部23而拔去之後,係為了藉由蓋部25a來覆蓋受電側凹部23,而從水平姿勢來成為鉛直姿勢。 In the suction device 19a of the first example, after the power supply terminal 64 is removed from the power receiving side recessed portion 23, the power receiving side recessed portion 23 is covered by the lid portion 25a, and the vertical position is brought into a vertical posture.
在第2例之吸附裝置19b中,若是供電端子64被從受電側凹部23而拔去,則被作了壓縮的受電側伸縮構件28係回復原本的形狀,第2例之吸附裝置19b的受電側凹部23,係成為藉由蓋部25b而被作覆蓋。 In the adsorption device 19b of the second example, when the power supply terminal 64 is removed from the power receiving side recessed portion 23, the compressed power receiving side telescopic element 28 returns to its original shape, and the second embodiment of the adsorption device 19b receives power. The undercut portion 23 is covered by the lid portion 25b.
又,在第3例之吸附裝置19b中,若是供電 端子64被從受電側凹部23而拔去,則作了變形之2枚的蓋部25c、25d係回復原本的形狀,第3例之吸附裝置19c的受電側凹部23,係成為藉由2枚的蓋部25c、25d而被作覆蓋。 Further, in the adsorption device 19b of the third example, if the power is supplied When the terminal 64 is removed from the power receiving-side recessed portion 23, the two deformed cover portions 25c and 25d are restored to the original shape, and the power receiving-side recessed portion 23 of the adsorption device 19c of the third example is composed of two The cover portions 25c, 25d are covered.
在第1例~第3例之吸附裝置19a~19c的吸附電極22處,係連接有接地電位,在從供電端子64而作了分離之後,亦仍殘存有電荷,身為吸附電極22之電位和接地電位之間之差的電壓係身為大的狀態。 In the adsorption electrodes 22 of the adsorption devices 19a to 19c of the first to third examples, a ground potential is connected, and after being separated from the power supply terminal 64, electric charges remain, and the potential of the adsorption electrode 22 is maintained. The voltage difference from the ground potential is in a large state.
在此狀態下,若是使受電端子24與具有反應性之氣體作接觸,則會發生受電端子24之變質或腐蝕或者是被形成薄膜。 In this state, if the power receiving terminal 24 is brought into contact with the reactive gas, the power receiving terminal 24 is deteriorated or corroded or a film is formed.
在第1例~第3例之吸附裝置19a~19c中,由於受電側凹部23係成為藉由蓋部25a~25d而被作了覆蓋的狀態,因此,當被從第1例~第3例之供電台18a~18c而分離並在被作了覆蓋之狀態下而被搬入至其他的真空槽16中時,所搬入的真空槽16之內部的殘留氣體由於係並無法侵入至受電側凹部23之內部,故而在受電端子24處係難以發生變質、腐蝕、薄膜之形成等的問題。 In the adsorption devices 19a to 19c of the first to third examples, since the power receiving-side recesses 23 are covered by the lid portions 25a to 25d, they are from the first to the third examples. When the power supply stages 18a to 18c are separated and are carried into the other vacuum chambers 16 while being covered, the residual gas inside the vacuum chambers 16 that are carried in cannot enter the power receiving side recesses 23 Internally, there is a problem that deterioration, corrosion, formation of a thin film, and the like are hard to occur at the power receiving terminal 24.
在第1例~第3例之供電台18a~18c中,由於電源裝置66之輸出電壓係被設為接地電位,供電端子64係被與接地電位作連接,因此,就算是與殘留氣體作接觸,也難以發生變質、腐蝕、薄膜形成等之問題。 In the power supply stations 18a to 18c of the first to third examples, since the output voltage of the power supply device 66 is set to the ground potential, the power supply terminal 64 is connected to the ground potential, and therefore, even if it is in contact with the residual gas. It is also difficult to cause problems such as deterioration, corrosion, and film formation.
接著,參考圖6(a)、(b)和圖7(a)、(b),來針對第4例、第5例之吸附裝置19d、19e作說明。 Next, the adsorption devices 19d and 19e of the fourth and fifth examples will be described with reference to Figs. 6(a) and 6(b) and Figs. 7(a) and 7(b).
首先,針對第4例、第5例之吸附裝置19d、19e之共通的構成和第4例、第5例之供電台18d、18e之共通的構成作說明。 First, the configuration of the common configuration of the adsorption devices 19d and 19e of the fourth and fifth examples and the configuration of the power supply stations 18d and 18e of the fourth and fifth examples will be described.
第4例、第5例之吸附裝置19d、19e的受電裝置20d、20e,係除了吸附電極22以外,亦具備有切換裝置36、和整流電路34、和受電側控制裝置35、和受電側接地端子33、和受電側控制端子32、42、以及受電端子31、41。 In addition to the adsorption electrode 22, the power receiving devices 20d and 20e of the adsorption devices 19d and 19e of the fourth and fifth examples include the switching device 36, the rectifier circuit 34, the power receiving-side control device 35, and the power receiving side ground. The terminal 33, the power receiving side control terminals 32 and 42, and the power receiving terminals 31 and 41.
受電端子31、41和受電側控制端子32、42,係被配置在裝置本體21之內部的底面近旁處,並構成為不會與裝置本體21之外部的氛圍相接觸。 The power receiving terminals 31, 41 and the power receiving side control terminals 32, 42 are disposed near the bottom surface of the inside of the apparatus body 21, and are configured not to come into contact with the atmosphere outside the apparatus body 21.
受電側接地端子33,係被設置在裝置本體21之底面,於此,係在具備有受電側接地端子33之厚度以上的深度之接地用凹部38的內部而被作露出配置。 The power receiving-side grounding terminal 33 is provided on the bottom surface of the apparatus main body 21, and is disposed inside the grounding recessed portion 38 having a depth equal to or greater than the thickness of the power receiving-side grounding terminal 33.
受電端子31、41,係被與整流電路34作連接,整流電路34和受電側接地端子33,係經由切換裝置36而被與吸附電極22作連接。 The power receiving terminals 31 and 41 are connected to the rectifier circuit 34, and the rectifier circuit 34 and the power receiving side ground terminal 33 are connected to the adsorption electrode 22 via the switching device 36.
亦可構成為將受電端子31、41經由切換裝置36來與整流電路34作連接,並使整流電路34與吸附電極22作連接。 Alternatively, the power receiving terminals 31 and 41 may be connected to the rectifier circuit 34 via the switching device 36, and the rectifier circuit 34 may be connected to the adsorption electrode 22.
切換裝置36,係藉由受電側控制裝置35而被作控制,並藉由受電側控制裝置35所對於切換裝置36輸 出之訊號,來以將吸附電極22與受電側接地端子33和受電端子31之其中一者作連接或者是將吸附電極22從受電側接地端子33和整流電路34之雙方而作遮斷的方式來動作。吸附電極22,係經由整流電路34而被與受電端子31作連接。 The switching device 36 is controlled by the power receiving-side control device 35, and is input to the switching device 36 by the power receiving-side control device 35. The signal is generated by connecting the adsorption electrode 22 to one of the power receiving side ground terminal 33 and the power receiving terminal 31 or by blocking the adsorption electrode 22 from both the power receiving side ground terminal 33 and the rectifier circuit 34. Come to action. The adsorption electrode 22 is connected to the power receiving terminal 31 via the rectifier circuit 34.
於搬送中,吸附電極22係被從雙方而遮斷,並被置於浮動電位。 During the transfer, the adsorption electrode 22 is blocked from both sides and placed at a floating potential.
第4例、第5例之供電台18d、18e的供電裝置60d、60e,係分別具備有供電端子65、75、和供電側控制端子67、77、以及供電側接地端子84。 The power feeding devices 60d and 60e of the power supply stations 18d and 18e of the fourth and fifth examples are provided with power supply terminals 65 and 75, power supply side control terminals 67 and 77, and power supply side ground terminal 84, respectively.
供電端子65、75,係被與身為交流電壓源之電源裝置66作連接,供電側控制端子67、77,係被與供電側控制裝置69作連接,供電側接地端子84,係被與接地電位作連接。 The power supply terminals 65, 75 are connected to the power supply device 66, which is an AC voltage source, and the power supply side control terminals 67, 77 are connected to the power supply side control device 69, and the power supply side ground terminal 84 is grounded. The potential is connected.
若是針對第4例之吸附裝置19d、供電台18d與第5例之吸附裝置19e、供電台18e之間的相異之構成作說明,則第4例之吸附裝置19d的受電端子31與受電側控制端子32和第4例之供電台18d的供電端子65與供電側控制端子67,係分別藉由平板狀之電極所構成,相對於此,第5例吸附裝置19e的受電端子41與受電側控制端子42和第5例之供電台18e的供電端子75與供電側控制端子77,係分別藉由線圈所構成。 In the case of the difference between the adsorption device 19d of the fourth example, the power supply table 18d, the adsorption device 19e of the fifth example, and the power supply station 18e, the power receiving terminal 31 and the power receiving side of the adsorption device 19d of the fourth example will be described. The control terminal 32 and the power supply terminal 65 of the power supply station 18d of the fourth example and the power supply side control terminal 67 are each formed of a flat electrode, whereas the power receiving terminal 41 and the power receiving side of the fifth example adsorption device 19e are provided. The control terminal 42 and the power supply terminal 75 of the power supply station 18e of the fifth example and the power supply side control terminal 77 are each constituted by a coil.
若是將第4例、第5例之吸附裝置19d、19e分別乘載於第4例、第5例之供電台18d、18e上,則第 4例之吸附裝置19d的受電端子31與第4例之供電台18d的供電端子65,係相互平行地被作近接配置,並形成以受電端子31和供電端子65作為電極的電力側電容,第5例之吸附裝置19e的受電端子41與第5例之供電台18e的供電端子75,係相互被作近接配置,並形成使受電端子41和供電端子75作了磁性耦合的變壓器。 When the adsorption devices 19d and 19e of the fourth and fifth examples are respectively carried on the power supply stages 18d and 18e of the fourth and fifth examples, The power receiving terminal 31 of the adsorption device 19d of the fourth example and the power supply terminal 65 of the power supply station 18d of the fourth example are arranged in close proximity to each other, and a power side capacitor having the power receiving terminal 31 and the power supply terminal 65 as electrodes is formed. The power receiving terminal 41 of the suction device 19e of the fifth example and the power supply terminal 75 of the power supply table 18e of the fifth example are arranged in close proximity to each other, and a transformer for magnetically coupling the power receiving terminal 41 and the power supply terminal 75 is formed.
又,若是將第4例、第5例之吸附裝置19d、19e分別乘載於第4例、第5例之供電台18d、18e上,則供電側控制端子67、77與受電側控制端子32、42係相互近接,在第4例之供電台18d和吸附裝置19d處,係藉由供電側控制端子67和受電側控制端子32而形成控制用電容,在第5例之供電台18e和吸附裝置19e處,係形成使供電側控制端子77和受電側控制端子42作磁性耦合的變壓器。 When the adsorption devices 19d and 19e of the fourth and fifth examples are respectively carried on the power supply tables 18d and 18e of the fourth and fifth examples, the power supply side control terminals 67 and 77 and the power receiving side control terminal 32 are respectively carried. 42 is in close proximity to each other. In the power supply station 18d and the adsorption device 19d of the fourth example, the control capacitor is formed by the power supply side control terminal 67 and the power receiving side control terminal 32, and in the fifth example, the power supply station 18e and the adsorption At the device 19e, a transformer that magnetically couples the power supply side control terminal 77 and the power receiving side control terminal 42 is formed.
供電側控制端子67、77,係被與供電側控制裝置69作連接,若是從供電側控制裝置69而將包含有控制訊號之電壓施加於供電側控制端子67、77處,並藉由該電壓而使在供電側控制端子67、77處所流動的電流改變,則在受電側控制端子32、42處,係被激勵有包含控制訊號之電壓,控制訊號係被輸入至受電側控制裝置35處。 The power supply side control terminals 67, 77 are connected to the power supply side control device 69, and the voltage including the control signal is applied to the power supply side control terminals 67, 77 from the power supply side control device 69, and by the voltage When the current flowing through the power supply side control terminals 67, 77 is changed, the voltage including the control signal is energized at the power receiving side control terminals 32, 42 and the control signal is input to the power receiving side control device 35.
受電側控制裝置35,係因應於被輸入了的控制訊號之內容而對於切換裝置36之連接作切換。於此,係使2個的開關37a、37b之其中一方導通,並將另外一 方遮斷。 The power receiving-side control device 35 switches the connection of the switching device 36 in response to the content of the input control signal. Here, one of the two switches 37a and 37b is turned on, and the other one is turned on. The party is interrupted.
當被載置有基板51~53之吸附裝置19d、19e被乘載於供電台18d、18e上時,若是供電側控制裝置69將使吸附電極22與整流電路34作連接的內容之訊號經由供電側控制端子67、77和受電側控制端子32、42而傳導至受電側控制裝置35處,則受電側控制裝置35,係將吸附電極22與整流電路34作連接。在此狀態下,吸附電極22,係被從受電側接地端子33而切離。 When the adsorption devices 19d and 19e on which the substrates 5 1 to 5 3 are placed are carried on the power supply tables 18d and 18e, the power supply-side control device 69 signals the content of the adsorption electrode 22 and the rectifier circuit 34. When the power supply side control terminals 67 and 77 and the power receiving side control terminals 32 and 42 are conducted to the power receiving-side control device 35, the power receiving-side control device 35 connects the adsorption electrode 22 to the rectifier circuit 34. In this state, the adsorption electrode 22 is cut away from the power receiving side ground terminal 33.
若是在真空槽16之內部而產生有電漿,並藉由電漿而使基板51~53被與接地電位作連接,電源裝置66動作,並輸出交流電壓,則在第4例之供電台18d和吸附裝置19d處,各基板51~53和吸附電極22之間的等價電容、和電力側電容,係相對於電源裝置66而被作串聯連接,若是電源裝置66輸出交流電壓,則藉由整流電路34而被作了整流的電壓,係被施加於吸附電極22處,等價電容係被充電為正電壓或負電壓之其中一方的極性之電壓。 If the plasma is generated inside the vacuum chamber 16, and the substrate 5 1 to 5 3 is connected to the ground potential by the plasma, the power supply device 66 operates and outputs an AC voltage, and the fourth example is supplied. At the radio station 18d and the adsorption device 19d, the equivalent capacitance between the substrates 5 1 to 5 3 and the adsorption electrode 22 and the power side capacitance are connected in series with respect to the power supply device 66, and if the power supply device 66 outputs an AC voltage. Then, the voltage rectified by the rectifier circuit 34 is applied to the adsorption electrode 22, and the equivalent capacitance is charged to a voltage of one of a positive voltage or a negative voltage.
另一方面,在第5例之供電台18e和吸附裝置19e處,若是電源裝置66輸出交流電壓,並在供電端子75處流動交流電流,則藉由磁性耦合,在受電端子41處係被激勵有交流電壓,該交流電壓係被施加於整流電路34處。 On the other hand, in the power supply station 18e and the adsorption device 19e of the fifth example, if the power supply unit 66 outputs an alternating current voltage and an alternating current flows through the power supply terminal 75, it is excited at the power receiving terminal 41 by magnetic coupling. There is an alternating voltage which is applied to the rectifier circuit 34.
供電側接地端子84係被與接地電位作連接,在使第4例、第5例之吸附裝置19d、19e分別被乘載於 第4例、第5例之供電台18d、18e上的狀態下,受電側接地端子33和供電側接地端子84係作接觸,受電側接地端子33係被與接地電位作連接,第5例之身為受電端子41的線圈之其中一端,係被與受電側接地端子33作連接,並經由供電側接地端子84而被與接地電位作連接,另外一端,係被與整流電路34作連接,於受電端子41處所被激勵了的交流電壓,係被施加於整流電路34處,如此一來,藉由整流電路34而作了整流的電流,係流動至等價電容處,等價電容係被充電為正電壓或負電壓之其中一方的極性之電壓。線圈之中點,係亦可被與受電側接地端子33作連接。 The power supply side ground terminal 84 is connected to the ground potential, and the adsorption devices 19d and 19e of the fourth and fifth examples are respectively carried by In the state of the power supply tables 18d and 18e of the fourth and fifth examples, the power receiving side ground terminal 33 and the power supply side ground terminal 84 are in contact with each other, and the power receiving side ground terminal 33 is connected to the ground potential, and the fifth example is One end of the coil as the power receiving terminal 41 is connected to the power receiving side ground terminal 33, and is connected to the ground potential via the power supply side ground terminal 84, and the other end is connected to the rectifier circuit 34. The AC voltage excited by the power receiving terminal 41 is applied to the rectifying circuit 34. Thus, the current rectified by the rectifying circuit 34 flows to the equivalent capacitor, and the equivalent capacitor is charged. A voltage that is the polarity of one of a positive voltage or a negative voltage. The midpoint of the coil can also be connected to the power receiving side ground terminal 33.
故而,在第4例、第5例之吸附裝置19d、19e中,各基板51~53係被吸附於吸附電極22處。 Therefore, in the adsorption devices 19d and 19e of the fourth and fifth examples, the substrates 5 1 to 5 3 are adsorbed to the adsorption electrode 22 .
若是藉由被形成於真空槽16之內部的電漿而使各基板51~53被作真空處理,則真空處理係結束。 When the substrates 5 1 to 5 3 are vacuum-treated by the plasma formed inside the vacuum chamber 16, the vacuum processing is completed.
在被搬送至下一個處理的情況時,若是使電漿消滅,並且亦使電源裝置66、供電側控制裝置69之輸出停止,則吸附電極22係成為浮動電位,在等價電容中係殘留有電荷,基板51~53被吸附在吸附電極22處的狀態係被維持。 When the plasma is destroyed and the output of the power supply device 66 and the power supply-side control device 69 is stopped, the adsorption electrode 22 is a floating potential and remains in the equivalent capacitance. The state in which the substrates 5 1 to 5 3 are adsorbed to the adsorption electrode 22 is maintained.
當並不存在有下一個處理而亦可從吸附電極22來中止基板51~53之吸附的情況時,係從供電側控制裝置69而輸出包含有將吸附電極22與受電側接地端子33作連接之內容的控制訊號之電壓,並經由供電側控制 端子67、77和受電側控制端子32、42而傳導至受電側控制裝置35處,切換裝置36,係將吸附電極22從整流電路34而切離並與受電側接地端子33作連接,並在其與經由有電漿的接地電位之間而使等價電容放電,而能夠將吸附中止,並使電漿消滅,且亦使電源裝置66和供電側控制裝置69之輸出停止,再藉由移動裝置,來使第4例、第5例之吸附裝置19d、19e從第4例、第5例之供電台18d、18e分離並移動。 When there is no next processing and the adsorption of the substrates 5 1 to 5 3 can be stopped from the adsorption electrode 22, the output from the power supply side control device 69 includes the adsorption electrode 22 and the power receiving side ground terminal 33. The voltage of the control signal to be connected is transmitted to the power receiving-side control device 35 via the power supply side control terminals 67, 77 and the power receiving side control terminals 32, 42 which switch the adsorption electrode 22 from the rectifier circuit 34. And being disconnected and connected to the power receiving side ground terminal 33, and discharging the equivalent capacitor between the ground potential and the ground potential via the plasma, the adsorption can be stopped, the plasma is extinguished, and the power supply device is also The output of the power supply-side control device 69 is stopped, and the adsorption devices 19d and 19e of the fourth and fifth examples are separated and moved from the power supply stations 18d and 18e of the fourth and fifth examples by the moving device.
也就是說,在搬送中,為了朝向下一個製程而在將吸附狀態作了維持的狀態下來將吸附裝置19d、19e整個作搬送,2個的開關37a、37b係被作遮斷。 In other words, in the conveyance, the adsorption devices 19d and 19e are entirely transported in a state where the adsorption state is maintained toward the next process, and the two switches 37a and 37b are blocked.
又,在搬出至大氣中的情況時,係使接地側之開關37a導通,並將受電側之開關37b遮斷,而在將吸附電極22與接地電位作了連接的狀態下來曝露於電漿中,之後搬出至大氣中。 In the case of being carried out to the atmosphere, the switch 37a on the ground side is turned on, and the switch 37b on the power receiving side is blocked, and the adsorption electrode 22 is exposed to the plasma while being connected to the ground potential. Then move out to the atmosphere.
就算是將第4例、第5例之吸附裝置19d、19e之吸附電極22與接地電位作連接,並使其從第4例、第5例之供電台18d、18e而分離,在等價電容中亦係殘留有電荷,基板51~53被吸附在吸附電極22處的狀態係被維持。 Even if the adsorption electrodes 22 of the adsorption devices 19d and 19e of the fourth and fifth examples are connected to the ground potential, and are separated from the power supply stages 18d and 18e of the fourth and fifth examples, the equivalent capacitance is obtained. The charge remains in the middle, and the state in which the substrates 5 1 to 5 3 are adsorbed to the adsorption electrode 22 is maintained.
受電端子31、41之表面,係被絕緣性之材料所覆蓋,在受電端子31、41與供電端子65、75之間,係至少被配置有將受電端子31、41之表面作覆蓋的絕緣性之材料。於此,將受電端子31、41之表面作覆蓋的絕緣 性之材料,係為構成裝置本體21之材料。 The surfaces of the power receiving terminals 31 and 41 are covered with an insulating material, and at least the insulating layer covering the surfaces of the power receiving terminals 31 and 41 is disposed between the power receiving terminals 31 and 41 and the power feeding terminals 65 and 75. Material. Here, the insulation of the surface of the power receiving terminals 31, 41 is covered. The material of the nature is the material constituting the apparatus body 21.
受電端子31、41,係藉由殘留電荷而成為高電壓,但是,受電端子31、41,由於係構成為並不會與裝置本體21之外部氛圍相接觸,因此,受電端子31、41係不會發生變質、腐蝕,也不會有被形成薄膜的情形。 The power receiving terminals 31 and 41 are high voltages due to residual charges. However, since the power receiving terminals 31 and 41 are not in contact with the external atmosphere of the apparatus body 21, the power receiving terminals 31 and 41 are not It will deteriorate, corrode, and there will be no film formation.
受電端子31、41和受電側控制端子32、42和供電端子65、75以及供電側控制端子67、77,由於係被配置在裝置本體21內或者是台本體61內,而並未露出於真空槽16之內部氛圍中,因此係不會發生變質、腐蝕、被形成薄膜等之問題。亦可將各端子31、32、41、42、65、67、75、77之表面藉由薄膜來作被覆而成為不會露出於真空槽16之內部氛圍中。 The power receiving terminals 31, 41 and the power receiving side control terminals 32, 42 and the power supply terminals 65, 75 and the power supply side control terminals 67, 77 are not disposed in the vacuum because they are disposed in the apparatus body 21 or in the stage body 61. In the internal atmosphere of the groove 16, there is no problem of deterioration, corrosion, formation of a film or the like. The surfaces of the terminals 31, 32, 41, 42, 65, 67, 75, and 77 may be covered by a film so as not to be exposed to the internal atmosphere of the vacuum chamber 16.
由於供電側接地端子84係被與接地電位作連接,受電側接地端子33係被置於接地電位或浮動電位,因此,供電側接地端子84和受電側接地端子33也難以發生變質、腐蝕、薄膜形成等之問題。 Since the power supply side ground terminal 84 is connected to the ground potential, and the power receiving side ground terminal 33 is placed at the ground potential or the floating potential, the power supply side ground terminal 84 and the power receiving side ground terminal 33 are also less likely to be deteriorated, corroded, and thinned. Forming issues such as.
另外,在上述各例中,雖係為使用有蝕刻氣體之電漿之例,但是,除此之外,就算是在處理部17乃身為濺鍍靶材,於真空槽16之內部係從濺鍍氣體導入裝置而被導入有濺鍍氣體,在真空槽16之內部被形成有濺鍍氣體之電漿的成膜裝置,亦由於係藉由濺鍍氣體之電漿來使基板51~53被與接地電位作連接並使其被吸附在第1例~第3 例之吸附裝置19a~19c的吸附電極22處,因此係被包含於本發明之真空處理裝置中。 Further, in each of the above examples, an example in which a plasma having an etching gas is used is used. However, even if the processing unit 17 is a sputtering target, the inside of the vacuum chamber 16 is used. The sputtering device is introduced into the sputtering gas introduction device, and a film forming device is formed in which the plasma of the sputtering gas is formed inside the vacuum chamber 16, and the substrate 5 1 is caused by the plasma of the sputtering gas. The 5 3 is connected to the ground potential and adsorbed to the adsorption electrode 22 of the adsorption devices 19a to 19c of the first to third examples, and is therefore included in the vacuum processing apparatus of the present invention.
於此情況,若是藉由所形成了的濺鍍氣體來使濺鍍靶材被作濺鍍,則在被吸附於第1例~第3例之吸附裝置19a~19c處的各基板51~53之表面上,係被形成薄膜。 In this case, if the sputtering target is sputtered by the formed sputtering gas, the substrates 5 1 to be adsorbed to the adsorption devices 19a to 19c of the first to third examples. On the surface of 5 3 , a film is formed.
又,從處理部17而導入CVD之原料氣體而形成原料氣體之電漿並在基板51~53之表面上形成薄膜的電漿CVD裝置,亦係被包含在本發明之真空處理裝置中。 Further, a plasma CVD apparatus which introduces a raw material gas of CVD from the processing unit 17 to form a plasma of a material gas and forms a thin film on the surfaces of the substrates 5 1 to 5 3 is also included in the vacuum processing apparatus of the present invention. .
進而,係並不被限定於電漿,由於只要是具有電傳導性之氣體狀的物質,便能夠將被載置於吸附裝置19a~19e上之基板51~53與真空槽16之壁面作電性連接,而能夠對等價電容進行充電,因此係能夠使用在本發明中。 Further, it is not limited to the plasma, and the substrate 5 1 to 5 3 placed on the adsorption devices 19a to 19e and the wall surface of the vacuum chamber 16 can be placed as long as it is electrically conductive. The electrical connection can be used to charge an equivalent capacitor, and thus can be used in the present invention.
成為具有電傳導性之氣體狀的物質之氣體,係亦可從處理部17以外之裝置而作導入。 The gas which is a gas-conducting substance having electrical conductivity can be introduced from a device other than the processing unit 17.
上述吸附電極22,雖然係被配置在裝置本體21之內部,但是,係亦可配置在裝置本體21之表面上,並將吸附電極22以保護膜來作覆蓋,而與將吸附電極22配置在裝置本體21之內部時同樣的,構成為並不與基板51~53作接觸並且被從真空槽16之氛圍而分離。 The adsorption electrode 22 is disposed inside the apparatus body 21, but may be disposed on the surface of the apparatus body 21, and the adsorption electrode 22 is covered with a protective film, and the adsorption electrode 22 is disposed at Similarly to the inside of the apparatus body 21, it is configured not to be in contact with the substrates 5 1 to 5 3 and to be separated from the atmosphere of the vacuum chamber 16 .
在上述例中,雖係將供電側控制端子67、77所輸出的控制訊號藉由受電側控制端子32、42來作了受 訊,但是,係亦能夠使控制訊號重疊於供電端子64、65、75所輸出的電壓中,並藉由抽出電路來從被供給至受電端子24、31、41處的電壓而抽出控制訊號,再輸入至受電側控制裝置35處。 In the above example, the control signals output from the power supply side control terminals 67, 77 are received by the power receiving side control terminals 32, 42. However, the control signal can also be superimposed on the voltage outputted by the power supply terminals 64, 65, 75, and the control signal can be extracted from the voltage supplied to the power receiving terminals 24, 31, 41 by the extraction circuit. It is input to the power receiving side control device 35 again.
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