TWI661092B - Method for preparing copper particles - Google Patents

Method for preparing copper particles Download PDF

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TWI661092B
TWI661092B TW106141001A TW106141001A TWI661092B TW I661092 B TWI661092 B TW I661092B TW 106141001 A TW106141001 A TW 106141001A TW 106141001 A TW106141001 A TW 106141001A TW I661092 B TWI661092 B TW I661092B
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copper
electrode
copper particles
containing electrolyte
electrolyte
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TW201925536A (en
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黃國宸
許仕揚
李建良
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盈昌科技工業股份有限公司
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

一種銅顆粒製備方法,主要用以解決習知銅顆粒製備方法耗費時間,無法連續生產的問題。係包含:提供一含銅電解液,該含銅電解液係選自由一含硫酸銅溶液及一含氯化銅溶液所組成之群組,該含硫酸銅溶液包含濃度為0.037~3% w/v之銅離子,該含氯化銅溶液包含濃度為0.037~1% w/v之銅離子;使一陽極電極及一陰極電極伸入於該含銅電解液中,該陽極電極為不溶性電極;及對該陽極電極與該陰極電極施予一電流,以電解該含銅電解液,使數個銅顆粒析出並沉積於該含銅電解液中。 A copper particle preparation method is mainly used to solve the problem that the conventional copper particle preparation method consumes time and cannot be continuously produced. The system includes: providing a copper-containing electrolyte, the copper-containing electrolyte is selected from the group consisting of a copper sulfate-containing solution and a copper chloride-containing solution, and the copper sulfate-containing solution contains a concentration of 0.037 ~ 3% w / v copper ion, the copper chloride-containing solution contains copper ions at a concentration of 0.037 to 1% w / v; an anode electrode and a cathode electrode are extended into the copper-containing electrolyte, and the anode electrode is an insoluble electrode; And applying an electric current to the anode electrode and the cathode electrode to electrolyze the copper-containing electrolyte, so that several copper particles are precipitated and deposited in the copper-containing electrolyte.

Description

銅顆粒製備方法 Preparation method of copper particles

本發明係關於一種銅顆粒製備方法,尤其是一種可連續生產且可製備出粒徑小且均勻分布之銅顆粒的銅顆粒製備方法。 The invention relates to a method for preparing copper particles, in particular to a method for preparing copper particles that can be continuously produced and can produce copper particles with small particle size and uniform distribution.

銅顆粒於工業上的用途十分廣泛,例如可掺混銅顆粒做為導電材料、以銅顆粒製作觸媒等等,是以,銅顆粒的粒徑大小將影響銅顆粒使用於上述用途時所能發揮的效果,粒徑越小之銅顆粒所具有的比表面積較大,反應率也較高,反之,粒徑較大的銅顆粒則比表面積較小,反應率較低。 Copper particles are widely used in industry, for example, copper particles can be blended as conductive materials, copper particles can be used as catalysts, etc. Therefore, the size of copper particles will affect the ability of copper particles to be used in the above applications. The effect exhibited is that the copper particles with a smaller particle size have a larger specific surface area and a higher reaction rate. Conversely, copper particles with a larger particle size have a smaller specific surface area and a lower reaction rate.

一種習知銅顆粒製備方法係於1~30A/dm2之電流密度操作下,對一酸性含銅電解液進行電解,使得數個銅顆粒可被析出於一陰極電極之表面,並附著於該陰極電極之表面上,該習知銅顆粒製備方法所製備出銅顆粒之粒徑分布約為3~30μm。 A conventional method for preparing copper particles is an electrolysis of an acidic copper-containing electrolyte under a current density operation of 1 to 30 A / dm 2 , so that several copper particles can be precipitated on the surface of a cathode electrode and attached to the cathode electrode. On the surface of the cathode electrode, the particle size distribution of the copper particles prepared by the conventional copper particle preparation method is about 3 to 30 μm.

惟,該習知銅顆粒製備方法於形成該數個銅顆粒後,該數個銅顆粒會附著在該陰極電極之表面,必須進一步自該陰極電極之表面收集該數個銅顆粒,因而工者必須適時地卸除更換該陰極電極,而影響銅顆粒的生產效率。又,習知銅顆粒製備方法所獲得之銅顆粒的規格不均,工者必須再針對所獲得的銅顆粒進行規格篩分,而增加了工作成本。 However, in the conventional copper particle preparation method, after the copper particles are formed, the copper particles will adhere to the surface of the cathode electrode, and the copper particles must be further collected from the surface of the cathode electrode. The cathode electrode must be removed and replaced in a timely manner, which affects the production efficiency of copper particles. In addition, the specifications of the copper particles obtained by the conventional copper particle preparation method are not uniform, and workers must perform size screening on the obtained copper particles, which increases the work cost.

有鑑於此,習知銅顆粒製備方法確實仍有加以改善之必要。 In view of this, the conventional method for preparing copper particles does still need to be improved.

為解決上述問題,本發明係提供一種銅顆粒製備方法,係使銅顆粒析出後不會附著於陰極電極之表面者。 In order to solve the above problems, the present invention provides a method for preparing copper particles, which prevents copper particles from adhering to the surface of a cathode electrode after precipitation.

本發明另提供一種銅顆粒製備方法,係可製備出具有小粒徑且粒徑均勻之銅顆粒者。 The invention also provides a method for preparing copper particles, which can prepare copper particles with small particle diameter and uniform particle diameter.

本發明的銅顆粒製備方法,包含:提供一含銅電解液,該含銅電解液係選自由一含硫酸銅溶液及一含氯化銅溶液所組成之群組,該含硫酸銅溶液包含0.037~3% w/v之銅離子,該含氯化銅溶液包含0.037~1% w/v之銅離子;使一陽極電極及一陰極電極伸入於該含銅電解液中,該陽極電極為不溶性電極;及對該陽極電極與該陰極電極施予一電流,係於10~100A/dm2之電流密度操作下電解該含銅電解液,使數個銅顆粒析出並沉積於該含銅電解液中。 The method for preparing copper particles of the present invention comprises: providing a copper-containing electrolyte, the copper-containing electrolyte is selected from the group consisting of a copper sulfate-containing solution and a copper chloride-containing solution, and the copper sulfate-containing solution contains 0.037 ~ 3% w / v copper ion, the copper chloride-containing solution contains 0.037 ~ 1% w / v copper ion; an anode electrode and a cathode electrode are protruded into the copper-containing electrolyte, and the anode electrode is An insoluble electrode; and applying a current to the anode electrode and the cathode electrode to electrolyze the copper-containing electrolyte under a current density operation of 10 to 100 A / dm2, so that several copper particles are precipitated and deposited on the copper-containing electrolyte in.

據此,本發明的銅顆粒製備方法,藉由該含銅電解液中含有適當比例的硫酸銅,所生成之該數個銅顆粒自該陰極電極析出後不會附著在該陰極電極上,故,可以快速方便地製備該數個銅顆粒,而可以縮短生產時間及提昇生產效率,此外,所生產之銅顆粒具有粒徑較小,且粒徑較為均勻之功效。 According to this, in the copper particle preparation method of the present invention, the copper-containing electrolyte contains a proper proportion of copper sulfate, and the generated copper particles will not adhere to the cathode electrode after precipitating from the cathode electrode. The copper particles can be prepared quickly and conveniently, and the production time can be shortened and the production efficiency can be improved. In addition, the produced copper particles have the effect of smaller particle size and more uniform particle size.

其中,選擇銅離子濃度為3% w/v之該含硫酸銅溶液或銅離子濃度為1% w/v之該含氯化銅溶液作為該含銅電解液。如此,係具有可製備出小粒徑銅顆粒之功效。 Among them, the copper sulfate-containing solution having a copper ion concentration of 3% w / v or the copper chloride-containing solution having a copper ion concentration of 1% w / v is selected as the copper-containing electrolyte. In this way, it has the effect of preparing small-sized copper particles.

其中,將銅離子濃度為3% w/v之該含硫酸銅溶液與銅離子濃度為10% w/v之該含氯化銅溶液混合作為該含銅電解液,且銅離子濃度為10% w/v之該含氯化銅溶液相對於該含銅電解液之體積比為2~10%。如此,係具有使本發明的銅顆粒製備方法所生成之銅顆粒粒徑小於2μm之功效。 Wherein, the copper sulfate-containing solution having a copper ion concentration of 3% w / v and the copper chloride-containing solution having a copper ion concentration of 10% w / v were mixed as the copper-containing electrolyte, and the copper ion concentration was 10% The volume ratio of w / v of the copper chloride-containing solution to the copper-containing electrolyte is 2-10%. In this way, it has the effect of making the particle size of the copper particles produced by the copper particle preparation method of the present invention less than 2 μm.

其中,於電解前加入一硫酸溶液於該含銅電解液中,使得該 含銅電解液的pH值小於3。如此,係具有提升電流效率之功效。 Wherein, a sulfuric acid solution is added to the copper-containing electrolyte before electrolysis, so that the The pH value of the copper-containing electrolyte is less than 3. In this way, it has the effect of improving current efficiency.

其中,選用一鈦鍍氧化銥電極作為該陽極電極。如此,係具有提高陽極穩定性及耐用性之功效。 Among them, a titanium-plated iridium oxide electrode is selected as the anode electrode. In this way, it has the effect of improving the stability and durability of the anode.

其中,選用一鈦鍍氧化銥電極作為該陰極電極。如此,係具有提高陰極穩定性及耐用性之功效。 Among them, a titanium-plated iridium oxide electrode is selected as the cathode electrode. In this way, it has the effect of improving the stability and durability of the cathode.

其中,係於21A/dm2之電流密度操作下,使數個銅顆粒析出並沉積於該含銅電解液中。如此,針對銅離子濃度為3%之該含銅電解液,可以於57.5分鐘內完成電解反應,達成縮短電解時程之功效。 Among them, under a current density operation of 21 A / dm 2 , several copper particles were precipitated and deposited in the copper-containing electrolyte. In this way, for the copper-containing electrolyte having a copper ion concentration of 3%, the electrolytic reaction can be completed in 57.5 minutes, thereby achieving the effect of shortening the electrolytic time course.

第1a~1b圖:本發明銅顆粒製備方法所製備出銅顆粒之X光繞射(X-ray diffraction,XRD)分析示意圖。 Figures 1a-1b: Schematic diagrams of X-ray diffraction (XRD) analysis of copper particles prepared by the copper particle preparation method of the present invention.

第2a~2b圖:本發明銅顆粒製備方法所製備出銅顆粒之掃描式電子顯微鏡(Scanning Electron Microscope,SEM)照片。 Figures 2a-2b: Scanning Electron Microscope (SEM) photos of copper particles prepared by the copper particle preparation method of the present invention.

第3a~3f圖:本發明銅顆粒製備方法所製備出銅顆粒之粒徑分布圖。 Figures 3a to 3f: Particle size distribution diagrams of copper particles prepared by the copper particle preparation method of the present invention.

為讓本發明之上述及其他目的、特徵及優點能更明顯易懂,下文特舉本發明之較佳實施例,並配合所附圖式,作詳細說明如下:本發明之第一實施例的銅顆粒製備方法係可以藉由以一預定之電流密度電解一含銅電解液,使數個銅顆粒析出於一陰極電極之表面,並沉積於該含銅電解液中。 In order to make the above and other objects, features, and advantages of the present invention more comprehensible, the following describes the preferred embodiments of the present invention in detail with the accompanying drawings as follows: The first embodiment of the present invention The method for preparing copper particles is that by electrolyzing a copper-containing electrolyte at a predetermined current density, several copper particles are precipitated on the surface of a cathode electrode and deposited in the copper-containing electrolyte.

詳言之,該含銅電解液係可以選自由一含硫酸銅溶液及一含氯化銅溶液所組成之群組,該含硫酸銅溶液包含濃度為0.037~3% w/v之銅離子,該含氯化銅溶液包含濃度為0.037~1% w/v之銅離子。例如,可以選擇銅離子濃度為3% w/v之該含硫酸銅溶液或銅離子濃度為1% w/v之 該含氯化銅溶液作為該含銅電解液,藉此,本發明的銅顆粒製備方法可以製備出小粒徑之該數個銅顆粒。又,較佳係將銅離子濃度為3% w/v之該含硫酸銅溶液與銅離子濃度為10% w/v之該含氯化銅溶液混合作為該含銅電解液,且銅離子濃度為10% w/v之該含氯化銅溶液相對於該含銅電解液之體積比為2~10%,藉此可以進一步製備出粒徑小於2μm之該數個銅顆粒。此外,該含硫酸銅溶液及該含氯化銅溶液的來源並無限制,可以由市售藥品等級之硫酸銅粉末或氯化銅粉末與水混合配製獲得,亦可以由工業廢液中的含銅廢液經稀釋而獲得(例如,工業電鍍廢液、工業蝕刻廢液經稀釋而獲得)。 Specifically, the copper-containing electrolyte may be selected from the group consisting of a copper sulfate-containing solution and a copper chloride-containing solution, and the copper sulfate-containing solution contains copper ions at a concentration of 0.037 to 3% w / v. The copper chloride-containing solution contains copper ions at a concentration of 0.037 to 1% w / v. For example, the copper sulfate-containing solution with a copper ion concentration of 3% w / v or a copper ion concentration of 1% w / v can be selected. The copper chloride-containing solution is used as the copper-containing electrolyte, whereby the copper particle preparation method of the present invention can prepare the copper particles with a small particle diameter. In addition, the copper sulfate-containing solution having a copper ion concentration of 3% w / v and the copper chloride-containing solution having a copper ion concentration of 10% w / v are preferably mixed as the copper-containing electrolyte, and the copper ion concentration is The volume ratio of the copper chloride-containing solution to the copper-containing electrolyte at 10% w / v is 2 to 10%, whereby the copper particles having a particle size of less than 2 μm can be further prepared. In addition, the source of the copper sulfate-containing solution and the copper chloride-containing solution is not limited, and can be obtained by mixing commercially available pharmaceutical-grade copper sulfate powder or copper chloride powder with water, or by using The copper waste liquid is obtained by dilution (for example, industrial electroplating waste liquid and industrial etching waste liquid are obtained by dilution).

較佳地,工者更能夠以一硫酸水溶液調整該含銅電解液的pH值至小於3,更佳為調整該含銅電解液的pH值至小於-0.8,藉此可以提升於後續電解反應時之電流效率,進而縮短電解時程,以節省該數個銅顆粒的生產成本。 Preferably, the worker can adjust the pH of the copper-containing electrolyte to less than 3 with a sulfuric acid aqueous solution, and more preferably adjust the pH of the copper-containing electrolyte to less than -0.8, thereby improving the subsequent electrolytic reaction. Time current efficiency, thereby shortening the electrolysis time to save the production cost of the copper particles.

續使一陽極電極及該陰極電極伸入該含銅電解液中,例如可以將該含銅電解液承載於一電解槽中,使該陽極電極及該陰極電極伸入該含銅電解液的液面下方,即可以完成該陽極電極及該陰極電極的設置。該陽極電極可以選擇為不溶性陽極,例如:由石墨、鈦、鈦鍍鉑族金屬等材料所形成之惰性電極,如此係使該陽極電極不會與該含銅電解液發生反應,可以達到延長該陽極電極壽命之功效。又,該陰極電極亦可以由鈦、石墨、鉑金、或者鈦鍍鉑族金屬等材料所形成的可導電之電極。於本實施例中,該陽極電極與該陰極電極同為由鈦鍍氧化銥材料所形成之鈦鍍氧化銥電極,其於酸性溶液中具有較高穩定性,因而可以提升該陽極電極及該陰極電極的穩定性及耐用性。 An anode electrode and the cathode electrode are continuously extended into the copper-containing electrolyte. For example, the copper-containing electrolyte may be carried in an electrolytic cell, and the anode electrode and the cathode electrode may be extended into the copper-containing electrolyte. Below the surface, the setting of the anode electrode and the cathode electrode can be completed. The anode electrode can be selected as an insoluble anode, for example, an inert electrode formed of graphite, titanium, titanium-plated group metals, and the like, so that the anode electrode does not react with the copper-containing electrolyte, and can extend the Effect of anode electrode life. In addition, the cathode electrode may be a conductive electrode formed of a material such as titanium, graphite, platinum, or a titanium-plated group metal. In this embodiment, the anode electrode and the cathode electrode are both titanium-plated iridium oxide electrodes formed of titanium-plated iridium oxide material, which has higher stability in an acidic solution, so the anode electrode and the cathode can be improved. Stability and durability of the electrode.

待完成該陽極電極及該陰極電極的設置後,即可以對該陽極電極與該陰極電極施予一電流,使該陽極電極與該陰極電極之間可以透過 該含銅電解液形成一電流迴路。值得注意的是,係可以在一電流密度為10~100A/dm2之操作下,使該數個銅顆粒析出並沉積於該含銅電解液中,因此所析出的該數個銅顆粒不會附著於該陰極電極之表面,如此一來可以節省卸除更換該陰極電極的時間,故,相較於該習知銅顆粒製備方法,於製備獲得等量的銅顆粒的狀況下,可以大幅縮短時程,因此本發明的銅顆粒製備方法具有較佳的生產效率。 After the setting of the anode electrode and the cathode electrode is completed, a current can be applied to the anode electrode and the cathode electrode, so that a current loop can be formed between the anode electrode and the cathode electrode through the copper-containing electrolyte. It is worth noting that the copper particles can be precipitated and deposited in the copper-containing electrolyte under the operation of a current density of 10 to 100 A / dm 2 , so the precipitated copper particles will not Adhering to the surface of the cathode electrode can save the time of removing and replacing the cathode electrode. Therefore, compared with the conventional method for preparing copper particles, it can be greatly shortened when the same amount of copper particles are obtained. Time course, therefore, the method for preparing copper particles of the present invention has better production efficiency.

前述之銅顆粒製備方法,藉由適當調配該含銅電解液的成分,及特定的電流密度區間操作下,所生成之該數個銅顆粒自該陰極電極析出後不會附著在該陰極電極上,故,可以快速方便地製備該數個銅顆粒,而可以縮短生產時間及提昇生產效率,此外,所生產之銅顆粒具有粒徑較小,且粒徑較為均勻之功效。 In the foregoing method for preparing copper particles, by appropriately blending the components of the copper-containing electrolyte and operating under a specific current density interval, the generated copper particles will not adhere to the cathode electrode after precipitating from the cathode electrode. Therefore, the plurality of copper particles can be prepared quickly and easily, which can shorten the production time and improve the production efficiency. In addition, the produced copper particles have the effect of smaller particle size and more uniform particle size.

為證實本發明的銅顆粒製備方法確實可以有效且快速地製備平均粒徑小於3μm之樹枝狀銅顆粒,係進行以下試驗:首先依照第1表所示之成分配比調配1500m1的該含銅電解液,其中需特別注意的是,第(IV)~(VI)組係將銅離子濃度為3% w/v之該含硫酸銅溶液與銅離子濃度為10% w/v之該含氯化銅溶液混合作為該含銅電解液,且銅離子濃度為10% w/v之該含氯化銅溶液相對於該含銅電解液之體積比分別為2%、5%及10%。調配該含銅電解液後,使該陽極電極與該陰極電極(同為鈦鍍氧化銥電極)伸入該含銅電解液中,在電流密度為21A/dm2之操作下,對該含銅電解液進行電解。 In order to confirm that the copper particle preparation method of the present invention can indeed effectively and quickly prepare dendritic copper particles with an average particle size of less than 3 μm, the following tests were performed: First, the copper-containing electrolytic solution of 1500 m1 was prepared according to the composition distribution ratio shown in Table 1. In particular, it should be noted that groups (IV) to (VI) consist of a solution containing copper sulfate with a copper ion concentration of 3% w / v and a solution containing chloride with a copper ion concentration of 10% w / v. Copper solutions were mixed as the copper-containing electrolyte, and the volume ratios of the copper chloride-containing solution to the copper-containing electrolyte with a copper ion concentration of 10% w / v were 2%, 5%, and 10%, respectively. After the copper-containing electrolyte was prepared, the anode electrode and the cathode electrode (also titanium-plated iridium oxide electrode) were extended into the copper-containing electrolyte, and the copper-containing electrolyte was operated under a current density of 21 A / dm 2 . The electrolyte is electrolyzed.

如第1表所示,於上述方式操作之下,各組均可產出該數個銅顆粒,其中,第(I)組反應時間僅需57.5分鐘,即可使該數個銅顆粒完全產出(產率100%),顯示本發明的銅顆粒製備方法可以有效且快速地製備出該數個銅顆粒;第(III)組相對於第(I)組,反應時間從57.5分鐘縮短至50分鐘,顯示於該含銅電解液中添加硫酸,以降低含銅電解液之pH值,確實有利於提升該含銅電解液中之電流效率,使得電解反應時間縮短。另一方面,請參照第(IV)~(VI)組,隨著氯化銅的添加量增加,使得該含銅電解液中的銅離子含量也提高,故,欲達成相同產率100%情況下,所需反應時間也需由50分鐘增加至70分鐘。 As shown in Table 1, under the above-mentioned method, each group can produce the copper particles. Among them, the reaction time of group (I) only needs 57.5 minutes, so that the copper particles can be completely produced. The yield (100% yield) shows that the copper particle preparation method of the present invention can efficiently and quickly prepare the several copper particles; the reaction time of group (III) is shortened from 57.5 minutes to 50 compared with group (I). It is shown that adding sulfuric acid to the copper-containing electrolyte to reduce the pH value of the copper-containing electrolyte actually improves the current efficiency in the copper-containing electrolyte and shortens the electrolytic reaction time. On the other hand, please refer to groups (IV) to (VI). As the amount of copper chloride increases, the copper ion content in the copper-containing electrolyte also increases. Therefore, to achieve the same yield of 100% In addition, the required reaction time also needs to be increased from 50 minutes to 70 minutes.

請閱第1a~1b圖,其係本發明銅顆粒製備方法所製備出銅顆粒之X光繞射(X-ray diffraction,XRD)分析示意圖。其中,第1a圖為第(II)組所製備之銅顆粒,第1b圖為JCPDS 89-2838純銅標準圖譜;由第1a圖及第1b圖對照結果可知,本發明的銅顆粒製備方法所製備之銅顆粒與純銅於相同繞射角度(2θ)處具有同樣波峰,顯示本發明的銅顆粒製備方法所製備之銅顆粒為高純度銅顆粒。 Please refer to Figs. 1a to 1b, which are schematic diagrams of X-ray diffraction (XRD) analysis of copper particles prepared by the copper particle preparation method of the present invention. Among them, Fig. 1a is the copper particles prepared in group (II), and Fig. 1b is the standard copper pure spectrum of JCPDS 89-2838. It can be seen from the comparison of Figs. The copper particles and pure copper have the same peak at the same diffraction angle (2θ), which shows that the copper particles prepared by the copper particle preparation method of the present invention are high-purity copper particles.

此外,請參照第2a~2b圖,其係本發明銅顆粒製備方法所製備出銅顆粒之掃描式電子顯微鏡(Scanning Electron Microscope,SEM)照片,其中,第2a圖係第(III)組所製備出之銅顆粒;第2b圖係第(VI)組所製備出之銅顆粒。由第2a~2b圖顯示本發明的銅顆粒製備方法所製得之銅顆粒外觀皆可以呈樹枝狀,相較於一般非樹枝狀之銅顆粒,係可以增 加該數個銅顆粒間的接枝比率,如此,可以達到具有較高之反應比表面積之功效,並有利於工業上之應用。 In addition, please refer to Figs. 2a to 2b, which are scanning electron microscope (SEM) photographs of copper particles prepared by the copper particle preparation method of the present invention. Among them, Fig. 2a is prepared by group (III). Copper particles produced; Figure 2b is copper particles prepared in group (VI). Figures 2a to 2b show that the copper particles produced by the copper particle preparation method of the present invention can be dendritic in appearance, compared with ordinary non-dendritic copper particles, the appearance can be increased. By adding the grafting ratio between the several copper particles, the effect of having a higher specific surface area for reaction can be achieved, and it is advantageous for industrial applications.

又,分別對第1表所示不同組成之含銅電解液所製得之銅顆粒,以奈米粒徑分析儀進行中位徑(D50)分析,其分析結果如第2表所示。 In addition, the copper particles obtained from the copper-containing electrolytes of different compositions shown in Table 1 were analyzed by a median diameter (D50) using a nanometer particle size analyzer, and the analysis results are shown in Table 2.

由第(I)~(VI)組顯示,本發明的銅顆粒製備方法所製得之銅顆粒粒徑皆小於3μm,其中,第(IV)~(VI)組顯示,當該含銅電解液中含有0.2~1%氯化銅時,更可以使所製得之銅顆粒粒徑小於2μm,尤其以第(VI)組所製得之銅顆粒粒徑最小,其中位徑(D50)為1.136μm,粒徑分布為0.548~1.292μm。此外,請參照第3a~3f圖,分別係以上述第(I)~(VI)組製備出銅顆粒之粒徑分布圖,由第3a~3f圖可知,各組製得之銅顆粒的粒徑分布集中,故本發明的銅顆粒製備方法確實可以製備出粒徑均勻之銅顆粒。 Groups (I) to (VI) show that the particle diameters of the copper particles prepared by the copper particle preparation method of the present invention are all less than 3 μm. Among them, groups (IV) to (VI) show that when the copper-containing electrolyte When 0.2 ~ 1% copper chloride is contained, the particle size of the copper particles obtained can be less than 2 μm, especially the copper particle size obtained from group (VI) is the smallest, and the position diameter (D50) is 1.136. μm, particle size distribution is 0.548 ~ 1.292μm. In addition, please refer to Figs. 3a to 3f. The particle size distribution diagrams of copper particles are prepared according to the above groups (I) to (VI). From the pictures 3a to 3f, it can be seen that the copper particles produced by each group are The diameter distribution is concentrated, so the copper particle preparation method of the present invention can indeed produce copper particles with uniform particle size.

綜上所述,本發明的銅顆粒製備方法,藉由適當調配該含銅電解液的成分,所生成之該數個銅顆粒自該陰極電極析出後不會附著在該陰極電極上,故,可以快速方便地製備該數個銅顆粒,而可以縮短生產時 間及提昇生產效率,此外,本發明的銅顆粒製備方法可以使所生產之銅顆粒具有粒徑較小,且粒徑較為均勻,為本案之功效。 In summary, in the method for preparing copper particles of the present invention, by appropriately formulating the components of the copper-containing electrolyte, the generated copper particles will not adhere to the cathode electrode after precipitation from the cathode electrode. The number of copper particles can be prepared quickly and easily, and the production time can be shortened. In addition, the production method of the copper particles of the present invention can make the produced copper particles have a smaller particle size and a more uniform particle size, which is the effect of this case.

雖然本發明已利用上述較佳實施例揭示,然其並非用以限定本發明,任何熟習此技藝者在不脫離本發明之精神和範圍之內,相對上述實施例進行各種更動與修改仍屬本發明所保護之技術範疇,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed using the above-mentioned preferred embodiments, it is not intended to limit the present invention. Anyone skilled in the art can make various changes and modifications to the above embodiments without departing from the spirit and scope of the present invention. The technical scope protected by the invention, so the scope of protection of the present invention shall be determined by the scope of the appended patent application.

Claims (7)

一種銅顆粒製備方法,包含:提供一含銅電解液,該含銅電解液係選自由一含硫酸銅溶液及一含氯化銅溶液所組成之群組,該含硫酸銅溶液包含濃度為0.037~3% w/v之銅離子,該含氯化銅溶液包含濃度為0.037~1% w/v之銅離子;使一陽極電極及一陰極電極伸入於該含銅電解液中,該陽極電極為不溶性電極;及對該陽極電極與該陰極電極施予一電流,係於10~100A/dm2之電流密度操作下電解該含銅電解液,使數個銅顆粒析出並沉積於該含銅電解液中。A method for preparing copper particles, comprising: providing a copper-containing electrolyte, the copper-containing electrolyte is selected from the group consisting of a copper sulfate-containing solution and a copper chloride-containing solution, and the copper sulfate-containing solution contains a concentration of 0.037 ~ 3% w / v copper ions, the copper chloride-containing solution contains copper ions at a concentration of 0.037 ~ 1% w / v; an anode electrode and a cathode electrode are protruded into the copper-containing electrolyte, the anode The electrode is an insoluble electrode; and a current is applied to the anode electrode and the cathode electrode, and the copper-containing electrolyte is electrolyzed under a current density operation of 10 to 100 A / dm 2 to precipitate and deposit several copper particles on the electrode. Copper electrolyte. 如申請專利範圍第1項所述之銅顆粒製備方法,其中,選擇銅離子濃度為3% w/v之該含硫酸銅溶液或銅離子濃度為1% w/v之該含氯化銅溶液作為該含銅電解液。The method for preparing copper particles according to item 1 of the scope of patent application, wherein the copper sulfate-containing solution having a copper ion concentration of 3% w / v or the copper chloride-containing solution having a copper ion concentration of 1% w / v is selected. As this copper-containing electrolyte. 如申請專利範圍第1項所述之銅顆粒製備方法,其中,將銅離子濃度為3% w/v之該含硫酸銅溶液與銅離子濃度為10% w/v之該含氯化銅溶液混合作為該含銅電解液,且銅離子濃度為10% w/v之該含氯化銅溶液相對於該含銅電解液之體積比為2~10%。The method for preparing copper particles according to item 1 of the scope of patent application, wherein the copper sulfate-containing solution having a copper ion concentration of 3% w / v and the copper chloride-containing solution having a copper ion concentration of 10% w / v The volume ratio of the copper chloride-containing solution to the copper-containing electrolytic solution as the copper-containing electrolytic solution with a copper ion concentration of 10% w / v is 2 to 10%. 如申請專利範圍第1~3項中任一項所述之銅顆粒製備方法,其中,於電解該含銅電解液前,以一硫酸水溶液調整該含銅電解液的pH值至小於3。The method for preparing copper particles according to any one of claims 1 to 3, wherein the pH of the copper-containing electrolyte is adjusted to less than 3 with a sulfuric acid aqueous solution before the copper-containing electrolyte is electrolyzed. 如申請專利範圍第1~3項中任一項所述之銅顆粒製備方法,其中,選用一鈦鍍氧化銥電極作為該陽極電極。The method for preparing copper particles according to any one of claims 1 to 3, wherein a titanium-plated iridium oxide electrode is selected as the anode electrode. 如申請專利範圍第1~3項中任一項所述之銅顆粒製備方法,其中,選用一鈦鍍氧化銥電極作為該陰極電極。The method for preparing copper particles according to any one of claims 1 to 3, wherein a titanium-plated iridium oxide electrode is selected as the cathode electrode. 如申請專利範圍第1~3項中任一項所述之銅顆粒製備方法,其中,係於21A/dm2之電流密度操作下,使數個銅顆粒析出並沉積於該含銅電解液中。The method for preparing copper particles according to any one of claims 1 to 3, wherein, under the current density operation of 21 A / dm 2 , several copper particles are precipitated and deposited in the copper-containing electrolyte .
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